A photoresist coating device to prevent particle contamination

Abstract

The invention discloses a photoresist coating device for preventing particle pollution, which relates to the technical field of photoresist coating, and comprises a reagent barrel and a protective device, wherein a sealing cover is fixedly installed on the top of the reagent barrel, a pneumatic device is arranged on the circumferential surface of the sealing cover, a rubber plug is arranged on the inner wall of the sealing cover, a fixing hole is opened on the surface of the pneumatic device, a fixing rod is fixedly installed on the surface of the pneumatic device, a fixing plate is fixedly installed on the top of the fixing rod, a glue guide hole is opened on the circumferential surface of the reagent barrel, the movement of the protective rod drives the movement of a hollow block, the movement of the hollow block contacts the inner wall of the protective hole and fixes the protective plate, the protective plate is limited by the hollow block to restore the shielding of the glue guide hole, and the protective plate shields the glue guide hole to prevent particle pollutants from entering the reagent barrel, so as to ensure the purity and stability of the photoresist, thereby ensuring the manufacturing quality and consistency of the product.

Description

Technical Field

[0001] The invention relates to the technical field of photoresist coating, in particular to a photoresist coating device for preventing particle pollution. Background Art

[0002] The photoresist coating device is usually composed of a reagent cartridge, an air pressure valve, a rubber valve and other parts, and the photoresist is a photosensitive adhesive dispersed in a solvent, and then the photolithography process is carried out after the solvent evaporates and dries.

[0003] The patent with patent announcement number CN101995773B relates to a photoresist coating device, including: a photoresist coating device body, the external cover of the nozzle of the photoresist coating device body is provided with a protection module for isolating the nozzle from impurities on the substrate. The nozzle includes a first surface arranged opposite to each other along the movement direction of the nozzle, and the protection module includes two first protection units, which are fixed on the first surface by a fixing device to form a slit. The patented photoresist coating device is based on the existing photoresist coating device body, and a protection module is fixed on the outside of the nozzle on the photoresist coating device body. The nozzle is isolated from impurities on the substrate through the protection module, thereby preventing the nozzle from being damaged by impurities on the substrate when the nozzle moves on the substrate surface to apply photoresist through the protection module, thereby reducing production costs.

[0004] In the above patent, the nozzle is isolated from impurities on the substrate by the protection module, thereby preventing the nozzle from being damaged by impurities on the substrate when the nozzle moves through the protection module on the substrate surface to apply photoresist, thereby reducing production costs. However, it is difficult to protect the glue guide holes and the rubber cross valve to prevent sharp objects from entering the reagent barrel and contaminating the photoresist. If sharp objects enter the reagent barrel, they will destroy the integrity of the photoresist or cause particle contamination. The particle contaminants will adhere to the wafer surface during the coating process, affecting the quality of the photoresist and the final chip manufacturing quality. Summary of the invention

[0005] In view of the deficiencies of the prior art, the present invention provides a photoresist coating device that prevents particle contamination, thereby solving the problems raised in the above-mentioned background technology.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: a photoresist coating device to prevent particle contamination, comprising a reagent barrel and a protective device, wherein a sealing cover is fixedly installed on the top of the reagent barrel, an air pressure device is arranged on the circumferential surface of the sealing cover, a rubber plug is arranged on the inner wall of the sealing cover, a fixing hole is opened on the surface of the air pressure device, a fixing rod is fixedly installed on the surface of the air pressure device, a fixing plate is fixedly installed on the top of the fixing rod, a glue guide hole is opened on the circumferential surface of the reagent barrel, a rubber cross valve is arranged inside the glue guide hole, and a transparent composite film is arranged on the circumferential surface of the reagent barrel, wherein the protective device comprises a protective frame, a stabilizing plate, a protective rod, an inclined panel, a protective plate, a protective hole, a movable hole, A protection plate, a protection rod and a hollow block. The movement of the protection rod drives the movement of the hollow block. The hollow block moves and contacts the inner wall of the protection hole to fix the protection plate. The protection plate is limited by the hollow block to restore the shielding of the glue guide hole. The protection frame is fixedly installed on the circumferential surface of the reagent barrel, the stabilizing plate is fixedly installed on the surface of the protection frame, the protection rod is fixedly installed on the bottom of the stabilizing plate, the inclined panel is slidably installed on the circumferential surface of the protection rod, the protection plate is fixedly installed on the surface of the inclined panel, the protection hole is opened on the surface of the protection plate, the movable hole is opened on the side of the protection frame away from the glue guide hole, the protection plate is fixedly installed on the side of the protection frame away from the glue guide hole, the protection rod slides through the front and rear walls of the protection plate, and the hollow blocks are fixedly installed on both sides of the protection rod.

[0007] According to the above technical solution, an elastic telescopic block is fixedly installed on the side of the protective frame away from the glue guiding hole, and a protective hole is opened on the side of the hollow block close to the elastic telescopic block. The free end of the elastic telescopic block contacts the inner wall of the protective hole, and the free end of the elastic telescopic block moves out of contact with the protective hole and releases the limitation on the hollow block.

[0008] According to the above technical solution, a No. 1 spring is arranged between the protective rod and the inclined panel, and the No. 1 spring can drive the inclined panel to reset. A No. 2 spring is arranged between the protective plate and the protective rod, and the No. 2 spring can drive the protective rod to reset. The side of the hollow block close to the protective plate is set as an inclined surface.

[0009] According to the above technical scheme, it also includes a scraping device and a limiting device, the scraping device includes a load-bearing frame, a scraper, a connecting block, a maintenance frame, a maintenance rod and a protrusion, the connection block moves upward to drive the scraper to move upward, the scraper moves upward to scrape the photoresist remaining on the circumferential surface of the reagent barrel, the load-bearing frame is fixedly installed on the side of the protective plate close to the glue guide hole, the scraper is slidably installed on the inner wall of the protective frame, the connecting block is fixedly installed on the side of the scraper away from the glue guide hole, the maintenance frame is fixedly installed on the inner wall of the protective frame, the maintenance rod is rotatably installed on the inner wall of the maintenance frame, and the protrusion is fixedly installed on the top of the inner wall of the protective frame.

[0010] According to the above technical solution, the connecting block contacts the inner wall of the load-bearing frame, a clockwork spring is arranged between the maintenance frame and the maintenance rod, one end of the clockwork spring is arranged on the inner wall of the maintenance frame and the other end is arranged on the surface of the maintenance rod, the clockwork spring can drive the maintenance rod to reset, and the scraper contacts the circumferential surface of the reagent barrel.

[0011] According to the above technical scheme, the limiting device includes a linkage frame, a linkage plate, a linkage rod, a placement plate, a placement frame, a circular plate, an L-shaped rod and a limiting groove. The L-shaped rod moves in a direction away from the fixed rod to break away from the contact with the limiting groove and release the limitation on the pneumatic equipment. The linkage frame is fixedly installed on the top of the stabilizing plate, the linkage plate is slidably installed on the inner wall of the linkage frame, the linkage rod is fixedly installed on the bottom of the linkage plate, the placement plate is fixedly installed on the surface of the pneumatic equipment, the placement frame is fixedly installed on the side of the placement plate away from the fixed rod, the circular plate is slidably installed on the inner wall of the placement frame, the L-shaped rod is fixedly installed on the side of the circular plate close to the fixed rod, and the limiting groove is opened on the circumferential surface of the fixed rod.

[0012] According to the above technical solution, a No. 3 spring is arranged between the linkage frame and the linkage plate, and the No. 3 spring can drive the linkage plate to reset. Liquid is arranged inside the linkage frame, and liquid is arranged inside the placement frame.

[0013] According to the above technical solution, the linkage frame is connected to the inside of the placement frame through a hose, the L-shaped rod is in contact with the limit groove, a movable groove is provided on the surface of the air pressure device, and the liquid inside the linkage frame is squeezed by the linkage plate and enters the inside of the placement frame through the hose.

[0014] The present invention provides a photoresist coating device that prevents particle contamination. It has the following beneficial effects:

[0015] (1) The photoresist coating device for preventing particle contamination, by manually pulling the free end of the elastic telescopic block, makes the free end of the elastic telescopic block disengage from the contact with the protection hole and releases the limit on the hollow block. The elastic telescopic block can effectively prevent the failure of the protection plate shielding due to accidental touch by personnel, and can significantly improve the safety of the reagent barrel by maintaining the stability of the protection plate shielding. After the photoresist is exported, the hollow block is driven to move by the movement of the protection rod, and the hollow block moves to contact the inner wall of the protection hole and fix the protection plate. The protection plate is limited by the hollow block to restore the shielding of the glue guide hole. Particle contamination will affect the final quality of the product. By shielding the glue guide hole with the protective plate to prevent particle contaminants from entering the interior of the reagent barrel, the purity and stability of the photoresist can be ensured, thereby ensuring the manufacturing quality and consistency of the product.

[0016] (2) The photoresist coating device for preventing particle contamination drives the scraper to move upward by moving the connecting block upward. The scraper moves upward to scrape the photoresist remaining on the circumferential surface of the reagent barrel, and the scraper moves upward to hit the protrusion to generate vibration. When the straight tube is pulled out, photoresist will remain on the surface of the reagent barrel, causing the remaining glue guide holes to be blocked. The scraper moves upward to effectively clean the surface of the reagent barrel and scrape off the remaining photoresist, ensuring that the remaining glue guide holes are unobstructed. At the same time, when the scraper moves downward, it squeezes the maintenance rod to generate rotation to scrape the bottom of the scraper, scraping off the photoresist adhered to the bottom of the scraper, thereby maintaining the scraper's cleaning effect on the reagent barrel.

[0017] (3) The photoresist coating device for preventing particle contamination drives the L-shaped rod to move by moving the circular plate in a direction away from the fixed rod. The L-shaped rod moves in a direction away from the fixed rod to break away from the contact with the limit groove and release the limit on the air pressure device. The air pressure device can be operated to export the photoresist in the reagent barrel only after the limit of the air pressure device is released. If the air pressure device can be pressed and operated at will, it will cause the photoresist to leak out of the glue guide hole, resulting in waste and particle contamination. By waiting for the protective equipment to be released before operating, it can be ensured that the air pressure device can be pressed only when the photoresist needs to be exported, thereby avoiding the leakage of photoresist from the glue guide hole, resulting in particle contamination and negative impact on the working environment. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0019] Figure 2 This is a schematic diagram of the position structure of the reagent barrel and the protective frame of the present invention;

[0020] Figure 3 For the present invention Figure 2 A schematic diagram of the structure enlargement of part A;

[0021] Figure 4 This is a schematic diagram of the position structure of the stabilizing plate and the linkage frame of the present invention;

[0022] Figure 5 It is a schematic diagram of the internal structure of the linkage frame of the present invention;

[0023] Figure 6 For the present invention Figure 5 A schematic diagram of the structure of part B in the middle is enlarged;

[0024] Figure 7 This is a schematic diagram of the position structure of the sealing cover and the rubber plug of the present invention;

[0025] Figure 8 For the present invention Figure 7 Schematic diagram of the enlarged structure of part C in the middle.

[0026] In the figure: 1. reagent barrel; 2. sealing cover; 3. air pressure equipment; 4. rubber plug; 5. fixing hole; 6. fixing rod; 7. fixing plate; 8. glue guide hole; 9. protection frame; 10. stabilizing plate; 11. protection rod; 12. inclined plate; 13. protection plate; 14. protection hole; 15. moving hole; 16. protection plate; 17. protection rod; 18. protection hole; 19. elastic telescopic block; 191. hollow block; 201. load-bearing frame; 202. scraper; 203. connecting block; 204. maintenance frame; 205. maintenance rod; 206. protrusion; 211. linkage frame; 212. linkage plate; 213. linkage rod; 214. placement plate; 215. placement frame; 216. round plate; 217. L-shaped rod; 218. limit groove. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0028] See also Figure 1-Figure 8 , one embodiment of the present invention is: a photoresist coating device to prevent particle contamination, comprising a reagent barrel 1, and also comprising a protective device, wherein a sealing cover 2 is fixedly installed on the top of the reagent barrel 1, an air pressure device 3 is arranged on the circumferential surface of the sealing cover 2, a rubber plug 4 is arranged on the inner wall of the sealing cover 2, a fixing hole 5 is opened on the surface of the air pressure device 3, a fixing rod 6 is fixedly installed on the surface of the air pressure device 3, a fixing plate 7 is fixedly installed on the top of the fixing rod 6, a glue guide hole 8 is opened on the circumferential surface of the reagent barrel 1, a rubber cross valve is arranged inside the glue guide hole 8, and a transparent composite film is arranged on the circumferential surface of the reagent barrel 1, wherein the protective device comprises a protective frame 9, a stabilizing plate 10, a protective rod 11, an inclined panel 12, a protective plate 13, a protective hole 14, a movable hole 15, a protective plate 16, a protective rod 17 and a hollow block 191, and the protective frame 9 is fixed It is fixedly installed on the circumferential surface of the reagent barrel 1, the stabilizing plate 10 is fixedly installed on the surface of the protective frame 9, the protective rod 11 is fixedly installed on the bottom of the stabilizing plate 10, the inclined plate 12 is slidably installed on the circumferential surface of the protective rod 11, the protective plate 13 is fixedly installed on the surface of the inclined plate 12, the protective hole 14 is opened on the surface of the protective plate 13, the movable hole 15 is opened on the side of the protective frame 9 away from the glue guide hole 8, the protective plate 16 is fixedly installed on the side of the protective frame 9 away from the glue guide hole 8, the protective rod 17 slides through the front and rear walls of the protective plate 16, the hollow block 191 is fixedly installed on both sides of the protective rod 17, and the air pressure device 3 consists of an air pressure valve and an air pressure switch. The protective plate 13 blocks the glue guide hole 8 to prevent particulate contaminants from entering the reagent barrel 1, which can ensure the purity and stability of the photoresist, thereby ensuring the manufacturing quality and consistency of the product.

[0029] An elastic telescopic block 19 is fixedly installed on the side of the protective frame 9 away from the glue guide hole 8, and a protective hole 18 is opened on the side of the hollow block 191 close to the elastic telescopic block 19. The free end of the elastic telescopic block 19 contacts the inner wall of the protective hole 18, and the free end of the elastic telescopic block 19 moves out of contact with the protective hole 18 and releases the limitation on the hollow block 191. The elastic telescopic block 19 can effectively prevent the shielding failure of the protective plate 13 caused by accidental touch by personnel, and the safety of the reagent barrel 1 can be significantly improved by maintaining the stability of the shielding of the protective plate 13.

[0030] A No. 1 spring is arranged between the protective rod 11 and the inclined panel 12, and the No. 1 spring can drive the inclined panel 12 to reset. A No. 2 spring is arranged between the protective plate 16 and the protective rod 17, and the No. 2 spring can drive the protective rod 17 to reset. The side of the hollow block 191 close to the protective plate 13 is arranged as an inclined surface.

[0031] When the present embodiment is working: when the photoresist inside the reagent barrel 1 needs to be led out, the free end of the elastic telescopic block 19 is first manually pulled to move away from the protective rod 17, and the free end of the elastic telescopic block 19 moves out of contact with the protective hole 18 and releases the limit on the hollow block 191. After the limit of the hollow block 191 is released, the hollow block 191 is manually pulled to move away from the glue guide hole 8. The movement of the hollow block 191 drives the movement of the protective rod 17, and the movement of the protective rod 17 squeezes the No. 2 spring. The No. 2 spring is squeezed by the protective rod 17 to produce deformation and accumulate force. The hollow block 191 moves out of contact with the protective hole 14 and releases the limit on the protective plate 13. After the limit of the protective plate 13 is released, the inclined plate 12 moves upward under the elastic force of spring No. 1. The upward movement of the inclined plate 12 drives the protective plate 13 to move upward. The upward movement of the protective plate 13 releases the obstruction of the glue guide hole 8. After the glue guide hole 8 leaks out, a straight tube with the same aperture size as the glue guide hole 8 is inserted until the transparent composite film is pierced, and the air pressure switch on the sealing cover 2 is pressed downward to make the air pressure inside the reagent barrel 1 the same as that outside the reagent barrel 1. At this time, the photoresist flows out along the straight tube. After use, you only need to lift the air pressure switch upwards and then pull out the straight tube. The rubber cross valve inside the glue guide hole 8 will close and seal to prevent the photoresist from continuing to flow out. At the same time, manually press the protective plate 13 downward. The protective plate 13 moves downward, driving the inclined plate 12 downward. The inclined plate 12 moves downward to squeeze the No. 1 spring. The No. 1 spring is squeezed by the inclined plate 12 and deforms and accumulates force. When the protective plate 13 continues to move downward so that the hollow block 191 contacts the protective hole 14, the protective rod 17 moves toward the direction close to the glue guide hole 8 under the elastic force of the No. 2 spring. The movement of the protective rod 17 drives the hollow block 191 to move, and the hollow block 191 moves with the protective The inner wall of the protective hole 14 contacts and fixes the protective plate 13, and the protective plate 13 is limited by the hollow block 191 to restore the shielding of the glue guide hole 8. When the photoresist is used again, it is only necessary to replace the new glue guide hole 8, and the same method can be repeated to complete the use of the photoresist. After the glue guide hole 8 is used up, the internal rubber cross valve can be effectively closed to prevent the photoresist from flowing out. At the same time, the glue guide hole 8 is no longer used after closing. Therefore, the photoresist cannot volatilize the internal reagent at the glue guide hole 8 and cannot form solid photoresist particles. In addition, a disposable glue guide hole 8 is used for the flow of photoresist, which effectively prevents the new pollution source from polluting the photoresist during use.

[0032] See also Figure 1-Figure 8On the basis of the above embodiment, another embodiment of the present invention further includes a scraping device and a limiting device, the scraping device includes a load-bearing frame 201, a scraper 202, a connecting block 203, a maintenance frame 204, a maintenance rod 205 and a protrusion 206, the load-bearing frame 201 is fixedly installed on the side of the protective plate 13 close to the glue guide hole 8, the scraper 202 is slidably installed on the inner wall of the protective frame 9, the connecting block 203 is fixedly installed on the side of the scraper 202 away from the glue guide hole 8, and the maintenance frame 204 is fixedly installed on the protective plate 13. The inner wall of the frame 9, the maintenance rod 205 is rotatably installed on the inner wall of the maintenance frame 204, and the protrusion 206 is fixedly installed on the top of the inner wall of the protective frame 9. The scraper 202 moves upward, so as to effectively clean the surface of the reagent barrel 1, scrape off the residual photoresist, and ensure the smoothness of the remaining glue guide holes 8. When the scraper 202 moves downward, the maintenance rod 205 is squeezed to rotate and scrape the bottom of the scraper 202 to scrape off the photoresist adhered to the bottom of the scraper 202, so as to maintain the cleaning effect of the scraper 202 on the reagent barrel 1.

[0033] The connecting block 203 contacts the inner wall of the load-bearing frame 201, and a clockwork spring is arranged between the maintenance frame 204 and the maintenance rod 205. One end of the clockwork spring is arranged on the inner wall of the maintenance frame 204 and the other end is arranged on the surface of the maintenance rod 205. The clockwork spring can drive the maintenance rod 205 to reset, and the scraper 202 contacts the circumferential surface of the reagent barrel 1.

[0034] The limiting device includes a linkage frame 211, a linkage plate 212, a linkage rod 213, a placement plate 214, a placement frame 215, a circular plate 216, an L-shaped rod 217 and a limiting groove 218. The linkage frame 211 is fixedly installed on the top of the stabilizing plate 10, the linkage plate 212 is slidably installed on the inner wall of the linkage frame 211, the linkage rod 213 is fixedly installed on the bottom of the linkage plate 212, the placement plate 214 is fixedly installed on the surface of the air pressure device 3, the placement frame 215 is fixedly installed on the side of the placement plate 214 away from the fixed rod 6, the circular plate 216 is slidably installed on the inner wall of the placement frame 215, the L-shaped rod 217 is fixedly installed on the side of the circular plate 216 close to the fixed rod 6, and the limiting groove 218 is provided on the circumferential surface of the fixed rod 6. By waiting for the shielding of the protective plate 13 to be released before operating, it can be ensured that the air pressure device 3 can be pressed only when the photoresist needs to be exported, thereby avoiding the leakage of photoresist from the glue guide hole 8 to cause particle contamination and negative impact on the working environment.

[0035] A No. 3 spring is arranged between the linkage frame 211 and the linkage plate 212 , and the No. 3 spring can drive the linkage plate 212 to reset. Liquid is arranged inside the linkage frame 211 , and liquid is arranged inside the placement frame 215 .

[0036] The linkage frame 211 is connected to the inside of the placement frame 215 through a hose, the L-shaped rod 217 is in contact with the limiting groove 218, and a moving groove is opened on the surface of the air pressure device 3. The liquid inside the linkage frame 211 is squeezed by the linkage plate 212 and enters the inside of the placement frame 215 through the hose.

[0037] When this embodiment is working, the inclined plate 12 moves upward to drive the protective plate 13 to move upward, the protective plate 13 moves upward to drive the load-bearing frame 201 to move upward, the load-bearing frame 201 moves upward to contact the connecting block 203 and squeeze the connecting block 203, the connecting block 203 moves upward under the squeezing of the load-bearing frame 201, the connecting block 203 moves upward to drive the scraper 202 to move upward, the scraper 202 moves upward to scrape the photoresist remaining on the circumferential surface of the reagent barrel 1, and at the same time the scraper 202 moves upward to hit the bump 206 to generate vibration, the vibration of the scraper 202 drives the connecting block 203 to resonate together, and when the protective plate 13 moves downward to drive the load-bearing frame 201 to move downward, the load-bearing frame 201 moves downward. The frame 201 moves downward, driving the connecting block 203 to move downward. The connecting block 203 moves downward, driving the scraper 202 to move downward to continue to scrape the photoresist remaining on the circumferential surface of the reagent barrel 1. At the same time, the scraper 202 continues to move downward to release and squeeze the maintenance rod 205. The maintenance rod 205 rotates downward due to the squeezing of the scraper 202. The maintenance rod 205 rotates downward to squeeze the clockwork spring. The clockwork spring is squeezed by the maintenance rod 205 to produce deformation and accumulate force. At the same time, the maintenance rod 205 rotates downward to scrape the bottom of the scraper 202. The maintenance rod 205 scrapes the bottom of the scraper 202 to scrape off the photoresist adhered to the bottom of the scraper 202.

[0038] The connecting block 203 moves upward to drive the scraper 202 to move upward. The scraper 202 moves upward to contact the bottom of the linkage rod 213 and squeeze the linkage rod 213. The linkage rod 213 moves upward under the squeezing of the scraper 202. The linkage rod 213 moves upward to drive the linkage plate 212 to move upward. The linkage plate 212 moves upward to squeeze the No. 3 spring. The No. 3 spring is squeezed by the linkage plate 212 to produce deformation and accumulate force. At the same time, the linkage plate 212 moves upward to squeeze the liquid inside the linkage frame 211. The liquid inside the linkage frame 211 is squeezed. The liquid squeezed to the linkage plate 212 enters the placement frame 215 through the hose, and the liquid entering the placement frame 215 squeezes the circular plate 216. The circular plate 216 is squeezed by the liquid inside the placement frame 215 and moves in the direction away from the fixed rod 6. The circular plate 216 moves in the direction away from the fixed rod 6 and drives the L-shaped rod 217 to move. The L-shaped rod 217 moves in the direction away from the fixed rod 6 to break away from the contact with the limit groove 218 and release the limit on the air pressure device 3. The air pressure switch on the sealing cover 2 can be pressed downward only after the limit of the air pressure device 3 is released.

[0039] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A photoresist coating device for preventing particle contamination, comprising a reagent barrel (1), characterized in that: It also includes protective devices, scraping devices and limiting devices; The reagent barrel (1) is fixedly provided with a sealing cover (2) on the top, a pneumatic device (3) is arranged on the circumferential surface of the sealing cover (2), a rubber plug (4) is arranged on the inner wall of the sealing cover (2), a fixing hole (5) is provided on the surface of the pneumatic device (3), a fixing rod (6) is fixedly provided on the surface of the pneumatic device (3), a fixing plate (7) is fixedly provided on the top of the fixing rod (6), a glue guide hole (8) is provided on the circumferential surface of the reagent barrel (1), a rubber cross valve is arranged inside the glue guide hole (8), and a transparent composite film is arranged on the circumferential surface of the reagent barrel (1); The protective device comprises a protective frame (9), a stabilizing plate (10), a protective rod (11), an inclined plate (12), a protective plate (13), a protective hole (14), a movable hole (15), a protective plate (16), a protective rod (17) and a hollow block (191), wherein the protective frame (9) is fixedly mounted on the circumferential surface of the reagent barrel (1), the stabilizing plate (10) is fixedly mounted on the surface of the protective frame (9), the protective rod (11) is fixedly mounted on the bottom of the stabilizing plate (10), and the inclined plate (12) is slidably mounted on the circumferential surface of the reagent barrel (1). The protective plate (13) is mounted on the circumferential surface of the protective rod (11), the protective plate (13) is fixedly mounted on the surface of the inclined plate (12), the protective hole (14) is formed on the surface of the protective plate (13), the movable hole (15) is formed on the side of the protective frame (9) away from the glue guide hole (8), the protective plate (16) is fixedly mounted on the side of the protective frame (9) away from the glue guide hole (8), the protective rod (17) slides through the front and rear walls of the protective plate (16), and the hollow blocks (191) are fixedly mounted on both sides of the protective rod (17); An elastic telescopic block (19) is fixedly mounted on a side of the protective frame (9) away from the glue guide hole (8), a protective hole (18) is provided on a side of the hollow block (191) close to the elastic telescopic block (19), and a free end of the elastic telescopic block (19) contacts an inner wall of the protective hole (18); A first spring is arranged between the protection rod (11) and the inclined plate (12), a second spring is arranged between the protection plate (16) and the protection rod (17), and a side of the hollow block (191) close to the protection plate (13) is arranged as an inclined surface; The inclined panel (12) moves upward, driving the protective plate (13) to move upward, and the protective plate (13) moves upward to release the obstruction of the glue guide hole (8).

2. A photoresist coating device for preventing particle contamination according to claim 1, characterized in that: The scraping device comprises a load-bearing frame (201), a scraper (202), a connecting block (203), a maintenance frame (204), a maintenance rod (205) and a protrusion (206); the load-bearing frame (201) is fixedly mounted on a side of the protective plate (13) close to the glue guide hole (8); the scraper (202) is slidably mounted on an inner wall of the protective frame (9); the connecting block (203) is fixedly mounted on a side of the scraper (202) away from the glue guide hole (8); the maintenance frame (204) is fixedly mounted on the inner wall of the protective frame (9); the maintenance rod (205) is rotatably mounted on the inner wall of the maintenance frame (204); and the protrusion (206) is fixedly mounted on the top of the inner wall of the protective frame (9).

3. A photoresist coating device for preventing particle contamination according to claim 2, characterized in that: The connection block (203) is in contact with the inner wall of the load-bearing frame (201), a spring is provided between the maintenance frame (204) and the maintenance rod (205), and the scraper (202) is in contact with the circumferential surface of the reagent barrel (1).

4. A photoresist coating device for preventing particle contamination according to claim 2, characterized in that: The limiting device comprises a linkage frame (211), a linkage plate (212), a linkage rod (213), a placement plate (214), a placement frame (215), a circular plate (216), an L-shaped rod (217) and a limiting groove (218); the linkage frame (211) is fixedly mounted on the top of the stabilizing plate (10); the linkage plate (212) is slidably mounted on the inner wall of the linkage frame (211); the linkage rod (213) is fixedly mounted on the bottom of the linkage plate (212); the placement plate (214) is fixedly mounted on the surface of the air pressure device (3); the placement frame (215) is fixedly mounted on a side of the placement plate (214) away from the fixed rod (6); the circular plate (216) is slidably mounted on the inner wall of the placement frame (215); the L-shaped rod (217) is fixedly mounted on a side of the circular plate (216) close to the fixed rod (6); and the limiting groove (218) is provided on the circumferential surface of the fixed rod (6).

5. A photoresist coating device for preventing particle contamination according to claim 4, characterized in that: A No. 3 spring is arranged between the linkage frame (211) and the linkage plate (212), liquid is arranged inside the linkage frame (211), and liquid is arranged inside the placement frame (215).

6. A photoresist coating device for preventing particle contamination according to claim 4, characterized in that: The linkage frame (211) is connected to the interior of the placement frame (215) via a hose, the L-shaped rod (217) is in contact with the limiting groove (218), and a moving groove is provided on the surface of the air pressure device (3).

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