Display panel, manufacturing method thereof and display device

Abstract

The invention provides a display panel, a manufacturing method thereof and a display device, and the manufacturing method comprises the steps: providing a display backboard which comprises a substrate, a light-emitting unit and a packaging layer; an optical layer pattern is formed on the packaging layer, a plurality of opening areas are defined by the optical layer pattern, and the opening areas are used for the light emitting unit to emit light; forming a photoresist layer on the optical layer pattern, patterning the photoresist layer to form a photoresist pattern, and filling the opening region with the photoresist pattern; a black matrix layer is formed on the photoresist pattern, the black matrix layer is subjected to composition to form a black matrix, and the orthographic projection of the black matrix on the display backboard is not overlapped with the orthographic projection of the photoresist pattern on the display backboard; stripping the photoresist pattern; the refractive index of the light filtering layer pattern is larger than that of the optical layer pattern, the optical layer pattern and the light filtering layer pattern form a light gathering structure, and the light gathering structure enables light emitted by the light emitting units towards the two sides to be gathered towards the middle area.

Description

Technical Field

[0001] The embodiments of the present invention relate to the field of display technology, and in particular to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] With the rapid development of the display industry, consumers have increasingly stringent requirements on the power consumption of display devices. The EIC solution, namely COE (Color filter on TFE) + EES (External Extraction Structure), has gradually become a trend. Among them, the COE solution is the mainstream technology to replace POL (polarizer) and reduce power consumption, and the EES solution can improve the front light output of the display device. The EIC solution integrates the COE and EES solutions, so that the power consumption of the display device is better reduced. However, in the EIC solution, the design of placing the BM (black matrix) process after the EOC Pattern (low refractive index optical layer pattern) of the EES makes it easy for the BM material to remain at the EOC deep pit position, causing poor process, thus affecting the display effect of the display device. Summary of the invention

[0003] The embodiments of the present invention provide a display panel and a manufacturing method thereof, and a display device, which are used to solve the problem in the existing EIC solution that the BM process is placed after the EOC Pattern design of the EES, resulting in the BM material easily remaining at the EOC deep pit position, causing process defects, thereby affecting the display effect of the display device.

[0004] In order to solve the above-mentioned technical problems, the present invention is achieved as follows:

[0005] In a first aspect, an embodiment of the present invention provides a method for manufacturing a display panel, comprising:

[0006] A display backplane is provided, the display backplane comprising a base substrate, a plurality of light-emitting units formed on the base substrate, and an encapsulation layer for encapsulating the light-emitting units;

[0007] forming an optical layer pattern on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light;

[0008] forming a photoresist layer on the optical layer pattern, and patterning the photoresist layer to form a photoresist pattern, wherein the photoresist pattern fills the opening area;

[0009] Forming a black matrix layer on the photoresist pattern, and patterning the black matrix layer to form a black matrix, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the photoresist pattern on the base substrate;

[0010] Stripping the photoresist pattern;

[0011] A filter layer pattern is formed, the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, the optical layer pattern and the filter layer pattern constitute a light-concentrating structure, and the light-concentrating structure makes the light diverging from the light-emitting unit to both sides converge to the middle area.

[0012] Optionally, patterning the photoresist layer to form a photoresist pattern includes: exposing the photoresist layer using a first mask, and developing the exposed photoresist layer to obtain the photoresist pattern;

[0013] The black matrix layer is patterned to form a black matrix, comprising: exposing the black matrix layer using the first mask, and developing the exposed black matrix layer to obtain the black matrix;

[0014] The photoresist layer is made of positive photosensitive material, and the black matrix layer is made of negative photosensitive material.

[0015] Alternatively, the material used for the photoresist layer is a negative photosensitive material, and the material used for the black matrix layer is a positive photosensitive material.

[0016] Optionally, the stripping of the photoresist pattern includes:

[0017] When the photoresist pattern is stripped off, a small amount of photoresist remains at the bottom of the side wall of the black matrix, forming a photoresist gentle slope pattern for smoothing the side wall slope of the black matrix.

[0018] Optionally, patterning the photoresist layer to form a photoresist pattern includes: exposing the photoresist layer using a second mask, and developing the exposed photoresist layer to obtain the photoresist pattern;

[0019] The black matrix layer is patterned to form a black matrix, including: exposing the black matrix layer using a first mask, and developing the exposed black matrix layer to obtain the black matrix.

[0020] Optionally, providing a display backplane includes:

[0021] providing a substrate base plate;

[0022] A driving circuit layer, a pixel definition layer, a light emitting unit and a packaging layer are formed on the base substrate to obtain the display backplane.

[0023] Optionally, before forming the optical layer pattern on the encapsulation layer, the method further includes:

[0024] forming a touch layer pattern on the display back panel, wherein the touch layer pattern includes a touch electrode pattern and a bridge pattern for overlapping the touch electrode pattern;

[0025] Wherein, the optical layer pattern covers the touch electrode pattern.

[0026] In a second aspect, an embodiment of the present invention provides a display panel, which is manufactured by the manufacturing method of the display panel as described in the first aspect above, and the display panel includes:

[0027] A display backplane, comprising a base substrate, a plurality of light-emitting units arranged on the base substrate, and an encapsulation layer for encapsulating the light-emitting units;

[0028] An optical layer pattern, disposed on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light;

[0029] A black matrix layer is disposed on a side of the optical layer pattern away from the display backplane, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the opening area on the base substrate;

[0030] A filter layer pattern, wherein the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, and the optical layer pattern and the filter layer pattern form a light-concentrating structure, and the light-concentrating structure makes the light diverging to both sides of the light-emitting unit converge to the middle area.

[0031] Optionally, the display panel further includes: a photoresist gentle slope pattern, which is arranged at the bottom of the side wall of the black matrix and is used to smooth the slope of the side wall of the black matrix.

[0032] Optionally, the display panel further includes: a touch layer pattern, arranged on a side of the optical layer pattern close to the display backplane, the touch layer pattern including a touch electrode pattern and a bridging pattern for overlapping the touch electrode pattern, and the touch electrode pattern is covered by the optical layer pattern.

[0033] In a third aspect, an embodiment of the present invention provides a display device, comprising the display panel as described in the first aspect.

[0034] In an embodiment of the present invention, after forming the optical layer pattern of the EES structure and before forming the black matrix of the COE structure, a photoresist pattern is formed to fill the deep pits formed by the optical layer pattern. After forming the black matrix, the photoresist pattern is stripped to prevent the black matrix from remaining in the deep pits formed by the optical layer pattern, thereby improving the process yield and further improving the display effect of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Various other advantages and benefits will become apparent to those of ordinary skill in the art by reading the detailed description of the preferred embodiments below. The accompanying drawings are only for the purpose of illustrating the preferred embodiments and are not to be considered as limiting the present invention. Moreover, the same reference symbols are used throughout the accompanying drawings to represent the same components. In the accompanying drawings:

[0036] Figure 1 A schematic diagram of a process of manufacturing a display panel in the related art;

[0037] Figure 2 is a schematic flow chart of a method for manufacturing a display panel according to an embodiment of the present invention;

[0038] Figure 3 is a schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present invention;

[0039] Figure 4-Figure 9 A schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present invention;

[0040] Fig.10 FIG. 4 is a schematic diagram of the focusing principle of the focusing structure in the display panel according to an embodiment of the present invention. DETAILED DESCRIPTION

[0041] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0042] Please refer to Figure 1 , Figure 1 The figure is a flow chart of a method for manufacturing a display panel in the related art, and the manufacturing method includes:

[0043] Pre-sequence process: comprising forming a display backplane, wherein the display backplane comprises a base substrate, a plurality of light emitting units formed on the base substrate, and an encapsulation layer for encapsulating the light emitting units;

[0044] TMB MASK: used to form the touch layer pattern.

[0045] EOC Coater: Coating the EOC layer.

[0046] EOC MASK: Patterning the EOC layer to form an EOC pattern of the EES structure.

[0047] BM Coater: Apply black matrix (BM) material to form a BM layer. The height of the EOC pattern is relatively large, and the opening area of ​​the EOC pattern needs to be filled when applying the black matrix material.

[0048] BM MASK (mask): The black matrix of the COE structure is formed by patterning the black matrix layer. When the black matrix layer is patterned, the black matrix layer is exposed through a mask, and the black matrix material in the opening area of ​​the EOC pattern is cleaned through a developing process. Due to the large height of the EOC pattern, the black matrix material is easy to remain in the opening area (deep pit) of the EOC pattern.

[0049] RGB: The filter layer pattern that forms the COE structure.

[0050] COC (Contour Layer): forms a flat layer.

[0051] It can be seen from the above process that placing the BM process of the COE structure after the design of the EOC pattern of the EES results in that the BM material is easily left at the EOC deep pit position, causing process defects, thus affecting the display effect of the display device.

[0052] To solve the above problems, please refer to Figure 2 and Figure 3 An embodiment of the present invention provides a method for manufacturing a display panel, comprising:

[0053] Step S11: providing a display backplane, wherein the display backplane comprises a base substrate, a plurality of light-emitting units formed on the base substrate, and an encapsulation layer for encapsulating the light-emitting units;

[0054] Right now Figure 2 The preceding process in .

[0055] In the embodiment of the present invention, the base substrate may be a rigid substrate, such as a glass substrate, or a flexible substrate, such as a PI (polyimide) substrate.

[0056] In the embodiment of the present invention, optionally, the plurality of light-emitting units may include light-emitting units of multiple colors, for example, a red (R) light-emitting unit, a green (G) light-emitting unit, and a blue (B) light-emitting unit. The film layer structure of the light-emitting unit may include an anode, a light-emitting layer, and a cathode.

[0057] In the embodiment of the present invention, optionally, the encapsulation layer may be a thin film encapsulation layer (Thin Film Encapsulation, TFE), which may include at least one inorganic encapsulation layer and / or at least one organic encapsulation layer.

[0058] Step S12: forming an optical layer pattern on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light;

[0059] In the embodiment of the present invention, the optical layer pattern, namely the optical layer pattern of EES (External Extraction Structure), may also be referred to as EOC Pattern (low refractive index optical pattern).

[0060] Right now Figure 2 EOC Coater (coating) and EOC MASK. Among them, EOC Coater (coating) refers to coating the EOC layer, and EOC MASK refers to using a mask for forming an EOC pattern to expose and develop the EOC layer to form an EOC pattern.

[0061] Step S13: forming a photoresist (PR) layer on the optical layer pattern, and patterning the photoresist layer to form a photoresist pattern, wherein the photoresist pattern fills the opening area;

[0062] Right now Figure 2 PR Coater (coating) and BM MASK in it. BM MASK refers to using a BM mask to expose and develop the coated photoresist layer to form a photoresist pattern.

[0063] Step S14: forming a black matrix (BM) layer on the photoresist pattern, and patterning the black matrix layer to form a black matrix, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the photoresist pattern on the base substrate;

[0064] Right now Figure 2 BM Coater (coating) and BM MASK. Among them, BM Coater (coating) refers to coating the BM layer, and BM MASK refers to using a mask for forming a BM pattern to expose and develop the BM layer to form a BM pattern (ie, a black matrix).

[0065] In some embodiments, after the black matrix is ​​formed, the method may further include: heating and curing the formed black matrix.

[0066] Step S15: stripping the photoresist pattern;

[0067] Right now Figure 2PR Strip (stripping) in.

[0068] Step S16: forming a filter layer pattern, wherein the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, and the optical layer pattern and the filter layer pattern constitute a light-concentrating structure, and the light-concentrating structure makes the light diverging from the light-emitting unit to both sides converge to the middle area.

[0069] Right now Figure 2 RGB in.

[0070] In an embodiment of the present invention, the filter layer pattern may include filter layer patterns of multiple colors, corresponding to the colors of the light-emitting units, and the filter layer pattern is used to filter light of other colors except the light of the specified color. For example, the light-emitting unit includes a red (R) light-emitting unit, a green (G) light-emitting unit, and a blue (B) light-emitting unit, then the filter layer pattern includes a red filter layer pattern, a green filter layer pattern, and a blue filter layer pattern. The red filter layer pattern is used to filter light of other colors except red light, the green filter layer pattern is used to filter light of other colors except green light, and the blue filter layer pattern is used to filter light of other colors except blue light. The red filter layer pattern is set corresponding to the red light-emitting unit, the green filter layer pattern is set corresponding to the green light-emitting unit, and the blue filter layer pattern is set corresponding to the blue light-emitting unit.

[0071] Optionally, the orthographic projection of the effective display area of ​​the light emitting unit on the base substrate is located within the orthographic projection area of ​​the filter layer pattern on the display backplane. The effective display area of ​​the light emitting unit generally refers to the overlapping area of ​​the anode, light emitting layer and cathode of the light emitting unit.

[0072] In the embodiment of the present invention, the filter layer pattern and the black matrix form a COE (Color filter on TFE, filter on the packaging layer) structure, and at the same time, the filter layer pattern and the optical layer pattern form an EES structure, also known as a focusing structure, please refer to Fig.10 The light emitted from the light-emitting unit to both sides can enter from the optical layer pattern. Since the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, the light is refracted at the interface between the optical layer pattern and the filter layer pattern and converges to the middle area (also called the forward direction of the light-emitting unit).

[0073] In an embodiment of the present invention, after forming the optical layer pattern of the EES structure and before forming the black matrix of the COE structure, a photoresist pattern is formed to fill the deep pits formed by the optical layer pattern. After forming the black matrix, the photoresist pattern is stripped to prevent the black matrix from remaining in the deep pits formed by the optical layer pattern, thereby improving the process yield and further improving the display effect of the display panel.

[0074] In some embodiments, optionally, in step S13, patterning the photoresist layer to form a photoresist pattern includes: exposing the photoresist layer using a first mask, and developing the exposed photoresist layer to obtain the photoresist pattern. In step S14, patterning the black matrix layer to form a black matrix includes: exposing the black matrix layer using the first mask, and developing the exposed black matrix layer to obtain the black matrix; wherein the material used in the photoresist layer is a positive photosensitive material, and the material used in the black matrix layer is a negative photosensitive material; or, the material used in the photoresist layer is a negative photosensitive material, and the material used in the black matrix layer is a positive photosensitive material.

[0075] Among them, the positive photosensitive material refers to the part that is not blocked by the mask (exposed to light) will dissolve in the developer, and the part blocked by the mask (not exposed to light) will not dissolve in the developer. The negative photosensitive material is just the opposite. The negative photosensitive material refers to the part that is blocked by the mask (not exposed to light) will dissolve in the developer, and the part that is not blocked by the mask (exposed to light) will not dissolve in the developer.

[0076] In the embodiment of the present invention, the first mask used for making a black matrix is ​​used to make a photoresist pattern, thereby saving process costs.

[0077] In some embodiments, the stripping of the photoresist pattern includes: when the photoresist pattern is stripped, a small amount of photoresist remains at the bottom of the side wall of the black matrix to form a photoresist gentle slope pattern for smoothing the side wall slope of the black matrix.

[0078] Since a small amount of photoresist remains at the bottom of the side wall of the black matrix, the side wall slope of the black matrix becomes gentle, making the black matrix and the subsequently formed filter layer pattern more firmly combined, preventing the risk of peeling of the black matrix and the filter layer pattern. In addition, the residual photoresist does not affect the display effect.

[0079] In some embodiments, optionally, the step S13 of patterning the photoresist layer to form a photoresist pattern includes: exposing the photoresist layer using a second mask plate, and developing the exposed photoresist layer to obtain the photoresist pattern; the step S14 of patterning the black matrix layer to form a black matrix includes: exposing the black matrix layer using a first mask plate, and developing the exposed black matrix layer to obtain the black matrix.

[0080] In this embodiment, a separate mask is used to form a photoresist pattern.

[0081] In some embodiments, optionally, providing a display backplane includes:

[0082] Step S111: providing a substrate;

[0083] Step S112: forming a driving circuit layer, a pixel definition layer, a light-emitting unit and a packaging layer on the base substrate to obtain the display backplane.

[0084] In some embodiments, optionally, before forming the optical layer pattern on the encapsulation layer, the method further includes: forming a touch layer pattern on the display backplane, the touch layer pattern including a touch electrode pattern (TMB layer (touch metal b, touch layer b), also known as metal2) and a bridge pattern (TMA (touch metal a, touch layer a), also known as metal1) for overlapping the touch electrode pattern; wherein the optical layer pattern covers the touch electrode pattern. The touch electrode pattern may further include a Tx (transmitting) electrode pattern and an Rx (sensing) electrode pattern.

[0085] In some embodiments, optionally, after step S16 (forming the filter layer pattern), the method further includes: forming a planarization layer (COC).

[0086] Please refer to Figure 4-Figure 9 , Figure 4-Figure 9 FIG. 1 is a schematic diagram of a method for manufacturing a display panel according to another embodiment of the present invention. The method comprises:

[0087] Step S21: providing a base substrate, and forming a driving circuit layer on the base substrate, wherein the driving circuit layer is used to drive the light-emitting unit to emit light, and forming a planar layer (PLN) 11 on the driving circuit layer.

[0088] Step S22: Please refer to Figure 4 An anode (Anode) 12, a pixel definition layer (Black PDL) 13, a light-emitting layer 14 and a cathode (CTD) 15 are formed on the flat layer 11, wherein the anode 12, the light-emitting layer 14 and the cathode 15 constitute a light-emitting unit, and an encapsulation layer (TFE) 16 is formed on the light-emitting unit.

[0089] Step S23: Please refer to Figure 4 A touch layer pattern is formed on the encapsulation layer, the touch layer pattern including a touch electrode pattern (TMB pattern) 17 and a bridge pattern (TMA pattern) for overlapping the touch electrode pattern. An EOC pattern 18 is formed on the touch layer pattern, wherein the EOC pattern 18 defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light.

[0090] Step S24: Please refer to Figure 4 , coating a photoresist on the EOC pattern 18 to form a photoresist layer 19;

[0091] Step S25: Please refer to Figure 5 The photoresist layer 19 is exposed and developed using a first mask for forming a BM to form a photoresist pattern 19', and the photoresist pattern 19' is filled in the opening area of ​​the EOC pattern.

[0092] Step S26: Please refer to Figure 6 , a black matrix material is coated on the photoresist pattern 19' to form a black matrix layer 110; since the opening area of ​​the EOC pattern is filled with the photoresist pattern 19', there will be no black matrix material in the opening area of ​​the EOC pattern, thereby avoiding the black matrix material remaining in the opening area (deep pit) of the EOC pattern.

[0093] Step S27: Please refer to Figure 7 The black matrix layer 110 is exposed and developed using a first mask for forming BM to form a black matrix 110', and the orthographic projection of the black matrix 110' on the base substrate does not overlap with the orthographic projection of the photoresist pattern 19' on the base substrate.

[0094] Step S28: Please refer to Figure 8 , the photoresist pattern 19' is stripped, and a small amount of photoresist remains at the bottom of the side wall of the black matrix 110' during stripping, forming a photoresist gentle slope pattern for smoothing the side wall slope of the black matrix. Since a small amount of photoresist remains at the bottom of the side wall of the black matrix, the side wall slope of the black matrix becomes gentle, so that the black matrix and the subsequently formed filter layer pattern are more firmly combined, and the risk of peeling of the black matrix and the filter layer pattern is prevented.

[0095] Step S29: Please refer to Fig. 9, forming a filter layer pattern 111, and a flat layer (COC) 112 for covering the filter layer pattern 111. The refractive index of the filter layer pattern 111 is greater than the refractive index of the EOC pattern 18, and the EOC pattern 18 and the filter layer pattern 111 constitute a light-concentrating structure, which makes the light emitted from the light-emitting unit to both sides converge to the middle area.

[0096] In an embodiment of the present invention, after forming the optical layer pattern of the EES structure and before forming the black matrix of the COE structure, a photoresist pattern is formed to fill the deep pits formed by the optical layer pattern. After forming the black matrix, the photoresist pattern is stripped to prevent the black matrix from remaining in the deep pits formed by the optical layer pattern, thereby improving the process yield and further improving the display effect of the display panel.

[0097] An embodiment of the present invention further provides a display panel, which is manufactured by the manufacturing method of the display panel described in any of the above embodiments, and the display panel includes:

[0098] A display backplane, comprising a base substrate, a plurality of light-emitting units arranged on the base substrate, and an encapsulation layer for encapsulating the light-emitting units;

[0099] An optical layer pattern, disposed on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light;

[0100] A black matrix layer is disposed on a side of the optical layer pattern away from the display backplane, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the opening area on the base substrate;

[0101] A filter layer pattern, wherein the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, and the optical layer pattern and the filter layer pattern form a light-concentrating structure, and the light-concentrating structure makes the light diverging to both sides of the light-emitting unit converge to the middle area.

[0102] In the embodiment of the present invention, the base substrate may be a rigid substrate, such as a glass substrate, or a flexible substrate, such as a PI (polyimide) substrate.

[0103] In the embodiment of the present invention, optionally, the plurality of light-emitting units may include light-emitting units of multiple colors, for example, a red (R) light-emitting unit, a green (G) light-emitting unit, and a blue (B) light-emitting unit. The film layer structure of the light-emitting unit may include an anode, a light-emitting layer, and a cathode.

[0104] In the embodiment of the present invention, optionally, the encapsulation layer may be a thin film encapsulation layer (Thin Film Encapsulation, TFE), which may include at least one inorganic encapsulation layer and / or at least one organic encapsulation layer.

[0105] In the embodiment of the present invention, the optical layer pattern is an EES (External Extraction Structure) optical layer pattern, which can also be called an EOC Pattern (low refractive index optical pattern). Optionally, the display panel further includes: a photoresist gentle slope pattern, which is arranged at the bottom of the side wall of the black matrix to smooth the side wall slope of the black matrix.

[0106] In an embodiment of the present invention, the filter layer pattern may include filter layer patterns of multiple colors, corresponding to the colors of the light-emitting units, and the filter layer pattern is used to filter light of other colors except the light of the specified color. For example, the light-emitting unit includes a red (R) light-emitting unit, a green (G) light-emitting unit, and a blue (B) light-emitting unit, then the filter layer pattern includes a red filter layer pattern, a green filter layer pattern, and a blue filter layer pattern. The red filter layer pattern is used to filter light of other colors except red light, the green filter layer pattern is used to filter light of other colors except green light, and the blue filter layer pattern is used to filter light of other colors except blue light. The red filter layer pattern is set corresponding to the red light-emitting unit, the green filter layer pattern is set corresponding to the green light-emitting unit, and the blue filter layer pattern is set corresponding to the blue light-emitting unit.

[0107] Optionally, the orthographic projection of the effective display area of ​​the light emitting unit on the base substrate is located within the orthographic projection area of ​​the filter layer pattern on the display backplane. The effective display area of ​​the light emitting unit generally refers to the overlapping area of ​​the anode, light emitting layer and cathode of the light emitting unit.

[0108] In the embodiment of the present invention, the filter layer pattern and the black matrix form a COE (Color filter on TFE, filter on the packaging layer) structure, and at the same time, the filter layer pattern and the optical layer pattern form an EES structure, also known as a focusing structure, please refer to Fig.10 The light emitted from the light-emitting unit to both sides can enter from the optical layer pattern. Since the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, the light is refracted at the interface between the optical layer pattern and the filter layer pattern and converges to the middle area (also called the forward direction of the light-emitting unit).

[0109] In an embodiment of the present invention, after forming the optical layer pattern of the EES structure and before forming the black matrix of the COE structure, a photoresist pattern is formed to fill the deep pits formed by the optical layer pattern. After forming the black matrix, the photoresist pattern is stripped to prevent the black matrix from remaining in the deep pits formed by the optical layer pattern, thereby improving the process yield and further improving the display effect of the display panel.

[0110] Optionally, the display panel further includes: a touch layer pattern, arranged on a side of the optical layer pattern close to the display backplane, the touch layer pattern including a touch electrode pattern and a bridging pattern for overlapping the touch electrode pattern, and the touch electrode pattern is covered by the optical layer pattern.

[0111] An embodiment of the present invention further provides a display device, comprising the display panel described in any one of the above embodiments.

[0112] Optionally, the display panel may be a mobile phone, a tablet computer, a personal computer, a television, a vehicle-mounted device, etc.

[0113] The embodiments of the present invention are described above in conjunction with the accompanying drawings, but the present invention is not limited to the above-mentioned specific implementation modes, which are merely illustrative rather than restrictive. Under the guidance of the present invention, ordinary technicians in this field can also make many forms without departing from the scope of protection of the present invention and the claims, all of which are within the protection of the present invention.

Claims

1. A method for manufacturing a display panel, characterized in that: include: A display backplane is provided, the display backplane comprising a base substrate, a plurality of light-emitting units formed on the base substrate, and an encapsulation layer for encapsulating the light-emitting units; forming an optical layer pattern on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light; forming a photoresist layer on the optical layer pattern, and patterning the photoresist layer to form a photoresist pattern, wherein the photoresist pattern fills the opening area; Forming a black matrix layer on the photoresist pattern, and patterning the black matrix layer to form a black matrix, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the photoresist pattern on the base substrate; Stripping the photoresist pattern; A filter layer pattern is formed, the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, the optical layer pattern and the filter layer pattern constitute a light-concentrating structure, and the light-concentrating structure makes the light diverging from the light-emitting unit to both sides converge to the middle area.

2. The method for manufacturing a display panel according to claim 1, wherein: The step of patterning the photoresist layer to form a photoresist pattern comprises: exposing the photoresist layer using a first mask, and developing the exposed photoresist layer to obtain the photoresist pattern; The black matrix layer is patterned to form a black matrix, comprising: exposing the black matrix layer using the first mask, and developing the exposed black matrix layer to obtain the black matrix; The photoresist layer is made of positive photosensitive material, and the black matrix layer is made of negative photosensitive material. Alternatively, the material used for the photoresist layer is a negative photosensitive material, and the material used for the black matrix layer is a positive photosensitive material.

3. The method for manufacturing a display panel according to claim 2, wherein: The stripping of the photoresist pattern comprises: When the photoresist pattern is stripped off, a small amount of photoresist remains at the bottom of the side wall of the black matrix, forming a photoresist gentle slope pattern for smoothing the side wall slope of the black matrix.

4. The method for manufacturing a display panel according to claim 1, wherein: The step of patterning the photoresist layer to form a photoresist pattern comprises: exposing the photoresist layer using a second mask, and developing the exposed photoresist layer to obtain the photoresist pattern; The black matrix layer is patterned to form a black matrix, including: exposing the black matrix layer using a first mask, and developing the exposed black matrix layer to obtain the black matrix.

5. The method for manufacturing a display panel according to claim 1, wherein: Providing a display backplane comprises: providing a substrate base plate; A driving circuit layer, a pixel definition layer, a light emitting unit and a packaging layer are formed on the base substrate to obtain the display backplane.

6. The method for manufacturing a display panel according to claim 1, wherein: Before forming the optical layer pattern on the encapsulation layer, the method further comprises: forming a touch layer pattern on the display back panel, wherein the touch layer pattern includes a touch electrode pattern and a bridge pattern for overlapping the touch electrode pattern; Wherein, the optical layer pattern covers the touch electrode pattern.

7. A display panel, characterized in that: The display panel is manufactured by the manufacturing method of the display panel according to any one of claims 1 to 6, and the display panel comprises: A display backplane, comprising a base substrate, a plurality of light-emitting units arranged on the base substrate, and an encapsulation layer for encapsulating the light-emitting units; An optical layer pattern, disposed on the encapsulation layer, wherein the optical layer pattern defines a plurality of opening areas, and the opening areas are used for the light emitting unit to emit light; A black matrix layer is disposed on a side of the optical layer pattern away from the display backplane, wherein the orthographic projection of the black matrix on the base substrate does not overlap with the orthographic projection of the opening area on the base substrate; A filter layer pattern, wherein the refractive index of the filter layer pattern is greater than the refractive index of the optical layer pattern, and the optical layer pattern and the filter layer pattern form a light-concentrating structure, and the light-concentrating structure makes the light diverging to both sides of the light-emitting unit converge to the middle area.

8. The display panel according to claim 7, wherein: Also includes: The photoresist gentle slope pattern is arranged at the bottom of the side wall of the black matrix and is used for smoothing the slope of the side wall of the black matrix.

9. The display panel according to claim 7 or 8, characterized in that: Also includes: The touch layer pattern is arranged on a side of the optical layer pattern close to the display backplane, the touch layer pattern comprises a touch electrode pattern and a bridge pattern for overlapping the touch electrode pattern, and the touch electrode pattern is covered by the optical layer pattern.

10. A display device, characterized in that: Comprising a display panel as described in any one of claims 7 to 9.

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