Display substrate and display device

Abstract

The invention discloses a display substrate and a display device. The display substrate comprises a substrate body, a plurality of circles of isolation columns and an inorganic layer, wherein the isolation columns and the inorganic layer are located on the substrate body. The multiple circles of isolation columns are located in a non-hole area on the substrate and surround the hole area. The isolation column at least comprises a first isolation layer and a second isolation layer which are arranged in a stacked mode, the second isolation layer is located on the side, away from the substrate, of the first isolation layer, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the first isolation layer and the second isolation layer are both made of conductive materials; the inorganic layer wraps the side surfaces of the first isolation layer and the second isolation layer of at least one circle of isolation column. According to the invention, the electrical connection between the isolation layer in the isolation column configured to isolate the light-emitting function layer and the film layer in the light-emitting function layer can be prevented, and the etching step under the condition that the inorganic layer is remained in the isolation column can be saved.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to a display substrate and a display device. Background Art

[0002] Organic light-emitting diode (OLED) display products have a wide range of applications due to their advantages such as rich colors, fast response time, and foldability. Organic light-emitting diode display devices include tandem devices, which increase the life and brightness of the light-emitting device and reduce power consumption by arranging a stacked light-emitting layer in the tandem device to meet users' requirements for display device life, power consumption, and good display quality. Summary of the invention

[0003] Embodiments of the present disclosure provide a display substrate and a display device.

[0004] The embodiment of the present disclosure provides a display substrate, comprising: a base substrate, and multiple circles of isolation columns and an inorganic layer located on the base substrate. The base substrate comprises a first area and a second area, the first area surrounds at least part of the second area, the first area comprises a display area, and the second area comprises a hole area and a non-hole area surrounding the hole area; the multiple circles of isolation columns are located in the non-hole area on the base substrate and surround the hole area. The isolation columns at least comprise a first isolation layer and a second isolation layer stacked, the second isolation layer is located on a side of the first isolation layer away from the base substrate, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; the inorganic layer wraps the side surfaces of the first isolation layer and the second isolation layer of at least one circle of isolation columns.

[0005] For example, according to an embodiment of the present disclosure, the display area includes a plurality of sub-pixels, each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode which are stacked, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; the display substrate includes a limiting structure, which is located between adjacent sub-pixels and is configured to separate at least one layer of the light-emitting functional layer; the limiting structure includes an inorganic limiting layer in which the inorganic layer is located between adjacent sub-pixels.

[0006] For example, according to an embodiment of the present disclosure, the display substrate further comprises: an organic layer located between the first electrode and the base substrate. The inorganic limiting layer is in contact with a surface of the organic layer away from the base substrate.

[0007] For example, according to an embodiment of the present disclosure, the display substrate further includes: a pixel defining pattern located on a side of the first electrode away from the base substrate, wherein the pixel defining pattern includes a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, and the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; and the inorganic defining layer is in contact with at least one surface of the pixel defining portion away from the base substrate.

[0008] For example, according to an embodiment of the present disclosure, the display substrate further includes: a pixel defining pattern located on a side of the first electrode away from the base substrate, wherein the pixel defining pattern includes a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, and the plurality of second openings are configured to expose at least a portion of the defining structure.

[0009] For example, according to an embodiment of the present disclosure, the limiting structure also includes at least one first protrusion in the organic layer that contacts the surface of the inorganic limiting layer, and the angle between the side of the first protrusion and the first surface of the organic layer other than the first protrusion and away from the base substrate is 80 to 110 degrees, and the first surface is roughly parallel to the base substrate.

[0010] For example, according to an embodiment of the present disclosure, the defining structure also includes at least one second protrusion in the pixel defining portion that contacts the surface of the inorganic defining layer, and the angle between the side surface of the second protrusion and the second surface of the pixel defining portion other than the second protrusion and away from the base substrate is 80 to 110 degrees, and the second surface is roughly parallel to the base substrate.

[0011] For example, according to an embodiment of the present disclosure, the inorganic layer covers at least a portion of the edge of the first electrode in the sub-pixel.

[0012] For example, according to an embodiment of the present disclosure, along a direction perpendicular to the base substrate, the first electrode and the inorganic layer do not overlap.

[0013] For example, according to an embodiment of the present disclosure, the inorganic layer includes an inorganic covering layer covering a side of the first opening.

[0014] For example, according to an embodiment of the present disclosure, the display substrate further includes: a spacer located on a side of the inorganic layer away from the base substrate, wherein the orthographic projection of the spacer on the base substrate is completely within the orthographic projection of the inorganic layer on the base substrate.

[0015] For example, according to an embodiment of the present disclosure, the display substrate further includes: a spacer located on a side of the first electrode away from the base substrate, wherein the inorganic layer is at least located on a surface of the spacer away from the base substrate.

[0016] For example, according to an embodiment of the present disclosure, each sub-pixel also includes a pixel circuit, which includes a light-emitting control transistor, and the first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and along a direction perpendicular to the base substrate, the inorganic layer and the via do not overlap.

[0017] For example, according to an embodiment of the present disclosure, the first electrode includes a main body portion and a connecting portion connected to each other, the main body portion overlaps with the light-emitting area of ​​the sub-pixel, the connecting portion is electrically connected to the light-emitting control transistor through the via hole, and the inorganic layer covers the edges of the main body portion and the connecting portion.

[0018] For example, according to an embodiment of the present disclosure, the pixel defining portion includes a first covering portion covering a surface of the inorganic defining layer on a side away from the base substrate, and an edge of the inorganic defining layer protrudes relative to an edge of the first covering portion.

[0019] For example, according to an embodiment of the present disclosure, the edge of the inorganic limiting layer protrudes relative to the edge of the first covering portion by a first protrusion dimension, and the edge of the inorganic limiting layer protrudes relative to the edge of the first protrusion by a second protrusion dimension, and the first protrusion dimension is not less than the second protrusion dimension.

[0020] For example, according to an embodiment of the present disclosure, the portion of the inorganic layer covering the edge of the first electrode is a second covering portion, and the orthographic projection of the second covering portion on the base substrate is completely located within the orthographic projection of the pixel defining portion on the base substrate.

[0021] For example, according to an embodiment of the present disclosure, a circle of edges of the first protrusions are all retracted relative to a circle of edges of the inorganic limiting layer.

[0022] For example, according to an embodiment of the present disclosure, the thickness of the pixel defining portion is 0.2 to 0.7 micrometers.

[0023] For example, according to an embodiment of the present disclosure, the height of the first protrusion is greater than the thickness of the first electrode.

[0024] Another embodiment of the present disclosure provides a display substrate, including: a base substrate and a plurality of sub-pixels, a pixel defining pattern, an inorganic layer and an organic layer located on the base substrate. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stacked manner, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; a pixel defining pattern is located on a side of the first electrode away from the base substrate, wherein the pixel defining pattern includes a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, wherein the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; and an organic layer is located between the inorganic layer and the base substrate. The display substrate includes a defining structure, wherein the second opening is configured to expose at least part of the defining structure, wherein the defining structure includes an inorganic defining layer located between adjacent sub-pixels and at least one protrusion in the organic layer in contact with the surface of the inorganic defining layer, wherein the defining structure is configured to cut off at least one layer of the light-emitting functional layer; and the inorganic layer covers the edge of the first electrode in at least part of the sub-pixels.

[0025] For example, according to an embodiment of the present disclosure, each sub-pixel also includes a pixel circuit, which includes a light-emitting control transistor, and the first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and along a direction perpendicular to the base substrate, the inorganic layer and the via do not overlap.

[0026] Another embodiment of the present disclosure provides a display substrate, including: a base substrate and a plurality of sub-pixels, a pixel defining pattern, an inorganic layer and an organic layer located on the base substrate. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stacked manner, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; a pixel defining pattern is located on a side of the first electrode away from the base substrate, wherein the pixel defining pattern includes a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, wherein the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; and an organic layer is located between the inorganic layer and the base substrate. The display substrate includes a defining structure, wherein the second opening is configured to expose at least part of the defining structure, wherein the defining structure includes an inorganic defining layer located between adjacent sub-pixels and at least one protrusion in the organic layer that contacts the surface of the inorganic defining layer, wherein the defining structure is configured to separate at least one layer of the light-emitting functional layer; and along a direction perpendicular to the base substrate, the inorganic layer does not overlap with the first electrode.

[0027] Another embodiment of the present disclosure provides a display substrate, including: a base substrate and a plurality of sub-pixels, a pixel defining pattern and an inorganic layer located on the base substrate. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stacked manner, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; a pixel defining pattern is located on a side of the first electrode away from the base substrate, and the pixel defining pattern includes a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, wherein the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; an inorganic layer is located on a side of the pixel defining portion away from the base substrate. The display substrate includes a defining structure located between adjacent sub-pixels and configured to isolate at least one layer of the light-emitting functional layer; the defining structure includes an inorganic defining layer where the inorganic layer is located between adjacent sub-pixels, and the inorganic defining layer is in contact with at least one surface of the pixel defining portion away from the base substrate.

[0028] For example, according to an embodiment of the present disclosure, the defining structure also includes at least one protrusion in the pixel defining portion that contacts the surface of the inorganic defining layer, and the angle between the side of the protrusion and the surface of the pixel defining portion other than the protrusion that is away from the base substrate is 80 to 110 degrees, and the surface is parallel to the base substrate.

[0029] For example, according to an embodiment of the present disclosure, along a direction perpendicular to the base substrate, the first electrode and the inorganic layer do not overlap.

[0030] For example, according to an embodiment of the present disclosure, the inorganic layer includes an inorganic covering layer covering a side of the first opening.

[0031] For example, according to an embodiment of the present disclosure, the display substrate further includes: a spacer located on a side of the first electrode away from the base substrate. The inorganic layer is at least located on a surface of the spacer away from the base substrate.

[0032] Another embodiment of the present disclosure provides a display device, comprising the display substrate provided by any of the above embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0034] Figure 1 It is a schematic diagram of a partial cross-sectional structure of a display substrate.

[0035] Figure 2A schematic plan view of a display substrate provided in an embodiment of the present disclosure.

[0036] Figure 3 For along Figure 2 A schematic diagram of the local cross-sectional structure taken along line BB' is shown.

[0037] Figure 4 It is a schematic diagram of the local cross-sectional structure of a part of the first zone.

[0038] Figure 5 for Figure 2 A schematic plan view of a local area of ​​a display region in a display substrate is shown.

[0039] Figure 6 for Figure 5 Magnified view of the local area shown.

[0040] Figure 7 A schematic diagram of the positional relationship between a first electrode and an inorganic layer is provided according to another example of an embodiment of the present disclosure.

[0041] Figure 8 For along Figure 7 The schematic diagram of the local cross-section structure taken along line DD' is shown.

[0042] Fig. 9 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0043] Fig.10 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0044] Fig.11 for Fig.10 The diagram shown is a schematic diagram of the local planar structure of the display substrate.

[0045] Fig.12 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0046] Fig.13 for Fig.12 The diagram shown is a schematic diagram of the local planar structure of the display substrate.

[0047] Fig.14 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0048] Fig.15 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0049] Fig.16 for Fig.15The diagram shows a schematic diagram of the local planar structure corresponding to the display substrate.

[0050] Fig.17 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0051] Fig.18 for Fig.17 The diagram shows a schematic diagram of the local planar structure corresponding to the display substrate.

[0052] Fig.19 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0053] Fig. 20 The present invention is a schematic block diagram of a display device according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0054] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0055] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. The words "include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0056] The features such as "parallel", "perpendicular" and "same" used in at least one embodiment of the present disclosure include the features such as "parallel", "perpendicular" and "same" in a strict sense, as well as the cases where "approximately parallel", "approximately perpendicular" and "approximately the same" contain certain errors, taking into account the errors associated with the measurement of specific quantities (for example, the limitations of the measurement system), and indicating the acceptable deviation range for a specific value determined by ordinary technicians in the field. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value. When the number of a component is not specifically indicated in the following of the embodiments of the present disclosure, it means that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "multiple" means at least two. The "same-layer arrangement" referred to in the disclosure refers to a structure formed by two (or more) structures formed by the same deposition process and patterned by the same composition process, and their materials can be the same or different. The "structure of an integrated arrangement" in the present disclosure refers to a structure connected to each other formed by two (or more) structures formed by the same deposition process and patterned by the same composition process, and their materials can be the same or different.

[0057] The light-emitting functional layer of the sub-pixel may include a plurality of light-emitting layers stacked in layers, such as a tandem (Tandem) device. The Tandem device has the characteristics of low power consumption and long life. However, a charge generation layer (CGL) is arranged between at least two of the multi-layer light-emitting layers in the Tandem device, and the conductivity of the charge generation layer is relatively large. For example, when the charge generation layer is a whole-surface film layer, the charge generation layer of the sub-pixels of different colors is a continuous film layer, and there is a phenomenon of lateral charge migration, which causes the display substrate to shift in low grayscale monochrome chromaticity, such as easily causing adjacent and different color sub-pixels, such as red sub-pixels and blue sub-pixels, or red sub-pixels and green sub-pixels, or blue sub-pixels and green sub-pixels to generate crosstalk, resulting in color deviation of the display substrate. For example, the charge generation layer easily causes crosstalk between sub-pixels of different colors at low brightness, resulting in low grayscale color deviation.

[0058] Providing a partition structure between adjacent sub-pixels of different colors is helpful to reduce crosstalk between sub-pixels. For example, the partition structure may be a partition structure made of inorganic materials. A peripheral area outside the display area may also be provided with a spacer column formed by the same patterning process as the partition structure to solve some reliability problems that often occur in the non-display area around the display substrate in the reliability condition.

[0059] Figure 1 The schematic diagram of a partial cross-sectional structure of a display substrate. In the research, the inventor of the present application found that the display substrate with a partition structure may have some defects as described below.

[0060] For example, Figure 1 As shown, the inorganic structure 030 in the partition structure is formed between the flat layer 031 and the anode 022 of the sub-pixel, and the anode 022 needs to be electrically connected to the pixel circuit 036 through the inorganic structure 030 and the via 035 in the flat layer 031. The via 035 is a sleeve hole formed by the inorganic structure via and the flat layer via. The uniformity of the via 035 is poor, and the via boundary overlap of the anode 022 in the partition structure becomes thinner and easy to break; and the inorganic structure 030 in the partition structure is etched by a dry etching process, and the etching gas causes the metal material in the pixel circuit 036, such as the surface of titanium, to be oxidized, thereby causing the contact impedance uniformity of the anode 022 overlapping the metal surface in the pixel circuit 036 to deteriorate, the impedance to increase, and other problems, resulting in low grayscale display mura unevenness and other problems that seriously affect the image quality.

[0061] For example, Figure 1 As shown, the inorganic structure 030 in the partition structure is likely to leave residues 037 on the sidewalls of the metal isolation column 034 in the non-display area during the preparation process, resulting in the metal isolation column 034 being unable to effectively isolate the organic materials in the non-display area, such as the materials in the light-emitting functional layer. In this regard, it is necessary to add a mask process, such as a hole mask process, to remove the residues 037, and then perform side engraving on the metal isolation column 034. The above-mentioned added mask process increases the process complexity, resulting in an increase in the mask process cost and a decrease in the process capacity.

[0062] For example, Figure 1 As shown, the inorganic structure 030 in the partition structure is formed before the anode 022 of the sub-pixel, and a groove is formed in the flat layer 031 during the patterning process of the inorganic structure 030. Water is likely to remain in the groove. During the subsequent high-temperature process, the residual water will adhere to the metal material with a large area in the film layer where the anode 022 is located, which may easily cause bulging of the metal material, thereby causing peeling problems.

[0063] For example, Figure 1 As shown, one side edge of the inorganic structure 030 of the partition structure located between two adjacent sub-pixels is covered by the pixel defining portion 011 of the pixel defining pattern, and the other side edge is exposed by the opening 012 of the pixel defining pattern. The portion of the inorganic structure 030 exposed by the opening is used to isolate the light-emitting functional layer 023. The partition surface of the charge generating layer in the light-emitting functional layer 023, which is located on the edge of the partition structure exposed by the opening 012, is electrically connected to the cathode 021 formed subsequently, and is prone to short circuit problems.

[0064] For example, Figure 1As shown, the partition structure is formed before the anode 022 . The process of forming the partition structure will etch the surface of the flat layer 031 to reduce the flatness, thereby affecting the flatness of the anode 022 .

[0065] For example, Figure 1 As shown, the display substrate also includes a base substrate 038, an intermediate film layer 033 located between the metal isolation column 034 and the base substrate 038, and the film layer 032 between the flat layer 031 and the base substrate 038 includes not only the intermediate film layer 033 but also a metal film layer where the metal isolation column 034 is located.

[0066] The present disclosure provides a display substrate and a display device. The display substrate includes a base substrate and multiple circles of isolation columns and an inorganic layer located on the base substrate. The base substrate includes a first area and a second area, the first area surrounds at least part of the second area, the first area includes a display area, and the second area includes a hole area and a non-hole area surrounding the hole area; the multiple circles of isolation columns are located in the non-hole area on the base substrate and surround the hole area. The isolation columns at least include a first isolation layer and a second isolation layer stacked, the second isolation layer is located on a side of the first isolation layer away from the base substrate, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; the inorganic layer wraps the side surfaces of the first isolation layer and the second isolation layer of at least one circle of isolation columns.

[0067] The display substrate provided by the present disclosure wraps the side surface of the isolation layer of at least one circle of isolation columns located in the non-hole area with an inorganic layer, which not only prevents the isolation layer in the isolation column configured to isolate the light-emitting functional layer from being electrically connected to the film layer in the light-emitting functional layer, but also saves the etching steps for the residual inorganic layer in the isolation column.

[0068] Another display substrate provided by the present disclosure includes a base substrate, a plurality of sub-pixels located on the base substrate, a pixel defining pattern, an inorganic layer and an organic layer. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stacked manner, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel defining pattern is located on the side of the first electrode away from the base substrate, the pixel defining pattern includes a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the organic layer is located between the inorganic layer and the base substrate. The display substrate includes a defining structure, the second opening is configured to expose the defining structure, the defining structure includes an inorganic defining layer located between adjacent sub-pixels and at least one protrusion in the organic layer that contacts the surface of the inorganic defining layer, the defining structure is configured to isolate at least one layer of the light-emitting functional layer; the inorganic layer covers the edge of the first electrode in at least part of the sub-pixels.

[0069] In the display substrate provided by the present disclosure, by setting the portion of the inorganic layer that is arranged in the same layer as the inorganic limiting layer in the limiting structure to cover the edge of the first electrode of the sub-pixel, it is beneficial to prevent damage to the edge of the first electrode during the process of etching to form the inorganic limiting layer.

[0070] Another display substrate provided by the present disclosure includes a base substrate, a plurality of sub-pixels located on the base substrate, a pixel defining pattern, an inorganic layer and an organic layer. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stacked manner, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel defining pattern is located on the side of the first electrode away from the base substrate, the pixel defining pattern includes a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the organic layer is located between the inorganic layer and the base substrate. The display substrate includes a defining structure, the second opening is configured to expose the defining structure, the defining structure includes an inorganic defining layer located between adjacent sub-pixels and at least one protrusion in the organic layer that contacts the surface of the inorganic defining layer, the defining structure is configured to isolate at least one layer of the light-emitting functional layer; along a direction perpendicular to the base substrate, the inorganic layer does not overlap with the first electrode.

[0071] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel defining pattern is formed, so that the first electrode can be set to have no overlap with the inorganic layer, so as to avoid the inorganic layer affecting the opening of the sub-pixel and the first electrode, which is beneficial to improving the display effect of the display substrate.

[0072] Another display substrate provided by an embodiment of the present disclosure includes a base substrate, a plurality of sub-pixels located on the base substrate, a pixel defining pattern, and an inorganic layer. Each sub-pixel includes a first electrode, a light-emitting functional layer, and a second electrode arranged in a stacked manner, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel defining pattern is located on a side of the first electrode away from the base substrate, the pixel defining pattern includes a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, and the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the inorganic layer is located on a side of the pixel defining portion away from the base substrate. The display substrate includes a defining structure, which is located between adjacent sub-pixels and is configured to isolate at least one layer of the light-emitting functional layer; the defining structure includes an inorganic defining layer, wherein the inorganic layer is located between adjacent sub-pixels, and the inorganic defining layer is in contact with at least one surface of the pixel defining portion away from the base substrate.

[0073] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel defining pattern is formed, so that the inorganic defining layer can be formed on the pixel defining portion to prevent the inorganic defining layer from affecting the first electrode and the organic layer between the first electrode and the base substrate, which is beneficial to improving the display effect of the display substrate.

[0074] The display substrate and the display device provided by the embodiments of the present disclosure are described below with reference to the accompanying drawings.

[0075] Figure 2 A schematic plan view of a display substrate provided in an embodiment of the present disclosure. Figure 3 For along Figure 2 A schematic diagram of the local cross-sectional structure taken along line BB' is shown.

[0076] like Figure 2 and Figure 3 As shown, the display substrate includes a base substrate 01 and a plurality of circles of isolation columns 100 and an inorganic layer 200 located on the base substrate 01. The base substrate 01 includes a first area A1 and a second area A2, the first area A1 surrounds at least a portion of the second area A2, the first area A1 includes a display area, and the second area A2 includes a hole area A21 and a non-hole area A22 surrounding the hole area A21. For example, the second area A2 includes a non-display area. For example, the display area is an area for displaying an image, and the non-display area is an area where no image is displayed. For example, the hole area A21 can be a light-transmitting area for setting a photosensitive sensor, such as an infrared sensor, an ultrasonic sensor, a LIDAR (Light Detection and Ranging, laser radar) sensor, a radar sensor, a camera, a distance sensor, but not limited thereto; the non-hole area A22 can be a non-light-transmitting area for setting a barrier and other structures. For example, the second area A2 can also be an AA hole area. Figure 2 It is schematically shown that the second area A2 includes one hole area A21 , but is not limited thereto and may also include two or more hole areas A21 .

[0077] Figure 4 It is a schematic diagram of the local cross-sectional structure of a part of the first zone.

[0078] like Figures 2 to 4 As shown, the multi-circle isolation column 100 is located in the non-hole area A22 on the substrate 01 and surrounds the hole area A21. Figure 2 and Figure 3 It is schematically shown that the number of isolation columns 100 is six turns, but it is not limited to this. The number of turns of the isolation columns 100 can be set according to product requirements. For example, the number of turns of the isolation columns 100 can be greater than six turns, such as nine turns, eight turns or seven turns, etc. The number of turns of the isolation columns 100 can also be less than six turns.

[0079] In some examples, such as Figure 4As shown, the display area includes a plurality of sub-pixels 300, each of which includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 that are stacked, the first electrode 310 is located between the light-emitting functional layer 330 and the base substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers. For example, the non-porous area A22 is not provided with a sub-pixel 300 for display, and the isolation column 100 may be a structure that isolates at least one film layer of the light-emitting functional layer 330 in the non-porous area A22 to prevent water and oxygen from invading the light-emitting functional layer 330 in the display area through the film layer of the non-porous area A22. For example, the isolation column 100 may be a structure that isolates the film layer where the second electrode 320 is located in the non-porous area A22 to avoid affecting the electrical properties of the second electrode 320 in the display area.

[0080] like Figure 3 As shown, the isolation column 100 at least includes a first isolation layer 110 and a second isolation layer 120 which are stacked, the second isolation layer 120 is located on a side of the first isolation layer 110 away from the base substrate 01, the edge of the second isolation layer 120 protrudes relative to the edge of the first isolation layer 110, and the materials of the first isolation layer 110 and the second isolation layer 120 are both conductive materials. For example, the edge of the second isolation layer 120 protrudes relative to the edge of the first isolation layer 110 to isolate the portion of the light-emitting functional layer 330 located in the non-hole area A22.

[0081] like Figure 3 As shown, the inorganic layer 200 wraps at least one circle of the side surfaces of the first isolation layer 110 and the second isolation layer 120 of the isolation column 100 .

[0082] The display substrate provided by the present disclosure, by wrapping the side of the isolation column with an inorganic layer, can isolate the light-emitting functional layer and other film layers while preventing the isolated light-emitting functional layer and other film layers from being electrically connected to the isolation column, so as to avoid problems such as water and oxygen intrusion caused by incomplete power outage, such as black spots displayed during the reliability process.

[0083] also, Figure 1 The metal isolation column 034 is further etched after removing the residue 037, such as side etching, to form a protruding portion that separates the light-emitting functional layer and other film layers; Figure 1 As shown in the figure, because the inorganic layer is easy to remain on the side wall of the isolation column, it is necessary to add a mask etching process (such as a hole mask process). After the edge of the isolation column in the display substrate provided by the present invention forms a protruding part, the inorganic layer is wrapped around the side of the isolation column, which can save the hole mask process and help reduce the production cost of the display substrate.

[0084] For example, Figure 3As shown, the inorganic layer 200 wraps the side surfaces of the first isolation layer 110 and the second isolation layer 120 of each circle of isolation column 100. For example, the isolation column 100 also includes a third isolation layer 130, which is located between the first isolation layer 110 and the base substrate 01, and the material of the third isolation layer 130 includes a conductive material. For example, the material of the first isolation layer 110 and the third isolation layer 130 is the same, and the material of the first isolation layer 110 is different from the material of the second isolation layer 120. For example, the edges of the first isolation layer 110 and the third isolation layer 130 are both protruding relative to the edge of the second isolation layer 120. For example, the isolation column 100 includes three metal layers, such as a titanium / aluminum / titanium structure.

[0085] For example, Figure 3 As shown, the region between adjacent isolation pillars 100 may not be provided with the inorganic layer 200 , or may be covered by the inorganic layer 200 , such as the inorganic layer 200 covers the isolation pillars 100 and the spaces between adjacent isolation pillars 100 .

[0086] For example, Figure 3 As shown, the display substrate further includes a buffer layer and a shielding layer 02, a gate insulating layer 03, and an interlayer insulating layer 04 located between the base substrate 01 and the isolation column 100. For example, a first metal pad layer 051 is provided between the gate insulating layer 03 and the isolation column 100, and / or a second metal pad layer 052 is provided between the buffer layer and the shielding layer 02 and the isolation column 100. The first metal pad layer 051 and / or the second metal pad layer 02 play a role in raising the isolation column 100, so as to further improve the effect of the isolation film layer of the isolation column 100. For example, in a direction perpendicular to the base substrate 01, the first metal pad layer 051 and the second metal pad layer 052 both overlap with the isolation column 100. For example, the shapes of the first metal pad layer 051 and the second metal pad layer 052 are both annular. For example, at least one of the first metal pad layer 051 and the second metal pad layer 052 can be a film layer where the gate line is located in the display area. Figure 3 It is schematically shown that a first metal pad layer and a second metal pad layer can be disposed simultaneously between the isolation column 100 and the base substrate 01 , but the present invention is not limited thereto. One of the first metal pad layer and the second metal pad layer can be disposed between the isolation column 100 and the base substrate 01 .

[0087] For example, Figure 4 As shown, the light-emitting functional layer 330 includes a charge generation layer. For example, the light-emitting functional layer 330 may be a light-emitting functional layer 330 included in an organic light-emitting element. For example, each sub-pixel 300 located in the display area includes a light-emitting element.

[0088] For example, Figure 4As shown, the light-emitting functional layer 330 may include a first light-emitting layer (EML), a charge generation layer (CGL) and a second light-emitting layer (EML) which are stacked, and the charge generation layer is located between the first light-emitting layer and the second light-emitting layer. The charge generation layer has strong conductivity, which can make the light-emitting functional layer 330 have the advantages of long life, low power consumption and high brightness. For example, compared with the light-emitting functional layer 330 without the charge generation layer, the sub-pixel 300 can increase the light-emitting brightness by nearly doubling by setting the charge generation layer in the light-emitting functional layer 330.

[0089] For example, the same sub-pixel 300 may be a tandem structure, such as a Tandem OLED.

[0090] For example, the charge generation layer may include an N-type charge generation layer and a P-type charge generation layer.

[0091] For example, in each sub-pixel 300 , the light emitting functional layer 330 may further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0092] For example, the hole injection layer, hole transport layer, electron transport layer, electron injection layer and charge generation layer are all common layers of the plurality of sub-pixels 300 and can be referred to as common layers. For example, the common layers and the second electrode 320 can be layers formed using an open mask.

[0093] For example, the second light-emitting layer may be located between the first light-emitting layer and the second electrode 320, and the hole injection layer may be located between the first electrode 310 and the first light-emitting layer. For example, an electron transport layer may be provided between the charge generation layer and the first light-emitting layer. For example, a hole transport layer may be provided between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer may be provided between the second light-emitting layer and the second electrode 320.

[0094] For example, in the same sub-pixel 300, the first light-emitting layer and the second light-emitting layer may be light-emitting layers that emit light of the same color. For example, in the same sub-pixel 300, the first light-emitting layer and the second light-emitting layer may be light-emitting layers that emit light of different colors. By arranging light-emitting layers that emit light of different colors in the same sub-pixel 300, the light emitted by the multiple light-emitting layers included in the sub-pixel 300 can be mixed into white light, and the color of the light emitted from each sub-pixel 300 can be adjusted by arranging a color filter layer.

[0095] For example, the material of the electron transport layer may include aromatic heterocyclic compounds, such as imidazole derivatives such as benzimidazole derivatives, imidazopyridine derivatives, and benzimidazolephenanthridine derivatives; oxazine derivatives such as pyrimidine derivatives and triazine derivatives; quinoline derivatives, isoquinoline derivatives, phenanthroline derivatives, and the like containing nitrogen-containing six-membered ring structures (including compounds having phosphine oxide-based substituents on the heterocyclic ring), etc.

[0096] For example, the material of the charge generation layer may be a material containing a phosphorus oxygen group or a material containing triazine.

[0097] For example, the ratio of the electron mobility of the charge generation layer to the electron mobility of the electron transport layer is 10 -2 ~10 2 .

[0098] For example, the first electrode 310 may be an anode, and the second electrode 320 may be a cathode. For example, the cathode may be formed of a material with high conductivity and low work function, for example, the cathode may be made of a metal material. For example, the anode may be formed of a transparent conductive material with a high work function.

[0099] For example, Figure 4 As shown, the orthographic projection of the second electrode 320 in at least some of the sub-pixels 300 on the base substrate 01 is a whole-surface structure. For example, the second electrode 320 may be a common electrode shared by a plurality of sub-pixels 300 .

[0100] In some examples, such as Figure 4 As shown, the display substrate includes a limiting structure 400, which is located between adjacent sub-pixels 300 and is configured to isolate at least one layer of the light-emitting functional layer 330. For example, Figures 4 to 6 It is schematically shown that a continuous defining structure 400 is disposed between adjacent sub-pixels 300 , but the present invention is not limited thereto, and a plurality of spaced defining structures may be disposed between adjacent sub-pixels.

[0101] For example, Figure 6 As shown, the angle between the extension direction of the defining structure 400 and the extension direction of the edge of the light emitting area of ​​the sub-pixel 300 adjacent thereto is less than 5 degrees.

[0102] For example, Figure 5As shown, the plurality of sub-pixels 300 include a red sub-pixel 301, a green sub-pixel 302, and a blue sub-pixel 303, the number of the limiting structures 400 may be multiple, and the plurality of limiting structures 400 include a limiting structure 400 surrounding the red sub-pixel and a limiting structure 400 surrounding the green sub-pixel. The limiting structure 400 surrounding the red sub-pixel means that the limiting structure 400 is located between the red sub-pixel and the green sub-pixel, but closer to the red sub-pixel. For example, the number of limiting structures 400 surrounding a red sub-pixel is four, and the number of limiting structures 400 surrounding a green sub-pixel is two. For example, a limiting structure 400 includes an inorganic limiting layer 410 and a protrusion (the first protrusion 510 or the second protrusion 631 described later).

[0103] For example, the limiting structure 400 may block the charge generation layer to prevent crosstalk between adjacent sub-pixels 300 of different colors. For example, all film layers between the charge generation layer and the base substrate 01 in the light-emitting functional layer 330 may be blocked at the edge of the limiting structure 400. For example, all film layers in the light-emitting functional layer 330 may be blocked at the edge of the limiting structure 400. For example, the second electrode 320 may be blocked at the edge of the limiting structure 400 or may be continuously disposed.

[0104] In some examples, such as Figure 4As shown, the display substrate further includes: a pixel defining pattern 600, which is located on the side of the first electrode 310 away from the base substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610, a plurality of second openings 620, and a pixel defining portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, and the plurality of second openings 620 are configured to expose the defining structure 400. For example, in each example, the second opening 620 is configured to expose at least part of the defining structure 400, such as the second opening can only expose part of the defining structure 400, or can also expose the entire defining structure 400. For example, one sub-pixel 300 corresponds to at least one first opening 610, at least part of the light-emitting functional layer 330 of the sub-pixel 300 is located in the first opening 610 corresponding to the sub-pixel 300, and the first opening 610 is configured to expose the first electrode 310. For example, one sub-pixel 300 corresponds to one first opening 610, and the light-emitting functional layer 330 located in the first opening 610 realizes light emission by contacting the first electrode 310 and the second electrode 320. For example, the first opening 610 is used to define the light-emitting area of ​​the sub-pixel 300. For example, the light-emitting function layer 330 may include a portion located in the first opening 610, the pixel defining portion 630, and the second opening 620, and may be disconnected at the edge of the defining structure 400. For example, the light-emitting layer in the light-emitting function layer 330 may be located only in the first opening 610, or located in the first opening 610 and on the pixel defining portion 630, but not in the second opening 620.

[0105] For example, Figure 4 As shown, the material of the pixel defining portion 630 includes an organic material. For example, the material of the pixel defining portion 630 may include polyimide, acrylic or polyethylene terephthalate, etc. For example, the maximum thickness of the pixel defining portion 630 in a direction perpendicular to the base substrate 01 may be greater than 0.8 micrometers.

[0106] In some examples, such as Figure 4 As shown, the defining structure 400 includes an inorganic defining layer 410, and the inorganic defining layer 410 is a structure in which the inorganic layer 200 is located between adjacent sub-pixels 300. For example, the inorganic layer 200 includes a film layer in the defining structure 400 and a structure covering the spacer 100.

[0107] In some examples, such as Figure 4 As shown, the display substrate further includes: an organic layer 500 located between the first electrode 310 and the base substrate 01 , and an inorganic limiting layer 410 is in contact with a surface of the organic layer 500 away from the base substrate 01 . Figure 4 The film layer between the organic layer 500 and the base substrate 01 is omitted. The film layer between the organic layer 500 and the base substrate 01 can refer to Figure 3 For example, the organic layer 500 may be a flat layer.

[0108] In some examples, such as Figure 4 As shown, the limiting structure 400 also includes at least one first protrusion 510 in the organic layer 500 that contacts the surface of the inorganic limiting layer 410, and the angle between the side of the first protrusion 510 and the first surface S1 of the organic layer 500 other than the first protrusion 510 and away from the substrate 01 is 80 to 110 degrees, and the first surface S1 is substantially parallel to the substrate 01. For example, the angle of the side of the first protrusion 510 can be 90 to 100 degrees, or 85 to 105 degrees, etc. The specific angles of the angle are not listed one by one in the embodiment of the present disclosure, and can be any angle between 80 and 110 degrees. For example, the first surface S1 being substantially parallel to the substrate 01 can mean that the angle between the first surface and the main surface of the substrate does not exceed 5 degrees.

[0109] For example, Figure 4 As shown, the structure in the organic layer 500 and the structure in the inorganic layer 200 serve as the inorganic limiting layer 410 and the first protrusion 510 in the limiting structure 400 respectively. The setting of the side angle of the first protrusion 510 can achieve the effect of isolating at least one layer of the light-emitting functional layer 330 of the adjacent sub-pixel 300.

[0110] For example, Figure 4 As shown, the edge of the inorganic limiting layer 410 protrudes relative to the edge of the first protrusion 510 to achieve the effect of isolating at least one layer of the light-emitting functional layer 330 .

[0111] For example, Figure 3 As shown, the non-hole area A22 is further provided with at least one circle of blocking portions 053 (dam), and the blocking portion 053 may be located between two circles of isolation columns 100. The blocking portion 053 may be used to prevent the organic layer 500 in the encapsulation layer (not shown) from overflowing the base substrate 01 during the manufacturing process. For example, the blocking portion 053 may include a portion of the organic layer 500; and / or, the blocking portion 053 includes the same material as the pixel defining portion 630.

[0112] For example, Figure 3 As shown, the non-hole area A22 also includes an isolation structure surrounding the isolation column 100, which includes a structure in the organic layer 500 and a structure in the inorganic layer 200. The isolation structure is used to assist the isolation column 100 and further isolate the film layers such as the light-emitting functional layer 330. For example, part of the inorganic layer 200 in the isolation structure is covered by the structural layer 631 disposed on the same layer as the pixel defining portion 630.

[0113] Figure 5 for Figure 2 A schematic plan view of a local area of ​​a display region in a display substrate is shown. Figure 6 for Figure 5Magnified view of the local area shown. Figure 4 It is a partial cross-sectional view taken along the CC' line shown in the figure.

[0114] In some examples, such as Figures 4 to 6 As shown, the inorganic layer 200 covers the edge of the first electrode 310 in at least part of the sub-pixel 300. By setting the inorganic layer 200 to cover the edge of the first electrode 310, it is possible to prevent the edge of the first electrode 310 from being damaged during the subsequent film layer etching process, thereby affecting the electrical performance of the first electrode 310.

[0115] For example, Figures 4 to 6 As shown, the portion of the inorganic layer 200 covering the edge of the first electrode 310 is the second covering portion 210, and the second covering portion 210 wraps at least a portion of the edge of the first electrode 310. For example, the second covering portion 210 can be a ring-shaped structure. For example, there is a gap between the second covering portion 210 and the edge of the first opening 610.

[0116] In some examples, such as Figures 4 to 6 As shown, the first electrode 310 includes a main body portion 311 and a connecting portion 312 connected to each other, the main body portion 311 overlaps with the light-emitting area of ​​the sub-pixel 300, and the connecting portion 312 is electrically connected to the pixel circuit through the via hole 501 in the organic layer 500. For example, the second covering portion 210 covers a circle edge of the main body portion 311. For example, the main body portion 311 and the connecting portion 312 are an integrated structure.

[0117] For example, Figure 6 As shown, in one example, the second covering portion 210 may not cover the edge of the connecting portion 312 of the first electrode 310 .

[0118] In the display substrate provided by the present disclosure, by adjusting the inorganic layer to be formed after the first electrode, and setting a partial structure of the inorganic layer, such as the second covering portion, to cover a circle of the edge of the main body of the first electrode, it is possible to prevent the edge of the main body of the first electrode from being damaged during the subsequent patterning of the inorganic layer (such as dry etching) to form the inorganic limiting layer 410, thereby preventing the luminous effect of the sub-pixel from being affected.

[0119] In some examples, such as Figures 4 to 6 As shown, the orthographic projection of the second covering portion 210 on the base substrate 01 is completely located within the orthographic projection of the pixel defining portion 630 on the base substrate 01. The second covering portion 210 covering the edge of the first electrode 310 in the inorganic layer 200 is completely covered by the pixel defining portion 630 and is not exposed by the first opening 610 or the second opening 620. Therefore, the second covering portion 210 does not serve to isolate the light-emitting functional layer 330.

[0120] Figure 7A schematic diagram of the positional relationship between a first electrode and an inorganic layer is provided according to another example of an embodiment of the present disclosure.

[0121] In some examples, such as Figure 7 As shown, the inorganic layer 200 covers the edges of the main body 311 and the connecting portion 312. For example, the shape of the main body 311 of the first electrode 310 is similar to the shape of the light-emitting area, such as both are quadrilaterals. For example, the connecting portion 312 is a structure extending from the corner of the main body 311.

[0122] For example, Figure 7 As shown, in addition to covering the edge of the main body 311 of the first electrode 310, the second covering portion 210 also covers the edge of the connecting portion 312 of the first electrode 310, which is beneficial to prevent the edge of the connecting portion 312 from being damaged during the dry etching of the inorganic layer 200, thereby improving the electrical connection effect between the connecting portion 312 and the pixel circuit. Figure 7 The positional relationship between a first electrode 310 and the inorganic layer 200 is schematically shown, and the edges of the main portion 311 and the connecting portion 312 of the first electrode 310 in other sub-pixels 300 in the display substrate are all covered by the inorganic layer 200 .

[0123] Figure 8 For along Figure 7 The schematic diagram of the local cross-section structure taken along line DD' is shown. Figure 8 The film layer on the side of the pixel defining portion 630 away from the base substrate 01 is not shown. Figure 8 The multiple film layers 06 in the embodiment may refer to the film layers between the aforementioned base substrate 01 and the organic layer 500 .

[0124] In some examples, such as Figure 7 and Figure 8 As shown, each sub-pixel 300 also includes a pixel circuit, which includes a light-emitting control transistor 056. The first electrode 310 is electrically connected to the light-emitting control transistor 056 through a via 501 in the organic layer 500, and along a direction perpendicular to the base substrate 01, the inorganic layer 200 and the via 501 do not overlap.

[0125] Relative to Figure 1 As shown, the inorganic structure is arranged at the anode via hole so that the anode via hole includes the inorganic layer opening and the organic layer opening to form a casing hole. In the display substrate provided by the present disclosure, the inorganic layer is formed after the first electrode is formed, and the first electrode is electrically connected to the pixel circuit only through the via hole in the organic layer, and does not need to be electrically connected to the pixel circuit through the via hole in the inorganic layer; at the same time, the inorganic layer is formed after the first electrode, avoiding the problem that the surface of the metal material in the pixel circuit is oxidized during the etching process of the inorganic layer, thereby avoiding the problem of uneven mura in low grayscale display of the display substrate.

[0126] For example, Figure 8 As shown, the first electrode 310 is electrically connected to the light emission control transistor 056 through the connection structure 055. For example, the connection portion 312 of the first electrode 310 is electrically connected to the light emission control transistor 056 through the via hole 501 in the organic layer 500.

[0127] For example, the pixel circuit may include multiple transistors and at least one capacitor. For example, the pixel circuit may be a 7T1C, 8T1C, 2T1C, 3T1C, etc. structure, which is not limited in the embodiment of the present disclosure and can be set according to the actual requirements of the display substrate. Figure 8 The light emitting control transistor 056 in the pixel circuit is schematically shown. The pixel circuit may also include other transistors, such as a driving transistor, a data writing transistor, an initialization transistor, a compensation transistor, etc. The embodiment of the present disclosure does not limit the specific structure of the pixel circuit and can be set according to requirements.

[0128] For example, Figure 7 and Figure 8 It is schematically shown that the portion of the connection portion 312 connected to the main body portion 311 is completely covered by the inorganic layer 200 , but the invention is not limited thereto, and only the edge of the portion of the connection portion 312 connected to the main body portion 311 may be covered.

[0129] In some examples, such as Figure 4 and Figure 6 As shown, the edges of the first protrusions 510 are retracted relative to the edges of the inorganic limiting layer 410 , so that the edges of the sub-pixels 300 on both sides of the inorganic limiting layer 410 are used to isolate the light-emitting function layer 330 .

[0130] Relative to Figure 1 The inorganic structure 030 shown adopts the case of single-sided partition, that is, the inorganic structure 030 only isolates the light-emitting functional layer of the sub-pixels on one side thereof, but does not isolate the light-emitting functional layer of the sub-pixels on the other side thereof. The display substrate provided by the present disclosure sets a limiting structure to isolate the light-emitting functional layer of the sub-pixels on both sides thereof, which is beneficial to avoid the short circuit problem caused by the electrical connection between the charge generation layer in the light-emitting functional layer isolated on one side and the second electrode at the partition position.

[0131] For example, Figure 4 and Figure 6 As shown, the size of the second opening 620 is greater than the size of the inorganic definition layer 410 so that the edge of the inorganic definition layer 410 is exposed by the second opening 620 .

[0132] For example, Figure 4 As shown, the edge of the inorganic definition layer 410 may protrude by no more than 0.2 micrometers relative to the edge of the first protrusion 510. For example, the height of the first protrusion 510 may be greater than 1500 angstroms.

[0133] For example, Figure 4 As shown, in the process of etching the inorganic layer 200 to form the inorganic limiting layer 410 and the second covering portion 210, the etching solution will cause a certain degree of etching to the organic layer 500 to form side etching, so that the edge of the first protrusion 510 stacked with the inorganic limiting layer 410 is retracted by a certain size relative to the edge of the inorganic limiting layer 410, and the edge of the protrusion stacked with the organic layer 500 and the second covering portion 210 is retracted by a certain size relative to the edge of the second covering portion 210. In the subsequent process of forming the pixel limiting portion 630, the portion of the edge of the protrusion stacked with the second covering portion 210 that is retracted relative to the edge of the second covering portion 210 can be filled with the material of the pixel limiting portion 630.

[0134] In some examples, such as Figure 4 As shown, the height of the first protrusion 510 is greater than the thickness of the first electrode 310. For example, the height of the first protrusion 510 may be 2000 to 3000 angstroms.

[0135] In some examples, such as Figure 5 As shown, the display substrate further includes a spacer 700 located on a side of the inorganic layer 200 away from the base substrate 01 , and the orthographic projection of the spacer 700 on the base substrate 01 is completely located within the orthographic projection of the inorganic layer 200 on the base substrate 01 .

[0136] By disposing part of the inorganic layer between the spacer and the base substrate, it is helpful to raise the spacer to improve the support effect of the spacer on the fine metal mask (FMM) forming the light-emitting layer, and prevent the mask from scratching the light-emitting material in the light-emitting area and affecting the display effect.

[0137] For example, Figure 3 As shown, the non-hole area A22 is also provided with at least one circle of filling structure 054, which is beneficial to prevent the isolation column 100 from being electrically connected to the light-emitting functional layer 330 and other film layers. For example, the filling structure 054 can be made of the same material as the spacer 700, such as formed in the same patterning process.

[0138] Another embodiment of the present disclosure provides a display substrate, comprising: Figures 2 to 8The display substrate shown in the figure includes a base substrate 01, a plurality of sub-pixels 300 located on the base substrate 01, a pixel defining pattern 600, an inorganic layer 200 and an organic layer 500. Each sub-pixel 300 includes a first electrode 310, a light-emitting functional layer 330 and a second electrode 320 which are stacked, wherein the first electrode 310 is located between the light-emitting functional layer 330 and the base substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is located on a side of the first electrode 310 away from the base substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610, a plurality of second openings 620 and a pixel defining portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, wherein the plurality of first openings 610 are configured to expose the first electrodes 310 of the plurality of sub-pixels 300; and the organic layer 500 is located between the inorganic layer 200 and the base substrate 01. The display substrate includes a defining structure 400, and the second opening 620 is configured to expose the defining structure 400, the defining structure 400 includes an inorganic defining layer 410 located between adjacent sub-pixels 300 and at least one protrusion (such as a first protrusion 510) in the organic layer 500 that contacts the surface of the inorganic defining layer 410, and the defining structure 400 is configured to isolate at least one layer of the light-emitting functional layer 330; the inorganic layer 200 covers the edge of the first electrode 310 in at least part of the sub-pixel 300.

[0139] In the display substrate provided by the present disclosure, the inorganic layer is formed after the first electrode, and by setting the portion of the inorganic layer that is arranged on the same layer as the inorganic limiting layer in the limiting structure to cover the edge of the first electrode of the sub-pixel, it is beneficial to prevent damage to the edge of the first electrode during the process of etching to form the inorganic limiting layer.

[0140] The side surfaces of the isolation columns located in the non-hole area of ​​the display substrate provided by the embodiment of the present disclosure may be covered by an inorganic layer or may not be covered by an inorganic layer.

[0141] In some examples, such as Figures 2 to 8 As shown, each sub-pixel 300 further includes a pixel circuit, the pixel circuit includes a light-emitting control transistor, the first electrode 310 is electrically connected to the light-emitting control transistor through a via hole in the organic layer 500, and along a direction perpendicular to the base substrate 01, the inorganic layer 200 and the via hole 501 do not overlap. Figure 1As shown, the inorganic structure is arranged at the anode via hole so that the anode via hole includes the inorganic layer opening and the organic layer opening to form a casing hole. In the display substrate provided by the present disclosure, the inorganic layer is formed after the first electrode is formed, and the first electrode is electrically connected to the pixel circuit only through the via hole in the organic layer, and does not need to be electrically connected to the pixel circuit through the via hole in the inorganic layer; at the same time, the inorganic layer is formed after the first electrode, avoiding the problem that the surface of the metal material in the pixel circuit is oxidized during the etching process of the inorganic layer, thereby avoiding the problem of uneven mura in low grayscale display of the display substrate.

[0142] The base substrate, sub-pixels, pixel defining patterns, inorganic layers, and organic layers in the display substrate provided by the present disclosure may have the same features as those in the above-mentioned embodiments, which will not be described in detail herein.

[0143] Fig. 9 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig. 9 The display substrate shown is Figure 3 The difference between the display substrates shown is whether the first covering portion 632 is provided on the defining structure 400 .

[0144] In some examples, such as Fig. 9 As shown, the pixel defining portion 630 includes a first covering portion 632 covering the surface of the inorganic defining layer 410 on the side away from the base substrate 01, and the edge of the inorganic defining layer 410 protrudes relative to the edge of the first covering portion 632. While the first covering portion 632 is provided on the side of the inorganic defining layer 410 away from the base substrate 01, the edge of the inorganic defining layer 410 is provided to protrude relative to the edge of the first covering portion 632, so that the inorganic defining layer 410 can be prevented from being peeled off from the first protrusion 510 without affecting the inorganic defining layer 410 to block the light-emitting functional layer 330.

[0145] In some examples, such as Fig. 9 As shown, the protruding dimension of the edge of the inorganic limiting layer 410 relative to the edge of the first covering portion 632 is a first protruding dimension d1, and the protruding dimension of the edge of the inorganic limiting layer 410 relative to the edge of the first protrusion 510 is a second protruding dimension d2, and the first protruding dimension d1 is not less than the second protruding dimension d2. By limiting the protruding dimension of the edge of the inorganic limiting layer 410 relative to the edges of the first covering portion 632 and the first protrusion 510, it is helpful to achieve the partition effect of the edge of the inorganic limiting layer 410 on the light-emitting functional layer 330.

[0146] Fig. 9 The other structures outside the first covering portion in the display substrate can be Figure 3 The corresponding structures in the display substrate shown have the same features, which will not be described in detail here.

[0147] Fig.10 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.11 for Fig.10 The diagram shown is a schematic diagram of the local planar structure of the display substrate.

[0148] Fig.10 The display substrate shown is Figure 3 The display substrates shown differ in whether the first electrode 310 of the sub-pixel 300 overlaps the inorganic layer 200 .

[0149] In some examples, such as Fig.10 and Fig.11 As shown, along the direction perpendicular to the base substrate 01, the first electrode 310 and the inorganic layer 200 do not overlap. In the display substrate provided in this example, the inorganic layer 200 is formed after the pixel defining pattern 600, which can not only prevent the inorganic layer 200 from affecting the organic layer 500 directly below the first electrode 310 and even the metal film layer between the organic layer 500 and the base substrate 01 during the patterning process, and prevent the film layer where the first electrode 310 is located from peeling off, but also eliminate the second covering portion 210 that wraps the edge of the first electrode 310, which is beneficial to prevent the second covering portion 210 from affecting the shape of the first opening 610 in the pixel defining pattern 600 and the shape of the pixel defining portion 630 surrounding the first opening 610, thereby causing the light-emitting functional layer 330 to be easily scratched by the mask.

[0150] In some examples, such as Fig.10 As shown, the thickness H0 of the pixel defining portion 630 is 0.2-0.7 micrometers. The thickness of the pixel defining portion 630 here refers to the thickness of the pixel defining portion 630 at a position where the surface of the side away from the base substrate 01 is a relatively flat surface.

[0151] Since the inorganic layer is formed after the pixel defining pattern, the process of patterning the inorganic layer to form the inorganic defining layer will etch the pixel defining portion to a certain extent, resulting in the thickness of the pixel defining portion being thinned. For example, in this example, the thickness of the pixel defining portion is less than Figure 3 and Fig. 9 The thickness of the pixel defining portion in the display substrate is shown.

[0152] For example, Fig.10 As shown, the thickness of the organic layer 500 directly below the pixel defining portion 630 is greater than the thickness of the organic layer 500 between the pixel defining portion 630 and the inorganic defining layer 410 .

[0153] For example, Fig.10As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0154] Fig.10 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate shown in FIG. Figure 3 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate are the same and will not be repeated here. Fig.10 The inorganic layer 200 covering the spacer 100 in the display substrate is shown to be formed after the pixel defining pattern 600 is formed.

[0155] Fig.12 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.13 for Fig.12 The diagram shown is a schematic diagram of the local planar structure of the display substrate. Fig.12 The display substrate shown is Fig.10 The difference between the display substrate shown is the positional relationship between the spacer 700 and the inorganic layer 200 .

[0156] In some examples, such as Fig.12 and Fig.13 As shown, the display substrate further includes: a spacer 700 located on a side of the first electrode 310 away from the base substrate 01 , and the inorganic layer 200 at least covers a surface of the spacer 700 away from the base substrate 01 .

[0157] The display substrate provided in this example covers the spacer with an inorganic layer to prevent the inorganic layer from affecting the shape and height of the spacer during patterning, thereby preventing the mask supported by the spacer from scratching the light-emitting functional layer.

[0158] For example, Fig.12 As shown, the inorganic layer 200 wraps the spacer 700. However, it is not limited thereto, and the inorganic layer 200 may be located only on one side of the spacer 700 away from the base substrate 01.

[0159] For example, Fig.12 As shown, the thickness of the pixel defining portion 630 directly below the spacer 700 is greater than the thickness of the pixel defining portion 630 at other positions, which is beneficial to improving the supporting effect of the spacer 700.

[0160] Fig.12 The spacer 700 and the pixel defining portion 630 are schematically shown as separate structures, but the present invention is not limited thereto. The spacer 700 and the pixel defining portion 630 may be integrated into a structure.

[0161] For example, Fig.12 As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0162] Fig.12 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate shown in FIG. Figure 3 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate are the same and will not be repeated here. Fig.12 The inorganic layer 200 covering the isolation column 100 in the display substrate is formed after the spacer 700 is formed.

[0163] Fig.14 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.14 The display substrate shown is Fig.12 The difference between the display substrates shown is whether the inorganic layer 200 covers the side of the first opening 610 .

[0164] In some examples, such as Fig.14 As shown, the inorganic layer 200 includes an inorganic cover layer 220 covering the sides of the first opening 610 .

[0165] In the display substrate provided in this example, by setting the inorganic layer to include an inorganic covering layer that covers the side of the pixel defining portion surrounding the first opening, it is helpful to prevent the inorganic layer from causing unnecessary etching to the side of the pixel defining portion surrounding the first opening during the process of dry etching to form the inorganic defining layer, resulting in affecting the height of the pixel defining portion and the morphology of the slope, which may not only easily affect the morphology of the pixel opening, but may also affect the height of the spacer, thereby causing the mask template to scratch the light-emitting functional layer.

[0166] For example, Fig.14 As shown, the sides of each first opening 610 are covered by the inorganic layer 200. For example, the orthographic projection of the inorganic cover layer 220 on the base substrate 01 may be a ring-shaped structure. For example, in addition to covering the sides of the pixel defining portion 630 surrounding the first opening 610, the inorganic cover layer 220 also covers the flat surface of the pixel defining portion 630 away from the base substrate 01. For example, the orthographic projection of the portion of the first electrode 310 covered by the pixel defining portion 630 on the base substrate 01 may be completely located within the orthographic projection of the inorganic cover layer 220 on the base substrate 01.

[0167] For example, Fig.14As shown, the pixel defining portion 630 includes a pixel defining protrusion 601 stacked with the inorganic covering layer 220, and the edge of the inorganic covering layer 220 away from the first opening 610 protrudes relative to the edge of the pixel defining protrusion 601, which is beneficial for the auxiliary defining structure 400 to isolate the light-emitting functional layer 330, so as to improve the isolation effect of the light-emitting functional layer 330.

[0168] For example, Fig.14 It is schematically shown that the inorganic layer 200 covers the spacer 700 , but the present invention is not limited thereto. The inorganic layer 200 may not cover the spacer 700 , and this may be done according to product requirements.

[0169] For example, Fig.14 As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0170] Fig.14 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate shown in FIG. Figure 3 The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and other structures in the display substrate are the same and will not be repeated here. Fig.14 The inorganic layer 200 covering the isolation column 100 in the display substrate is formed after the spacer 700 is formed.

[0171] Another embodiment of the present disclosure provides a display substrate, comprising: Figures 10 to 14The display substrate shown in any of the examples shown in the figure includes a base substrate 01, a plurality of sub-pixels 300 located on the base substrate 01, a pixel defining pattern 600, an inorganic layer 200, and an organic layer 500. Each sub-pixel 300 includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 that are stacked, wherein the first electrode 310 is located between the light-emitting functional layer 330 and the base substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is located on a side of the first electrode 310 away from the base substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610, a plurality of second openings 620, and a pixel defining portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, wherein the plurality of first openings 610 are configured to expose the first electrodes 310 of the plurality of sub-pixels 300; and the organic layer 500 is located between the inorganic layer 200 and the base substrate 01. The display substrate includes a defining structure 400, and the second opening 620 is configured to expose the defining structure 400, the defining structure 400 includes an inorganic defining layer 410 where the inorganic layer 200 is located between adjacent sub-pixels 300 and at least one protrusion in the organic layer 500 that contacts the surface of the inorganic defining layer 410, and the defining structure 400 is configured to isolate at least one layer of the light-emitting functional layer 330; along a direction perpendicular to the base substrate 01, the inorganic layer 200 does not overlap with the first electrode 310.

[0172] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel defining pattern is formed, so that the first electrode can be set to have no overlap with the inorganic layer, so as to avoid the inorganic layer affecting the opening of the sub-pixel and the first electrode, which is beneficial to improving the display effect of the display substrate.

[0173] The side surfaces of the isolation columns located in the non-hole area of ​​the display substrate provided by the embodiment of the present disclosure may be covered by an inorganic layer or may not be covered by an inorganic layer.

[0174] The base substrate 01 , the sub-pixel 300 , the pixel defining pattern 600 , the inorganic layer 200 , and the organic layer 500 in the display substrate provided by the present disclosure may have the same features as those in the above-mentioned embodiment, which will not be described in detail herein.

[0175] Fig.15 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.16 for Fig.15 The diagram shows a schematic diagram of the local planar structure corresponding to the display substrate. Fig.15 For along Fig.16 A schematic diagram of the local cross-sectional structure taken along line EE' is shown. Fig.15 and Fig.16 The display substrate shown is Figure 3 The display substrate shown is different in that the film layers included in the definition structure 400 are different.

[0176] In some examples, such as Fig.15 and 16 As shown, the pixel defining pattern 600 includes a plurality of first openings 610 and a pixel defining portion 630 surrounding the plurality of first openings 610, wherein the plurality of first openings 610 are configured to expose the first electrodes 310 of the plurality of sub-pixels 300; the inorganic defining layer 410 is in contact with at least one side surface of the pixel defining portion 630 away from the base substrate 01.

[0177] In the display substrate provided in this example, the inorganic layer is formed after the pixel defining pattern, so that the inorganic defining layer can be formed on the pixel defining portion, preventing the inorganic defining layer from affecting the first electrode and the organic layer between the first electrode and the base substrate, which is beneficial to improving the display effect of the display substrate.

[0178] Fig.15 The pixel defining pattern 600 in the display substrate shown includes only the first opening 610 but not the second opening 620, which helps prevent the second opening 620 from affecting the side and height of the pixel defining portion 630 surrounding the first opening 610, thereby affecting the height of the spacer 700 and causing the mask to scratch the light-emitting functional layer.

[0179] In some examples, such as Figure 1 As shown, the limiting structure 400 also includes at least one second protrusion 631 in the pixel limiting part 630 that contacts the surface of the inorganic limiting layer 410, and the angle between the side of the second protrusion 631 and the second surface S2 of the pixel limiting part 630 other than the second protrusion 631 and away from the substrate substrate 01 is 80 to 110 degrees, and the second surface S2 is substantially parallel to the substrate substrate 01. For example, the angle of the side of the second protrusion 631 can be 90 to 100 degrees, or 85 to 105 degrees, etc. The specific angles of the angle are no longer listed one by one in the embodiment of the present disclosure, and can be any angle between 80 and 110 degrees. For example, the second surface S2 being substantially parallel to the substrate substrate 01 can mean that the angle between the second surface and the main surface of the substrate substrate does not exceed 5 degrees.

[0180] In this example, the portion of the pixel defining portion that is in contact with the inorganic defining layer is used as a defining structure. The setting of the side angle of the second protrusion can achieve the effect of isolating at least one layer of the light-emitting functional layer of adjacent sub-pixels. In addition, it is beneficial to improve the flatness of the organic layer between the first electrode and the base substrate to improve the flatness of the first electrode.

[0181] For example, Fig.15 As shown, along the direction perpendicular to the base substrate 01 , the inorganic limiting layer 410 and the first electrode 310 do not overlap.

[0182] For example, Fig.15 As shown, the thickness H0 of the pixel defining portion 630 is 0.2-0.7 micrometers. The thickness of the pixel defining portion 630 here refers to the thickness of the pixel defining portion 630 at a position where the surface of the side away from the base substrate 01 is a relatively flat surface.

[0183] Since the inorganic layer is formed after the pixel defining pattern, the process of patterning the inorganic layer to form the inorganic defining layer will etch the pixel defining portion to a certain extent, resulting in the thickness of the pixel defining portion being thinned. For example, in this example, the thickness of the pixel defining portion is less than Figure 3 and Fig. 9 The thickness of the pixel defining portion in the display substrate is shown.

[0184] For example, Fig.15 As shown, the height of the second protrusion 631 may be greater than 1500 angstroms. For example, the height of the second protrusion 631 may be 2000 to 3000 angstroms.

[0185] Fig.15 It is schematically shown that the portion of the pixel defining portion 630 surrounding the second protrusion 631 is a flat surface, but not limited to this. The pixel defining portion 630 may include a circle of grooves surrounding the second protrusion 631, which is beneficial for the auxiliary defining structure 400 to isolate the light-emitting functional layer 330.

[0186] For example, Fig.15 As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0187] Fig.15 and Fig.16 The sub-pixel 300, the spacer 700 and other structures in the display substrate can be Figure 3 The corresponding structures shown have the same features and will not be described again here.

[0188] Fig.17 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.18 for Fig.17 The diagram shows a schematic diagram of the local planar structure corresponding to the display substrate. Fig.17 For along Fig.18 A schematic diagram of the local cross-sectional structure taken along line FF' is shown. Fig.17 and Fig.18 The display substrate shown is Fig.15 and Fig.16 The difference of the display substrate shown is that the inorganic layer 200 is at least located on the surface of the spacer 700 away from the base substrate 01 .

[0189] In some examples, such as Fig.17 and Fig.18 As shown, the spacer 700 is located on the side of the first electrode 310 away from the base substrate 01, and the inorganic layer 200 is at least located on the surface of the spacer 700 away from the base substrate 01. For example, the inorganic layer 200 at least covers the surface of the spacer 700 away from the base substrate 01, but is not limited thereto, the inorganic layer and the spacer may be in direct contact, and other film layers may also exist between the two.

[0190] The display substrate provided in this example prevents the inorganic layer from affecting the shape and height of the spacer during patterning, thereby preventing the mask supported by the spacer from scratching the light-emitting functional layer.

[0191] For example, Fig.17 As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0192] In this example, the covering relationship between the spacer 700 and the inorganic layer 200 is similar to Fig.12 The spacer 700 and the inorganic layer 200 shown have the same covering relationship, which will not be described again.

[0193] This example is not limited to the case where the inorganic layer is located on the side of the spacer away from the base substrate. The inorganic layer may also be located between the spacer and the pixel defining portion. If the orthographic projection of the spacer on the base substrate completely falls within the orthographic projection of the inorganic layer on the base substrate, it is beneficial to raise the spacer to enhance the supporting effect of the spacer on the fine metal mask (FMM) forming the light-emitting layer, thereby preventing the mask from scratching the light-emitting material in the light-emitting area and affecting the display effect.

[0194] Fig.19 A schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Fig.19 The display substrate shown is Fig.17 The display substrates shown differ in whether the edge of the first opening 610 is covered by the inorganic layer 200 .

[0195] In some examples, such as Fig.19 As shown, the inorganic layer 200 includes an inorganic cover layer 220 covering the sides of the first opening 610 .

[0196] In the display substrate provided in this example, by setting the inorganic layer 200 to include an inorganic covering layer 220 that covers the side of the pixel defining portion 630 surrounding the first opening 610, it is helpful to prevent the inorganic layer 200 from causing unnecessary etching to the side of the pixel defining portion 630 surrounding the first opening 610 during the process of dry etching to form the inorganic defining layer 410, resulting in affecting the height of the pixel defining portion 630 and the morphology of the slope, which may not only easily affect the morphology of the pixel opening, but may also affect the height of the spacer 700, thereby causing the mask template to scratch the light-emitting functional layer.

[0197] For example, Fig.19 As shown, the portion of the pixel defining portion 630 between the inorganic cover layer 220 and the inorganic defining layer 410 includes a groove 602, and the edge of the inorganic cover layer 220 protrudes into the groove 602. The provision of the inorganic cover layer 220 is conducive to assisting the inorganic defining layer 410 to isolate at least one layer of the light-emitting functional layer 330, which is conducive to significantly improving the isolation effect of the light-emitting functional layer.

[0198] For example, Fig.19 As shown, the limiting structure 400 can isolate the light-emitting functional layers in the sub-pixels 300 on both sides thereof, such as bilateral isolation. For example, the first electrode does not need to pass through the inorganic layer via hole, but is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0199] Fig.19 The inorganic cover layer 220 is Fig.14 The inorganic cover layer 220 shown has the same features, which will not be described again.

[0200] Another embodiment of the present disclosure provides a display substrate, comprising: Figures 15 to 19The display substrate shown in any of the examples shown includes a base substrate 01, and a plurality of sub-pixels 300, a pixel defining pattern 600, and an inorganic layer 200 located on the base substrate 01. Each sub-pixel 300 includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 that are stacked, wherein the first electrode 310 is located between the light-emitting functional layer 330 and the base substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is located on a side of the first electrode 310 away from the base substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610 and a pixel defining portion 630 surrounding the plurality of first openings 610, wherein the plurality of first openings 610 are configured to expose the first electrodes 310 of the plurality of sub-pixels 300; and the inorganic layer 200 is located on a side of the pixel defining portion 630 away from the base substrate 01. The display substrate includes a defining structure 400, which is located between adjacent sub-pixels 300 and is configured to isolate at least one layer of the light-emitting functional layer 330; the defining structure 400 includes an inorganic layer 200 and an inorganic defining layer 410 located between adjacent sub-pixels 300, and the inorganic defining layer 410 is in contact with at least one side of the pixel defining portion 630 away from the base substrate 01.

[0201] The display substrate provided by the embodiment of the present disclosure forms an inorganic limiting layer on the pixel defining part to prevent the inorganic limiting layer from affecting the first electrode and the organic layer between the first electrode and the base substrate, thereby preventing the morphology of the edge of the pixel defining part around the first opening from being affected, causing the mask to scratch the light-emitting functional layer in the light-emitting area and cause bright and dark spot problems. Therefore, forming the inorganic limiting layer after the pixel defining pattern is beneficial to improving the display effect of the display substrate, improving the production yield of the product, and greatly reducing the production cost.

[0202] In some examples, such as Figures 15 to 19 As shown, the defining structure 400 further includes at least one protrusion (i.e., a second protrusion 631) in the pixel defining portion 630 that contacts the surface of the inorganic defining layer 410, and the angle between the side of the protrusion and the surface of the pixel defining portion 630 other than the protrusion and away from the base substrate 01 is 80 to 110 degrees, and the surface is parallel to the base substrate 01. The protrusion in this example may have the same features as the second protrusion 631 described above, and will not be repeated here.

[0203] In some examples, such as Figures 15 to 18As shown, along the direction perpendicular to the base substrate 01, the first electrode 310 and the inorganic layer 200 do not overlap. In the display substrate provided in this example, the inorganic layer 200 is formed after the pixel defining pattern 600, which can not only prevent the inorganic layer 200 from affecting the organic layer 500 directly below the first electrode 310 and even the metal film layer between the organic layer 500 and the base substrate 01 during the patterning process, and prevent the film layer where the first electrode 310 is located from peeling off, but also eliminate the second covering portion 210 that wraps the edge of the first electrode 310, which is beneficial to prevent the second covering portion 210 from affecting the shape of the first opening 610 in the pixel defining pattern 600 and the shape of the pixel defining portion 630 surrounding the first opening 610, thereby preventing the light-emitting functional layer 330 from being scratched by the mask.

[0204] For example, Fig.17 As shown, the thickness H0 of the pixel defining portion 630 is 0.2 to 0.7 microns. Here, the thickness of the pixel defining portion 630 refers to the thickness of the pixel defining portion 630 at a position where the surface of the side away from the substrate 01 is a relatively flat surface. After the inorganic layer 200 is formed on the pixel defining pattern 600, the process of patterning the inorganic layer 200 to form the inorganic defining layer 410 will cause a certain etching of the pixel defining portion 630, resulting in the thickness of the pixel defining portion 630 being thinned. For example, the thickness of the pixel defining portion 630 in this example is less than Figure 3 and Fig. 9 The thickness of the pixel defining portion 630 in the display substrate is shown.

[0205] In some examples, such as Fig.19 As shown, the inorganic layer 200 includes an inorganic cover layer 220 covering the side of the first opening 610. In the display substrate provided in this example, by setting the inorganic layer 200 to include the inorganic cover layer 220 covering the side of the pixel defining portion 630 surrounding the first opening 610, it is helpful to prevent the inorganic layer 200 from causing unnecessary etching to the side of the pixel defining portion 630 surrounding the first opening 610 during the process of dry etching to form the inorganic defining layer 410, resulting in affecting the height of the pixel defining portion 630 and the morphology of the slope, which not only easily affects the morphology of the pixel opening, but also may affect the height of the spacer 700, thereby causing the mask to scratch the light-emitting functional layer 330.

[0206] The inorganic cover layer 220 in this example may have the same features as the inorganic cover layer 220 in the above embodiment, and will not be described in detail herein.

[0207] In some examples, such as Fig.17 and Fig.18As shown, the display substrate further includes: a spacer 700, which is located on the side of the first electrode 310 away from the base substrate 01, and the inorganic layer 200 is at least located on the surface of the spacer 700 away from the base substrate 01. For example, the inorganic layer 200 at least covers the surface of the spacer 700 away from the base substrate 01, but is not limited to this. The inorganic layer and the spacer can be in direct contact, and other film layers can also exist between the two. By arranging the inorganic layer 200 on the spacer 700, it is prevented that the inorganic layer 200 affects the shape and height of the spacer 700 during the patterning process, thereby causing the mask supported by the spacer 700 to scratch the light-emitting functional layer 330.

[0208] The relative positional relationship between the spacer 700 and the inorganic layer 200 in this example may be the same as the relative positional relationship between the spacer 700 and the inorganic layer 200 in the above embodiment, and will not be described in detail herein.

[0209] Another embodiment of the present disclosure provides a method for manufacturing a display substrate, the manufacturing method comprising: after patterning a first electrode 310, forming an inorganic layer 200 on a side of the first electrode 310 away from the base substrate 01, patterning the inorganic layer 200 to form a structure covering the side of the isolation column 100, an inorganic limiting layer 410 in contact with the organic layer 500, and a second covering portion 210 covering the edge of the first electrode 310, the structure formed is as follows Figures 3 to 9 shown.

[0210] Another embodiment of the present disclosure provides a method for manufacturing a display substrate, the method comprising: after patterning a pixel defining pattern 600, forming an inorganic layer 200 on a side of a pixel defining portion 630 away from a base substrate 01, in a first opening 610 and a second opening 620, and patterning an inorganic defining layer 410 in contact with an organic layer 500 exposed by the second opening 620 and a structure covering a side of an isolation column 100, the structure formed is as follows: Figure 3 , Fig.10 For example, the inorganic layer 200 can also be patterned to form Fig.12 The structure of the part covering the spacer 700 is shown. For example, the inorganic layer 200 can also be patterned to form the following Fig.14 An inorganic capping layer 220 is shown.

[0211] Another embodiment of the present disclosure provides a method for manufacturing a display substrate, the method comprising: after patterning a pixel defining pattern 600, forming an inorganic layer 200 in a first opening 610 on a side of a pixel defining portion 630 away from a base substrate 01, and patterning an inorganic defining layer 410 in contact with the pixel defining portion 630 and a structure covering a side of an isolation column 100, forming a structure as shown in FIG. Figure 3 , Fig.15 For example, the inorganic layer 200 can also be patterned to form a structure as shown in FIG. Fig.17 The structure of the part covering the spacer 700 is shown. For example, the inorganic layer 200 can also be patterned to form the following Fig.19 An inorganic capping layer 220 is shown.

[0212] The present disclosure is not limited to the above-mentioned method for patterning the inorganic layer 200 to form a Figure 3 The structure covering the side of the isolation column 100 shown, such as the non-hole area A22, may not be provided with the wrapping structure formed by patterning the inorganic layer 200.

[0213] Fig. 20 FIG. 1 is a schematic block diagram of a display device according to another embodiment of the present disclosure. Fig. 20 As shown, a display device provided by an embodiment of the present disclosure includes any one of the above-mentioned display substrates.

[0214] For example, the display substrate provided in the embodiment of the present disclosure may be an organic light emitting diode display substrate. For example, the display substrate may be provided with a color filter layer or may not be provided with a color filter layer.

[0215] For example, the display device further includes a cover plate located on the light emitting side of the display substrate.

[0216] For example, the display device may be a display device such as an organic light emitting diode display device, as well as any product or component with a display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, navigator, etc., which includes the display device, but the present embodiment is not limited thereto.

[0217] There are a few points to note:

[0218] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can refer to the general design.

[0219] (2) In the absence of conflict, features in the same embodiment or in different embodiments of the present disclosure may be combined with each other.

[0220] The above description is merely an exemplary embodiment of the present disclosure and is not intended to limit the protection scope of the present disclosure. The protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: A substrate, comprising a first area and a second area, wherein the first area surrounds at least a portion of the second area, the first area comprises a display area, and the second area comprises a hole area and a non-hole area surrounding the hole area; A plurality of circles of isolation columns are located in a non-hole area on the substrate and surround the hole area; an inorganic layer, located on the substrate, The isolation column at least comprises a first isolation layer and a second isolation layer which are stacked, the second isolation layer is located on a side of the first isolation layer away from the base substrate, an edge of the second isolation layer protrudes relative to an edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; The inorganic layer wraps around the side surfaces of the first isolation layer and the second isolation layer of at least one circle of isolation columns.

2. The display substrate according to claim 1, wherein: The display area includes a plurality of sub-pixels, each of which includes a first electrode, a light-emitting functional layer, and a second electrode that are stacked, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer includes a plurality of film layers; The display substrate comprises a limiting structure, which is located between adjacent sub-pixels and is configured to separate at least one layer of the light-emitting functional layer; The defining structure includes an inorganic defining layer, and the inorganic defining layer is a structure in which the inorganic layer is located between adjacent sub-pixels.

3. The display substrate according to claim 2, further comprising: an organic layer, located between the first electrode and the base substrate, Wherein, the inorganic limiting layer is in contact with a surface of the organic layer which is away from the base substrate.

4. The display substrate according to claim 2, further comprising: A pixel defining pattern is located on a side of the first electrode away from the substrate. The pixel defining pattern includes a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, and the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; The inorganic defining layer is in contact with at least one surface of the pixel defining portion away from the base substrate.

5. The display substrate according to claim 3, further comprising: A pixel defining pattern is located on a side of the first electrode away from the substrate. The pixel defining pattern includes a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, and the plurality of second openings are configured to expose at least a portion of the defining structure.

6. The display substrate according to claim 5, wherein: The limiting structure also includes at least one first protrusion in the organic layer that contacts the surface of the inorganic limiting layer, and the angle between the side of the first protrusion and the first surface of the organic layer other than the first protrusion and away from the base substrate is 80 to 110 degrees, and the first surface is roughly parallel to the base substrate.

7. The display substrate according to claim 4, wherein: The defining structure also includes at least one second protrusion in the pixel defining portion that contacts the surface of the inorganic defining layer, and the angle between the side surface of the second protrusion and the second surface of the pixel defining portion other than the second protrusion and away from the base substrate is 80 to 110 degrees, and the second surface is roughly parallel to the base substrate.

8. The display substrate according to claim 3, wherein: The inorganic layer covers at least a portion of the edge of the first electrode in the sub-pixel.

9. The display substrate according to claim 3 or 4, wherein: In a direction perpendicular to the base substrate, the first electrode does not overlap with the inorganic layer.

10. The display substrate according to claim 4 or 5, wherein: The inorganic layer includes an inorganic cover layer covering sides of the first opening.

11. The display substrate according to claim 3, further comprising: A spacer is located on a side of the inorganic layer away from the substrate. The orthographic projection of the spacer on the base substrate is completely located within the orthographic projection of the inorganic layer on the base substrate.

12. The display substrate according to claim 3 or 4, further comprising: a spacer, located on a side of the first electrode away from the substrate, Wherein, the inorganic layer is at least located on the surface of the spacer which is away from the base substrate.

13. The display substrate according to claim 8, wherein: Each sub-pixel also includes a pixel circuit, which includes a light-emitting control transistor. The first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and the inorganic layer and the via do not overlap in a direction perpendicular to the base substrate.

14. The display substrate according to claim 13, wherein: The first electrode includes a main body portion and a connecting portion connected to each other, the main body portion overlaps with the light-emitting area of ​​the sub-pixel, the connecting portion is electrically connected to the light-emitting control transistor through the via hole, and the inorganic layer covers edges of the main body portion and the connecting portion.

15. The display substrate according to claim 6, wherein: The pixel defining portion includes a first covering portion that covers a surface of the inorganic defining layer on a side away from the base substrate, and an edge of the inorganic defining layer protrudes relative to an edge of the first covering portion.

16. The display substrate according to claim 15, wherein: The edge of the inorganic limiting layer protrudes relative to the edge of the first covering portion by a first protrusion dimension, and the edge of the inorganic limiting layer protrudes relative to the edge of the first protrusion by a second protrusion dimension, and the first protrusion dimension is not less than the second protrusion dimension.

17. The display substrate according to claim 5, wherein: The portion of the inorganic layer covering the edge of the first electrode is a second covering portion, and the orthographic projection of the second covering portion on the base substrate is completely located within the orthographic projection of the pixel defining portion on the base substrate.

18. The display substrate according to claim 6, wherein: A circle of edges of the first protrusions are all retracted relative to a circle of edges of the inorganic limiting layer.

19. The display substrate according to claim 4, wherein: The thickness of the pixel defining portion is 0.2 to 0.7 micrometers.

20. The display substrate according to claim 6, wherein: The height of the first protrusion is greater than the thickness of the first electrode.

21. A display substrate, comprising: substrate substrate; A plurality of sub-pixels are located on the base substrate, each of the sub-pixels comprises a first electrode, a light-emitting functional layer and a second electrode which are stacked, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprises a plurality of film layers; a pixel defining pattern located at a side of the first electrode away from the base substrate, the pixel defining pattern comprising a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings being configured to expose the first electrodes of the plurality of sub-pixels; An inorganic layer, located on the substrate; an organic layer, located between the inorganic layer and the substrate, The display substrate includes a defining structure, the second opening is configured to expose at least part of the defining structure, the defining structure includes an inorganic defining layer where the inorganic layer is located between adjacent sub-pixels and at least one protrusion in the organic layer that contacts a surface of the inorganic defining layer, and the defining structure is configured to separate at least one layer of the light-emitting functional layer; The inorganic layer covers at least a portion of the edge of the first electrode in the sub-pixel.

22. The display substrate according to claim 21, wherein: Each sub-pixel also includes a pixel circuit, which includes a light-emitting control transistor. The first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and the inorganic layer and the via do not overlap in a direction perpendicular to the base substrate.

23. A display substrate, comprising: substrate substrate; A plurality of sub-pixels are located on the base substrate, each of the sub-pixels comprises a first electrode, a light-emitting functional layer and a second electrode which are stacked, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprises a plurality of film layers; a pixel defining pattern located at a side of the first electrode away from the base substrate, the pixel defining pattern comprising a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings being configured to expose the first electrodes of the plurality of sub-pixels; An inorganic layer, located on the substrate; an organic layer, located between the inorganic layer and the substrate, The display substrate includes a defining structure, the second opening is configured to expose at least part of the defining structure, the defining structure includes an inorganic defining layer where the inorganic layer is located between adjacent sub-pixels and at least one protrusion in the organic layer that contacts a surface of the inorganic defining layer, and the defining structure is configured to separate at least one layer of the light-emitting functional layer; In a direction perpendicular to the base substrate, the inorganic layer does not overlap with the first electrode.

24. A display substrate, comprising: substrate substrate; A plurality of sub-pixels are located on the base substrate, each of the sub-pixels comprises a first electrode, a light-emitting functional layer and a second electrode which are stacked, the first electrode is located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprises a plurality of film layers; a pixel defining pattern, located at a side of the first electrode away from the base substrate, the pixel defining pattern comprising a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, the plurality of first openings being configured to expose the first electrodes of the plurality of sub-pixels; an inorganic layer, located on a side of the pixel defining portion away from the base substrate, Wherein, the display substrate comprises a limiting structure, which is located between adjacent sub-pixels and is configured to separate at least one layer of the light-emitting functional layer; The defining structure includes an inorganic defining layer where the inorganic layer is located between adjacent sub-pixels, and the inorganic defining layer is in contact with at least one surface of the pixel defining portion away from the base substrate.

25. The display substrate according to claim 24, wherein: The defining structure also includes at least one protrusion in the pixel defining portion that contacts the surface of the inorganic defining layer, and the angle between the side of the protrusion and the surface of the pixel defining portion other than the protrusion and away from the base substrate is 80 to 110 degrees, and the surface is parallel to the base substrate.

26. The display substrate according to claim 24, wherein: In a direction perpendicular to the base substrate, the first electrode does not overlap with the inorganic layer.

27. The display substrate according to claim 24, wherein: The inorganic layer includes an inorganic cover layer covering sides of the first opening.

28. The display substrate according to claim 24, further comprising: a spacer, located on a side of the first electrode away from the substrate, Wherein, the inorganic layer is at least located on the surface of the spacer which is away from the base substrate.

29. A display device comprising the display substrate according to any one of claims 1 to 28.

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