Cleaning control methods and cleaning systems for cleaning systems

Abstract

This invention discloses a cleaning control method and a cleaning system for a cleaning system. The cleaning system includes cleaning equipment and a cleaning base station. The cleaning base station includes a base station base, a cleaning component, a limiting component, a water supply component, and a drainage component. The base station base forms a cleaning tank and a filter tank. The cleaning control method includes: controlling the cleaning equipment to move to the cleaning base station, with the cleaning component positioned in the cleaning tank; controlling the limiting component to fix the cleaning component in a first cleaning state relative to the base station base station base, allowing the cleaning component to move relative to the cleaning component for cleaning; controlling the limiting component to disengage from the cleaning component, placing the cleaning component in a second cleaning state where it can move to clean the cleaning tank, and allowing dirt in the cleaning tank to flow into the filter tank for filtration under the agitation of the cleaning component. According to the cleaning control method of this invention, the level of automation is high, which can significantly reduce user operations during the use of the cleaning system and improve the user experience.

Description

Technical Field

[0001] This invention relates to the field of cleaning appliance technology, and in particular to a cleaning control method and a cleaning system for a cleaning system. Background Technology

[0002] As people's living standards improve, automatic cleaning equipment such as cleaning robots are gradually entering households, saving people a lot of energy on housework. Furthermore, with the rapid development of automatic cleaning equipment, cleaning robots with both sweeping and mopping functions are being chosen by more and more users. During the operation of cleaning robots with sweeping and mopping functions, a cleaning base station is usually used to clean the mop to improve the cleaning ability of the cleaning robot. The cleaning base station also needs to have a self-cleaning function. However, the self-cleaning effect of the cleaning base station in related technologies and the way it handles the dirt generated during the cleaning process are not good. This leads to a large amount of damp dirt accumulating in the cleaning base station, which easily breeds mud and bacteria. At the same time, it requires users to clean the dirt frequently, resulting in a poor user experience. Summary of the Invention

[0003] This invention proposes a cleaning control method for a cleaning system. The cleaning control method can automatically filter solid dirt generated during the cleaning process. At the same time, the cleaning system has a high level of automation, which can effectively reduce the user's operation during the use of the cleaning system and improve the user experience of the cleaning system.

[0004] The present invention also proposes a cleaning system that operates according to the above-described cleaning control method.

[0005] According to an embodiment of the present invention, a cleaning control method for a cleaning system includes a cleaning device and a cleaning base station. The cleaning base station includes a base station base, a cleaning component, a limiting component, a water supply component, and a drainage component. The base station base forms a cleaning tank and a filter tank. The cleaning component is movably disposed in the cleaning tank. The water supply component supplies water to the cleaning tank, and the drainage component discharges wastewater generated in the cleaning tank. The cleaning control method includes: controlling the cleaning device to move to the cleaning base station, with the cleaning device's wiping component located in the cleaning tank; controlling the limiting component to limit the cleaning component to a first cleaning state so that the cleaning component is fixed relative to the base station base, and the cleaning device's wiping component moves relative to the cleaning component to perform cleaning; controlling the limiting component to disengage from the cleaning component, with the cleaning component in a second cleaning state so that the cleaning component is movable, and the cleaning component moves to clean the cleaning tank, wherein dirt in the cleaning tank is adapted to flow into the filter tank for filtration under the agitation of the cleaning component.

[0006] According to the cleaning control method for a cleaning system of the present invention, the filter tank can effectively separate sewage and solid waste, facilitating the classification and treatment of different types of waste and effectively preventing blockage of sewage pipes. By controlling the cleaning component to switch between the first cleaning state and the second cleaning state through the limiting component, the cleaning base station can switch between the cleaning mop and the cleaning tank modes, which can improve the automation level of the cleaning system, thereby reducing the user's operation during the use of the cleaning system and improving the user experience of the cleaning system.

[0007] According to some embodiments of the present invention, controlling the cleaning device to move to the cleaning base station includes: the mopping component being located on and in contact with the cleaning component; the mopping component of the cleaning device moving relative to the cleaning component to clean includes: controlling the mopping component to rotate and rub against the cleaning component to clean the mopping component; the cleaning component moving to clean the cleaning tank includes: controlling the mopping component to rotate to drive the cleaning component to rotate.

[0008] According to some embodiments of the present invention, the rotational speed of the mopping member in the second cleaning state is less than the rotational speed of the mopping member in the first cleaning state.

[0009] According to some embodiments of the present invention, after the cleaning component moves to clean the cleaning tank, the method further includes: controlling the mopping component to disengage from the cleaning component, and controlling the mopping component to rotate; or, controlling the mopping component to rotate and driving the cleaning component to rotate.

[0010] According to some embodiments of the present invention, the movement of the cleaning component to clean the cleaning tank includes: controlling the cleaning component to rotate at a uniform speed; or, controlling the cleaning component to rotate intermittently; or, controlling the cleaning component to rotate alternately along different rotation directions.

[0011] According to some embodiments of the present invention, after the cleaning component moves to clean the cleaning tank, the method further includes controlling the rotation of the mopping component.

[0012] According to some embodiments of the present invention, the cleaning system further includes a drying and collecting component, which is disposed on the base station base and includes a drying component and a collecting component. After the cleaning component moves to clean the cleaning tank, the system further includes: controlling the drying component to dry the mopping component and the solid dirt in the filter tank; and controlling the collecting component to collect the dried solid dirt in the filter tank.

[0013] According to some embodiments of the present invention, the drying temperature for drying the mop and the solid dirt in the filter tank by the drying assembly is T, and the drying time is t, where T ranges from 40 to 80°C and t ranges from 1.5h to 2.5h.

[0014] According to some embodiments of the present invention, the collection assembly includes a suction nozzle movably located within the filter tank, wherein solid contaminants within the filter tank are adapted to be drawn into the collection assembly through the suction nozzle; the collection assembly collects solid contaminants within the filter tank by: activating a collection fan of the collection assembly to create a negative pressure at the suction nozzle; and controlling the movement of the suction nozzle to cause the scraping wall of the suction nozzle to scrape the bottom wall of the filter tank, thereby separating the solid contaminants from the bottom wall of the filter tank.

[0015] According to some embodiments of the present invention, the suction nozzle is adapted to reciprocate along a suction direction parallel to the suction nozzle.

[0016] According to some embodiments of the present invention, the suction nozzle constitutes the limiting member; controlling the cleaning device to move to the cleaning base station includes: the mopping member being located on and in contact with the cleaning member; controlling the limiting member to limit the cleaning member includes: controlling the suction nozzle to be located in the limiting position and cooperating with the cleaning member so that the cleaning member is in a first cleaning state, controlling the mopping member to rotate and rub against the cleaning member to clean the mopping member; controlling the limiting member to disengage from the cleaning member includes: controlling the suction nozzle to be located in a non-limiting position and disengaging from the cleaning member so that the cleaning member is in a second cleaning state, controlling the mopping member to rotate to drive the cleaning member to rotate.

[0017] According to some embodiments of the present invention, controlling the mopping member to rotate and rub against the cleaning member to clean the mopping member includes: an initial cleaning phase and a stable cleaning phase following the initial phase, wherein the rotational speed of the mopping member in the initial cleaning phase is less than the rotational speed of the mopping member in the stable cleaning phase.

[0018] According to some embodiments of the present invention, in the initial cleaning phase, the rotational speed of the mopping component gradually increases; in the stable cleaning phase, the rotational speed of the mopping component remains constant.

[0019] According to some embodiments of the present invention, the filter tank includes a filter zone and a non-filter zone, the bottom wall of the filter zone is formed with a filter structure, at least a portion of the suction nozzle is located in the filter zone in the restricted position, and the suction nozzle is located in the non-filter zone in the non-restricted position; controlling the drying assembly to dry the mop and the solid dirt in the filter tank includes: controlling the suction nozzle to be located in the non-restricted position.

[0020] According to some embodiments of the present invention, the drying assembly includes a drying duct and a drying fan, the drying duct having a drying duct; the collecting assembly includes a collecting duct and a collecting fan, the collecting duct having a collecting duct; the drying and collecting assembly includes a suction nozzle located within the filter tank and connected to the outlet end of the drying duct and the inlet end of the collecting duct; the suction nozzle is selectively connected to one of the drying duct and the collecting duct; controlling the drying assembly to dry the mop and solid waste in the filter tank includes: controlling the suction nozzle to connect to the drying duct, and controlling the drying fan to turn on and the collecting fan to turn off; controlling the collecting assembly to collect solid waste in the filter tank includes: controlling the suction nozzle to connect to the collecting duct, and controlling the collecting fan to turn on and the drying fan to turn off.

[0021] According to some embodiments of the present invention, the cleaning device's mopping component moves relative to the cleaning component to perform cleaning, including: controlling a water supply assembly to supply water to the cleaning tank; after the cleaning component moves to clean the cleaning tank, the device further includes: controlling the water supply assembly to stop supplying water to the cleaning tank.

[0022] A cleaning system according to an embodiment of the present invention includes: a cleaning base station, including a first control module, the first control module being used to control the cleaning base station; and a cleaning device, including a second control module, the second control module being used to control the cleaning device; wherein the cleaning device is adapted to cooperate with the cleaning base station, and the first control module and the second control module are communicatively connected to jointly control the cleaning system to operate according to the above-described cleaning control method.

[0023] The cleaning system according to embodiments of the present invention facilitates the classification and treatment of different types of dirt, effectively avoids clogging of sewage pipes, and enables the cleaning base station to switch between two modes—cleaning the mop and cleaning the cleaning tank—by controlling the cleaning component to switch between the first and second cleaning states using a limiting component. This improves the automation level of the cleaning system, thereby reducing the user's operation during the use of the cleaning system and enhancing the user experience.

[0024] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0025] Figure 1 This is a schematic flowchart of a cleaning control method for a cleaning system according to an embodiment of the present invention;

[0026] Figure 2This is a detailed flowchart illustrating a cleaning control method for a cleaning system according to an embodiment of the present invention.

[0027] Figure 3 This is a schematic diagram of a portion of a cleaning base station and a mopping component according to an embodiment of the present invention;

[0028] Figure 4 This is a partial schematic diagram of a clean base station according to an embodiment of the present invention;

[0029] Figure 5 This is a partial exploded view of a clean base station according to an embodiment of the present invention;

[0030] Figure 6 This is a cross-sectional view of a clean base station along the front-to-back direction and passing through the center, according to an embodiment of the present invention.

[0031] Figure 7 yes Figure 6 Enlarged view of region A in the middle;

[0032] Figure 8 This is a schematic diagram of the drying air duct component, the collecting air duct component, the connecting air duct component, and the suction nozzle of a cleaning base station according to an embodiment of the present invention;

[0033] Figure 9 This is a bottom side view of the drying air duct, collecting air duct, connecting air duct, and suction nozzle of a cleaning base station according to an embodiment of the present invention.

[0034] Figure label:

[0035] Clean base station 10;

[0036] Base station base 1;

[0037] Base body 11; cleaning tank 111; connecting notch 112;

[0038] Filter component 12; filter hole 121; filter tank 13; wastewater buffer chamber 14;

[0039] 2. Cleaning component; 3. Suction nozzle; 4. Drain pipe;

[0040] Drying air duct component 5; Drying air duct 51; Collecting air duct component 6; Collecting air duct 61;

[0041] Connecting air duct component 7; First channel 71; Second channel 72; Sliding cavity 73; Drive mechanism 8;

[0042] 20 mop parts. Detailed Implementation

[0043] Embodiments of the present invention are described in detail below. Examples of these embodiments are illustrated in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0044] The following disclosure provides numerous different embodiments or examples for implementing various structures of the invention. To simplify the disclosure, specific examples of components and arrangements are described below. These are merely examples and are not intended to limit the invention. Furthermore, reference numerals and / or letters may be repeated in different examples. Such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed. Additionally, examples of various specific processes and materials are provided in this invention; however, those skilled in the art will recognize the applicability of other processes and / or the use of other materials.

[0045] The cleaning control method for a cleaning system according to an embodiment of the present invention is described below with reference to the accompanying drawings.

[0046] The cleaning system includes cleaning equipment and a cleaning base station 10. The cleaning base station 10 includes a base station base 1, a cleaning component 2, a limiting component, a water supply component, and a drainage component. The base station base 1 forms a cleaning tank 111 and a filter tank 13. The cleaning component 2 is movably disposed within the cleaning tank 111. The water supply component supplies water to the cleaning tank 111, and the drainage component discharges wastewater from the cleaning tank 111 to prevent wastewater from accumulating in the cleaning tank 111 and the filter tank 13. Figures 1-9 As shown, the cleaning control method according to an embodiment of the present invention includes: controlling the cleaning equipment to move to the cleaning base station 10, wherein the mopping component 20 of the cleaning equipment is located in the cleaning tank 111.

[0047] It is understandable that when the cleaning equipment is operating to clean the floor, the mop 20 can be brought into contact with the floor and moved relative to it to perform sweeping and mopping operations. Simultaneously, dust and other dirt on the floor will adhere to the mop 20. Therefore, when a large amount of dirt adhered to the mop 20 affects its sweeping and mopping effect, the cleaning equipment can move to the base station base 1 so that the mop 20 is located in the cleaning tank 111. This allows the cleaning base station 10 to clean the mop 20, restoring its cleanliness. The cleaning equipment can then carry the clean mop 20 to continue sweeping and mopping operations, improving the cleaning effect. Furthermore, with the mop 20 located in the cleaning tank 111, the tank can effectively collect and contain dirt and wastewater that falls off the mop 20 during the cleaning process, thus effectively preventing spillage and pollution.

[0048] In this process, after the cleaning equipment moves to the cleaning base station 10 and the mopping component 20 is located in the cleaning tank 111, the control limiter limits the cleaning component 2 to a first cleaning state so that the cleaning component 2 is fixed relative to the base station base 1. The mopping component 20 of the cleaning equipment moves relative to the cleaning component 2 to perform cleaning. That is, at this time, the cleaning base station is in the mopping component cleaning mode, so that the dirt adhering to the mopping component 20 can be effectively cleaned by the relative movement of the cleaning component 2 and the mopping component 20, so as to restore the cleanliness of the mopping component 20, and at the same time, the cleaning component 2 can effectively ensure the comprehensive cleaning of the mopping component 20.

[0049] The water supplied to the cleaning tank 111 by the water supply component effectively wets the mop 20 located within the tank. The water effectively absorbs and dissolves dust and other dirt on the mop 20, allowing the dirt to detach from the mop 20 along with the water. This significantly improves the cleaning effect of the cleaning base station 10 on the mop 20, enhancing its cleanliness. Furthermore, the continuous supply of water to the cleaning tank 111 allows the mop 20 to be repeatedly rinsed with the water, further enhancing the cleaning effect of the cleaning base station 10 on the mop 20.

[0050] It should be noted that this is only an example to illustrate one type of liquid stored in the water supply component, in order to understand the role of the water supply component in the cleaning process of the mop 20. The water supply component can store clean water, or it can also add water mixed with detergent, disinfectant, etc., to further enhance the cleaning power of the liquid in the water supply component on the mop 20. There are no specific restrictions on the type of liquid stored in the water supply component.

[0051] Furthermore, after the wiping component 20 has finished cleaning, the control limiting component disengages from the cleaning component 2, and the cleaning component 2 is in a second cleaning state, allowing it to move. The movement of the cleaning component 2 cleans the cleaning tank 111, and the dirt in the cleaning tank 111 flows into the filter tank 13 for filtration under the agitation of the cleaning component 2. In other words, the rotation of the cleaning tank 111 relative to itself allows the cleaning tank 111 to be cleaned more effectively. For example, the cleaning component 2 can scrape the solid dirt on the inner wall of the cleaning tank 111, separating it from the inner wall. At the same time, the movement of the cleaning component 2 can better agitate the flow of sewage in the cleaning tank 111, thereby accelerating the speed at which sewage enters the filter tank 13.

[0052] Furthermore, the flowing wastewater in the cleaning tank 111 can effectively carry away solid waste adhering to it, allowing it to flow into the filter tank 13. This prevents solid waste detached from the mop 20 during cleaning from accumulating on the inner wall of the cleaning tank 111, thus ensuring its cleanliness. In other words, the movement of the cleaning component 2 relative to the cleaning tank 111 effectively achieves self-cleaning of the cleaning base station 10, significantly reducing the frequency of user cleaning and improving user experience. Therefore, the cleaning base station 10 can simultaneously perform both cleaning of the mop 20 and self-cleaning of the cleaning tank 111, enhancing the automation level of the cleaning system and reducing user intervention during operation, thus improving the overall user experience.

[0053] The waste in the cleaning tank 111 flows into the filter tank 13 along with the wastewater, effectively preventing wastewater from overflowing from the base station base 1 and polluting the environment. The filter tank 13 effectively intercepts solid particles, hair, and other solid waste carried in the wastewater, thus separating wastewater from solid waste. This facilitates the classification and treatment of different types of waste, improving the cleaning effect of the base station 10 on the waste in the cleaning tank 111. Furthermore, when the drainage component discharges wastewater from the filter tank 13, it effectively prevents solid waste from entering the drainage component and causing blockages, ensuring unobstructed drainage and allowing wastewater to drain smoothly.

[0054] Furthermore, during the cleaning process in the cleaning tank 111, the water supply component supplies water to the cleaning tank 111, which can effectively dilute the sewage concentration in the cleaning tank 111. Simultaneously, the cleaning component 2 can agitate the clean water to repeatedly rinse the inner wall of the cleaning tank 111, further improving the cleaning effect of the cleaning component 2 on the cleaning tank 111. Therefore, by controlling the switching of the cleaning component 2 between the first and second cleaning states using the limiting component, the cleaning base station 10 can switch between the two modes of cleaning the mop and cleaning the cleaning tank, which can significantly simplify the control of the cleaning base station 10. In some embodiments, the movement of the cleaning component 2 can be driven by the movement of the mop 20, i.e., the mop 20 and the cleaning component 2 can be connected by a transmission connection; in other embodiments, the cleaning base station 10 is equipped with a drive motor that is connected to the cleaning component 2 by a transmission connection, so as to drive the cleaning component to rotate.

[0055] According to the cleaning control method of the present invention, the filter tank 13 can effectively separate sewage and solid waste, which facilitates the classification and treatment of different types of waste and can better avoid the blockage of sewage pipes. By controlling the cleaning component 2 to switch between the first cleaning state and the second cleaning state through the limiting component, the cleaning base station 10 can switch between the two modes of cleaning the mop and cleaning the cleaning tank, which can effectively improve the automation level of the cleaning system, thereby reducing the user's operation during the use of the cleaning system and improving the user experience of the cleaning system.

[0056] The water supply component can be a water inlet pipe, with both ends connected to the cleaning tank 111 and an external water source such as a tap water pipe, so that the external water source can directly enter the cleaning tank 111 through the water inlet pipe; the water supply component can also be a water supply tank installed at the cleaning base station 100, with the water supply tank connected to the cleaning tank 111, and the user can manually add water to the water supply tank so that the water in the water supply tank can enter the cleaning tank 111; the water supply component can also include a water inlet pipe and a water supply tank, with both ends of the water inlet pipe connected to an external water source such as a tap water pipe and the water supply tank, and the water supply tank connected to the cleaning tank 111, so that the external water source can automatically add water to the water supply tank. The drainage component can be a drain pipe, with both ends connected to the cleaning tank 111 and the sewer pipe respectively, so that the sewage in the cleaning tank 111 can be directly discharged into the sewer pipe through the drain pipe; the drainage component can also be a sewage tank installed at the cleaning base station 100, with the sewage tank connected to the cleaning tank 111 through the sewage pipe 4, so that the sewage in the cleaning tank 111 can flow into the sewage tank, and the user can manually clean the sewage in the sewage tank; the drainage component can also include a sewage tank and a drain pipe, with both ends connected to the sewage tank and the sewer pipe respectively, so that the sewage tank can be connected to the cleaning tank 111 through the sewage pipe 4, so that the sewage in the sewage tank can be automatically discharged into the sewer through the drain pipe.

[0057] In a specific example, the cleaning base station 100 includes a water supply component and a drainage component. The water supply component is used to supply water to the cleaning tank 111, and the drainage component is used to discharge the sewage generated in the cleaning tank 111. The water supply component and the drainage component together constitute a water supply and drainage module.

[0058] According to some embodiments of the present invention, controlling the movement of the cleaning device to the cleaning base station 10 includes: the mopping component 20 being positioned on and in contact with the cleaning component 2, that is, when cleaning of the mopping component 20 is required, after the cleaning device enters the cleaning base station 10, the mopping component 20 presses against the cleaning component 2. The cleaning of the mopping component 20 relative to the cleaning component 2 includes: controlling the cleaning component 2 to be in a first cleaning state so that the cleaning component 2 is fixed relative to the base station base 1; controlling the mopping component 20 to rotate and rub against the cleaning component 2 to clean the mopping component 20.

[0059] In other words, the cleaning component 2 has a first cleaning state that is fixed relative to the base station base 1. Therefore, when it is necessary to clean the mopping component 20, by controlling the rotation of the mopping component 20 relative to the base station base 1, the mopping component 20 can rotate relative to the cleaning component 2 in the first cleaning state, thereby causing relative rotational friction between the rotating mopping component 20 and the fixed cleaning component 2. The mopping component 20 can be wetted by water injected into the cleaning tank 111 by the water supply assembly, allowing the cleaning component 2 to remove dirt from the mopping component 20 through friction and rubbing against the wetted mopping component 20, thus achieving the cleaning operation of the mopping component 20.

[0060] Furthermore, the movement of the cleaning component 2 to clean the cleaning tank 111 includes: controlling the cleaning component 2 to be in a second cleaning state so that the cleaning component 2 can move, and controlling the wiping component 20 to rotate so as to drive the cleaning component 2 to rotate. That is, the cleaning component 2 also has a second cleaning state in which it can move freely relative to the base station base 1. Therefore, when it is necessary to clean the cleaning tank 111, by controlling the wiping component 20 to rotate relative to the base station base 1, the wiping component 20 can drive the cleaning component 2 to move synchronously with the wiping component 2 in the cleaning tank 111 through the friction between the wiping component 2 and the cleaning component 2. Thus, the cleaning tank 111 can be cleaned by the moving cleaning component 2 and the dirt in the agitated cleaning tank 111 can be flowed into the filter tank 13 for filtration.

[0061] Therefore, the cleaning base station 10 can control the cleaning component 2 to switch between a first cleaning state and a second cleaning state according to the needs of cleaning the mop component 20 or the cleaning tank 111. This can significantly reduce the difficulty of switching between the two modes of cleaning the mop component 20 and cleaning the cleaning tank 111, while also simplifying the cooperation between the mop component 20 and the cleaning component 2, thus simplifying the structure of the cleaning system. In addition, while the mop component 20 is moving the cleaning component 2 in the second cleaning state, it can also shake off the adsorbed liquid by rotating itself, thereby reducing the moisture content in the mop component 20 during the cleaning process in the cleaning tank 111, thus reducing the difficulty of drying the mop component 20 afterwards.

[0062] According to some optional embodiments of the present invention, the rotational speed of the mopping member 20 in the second cleaning state is less than the rotational speed of the mopping member 20 in the first cleaning state. That is, the rotational speed of the mopping member 20 driving the cleaning member 2 in the second cleaning state is less than the rotational speed of the mopping member 20 relative to the cleaning member 2 in the first cleaning state. It can be understood that the faster the rotational speed of the mopping member 20 relative to the cleaning member 2 in the first cleaning state, the more times the cleaning member 2 completely sweeps over the mopping member 20 in the same amount of time, i.e., the higher the cleaning frequency of the cleaning member 2 on the mopping member 20; the faster the rotational speed of the mopping member 20 driving the cleaning member 2 in the second cleaning state, the greater the agitation and impact force of the cleaning member 2 on the sewage in the cleaning tank 111, and the easier it is to generate splashed sewage. Therefore, it can better avoid the mopping member 20 rotating too slowly relative to the cleaning member 2 in the first cleaning state, resulting in too few sweeps of the cleaning member 20. In other words, by increasing the rotational speed of the mopping member 20 relative to the cleaning member 2, the cleaning frequency of the cleaning member 2 on the mopping member 20 can be better increased. At the same time, it can better prevent the mopping component 20 from causing the cleaning component 2, which is in the second cleaning state, to rotate too fast, which would cause the sewage in the cleaning tank 111 to cause secondary pollution to the mopping component 20, so as to ensure the cleaning effect of the cleaning base station 10 on the mopping component 20.

[0063] According to some optional embodiments of the present invention, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes: controlling the mopping member 20 to disengage from the cleaning member 2 and controlling the mopping member 20 to rotate. That is, after the cleaning tank 111 is cleaned, the mopping member 20 is spaced apart from the cleaning member 2 and the mopping member 20 rotates itself. Thus, the rotation of the mopping member 20 can better dissipate the adsorbed water, thereby improving the dryness of the mopping member 20.

[0064] When the mopping component 20 is out of contact with the cleaning component 2 and rotates to shake off water, the drying assembly can dry the mopping component 20 and the solid dirt in the filter tank 13. In other words, when the drying assembly dries the mopping component 20, the mopping component 20 is separated from the cleaning component 2 and rotates itself. Therefore, the rotation of the mopping component 20 effectively shakes off the adsorbed water, thus shortening the drying time of the mopping component 20 and preventing frictional resistance from contact between the mopping component 20 and the cleaning component 2. This also increases the rotational speed of the mopping component 20 and saves energy consumption for driving its rotation, while ensuring uniform drying of different areas of the mopping component 20. In a specific example, the air outlet of the drying component is located on the inner peripheral wall of the cleaning tank 111. Therefore, by rotating the mop 20, every part of the mop 20 in the circumferential direction can circulate through the outlet of the drying component, thereby ensuring that the drying component can dry the mop 20 evenly.

[0065] According to some optional embodiments of the present invention, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes controlling the mopping member 20 to rotate and driving the cleaning member 2 to rotate. That is, after the cleaning tank 111 is cleaned, the mopping member 20 continues to rotate. Thus, the rotation of the mopping member 20 can better dissipate the adsorbed water, thereby improving the dryness of the mopping member 20.

[0066] When the mopping component 20 rotates and drives the cleaning component 2 to rotate and spin water, the drying assembly can dry the solid dirt in the mopping component 20 and the filter tank 13. Thus, the rotation of the mopping component 20 effectively dissipates the adsorbed water, while ensuring uniform drying of different areas on the mopping component 20 by the drying assembly. Furthermore, the synchronous rotation of the cleaning component 2 with the mopping component 20 allows for brushing of the cleaning tank 111, further improving the cleanliness of the cleaning tank 111.

[0067] According to some optional embodiments of the present invention, the movement of the cleaning member 2 to clean the cleaning tank 111 includes controlling the cleaning member 2 to rotate at a constant speed. That is, when the cleaning member 2 cleans the cleaning tank 111, the rotational speed of the cleaning member 2 relative to the cleaning tank 111 remains constant, so that the cleaning member 2 can clean the cleaning tank 111 at a constant speed and agitate the dirt in the cleaning tank 111 at a constant speed into the filter tank 13. This can improve the stability of the rotation of the cleaning member 2 and the control logic is simple.

[0068] According to some optional embodiments of the present invention, the movement of the cleaning component 2 to clean the cleaning tank 111 includes: controlling the intermittent rotation of the cleaning component 2. That is, when the cleaning component 2 cleans the cleaning tank 111, the cleaning component 2 has two states: moving relative to the cleaning tank 111 and fixed relative to the cleaning tank 111. The cleaning component 2 rotates relative to the cleaning tank 111 for a certain period of time and then stops rotating for a certain period of time. Thus, while ensuring that the cleaning component 2 can clean the cleaning tank 111 and agitate the dirt in the cleaning tank 111 to enter the filter tank 13 when it moves relative to the cleaning tank 111, stopping the rotation of the cleaning component 2 can better prevent the continuous rotation of the cleaning component 2 from carrying away dirt and preventing the dirt from entering the filter tank 13. This is beneficial to improving the efficiency of dirt flowing from the cleaning tank 111 into the filter tank 13, and can also save energy consumption of the movement of the cleaning component 2.

[0069] According to some optional embodiments of the present invention, the movement of the cleaning member 2 to clean the cleaning tank 111 includes: controlling the cleaning member 2 to rotate alternately in different rotational directions. That is, when cleaning the cleaning tank 111 with the cleaning member 2, the cleaning member 2 has two rotational states: rotating clockwise relative to the cleaning tank 111 or rotating counterclockwise relative to the cleaning tank 111. After rotating clockwise relative to the cleaning tank 111 for a certain period of time, the cleaning member 2 is adjusted to rotate counterclockwise relative to the cleaning tank 111, and after rotating counterclockwise relative to the cleaning tank 111 for a certain period of time, it is adjusted to rotate clockwise relative to the cleaning tank 111. This allows the cleaning member 2 to clean the cleaning tank 111 in both clockwise and counterclockwise directions and agitate the dirt in the cleaning tank 111 into the filter tank 13, ensuring thorough cleaning of the cleaning tank 111 by the cleaning member 2 and improving the agitation effect of the cleaning member 2 on the dirt in the cleaning tank 111, thus enhancing the cleaning effect of the cleaning member 2 on the cleaning tank 111.

[0070] According to some embodiments of the present invention, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes controlling the rotation of the mopping member 20. That is, after the cleaning tank 111 is cleaned, the mopping member 20 continues to rotate. Thus, the rotation of the mopping member 20 can better dissipate the adsorbed water, thereby improving the dryness of the mopping member 20.

[0071] During the rotation of the mop 20 to spin and spin water, the drying assembly dries the solid waste in the mop 20 and the filter tank 13. Thus, the rotation of the mop 20 effectively dissipates the adsorbed water, significantly shortening the drying time and improving the drying efficiency of the cleaning base station 10. It also ensures uniform drying of different areas of the mop 20. In a specific example, the air outlet of the drying assembly is located on the inner circumferential wall of the cleaning tank 111. Therefore, the rotation of the mop 20 allows every part of its circumference to circumferentially pass through the outlet of the drying assembly, ensuring uniform drying of the mop 20.

[0072] According to some embodiments of the present invention, the cleaning system further includes a drying and collecting assembly, which is disposed on the base station base 1 and includes a drying assembly and a collecting assembly. After the cleaning component 2 moves to clean the cleaning tank 111, the system further includes controlling the drying assembly to dry the solid dirt in the mopping component 20 and the filter tank 13. That is, after the cleaning tank 111 is cleaned, the system enters the drying mode for the mopping component 20 and solid dirt. Before the drying assembly dries the solid dirt in the mopping component 20 and the filter tank 13, the dirt in the cleaning tank 111 has completely flowed into the filter tank 13 and been filtered.

[0073] Therefore, drying the mop 20 effectively prevents it from becoming damp and generating odors or bacteria. Simultaneously, it allows the cleaning equipment to use the dried mop 20 to sweep and absorb moisture from the floor, preventing slippery surfaces. Drying the solid waste in the filter tank 13 facilitates its separation, preventing damp solid waste from adhering to the filter tank 13 and becoming difficult to clean. Furthermore, while the drying assembly dries the mop 20 and the solid waste in the filter tank 13, hot air drying can simultaneously and effectively dissipate into the cleaning tank 111 and the filter tank 13, ensuring they remain dry and preventing the long-term growth of dirt or bacteria in these environments.

[0074] Furthermore, after the solid waste is dried, the collection component collects the dried solid waste from the filter tank 13. In other words, the collection component collects and stores the dried solid waste in the filter tank 13, reducing the frequency of user cleaning of the base station and improving the user experience. It also effectively prevents solid waste from accumulating in the filter tank 13, making it easier to accept waste generated during the next cleaning process and preventing solid waste from clogging the filter tank 13. In addition, it effectively prevents the collection component from directly collecting damp solid waste, which could lead to a long-term damp environment inside the collection component, fostering the growth of mud or bacteria, thus improving the cleanliness of the internal environment of the collection component. Therefore, the cleaning base station 10 can automatically filter, dry, and collect solid waste generated during the cleaning process, effectively preventing the accumulation of solid waste inside the cleaning base station 10 and improving its internal cleanliness.

[0075] According to some embodiments of the present invention, the drying temperature for drying the solid dirt in the mop 20 and the filter tank 13 by the drying assembly is T, and the drying time is t. The value of T ranges from 40 to 80°C, and the value of t ranges from 1.5h to 2.5h. That is, the temperature at which the drying assembly dries the solid dirt in the mop 20 and the filter tank 13 is controlled within the range of 40°C to 80°C, and the drying time is controlled within the range of 1.5h to 2.5h. For example, the temperature at which the drying assembly dries the solid dirt in the mop 20 and the filter tank 13 can be 40°C, or 45°C, or 55°C, or 67°C, or 80°C, etc., and the drying time can be 1.5h, or 1.8h, or 2h, or 2.3h, or 2.5h, etc., without specific limitations.

[0076] Understandably, the higher the drying temperature and the longer the drying time, the better the drying effect of the drying component on the mop 20 and the solid dirt in the filter tank 13. However, the energy consumption of the drying component is also higher, and excessively high temperatures may damage the cleaning equipment or cleaning base station 10. Conversely, the lower the drying temperature and the shorter the drying time, the lower the energy consumption of the drying component and the less impact on the cleaning equipment or cleaning base station 10. However, this may result in incomplete drying of the solid dirt in the mop 20 and the filter tank 13.

[0077] Therefore, by controlling the temperature and time of the drying component in drying the mop 20 and the filter tank 13 within a reasonable range, it is possible to avoid excessive energy consumption of the drying component or adverse effects on the cleaning base station 10 and cleaning equipment caused by excessively high drying temperature or excessively long drying time. At the same time, it is possible to avoid the solid dirt in the mop 20 and the filter tank 13 not being completely dried due to excessively low drying temperature or excessively short drying time. Thus, the energy consumption of the drying component can be controlled while ensuring the drying effect of the drying component on the mop 20 and the filter tank 13.

[0078] According to some embodiments of the present invention, the collection assembly includes a suction nozzle 3, which is movably located within a filter tank 13. Solid contaminants in the filter tank 13 are suitable for being drawn into the collection assembly through the suction nozzle 3. The collection assembly collects the solid contaminants in the filter tank 13 by activating a collection fan to create a negative pressure at the suction nozzle 3. In other words, the suction nozzle 3 is movable relative to the filter tank 13, and a communicating channel is formed between the suction nozzle 3 and the collection assembly. Therefore, by driving the suction nozzle 3 to move, its position within the filter tank 13 can be adjusted, allowing the collection assembly to collect solid contaminants located at different positions within the filter tank 13. Furthermore, the suction nozzle 3's placement within the filter tank 13 effectively shortens the distance between the suction nozzle 3 and the solid contaminants in the filter tank 13, thereby improving the suction force of the collection assembly on the solid contaminants in the filter tank 13. This, in turn, enhances the collection effect of the collection assembly on the solid contaminants in the filter tank 13, thus improving the cleanliness of the filter tank 13.

[0079] Furthermore, after the collecting fan is started, the suction nozzle 3 is controlled to move so that the scraping wall of the suction nozzle 3 scrapes against the bottom wall of the filter tank 13, thereby separating solid dirt from the bottom wall of the filter tank 13. Thus, the moving suction nozzle 3 can effectively eliminate the adhesion between solid dirt and the bottom wall of the filter tank 13, thereby reducing the difficulty of collecting solid dirt in the filter tank 13 and preventing the accumulation of solid dirt in the filter tank 13, thus improving the cleanliness of the filter tank 13.

[0080] According to some optional embodiments of the present invention, the suction nozzle 3 is adapted to reciprocate along a suction direction parallel to the suction direction of the suction nozzle 3. That is, the suction nozzle 3 can move relative to the bottom wall of the filter tank 13 along the suction direction of the suction inlet, and the suction nozzle 3 can also move relative to the bottom wall of the filter tank 13 in a direction opposite to the suction direction of the suction inlet, so that the suction nozzle 3 can reciprocate relative to the bottom wall of the filter tank 13 in a direction parallel to the suction direction of the suction nozzle 3. Thus, during the reciprocating motion of the suction nozzle 3 relative to the bottom wall of the filter tank 13, the collecting component can collect solid dirt on the bottom wall of the filter tank 13 multiple times through the suction nozzle 3, and at the same time, the suction nozzle 3 can scrape the solid dirt on the bottom wall of the filter tank 13 multiple times, which helps to improve the collection effect of the collecting component on the dirt in the filter tank 13 through the suction nozzle 3, so as to ensure the cleanliness of the filter tank 13.

[0081] According to some optional embodiments of the present invention, the suction nozzle 3 constitutes a limiting member, and the cleaning member 2 has a first cleaning state and a second cleaning state. In the first cleaning state, the cleaning member 2 is fixed relative to the base station base 1, and in the second cleaning state, the cleaning member 2 is movable. That is, the cleaning member 2 has a first cleaning state fixed relative to the base station base 1 and a second cleaning state movable relative to the base station base 1. Controlling the cleaning device to move to the cleaning base station 10 includes: the mopping member 20 is located on the cleaning member 2 and in contact with the cleaning member 2. That is, when the mopping member 20 needs to be cleaned, after the cleaning device enters the cleaning base station 10, the mopping member 20 presses onto the cleaning member 2. Further, controlling the limiting member to limit the cleaning member 2 includes: controlling the suction nozzle 3 to be located in the limiting position and cooperating with the cleaning member 2 so that the cleaning member 2 is in the first cleaning state; controlling the mopping member 20 to rotate and rub against the cleaning member 2 to clean the mopping member 20.

[0082] In other words, the suction nozzle 3 located at the limiting position is used to restrict the movement of the cleaning component 2 relative to the base station base 1 to keep the cleaning component 2 fixed relative to the base station base 1 in the first cleaning state. Therefore, by controlling the wiping component 20 to rotate relative to the base station base 1, the wiping component 20 can rotate relative to the cleaning component 2 in the first cleaning state, so that the rotating wiping component 20 and the fixed cleaning component 2 rotate and rub against each other. The wiping component 20 can be wetted by water injected into the cleaning tank 111 by the water supply component, so that the cleaning component 2 can rub and remove dirt from the wiping component 20 through friction with the wetted wiping component 20 to achieve the cleaning operation of the wiping component 20.

[0083] Furthermore, controlling the disengagement of the limiting component from the cleaning component 2 includes: controlling the suction nozzle 3 to be in a non-limiting position and disengaging from the cleaning component 2, so that the cleaning component 2 is in a second cleaning state; and controlling the wiping component 20 to rotate, thereby driving the cleaning component 2 to rotate. That is, after the suction nozzle 3 moves to the non-limiting position, it releases the limiting effect on the cleaning component 2, thereby allowing the cleaning component 2 to return to the second cleaning state where it can move relative to the cleaning tank 111. Therefore, by controlling the wiping component 20 to rotate relative to the base station base 1, the wiping component 20 can drive the cleaning component 2 to move synchronously with the wiping component 2 in the cleaning tank 111 through the friction between the wiping component 20 and the cleaning component 2. Thus, the moving cleaning component 2 can clean the cleaning tank 111 and the agitated dirt in the cleaning tank 111 can be flowed into the filter tank 13 for filtration.

[0084] Therefore, the suction nozzle 3 can not only collect solid waste in the filter tank 13 in conjunction with the collection component, but also act as a limiting component to restrict the movement of the cleaning component 2 relative to the cleaning tank 111. That is, the suction nozzle 3 has two functions: suctioning solid waste and limiting movement. It has a high degree of integration, which can effectively reduce the number of parts in the cleaning base station 10 and simplify its structure. In addition, by controlling the suction nozzle 3 to switch between the limiting position and the non-limiting position, the cleaning component 2 can switch between the first cleaning state and the second cleaning state. This can effectively reduce the difficulty of switching the cleaning component 2 between the first cleaning state and the second cleaning state, and at the same time, it can be achieved without relying on changing the rotation direction of the wiping component 20 when switching between the first cleaning state and the second cleaning state. This can effectively reduce the requirements of the cleaning base station 10 on the cleaning equipment and improve the applicability of the cleaning base station 10.

[0085] Therefore, when the cleaning component 2 is in the first cleaning state, the cleaning device can drive the mop component 20 to rotate clockwise or counterclockwise, so that the cleaning component 2 can clean the mop component 20 in a clockwise or counterclockwise direction. When the cleaning component 2 is in the second cleaning state, the cleaning device can drive the mop component 20 to rotate clockwise or counterclockwise, so that the cleaning component 2 can clean the cleaning tank 111 in a clockwise or counterclockwise direction, which is beneficial to improving the cleaning effect of the cleaning component 2 on the mop component 20 and the cleaning tank 111.

[0086] The process of controlling the rotation of the mopping component 20 to rub against the cleaning component 2 for cleaning includes an initial cleaning phase and a stable cleaning phase following the initial phase. The rotational speed of the mopping component 20 in the initial cleaning phase is lower than its rotational speed in the stable cleaning phase. It is understood that when the suction nozzle 3 is in the non-limited position, the cleaning component 2 can rotate freely relative to the cleaning tank 111. Therefore, when the suction nozzle 3 moves to the limit position, the cleaning component 2 may be spaced apart from the suction nozzle 3. Thus, after the suction nozzle 3 moves to the limit position, the mopping component 20 needs to rotate to drive the cleaning component 2 to rotate until the cleaning component 2 comes into contact with the suction nozzle 3, thereby confining the cleaning component 2 to the first cleaning state by the suction nozzle 3.

[0087] Therefore, the rotational speed of the mopping component 20 in the initial cleaning stage is lower than that in the stable cleaning stage. This effectively reduces the speed at which the mopping component 2 moves the cleaning component 2 towards the suction nozzle 3, thus reducing the impact force between the cleaning component 2 and the suction nozzle 3. This also helps to prevent impact damage between the cleaning component 2 and the suction nozzle 3 and reduces impact noise. Furthermore, the faster the rotational speed of the mopping component 20, the more times the cleaning component 2 completely sweeps over the mopping component 20 in the same amount of time, meaning a higher cleaning frequency. Therefore, after entering the stable cleaning stage, the mopping component 20 rotates at a higher speed relative to the cleaning component 2 to increase the cleaning force of the cleaning component 2 on the mopping component 20. In other words, while ensuring the cleaning force of the mopping component 20 in the stable cleaning stage, the impact force and noise between the cleaning component 2 and the suction nozzle 3 can be reduced.

[0088] Furthermore, during the initial cleaning phase, the rotational speed of the mop component 20 gradually increases; during the stable cleaning phase, the rotational speed of the mop component 20 remains constant. That is, during the cleaning process of the mop component 20 by the cleaning component 2, the rotational speed of the mop component 20 gradually increases and remains constant after reaching a certain speed. This effectively improves the smoothness of the rotational speed increase process of the mop component 20. Specifically, during the initial cleaning phase, the rotational speed of the mop component 20 can be gradually increased after the cleaning component 2 and the suction nozzle 3 come into contact, thereby reducing the impact force and noise between the cleaning component 2 and the suction nozzle 3.

[0089] In a specific example, a wastewater buffer chamber 14 is also formed inside the base station base 1. The wastewater buffer chamber 14 is located below the filter tank 13. A filter structure is formed on the bottom wall of the filter tank 13, and the filter tank 13 and the wastewater buffer chamber 14 are connected through the filter structure. Therefore, after the dirt in the cleaning tank 111 enters the filter tank 13, the wastewater therein can pass through the filter tank 13 and enter the wastewater buffer chamber 14 for temporary storage. That is, the wastewater buffer chamber 14 can effectively hold the wastewater generated during the cleaning of the base station 10 and the cleaning of the mop 20 or the cleaning tank 111, and can effectively prevent the wastewater from exceeding the capacity limit of the cleaning tank 111 and overflowing. Solid dirt is intercepted in the filter tank 13. Therefore, the filter tank 13 can effectively separate wastewater and solid dirt, which is convenient for classifying and treating different types of dirt, and can also effectively prevent solid dirt from accumulating in the wastewater buffer chamber 14. In addition, a drainage component can be connected to the wastewater buffer chamber 14 to discharge the wastewater in the wastewater buffer chamber 14 in a timely manner.

[0090] According to some optional embodiments of the present invention, the filter tank 13 includes a filtration zone and a non-filtration zone. The bottom wall of the filtration zone is formed with a filtration structure, that is, the wastewater buffer chamber 14 is connected to the filter tank 13 through the filtration structure, so that wastewater entering the filter tank 13 can flow downward into the wastewater buffer chamber 14 through the filtration structure, and solid waste is intercepted on the bottom wall of the filtration zone. At least a portion of the suction nozzle 3 is located in the filtration zone in the restricted position, and in the non-restricted position, the suction nozzle 3 is located in the non-filtration zone. That is, the suction nozzle 3 in the non-restricted position is spaced apart from the filtration structure. The process of controlling the drying assembly to dry the mop 20 and the solid waste in the filter tank 13 includes controlling the suction nozzle 3 to be in the non-restricted position.

[0091] In other words, when drying solid waste in the filter tank 13, the suction nozzle 3 is spaced apart from the filter structure on the bottom wall of the filter zone in the direction of movement. This means that solid waste entering the filter tank 13 accumulates on the filter structure. Therefore, the suction nozzle 3 can effectively prevent it from blocking the solid waste on the filter structure, ensuring a better drying effect for the drying assembly. Furthermore, after the solid waste on the filter structure is dried, the suction nozzle 3 can be driven to move from the non-filter zone towards the filter zone, scraping the bottom wall of the filter zone during its movement. This separates the solid waste adhering to the bottom wall of the filter zone from the bottom wall, facilitating collection by the collection assembly.

[0092] In a specific example, the filter zone and the non-filter zone are arranged and connected in the front-to-back direction. Multiple filter holes 121 are formed on the filter zone, and the multiple filter holes 121 together constitute the filter structure. The front end of the filter zone extends into the cleaning tank 111. When the suction nozzle 3 moves forward to the limit position, the front end of the suction nozzle 3 is located in the cleaning tank 111, so as to restrict the rotation of the cleaning component 2 by the part of the suction nozzle 3 located in the cleaning tank 111. When the suction nozzle 3 moves backward into the non-filter zone, it is located behind the filter hole 121.

[0093] According to some embodiments of the present invention, the drying assembly includes a drying air duct 5 and a drying fan, the drying air duct 5 having a drying air duct 51, the collecting assembly includes a collecting air duct 6 and a collecting fan, the collecting air duct 6 having a collecting air duct 61, the drying collecting assembly includes a suction nozzle 3, the suction nozzle 3 is located in the filter tank 13 and connected to the outlet end of the drying air duct 5 and the inlet end of the collecting air duct 6, the suction nozzle 3 may selectively communicate with one of the drying air duct 51 and the collecting air duct 61.

[0094] In other words, the suction nozzle 3 can be connected to the drying air duct 51, allowing the drying fan to deliver hot air to the filter tank 13 through the drying air duct 51 and the suction nozzle 3, thereby achieving the drying treatment of solid dirt in the filter tank 13. The suction nozzle 3 is located inside the filter tank 13, making the distance between the suction nozzle 3 and the solid dirt in the filter tank 13 close, so that the drying component can deliver hot air to the vicinity of the solid dirt through the suction nozzle 3, thereby improving the drying effect of the drying component on the solid dirt in the filter tank 13. The suction nozzle 3 can also be connected to the collection air duct 61, allowing the collection fan to collect solid dirt in the filter tank 13 through the suction nozzle 3 and the collection air duct 61. The suction nozzle 3 is located inside the filter tank 13, making the distance between the suction nozzle 3 and the solid dirt in the filter tank 13 close, thereby improving the suction force of the collection fan on the solid dirt in the filter tank 13. That is, the nozzle 3 can improve the drying effect of the drying component on solid dirt when the drying component is working, and can improve the collection effect of the collection component on solid dirt when the collection component is working. At the same time, the drying component and the collection component can share the nozzle 3, which can save the number of nozzles 3 and simplify the structure of the cleaning base station 10.

[0095] The drying assembly controls the drying of solid waste in the mop 20 and filter tank 13 by: controlling the suction nozzle 3 to connect to the drying duct 51, and controlling the drying fan to start and the collecting fan to stop. Therefore, when the drying assembly dries the solid waste in the mop 20 and filter tank 13, the drying fan can deliver hot air to the filter tank 13 through the drying duct 51 and the suction nozzle 3 to dry the solid waste in the filter tank 13, while effectively preventing the collecting fan from sucking away the hot air delivered by the drying assembly to the filter tank 13. In a specific example, the drying assembly also includes a heating element to heat the gas in the drying duct 51, ensuring the supply of hot air to the filter tank 13 by the drying assembly.

[0096] Furthermore, controlling the collection component to collect solid waste in the filter tank 13 includes: controlling the suction nozzle 3 to connect with the collection duct 61, and controlling the collection fan to turn on and the drying fan to turn off. Therefore, when the collection component collects solid waste in the filter tank 13, the collection fan can collect the solid waste in the filter tank 13 through the suction nozzle 3 and the collection duct 61. In addition, when the collection component collects solid waste in the filter tank 13, the solid waste has already been dried, so turning off the drying fan can better reduce operating energy consumption and better avoid the exhaust air of the drying fan disturbing the intake airflow of the collection component. In a specific example, the collection component also includes a dust collection component, which forms a dust collection chamber that communicates with the outlet end of the collection duct 6 to store the solid waste collected by the collection component.

[0097] It should be noted that the solid waste in the filter tank 13 can be collected by the collection component after the solid waste in the filter tank 13 has been dried and before the mopping component 20 has been dried. Alternatively, the solid waste in the filter tank 13 can be collected by the collection component after the mopping component 20 has been dried. In other words, the operating time of the collection component can be flexibly adjusted according to design requirements, and no specific restrictions are imposed here.

[0098] According to some embodiments of the present invention, the mopping component 20 of the cleaning device moves relative to the cleaning component 2 for cleaning, including controlling the water supply component to supply water into the cleaning tank 111. That is, during the cleaning process of the cleaning base station 10 cleaning the mopping component 20, the cleaning tank 111 contains water injected by the water supply component. The water injected into the cleaning tank 111 by the water supply component can effectively wet the mopping component 20 located in the cleaning tank 111. The water can effectively absorb and dissolve dust and other dirt on the mopping component 20, and at the same time, the dirt on the mopping component 20 can be removed from the mopping component 20 along with the water, which can effectively improve the cleaning effect of the cleaning base station 10 on the mopping component 20 and improve the cleanliness of the mopping component 20. In addition, by continuously injecting clean water into the cleaning tank 111 by the water supply component, the mopping component 20 can be repeatedly rinsed by dipping into the clean water in the cleaning tank 111, which is beneficial to further improve the cleaning effect of the cleaning base station 10 on the mopping component 20.

[0099] Furthermore, after the cleaning component 2 moves to clean the cleaning tank 111, it includes controlling the water supply component to stop supplying water to the cleaning tank 111. That is, when the drying component is drying solid dirt, the water supply component stops supplying water to the cleaning tank 111, which can better prevent water from wetting the mop 20 and solid dirt again when the drying component is drying the mop 20 and solid dirt, thereby improving the drying efficiency of the drying component for solid dirt.

[0100] The following is for reference. Figures 1-9 A cleaning control method for a cleaning system according to specific embodiments of the present invention is described. It is to be understood that the following description is merely exemplary and intended to explain the invention, and should not be construed as limiting the invention.

[0101] The cleaning equipment can be detached from the cleaning base station 10 to drive the mopping components 20 for floor cleaning. When the mopping components 20 need to be cleaned, the cleaning equipment moves to the cleaning base station 10, so that the two mopping components 20 of the cleaning equipment are respectively located in the two cleaning tanks 111 and respectively cover the two cleaning components 2. Then, the suction nozzle 3 is driven forward towards the limiting position by the drive mechanism 8. When the suction nozzle 3 moves to the limiting position, the left and right sides of the front end of the suction nozzle 3 are respectively located in the two cleaning tanks 111 to form limiting parts. Water is supplied to the cleaning tanks through the water supply component. Water is filled into the cleaning tank 111, and the two mopping parts 20 are rotated by the cleaning equipment. At this time, it is in the initial cleaning stage. The rotation of the mopping parts 20 drives the cleaning parts 2 to rotate until the cleaning parts 2 come into contact with the limiting part to limit the rotation of the two cleaning parts 2 relative to the cleaning rub. At this time, it enters the stable cleaning stage. The friction between the mopping parts 20 and the cleaning parts 2 causes the dirt on the mopping parts 20 to fall into the cleaning tank 111. The sewage in the cleaning tank 111 can flow into the filter tank 13 for filtration and intercept solid dirt on the bottom wall of the filter tank 13.

[0102] After the mop 20 finishes cleaning, the drive mechanism 8 drives the suction nozzle 3 to move backward to a non-limited position, allowing the cleaning component 2 to rotate freely relative to the bottom wall of the cleaning tank 111. At this time, the mop 20 continues to rotate, causing the cleaning component 2 to brush the inner wall of the cleaning tank 111 and agitate the dirt in the cleaning tank 111 to flow into the filter tank 13 for filtration, and intercepting solid dirt on the bottom wall of the filter tank 13. After the cleaning tank 111 is cleaned, the suction nozzle 3 moves to the non-filtration area and turns on the drying fan. At this time, the collection fan is in the off state. The drying fan delivers hot air to the filter tank 13 and the cleaning tank 111 through the drying air duct 5 and the suction nozzle 3, and dries the solid dirt in the mop 20 and the filter tank 13 with hot air. After drying is complete, the drying fan is turned off and the collection fan is turned on. Simultaneously, the drive mechanism 8 drives the suction nozzle 3 forward, scraping the bottom wall of the filter area to separate solid debris adhering to the filter area. The collection fan collects the solid debris from the filter tank 13 through the suction nozzle 3 and the collection duct 6. The cleaning equipment can be detached and, carrying the cleaned mop 20, continue floor cleaning operations.

[0103] The cleaning system according to an embodiment of the present invention is described below with reference to the accompanying drawings.

[0104] A cleaning system according to an embodiment of the present invention includes: a cleaning base station 10 and a cleaning device. The cleaning base station 10 includes a first control module for controlling the cleaning base station 10. The cleaning device includes a second control module for controlling the cleaning device. The cleaning device is adapted to cooperate with the cleaning base station 10. The first control module and the second control module are communicatively connected to jointly control the cleaning system to operate according to the above-described cleaning control method. Therefore, the automation level of the cleaning system can be significantly improved, and user operations can be significantly reduced to enhance the user experience.

[0105] According to the cleaning system of the present invention, the filter tank 13 can effectively separate sewage and solid waste, which facilitates the classification and treatment of different types of waste and can better avoid the blockage of sewage pipes. By controlling the cleaning component 2 to switch between the first cleaning state and the second cleaning state through the limiting component, the cleaning base station 10 can switch between the two modes of cleaning the mop and cleaning the cleaning tank, which can improve the automation level of the cleaning system, thereby reducing the user's operation during the use of the cleaning system and improving the user experience of the cleaning system.

[0106] In a specific example, the base station base 1 includes a base body 11 and a filter component 12. Two cleaning grooves 111 arranged in a left-right direction are formed on the base body 11. The cleaning grooves 111 are circular. A filter groove 13 is disposed between the two cleaning grooves 111, and the bottom wall of the filter groove 13 is lower than the bottom wall of the cleaning groove 111. A through-hole 112 is provided on the inner peripheral wall of the cleaning groove 111, and the cleaning groove 111 communicates with the filter groove 13 through the through-hole 112. The cleaning component 2 is a long strip extending radially along the cleaning groove 111, with its center in the length direction... The cleaning component 2 is rotatably positioned at the center of the cleaning tank 111, so that it is rotatably positioned inside the cleaning tank 111 around the center of the cleaning tank 111. A first cleaning structure is provided on the bottom surface of the cleaning component 2, and the first cleaning structure contacts the bottom wall of the cleaning tank 111. A second cleaning structure is provided on the radial outer end face of the cleaning component 2, and the second cleaning structure contacts the inner peripheral wall of the cleaning tank 111. During the rotation of the cleaning component 2 relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 is brushed by the first cleaning structure, and the inner peripheral wall of the cleaning tank 111 is brushed by the second cleaning structure. The base body 11 and the filter component 12 together define a filter tank 13 and a sewage buffer chamber 14 arranged in the vertical direction. The sewage buffer chamber 14 is located below the filter tank 13 and is connected to the filter tank 13 through a filter structure. The drainage component is connected to the sewage buffer chamber 14 through a sewage pipe 4. Multiple filter holes 121 are formed on the bottom wall of the filter tank 13. The multiple filter holes 121 together constitute the filter structure. The filter structure can effectively prevent solid particles, hair and other solid dirt from entering the sewage buffer chamber 14 and being difficult to clean. Solid dirt accumulates on the filter structure located on the sewage buffer chamber 14, which can effectively reduce the difficulty of cleaning solid dirt on the filter structure.

[0107] In addition, the cleaning base station 10 also includes a connecting air duct component 7, which is located on the upper side of the filter tank 13. The connecting air duct component 7 forms a first channel 71 for drying air duct 51 and a second channel 72 for collecting air duct 61. The drying air duct component 5 and the collecting air duct component 6 are both located at the rear end of the connecting air duct component 7 and are arranged in the left-right direction. The drying air duct component 5 is provided with a first control valve for controlling the opening and closing of the drying air duct 51, and the collecting air duct component 6 is provided with a second control valve for controlling the opening and closing of the collecting air duct 61. The connecting air duct component 7 also forms a sliding cavity 73 that extends in the front-back direction and opens forward. The suction nozzle 3 is slidably disposed in the sliding cavity 73 in the front-back direction. The first channel 71 and the second channel 72 are connected to the sliding cavity 73. The base station base 1 has a drive mechanism 8 on its outer side. The drive mechanism 8 is connected to the suction nozzle 3 to drive the suction nozzle 3 to move between a limited position and a non-limited position.

[0108] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0109] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0110] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A cleaning control method for a cleaning system, characterized in that, The cleaning system includes cleaning equipment and a cleaning base station. The cleaning base station includes a base station base, a cleaning component, a limiting component, a water supply component, and a drainage component. The base station base forms a cleaning tank and a filter tank. The cleaning component is movably disposed within the cleaning tank. The water supply component supplies water to the cleaning tank, and the drainage component discharges wastewater generated within the cleaning tank. The cleaning control method includes: The cleaning equipment is controlled to move to the cleaning base station, and the mopping component of the cleaning equipment is located in the cleaning tank; The limiting component controls the cleaning component to be in a first cleaning state so that the cleaning component is fixed relative to the base station base, and the mopping component of the cleaning device moves relative to the cleaning component to perform cleaning; The limiting member is controlled to disengage from the cleaning member, and the cleaning member is in a second cleaning state so that the cleaning member can move. The cleaning member moves to clean the cleaning tank, and the dirt in the cleaning tank is suitable to flow into the filter tank for filtration under the agitation of the cleaning member. The cleaning system further includes a drying and collecting assembly, which is disposed on the base station base and includes a drying assembly and a collecting assembly. After the cleaning component moves to clean the cleaning tank, it further includes: The drying assembly is controlled to dry the mop and the solid waste in the filter tank; The collection assembly is controlled to collect the dried solid waste in the filter tank; The collection assembly includes a suction nozzle movably located within the filter tank, wherein solid contaminants within the filter tank are adapted to be drawn into the collection assembly through the suction nozzle, and the suction nozzle constitutes the limiting member; The collection component collects solid waste from the filter tank, including: Start the collection fan of the collection component to create negative pressure at the suction nozzle; The movement of the suction nozzle is controlled so that the scraping wall of the suction nozzle scrapes against the bottom wall of the filter tank, thereby separating the solid waste from the bottom wall of the filter tank.

2. The cleaning control method according to claim 1, characterized in that, Controlling the cleaning equipment to move to the cleaning base station includes: the mopping component being positioned on the cleaning component and in contact with the cleaning component; The cleaning device uses a mopping component to clean the cleaning component by moving relative to the cleaning component, including: controlling the mopping component to rotate and rub against the cleaning component to clean the mopping component; The movement of the cleaning component to clean the cleaning tank includes: controlling the rotation of the mopping component to drive the cleaning component to rotate.

3. The cleaning control method according to claim 2, characterized in that, The rotational speed of the mopping component in the second cleaning state is less than the rotational speed of the mopping component in the first cleaning state.

4. The cleaning control method according to claim 2, characterized in that, After the cleaning component moves to clean the cleaning tank, the process further includes: Control the mopping component to disengage from the cleaning component, and control the mopping component to rotate; Alternatively, the mopping component can be controlled to rotate, thereby causing the cleaning component to rotate.

5. The cleaning control method according to claim 1, characterized in that, The movement of the cleaning component to clean the cleaning tank includes: Control the cleaning component to rotate at a constant speed; Alternatively, the cleaning component can be controlled to rotate intermittently; Alternatively, the cleaning component can be controlled to rotate alternately in different directions.

6. The cleaning control method according to claim 1, characterized in that, After the cleaning component moves to clean the cleaning tank, the process further includes: Control the rotation of the wiping component.

7. The cleaning control method according to claim 1, characterized in that, The drying component dries the solid waste in the wiping component and the filter tank at a temperature of T and a drying time of t. The value of T ranges from 40 to 80°C, and the value of t ranges from 1.5 h to 2.5 h.

8. The cleaning control method according to claim 1, characterized in that, The suction nozzle is adapted to reciprocate along a suction direction parallel to the suction nozzle.

9. The cleaning control method according to claim 1, characterized in that, Controlling the cleaning equipment to move to the cleaning base station includes: the mopping component being positioned on the cleaning component and in contact with the cleaning component; Controlling the limiting member to limit the cleaning member includes: controlling the suction nozzle to be in the limiting position and cooperating with the cleaning member so that the cleaning member is in the first cleaning state; controlling the mopping member to rotate and rub against the cleaning member to clean the mopping member. Controlling the limiting member to disengage from the cleaning member includes: controlling the suction nozzle to be in a non-limiting position and disengaging from the cleaning member, so that the cleaning member is in the second cleaning state; and controlling the mopping member to rotate, so as to drive the cleaning member to rotate.

10. The cleaning control method according to claim 9, characterized in that, Controlling the mopping component to rotate and rub it against the cleaning component to clean the mopping component includes: In the initial cleaning phase and the subsequent stable cleaning phase, the rotational speed of the mopping component in the initial cleaning phase is lower than that in the stable cleaning phase.

11. The cleaning control method according to claim 10, characterized in that, During the initial cleaning phase, the rotational speed of the mopping component gradually increases; during the stable cleaning phase, the rotational speed of the mopping component remains constant.

12. The cleaning control method according to claim 9, characterized in that, The filter tank includes a filter zone and a non-filter zone. The bottom wall of the filter zone is formed with a filter structure. At least a portion of the nozzle is located in the filter zone in the limiting position and in the non-limiting position, the nozzle is located in the non-filter zone. Controlling the drying assembly to dry the mop and the solid dirt in the filter tank includes: controlling the suction nozzle to be in the non-limited position.

13. The cleaning control method according to claim 1, characterized in that, The drying assembly includes a drying air duct and a drying fan. The drying air duct has a drying air duct. The collection assembly includes a collection air duct and a collection fan. The collection air duct has a collection air duct. The drying collection assembly includes a suction nozzle. The suction nozzle is located in the filter tank and is connected to the outlet end of the drying air duct and the inlet end of the collection air duct. The suction nozzle can be selectively connected to one of the drying air duct and the collection air duct. Controlling the drying assembly to dry the mop and the solid dirt in the filter tank includes: controlling the suction nozzle to connect with the drying air duct, and controlling the drying fan to turn on and the collecting fan to turn off; Controlling the collection component to collect solid waste in the filter tank includes: controlling the suction nozzle to connect with the collection air duct, and controlling the collection fan to turn on and the drying fan to turn off.

14. The cleaning control method according to claim 1, characterized in that, The cleaning equipment uses a mopping component to clean relative to the cleaning component, including controlling a water supply assembly to supply water into the cleaning tank. After the cleaning component moves to clean the cleaning tank, it includes controlling the water supply assembly to stop supplying water to the cleaning tank.

15. A cleaning system, characterized in that, include: A clean base station includes a first control module, which is used to control the clean base station. The cleaning equipment includes a second control module, which is used to control the cleaning equipment. The cleaning equipment is adapted to cooperate with the cleaning base station, and the first control module and the second control module are communicatively connected to jointly control the cleaning system to operate according to the cleaning control method according to any one of claims 1-14.

Images