Production process of environment-friendly mask base cloth
By designing a multi-layered mask base fabric and degradable agents, the problem of essence contamination on the base fabric surface after mask use is solved, enabling environmentally friendly mask base fabric production and avoiding environmental pollution.
Patent Information
- Application Number
- CN202410793451.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-19
- Publication Date
- 2025-11-28
- Estimated Expiration
- 2044-06-19
AI Technical Summary
After a face mask is used, a large amount of unused essence remains on the surface of the base fabric, which can easily lead to bacterial growth and environmental pollution.
The mask features a multi-layered base fabric design, including a base fabric layer and a hollow fiber woven biodegradable skeleton. This utilizes biodegradable factors to multiply and consume residual essence after use. Furthermore, it is reinforced through spunlace nonwoven technology and hot-press cutting to ensure that the biodegradable factors lose their nutrient source and die after use, thus avoiding contamination.
After the mask is used, the degradation factors consume the remaining essence, preventing bacterial growth, reducing environmental pollution, and achieving environmentally friendly mask base fabric production.
Smart Images

Figure CN118700679B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The application relates to a production process of an environment-friendly mask base cloth, in particular to a production process of a mask base cloth applied to the field of fiber non-woven manufacturing. BACKGROUND
[0002] The mask cloth is a base material for manufacturing a mask and is mainly used for carrying mask essence, wherein the non-woven cloth is the most common, and the mask cloth is mostly made by laying and pressing superfine fiber materials. The mask can not only soften the cutin layer, prevent water evaporation, accelerate the penetration and absorption of nutrients, but also remove dirt and oil on the skin surface, so as to enhance the elasticity of the skin, prevent wrinkles, and make the skin smoother and more moisturized. The mask has two forms, one is a non-carrier type, and the other is a carrier type. The carrier type mask refers to a mask with a film-forming material as a carrier (i.e., a mask base material), supplemented with nutrient ingredients and drugs, and then applied to the face.
[0003] The specification of Chinese invention patent CN113279145B discloses a preparation method of a degradable superfine mask base cloth. The mask produced by the production process has the advantage of being degradable. The island component of the fiber is selected from PLA (polylactic acid), and the sea component is selected from PA6 (polycaprolactam) or PVA (polyvinyl alcohol). The sea component and the island component are formed into a composite stream in a side-by-side manner, then they are collected together, extruded from a spinneret hole like a single-component fiber, and a sea-island type filament fiber is obtained. After subsequent web laying and reinforcement, the mask base cloth is obtained. The superfine long fiber mask produced by the production process has the advantages of high fiber strength and can produce mask base cloths with different gram weights. The superfine fiber produced by the production process has good skin-fitting performance and good moisture absorption effect.
[0004] In the above-mentioned invention patent, the degradable mask base cloth is produced by using degradable raw materials. Although the mask base cloth can be naturally degraded in the natural environment, a large amount of unused essence liquid still exists on the surface of the mask before the base cloth is completely degraded after use, which is easy to cause bacterial growth and pollute the environment. SUMMARY
[0005] In view of the above-mentioned prior art, the technical problem to be solved by the application is that a large amount of unused essence liquid still exists on the surface of the mask before the base cloth is completely degraded after use, which is easy to cause bacterial growth and pollute the environment.
[0006] To solve the above-mentioned problems, the application provides an environment-friendly mask base cloth production process, mainly including the following steps:
[0007] S1, the base cloth is woven and the degradation skeleton is prepared, the PLA / PVA polymer is prepared through the steps of screw extrusion, melt filtration, high-speed airflow drafting and hot rolling, and the degradation skeleton is woven into a net shape by a plurality of hollow fibers;
[0008] S2, integration and reinforcement, a layer of base cloth layer is attached to the upper and lower ends of the degradation skeleton, and after initial fixation by elongation rolling, reinforcement is performed by using spunlace non-woven technology to obtain a mask base cloth combined with the base cloth layer and the degradation skeleton;
[0009] S3, drying and setting, the mask base cloth prepared in step S2 of integration and reinforcement is dried and set by using a hot press roller;
[0010] S4, cutting and forming, the mask base cloth after drying and setting is cut by using a hot press knife to obtain a set mask base cloth.
[0011] In the above mask base cloth production process, after the mask is used, before the base cloth is completely degraded, the essence liquid is used for reproduction and the dominant bacterial species are formed to degrade the base cloth layer. After the base cloth layer is completely degraded, the bacterial species lose the nutrient source and automatically die, which is not easy to pollute the environment.
[0012] As a further improvement of the present application, the mask base cloth includes a pair of base cloth layers, and a degradation skeleton matched with itself is clamped between the two base cloth layers. The degradation skeleton is fixedly connected with the two base cloth layers. The two base cloth layers and the degradation skeleton are initially fixed by elongation rolling and then fixed by spunlace non-woven technology.
[0013] As a further improvement of the present application, the degradation skeleton is woven by a plurality of hollow fibers. The hollow fiber is a hollow structure, and a degradation factor is fixedly connected to the inner wall of the hollow fiber. After the user finishes using the mask and discards it, the degradation factor continues to reproduce and forms dominant bacterial species, consumes the residual essence liquid, and degrades the base cloth layer, which is not easy to breed bacteria and pollute the environment.
[0014] As a further improvement of the present application, in step S4 of cutting and forming, the mask base cloth is cut by using a hot press cutter. On the one hand, hot press cutting can locally melt the hollow fiber, which can be coated at the cutting position to maintain a closed environment for the hollow fiber. On the other hand, the high temperature of the hot press cutter can inactivate the degradation factor locally, which is not easy to cause the degradation factor to scatter and pollute.
[0015] As another improvement of the present application, the production process of the degradation skeleton mainly includes the following steps:
[0016] S1, skeleton unit preparation, hollow fibers are prepared by using a spinning and drawing process;
[0017] S2, the degradation liquid is infiltrated, the hollow fiber prepared in step S1 is put into the infiltration device, so that the inner and outer walls of the hollow fiber are completely infiltrated by the degradation culture solution;
[0018] S3, low temperature drying, low temperature drying is carried out in the infiltration device, so that the liquid part in the degradation culture solution is volatilized, and the degradation factor is formed on the surface and the inner wall of the hollow fiber, and the degradation factor on the surface of the hollow fiber is cleaned;
[0019] S4, end sealing, the end of the hollow fiber is sealed by using a hot press, so that the hollow area of the hollow fiber forms a sealed area, so that the degradation factor enters the dormant state, and the degradation factor at the end is inactivated by the hot press, so that the degradation skeleton is not easily contaminated by the degradation factor before use.
[0020] As another improvement of the present application, the hollow diameter of the hollow fiber is less than one tenth of the diameter of the hollow fiber, which reduces the influence of the hollow structure of the hollow fiber on its own structural strength, so that the degradation factor is not easy to scatter and cause pollution.
[0021] As another improvement of the present application, the infiltration device in step S2 includes a matched infiltration pool and a sealing cover, the infiltration pool and the sealing cover form a sealed structure, the infiltration pool is filled with the degradation culture solution, the degradation skeleton is submerged in the degradation culture solution, the side wall of the infiltration pool is drilled with a matched gas outlet channel and a gas inlet channel, the gas outlet channel is connected with a low pressure pump, the gas inlet channel is fixedly connected with a matched electromagnetic valve, during the infiltration of the degradation liquid, the electromagnetic valve is in a sealed state, a low pressure environment is formed in the infiltration pool by using the low pressure pump connected with the gas outlet channel, so that the hollow position of the hollow fiber is not easy to remain air, and the degradation culture solution is easy to be completely infiltrated, and during the low temperature drying stage, the electromagnetic valve is in an open state, so that the surface of the degradation culture solution can form a flowing gas flow, and the volatilization speed of the liquid component of the degradation culture solution is accelerated.
[0022] In summary, the mask base cloth of the present application is a combination of multiple layers of different materials, and the material of the degradation skeleton is infiltrated and treated to fix the degradation factor on the degradation skeleton. When the degradation skeleton is reinforced by the water jet non-woven technology, the water needle will impact the hollow fiber, causing the hollow fiber to bend and deform. In the position where the local thickness of the hollow fiber is high, the deformable range is also small. With the continuous flushing of the water needle, impact fatigue will be formed in the hollow fiber. During the subsequent use of the user, the base cloth layer and the degradation skeleton will be stretched to a certain extent, making the hollow fiber prone to break at the position where the impact fatigue is concentrated. The essence liquid enters the hollow fiber and awakens the degradation factor. After the user finishes using the mask and discards it, the degradation factor continues to reproduce and forms dominant species, consumes the remaining essence liquid, and degrades the base cloth layer. After the degradation factor is completely degraded by the purification liquid and the base cloth layer, it will quickly die out due to the lack of nutrients, and is not easy to cause bacterial breeding and pollute the environment. BRIEF DESCRIPTION OF DRAWINGS
[0023] Figure 1 The main flow chart of the mask base cloth production process of the first embodiment of the present application;
[0024] Figure 2 The schematic diagram of the mask base cloth integration and reinforcement process of the first embodiment of the present application;
[0025] Figure 3 The main structure explosion diagram of the mask base cloth of the first embodiment of the present application;
[0026] Figure 4 The structure schematic diagram of the mask base cloth of the first embodiment of the present application;
[0027] Figure 5 The side view of the skeleton unit of the first embodiment of the present application;
[0028] Figure 6 The side view of the skeleton unit of the first embodiment of the present application;
[0029] Figure 7 The main flow chart of the degradation skeleton production process of the second embodiment of the present application;
[0030] Figure 8 The schematic diagram of the degradation liquid infiltration and low-temperature drying process in the degradation skeleton production process of the second embodiment of the present application;
[0031] Figure 9 The structure schematic diagram of the degradation liquid infiltration and low-temperature drying device of the degradation skeleton of the second embodiment of the present application;
[0032] Figure 10The structural change of the degradation framework in the cutting and forming process is shown in the second embodiment of the present application.
[0033] Explanation of the reference numerals in the drawing:
[0034] 1 base cloth layer, 2 degradation framework, 201 hollow fiber, 202 degradation factor, 3 infiltration pool, 4 sealing cover, 5 gas outlet channel, 6 gas inlet channel, 7 electromagnetic valve, 8 degradation culture solution. DETAILED DESCRIPTION
[0035] The two embodiments of the present application will be described in detail below with reference to the accompanying drawings.
[0036] First embodiment
[0037] Figure 1 The production process of the mask base cloth is shown, which mainly includes the following steps:
[0038] S1, base cloth weaving and degradation framework preparation, the PLA / PVA polymer is subjected to screw extrusion, melt filtration, high-speed airflow drafting and hot rolling steps to obtain the base cloth layer 1, and the degradation framework 2 is woven into a net shape by a plurality of hollow fibers 201;
[0039] S2, integration and reinforcement, one layer of base cloth layer 1 is attached to the upper and lower ends of the degradation framework 2, and after initial fixation by elongation rolling, reinforcement is performed by using spunlace non-woven technology to obtain a mask base cloth combined by the base cloth layer 1 and the degradation framework 2;
[0040] S3, drying and setting, the mask base cloth obtained in the integration and reinforcement of step S2 is dried and set by using a hot press roller;
[0041] S4, cutting and forming, the mask base cloth subjected to drying and setting is cut by using a hot press knife to obtain a set mask base cloth.
[0042] Please refer to Figures 2-6The mask base cloth includes a pair of base cloth layers 1, and a degradation framework 2 matched with itself is clamped between the two base cloth layers 1, the degradation framework 2 is fixedly connected with the two base cloth layers 1, and the two base cloth layers 1 and the degradation framework 2 are preliminarily fixed through drawing and rolling and then are fixed through the spunlace non-woven technology, the degradation framework 2 is woven by a plurality of hollow fibers 201, the hollow fiber 201 is of a hollow structure, and a degradation factor 202 is fixedly connected to the inner wall of the hollow fiber 201, when the degradation framework 2 is reinforced through the spunlace non-woven technology, the water needle will impact the hollow fiber 201, causing the hollow fiber 201 to bend and deform, the deformable range of the hollow fiber 201 is small at the position where the local thickness of the hollow fiber 201 is high, and with the continuous washing of the water needle, impact fatigue will be formed in the hollow fiber 201, in the subsequent use process of the user, the base cloth layer 1 and the degradation framework 2 will be stretched to a certain extent, the hollow fiber 201 is prone to breakage at the position where the impact fatigue is concentrated, the essence liquid enters the hollow fiber 201 and awakens the degradation factor 202, after the user finishes using the mask and discards it, the degradation factor 202 continues to reproduce and forms dominant bacterial species, consumes the residual essence liquid, and degrades the base cloth layer 1, so that bacteria are not easy to breed and the environment is not easy to be polluted.
[0043] The main components of the essence liquid include water, glycerol, hyaluronic acid and propylene glycol, the main nutritional component is hyaluronic acid, and on the basis of the hyaluronic acid, streptococcus and pseudomonas strains can be directionally cultured to realize the awakening, reproduction and consumption work declared in the application.
[0044] Please refer to Figure 10 In the cutting and forming in step S4, the cutting of the mask base cloth utilizes hot-press cutting, on the one hand, the hot-press cutting can locally melt the hollow fiber 201, and the melted hollow fiber 201 can cover the cutting position, so that the hollow fiber 201 maintains a closed environment, on the other hand, the high temperature of the hot-press cutter can locally inactivate the degradation factor 202, so that the degradation factor 202 is not easy to scatter and pollute.
[0045] The control fiber is made of an amorphous elastic material, and is usually made of a high molecular material such as polyester and polyamide, and will locally melt under the action of the hot-press cutter.
[0046] In particular, in the present scheme, the degradation factor 202 is made of a material that can effectively degrade the oil and sundries adhered to the skin surface after the mask is applied to the skin, and the hollow fiber 201 is made of a non-polluting material, and the specific selection of the materials of the hollow fiber 201 and the degradation factor 202 is a known technology of those skilled in the art, which is not disclosed in detail in the present application, and those skilled in the art can reasonably select according to the actual situation.
[0047] Second embodiment
[0048] Figure 7 The production process of the degradation skeleton is shown, mainly including the following steps:
[0049] S1, skeleton unit preparation, using a spinning and drawing process to obtain a hollow hollow fiber 201, and the hollow diameter of the hollow fiber 201 is one tenth of the diameter of the hollow fiber 201, reducing the influence of the hollow structure of the hollow fiber 201 on its own structural strength, so that the degradation factor 202 is not easy to scatter and cause pollution;
[0050] S2, degradation liquid infiltration, the hollow fiber 201 prepared in step S1 is put into the infiltration device, so that the inner and outer walls of the hollow fiber 201 are completely infiltrated by the degradation culture solution 8;
[0051] S3, low-temperature drying, low-temperature drying is carried out in the infiltration device, so that the liquid part of the degradation culture solution 8 volatilizes, and the degradation factor 202 is formed on the surface and inner wall of the hollow fiber 201, and the degradation factor 202 on the surface of the hollow fiber 201 is cleaned;
[0052] S4, end sealing, using a hot press to seal the end of the hollow fiber 201, so that the hollow area of the hollow fiber 201 forms a sealed area, so that the degradation factor 202 enters the dormant state, and the degradation factor 202 at the end is inactivated by the hot press, so that the degradation skeleton 2 is not easy to be polluted by the degradation factor 202 before use.
[0053] Please refer to Figures 8-9 , the infiltration device in step S2 includes a matching infiltration pool 3 and a sealing cover 4, the infiltration pool 3 and the sealing cover 4 form a sealed structure, the infiltration pool 3 is filled with degradation culture solution 8, the degradation skeleton 2 is submerged in the degradation culture solution 8, the side wall of the infiltration pool 3 is drilled with a matching gas outlet channel 5 and a gas inlet channel 6, the gas outlet channel 5 is connected with a low-pressure pump, the gas inlet channel 6 is fixedly connected with a matching electromagnetic valve 7, during the degradation liquid infiltration process, the electromagnetic valve 7 is in a sealed state, using the low-pressure pump connected with the gas outlet channel 5 to form a low-pressure environment in the infiltration pool 3, so that the hollow position of the hollow fiber 201 is not easy to remain air, and the degradation culture solution 8 is easy to be completely infiltrated, and during the low-temperature drying stage, the electromagnetic valve 7 is in an open state, so that the surface of the degradation culture solution 8 can form a flowing gas flow, and the volatilization speed of the liquid component of the degradation culture solution 8 is accelerated.
[0054] In combination with the current actual demand, the above-mentioned embodiments adopted by the application do not limit the protection scope, various changes made within the knowledge range of those skilled in the art without departing from the concept of the present application still fall within the protection scope of the present application.
Claims
1. A production process for an environmentally friendly facial mask base fabric, characterized in that: The main steps include: S1. Base fabric weaving and degradation skeleton preparation: PLA / PVA polymer is processed by screw extrusion, melt filtration, high-speed airflow stretching and hot rolling to obtain the base fabric layer (1), while the degradation skeleton (2) is obtained by weaving multiple hollow fibers (201) into a mesh. S2. Integration and reinforcement: A base fabric layer (1) is attached to both the upper and lower ends of the degradable skeleton (2). After initial fixation by rolling, it is reinforced by spunlace nonwoven technology to obtain a firmly bonded mask base fabric composed of the base fabric layer (1) and the degradable skeleton (2). S3. Drying and shaping: The mask base fabric obtained in step S2 is dried and shaped using hot rollers. S4. Cutting and shaping: Use a hot press knife to cut the dried and shaped mask base fabric to obtain the shaped mask base fabric. The production process of the degradable skeleton mainly includes the following steps: s1. Preparation of skeleton unit: Hollow fibers are prepared by spin-stretching process (201). s2, Degradation solution immersion: The hollow fiber (201) obtained in step S1 is put into the immersion device so that the inner and outer walls of the hollow fiber (201) are completely immersed in the degradation culture solution (8). s3. Low-temperature drying: Low-temperature drying is carried out in the immersion device to evaporate the liquid portion in the degradation culture solution (8) and form degradation factors (202) on the surface and inner wall of the hollow fiber (201). The degradation factors (202) on the surface of the hollow fiber (201) are then cleaned. s4. End sealing: The ends of the hollow fiber (201) are sealed using a hot press, so that the hollow area of the hollow fiber (201) forms a sealed area, causing the degradation factor (202) to enter a dormant state, and the degradation factor (202) at the end is deactivated by the hot press.
2. The environmentally friendly mask base fabric production process according to claim 1, characterized in that: In step S4, the mask base fabric is cut using hot pressing.
3. The environmentally friendly facial mask base fabric production process according to claim 1, characterized in that: The hollow diameter of the hollow fiber (201) is less than one-tenth of the diameter of the hollow fiber (201).
4. The environmentally friendly facial mask base fabric production process according to claim 1, characterized in that: In step S2, the immersion device includes a matching immersion pool (3) and a sealing cover (4). The immersion pool (3) and the sealing cover (4) form a sealing structure. The immersion pool (3) is filled with degradation culture medium (8). The degradation skeleton (2) is submerged in the degradation culture medium (8). The side wall of the immersion pool (3) is chiseled with matching air outlet channel (5) and air inlet channel (6). The air outlet channel (5) is connected to a low-pressure pump. The air inlet channel (6) is fixedly connected with a matching solenoid valve (7).
Citation Information
Patent Citations
A method for preparing a biodegradable ultrafine facial mask base fabric
CN113279145B
Plant fiber non-woven facial mask base cloth which is environmentally friendly and plant fiber facial mask
CN108754854A
Degradable strippable and super absorbent wet-laid spunlace non-woven facial mask substrate
CN108950858A