A cleaning device for pipeline blockage caused by chemical vapor deposition process

Abstract

The present invention provides a cleaning device for pipeline blockage caused by chemical vapor deposition process, and relates to the field of deposition equipment cleaning. The cleaning device for cleaning pipeline blockage caused by chemical vapor deposition process comprises a remote plasma generator, a conduit and a cartridge rack: the outlet end of the remote plasma generator is connected to the pipeline of the vapor deposition equipment through a pipeline; one end of the cartridge rack is connected to the conduit, and the end of the conduit away from the cartridge rack is passed through the gas line pipe to pass the output gas of the remote plasma generator, and the other end of the cartridge rack is connected to a silicone head, and the outer circumference of the cartridge rack is rotatably connected to a cleaning component, and both ends of the cartridge rack are provided with a moving component, and the inner wall of the cartridge rack is provided with a power component, and the power component is used to drive the moving component and the cleaning component, and the silicone head is provided with a guide control component. By combining reaction cleaning and physical cleaning, cleaning is performed simultaneously to achieve effective cleaning of the pipeline of the vapor deposition equipment.

Description

Technical Field

[0001] The invention relates to the technical field of cleaning deposition equipment, in particular to a cleaning device for pipeline blockage caused by a chemical vapor deposition process. Background Art

[0002] Chemical vapor deposition equipment is widely used in various industries, and is commonly used in the coating process of semiconductor wafers, liquid crystal panels, solar photovoltaics, medical fields and other products. The chemical vapor deposition equipment (CVD) currently used in the semiconductor industry has a chamber in which objects that undergo chemical reactions on the surface of the wafer will be deposited on the surface of the wafer during the process, forming a specific layer of film. At present, the deposits deposited on the inner wall are mainly compounds with silicon elements, such as silicon oxide SiO2, silicon oxynitride SiON, silicon nitride Si 3N4, etc. The reaction equation for the chemical reaction of SiO2 is: 3NF3+SiQ2=SiF4+3NO2.

[0003] When the main chamber is continuously processing, due to the gas state characteristics of the reactants, the gas cannot be completely directed to be 100% deposited on the wafer surface. The continuously generated auxiliary reactants accumulate on the side walls of the chamber and the inside of the pipeline. Over time, it will cause blockage of the chamber and the pipeline.

[0004] Patent application number CN202111105692.2 discloses a cleaning device for chemical vapor deposition equipment. This patent mainly uses a mechanism to drive a cleaning brush and an adsorption device to brush and clean the deposits inside the vapor deposition equipment, and does not have the function of cleaning the deposits in the pipeline of the vapor deposition equipment. In the prior art, the reactants of the chemical reaction outside the wafer will be sucked away by the vacuum airflow through the pipeline under the cavity, but some of them will adhere to the cavity and the walls of the pipeline below. Over time, the pipeline will be blocked, and the cavity and pipeline need to be opened manually for cleaning. At the same time, the pipeline of the current vapor deposition equipment is bent, and the existing cleaning is purely mechanical. This kind of manual work wastes time and affects the utilization rate of the equipment, and increases the generation of dust and particles in the cavity. Frequent opening of the cavity is prone to leakage of toxic and harmful gases, which poses a safety hazard. Summary of the invention

[0005] In view of the deficiencies of the prior art, the present invention provides a cleaning device for pipeline blockage caused by a chemical vapor deposition process, which solves the problem that the existing vapor deposition equipment cannot perform various air intake pipelines well.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: A cleaning device for pipeline blockage caused by chemical vapor deposition process, comprising a remote plasma generator, a conduit and a cartridge rack:

[0007] The outlet end of the remote plasma generator is connected to the pipeline of the vapor deposition equipment through a pipeline, a connecting branch pipe is arranged on the outlet end pipeline of the remote plasma generator, the cartridge rack and the conduit are both arranged in the connecting branch pipe, and the inlet end of the remote plasma generator is connected to three air inlet pipes through a tee pipe;

[0008] One end of the cartridge rack is connected to a conduit, and the end of the conduit away from the cartridge rack is fed with the output gas of a remote plasma generator through an air pipe, and the other end of the cartridge rack is connected to a silicone head, a cleaning pipe is passed through the cartridge rack and the cleaning pipe is passed through the conduit, and a cleaning assembly is rotatably connected to the outer periphery of the cartridge rack, a moving assembly is provided at both ends of the cartridge rack, a power assembly is provided on the inner wall of the cartridge rack, and the power assembly is used to drive the moving assembly and the cleaning assembly, and a guide control assembly is provided in the silicone head, and the guide control assembly is used for steering the cleaning device in the pipeline;

[0009] The cleaning assembly includes a rotating sleeve, a limiting ring, ventilation holes and bristles, the bristles are evenly distributed on the outer periphery of the rotating sleeve, the limiting rings are installed at both ends of the rotating sleeve, the rotating sleeve is rotatably connected to the outer periphery of the cartridge frame, the limiting ring is rotatably connected to the inner side wall of the cartridge frame, the ventilation holes are evenly distributed on the rotating sleeve and the cartridge frame inside the rotating sleeve, and the ventilation holes on the rotating sleeve correspond to the ventilation holes on the cartridge frame one by one;

[0010] The moving components include a first flexible shaft and a driving rod, the two ends of the first flexible shaft are fixedly connected to the two ends of the driving rod, the first flexible shaft is rotatably arranged in the side walls at the two ends of the cylinder frame, rubber wheels are evenly distributed on the first flexible shaft, the rubber wheels all penetrate the cylinder frame, the driving rod is rotatably connected in the cylinder frame, and the cylinder frame is provided with a through groove at the driving rod.

[0011] Preferably, the cleaning pipe fitting includes a main pipe and two groups of branch pipes arranged in a circumferential array outside the main pipe, one group of branch pipes penetrates the side wall of the cartridge rack close to one end of the catheter, and the other group of branch pipes penetrates the side wall of the silicone head close to one end of the cartridge rack, and the end of the main pipe away from the cartridge rack is connected to a negative pressure pump.

[0012] Preferably, the power assembly includes a first worm wheel, a first worm, a first motor and a second flexible shaft, the first worm wheel is fixedly connected to the middle part of the driving rod and the first worm wheel rotates in the through slot where the driving rod is located, the first worm wheel and the first worm are meshingly connected, the second flexible shaft is rotatably connected to the inner wall of the drum frame through a bearing seat, both ends of the second flexible shaft are fixedly connected with gears, the middle part of the side of the gear away from the second flexible shaft is fixedly connected to the first worm, the first worm is rotatably set on the inner wall of the drum frame through a bearing seat, one end of the first worm away from the gear is fixedly connected to the driving end of the first motor, and the first motor is fixedly connected to the inner wall of the drum frame.

[0013] Preferably, the gears are meshedly connected with an internal gear ring, the internal gear ring is installed on the inner circumference of the limiting ring, and the cylinder frame is provided with a through groove at the meshing connection between the gears and the internal gear ring.

[0014] Preferably, the guide control assembly includes a mounting plate, the mounting plate is fixedly connected to the inside of one end of the cylinder frame close to the silicone head, a reversing power mechanism is arranged on the side of the mounting plate away from the cylinder frame, the reversing power mechanism includes a linear motor, the driving end of the linear motor is fixedly connected to a first connecting rod, the end of the first connecting rod away from the linear motor is rotatably connected to a second connecting rod through a torsion spring, the second connecting rod is V-shaped, the end of the second connecting rod away from the first connecting rod is fixedly connected to an electromagnet, the end of the silicone head away from the cylinder frame is semicircular and a guide seat is arranged inside the semicircle, a plurality of iron sheets are circumferentially distributed on the inner edge of the guide seat, and the plurality of iron sheets correspond to the circumferential outer side of the electromagnet.

[0015] Preferably, the reversing power mechanism also includes a limiting groove installed on one side of the mounting plate, the bottom of the linear motor is rotatably connected in the limiting groove, the outer periphery of the linear motor close to the limiting groove is fixedly connected to a second worm gear, the second worm gear is meshingly connected to a second worm, the second worm is rotatably connected to the mounting plate, one end of the second worm is fixedly connected to a second motor, and the second motor is mounted on the mounting plate.

[0016] Preferably, a limiting portion is provided at one end of the first connecting rod close to the second connecting rod, and the limiting portion is provided on one side of the second connecting rod.

[0017] Preferably, the branch pipes all pass through the mounting plate.

[0018] The present invention provides a cleaning device for pipeline blockage caused by chemical vapor deposition process. It has the following beneficial effects:

[0019] 1. In the present invention, three gases are connected to the air inlet pipe, namely, argon gas, nitrogen trifluoride gas, and oxygen. The argon gas is then introduced into the remote plasma generator for activation to form argon particle ions. After successful activation, nitrogen trifluoride and oxygen are simultaneously introduced into the remote plasma generator for gas ionization reaction. The product of gas ionization can react to clean the attachments deposited on the inner wall of the gas deposition equipment and detach the attachments. As the negative pressure airflow is drawn away, the cleaning device is started while the chemical reaction is taking place. The first motor, the first worm, the first worm gear, and the first worm gear are started. A soft shaft cooperates to realize the rotation of the rubber wheel, so that the cleaning device moves in the pipeline of the deposition equipment. While moving, the catheter passes the reaction gas into the bristle side through the ventilation hole. The gear realizes the rotating sleeve through the internal gear ring to drive the bristles to brush the reactants deposited in the pipeline and the reactants not sucked away by the negative pressure airflow. While the rotating sleeve drives the bristles to brush the pipeline, the main pipeline generates a negative pressure airflow through the branch pipeline combined with the negative pressure pump to completely absorb the reactants brushed up by the bristles, so that the pipeline of the vapor deposition equipment can be fully cleaned without opening it. The reaction is carried out simultaneously in a physical way, and the cleaning is thorough, efficient and safe.

[0020] 2. In the present invention, when the cleaning device moves in the pipeline of the deposition equipment, the linear motor adjusts the direction of the first connecting rod and the second connecting rod so that the electromagnet corresponds to the corresponding iron sheet. After the electromagnet is energized, it magnetically attracts the iron sheet. At this time, the second connecting rod rotates on the first connecting rod, and the linear motor continues to extend. Then, the second connecting rod can push the guide seat through the electromagnet and the iron sheet. The guide seat is forced to push the silicone head to the pipeline in the corresponding direction. Pipelines of various shapes of vapor deposition equipment can be closed and cleaned to avoid gas leakage, which is safe and efficient. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 A perspective view of the present invention;

[0022] Figure 2 It is a cross-sectional structural diagram of the present invention;

[0023] Figure 3 A plan view of the power assembly of the present invention;

[0024] Figure 4 is a side view of a moving assembly of the present invention;

[0025] Figure 5 A plan view of the cleaning pipe of the present invention;

[0026] Figure 6 is a three-dimensional diagram of the cleaning pipe of the present invention;

[0027] Figure 7 for Figure 1 Enlarged view of point A in the middle;

[0028] Figure 8 for Figure 2 Enlarged view of point B in the middle;

[0029] Fig. 9 A plan view of the power assembly of the present invention;

[0030] Fig.10 is a front cross-sectional view of the guide control assembly of the present invention;

[0031] Fig.11 is a side view of the guide control assembly of the present invention;

[0032] Fig.12 is a side view of a second connecting rod of the present invention;

[0033] Fig.13 This is a diagram of the cleaning system of the present invention.

[0034] Among them, 1. catheter; 2. cylinder rack; 3. cleaning pipe fittings; 4. main pipeline; 5. branch pipeline; 6. silicone head; 7. cleaning component; 8. moving component; 9. power component; 10. rotating sleeve; 11. limiting ring; 12. bristles; 13. ventilation hole; 14. first flexible shaft; 15. rubber wheel; 16. driving rod; 17. first worm gear; 18. first worm; 19. first motor; 20. second flexible shaft; 21. gear Wheel; 22, inner gear ring; 23, mounting plate; 24, guide control assembly; 25, reversing power mechanism; 26, linear motor; 27, first connecting rod; 28, second connecting rod; 29, electromagnet; 30, guide seat; 31, iron sheet; 32, limit groove; 33, second worm gear; 34, second worm; 35, second motor; 36, limit part; 37, remote plasma generator; 38, connecting branch pipe; 39, intake pipe. DETAILED DESCRIPTION

[0035] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0036] Example:

[0037] like Figure 1-13 As shown, an embodiment of the present invention provides a cleaning device for pipeline blockage caused by a chemical vapor deposition process, comprising a remote plasma generator 37, a conduit 1 and a cartridge rack 2:

[0038] The outlet end of the remote plasma generator 37 is connected to the pipeline of the vapor deposition equipment through a pipeline. A connecting branch pipe 38 is arranged on the outlet pipeline of the remote plasma generator 37. The cartridge rack 2 and the guide tube 1 are both arranged in the connecting branch pipe 38. The inlet end of the remote plasma generator 37 is connected to three air inlet pipes 39 through a three-way pipe. The three air inlet pipes 39 are respectively: one gas pipeline for argon, one gas pipeline for nitrogen trifluoride, and one gas pipeline for oxygen. When actually using it, the straight pipeline below the CVD chamber is replaced with a three-way pipeline, and the pipeline of our system is connected. When setting special process requirements on the CVD equipment, our system will introduce one or more special mixed gases, ionize the gas, form gas ions, introduce them into the pipeline, react chemically with the attachments around the pipeline, and absorb the products after the reaction through vacuum airflow. In this way, after the system has been running for a period of time, the problem of pipeline blockage can be solved;

[0039] One end of the cartridge rack 2 is connected to the conduit 1, and the end of the conduit 1 away from the cartridge rack 2 is fed with the output gas of the remote plasma generator 37 through the gas line pipe, so as to realize cleaning and reaction at the same time and thoroughly clean the pipeline. The other end of the cartridge rack 2 is connected to a silicone head 6, and the silicone head 6 is combined with a reversing power mechanism 25 to guide the cartridge rack 2 to the pipeline that needs to be cleaned. A cleaning pipe 3 runs through the cartridge rack 2 and the cleaning pipe 3 runs through the conduit 1. The outer periphery of the cartridge rack 2 is rotatably connected to a cleaning component 7. Moving components 8 are provided at both ends of the cartridge rack 2, and a power component 9 is provided on the inner wall of the cartridge rack 2. The power component 9 is used to drive the moving component 8 and cleaning component 7, a guide control component 24 is arranged in the silicone head 6, and the guide control component 24 is used for steering the cleaning device in the pipeline. The cartridge rack 2 enters the pipeline of the vapor deposition equipment through the connecting branch pipe 38, and the power component 9 drives the moving component 8 to make the cartridge rack 2 drive the cleaning component 7 to clean the pipeline of the vapor deposition equipment. When cleaning, the guide control component 24 can adjust the direction of the cleaning device to adapt to pipelines of different shapes. The cartridge rack 2 can set the length according to the curvature of the pipeline to be cleaned, and the silicone head 6 also needs to set the length according to the actual size, so that it can flexibly adapt to pipelines of different curvatures.

[0040] The power assembly 9 includes a first worm gear 17, a first worm 18, a first motor 19 and a second flexible shaft 20. The first worm gear 17 is fixedly connected to the middle part of the driving rod 16 and the first worm gear 17 rotates in the through groove where the driving rod 16 is located. The first worm gear 17 and the first worm 18 are meshed and connected. The second flexible shaft 20 is rotatably connected to the inner wall of the drum frame 2 through a bearing seat. Both ends of the second flexible shaft 20 are fixedly connected with gears 21. The middle part of the side of the gear 21 away from the second flexible shaft 20 is fixedly connected to the first worm 18. The first worm 18 is rotatably set on the inner wall of the drum frame 2 through a bearing seat. One end of the first worm 18 on one side away from the gear 21 is fixedly connected to the driving end of the first motor 19, and the first motor 19 is fixedly connected to the inner wall of the drum frame 2. The gears 21 are all meshedly connected with the inner gear ring 22, and the inner gear ring 22 is installed on the inner circumference of the limit ring 11. The cylinder frame 2 is provided with a through groove at the meshing connection between the gears 21 and the inner gear ring 22. The first motor 19 can drive the rotating sleeve 10 and the rubber wheel 15 at the same time, so that the pipeline can be cleaned while the cleaning component 7 moves. Moreover, corresponding ventilation holes 13 are provided on the rotating sleeve 10 and the cylinder frame 2. The ventilation holes 13 can fully spray the reaction gas introduced by the catheter 1 to the inner wall of the pipeline of the vapor deposition equipment, so as to realize efficient reaction cleaning of the vapor deposition equipment. Physical cleaning and reaction cleaning are carried out simultaneously, with high cleaning degree and good efficiency. The cleaning component 7 includes a rotating sleeve 10, a limit Ring 11, ventilation holes 13 and bristles 12, the bristles 12 are evenly distributed on the outer periphery of the rotating sleeve 10, the limiting ring 11 is installed at both ends of the rotating sleeve 10, the limiting ring 11 makes the rotating sleeve 10 rotate outside the drum frame 2 and keeps the rotating sleeve 10 stable, the rotating sleeve 10 is rotatably connected to the outer periphery of the drum frame 2, the limiting ring 11 is rotatably connected to the inner side wall of the drum frame 2, the ventilation holes 13 are evenly distributed on the rotating sleeve 10 and the drum frame 2 inside the rotating sleeve 10, the ventilation holes 13 on the rotating sleeve 10 and the ventilation holes 13 on the drum frame 2 correspond one to one, cleaning and reacting at the same time, improving the cleaning effect of the pipeline, and at the same time ensuring that the equipment does not need to be opened for cleaning, ensuring that personnel are not harmed by harmful gases;

[0041] The moving components 8 include a first flexible shaft 14 and a driving rod 16. The two ends of the first flexible shaft 14 are fixedly connected to the two ends of the driving rod 16. The first flexible shaft 14 is rotatably arranged in the side walls at the two ends of the cylinder frame 2. Rubber wheels 15 are evenly distributed on the first flexible shaft 14. The rubber wheels 15 all penetrate the cylinder frame 2. The driving rod 16 is rotatably connected in the cylinder frame 2, and the cylinder frame 2 is provided with a through groove at the driving rod 16. The moving components 8 can drive the cylinder frame 2 to move in the pipeline. The driving rod 16 is stably rotatably connected in the cylinder frame 2, and then the driving rod 16 rotates to realize the rotation of the first flexible shaft 14 and drive the rubber wheel 15. The rubber wheel 15 is made of rubber material and generates friction with the inner wall of the pipeline. At the same time, it can also adapt to the cleaning of pipelines with different inner diameters, and can ensure that the cylinder frame 2 moves in the pipeline.

[0042] The cleaning pipe fitting 3 includes a main pipe 4 and two groups of branch pipes 5 arranged circumferentially on the outside of the main pipe 4. One group of branch pipes 5 penetrates the side wall of the cartridge rack 2 close to the end of the catheter 1, and the other group of branch pipes 5 penetrates the side wall of the silicone head 6 close to the end of the cartridge rack 2. The branch pipes 5 all penetrate the mounting plate 23. A negative pressure pump is connected to the end of the main pipe 4 away from the cartridge rack 2. When the bristles 12 wipe off the reactants in the pipeline, the negative pressure pump absorbs the reactants on the inner wall of the pipeline through the main pipe 4 and the branch pipes 5, so that the cleaning effect is good and the automation is high.

[0043] The guide control assembly 24 includes a mounting plate 23, which is fixedly connected to the inside of the cylinder frame 2 near the end of the silicone head 6. The silicone head 6 is made of soft material, and rubber material is also acceptable. A reversing power mechanism 25 is arranged on the side of the mounting plate 23 away from the cylinder frame 2. The reversing power mechanism 25 includes a linear motor 26. The driving end of the linear motor 26 is fixedly connected to a first connecting rod 27. The end of the first connecting rod 27 away from the linear motor 26 is rotatably connected to a second connecting rod 28 through a torsion spring. The second connecting rod 28 is V-shaped. The second connecting rod 28 can push the linear motor 26 in a straight line. By way of angle conversion, combined with an electromagnet 29 and an iron The sheet 31 makes the silicone head 6 bend to one side, so that the silicone head 6 can be bent into the pipe that it wants to enter. The end of the second connecting rod 28 away from the first connecting rod 27 is fixedly connected to the electromagnet 29. The end of the silicone head 6 away from the cylinder frame 2 is semicircular and a guide seat 30 is arranged inside the semicircle. A plurality of iron sheets 31 are distributed circumferentially on the inner edge of the guide seat 30, and the plurality of iron sheets 31 all correspond to the circumferential outer side of the electromagnet 29. The linear motor 26 can set the driving distance, so that the silicone head 6 can be pushed in different directions for different pipe curvatures. Moreover, the iron sheets 31 are arranged circumferentially in an array, and the purpose is to correspond one-to-one to the unique electromagnet 29. The reversing power mechanism 25 also includes a limit slot 32 installed on one side of the mounting plate 23. The bottom of the linear motor 26 is rotatably connected in the limit slot 32. The outer periphery of the linear motor 26 near the limit slot 32 is fixedly connected with a second worm gear 33. The second worm gear 33 is meshingly connected with a second worm 34. The second worm 34 is rotatably connected to the mounting plate 23. One end of the second worm 34 is fixedly connected with a second motor 35. The second motor 35 is installed on the mounting plate 23. The second motor 35 can be a servo motor. With the array arrangement of the iron sheet 31, the second connecting rod 28 can be driven to different angles, so that the second connecting rod 28 can be effectively adjusted. A limit portion 36 is provided at one end of the first connecting rod 27 near the second connecting rod 28. The limit portion 36 is arranged on one side of the second connecting rod 28. The limit portion 36 allows the second connecting rod 28 to rotate in only one direction. With the torsion spring, it is ensured that the second connecting rod 28 can effectively push its corresponding iron sheet 31 to achieve unidirectional bending of the silicone head 6.

[0044] like Figure 1-13As shown, an embodiment of the present invention provides a method for using a cleaning device for pipeline blockage caused by a chemical vapor deposition process, comprising the following steps:

[0045] Reaction cleaning: three gases are connected to the air inlet pipe 39, namely, argon gas, nitrogen trifluoride gas, and oxygen gas. The argon gas is then introduced into the remote plasma generator for activation to form argon particle ions. After successful activation, nitrogen trifluoride and oxygen are simultaneously introduced into the remote plasma generator for gas ionization reaction. The ionized gases of various ions enter the pipeline where the deposits need to be cleaned, and react chemically with the attachments on the inner wall during the gas flow. The reaction products continue to flow in the pipeline. New ionized gases are then continuously introduced into the deposition equipment pipeline, and continuously react chemically with the scale deposited on the inner wall to generate a new non-deposited product, which is then pumped away with the negative pressure airflow.

[0046] Secondary cleaning: while the chemical reaction in the deposition equipment pipeline is taking place, the cleaning device in the connecting branch pipe 38 is started, the first motor 19 drives the first worm wheel 17 through the first worm 18 to make the driving rod 16 drive the first flexible shaft 14 to rotate, the first flexible shaft 14 realizes the rotation of the rubber wheel 15, so that the cleaning device moves in the deposition equipment pipeline, while moving, the first motor 19 realizes the synchronous rotation of the gear 21 through the first worm 18 and the second flexible shaft 20, the gear 21 realizes the rotating sleeve 10 driving the bristles 12 to brush the reactants deposited in the pipeline and the reactants not drawn away by the negative pressure airflow through the inner gear ring 22, the conduit 1 introduces the reaction gas to the rotating sleeve 10 and the cartridge rack 2, so as to ensure that the bristles 12 react while brushing the reactants, so as to thoroughly clean the deposits in the pipeline;

[0047] Cleaning and adsorption: While the rotating sleeve 10 drives the bristles 12 to brush the pipeline, the main pipeline 4 generates a negative pressure airflow through the branch pipeline 5 in combination with the negative pressure pump, and completely absorbs the reactants brushed up by the bristles 12 to clean the pipeline of the deposition equipment. Through the operation of chemical cleaning combined with physical cleaning, combined with cleaning and adsorption, the pipeline is closed and cleaned once, effectively avoiding the blockage of the pipeline of the vapor deposition equipment;

[0048] Flexible use: When the cleaning device moves in the pipeline of the deposition equipment, the second motor 35 drives the second worm gear 33 to drive the linear motor 26 to rotate through the second worm 34. The linear motor 26 adjusts the direction of the first connecting rod 27 and the second connecting rod 28 so that the electromagnet 29 corresponds to the corresponding iron sheet 31. After the electromagnet 29 is energized, it magnetically adsorbs the iron sheet 31. At this time, the second connecting rod 28 rotates on the first connecting rod 27, and the linear motor 26 continues to extend. Then, the second connecting rod 28 can push the guide seat 30 through the electromagnet 29 and the iron sheet 31. The guide seat 30 is subjected to force to push the silicone head 6 to the pipeline in the corresponding direction, so as to clean multiple pipelines.

[0049] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A cleaning device for pipeline blockage caused by chemical vapor deposition process, comprising a remote plasma generator (37), a guide tube (1) and a cartridge holder (2), characterized in that: The outlet end of the remote plasma generator (37) is connected to the pipeline of the vapor deposition equipment through a pipeline, a connecting branch pipe (38) is arranged on the outlet end pipeline of the remote plasma generator (37), the cartridge rack (2) and the guide tube (1) are both arranged in the connecting branch pipe (38), and the inlet end of the remote plasma generator (37) is connected to three air inlet pipes (39) through a three-way pipe; One end of the cartridge rack (2) is connected to the conduit (1), and the end of the conduit (1) away from the cartridge rack (2) is connected to the output gas of the remote plasma generator (37) through the gas line pipe. The other end of the cartridge rack (2) is connected to a silicone head (6). A cleaning pipe (3) runs through the cartridge rack (2) and the cleaning pipe (3) runs through the conduit (1). The outer periphery of the cartridge rack (2) is rotatably connected to a cleaning assembly (7). Both ends of the cartridge rack (2) are provided with a moving assembly (8). The inner wall of the cartridge rack (2) is provided with a power assembly (9), and the power assembly (9) is used to drive the moving assembly (8) and the cleaning assembly (7). A guide control assembly (24) is provided in the silicone head (6), and the guide control assembly (24) is used to turn the cleaning device in the pipeline. The cleaning assembly (7) comprises a rotating sleeve (10), a limiting ring (11), ventilation holes (13) and bristles (12); the bristles (12) are evenly distributed on the outer periphery of the rotating sleeve (10); the limiting ring (11) is installed at both ends of the rotating sleeve (10); the rotating sleeve (10) is rotatably connected to the outer periphery of the cartridge frame (2); the limiting ring (11) is rotatably connected to the inner side wall of the cartridge frame (2); the ventilation holes (13) are evenly distributed on the rotating sleeve (10) and the cartridge frame (2) inside the rotating sleeve (10); the ventilation holes (13) on the rotating sleeve (10) and the ventilation holes (13) on the cartridge frame (2) correspond one to one; The moving assembly (8) comprises a first flexible shaft (14) and a driving rod (16), the two ends of the first flexible shaft (14) are fixedly connected to the two ends of the driving rod (16), the first flexible shaft (14) is rotatably arranged in the side walls at the two ends of the cartridge frame (2), rubber wheels (15) are evenly distributed on the first flexible shaft (14), the rubber wheels (15) all penetrate the cartridge frame (2), the driving rod (16) is rotatably connected in the cartridge frame (2), and the cartridge frame (2) is provided with a through groove at the driving rod (16).

2. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 1, characterized in that: The cleaning pipe fitting (3) comprises a main pipe (4) and two groups of branch pipes (5) arranged in a circumferential array outside the main pipe (4), one group of the branch pipes (5) passing through the side wall of the cartridge holder (2) close to one end of the catheter (1), and the other group of the branch pipes (5) passing through the side wall of the silicone head (6) close to one end of the cartridge holder (2), and the end of the main pipe (4) away from the cartridge holder (2) is connected to a negative pressure pump.

3. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 1, characterized in that: The power assembly (9) comprises a first worm wheel (17), a first worm (18), a first motor (19) and a second flexible shaft (20); the first worm wheel (17) is fixedly connected to the middle part of the driving rod (16) and the first worm wheel (17) rotates in the through slot where the driving rod (16) is located; the first worm wheel (17) and the first worm (18) are meshedly connected; the second flexible shaft (20) is rotatably connected to the inner wall of the drum frame (2) through a bearing seat; both ends of the second flexible shaft (20) are fixedly connected to a gear (21); the middle part of the gear (21) away from the second flexible shaft (20) is fixedly connected to the first worm (18); the first worm (18) is rotatably arranged on the inner wall of the drum frame (2) through a bearing seat; one end of the first worm (18) away from the gear (21) is fixedly connected to the driving end of the first motor (19); and the first motor (19) is fixedly connected to the inner wall of the drum frame (2).

4. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 3, characterized in that: The gears (21) are meshedly connected with an internal gear ring (22), and the internal gear ring (22) is installed on the inner circumference of the limiting ring (11). The cylinder frame (2) is provided with a through groove at the meshing connection between the gears (21) and the internal gear ring (22).

5. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 2, characterized in that: The guide control assembly (24) comprises a mounting plate (23), the mounting plate (23) being fixedly connected to the inside of one end of the cartridge frame (2) close to the silicone head (6), a reversing power mechanism (25) being arranged on the side of the mounting plate (23) away from the cartridge frame (2), the reversing power mechanism (25) comprising a linear motor (26), a driving end of the linear motor (26) being fixedly connected to a first connecting rod (27), the first connecting rod (27) being away from the linear motor (26) One end of the silicone head (6) is rotatably connected to a second connecting rod (28) via a torsion spring, the second connecting rod (28) is V-shaped, one end of the second connecting rod (28) away from the first connecting rod (27) is fixedly connected to an electromagnet (29), the end of the silicone head (6) away from the cartridge frame (2) is semicircular and a guide seat (30) is arranged inside the semicircle, a plurality of iron sheets (31) are circumferentially distributed on the inner edge of the guide seat (30), and the plurality of iron sheets (31) all correspond to the circumferential outer sides of the electromagnet (29).

6. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 5, characterized in that: The reversing power mechanism (25) further comprises a limiting groove (32) mounted on one side of the mounting plate (23); the bottom of the linear motor (26) is rotatably connected in the limiting groove (32); a second worm gear (33) is fixedly connected to the outer periphery of the linear motor (26) near the limiting groove (32); the second worm gear (33) is meshingly connected to a second worm (34); the second worm (34) is rotatably connected to the mounting plate (23); one end of the second worm (34) is fixedly connected to a second motor (35); and the second motor (35) is mounted on the mounting plate (23).

7. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 5, characterized in that: A limiting portion (36) is provided at one end of the first connecting rod (27) close to the second connecting rod (28), and the limiting portion (36) is provided on one side of the second connecting rod (28).

8. The cleaning device for pipeline blockage caused by chemical vapor deposition process according to claim 5, characterized in that: The branch pipes (5) all pass through the mounting plate (23).

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