Method and device for optimizing three-dimensional effect of clothing pattern
By meshing the clothing sheets and constraining the contour lines of the specified patterns, the correspondence between the clothing sheets and the specified patterns is established, and the thickness of the specified patterns is rendered, the problem of poor three-dimensional effect of clothing patterns in the prior art is solved, and a more realistic and consistent three-dimensional effect is achieved.
Patent Information
- Application Number
- CN202311276417.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-28
- Publication Date
- 2025-03-28
AI Technical Summary
The prior art has shortcomings in presenting the three-dimensional effect of clothing patterns. Single-layer grids cannot achieve real three-dimensional effect, and edge rendering is not obvious, especially for thickness performance with 90° edges. The existing methods are prone to stiff and uneven effects when dealing with clothing models with large area and wrinkles.
By meshing the clothing sheet and constraining the meshing based on the contour lines of the specified pattern, the meshed pattern coincides with the contour lines of the specified pattern. Establish a correspondence between the clothing sheet and the specified pattern, adjust the specified pattern when the clothing sheet changes to maintain its position relative to the clothing sheet, and render the thickness of the specified pattern to achieve a three-dimensional effect.
It improves the accuracy and consistency of the pattern on the clothing version, enhances the three-dimensional sense of the pattern, makes the pattern visually present a better three-dimensional effect, avoids uneven situations, achieves a more realistic three-dimensional effect, and optimizes the three-dimensional simulation visualization effect.
Smart Images
Figure CN119723000A_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of three-dimensional clothing processing, and in particular relates to a method and a device for optimizing the three-dimensional effect of clothing patterns. Background Art
[0002] Using digital technology to achieve the true reproduction of clothing patterns on three-dimensional models is one of the important technical means in the clothing industry. Stereoscopic effect technology can make clothing patterns more delicate and realistic, while also providing clothing designers with more intuitive visual effects, which can enhance their design capabilities and creativity, allowing them to more accurately predict the effects of clothing in real environments, saving time and costs, while improving design accuracy and efficiency.
[0003] However, the existing technology has some shortcomings in presenting the three-dimensional effect of clothing patterns. The single-layer mesh of patterns / decals commonly used in the existing technology cannot achieve a true three-dimensional effect. Even if the thickness is rendered by edge normals, the effect is not obvious, especially for thickness with 90° edges. In addition, the method of using displacement thickness rendering can only be achieved through offline rendering, and the edges are not flat, which cannot be applied to the situation where the side thickness uses different materials.
[0004] Secondly, when the clothing model has a large area and has wrinkles, the requirements for the model shape are high, and the solutions using existing technologies often result in stiff and uneven effects. The method of achieving a three-dimensional effect by sewing pieces of corresponding shapes also has the problems of low efficiency, cumbersome operation procedures, the risk of penetration, and the final effect of the generated pattern cannot be flattened. Summary of the invention
[0005] In order to overcome the defects of the above-mentioned prior art, the present invention proposes a method for optimizing the three-dimensional effect of clothing patterns, wherein the clothing is composed of one or more clothing patterns, and the method comprises:
[0006] Meshing the garment pattern piece, and constraining the meshing based on the contour line of the designated pattern on the garment pattern piece, so that the edges of multiple meshes in the original mesh pattern obtained after the meshing coincide with the contour line of the designated pattern;
[0007] A correspondence relationship between the garment pattern and the designated pattern is established based on the designated pattern and the original grid pattern on the garment pattern, so that when the shape of the garment pattern changes, the designated pattern is adjusted accordingly based on the correspondence relationship to maintain the position of the designated pattern relative to the garment pattern;
[0008] The thickness of the designated pattern is rendered to reflect the three-dimensional effect of the designated pattern on the clothing.
[0009] Further, the “rendering the thickness of the specified pattern” includes:
[0010] If a first grid pattern is detected, the original grid pattern inside the outline of the designated pattern is offset by a third distance in the first direction to generate a third grid pattern, the original grid pattern inside the outline of the designated pattern is offset by the first distance in the first direction to generate a fourth grid pattern, and the designated pattern with thickness rendering is obtained based on the third grid pattern and the fourth grid pattern; the third distance is greater than the first distance, and the rendering thickness of the designated pattern is the difference between the third distance and the first distance;
[0011] If the first grid pattern is not detected, the original grid pattern inside the contour of the designated pattern is offset in the first direction by a third distance to generate the third grid pattern, and the designated pattern with completed thickness rendering is obtained based on the third grid pattern and the original grid pattern inside the contour of the designated pattern; the rendering thickness of the designated pattern is equal to the third distance.
[0012] Preferably, the method further comprises:
[0013] The thickness of the garment pattern is rendered.
[0014] Furthermore, the first grid pattern is obtained by shifting the original grid pattern on the garment pattern piece in a first direction by a first distance, and the method further includes:
[0015] Obtaining the garment pattern with thickness rendering completed based on the first grid pattern and the original grid pattern; the rendering thickness of the garment pattern is equal to the first distance;
[0016] Or, the original grid pattern is offset in a second direction by a second distance to generate a second grid pattern, and the garment pattern piece with thickness rendering is obtained based on the second grid pattern and the original grid pattern; the rendering thickness of the garment pattern piece is equal to the second distance;
[0017] Or, the original grid pattern is offset in the second direction by a second distance to generate a second grid pattern, and the clothing pattern with completed thickness rendering is obtained based on the first grid pattern and the second grid pattern; the rendering thickness of the clothing pattern is the sum of the first distance and the second distance.
[0018] Specifically, the first grid pattern is obtained by shifting an original grid pattern on the garment plate in a first direction by a first distance.
[0019] Specifically, the method further includes:
[0020] Acquire normals of vertices in the original mesh pattern, so as to determine a direction of the normals extending toward the outside of the garment pattern piece as a first direction;
[0021] The normals of the vertices in the original mesh pattern are obtained, and the direction of the normals extending toward the inner side of the garment pattern piece is determined as the second direction.
[0022] Preferably, the method further comprises:
[0023] Changing the position and / or shape of the designated pattern based on a user's instruction to generate a new pattern, and re-gridding the garment pattern piece, while constraining the gridding based on the contour of the new pattern on the garment pattern piece, so that the edges of multiple grids in the original grid pattern obtained after the gridding coincide with the contour of the new pattern;
[0024] Establishing a correspondence between the garment pattern and the new pattern based on the new pattern and the original grid pattern on the garment pattern;
[0025] After repeatedly performing stitching and simulation processing on the garment pattern piece, the thickness of the new pattern is rendered to reflect the three-dimensional effect of the new pattern on the garment.
[0026] Preferably, the meshing comprises triangular meshing, and the original mesh pattern comprises a triangular mesh pattern composed of a plurality of triangular meshes.
[0027] The present invention also proposes a device for optimizing the three-dimensional effect of clothing patterns, which is used to implement the method described above, and the device comprises:
[0028] A creation module, for meshing the garment pattern piece, and constraining the meshing based on the contour line of the designated pattern on the garment pattern piece, so that the edges of multiple meshes in the original mesh pattern obtained after the meshing coincide with the contour line of the designated pattern;
[0029] A first corresponding module is used to establish a corresponding relationship between the garment pattern and the designated pattern based on the designated pattern and the original grid pattern on the garment pattern, so that when the shape of the garment pattern changes, the designated pattern is adjusted accordingly based on the corresponding relationship to maintain the position of the designated pattern relative to the garment pattern;
[0030] The first rendering module is used to render the thickness of the designated pattern to reflect the three-dimensional effect of the designated pattern on the clothing.
[0031] Furthermore, the first rendering module includes:
[0032] a second offset unit, configured to offset the original grid pattern inside the contour of the designated pattern by a third distance in the first direction to generate a third grid pattern, and when the first grid pattern is detected, offset the original grid pattern inside the contour of the designated pattern by the first distance in the first direction to generate a fourth grid pattern; the third distance is greater than the first distance;
[0033] A second acquisition unit is used to obtain the designated pattern that completes thickness rendering based on the third grid pattern and the fourth grid pattern; the rendering thickness of the designated pattern is the difference between the third distance and the first distance;
[0034] Or, the designated pattern with completed thickness rendering is obtained based on the third grid pattern and the grid pattern inside the contour line of the designated pattern; the rendering thickness of the designated pattern is equal to the third distance.
[0035] The present invention has at least the following beneficial effects:
[0036] This solution grids the garment pattern and constrains it based on the specified pattern outline, so that the gridded pattern coincides with the outline of the specified pattern, and by establishing a corresponding relationship between the garment pattern and the specified pattern, the specified pattern is adjusted accordingly when the garment pattern changes, which plays a role in stabilizing the position of the specified pattern relative to the garment pattern, improving the accuracy and consistency of the pattern on the garment pattern, and thereby enhancing the three-dimensional sense of the pattern, so that the pattern presents a better three-dimensional effect visually;
[0037] In addition, this solution can construct grid data with thickness, and the pattern can fit perfectly with the clothing pattern, effectively preventing the unevenness of the pattern, thereby achieving a more realistic three-dimensional effect and optimizing the three-dimensional simulation and visualization effect of this type of clothing craft. It can make the side effect of the pattern have more forms of expression and can be flexibly applied to various materials. Users can adjust the position and style of the pattern according to their needs, and reuse the physical parameters in the previous stitching and simulation processing steps, so as to directly migrate the effects that have been generated on the clothing pattern to the same clothing pattern with the new pattern attached, effectively reducing the repetitive steps in manual operations and improving work efficiency.
[0038] Therefore, the present invention provides a method and device for optimizing the three-dimensional effect of clothing patterns. This scheme can accurately control and maintain the position and shape of the specified pattern relative to the clothing pattern by gridding the clothing pattern and constraining the gridding according to the contour line of the specified pattern, and on this basis enhance the three-dimensional sense of the specified pattern on the clothing, so that the clothing has a better visual sense of layering and three-dimensional effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0039] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0040] Figure 1 A schematic diagram of the overall process of the method for optimizing the three-dimensional effect of clothing patterns provided in Example 1;
[0041] Figure 2 This is an example of a specified pattern after meshing the garment pattern;
[0042] Figure 3 This is an example of a garment pattern with a specified pattern containing inner contours after meshing;
[0043] Figure 4 A flow chart of a method for processing a garment pattern;
[0044] Figure 5 Example of rendering a garment pattern and specifying pattern thickness;
[0045] FIG. 6( a ) is an example diagram showing a side effect with curvature in a designated pattern, and FIG. 6( b ) is an example diagram showing a side effect with right angles in a designated pattern;
[0046] Figure 7 A flow chart of a method for optimizing the three-dimensional effect of a specified pattern after a change;
[0047] Figure 8 This is a schematic diagram of the module structure of the device for optimizing the three-dimensional effect of clothing patterns provided in Example 2.
[0048] illustrate:
[0049] 10-creation module; 20-first corresponding module; 30-first rendering module; 31-determination unit; 32-first offset unit; 33-first acquisition unit; 34-second offset unit; 35-second acquisition unit; 40-stitching module; 50-simulation module; 60-change module; 70-second corresponding module; 80-second rendering module. DETAILED DESCRIPTION
[0050] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0051] Hereinafter, various embodiments of the present invention will be described more fully. The present invention may have various embodiments, and adjustments and changes may be made therein. However, it should be understood that there is no intention to limit the various embodiments of the present invention to the specific embodiments disclosed herein, but the present invention should be understood to cover all adjustments, equivalents and / or alternatives falling within the spirit and scope of the various embodiments of the present invention.
[0052] Hereinafter, the term "include" or "may include" used in various embodiments of the present invention indicates the presence of disclosed functions, operations or elements, and does not limit the addition of one or more functions, operations or elements. In addition, as used in various embodiments of the present invention, the terms "include", "have" and their cognates are intended only to indicate specific features, numbers, steps, operations, elements, components or combinations of the foregoing items, and should not be understood as first excluding the presence of one or more other features, numbers, steps, operations, elements, components or combinations of the foregoing items or the possibility of adding one or more features, numbers, steps, operations, elements, components or combinations of the foregoing items.
[0053] In various embodiments of the present invention, the expression "or" or "at least one of A or / and B" includes any combination or all combinations of the words listed at the same time. For example, the expression "A or B" or "at least one of A or / and B" may include A, may include B, or may include both A and B.
[0054] The expressions (such as "first", "second", etc.) used in various embodiments of the present invention may modify the various constituent elements in various embodiments, but may not limit the corresponding constituent elements. For example, the above expressions do not limit the order and / or importance of the elements. The above expressions are only used for the purpose of distinguishing an element from other elements. For example, the first user device and the second user device indicate different user devices, although both are user devices. For example, without departing from the scope of various embodiments of the present invention, the first element may be referred to as the second element, and similarly, the second element may also be referred to as the first element.
[0055] It should be noted that in the present invention, unless otherwise clearly specified and defined, the terms such as "installation", "connection", "fixation" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0056] In the present invention, those skilled in the art need to understand that the terms indicating orientation or positional relationship herein are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.
[0057] The terms used in various embodiments of the present invention are only used for the purpose of describing specific embodiments and are not intended to limit various embodiments of the present invention. As used herein, the singular form is intended to also include the plural form, unless the context clearly indicates otherwise. Unless otherwise limited, all terms used here (including technical terms and scientific terms) have the same meaning as the meaning generally understood by those of ordinary skill in the art to which the various embodiments of the present invention belong. The terms (such as the terms defined in the dictionary generally used) will be interpreted as having the same meaning as the contextual meaning in the relevant technical field and will not be interpreted as having an idealized meaning or an overly formal meaning, unless clearly defined in various embodiments of the present invention.
[0058] Example 1
[0059] See also Figure 1-2 This embodiment proposes a method for optimizing the three-dimensional effect of clothing patterns, the method comprising:
[0060] S100: Meshing the garment pattern, and constraining the meshing based on the contour of the designated pattern on the garment pattern, so that the edges of multiple meshes in the original mesh pattern obtained after meshing coincide with the contour of the designated pattern.
[0061] It should be noted that a garment is usually composed of one or more garment patterns. By meshing the garment patterns in the initial state, a complex garment model can be transformed into a simple structure composed of many small mesh units, so as to better perform simulation, rendering and animation processing;
[0062] The initial state refers to the unprocessed cloth or blank before the cloth is cut according to the set shape, size and style. At this time, the clothing pattern has not been processed by the steps of segmentation, padding, stitching and ironing. Therefore, the clothing pattern at this stage only has preliminary shape and size information and can meet the basic gridding requirements.
[0063] In addition, please refer to Figure 3 , the contour lines in the specified pattern may include inner contour lines in addition to outer contour lines. When the contour lines include outer contour lines and inner contour lines, the edges of multiple grids in the original grid pattern obtained after meshing need to coincide with the contour lines of the specified pattern including the outer contour lines and the inner contour lines.
[0064] Specifically, the meshing methods for clothing patterns may include but are not limited to triangular meshing, quadrilateral meshing and hexagonal meshing. The meshing in this embodiment includes triangular meshing. The triangular mesh pattern obtained after triangular meshing includes multiple triangular meshes with uniform density and no elongated shapes.
[0065] S200: establishing a correspondence between the garment pattern and the designated pattern based on the designated pattern and the original grid pattern on the garment pattern.
[0066] It should be noted that when the correspondence between the clothing pattern and the specified pattern is established in step S200, both the clothing pattern and the specified pattern are in an initial state. After the correspondence is established through step S200, when the shape of the clothing pattern changes, the specified pattern can be adjusted accordingly based on the correspondence, and the effect of maintaining the position of the specified pattern relative to the clothing pattern can be achieved.
[0067] S300: Rendering the thickness of the specified pattern to reflect the three-dimensional effect of the specified pattern on the clothing.
[0068] Specifically, see Figure 4 , the method further comprises:
[0069] S400: Sewing garment patterns to form a garment model.
[0070] S500: Carrying the clothing model through the display medium, and performing simulation processing on the clothing model based on the set physical parameters.
[0071] It should be noted that the display media include but are not limited to digital models, human models, hangers and display stands. For example, when the human model is used as the display medium, step S420 needs to adapt the clothing model to the movement of the human model, and then place the clothing model at the corresponding position of the human model; when the user adjusts the movement of the human model, the clothing model will also change accordingly. In this process, the clothing model needs to be able to follow the movement of the human model and maintain its position on the human model.
[0072] In this embodiment, the changes in the morphology of the garment pattern pieces mentioned above include changes that occur during the stitching and simulation processing.
[0073] Specifically, the method proposed in this embodiment further includes rendering the thickness of the clothing pattern. The method for rendering the thickness of the clothing pattern includes:
[0074] The original grid pattern on the garment pattern is offset in a first direction by a first distance to generate a first grid pattern, and a garment pattern with thickness rendering is obtained based on the first grid pattern and the original grid pattern; the rendering thickness of the garment pattern is equal to the first distance;
[0075] Or, the original grid pattern is offset in a second direction by a second distance to generate a second grid pattern, and a garment pattern piece with thickness rendering is obtained based on the second grid pattern and the original grid pattern; the rendering thickness of the garment pattern piece is equal to the second distance;
[0076] Or, the original grid pattern is offset in a first direction by a first distance to generate a first grid pattern, the original grid pattern is offset in a second direction by a second distance to generate a second grid pattern, and a clothing pattern with completed thickness rendering is obtained based on the first grid pattern and the second grid pattern; the rendering thickness of the clothing pattern is the sum of the first distance and the second distance.
[0077] Specifically, there are several methods for rendering the thickness of clothing patterns. In a specific application environment or in combination with user needs, one of the above methods can be adaptively selected to render the thickness of the clothing pattern, so as to reflect the differentiation and better adapt to the specific application environment and user needs.
[0078] It should be noted that the values of the first distance and the second distance may be the same or different.
[0079] Preferably, the method further comprises:
[0080] The normals of the vertices in the original mesh pattern are obtained to determine the direction of the normal extending toward the outside of the garment pattern as a first direction, and the direction of the normal extending toward the inside of the garment pattern as a second direction.
[0081] Furthermore, if the thickness of the garment pattern is rendered, in order to prevent the specified pattern from being covered by the garment pattern after the thickness is rendered, the “rendering the thickness of the specified pattern on the garment pattern” in step S300 specifically includes:
[0082] If the first grid pattern is detected, the original grid pattern inside the outline of the designated pattern is offset by a third distance in the first direction to generate a third grid pattern, the original grid pattern inside the outline of the designated pattern is offset by a first distance in the first direction to generate a fourth grid pattern, and the designated pattern with thickness rendering is obtained based on the third grid pattern and the fourth grid pattern; the third distance is greater than the first distance, and the rendering thickness of the designated pattern is the difference between the third distance and the first distance; it should be noted that the third distance is greater than the first distance;
[0083] Since the thickness of the rendered specified pattern is obtained based on the third offset distance of the first grid pattern and the first offset distance of the original grid pattern, and the first grid pattern is obtained by offsetting the original grid pattern on the clothing pattern in the first direction by the first distance, the rendering thickness, direction, and position of the specified pattern are related to the original grid pattern. When the clothing pattern changes dynamically, the specified pattern will also change synchronously, thereby avoiding the phenomenon of penetration between the specified pattern and the clothing pattern in the rendering with wrinkle effects and subsequent dynamic simulations.
[0084] If the first grid pattern is not detected, the original grid pattern inside the contour of the designated pattern is offset in the first direction by a third distance to generate a third grid pattern, and the designated pattern with completed thickness rendering is obtained based on the third grid pattern and the original grid pattern inside the contour of the designated pattern; the rendering thickness of the designated pattern is equal to the third distance.
[0085] At this time, since the thickness of the rendered specified pattern is directly based on the original grid pattern, the rendering thickness, direction, and position of the specified pattern are related to the original grid pattern. When the clothing pattern changes dynamically, the specified pattern will also change synchronously, thereby avoiding the phenomenon of penetration between the specified pattern and the clothing pattern in the rendering with wrinkle effects and subsequent dynamic simulations.
[0086] In a specific embodiment, the rendering thickness of the garment pattern needs to be θ and the rendering thickness of the specified pattern needs to be δ, then the sum of the first distance and the second distance needs to be θ, and the value of the third distance is the sum of the first distance and δ;
[0087] Assuming that the first distance and the second distance are both θ / 2, the original grid pattern on the clothing pattern needs to be offset by a distance of θ / 2 in the first direction to generate the first grid pattern, and the original grid pattern on the clothing pattern needs to be offset by a distance of θ / 2 in the second direction to generate the second grid pattern;
[0088] When the first distance is θ / 2, the third distance is θ / 2+δ, and the original grid pattern inside the outline of the specified pattern needs to be offset by a distance of θ / 2+δ in the first direction to generate the third grid pattern, and the original grid pattern inside the outline of the specified pattern needs to be offset by a distance of θ / 2 in the first direction to generate the fourth grid pattern;
[0089] Since the step of rendering the specified pattern thickness needs to be executed after the step of rendering the garment pattern, the step of offsetting the original grid pattern inside the contour line of the specified pattern by a distance of θ / 2 in the first direction to generate a fourth grid pattern can be regarded as moving the original grid pattern inside the contour line of the specified pattern to the top of the garment pattern.
[0090] In this solution, the original grid pattern on the clothing pattern and the original grid pattern inside the outline of the specified pattern are closely connected to each other. Therefore, when rendering the thickness of the clothing pattern and the specified pattern, the technical effect of making the specified pattern dynamically change accordingly with the change in the shape of the clothing pattern can be achieved. In addition, if the shape of the clothing pattern still needs to be changed after the thickness rendering of the clothing pattern and the specified pattern is completed, the three-dimensional specified pattern can also adaptively change naturally and dynamically with the change in the shape of the clothing pattern.
[0091] See also Figure 5 In another embodiment, the original grid pattern of the clothing pattern and the specified pattern can be offset by the same distance in the first direction and the second direction respectively to obtain a completed thickness-rendered clothing pattern and the specified pattern. If the rendering thickness of the clothing pattern needs to be θ and the rendering thickness of the specified pattern needs to be δ, the original grid pattern on the clothing pattern is offset by a distance of θ / 2 in the first direction and the second direction respectively, and the original grid pattern inside the contour line of the specified pattern is offset by a distance of θ / 2+δ / 2 in the first direction, and then the original grid pattern inside the contour line of the specified pattern is offset by a distance of δ / 2 in the first direction and the second direction respectively.
[0092] Please refer to Figure 6(a)-(b). This solution can construct grid data with thickness, and the pattern can fit perfectly with the clothing pattern, effectively preventing the unevenness of the pattern, thereby achieving a more realistic three-dimensional effect and optimizing the three-dimensional simulation and visualization effect of this type of clothing craft. This solution can achieve a 90° right-angle side effect while making the pattern show a curvature side effect, and can also be flexibly applied to various different materials.
[0093] Optionally, specify a pattern to attach to the garment pattern. To save steps, see Figure 7 , the method further comprises:
[0094] S600: Based on the user's instructions, the position and / or shape of the specified pattern is changed to generate a new pattern, and the garment pattern is re-gridded. At the same time, the gridding is constrained based on the contour line of the new pattern on the garment pattern so that the edges of multiple grids in the original grid pattern obtained after gridding coincide with the contour line of the new pattern.
[0095] S700: Establishing a correspondence between the garment pattern and the new pattern based on the new pattern and the original grid pattern on the garment pattern.
[0096] S800: Renders the thickness of the new pattern to give it a three-dimensional effect on the garment.
[0097] It should be noted that the scheme of steps S600 to S800 is similar to that of steps S100 to S300, and the original scheme can be interrupted and replaced at any node in the process of steps S100 to S300 to facilitate the change of the pattern. Therefore, the user can adjust the position and style of the pattern at any time according to needs, and reuse the physical parameters in previous stitching and simulation processing steps. At the same time, the effects that have been generated on the clothing pattern can be directly migrated to the same clothing pattern with the new pattern attached. This method can effectively reduce the repetitive steps in manual operations and improve work efficiency.
[0098] Example 2
[0099] See also Figure 8 This embodiment proposes a device for optimizing the three-dimensional effect of clothing patterns, the device comprising:
[0100] A creation module 10 is used to grid the garment pattern piece, and constrain the gridding based on the contour line of the specified pattern on the garment pattern piece, so that the edges of multiple grids in the original grid pattern obtained after gridding coincide with the contour line of the specified pattern;
[0101] A first corresponding module 20 is used to establish a corresponding relationship between the garment pattern and the specified pattern based on the specified pattern and the original grid pattern on the garment pattern, so that when the shape of the garment pattern changes, the specified pattern is adjusted accordingly based on the corresponding relationship to maintain the position of the specified pattern relative to the garment pattern;
[0102] The first rendering module 30 is used to render the thickness of the designated pattern to reflect the three-dimensional effect of the designated pattern on the clothing.
[0103] Specifically, the device also includes:
[0104] A sewing module 40, for sewing garment patterns to form a garment model;
[0105] The simulation module 50 is used to carry the clothing model through the display medium and perform simulation processing on the clothing model based on the set physical parameters.
[0106] Specifically, the first rendering module 30 includes:
[0107] A determination unit 31 is used to obtain normals of vertices in the original mesh pattern on the garment pattern, so as to determine a direction of the normal extending toward the outside of the garment pattern as a first direction, and a direction of the normal extending toward the inside of the garment pattern as a second direction;
[0108] A first offset unit 32, configured to offset the original grid pattern by a first distance in a first direction to generate a first grid pattern, and / or offset the original grid pattern by a second distance in a second direction to generate a second grid pattern;
[0109] A first acquisition unit 33, configured to obtain a garment pattern with thickness rendering completed based on the first grid pattern and the original grid pattern;
[0110] Or, obtaining a garment pattern with thickness rendering completed based on the second grid pattern and the original grid pattern;
[0111] Or, a garment pattern with thickness rendering is obtained based on the first grid pattern and the second grid pattern.
[0112] It should be noted that when a clothing pattern with completed thickness rendering is obtained based on the first grid pattern and the original grid pattern, the rendering thickness of the clothing pattern obtained by the first acquisition unit 33 is equal to the first distance; when a clothing pattern with completed thickness rendering is obtained based on the second grid pattern and the original grid pattern, the rendering thickness of the clothing pattern is equal to the second distance; when a clothing pattern with completed thickness rendering is obtained based on the first grid pattern and the second grid pattern, the rendering thickness of the clothing pattern is the sum of the first distance and the second distance.
[0113] Furthermore, the first rendering module 30 also includes:
[0114] A second offset unit 34 is used to offset the original grid pattern inside the outline of the designated pattern by a third distance in the first direction to generate a third grid pattern, and when the first grid pattern is detected, offset the original grid pattern inside the outline of the designated pattern by a first distance in the first direction to generate a fourth grid pattern;
[0115] The second acquisition unit 35 is used to obtain the designated pattern for thickness rendering based on the third grid pattern and the fourth grid pattern, or to obtain the designated pattern for thickness rendering based on the third grid pattern and the original grid pattern inside the contour of the designated pattern.
[0116] It should be noted that the third distance is greater than the first distance. When the designated pattern for completing thickness rendering is obtained based on the third grid pattern and the fourth grid pattern, the rendering thickness of the designated pattern obtained by the second acquisition unit 35 is the difference between the third distance and the first distance; when the designated pattern for completing thickness rendering is obtained based on the third grid pattern and the original grid pattern inside the contour line of the designated pattern, the rendering thickness of the designated pattern is equal to the third distance.
[0117] Specifically, the device also includes:
[0118] The change module 60 is used to change the position and / or shape of the specified pattern based on the user's instructions to generate a new pattern, and re-grid the clothing pattern, and at the same time constrain the gridding based on the contour line of the new pattern on the clothing pattern so that the edges of multiple grids in the original grid pattern obtained after gridding coincide with the contour line of the new pattern.
[0119] The second corresponding module 70 is used to establish a corresponding relationship between the garment pattern and the new pattern based on the new pattern and the original grid pattern on the garment pattern.
[0120] The second rendering module 80 is used to render the thickness of the new pattern to reflect the three-dimensional effect of the new pattern on the clothing.
[0121] In summary, the present invention provides a method and device for optimizing the three-dimensional effect of clothing patterns. This scheme can accurately control and maintain the position and shape of the specified pattern relative to the clothing pattern by gridding the clothing pattern and constraining the gridding according to the contour line of the specified pattern, and on this basis enhance the three-dimensional sense of the specified pattern on the clothing, so that the clothing has a better visual sense of layering and three-dimensional effect.
[0122] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims
1. A method for optimizing the three-dimensional effect of a clothing pattern, wherein the clothing is composed of one or more clothing patterns, characterized in that: The method comprises: Meshing the garment pattern piece, and constraining the meshing based on the contour line of the designated pattern on the garment pattern piece, so that the edges of multiple meshes in the original mesh pattern obtained after the meshing coincide with the contour line of the designated pattern; A correspondence relationship between the garment pattern and the designated pattern is established based on the designated pattern and the original grid pattern on the garment pattern, so that when the shape of the garment pattern changes, the designated pattern is adjusted accordingly based on the correspondence relationship to maintain the position of the designated pattern relative to the garment pattern; The thickness of the designated pattern is rendered to reflect the three-dimensional effect of the designated pattern on the clothing.
2. The method for optimizing the three-dimensional effect of clothing patterns according to claim 1, characterized in that: The “thickness of rendering the specified pattern” includes: If a first grid pattern is detected, the original grid pattern inside the contour of the designated pattern is offset by a third distance in the first direction to generate a third grid pattern, and the original grid pattern inside the contour of the designated pattern is offset by the first distance in the first direction to generate a fourth grid pattern, and the designated pattern with completed thickness rendering is obtained based on the third grid pattern and the fourth grid pattern; the third distance is greater than the first distance, and the rendering thickness of the designated pattern is the difference between the third distance and the first distance.
3. The method for optimizing the three-dimensional effect of clothing patterns according to claim 1, characterized in that: The “rendering the thickness of the specified pattern” also includes: If the first grid pattern is not detected, the original grid pattern inside the contour of the designated pattern is offset in the first direction by a third distance to generate the third grid pattern, and the designated pattern with completed thickness rendering is obtained based on the third grid pattern and the original grid pattern inside the contour of the designated pattern; the rendering thickness of the designated pattern is equal to the third distance.
4. The method for optimizing the three-dimensional effect of clothing patterns according to claim 1, characterized in that: The method also includes rendering a thickness of the garment pattern.
5. The method for optimizing the three-dimensional effect of clothing patterns according to claim 2 or 3, characterized in that: The method further comprises: Obtaining the garment pattern with thickness rendering completed based on the first grid pattern and the original grid pattern; the rendering thickness of the garment pattern is equal to the first distance; Or, the original grid pattern is offset in a second direction by a second distance to generate a second grid pattern, and the garment pattern piece with thickness rendering is obtained based on the second grid pattern and the original grid pattern; the rendering thickness of the garment pattern piece is equal to the second distance; Or, the original grid pattern is offset in the second direction by a second distance to generate a second grid pattern, and the clothing pattern with completed thickness rendering is obtained based on the first grid pattern and the second grid pattern; the rendering thickness of the clothing pattern is the sum of the first distance and the second distance.
6. The method for optimizing the three-dimensional effect of clothing patterns according to claim 2 or 3, characterized in that: The first grid pattern is obtained by shifting the original grid pattern on the garment plate in a first direction by a first distance.
7. The method for optimizing the three-dimensional effect of clothing patterns according to any one of claims 2 to 4, characterized in that: The method further comprises: The normals of the vertices in the original mesh pattern are obtained to determine the direction of the normals extending toward the outside of the garment pattern piece as the first direction.
8. The method for optimizing the three-dimensional effect of clothing patterns according to claim 5, characterized in that: The method further comprises: The normals of the vertices in the original mesh pattern are obtained, and the direction of the normals extending toward the inner side of the garment pattern piece is determined as the second direction.
9. The method for optimizing the three-dimensional effect of clothing patterns according to claim 1, characterized in that: The method further comprises: Changing the position and / or shape of the designated pattern based on a user's instruction to generate a new pattern, and re-gridding the garment pattern piece, while constraining the gridding based on the contour of the new pattern on the garment pattern piece, so that the edges of multiple grids in the original grid pattern obtained after the gridding coincide with the contour of the new pattern; Establishing a correspondence between the garment pattern and the new pattern based on the new pattern and the original grid pattern on the garment pattern; The thickness of the new pattern is rendered on the garment pattern piece to reflect the three-dimensional effect of the new pattern on the garment.
10. The method for optimizing the three-dimensional effect of clothing patterns according to claim 1 or 9, characterized in that: The meshing includes triangular meshing, and the original mesh pattern includes a triangular mesh pattern composed of a plurality of triangular meshes.
11. A device for optimizing the three-dimensional effect of clothing patterns, characterized in that: For implementing the method according to any one of claims 1 to 10, the device comprises: A creation module, for meshing the garment pattern piece, and constraining the meshing based on the contour line of the designated pattern on the garment pattern piece, so that the edges of multiple meshes in the original mesh pattern obtained after the meshing coincide with the contour line of the designated pattern; A first corresponding module is used to establish a corresponding relationship between the garment pattern and the designated pattern based on the designated pattern and the original grid pattern on the garment pattern, so that when the shape of the garment pattern changes, the designated pattern is adjusted accordingly based on the corresponding relationship to maintain the position of the designated pattern relative to the garment pattern; The first rendering module is used to render the thickness of the designated pattern to reflect the three-dimensional effect of the designated pattern on the clothing.
12. The device for optimizing the three-dimensional effect of clothing patterns according to claim 11, characterized in that: The first rendering module includes: a second offset unit, configured to offset the original grid pattern inside the contour of the designated pattern by a third distance in the first direction to generate a third grid pattern, and when the first grid pattern is detected, offset the original grid pattern inside the contour of the designated pattern by the first distance in the first direction to generate a fourth grid pattern; the third distance is greater than the first distance; A second acquisition unit is used to obtain the designated pattern that completes thickness rendering based on the third grid pattern and the fourth grid pattern; the rendering thickness of the designated pattern is the difference between the third distance and the first distance; Or, the designated pattern with thickness rendering is obtained based on the third grid pattern and the original grid pattern inside the contour line of the designated pattern; the rendering thickness of the designated pattern is equal to the third distance.