Dual injection planar magnetron injection electron gun

Abstract

The disclosure provides a double injection planar magnetic control injection electron gun, which comprises a focusing electrode, two strip-shaped cathodes, an anode and a magnetic field generating assembly. The focusing electrode comprises two inclined surfaces extending in the Z-axis direction and arranged oppositely, the two strip-shaped cathodes are respectively installed on the inclined surfaces of the focusing electrode in parallel with each other, and the inclined surfaces are introduced with clockwise or counterclockwise rotation, and the cathodes are configured to respectively emit electrons after being heated; the anode forms an electric field with the two strip-shaped cathodes to accelerate the emitted electrons to form an electron beam; the electron beam rotates under the action of the magnetic field generated by the magnetic field generating assembly to form two strip-shaped electron beams, and reduce the included angle between the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane and the ZX plane.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of microwave and millimeter wave electric vacuum devices, and particularly relates to a double-injection planar magnetron injection electron gun. BACKGROUND

[0002] The millimeter wave frequency band refers to electromagnetic waves with a frequency of 30GHz-300GHz and a wavelength of 1mm-10mm. Due to its unique spectral position, the millimeter wave has the characteristics of wide bandwidth and short wavelength. Wide bandwidth represents large information capacity, which can improve the transmission capacity in communication, and the frequency resources are also rich, which can greatly improve the electronic anti-interference ability. Short wavelength can improve the resolution. Compared with infrared and visible light, the millimeter wave has a lower resolution, but it has better transmission and is not easily affected by small particulate matter such as dust and smoke, and has all-weather characteristics. Compared with microwaves, millimeter waves are more easily miniaturized. These characteristics make the technology related to it have quite wide application in modern military, medical, instrument and other fields.

[0003] With the development of radar and satellite communication, the performance of traditional circular electron injection devices cannot meet the needs and is difficult to improve, and the strip-shaped electron injection has become the development trend in the future due to its characteristics of high power and high frequency. At the same time, relevant research shows that the gyro electron injection can improve the gain and bandwidth of the interaction system more than the linear electron injection. Compared with the circular electron injection, the strip-shaped electron injection can improve the total input current, thereby improving the output power, gain and other indicators of the device.

[0004] The magnetron injection electron gun in the related art generates a strip-shaped gyro electron injection, which needs to use a parallel focusing magnetic field uniformly distributed in space, and the design and manufacture of the magnetic field configuration of the coil generating the parallel focusing magnetic field are relatively difficult. In comparison, the cylindrical axisymmetric magnetic field generated by the superconducting coil is easier to design, calculate and process and manufacture, but the cylindrical axisymmetric magnetic field generated by the superconducting coil will cause the cross section of the electron injection in the XY plane to be obviously rotated and twisted relative to the XZ plane. SUMMARY

[0005] Therefore, the present disclosure provides a double-injection planar magnetron injection electron gun, which can reduce the included angle between the cross section of the motion trajectory of the two strip-shaped electron injections in the XY plane and the ZX plane.

[0006] As an aspect of the embodiments of the present disclosure, a dual-injection planar magnetron injection electron gun is provided, which includes a focusing electrode, two strip-shaped cathodes, an anode and a magnetic field generating assembly. The focusing electrode includes two inclined surfaces extending in the Z-axis direction and arranged oppositely; the two strip-shaped cathodes are respectively installed on the inclined surfaces of the focusing electrode in parallel to each other and are introduced with a clockwise or counterclockwise rotation on the inclined surfaces, and the cathodes are configured to respectively emit electrons after being heated; the anode forms an electric field with the two strip-shaped cathodes to accelerate the emitted electrons to form an electron beam; the electron beam is rotated under the action of a magnetic field generated by the magnetic field generating assembly to form two strip-shaped electron beams and reduce the included angle between the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane and the ZX plane.

[0007] According to the embodiments of the present disclosure, a cavity extending in the Z-axis direction is formed in the anode, and the cavity is sequentially divided into a first region, a second region and a third region in the Z-axis direction. The magnetic field strength of the magnetic field gradually increases in the first region to adjust the electron beam; the magnetic field strength is substantially constant in the second region to enable the strip-shaped electron beams formed by the electron beam to perform beam-wave interaction with electromagnetic waves; and the magnetic field strength gradually decreases in the third region to collect the strip-shaped electron beams that have exchanged energy with the electromagnetic waves after passing through the second region.

[0008] According to the embodiments of the present disclosure, the first region includes an electron emission region and an adiabatic compression region. The electron emission region is adapted to accommodate the focusing electrode and the two strip-shaped cathodes; and the magnetic field strength of the magnetic field gradually increases in the adiabatic compression region in the direction of travel of the electrons to perform an adiabatic compression action on the electrons in the electron beam from the electron emission region, so that the speed of the electrons in the Z-axis direction decreases and the speed of the electrons in the transverse direction increases.

[0009] According to the embodiments of the present disclosure, the second region is an interaction region. The interaction region is adapted to allow the strip-shaped electron beams that have reached a stable state after passing through the adiabatic compression region to perform beam-wave interaction with electromagnetic waves.

[0010] According to the embodiments of the present disclosure, in the interaction region, the magnetic field and an electric field directed to the inside of the strip-shaped electron beams due to the space charge effect form a Lorentz force, so that the edges of the strip-shaped electron beams opposite to each other in the XY plane are subjected to a Y-direction Lorentz force to perform a twisted rotation relative to the ZX plane; and the inclined direction of the two strip-shaped cathodes relative to the ZX plane is opposite to the direction of the twisted rotation to reduce the included angle.

[0011] According to an embodiment of the present disclosure, the interaction region is provided with a resonant cavity having a wave output end; wherein the resonant cavity is used to generate the electromagnetic wave and to make the electromagnetic wave interact with the two strip-shaped electron beams in the resonant cavity to amplify the electromagnetic wave and output the electromagnetic wave from the wave output end.

[0012] According to an embodiment of the present disclosure, the magnetic field generating assembly comprises a superconducting coil which is spaced apart from the anode and arranged at the periphery of the anode, and is adapted to provide a cylindrical axisymmetric magnetic field in the axial direction parallel to the Z-axis direction.

[0013] According to an embodiment of the present disclosure, the double-injection planar magnetron injection electron gun further comprises a modulation assembly which is spaced apart from the two strip-shaped cathodes, the focusing electrode and the anode, and is located between the two strip-shaped cathodes and the anode, and is used to adjust the speed and direction of the two strip-shaped electron beams.

[0014] According to an embodiment of the present disclosure, the modulation assembly comprises two modulation anodes which are adapted to adjust the speed and direction of the two strip-shaped electron beams, respectively.

[0015] According to an embodiment of the present disclosure, the two strip-shaped cathodes are in any one of a rectangular shape, a racetrack shape and an elliptical shape.

[0016] According to the double-injection planar magnetron injection electron gun of the present disclosure, the two strip-shaped cathodes are respectively installed parallel to each other on the inclined surface of the focusing electrode, and are tilted relative to the ZX plane and the XY plane, so that the electron beams are rotated under the action of the magnetic field to form two strip-shaped electron beams, the included angle between the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane and the ZX plane is reduced, the strip-shaped electron beams entering the interaction region are made to be incident as much as possible parallel to the ZX plane, the incident quality of the strip-shaped electron beams is improved, the strip-shaped electron beams are in the best interaction position, and the efficiency of the beam-wave interaction with the electromagnetic wave is improved. BRIEF DESCRIPTION OF DRAWINGS

[0017] The above and other objects, features and advantages of the present disclosure will become more apparent from the following description of embodiments of the present disclosure taken in conjunction with the accompanying drawings, in which:

[0018] Figure 1 A partial cross-sectional view of an electron gun in the related art is schematically shown;

[0019] Figure 2 A partial perspective view of an electron gun in the related art is schematically shown;

[0020] Figure 3 A force analysis diagram of the motion trajectory of a strip-shaped electron beam of an electron gun in the related art in the XY plane is schematically shown;

[0021] Figure 4 A schematic cross-sectional view of the motion trajectory of a ribbon-shaped electron beam of an electron gun in the related art is shown in the XY plane;

[0022] Figure 5 A schematic cross-sectional view of the motion trajectory of a ribbon-shaped electron beam of an electron gun in the related art is shown in the XY plane;

[0023] Figure 6 A schematic partial cross-sectional view of a dual-beam planar magnetic control injection electron gun according to an embodiment of the present disclosure is shown;

[0024] Figure 7 A schematic cross-sectional view of a dual-beam planar magnetic control injection electron gun according to an embodiment of the present disclosure is shown;

[0025] Figure 8 A schematic cross-sectional view of the motion trajectory of a ribbon-shaped electron beam of an electron gun in the related art is shown in the XY plane; Figure 7 A partial enlarged view of part A of the dual-beam planar magnetic control injection electron gun shown is shown;

[0026] Figure 9 A schematic partial perspective view of a dual-beam planar magnetic control injection electron gun according to an embodiment of the present disclosure is shown;

[0027] Figure 10 A schematic graph of the magnetic field strength in the Z-axis direction according to an embodiment of the present disclosure is shown; and

[0028] Figure 11 A schematic cross-sectional view of the motion trajectory of two ribbon-shaped electron beams in the XY plane in an interaction region according to an embodiment of the present disclosure is shown.

[0029] BRIEF DESCRIPTION OF REFERENCE NUMERALS:

[0030] 1, focusing pole;

[0031] 2, bar-shaped cathode;

[0032] 3, anode;

[0033] 4, first region;

[0034] 41, electron emission region;

[0035] 42, adiabatic compression region;

[0036] 5, second region;

[0037] 6, third region;

[0038] 7, modulation assembly;

[0039] 71, modulation anode;

[0040] 8, cavity;

[0041] 9. The cathode. DETAILED DESCRIPTION

[0042] In order to make the objects, technical solutions and advantages of the present disclosure clearer, the present disclosure will be further described in detail below with reference to specific embodiments and with reference to the drawings.

[0043] The terminology used herein is for the purpose of describing specific embodiments only and is not intended to limit the present disclosure. The terms "comprising," "including," and the like as used herein are meant to be interpreted in an inclusive sense, i.e., to mean that the stated features, steps, operations, and / or components are present, but not to the exclusion of one or more other features, steps, operations, and / or components.

[0044] All terms used herein, including technical and scientific terms, have the meanings commonly understood by one of ordinary skill in the art, unless otherwise defined. It should be noted that the terms used herein should be interpreted as having meanings that are consistent with the context of the specification, and should not be interpreted in an idealized or overly formal way.

[0045] In the case where expressions such as "at least one of A, B, and C, etc." are used, it generally should be interpreted to include any of one, two, three, etc. of the items listed after the conjunction, for example, "a system having at least one of A, B, and C" should be interpreted to include a system having A alone, a system having B alone, a system having C alone, a system having both A and B together, a system having both A and C together, a system having both B and C together, and / or a system having all of A, B, and C together, etc. In the case where expressions such as "at least one of A, B, or C, etc." are used, it generally should be interpreted to include any of one, two, three, etc. of the items listed after the conjunction, for example, "a system having at least one of A, B, or C" should be interpreted to include a system having A alone, a system having B alone, a system having C alone, a system having both A and B together, a system having both A and C together, a system having both B and C together, and / or a system having all of A, B, and C together, etc.

[0046] It is also necessary to note that the directional phrases mentioned in the embodiments, such as "upper", "lower", "front", "back", "left", "right", "X", "Y", "Z", etc., are only the directions of the drawings, and are not intended to limit the protection scope of the present disclosure. Throughout the drawings, the same elements are represented by the same or similar reference numerals. When the conventional structures or configurations may cause confusion in understanding the present disclosure, they will be omitted.

[0047] Figure 1 A partial cross-sectional view of an electron gun in the related art is schematically shown, Figure 2 A partial perspective view of an electron gun in the related art is schematically shown.

[0048] In the process of implementing the present disclosure, it is found that, for example, Figure 1 and Figure 2As shown, the shorter side of the emitting surface of the two cathodes 9 of the magnetron-injected electron gun in the related technology (i.e., Figure 2 The line containing the midpoint of the two sides (approximately located in the left-right direction) shown in the diagram is installed parallel to the XZ plane. For example... Figure 2 As shown, electrons in the magnetron-injected electron gun are emitted from the rectangular hot cathode 9 under the combined action of high temperature and anode. The emitted electron beam forms a spiral electron beam in a gyratory motion under the compression of the magnetic field. Under the relativistic effect, the electron beam clusters in the angular direction of the gyratory motion and enters the interaction region in a scattered manner with a certain horizontal-to-vertical velocity ratio and velocity to carry out beam-wave interaction. The energy carried by the electrons is transferred to the electromagnetic wave, amplifying the energy of the electromagnetic wave.

[0049] Figure 3 This schematically illustrates the force analysis diagram of the trajectory of the ribbon electron beam of an electron gun in the XY plane. Figure 4 This schematically illustrates a theoretical cross-sectional view of the trajectory of the ribbon electron beam of an electron gun in the XY plane in the related art. Figure 5 The diagram schematically illustrates a cross-sectional view of the trajectory of the ribbon electron beam of an electron gun in the XY plane.

[0050] like Figure 3 As shown, under the cylindrical axisymmetric magnetic field generated by the superconducting coil, the edge of the ribbon electron beam has an electric field E pointing towards the interior of the electron beam due to the space charge effect. This causes the ribbon electron beam to drift at a velocity Vd as it moves in the magnetic field, resulting in spatial drift in the E×B direction on both sides. This causes the ribbon cyclotron electron beam to twist and rotate, thus producing... Figure 4 and Figure 5 The electron beam shown is tilted relative to the XZ plane. This will significantly affect the quality of the incident electron beam, leading to a decrease in interaction efficiency during subsequent beam-wave interactions.

[0051] Figure 6 A partial cross-sectional view of a dual-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is schematically shown. Figure 7 A schematic cross-sectional view of a dual-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is shown. Figure 8 Schematic illustration Figure 7 A partially enlarged view of part A of the dual-injection planar magnetron injection electron gun shown. Figure 9 A partial perspective view of a dual-injection planar magnetron injection electron gun according to an embodiment of the present disclosure is shown schematically.

[0052] As one aspect of this disclosure, a dual-injection planar magnetron injection electron gun is provided. For example... Figures 6 to 9As shown, the dual-beam planar magnetron injection electron gun includes a focusing electrode 1, two strip cathodes 2, an anode 3, and a magnetic field generating assembly. The focusing electrode 1 includes two inclined planes extending in the Z-axis direction and inclined towards each other. The two strip cathodes 2 are mounted parallel to each other on the inclined planes of the focusing electrode 1, and are inclined in a clockwise or counterclockwise rotation. The cathodes are configured to emit electrons when heated. An electric field is formed between the anode 3 and the two strip cathodes 2 to accelerate the emitted electrons, forming an electron beam. The electron beam rotates under the influence of the magnetic field generated by the magnetic field generating assembly, forming two strip-shaped electron beams and reducing the angle between the cross-section of the two strip-shaped electron beam trajectories in the XY plane and the ZX plane.

[0053] According to the dual-injection planar magnetron injection electron gun of this disclosure, two strip cathodes 2 are respectively mounted parallel to each other on the inclined surface of the focusing electrode 1, and are tilted relative to both the ZX plane and the XY plane, and the short side of the emitting surface of the strip cathode 2 (i.e., Figure 9 The line containing the midpoint of the two sides (approximately located in the left-right direction in the shown viewpoint) is equivalent to the XY plane being tilted, so that the electron beam has a velocity component perpendicular to the Z-axis when it is emitted. As a result, the electron beam rotates under the influence of the magnetic field, forming two ribbon-shaped electron beams. This reduces the angle between the cross section of the two ribbon-shaped electron beams' motion trajectory on the XY plane and the ZX plane, allowing the ribbon-shaped electron beams entering the interaction region to be as parallel to the ZX plane as possible. This improves the incident quality of the ribbon-shaped electron beams and places them in the optimal interaction position, thereby improving the efficiency of beam-wave interaction with electromagnetic waves.

[0054] According to embodiments of this disclosure, the two opposing inclined surfaces of the focusing electrode 1 guide the electron beam in a specific direction and perform initial focusing.

[0055] According to embodiments of this disclosure, such as Figures 6 to 9 As shown, the dual-beam planar magnetron injection electron gun also includes a modulation component 7. The modulation component 7 is spatially isolated from the two strip cathodes 2, the focusing electrode 1, and the anode 3, and is located between the two strip cathodes 2 and the anode 3, and is used to adjust the speed and direction of the two strip electron beams.

[0056] According to embodiments of this disclosure, the parameters of the two strip electron beams are adjusted by the modulation component 7, thereby improving the stability of the device and enabling it to maintain good performance under different operating conditions.

[0057] According to embodiments of this disclosure, such as Figures 6 to 9 As shown, the modulation component 7 includes two modulation anodes 71, which are suitable for modulating the speed and direction of the two strip electron beams respectively.

[0058] According to an embodiment of the present disclosure, the electrons are accelerated when passing through the space between the focusing electrode and the modulation anode 71, and the voltage of the modulation anode 71 determines the exit speed of the strip-shaped electron beam.

[0059] According to an embodiment of the present disclosure, the modulation anode voltage is a certain percentage of the anode control voltage, and the parameters of the finally formed strip-shaped electron beam are adjusted to obtain a strip-shaped electron beam meeting the requirements.

[0060] According to an embodiment of the present disclosure, the shape of the two strip-shaped cathodes 2 can be any one of a rectangle, a racetrack, and an ellipse.

[0061] According to an embodiment of the present disclosure, the electric field in the double-injection planar magnetron injection electron gun is generated by the voltage difference between the cathode 2 and the anode 3, and the direction is from the anode 3 (positive electrode) to the cathode (negative electrode). The main function of the electric field is to accelerate the electrons, so that the electrons move from the cathode to the anode 3 to form an electron beam.

[0062] According to an embodiment of the present disclosure, the magnetic field is generated by the magnetic field generating assembly located around the double-injection planar magnetron injection electron gun, and the direction of the magnetic field is parallel to the travel direction of the electron beam. The magnetic field is used to control the shape and trajectory of the electron beam, and the electron beam is focused or deflected by applying the Lorentz force perpendicular to the travel direction.

[0063] Figure 10 A curve diagram of the magnetic field strength in the Z-axis direction according to an embodiment of the present disclosure is schematically shown.

[0064] As shown in Figure 10 , the abscissa represents the distance in the Z-axis direction, and the ordinate represents the magnetic field strength. The position marked "1" in the figure is the position of the strip-shaped cathode 2.

[0065] According to an embodiment of the present disclosure, as shown in Figure 6 and Figure 10 , a cavity 8 extending in the Z-axis direction is formed in the anode 3, and the cavity 8 is sequentially divided into a first region 4, a second region 5, and a third region 6 in the Z-axis direction. The magnetic field strength of the magnetic field gradually increases in the first region 4 to adjust the electron beam. The magnetic field strength is substantially constant in the second region 5 to make the strip-shaped electron beam formed by the electron beam interact with the electromagnetic wave. The magnetic field strength gradually decreases in the third region 6 to collect the strip-shaped electron beam that has exchanged energy with the electromagnetic wave after passing through the second region 5.

[0066] According to an embodiment of the present disclosure, the magnetic field strength of the first region 4 gradually increases, which can adjust the speed of the electron beam, so that the electron beam is adiabatically compressed in the first region 4 to form a strip-shaped electron beam with a certain transverse-longitudinal velocity ratio and velocity dispersion.

[0067] According to the embodiment of the present disclosure, the magnetic field strength of the second region 5 is substantially constant, which can make the strip-shaped electron beam formed in the first region 4 interact with the electromagnetic wave in a stable state, thereby ensuring the stability of the beam-wave interaction.

[0068] According to the embodiment of the present disclosure, the magnetic field strength of the third region 6 gradually decreases, and the electron beam diverges, so that the strip-shaped electron beam that has exchanged energy with the electromagnetic wave after passing through the second region 5 is intercepted by the tube wall under the action of the collector and is recycled.

[0069] According to the embodiment of the present disclosure, as shown in Figure 6 The first region 4 includes an electron emission region 41 and an adiabatic compression region 42. The electron emission region 41 is adapted to accommodate the focusing electrode 1, the two modulation anodes 7 (which will be described in detail later) and the two strip-shaped cathodes 2. The magnetic field strength of the magnetic field gradually increases in the adiabatic compression region 42 in the direction of travel of the electrons, so as to perform an adiabatic compression action on the electrons in the electron beam from the electron emission region 41, so as to reduce the speed of the electrons in the Z-axis direction and increase the speed of the electrons in the transverse direction (i.e., the X-axis direction).

[0070] According to the embodiment of the present disclosure, the electrons in the electron beam are subjected to an adiabatic compression action by the magnetic field in the adiabatic compression region 42, so as to reduce the speed of the electrons in the Z-axis direction and increase the speed of the electrons in the transverse direction (i.e., the X-axis direction), thereby reducing the gyroradius of the electrons, so as to adjust the motion parameters and spatial distribution of the electron beam.

[0071] According to the embodiment of the present disclosure, as shown in Figure 6 The second region 5 is an interaction region. It is adapted to allow the strip-shaped electron beam that has reached a stable state after adiabatic compression to interact with the electromagnetic wave.

[0072] According to the embodiment of the present disclosure, in the interaction region, the magnetic field and the electric field directed to the inside of the strip-shaped electron beam due to the space charge effect form a Lorentz force, so that the edges of the strip-shaped electron beams opposite to each other in the XY plane are subjected to a Lorentz force in the Y direction to undergo a twisted rotation relative to the ZX plane. The inclination direction of the two strip-shaped cathodes 2 relative to the ZX plane is opposite to the direction of the twisted rotation, so as to reduce the included angle between the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane and the ZX plane, and make the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane as parallel to the ZX plane as possible.

[0073] According to the embodiment of the present disclosure, the electron is emitted from the cathode in a slanting manner, the cathode has an inclination angle with the ZX plane, and when the electron is emitted under the action of the electric field, there is a velocity parallel to the Z-axis direction and a velocity perpendicular to the Z-axis direction, so that the electron has a spiral advancing motion state. In the process of electron advancing, the electron is subjected to the action of the Lorentz force formed by the Z-direction magnetic field and the internal electric field directed to the electron beam, so that the electron is subjected to the Y-direction Lorentz force and is twisted and rotated. The strip-shaped cathode 2 is inclined to the opposite direction of the twisted rotation, thereby offsetting the twisted rotation generated in this way, so that the strip-shaped electron beam is as parallel as possible to the ZX plane when reaching the interaction region.

[0074] According to the embodiment of the present disclosure, before entering the interaction region, the electron beam gradually reaches a stable state under the action of adiabatic compression as the magnetic field increases, and finally enters the interaction region in a stable state, so that the inclination angle is basically unchanged in the interaction region. After passing through the interaction region, the magnetic field decreases, the strip-shaped electron beam diverges, and the inclination angle also continues to increase.

[0075] According to the embodiment of the present disclosure, the electron is emitted from the strip-shaped hot cathode under the joint action of high temperature and the anode 3, the emitted electron beam generates a planar rotating strip-shaped electron beam through an adiabatic compression process, and the strip-shaped cathode 2 is arranged on the inclined surface of the focusing pole 1 and is inclined relative to the ZX plane, that is, the strip-shaped cathode 2 rotates clockwise or counterclockwise around the center of the strip-shaped cathode 2 on the inclined surface of the focusing pole. The inclination makes the inclination angle of the strip-shaped cathode 2 offset the rotational distortion of the strip-shaped electron beam generated in the cylindrical axisymmetric magnetic field, thereby reducing the angle of rotation of the strip-shaped electron beam in the ZX plane caused by the axisymmetric focusing magnetic field, and further generating a strip-shaped electron beam with high quality into the beam-wave interaction region.

[0076] According to the embodiment of the present disclosure, the interaction region is provided with a resonant cavity having a wave output end. The resonant cavity is used to excite electromagnetic waves, and the electromagnetic waves and the strip-shaped electron beam perform beam-wave interaction in the resonant cavity, so that the electromagnetic waves are amplified and output from the wave output end.

[0077] According to the embodiment of the present disclosure, the magnetic field generating assembly includes a superconducting coil. The superconducting coil is arranged at the periphery of the anode 3 in space and is spaced apart from the anode 3, and is suitable for providing a cylindrical axisymmetric magnetic field parallel to the Z-axis direction in the axial direction.

[0078] According to embodiments of this disclosure, the electron beam emitted by the strip cathode 2 forms a spiral electron beam with gyratory motion under the compression of the magnetic field. The electron beam entering the interaction region exhibits a clustering phenomenon in the angular direction of its gyratory motion due to relativistic effects. In the high-frequency system, beam-wave interaction occurs, allowing the energy carried by the electrons to be transferred to the electromagnetic wave, amplifying the energy of the electromagnetic wave. Compared to traditional planar magnetron injection electron guns, the dual-beam planar magnetron injection electron gun with an inclined cathode that rotates clockwise or counterclockwise on the inclined surface of the focusing electrode can adapt to the cylindrical axisymmetric magnetic field generated by the superconducting coil, forming parallel dual electron beams within a certain region of the cylindrical axisymmetric magnetic field, without the need to specifically design and manufacture more complex rectangular magnetic field coils.

[0079] Figure 11 The diagram schematically illustrates a cross-sectional view of the motion trajectories of two strip-shaped electron beams in the interaction region on the XY plane according to an embodiment of the present disclosure.

[0080] In one illustrative embodiment, the anode voltage is 60kV, the modulated anode voltage is 15kV, the cathode voltage is 0V, the current is 5A, and the cathode emitting surface tilt angle is 9°. Simulation software yields a cross-sectional view of the motion trajectories of the two strip-shaped electron beams in the interaction region on the XY plane, as shown below. Figure 11 As shown. Figure 11 As shown, placing an inclined cathode relative to the ZX plane can effectively reduce the rotation angle of the ribbon electron beam in the interaction region relative to the ZX plane.

[0081] The embodiments of this disclosure have been described above. However, these embodiments are for illustrative purposes only and are not intended to limit the scope of this disclosure. Although various embodiments have been described above, this does not mean that the measures in the various embodiments cannot be used advantageously in combination. The scope of this disclosure is defined by the appended claims and their equivalents. Various substitutions and modifications can be made by those skilled in the art without departing from the scope of this disclosure, and all such substitutions and modifications should fall within the scope of this disclosure.

Claims

1. A dual injection planar magnetron injection electron gun characterized in that, The application relates to a device for generating two beams of banded electron beams, comprising: a focusing electrode, which comprises two inclined surfaces extending in the Z-axis direction and arranged oppositely; two strip-shaped cathodes, which are respectively installed on the inclined surfaces of the focusing electrode in parallel to each other and are introduced with a clockwise or counterclockwise rotation on the inclined surfaces, and the cathodes are configured to respectively emit electrons after being heated; an anode, which forms an electric field between the two strip-shaped cathodes to accelerate the emitted electrons to form an electron beam; and a magnetic field generating assembly, which is used to rotate the electron beam under the action of a magnetic field generated by the magnetic field generating assembly to form two beams of banded electron beams and reduce the included angle between the cross section of the motion track of the two beams of banded electron beams in the XY plane and the ZX plane.

2. The dual injection planar magnetron injection electron gun of claim 1, wherein, A cavity extending in the Z-axis direction is formed in the anode, and the cavity is sequentially divided into the following regions in the Z-axis direction: a first region, in which the magnetic field strength of the magnetic field gradually increases to adjust the electron beam; a second region, in which the magnetic field strength is substantially constant to make the banded electron beams formed by the electron beam perform beam-wave interaction with electromagnetic waves; and a third region, in which the magnetic field strength gradually decreases to collect the banded electron beams which have exchanged energy with the electromagnetic waves after passing through the second region.

3. The dual-injection planar magnetron injection electron gun according to claim 2, characterized in that, The first region comprises: an electron emission area, which is suitable for accommodating the focusing electrode and the two strip-shaped cathodes; and an adiabatic compression area, in which the magnetic field strength of the magnetic field gradually increases in the electron travel direction to perform an adiabatic compression action on the electrons in the electron beam from the electron emission area, so that the speed of the electrons in the Z-axis direction decreases and the speed of the electrons in the transverse direction increases.

4. The dual injection planar magnetron injection electron gun of claim 3, wherein, The second region is an interaction area, which is suitable for allowing the banded electron beams which have reached a stable state after passing through the adiabatic compression area to perform beam-wave interaction with electromagnetic waves. In the interaction area, the magnetic field and the electric field generated due to the space charge effect and pointing to the inside of the banded electron beams form a Lorentz force, so that the edges of the banded electron beams opposite to each other in the XY plane are subjected to a Y-direction Lorentz force to perform a twisted rotation relative to the ZX plane; 5. The dual injection planar magnetron injection electron gun of claim 4, wherein, wherein the inclined direction of the two strip-shaped cathodes relative to the ZX plane is opposite to the direction of the twisted rotation to reduce the included angle. The interaction area is provided with a resonant cavity with a wave output end; 6. The dual injection planar magnetron injection electron gun of claim 4, wherein, wherein the resonant cavity is used to excite the electromagnetic waves and make the electromagnetic waves perform beam-wave interaction with the banded electron beams in the resonant cavity to amplify the electromagnetic waves and then output the electromagnetic waves from the wave output end. The magnetic field generating assembly comprises:

7. The dual injection planar magnetron injection electron gun according to any of claims 1-6, wherein, a superconducting coil, which is arranged at the periphery of the anode in space and is suitable for providing a cylindrical axisymmetric magnetic field in the axial direction parallel to the Z-axis direction. Further comprising:

8. The dual injection planar magnetron injection electron gun of claim 1, wherein, a modulation assembly, which is isolated from the two strip-shaped cathodes, the focusing electrode and the anode in space and is located between the two strip-shaped cathodes and the anode, and is used to adjust the speed and direction of the two beams of banded electron beams. The modulation assembly comprises two modulation anodes, which are suitable for respectively adjusting the speed and direction of the two beams of banded electron beams.

9. The dual injection planar magnetron injection electron gun of claim 8, wherein, ​ 10. The dual injection planar magnetron injection electron gun according to any one of claims 1-6, wherein, The shape of the two bar cathodes is any one of rectangular, racetrack, and elliptical. The shape of the two bar cathodes is any one of rectangular, racetrack, and elliptical.

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