Film layer structure, method for preparing film layer structure and display substrate
CN119173074BActive Publication Date: 2026-06-26BOE TECHNOLOGY GROUP CO LTD +1
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BOE TECHNOLOGY GROUP CO LTD
- Filing Date
- 2024-09-19
- Publication Date
- 2026-06-26
AI Technical Summary
Technical Problem
In the film structure of OLED display substrates, pores in the ITO layer allow impurities to enter, leading to anode abnormalities and dark spots on the display screen.
Method used
By adopting a multi-layer ITO sublayer and barrier layer structure design, and by adjusting the film quality and process parameters of each layer, the probability of impurities contacting the metal layer through pinholes is reduced, thereby increasing the protective capability of the ITO layer.
Benefits of technology
It effectively prevents impurities from oxidizing or corroding the metal layer, avoids dark spots on the display screen, and maintains the simplicity of the manufacturing process.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure CN119173074B_ABST
Abstract
The application provides a film layer structure, a preparation method of the film layer structure and a display substrate, relates to the technical field of semiconductors, and the film layer structure comprises a PLN layer, a first ITO layer, a metal layer and a second ITO layer. The first ITO layer is located on the PLN layer, the first ITO layer comprises N first ITO sublayers, the film qualities of the N first ITO sublayers are different from each other, N is greater than 1, the metal layer is located on the first ITO layer, the second ITO layer is located on the metal layer, the second ITO layer comprises M second ITO sublayers, the film qualities of the M second ITO sublayers are different from each other, and M is greater than 1. Based on the scheme, the probability that impurities inside or outside the film layer structure contact the metal layer through pinholes of the ITO layer can be further reduced, the protection capability of the ITO layer on the metal layer is further increased, and the display screen of the display applying the film layer structure is prevented from having dark spots.
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Citation Information
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