Display substrate, preparation method thereof and display device

Abstract

The invention discloses a display substrate and a preparation method thereof and a display device.The display substrate comprises a base, a light-emitting structure layer arranged on the base and a color film structure layer arranged on the side, away from the base, of the light-emitting structure layer, the color film structure layer comprises a first light filtering pattern located on a first sub-pixel, and a second light filtering pattern located on a second sub-pixel. The first light filtering pattern is located on the first sub-pixel, the second light filtering pattern is located on the second sub-pixel, the third light filtering pattern is located on the third sub-pixel, the thickness of the first light filtering pattern is larger than that of the second light filtering pattern, and the thickness of the third light filtering pattern is larger than that of the second light filtering pattern; the difference between the thickness of the first filtering pattern and the thickness of the second filtering pattern is larger than or equal to 500 nanometers and smaller than or equal to 4500 nanometers, and the difference between the thickness of the third filtering pattern and the thickness of the second filtering pattern is larger than or equal to 500 nanometers and smaller than or equal to 4500 nanometers.

Description

Technical Field

[0001] This article relates to but is not limited to the field of display technology, and specifically to a display substrate and a preparation method thereof, and a display device. Background Art

[0002] Micro Organic Light-Emitting Diode (Micro-OLED) is a micro display that has been developed in recent years, and silicon-based OLED is one of them. Silicon-based OLED can not only realize active addressing of pixels, but also realize the preparation of pixel driving circuits and other structures on silicon-based substrates, which is conducive to reducing the system volume and achieving lightweight. Silicon-based OLED is prepared using mature complementary metal oxide semiconductor (Complementary Metal Oxide Semiconductor, CMOS) integrated circuit technology. It has the advantages of small size, high resolution (Pixels Per Inch, PPI), high refresh rate, etc., and is widely used in virtual reality (VR) or augmented reality (AR) near-eye display fields. Summary of the invention

[0003] The embodiment of the present application provides a display substrate, which can improve the luminous efficiency of the display substrate and increase the color gamut.

[0004] The embodiment of the present application provides a display substrate, comprising a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel is configured to emit a first color light, the second sub-pixel is configured to emit a second color light, and the third sub-pixel is configured to emit a third color light; The display substrate includes a substrate, a light-emitting structure layer arranged on the substrate, and a color filter structure layer arranged on a side of the light-emitting structure layer away from the substrate, the color filter structure layer includes a first filter pattern located at the first sub-pixel, a second filter pattern located at the second sub-pixel, and a third filter pattern located at the third sub-pixel, the thickness of the first filter pattern is greater than the thickness of the second filter pattern, and the thickness of the third filter pattern is greater than the thickness of the second filter pattern; the difference between the thickness of the first filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers, and the difference between the thickness of the third filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0005] In an exemplary embodiment, the transmittance of the first filter pattern to the first color light is greater than or equal to 85%; the transmittance of the first filter pattern to the third color light is less than or equal to 0.3%. In an exemplary embodiment, a thickness of the first filter pattern is substantially equal to a thickness of the third filter pattern.

[0006] In an exemplary embodiment, the thickness of the first filter pattern is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers.

[0007] In an exemplary embodiment, a transmittance of the second filter pattern to the second color light is greater than or equal to 85%.

[0008] In an exemplary embodiment, the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 3000 nanometers.

[0009] In an exemplary embodiment, a surface of the second filter pattern away from the substrate is recessed toward the substrate compared to a surface of the first filter pattern away from the substrate; a surface of the second filter pattern away from the substrate is recessed toward the substrate compared to a surface of the third filter pattern away from the substrate.

[0010] In an exemplary embodiment, the transmittance of the third color filter pattern to the third color light is greater than or equal to 85%, and the transmittance of the third color filter pattern to the first color light is less than or equal to 3.5%.

[0011] In an exemplary embodiment, the thickness of the third filter pattern is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers.

[0012] In an exemplary embodiment, the light-emitting structure layer includes light-emitting devices respectively located in the first sub-pixel, the second sub-pixel and the third sub-pixel, and the light-emitting devices include at least a first electrode, a light-emitting functional layer and a second electrode stacked in sequence along a direction away from the substrate, and the first electrode includes a plurality of conductive patterns and a dielectric layer stacked in sequence along a direction away from the substrate, and the dielectric layer is arranged between any adjacent conductive patterns.

[0013] In an exemplary embodiment, the first electrode includes a first conductive pattern, a second conductive pattern, a dielectric layer, and a third conductive pattern sequentially stacked in a direction away from the substrate, a via is provided in the dielectric layer, and the third conductive pattern is connected to the second conductive pattern through the via.

[0014] In an exemplary embodiment, the thickness of the dielectric layer of the first electrode in the first sub-pixel is greater than or equal to 100 nanometers and less than or equal to 150 nanometers; the thickness of the dielectric layer of the first electrode in the second sub-pixel is less than or equal to 50 nanometers; and the thickness of the dielectric layer of the first electrode in the third sub-pixel is greater than or equal to 110 nanometers and less than or equal to 160 nanometers.

[0015] In an exemplary embodiment, a vertical distance from a surface of the first electrode of the third subpixel away from the substrate side to the substrate surface is greater than a vertical distance from a surface of the first electrode of the first subpixel away from the substrate side to the substrate surface; a vertical distance from a surface of the first electrode of the first subpixel away from the substrate side to the substrate surface is greater than a vertical distance from a surface of the first electrode of the second subpixel away from the substrate side to the substrate surface.

[0016] The embodiment of the present application further provides a method for preparing a display substrate, wherein the display substrate comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel is configured to emit a first color light, the second sub-pixel is configured to emit a second color light, and the third sub-pixel is configured to emit a third color light; the method for preparing the display substrate comprises: forming a light-emitting structure layer on a substrate; A color filter structure layer is formed on the side of the light-emitting structure layer away from the substrate, and the color filter structure layer includes a first filter pattern located at the first sub-pixel, a second filter pattern located at the second sub-pixel, and a third filter pattern located at the third sub-pixel, the thickness of the first filter pattern is greater than the thickness of the second filter pattern, and the thickness of the third filter pattern is greater than the thickness of the second filter pattern; the difference between the thickness of the first filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers, and the difference between the thickness of the third filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0017] An embodiment of the present application also provides a display device, comprising the aforementioned display substrate.

[0018] Other features and advantages of the present application will be described in the following description, and partly become apparent from the description, or be understood by implementing the present application. Other advantages of the present application can be realized and obtained by the schemes described in the description and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The accompanying drawings are used to provide an understanding of the technical solution of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the technical solution of the present application and do not constitute a limitation on the technical solution of the present application.

[0020] Figure 1 is a schematic diagram of a cross-sectional structure of a related display substrate; Figure 2 is a structural schematic diagram of a display device; Figure 3 A schematic diagram of the planar structure of a display area in a display device; Figure 4 A schematic cross-sectional structure diagram of a display substrate according to an embodiment of the present disclosure; Figure 5 This is a schematic cross-sectional structure diagram of a light-emitting functional layer of a display substrate according to an embodiment of the present disclosure; Figure 6 Spectral curve diagrams of related display substrates and display substrates of embodiments of the present disclosure; Figure 7 A graph showing the transmittance of a color film structure layer of a display substrate to light of different wavelengths; Figure 8 A curve diagram showing the transmittance of a color film structure layer of another display substrate to light of different wavelengths; Fig. 9 A curve diagram showing the transmittance of a color film structure layer of another display substrate to light of different wavelengths; Fig.10 This is a curve diagram of the transmittance of the color film structure layer of another display substrate to light of different wavelengths. DETAILED DESCRIPTION

[0021] The present application describes multiple embodiments, but the description is exemplary rather than restrictive, and it is obvious to those skilled in the art that there may be more embodiments and implementations within the scope of the embodiments described in the present application. Although many possible feature combinations are shown in the drawings and discussed in the specific embodiments, many other combinations of the disclosed features are also possible. Unless specifically limited, any feature or element of any embodiment may be used in combination with any other feature or element in any other embodiment, or may replace any other feature or element in any other embodiment.

[0022] The present application includes and contemplates combinations of features and elements known to those of ordinary skill in the art. The embodiments, features and elements disclosed in the present application may also be combined with any conventional features or elements to form a unique invention scheme. Any features or elements of any embodiment may also be combined with features or elements from other invention schemes to form another unique invention scheme. Therefore, it should be understood that any feature shown and / or discussed in the present application may be implemented individually or in any appropriate combination. Therefore, except for the limitations made according to the attached claims and their equivalents, the embodiments are not subject to other restrictions. In addition, various modifications and changes may be made within the scope of protection of the attached claims.

[0023] In addition, when describing representative embodiments, the specification may have presented the method and / or process as a specific sequence of steps. However, to the extent that the method or process does not rely on the specific order of the steps described herein, the method or process should not be limited to the steps of the specific order described. As will be understood by those of ordinary skill in the art, other sequences of steps are also possible. Therefore, the specific sequence of the steps set forth in the specification should not be interpreted as a limitation to the claims. In addition, the claims for the method and / or process should not be limited to the steps of performing them in the order written, and those skilled in the art can easily understand that these sequences can be changed and still remain within the spirit and scope of the embodiments of the present application.

[0024] Figure 1 FIG. 1 is a schematic diagram of a cross-sectional structure of a related display substrate. Figure 1 As shown, in the direction perpendicular to the display substrate, the relevant display substrate may include: a substrate 101', a driving circuit layer 102' arranged on the substrate 101', a light-emitting structure layer arranged on the side of the driving circuit layer 102' away from the substrate 101', an encapsulation structure layer 104' arranged on the side of the light-emitting structure layer away from the substrate 101', and a color film structure layer 105' arranged on the side of the encapsulation structure layer 104' away from the substrate 101'. The light-emitting structure layer includes a plurality of light-emitting devices, and the light-emitting devices may include a first electrode 11', a light-emitting functional layer 12' and a second electrode 13' sequentially stacked in a direction away from the substrate 101'. The light-emitting functional layer 12' may include a plurality of light-emitting units sequentially stacked in a direction away from the substrate 101' and a charge generation layer connected to adjacent light-emitting units. The light emitted by the stacked plurality of light-emitting units is superimposed on each other to achieve the effect of emitting white light.

[0025] The first electrode 11' of the relevant display substrate may be a weak microcavity structure, and the first electrode 11' may include a first conductive pattern 11-1', a second conductive pattern 11-2' and a third conductive pattern 11-3' stacked in sequence along a direction away from the substrate 101', the first conductive pattern 11-1' is connected to the driving circuit layer 102', the second conductive pattern 11-2' is arranged on the side of the first conductive pattern 11-1' away from the substrate 101', and contacts the first conductive pattern 11-1'; the third conductive pattern 11-3' is arranged on the side of the second conductive pattern 11-2' away from the substrate 101', and contacts the second conductive pattern 11-2'. The color filter structure layer 105' may include a black matrix (BM) and a filter pattern (CF), the position of the filter pattern may correspond to the position of the light-emitting device, and the black matrix may be located between adjacent filter patterns.

[0026] The preparation process of the relevant display substrate includes the following steps.

[0027] Step 101, first forming a driving circuit layer 102' on a substrate 101', the driving circuit layer 102' including a pixel driving circuit, the pixel driving circuit including a plurality of transistors and a storage capacitor; then, forming a first conductive film, a second conductive film and a third conductive film in sequence on a side of the driving circuit layer 102' away from the substrate 101' by a sputtering process; then, patterning the first conductive film, the second conductive film and the third conductive film by a composition process to form first electrodes 11' corresponding to different sub-pixels.

[0028] In step 102, an isolation column 22' and a pixel definition layer 21' are sequentially formed on the side of the first electrode 11' away from the substrate 101'. The isolation column 22' is located between the first electrodes 11' of adjacent sub-pixels to isolate the first electrodes 11' of adjacent sub-pixels. The pixel definition layer 21' is disposed on the surface of the isolation column 22' away from the substrate 101'. A pixel opening is disposed in the pixel definition layer 21' to expose at least a portion of the first electrode 11'.

[0029] Step 103, by evaporation process, a light-emitting functional layer 12' is formed on the side of the pixel definition layer 21' away from the substrate, the light-emitting functional layer 12' covers the pixel opening and contacts the exposed first electrode 11'. Some film layers in the light-emitting functional layer 12' of multiple sub-pixels can be common layers connected together.

[0030] Step 104 , forming a second electrode 13 ′ on a side of the light-emitting functional layer 12 ′ away from the substrate 101 ′. The second electrodes 13 ′ of a plurality of sub-pixels may be a common layer connected together.

[0031] Step 105 : using a thin film encapsulation (TFE) method, forming an encapsulation structure layer 104 ′ on the side of the second electrode 13 ′ away from the substrate.

[0032] Step 106 , forming a color filter structure layer 105 ′ on the side of the packaging structure layer 104 ′ away from the substrate.

[0033] The inventors of the present application have found through research that the first electrode 11 ′ of the relevant display substrate is a weak microcavity structure, which will lead to a broadened spectrum of the output light of the display substrate and a large half-peak width of the spectrum, ultimately resulting in low color purity and poor color gamut of the display substrate.

[0034] An embodiment of the present application provides a display substrate, comprising a substrate, a light-emitting structure layer arranged on the substrate, and a color filter structure layer arranged on a side of the light-emitting structure layer away from the substrate, the color filter structure layer comprising a first filter pattern located at the first sub-pixel, a second filter pattern located at the second sub-pixel, and a third filter pattern located at the third sub-pixel, the thickness of the first filter pattern is greater than the thickness of the second filter pattern, and the thickness of the third filter pattern is greater than the thickness of the second filter pattern; the difference between the thickness of the first filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers, and the difference between the thickness of the third filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0035] Figure 2 FIG. 1 is a schematic diagram of the structure of a display device. Figure 2 As shown, the display device may include: a timing controller, a data driver, a scan driver, a light-emitting driver and a pixel array. The timing controller is connected to the data driver, the scan driver and the light-emitting driver respectively. The data driver is connected to a plurality of data signal lines (for example, D1 to Dn), the scan driver is connected to a plurality of scan signal lines (for example, S1 to Sm), and the light-emitting driver is connected to a plurality of light-emitting control lines (for example, E1 to Eo). Among them, n, m and o can be natural numbers. The pixel array may include at least two sub-pixels Pxij, and i and j can be natural numbers. At least one sub-pixel Pxij may include: a pixel circuit and a light-emitting device connected to the pixel circuit. The pixel circuit may be connected to the scan signal line, the light-emitting control line and the data signal line, respectively.

[0036] In some exemplary embodiments, the timing controller may provide a grayscale value and a control signal suitable for the specifications of the data driver to the data driver, a clock signal, a scan start signal, etc. suitable for the specifications of the scan driver to the scan driver, and a clock signal, an emission stop signal, etc. suitable for the specifications of the light emitting driver to the light emitting driver. The data driver may generate a data voltage to be provided to the data signal lines D1, D2, D3, ... and Dn using the grayscale value and the control signal received from the timing controller. For example, the data driver may sample the grayscale value using the clock signal, and apply the data voltage corresponding to the grayscale value to the data signal lines D1 to Dn in units of pixel rows. The scan driver may generate a scan signal to be provided to the scan signal lines S1, S2, S3, ... and Sm by receiving a clock signal, a scan start signal, etc. from the timing controller. For example, the scan driver may sequentially provide a scan signal having an on-level pulse to the scan signal lines S1 to Sm. For example, the scan driver may be constructed in the form of a shift register, and may generate a scan signal in a manner that a scan start signal provided in the form of an on-level pulse is sequentially transmitted to a next-level circuit under the control of a clock signal. The light-emitting driver may generate a light-emitting control signal to be provided to the light-emitting control lines E1, E2, E3, ... and Eo by receiving a clock signal, an emission stop signal, etc. from a timing controller. For example, the light-emitting driver may sequentially provide an emission signal with an off-level pulse to the light-emitting control lines E1 to Eo. For example, the light-emitting driver may be constructed in the form of a shift register, and may generate a light-emitting control signal in a manner that an emission stop signal provided in the form of an off-level pulse is sequentially transmitted to a next-level circuit under the control of a clock signal.

[0037] Figure 3 FIG. 1 is a schematic diagram of a planar structure of a display area in a display device. Figure 3 As shown, the display area of ​​the display device may include a plurality of pixel units P arranged in a matrix manner, at least one of the plurality of pixel units P includes a first sub-pixel P1 emitting a first color light, a second sub-pixel P2 emitting a second color light, and a third sub-pixel P3 emitting a third color light, and the first sub-pixel P1, the second sub-pixel P2, and the third sub-pixel P3 each include a pixel driving circuit and a light-emitting device. The pixel driving circuits in the sub-pixels are respectively connected to the scanning signal lines and the data signal lines, and the pixel driving circuits are configured to receive the data voltage transmitted by the data signal lines under the control of the scanning signal lines, and output corresponding currents to the light-emitting devices. The light-emitting devices in the sub-pixels are respectively connected to the pixel driving circuits of the sub-pixels in which they are located, and the light-emitting devices are configured to emit light of corresponding brightness in response to the current output by the pixel driving circuits of the sub-pixels in which they are located.

[0038] In an exemplary embodiment, the first sub-pixel P1 may be a red sub-pixel emitting red (R) light, the second sub-pixel P2 may be a green sub-pixel emitting green (G) light, and the third sub-pixel P3 may be a blue sub-pixel emitting blue (B) light. In an exemplary embodiment, the shape of the sub-pixels may be any one or more of a triangle, a square, a rectangle, a rhombus, a trapezoid, a parallelogram, a pentagon, a hexagon, and other polygons, and may be arranged in a horizontal parallel arrangement, a vertical parallel arrangement, an X shape, a cross shape, a herringbone shape, a square shape, a diamond shape, or a delta shape, which is not limited in the present disclosure.

[0039] In an exemplary embodiment, a pixel unit may include four sub-pixels, which is not limited in the present disclosure.

[0040] Figure 4 Schematic diagram of a cross-sectional structure of a display substrate according to an embodiment of the present disclosure, wherein: Figure 4 Can be Figure 3 Cross-sectional view along the A-A' direction. Figure 4 The display substrate shown in the figure is a structure that uses white light + color film to achieve full color. Figure 4 As shown, the display substrate of the embodiment of the present disclosure may include a first sub-pixel P1, a second sub-pixel P2 and a third sub-pixel P3. The third sub-pixel P3, the first sub-pixel P1 and the second sub-pixel P2 are sequentially distributed along a direction parallel to the substrate. The first sub-pixel P1 may be a red sub-pixel emitting red (R) light, the second sub-pixel P2 may be a green sub-pixel emitting green (G) light, and the third sub-pixel P3 may be a blue sub-pixel emitting blue (B) light.

[0041] In an exemplary embodiment, in a direction perpendicular to the display substrate, the display substrate of the embodiment of the present disclosure may include: a substrate 101, a driving circuit layer 102 disposed on the substrate 101, a light emitting structure layer disposed on a side of the driving circuit layer 102 away from the substrate 101, a packaging structure layer 104 disposed on a side of the light emitting structure layer away from the substrate 101, and a color film structure layer 105 disposed on a side of the packaging structure layer 104 away from the substrate 101. In some possible implementations, the display device may include other film layers, such as a touch film layer, a cover layer, a lens layer, etc., which are not limited in the present disclosure.

[0042] In exemplary embodiments, the substrate 101 may be a silicon substrate or a glass substrate.

[0043] In an exemplary embodiment, the driving circuit layer 102 may be fabricated on the substrate 101 by a silicon semiconductor process (eg, a CMOS process), and the driving circuit layer 102 may include a pixel driving circuit, and the pixel driving circuit may include a plurality of transistors and a storage capacitor.

[0044] In an exemplary embodiment, the light emitting structure layer may include a light emitting device, and the first sub-pixel P1, the second sub-pixel P2, and the third sub-pixel P3 are each provided with a light emitting device. The light emitting device may be a tandem light emitting device, and the light emitting device may emit white light or light of other colors. In some embodiments, the light emitting device may be a single-layer light emitting device.

[0045] In an exemplary embodiment, the light-emitting device may include at least a first electrode 11, a light-emitting functional layer 12, and a second electrode 13 stacked in sequence along a direction away from the substrate 101. The first electrode 11 may be connected to the transistor of the driving circuit layer 102, the light-emitting functional layer 12 is connected to the first electrode 11, and the second electrode 13 is connected to the light-emitting functional layer 12. The light-emitting functional layer 12 emits light, such as white light, when driven by the first electrode 11 and the second electrode 13.

[0046] In an exemplary embodiment, the first electrode 11 is a strong microcavity structure. The first electrode 11 may include a first conductive pattern 11-1, a second conductive pattern 11-2, a dielectric layer 11-4, and a third conductive pattern 11-3 stacked in sequence along a direction perpendicular to the substrate. The first conductive pattern 11-1 is arranged on the side of the driving circuit layer 102 away from the substrate 101, and is connected to the transistor of the driving circuit layer 102; the second conductive pattern 11-2 is arranged on the side of the first conductive pattern 11-1 away from the substrate 101, and is in contact with the first conductive pattern 11-1; the dielectric layer 11-4 is arranged on the side of the second conductive pattern 11-2 away from the substrate 101, and is in contact with the second conductive pattern 11-2; the third conductive pattern 11-3 is arranged on the side of the dielectric layer 11-4 away from the substrate 101, and is in contact with the dielectric layer 11-4. A via is provided in the dielectric layer 11-4, and the third conductive pattern 11-3 is connected to the second conductive pattern 11-2 through the via. The dielectric layer 11-4 is used to adjust the thickness of the first electrode 11 so that the first electrode 11 forms a strong microcavity structure.

[0047] The display substrate of the embodiment of the present disclosure has a strong microcavity structure through the first electrode 11 of the sub-pixel, which improves the luminous efficiency of the sub-pixel of the display substrate and increases the color gamut.

[0048] In an exemplary embodiment, the thickness of the dielectric layer 11 - 4 in the first electrode 11 of the first subpixel P1 may be greater than or equal to 100 nanometers and less than or equal to 150 nanometers.

[0049] In an exemplary embodiment, the thickness of the dielectric layer 11 - 4 in the first electrode 11 of the second subpixel P2 may be less than or equal to 50 nanometers.

[0050] In an exemplary embodiment, the thickness of the dielectric layer 11 - 4 in the first electrode 11 of the third sub-pixel P3 may be greater than or equal to 110 nanometers and less than or equal to 160 nanometers.

[0051] The disclosed embodiment shows that the substrate controls the thickness of the dielectric layer 11-4 of different sub-pixels so that the corresponding sub-pixels are in a specific light wave resonance period. For example, the light wave resonance period of the first sub-pixel P1 and the light wave resonance period of the second sub-pixel P2 are both in the second period, and the light wave resonance period of the third sub-pixel P3 is in the third period.

[0052] In an exemplary embodiment, a vertical distance between a surface of the first electrode 11 of the third subpixel P3 away from the substrate and the surface of the substrate 101 is h3, a vertical distance between a surface of the first electrode 11 of the first subpixel P1 away from the substrate and the surface of the substrate 101 is h1, and a vertical distance between a surface of the first electrode 11 of the second subpixel P2 away from the substrate and the surface of the substrate 101 is h2, wherein the vertical distance h3 is greater than the vertical distance h1, and the vertical distance h1 is greater than the vertical distance h2.

[0053] In an exemplary embodiment, the material of the dielectric layer 11-4 may include a conductive material. For example, the material of the dielectric layer 11-4 may include at least one of indium tin oxide (ITO) and indium zinc oxide (IZO). The material of the dielectric layer 11-4 may also include an insulating material. For example, the material of the dielectric layer 11-4 may include silicon oxide, silicon nitride, silicon oxynitride, or silicon nitride oxide.

[0054] In an exemplary embodiment, the dielectric layer 11 - 4 may be a light-transmitting material, and the transmittance of the dielectric layer 11 - 4 to visible light is greater than 90%.

[0055] In an exemplary embodiment, the material of the first conductive pattern 11 - 1 and the third conductive pattern 11 - 3 may be a metal compound such as indium tin oxide (ITO), and the material of the second conductive pattern 11 - 2 may be a conductive metal such as silver, aluminum, or the like.

[0056] In an exemplary embodiment, the thickness of the first conductive pattern 11-1 and the third conductive pattern 11-3 is less than the thickness of the second conductive pattern 11-2. For example, the thickness of the first conductive pattern 11-1 and the third conductive pattern 11-3 can be greater than or equal to 70 angstroms and less than or equal to 100 angstroms, and the thickness of the second conductive pattern 11-2 can be greater than or equal to 800 angstroms and less than or equal to 1200 angstroms.

[0057] In some embodiments, the first electrode may include other numbers of conductive patterns in addition to three layers, for example, the first electrode may include two layers, four layers, five layers, six layers, etc. For example, the first electrode may include four layers of conductive patterns, and the first electrode may include a first conductive pattern, a second conductive pattern, a third conductive pattern, and a fourth conductive layer stacked in sequence along a direction perpendicular to the substrate, the material of the first conductive pattern may be titanium, the material of the second conductive pattern may be aluminum, the material of the third conductive pattern may be titanium or titanium nitride, the material of the fourth conductive layer may be indium tin oxide, the thickness of the first conductive pattern may be greater than or equal to 50 angstroms and less than or equal to 100 angstroms, the thickness of the second conductive pattern may be greater than or equal to 800 angstroms and less than or equal to 2000 angstroms, the thickness of the third conductive pattern may be greater than or equal to 50 angstroms and less than or equal to 100 angstroms, the thickness of the fourth conductive layer may be greater than or equal to 50 angstroms and less than or equal to 100 angstroms, and the dielectric layer may be disposed between the second conductive pattern and the third conductive pattern.

[0058] In an exemplary embodiment, the light-emitting functional layer 12 of the light-emitting device includes at least two light-emitting units stacked in sequence and connected in series along a direction away from the substrate 101, the light-emitting unit includes at least a light-emitting layer, and a charge generation layer is provided between two adjacent light-emitting units, and the charge generation layer generates holes and electrons under the action of the voltage of the first electrode and the second electrode.

[0059] In an exemplary embodiment, the thickness of the light emitting function layer 12 of the light emitting device may be greater than or equal to 200 nanometers and less than or equal to 250 nanometers to ensure the light emitting efficiency of the sub-pixels of the display substrate and increase the color gamut.

[0060] In an exemplary embodiment, the second electrode 13 may transmit visible light, and for example, the transmittance of the second electrode 13 to visible light is greater than or equal to 80%. Alternatively, the second electrode 13 may transmit a certain amount of visible light and reflect a certain amount of visible light, and for example, the transmittance of the second electrode 13 to visible light is 50%, and the reflectance of the second electrode 13 to visible light is 50%.

[0061] In an exemplary embodiment, the material of the second electrode 13 may include a metal or an alloy, for example, the material of the second electrode 13 may be a magnesium-silver alloy, and the mass ratio of magnesium to silver is 1:9. The thickness of the second electrode 13 is greater than or equal to 100 angstroms and less than or equal to 200 angstroms.

[0062] In an exemplary embodiment, the encapsulation structure layer 104 may be prepared by thin film encapsulation (TFE for short), which can ensure that external water vapor cannot enter the light-emitting structure layer.

[0063] In an exemplary embodiment, the color filter structure layer 105 may include a plurality of filter patterns 61 and a light blocking pattern 62, wherein the light blocking pattern 62 is located between the filter patterns 61 of adjacent sub-pixels to prevent the light emitted by adjacent sub-pixels from crosstalking with each other. The plurality of filter patterns 61 may correspond to the light emitting devices of the plurality of sub-pixels, and the orthographic projection of the filter pattern 61 on the substrate overlaps with the orthographic projection of the light emitting device of the corresponding sub-pixel on the substrate. For example, the orthographic projection of the filter pattern 61 on the substrate includes the orthographic projection of the light emitting device of the corresponding sub-pixel on the substrate. The filter pattern 61 is configured to form light of a specific color from the light emitted by the light emitting device.

[0064] In an exemplary embodiment, the plurality of filter patterns 61 may include a first filter pattern 61-1, a second filter pattern 61-2, and a third filter pattern 61-3. The third filter pattern 61-3, the first filter pattern 61-1, and the second filter pattern 61-2 are sequentially arranged along the first direction D1, a light blocking pattern 62 is arranged between the third filter pattern 61-3 and the first filter pattern 61-1, and a light blocking pattern 62 is arranged between the first filter pattern 61-1 and the second filter pattern 61-2. The first filter pattern 61-1 is located in the first sub-pixel P1, and the orthographic projection of the first filter pattern 61-1 on the substrate includes the orthographic projection of the light-emitting device of the first sub-pixel P1 on the substrate. The first filter pattern 61-1 is configured to convert the light emitted by the light-emitting device of the first sub-pixel P1, such as white light, into a first color light; the second filter pattern 61-2 is located in the second sub-pixel P2, and the orthographic projection of the second filter pattern 61-2 on the substrate includes the orthographic projection of the light-emitting device of the second sub-pixel P2 on the substrate. The second filter pattern 61-2 is configured to convert the light emitted by the light-emitting device of the second sub-pixel P2, such as white light, into a second color light; the third filter pattern 61-3 is located in the third sub-pixel P3, and the orthographic projection of the third filter pattern 61-3 on the substrate includes the orthographic projection of the light-emitting device of the third sub-pixel P3 on the substrate. The third filter pattern 61-3 is configured to convert the light emitted by the light-emitting device of the third sub-pixel P3, such as white light, into a third color light.

[0065] In an exemplary embodiment, the first color light may be red (R) light, the second color light may be green (G) light, and the third color light may be blue (B) light.

[0066] In an exemplary embodiment, the transmittance of the first filter pattern 61-1 to the first color light is greater than or equal to 85%, and the transmittance to the third color light is less than or equal to 0.3%. The thickness H1 of the first filter pattern 61-1 is greater than the thickness H2 of the second filter pattern 61-2, and the thickness H1 of the first filter pattern 61-1 is substantially equal to the thickness H3 of the third filter pattern 61-3. The surface of the first filter pattern 61-1 away from the substrate is substantially flush with the surface of the third filter pattern 61-3 away from the substrate. The vertical distance from the surface of the first filter pattern 61-1 away from the substrate to the surface of the substrate 101 is greater than the vertical distance from the surface of the second filter pattern 61-2 away from the substrate to the surface of the substrate 101, and the surface of the first filter pattern 61-1 away from the substrate is more protruding than the surface of the second filter pattern 61-2 away from the substrate in a direction away from the substrate.

[0067] In an exemplary embodiment, a difference between a thickness H1 of the first filter pattern 61 - 1 and a thickness H2 of the second filter pattern 61 - 2 is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0068] In an exemplary embodiment, the thickness H1 of the first filter pattern 61 - 1 is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers. For example, the thickness H1 of the first filter pattern 61 - 1 is greater than or equal to 2000 nanometers and less than or equal to 3000 nanometers.

[0069] The display substrate of the disclosed embodiment controls the thickness and transmittance of the first filter pattern in the color filter structure layer to match the strong microcavity structure of the corresponding first sub-pixel, thereby improving the luminous efficiency of the first sub-pixel and increasing the color gamut.

[0070] In an exemplary embodiment, the transmittance of the second filter pattern 61-2 to the second color light is greater than or equal to 85%. The thickness H2 of the second filter pattern 61-2 is less than the thickness H1 of the first filter pattern 61-1, and the thickness H2 of the second filter pattern 61-2 is less than the thickness H3 of the third filter pattern 61-3. The vertical distance from the surface of the second filter pattern 61-2 away from the substrate to the surface of the substrate 101 is less than the vertical distance from the surface of the first filter pattern 61-1 away from the substrate to the surface of the substrate 101, the vertical distance from the surface of the second filter pattern 61-2 away from the substrate to the surface of the substrate 101 is less than the vertical distance from the surface of the third filter pattern 61-3 away from the substrate to the surface of the substrate 101, and the surface of the second filter pattern 61-2 away from the substrate is concave in the direction close to the substrate compared to the surface of the first filter pattern 61-1 away from the substrate and the surface of the third filter pattern 61-3 away from the substrate.

[0071] In an exemplary embodiment, the difference between the thickness H1 of the first filter pattern 61-1 and the thickness H2 of the second filter pattern 61-2 is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers. The difference between the thickness H3 of the third filter pattern 61-3 and the thickness H2 of the second filter pattern 61-2 is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0072] In an exemplary embodiment, the thickness H2 of the second filter pattern 61 - 2 is greater than or equal to 500 nanometers and less than or equal to 3000 nanometers. For example, the thickness H2 of the second filter pattern 61 - 2 is greater than or equal to 1000 nanometers and less than or equal to 2000 nanometers.

[0073] The display substrate of the disclosed embodiment controls the thickness and transmittance of the second filter pattern in the color filter structure layer to match the strong microcavity structure of the corresponding second sub-pixel, thereby improving the luminous efficiency of the second sub-pixel and increasing the color gamut.

[0074] In an exemplary embodiment, the transmittance of the third filter pattern 61-3 to the third color light is greater than or equal to 85%, and the transmittance to the first color light is less than or equal to 3.5%. The thickness H3 of the third filter pattern 61-3 is greater than the thickness H2 of the second filter pattern 61-2, and the thickness H3 of the third filter pattern 61-3 is substantially equal to the thickness H1 of the first filter pattern 61-1. The surface of the third filter pattern 61-3 away from the substrate is substantially flush with the surface of the second filter pattern 61-2 away from the substrate. The vertical distance from the surface of the third filter pattern 61-3 away from the substrate to the surface of the substrate 101 is greater than the vertical distance from the surface of the second filter pattern 61-2 away from the substrate to the surface of the substrate 101, and the surface of the third filter pattern 61-3 away from the substrate is more protruding than the surface of the second filter pattern 61-2 away from the substrate along the direction away from the substrate.

[0075] In an exemplary embodiment, a difference between a thickness H3 of the third filter pattern 61 - 3 and a thickness H2 of the second filter pattern 61 - 2 is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

[0076] In an exemplary embodiment, the thickness H3 of the third filter pattern 61 - 3 is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers. For example, the thickness H3 of the third filter pattern 61 - 3 is greater than or equal to 2000 nanometers and less than or equal to 3000 nanometers.

[0077] The display substrate of the disclosed embodiment controls the thickness and transmittance of the third filter pattern in the color filter structure layer to match the strong microcavity structure of the corresponding third sub-pixel, thereby improving the luminous efficiency of the third sub-pixel and increasing the color gamut.

[0078] In an exemplary embodiment, the display substrate of the disclosed embodiment further includes an isolation column 22 and a pixel definition layer 21, wherein the isolation column 22 is located between the first electrodes 11 of adjacent sub-pixels to isolate the first electrodes 11 of adjacent sub-pixels; the pixel definition layer 21 is disposed on the surface of the isolation column 22 on the side away from the substrate 101, and a pixel opening defining the sub-pixel is disposed in the pixel definition layer 21, wherein the pixel opening exposes at least a portion of the first electrode 11, and the light-emitting functional layer 12 covers the pixel opening and is in contact with the first electrode 11 exposed by the pixel opening.

[0079] Figure 5 The cross-sectional structure diagram of a light-emitting functional layer of a display substrate according to an embodiment of the present disclosure is shown in FIG. Figure 5 The light-emitting functional layer shown can be Figure 4 In an exemplary embodiment, the light-emitting functional layer of any sub-pixel in Figure 5 As shown, the light-emitting functional layer is located between the first electrode 11 and the second electrode 13, and is in contact with the first electrode 11 and the second electrode 13 respectively. The light-emitting functional layer 12 may include a first light-emitting unit 12-1 and a second light-emitting unit 12-2 sequentially stacked in a direction away from the substrate 101, and a charge generation layer 30 disposed between the first light-emitting unit 12-1 and the second light-emitting unit 12-2.

[0080] In an exemplary embodiment, the first light emitting unit 12 - 1 is located on a side of the second light emitting unit 12 - 2 close to the substrate, and is connected in series with the second light emitting unit 12 - 2 via the charge generation layer 30 .

[0081] The display substrate of the disclosed embodiment achieves the effect of emitting white light by superimposing the light emitted by the first light emitting unit 12 - 1 and the light emitted by the second light emitting unit 12 - 2 .

[0082] In an exemplary embodiment, the first light-emitting unit 12-1 may include a first auxiliary layer 41, a first light-emitting layer 31, and a second auxiliary layer 42 sequentially stacked in a direction away from the substrate 101, and the first light-emitting layer 31 is respectively in contact with the first auxiliary layer 41 and the second auxiliary layer 42. The first auxiliary layer 41 is located on a side of the first light-emitting layer 31 close to the substrate and in contact with the first electrode 11, and the second auxiliary layer 42 is located on a side of the first light-emitting layer 31 away from the substrate and in contact with the charge generation layer 30.

[0083] In an exemplary embodiment, the first auxiliary layer 41 includes at least a first hole injection layer 41-2 (HIL), a first hole transport layer 41-1 (HTL) and a first functional layer 41-3 (prime), the first hole injection layer 41-2 is located on the side of the first hole transport layer 41-1 close to the substrate and in contact with the first electrode 11, the first hole transport layer 41-1 is located between the first hole injection layer 41-2 (HIL) and the first functional layer 41-3 (prime), and the first functional layer 41-3 is located on the side of the first hole transport layer 41-1 away from the substrate and in contact with the first light-emitting layer 31.

[0084] In an exemplary embodiment, the second auxiliary layer 42 includes at least a first hole blocking layer 42-2 and a first electron transport layer 42-1, the first hole blocking layer 42-2 is arranged on the side of the first electron transport layer 42-1 close to the substrate and contacts the first light-emitting layer 31, and the first electron transport layer 42-1 contacts the charge generation layer 30.

[0085] In an exemplary embodiment, the first light-emitting layer 31 includes a first sub-light-emitting layer 51 and a second sub-light-emitting layer 52 sequentially stacked in a direction away from the substrate, the first sub-light-emitting layer 51 and the second sub-light-emitting layer 52 are in contact with each other, the first sub-light-emitting layer 51 is located on a side of the second sub-light-emitting layer 52 close to the first electrode 11, and the second sub-light-emitting layer 52 is located on a side of the first sub-light-emitting layer 51 close to the second electrode 13. The first sub-light-emitting layer 51 can emit a first color light, and the second sub-light-emitting layer 52 can emit a second color light.

[0086] In an exemplary embodiment, the first sub-light emitting layer 51 may be a red light emitting layer, and the first sub-light emitting layer 51 may emit red light; the second sub-light emitting layer 52 may be a green light emitting layer, and the second sub-light emitting layer 52 may emit green light, and the first sub-light emitting layer 51 and the second sub-light emitting layer 52 are stacked on each other to achieve yellow light emitting from the first light emitting layer 31. In some embodiments, the first light emitting layer may be a single film layer structure, and the first light emitting layer may be a yellow light emitting layer.

[0087] In an exemplary embodiment, the second light-emitting unit 12-2 may include a third auxiliary layer 43, a second light-emitting layer 32, and a fourth auxiliary layer 44 sequentially stacked in a direction away from the substrate 101, and the second light-emitting layer 32 is respectively in contact with the third auxiliary layer 43 and the fourth auxiliary layer 44. The third auxiliary layer 43 is located on the side of the second light-emitting layer 32 close to the substrate and in contact with the charge generation layer 30, and the fourth auxiliary layer 44 is located on the side of the second light-emitting layer 32 away from the substrate and in contact with the second electrode 13.

[0088] In an exemplary embodiment, the third auxiliary layer 43 includes at least a second hole transport layer 43-1 (HTL) and a second functional layer 43-2, the second hole transport layer 43-1 is arranged on the side of the second functional layer 43-2 close to the substrate and in contact with the charge generation layer 30, and the second functional layer 43-2 is located on the side of the second hole transport layer 43-1 away from the substrate and in contact with the second light-emitting layer 32.

[0089] In an exemplary embodiment, the second light emitting layer 32 may be a single-layer structure, and the second light emitting layer 32 emits light of a third color.

[0090] In an exemplary embodiment, the second light emitting layer 32 may be a blue light emitting layer, and the second light emitting layer 32 may emit blue light. The second light emitting layer 32 and the first light emitting layer 31 are stacked on each other, so that the light emitting device emits white light.

[0091] In an exemplary embodiment, the fourth auxiliary layer 44 includes at least a second hole blocking layer 44-2 (HBL), a second electron transport layer 44-1 (ETL) and an electron injection layer 44-3 (EIL), the second hole blocking layer 44-2 is arranged on the side of the second electron transport layer 44-1 close to the substrate and in contact with the second light emitting layer 32, the second electron transport layer 44-1 (ETL) is arranged between the second hole blocking layer 44-2 (HBL) and the electron injection layer 44-3 (EIL), and the electron injection layer 44-3 is arranged on the side of the second electron transport layer 44-1 away from the substrate and in contact with the second electrode 13.

[0092] In some embodiments, the position of the first light-emitting layer can be interchanged with the position of the second light-emitting layer, that is, the first light-emitting layer is disposed on a side of the second light-emitting layer away from the substrate.

[0093] Figure 6 : is a spectrum curve diagram of a related display substrate and a display substrate of an embodiment of the present disclosure. Figure 6 The middle line a indicates Figure 1 The relationship between different wavelengths of light and light intensity of the related display substrate shown, Figure 6 The middle line b indicates Figure 4 The embodiment of the present disclosure shown shows the relationship between light of different wavelengths and light intensity of the first sub-pixel of the substrate; Figure 6 The middle line c indicates Figure 4 The embodiment of the present disclosure shown shows the relationship between different wavelengths of light and light intensity of the second sub-pixel of the substrate; Figure 6 The middle line d indicates Figure 4 The embodiment of the present disclosure shown in the figure shows the relationship between different wavelengths of light and light intensity of the third sub-pixel of the substrate. Figure 6As shown, the first electrode of the display substrate of the embodiment of the present disclosure has a strong microcavity structure. Compared with the first electrode of the related display substrate having a weak microcavity structure, the luminous efficiency of the sub-pixel of the display substrate of the embodiment of the present disclosure is improved and the color gamut is increased.

[0094] Figure 7 It is a curve diagram of the transmittance of the color film structure layer of a display substrate to light of different wavelengths. Figure 7 The first electrode of the display substrate shown has a strong microcavity structure. Figure 7 The display substrate shown includes a first color film structure layer; Figure 7 The middle curve R1 shows the transmittance of the first filter pattern of the first color filter structure layer to light of different wavelengths. Figure 7 The middle curve G1 shows the transmittance of the second filter pattern of the first color filter structure layer to light of different wavelengths. Figure 7 The middle curve B1 shows the transmittance of the third filter pattern of the first color filter structure layer to light of different wavelengths. Figure 7 As shown, the transmittance of the first filter pattern of the first color film structure layer to the light with a wavelength of 620 nanometers is 84.16%, and the transmittance to the light with a wavelength of 420 nanometers to 500 nanometers is less than 0.3%; the transmittance of the second filter pattern of the first color film structure layer to the light with a wavelength of 530 nanometers is 73%; the transmittance of the third filter pattern of the first color film structure layer to the light with a wavelength of 460 nanometers is 63.4%, and the transmittance to the light with a wavelength of 580 nanometers to 670 nanometers is less than 4%.

[0095] A simulation experiment was conducted on the above-mentioned display substrate. The input charge luminous efficiency (Eff) of the display substrate was 248%, the spectral half-width (FWHM) of the first sub-pixel was 28 nanometers, the spectral half-width (FWHM) of the second sub-pixel was 24 nanometers, the spectral half-width (FWHM) of the third sub-pixel was 13 nanometers, and the color gamut percentage of the display substrate was 100%.

[0096] Figure 8 It is a curve diagram of the transmittance of the color film structure layer of another display substrate to light of different wavelengths. Figure 8 The first electrode of the display substrate shown has a strong microcavity structure. Figure 8 The display substrate shown includes a second color film structure layer; Figure 8 The middle curve R2 illustrates the transmittance of the first filter pattern of the second color filter structure layer to light of different wavelengths. Figure 8 The middle curve G2 shows the transmittance of the second filter pattern of the second color filter structure layer to light of different wavelengths. Figure 8 The middle curve B2 shows the transmittance of the third filter pattern of the second color filter structure layer to light of different wavelengths. Figure 8As shown, the transmittance of the first filter pattern of the second color film structure layer to the light with a wavelength of 620 nanometers is 92%, and the transmittance to the light with a wavelength of 420 nanometers to 500 nanometers is less than 0.1%; the transmittance of the second filter pattern of the second color film structure layer to the light with a wavelength of 530 nanometers is 84.14%; the transmittance of the third filter pattern of the second color film structure layer to the light with a wavelength of 460 nanometers is 82.77%, and the transmittance to the light with a wavelength of 580 nanometers to 670 nanometers is less than 4%.

[0097] A simulation experiment was conducted on the above-mentioned display substrate. The input charge luminous efficiency (Eff) of the display substrate was 287%, the spectral half-width (FWHM) of the first sub-pixel was 27 nanometers, the spectral half-width (FWHM) of the second sub-pixel was 25 nanometers, the spectral half-width (FWHM) of the third sub-pixel was 13 nanometers, and the color gamut percentage of the display substrate was 100%.

[0098] Fig. 9 It is a curve diagram of the transmittance of the color film structure layer of another display substrate to light of different wavelengths. Fig. 9 The first electrode of the display substrate shown has a strong microcavity structure. Fig. 9 The display substrate shown includes a third color filter structure layer; Fig. 9 The middle curve R3 shows the transmittance of the first filter pattern of the third color filter structure layer to light of different wavelengths. Fig. 9 The middle curve G3 shows the transmittance of the second filter pattern of the third color filter structure layer to light of different wavelengths. Fig. 9 The middle curve B3 shows the transmittance of the third filter pattern of the third color filter structure layer to light of different wavelengths. Fig. 9 As shown, the transmittance of the first filter pattern of the third color film structure layer to the light with a wavelength of 620 nanometers is 83.72%, and the transmittance to the light with a wavelength of 420 nanometers to 500 nanometers is less than 1.1%; the transmittance of the second filter pattern of the third color film structure layer to the light with a wavelength of 530 nanometers is 80.83%; the transmittance of the third filter pattern of the third color film structure layer to the light with a wavelength of 460 nanometers is 86.3%, and the transmittance to the light with a wavelength of 580 nanometers to 670 nanometers is less than 3.4%.

[0099] A simulation experiment was conducted on the above-mentioned display substrate. The input charge luminous efficiency (Eff) of the display substrate was 297%, the spectral half-width (FWHM) of the first sub-pixel was 27 nanometers, the spectral half-width (FWHM) of the second sub-pixel was 25 nanometers, the spectral half-width (FWHM) of the third sub-pixel was 13 nanometers, and the color gamut percentage of the display substrate was 100%.

[0100] Fig.10It is a curve diagram of the transmittance of the color film structure layer of another display substrate to light of different wavelengths. Fig.10 The first electrode of the display substrate shown has a strong microcavity structure. Fig.10 The display substrate shown includes a fourth color filter structure layer; Fig.10 The middle curve R3 shows the transmittance of the first filter pattern of the fourth color filter structure layer to light of different wavelengths. Fig.10 The middle curve G3 shows the transmittance of the second filter pattern of the fourth color filter structure layer to light of different wavelengths. Fig.10 The middle curve B3 shows the transmittance of the third filter pattern of the fourth color filter structure layer to light of different wavelengths. Fig.10 As shown, the transmittance of the first filter pattern of the fourth color film structure layer to the light with a wavelength of 620 nanometers is 89.62%, and the transmittance to the light with a wavelength of 420 nanometers to 500 nanometers is less than 0.3%; the transmittance of the second filter pattern of the fourth color film structure layer to the light with a wavelength of 530 nanometers is 85.86%; the transmittance of the third filter pattern of the fourth color film structure layer to the light with a wavelength of 460 nanometers is 88.42%, and the transmittance to the light with a wavelength of 580 nanometers to 670 nanometers is less than 3.5%.

[0101] A simulation experiment was conducted on the above-mentioned display substrate. The input charge luminous efficiency (Eff) of the display substrate was 314%, the spectral half-width (FWHM) of the first sub-pixel was 27 nanometers, the spectral half-width (FWHM) of the second sub-pixel was 25 nanometers, the spectral half-width (FWHM) of the third sub-pixel was 13 nanometers, and the color gamut percentage of the display substrate was 100%.

[0102] The first color filter structure layer is used as the color filter structure layer of a display substrate with a weak microcavity structure, and a simulation experiment is performed on the display substrate. The input charge luminous efficiency (Eff) of the display substrate is 100%, the spectral half-width (FWHM) of the first sub-pixel is 39 nanometers, the spectral half-width (FWHM) of the second sub-pixel is 34 nanometers, and the spectral half-width (FWHM) of the third sub-pixel is 20 nanometers. The color gamut percentage of the display substrate is 87%.

[0103] From the results of the above simulation experiments, it can be seen that the display substrate with a strong microcavity structure has a narrower spectrum, a smaller sub-pixel spectrum half-width (FWHM), a better color gamut, and an input charge luminous efficiency (Eff) that is more than doubled compared to the display substrate with a weak microcavity structure. As the transmittance of the color filter structure layer to the corresponding color light increases, the input charge luminous efficiency (Eff) increases accordingly, and the color gamut remains unchanged.

[0104] The present disclosure also provides a method for preparing a display substrate, comprising: Step 101, first forming a driving circuit layer 102 on a substrate 101, the driving circuit layer 102 including a pixel driving circuit, the pixel driving circuit including a plurality of transistors and a storage capacitor; then, forming a first conductive film, a second conductive film and a dielectric film in sequence on the substrate; then, forming a via hole in the dielectric film, the via hole exposing the second conductive film; then, forming a fourth conductive film on the dielectric film, the fourth conductive film being connected to the second conductive film through the via hole, and forming the first conductive film, the second conductive film, the dielectric film and the fourth conductive film into a first electrode 11 through processes such as coating / exposure / development / etching / stripping.

[0105] Step 102, forming an isolation column 22 and a pixel definition layer 21 in sequence on the side of the first electrode away from the substrate, the isolation column 22 is located between the first electrodes 11 of adjacent sub-pixels, and a pixel opening is set in the pixel definition layer 21, and the pixel opening exposes the first electrode 11 of each sub-pixel.

[0106] Step 103, by evaporation process, a light-emitting functional layer 12 is formed on the side of the pixel definition layer away from the substrate, the light-emitting functional layer 12 covers the pixel opening and contacts the exposed first electrode 11. Some film layers in the light-emitting functional layer 12 of multiple sub-pixels can be common layers connected together.

[0107] Step 104: forming a second electrode 13 on the side of the light-emitting functional layer 12 away from the substrate. The second electrodes 13 of the plurality of sub-pixels may be a common layer connected together.

[0108] Step 105 , using a thin film encapsulation (TFE) method, forming an encapsulation structure layer 104 on the side of the second electrode 13 away from the substrate.

[0109] Step 106 , forming a color filter structure layer 105 on the side of the packaging structure layer 104 away from the substrate.

[0110] The embodiment of the present disclosure further provides a display device, including any of the above-mentioned display substrates. The display device can be: a mobile phone, a wearable device, an AR or VR display device, a vehicle-mounted display device, a tablet computer, a television, a display, a laptop computer, a digital photo frame, a navigator, or any other product or component with a display function, and the embodiment of the present invention is not limited thereto.

[0111] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0112] In addition, the terms "first", "second", etc. are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first", "second", etc. may explicitly or implicitly include at least one of the features.

[0113] In the description of the present application, “plurality” means at least two, for example, two, three, etc., unless otherwise clearly and specifically defined.

[0114] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0115] In the present application, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being “above”, “above”, and “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0116] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0117] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. A display substrate, characterized in that: The device comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel is configured to emit a first color light, the second sub-pixel is configured to emit a second color light, and the third sub-pixel is configured to emit a third color light; The display substrate includes a substrate, a light-emitting structure layer arranged on the substrate, and a color filter structure layer arranged on a side of the light-emitting structure layer away from the substrate, the color filter structure layer includes a first filter pattern located at the first sub-pixel, a second filter pattern located at the second sub-pixel, and a third filter pattern located at the third sub-pixel, the thickness of the first filter pattern is greater than the thickness of the second filter pattern, and the thickness of the third filter pattern is greater than the thickness of the second filter pattern; the difference between the thickness of the first filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers, and the difference between the thickness of the third filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

2. The display substrate according to claim 1, characterized in that: The transmittance of the first filter pattern to the first color light is greater than or equal to 85%; the transmittance of the first filter pattern to the third color light is less than or equal to 0.3%.

3. The display substrate according to claim 1, characterized in that: The thickness of the first filter pattern is substantially equal to the thickness of the third filter pattern.

4. The display substrate according to claim 1, characterized in that: The thickness of the first filter pattern is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers.

5. The display substrate according to any one of claims 1 to 4, characterized in that: The transmittance of the second filter pattern to the second color light is greater than or equal to 85%.

6. The display substrate according to any one of claims 1 to 4, characterized in that: The thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 3000 nanometers.

7. The display substrate according to any one of claims 1 to 4, characterized in that: The surface of the second filter pattern away from the substrate is recessed toward the substrate compared to the surface of the first filter pattern away from the substrate; the surface of the second filter pattern away from the substrate is recessed toward the substrate compared to the surface of the third filter pattern away from the substrate.

8. The display substrate according to any one of claims 1 to 4, characterized in that: The transmittance of the third filter pattern to the third color light is greater than or equal to 85%, and the transmittance of the third filter pattern to the first color light is less than or equal to 3.5%.

9. The display substrate according to any one of claims 1 to 4, characterized in that: The thickness of the third filter pattern is greater than or equal to 1000 nanometers and less than or equal to 5000 nanometers.

10. The display substrate according to any one of claims 1 to 4, characterized in that: The light-emitting structure layer includes light-emitting devices respectively located in the first sub-pixel, the second sub-pixel and the third sub-pixel, and the light-emitting devices at least include a first electrode, a light-emitting functional layer and a second electrode stacked in sequence along a direction away from the substrate. The first electrode includes a plurality of conductive patterns and a dielectric layer stacked in sequence along a direction away from the substrate, and the dielectric layer is arranged between any adjacent conductive patterns.

11. The display substrate according to claim 10, characterized in that: The first electrode includes a first conductive pattern, a second conductive pattern, a dielectric layer and a third conductive pattern stacked in sequence in a direction away from the substrate, a via is provided in the dielectric layer, and the third conductive pattern is connected to the second conductive pattern through the via.

12. The display substrate according to claim 10, characterized in that: The thickness of the dielectric layer of the first electrode in the first sub-pixel is greater than or equal to 100 nanometers and less than or equal to 150 nanometers; the thickness of the dielectric layer of the first electrode in the second sub-pixel is less than or equal to 50 nanometers; the thickness of the dielectric layer of the first electrode in the third sub-pixel is greater than or equal to 110 nanometers and less than or equal to 160 nanometers.

13. The display substrate according to claim 10, characterized in that: A vertical distance from a surface of the first electrode of the third sub-pixel away from the substrate to the substrate surface is greater than a vertical distance from a surface of the first electrode of the first sub-pixel away from the substrate surface; a vertical distance from a surface of the first electrode of the first sub-pixel away from the substrate surface is greater than a vertical distance from a surface of the first electrode of the second sub-pixel away from the substrate surface.

14. A method for preparing a display substrate, characterized in that: The display substrate comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, wherein the first sub-pixel is configured to emit a first color light, the second sub-pixel is configured to emit a second color light, and the third sub-pixel is configured to emit a third color light; The method for preparing the display substrate comprises: forming a light-emitting structure layer on a substrate; A color filter structure layer is formed on the side of the light-emitting structure layer away from the substrate, and the color filter structure layer includes a first filter pattern located at the first sub-pixel, a second filter pattern located at the second sub-pixel, and a third filter pattern located at the third sub-pixel, the thickness of the first filter pattern is greater than the thickness of the second filter pattern, and the thickness of the third filter pattern is greater than the thickness of the second filter pattern; the difference between the thickness of the first filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers, and the difference between the thickness of the third filter pattern and the thickness of the second filter pattern is greater than or equal to 500 nanometers and less than or equal to 4500 nanometers.

15. A display device, characterized in that: It comprises the display substrate as claimed in any one of claims 1 to 13.

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