Apparatus for cleaning foreign matter from a chemical mechanical polishing pad

Abstract

The application discloses a foreign matter cleaning device for a chemical mechanical polishing pad, which comprises a baffle assembly, a high-pressure flushing assembly and a suction assembly. The upper end of the baffle assembly is fixed on a slurry arm, the lower end of the baffle assembly is attached to the surface of the pad, and the lower part is provided with a foreign matter collecting cavity. The high-pressure flushing assembly is fixedly arranged on the slurry arm, and an angle is arranged between the liquid outlet direction of the high-pressure flushing assembly and the surface of the pad. The liquid outlet direction of the high-pressure flushing assembly points to the baffle assembly. The negative pressure end of the suction assembly is communicated with the foreign matter collecting cavity, and the foreign matter in the foreign matter collecting cavity is sucked. The pad is flushed by the high-pressure flushing assembly, the baffle assembly is arranged in the liquid outlet direction of the high-pressure flushing assembly, the foreign matter on the pad is collected into the foreign matter collecting cavity of the baffle assembly, and finally the foreign matter is sucked out by the suction assembly, so that the foreign matter is prevented from remaining on the surface of the pad or the groove of the pad, and the influence on the quality of a wafer is reduced.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and more specifically to a foreign matter cleaning device for a chemical mechanical abrasive pad. Background Technology

[0002] In semiconductor equipment, the proportion of chemical mechanical polishing (CMP) is increasing. As a prerequisite for CMP, polishing pads are required. Polishing pads are primarily made of rigid polyurethane, non-woven polyester felt impregnated with, or coated with non-woven polyurethane. Polishing pads support the chemical and mechanical properties required in CMP processes.

[0003] However, during the subsequent processes, the polishing pads will also wear down, producing pad and polishing fluid residue, which will have an impact on the quality of the wafer. Summary of the Invention

[0004] The technical problem to be solved by this invention is that wear leaves foreign objects on the pad, and traditional cleaning methods may cause foreign objects to remain in the grooves of the pad. The purpose is to provide a foreign object cleaning device for chemical mechanical abrasive pads, which solves the cleaning problem of abrasive pads.

[0005] This invention is achieved through the following technical solution:

[0006] A foreign matter cleaning device for a chemical mechanical abrasive liner, wherein the liner is horizontally arranged and a paddle arm is arranged above the liner, the cleaning device comprising:

[0007] A baffle assembly, the upper end of which is fixed to the paddle arm, the lower end of which is attached to the surface of the liner, and a foreign matter collection cavity is provided in the lower part of the baffle assembly.

[0008] A high-pressure flushing assembly is fixedly installed with the paddle arm, and the liquid outlet direction of the high-pressure flushing assembly is at an angle to the surface of the liner, with the liquid outlet direction of the high-pressure flushing assembly pointing towards the baffle assembly.

[0009] The suction component has a negative pressure end connected to the foreign object collection chamber and attracts foreign objects located in the foreign object collection chamber.

[0010] Specifically, the high-pressure flushing assembly includes a plurality of high-pressure nozzles arranged along the paddle arm, and the high-pressure nozzles are connected to a high-pressure pump;

[0011] With the direction from the high-pressure flushing assembly to the baffle assembly as the positive direction, the angle between the liquid outlet direction of the high-pressure nozzle and the positive direction is an obtuse angle.

[0012] Specifically, a plurality of high-pressure nozzles are arranged sequentially along the length of the paddle arm, and the high-pressure nozzles are located on the lower side of the paddle arm, with an abrasive nozzle provided at the end of the paddle arm.

[0013] Specifically, the baffle assembly is arranged along the length of the paddle arm, and the foreign matter collection chamber is located on the reflection path after the liquid outlet direction of the high-pressure nozzle impacts the liner.

[0014] Optionally, the baffle assembly includes an upper plate and a lower plate. The upper end of the upper plate is vertically connected to the paddle arm, and the lower end of the upper plate is fixedly connected to the upper end of the lower plate. The foreign matter collection chamber is disposed on the inner side of the lower plate, and the negative pressure end of the suction assembly is fixed on the outer side of the lower plate and communicates with the foreign matter collection chamber.

[0015] Specifically, the lower plate includes an inclined plate, a vertical plate, and a horizontal plate. The inclined plate is inclined, the vertical plate is vertical, and the horizontal plate is horizontal. The angle between the outer side of the inclined plate and the positive direction is an obtuse angle.

[0016] The upper end of the inclined plate is fixedly connected to the lower end of the upper plate, the upper end of the vertical plate is fixedly connected to the lower end of the inclined plate, the outer end of the horizontal plate is fixedly connected to the lower end of the vertical plate, and the negative pressure end of the suction component is connected to the cavity formed by the inclined plate, the vertical plate and the horizontal plate.

[0017] Optionally, the lower side of the cross plate is attached to the surface of the pad, and the cross plate and the pad can slide relative to each other.

[0018] Specifically, the upper side of the horizontal plate is an inclined surface, and the outer end thickness of the horizontal plate is less than the inner end thickness of the inclined plate.

[0019] Specifically, the suction assembly includes a suction tube and a suction device. The lower plate is provided with a plurality of suction holes, which are connected to the suction device through a plurality of suction tubes. The suction device provides negative pressure to the suction tube.

[0020] Preferably, the suction tube is fixed by the paddle arm.

[0021] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0022] This invention uses a high-pressure impact component on the paddle arm, a high-pressure flushing component to flush the liner, and a baffle component in the liquid outlet direction of the high-pressure flushing component to collect foreign matter on the liner into the foreign matter collection chamber of the baffle component. Finally, the foreign matter is sucked out by the suction component, which avoids the foreign matter remaining on the liner surface or liner groove and reduces the impact on wafer quality. Attached Figure Description

[0023] The accompanying drawings illustrate exemplary embodiments of the present invention and, together with the description thereof, serve to explain the principles of the invention. These drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, but do not constitute a limitation on the embodiments of the present invention.

[0024] Figure 1 This is a schematic diagram of a foreign matter cleaning device for a chemical mechanical abrasive liner according to the present invention, and the figure is a side view along the length of the impeller arm.

[0025] Reference numerals: 1-High-pressure cleaning assembly, 2-Baffle assembly, 3-Suction assembly, 21-Upper plate, 22-Lower plate, 221-Inclined plate, 222-Vertical plate, 223-Horizontal plate, 10-Paddle arm, 20-Pad. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of the invention.

[0027] It should also be noted that, for ease of description, only the parts relevant to the present invention are shown in the accompanying drawings.

[0028] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0029] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0030] Where there is no conflict, the embodiments and features described herein can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0031] The applicable scenario for this embodiment is: the pad 20 is set horizontally, and a slurry arm 10 is set above the pad 20. An abrasive nozzle is set at the end of the slurry arm 10 to drop abrasive onto the upper surface of the pad 20. Then, the wafer is polished by rotating the pad 20.

[0032] like Figure 1 As shown, in order to solve the problem of foreign matter residue on the surface of the liner 20, this embodiment provides a foreign matter cleaning device for chemical mechanical abrasive liner, including a baffle assembly 2, a high-pressure flushing assembly and a suction assembly 3.

[0033] The upper end of the baffle assembly 2 is fixed to the paddle arm 10, and the lower end of the baffle assembly 2 is attached to the surface of the liner 20. A foreign matter collection chamber is provided at the lower part of the baffle assembly 2. The high-pressure flushing assembly is fixed to the paddle arm 10, and there is an angle between the liquid outlet direction of the high-pressure flushing assembly and the surface of the liner 20. The liquid outlet direction of the high-pressure flushing assembly points towards the baffle assembly 2.

[0034] With the cooperation of the high-pressure flushing component and the baffle component 2, the high-pressure flushing component sprays high-speed cleaning fluid to impact the upper surface of the liner 20. Because there is an angle between the liquid outlet direction and the surface of the liner 20, foreign objects on the surface of the liner 20 are impacted to the location of the baffle component 2. Then, by setting a foreign object collection chamber at the lower part of the baffle component 2, the foreign objects are collected to prevent them from remaining on the surface of the liner 20.

[0035] The negative pressure end of the suction component 3 is connected to the foreign object collection chamber and attracts foreign objects located in the foreign object collection chamber.

[0036] By setting an aspiration component 3, foreign objects in the foreign object collection chamber can be continuously discharged, preventing foreign objects in the foreign object collection chamber from flowing back onto the liner 20.

[0037] In this embodiment, the high-pressure flushing assembly includes multiple high-pressure nozzles arranged along the paddle arm 10. The high-pressure nozzles are connected to a high-pressure pump, which pumps out cleaning fluid, which is then sprayed out from the high-pressure nozzles to achieve cleaning.

[0038] For ease of description, the direction in which the high-pressure flushing assembly points towards the baffle assembly 2 is defined as the positive direction, i.e. Figure 1 In the right-center direction, the angle between the liquid outlet direction of the high-pressure nozzle and the positive direction is an obtuse angle.

[0039] Multiple high-pressure nozzles are arranged sequentially along the length of the paddle arm 10, with the high-pressure nozzles located on the lower side of the paddle arm 10. An abrasive nozzle is provided at the end of the paddle arm 10. This means that multiple high-pressure nozzles can work simultaneously. The paddle arm 10 is generally set according to the radius of the liner 20. By rotating the liner 20, the entire liner 20 can be cleaned.

[0040] Therefore, to achieve the above work, the baffle assembly 2 is arranged along the length of the paddle arm 10, that is, the baffle assembly 2 is also arranged according to the radius of the liner 20, and as... Figure 1 As shown, the foreign matter collection chamber is located on the reflection path of the high-pressure nozzle after impacting the liner 20. After the high-pressure nozzle sprays the cleaning fluid, it impacts the upper surface of the liner 20. Foreign matter on the upper surface of the liner 20 moves with the cleaning fluid. After being reflected, the cleaning fluid can enter the foreign matter collection chamber, thus achieving the collection of foreign matter.

[0041] The baffle assembly 2 includes an upper plate 21 and a lower plate 22. The upper end of the upper plate 21 is vertically connected to the paddle arm 10, and the lower end of the upper plate 21 is fixedly connected to the upper end of the lower plate 22. The foreign matter collection chamber is located on the inner side of the lower plate 22, and the negative pressure end of the suction assembly 3 is fixed on the outer side of the lower plate 22 and communicates with the foreign matter collection chamber.

[0042] The lower plate 22 includes an inclined plate 221, a vertical plate 222 and a horizontal plate 223. The inclined plate 221 is inclined, the vertical plate 222 is vertical, and the horizontal plate 223 is horizontal. The angle between the outer side of the inclined plate 221 and the positive direction is an obtuse angle.

[0043] The upper end of the inclined plate 221 is fixedly connected to the lower end of the upper plate 21, the upper end of the vertical plate 222 is fixedly connected to the lower end of the inclined plate 221, the outer end of the horizontal plate 223 is fixedly connected to the lower end of the vertical plate 222, and the negative pressure end of the suction component 3 is connected to the cavity formed by the inclined plate 221, the vertical plate 222 and the horizontal plate 223.

[0044] A groove structure is formed by the inclined plate 221, the vertical plate 222 and the horizontal plate 223. This groove structure is the foreign object collection cavity. In order to avoid damage to the surface of the liner 20 by the foreign object collection cavity, when the lower side of the horizontal plate 223 is attached to the surface of the liner 20, a certain gap is set between the lower side of the horizontal plate 223 and the upper surface of the liner 20. This also ensures that the horizontal plate 223 and the liner 20 can slide relative to each other.

[0045] In addition, to prevent foreign objects entering the foreign object collection cavity from flowing back from the inner end of the horizontal plate 223 to the pad 20, the upper side of the horizontal plate 223 is set as an inclined surface, that is, the outer end thickness of the horizontal plate 223 is less than the inner end thickness of the inclined plate 221.

[0046] In order to facilitate the collection of cleaning fluid during the rotation of the gasket 20, an inclined surface is provided at the inner end of the horizontal plate 223 to prevent the cleaning fluid from flowing into the foreign matter collection cavity through the inclined surface.

[0047] Finally, to prevent foreign objects and cleaning fluid from accumulating in the foreign object collection chamber, they are extracted by the suction component 3. Continuous extraction ensures that the cleaning equipment can continue to operate.

[0048] In this embodiment, the suction assembly 3 includes a suction tube and a suction device. Multiple suction holes are provided on the lower plate 22, and these holes are connected to the suction device via multiple suction tubes. The suction device provides negative pressure to the suction tubes. Furthermore, to prevent the suction tubes from interfering with the entire chemical mechanical grinding apparatus, the suction tubes are fixed by the paddle arm 10.

[0049] In the description of this specification, the references to terms such as "one embodiment / mode," "some embodiments / modes," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment / mode or example is included in at least one embodiment / mode or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment / mode or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments / modes or examples. Furthermore, without contradiction, those skilled in the art can combine and integrate the different embodiments / modes or examples described in this specification, as well as the features of different embodiments / modes or examples.

[0050] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0051] Those skilled in the art should understand that the above embodiments are merely for illustrating the present invention and are not intended to limit the scope of the invention. Those skilled in the art can make other changes or modifications based on the above invention, and these changes or modifications still fall within the scope of the present invention.

Claims

1. A foreign matter cleaning device for a chemical mechanical abrasive liner, characterized in that, The liner (20) is horizontally positioned, and a paddle arm (10) is positioned above the liner (20). The cleaning device includes: A baffle assembly (2) is fixed at its upper end to the paddle arm (10), and the lower end of the baffle assembly (2) is attached to the surface of the liner (20). A foreign matter collection chamber is provided at the lower part of the baffle assembly (2). The baffle assembly (2) is arranged along the length direction of the paddle arm (10), and the foreign matter collection chamber is located on the reflection path after the liquid outlet direction of the high-pressure nozzle impacts the liner (20). A high-pressure flushing assembly is fixedly installed with the paddle arm (10), and the liquid outlet direction of the high-pressure flushing assembly is at an angle to the surface of the liner (20). The liquid outlet direction of the high-pressure flushing assembly points towards the baffle assembly (2). The high-pressure flushing assembly includes a plurality of high-pressure nozzles arranged along the paddle arm (10). The high-pressure nozzles are connected to a high-pressure pump. The direction of the high-pressure flushing assembly pointing towards the baffle assembly (2) is taken as the positive direction, and the angle between the liquid outlet direction of the high-pressure nozzle and the positive direction is an obtuse angle. The suction component (3) has a negative pressure end connected to the foreign object collection chamber and attracts foreign objects located in the foreign object collection chamber; The baffle assembly (2) includes an upper plate (21) and a lower plate (22). The upper end of the upper plate (21) is vertically connected to the paddle arm (10), and the lower end of the upper plate (21) is fixedly connected to the upper end of the lower plate (22). The foreign matter collection chamber is disposed on the inner side of the lower plate (22). The negative pressure end of the suction assembly (3) is fixed on the outer side of the lower plate (22) and communicates with the foreign matter collection chamber. The lower plate (22) includes an inclined plate (221), a vertical plate (222), and a horizontal plate (223). The inclined plate (221) is inclined, the vertical plate (222) is vertical, and the horizontal plate (223) is horizontal. The angle between the outer side of the inclined plate (221) and the positive direction is obtuse. The upper side of the horizontal plate (223) is an inclined surface, and the outer end thickness of the horizontal plate (223) is less than the inner end thickness of the inclined plate (221). The upper end of the inclined plate (221) is fixedly connected to the lower end of the upper plate (21), the upper end of the vertical plate (222) is fixedly connected to the lower end of the inclined plate (221), the outer end of the horizontal plate (223) is fixedly connected to the lower end of the vertical plate (222), the negative pressure end of the suction component (3) is connected to the cavity formed by the inclined plate (221), the vertical plate (222) and the horizontal plate (223), the lower side of the horizontal plate (223) is attached to the surface of the pad (20), and the horizontal plate (223) and the pad (20) can slide relative to each other.

2. The foreign matter cleaning device for a chemical mechanical abrasive liner according to claim 1, characterized in that, Multiple high-pressure nozzles are arranged sequentially along the length of the paddle arm (10), and the high-pressure nozzles are located on the lower side of the paddle arm (10). An abrasive nozzle is provided at the end of the paddle arm (10).

3. The foreign matter cleaning device for a chemical mechanical abrasive liner according to claim 1, characterized in that, The suction assembly (3) includes a suction tube and a suction device. The lower plate (22) is provided with a plurality of suction holes. The plurality of suction holes are connected to the suction device through a plurality of suction tubes. The suction device provides negative pressure to the suction tube.

4. The foreign matter cleaning device for a chemical mechanical abrasive liner according to claim 3, characterized in that, The suction tube is fixed by the paddle arm (10).

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