Display device

Abstract

A display device includes: a substrate including a plurality of sub-pixels; a pattern portion having a concave shape and disposed between adjacent sub-pixels among the plurality of sub-pixels; and a reflective portion disposed on the pattern portion, in which each of the plurality of sub-pixels includes: a light emitting layer disposed on the substrate; and a nano lens portion including a plurality of nano lenses and disposed between the light emitting layer and the substrate and spaced apart from the reflection portion, thereby improving light extraction efficiency of light emitted from the light emitting layer.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Korean Patent Application No. 10-2023-0078468, filed on June 19, 2023, which is hereby incorporated by reference in its entirety. Technical Field

[0003] The present disclosure relates to a display device for displaying an image. Background Art

[0004] Unlike liquid crystal displays (LCDs), organic light-emitting display (OLED) devices offer high response speeds and low power consumption, and they emit light without requiring a separate light source. Consequently, OLEDs offer no viewing angle issues. As a result, OLEDs are attracting attention as the next generation of flat panel displays.

[0005] Such a display apparatus displays an image by light emission of a light emitting device layer including a light emitting layer interposed between two electrodes.

[0006] On the other hand, because part of the light emitted from the light-emitting device layer is not emitted to the outside due to total reflection at the interface between the light-emitting device layer and the electrode and / or between the substrate and the air layer outside the display device, the light extraction efficiency of the display device may be reduced. Summary of the Invention

[0007] Accordingly, the present disclosure is directed to a display device that substantially obviates one or more of the problems due to the above limitations and disadvantages.

[0008] More particularly, the present disclosure provides a display device having improved light extraction efficiency of light emitted from a light emitting layer.

[0009] Furthermore, the present disclosure provides a display device featuring an improved viewing angle of a plurality of sub-pixels.

[0010] The present disclosure also provides a display device having light extraction efficiency that can be further improved by extracting light from a non-light emitting area.

[0011] The present disclosure also provides a display device having reduced overall power consumption through light extraction.

[0012] In addition, the present disclosure is intended to provide an optical component and a display device including the optical component, which can minimize or reduce the occurrence of radial rainbow patterns and radial ring patterns caused by the diffraction pattern of reflected light, wherein the diffraction pattern of reflected light is caused by destructive interference and / or constructive interference of light caused by reflection of external light.

[0013] Problems to be solved by examples of the present disclosure are not limited to those mentioned above, and other problems not mentioned will be apparent to those of ordinary skill in the art to which the technical spirit of the present disclosure belongs through the following description.

[0014] Additional features and advantages of the present disclosure will be set forth in the following description, and in part will be apparent from the description, or may be learned through practice of the present disclosure. Other advantages of the present disclosure will be realized and obtained through the structures specifically pointed out in the written description and claims of the present disclosure and the accompanying drawings.

[0015] To achieve these and other advantages, and in accordance with the present disclosure, as implemented and broadly described, a display device includes: a substrate including a plurality of sub-pixels; a pattern portion having a concave shape and disposed between adjacent ones of the plurality of sub-pixels; and a reflective portion disposed on the pattern portion, wherein each of the plurality of sub-pixels includes: a light-emitting layer disposed on the substrate; and a nanolens portion including a plurality of nanolenses and disposed between the light-emitting layer and the substrate and spaced apart from the reflective portion.

[0016] In another aspect of the present disclosure, a display device includes: a plurality of sub-pixels, the plurality of sub-pixels including a light-emitting area and a non-light-emitting area surrounding the light-emitting area; a pattern portion, the pattern portion being arranged in the non-light-emitting area and surrounding the plurality of sub-pixels; a reflective portion, the reflective portion being arranged on the pattern portion and having a curved surface; and at least one optical path changing portion, the at least one optical path changing portion being arranged in the light-emitting area and the non-light-emitting area.

[0017] The technical benefits of the present disclosure are not limited to the above-mentioned benefits, and other benefits not mentioned above can be clearly understood by those skilled in the art from the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The accompanying drawings illustrate various aspects of the present disclosure and together with the description serve to explain the principles of the present disclosure. They are included to provide a further understanding of the present disclosure and are incorporated in and constitute a part of this disclosure.

[0019] In the attached figure:

[0020] Figure 1 is a schematic plan view of a display device according to one aspect of the present disclosure;

[0021] Figure 2 yes Figure 1 A schematic plan view of a pixel is shown;

[0022] Figure 3 It is along Figure 2A schematic cross-sectional view taken along line II' shown;

[0023] Figure 4 yes Figure 3 A schematic enlarged view of portion A is shown;

[0024] Figure 5 yes Figure 4 A schematic enlarged view of portion B is shown.

[0025] Figure 6 It is along Figure 2 A schematic cross-sectional view taken along line II-II' is shown;

[0026] Figure 7 is a schematic cross-sectional view of a display device according to a second aspect of the present disclosure; and

[0027] Figure 8 is a schematic cross-sectional view of a display device according to a third aspect of the present disclosure. DETAILED DESCRIPTION

[0028] Reference will now be made in detail to aspects of the present disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numerals will be used throughout the drawings to refer to the same or like parts.

[0029] The advantages and features of the present disclosure and methods thereof will be illustrated by the following aspects described with reference to the accompanying drawings. However, the present disclosure may be embodied in different forms and should not be construed as limited to the aspects set forth herein. Rather, these aspects are provided so that the present disclosure will be thorough and complete and will fully convey the scope of the present disclosure to those skilled in the art.

[0030] The shapes, sizes, proportions, angles, and numbers disclosed in the drawings used to describe aspects of the present disclosure are merely examples, and thus, the present disclosure is not limited to the details shown.

[0031] Like reference numerals denote like elements throughout. In the following description, when a detailed description of a related known function or configuration is determined to unnecessarily obscure the gist of the present disclosure, the detailed description will be omitted.

[0032] In the case where “including,” “having,” and “comprising” described in this specification are used, another component may be added unless “only to” is used. Terms in the singular form may include plural forms unless otherwise specified.

[0033] When explaining an element, the element is interpreted as including a range of error although there is no explicit description.

[0034] When describing a positional relationship, for example, when the positional relationship between two parts is described as "on...", "above...", "below...", and "adjacent...", one or more other parts may be set between the two parts, unless "just" or "directly" is used.

[0035] When describing a temporal relationship, for example, when a temporal order is described as "after," "subsequently," "next," and "before," discontinuous cases may be included unless "just" or "directly" is used.

[0036] It will be understood that, although the terms "first," "second," etc. may be used herein to describe various elements, these elements should not be limited by these terms.

[0037] These terms are only used to distinguish one element from another element.For example, without departing from the scope of the present disclosure, a first element could be referred to as a second element, and similarly, a second element could be referred to as a first element.

[0038] The “X-axis direction,” “Y-axis direction,” and “Z-axis direction” should not be interpreted solely by a geometric relationship of being perpendicular to each other, but may have broader directivities within a range in which the elements of the present disclosure can function.

[0039] The term "at least one" should be understood to include any and all combinations of one or more of the relevant listed items. For example, the meaning of "at least one of the first, second, and third items" refers to all combinations of two or more of the first, second, and third items, as well as the first, second, or third item.

[0040] The features of the various aspects of the present disclosure may be combined or combined with each other in part or in whole, and may interoperate with each other in different ways and be driven by technology as can be fully understood by those skilled in the art. The aspects of the present disclosure may be performed independently of each other, or may be performed together in a mutually dependent relationship.

[0041] Hereinafter, various aspects of the present disclosure will be described in detail with reference to the accompanying drawings.

[0042] Figure 1 is a schematic plan view of a display device according to one aspect of the present disclosure. Figure 2 yes Figure 1 A schematic plan view of a pixel is shown. Figure 3 It is along Figure 2 Schematic cross-sectional view taken along line II' is shown. Figure 4 yes Figure 3 A schematic enlargement of portion A is shown. Figure 5 yes Figure 4 A schematic enlarged view of portion B is shown. Figure 6It is along Figure 2 Schematic cross-sectional view taken along line II-II' is shown.

[0043] Reference Figures 1 to 6 A display device 100 according to one aspect of the present disclosure includes: a substrate 110 having a plurality of pixels P including a plurality of sub-pixels SP; a pattern portion 120 disposed on the substrate 110 and formed in a concave shape between the plurality of sub-pixels SP; and a reflective portion 130 on the pattern portion 120. According to one example, each of the plurality of sub-pixels SP may include a light-emitting layer 116 disposed on the substrate 110 and a nano-lens portion 140 (or an optical path changing portion) disposed between the light-emitting layer 116 and the substrate 110. The nano-lens portion 140 includes a plurality of nano-lenses 141.

[0044] In the display device 100 according to an exemplary aspect of the present disclosure, the nanolens section 140 can be disposed separately from the reflective section 130. The nanolens section 140 according to an exemplary aspect can reflect or transmit light. Each of the multiple nanolenses 141 according to an exemplary aspect can be formed in various shapes, such as a lens shape, a hemispherical shape, an uneven shape, etc. Therefore, a portion of the light emitted from the light-emitting layer 116 can be reflected and / or refracted by the nanolens section 140 and have its optical path changed toward the reflective section 130. In addition, another portion of the light emitted from the light-emitting layer 116 can be reflected by the reflective section 130 and then reflected and / or refracted by the nanolens section 140 (or the optical path changing section), thereby changing the optical path (or the path of the light). As described above, the light emitted from the light-emitting layer 116 can have its optical path changed by the reflective section 130 and the nanolens section 140 disposed separately from the reflective section 130.

[0045] Therefore, in the display device 100 according to one aspect of the present disclosure, since each of the plurality of sub-pixels includes the nano-lens portion 140 provided separately from the reflective portion 130, the optical path can be changed by the reflective portion 130 and the nano-lens portion 140. Therefore, since total reflection at the interface between the substrate 110 and the air layer can be reduced and light extinguished due to total reflection can be extracted to the outside of the substrate 110, the display device 100 according to one aspect of the present disclosure can improve the light extraction efficiency of the light emitted from the light emitting layer 116.

[0046] On the other hand, light whose optical path is changed by the nanolens portion 140 can be extracted (or emitted) through the light-emitting area EA or the non-light-emitting (or non-emission) area NEA. According to an exemplary aspect, the plurality of sub-pixels SP may include the light-emitting area EA and the non-light-emitting (or non-emission) area NEA adjacent to the light-emitting area EA. The light-emitting area EA may be a region from which light is emitted and may be included in the display area DA. The non-light-emitting (or non-emission) area NEA may be a region from which light is not emitted and an area adjacent to the light-emitting area EA. The non-light-emitting (or non-emission) area NEA may be expressed as a peripheral area. In the display device 100 according to one aspect of the present disclosure, light emitted to the light-emitting area EA due to its optical path being changed by the nanolens portion 140 may be defined as first extracted light L1, and light emitted to the non-light-emitting (or non-emission) area NEA due to its optical path being changed by the nanolens portion 140 may be defined as second extracted light L2.

[0047] For example, Figure 4 As shown, a portion of the light emitted from the light emitting layer 116 may first be reflected by one of the plurality of nano-lenses 141, and the optical path of the light may be changed toward the reflective portion 130. Subsequently, after the light having the optical path toward the reflective portion 130 is twice reflected by the reflective portion 130, the light may not be totally reflected at the interface between the substrate 110 and the air layer and may be emitted to the light emitting area EA. This light may be the first extracted light L1.

[0048] In addition, if Figure 4 As shown, another portion of the light emitted from the light-emitting layer 116 may first be reflected by one of the plurality of nano-lenses 141, and the optical path of the light may be changed toward the reflective portion 130. Next, after the light having an optical path toward the reflective portion 130 is twice reflected by the reflective portion 130, the light may be reflected three times by the nano-lenses 141 provided on the side surface 114b of the pixel electrode 114. The light reflected for the third time may not be totally reflected at the interface between the substrate 110 and the air layer, and may be emitted to the non-light-emitting (or non-exiting) area NEA. This light may be the second extracted light L2.

[0049] exist Figure 4 For ease of explanation, only the first extracted light L1 and the second extracted light L2 are shown, but the light emitted from the light-emitting layer 116 can be in the form of direct light that is directly emitted to the lower surface of the substrate 110 without passing through the nanolens portion 140 (or the optical path changing portion) and the reflective portion 130.

[0050] The display device according to the present disclosure includes a reflective portion 130 and a nanolens portion 140 adjacent to the non-luminous (or non-exiting) area NEA, so that the second extracted light L2 is emitted even from the non-luminous (or non-exiting) area NEA, thereby improving the overall efficiency of light extraction.

[0051] In addition, the display device 100 according to one aspect of the present disclosure, such as Figure 4 As shown, light can be scattered (or reflected and / or refracted) by the nanolens portion 140 including a plurality of nanolenses 141, so that the second extracted light L2 can be emitted toward the non-light emitting (or non-exiting) area NEA. Therefore, the display device 100 according to one aspect of the present disclosure can have an improved viewing angle characteristic compared to a display device without the nanolens portion 140.

[0052] Hereinafter, the pattern part 120 , the reflection part 130 , and the nanolens part 140 included in the display apparatus 100 according to one aspect of the present disclosure are described in detail.

[0053] Since the display device 100 according to one aspect of the present disclosure includes a reflective portion 130 and a nano-lens portion 140 at the periphery of the non-luminous (or non-emission) area NEA, the light emitted from the luminous area EA and directed toward the adjacent sub-pixel SP can be reflected toward the luminous area EA of the luminous sub-pixel SP. Therefore, in the display device 100 according to one aspect of the present disclosure, the light extraction efficiency of the luminous sub-pixel SP can be improved. Here, the periphery of the non-luminous (or non-emission) area NEA can refer to a partial area of ​​the non-luminous (or non-emission) area NEA that is set to be separated from the luminous area EA or adjacent to the luminous area EA. For example, the periphery of the non-luminous (or non-emission) area NEA can be an area surrounding the luminous area EA and set to be separated from the luminous area EA.

[0054] Since the display device 100 according to one aspect of the present disclosure includes the nanolens portion 140 outside the light-emitting area EA and the non-light-emitting (or non-exiting) area NEA, a portion of the light emitted from the light-emitting layer 116 can be scattered. Therefore, the display device 100 according to one aspect of the present disclosure can change the light path from the non-light-emitting (or non-exiting) area NEA to the light-emitting area EA through the nanolens portion 140. Therefore, compared with a display device without the nanolens portion 140, the light extraction efficiency can be improved. In addition, since the display device 100 according to one aspect of the present disclosure can change the light path from the light-emitting area EA to the non-light-emitting (or non-exiting) area NEA through the nanolens portion 140, the viewing angle (or brightness half angle) characteristics can be improved compared with a display device without the nanolens portion 140.

[0055] According to an example, the pattern portion 120 may be formed to be recessed near the non-light emitting (or non-emitting) area NEA. For example, the pattern portion 120 may be formed to be recessed near the outer coating layer 113 (eg, Figure 3 As shown) is concave. Figure 2As shown, the pattern portion 120 may be disposed to surround the light emitting area EA. The pattern portion 120 may be disposed to be spaced apart from the light emitting area EA. Figure 2 In FIG. 1 , dot hatching (or shadowing) indicates a bank. The pattern portion 120 according to one example may be provided to surround the light emitting area EA in the form of a slit or a groove. For example, the width of the pattern portion 120 may be formed to decrease from the reflective portion 130 toward the substrate 110. In addition, as Figure 2 As shown, the pattern portion 120 may include a portion not covered by the bank 115 (e.g. Figure 3 Therefore, the pattern portion 120 may be expressed as a term such as a groove, a slit, a trench, a bank slit, and a bank trench.

[0056] According to one example, the reflective portion 130 can be formed to be recessed along the contour of the pattern portion 120 that is recessed near the non-luminous (or non-emission) area NEA, thereby being recessed near the non-luminous (or non-emission) area NEA. In other words, the reflective portion 130 can be provided along the peripheral area. The reflective portion 130 can be made of a material that can reflect light and can reflect light emitted from the luminous area EA and directed toward the adjacent sub-pixel SP toward the luminous area EA of the sub-pixel SP for emitting light. Since the reflective portion 130 is arranged to be inclined while surrounding the luminous area EA, the reflective portion 130 can be expressed as a side reflective portion or an inclined reflective portion.

[0057] like Figure 4 As shown, the reflective portion 130 may include a flat surface 131 provided on the center portion of the bankless region not including the bank 115 and a curved surface 132 connected to the flat surface 131. The curved surface 132 of the reflective portion 130 may represent the reflective portion 130 provided in a portion of the bank region in which the bank 115 is provided. The flat surface 131 may be provided to be aligned with the bottom surface 120b (e.g., Figure 4 The curved surface 132 may be formed in a circular shape along the contour of the inclined surface 120s of the pattern portion 120. Light emitted from the light-emitting sub-pixel SP and directed toward the adjacent sub-pixel SP may be mostly reflected by the curved surface 132 of the reflective portion 130 to be directed toward the light-emitting area EA of the light-emitting sub-pixel SP or the non-light-emitting (or non-emitting) area NEA of the light-emitting sub-pixel SP.

[0058] On the other hand, the display device 100 according to one aspect of the present disclosure can be implemented as a bottom-emission type in which light emitted from the light-emitting area EA is emitted to the lower surface of the substrate 110. Therefore, in the display device 100 according to one aspect of the present disclosure, the light emitted to the lower surface of the substrate 110 can be a combination of direct light emitted from the light-emitting area EA and directly emitted to the lower surface of the substrate 110 and extracted light (or reflected light) obtained by reflecting light emitted from the light-emitting area EA and directed toward adjacent sub-pixels SP by the reflective portion 130 and / or the nanolens portion 140 and emitting this light to the lower surface of the substrate 110. Therefore, the display device 100 according to one aspect of the present disclosure can further improve the light extraction efficiency compared to a display device in which the reflective portion 130 formed in a concave shape is not provided. In addition, compared to a display device without a nanolens portion 140 including a plurality of nanolenses 141, the display device 100 according to one aspect of the present disclosure can improve the light extraction efficiency and improve the viewing angle characteristics.

[0059] The nanolens section 140 according to one exemplary aspect may be spaced apart from the reflective section 130. The nanolens section 140 according to one exemplary aspect may reflect or transmit light. In one example, each of the plurality of nanolenses 141 included in the nanolens section 140 may contain more indium (In) than the pixel electrode 114 containing a transparent conductive material. In this case, since the nanolens 141 is close to the metal, the nanolens 141 may reflect more light than the pixel electrode 114. In another example, the indium (In) contained in the plurality of nanolenses 141 may be close to the pixel electrode 114, or may contain slightly more indium (In) than the pixel electrode 114. In this case, the nanolens 141 may be closer to the transparent conductive material than the metal, and therefore, the nanolens 141 may transmit a portion of light and reflect a portion of other light similar to the pixel electrode 114.

[0060] According to one exemplary aspect, each of the plurality of nano-lenses 141 can be formed into various shapes, such as a lens shape, a hemispherical shape, an uneven shape, and the like. Because each of the plurality of nano-lenses 141 has a very small size, it can be represented by a nanostructure or a microlens. In addition, because each of the plurality of nano-lenses 141 has a very small size, it can be represented by a roughness. Because the plurality of nano-lenses 141 are formed by a plasma process using hydrogen (H) or ammonia (NH3), the plurality of nano-lenses 141 can be formed to have uneven sizes, irregular shapes, and uneven spacing. For example, after forming the pixel electrode 114 comprising the transparent conductive material ITO, a plasma process using hydrogen (H) or ammonia (NH3) is performed, so that the plurality of nano-lenses 141 can be formed by the free radical reaction of oxygen (O) and hydrogen (H) in the ITO to precipitate indium (In) according to the following formula.

[0061] 3H2+In2O3→3H2O+2In

[0062] According to the above chemical formula, through the plasma process, oxygen (O) contained in the pixel electrode 114 as a transparent conductive material can be combined with hydrogen (H) as a plasma gas to generate water (H2O), thereby precipitating indium (In). Therefore, the multiple nano lenses 141 can contain more indium (In) than the pixel electrode 114. Therefore, the multiple nano lenses 141 are closer to metal than the pixel electrode 114 and can have a higher light reflectivity than the pixel electrode 114. Therefore, as Figure 5 As shown, a portion of light emitted from the light emitting layer 116 may be reflected by the nanolens 141 containing more indium (In) than the pixel electrode 114 , thereby changing its optical path to be emitted as the first extracted light L1 and / or the second extracted light L2 .

[0063] As described above, since the plurality of nano-lenses 141 are randomly and irregularly formed on the upper surface 114a and the side surface 114b of the pixel electrode 114 through a plasma process using hydrogen (H) or ammonia (NH3), the plurality of nano-lenses 141 can have different sizes, shapes, and spacings. Therefore, the amount of indium (In) contained in the plurality of nano-lenses 141 can be different, so that some of the plurality of nano-lenses 141 can contain indium (In) similar to or slightly more than that of the pixel electrode 114. In this case, the nano-lenses 141 can have similar characteristics to the pixel electrode 114, so that the nano-lenses 141 can transmit a portion of light and reflect another portion of light.

[0064] On the other hand, since some of the plurality of nano-lenses 141 may have similar characteristics to the pixel electrode 114 and may have different amounts of indium, the pixel electrode 114 and the nano-lenses 141 may have different refractive indices. Therefore, light passing through some of the plurality of nano-lenses 141 may be refracted by the interface between the nano-lenses 141 and the pixel electrode 114, thereby changing its optical path.

[0065] Therefore, a portion of the light emitted from the light emitting layer 116 may be reflected and / or refracted by the nano-lens portion 140, thereby changing its optical path toward the reflective portion 130. Furthermore, another portion of the light emitted from the light emitting layer 116 may be reflected by the reflective portion 130 and then reflected and / or refracted by the nano-lens portion 140, thereby changing its optical path. As described above, the light emitted from the light emitting layer 116 may have its optical path changed by the reflective portion 130 and the nano-lens portion 140 spaced apart from the reflective portion 130.

[0066] Therefore, since the optical path of light emitted from each of the plurality of sub-pixels SP can be changed by the nanolens portion 140 spaced apart from the reflective portion 130, the display device 100 according to one aspect of the present disclosure can improve the light extraction efficiency of light emitted from the light emitting layer 116, thereby reducing the total reflection of light at the interface between the substrate 110 and the air layer.

[0067] In the following, reference is made to Figures 1 to 4 , the display device 100 according to one aspect of the present specification will be described in more detail.

[0068] Reference Figure 1 and Figure 3 The display device 100 according to one aspect of the present disclosure may further include: a display panel including a gate driver (GD); a nano-lens unit 140; a source driver integrated circuit (hereinafter referred to as "IC") 150; a flexible film 160; a circuit board 170; and a timing controller 180. The nano-lens unit 140 includes a plurality of nano-lenses 141 and is disposed between the light emitting layer 116 and the substrate 110.

[0069] The display panel may include a substrate 110 and an opposite substrate 200 (eg Figure 3 shown).

[0070] The substrate 110 may include a thin film transistor and may be a transistor array substrate, a lower substrate, a base substrate, or a first substrate. The substrate 110 may be a transparent glass substrate or a transparent plastic substrate. The substrate 110 may include a display area DA and a non-display area NDA.

[0071] The display area DA is the area in which an image is displayed. The display area DA may be a pixel array area, an active area, a pixel array unit, a display unit, or a screen. For example, the display area DA may be located in the center of a display panel. The display area DA may include a plurality of pixels P.

[0072] The opposite substrate 200 may encapsulate (or seal) the display area DA provided on the substrate 110. For example, the opposite substrate 200 may be bonded to the substrate 110 via an adhesive member (or transparent adhesive). The opposite substrate 200 may be an upper substrate, a second substrate, or an encapsulation substrate.

[0073] The gate driver GD supplies a gate signal to the gate line according to a gate control signal input from the timing controller 180. The gate driver GD may be formed in a non-emission (or non-exit) area NEA on one side of the emission area EA or on both sides of the emission area EA in a gate driver in panel (GIP) method, as shown in FIG. Figure 1 shown.

[0074] The non-display area NDA is an area on which no image is displayed, and may be a peripheral area, a signal supply area, an inactive area, or a frame area. The non-display area NDA may be configured to be located near the display area DA. That is, the non-display area NDA may be provided to surround the display area DA.

[0075] The pad area PA may be provided in the non-display area NDA. The pad area PA may supply power and / or signals for outputting an image to the pixels P provided in the display area DA. Figure 1 , the pad area PA may be disposed above the display area DA.

[0076] The source driver IC 150 receives digital video data and source control signals from the timing controller 180. The source driver IC 150 converts the digital video data into analog data voltages according to the source control signals and supplies the analog data voltages to the data lines. When the source driver IC 150 is manufactured as a driver chip, the source driver IC 150 can be packaged in the flexible film 160 using a chip on film (COF) method or a chip on plastic (COP) method.

[0077] Pads such as data pads may be formed in the non-display area (NDA) of the display panel. Lines connecting the pads to the source driver IC 150 and lines connecting the pads to the circuit board 170 may be formed in the flexible film 160. The flexible film 160 may be attached to the pads using an anisotropic conductive film, whereby the pads may be connected to the lines of the flexible film 160.

[0078] The circuit board 170 may be attached to the flexible film 160. A plurality of circuits implemented as a driving chip may be packaged in the circuit board 170. For example, the timing controller 180 may be packaged in the circuit board 170. The circuit board 170 may be a printed circuit board or a flexible printed circuit board.

[0079] The timing controller 180 receives digital video data and timing signals from an external system board via a cable of the circuit board 170. Based on the timing signals, the timing controller 180 generates a gate control signal for controlling the operation timing of the gate driver GD and a source control signal for controlling the source driver IC 150. The timing controller 180 supplies the gate control signal to the gate driver GD and supplies the source control signal to the source driver IC 150.

[0080] Reference Figure 2 and Figure 3 , the substrate 110 according to an example may include a light emitting area EA and a non-light emitting (or non-exiting) area NEA.

[0081] The light emitting area EA is an area in which an image is displayed. The light emitting area EA may be a pixel array area, an active area, a pixel array unit, a display unit, or a screen. For example, the light emitting area EA may be provided in the central portion of the display panel.

[0082] The light emitting area EA according to an example may include a gate line, a data line, a pixel driving power line, and a plurality of pixels P. Each of the plurality of pixels P may include a plurality of sub-pixels SP that may be defined by the gate line and the data line.

[0083] On the other hand, at least four sub-pixels SP configured to emit different colors and arranged adjacent to each other among the plurality of sub-pixels SP may constitute a pixel P (or unit pixel). A pixel P may include, but is not limited to, a red sub-pixel, a green sub-pixel, a blue sub-pixel, and a white sub-pixel. A pixel P may include three sub-pixels SP configured to emit light of different colors and arranged adjacent to each other. For example, a pixel P may include a red sub-pixel, a green sub-pixel, and a blue sub-pixel.

[0084] Each of the plurality of sub-pixels SP includes a thin film transistor and a light emitting device layer E connected to the thin film transistor. Each of the plurality of sub-pixels may include a light emitting layer (or an organic light emitting layer) interposed between a pixel electrode and a reflective electrode.

[0085] The light-emitting layers provided in the plurality of sub-pixels SP may individually emit light of different colors, or collectively emit white light. According to an example, when the light-emitting layers of the plurality of sub-pixels SP collectively emit white light, each of the red, green, and blue sub-pixels may include a color filter CF (or wavelength conversion member) for converting the white light into light of its respective different colors. In this case, the white sub-pixel according to the example may not include a color filter.

[0086] In the display device 100 according to one aspect of the present disclosure, a region provided with a red color filter may be a red sub-pixel or a first sub-pixel, a region provided with a green color filter may be a green sub-pixel or a second sub-pixel, a region provided with a blue color filter may be a blue sub-pixel or a third sub-pixel, and a region not provided with a color filter may be a white sub-pixel or a fourth sub-pixel. However, the colors corresponding to the sub-pixels are not limited thereto, and the first sub-pixel may be a red sub-pixel, the second sub-pixel may be a white sub-pixel, the third sub-pixel may be a green sub-pixel, and the fourth sub-pixel may be a blue sub-pixel.

[0087] When a gate signal is input from a gate line using a thin film transistor, each sub-pixel SP supplies a specified current to the organic light emitting element according to the data voltage of the data line. Therefore, the light emitting layer of each sub-pixel can emit light with a specified brightness according to the specified current.

[0088] According to an example, a plurality of sub-pixels SP may be arranged to be adjacent to each other in a first direction (X-axis direction). The first direction (X-axis direction) may be based on Figure 2 The horizontal direction may be a direction in which the gate lines GL are arranged.

[0089] The second direction (Y-axis direction) is a direction crossing the first direction (X-axis direction) and may be based on Figure 2 The vertical direction may be a direction in which the data line is set.

[0090] The third direction (Z-axis direction) is a direction crossing each of the first direction (X-axis direction) and the second direction (Y-axis direction), and may be a thickness direction of the display device 100 .

[0091] The plurality of sub-pixels SP may include a first sub-pixel SP1, a second sub-pixel SP2, a third sub-pixel SP3, and a fourth sub-pixel SP4 arranged adjacent to each other in a first direction (X-axis direction). For example, the first sub-pixel SP1 may be a red sub-pixel, the second sub-pixel SP2 may be a green sub-pixel, the third sub-pixel SP3 may be a blue sub-pixel, and the fourth sub-pixel SP4 may be a white sub-pixel, but the present invention is not limited thereto. However, the arrangement order of the first sub-pixel SP1, the second sub-pixel SP2, the third sub-pixel SP3, and the fourth sub-pixel SP4 may be changed.

[0092] Alternatively, as Figure 3 As shown, the second subpixel SP2 may be disposed adjacent to one side (or right side) of the first subpixel SP1, and the fourth subpixel SP4' of another pixel P may be disposed adjacent to the other side (or left side) of the first subpixel SP1.

[0093] Each of the first to fourth subpixels SP1 to SP4 may include an emission area EA and a circuit area CA. The emission area EA may be disposed on one side (or upper side) of the subpixel area, and the circuit area CA may be disposed on the other side (or lower side) of the subpixel area. For example, the circuit area CA may be disposed below the emission area EA based on the second direction Y. The emission areas EA of the first to fourth subpixels SP1 to SP4 may have different sizes (or areas).

[0094] The first to fourth subpixels SP1 to SP4 can be arranged adjacent to each other along the first direction (X-axis direction). For example, two data lines extending along the second direction (Y-axis direction) can be arranged parallel to each other between the first subpixel SP1 and the second subpixel SP2, and between the third subpixel SP3 and the fourth subpixel SP4. A pixel power line extending along the first direction (X-axis direction) can be arranged between the emission area EA and the circuit area CA of each of the first to fourth subpixels SP1 to SP4. The gate line and the sensing line can be arranged below the circuit area CA. The pixel power line extending along the second direction (Y-axis direction) can be arranged on one side of the first subpixel SP1 or the fourth subpixel SP4. A reference line extending along the second direction (Y-axis direction) can be arranged between the second subpixel SP2 and the third subpixel SP3. The reference line can serve as a sensing line for externally sensing changes in the characteristics of the driving thin film transistor and / or changes in the characteristics of the light-emitting device layer arranged in the circuit area CA in the sensing drive mode of the pixel P.

[0095] In the display device 100 according to one aspect of the present disclosure, each of the plurality of sub-pixels SP may include a nano-lens portion 140 having a plurality of nano-lenses 141. The nano-lens portion 140 may partially overlap with the emission area EA of each sub-pixel SP. Figure 4 As shown, the nano-lens section 140 can be formed on the upper surface 114a of the pixel electrode 114 and the side surface 114b of the pixel electrode 114. The upper surface 114a of the pixel electrode 114 can be a surface facing the light-emitting layer 116 or a surface in contact with the lower surface of the light-emitting layer 116. The plurality of nano-lenses 141 included in the nano-lens section 140 can be formed to have a lens (or concave-convex) shape on the upper surface 114a and the side surface 114b of the pixel electrode 114, thereby changing the optical path of light emitted from the light-emitting device layer E to increase the efficiency of light extraction. For example, the nano-lens section 140 can be an uneven portion, a concave-convex pattern portion, a micro-lens portion, or a light-scattering pattern portion.

[0096] On the other hand, in the display device 100 according to one aspect of the present disclosure, since the pattern portion 120 is provided to surround the emission area EA, at least a portion of the reflective portion 130 on the pattern portion 120 can be provided to surround the emission area EA. Therefore, reflected light can be emitted toward the substrate 110 from a position that surrounds at least a portion of the emission area EA and is spaced apart from the emission area EA.

[0097] Hereinafter, the structure of each of the plurality of sub-pixels SP will be described in detail.

[0098] Reference Figure 6 The display device 100 according to one aspect of the present disclosure may further include a buffer layer BL, a circuit element layer 111, a thin film transistor 112, a pixel electrode 114, a bank 115, a light emitting layer 116, a reflective electrode 117, an encapsulation layer 118, and a color filter CF.

[0099] In more detail, each sub-pixel SP according to one aspect may include: a circuit element layer 111 including a gate insulating layer 111a, an interlayer insulating layer 111b and a passivation layer 111c arranged on the upper surface of the buffer layer BL; an outer coating layer 113 arranged on the circuit element layer 111; a pixel electrode 114 arranged on the outer coating layer 113; a dam 115 covering an edge of the pixel electrode 114; a light-emitting layer 116 located on the pixel electrode 114 and the dam 115; a reflective electrode 117 on the light-emitting layer 116; and an encapsulation layer 118 on the reflective electrode 117.

[0100] The thin film transistor 112 for driving the sub-pixel SP may be provided on the circuit element layer 111. The circuit element layer 111 may be expressed as an inorganic film layer. The pixel electrode 114, the light emitting layer 116, and the reflective electrode 117 may be included in the light emitting device layer E.

[0101] A buffer layer BL may be formed between the substrate 110 and the gate insulating layer 111a to protect the thin film transistor 112. The buffer layer BL may be provided on the entire surface (or front surface) of the substrate 110. The buffer layer BL may be used to prevent materials contained in the substrate 110 from diffusing into the transistor layer during high-temperature processes in the manufacturing process of the thin film transistor. Alternatively, the buffer layer BL may be omitted in some cases.

[0102] The thin film transistor 112 (or driving transistor) according to an example may include an active layer 112 a , a gate electrode 112 b , a source electrode 112 c , and a drain electrode 112 d .

[0103] The active layer 112a may include a channel region, a drain region, and a source region formed in a thin film transistor region of a circuit region of the subpixel SP. The drain region and the source region may be spaced apart from each other with the channel region interposed therebetween.

[0104] The active layer 112 a may be formed of a semiconductor material based on any one of amorphous silicon, polysilicon, oxide, and an organic material.

[0105] The gate insulating layer 111a may be formed on the channel region of the active layer 112a. As an example, the gate insulating layer 111a may be formed in an island shape only on the channel region of the active layer 112a, or may be formed on the entire front surface of the substrate 110 or the buffer layer BL including the active layer 112a.

[0106] The gate electrode 112 b may be formed on the gate insulating layer 111 a to overlap the channel region of the active layer 112 a .

[0107] An interlayer insulating layer 111b may be formed on the gate electrode 112b and the drain and source regions of the active layer 112a. Figure 5 As shown, the interlayer insulating layer 111b may be formed in the circuit region and the entire light-emitting region in which light is emitted to the sub-pixel SP. However, aspects of the present disclosure are not limited thereto. The interlayer insulating layer 111b may be patterned between the drain electrode 112d and the gate electrode 112b and the drain region of the active layer 112a and may be arranged in an island shape. Furthermore, the source electrode 112c may be patterned between the gate electrode 112b and the source region of the active layer 112a and may be arranged in an island shape.

[0108] The source electrode 112c may be electrically connected to the source region of the active layer 112a through a source contact hole provided in the interlayer insulating layer 111b overlapping the source region of the active layer 112a. The drain electrode 112d may be electrically connected to the drain region of the active layer 112a through a drain contact hole provided in the interlayer insulating layer 111b overlapping the drain region of the active layer 112a.

[0109] The drain electrode 112d and the source electrode 112c may be made of the same metal material. For example, each of the drain electrode 112d and the source electrode 112c may be made of a single metal layer, a single layer of an alloy, or a multilayer of two or more layers that is the same as or different from the gate electrode.

[0110] In addition, the circuit region may further include a first switching thin film transistor and a second switching thin film transistor provided together with the thin film transistor 112, and a capacitor. Since each of the first switching thin film transistor and the second switching thin film transistor is provided on the circuit region of the sub-pixel SP to have the same structure as that of the thin film transistor 112, their description will be omitted. A capacitor (not shown) may be provided in an overlapping region between the gate electrode 112b and the source electrode 112c of the thin film transistor 112, which overlap with each other with the interlayer insulating layer 111b interposed therebetween.

[0111] Furthermore, to prevent the threshold voltage of the thin film transistors disposed in the pixel region from shifting due to light, the display panel or substrate 110 may further include a light shielding layer (not shown) disposed below the active layer 112a of at least one of the thin film transistor 112, the first switching thin film transistor, or the second switching thin film transistor. The light shielding layer may be disposed between the substrate 110 and the active layer 112a to block light incident on the active layer 112a through the substrate 110, thereby minimizing changes in the threshold voltage of the transistors due to external light. Furthermore, since the light shielding layer is disposed between the substrate 110 and the active layer 112a, the thin film transistors can be prevented from being viewed by the user.

[0112] A passivation layer 111c may be provided on substrate 110 to cover the pixel region. Passivation layer 111c covers the drain electrode 112d, source electrode 112c, and gate electrode 112b of thin film transistor 112, as well as buffer layer BL. Passivation layer 111c may be formed above the circuit region and the light-emitting region. Passivation layer 111c may be omitted. A color filter CF may be provided on passivation layer 111c.

[0113] An overcoat layer 113 may be provided on the substrate 110 to cover the passivation layer 111c and the color filter CF. When the passivation layer 111c is omitted, the overcoat layer 113 may be provided on the substrate 110 to cover the circuit area. The overcoat layer 113 may be formed in the circuit area CA in which the thin film transistor 112 is provided, and in the light emitting area EA. In addition, the overcoat layer 113 may be formed in other non-display areas NDA and the entire display area DA except for the pad area PA of the non-display area NDA. For example, the overcoat layer 113 may include an extension (or extension) extending from the display area DA or extending to other non-display areas NDA except for the pad area PA. Therefore, the overcoat layer 113 may have a size that is relatively wider than the size of the display area DA.

[0114] The overcoat layer 113 according to an example may be formed to have a relatively thick thickness to provide a flat surface on the display area DA and the non-display area NDA. For example, the overcoat layer 113 may be made of an organic material such as photoacrylate, benzocyclobutene, polyimide, and fluororesin.

[0115] The overcoat layer 113 may be disposed between the passivation layer 111c and the pixel electrode 114 and include an upper surface 1132a and a side surface 1132b. The overcoat layer 113 according to one exemplary aspect may include a first layer 1131 and a second layer 1132. The first layer 1131 is disposed between the passivation layer 111c and the pixel electrode 114. The second layer 1132 covers the first layer 1131 and has an end portion that partially contacts the bottom surface 120b of the pattern portion 120. Alternatively, the overcoat layer 1133 may include the first layer 1131 in contact with the passivation layer 111c and the color filter CF and the second layer 1132 disposed on the first layer 1131. Since the second layer 1132 is disposed on the first layer 1131, the upper surface 1132a and the side surface 1132b of the overcoat layer 1133 may be the upper surface and the side surface of the second layer 1132.

[0116] According to one exemplary aspect, the first layer 1131 may be formed as a main body except for the contact hole of the pixel electrode 114 and the contact hole of the thin film transistor 112. Figure 6The second layer 1132 of one exemplary aspect shown can be formed to overlap the entire light-emitting area EA and a portion of the non-light-emitting (or non-exiting) area NEA. Therefore, the second layer 1132 can be formed on the first layer 1131 by patterning into an island shape. The first layer 1131 and the second layer 1132 can be formed to have the same refractive index, but the refractive index of the first layer 1131 and the second layer 1132 is not limited thereto, and the first layer 1131 and the second layer 1132 can have different refractive indices. When the refractive indices of the first layer 1131 and the second layer 1132 are different (for example, the refractive index of the second layer 1132 is greater than the refractive index of the first layer 1131), the optical path of the light emitted from the light-emitting device layer E directed to the adjacent sub-pixel SP can be changed toward the reflective portion 130 according to the refractive index difference between the first layer 1131 and the second layer 1132. Therefore, the display device 100 according to one aspect of the present disclosure can reduce or prevent color mixing with the adjacent sub-pixel SP.

[0117] like Figure 3 As shown, the second layer 1132 of the display device 100 according to one aspect of the present disclosure may include an upper surface 1132a, a side surface 1132b, and an end portion 1132c. The upper surface 1132a of the second layer 1132 may be flat, and the side surface 1132b of the second layer 1132 may be inclined.

[0118] On the other hand, the pixel electrode 114 is formed on the upper surface 1132a of the second layer 1132, so that the pixel electrode 114 can be provided flat, and the light-emitting layer 116 and the reflective electrode 117 formed on the pixel electrode 114 can also be provided flat. Since the pixel electrode 114, the light-emitting layer 116, and the reflective electrode 117, that is, the light-emitting device layer E, are provided flat in the light-emitting area EA, the thickness of the pixel electrode 114, the light-emitting layer 116, and the reflective electrode 117 can be formed uniformly in the light-emitting area EA. Therefore, the light-emitting layer 116 can emit light uniformly without deviation in the light-emitting area EA.

[0119] Reference Figure 3 , the color filter CF provided in the light emitting area EA may be provided between the substrate 110 and the outer coating layer 113. The color filter CF may include a red color filter (or first color filter) CF1 for converting the white light emitted from the light emitting layer 116 into red light, a green color filter (or second color filter) CF2 for converting the white light into green light, and a blue color filter (or third color filter) CF3 for converting the white light into blue light. Since the light emitting layer 116 emits white light, the fourth sub-pixel as a white sub-pixel may not include a color filter. That is, in the display device 100 according to one aspect of the present disclosure, the color filter CF may be provided only in a portion of the multiple sub-pixels SP. Alternatively, as Figure 3 As shown, a fourth subpixel SP4 ′ of another subpixel P may be disposed adjacent to the other side (or left side) of the first subpixel SP1 , and a blue color filter (or third color filter) CF3 ′ may be disposed in the fourth subpixel SP4 .

[0120] like Figure 3 As shown, the display device 100 according to one aspect of the present disclosure may be configured such that color filters having different colors partially overlap each other at the boundary portions of the plurality of sub-pixels SP. In this case, the display device 100 according to one aspect of the present disclosure may prevent light emitted from each sub-pixel SP from being emitted to an adjacent sub-pixel SP due to the color filters overlapping each other at the boundary portions of the sub-pixels SP, thereby preventing color mixing between the sub-pixels SP.

[0121] Reference Figure 6 , the pixel electrode 114 of the sub-pixel SP may be formed on the overcoat layer 113. The pixel electrode 114 may be connected to the drain or source of the thin film transistor 112 through a contact hole passing through the overcoat layer 113 and the passivation layer 111c. Figure 6 In the embodiment, the pixel electrode 114 may be configured to be wider than the second layer 1132. However, depending on the cross-sectional position or other aspects, the pixel electrode 114 may be configured to be narrower than the second layer 1132. For example, Figure 7 As shown, the pixel electrode 114 can be configured to be narrower than the second layer 1132. Figure 6 As shown, when the pixel electrode 114 is provided to be wider than the second layer 1132, the edge portion of the pixel electrode 114 may be connected to the drain or source in the circuit area CA. In this case, the edge portion of the pixel electrode 114 may be covered by the bank 115. The pixel electrode 114 may be made of at least one of a transparent metal material and a semi-transmissive metal material.

[0122] Because the display device 100 according to one aspect of the present disclosure is configured as a bottom emission type, the pixel electrode 114 can be formed of a transparent conductive material (or TCO) capable of transmitting light such as indium tin oxide (ITO) and indium zinc oxide (IZO), or a semi-transmissive conductive material such as magnesium (Mg), silver (Ag), and an alloy of Mg and Ag.

[0123] On the other hand, the material constituting the pixel electrode 114 may include MoTi. The pixel electrode 114 may be a first electrode or an anode.

[0124] Reference Figure 3In the display device 100 according to one aspect of the present disclosure, the pixel electrode 114 may be formed to cover the upper surface 1132a and the side surface 1132b of the second layer 1132. That is, the pixel electrode 114 may be provided to extend from the upper surface of the overcoat layer 113 (or the second layer 1132) to the side surface of the overcoat layer 113. In this case, the end portion (or end portion) of the pixel electrode 114 may be in contact with the first layer 1131. Since the pixel electrode 114 is formed to cover the upper surface 1132a and the side surface 1132b of the second layer 1132, the nanolens portion 140 including the plurality of nanolenses 141 may be provided on the upper surface 1132a and the side surface 1132b of the second layer 1132.

[0125] Reference Figure 4 , at least one of the side surfaces 1132b of the overcoat layer 113 can be positioned to face the reflective portion 130 (or the curved surface 132 of the reflective portion 130). Therefore, the plurality of nano-lenses 141 on the side surface 114b of the pixel electrode 114, which is disposed on the side surface 1132b of the overcoat layer 113, can be positioned to face the reflective portion 130 (or the curved surface 132 of the reflective portion 130). As a result, in the display device 100 according to one aspect of the present disclosure, the reflective portion 130 and a portion of the plurality of nano-lenses 141 are positioned to face each other, so that the plurality of nano-lenses 141 can scatter (or reflect and / or refract) light reflected by the reflective portion 130, thereby maximizing light extraction efficiency and / or viewing angle characteristics.

[0126] After forming the pixel electrode 114, a plasma process using hydrogen (H) or ammonia (NH 3 ) is performed, and a plurality of nano-lenses 141 can be randomly and irregularly formed on the upper surface 114 a and the side surface 114 b of the pixel electrode 114. As described above, since the plasma process using hydrogen (H) or ammonia (NH 3 ) is performed on the pixel electrode 114 including ITO, each of the plurality of nano-lenses 141 can be formed to include more indium (In) than the pixel electrode 114. Therefore, the light reflectivity of the plurality of nano-lenses 141 can be greater than the light reflectivity of the pixel electrode 114 including a transparent conductive material.

[0127] Since the non-uniformly formed nanolenses 141 are provided on the upper surface 114a and the side surface 114b of the pixel electrode 114, the optical path of the light emitted from the light-emitting layer 116 and directed toward the nanolenses 141 can be changed by the nanolenses 141. In other words, scattering may occur due to the nanolenses 141. Therefore, the display device 100 according to one aspect of the present disclosure can reduce the total reflectivity at the interface between the substrate 110 and the air layer due to the scattering effect of the multiple nanolenses 141, and thus can further improve the light extraction efficiency (or luminous efficiency) compared to a display device without multiple nanolenses 141.

[0128] On the other hand, in the display device 100 according to one aspect of the present disclosure, the lower surface 114c of the pixel electrode 114 can be flat. In the case of a display device in which the lower surface of the pixel electrode has a lens shape or an uneven shape, there is a problem in which external light is reflected twice on the lower surface of the pixel electrode, resulting in a diffraction pattern of the reflected light. Therefore, in the display device 100 according to one aspect of the present disclosure, since the lower surface 114c of the pixel electrode 114 can be flat, the diffraction pattern of the reflected light can be reduced or minimized compared to the case in which the lower surface of the pixel electrode has a lens shape or an uneven shape. Reflected light can refer to light that is incident from the outside of the substrate 110, reflected on the lower surface of a transparent conductive material (or transparent metal layer) such as the pixel electrode 114, and emitted to the outside of the substrate 110. Therefore, in the display device 100 according to one aspect of the present disclosure, since the lower surface 114c of the pixel electrode 114 can be flat, the occurrence of radial rainbow patterns and radial ring patterns of the reflected light can be reduced or minimized due to the unevenness or randomness of the diffraction pattern of the reflected light. Therefore, the display device 100 according to one aspect of the present disclosure can use a general polarizer to reduce the diffraction pattern and / or external light reflectivity without a special polarizer to prevent the diffraction pattern, thereby reducing manufacturing costs.

[0129] The bank 115 is a region where no light is emitted and may be provided to surround each light-emitting portion included in each of the plurality of sub-pixels SP. That is, the bank 115 may separate (or define) each light-emitting portion or the light-emitting area EA included in each sub-pixel SP. The light-emitting portion may refer to a portion of the light-emitting layer 116 where the pixel electrode 114 contacts the lower surface and the reflective electrode 117 contacts the upper surface.

[0130] The bank 115 may be formed to cover the edge of each pixel electrode 114 of each sub-pixel SP and expose a portion of each pixel electrode 114. That is, the bank 115 may partially cover the pixel electrode 114. Therefore, the bank 115 may prevent the pixel electrode 114 and the reflective electrode 117 from contacting each other at the end of each pixel electrode 114.

[0131] On the other hand, since the bank 115 covers the edge of the pixel electrode 114, a portion of the plurality of nano lenses 141 formed on the pixel electrode 114 may also be covered by the bank 115. The exposed portion of the pixel electrode 114 not covered by the bank 115 may be included in the light emitting portion. Figure 4 As shown, the light emitting portion may be formed on the plurality of nano lenses 141 , and thus the light emitting portion (or light emitting area EA) may overlap with a portion of the plurality of nano lenses 141 in the thickness direction of the substrate 110 .

[0132] After the embankment 115 is formed, the light-emitting layer 116 may be formed to cover the pixel electrode 114, the plurality of nano-lenses 141 and the embankment 115. Thus, the embankment 115 is disposed between the pixel electrode 114 (or nano-lens 141) and the light-emitting layer 116. The embankment 115 may be described as a pixel defining layer. The embankment 115 according to an exemplary aspect may comprise an organic material. In the case where the embankment 115 comprises an organic material, the embankment 115 in the non-luminous (or non-emission) area NEA may have different thicknesses depending on their positions. In addition, when the embankment 115 is made of an organic material, since the upper surface of the embankment 115 can be set to be flat, the light-emitting layer 116, the reflective electrode 117 and the encapsulation layer 118 formed on the upper surface of the embankment 115 in subsequent processes may also be set to be flat, but the present disclosure is not limited thereto. The embankment 115 may be made of an inorganic material. When the bank 115 is made of an inorganic material, the bank 115 may be formed to have the same or similar thickness along the contour of the pattern part 120 (or the second layer 1132 ).

[0133] Further references Figure 4 , a light-emitting layer 116 may be formed on the pixel electrode 114, the plurality of nano-lenses 141, and the bank 115. The light-emitting layer 116 may be disposed between the pixel electrode 114 (or the plurality of nano-lenses 141) and the reflective electrode 117. Therefore, when a voltage is applied to each of the pixel electrode 114 and the reflective electrode 117, an electric field is formed between the pixel electrode 114 and the reflective electrode 117. As a result, the light-emitting layer 116 may emit light. The light-emitting layer 116 may be formed of a plurality of sub-pixels SP and a common layer disposed on the bank 115.

[0134] According to one aspect, the light-emitting layer 116 can be configured to emit white light. The light-emitting layer 116 may include multiple stacked layers that emit light of different colors. For example, the light-emitting layer 116 may include a first stacked layer, a second stacked layer, and a charge generation layer (CGL) disposed between the first and second stacked layers. The light-emitting layer can be configured to emit white light, and therefore, each of the multiple sub-pixels SP may include a color filter CF suitable for the corresponding color.

[0135] The first stack may be disposed on the pixel electrode 114 and the plurality of nanolenses 141 and may implement a structure in which a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML(B)), and an electron transport layer (ETL) are sequentially stacked.

[0136] The charge generation layer may supply charges to the first stack and the second stack. The charge generation layer may include an N-type charge generation layer for supplying electrons to the first stack and a P-type charge generation layer for supplying holes to the second stack. The N-type charge generation layer may contain a metal material as a dopant.

[0137] The second stack may be provided on the first stack, and may be implemented as a structure in which a hole transport layer (HTL), a yellow-green (YG) emission layer (EML(YG)), and an electron injection layer (EIL) are sequentially stacked.

[0138] In the display device 100 according to one aspect of the present disclosure, since the light emitting layer 116 is provided as a common layer, the first stacked layer, the charge generation layer, and the second stacked layer may be arranged across the plurality of sub-pixels SP.

[0139] According to another aspect, the light-emitting layer 116 can be configured to emit light of different colors and can be patterned in each of the plurality of sub-pixels SP. However, in this case, in addition to the light-emitting layer, the hole injection layer (HIL), hole transport layer (HTL), electron transport layer (ETL), and electron injection layer (EIL) can be arranged as common layers in the sub-pixels SP. In addition, when the light-emitting layer 116 is patterned in each sub-pixel SP, a color filter may not be provided between the substrate 110 and the light-emitting layer 116.

[0140] A reflective electrode 117 may be formed on the light-emitting layer 116. According to one example, the reflective electrode 117 may include a metal material. The reflective electrode 117 may reflect light emitted from the light-emitting layer 116 in the plurality of sub-pixels SP toward the lower surface of the substrate 110. Therefore, the display device 100 according to one aspect of the present disclosure may be implemented as a bottom-emission display device.

[0141] The display device 100 according to one aspect of the present disclosure is a bottom-emitting type, and the light emitted from the light-emitting layer 116 must be reflected toward the substrate 110, so the reflective electrode 117 can be made of a metal material with high reflectivity. According to an example, the reflective electrode 117 can be formed of a metal material with high reflectivity, such as a laminated structure of aluminum and titanium (Ti / Al / Ti), a laminated structure of aluminum and ITO (ITO / Al / ITO), an Ag alloy, and a laminated structure of an Ag alloy and ITO (ITO / Ag alloy / ITO). The Ag alloy can be an alloy such as silver (Ag), palladium (Pd) and copper (Cu). The reflective electrode 117 can be expressed as terms such as a second electrode, a cathode and a counter electrode.

[0142] On the other hand, in the display device 100 according to one aspect of the present disclosure, the reflective portion 130 may be a portion of the reflective electrode 117. Therefore, the reflective portion 130 may reflect light directed toward the adjacent sub-pixel SP toward the emission area EA of the sub-pixel SP for emitting light. Since the reflective portion 130 is a portion of the reflective electrode 117, as shown in FIG. Figure 3 As shown, the reflective portion 130 may be indicated by reference numeral 117a. In the present disclosure, the reflective portion 130 may indicate the reflective electrode 117 that overlaps with the pattern portion 120. Specifically, the reflective portion 130 may indicate the reflective electrode 117 that overlaps with the pattern portion 120 and is tilted (or the curved surface 132 of the reflective portion 130). Figure 3 As shown, the reflective portion 130 may reflect light directed to an adjacent sub-pixel SP or light dissipated by total reflection between interfaces toward the light emitting area EA of the sub-pixel SP for emitting light.

[0143] The encapsulation layer 118 is formed on the reflective electrode 117. The encapsulation layer 118 serves to prevent oxygen or moisture from penetrating into the light emitting layer 116 and the reflective electrode 117. To this end, the encapsulation layer 118 may include at least one inorganic film and at least one organic film.

[0144] On the other hand, Figure 3 As shown, the encapsulation layer 118 may be disposed not only in the emission area EA but also in the non-emission (or non-exit) area NEA. The encapsulation layer 118 may be disposed between the reflective electrode 117 and the opposite substrate 200.

[0145] In the following, reference will be made to Figures 1 to 6 The pattern part 120 , the reflection part 130 , and the nanolens part 140 of the display apparatus 100 according to one aspect of the present disclosure are described in more detail.

[0146] In the display device 100 according to one aspect of the present disclosure, the pattern portion 120 may be provided near the light-emitting area EA (or near the non-light-emitting (or non-exiting) area NEA) and the reflective portion 130 may be provided on the pattern portion 120 to prevent a decrease in light extraction efficiency due to a portion of the light emitted from the light-emitting device layer not being discharged to the outside due to total reflection at the interface between the light-emitting device layer and the electrode and / or the interface between the substrate and the air layer. In addition, a plurality of nano-lenses 141 are provided on the pixel electrode 114, so that the light emitted from the light-emitting layer 116 can be scattered.

[0147] For example, Figure 3 As shown, the pattern portion 120 may be formed to be recessed in the first layer 1131 of the outer coating layer 113. Figure 2 and Figure 3 As shown, the pattern portion 120 can be disposed near the non-emission (or non-exit) area NEA. That is, the pattern portion 120 can be disposed to surround the emission area EA. The pattern portion 120 can be formed by patterning and removing the boundaries of the first layer 1131 between the sub-pixels SP after forming the first layer 1131. According to one aspect, the pattern portion 120 can be disposed to surround the emission area EA in the form of slits or grooves. The pattern portion 120 may include a bottom surface 120b and an inclined surface 120s.

[0148] The bottom surface 120b of the pattern portion 120 according to one exemplary aspect is the surface of the pattern portion 120 formed closest to the substrate 110 and can be arranged closer to the substrate 110 (or the upper surface of the substrate 110) than the pixel electrode 114 (or the upper surface 114a of the pixel electrode 114) in the emission area EA. On the other hand, since the shallower the depth of the pattern portion 120, the smaller the area of ​​the reflective portion 130 provided on the pattern portion 120, the light extraction efficiency may be reduced. Therefore, in the display device 100 according to one aspect of the present disclosure, the depth of the pattern portion 120 can be set within a range that does not reduce the light extraction efficiency due to the reflective portion 130 provided on the pattern portion 120.

[0149] The inclined surface 120s of the pattern portion 120 may be disposed to be inclined between the bottom surface 120b and the light emitting area EA. Therefore, the inclined surface 120s of the pattern portion 120 may be disposed to surround the light emitting area EA. Figure 3As shown, the inclined surface 120s can be connected to the bottom surface 120b. The inclined surface 120s can be formed to have a specified angle with the bottom surface 120b. For example, the specified angle between the inclined surface 120s and the bottom surface 120b can be an obtuse angle. Therefore, the width of the pattern portion 120 can gradually decrease in the direction from the opposite substrate 200 (or the reflective portion 130) toward the substrate 110 (or a third direction, such as the Z-axis direction). Because the obtuse angle is formed by the inclined surface 120s and the bottom surface 120b, the light-emitting device layer E (or the light-emitting device layer E including the reflective portion 130) formed in subsequent processes, including the second layer 1132, the bank 115, the pixel electrode 114, and the reflective portion 130, can be formed to be recessed along the outline of the pattern portion 120. Therefore, the light-emitting device layer E (or the reflective portion 130) can be formed to be recessed on the pattern portion 120, and the pattern portion 120 is formed to be recessed in the non-light-emitting (or non-emitting) area NEA (or peripheral area). The light emitting device layer E (or the reflective portion 130 ) formed to be recessed in the pattern portion 120 may mean that it includes at least one of the pixel electrode 114 , the light emitting layer 116 , and the reflective electrode 117 .

[0150] like Figure 2 As shown, the pattern portion 120 can be arranged to surround the light-emitting area EA. Since the pattern portion 120 is arranged to surround the light-emitting area EA, at least a portion of the reflective portion 130 provided on the pattern portion 120 can be arranged to surround the light-emitting area EA. Therefore, in the display device 100 according to one aspect of the present disclosure, since light can be extracted even from the non-light-emitting (or non-emitting) area NEA near the light-emitting area EA by the reflector 130, the overall light efficiency can be improved. Therefore, compared with a general display device without the pattern portion 120 and the reflective portion 130 on the pattern portion 120, the display device 100 according to one aspect of the present disclosure can have the same light-emitting efficiency or further improved light-emitting efficiency even at low power, thereby reducing the total power consumption.

[0151] In addition, the display apparatus 100 according to one aspect of the present disclosure may enable the light emitting device layer E to emit light even at low power, thereby improving the lifespan of the light emitting device layer E.

[0152] Return to reference Figure 2 The pattern portion 120 may include a first pattern line 121 disposed along a first direction (eg, X-axis direction) between the circuit area CA and the light emitting area EA and a second pattern line 122 disposed along a second direction (eg, Y-axis direction) intersecting the first direction (X-axis direction). Figure 2 , the first pattern line 121 may represent the pattern portion 120 disposed along the horizontal direction, and the second pattern line 122 may represent the pattern portion 120 disposed along the vertical direction.

[0153] The first pattern line 121 may include a bottom surface 121b and an inclined surface 121s (eg, Figure 6 The second pattern line 122 may include a bottom surface 122b (as shown). Figure 4 As shown) and the inclined surface 122s (as Figure 4 As shown). Since each of the bottom surface 121b and the inclined surface 121s of the first pattern line 121 and each of the bottom surface 122b and the inclined surface 122s of the second pattern line 122 are the same as each of the bottom surface 120b and the inclined surface 120s of the pattern portion 120, their description will be replaced with the description of the bottom surface 120b and the inclined surface 120s of the pattern portion 120. The first pattern line 121 and the second pattern line 122 can be connected into one line in the non-light emitting (or non-exiting) area NEA (or peripheral area) to surround the light emitting area EA. However, as Figure 2 As shown, the first pattern line 121 may be disconnected in a portion where the emission area EA is connected to the circuit area CA.

[0154] The first pattern line 121 can be arranged between sub-pixels SP for emitting light of the same color. For example, the first pattern line 121 can be arranged between first sub-pixels SP1 arranged along the second direction (Y-axis direction). Therefore, the first pattern line 121 can be arranged in the first direction (X-axis direction). In contrast, the second pattern line 122 can be arranged between sub-pixels SP for emitting light of different colors. For example, the second pattern line 122 can be arranged between the first sub-pixel SP1 as a red sub-pixel and the second sub-pixel SP2 as a green sub-pixel. Therefore, the second pattern line 122 can be arranged in the second direction (Y-axis direction).

[0155] Since the second pattern lines 122 are disposed between the sub-pixels SP for emitting light of different colors, the reflective portions 130 on the second pattern lines 122 can prevent light of different colors from emitting to other adjacent sub-pixels SP. Therefore, the display device 100 according to the present disclosure can prevent color mixing (or color distortion) between the sub-pixels SP for emitting light of different colors, thereby improving color purity.

[0156] The second layer 1132 of the overcoat layer 113 may further extend from the light emitting area EA to the non-light emitting (or non-exiting) area NEA to partially cover the inclined surface 120s of the pattern portion 120. Figure 3As shown, the end 1132c of the second layer 1132 may be in contact with the bottom surface 120b of the pattern portion 120. In this case, the end 1132c of the second layer 1132 may only be in contact with a portion of the bottom surface 120b. When the second layer 1132 completely covers the bottom surface 120b, the depth of the reflective portion 130 formed on the pattern portion 120 may be relatively reduced, thereby reducing the reflection efficiency. Therefore, in the display device 100 according to one aspect of the present disclosure, the second layer 1132 is configured to be in contact with only a portion of the bottom surface 120b, rather than completely covering the bottom surface 120b of the pattern portion 120, so that the reflective portion 130 formed in a subsequent process can be formed close to the bottom surface 120b, thereby improving the reflection efficiency.

[0157] The bank 115 may extend to cover the edge of the pixel electrode 114 while covering the side surface 1132b of the second layer 1132, which covers the inclined surface 120s of the pattern portion 120. Therefore, the bank 115 may contact a portion of the bottom surface 120b of the pattern portion 120 that is not covered by the second layer 1132. When the bank 115 completely covers the bottom surface 120b, the depth of the reflective portion 130 formed on the pattern portion 120 is reduced, thereby reducing the reflection efficiency. Therefore, as Figure 3 As shown, each of the second layer 1132 and the embankment 115 on the bottom surface 120b of the pattern portion 120 can be provided discontinuously. That is, each of the second layer 1132 and the embankment 115 can be disconnected on the bottom surface 120b of the pattern portion 120. Therefore, in the display device 100 according to one aspect of the present disclosure, the embankment 115 is provided so as to contact only a portion of the bottom surface 120b, rather than completely covering the bottom surface 120b, so that the reflective portion 130 formed in a subsequent process can be formed close to the bottom surface 120b, thereby improving reflection efficiency. Similarly, the pixel electrode 114 can cover the upper surface 1132a and side surface 1132b of the second layer 1132 and have an end portion that partially contacts the bottom surface 120b of the pattern portion 120. Therefore, the pixel electrode 114 included in each sub-pixel SP can be disconnected and not connected to each other.

[0158] On the other hand, Figure 3 As shown, since the second pattern line 122 is arranged between the sub-pixels SP for emitting light of different colors, the second layer 1132, the pixel electrode 114, the embankment 115, the light-emitting layer 116 and the reflective portion 130 can be arranged to be symmetrical based on the center of the pattern portion 120 (or the second pattern line 122).

[0159] The first pattern line 121 may be provided between sub-pixels SP for emitting light of the same color. Figure 6As shown, the second layer 1132 may be formed only to a portion adjacent to the light emitting area EA, and the second layer 1132 may not be formed on the opposite side of the light emitting area EA based on the first pattern line 121. As a result, since the first pattern line 121 is provided between the sub-pixels SP for emitting light of the same color, the bank 115, the light emitting layer 116, and the reflective portion 130 may be provided asymmetrically based on the center of the pattern portion 120 (or the first pattern line 121), as shown in FIG. Figure 6 shown on the left.

[0160] Reference Figure 6 , the plurality of nano-lenses 141 included in the nano-lens portion 140 may be formed by a plasma process after forming the pixel electrode 114. As a result, the display device 100 according to one aspect of the present disclosure may have a structural feature in which the plurality of nano-lenses 141 are provided on the pixel electrode 114 connected to the drain electrode 112d of the thin film transistor.

[0161] Return to reference Figure 4 In the display device 100 according to one aspect of the present disclosure, the size of the nanolens section 140 can be equal to or larger than the size of the light-emitting area EA. The nanolens section 140 according to one exemplary aspect can have a second width W2 that is larger than the first width W1 of the light-emitting area EA. Therefore, the nanolens section 140 can partially overlap with the light-emitting area EA. Since the nanolens section 140 partially overlaps with the light-emitting area EA, light emitted from the light-emitting layer 116, which mainly emits light, can be scattered by the multiple nanolenses 141, thereby reducing the light that is totally reflected at the interface between the substrate 110 and the air layer. Therefore, the display device 100 according to one aspect of the present disclosure can improve the light extraction efficiency, thereby improving the overall luminous efficiency (or brightness).

[0162] Furthermore, compared to a display device without a plurality of nano-lenses, the display device 100 according to one aspect of the present disclosure may further improve viewing angle characteristics due to the scattering effect generated by the plurality of nano-lenses 141 .

[0163] Figure 7 is a schematic cross-sectional view of a display device according to a second aspect of the present disclosure.

[0164] Reference Figure 7 , except that the structure of the pixel electrode 114 is changed and the nano lens portion 140 is provided on the base layer BSL provided on the same layer as the active layer 112a, the display device 100 according to the second aspect of the present disclosure is different from the display device according to the above aspect. Figures 1 to 6 Therefore, the same reference numerals will be assigned to the same configurations, and only different configurations will be described hereinafter.

[0165] In accordance with the above Figure 4In the case of a display device of FIG. 1 , the nano lens portion 140 is provided on the upper surface 114a and the side surface 114b of the pixel electrode 114. Figure 4 In the case of a display device of FIG. 1 , a plurality of nano lenses 141 may be provided on the upper surface 114a and the side surface 114b of the pixel electrode 114. Figure 4 In the display device, a portion of light emitted from the light emitting layer 116 may be emitted to the outside through the lower surface of the substrate 110 after the optical path of the light is changed at the upper side of the overcoat layer 113 .

[0166] On the other hand, according to Figure 7 The display device 100 may further include a base layer BSL disposed between the passivation layer 111c and the substrate 110, and the nano lens portion 140 may be disposed on an upper surface BSLa of the base layer BSL facing the lower surface 114c of the pixel electrode 114. Figure 7 As shown, a portion of the light emitted from the light emitting layer 116 may be emitted to the outside through the lower surface of the substrate 110 after being first reflected by the reflective portion 130 and secondarily reflected by the nano lens portion 140 provided on the upper surface BLSa of the base layer BSL. Figure 7 In the display device 100 , light may be emitted to the outside after the optical path of the light is changed under the overcoat layer 113 .

[0167] On the other hand, according to Figure 7 In the display device 100, since the optical path of light can be changed on the nanolens portion 140 provided between the overcoat layer 113 and the substrate 110, the pixel electrode 114 may not be formed on the side surface 1132b of the overcoat layer 113. The pixel electrode 114 is formed only on the upper surface 1132a of the overcoat layer 113, and not on the side surface 1132b of the overcoat layer 113, so the width of the emission area EA can be widened to be as wide as the width of the area in which the pixel electrode is not formed on the side surface 1132b of the overcoat layer 113, thereby improving light emission efficiency.

[0168] In the display device according to the second aspect of the present disclosure, the base layer BSL may include IGZO as a transparent conductive material. After forming the base layer BSL including IGZO, a plasma process using hydrogen (H) or ammonia (NH3) is performed, thereby forming a plurality of nanolenses 141 by precipitating indium (In) through a radical reaction of oxygen (O) and hydrogen (H) in the IGZO according to the following formula.

[0169] 3H2+In203→3H2O+2In

[0170] According to the above chemical formula, oxygen (O) contained in the base layer BSL, which is a transparent conductive material, can be combined with hydrogen (H) as a plasma gas through the plasma process to generate water (H2O), thereby precipitating indium (In). Therefore, the multiple nano lenses 141 (or the nano lens portion 140) can contain more indium (In) than the base layer BSL. Therefore, the multiple nano lenses 141 are closer to metal than the base layer BSL and can have a higher light reflectivity than the base layer BSL. Therefore, as Figure 7 As shown, light emitted from the light emitting layer 116 and reflected by the reflective portion 130 may be reflected by the nanolens 141 containing more indium (In) than the base layer BSL, so that its optical path may be changed to be emitted as the first extracted light L1 and / or the second extracted light L2.

[0171] As described above, since the plurality of nanolenses 141 are randomly and irregularly formed on the upper surface BSLa of the base layer BSL through a plasma process using hydrogen (H) or ammonia (NH3), the plurality of nanolenses 141 can have different sizes, shapes, and spacings. Therefore, the amount of indium (In) contained in the plurality of nanolenses 141 can vary, so that some of the plurality of nanolenses 141 can contain indium (In) similar to or slightly more than the base layer BSL. In this case, the nanolenses 141 can have similar properties to the base layer BSL, so that the nanolenses 141 can transmit some light and reflect other light.

[0172] On the other hand, some of the plurality of nanolenses 141 may have similar properties to the base layer BSL, but may have different amounts of indium, so that the base layer BSL and the nanolenses 141 may have different refractive indices. Therefore, light passing through some of the plurality of nanolenses 141 may be refracted by the interface between the nanolenses 141 and the base layer BSL, thereby changing its optical path.

[0173] Therefore, among the light emitted from the light emitting layer 116, the light reflected by the reflective portion 130 and directed toward the nanolens portion 140 can be reflected and / or refracted by the nanolens portion 140 provided on the upper surface BSLa of the base layer BSL to be emitted to the outside of the substrate 110. As described above, the optical path of the light emitted from the light emitting layer 116 can be changed by the reflective portion 130 and the nanolens portion 140 spaced apart from the reflective portion 130.

[0174] Therefore, in the display device according to the second aspect of the present disclosure, the light path in each sub-pixel SP is changed by the nanolens portion 140 spaced apart from the reflective portion 130, so that the total reflection in the interface between the substrate 110 and the air layer can be reduced, and the light extraction efficiency of the light emitted from the light emitting layer 116 can be improved.

[0175] Return to reference Figure 7 The base layer BSL may be flat and partially overlap the emission area EA. For example, the base layer BSL may be formed to have a width greater than that of the pixel electrode 114, and may be configured so that the center of the base layer BSL overlaps the center of the pixel electrode 114, thereby partially overlapping the emission area EA. Since the base layer BSL is configured to have a width equal to or smaller than that of the sub-pixel SP, color mixing with adjacent sub-pixels SP may be prevented.

[0176] In the display device 100 according to the second aspect of the present disclosure, the base layer BSL can be provided on the same layer as the active layer 112a. Furthermore, the base layer BSL can be provided as IGZO containing the same material as the active layer 112a. This is because the base layer BSL and the active layer 112a are formed on the same layer using the same process, but at different locations on the plane. For example, the base layer BSL can be provided between the buffer layer BL and the interlayer insulating layer 111b. Furthermore, the active layer 112a can be provided in the circuit area CA, while the base layer BSL can be provided to partially overlap the emission area EA.

[0177] On the other hand, after forming the base layer BSL, a plasma process is performed to form the nanolens portion 140. As described above, the active layer 112a is provided on the same layer as the base layer BSL, and therefore the active layer 112a may be damaged by the plasma process. Therefore, in the display device 100 according to the second aspect of the present disclosure, before performing the plasma process, a photoresist PR is formed on the remaining area other than the base layer BSL (e.g., on the active layer 112a), and thereafter a plasma process using hydrogen (H) or ammonia (NH3) may be performed. After forming the nanolens portion 140 on the base layer BSL through the plasma process, the photoresist PR may be removed. Therefore, in the display device 100 according to the second aspect of the present disclosure, a plurality of nanolenses 141 having lens shapes or uneven shapes can be formed on the base layer BSL without damaging the active layer 112a due to the plasma process.

[0178] Reference Figure 7In the display device 100 according to the second aspect of the present disclosure, the lower surface BSLb of the base layer BSL is set to be flat. Therefore, in the display device 100 according to the second aspect of the present disclosure, the diffraction pattern of the reflected light can be reduced or minimized compared to the case where the lower surface of the base layer or the lower surface of the pixel electrode has a convex lens shape or an uneven shape. Reflected light can refer to light that is incident from the outside of the substrate 110, reflected on the lower surface of the transparent conductive material (or transparent metal layer) such as the pixel electrode 114 or the base layer BSL, and emitted to the outside of the substrate 110. As a result, in the display device 100 according to the second aspect of the present disclosure, since the lower surface BLSb of the base layer BLS can be flat, the occurrence of radial rainbow patterns and radial ring patterns of the reflected light can be reduced or minimized due to the unevenness or randomness of the diffraction pattern of the reflected light. Therefore, the display device 100 according to the second aspect of the present disclosure can use a general polarizer to reduce the diffraction pattern and / or external light reflectivity without a special polarizer to prevent diffraction patterns, thereby reducing manufacturing costs.

[0179] Figure 8 is a schematic cross-sectional view of a display device according to a third aspect of the present disclosure.

[0180] Reference Figure 8 The display device 100 according to the third aspect of the present disclosure is similar to the display device according to the third aspect of the present disclosure except that the nano lens portion 140 is also provided on the base layer BSL provided on the same layer as the active layer 112a and the buffer layer BL is patterned. Figures 1 to 6 Therefore, the same reference numerals will be assigned to the same configurations, and only the different configurations will be described below.

[0181] In accordance with the above Figure 4 In the case of a display device of FIG. 1 , the nano lens portion 140 is provided on the upper surface 114a and the side surface 114b of the pixel electrode 114. Figure 4 In the case of a display device of FIG. 1 , a plurality of nano lenses 141 may be provided on the upper surface 114a and the side surface 114b of the pixel electrode 114. Figure 4 In the display device, a portion of light emitted from the light emitting layer 116 may be emitted to the outside through the lower surface of the substrate 110 after the optical path of the light is changed at the upper side of the overcoat layer 113 .

[0182] On the other hand, according to Figure 8The display device 100 further includes a base layer BSL disposed between the buffer layer BL and the passivation layer 111c and between the substrate 110 and the passivation layer 111c, and the nano lens portion 140 may also be disposed on the upper surface BSLa and the side surfaces BSLs of the base layer BSL. The upper surface BSLa of the base layer BSL faces the lower surface of the passivation layer 111c. Therefore, as Figure 8 As shown, a portion of the light emitted from the light emitting layer 116 may be first reflected by the nano lens portion 140 provided on the pixel electrode 114, and then may be reflected twice by the reflective portion 130. The light reflected twice by the reflective portion 130 may be reflected three times by the nano lens portion 140 provided on the upper surface BSLa of the base layer BSL, and thereafter, the light reflected for the third time may be emitted outward through the lower surface of the substrate 110. That is, according to Figure 8 In the display device 100 , a portion of the light emitted from the light emitting layer 116 may be emitted to the outside after the optical path of the light is changed above and below the overcoat layer 113 , respectively.

[0183] On the other hand, according to Figure 8 In the display device 100 of FIG. 1 , the base layer BSL may partially overlap with the pixel electrode 114. For example, the base layer BSL may have a width greater than that of the pixel electrode 114 and may be provided such that the center portion of the base layer BSL overlaps with the center portion of the pixel electrode 114. Therefore, the base layer BSL may partially overlap with the pixel electrode 114 and / or the emission area EA. Figure 8 In the display device 100, the nano lens portion 140 disposed on the base layer BSL and the nano lens portion 140 disposed on the pixel electrode 114 may be double-overlapped in the thickness direction of the substrate 110. Therefore, since the scattering effect can be further improved by the nano lens portion 140 having a double-overlapping structure, Figure 8 The display device 100 can maximize the efficiency of light extraction and the viewing angle characteristics. On the other hand, since the width of the base layer BSL is less than or equal to the width of the sub-pixel SP, color mixing with the adjacent sub-pixel SP can be prevented.

[0184] In the display device 100 according to the third aspect of the present disclosure, the base layer BSL may include IGZO as a transparent conductive material. After forming the base layer BSL including IGZO, a plasma process using hydrogen (H) or ammonia (NH3) is performed. Thus, indium (In) is precipitated by a radical reaction of oxygen (O) and hydrogen (H) in IGZO according to the following formula to form a plurality of nanolenses 141.

[0185] 3H2+In2O3→3H2O+2In

[0186] According to the above chemical formula, oxygen (O) contained in the base layer BSL, which is a transparent conductive material, can be combined with hydrogen (H) as a plasma gas through the plasma process to generate water (H2O), thereby precipitating indium (In). Therefore, the multiple nano lenses 141 (or the nano lens portion 140) can contain more indium (In) than the base layer BSL. Therefore, the multiple nano lenses 141 are closer to metal than the base layer BSL and can have a higher light reflectivity than the base layer BSL. Therefore, as Figure 8 As shown, light emitted from the light emitting layer 116 and reflected by the reflective portion 130 may be reflected by the nanolens 141 containing more indium (In) than the base layer BSL, so that its optical path may be changed and emitted as the first extracted light L1 and / or the second extracted light L2.

[0187] On the other hand, in the display device according to the third aspect of the present disclosure, each of the plurality of sub-pixels SP may include a slit portion SLT provided by partially removing the buffer layer BL. In this case, the buffer layer BL may include a side surface BLs of the buffer layer BL, the side surface BLs of the buffer layer BL being adjacent to the slit portion SLT and connected to the upper surface BLa of the buffer layer BL. The slit portion SLT may include a lower surface SLTb adjacent to the upper surface of the substrate 110. Figure 8 As shown, as the slit portion SLT is formed in the buffer layer BL, the base layer BSL may include a recessed portion formed along the outline of the slit portion SLT and the side surface BLs of the buffer layer BL. Therefore, the base layer BSL may be in contact with the lower surface SLTb of the slit portion SLT, the side surface BLs of the buffer layer BL, and the upper surface BLa of the buffer layer BL.

[0188] Since the plurality of nanolenses 141 are randomly and irregularly formed on the upper surface BSLa and the side surfaces BSLs of the base layer BSL through a plasma process using hydrogen (H) or ammonia (NH3), the plurality of nanolenses 141 can have different sizes, shapes, and spacings. Therefore, the amount of indium (In) contained in the plurality of nanolenses 141 can be different from each other, so that some of the plurality of nanolenses 141 can contain indium (In) similar to or slightly more than the base layer BSL. In this case, the nanolenses 141 can have similar properties to the base layer BSL, and thus the nanolenses 141 can transmit some light and reflect other light.

[0189] Meanwhile, some of the plurality of nanolenses 141 may have similar properties to the base layer BSL, but may have different amounts of indium, so that the base layer BSL and the nanolenses 141 may have different refractive indices. Therefore, light passing through some of the plurality of nanolenses 141 may be refracted at the interface between the nanolenses 141 and the base layer BSL, thereby changing its optical path.

[0190] Therefore, among the light emitted from the light emitting layer 116, the light reflected by the reflective portion 130 and directed toward the nanolens portion 140 (or the light reflected by the nanolens portion 140 disposed on the pixel electrode 114 and directed toward the nanolens portion 140 disposed on the upper surface BSLa and the side surfaces BSLs of the base layer BSL) can be reflected and / or refracted by the nanolens portion 140 disposed on the upper surface BSLa and the side surfaces BSLs of the base layer BSL to be transmitted to the outside of the substrate 110. As described above, the optical path of the light emitted from the light emitting layer 116 can be changed by the reflective portion 130 and the nanolens portion 140 spaced apart from the reflective portion 130 (the nanolens portion 140 disposed on the pixel electrode 114 and the nanolens portion 140 disposed on the base layer BSL).

[0191] As a result, in each of the multiple sub-pixels SP of the display device 100 according to the third aspect of the present disclosure, the optical path of light can be changed by the nanolens portion 140 that is arranged to be spaced apart from the reflective portion 130 and has a double overlapping structure, so that the total reflection in the interface between the substrate 110 and the air layer can be reduced, thereby improving the light extraction efficiency of the light emitted from the light-emitting layer 116.

[0192] In the display device 100 according to the third aspect of the present disclosure, the base layer BSL may be provided on the same layer as the active layer 112a. In addition, the base layer BSL may include IGZO, the same material as the active layer 112a. A detailed description of this is given in the description of the display device 100 according to the second aspect of the present disclosure, and thus will be omitted.

[0193] Reference Figure 8In the display device 100 according to the third aspect of the present disclosure, due to the slit portion SLT formed in the buffer layer BL, the base layer BSL can be formed to be concave. However, the lower surface BSLb of the base layer BSL can be set to not have a convex lens shape or an uneven shape, but to have a specified width and be flat. Therefore, in the display device 100 according to the third aspect of the present disclosure, the diffraction pattern of the reflected light can be reduced or minimized compared to the case where the lower surface of the pixel electrode or the lower surface of the base layer has a convex lens shape or an uneven shape. Reflected light can refer to light that is incident from the outside of the substrate 110, reflected on the lower surface of the transparent conductive material (or transparent metal layer) such as the pixel electrode or the base layer, and emitted to the outside of the substrate 110. As a result, in the display device 100 according to the third aspect of the present disclosure, since the lower surface BSLb of the base layer BSL has a specified width and is flat, the occurrence of radial rainbow patterns and radial ring patterns of the reflected light due to the unevenness or randomness of the diffraction pattern of the reflected light can be reduced or minimized. Therefore, the display device 100 according to the third aspect of the present disclosure can reduce the diffraction pattern and / or lower the external light reflectivity using a general polarizer without a special polarizer to prevent the diffraction pattern, thereby reducing manufacturing costs.

[0194] In the display device of the present disclosure, since each of the plurality of sub-pixels includes a nanolens portion spaced apart from the reflective portion, total reflection at the interface between the substrate and the air layer can be reduced, thereby improving extraction efficiency of light emitted from the light emitting layer.

[0195] Furthermore, in the display device of the present disclosure, since light can be scattered by the nanolens portion including a plurality of nanolenses, the viewing angle characteristic is improved compared to a display device without the nanolens portion.

[0196] Furthermore, in the display device of the present disclosure, since the reflective portion and the nanolens portion are disposed adjacent to the non-luminescent region, light can be extracted from the non-luminescent region, thereby improving overall light extraction efficiency.

[0197] In addition, in the display device of the present disclosure, since the efficiency of light extraction can be improved by the nanolens portion and / or the reflective portion, the luminous efficiency equal to or greater than that of the display device without the nanolens portion and / or the reflective portion can be obtained, thereby reducing the total power consumption.

[0198] In addition, in the display device of the present disclosure, since one surface of the transparent metal layer provided on the side where external light is incident is flat, the diffraction pattern of the reflected light caused by the transparent metal layer can be reduced or minimized, thereby reducing or minimizing the occurrence of radial rainbow patterns and radial circular ring patterns.

[0199] Effects obtained from the present disclosure are not limited to those mentioned above, and other effects not mentioned will be apparent to those of ordinary skill in the art from the description.

[0200] Although the aspects of the present disclosure have been described in more detail with reference to the accompanying drawings, the present disclosure is not necessarily limited to these aspects, but can be practiced in various modifications without departing from the technical ideas of the present disclosure. Therefore, the present disclosure is intended to cover modifications and variations of these aspects as long as they fall within the scope of the appended claims and their equivalents.

Claims

1. A display device, comprising: a substrate, the substrate comprising a plurality of sub-pixels; a pattern portion having a concave shape and disposed between adjacent sub-pixels among the plurality of sub-pixels; as well as a reflecting portion, wherein the reflecting portion is arranged on the pattern portion, Wherein, each of the plurality of sub-pixels comprises: a light-emitting layer, the light-emitting layer being disposed on the substrate; and The nano lens portion includes a plurality of nano lenses and is disposed between the light emitting layer and the substrate and is spaced apart from the reflective portion.

2. The display device according to claim 1, wherein: The plurality of sub-pixels include a light emitting region and a non-light emitting region adjacent to the light emitting region, and Wherein, the nano lens portion overlaps with the light emitting area.

3. The display device according to claim 2, wherein: The size of the nano lens portion is equal to or larger than the size of the light emitting region.

4. The display device according to claim 1, wherein: Each of the plurality of sub-pixels further includes a pixel electrode disposed below the light emitting layer, and The nano lens portion is disposed on an upper surface of the pixel electrode facing the light emitting layer and is disposed on a side surface of the pixel electrode connected to the upper surface of the pixel electrode.

5. The display device according to claim 4, wherein: The plurality of nano lenses are irregularly formed on the upper surface of the pixel electrode and the side surfaces of the pixel electrode.

6. The display device according to claim 4, wherein: The pixel electrode comprises indium tin oxide, i.e., ITO, and The nano lens portion contains more indium, ie, In, than the pixel electrode.

7. The display device according to claim 4, wherein: Each of the plurality of sub-pixels further comprises: a passivation layer, the passivation layer being disposed between the substrate and the pixel electrode; and an outer coating layer having an upper surface and a side surface and disposed between the passivation layer and the pixel electrode, Wherein, the pixel electrode extends from the upper surface of the outer coating layer to the side surface of the outer coating layer.

8. The display device according to claim 7, wherein: At least one of the side surfaces of the outer coating layer is disposed to face the reflecting portion.

9. The display device according to claim 7, wherein: The pattern portion includes a bottom surface and an inclined surface connected to the bottom surface, the inclined surface having an inclination, and Wherein, the outer coating comprises: a first layer, the first layer being disposed between the passivation layer and the pixel electrode; and a second layer covering the first layer and having an end portion in contact with a portion of the bottom surface of the pattern portion, The nano lens portion is disposed on an upper surface of the second layer and on a side surface of the second layer.

10. The display device according to claim 1, wherein: Each of the plurality of sub-pixels comprises: A pixel electrode, wherein the pixel electrode is arranged below the light-emitting layer; a passivation layer, the passivation layer being disposed between the pixel electrode and the substrate; and a base layer, the base layer being arranged between the passivation layer and the substrate, The nano lens portion is disposed on an upper surface of the base layer facing a lower surface of the pixel electrode.

11. The display device according to claim 10, wherein: The base layer comprises indium gallium zinc oxide, i.e., IGZO, and The nano lens portion contains more indium, ie, In, than the base layer.

12. The display device according to claim 10, wherein: Each of the plurality of sub-pixels includes a thin film transistor having an active layer, and Wherein, the base layer and the active layer are arranged on the same layer.

13. The display device according to claim 10, wherein: The plurality of sub-pixels include a light-emitting region and a non-light-emitting region adjacent to the light-emitting region, and The base layer is flat and overlaps with the light emitting area.

14. The display device according to claim 7, wherein: Each of the plurality of sub-pixels further comprises: a buffer layer, the buffer layer being disposed between the passivation layer and the substrate; and a base layer, the base layer being arranged between the buffer layer and the passivation layer and between the substrate and the passivation layer, The nano lens part is disposed on an upper surface of the base layer facing a lower surface of the passivation layer, and is disposed on a side surface of the base layer connected to the upper surface of the base layer.

15. The display device according to claim 14, wherein: The base layer overlaps with the pixel electrode.

16. The display device according to claim 14, wherein: Each of the plurality of sub-pixels includes a slit portion adjacent to a side surface of the buffer layer, and the side surface of the buffer layer is connected to an upper surface of the buffer layer, The slit portion includes a lower surface adjacent to the upper surface of the substrate, and The base layer contacts the lower surface of the slit portion, the side surface of the buffer layer, and the upper surface of the buffer layer.

17. The display device according to claim 14, wherein: The pixel electrode comprises indium tin oxide, i.e., ITO, and The nano lens portion contains more indium, ie, In, than the pixel electrode.

18. The display device according to claim 14, wherein: The base layer comprises indium gallium zinc oxide, i.e., IGZO, and The nano lens portion contains more indium, ie, In, than the base layer.

19. The display device according to claim 1, wherein: The reflective portion includes a reflective electrode disposed on the light emitting layer.

20. The display device according to claim 1, wherein: The plurality of sub-pixels include a light-emitting region and a non-light-emitting region adjacent to the light-emitting region, and Wherein, the pattern portion is arranged to be spaced apart from the light emitting area.

21. The display device according to claim 20, wherein: The width of the pattern part decreases in a direction from the reflection part to the substrate. 22 . The display device of claim 21 , further comprising a color filter that is disposed on the substrate and converts a color of light emitted from the light emitting layer.

23. A display device comprising: A plurality of sub-pixels, each of which includes a light-emitting area and a non-light-emitting area surrounding the light-emitting area; a pattern portion, the pattern portion being disposed in the non-luminescent region and surrounding a plurality of sub-pixels; a reflecting portion, the reflecting portion being disposed on the pattern portion and having a curved surface; as well as At least one light path changing portion is disposed in the light emitting area and the non-light emitting area.

24. The display device according to claim 23, wherein: The pattern part has a bottom surface and an inclined surface extending from the bottom surface.

25. The display device according to claim 24, wherein: The pattern portion comprises: a pixel electrode, the pixel electrode being disposed along the inclined surface of the pattern portion; a bank layer, the bank layer being disposed on the pixel electrode; and A light-emitting layer is disposed on the bank layer.

26. The display device according to claim 25, wherein: The at least one optical path changing portion includes a plurality of nano lenses disposed on the pixel electrode.

27. The display device according to claim 25, wherein: The pixel electrode includes a first portion and a second portion extending from the first portion, and The first portion and the second portion of the pixel electrode have an upper surface and a lower surface, and the lower surface of the first portion is flat and faces the substrate.

28. The display device according to claim 25, wherein: The reflective portion includes a reflective electrode disposed on the light emitting layer.

29. The display device according to claim 23, wherein: The width of the at least one light path changing portion is greater than the width of the light emitting area.

30. The display device according to claim 27, wherein: The plurality of nano lenses are disposed on upper surfaces of the first portion and the second portion of the pixel electrode.

31. The display device according to claim 23, wherein: The pattern part includes a first pattern line extending along a first direction and a second pattern line extending along a second direction crossing the first direction.

32. The display device according to claim 31, wherein: The first pattern line is disposed between adjacent sub-pixels for emitting light having the same color, and the second pattern line is disposed between adjacent sub-pixels for emitting light having different colors.

33. The display device according to claim 23, wherein: The reflective portion and the at least one optical path changing portion are configured to change an optical path of light in the light emitting region and the non-light emitting region.

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