Display panel, preparation method thereof and display device

Abstract

Embodiments of the present application provide a display panel, a preparation method thereof and a display device to improve the light extraction efficiency of the light emitting side of the display panel. The display panel comprises a substrate, a pixel definition layer located on one side of the substrate, a first light modulation layer located on the side of the pixel definition layer away from the substrate, the orthographic projection of the first light modulation layer on the substrate covering the orthographic projection of the pixel definition layer on the substrate, the first light modulation layer comprising a plurality of hole structures, and a second light modulation layer located on the side of the first light modulation layer away from the substrate, the second light modulation layer filling the hole structures, the refractive index of the second light modulation layer being greater than the refractive index of the first light modulation layer. In this way, the concentration of light emitted by the light emitting unit is enhanced, the light brightness of the light emitting side is improved, the light extraction efficiency of the light emitting side is improved, and the light extraction capability is enhanced.

Description

Technical Field

[0001] This application relates to the field of display technology, specifically to a display panel, its manufacturing method, and a display device. Background Technology

[0002] In active-matrix organic light-emitting diode (AMOLED) products, as different film layers accumulate, the light gradually weakens, resulting in lower light extraction efficiency on the light-emitting side. Summary of the Invention

[0003] In view of this, embodiments of this application provide a display panel, a method for manufacturing the same, and a display device, to improve the light emission efficiency of the light-emitting side of the display panel.

[0004] In a first aspect, embodiments of this application provide a display panel, comprising: a substrate; a pixel definition layer located on one side of the substrate; a first dimming layer located on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, and the first dimming layer includes a plurality of hole structures; and a second dimming layer located on the side of the first dimming layer away from the substrate, wherein the second dimming layer fills the hole structures, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

[0005] Preferably, the pixel definition layer encloses multiple pixel opening regions, and the orthographic projection of the hole structure on the substrate at least covers the orthographic projection of the pixel opening on the substrate; preferably, the hole structure includes a hole, and the orthographic projection of the hole on the substrate covers the orthographic projection of the pixel opening on the substrate; or, the hole structure includes multiple holes spaced apart, and the orthographic projections of the multiple holes on the substrate and the gaps between adjacent holes on the substrate cover the orthographic projection of the pixel opening on the substrate; preferably, the shape of the hole is hexagonal.

[0006] Preferably, the material of the first dimming layer includes inorganic materials; preferably, the first dimming layer includes a graphene crystal film; preferably, the graphene crystal film includes a three-dimensional porous structure; preferably, the pore size of the graphene crystal film is in the range of 1 nm to 20 μm; preferably, the thickness of the first dimming layer is in the range of 1 μm to 1 mm; preferably, the refractive index of the first dimming layer is in the range of 1 to 1.55.

[0007] Preferably, the material of the second dimming layer includes inorganic or organic materials; preferably, the material of the second dimming layer includes porous titanium dioxide.

[0008] Preferably, the pixel definition layer encloses a plurality of pixel openings; the display panel further includes: a light-emitting device layer, the light-emitting device layer including a plurality of light-emitting units, at least a portion of the light-emitting units being located within the pixel openings; preferably, the display panel further includes: an encapsulation layer, the encapsulation layer being located between the pixel definition layer and the first dimming layer; preferably, the display panel further includes a touch layer, the touch layer being located between the encapsulation layer and the first dimming layer.

[0009] Preferably, the display panel further includes a barrier layer located between the first dimming layer and the second dimming layer.

[0010] Preferably, the material of the barrier layer is different from the material of the first dimming layer and the second dimming layer; preferably, the material of the first dimming layer and / or the material of the second dimming layer includes organic materials; preferably, the material of the barrier layer includes silicon nitride.

[0011] Secondly, embodiments of this application also provide a method for fabricating a display panel, for fabricating the aforementioned display panel, the method comprising: providing a substrate; fabricating a pixel definition layer on one side of the substrate; fabricating a first dimming layer on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, the first dimming layer including a plurality of hole structures; and fabricating a second dimming layer on the side of the first dimming layer away from the substrate, the second dimming layer filling the hole structures, the refractive index of the second dimming layer being greater than the refractive index of the first dimming layer.

[0012] Preferably, the first dimming layer comprises a graphene crystal film. The first dimming layer is fabricated on the side of the pixel definition layer away from the substrate, comprising: forming a polyimide precursor layer on the side of the pixel definition layer away from the substrate; and in-situ inducing the polyimide precursor layer using an energy source to obtain the first dimming layer; preferably, the energy source comprises at least one of a high-energy electron beam and a laser; preferably, after providing a substrate and before fabricating the pixel definition layer on one side of the substrate, the method further comprises: fabricating a first electrode layer on the substrate, the first electrode layer comprising a plurality of spaced-apart first electrodes, the pixel definition layer enclosing a plurality of pixel openings, the pixel openings exposing portions of the first electrodes; and fabricating an image on one side of the substrate... After the pixel definition layer is formed, and before the first dimming layer is formed on the side of the pixel definition layer away from the substrate, the method further includes: sequentially forming a light-emitting functional layer and a second electrode layer on the side of the pixel definition layer away from the substrate, wherein the first electrode layer, the light-emitting functional layer, and the second electrode layer constitute a light-emitting device layer, the light-emitting device layer includes a plurality of light-emitting units, at least a portion of which are located within a pixel opening; preferably, after the light-emitting functional layer and the second electrode layer are sequentially formed on the side of the pixel definition layer away from the substrate, and before the first dimming layer is formed on the side of the pixel definition layer away from the substrate, the method further includes: forming an encapsulation layer on the side of the pixel definition layer away from the substrate; and forming a touch layer on the side of the encapsulation layer away from the substrate.

[0013] Thirdly, embodiments of this application also provide a display device, including the aforementioned display panel.

[0014] By using the above technical solution, a first dimming layer and a second dimming layer are provided. The large-angle light emitted by the light-emitting unit enters the second dimming layer through the first dimming layer and then reaches the interface between the second dimming layer and the first dimming layer. The light undergoes total internal reflection at the interface between the second dimming layer and the first dimming layer, converging the light in a direction perpendicular to the substrate. This ensures that the large-angle light can be emitted from the light-emitting side, enhances the concentration of the light emitted by the light-emitting unit, increases the brightness of the light on the light-emitting side, improves the light extraction efficiency of the light-emitting side, and enhances the light extraction capability. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the structure of a display panel provided in one embodiment of this application.

[0016] Figure 2 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application.

[0017] Figure 3 yes Figure 1 A top view of the hole structure in the display panel shown.

[0018] Figure 4 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application.

[0019] Figure 5 yes Figure 4 A top view of the hole structure in the display panel shown.

[0020] Figure 6 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application.

[0021] Figure 7 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application.

[0022] Figure 8 This is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of this application.

[0023] Figure 9 This is a schematic diagram of the structure of a display device provided in an embodiment of this application. Detailed Implementation

[0024] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0025] In AMOLED products, as the film thickness accumulates, the distance from the light-emitting side to the pixel light-emitting unit becomes farther and farther, resulting in a gradual weakening of the light on the light-emitting side and a lower light extraction efficiency.

[0026] This application provides a display panel, a method for manufacturing the same, and a display device to improve the light extraction efficiency of the light-emitting side of the display panel.

[0027] Figure 1 This is a schematic diagram of the structure of a display panel provided in one embodiment of this application. Figure 1 As shown, the display panel includes a substrate 10, a pixel definition layer 20, a light-emitting device layer 30, an encapsulation layer 40, a first dimming layer 50, and a second dimming layer 60.

[0028] The substrate 10 may be an array substrate. The array substrate may be a thin-film transistor (TFT) array substrate. For example, the array substrate may be a low-temperature polysilicon (LTPS) TFT array substrate, an amorphous silicon (a-Si) TFT array substrate, or an oxide TFT array substrate. Preferably, the substrate 10 comprises a rigid substrate or a flexible substrate.

[0029] The pixel definition layer 20 is located on one side of the substrate 10. The pixel definition layer 20 encloses a plurality of pixel openings P1. In the embodiments of this application, the pixel definition layer 20 includes organic or inorganic materials, and this application is not limited thereto. For ease of explanation, Figure 1 Only three pixel openings P1 are shown in the image; it can be understood that the display panel of this application includes multiple pixel openings P1.

[0030] The light-emitting device layer 30 includes a plurality of light-emitting units 300, at least a portion of which is located within a pixel opening P1. Each light-emitting unit 300 includes a first electrode 301, a light-emitting functional unit 302, and a second electrode 303, sequentially stacked along a direction away from the substrate 10. Specifically, the first electrode 301 is located between the substrate 10 and the pixel definition layer 20, with a portion of the first electrode 301 exposed by the pixel opening P1. The light-emitting functional unit 302 is located on the side of the first electrode 301 away from the substrate 10, at least a portion of which covers the exposed first electrode 301. The second electrode 303 is located on the side of the light-emitting functional unit 302 away from the substrate 10, covering the light-emitting functional unit 302. In embodiments of this application, the first electrode 301 may be an anode, and the second electrode 303 may be a cathode; alternatively, the first electrode 301 may be a cathode, and the second electrode 303 may be an anode.

[0031] The light-emitting functional unit 302 includes a hole injection layer, an electron injection layer, a hole transport layer, an electron transport layer, an electron blocking layer, a hole blocking layer, and an electroluminescent layer stacked sequentially. If the first electrode 301 is the anode and the second electrode 303 is the cathode, the light-emitting functional unit 302 can emit light due to the combination of holes provided from the first electrode 301 and electrons provided from the second electrode 303. When a voltage is applied to the anode and cathode, electrons can migrate from the cathode through the electron transport layer to the electroluminescent layer, and holes can migrate from the anode through the hole transport layer to the electroluminescent layer. After electrons and holes meet in the electroluminescent layer, they can form excitons. Under the action of an electric field, the excitons transfer energy to the light-emitting molecules in the electroluminescent layer, causing the light-emitting molecules to emit visible light. This visible light is emitted through the cathode, thereby enabling the light-emitting unit 300 to emit light.

[0032] The encapsulation layer 40 is located on the side of the pixel definition layer 20 away from the substrate 10.

[0033] The first dimming layer 50 is located on the side of the encapsulation layer 40 away from the substrate 10. The first dimming layer 50 includes a plurality of hole structures P2.

[0034] Preferably, the material of the first dimming layer 50 includes an inorganic material. More preferably, the first dimming layer 50 includes a graphene crystal film, which has a three-dimensional porous structure and a pore size ranging from 1 nm to 220 μm. Specifically, the pore size of the graphene crystal film is 1 nm, 50 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 1 μm, 5 μm, 10 μm, 15 μm, 20 μm, etc. The thickness of the first dimming layer 50 or the graphene crystal film ranges from 1 μm to 1 mm. Specifically, the thickness of the first dimming layer 50 is 1 μm, 10 μm, 50 μm, 100 μm, 200 μm, 300 μm, 400 μm, 500 μm, 600 μm, 660 μm, 700 μm, 800 μm, 900 μm, or 1 mm. The refractive index of the first dimming layer 50 ranges from 1 to 1.55. For example, the refractive index of the first dimming layer 50 is 1, 1.2, 1.25, 1.3, 1.35, 1.4, 1.45, 1.5, or 1.55. In this embodiment, the refractive index of the first dimming layer 50 can be adjusted by the thickness of the graphene crystal film, and the thickness of the first dimming layer or the graphene crystal film can be controlled according to the energy source used. For example, the type of energy source or the intensity of the energy source can be changed. By adjusting the thickness and refractive index of graphene crystal films, the requirements of different film structures can be met. Appropriate thickness and refractive index can be selected according to actual conditions, thereby maximizing the light extraction efficiency on the light-emitting side.

[0035] In this embodiment, the pore structure P2 includes the pore structure of a graphene crystal film. In this embodiment, the orthogonal projection of the pore structure P2 onto the substrate 10 at least covers the orthogonal projection of the pixel opening P1 onto the substrate 10. For example... Figure 1 As shown, the orthographic projection range of any hole structure P2 on the substrate 10 coincides with the orthographic projection range of the corresponding pixel opening P1 on the substrate 10. Alternatively, as... Figure 2 As shown, the orthographic projection range of any aperture structure P2 on the substrate 10 is larger than the orthographic projection range of the pixel opening P1 on the substrate 10. This allows more light to undergo total internal reflection at the interface between the first dimming layer 50 and the second dimming layer 60, thus converging the light in a direction perpendicular to the substrate 10 and improving the light extraction efficiency on the light-emitting side. In this embodiment, the cross-sectional shape of the pixel opening P1 and the cross-sectional shape of the aperture structure P2 can be the same or different; this application does not impose any limitations on this.

[0036] Continue to refer to Figure 1 In this embodiment, since the graphene crystal film is a porous structure and there is a certain distance between adjacent light-emitting units, a pore structure P2 may also exist in the non-pixel opening area on the pixel definition layer. This pore structure does not affect the light transmission of the light-emitting unit. It is understood that... Figure 1 The hole structure shown is just an example. The number of hole structures varies depending on the distance between adjacent light-emitting units. For example, the area of ​​non-pixel openings on the pixel definition layer may include 0, 1, 2 or 3 hole structures P2.

[0037] The second dimming layer 60 is located on the side of the first dimming layer 50 away from the substrate 10. The second dimming layer 60 is filled with a plurality of hole structures P2. The refractive index of the second dimming layer 60 is greater than that of the first dimming layer 50.

[0038] In this embodiment, the material of the second dimming layer 60 includes inorganic or organic materials. For example, the material of the second dimming layer 60 includes porous titanium dioxide. When the material of the second dimming layer 60 includes organic materials, metal oxides, such as zirconium oxide, can be added to the organic material to increase the refractive index of the second dimming layer 60.

[0039] In this embodiment, without altering the fabrication process between the substrate 10 and the encapsulation layer 40, the first dimming layer 50 is fabricated on the side of the encapsulation layer 40 away from the substrate 10, simplifying the fabrication process. Furthermore, placing the first dimming layer 50 on the side of the encapsulation layer 40 away from the substrate 10 avoids the loss of light emitted by the light-emitting unit 300 that deviates from the direction perpendicular to the substrate 10 due to excessive distance between the first dimming layer 50, the second dimming layer 60, and the light-emitting unit 300, thus preventing light loss as it cannot pass through the first dimming layer 40. This further enhances the light extraction efficiency on the light-emitting side. Secondly, by providing the first dimming layer 50 and the second dimming layer 60, large-angle light emitted by the light-emitting unit 300 can undergo total internal reflection at the interface of the first dimming layer 50 and the second dimming layer 60, concentrating the light in a direction perpendicular to the substrate. This ensures that large-angle light can exit from the light-emitting side, enhancing the concentration of light emitted by the light-emitting unit, increasing the brightness of the light on the light-emitting side, improving the light extraction efficiency on the light-emitting side, and enhancing the light extraction capability. Furthermore, the first dimming layer 50 is made of a graphene crystal film. Graphene has low light absorption, and its hexagonal porous structure allows light to converge based on Fraunhofer diffraction, which is beneficial for light to exit from the light-emitting side, further improving the light extraction efficiency on the light-emitting side. Moreover, during the fabrication of the graphene crystal film, its thickness and refractive index can be controlled, allowing the porous structure to be formed without the need for a photomask, thus simplifying the fabrication process. In addition, the material of the first dimming layer 50 includes a graphene crystal film, and the material of the second dimming layer 60 includes inorganic or organic materials. This is beneficial to the stability of the structure composed of the first dimming layer 50 and the second dimming layer 60. Compared with using two organic materials, it can avoid the mutual dissolution of organic materials and avoid the collapse of the film structure, which would affect the light extraction capability. Furthermore, the low refractive index of the graphene crystal film can increase the refractive index difference between the first dimming layer 50 and the second dimming layer 60, making it easier for light to undergo total internal reflection at the interface between the first dimming layer 50 and the second dimming layer 60. This allows more light to be focused in a direction perpendicular to the substrate 10, thereby further improving the light extraction efficiency on the light-emitting side and further enhancing the light extraction capability.

[0040] In this embodiment, the encapsulation layer 40 may include two inorganic layers and one organic layer, with the organic layer located between the two inorganic layers, forming a sandwich structure comprising an inorganic layer / organic layer / inorganic layer. Specifically, in this embodiment, the organic layer can be prepared using inkjet printing (IJP) technology. The organic layer is fluid at a preset temperature; by using IJP technology to place it within the enclosed area and allowing it to level and solidify, it can further prevent the intrusion of water and oxygen, improving the encapsulation effect. The two inorganic layers can be formed using chemical vapor deposition (CVD).

[0041] In the embodiments of this application, in the sandwich structure, the encapsulation layer 40 may include only one organic layer or multiple organic layers, and there is no limitation on this.

[0042] In addition, in this embodiment, besides adopting a sandwich structure composed of inorganic / organic / inorganic layers, the encapsulation layer 40 can also adopt a multi-layer inorganic layer structure, or other forms including overlapping organic and inorganic layers. Preferably, the encapsulation layer 40 comprises at least one organic layer and at least one inorganic layer alternately stacked in sequence to improve the encapsulation effect.

[0043] In the embodiments of this application, the inorganic layer constituting the encapsulation layer can be made of silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), aluminum oxide (Al2O3), etc. Preferably, silicon nitride can be selected as the inorganic layer constituting the encapsulation layer, as silicon nitride has a good water and oxygen barrier effect, which can further improve the encapsulation effect. The organic layer can be made of one or a combination of polyvinyl alcohol, polyurethane acrylate polymer, and polyimide resin, but this application is not limited to these.

[0044] Figure 3 yes Figure 1 A top view of the hole structure in the display panel shown. Figure 1 and Figure 3 As shown, the aperture structure P2 includes an aperture P210, the orthographic projection of which onto the substrate 10 overlaps the orthographic projection of the pixel opening P1 onto the substrate. The sidewall 501 of the aperture structure P2 is inclined relative to the substrate 10, with an inclination angle of 60° to 90°, for example, 60°, 70°, 80°, or 90°. Within this angle range, light can undergo total internal reflection at the interface between the first dimming layer 50 and the second dimming layer 60, improving light extraction efficiency.

[0045] Figure 4 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application. Figure 5 yes Figure 4 A top view of the hole structure in the display panel shown. Figure 4 and Figure 5 As shown, the aperture structure P2 includes multiple spaced apertures P220. The orthographic projections of the multiple apertures P220 on the substrate 10 and the orthographic projections of the gaps between adjacent apertures P220 on the substrate 10 cover the orthographic projection of the pixel opening P1 on the substrate 10. Since the material of the first dimming layer 50 includes a graphene crystal film, the apertures are hexagonal in shape. The hexagonal apertures facilitate light convergence, thereby converging the light in a direction perpendicular to the substrate 10, further improving the light extraction efficiency. It can be understood that... Figure 5The number of pore structures shown is merely an example; the number and size of the graphene pore structures can be adjusted. In this embodiment, the sidewall of pore structure P2 is perpendicular to the substrate 10. It can be understood that the sidewall of pore structure P2 may not be perpendicular to the substrate 10. Specifically, the inclination angle of the sidewall of pore structure P2 relative to the substrate 10 is 60° to 90°.

[0046] Figure 6 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application. Figure 6 The display panel shown is Figure 1 The difference in the display panels shown is that, Figure 6 The display panel shown also includes a touch layer 70. The touch layer 70 is located between the encapsulation layer 40 and the first dimming layer 50.

[0047] Furthermore, the first dimming layer 50 can also be located on the side of other film layers away from the substrate 10; this is not restricted. In this embodiment, it is sufficient that the orthographic projection of the first dimming layer 50 onto the pixel definition layer 20 covers the side of the pixel definition layer 20 away from the substrate 10. In other words, it is sufficient that the first dimming layer 50 is located above the pixel definition layer 20 in the direction perpendicular to the substrate 10, thereby enabling the first dimming layer 50 and the second dimming layer 60 to adjust the optical path of the light emitted by the pixel light-emitting unit 30. Under the technical concept of the technical solution provided in this embodiment, the closer the first dimming layer 50 and the second dimming layer 60 are to the pixel light-emitting unit 30, the better it is for improving the light extraction efficiency on the light-emitting side.

[0048] Figure 7 This is a schematic diagram of the structure of a display panel provided in another embodiment of this application. Figure 4 The display panel shown is Figure 1 The difference in the display panels shown is that, Figure 4 The display panel shown also includes a barrier layer 80. The barrier layer 80 is located between the first dimming layer 50 and the second dimming layer 60. The material of the barrier layer 80 is different from that of the first dimming layer 50 and the second dimming layer 60. The materials of the first dimming layer 50 and / or the second dimming layer 60 include organic materials, while the material of the barrier layer includes inorganic materials, such as silicon nitride. By providing the barrier layer 80, mutual solubility between the first dimming layer 50 and the second dimming layer 60 can be avoided, which helps maintain the structural stability of the first dimming layer 50 and the second dimming layer 60 and improves the light extraction efficiency on the light-emitting side.

[0049] In this embodiment, the material of the first dimming layer 50 includes an organic material, and the hole structure of the first dimming layer 50 can be formed by patterning. For example, the material of the first dimming layer 50 is formed on the side of the encapsulation layer 40 away from the substrate 10, and then the material of the first dimming layer 50 is patterned to obtain a plurality of hole structures P2.

[0050] Secondly, embodiments of this application provide a method for preparing a display panel, used to prepare the aforementioned display panel.

[0051] Figure 8 This is a schematic flowchart illustrating a method for manufacturing a display panel according to an embodiment of this application. Figure 7 As shown, the method includes the following steps.

[0052] Step S801: Provide a substrate.

[0053] Step S802: Prepare a pixel definition layer on one side of the substrate.

[0054] This application does not limit the method for preparing the pixel definition layer, as long as the pixel definition layer can be obtained. Preferably, an insulating material layer is formed on one side of the substrate, and the insulating material layer is patterned to obtain the pixel definition layer.

[0055] Preferably, before step S802, the method further includes: fabricating a first electrode layer on a substrate. The first electrode layer includes a plurality of spaced-apart first electrodes, and a pixel definition layer encloses a plurality of pixel openings, the pixel openings exposing portions of the first electrodes. After step S802, the method further includes: sequentially fabricating a light-emitting functional layer and a second electrode layer on the side of the pixel definition layer facing away from the substrate, the first electrode layer, the light-emitting functional layer, and the second electrode layer constituting a light-emitting device layer, the light-emitting device layer including a plurality of light-emitting units, at least a portion of the light-emitting units being located within the pixel openings.

[0056] Step S803: Prepare a first dimming layer on the side of the pixel definition layer away from the substrate.

[0057] Preferably, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate. The first dimming layer includes a plurality of hole structures.

[0058] Preferably, in this embodiment, the first dimming layer comprises a graphene crystal film. Preferably, a polyimide precursor layer is formed on the side of the pixel definition layer away from the substrate; the polyimide precursor layer is in-situ induced using an energy source to obtain the first dimming layer. Preferably, the energy source comprises at least one of a high-energy electron beam and a laser, preferably a high-energy electron beam. In this embodiment, graphene crystal films of different thicknesses can be prepared by changing the type of energy source or changing the energy of the energy source. In this method, there is no need to use a mask for patterning to obtain multiple pore structures, simplifying the fabrication process. Furthermore, graphene has high flexibility, which is beneficial to the stability of the first dimming layer.

[0059] Preferably, the material of the first dimming layer includes an organic material, and the method for preparing the first dimming layer includes: forming the material of the first dimming layer on the side of the pixel definition layer away from the substrate, and patterning the material of the first dimming layer to obtain the first dimming layer. Preferably, in this method, after preparing the first dimming layer, the method further includes forming a barrier layer on the side of the first dimming layer away from the substrate.

[0060] Preferably, before step S803, the method further includes forming an encapsulation layer on the side of the pixel definition layer away from the substrate; and forming a touch layer on the side of the encapsulation layer away from the substrate.

[0061] Step S804: Prepare a second dimming layer on the side of the first dimming layer away from the substrate.

[0062] The second dimming layer has a hole-filling structure, and the refractive index of the second dimming layer is greater than that of the first dimming layer.

[0063] Thirdly, embodiments of this application provide a display device.

[0064] Figure 9 This is a schematic diagram of the structure of a display device provided in an embodiment of this application. Figure 9 As shown, display device 900 is a product with image display function. For example, display device 900 can be used to display static images, such as pictures or photographs. Display device 900 can also be used to display moving images, such as videos.

[0065] Display device 900 can be a laptop, mobile phone, handheld or portable computer, camera, camcorder, in-vehicle smart central control screen, calculator, smartwatch, GPS navigator, electronic photo, electronic billboard or sign, projector, etc.

[0066] The display device 900 includes the display panel provided in any of the above embodiments. The display panel may be an organic light-emitting diode display panel or a quantum dot electroluminescent display panel.

[0067] In addition, the display device 900 can also perform functions such as taking photos, recording videos, fingerprint recognition, and facial recognition. Accordingly, the display device 900 also includes at least one functional module for implementing the above functions, such as an under-display camera or an under-display fingerprint recognition sensor.

[0068] The material of the first dimming layer 50 in this application may include a graphene crystal film. Graphene has low light absorption, and its hexagonal pore structure can converge light based on Fraunhofer diffraction, which is beneficial for light to exit from the light-emitting side and further improves the light extraction efficiency of the light-emitting side. Furthermore, the thickness and refractive index of the graphene crystal film can be controlled during its fabrication, and the pore structure can be formed without the use of a mask, simplifying the fabrication process. In addition, the material of the first dimming layer 50 includes a graphene crystal film, and the material of the second dimming layer 60 includes inorganic or organic materials. This is beneficial to the stability of the structure composed of the first dimming layer 50 and the second dimming layer 60. Compared with using two organic materials, it can avoid the mutual dissolution of organic materials and avoid the collapse of the film structure, which would affect the light extraction capability. Furthermore, the low refractive index of the graphene crystal film can increase the refractive index difference between the first dimming layer 50 and the second dimming layer 60, making it easier for light to undergo total internal reflection at the interface between the first dimming layer 50 and the second dimming layer 60. This allows more light to be focused in a direction perpendicular to the substrate 10, thereby further improving the light extraction efficiency on the light-emitting side and further enhancing the light extraction capability.

[0069] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0070] The terms “including,” “comprising,” “having,” etc., used in this application are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context explicitly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0071] It should be understood that the qualifying terms "first," "second," "third," and "fourth," etc., used in the description of the embodiments of the present invention are only used to more clearly illustrate the technical solutions and are not intended to limit the scope of protection of the present invention.

[0072] The above description has been given for illustrative and descriptive purposes. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A display panel, characterized in that, include: substrate; A pixel definition layer is located on one side of the substrate; A first dimming layer is located on the side of the pixel definition layer away from the substrate. The orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate. The first dimming layer includes a graphene crystal film. The first dimming layer is a film layer with multiple pore structures obtained by in-situ induction of a polyimide precursor layer using an energy source. The polyimide precursor layer is formed on the side of the pixel definition layer away from the substrate. as well as The second dimming layer is located on the side of the first dimming layer away from the substrate. The second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than that of the first dimming layer. The hole structure includes a hole, and the orthographic projection of the hole on the substrate covers the orthographic projection of the pixel opening on the substrate; or, The hole structure includes a plurality of holes spaced apart, and the orthographic projection of the plurality of holes on the substrate and the orthographic projection of the gap between adjacent holes on the substrate cover the orthographic projection of the pixel opening on the substrate.

2. The display panel according to claim 1, characterized in that, The pixel definition layer encloses a plurality of pixel openings, and the orthographic projection of the hole structure on the substrate at least covers the orthographic projection of the pixel openings on the substrate.

3. The display panel according to claim 1, characterized in that, The hole is hexagonal in shape.

4. The display panel according to claim 1, characterized in that, The graphene crystal film comprises a three-dimensional porous structure.

5. The display panel according to claim 1, characterized in that, The pore size of the graphene crystal film ranges from 1 nm to 20 µm.

6. The display panel according to claim 1, characterized in that, The thickness of the first dimming layer ranges from 1 µm to 1 mm.

7. The display panel according to claim 1, characterized in that, The refractive index of the first dimming layer is in the range of 1 to 1.

55.

8. The display panel according to claim 1, characterized in that, The material of the second dimming layer includes inorganic or organic materials.

9. The display panel according to claim 8, characterized in that, The material of the second dimming layer includes porous titanium dioxide.

10. The display panel according to claim 1, characterized in that, The pixel definition layer encloses multiple pixel openings; The display panel further includes a light-emitting device layer, which includes a plurality of light-emitting units, at least a portion of which are located within the pixel opening.

11. The display panel according to claim 1, characterized in that, The display panel further includes an encapsulation layer, which is located between the pixel definition layer and the first dimming layer.

12. The display panel according to claim 11, characterized in that, The display panel further includes a touch layer, which is located between the encapsulation layer and the first dimming layer.

13. The display panel according to claim 1, characterized in that, The inclination angle of the sidewall of the hole structure relative to the substrate is 60°~90°.

14. The display panel according to claim 1, characterized in that, Also includes: A barrier layer is located between the first dimming layer and the second dimming layer.

15. The display panel according to claim 14, characterized in that, The material of the barrier layer is different from that of the first dimming layer and the second dimming layer.

16. The display panel according to claim 15, characterized in that, The material of the first dimming layer and / or the material of the second dimming layer includes organic materials; and / or, the material of the barrier layer includes silicon nitride.

17. A method for manufacturing a display panel, characterized in that, The method for preparing the display panel according to any one of claims 1-16 comprises: Provide a substrate; A pixel definition layer is fabricated on one side of the substrate; A first dimming layer is formed on the side of the pixel definition layer away from the substrate, the orthogonal projection of the first dimming layer on the substrate covering the orthogonal projection of the pixel definition layer on the substrate, and the first dimming layer includes a plurality of hole structures; and A second dimming layer is prepared on the side of the first dimming layer away from the substrate, the second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer; The step of fabricating a first dimming layer on the side of the pixel definition layer away from the substrate includes: A polyimide precursor layer is formed on the side of the pixel definition layer away from the substrate; The first dimming layer is obtained by in-situ induction of the polyimide precursor layer using an energy source.

18. The method for manufacturing a display panel according to claim 17, characterized in that, The energy source includes at least one of high-energy electron beams and lasers.

19. The method for manufacturing a display panel according to claim 17, characterized in that, After providing a substrate and before fabricating a pixel definition layer on one side of the substrate, the method further includes: fabricating a first electrode layer on the substrate, the first electrode layer including a plurality of spaced-apart first electrodes, the pixel definition layer enclosing a plurality of pixel openings, the pixel openings exposing portions of the first electrodes; After the pixel definition layer is prepared on one side of the substrate, and before the first dimming layer is prepared on the side of the pixel definition layer away from the substrate, the method further includes: sequentially preparing a light-emitting functional layer and a second electrode layer on the side of the pixel definition layer away from the substrate, wherein the first electrode layer, the light-emitting functional layer and the second electrode layer constitute a light-emitting device layer, the light-emitting device layer includes a plurality of light-emitting units, at least a portion of the light-emitting units being located within the pixel opening.

20. The method for manufacturing a display panel according to claim 19, characterized in that, After sequentially forming a light-emitting functional layer and a second electrode layer on the side of the pixel definition layer away from the substrate, and before forming a first dimming layer on the side of the pixel definition layer away from the substrate, the method further includes: forming an encapsulation layer on the side of the pixel definition layer away from the substrate; and forming a touch layer on the side of the encapsulation layer away from the substrate.

21. A display device, characterized in that, include: The display panel according to any one of claims 1-16.

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