Display screen support plate and its manufacturing method, display screen assembly, electronic equipment

By setting a hard chrome layer or a nitrided layer on the substrate layer of the display support plate, the problem of traditional support plates being unable to balance weight reduction and rigidity is solved, achieving the effect of improving rigidity without increasing thickness.

CN119068761BActive Publication Date: 2026-03-06GUANGDONG OPPO MOBILE TELECOMMUNICATIONS CORP LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-05-30
Publication Date
2026-03-06

AI Technical Summary

Technical Problem

Traditional display screen support plates struggle to balance weight reduction and rigidity requirements, and are also costly.

Method used

Titanium alloy or aluminum alloy is used as the base layer, and a hard chrome layer or nitriding layer is set on its supporting surface as a rigidity reinforcement layer to improve the elastic modulus and thus enhance rigidity.

Benefits of technology

Without increasing thickness, the rigidity of the display support plate is significantly improved, meeting the requirements for lightweighting and rigidity, and reducing production costs.

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Abstract

This invention relates to a display screen support plate and its manufacturing method, a display screen assembly, and an electronic device. The display screen support plate has a substrate layer with a first support surface and a second support surface disposed opposite to each other. At least one of the first and second support surfaces is provided with a rigid reinforcement layer. The substrate layer is a titanium alloy layer or an aluminum alloy layer, and the rigid reinforcement layer is a hard chrome layer; alternatively, the substrate layer is a titanium alloy layer, and the rigid reinforcement layer is a nitrided layer. The aforementioned display screen support plate can simultaneously meet the requirements of weight reduction and rigidity.
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Description

Technical Field

[0001] This invention relates to the field of electronic equipment technology, and in particular to a display screen support plate and its manufacturing method, a display screen assembly, and an electronic device. Background Technology

[0002] Thinner and lighter designs are a major trend in the development of electronic devices, and how to reduce the weight of electronic devices has attracted the attention of researchers. The support plate is a structure in the display assembly used to support the display screen, and it has certain rigidity requirements. Traditional materials for display support plates include stainless steel, carbon fiber, and their composites. However, stainless steel is heavy, which is not conducive to weight reduction in electronic devices. Carbon fiber and its composites are lighter, but they are thicker, and carbon fiber itself is expensive and non-conductive, requiring an additional conductive coating. Summary of the Invention

[0003] Therefore, it is necessary to provide a display screen support plate and its manufacturing method, display screen assembly, and electronic equipment to solve the problem that the display screen support plate is difficult to balance with the requirements of weight reduction and rigidity.

[0004] The first aspect of the present invention is to provide a display screen support plate, the solution of which is as follows:

[0005] A display screen support plate has a base layer, the base layer having a first support surface and a second support surface disposed opposite to each other, and at least one of the first support surface and the second support surface is provided with a rigid reinforcement layer;

[0006] The substrate layer is a titanium alloy layer or an aluminum alloy layer, and the rigid reinforcement layer is a hard chrome layer; or

[0007] The substrate layer is a titanium alloy layer, and the rigid reinforcement layer is a nitrided layer.

[0008] A second aspect of the present invention is to provide a method for manufacturing a display screen support plate, the scheme of which is as follows:

[0009] A method for manufacturing a display screen support plate includes the following steps:

[0010] A substrate layer is provided, the substrate layer having a first support surface and a second support surface disposed opposite to each other;

[0011] A rigid reinforcement layer is formed on at least one of the first support surface and the second support surface;

[0012] The substrate layer is a titanium alloy layer or an aluminum alloy layer, and the rigidity reinforcement layer is a hard chrome layer; or

[0013] The substrate layer is a titanium alloy layer, and the rigid reinforcement layer is a nitrided layer.

[0014] A third aspect of the present invention is to provide a display screen support plate prepared by the above-described preparation method.

[0015] A fourth aspect of the present invention is to provide a display screen assembly, including the aforementioned display screen support plate, and further including a display module stacked with the display screen support plate.

[0016] A fifth aspect of the present invention is to provide an electronic device, including a housing, a circuit board, and the aforementioned display assembly, wherein the display assembly and the housing form a receiving space, and the circuit board is disposed within the receiving space.

[0017] Compared with traditional solutions, the above-mentioned display support plate and its manufacturing method, display assembly, and electronic equipment have the following advantages:

[0018] The aforementioned display screen support plate uses a titanium alloy layer or an aluminum alloy layer as the base layer. Titanium alloy and aluminum alloy have low density. A hard chrome layer is provided on at least one of the first support surface and the second support surface that are arranged opposite to each other in the base layer. The hard chrome layer can significantly improve its elastic modulus. When the titanium alloy layer is used as the base layer, a nitriding layer can also be provided on at least one support surface. By utilizing the high modulus of titanium nitride, the rigidity of the display screen support plate can be significantly improved without changing the thickness, thus balancing the requirements for weight reduction and rigidity.

[0019] The aforementioned display assembly includes the aforementioned display support plate, and therefore possesses the corresponding technical features and is able to achieve the corresponding technical effects.

[0020] The aforementioned electronic device includes the aforementioned display screen assembly, and therefore possesses the corresponding technical features and is able to achieve the corresponding technical effects. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the display screen support plate of Example 1 of the present invention;

[0022] Figure 2 This is a schematic diagram of the display screen support plate of Example 2 of the present invention;

[0023] Figure 3 This is a schematic diagram of the display screen support plate of Example 3 of the present invention;

[0024] Figure 4 This is a schematic diagram of the display screen support plate of Example 4 of the present invention;

[0025] Figure 5 This is a schematic flowchart of a method for preparing a display screen support plate according to an embodiment of the present invention;

[0026] Figure 6 This is a flowchart illustrating the process of obtaining alloy sheets in an example.

[0027] Figure 7 This is a schematic diagram of the process for pre-treating the surface of an alloy sheet in an example.

[0028] Figure 8 This is a schematic diagram of the etching process for the surface of an alloy sheet in one example.

[0029] Figure 9 This is a schematic diagram of the post-processing procedure for hard chrome plated products in an example.

[0030] Figure 10 This is a schematic flowchart illustrating a method for preparing a display screen support plate according to an embodiment of the present invention. Detailed Implementation

[0031] To facilitate understanding of the present invention, a more complete description will be given below with reference to the accompanying drawings. Preferred embodiments of the invention are shown in the drawings. However, the invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of the invention.

[0032] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the specification of this invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0033] the term

[0034] Unless otherwise stated or in case of contradiction, the terms or phrases used herein shall have the following meanings:

[0035] In this invention, terms such as "multiple", "various", "multiple times", and "multi-dimensional" are used, unless otherwise specified, to refer to a quantity greater than or equal to 2. For example, "one or more" means one or more types.

[0036] In this invention, terms such as "preferred," "better," "more suitable," and "ideal" are used only to describe implementation methods or embodiments with better effects, and should be understood not to limit the scope of protection of this invention.

[0037] In this invention, terms such as "further," "even more," and "particularly" are used for descriptive purposes to indicate differences in content, but should not be construed as limiting the scope of protection of this invention.

[0038] In this invention, the terms "optionally," "optionally," and "optional" refer to options that are optional, meaning they are selected from either "with" or "without." If multiple "optional" options appear in a technical solution, unless otherwise specified and there are no contradictions or mutual constraints, each "optional" option is independent.

[0039] In this invention, the terms "first aspect," "second aspect," "third aspect," and "fourth aspect," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or quantity, nor should they be construed as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first," "second," "third," and "fourth," etc., serve only as a non-exhaustive enumeration and should be understood not to constitute a closed limitation on quantity.

[0040] In this invention, "above" or "below" the second feature can mean that the first and second features are in direct contact, or that they are in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0041] In this invention, when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. It should also be understood that, in interpreting the connection or positional relationship of elements, although not explicitly described, connection and positional relationships are interpreted to include a range of error, which should be within the acceptable deviation range of a specific value as determined by a person skilled in the art. For example, "approximately," "approximately," or "substantially" can mean within one or more standard deviations, without limitation herein.

[0042] In this invention, the technical features described in an open-ended manner include both closed-ended technical solutions composed of the listed features and open-ended technical solutions that include the listed features.

[0043] In this invention, an "electronic device" (or simply a "terminal") includes, but is not limited to, a device configured to receive / transmit communication signals via a wired connection (such as via a Public Switched Telephone Network (PSTN), Digital Subscriber Line (DSL), Digital Cable, Direct Cable Connection, and / or another data connection / network) and / or via a wireless interface (e.g., for cellular networks, Wireless Local Area Networks (WLANs), digital television networks such as DVB-H networks, satellite networks, AM-FM broadcast transmitters, and / or another communication terminal). A communication terminal configured to communicate via a wireless interface may be referred to as a "wireless communication terminal," a "wireless terminal," or a "mobile terminal." Examples of mobile terminals include, but are not limited to, satellite or cellular phones; personal communication system (PCS) terminals that can combine cellular radiotelephone with data processing, fax, and data communication capabilities; PDAs that may include radiotelephones, pagers, Internet / intranet access, web browsers, notepads, calendars, and / or Global Positioning System (GPS) receivers; and conventional laptop and / or handheld receivers or other electronic devices including radiotelephone transceivers. A mobile phone is an electronic device equipped with a cellular communication module.

[0044] A display support plate is a structure in a display assembly used to support the display screen. In today's world, where there is a strong emphasis on making mobile phones and other electronic devices thinner and lighter, display support plates are expected to be both thin and lightweight while maintaining high rigidity.

[0045] Traditional display screen support plates include stainless steel support plates, carbon fiber support plates, and carbon fiber resin composite support plates.

[0046] Stainless steel has a high modulus of elasticity of 193 GPa, good rigidity, and low processing costs. However, stainless steel has a very high density, reaching 7.9 g / cm³. 3 If used as a display support plate for a regular 8-inch foldable phone, the weight of the display support plate alone would be close to 20g, which would not meet the lightweight requirements and is therefore unacceptable.

[0047] The advantages of carbon fiber include low density and high elastic modulus. The density of carbon fiber is only 1.8 g / cm³. 3 Composite materials prepared by mixing carbon fiber and epoxy resin have even lower densities, sometimes even below 1.6 g / cm³. 3Carbon fiber itself has a high modulus along its fiber direction, but the elastic modulus of the carbon fiber-epoxy resin composite material along the fiber direction is only about 55% of that of carbon fiber. The elastic modulus of the composite material perpendicular to the fiber direction is essentially the same as that of the epoxy resin, only a few gigapascals, which is negligible. Therefore, to achieve the same rigidity and modulus as stainless steel, the thickness of the composite support plate needs to be significantly increased, requiring a 50% increase over the thickness of the stainless steel support plate, thus increasing the overall thickness of the device. Furthermore, since carbon fiber and its resin composite material are non-conductive, conductive treatment is required on their surface to meet the grounding and shielding requirements of the devices, resulting in high production costs throughout the entire process.

[0048] To address the above problems, the present invention provides a display screen support plate.

[0049] The display screen support plate provided by the present invention has a substrate layer, and the substrate layer has a first support surface and a second support surface disposed opposite to each other. At least one of the first support surface and the second support surface is provided with a rigid reinforcement layer.

[0050] The base layer is a titanium alloy layer or an aluminum alloy layer, and the rigid reinforcement layer is a hard chrome layer; or

[0051] The base layer is a titanium alloy layer, and the rigid reinforcement layer is a nitrided layer.

[0052] The aforementioned display support plate uses a titanium alloy layer or an aluminum alloy layer as the base layer. Titanium alloy and aluminum alloy have low density. A hard chrome layer is provided on at least one of the first support surface and the second support surface that are arranged opposite to each other in the base layer. The hard chrome layer can significantly improve its elastic modulus. When the titanium alloy layer is used as the base layer, a nitriding layer can also be provided on at least one support surface. By utilizing the high modulus of titanium nitride, the rigidity of the display support plate can be significantly improved without changing the thickness.

[0053] For example, when the thickness of the display support plate is 0.12mm, forming hard chrome layers on both sides of the titanium alloy layer increases its elastic modulus from the original 110GPa to over 150GPa; forming hard chrome layers on both sides of the aluminum alloy layer increases its elastic modulus from the original 70GPa to over 120GPa; and forming nitrided layers on both sides of the titanium alloy layer increases its elastic modulus from the original 110GPa to over 170GPa, thus balancing weight reduction and stiffness requirements.

[0054] Please see Figure 1 , Figure 1The structure of the display support plate 10 in Example 1 is shown. In this example, the display support plate 10 includes a substrate layer 11, a first rigid reinforcement layer 12, and a second rigid reinforcement layer 13. The substrate layer 11 has a first support surface 111 and a second support surface 112 disposed opposite to each other. The first rigid reinforcement layer 12 is disposed on the first support surface 111. The second rigid reinforcement layer 13 is disposed on the second support surface 112.

[0055] In Example 1, a first rigid reinforcement layer 12 is formed on the first support surface 111 of the substrate layer 11 by hard chrome plating or nitriding. The first rigid reinforcement layer 12 is directly formed on the first support surface 111, that is, the first rigid reinforcement layer 12 is in direct contact with the first support surface 111. A second rigid reinforcement layer 13 is formed on the second support surface 112 of the substrate layer 11 by hard chrome plating or nitriding. The second rigid reinforcement layer 13 is directly formed on the second support surface 112, that is, the second rigid reinforcement layer 13 is in direct contact with the second support surface 112.

[0056] In other examples, a rigid reinforcement layer may be provided only on one of the support surfaces of the matrix layer.

[0057] For example, see Figure 2 The example shown is a display support plate 20. In this example, the display support plate 20 includes a substrate layer 21 and a rigid reinforcement layer 22. The substrate layer 21 has a first support surface 211 and a second support surface 212 disposed opposite to each other. The rigid reinforcement layer 22 is disposed on the first support surface 211.

[0058] In Example 2, a rigid reinforcement layer 22 is formed on the first support surface 211 of the substrate layer 21 by hard chrome plating or nitriding. The rigid reinforcement layer 22 is formed directly on the first support surface 211, that is, the rigid reinforcement layer 22 is in direct contact with the first support surface 211.

[0059] If the rigid reinforcement layer is a hard chrome layer, other layers can also be set between the rigid reinforcement layer and the substrate layer, that is, the rigid reinforcement layer is indirectly formed on the substrate layer.

[0060] For example, a bonding reinforcement layer can be provided between the rigid reinforcement layer and the substrate layer. The bonding reinforcement layer is, for example, but not limited to, a nickel layer. Since the nickel layer has better adhesion to the hard chrome layer and the substrate layer, providing a nickel layer can improve the adhesion between the hard chrome layer and the substrate layer.

[0061] Please see Figure 3 , Figure 3The structure of the display support plate 30 of Example 3 is shown. The display support plate 30 includes a substrate layer 31, which has a first support surface 311 and a second support surface 312 disposed opposite to each other. A first nickel layer 34 is disposed on the first support surface 311, and a first rigidity reinforcement layer 32 is disposed on the side of the first nickel layer 34 away from the first support surface 311. A second nickel layer 35 is disposed on the second support surface 312, and a second rigidity reinforcement layer 33 is disposed on the side of the second nickel layer 35 away from the second support surface 312.

[0062] In Example 3, nickel plating is first performed on the two supporting surfaces of the substrate layer 31 to form a first nickel layer 34 and a second nickel layer 35, respectively. Then, the first nickel layer 34 is hard chrome plated to form a first rigid reinforcement layer 32, and the second nickel layer 35 is hard chrome plated to form a second rigid reinforcement layer 33. By placing the first nickel layer 34 between the first supporting surface 311 and the first rigid reinforcement layer 32, and the second nickel layer 35 between the second supporting surface 312 and the second rigid reinforcement layer 33, the bonding force between the first rigid reinforcement layer 32, the second rigid reinforcement layer 33 and the substrate layer 31 can be improved.

[0063] It is understandable that in other examples, the matrix layer may also have a rigid reinforcement layer directly placed on one of the support surfaces and a rigid reinforcement layer indirectly placed on the other support surface.

[0064] For example, see Figure 4 The example shown is a display support plate 40. The display support plate 40 includes a substrate layer 41, which has a first support surface 411 and a second support surface 412 disposed opposite to each other. A nickel layer 44 is disposed on the first support surface 411, and a first rigidity reinforcement layer 42 is disposed on the side of the nickel layer 44 away from the first support surface 411. A second rigidity reinforcement layer 43 is directly disposed on the second support surface 412.

[0065] Optionally, the titanium alloy layer may be made of one or more of the following materials: TA1 titanium alloy, TA2 titanium alloy, TA3 titanium alloy, TA4 titanium alloy, TC5 titanium alloy, TA7 titanium alloy, and TC4 titanium alloy.

[0066] Preferably, TA4 titanium alloy is selected as the material for the titanium alloy layer. TA4 titanium alloy has better ductility, which is beneficial for making thin-layer structures.

[0067] Optionally, the aluminum alloy layer is made of one or more of the following: 2-series aluminum alloys, 5-series aluminum alloys, 6-series aluminum alloys, and 7-series aluminum alloys.

[0068] Preferably, the aluminum alloy layer is made of 7-series aluminum alloy.

[0069] In some of these examples, the display support plate has multiple openings. For instance, openings can be made in areas where high rigidity is not required, reducing weight while minimizing stress concentration.

[0070] For example, the display screen support plate includes a first folding area, a bending area, and a second folding area. The bending area is located between the first and second folding areas and has multiple openings. These openings reduce the stiffness of the bending area and minimize stress concentration.

[0071] In the area with openings, multiple openings can be arranged linearly, in an array, or similarly. The shape of the openings can be, but is not limited to, one or more of the following: polygonal, circular, elliptical, elongated, and irregular shapes.

[0072] In some of these examples, multiple openings are arranged in a matrix, and the openings are circular holes with a diameter of 0.1 mm to 0.4 mm, with the distance between the edges of adjacent openings being 0.2 mm to 0.6 mm.

[0073] In some examples, multiple openings are arranged in a matrix, and the openings are regular hexagonal holes with a side length of 0.1 mm to 0.4 mm, with the distance between the edges of adjacent openings being 0.2 mm to 0.6 mm. In some examples, the openings are strip-shaped holes, and multiple openings are arranged in multiple columns, with the openings in adjacent columns being staggered. The width of the openings is 0.08 mm to 0.15 mm, and the length is, for example, 3 mm to 6 mm, with the distance between the edges of adjacent openings being 0.15 mm to 0.25 mm. The above-mentioned openings are made in the bending area, and the extension direction of the openings is consistent with the length direction of the bending area.

[0074] Optionally, the thickness of the display support plate can be, but is not limited to, 0.1mm to 0.17mm. At this thickness, the display support plate can be better applied to electronic devices such as mobile phones.

[0075] Optionally, the thickness of the substrate layer can be, but is not limited to, 0.05 mm to 0.12 mm. More preferably, the thickness of the substrate layer accounts for 40% to 80% of the total thickness of the display support plate, and more preferably 70% to 80%. At this thickness, the display support plate can maintain a low density, achieving lightweight design.

[0076] Optionally, when the rigid reinforcement layer is a hard chrome layer, its thickness can be, but is not limited to, 0.003 mm to 0.02 mm. Further, the total thickness of the rigid reinforcement layer accounts for 2% to 15% of the total thickness of the display support plate, more preferably 10% to 15%. At this thickness, the rigidity of the display support plate can be better improved while maintaining its low density.

[0077] In examples where a nickel layer is provided in the display support plate, the thickness of the nickel layer can be, but is not limited to, 0.01 mm to 0.03 mm. Preferably, the thickness of the substrate layer accounts for 40% to 80% of the total thickness of the display support plate, more preferably 70% to 80%. The total thickness of the rigid reinforcement layer accounts for 2% to 15% of the total thickness of the display support plate, more preferably 10% to 15%. The total thickness of the nickel layer accounts for 6% to 20% of the total thickness of the display support plate, more preferably 10% to 15%. At this thickness, the display support plate has both low density and higher rigidity, and can better improve the bonding force between the rigid reinforcement layer and the substrate layer.

[0078] Optionally, when the rigid reinforcement layer is a nitrided layer, its thickness is 0.01 mm to 0.05 mm. Further, the total thickness of the rigid reinforcement layer accounts for 2% to 15% of the total thickness of the display support plate, more preferably 10% to 15%. At this thickness, the rigidity of the display support plate can be better improved while maintaining its low density. Furthermore, the present invention also provides a method for preparing a display support plate according to any of the above examples.

[0079] The method for preparing the display screen support plate includes the following steps:

[0080] Obtain the matrix layer;

[0081] A rigid reinforcement layer is formed on at least one of the first support surface and the second support surface.

[0082] Please see Figure 5 One embodiment of the method 50 for preparing a display support plate includes the following steps:

[0083] Step S10: Obtain alloy sheet, which is either titanium alloy sheet or aluminum alloy sheet;

[0084] Step S20: Pre-treat the surface of the alloy sheet to obtain the substrate layer;

[0085] Step S30: The substrate layer is nickel-plated to obtain a nickel-plated product;

[0086] Step S40: Perform hard chrome plating on the nickel-plated product to obtain a hard chrome-plated product;

[0087] Step S50: Post-process the hard chrome plated product to obtain the display screen support plate.

[0088] Please see Figure 6 In some of these examples, step S10 specifically includes:

[0089] Step S11: Provide alloy raw materials, which are titanium alloys or aluminum alloys;

[0090] Step S12: The alloy raw material is hot-rolled to obtain hot-rolled sheet material;

[0091] Step S13: The hot-rolled sheet is subjected to cold rolling to obtain a cold-rolled sheet.

[0092] The titanium alloy may be, but is not limited to, one or more of TA1 titanium alloy, TA2 titanium alloy, TA3 titanium alloy, TA4 titanium alloy, TC5 titanium alloy, TA7 titanium alloy, and TC4 titanium alloy. Preferably, TA4 titanium alloy is selected. The aluminum alloy may be, but is not limited to, one or more of 2-series aluminum alloy, 5-series aluminum alloy, 6-series aluminum alloy, and 7-series aluminum alloy. Preferably, 7-series aluminum alloy is selected.

[0093] In some examples, the alloy raw material is a titanium alloy, and in step S12, the thickness of the hot-rolled sheet obtained by hot rolling is 2mm to 5mm, specifically, for example, 2mm, 2.5mm, 3mm, 3.5mm, 4mm, 4.5mm, 5mm, etc. In some examples, in step S12, the thickness of the cold-rolled sheet is 0.1mm to 0.15mm, specifically, for example, 0.1mm, 0.11mm, 0.12mm, 0.13mm, 0.14mm, 0.15mm, etc.

[0094] In some examples, the alloy raw material is aluminum alloy, and in step S12, the thickness of the hot-rolled sheet obtained by hot rolling is 1mm to 5mm, specifically, for example, 1mm, 2mm, 2.5mm, 3mm, 3.5mm, 4mm, 4.5mm, 5mm, etc. In some examples, in step S12, the thickness of the cold-rolled sheet is 0.04mm to 0.15mm, specifically, for example, 0.05mm, 0.1mm, 0.11mm, 0.12mm, 0.13mm, 0.14mm, 0.15mm, etc.

[0095] In some of these examples, step S10 may also include:

[0096] Step S14: Cut the cold-rolled sheet into slabs to obtain slab sheets.

[0097] The size of the segmented sheet is set according to the size of the display screen. For example, a large cold-rolled sheet can be divided into multiple segmented sheets of any size from 1 to 10 inches.

[0098] In some of these examples, step S10 may also include:

[0099] Step S15: The segmented sheet is leveled to obtain a leveled sheet.

[0100] Flattened sheets offer high flatness, optimize product appearance, and facilitate subsequent pretreatment, electroplating, and other processes.

[0101] In some of these examples, step S10 may also include:

[0102] Step S16: Make multiple openings on the flat sheet to obtain an open sheet.

[0103] For example, the alloy sheet includes a first folded area, a bending area, and a second folded area. The bending area is located between the first and second folded areas, and multiple openings are formed in the bending area. The multiple openings serve to reduce the stiffness of the bending area and reduce stress concentration.

[0104] In some of these examples, the method of creating multiple openings includes the following steps:

[0105] Step S161: Coat the surface of the alloy sheet with a photoresist layer;

[0106] Step S162: Expose and develop the photoresist layer according to the designed pattern to form etched openings on the photoresist layer.

[0107] Step S163: Etch the surface of the alloy sheet through the etching opening;

[0108] Step S164: Remove the remaining photoresist.

[0109] In step S161, the drying temperature of the photoresist layer is, for example, 80°C to 140°C.

[0110] In step S162, the pattern plate can be exposed on a double-sided exposure machine according to the design, developed on a dedicated developing machine, and dried at 150℃~270℃.

[0111] In step S163, etching is performed, for example, by chemical etching. The etching solution used may be, for example, an etching solution composed of a measured amount of sulfuric acid, nitric acid, phosphoric acid, or other compounds; an etching solution composed of an aqueous ammonia solution of a certain concentration; an etching solution composed of hydrofluoric acid and hydrochloric acid as oxidants; or an aqueous solution composed of hydroiodic acid and boric acid.

[0112] In step S164, a 10% sodium hydroxide aqueous solution can be used for immersion at a temperature of 80°C to 100°C until all the unetched photoresist is removed, and then the photoresist is dried in a dryer at 100°C to 150°C.

[0113] In step S20, the pretreatment of the alloy sheet surface may be, for example, one or more of sandblasting, etching and activation treatments.

[0114] The surfaces of the alloy sheet to be pretreated can be just one surface or multiple surfaces, such as all surfaces. For example, one or more surfaces of the alloy sheet to which a rigid reinforcing layer is to be formed may be pretreated. When pretreating different surfaces, the specific treatment methods can be the same or different. The area to be pretreated on a surface can be a portion of that surface or all of that surface.

[0115] Please see Figure 7 In some of these examples, step S20 specifically includes:

[0116] Step S21, sandblasting treatment;

[0117] Step S22, etching treatment;

[0118] Step S23, activation treatment.

[0119] In step S21, by sandblasting the surface of the alloy sheet, part of the oxide layer on the surface of the alloy sheet can be removed, thereby improving the adhesion between the subsequently formed coating and the titanium alloy or aluminum alloy base.

[0120] It is understandable that in other examples, the surface of the alloy sheet may not be sandblasted, or the pretreatment may only involve sandblasting.

[0121] In step S22, by etching the surface of the alloy sheet, the oxide layer on the surface of the alloy sheet can be removed, improving the adhesion between the subsequently formed coating and the titanium alloy or aluminum alloy base. Performing sandblasting and etching treatments sequentially on the alloy sheet can better remove the oxide layer from its surface.

[0122] The etching solution can be a mixture of hydrofluoric acid and nitric acid of a certain concentration and ratio. Etch the titanium alloy at room temperature until red fumes are emitted, at which point the etching process is complete. Then, clean the surface of the alloy sheet with running water to remove any remaining etching agent.

[0123] It is understandable that in other examples, the surface of the alloy sheet may not be etched, or the pretreatment may only involve etching.

[0124] In step S23, for titanium alloy sheets, an activation treatment is performed on the surface of the alloy sheet to form a temporary titanium-fluorine film. This film prevents further oxidation of the alloy sheet, thereby improving the adhesion between the subsequent coating and the alloy sheet. For aluminum alloy sheets, an acid such as dilute nitric acid can be used to activate the surface, removing the oxide film and thus improving the adhesion between the subsequent coating and the alloy sheet.

[0125] It is understandable that in other examples, the surface of the alloy sheet may not be activated, or the pretreatment may only involve activation.

[0126] It is understood that in other examples, the pretreatment is not limited to the treatments described above. Furthermore, pretreatment of the alloy sheet may not be necessary.

[0127] In step S30, the substrate layer is nickel-plated to obtain a nickel-plated product. In step S40, the nickel-plated product is hard-chrome-plated to obtain a hard-chrome-plated product. Since the nickel layer has better adhesion to the hard-chrome layer and the substrate layer, the adhesion between the hard-chrome layer and the substrate layer can be improved by adding a nickel layer.

[0128] In some of these examples, the hard chrome plating process includes the following steps:

[0129] The substrate layer is connected to an electric current, and the surface on which the hard chromium layer is to be formed is immersed in a chromium-containing electroplating solution for electroplating.

[0130] The chromium-containing electroplating solution can be a standard chromium plating solution, which contains chromium anhydride at a concentration of 220 g / L to 260 g / L and sulfuric acid at a concentration of 2 g / L to 3 g / L. Specific concentrations of chromium anhydride include, for example, 220 g / L, 230 g / L, 240 g / L, 250 g / L, and 260 g / L. Specific concentrations of sulfuric acid include, for example, 2 g / L, 2.2 g / L, 2.4 g / L, 2.6 g / L, 2.8 g / L, and 3 g / L.

[0131] During hard chrome plating, the temperature of the chromium-containing electroplating solution is 55℃~65℃, specifically 55℃, 57℃, 59℃, 61℃, 63℃, and 65℃. The current density is 15A / dm³. 2 ~30A / dm 2 For example, 15A / dm 2 18A / dm 2 21A / dm 2 24A / dm 2 27A / dm 2 30A / dm 2 The thickness of the coating can be controlled by adjusting the electroplating time. Generally, it takes about 5 minutes to deposit a 1μm coating.

[0132] In some of these examples, both support surfaces of the substrate layer are directly plated with hard chrome to form a hard chrome layer.

[0133] For example, such as Figure 1As shown in Example 1, a first rigid reinforcement layer 12 is formed on the first support surface 111 of the substrate layer 11 by a hard chrome plating process. The first rigid reinforcement layer 12 is directly formed on the first support surface 111, that is, the first rigid reinforcement layer 12 is in direct contact with the first support surface 111. A second rigid reinforcement layer 13 is formed on the second support surface 112 of the substrate layer 11 by a hard chrome plating process. The second rigid reinforcement layer 13 is directly formed on the second support surface 112, that is, the second rigid reinforcement layer 13 is in direct contact with the second support surface 112.

[0134] In some of these examples, hard chrome plating is performed only on one of the support surfaces of the substrate layer to form a rigid reinforcement layer.

[0135] For example, such as Figure 2 As shown, in Example 2, a rigid reinforcement layer 22 is formed on the first support surface 211 of the substrate layer 21 by a hard chrome plating process. The rigid reinforcement layer 22 is formed directly on the first support surface 211, that is, the rigid reinforcement layer 22 is in direct contact with the first support surface 211.

[0136] Before hard chrome plating, a bonding reinforcement layer can be formed on the corresponding support surface. For example, nickel plating can be performed to form a nickel layer, and then hard chrome plating can be performed on the nickel layer to form a rigid reinforcement layer. Since the nickel layer has better adhesion to the rigid reinforcement layer and the substrate layer, the adhesion between the rigid reinforcement layer and the substrate layer can be improved by setting a nickel layer.

[0137] In some of these examples, before forming the first rigid reinforcement layer, a first nickel layer is formed by nickel plating on the first support surface, and the first rigid reinforcement layer is formed on the first nickel layer; before forming the second rigid reinforcement layer, a second nickel layer is formed by nickel plating on the second support surface, and the second rigid reinforcement layer is formed on the second nickel layer.

[0138] For example, such as Figure 3 As shown in Example 3, nickel plating is first performed on the two supporting surfaces of the substrate layer 31 to form a first nickel layer 34 and a second nickel layer 35, respectively. Then, a first rigid reinforcement layer 32 is formed on the first nickel layer 34 by hard chrome plating, and a second rigid reinforcement layer 33 is formed on the second nickel layer 35 by hard chrome plating. That is, the first nickel layer 34 is in direct contact with the corresponding supporting surface of the substrate layer 31, the first rigid reinforcement layer 32 is in direct contact with the first nickel layer 34, and the second rigid reinforcement layer 33 is in direct contact with the second nickel layer 35.

[0139] In some examples, the matrix layer may also have a rigid reinforcement layer directly placed on one of the support surfaces and an indirect rigid reinforcement layer placed on the other support surface. For example, as... Figure 4As shown, in Example 4, a nickel layer 44 is formed by nickel plating on the first support surface 411 of the substrate layer 41, and then a first rigid reinforcement layer 42 is formed on the nickel layer 44 by hard chrome plating. On the second support surface 412, a second rigid reinforcement layer 43 is formed directly on the second support surface 412 by hard chrome plating.

[0140] In some examples, a rigid reinforcement layer is formed only on one of the first and second support surfaces of the substrate layer. Prior to forming the rigid reinforcement layer, a nickel layer is formed on the corresponding support surface through nickel plating, and the rigid reinforcement layer is formed on top of this nickel layer. In these examples, the rigid reinforcement layer is in direct contact with the corresponding support surface of the substrate layer, and the rigid reinforcement layer is in direct contact with the rigid reinforcement layer.

[0141] It is understandable that in other examples, nickel plating on the substrate layer may not be necessary.

[0142] Please see Figure 9 In some of these examples, step S50 specifically includes:

[0143] Step S51, hydrogen removal treatment.

[0144] Step S52, heat treatment.

[0145] In step S51, hydrogen is removed from the hard chrome plated product by performing a hydrogen removal treatment, thus preventing hydrogen from penetrating and reducing the product's fatigue strength, mechanical properties, and the bonding strength of the plating layer.

[0146] It is understandable that in other examples, hydrogen removal treatment may not be performed on hard chrome plated products, or only hydrogen removal treatment may be performed in the post-treatment.

[0147] In step S52, by heat-treating the hard chrome plated product, nickel atoms in the nickel layer can diffuse into the substrate layer, thereby improving the adhesion between the substrate layer and the plating layer.

[0148] In some of these examples, the heat treatment includes the following steps:

[0149] In a vacuum environment, the hard chrome plated product is heated to 650-850℃ and held for 3-5 hours.

[0150] After the heat preservation time is over, the hard chrome plated products are air cooled with the furnace. Before the furnace temperature drops to 200°C, the vacuum in the furnace chamber is maintained. When the furnace temperature drops below 200°C, the vacuum is broken and the parts are removed.

[0151] It is understandable that in other examples, hard chrome plated products may not be heat-treated, or post-treatment may only involve heat treatment.

[0152] It is understood that in other examples, post-processing is not limited to the processes described above. Furthermore, post-processing may not be performed on hard chrome plated products.

[0153] Please see Figure 10 Another embodiment of the method 60 for preparing a display support plate includes the following steps:

[0154] Step S100: Obtain alloy sheet, wherein the alloy sheet is a titanium alloy sheet;

[0155] Step S200: Nitriding treatment is performed on the alloy sheet.

[0156] The preparation method of the alloy sheet in step S100 can refer to step S10 in preparation method 50.

[0157] In step S200, the nitriding treatment can be, but is not limited to, at least one of salt bath nitriding, gas nitriding, and plasma nitriding.

[0158] In some of these examples, the steps of salt bath nitriding include:

[0159] The workpiece is subjected to a salt bath with cyanide at 700℃~900℃ for 1h~3h.

[0160] The cyanide salt is, for example, one or more of sodium cyanide, potassium cyanide, etc.

[0161] During the salt bath nitriding process, nitrogen, carbon, and a very small amount of oxygen diffuse into the alloy surface, forming a diffusion layer with interstitial atom solid solution reinforcement.

[0162] In some of these examples, the steps of the gas nitriding process include:

[0163] Place the workpiece in ammonia or nitrogen gas at atmospheric pressure at 800℃~1000℃; or place the workpiece in ammonia gas at 1.1MPa~1.3MPa at 800℃~1000℃.

[0164] In some of these examples, the steps of plasma nitriding include:

[0165] Nitrogen-containing gas is decomposed and ionized into nitrogen ions, which are then bombarded on the surface of the workpiece under the action of an electric field.

[0166] Among them, nitrogen-containing gases include, for example, ammonia, nitrogen, a mixture of ammonia and hydrogen, and a mixture of nitrogen and hydrogen.

[0167] During plasma nitriding, the sputtering effect caused by nitrogen ion bombardment effectively removes the oxide film on the alloy surface, thus activating the surface. Simultaneously, particle bombardment also creates crystal defects on the alloy surface, such as vacancies and dislocations. The combined effect of these two factors promotes nitrogen absorption on the alloy surface, thereby increasing the nitriding rate.

[0168] Furthermore, the present invention also provides a display screen assembly, including a display screen support plate of any of the above examples, and a display module stacked with the display screen support plate.

[0169] The aforementioned display assembly includes the display support plate of any of the above examples, and thus has the corresponding technical features and can achieve the corresponding technical effects.

[0170] Furthermore, the present invention also provides an electronic device, including a housing, a circuit board, and the aforementioned display assembly, wherein the display assembly and the housing form a receiving space, and the circuit board is disposed within the receiving space.

[0171] The aforementioned electronic device includes the aforementioned display screen assembly, and therefore possesses the corresponding technical features and is able to achieve the corresponding technical effects.

[0172] It is understood that the specific type of electronic device of the present invention is not particularly limited, and those skilled in the art can choose flexibly according to the actual situation. For example, it can be a mobile phone, smartwatch, handheld computer or laptop computer, etc.

[0173] The following description, in conjunction with specific embodiments and comparative examples, further illustrates the present invention, but the invention is not limited to the specific embodiments described below.

[0174] Example 1

[0175] Example 1 provides a display screen support plate and its manufacturing method, the manufacturing method including the following steps:

[0176] Step S1: Prepare titanium alloy sheets. TA4 titanium alloy raw material is provided, first hot-rolled to a thickness of 3 mm, then cold-rolled to a thickness of 0.1 mm, and then cut and leveled to obtain titanium alloy sheets.

[0177] Step S2 involves pre-treating the surface of the titanium alloy sheet. The pre-treatment includes sequential etching, sandblasting, immersion etching, and activation treatment to obtain the substrate layer.

[0178] Step S3: The first and second support surfaces of the substrate layer are nickel-plated to form a first nickel layer and a second nickel layer, resulting in a nickel-plated product.

[0179] Step S4: Hard chrome plating is performed on the first nickel layer and the second nickel layer of the nickel-plated product to form a first rigid reinforcement layer and a second rigid reinforcement layer, resulting in a hard chrome-plated product. The total thickness of the first nickel layer and the first rigid reinforcement layer thereon is 0.01 mm, and the total thickness of the second nickel layer and the second rigid reinforcement layer thereon is 0.01 mm.

[0180] Step S5: Post-processing is performed on the hard chrome plated product. The post-processing includes hydrogen removal and heat treatment performed sequentially to obtain the display screen support plate.

[0181] Examples 2-5

[0182] The preparation methods of the display support plates in Examples 2 to 5 are basically the same as those in Example 1, except that the thickness of the substrate layer and the coating layer are different, as shown in Table 1.

[0183] Example 6

[0184] Example 6 provides a display screen support plate and its manufacturing method, the manufacturing method including the following steps:

[0185] Step S1: Prepare aluminum alloy sheets. Provide 7-series aluminum alloy raw materials, first hot-roll to a thickness of 3 mm, then cold-roll to a thickness of 0.1 mm, and after cutting, slicing, and leveling, obtain titanium alloy sheets.

[0186] Step S2 involves pre-treating the surface of the titanium alloy sheet. The pre-treatment includes sequential etching, sandblasting, immersion etching, and activation treatment to obtain the substrate layer.

[0187] Step S3: The first and second support surfaces of the substrate layer are nickel-plated to form a first nickel layer and a second nickel layer, resulting in a nickel-plated product.

[0188] Step S4: Hard chrome plating is performed on the first nickel layer and the second nickel layer of the nickel-plated product to form a first rigid reinforcement layer and a second rigid reinforcement layer, resulting in a hard chrome-plated product. The total thickness of the first nickel layer and the first rigid reinforcement layer thereon is 0.01 mm, and the total thickness of the second nickel layer and the second rigid reinforcement layer thereon is 0.01 mm.

[0189] Step S5: Post-processing is performed on the hard chrome plated product. The post-processing includes hydrogen removal and heat treatment performed sequentially to obtain the display screen support plate.

[0190] Examples 7-9

[0191] The preparation methods of the display support plates in Examples 7 to 9 are basically the same as those in Example 6, except that the thickness of the substrate layer and the coating layer are different, as shown in Table 1.

[0192] Comparative Example 1

[0193] The display support plate provided in Comparative Example 1 is made of pure TA4 titanium alloy sheet with a thickness of 0.12mm.

[0194] Comparative Example 2

[0195] The display support plate provided in Comparative Example 2 is made of pure 7-series aluminum alloy sheet with a thickness of 0.12mm.

[0196] The overall density and elastic modulus of the display support plates provided in Examples 1-9 and Comparative Examples 1-2 are shown in Table 1.

[0197] Table 1. Density and elastic modulus of the display support plates in Examples 1-9 and Comparative Examples 1-2

[0198]

[0199] Example 10

[0200] Example 10 provides a display screen support plate and its manufacturing method, the manufacturing method including the following steps:

[0201] Step S1: Prepare titanium alloy sheets. TA4 titanium alloy raw material is provided, first hot-rolled to a thickness of 3 mm, then cold-rolled to a thickness of 0.1 mm, and then cut and leveled to obtain titanium alloy sheets.

[0202] Step S2 involves subjecting the titanium alloy sheet to a salt bath in a mixed salt solution of sodium cyanide and potassium cyanide at 800°C to form a nitriding layer, thereby obtaining the titanium alloy substrate layer and the first and second rigid reinforcing layers on both sides. The thickness of the substrate layer is 0.08 mm, and the thickness of both the first and second rigid reinforcing layers is 0.02 mm.

[0203] Examples 11-13

[0204] The preparation methods of the display support plates in Examples 11-13 are basically the same as those in Example 10, except that the thicknesses of the substrate layer and the nitriding layer are different, as shown in Table 2.

[0205] Table 2. Density and elastic modulus of the display support plate in Examples 10-13

[0206]

[0207] Comparative Example 4

[0208] The display support plate provided in Comparative Example 4 is made of stainless steel.

[0209] Comparative Example 5

[0210] The display support plate provided in Comparative Example 5 is made of carbon fiber.

[0211] Comparative Example 6

[0212] The display support plate provided in Comparative Example 6 is a titanium alloy / stainless steel composite plate, that is, composite stainless steel sheets are rolled on both sides of a titanium alloy sheet. The thickness of the titanium alloy sheet is 0.086 mm, and the thickness of the stainless steel sheet is 0.022 mm.

[0213] Comparative Example 7

[0214] The display support plate provided in Comparative Example 7 is a titanium alloy / copper composite plate, that is, composite copper sheets are rolled on both sides of a titanium alloy sheet. The thickness of the titanium alloy sheet is 0.086 mm, and the thickness of the copper sheet is 0.022 mm.

[0215] The physical parameters and cost evaluation of the display support plates provided in Examples 5 and Comparative Examples 4 to 7 are shown in Table 3.

[0216] Table 3. Physical parameters and cost evaluation of the display support plates provided in Examples 5 and Comparative Examples 4-7

[0217]

[0218] In the cost evaluation, the more "+" signs there are, the higher the cost. Carbon fiber sheets themselves are expensive and non-conductive, requiring an additional conductive layer, which significantly increases costs.

[0219] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0220] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A display screen support plate, characterized in that The base layer has a first support surface and a second support surface arranged oppositely, the first support surface is provided with a first rigid reinforcing layer, and the second support surface is provided with a second rigid reinforcing layer; The base layer is a titanium alloy layer or an aluminum alloy layer, the first rigid reinforcing layer and the second rigid reinforcing layer are hard chromium layers formed by hard chromium plating treatment, a first connecting reinforcing layer is arranged between the first support surface and the first rigid reinforcing layer, the first connecting reinforcing layer is a nickel layer, and / or a second connecting reinforcing layer is arranged between the second support surface and the second rigid reinforcing layer, the second connecting reinforcing layer is a nickel layer; or The base layer is a titanium alloy layer, and the first rigid reinforcing layer and the second rigid reinforcing layer are nitriding layers.

2. The display screen support plate of claim 1, wherein, The overall thickness of the display screen support plate is 0.1mm-0.17mm. The thickness of the titanium alloy layer is 0.05mm-0.12mm, or the thickness of the aluminum alloy layer is 0.04mm-0.15mm.

3. The display screen support plate of claim 2, wherein, The thickness of the hard chromium layer is 0.003mm-0.02mm.

4. The display screen support plate of claim 2, wherein, The thickness of the nitriding layer is 0.01mm-0.05mm.

5. The display screen support plate of claim 1, wherein, The material of the titanium alloy layer is selected from at least one of TA1 titanium alloy, TA2 titanium alloy, TA3 titanium alloy, TA4 titanium alloy, TC5 titanium alloy, TA7 titanium alloy and TC4 titanium alloy; or The material of the aluminum alloy layer is selected from at least one of 2 series aluminum alloy, 5 series aluminum alloy, 6 series aluminum alloy and 7 series aluminum alloy.

6. A display screen support plate according to any one of claims 1 to 5, wherein, A plurality of openings are arranged on the display screen support plate.

7. A method of making a display screen support plate, characterized by The method comprises the following steps: A base layer is provided, the base layer has a first support surface and a second support surface arranged oppositely; A first rigid reinforcing layer is made on the first support surface, and a second rigid reinforcing layer is made on the second support surface of the base layer; The base layer is a titanium alloy layer or an aluminum alloy layer, the first rigid reinforcing layer and the second rigid reinforcing layer are hard chromium layers formed by hard chromium plating treatment, a first connecting reinforcing layer is formed on the first support surface before the first rigid reinforcing layer is formed, and the first rigid reinforcing layer is formed on the first connecting reinforcing layer; and / or a second connecting reinforcing layer is formed on the second support surface before the second rigid reinforcing layer is formed, and the second rigid reinforcing layer is formed on the second connecting reinforcing layer; or The base layer is a titanium alloy layer, and the first rigid reinforcing layer and the second rigid reinforcing layer are nitriding layers.

8. The method for preparing the display screen support plate as described in claim 7, characterized in that, The hard chromium layer is formed by hard chromium plating treatment, and the process parameters of the hard chromium plating treatment include: The chromium-containing plating solution used contains chromic anhydride at a concentration of 220 g / L to 260 g / L and sulfuric acid at a concentration of 2 g / L to 3 g / L, has a temperature of 55°C to 65°C, and an electric current density of 15 A / dm 2 ~30 A / dm 2 .

9. The method of claim 7, wherein the display support plate is prepared by the steps of: The preparation method of the base layer comprises the following steps: ​ An alloy sheet is obtained, the alloy sheet is a titanium alloy sheet or an aluminum alloy sheet; At least one surface of the alloy sheet, which is prepared to form the hard chromium layer, is pretreated; The pretreatment comprises one or more of sand blasting treatment, immersion etching treatment and activation treatment.

10. The method of claim 9, wherein the display support plate is prepared by the steps of: The pretreatment comprises the sand blasting treatment, the immersion etching treatment and the activation treatment in sequence. ​ 11. The method of claim 7, wherein the display support plate is prepared by the steps of: The preparation method of the display screen support plate further comprises the following steps: ​ The display screen support plate with the hard chromium layer is post-treated; The post-treatment comprises at least one of a hydrogen removal treatment and a heat treatment.

12. The method of claim 11, wherein the display support plate is prepared by the steps of: The heat treatment comprises the following steps: ​ The display screen support plate is heated to 650-850 DEG C in a vacuum environment, and is kept for 3-5 hours.

13. The method of claim 7, wherein the display support plate is made of a material selected from the group consisting of: glass, acrylic, and polycarbonate. The nitriding treatment is selected from at least one of a salt bath nitriding treatment, a gas nitriding treatment and a plasma nitriding treatment.

14. The method of claim 13, wherein the display support plate is prepared by the steps of: The nitriding treatment satisfies at least one of the following characteristics: ​ (1) The nitriding treatment comprises the salt bath nitriding treatment, and the steps of the salt bath nitriding treatment comprise: The workpiece is subjected to salt bath at 700-900 DEG C for 1-3 hours by using cyanide salt; (2) The nitriding treatment comprises the gas nitriding treatment, and the steps of the gas nitriding treatment comprise: The workpiece is placed in ammonia or nitrogen at normal pressure at 800-1000 DEG C; or The workpiece is placed in ammonia at 1.1-1.3 MPa at 800-1000 DEG C; (3) The nitriding treatment comprises the plasma nitriding treatment, and the steps of the plasma nitriding treatment comprise: Nitrogen-containing gas is decomposed and ionized into nitrogen ions, and the nitrogen ions are bombarded on the surface of the workpiece under the action of an electric field.

15. The method of claim 7, wherein the display support plate is made of a material selected from the group consisting of: aluminum, stainless steel, and titanium. A plurality of openings are formed on the base layer.

16. The method of claim 15, wherein the display support plate is prepared by the steps of: The method for forming the plurality of openings comprises the following steps: ​ A photoresist layer is coated on the surface of the base layer; The photoresist layer is exposed and developed according to a designed pattern to form etching openings on the photoresist layer; The base layer is etched through the etching openings; Remaining photoresist is removed.

17. A display screen assembly, characterized by The display module is installed on the display screen support plate.

18. An electronic device, comprising: The display module is installed on the display screen support plate.

Citation Information

Patent Citations

  • Flexible screen supporting piece, flexible screen module and electronic equipment

    CN216353073U