Display substrate, preparation method thereof and display device

Abstract

The invention provides a display substrate, a preparation method thereof and a display device. The display substrate comprises a substrate body and a touch layer located on the substrate body. The touch layer comprises a second conducting layer, the second conducting layer comprises a first conducting sub-layer and a second conducting sub-layer, the first conducting sub-layer comprises a plurality of first conducting parts, the second conducting sub-layer comprises a plurality of second conducting parts, and the first conducting parts and the second conducting parts are electrically connected in a one-to-one correspondence mode; the orthographic projection of the first conductive part on the substrate falls into the orthographic projection of the corresponding second conductive part on the substrate; and the edge of the orthographic projection of the first conductive part on the substrate is not overlapped with the edge of the orthographic projection of the corresponding second conductive part on the substrate.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display substrate and a preparation method thereof, and a display device. Background Art

[0002] With the rapid development of display technology, touch screens have been widely used in electronic products such as smart phones, tablet computers, and televisions. Mutual capacitive touch screens mainly include OGM touch screens implemented with metal mesh capacitive touch technology (One Glass SolutionMetal Mesh, referred to as OGM) and OGS touch screens implemented with single glass full bonding technology (One Glass Solution, referred to as OGS). However, in conventional OGS touch screens, due to process limitations, the thickness of the indium tin oxide (ITO) formed by magnetron sputtering does not exceed 1500A at a time, resulting in a large square resistance of ITO (for example, greater than 15Ω / □), which cannot meet the requirements of touch sensitivity and active pen.

[0003] It should be noted that the information disclosed in the above background technology section is only used to enhance the understanding of the background of the present disclosure, and therefore may include information that does not constitute the prior art known to those skilled in the art. Summary of the invention

[0004] In one aspect, a display substrate is provided, comprising: a base substrate and a touch layer located on the base substrate,

[0005] The touch layer includes a second conductive layer, the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one,

[0006] wherein the orthographic projection of the first conductive portion on the base substrate falls within the orthographic projection of the corresponding second conductive portion on the base substrate; and

[0007] An edge of an orthographic projection of the first conductive portion on the base substrate does not overlap with an edge of an orthographic projection of the corresponding second conductive portion on the base substrate.

[0008] According to some exemplary embodiments, the touch layer further includes a first conductive layer and a first insulating layer, and the first insulating layer is located between the first conductive layer and the second conductive layer.

[0009] According to some exemplary embodiments, the first conductive layer is located on a side of the second conductive layer close to the substrate.

[0010] According to some exemplary embodiments, the first sub-conductive layer is located on a side of the first insulating layer away from the base substrate; and the second sub-conductive layer is located on a side of the first sub-conductive layer away from the base substrate.

[0011] According to some exemplary embodiments, the second sub-conductive layer is located on a side of the first insulating layer away from the base substrate; and the first sub-conductive layer is located on a side of the second sub-conductive layer away from the base substrate.

[0012] According to some exemplary embodiments, two adjacent first conductive portions among the plurality of first conductive portions are spaced apart by a first spacing distance at a minimum in the horizontal direction, and two adjacent second conductive portions among the plurality of second conductive portions are spaced apart by a second spacing distance at a minimum in the horizontal direction, the first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light emitting surface of the display substrate.

[0013] According to some exemplary embodiments, at least one of the first conductive portions includes a first surface close to the substrate and a first side surface adjacent to the first surface, and a first slope angle is formed between the first surface and the first side surface; at least one of the second conductive portions includes a second surface close to the substrate and a second side surface adjacent to the second surface, and a second slope angle is formed between the second surface and the second side surface; and

[0014] The first slope angle is smaller than the second slope angle.

[0015] According to some exemplary embodiments, a difference between the first spacing distance and the second spacing distance is in a range of 6 micrometers to 14 micrometers.

[0016] According to some exemplary embodiments, the first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is less than the second refractive index; and / or,

[0017] The second conductive layer has a third refractive index that is lower than the second refractive index.

[0018] According to some exemplary embodiments, the first sub-conductive layer has a first thickness in a third direction, the second sub-conductive layer has a second thickness in the third direction, the sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms, and the third direction is perpendicular to the light emitting surface of the display substrate.

[0019] According to some exemplary embodiments, the material of the first sub-conductive layer includes indium tin oxide; and / or the material of the second sub-conductive layer includes indium tin oxide.

[0020] According to some exemplary embodiments, a sheet resistance of the second conductive layer is in a range of 7Ω / □ to 11Ω / □.

[0021] According to some exemplary embodiments, the first conductive layer includes a plurality of bridge portions, and at least a portion of the plurality of first conductive portions is electrically connected to the bridge portion.

[0022] According to some exemplary embodiments, the first insulating layer includes a plurality of first insulating portions, at least some of the first insulating portions are arranged corresponding to at least some of the bridge portions,

[0023] The orthographic projection of the first insulating portion on the base substrate at least partially overlaps with the orthographic projection of the corresponding bridge portion on the base substrate; and

[0024] The width of the first insulating portion in the first direction is greater than the width of the corresponding bridging portion in the first direction; and the width of the first insulating portion in the second direction is less than the width of the corresponding bridging portion in the second direction, the first direction and the second direction are parallel to the horizontal direction, and the first direction and the second direction intersect.

[0025] According to some exemplary embodiments, a width of the first insulating portion in the second direction is greater than the first spacing distance.

[0026] According to some exemplary embodiments, the first conductive layer includes a single layer or multiple conductive layers; and / or,

[0027] The material of the first conductive layer includes indium tin oxide, metal or metal alloy.

[0028] According to some exemplary embodiments, the touch layer includes a touch electrode, the touch electrode includes a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes, the plurality of first sub-touch electrodes extend along a first direction and are spaced apart along a second direction, the plurality of second sub-touch electrodes extend along the second direction and are spaced apart along the first direction, and the first direction and the second direction intersect; the first sub-touch electrodes and the second sub-touch electrodes are insulated from each other; at least one of the first sub-touch electrode and the second sub-touch electrode includes a plurality of main body portions and a plurality of bridging portions, the plurality of main body portions are located in the second conductive layer, the plurality of bridging portions are located in the first conductive layer, and two adjacent main body portions are electrically connected through one bridging portion.

[0029] In another aspect, a display device is provided, wherein the display device comprises the display substrate as described in any one of the above items.

[0030] In yet another aspect, a method for preparing a display substrate is provided, comprising:

[0031] providing a substrate base plate;

[0032] Forming a first conductive material layer on the base substrate, and performing a patterning process on the first conductive material layer to form a first conductive layer;

[0033] forming a first insulating material layer on a side of the first conductive layer away from the base substrate, and performing a patterning process on the first insulating material layer to form a first insulating layer; and

[0034] A second conductive material layer is formed on a side of the first insulating layer away from the base substrate, and a patterning process is performed on the second conductive material layer to form a second conductive layer, wherein the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, and the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one.

[0035] wherein the orthographic projection of the first conductive portion on the base substrate falls within the orthographic projection of the corresponding second conductive portion on the base substrate; and

[0036] An edge of an orthographic projection of the first conductive portion on the base substrate does not overlap with an edge of an orthographic projection of the corresponding second conductive portion on the base substrate.

[0037] According to some exemplary embodiments, forming the second conductive layer includes:

[0038] forming a first sub-conductive material layer on a side of the first insulating layer away from the base substrate, and performing a patterning process on the first sub-conductive material layer to form a first sub-conductive layer; and

[0039] forming a second sub-conductive material layer on a side of the first sub-conductive layer away from the base substrate, and performing a patterning process on the second sub-conductive material layer to form a second sub-conductive layer,

[0040] Among them, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, two adjacent first conductive parts among the plurality of first conductive parts are spaced apart by a first spacing distance at a minimum in the horizontal direction, and two adjacent second conductive parts among the plurality of second conductive parts are spaced apart by a second spacing distance at a minimum in the horizontal direction, the first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light emitting surface of the display substrate.

[0041] According to some exemplary embodiments, a composition process for forming the first sub-conductive layer and a composition process for forming the second sub-conductive layer share the same mask; and

[0042] The yellow light process in the composition process of forming the first sub-conductive layer includes forming a pattern using irradiation light of a first exposure amount, and the yellow light process in the composition process of forming the second sub-conductive layer includes forming a pattern using irradiation light of a second exposure amount, and the first exposure amount is greater than the second exposure amount. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] The above contents and other objects, features and advantages of the present disclosure will become more apparent through the following description of the embodiments of the present disclosure with reference to the accompanying drawings, in which:

[0044] Figure 1 is a schematic plan view of a display substrate according to an embodiment of the present disclosure;

[0045] Figure 2 are partial plan views of some exemplary display substrates;

[0046] Figure 3 is along Figure 2 Schematic diagram of a cross section taken along the midline AA';

[0047] Figure 4 is a partial plan view of a display substrate according to an embodiment of the present disclosure;

[0048] Figure 5 is along Figure 4 Schematic diagram of the cross section taken along the midline BB';

[0049] Figure 6 is a partial cross-sectional schematic diagram of a display substrate according to an embodiment of the present disclosure;

[0050] Fig. 7A is a partial plan view of a display substrate according to an embodiment of the present disclosure, Figure 7B yes Fig. 7A Schematic diagram of a local cross section of the S1 region. Figure 7C yes Fig. 7A Schematic diagram of a local cross section of the middle S2 region;

[0051] Figure 8 is based on Figure 1 A schematic plan view of a partial enlargement of the S0 region;

[0052] Fig.9A is a schematic plan view of a display substrate according to an embodiment of the present disclosure, Fig. 9B is a schematic plan view of a display substrate according to an embodiment of the present disclosure, Fig. 9C yes Fig. 9B A schematic diagram of a local section taken along the center line CC';

[0053] Fig.10 is a structural block diagram of a display device according to an embodiment of the present disclosure;

[0054] Fig.11 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure;

[0055] Fig.12 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure;

[0056] Fig.13 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure; and

[0057] Figures 14A-14J They are respectively partial cross-sectional schematic diagrams of a display substrate according to an embodiment of the present disclosure.

[0058] It should be noted that, for the sake of clarity, in the drawings used to describe the embodiments of the present invention, the sizes of layers, structures or regions may be enlarged or reduced, that is, these drawings are not drawn according to the actual scale. DETAILED DESCRIPTION

[0059] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0060] It should be noted that in the drawings, the size and relative size of the elements may be exaggerated for the purpose of clarity and / or description. Thus, the size and relative size of each element are not necessarily limited to the size and relative size shown in the drawings. In the specification and drawings, the same or similar reference numerals indicate the same or similar parts.

[0061] Unless otherwise defined, the technical terms or scientific terms used in this disclosure should be understood by ordinary technicians in the field. "First", "second" and similar words used in this disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprising" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0062] In this document, unless otherwise specified, directional terms such as "upper", "lower", "left", "right", "inner", "outer", etc. are used to indicate the orientation or positional relationship based on the drawings, and are only for the convenience of describing the present disclosure, and do not indicate or imply that the device, element or component referred to must have a specific orientation, be constructed or operate in a specific orientation. It should be understood that when the absolute position of the described object changes, the relative positional relationship they represent may also change accordingly. Therefore, these directional terms should not be understood as limiting the present disclosure.

[0063] As used herein, the terms "substantially," "approximately," "approximately," and other similar terms are used as terms of approximation rather than as terms of degree, and they are intended to account for the inherent deviations in measured or calculated values ​​that would be recognized by one of ordinary skill in the art. Taking into account factors such as process fluctuations, measurement problems, and errors associated with the measurement of a particular quantity (i.e., limitations of the measurement system), "approximately" or "approximately" as used herein include the stated value and mean that the particular value is within an acceptable range of deviation as determined by one of ordinary skill in the art. For example, "approximately" can mean within one or more standard deviations, or within ±10% or ±5% of the stated value.

[0064] In this document, directional expressions "first direction" and "second direction" are used to describe different directions of a touch module or a display substrate, for example, the row direction and column direction of touch electrodes. It should be understood that such expressions are only exemplary descriptions and are not limitations of the present disclosure.

[0065] In this document, unless otherwise specified, the expression "electrically connected" may mean that two parts or elements are directly electrically connected, for example, part or element A is in direct contact with part or element B, and electrical signals can be transmitted between the two parts; it may also mean that two parts or elements are electrically connected through a conductive medium such as a conductive wire, for example, part or element A is electrically connected to part or element B through a conductive wire to transmit electrical signals between the two parts or elements; it may also mean that two parts or elements are electrically connected through at least one electronic component, for example, part or element A is electrically connected to part or element B through at least one thin film transistor to transmit electrical signals between the two parts or elements.

[0066] The following is a brief description of the technical terms involved in the present disclosure so that relevant personnel can better understand the present solution.

[0067] OGM touch screen: refers to a touch screen with a touch electrode including a metal grid formed on a substrate. For example, the substrate can be an encapsulation film or encapsulation layer in a display substrate.

[0068] OGS touch screen: refers to a touch screen in which touch electrodes of ITO material and bridges of ITO material or metal material are directly formed on the substrate.

[0069] At present, the touch modules in display devices with touch functions mainly include two categories: embedded touch modules (in cell touch) and external touch modules (on cell touch). Taking liquid crystal display devices as an example, the embedded touch module is to set the touch electrodes in the touch module inside the liquid crystal box, so there is no need to increase the thickness of the liquid crystal box, but the touch will take up the display time, so it is difficult to support high-frequency products. The external touch module does not take up the display time and can support high-frequency products. For example, the refresh rate of some e-sports screens can reach more than 240Hz, which is difficult to meet with embedded touch technology, but can be supported by external touch technology.

[0070] Taking an organic light-emitting diode (OLED) display device as an example, an external touch module implements a touch electrode on a cover glass or a packaging layer to achieve a touch function.

[0071] Touch screens can be divided into mutual capacitance touch screens and self-capacitive touch screens according to the touch mode. Since mutual capacitance touch screens can realize multi-point touch, they have become the mainstream and future development trend in the current touch screen market. Among them, mutual capacitance touch screens mainly include OGM touch screens and OGS touch screens. With the continuous upgrading of display module resolution, the metal grid in the OGM touch screen is prone to the appearance of moiré, affecting the display effect. Although conventional OGS touch screens do not have the problem of moiré, due to process limitations, the thickness of the ITO film formed by magnetron sputtering does not exceed 1500A at one time, resulting in a large square resistance of ITO (for example, greater than 15Ω / □), which cannot meet customer needs for touch sensitivity and active pens. In an embodiment of the present disclosure, the display device may include an OLED display device, a quantum dot light emitting diode (Quantum Dot Light Emitting Diodes, abbreviated as QLED) display device, a sub-millimeter light emitting diode (Mini Light Emitting Diode, abbreviated as Mini LED) display device, a micro light emitting diode (Micro Light Emitting Diode, abbreviated as Micro LED) display device, etc.

[0072] An embodiment of the present disclosure provides a display substrate. Specifically, the display substrate includes: a base substrate and a touch layer located on the base substrate; the touch layer includes a second conductive layer. The second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one, wherein the orthographic projection of the first conductive part on the base substrate falls within the orthographic projection of the corresponding second conductive part on the base substrate. And the edge of the orthographic projection of the first conductive part on the base substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive part on the base substrate.

[0073] Through such a design, the second conductive layer can be formed by stacking two conductive layers. For example, the second conductive layer can be formed by stacking two ITO coating processes, thereby increasing the thickness of the second conductive layer and reducing the square resistance of the second conductive layer, which is beneficial to improving the touch sensitivity of the display substrate and meeting the requirements of the active pen. In addition, the two conductive layers in the second conductive layer can be formed by using the same mask, without increasing the mask cost.

[0074] Figure 1 is a schematic plan view of a display substrate according to an embodiment of the present disclosure.

[0075] Exemplarily, in an embodiment of the present disclosure, a display substrate 100 is provided. Figure 1 , the display substrate 100 includes a base substrate 1 and a touch layer 2 located on the base substrate 1. The touch layer 2 may include a touch electrode 20. For example, the touch electrode 20 includes a plurality of first sub-touch electrodes 201 and a plurality of second sub-touch electrodes 202. The plurality of first sub-touch electrodes 201 extend along a first direction X and are arranged at intervals along a second direction Y, and the plurality of second sub-touch electrodes 202 extend along a second direction Y and are arranged at intervals along the first direction X, and the first direction X and the second direction Y intersect. The first direction X and the second direction Y are parallel to the light emitting surface of the display substrate 100. The light emitted by the light emitting device in the display substrate 100 is emitted to the outside after passing through the light emitting surface of the display substrate 100.

[0076] It should be noted that the embodiments of the present disclosure do not limit the shape and quantity of the first sub-touch electrode 201 and the second sub-touch electrode 202. The first sub-touch electrode 201 and the second sub-touch electrode 202 can select corresponding shapes and quantities according to actual needs, as long as the position of the touch point can be determined by detecting the capacitance. The embodiments of the present disclosure do not limit the types of the first sub-touch electrode 201 and the second sub-touch electrode 202. For example, the first sub-touch electrode 201 can be a driving electrode, and the second sub-touch electrode 202 can be a sensing electrode. Alternatively, the first sub-touch electrode 201 can be a sensing electrode, and the second sub-touch electrode 202 can be a driving electrode.

[0077] It should also be noted that the first sub-touch electrode 201 and the second sub-touch electrode 202 are arranged crosswise, and the first sub-touch electrode 201 and the second sub-touch electrode 202 may be perpendicular to each other, or the angle between the first sub-touch electrode 201 and the second sub-touch electrode 202 is an acute angle. The embodiment of the present disclosure is illustrated by taking the first sub-touch electrode 201 and the second sub-touch electrode 202 as an example of being perpendicular to each other.

[0078] Exemplarily, the first touch sub-electrode 201 and the second touch sub-electrode 202 are insulated from each other. For example, the first touch sub-electrode 201 and the second touch sub-electrode 202 may be isolated from each other by an insulating layer at the intersection position.

[0079] In some embodiments, the first touch sub-electrode 201 and the second touch sub-electrode 202 may be located in different conductive layers. An insulating layer is provided between the layer where the first touch sub-electrode 201 is located and the layer where the second touch sub-electrode 202 is located, so that the first touch sub-electrode 201 and the second touch sub-electrode 202 are insulated and isolated at the intersection.

[0080] In some embodiments, a portion of the first touch sub-electrode 201 may be located at the same layer as the second touch sub-electrode 202. Alternatively, a portion of the second touch sub-electrode 202 may be located at the same layer as the first touch sub-electrode 201. The first touch sub-electrode 201 and the second touch sub-electrode 202 may be bridged by a bridge portion.

[0081] Exemplarily, at least one of the first touch sub-electrode 201 and the second touch sub-electrode 202 includes a plurality of main body portions 230 and a plurality of bridge portions 210. Figure 1 The main body 230 includes a second main body 2302, and the bridge portion 210 includes a second bridge portion 2102. The second sub touch electrode 202 includes a plurality of second main bodies 2302 and a plurality of second bridge portions 2102. Two adjacent second main bodies 2302 can be electrically connected through a second bridge portion 2102, thereby realizing the extension design of the second sub touch electrode 202 along the second direction Y.

[0082] Exemplarily, the second main body 2302 of the first touch sub-electrode 201 and the second touch sub-electrode 202 may be located in the same layer. The second bridge 2102 of the first touch sub-electrode 201 and the second touch sub-electrode 202 may be located in different layers. For example, the intersection of the second bridge 2102 of the first touch sub-electrode 201 and the second touch sub-electrode 202 may be isolated by an insulating layer.

[0083] It should be noted that, in this article, the expression "the same layer" refers to a layer structure formed by using the same film-forming process to form a film layer for forming a specific pattern, and then using the same mask to pattern the film layer through a single composition process. Depending on the specific pattern, a single composition process may include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure may be continuous or discontinuous. These specific patterns may also be at different heights. Multiple elements, components, structures and / or parts located in the "same layer" are made of the same material and are formed by the same composition process. Generally, multiple elements, components, structures and / or parts located in the "same layer" have approximately the same thickness.

[0084] For example, continue to refer to Figure 1 The touch layer 2 may further include a plurality of touch traces 241. One end of the touch trace 241 may be electrically connected to the first sub-touch electrode 201 and / or the second sub-touch electrode 202 in the touch electrode 20, and the other end of the touch trace 241 may be electrically connected to an external touch drive circuit or touch chip, thereby realizing signal transmission between the touch electrode 20 and the external touch drive circuit or touch chip.

[0085] Figure 2 are partial plan views of some exemplary display substrates, Figure 3 is along Figure 2 Schematic diagram of the cross section taken along the midline AA'.

[0086] For example, in conjunction with reference Figure 1-Figure 3 The display substrate includes a base substrate 1 and a touch layer 2 located on the base substrate 1. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the base substrate 1; a first insulating layer 22 disposed on a side of the first conductive layer 21 away from the base substrate 1; and a second conductive layer 23 disposed on a side of the first insulating layer 22 away from the base substrate 1.

[0087] Exemplarily, the second main body portion 2302 of the first touch sub-electrode 201 and the second touch sub-electrode 202 may both be located in the second conductive layer 23. The second bridge portion 2102 of the second touch sub-electrode 202 may be located in the first conductive layer 21.

[0088] Exemplarily, the touch layer 2 may include a plurality of first insulating portions 221 in the first insulating layer 22. The first sub-touch electrode 201 and the second bridging portion 2102 of the second sub-touch electrode 202 may be isolated by the first insulating portion 221. The second body portion 2302 of the second sub-touch electrode 202 may be electrically connected to a portion of the second bridging portion 2102 that is not covered by the first insulating portion 221.

[0089] In the related art, in order to avoid the occurrence of moiré patterns that affect the display effect, the touch electrode is usually made of ITO material. For example, the material of the second conductive layer 23 includes ITO. For example, ITO is prepared by magnetron sputtering. Due to process limitations, the thickness of ITO formed by magnetron sputtering does not exceed 1500 angstroms, resulting in a large square resistance of ITO, which in turn leads to a low signal transmission rate in the touch electrode, resulting in insufficient touch sensitivity of the display substrate and unable to meet the requirements of the active pen.

[0090] In order to reduce the square resistance of the touch electrode, the embodiment of the present disclosure optimizes the design of the touch layer. By adopting a stacked design, the thickness of the second conductive layer is increased, and the square resistance of the second conductive layer is reduced, thereby improving the touch sensitivity of the display substrate and meeting the requirements of the active pen.

[0091] Figure 4 is a partial plan view of a display substrate according to an embodiment of the present disclosure, Figure 5 is along Figure 4 Schematic diagram of the cross section taken along the midline BB'.

[0092] For example, in the embodiments of the present disclosure, in combination with reference Figure 4 and Figure 5 The display substrate 100 may include: a base substrate 1 and a touch control layer 2 located on the base substrate.

[0093] Exemplarily, the touch layer 2 may include a first conductive layer 21 and a second conductive layer 23 , and a first insulating layer 22 located between the first conductive layer 21 and the second conductive layer 23 .

[0094] In some embodiments, the first sub-touch electrode 201 and the second sub-touch electrode 202 may be bridged by a bridge portion. For example, the touch layer 2 may include: a first conductive layer 21 disposed on the base substrate 1; a first insulating layer 22 disposed on a side of the first conductive layer 21 away from the base substrate; and a second conductive layer 23 disposed on a side of the first insulating layer 22 away from the base substrate. The bridge portion may be located in the first conductive layer 21.

[0095] In some embodiments, the second main body portion 2302 of the first touch sub electrode 201 and the second touch sub electrode 202 may both be located in the second conductive layer 23. The second bridge portion 2102 of the second touch sub electrode 202 may be located in the first conductive layer 21.

[0096] For example, refer to Figure 5, the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacking structure, increasing the thickness of the second conductive layer 23, and reducing the square resistance of the second conductive layer 23.

[0097] Exemplarily, the second main body 2302 of the second touch sub-electrode 202 and the first touch sub-electrode 201 are located in the second conductive layer 23, and the second conductive layer 23 adopts a double-layer conductive layer design. In other words, the second main body 2302 of the second touch sub-electrode 202 and the first touch sub-electrode 201 adopt a double-layer design, so that the square resistance of the second main body 2302 of the second touch sub-electrode 202 and the first touch sub-electrode 201 can be reduced.

[0098] Since the second main body 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 occupy a relatively high proportion of the entire touch electrode (for example, the area accounts for more than 80%), reducing the square resistance of the second main body 2302 of the second sub-touch electrode 202 and the first sub-touch electrode 201 can greatly improve the signal transmission rate of the touch electrode, thereby improving the touch sensitivity of the display substrate.

[0099] For example, refer to Figure 4 , the orthographic projection of the first conductive portion 2311 on the base substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the base substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1.

[0100] Through such a design, the thickness of the second conductive layer 23 can be increased and the square resistance of the second conductive layer 23 can be reduced. At the same time, the alignment design of the double-layer conductive layer can be facilitated to avoid short circuits or uneven film thickness, which is beneficial to improving the reliability and touch effect of the display substrate.

[0101] For example, refer to Figure 5 , the first sub-conductive layer 231 is located on the side of the first insulating layer 22 away from the base substrate 1. The second sub-conductive layer 232 is located on the side of the first sub-conductive layer 231 away from the base substrate 1. In other words, the orthographic projection of the second sub-conductive layer 232 located on the upper layer of the second conductive layer 23 on the base substrate can cover the orthographic projection of the first sub-conductive layer 231 located on the lower layer on the base substrate, thereby ensuring that the second conductive portion 2321 located on the upper layer can wrap or semi-wrap the first conductive portion 2311 located on the lower layer electrically connected thereto.

[0102] Through such a design, during the process of patterning the upper second sub-conductive layer 232, the damage to the film layer of the lower first sub-conductive layer 231 caused by the etching process can be minimized as much as possible, which is beneficial to improving the overall film layer quality of the second conductive layer 23 and reducing the square resistance of the second conductive layer 23, thereby improving the touch sensitivity of the display substrate and enhancing the touch effect of the display substrate.

[0103] Exemplarily, the material of the first sub-conductive layer 231 may include indium tin oxide (ITO). And / or, the material of the second sub-conductive layer 232 may include indium tin oxide (ITO). The first sub-conductive layer 231 and the second sub-conductive layer 232 may form a grid-shaped touch electrode.

[0104] Exemplarily, the transmittance of the second conductive layer 23 to visible light is greater than or equal to 90%. For example, the transmittance of the second conductive layer 23 to visible light is approximately equal to 91.94%.

[0105] The second conductive layer adopts a double-layer ITO design, which can reduce the square resistance of the touch electrode and improve the touch sensitivity of the display substrate on the one hand, and ensure that most areas of the grid-shaped touch electrode have high transparency on the other hand, avoiding the occurrence of moiré patterns, which is beneficial to improving the picture quality of the display substrate.

[0106] In the related art, the second conductive layer is formed by a single ITO sputtering process. Due to process limitations, the thickness of the ITO formed in a single film does not exceed 1500 angstroms, and the lowest square resistance of ITO can be 15Ω / □. The square resistance of the ITO formed in a single film is large, resulting in a low signal transmission rate of the touch layer, which cannot meet the requirements of the display device for touch sensitivity and active pen.

[0107] In some embodiments of the present disclosure, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be formed in two sputtering coating processes respectively, thereby overcoming the defect of thin ITO thickness prepared by single sputtering coating.

[0108] Exemplarily, the first sub-conductive layer 231 has a first thickness h1 in the third direction Z, and the second sub-conductive layer 232 has a second thickness h2 in the third direction Z. The first thickness h1 may be equal to or unequal to the second thickness h2. The third direction Z is the light emitting direction of the display substrate. Alternatively, the third direction Z is perpendicular to the light emitting surface of the display substrate.

[0109] Exemplarily, the sum of the first thickness h1 and the second thickness h2 is in the range of 1500 angstroms to 3000 angstroms. The sheet resistance of the second conductive layer 23 is in the range of 7Ω / □ to 11Ω / □.

[0110] It should be noted that the "first thickness" in the embodiments of the present disclosure refers to the maximum thickness of the first sub-conductive layer in the overlapping area of ​​the first sub-conductive layer and the second sub-conductive layer, and the "second thickness" refers to the maximum thickness of the second sub-conductive layer in the overlapping area of ​​the first sub-conductive layer and the second sub-conductive layer.

[0111] It should also be noted that the sheet resistance of the second conductive layer here refers to the sheet resistance of the second conductive layer in the overlapping area of ​​the first sub-conductive layer and the second sub-conductive layer.

[0112] Compared with the single-layer ITO used in the second conductive layer in the related art, the second conductive layer in the display substrate of the embodiment of the present disclosure adopts a double-layer ITO design, which can reduce the square resistance by 27%-54%, and can greatly improve the signal transmission rate in the touch electrode, thereby improving the touch sensitivity of the display substrate and meeting the requirements of the active pen.

[0113] For example, continue to refer to Figure 5 , two adjacent first conductive portions 2311 among the plurality of first conductive portions 2311 are spaced at a minimum distance of a first spacing distance d1 in the horizontal direction (e.g., the second direction Y). Two adjacent second conductive portions 2321 among the plurality of second conductive portions 2321 are spaced at a minimum distance of a second spacing distance d2 in the horizontal direction (e.g., the second direction Y). The horizontal direction is parallel to the light emitting surface of the display substrate. For example, the horizontal direction may be a direction parallel to the first direction X or the second direction Y, or may be another direction that forms a certain angle with the first direction X or the second direction Y.

[0114] For example, the first spacing distance d1 is greater than the second spacing distance d2. For example, the first spacing distance d1 may be approximately equal to 40 microns, for example, the first spacing distance d1 is in the range of 38 microns to 42 microns. The second spacing distance d2 may be approximately equal to 30 microns. For example, the second spacing distance d2 is in the range of 28 microns to 32 microns.

[0115] In some embodiments, the first sub-conductive layer 231 and the second sub-conductive layer 232 can be prepared using the same mask. For example, during the patterning process of the first sub-conductive layer 231, a mask needs to be used in combination with a yellow light process and an etching process to form a first sub-conductive layer 231 including a plurality of first conductive portions 2311. During the patterning process of the second sub-conductive layer 232, a mask needs to be used in combination with a yellow light process and an etching process to form a second sub-conductive layer 232 including a plurality of second conductive portions 2321. The first sub-conductive layer 231 and the second sub-conductive layer 232 can use the same mask, and by changing the exposure amount in the yellow light process, the critical dimensions in the first sub-conductive layer 231 and the second sub-conductive layer 232 are adjusted, so that the first spacing distance d1 is greater than the second spacing distance d2. It should be noted that the "critical dimension" here refers to the minimum spacing distance among multiple components or structures located in the same layer.

[0116] For example, during the patterning process of the first sub-conductive layer 231, a UV light with a larger exposure amount can be used to irradiate the photoresist, so that after development, the area of ​​the photoresist removed will be larger, which can make the area of ​​ITO etched by the etching liquid in the subsequent etching process larger, thereby increasing the minimum spacing distance between two adjacent first conductive parts 2311 in the first sub-conductive layer 231, for example, controlling the first spacing distance d1 to be approximately equal to 40 microns. For another example, during the patterning process of the second sub-conductive layer 232, a UV light with a smaller exposure amount can be used to irradiate the photoresist, so that after development, the area of ​​the photoresist removed will be smaller, which can make the area of ​​ITO etched by the etching liquid in the subsequent etching process smaller, thereby making the minimum spacing distance between two adjacent second conductive parts 2321 in the second sub-conductive layer 232 relatively small, for example, controlling the second spacing distance d2 to be approximately equal to 30 microns.

[0117] Through such a design, patterning of the first sub-conductive layer 231 and the second sub-conductive layer 232 in two different sizes can be achieved without adding a mask, which is beneficial to reducing costs.

[0118] Exemplarily, the difference between the first spacing distance d1 and the second spacing distance d2 is in the range of 6 micrometers to 14 micrometers. For example, the first spacing distance d1 is in the range of 38 micrometers to 42 micrometers, and the second spacing distance d2 is in the range of 28 micrometers to 32 micrometers.

[0119] Through such a design, it can be ensured that there is a sufficient spacing distance between adjacent first conductive parts 2311 and / or adjacent second conductive parts 2321, thereby avoiding defects such as short circuits caused by insufficient alignment accuracy.

[0120] Exemplarily, the first conductive layer 21 may include a plurality of bridge portions 210 , and at least a portion of the first conductive portions 2311 among the plurality of first conductive portions is electrically connected to the bridge portion 210 .

[0121] Exemplarily, the first conductive layer 21 may include a single layer or multiple layers. For example, the first conductive layer 21 may include a single layer of ITO. Alternatively, the first conductive layer 21 may include multiple layers of conductive layers, for example, the first conductive layer 21 may include a multiple layer of conductive layers composed of an aluminum conductive layer and a silver conductive layer.

[0122] Through such a design, parameters such as the material type, film structure and thickness of the first conductive layer can be flexibly adjusted, which is beneficial to improving the conductive performance of the first conductive layer, thereby improving the reliability of the bridge portion in the touch electrode.

[0123] In the related art, the touch layer in the display substrate adopts a patterned design, resulting in gaps between adjacent touch electrodes, and the light path difference reflected from the touch electrodes and the gaps to the human eye is different, which easily causes color difference, making the pattern of the touch electrodes easily perceived by the human eye, affecting the clarity of the display image.

[0124] In some embodiments of the present disclosure, the propagation path of light in the touch electrode and the gap area can be changed by adjusting the refractive index of a portion of the film layer adjacent to ITO, so that the pattern of the touch electrode is not easily perceived by the human eye, thereby achieving a shadow elimination effect of the touch electrode.

[0125] Exemplarily, the first conductive layer 21 has a first refractive index, and the first insulating layer 22 has a second refractive index, and the first refractive index is less than the second refractive index. For example, the material of the first conductive layer 21 may include ITO, a metal or a metal alloy (for example, aluminum, silver or magnesium-silver alloy). The first refractive index is less than or equal to 2.1. The material of the first insulating layer 22 may include an insulating material with a high refractive index, for example, the material of the first insulating layer 22 may include titanium dioxide. The second refractive index is greater than or equal to 2.1. For example, the second refractive index is approximately equal to 2.5.

[0126] Exemplarily, the second conductive layer 23 has a third refractive index, which is less than the second refractive index. For example, the material of the second conductive layer 23 may include ITO. For example, the third refractive index is in the range of 1.8 to 2.1.

[0127] For example, Table 1 shows the optical test comparison data of two different OGS touch screens. Among them, the OGS1 touch screen is a touch screen in which the first conductive layer 21 and the second conductive layer 23 in the touch layer are both designed with single-layer ITO. The OGS2 touch screen is a touch screen in which the first conductive layer 21 is designed with single-layer ITO and the second conductive layer 23 is designed with double-layer ITO, wherein a first insulating layer 22 with a high refractive index is used between the first conductive layer 21 and the second conductive layer 23.

[0128] Table 1 Optical test comparison of two different OGS touch screens

[0129]

[0130] It should be noted that "Li" in Table 1 represents the result rating of the optical test, and the smaller the number i after "L" (for example, 2, 2.5 and 3), the better the shadow elimination effect. "Pattern" refers to the area with a conductive structure other than the bridge portion in the touch layer, and "bridge point" refers to the area where the bridge portion is located in the touch layer. "Dark state shadow elimination" refers to the shadow elimination effect when the display screen is off, and "bright state shadow elimination" refers to the shadow elimination effect when the display screen is on. By comparing the two display screens, OGS1 and OGS2, it can be seen that in the off state, the shadow elimination effect at the bridge point of the OGS2 display screen is better than the shadow elimination effect at the bridge point of the OGS1 display screen.

[0131] In the bridging area (the area near the bridging portion 210), a reflection interface will be generated between the bridging portion 210 and the first insulating portion 221 with different refractive indices, and between the first insulating portion 221 and the first conductive portion 2311 and / or the second conductive portion 2321 with different refractive indices. External incident light will generate reflected light at each reflection interface. The reflected light at different interfaces will interfere when incident into the human eye, causing the reflected light of different vectors to superimpose and cancel each other, thereby making the optical path difference of the reflected light in the bridging area and other areas tend to be consistent, making the color difference between the bridging area and other areas smaller, thereby improving the blanking level of the bridge point and improving the display effect of the display substrate. The "bridge point" here refers to the bridging portion in the touch electrode.

[0132] For example, continue to refer to Figure 5 The display substrate 100 may further include: a first shadow removal layer IM1 located between the first conductive layer 21 and the base substrate 1 , and a second shadow removal layer IM2 located on a side of the second conductive layer 23 away from the base substrate 1 .

[0133] Exemplarily, the refractive index of the touch electrode may be greater than the refractive index of the first image elimination layer IM1 , and / or the refractive index of the touch electrode may be greater than the refractive index of the second image elimination layer IM2 .

[0134] By setting more reflective interfaces, reflected light is generated at more interfaces, thereby achieving a greater degree of coherent cancellation of reflected light, and thus better reducing the chromatic aberration of reflected light from the touch electrode (e.g., the first sub-touch electrode 201 and the second sub-touch electrode 202) and other areas outside the touch electrode (e.g., the gap area between the first sub-touch electrode 201 and the second sub-touch electrode 202), and better achieving the cancellation of the pattern of the touch electrode, that is, making the pattern of the first sub-touch electrode 201 and the second sub-touch electrode 202 less likely to be perceived by the human eye. It should be noted that chromatic aberration is a dispersion phenomenon caused by the optical path difference of different lights, and the smaller the optical path difference, the smaller the chromatic aberration.

[0135] For example, in conjunction with reference Figure 1 , Figure 4 and Figure 5 , the first touch sub-electrode 201 and the second touch sub-electrode 202 in the display substrate 100 can be isolated by an insulating layer. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, and at least part of the first insulating portions 221 are arranged corresponding to at least part of the bridge portion 210, so that the first touch sub-electrode 201 and the second touch sub-electrode 202 are isolated at the intersection.

[0136] For example, continue to refer to Figure 4 , an orthographic projection of the first insulating portion 221 on the substrate at least partially overlaps with an orthographic projection of the corresponding bridge portion 210 on the substrate.

[0137] Exemplarily, the width d4 of the first insulating portion 221 in the first direction X is greater than the width d3 of the corresponding bridge portion 210 in the first direction X. The width d5 ​​of the first insulating portion 221 in the second direction Y is less than the width d6 of the corresponding bridge portion 210 in the second direction Y, and the first direction X and the second direction Y are parallel to the horizontal direction, and the first direction X and the second direction Y intersect.

[0138] For example, in conjunction with reference Figure 4 and Figure 5 , a width d5 ​​of the first insulating portion 221 in the second direction Y is greater than the first spacing distance d1. A width d6 of the bridge portion 210 in the second direction Y is greater than the first spacing distance d1.

[0139] This design can better electrically connect the bridge portion 210 to the second main body portion 2302 of the second touch sub-electrode 202, while preventing the bridge portion 210 from short-circuiting with the first touch sub-electrode 201, thereby ensuring better insulation between the first touch sub-electrode 201 and the second touch sub-electrode 202 at the intersection.

[0140] For example, in some embodiments of the present disclosure, the display substrate may include a black matrix layer BM between the first image elimination layer IM1 and the base substrate 1 , and the black matrix layer BM may reduce light crosstalk between adjacent pixels and improve the display effect of the display substrate.

[0141] Exemplarily, the display substrate may include a first protective layer OC located on a side of the second image elimination layer IM2 away from the base substrate 1. For example, the first protective layer OC may include an optical adhesive layer to protect the touch layer thereunder.

[0142] In some embodiments of the present disclosure, when the second conductive layer 23 adopts a double-layer conductive layer design, it may not only include a situation where the projection area of ​​the upper conductive layer (for example, the second sub-conductive layer 232) is larger than the projection area of ​​the lower conductive layer (for example, the first sub-conductive layer 231), but may also include a situation where the projection area of ​​the upper conductive layer (for example, the first sub-conductive layer 231) is smaller than the projection area of ​​the lower conductive layer (for example, the second sub-conductive layer 232).

[0143] Figure 6 is a partial cross-sectional schematic diagram of a display substrate according to an embodiment of the present disclosure.

[0144] For example, in some embodiments of the present disclosure, referring to Figure 6 , the touch layer 2 may include: a first conductive layer 21 disposed on the base substrate 1; a first insulating layer 22 disposed on the side of the first conductive layer 21 away from the base substrate; and a second conductive layer 23 disposed on the side of the first insulating layer 22 away from the base substrate. The second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacking structure, which can increase the thickness of the second conductive layer 23 and reduce the square resistance of the second conductive layer 23.

[0145] Exemplarily, the second sub-conductive layer 232 is located on a side of the first insulating layer 22 away from the base substrate 1. The first sub-conductive layer 231 is located on a side of the second sub-conductive layer 232 away from the base substrate 1. The orthographic projection of the first conductive portion 2311 on the base substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the base substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1.

[0146] Through such a design, the thickness of the second conductive layer 23 can be increased and the square resistance of the second conductive layer 23 can be reduced. At the same time, the alignment design of the double-layer conductive layer is more convenient to avoid short circuits or uneven film thickness, which is beneficial to improving the reliability and touch effect of the display substrate. Fig. 7A is a partial plan view of a display substrate according to an embodiment of the present disclosure, Figure 7B yes Fig. 7A Schematic diagram of a local cross section of the S1 region. Figure 7C yes Fig. 7A Schematic diagram of a local cross section of the S2 region.

[0147] For example, in some embodiments of the present disclosure, in combination with reference Figure 7A-7C , the orthographic projection of the first conductive portion 2311 on the base substrate 1 falls within the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the base substrate 1 does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1. The second conductive portion 2321 is located on the side of the first conductive portion 2311 away from the base substrate.

[0148] Exemplarily, at least one first conductive portion 2311 includes a first surface ml near the substrate 1 and a first side m2 adjacent to the first surface ml, and a first slope angle α1 is provided between the first surface ml and the first side m2. At least one second conductive portion 2321 includes a second surface m3 near the substrate 1 and a second side m4 adjacent to the second surface m3, and a second slope angle α2 is provided between the second surface m3 and the second side m4. Exemplarily, the first slope angle α1 is less than the second slope angle α2. For example, the first slope angle α1 may be approximately equal to 9.39°, and the second slope angle α2 may be approximately equal to 10.51°.

[0149] Through such a design, the first slope angle α1 of the edge area of ​​the first conductive part 2311 located in the lower layer can be made smaller, so that the film layer of the second conductive part 2321 located above the first conductive part 2311 in the edge area of ​​the first conductive part 2311 can have a smoother transition, which is beneficial to improving the film layer quality of the second conductive part 2321, thereby improving the overall film layer quality of the second conductive layer 23, and further improving the reliability and touch effect of the display substrate.

[0150] Figure 8 is based on Figure 1 A schematic plan view of a partial enlargement of the S0 region.

[0151] For example, in some embodiments of the present disclosure, in combination with reference Figure 1 , Figure 5 and Figure 8, the display substrate 100 may include a third conductive layer 24 located on a side of the second conductive layer 23 away from the base substrate 1. The third conductive layer 24 may include a plurality of touch traces 241. At least a portion of the first sub-touch electrode 201 and the second sub-touch electrode 202 is electrically connected to the touch trace 241. For example, the touch trace 241 may include a first portion 2411 located in the touch area TA, and the first portion 2411 of the touch trace 241 may overlap with at least a portion of the first sub-touch electrode 201 and / or the second sub-touch electrode 202, thereby achieving electrical connection between the touch trace 241 and the first sub-touch electrode 201 and / or the second sub-touch electrode 202. The touch trace 241 may also include a second portion 2412 located in the non-touch area TN. The non-touch area TN may be an edge area surrounding the touch area TA.

[0152] In some embodiments, through the routing design of the second part 2412 of the touch routing 241, one end of the touch routing 241 connected to the grid-shaped touch electrode can be concentrated into a smaller area, which is beneficial to reducing the wiring space occupied by the touch routing and facilitating the electrical connection between the touch routing 241 and the external touch circuit or touch chip.

[0153] Fig.9A is a schematic plan view of a display substrate according to an embodiment of the present disclosure, Fig. 9B is a schematic plan view of a display substrate according to an embodiment of the present disclosure, Fig. 9C yes Fig. 9B Schematic diagram of a local cross section taken along the center line CC'.

[0154] For example, in some embodiments of the present disclosure, referring to Fig.9A , the first sub-touch electrode 201 can be formed into a continuously extending structure by a main body 230 and a bridge portion 210 located in different layers. For example, the main body 230 may include a first main body 2301. The bridge portion 210 may include a first bridge portion 2101. The first sub-touch electrode 201 includes a plurality of first main bodies 2301 and a plurality of first bridge portions 2101. The first bridge portion 2101 is located in the first conductive layer 21, and the first main body 2301 is located in the second conductive layer 23. Two adjacent first main bodies 2301 can be electrically connected through a first bridge portion 2101, thereby realizing the extension design of the first sub-touch electrode 201 along the first direction X.

[0155] Exemplarily, the second sub-touch electrode 202 is located in the second conductive layer 23. The first main body 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both be located in the second conductive layer. The first main body 2301 of the first sub-touch electrode 201 and the second sub-touch electrode 202 may both adopt a double-layer conductive layer design, thereby reducing the square resistance of the touch electrode and improving the touch sensitivity of the display substrate.

[0156] Through such a design, the touch electrodes can be arranged more flexibly, ensuring that most of the touch electrodes adopt a double-layer conductive layer design, which can ensure that the square resistance of most areas of the touch electrodes is small, thereby improving the overall conductivity of the touch electrodes and improving the touch sensitivity of the display substrate.

[0157] In some embodiments, refer back to Figure 1 , a touch wiring 241 can be electrically connected to a first sub-touch electrode 201 or a second sub-touch electrode 202 .

[0158] In some embodiments, continue to refer to Fig.9A , one touch line 241 can be electrically connected to a plurality of first sub-touch electrodes 201 or a plurality of second sub-touch electrodes 202. For example, one touch line 241 can be electrically connected to two first sub-touch electrodes 201. With such a design, the number of touch lines can be reduced, the wiring space can be saved, and it is conducive to realizing a narrow frame of the display substrate.

[0159] In the embodiments of the present disclosure, the touch layer may adopt a bridge portion design, and one of the conductive layers in the touch layer (eg, the second conductive layer) may adopt a double-layer ITO design.

[0160] In some other embodiments, the touch layer may not adopt a bridge portion design. Fig. 9B and Fig. 9C , the touch layer 2 may include a first conductive layer 21 and a second conductive layer 23, the first sub-touch electrode 201 is located in the first conductive layer 21, and the second sub-touch electrode 202 is located in the second conductive layer 23. Alternatively, the first sub-touch electrode 201 is located in the second conductive layer 23, and the second sub-touch electrode 202 is located in the first conductive layer 21. The first sub-touch electrodes 201 and the second sub-touch electrodes 202 form a grid-like touch electrode pattern.

[0161] For example, at least one conductive layer in the touch layer that does not adopt the bridge portion design may adopt a double-layer ITO design. For example, one of the first conductive layer 21 and the second conductive layer 23 adopts a double-layer ITO design, or both of the first conductive layer 21 and the second conductive layer 23 adopt a double-layer ITO design. Fig. 9C , the second conductive layer 23 includes a first sub-conductive layer 231 and a second sub-conductive layer 232. The first sub-conductive layer 231 may include a plurality of first conductive portions 2311, and the second sub-conductive layer 232 may include a plurality of second conductive portions 2321. The plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence, thereby forming a double-layer stacking structure, increasing the thickness of the second conductive layer 23, and reducing the square resistance of the second conductive layer 23.

[0162] It should be noted that in the embodiment where the touch layer does not adopt the bridge portion design, there is no restriction on the upper and lower relationship between the first conductive layer and the second conductive layer. For example, the first conductive layer 21 can be located on the side of the second conductive layer 23 close to the base substrate 1. Alternatively, the first conductive layer 21 can be located on the side of the second conductive layer 23 away from the base substrate 1.

[0163] Through such a design, the square resistance of at least one of the first sub-touch electrode and the second sub-touch electrode can be reduced, thereby improving the overall touch sensitivity of the touch structure.

[0164] Fig.10 is a structural block diagram of a display device according to an embodiment of the present disclosure.

[0165] Optionally, an embodiment of the present disclosure further provides a display device, referring to Fig.10 The display device 200 may include the display substrate 100. The display device may include but is not limited to: electronic paper, mobile phones, tablet computers, monitors, laptop computers, digital photo frames, navigators, and any other products or components with display functions. It should be understood that the display device has the same beneficial effects as the display substrate provided in the above embodiments.

[0166] Fig.11 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure; Fig.12 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure, Fig.13 is a partial flow chart of a method for preparing a display substrate according to an embodiment of the present disclosure, Figures 14A-14J They are respectively partial cross-sectional schematic diagrams of a display substrate according to an embodiment of the present disclosure.

[0167] Illustratively, in an embodiment of the present disclosure, a method for preparing a display substrate is further provided. The method for preparing a display substrate may include the following steps S01-S04.

[0168] In step S01, refer to Fig.14A , providing a base substrate 1. For example, the base substrate 1 may include an encapsulation film or an encapsulation cover glass of a display substrate.

[0169] In step S02, refer to Fig.14D A first conductive material layer is formed on the base substrate 1 , and a patterning process is performed on the first conductive material layer to form a first conductive layer 21 . For example, the first conductive layer 21 may include a plurality of bridge portions 210 .

[0170] In some embodiments, in conjunction with reference Fig. 14B and Fig. 14CThe preparation method further includes: before forming the first conductive layer 21 , forming a black matrix layer BM and a first image elimination layer IM1 located on a side of the black matrix layer BM away from the base substrate 1 .

[0171] In step S03, refer to Fig.14E A first insulating material layer is formed on a side of the first conductive layer 21 away from the base substrate 1, and a patterning process is performed on the first insulating material layer to form a first insulating layer 22. For example, the first insulating layer 22 may include a plurality of first insulating portions 221, and the orthographic projections of at least some of the first insulating portions 221 on the base substrate overlap with the orthographic projections of the bridge portion 210 on the base substrate.

[0172] In step S04, combined with reference Fig.14F and Figure 14G A second conductive material layer is formed on a side of the first insulating layer 22 away from the base substrate 1, and a patterning process is performed on the second conductive material layer to form a second conductive layer 23. The second conductive layer 23 may include a first sub-conductive layer 231 and a second sub-conductive layer 232, the first sub-conductive layer 231 includes a plurality of first conductive portions 2311, the second sub-conductive layer 232 includes a plurality of second conductive portions 2321, and the plurality of first conductive portions 2311 and the plurality of second conductive portions 2321 are electrically connected in a one-to-one correspondence.

[0173] In some embodiments, by adjusting the process parameters of the patterning process of the first sub-conductive layer 231 and the second sub-conductive layer 232, for example, adjusting the yellow light process parameters, the orthographic projection of the first conductive portion 2311 on the base substrate 1 can be made to fall within the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1. The edge of the orthographic projection of the first conductive portion 2311 on the base substrate does not overlap with the edge of the orthographic projection of the corresponding second conductive portion 2321 on the base substrate 1.

[0174] Exemplarily, forming the second conductive layer in step S04 may specifically include the following steps S041-S042.

[0175] Exemplarily, in step S041, referring to Fig.14F A first sub-conductive material layer is formed on a side of the first insulating layer 22 away from the base substrate 1 , and a patterning process is performed on the first sub-conductive material layer to form a first sub-conductive layer 231 .

[0176] Exemplarily, in step S042, referring to Figure 14G, a second sub-conductive material layer is formed on a side of the first sub-conductive layer 231 away from the base substrate 1, and a composition process is performed on the second sub-conductive material layer to form a second sub-conductive layer 232. The first sub-conductive layer 231 includes a plurality of first conductive portions 2311, and the second sub-conductive layer 232 includes a plurality of second conductive portions 2321. Two adjacent first conductive portions 2311 in the plurality of first conductive portions 2311 are spaced at least by a first spacing distance d1 in the horizontal direction, and two adjacent second conductive portions 2321 in the plurality of second conductive portions 2321 are spaced at least by a second spacing distance d2 in the horizontal direction. The first spacing distance d1 is greater than the second spacing distance d2, and the horizontal direction is parallel to the light exit surface of the display substrate.

[0177] For example, the material of the first sub-conductive layer 231 may include ITO. The material of the second sub-conductive layer 232 may include ITO.

[0178] By adopting a double-layer ITO design, on the one hand, the square resistance of the touch electrode can be reduced and the touch sensitivity of the display substrate can be improved. On the other hand, the transparency of most areas in the grid-shaped touch electrode can be ensured to be high, which can avoid the occurrence of moiré patterns and is beneficial to improving the display effect of the display substrate.

[0179] Exemplarily, the patterning process for forming the first sub-conductive layer 231 and the patterning process for forming the second sub-conductive layer 232 can share the same mask. By adjusting the yellow light process parameters in the patterning process, such as changing the exposure amount in the yellow light process, the same mask can be used to form a film layer with two different shapes. For example, the yellow light process in the patterning process for forming the first sub-conductive layer 231 includes forming a pattern using irradiation light of a first exposure amount. The yellow light process in the patterning process for forming the second sub-conductive layer 232 includes forming a pattern using irradiation light of a second exposure amount. Exemplarily, the first exposure amount is greater than the second exposure amount, so that the first spacing distance d1 in the first sub-conductive layer 231 can be greater than the second spacing distance d2 in the second sub-conductive layer 232. By such a method, masks can be saved, which is conducive to reducing costs.

[0180] Exemplarily, the method for preparing a display substrate may further include: after forming the second conductive layer 23 , continuing to perform the following steps S05 - S07 .

[0181] In step S05, refer to Fig.14H A third conductive material layer is formed on a side of the second conductive layer 23 away from the base substrate 1 , and a patterning process is performed on the third conductive material layer to form a third conductive layer 24 . Exemplarily, the touch control trace 241 may be located in the third conductive layer 24 .

[0182] In step S06, refer to Fig.14I, a second shadow elimination layer IM2 is formed on the side of the third conductive layer 24 away from the base substrate 1. Exemplarily, the first shadow elimination layer IM1 and the second shadow elimination layer IM2 can be respectively located on the upper and lower sides of the touch electrode to wrap the touch electrode, so that the optical path difference of different areas can be adjusted by using the interface between the multiple layers, so that the pattern of the touch electrode is not easily observed by the naked eye.

[0183] In step S07, refer to Fig.14J A first protective layer OC is formed on a side of the second image elimination layer IM2 away from the base substrate 1. For example, the first protective layer OC may include an optical adhesive layer, which may protect the touch layer below.

[0184] Although some embodiments of the present general inventive concept have been shown and described, it will be appreciated by those skilled in the art that changes may be made to these embodiments without departing from the principles and spirit of the present general inventive concept, the scope of which is defined by the claims and their equivalents.

Claims

1. A display substrate, characterized in that: include: A base substrate and a touch layer located on the base substrate, The touch layer includes a second conductive layer, the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one, wherein the orthographic projection of the first conductive portion on the base substrate falls within the orthographic projection of the corresponding second conductive portion on the base substrate; and An edge of an orthographic projection of the first conductive portion on the base substrate does not overlap with an edge of an orthographic projection of the corresponding second conductive portion on the base substrate.

2. The display substrate according to claim 1, wherein: The touch control layer further includes a first conductive layer and a first insulating layer, wherein the first insulating layer is located between the first conductive layer and the second conductive layer.

3. The display substrate according to claim 2, wherein: The first conductive layer is located on a side of the second conductive layer close to the base substrate.

4. The display substrate according to claim 3, wherein: The first sub-conductive layer is located on a side of the first insulating layer away from the base substrate, and the second sub-conductive layer is located on a side of the first sub-conductive layer away from the base substrate.

5. The display substrate according to claim 3, wherein: The second sub-conductive layer is located on a side of the first insulating layer away from the base substrate, and the first sub-conductive layer is located on a side of the second sub-conductive layer away from the base substrate.

6. The display substrate according to any one of claims 3 to 5, wherein: Two adjacent first conductive portions among the plurality of first conductive portions are spaced apart by a first spacing distance at a minimum in the horizontal direction, and two adjacent second conductive portions among the plurality of second conductive portions are spaced apart by a second spacing distance at a minimum in the horizontal direction, the first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light emitting surface of the display substrate.

7. The display substrate according to claim 6, wherein: At least one of the first conductive parts includes a first surface close to the substrate and a first side surface adjacent to the first surface, and a first slope angle is formed between the first surface and the first side surface; At least one of the second conductive parts includes a second surface close to the substrate and a second side surface adjacent to the second surface, and a second slope angle is formed between the second surface and the second side surface; and The first slope angle is smaller than the second slope angle.

8. The display substrate according to claim 6, wherein: A difference between the first spacing distance and the second spacing distance is in a range of 6 micrometers to 14 micrometers.

9. The display substrate according to any one of claims 3 to 8, wherein: The first conductive layer has a first refractive index, the first insulating layer has a second refractive index, and the first refractive index is smaller than the second refractive index; and / or, The second conductive layer has a third refractive index that is lower than the second refractive index.

10. The display substrate according to any one of claims 1 to 9, wherein: The first sub-conductive layer has a first thickness in a third direction, the second sub-conductive layer has a second thickness in the third direction, the sum of the first thickness and the second thickness is in the range of 1500 angstroms to 3000 angstroms, and the third direction is perpendicular to the light emitting surface of the display substrate.

11. The display substrate according to claim 1, wherein: The material of the first sub-conductive layer includes indium tin oxide; and / or the material of the second sub-conductive layer includes indium tin oxide.

12. The display substrate according to claim 1, wherein: The sheet resistance of the second conductive layer is in the range of 7Ω / □ to 11Ω / □.

13. The display substrate according to any one of claims 6 to 12, wherein: The first conductive layer includes a plurality of bridge portions, and at least a portion of the plurality of first conductive portions is electrically connected to the bridge portion.

14. The display substrate according to claim 13, wherein: The first insulating layer includes a plurality of first insulating portions, at least some of the first insulating portions are arranged corresponding to at least some of the bridging portions, The orthographic projection of the first insulating portion on the substrate at least partially overlaps with the orthographic projection of the corresponding bridge portion on the substrate; as well as The width of the first insulating portion in the first direction is greater than the width of the corresponding bridge portion in the first direction; And the width of the first insulating portion in the second direction is smaller than the width of the corresponding bridge portion in the second direction, the first direction and the second direction are parallel to the horizontal direction, and the first direction and the second direction intersect.

15. The display substrate according to claim 14, wherein: The width of the first insulating portion in the second direction is greater than the first spacing distance.

16. The display substrate according to any one of claims 3 to 15, wherein: The first conductive layer includes a single layer or multiple conductive layers; and / or, The material of the first conductive layer includes indium tin oxide, metal or metal alloy.

17. The display substrate according to claim 1, wherein: The touch layer includes a touch electrode, and the touch electrode includes a plurality of first sub-touch electrodes and a plurality of second sub-touch electrodes, the plurality of first sub-touch electrodes extend along a first direction and are spaced apart along a second direction, the plurality of second sub-touch electrodes extend along a second direction and are spaced apart along the first direction, and the first direction and the second direction intersect; the first sub-touch electrodes and the second sub-touch electrodes are insulated from each other; at least one of the first sub-touch electrodes and the second sub-touch electrodes includes a plurality of main bodies and a plurality of bridging parts, the plurality of main bodies are located in the second conductive layer, the plurality of bridging parts are located in the first conductive layer, and two adjacent main bodies are electrically connected via one bridging part.

18. A display device, characterized in that: Comprising the display substrate as described in any one of claims 1-17.

19. A method for preparing a display substrate, characterized in that: include: providing a substrate base plate; Forming a first conductive material layer on the base substrate, and performing a patterning process on the first conductive material layer to form a first conductive layer; forming a first insulating material layer on a side of the first conductive layer away from the base substrate, and performing a patterning process on the first insulating material layer to form a first insulating layer; as well as A second conductive material layer is formed on a side of the first insulating layer away from the base substrate, and a patterning process is performed on the second conductive material layer to form a second conductive layer, wherein the second conductive layer includes a first sub-conductive layer and a second sub-conductive layer, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, and the plurality of first conductive parts and the plurality of second conductive parts are electrically connected one by one. wherein the orthographic projection of the first conductive portion on the base substrate falls within the orthographic projection of the corresponding second conductive portion on the base substrate; and An edge of an orthographic projection of the first conductive portion on the base substrate does not overlap with an edge of an orthographic projection of the corresponding second conductive portion on the base substrate.

20. The method according to claim 18, wherein: The forming of the second conductive layer comprises: forming a first sub-conductive material layer on a side of the first insulating layer away from the base substrate, and performing a patterning process on the first sub-conductive material layer to form a first sub-conductive layer; and forming a second sub-conductive material layer on a side of the first sub-conductive layer away from the base substrate, and performing a patterning process on the second sub-conductive material layer to form a second sub-conductive layer, Among them, the first sub-conductive layer includes a plurality of first conductive parts, the second sub-conductive layer includes a plurality of second conductive parts, two adjacent first conductive parts among the plurality of first conductive parts are spaced apart by a first spacing distance at a minimum in the horizontal direction, and two adjacent second conductive parts among the plurality of second conductive parts are spaced apart by a second spacing distance at a minimum in the horizontal direction, the first spacing distance is greater than the second spacing distance, and the horizontal direction is parallel to the light emitting surface of the display substrate.

21. The method according to claim 20, wherein: A composition process for forming the first sub-conductive layer and a composition process for forming the second sub-conductive layer share the same mask; as well as The yellow light process in the composition process of forming the first sub-conductive layer includes forming a pattern using irradiation light of a first exposure amount, and the yellow light process in the composition process of forming the second sub-conductive layer includes forming a pattern using irradiation light of a second exposure amount, and the first exposure amount is greater than the second exposure amount.

Images