Polishing device for inner wall of reaction kettle

Abstract

The invention discloses a reaction kettle inner wall polishing device, which belongs to the technical field of machining and comprises a base and a mounting plate. Hydraulic cylinders are uniformly, horizontally and fixedly mounted on the top wall of the mounting plate, clamping plates are fixedly mounted at the output ends of the hydraulic cylinders, baffles are fixedly mounted on the side walls of the sides, close to the hydraulic cylinders, of the clamping plates, first electric telescopic rods are vertically and rotatably mounted on the bottom wall of the mounting plate, and the output ends of the first electric telescopic rods are fixedly connected with the base; air containing dust generated in the polishing process can be purified in time, the upper end face of the kettle body is paved with the elastic film, and therefore when polishing is just started, the kettle body is communicated with the outside only through the gap between the bottom wall of the elastic film and the bottom wall of the baffle, the area of communication between the kettle body and the outside is effectively reduced, the amount of dust diffused to the outside is reduced, and the polishing effect is improved. When the base moves downwards, the polished part of the kettle body is separated from the outside through the elastic film, so that dust-containing gas can be prevented from diffusing to the outside.

Description

Technical Field

[0001] The invention relates to the technical field of mechanical processing, and more specifically to a device for polishing the inner wall of a reaction kettle. Background Art

[0002] Reactors are common equipment in chemical production and are widely used in petroleum, chemicals, rubber, pesticides, dyes, medicines, and foods. They are pressure vessels used to complete processes such as vulcanization, nitration, hydrogenation, hydrocarbonization, polymerization, and condensation.

[0003] As the core equipment of chemical production, the inner wall surface quality of the reactor has a direct impact on the contact effect of the reaction materials and the reaction efficiency. In order to ensure the uniformity and efficiency of the reaction process, the inner wall needs to be finely polished during the manufacturing and maintenance process. This process can not only effectively reduce material residues, improve mass and heat transfer efficiency, but also extend the service life of the equipment.

[0004] A reactor generally includes a reactor body and a reactor cover, and the reactor cover is used to seal the reactor body. For reactors that are large in size and difficult to carry, the reactor cover is usually removed when polishing the inner wall of the reactor, and then the staff enters the reactor body for manual polishing. Since the air flow inside the reactor is poor, the dust generated by polishing is difficult to be transferred in time. Even if the air flow inside the reactor is blown by a fan, it is difficult to completely blow out the dust, which poses a threat to the health of the staff.

[0005] Therefore, a device for polishing the inner wall of a reactor is proposed. Summary of the invention

[0006] In view of the problems existing in the prior art, the object of the present invention is to provide a device for polishing the inner wall of a reactor, which can automatically polish the inner wall of a reactor that is difficult to carry without the need for workers to enter therein.

[0007] To solve the above problems, the present invention adopts the following technical solutions.

[0008] A reaction kettle inner wall polishing device comprises a base and a mounting plate; A hydraulic cylinder is evenly and horizontally fixedly installed on the top wall of the mounting plate, a clamping plate is fixedly installed on the output end of the hydraulic cylinder, a baffle is fixedly installed on the side wall of the clamping plate close to the hydraulic cylinder, and a first electric telescopic rod is vertically and rotatably installed on the bottom wall of the mounting plate, and the output end of the first electric telescopic rod is fixedly connected to the base; A second electric telescopic rod is horizontally arranged on the base, a first motor is arranged on the output end of the second electric telescopic rod, and a polishing head is installed on the output end of the first motor; A fan is fixedly mounted on the top wall of the base, an air intake pipe is fixedly mounted on the input end of the fan, one end of the air intake pipe away from the fan extends to the bottom of the base, a filter box is fixedly mounted on the base, the output end of the fan extends into the filter box, a pressure relief valve for connecting the output end with the outside is embedded on the top wall of the filter box, and a sealing mechanism is provided on the base, the sealing mechanism is used to limit the diffusion range of dust generated during the processing; The mounting plate is provided with an adjusting mechanism for driving the base to move.

[0009] Furthermore, the sealing mechanism includes an annular plate fixedly mounted on the top wall of the base, an annular groove is provided on the side wall of the annular plate, an elastic membrane is fixedly mounted in the annular groove, a protective mechanism cooperating with the elastic membrane is provided on the base, and a connecting pipe is fixedly inserted on the side wall of the filter box, and the connecting pipe extends from one end away from the filter box into the annular groove.

[0010] Furthermore, the adjustment mechanism includes a stepper motor fixedly mounted on the top wall of the mounting plate, and an output end of the stepper motor is fixedly connected to the top wall of the first electric telescopic rod.

[0011] Furthermore, the protective mechanism includes a socket opened on the side wall of the base, the socket corresponds to the card plate one by one, an insertion rod is slidably installed in the socket, an elastic rope is installed between the insertion rod and the side wall of the socket, a ball is movably embedded in the end surface of the insertion rod away from the socket, and a driving mechanism is provided on the base to drive the socket to extend from the insertion rod.

[0012] Furthermore, the driving mechanism includes a guide cavity opened on the base, the guide cavity is annular, a catheter is fixedly installed on the base, the two ends of the catheter are respectively connected to the guide cavity and the annular groove, the sockets are evenly distributed on the side wall of the guide cavity, and the sockets are connected to the guide cavity.

[0013] Furthermore, a sponge is installed in the filter box, and the output end of the fan passes through the sponge.

[0014] Furthermore, an annular cavity is provided on the base, and drainage holes are evenly provided on the side walls of the cavity. The drainage holes are inclined, and the end of the drainage holes away from the cavity is inclined upward, so that the water discharged from the drainage holes has an upward impact force. A water supply mechanism for lubricating the elastic membrane is provided on the base.

[0015] Further, the water supply mechanism includes an extension pipe fixedly mounted on the output end of the pressure relief valve, and the extension pipe extends into the cavity; The sponge is slidably installed in the filter box, and the output end of the fan is slidably inserted on the sponge, and a pressing plate is fixedly installed on the bottom wall of the sponge.

[0016] Furthermore, the extrusion mechanism includes a magnet fixedly mounted on the mounting plate, the pressing plate is made of magnetic material, the pressing plate and the magnet attract each other, and the side wall of the filter box fits with the inner wall of the annular plate.

[0017] Furthermore, a storage box with an open top is fixedly mounted on the top wall of the sponge, and a through hole is opened on the top of the side wall of the storage box.

[0018] Compared with the prior art, the present invention has the following beneficial effects: (1) This scheme can timely purify the dust-containing air generated during the polishing process through the cooperation of the fan, filter box, elastic membrane, and protective mechanism. The elastic membrane covers the upper end surface of the kettle body. Therefore, at the beginning of polishing, the kettle body is connected to the outside world only through the gap between the bottom wall of the elastic membrane and the bottom wall of the baffle, which effectively reduces the area of ​​the kettle body connected to the outside world, thereby reducing the amount of dust diffused to the outside world. When the base moves down, the elastic membrane separates the kettle body from the outside world in the polishing area, which can prevent the dust-containing gas from being emitted to the outside world. Therefore, the dust generated by polishing can be purified in time during the entire polishing process, thereby improving the environmental protection effect.

[0019] (2) This scheme uses the cooperation of sponge, pressure plate and magnet. When the gas containing dust is in water, it will float upward in the form of bubbles. The bubbles gradually pass through the sponge, and the sponge breaks the larger bubbles into smaller bubbles, increasing the probability of contact between the dust suspended in the bubbles and water, thereby improving the purification effect. At the same time, the porous structure of the sponge itself can limit the movement range of the dust settled in the water, prevent the dust from flowing to the liquid surface, and prevent the bubbles emerging from the water from carrying the dust to float into the air again.

[0020] (3) Through the cooperation of the drainage hole, sponge, pressure plate and magnet, the drainage hole can drain water toward the surface of the elastic membrane, thereby reducing the friction between the elastic membrane and the inner wall of the reactor. Under the impact of the airflow, the moisture on the bottom wall of the elastic membrane is evenly diffused until it diffuses into the gap between the elastic membrane and the inner wall of the reactor body. As a result, the friction on the elastic membrane can be reduced during the downward movement of the elastic membrane driven by the base, thereby protecting the elastic membrane and ensuring the sealing effect of the elastic membrane. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the top view structure of the present invention; Figure 3 It is a schematic diagram of the combined structure of the mounting plate and the mounting ring of the present invention; Figure 4 It is a bottom view structural schematic diagram of the present invention; Figure 5 It is a schematic diagram of the combined structure of the fan and the base of the present invention; Figure 6 It is a schematic diagram of a top cross-sectional structure of the annular plate of the present invention; Figure 7 It is a schematic diagram of the combined cross-sectional structure of the base and the annular plate of the present invention; Figure 8 It is a cross-sectional structural schematic diagram of the filter box of the present invention; Fig. 9 For the present invention Figure 7 Schematic diagram of the AA structure; Fig.10 For the present invention Figure 7 Schematic diagram of the BB structure.

[0022] Description of the numbers in the figure: 1. Base; 2. Mounting plate; 3. Hydraulic cylinder; 4. Card plate; 5. Baffle; 6. First electric telescopic rod; 7. Second electric telescopic rod; 8. First motor; 9. Polishing head; 10. Fan; 11. Intake pipe; 12. Filter box; 13. Pressure relief valve; 14. Annular plate; 15. Annular groove; 16. Elastic membrane; 17. Connecting pipe; 18. Stepper motor; 19. Insert rod; 20. Elastic rope; 21. Ball; 22. Diversion chamber; 23. Catheter; 24. Sponge; 25. Cavity; 26. Drain hole; 27. Extension tube; 28. Press plate; 29. ​​Magnet; 30. Storage box; 31. Through hole. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention; it is obvious that the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments, and all other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making creative work are within the scope of protection of the present invention. Embodiment 1:

[0024] See also Figures 1 to 10 , a reactor inner wall polishing device, comprising a base 1 and a mounting plate 2; The top wall of the mounting plate 2 is evenly and horizontally fixed with hydraulic cylinders 3, and the plurality of hydraulic cylinders 3 are distributed in a circle. A clamping plate 4 is vertically and fixedly installed on the output end of the hydraulic cylinder 3, and a baffle 5 is horizontally and fixedly installed on the side wall of the clamping plate 4 close to the hydraulic cylinder 3. A first electric telescopic rod 6 for longitudinal extension is vertically and rotatably installed on the bottom wall of the mounting plate 2, and the output end of the first electric telescopic rod 6 is fixedly connected to the base 1; A second electric telescopic rod 7 that can be telescoped laterally is horizontally arranged on the bottom wall of the base 1, a first motor 8 is arranged on the output end of the second electric telescopic rod 7, a polishing head 9 is fixedly mounted on the output end of the first motor 8, the base 1 is semicircular, and the straight line where the output end of the second electric telescopic rod 7 is located and the center of the base 1 are in the same straight line, when the second electric telescopic rod 7 is fully retracted, the polishing head 9 and the second electric telescopic rod 7 are both located on the same side of the center of the base 1, so the second electric telescopic rod 7 can drive the polishing head 9 to contact any position of the bottom wall of the kettle body; A fan 10 is fixedly mounted on the top wall of the base 1, an air intake pipe 11 is fixedly mounted on the input end of the fan 10, one end of the air intake pipe 11 away from the fan 10 extends to the bottom of the base 1, and one end of the air intake pipe 11 away from the fan 10 extends to the surface of the polishing head 9, a filter box 12 is fixedly mounted on the base 1, the filter box 12 is filled with clean water, the output end of the fan 10 extends into the filter box 12, and the output end of the fan 10 passes through the top wall of the filter box 12 and extends below the liquid level, a pressure relief valve 13 for connecting the output end with the outside is embedded on the top wall of the filter box 12, and a sealing mechanism is provided on the base 1, the sealing mechanism is used to limit the diffusion range of dust generated during the processing; The mounting plate 2 is provided with an adjusting mechanism for driving the base 1 to move.

[0025] Among them, making the polishing head 9 contact with the part to be polished and driving the polishing head 9 to rotate by the first motor 8 for polishing is a prior art and will not be described in detail; the fan 10 is a centrifugal fan 10, which is a prior art and will not be described in detail.

[0026] The sealing mechanism includes an annular plate 14 fixedly mounted on the top wall of the base 1, an annular groove 15 is formed on the outer wall of the annular plate 14, an elastic membrane 16 is fixedly mounted in the annular groove 15, a protective mechanism cooperating with the elastic membrane 16 is provided on the base 1, and a connecting pipe 17 is fixedly inserted on the side wall of the filter box 12, and the connecting pipe 17 extends into the annular groove 15 at one end away from the filter box 12.

[0027] The adjustment mechanism includes a stepper motor 18 fixedly mounted on the top wall of the mounting plate 2, and the output end of the stepper motor 18 passes through the mounting plate 2, and the output end of the stepper motor 18 is fixedly connected to the top wall of the first electric telescopic rod 6; therefore, the output end of the stepper motor 18 can drive the first electric telescopic rod 6 to rotate, and at the same time, the first electric telescopic rod 6 can drive the base 1 to move up and down; and, during installation, when the first electric telescopic rod 6 is fully retracted, the baffle 5 is located below the polishing head 9, so the polishing head 9 can contact any position of the inner wall of the reactor.

[0028] The protective mechanism includes a socket opened on the side wall of the base 1, the socket corresponds to the card plate 4 one by one, and the thickness of the baffle 5 is the same as the thickness of the kettle body. Therefore, when the first electric telescopic rod 6 is in a retracted state, the plug rod 19 is perpendicular to the side wall of the baffle 5, and the plug rod 19 is slidably installed in the socket. An elastic rope 20 is jointly installed between the plug rod 19 and the side wall of the socket. The elastic coefficient of the elastic rope 20 is smaller than the elastic coefficient of the elastic membrane 16. Therefore, when subjected to the same pressure, the elastic rope 20 is more easily deformed. A ball 21 is movably embedded in the end face of the plug rod 19 away from the socket, and a driving mechanism for driving the socket to extend out of the plug rod 19 is provided on the base 1.

[0029] The driving mechanism includes a guide cavity 22 opened on the base 1, and the guide cavity 22 is annular. A conduit 23 is fixedly installed on the base 1. The two ends of the conduit 23 are respectively connected to the guide cavity 22 and the annular groove 15. The jacks are evenly distributed on the side wall of the guide cavity 22, and the jacks are connected to the guide cavity 22.

[0030] First, remove the reactor cover, then place the mounting plate 2 on top of the reactor body and start the hydraulic cylinder 3 to extend the output end of the hydraulic cylinder 3 to the maximum extent. At this time, the clamping plate 4 on the output end of the hydraulic cylinder 3 located in the same straight line can surround the reactor body. Then, contract the hydraulic cylinder 3 to drive the clamping plate 4 toward the hydraulic rod until the clamping plate 4 contacts the side wall of the reactor body. At this time, the baffle 5 contacts the top wall of the reactor body, so that the mounting plate 2 can be fixedly connected to the reactor body for subsequent polishing.

[0031] After the mounting plate 2 is fixed, the fan 10 and the second electric telescopic rod 7 are started in sequence, the output end of the second electric telescopic rod 7 extends and moves toward the inner wall of the kettle body, and when the polishing head 9 contacts the inner wall of the kettle body, the first motor 8 is started, so that the polishing head 9 can be driven to rotate by the first motor 8, and the inner wall of the kettle body can be polished by the polishing head 9; and the stepping motor 18 is started to drive the base 1 to rotate, and the base 1 is driven to move up and down by the first electric telescopic rod 6, so that the polishing position of the polishing head 9 can be changed, and various parts of the inner wall of the kettle body can be polished.

[0032] When the fan 10 is working, the fan 10 sucks air from around the polishing head 9 through the suction pipe 11, so the dust generated during the polishing process will be sucked into the suction pipe 11, and then the mixture of dust and gas is transported to below the liquid surface in the filter box 12 through the output end of the fan 10, and then floats in the water in the form of bubbles. When the dust in the bubbles contacts the water, the dust settles in the water. Therefore, the gas discharged from the filter box 12 through the pressure relief valve 13 is clean gas, which prevents the staff from inhaling a large amount of dust.

[0033] At the same time, part of the gas in the filter box 12 is discharged into the annular groove 15 through the connecting pipe 17. At this time, the gas in the annular groove 15 flows along the conduit 23 into the annular cavity and then enters the insertion hole.

[0034] As the working time of the fan 10 increases, the air pressure in the insertion hole and the annular groove 15 gradually increases. Since the elastic coefficient of the elastic rope 20 is smaller than the elastic coefficient of the elastic membrane 16, the insertion rod 19 is gradually extended from the insertion hole by the thrust of the air pressure until the ball 21 contacts the side wall of the baffle 5. At this time, the insertion rod 19 is in a state of being extended from the insertion hole to the maximum extent.

[0035] Then the elastic membrane 16 begins to expand, and the expanded elastic membrane 16 gradually contacts the baffle 5. At this time, the elastic membrane 16 covers the upper end surface of the kettle body. Therefore, the kettle body is connected to the outside world only through the gap between the bottom wall of the elastic membrane 16 and the bottom wall of the baffle 5, which effectively reduces the area of ​​the kettle body connected to the outside world, thereby reducing the amount of dust diffused to the outside world; and under the action of the insertion rod 19, the elastic membrane 16 can be prevented from expanding toward the inside of the kettle body before polishing begins, and the polishing head 9 can be prevented from grinding on the surface of the elastic membrane 16, thereby protecting the elastic membrane 16.

[0036] When the rod 19 moves along the inner wall of the kettle body, the friction force on the inner wall of the kettle body is reduced by providing the ball bearings 21, so that the inner wall of the kettle body can be protected and the inner wall of the kettle body is prevented from being scratched.

[0037] As the first electric telescopic rod 6 extends, the insertion rod 19 and the elastic membrane 16 move downward with the base 1. When the side wall of the elastic membrane 16 contacts the inner wall of the kettle body, the elastic membrane 16 completely blocks the kettle body, thereby preventing the dust generated by polishing from diffusing to the outside. With the cooperation of the fan 10 and the filter box 12, the dust filtering effect is improved.

[0038] like Figure 8 As shown, a sponge 24 is installed in the filter box 12 , and the output end of the fan 10 passes through the sponge 24 .

[0039] When the gas containing dust is in the water, it will float upward in the form of bubbles. During this process, the bubbles gradually pass through the sponge 24. Since the sponge 24 has a porous structure, the sponge 24 can break the larger bubbles into smaller bubbles, thereby increasing the probability of contact between the dust suspended in the bubbles and water and improving the purification effect. At the same time, the porous structure of the sponge 24 itself can limit the movement range of the dust settled in the water and prevent the dust from flowing to the liquid surface, thereby preventing the bubbles emerging from the water from carrying the dust to float into the air again.

[0040] like Figure 7 , Fig. 9As shown, an annular cavity 25 is provided on the base 1, and drainage holes 26 are evenly provided on the side walls of the cavity 25. The drainage holes 26 are inclined, and one end of the drainage holes 26 away from the cavity 25 is inclined upward, so that the water discharged from the drainage holes 26 has an upward impact force. A water supply mechanism for lubricating the elastic membrane 16 is provided on the base 1.

[0041] like Figure 5 , Fig. 9 As shown, the water supply mechanism includes an extension pipe 27 fixedly mounted on the output end of the pressure relief valve 13, and the extension pipe 27 extends into the cavity 25; The sponge 24 is slidably installed in the filter box 12, and the output end of the fan 10 is slidably inserted on the sponge 24. A pressure plate 28 is fixedly installed on the bottom wall of the sponge 24. The pressure plate 28 is a hollow structure so that the gas can pass through the pressure plate 28 and the sponge 24 normally, and a squeezing mechanism for squeezing the sponge 24 is provided on the mounting plate 2.

[0042] The extrusion mechanism includes a magnet 29 fixedly mounted on the mounting plate 2, the pressure plate 28 is made of magnetic material, and the pressure plate 28 and the magnet 29 attract each other, the magnet 29 is located at the inner wall of the circular ring of the annular plate 14 projected on the surface of the mounting plate 2, and the side wall of the filter box 12 is in contact with the inner wall of the annular plate 14, so during the rotation of the base 1, the filter box 12 drives the pressure plate 28 to intermittently rotate to the bottom of the magnet 29.

[0043] When the pressure plate 28 moves to just below the magnet 29, under the action of attraction, the pressure plate 28 moves upward, driving the sponge 24 to move to the surface of the input end of the pressure relief valve 13 and squeezes the sponge 24. At this time, the sponge 24 is out of contact with the water surface and the water in the sponge 24 gathers together to form water droplets.

[0044] In the process of air flow entering the pressure relief valve 13, it can exert an impact force on the formed water droplets, so that the water droplets enter the pressure relief valve 13 together with the air flow, and the gas containing water droplets in the pressure relief valve 13 is discharged along the extension tube 27, and the water droplets discharged from the extension tube 27 are gathered in the cavity 25. Finally, the moisture in the cavity 25 flows out through the drainage hole 26 due to the impact force of the air flow discharged from the drainage hole 26.

[0045] The moisture discharged from the drainage hole 26 is evenly spread on the bottom wall of the elastic membrane 16, and under the action of the impact force of the airflow, the moisture on the bottom wall of the elastic membrane 16 is evenly diffused until it diffuses into the gap between the elastic membrane 16 and the inner wall of the kettle body, thereby reducing the friction force on the elastic membrane 16 during the process of the base 1 driving the elastic membrane 16 to move downward, thereby playing a role in protecting the elastic membrane 16.

[0046] And when the sponge 24 is squeezed, only a small amount of water flows into the pressure relief valve 13, and the rest of the water will drip downwards, which can reversely flush the sponge 24 during the dripping process, and knock out the dust accumulated in the sponge 24, so that the sponge 24 remains clean, thereby playing the role of automatically cleaning the sponge 24.

[0047] like Figure 8 As shown, a storage box 30 with an open top is fixedly mounted on the top wall of the sponge 24 , and a through hole 31 is opened on the top of the side wall of the storage box 30 .

[0048] When the sponge 24 is out of contact with the water surface, the interior of the storage box 30 is full of water. As the sponge 24 is pushed upward, the bottom end of the pressure relief valve 13 is gradually inserted into the storage box 30.

[0049] When the sponge 24 is squeezed, the input end of the pressure relief valve 13 is located below the liquid level in the storage box 30, and the gas in the filter box 12 enters the storage box 30 through the through hole 31, and the gas applies pressure to the liquid level in the storage box 30. This process squeezes the water in the storage box 30 into the pressure relief valve 13, thereby increasing the amount of water delivered to the cavity 25, and further improving the lubrication effect on the elastic membrane 16.

[0050] The above is only a preferred specific implementation of the present invention; however, the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical solution and its improved conception within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A device for polishing the inner wall of a reactor, comprising a base (1) and a mounting plate (2); Features: A hydraulic cylinder (3) is evenly and horizontally fixedly mounted on the top wall of the mounting plate (2); a clamping plate (4) is fixedly mounted on the output end of the hydraulic cylinder (3); a baffle (5) is fixedly mounted on the side wall of the clamping plate (4) close to the hydraulic cylinder (3); a first electric telescopic rod (6) is vertically and rotatably mounted on the bottom wall of the mounting plate (2); the output end of the first electric telescopic rod (6) is fixedly connected to the base (1); A second electric telescopic rod (7) is horizontally arranged on the base (1); a first motor (8) is arranged on the output end of the second electric telescopic rod (7); and a polishing head (9) is installed on the output end of the first motor (8); A fan (10) is fixedly mounted on the top wall of the base (1), an air intake pipe (11) is fixedly mounted on the input end of the fan (10), one end of the air intake pipe (11) away from the fan (10) extends to below the base (1), a filter box (12) is fixedly mounted on the base (1), the output end of the fan (10) extends into the filter box (12), a pressure relief valve (13) for connecting the output end with the outside is embedded on the top wall of the filter box (12), and a sealing mechanism is provided on the base (1), the sealing mechanism is used to limit the diffusion range of dust generated during the processing; The mounting plate (2) is provided with an adjustment mechanism for driving the base (1) to move.

2. A reactor inner wall polishing device according to claim 1, characterized in that: The sealing mechanism comprises an annular plate (14) fixedly mounted on the top wall of the base (1), an annular groove (15) being provided on the side wall of the annular plate (14), an elastic membrane (16) being fixedly mounted in the annular groove (15), a protective mechanism cooperating with the elastic membrane (16) being provided on the base (1), and a connecting pipe (17) being fixedly inserted on the side wall of the filter box (12), the connecting pipe (17) extending from one end of the filter box (12) into the annular groove (15).

3. A reactor inner wall polishing device according to claim 2, characterized in that: The adjustment mechanism comprises a stepper motor (18) fixedly mounted on the top wall of the mounting plate (2), and an output end of the stepper motor (18) is fixedly connected to the top wall of the first electric telescopic rod (6).

4. A reactor inner wall polishing device according to claim 3, characterized in that: The protective mechanism comprises a socket provided on a side wall of the base (1), the socket corresponding to the card plate (4) one by one, a plug rod (19) slidably mounted in the socket, an elastic rope (20) being mounted between the plug rod (19) and the side wall of the socket, a ball (21) being movably embedded in the end surface of the plug rod (19) away from the socket, and a driving mechanism for driving the socket to extend out of the plug rod (19) is provided on the base (1).

5. The device for polishing the inner wall of a reactor according to claim 4, characterized in that: The driving mechanism comprises a flow guiding cavity (22) provided on a base (1), the flow guiding cavity (22) being annular, a conduit (23) being fixedly mounted on the base (1), two ends of the conduit (23) being respectively connected to the flow guiding cavity (22) and the annular groove (15), the jacks being evenly distributed circumferentially on the side wall of the flow guiding cavity (22), and the jacks being connected to the flow guiding cavity (22).

6. The device for polishing the inner wall of a reactor according to claim 5, characterized in that: A sponge (24) is installed in the filter box (12), and the output end of the fan (10) passes through the sponge (24).

7. The device for polishing the inner wall of a reactor according to claim 6, characterized in that: The base (1) is provided with an annular cavity (25), and drainage holes (26) are evenly provided on the side walls of the cavity (25). The drainage holes (26) are arranged obliquely, and one end of the drainage hole (26) away from the cavity (25) is inclined upward, so that water discharged from the drainage hole (26) has an upward impact force. The base (1) is provided with a water supply mechanism for lubricating the elastic membrane (16).

8. The device for polishing the inner wall of a reactor according to claim 7, characterized in that: The water supply mechanism comprises an extension pipe (27) fixedly mounted on the output end of the pressure relief valve (13), wherein the extension pipe (27) extends into the cavity (25); The sponge (24) is slidably mounted in the filter box (12), and the output end of the fan (10) is slidably inserted on the sponge (24), a pressing plate (28) is fixedly mounted on the bottom wall of the sponge (24), and a squeezing mechanism for squeezing the sponge (24) is provided on the mounting plate (2).

9. A reactor inner wall polishing device according to claim 8, characterized in that: The extrusion mechanism comprises a magnet (29) fixedly mounted on the mounting plate (2); the pressing plate (28) is made of a magnetic material, the pressing plate (28) and the magnet (29) attract each other, and the side wall of the filter box (12) fits the inner wall of the annular plate (14).

10. The device for polishing the inner wall of a reactor according to claim 9, characterized in that: A storage box (30) with an open top is fixedly mounted on the top wall of the sponge (24), and a through hole (31) is provided on the top of the side wall of the storage box (30).

Images