Exposure method, exposure apparatus, and article manufacturing method

Abstract

The invention provides an exposure method, an exposure apparatus, and an article manufacturing method. Provided is a technique that contributes to improving the throughput of an exposure process for intermittently exposing one exposure region. An exposure method for performing intermittent exposure for intermittently exposing a plurality of times on a projection lattice region of a substrate, the exposure method including: a first step of starting a first exposure on a first projection lattice region of the substrate by changing a shutter for opening and closing an optical path of exposure light from a light-blocking state to a light-passing state; and a second step in which the shutter is brought from the light-passing state to the light-blocking state to terminate the first exposure, and thereafter, the shutter is brought into the light-passing state to start a second exposure in which the first projection lattice region on which the first exposure has been performed is re-exposed, and the second projection lattice region on which the second projection lattice region has been subjected to the light-blocking state is re-exposed. In the second step, the shutter is not stopped.

Description

Technical Field

[0001] The present invention relates to an exposure method, an exposure device and an article manufacturing method. Background Art

[0002] When manufacturing devices (semiconductor devices, magnetic storage media, liquid crystal display elements, etc.), color filters, or hard disks, an exposure device is used to expose a substrate (glass plate, wafer, etc.). The exposure device, for example, irradiates light onto an original plate (graticule, mask) on which a pattern is formed, and irradiates the light from the original plate onto the substrate via a projection optical system, thereby exposing the substrate.

[0003] Patent document 1 discloses the following exposure method: in order to prevent the temperature rise of the lens caused by exposure from affecting the optical system of the exposure device, the area to be exposed (projection grid area) on the substrate is exposed intermittently. Here, intermittently exposing the projection grid area means that the exposure and interruption of the projection grid area are repeated.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent No. 2844600 Summary of the invention

[0007] Problem that the invention aims to solve

[0008] When intermittently exposing the projection grid area on the substrate, the exposure process is prolonged due to the period of interruption of the exposure, which may inhibit the improvement of throughput. Therefore, it is desired to shorten the exposure interruption period in the exposure process of intermittent exposure to improve the throughput.

[0009] The present invention provides a technique that is beneficial for improving the throughput of an exposure process for intermittently exposing a projection grid area.

[0010] Solutions for solving problems

[0011] According to a first aspect of the present invention, an exposure method is provided, wherein the exposure method intermittently exposes a projection grid area of ​​a substrate, wherein the intermittent exposure intermittently performs multiple exposures, and the exposure method is characterized in that it includes: a first step of changing a shutter for opening and closing an optical path of exposure light from a light-shielding state to a light-passing state, thereby starting a first exposure of a first projection grid area of ​​the substrate; and a second step of changing the shutter from the light-passing state to the light-shielding state, thereby terminating the first exposure, and then changing the shutter to the light-passing state, thereby starting a second exposure, in which the first projection grid area that has undergone the first exposure is exposed again, and in the second step, the shutter is not kept stationary.

[0012] According to a second aspect of the present invention, an exposure device is provided, which performs intermittent exposure on a projection grid area of ​​a substrate, and the intermittent exposure intermittently performs multiple exposures, and the exposure device is characterized in that it comprises: a shutter, which has a light passing portion and a light shielding portion; a driving portion, which drives the shutter, and puts the shutter into a light shielding state by making the light shielding portion located on the optical path of the exposure light, and puts the shutter into a light passing state by making the light passing portion located on the optical path; and a control portion, the control portion being configured to execute: a first step of changing the shutter from the light shielding state to the light passing state, thereby starting a first exposure of a first projection grid area; and a second step of changing the shutter from the light passing state to the light shielding state, thereby ending the first exposure, and then making the shutter into the light passing state again, thereby starting a second exposure, in which the first projection grid area that has undergone the first exposure is exposed again, and the control portion controls the driving portion so that the shutter is not made stationary in the first step.

[0013] According to a third aspect of the present invention, there is provided a method for manufacturing an article, which is characterized in that it includes: a process of exposing a substrate according to the exposure method involved in the above-mentioned first aspect; and a process of developing the exposed substrate, and manufacturing an article from the developed substrate.

[0014] Effects of the Invention

[0015] According to the present invention, it is possible to provide a technology that is advantageous for improving the throughput of an exposure process for intermittently exposing a projection grid area. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a figure which shows the structure of an exposure apparatus.

[0017] Figure 2 It is a diagram showing the structure of the light shielding mechanism.

[0018] Figure 3 It is a diagram showing an example of a plurality of projection grid areas on a substrate.

[0019] Figure 4 3 is a diagram showing the exposure process according to Comparative Example 1.

[0020] Figure 5 1 and 2 are diagrams showing exposure processing including intermittent exposure according to Comparative Example 2.

[0021] Figure 6 It is a diagram showing the exposure process according to the first embodiment.

[0022] Figure 7 It is a diagram showing an exposure process according to a first modification example of the first embodiment.

[0023] Figure 8 It is a diagram showing an exposure process according to a second modification example of the first embodiment.

[0024] Fig. 9 It is a diagram showing the exposure process according to the second embodiment.

[0025] Fig.10 It is a diagram showing exposure processing according to a modification example of the second embodiment.

[0026] Description of Reference Numerals

[0027] 100a: exposure device; 101: light source unit; 102: light shielding mechanism; 103: illumination optical system; 105: projection optical system; 108: mounting table; 110: control unit. DETAILED DESCRIPTION

[0028] The following detailed description of the embodiments is made with reference to the accompanying drawings. Moreover, the following embodiments are not intended to limit the inventions involved in the claims. A plurality of features are described in the embodiments, but the present invention is not limited to requiring all of these multiple features, and a plurality of features may be combined arbitrarily. In addition, in the accompanying drawings, the same reference numerals are added to the same or similar structures, and repeated descriptions are omitted.

[0029] <First Embodiment>

[0030] First, the exposure apparatus 100a according to the first embodiment will be described. Figure 11 is a diagram showing an exposure device 100a according to the first embodiment. The exposure device 100a may include, for example, a light source unit 101, a light shielding mechanism 102 (switching unit), an illumination optical system 103, an original plate holding unit (not shown), a projection optical system 105, a stage 108, and a control unit 110. In addition, in this specification and the drawings, the direction along the optical axis 109 of the projection optical system 105 is defined as the Z-axis direction, and two directions orthogonal to each other along a plane perpendicular to the Z-axis direction are defined as the X-axis direction and the Y-axis direction.

[0031] The light source unit 101 irradiates light for exposing the substrate 107. The light source unit 101 is formed of a light source such as an ultra-high pressure mercury lamp, a solid light source such as an LED or LD, an ArF excimer laser, a KrF excimer laser, etc. The light source unit 101 may be configured separately from the exposure device 100a.

[0032] The light shielding mechanism 102 is a mechanism for switching between blocking and passing the light from the light source unit 101, and may include a shutter, for example. The shutter may include: a light shielding member 102a, which is a light shielding portion that blocks the light from the light source unit 101; and a light passing portion 102b, which allows the light from the light source unit 101 to pass (see Figure 2 ). The light shielding mechanism 102 further includes a driving unit 102c for driving the shutter. The driving unit 102c drives the shutter, and the shutter is in a light shielding state by positioning the light shielding member 102a on the optical path of the exposure light, and in a light passing state by positioning the light passing unit 102b on the optical path. Figure 1 In the example shown in FIG. 1 , the shading mechanism 102 is arranged on the optical path between the light source unit 101 and the illumination optical system 103 , but may be arranged at another location as long as it is a location that can shield the light from the light source unit 101 .

[0033] Here, the movement of the light shielding member 102a will be described. Figure 2 1 is a diagram showing the positional relationship between the light shielding member 102a and the light beam 101a from the light source unit 101 according to the present embodiment. Figure 2 In the example, the driving unit 102c rotates the light shielding member 102a (moves in the rotation direction), thereby switching between blocking and passing the light from the light source unit 101. In one example, three light shielding members 102a are arranged at intervals of 120 degrees, and the driving unit 102c rotates the light shielding member 102a with the center of the light shielding member 102a as the rotation axis.

[0034] Figure 2 (a) shows a state where the light shielding member 102a is in a position to shield the light from the light source unit 101. Figure 2As shown in (a), any one of the three light shielding members 102a is located at a position overlapping with the light beam 101a, thereby shielding the light from the light source unit 101. In addition, Figure 2 (b) shows a state where the light passing portion 102b is located on the optical path of the exposure light from the light source portion 101. Figure 2 As shown in (b), the light passing portion 102b between the two light shielding members 102a is arranged on the optical path, thereby allowing the light from the light source unit 101 to pass. In other words, the light shielding members 102a are arranged in such a manner that none of the three light shielding members 102a overlaps with the light beam 101a of the light from the light source unit 101, thereby allowing the light from the light source unit 101 to pass.

[0035] Here, an example of the light shielding mechanism 102 in which the light shielding member 102a rotates to switch between passing and blocking light is described, but the light shielding mechanism may also be a light shielding mechanism in which the light shielding member moves back and forth along a predetermined path to switch between passing and blocking light. In addition, the number of light shielding portions of the light shielding member 102a and the arrangement of the light shielding portions are not limited to Figure 2 Example.

[0036] return Figure 1 The illumination optical system 103 shapes the light beam from the light source unit 101 into a predetermined shape suitable for exposure and illuminates the original plate 104. In order to realize the function of uniformly illuminating the original plate 104 and the polarized light illumination function, the illumination optical system 103 may include a lens, a reflector, an optical integrator, an aperture, etc. The original plate 104 is, for example, a quartz original plate (master, mask), on which a circuit pattern to be transferred to the substrate 107 is formed, and is held and moved by an original plate holding unit (not shown).

[0037] The original plate holding unit holds the original plate 104 and moves the original plate 104 in the X-axis direction, the Y-axis direction, the Z-axis direction, and the rotation direction around each axis. The original plate holding unit holds the original plate 104 with the aid of an original plate holding mechanism (not shown) that holds the original plate 104, and is connected to an original plate moving mechanism (not shown). The original plate moving mechanism is composed of a linear motor, etc., and drives the original plate holding unit in the X-axis direction, the Y-axis direction, the Z-axis direction, and the rotation direction around each axis, thereby moving the original plate 104.

[0038] The projection optical system 105 projects the pattern of the original plate 104 illuminated by the illumination optical system 103 onto the substrate 107, thereby exposing the substrate 107. The projection optical system 105 has the function of imaging the light beam from the object plane onto the image plane. In this embodiment, the diffracted light formed by the pattern formed on the original plate 104 is imaged on the substrate 107. The projection optical system 105 can be an optical system (catadoptical system) including a plurality of lens elements and at least one concave mirror, an optical system having a plurality of lens elements and at least one kinoform or other diffractive optical elements, etc.

[0039] The stage 108 (moving unit) holds the substrate 107 and moves the substrate 107 in the X-axis direction, the Y-axis direction, the Z-axis direction, and the rotation direction around each axis. The stage 108 is configured to hold the substrate 107 by a substrate holding mechanism (not shown) that holds the substrate 107 and to be able to change the position and posture of the substrate 107. The stage 108, like the original plate holding unit, uses a substrate moving mechanism (not shown) composed of a linear motor, etc. to move the substrate 107 in the X-axis direction, the Y-axis direction, the Z-axis direction, and the rotation direction around each axis. In addition, a photosensitive agent 106 (resist) is applied to the substrate 107.

[0040] The control unit 110 is composed of, for example, a computer (information processing device) connected in a communicable manner including a CPU, a memory, etc., and controls the various parts of the exposure device 100a in a unified manner according to the program stored in the storage unit. Alternatively, the control unit 110 may be composed of a plurality of computers including a single-board computer for individually controlling the various parts of the exposure device 100a.

[0041] The exposure device 100a is, for example, a device that performs a process (exposure process) of forming a pattern on the substrate 107 in a step and repeat method. Alternatively, the exposure device 100a may be a device that performs a process of forming a pattern on the substrate 107 in a step and scan method or other methods.

[0042] Here, a case where the exposure apparatus 100a performs exposure processing according to the step-and-repeat method will be described. Figure 3 1 is a diagram showing an example of a plurality of projection grid areas (exposure areas) on the substrate 107. Figure 3 In the example of , there are 21 exposure regions a to u on the substrate 107, but the present invention is not limited to this example, and the size and number of the exposure regions can be set arbitrarily. In addition, the exposure device 100a, for example, starts the exposure process from the exposure region a, and performs the exposure process in the order of the exposure regions a, b, c, ..., u. Moreover, this order is an example, and the exposure process can be performed in any order.

[0043] The control unit 110 first moves the stage 108 so that the exposure region a of the substrate 107 is located on the optical axis 109 of the projection optical system 105. Then, the control unit 110 moves the light shielding member 102a to a position where the light from the light source unit 101 passes. As a result, the light from the light source unit 101 illuminates the original plate 104 via the illumination optical system 103. Moreover, the pattern of the illuminated original plate 104 is projected onto the substrate 107 via the projection optical system 105, so that the exposure region a is exposed. After exposing the exposure region a with a predetermined exposure amount, the control unit 110 moves the light shielding member 102a of the light shielding mechanism 102 to a position where the light from the light source unit 101 is blocked. Through the above, the exposure process of the exposure region a is completed. Then, the control unit 110 moves the stage 108 so that the exposure region b of the substrate 107 is located on the optical axis 109 of the projection optical system 105. Then, the exposure process of the exposure region b is performed in the same manner as the exposure region a. In addition, the exposure process is similarly performed on the exposure regions after the exposure region c.

[0044] (Comparative Example 1)

[0045] Next, as Comparative Example 1, an exposure process in the case of continuously exposing the exposure area will be described. Figure 4 3 is a diagram showing the exposure process according to Comparative Example 1. Figure 4 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Figure 4 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the shading mechanism 102. There are two states θ: a shading state θ1 in which the shading mechanism 102 completely blocks the light from the light source unit 101, and a light passing state θ2 in which the shading mechanism 102 allows all the light from the light source unit 101 to pass through. In addition, there is an intermediate state θ in which the shading mechanism 102 blocks part of the light from the light source unit 101 and allows the rest of the light to pass through (θ1<θ<θ2). Figure 2 As shown in (a) of FIG. 1 , the light shielding state θ1 is a state in which the light shielding member 102a is in a position to completely shield the light from the light source unit 101. Figure 2 As shown in (b), the light passing state θ2 is a state where the light shielding member 102a is in a position to allow all light from the light source unit 101 to pass. The intermediate state is a state where the light shielding member 102a is in a position to block part of the light from the light source unit 101 and allow the rest of the light to pass.

[0046] During the period (movement (a)) when the stage 108 is moved so that the exposure area a is located on the optical axis 109, the light shielding mechanism 102 begins to transition from the light shielding state θ1 to the light passing state θ2. For this state transition, the light shielding mechanism 102 performs acceleration drive and constant speed drive. In the constant speed drive, when the light shielding member 102a reaches a position where the light from the light source unit 101 completely passes, the exposure period (exposure (a)) of the exposure area a begins. During the exposure period (exposure (a)), the light shielding mechanism 102 is in the light passing state θ2. At this time, the light shielding mechanism 102 performs deceleration drive to make the light shielding member 102a stationary.

[0047] In conjunction with the timing of the completion of the exposure period (exposure (a)), the light shielding mechanism 102 begins to transition from the light passing state θ2 to the light shielding state θ1. For this state transition, the light shielding mechanism 102 performs acceleration driving and constant speed driving. When the light shielding member 102a reaches a position where the light from the light source unit 101 is completely shielded, the exposure period (exposure (a)) ends.

[0048] Thereafter, while the stage 108 is moved (movement (b)) so that the exposure region b is located on the optical axis 109, the light shielding mechanism 102 is in the light shielding state θ1. At this time, the light shielding mechanism 102 is driven at a reduced speed, and the light shielding member 102a is stationary.

[0049] In conjunction with the timing of starting exposure of the exposure area b, the light shielding mechanism 102 starts to transfer from the light shielding state θ1 to the light passing state θ2. For this state transition, the light shielding mechanism 102 performs acceleration drive and constant speed drive. In the constant speed drive, when the light shielding member 102a reaches a position that allows the light from the light source unit 101 to pass completely, the exposure period (exposure (b)) of the exposure area b starts. During the exposure period (exposure (b)), the light shielding mechanism 102 is in the light passing state θ2. At this time, the light shielding mechanism 102 performs deceleration drive to make the light shielding member 102a stationary.

[0050] In conjunction with the timing of the completion of the exposure period (exposure (b)), the light shielding mechanism 102 starts to transition from the light passing state θ2 to the light shielding state θ1. For this state transition, the light shielding mechanism 102 performs acceleration driving and constant speed driving. After that, similarly, the stage 108 is moved to expose the exposure area c, and the exposure process of the exposure area c is performed.

[0051] Here, the exposure of the substrate 107 coated with the photosensitive agent 106 containing the radical polymerization curing resin is described. The photosensitive agent 106 containing the radical polymerization curing resin absorbs the light irradiated to the photosensitive agent 106 and undergoes a radical reaction, thereby curing. In addition, the concentration of free radicals generated by the radical reaction in the photosensitive agent 106 is determined by the illumination of the light irradiated to the photosensitive agent 106. In addition, the irradiated light is absorbed by the photosensitive agent 106, so that a difference in the concentration of free radicals (concentration gradient) is generated between the upper layer and the lower layer of the photosensitive agent 106. Therefore, the upper layer of the photosensitive agent 106 is easy to cure, but the lower layer is difficult to cure. Therefore, the amount of cured photosensitive agent 106 is different between the upper layer and the lower layer of the photosensitive agent 106, and the accuracy of the pattern distribution (Japanese: パターンプロファイル) of the pattern formed by the cured photosensitive agent 106 may be reduced.

[0052] Therefore, in order to suppress the reduction in the accuracy of the pattern distribution, it is considered to intermittently expose the exposure area of ​​the substrate 107. Here, intermittently exposing the exposure area means that in the exposure process for one exposure area, the exposure is interrupted halfway and the exposure is repeated. Here, interrupting the exposure includes not only not irradiating the exposure area with light, but also irradiating light with a light intensity reduced to a level that does not make the photosensitive agent 106 on the exposure area sensitive to light. That is, intermittently exposing the exposure area includes setting the following periods during the exposure process of one exposure area: (1) an exposure period in which the exposure area is exposed by irradiating light; and (2) an interruption period in which the exposure is interrupted by not irradiating light to the exposure area (or reducing the illumination of the light irradiated to the exposure area).

[0053] In order to improve the accuracy of pattern distribution, it is important to be able to control the interruption period according to the characteristics of the photosensitive agent 106 .

[0054] (Comparative Example 2)

[0055] An exposure process in which exposure is performed intermittently will be described as Comparative Example 2. First, an exposure process in which exposure is performed intermittently by the light shielding mechanism 102 will be described. Figure 5 3 is a diagram showing the exposure process according to Comparative Example 2. Figure 5 The relationship between the horizontal axis and the vertical axis in Figure 4 Likewise. That is, Figure 5 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Figure 5 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102. Figure 5 In the example of FIG. 1 , an exposure process is described in which one exposure area is exposed twice intermittently, but the number of times one exposure area is exposed is not limited to two times.

[0056] During the period (movement (a)) when the stage 108 is moved so that the exposure area a is located on the optical axis 109, the light shielding mechanism 102 begins to transition from the light shielding state θ1 to the light passing state θ2. For this state transition, the light shielding mechanism 102 performs acceleration drive and constant speed drive. In the constant speed drive, when the light shielding member 102a reaches a position where the light from the light source unit 101 completely passes, the first exposure period (exposure 1 (a)) of the exposure area a begins. During the first exposure period (exposure 1 (a)), the light shielding mechanism 102 is in the light passing state θ2. At this time, the light shielding mechanism 102 performs deceleration drive to make the light shielding member 102a stationary.

[0057] In conjunction with the timing of completion of the first exposure period (exposure 1(a)), the shading mechanism 102 begins to transition from the light passing state θ2 to the shading state θ1. For this state transition, the shading mechanism 102 is accelerated and driven at a constant speed. When the shading member 102a reaches a position where the light from the light source unit 101 is completely blocked, the first exposure period (exposure 1(a)) ends, and an interruption period (interruption (a)) in which the exposure area a is not exposed begins. During the interruption period (interruption (a)), the shading mechanism 102 is in the shading state θ1. At this time, the shading mechanism 102 is decelerated to make the shading member 102a stationary.

[0058] In conjunction with the timing of the completion of the interruption period (interruption (a)), the shading mechanism 102 begins to transfer from the shading state θ1 to the light passing state θ2. For this state transition, the shading mechanism 102 performs acceleration drive and constant speed drive. In the constant speed drive, when the shading member 102a reaches a position where the light from the light source unit 101 passes completely, the second exposure period (exposure 2 (a)) for exposing the exposure area a for the second time begins. In the second exposure period (exposure 2 (a)), the shading mechanism 102 is in the light passing state θ2. At this time, the shading mechanism 102 performs deceleration drive to make the shading member 102a stationary.

[0059] In conjunction with the timing of the completion of the second exposure period (exposure 2(a)), the light shielding mechanism 102 starts to transition from the light passing state θ2 to the light shielding state θ1. For this state transition, the light shielding mechanism 102 performs acceleration driving and constant speed driving. After that, similarly, the stage 108 is moved to expose the exposure area b, and intermittent exposure processing is performed on the exposure area b.

[0060] so, Figure 5In the example of , intermittent exposure is performed on one exposure area by moving the light shielding member 102a of the light shielding mechanism 102. In this case, when the light shielding mechanism 102 is driven, control is performed with acceleration, constant speed, and deceleration driving. Due to limitations related to the performance of the light shielding mechanism 102, such as speed limitations, there is a limit to shortening the interruption period for interrupting exposure.

[0061] (Example)

[0062] As described below, in this embodiment, in an intermittent exposure apparatus that intermittently performs a plurality of exposures on a plurality of projection grid areas of a substrate a plurality of times, drive control of the light shielding mechanism 102 is implemented that is advantageous in shortening the interruption period.

[0063] Figure 6 It is a diagram showing the exposure process according to this embodiment. Figure 6 The relationship between the horizontal axis and the vertical axis in Figure 4 as well as Figure 5 Likewise. That is, in Figure 6 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Figure 6 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102. Figure 6 In the example, an exposure process of intermittently exposing one exposure area twice is described, but the number of times of exposing one exposure area is not limited to twice.

[0064] During the period (movement (a)) when the stage 108 is moved so that the exposure area a (first projection grid area) is located on the optical axis 109, the shading mechanism 102 begins to transfer from the shading state θ1 to the light passing state θ2. For this state transition, the shading mechanism 102 is accelerated and driven at a constant speed. In the constant speed drive, when the shading member 102a reaches a position where the light from the light source unit 101 passes completely, the first exposure period of the exposure area a, i.e., the first exposure period (exposure 1 (a)), begins (first process). During the first exposure period (exposure 1 (a)), the shading mechanism 102 is in the light passing state θ2. At this time, the shading mechanism 102 is decelerated to make the shading member 102a stationary.

[0065] In conjunction with the timing of the completion of the first exposure period (exposure 1 (a)), the light shielding mechanism 102 begins to transition from the light passing state θ2 to the light shielding state θ1. For this state transition, the light shielding mechanism 102 performs acceleration driving and constant speed driving. When the light shielding member 102a reaches a position where the light from the light source unit 101 is completely shielded, the first exposure period (exposure 1 (a)) ends, and the interruption period (interruption (a)) in which the exposure area a is not exposed begins.

[0066] In the present embodiment, during the interruption period (interruption (a)), even if the shading mechanism 102 becomes the shading state θ1, the shading member 102a is not made to stop, but the constant speed driving is continuously maintained. Through this constant speed movement, the shading mechanism 102 moves from the shading state θ1 to the light passing state θ2 again. In this constant speed driving, when the shading member 102a reaches a position where the light from the light source unit 101 passes completely, the interruption period (interruption (a)) ends, and the second exposure period of the exposure area a, that is, the second exposure period (exposure 2 (a)) begins (second process). During the second exposure period (exposure 2 (a)), the shading mechanism 102 is in the light passing state θ2. At this time, the shading mechanism 102 is decelerated and the shading member 102a is made to stop.

[0067] In conjunction with the timing of the completion of the second exposure period (exposure 2(a)), the light shielding mechanism 102 begins to transition from the light passing state θ2 to the light shielding state θ1. For this state transition, the light shielding mechanism 102 performs acceleration driving and constant speed driving. When the light shielding member 102a reaches a position where the light from the light source unit 101 is completely shielded, the second exposure period (exposure 2(a)) ends.

[0068] Thereafter, during the moving step (movement (b)) of moving the stage 108 so that the exposure region b (second projection grid region) is located on the optical axis 109, the light shielding mechanism 102 is in the light shielding state θ1. Subsequently, exposure processing is performed in the exposure region b and thereafter in the same manner.

[0069] Thus, in this embodiment, the driving control method of the light shielding mechanism 102 may be different between the period when the stage 108 is moved between the exposure processes of a plurality of exposure regions and the period when the exposure process is intermittently performed on one exposure region. In particular, the exposure method for intermittent exposure of this embodiment may include the following steps:

[0070] (1) a first step of changing a shutter for opening and closing an optical path of exposure light from a light-shielding state to a light-passing state, thereby starting a first exposure of a first projection grid area of ​​the substrate; and

[0071] (2) In the second step, the shutter is changed from a light-transmitting state to a light-shielding state, thereby terminating the first exposure, and then the shutter is changed back to a light-transmitting state to start a second exposure. In the second exposure, the first projection grid area that has undergone the first exposure is exposed again.

[0072] Furthermore, the shutter is not made to stop in the second step. Thus, the number of acceleration and deceleration controls of the light shielding mechanism 102 during the interruption period of the exposure process in one exposure area can be reduced. This helps to shorten the interruption period and improve the throughput of the exposure process for intermittent exposure.

[0073] (First Modification)

[0074] Figure 7 It is a diagram showing exposure processing according to a first modified example of the present embodiment. Figure 7 The relationship between the horizontal axis and the vertical axis in Figure 6 Likewise. That is, in Figure 7 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Figure 7 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102. Figure 7 In the example, an exposure process of intermittently exposing one exposure area twice is described, but the number of times of exposing one exposure area is not limited to twice.

[0075] Figure 7 The example does not stop the shutter in interruption (a), which is different from Figure 6 Likewise. That is, Figure 7 In the example of FIG. 1 , at the timing when the first exposure period (exposure 1(a)) is completed, the light shielding member 102a is accelerated and driven at a constant speed so as to shift from the light passing state θ2 to the light shielding state θ1.

[0076] In the first variant, in order to adjust the length of the interruption period (interruption (a)) during which the exposure is interrupted between the first exposure period (exposure 1 (a)) and the second exposure period (exposure 2 (a)), there may be a setting process in which the drive profile of the shutter in the second process for starting the second exposure is set. Figure 7 In the example of FIG. 1 , the speed of the constant speed drive in interrupt (a) may be different from the speed of the constant speed drive at the beginning of exposure 1 (a) or at the end of exposure 2 (a). For example, the driving speed of the constant speed drive in interrupt (a) may be determined based on the following parameters:

[0077] (1) a driving distance required for transition from the light-through state θ2 during the first exposure period (exposure 1(a)) to the light-shielding state θ1 during the interruption period (interruption (a)), and further to the light-through state θ2 during the second exposure period (exposure 2(a)); and,

[0078] (2) The timing of transition from the light-passing state θ2 to the light-shielding state θ1 in the first exposure period (exposure 1 (a)), and the timing of transition to the light-passing state θ2 in the second exposure period (exposure 2 (a)).

[0079] Furthermore, in the setting process, the duration of the constant speed drive in the interruption (a) can be set to be different from the duration of the constant speed drive at the start of exposure 1 (a) or at the end of exposure 2 (a). Figure 7As shown, in the setting process, the speed of the constant speed drive in the interruption period can be made slower than that in the moving process, and the duration of the constant speed drive in the interruption period can be made longer than that in the moving process.

[0080] Therefore, according to this example, the break period (break (a)) between the first exposure period (exposure 1 (a)) and the second exposure period (exposure 2 (a)) can be appropriately set according to the pattern distribution of the material and the like.

[0081] (Second Modification)

[0082] When there are a plurality of interruption periods, the length of the first interruption period and the length of the second interruption period may be set independently. Figure 8 An example of exposure processing in which one exposure region is intermittently exposed three times is shown. Figure 8 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Figure 8 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102. Figure 8 In the example, the shutter is changed from the light passing state θ2 to the light shielding state θ1, thereby ending the second exposure period (exposure 2(a)). Thereafter, the shutter is changed to the light passing state θ2, thereby starting the third exposure period (exposure 3(a)) of the first projection grid area (third process (interruption 2(a))).

[0083] In the third step (interruption 2(a)), the shutter is not stopped. In addition, the drive distribution of the shutter may be different during the first interruption period (interruption 1(a)) of the second step and the second interruption period (interruption 2(a)) of the third step. For example, Figure 8 As shown, the drive distribution may be set so that the first interruption period (interruption 1(a)) is shorter than the second interruption period (interruption 2(a)). Alternatively, on the contrary, the drive distribution may be set so that the first interruption period (interruption 1(a)) is longer than the second interruption period (interruption 2(a)). Thus, the control distribution can be determined based on two viewpoints: the interruption period that is optimal for the pattern distribution and the improvement in throughput.

[0084] <Second Embodiment>

[0085] In the second embodiment, an example is shown in which one of the first exposure period (exposure 1(a)) and the second exposure period (exposure 2(a)) includes a period in which the shutter is stationary in the light passing state θ2, and the shutter is not stationary in the other period. Fig. 9 It is a diagram showing the exposure process according to the second embodiment. Fig. 9 The relationship between the horizontal axis and the vertical axis in Figure 6And so on. That is, in Fig. 9 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Fig. 9 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102.

[0086] During the movement period (movement (a)) in which the stage 108 is moved so that the exposure area a is located on the optical axis 109, the light shielding mechanism 102 starts to transition from the light shielding state θ1 to the light passing state θ2. For this state transition, the light shielding mechanism 102 performs acceleration drive and constant speed drive. In the intermediate state, the first exposure period (exposure 1 (a)) for exposing the exposure area a starts.

[0087] During the first exposure period (exposure 1(a)), the light shielding mechanism 102 is driven at a constant speed toward the light passing state θ2. In the second embodiment, even if the light passing state θ2 is reached, the light shielding mechanism 102 does not decelerate and continues to drive at a constant speed. Therefore, the light passing state θ2 is ended by a constant speed rotational motion, and then the state is reached to the light shielding state θ1. At the timing when the light shielding member 102a completely blocks the light, the first exposure period (exposure 1(a)) ends, and the interruption period (interruption (a)) begins. Thereafter, the light shielding mechanism 102 becomes the light shielding state θ1, but at this time, the light shielding mechanism 102 does not decelerate and continues to drive at a constant speed. Therefore, the light shielding state θ1 is ended by a constant speed rotational motion, and then the state is reached to the light passing state θ2. At the timing when the light shielding member 102a allows the light to pass completely, the interruption period (interruption (a)) ends, and the second exposure period (exposure 2(a)) for exposing the exposure area a begins.

[0088] Then, in the second exposure period (exposure 2(a)), the light shielding member 102a is in the light passing state θ2. At this time, the light shielding mechanism 102 decelerates and stops the light shielding member 102a. At this time, in the first drive control of the light shielding mechanism 102, the light shielding member 102a rotates, for example, 180 degrees.

[0089] Then, in coordination with the timing of the completion of the second exposure period (exposure 2 (a)), the shading mechanism 102 starts to drive the shading member 102a from the light passing state θ2 toward the shading state θ1. At this time, the shading mechanism 102 performs acceleration driving and constant speed driving. When the shading member 102a reaches a position where the light from the light source unit 101 is completely blocked, the second exposure period (exposure 2 (a)) ends. At this time, in the second drive control of the shading mechanism 102, the shading member 102a rotates, for example, 60 degrees.

[0090] Then, while the stage 108 is moved so that the exposure region b is located on the optical axis 109 (movement (b)), the light shielding member 102a starts to shift from the light passing state θ2 to the light shielding state θ1. At this time, the light shielding mechanism 102 is driven at a reduced speed. In the same manner, the exposure process is performed for the exposure region b and thereafter.

[0091] In this way, in the second embodiment, when the exposure process is intermittently performed on one exposure area, the driving of the light shielding mechanism 102 in each exposure is independently controlled. This can improve the throughput of the exposure process of intermittent exposure.

[0092] (Variation Example)

[0093] In the case of a plurality of interruption periods, the drive amount of the light shielding member 102a moved by a single drive control may be independently set. In the modified example of the second embodiment shown below, any one of the first exposure period (exposure 1(a)), the second exposure period (exposure 2(a)), and the third exposure period (exposure 3(a)) includes a period in which the shutter is stationary in the light passing state θ2. In addition, the shutter is not stationary during the remaining period. Fig.10 It is a diagram showing exposure processing according to a modification example of the second embodiment. Fig.10 In (A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102 . Fig.10 In (B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light shielding mechanism 102. Fig.10 An example of exposure processing in which one exposure area is exposed three times intermittently is shown. Fig.10 In the embodiment, the first drive of the light-shielding mechanism 102 is performed during the first exposure period (exposure 1(a)), the first interruption period (interruption 1(a)), the second exposure period (exposure 2(a)), the second interruption period (interruption 2(a)), and the third exposure period (exposure 3(a)). On the other hand, the second drive of the light-shielding mechanism 102 is performed only during the third exposure period (exposure 3(a)) and the movement period (movement (b)). This results in the following situation: in the first drive of the light-shielding mechanism 102, the light-shielding member 102a is rotated, for example, by 300 degrees, whereas, in the second drive of the light-shielding mechanism 102, the light-shielding member 102a is rotated, for example, by 60 degrees. Thus, according to this example, in an exposure process in which an exposure area is intermittently exposed multiple times, the drive amount of the light-shielding member 102a in each exposure process can be independently set.

[0094] <Implementation Method of Article Manufacturing Method>

[0095] The article manufacturing method involved in the embodiment of the present invention is suitable for manufacturing articles such as micro devices such as semiconductor devices, elements with fine structures, etc. The article manufacturing method of this embodiment includes a process of forming a latent image pattern using the above-mentioned exposure device on the photosensitive agent coated on the substrate (a process of exposing the substrate), and a process of developing the substrate on which the latent image pattern is formed in this process. The manufacturing method also includes other well-known processes (oxidation, film formation, evaporation, doping, flattening, etching, resist stripping, cutting, bonding, packaging, etc.). Compared with previous methods, the article manufacturing method of this embodiment is advantageous to at least one of the performance, quality, productivity, and production cost of the article.

[0096] The present invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the present invention. Therefore, in order to disclose the scope of the invention, the following claims are appended.

Claims

1. An exposure method, wherein the exposure method intermittently exposes a projection grid area of ​​a substrate, and the intermittent exposure intermittently performs multiple exposures, wherein the exposure method is characterized by comprising: In a first step, a shutter for opening and closing an optical path of exposure light is changed from a light-shielding state to a light-passing state, thereby starting a first exposure of a first projection grid area of ​​the substrate; as well as In the second step, the shutter is changed from the light passing state to the light shielding state, thereby terminating the first exposure, and then the shutter is changed to the light passing state again, thereby starting the second exposure, in which the first projection grid area subjected to the first exposure is exposed again, In the second step, the shutter is not made to stop.

2. The exposure method according to claim 1, characterized in that: The method further includes a setting step of setting a driving profile of the shutter in the second step to adjust the length of a suspension period during which exposure is suspended between the first exposure and the second exposure.

3. The exposure method according to claim 2, characterized in that: In the setting step, the speed of the constant speed driving during the interruption period and the duration of the constant speed driving are set.

4. The exposure method according to claim 3, characterized in that: The method further includes moving a stage holding the substrate so that after the second exposure, the shutter changes from the light passing state to the light shielding state, and exposes a second projection grid area of ​​the substrate behind the first projection grid area. In the setting step, the speed of the constant speed drive in the interruption period is made slower than the speed of the constant speed drive in the moving step, and the duration of the constant speed drive in the interruption period is made longer than the duration of the constant speed drive in the moving step.

5. The exposure method according to claim 1, characterized in that: The method further includes a third step, in which the shutter is changed from the light passing state to the light shielding state, thereby terminating the second exposure, and then the shutter is changed to the light passing state again, thereby starting a third exposure of the first projection grid area. In the third step, the shutter is not made to be stationary. In the second step and the third step, the driving profile of the shutter is different.

6. The exposure method according to claim 1, characterized in that: The period during which the first exposure is performed and the period during which the second exposure is performed each include a period during which the shutter is kept stationary in the light passing state.

7. The exposure method according to claim 5, characterized in that: The period during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed each include a period during which the shutter is kept stationary in the light passing state.

8. The exposure method according to claim 1, characterized in that: One of a period during which the first exposure is performed and a period during which the second exposure is performed includes a period during which the shutter is kept at rest in the light passing state, and in the other period, the shutter is not kept at rest.

9. The exposure method according to claim 5, characterized in that: Any one of a period during which the first exposure is performed, a period during which the second exposure is performed, and a period during which the third exposure is performed includes a period during which the shutter is kept stationary in the light passing state, and the shutter is not kept stationary in the remaining period.

10. An exposure device, which performs intermittent exposure on a projection grid area of ​​a substrate, wherein the intermittent exposure is performed multiple times intermittently, and the exposure device is characterized in that it has: a shutter having a light passing portion and a light shielding portion; a driving unit that drives the shutter to put the shutter into a light-shielding state by positioning the light-shielding unit on an optical path of exposure light and to put the shutter into a light-passing state by positioning the light-passing unit on the optical path; and Control Department, The control unit is configured to execute: A first step is to change the shutter from the light-shielding state to the light-passing state, thereby starting a first exposure of a first projection grid area of ​​the substrate; and In the second step, the shutter is changed from the light passing state to the light shielding state, thereby terminating the first exposure, and then the shutter is changed to the light passing state again, thereby starting the second exposure, in which the first projection grid area subjected to the first exposure is exposed again, The control unit controls the driving unit so as not to stop the shutter in the first step.

11. A method for manufacturing an article, characterized in that: include: A step of exposing a substrate according to the exposure method according to any one of claims 1 to 9; as well as a step of developing the exposed substrate, An article is manufactured from the developed substrate.

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