Substrate processing apparatus and substrate processing method

Abstract

The purpose of the present invention is to easily customize processing performed on a substrate in a substrate processing apparatus. In order to achieve this purpose, a substrate processing apparatus is provided with two or more chemical solution processing units, a storage unit, and a control unit. Each chemical solution treatment unit includes a treatment tank and a solution supply unit. The processing tank processes a substrate with a processing liquid. The liquid supply unit supplies a processing liquid to the processing tank. The storage unit stores numerical value information of a supply amount of the processing liquid per unit processing amount of the substrate for each of the liquid processing units. The control unit has an acquisition unit, an identification unit, a calculation unit, and a supply control unit. The calculation unit calculates a value of a supply amount of the processing liquid to be supplied to the processing tank of the one chemical processing unit based on a value of a supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical processing unit identified by the identification unit in the value information and the processing amount information acquired by the acquisition unit. The supply control unit supplies the processing liquid to the processing tank by the liquid supply unit on the basis of the numerical value calculated by the calculation unit.

Description

[0001] This invention is based on a divisional application of an invention application with an international application date of November 13, 2019, an international application number of PCT / JP2019 / 044569, a national application number of 201980077527.5 entering the Chinese national phase, and an invention name of “Substrate processing device and substrate processing method”. Technical Field

[0002] The present invention relates to a technique for performing etching and cleaning treatments on substrates such as semiconductor wafers, substrates for liquid crystal displays, substrates for plasma displays, substrates for organic EL, substrates for FED (Field Emission Display), substrates for optical displays, substrates for magnetic disks, substrates for optical magneto-optical disks, substrates for photomasks, and substrates for solar cells using a treatment liquid. Background Art

[0003] For example, there is a substrate processing device (e.g., Patent Document 1) that processes a substrate by immersing the substrate in a stored processing liquid in a processing tank. In the substrate processing device, for example, various actions and processes are performed on the substrate according to a process that specifies the processing of the substrate.

[0004] Such a substrate processing apparatus includes, for example, a plurality of processing tanks for performing the same processing on substrates, and performs the same processing on substrates in parallel in the plurality of processing tanks according to the same process.

[0005] Prior art literature

[0006] Patent Literature

[0007] Patent Document 1: Japanese Patent Application Publication No. 2009-260257 Summary of the invention

[0008] Furthermore, even if multiple processing tanks have the same structure, the results of the same processing performed on a substrate in the multiple processing tanks may differ due to differences in age, piping conditions, external factors such as vibration or temperature, number of uses, and configuration.

[0009] In recent years, for example, there has been a trend of increasing demands for more sophisticated processing on substrates, and as a result, the content of recipes has become more complicated, and the creation and editing of recipes has become increasingly difficult.

[0010] These problems are not limited to so-called batch-type substrate processing apparatuses that process substrates by immersing the substrates in a stored processing liquid in a processing tank, but also generally occur in so-called single-sheet substrate processing apparatuses that process the substrates by spraying the processing liquid from a nozzle onto the substrates.

[0011] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a technology that can easily execute customization regarding a process to be performed on a substrate in a substrate processing apparatus.

[0012] In order to solve the above-mentioned problem, a substrate processing device according to the first aspect comprises two or more liquid processing units, a storage unit, and a control unit. Each of the two or more liquid processing units comprises a processing tank and a liquid supply unit. The processing tank processes the substrate using the stored processing liquid. The liquid supply unit supplies the processing liquid to the processing tank. The storage unit stores numerical information related to the supply amount of the processing liquid per unit processing amount of the substrate for each of the liquid processing units. The control unit comprises an acquisition unit, an identification unit, a calculation unit, and a supply control unit. The acquisition unit acquires the processing amount information related to the processing amount of the substrate to be processed. The identification unit identifies one of the two or more liquid processing units used to process the substrate. The calculation unit calculates the numerical value related to the supply amount of the processing liquid supplied to the processing tank of the one liquid processing unit based on the numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one liquid processing unit identified by the identification unit in the numerical information and the processing amount information acquired by the acquisition unit. The supply control unit supplies the processing liquid to the processing tank through the liquid supply unit in the one chemical liquid processing unit according to the numerical value calculated by the calculation unit.

[0013] A substrate processing apparatus according to a second aspect is the substrate processing apparatus according to the first aspect, further comprising a sensor unit for measuring a processing amount of the substrate. The acquisition unit acquires the processing amount information based on a measurement result obtained by the sensor unit.

[0014] A substrate processing apparatus according to a third aspect is the substrate processing apparatus according to the first or second aspect, wherein the storage unit stores a recipe including the numerical information and defining processing conditions.

[0015] The substrate processing apparatus of the fourth aspect is the substrate processing apparatus of the third aspect, wherein the numerical information includes a reference value related to the supply amount of the processing liquid per unit processing amount of the substrate relative to the two or more chemical liquid processing units, and an adjustment value related to the supply amount of the processing liquid per unit processing amount of the substrate relative to at least one of the two or more chemical liquid processing units. The calculation unit calculates a numerical value related to the supply amount of the processing liquid supplied to the processing tank in the one chemical liquid processing unit based on the reference value in the numerical information, the adjustment value corresponding to the one chemical liquid processing unit identified by the identification unit, and the processing amount information acquired by the acquisition unit.

[0016] A substrate processing apparatus according to a fifth aspect is the substrate processing apparatus according to the third or fourth aspect, wherein the recipe defines a timing for supplying the processing liquid to the processing tank by the liquid supply unit.

[0017] The substrate processing apparatus of a sixth aspect is the substrate processing apparatus of any one of the third to fifth aspects, further comprising an input unit for inputting a signal in response to a user's action. The control unit further comprises a recipe creation unit for creating or editing the recipe by recording a numerical value related to the supply amount of the processing liquid per unit processing amount of the substrates of each of the two or more chemical liquid processing units, which is included in the numerical information, in the recipe in accordance with a signal input by the input unit in response to the user's action.

[0018] The substrate processing device of the seventh aspect is the substrate processing device of any one of the first to fifth aspects, further comprising an input unit for inputting a signal in response to a user's action. The control unit further comprises a mode switching unit, which switches the mode between the first liquid supply mode and the second liquid supply mode according to the signal input by the input unit in response to the user's action. The first liquid supply mode is a mode in which the calculation unit calculates a numerical value related to the supply amount of the processing liquid supplied to the processing tank of the one liquid processing unit based on the numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one liquid processing unit identified by the identification unit in the numerical information and the processing amount information acquired by the acquisition unit, and the supply control unit supplies the processing liquid to the processing tank in the one liquid processing unit through the liquid supply unit according to the numerical value calculated by the calculation unit. The second liquid supply mode is a mode in which the control unit supplies the processing liquid in an amount set in advance by the liquid supply unit to the processing tank of the one liquid processing unit identified by the identification unit.

[0019] The substrate processing device of the eighth aspect is the substrate processing device of the sixth aspect, further comprising a display unit. The control unit further comprises: a screen creation unit that creates information of a recipe input screen for creating or editing the recipe; and a display control unit that causes the recipe input screen to be displayed on the display unit. The recipe input screen includes a first area and a second area. The first area includes an area for recording conditions for a plurality of first setting items that are conditions that do not depend on the passage of time in the process executed according to the recipe. The second area includes an area for recording conditions for a plurality of second setting items that are conditions that depend on the passage of time in the process executed according to the recipe. The recipe creation unit creates or edits the recipe based on the conditions recorded for each of the first setting items in the recipe input screen and the conditions recorded for each of the second setting items in the recipe input screen according to a signal input by the input unit in response to a user's action. The screen creation unit changes one or more of the multiple first setting items in the first area to one or more of the multiple second setting items in the second area in the process input screen based on a signal input by the input unit in response to a user's action, and changes one or more of the multiple second setting items in the second area to one or more of the first setting items in the process input screen in a manner included in the multiple first setting items in the first area based on a signal input by the input unit in response to a user's action.

[0020] The substrate processing device of the 9th aspect is the substrate processing device of the 8th aspect, and the screen creation unit prohibits changing one or more pre-set specific first setting items among the multiple first setting items in the first area to one or more second setting items in a manner included in the multiple second setting items in the second area.

[0021] The substrate processing device of the tenth aspect is the eighth or ninth substrate processing device, and in the process input screen, when there are first display elements related to group names of multiple first setting item groups each including two or more first setting items among the multiple first setting items in the first area, the screen creation unit changes the two or more first setting items in the first area to two or more second setting items in a manner that they are included in the multiple second setting items in the second area for each of the multiple first setting item groups based on a signal input by the input unit in response to a user's action.

[0022] The substrate processing device of the 11th aspect is the substrate processing device of the 6th aspect, further comprising a display unit. The control unit further comprises: a screen creation unit that creates information of a recipe input screen for creating or editing the recipe; and a display control unit that causes the recipe input screen to be displayed on the display unit. The recipe input screen includes a first area and a second area. The first area includes an area for recording conditions for each of a plurality of first setting items regarding conditions that do not depend on the passage of time in the processing executed according to the recipe. The second area includes an area for recording conditions for each of a plurality of second setting items regarding conditions that depend on the passage of time in the processing executed according to the recipe. The recipe creation unit creates or edits the recipe based on the conditions recorded for each of the first setting items in the recipe input screen and the conditions recorded for each of the second setting items in the recipe input screen in accordance with a signal input by the input unit in response to a user's action. In the first area, there are first display elements associated with group names of each of a plurality of first setting item groups that each include two or more first setting items among the plurality of first setting items. The screen creation unit switches the display state of the two or more first setting items included in one of the multiple first setting item groups in the process input screen displayed on the display unit between an expanded state being displayed and a collapsed state not being displayed, based on a signal input by the input unit in response to a user's action.

[0023] The substrate processing method of the twelfth aspect is a substrate processing method in a substrate processing device having two or more liquid processing units, each of which has a processing tank for processing a substrate using a stored processing liquid and a liquid supply unit for supplying the processing liquid to the processing tank, and comprises a step (a), a step (b), a step (c), a step (d, and a step (e. In the step (a), numerical information related to the supply amount of the processing liquid per unit processing amount of the substrate is stored in a storage unit for each of the liquid processing units. In the step (b), the processing amount of the substrate to be processed is obtained. In the step (c), the two or more A liquid processing unit used for processing a substrate in the liquid processing unit. In the step (d), a numerical value related to the supply amount of the processing liquid supplied to the processing tank of the one liquid processing unit is calculated based on the numerical value related to the supply amount of the processing liquid per unit processing amount corresponding to the one liquid processing unit identified in the step (c) and the processing amount acquired in the step (b). In the step (e), the processing liquid is supplied to the processing tank in the one liquid processing unit through the liquid supply unit according to the numerical value calculated in the step (d).

[0024] Effects of the Invention

[0025] By the substrate processing apparatus of the first aspect and the substrate processing method of the twelfth aspect, for example, it is possible to supply a processing liquid in an amount corresponding to the processing amount of the substrate to each processing tank. As a result, for example, it is not easy to waste the processing liquid, or to cause defects such as over-processing due to excessive supply of the processing liquid. As a result, for example, it is easy to perform customization of the processing to be performed on the substrate for each processing tank in the substrate processing apparatus. Therefore, for example, it is possible to easily perform customization of the processing to be performed on the substrate in the substrate processing apparatus.

[0026] According to the substrate processing apparatus of the second aspect, for example, based on the processing amount of the substrate measured by the substrate processing apparatus, a processing liquid corresponding to the processing amount of the substrate can be supplied to each processing tank. Thus, for example, in the substrate processing apparatus, customization of the processing to be performed on the substrate can be performed for each processing tank.

[0027] According to the substrate processing apparatus of the third aspect, for example, it is possible to process the substrate in parallel using two processing tanks according to one process. Thus, for example, it is possible to supply a processing liquid in an amount corresponding to the processing amount of the substrate to each processing tank using one process. Thus, for example, it is possible to easily perform customization of the processing to be performed on the substrate in the substrate processing apparatus.

[0028] According to the substrate processing apparatus of the fourth aspect, for example, by changing the adjustment value in one process, it is possible to supply the processing liquid in an amount corresponding to the processing amount of the substrate to each processing tank. Thus, for example, it is possible to easily create a process. Therefore, for example, in the substrate processing apparatus, it is possible to easily perform customization regarding the processing performed on the substrate.

[0029] According to the substrate processing apparatus of the fifth aspect, for example, the processing liquid in an amount corresponding to the processing amount of the substrates can be supplied to the processing tank at an appropriate timing for each processing tank.

[0030] According to the substrate processing apparatus of the sixth aspect, for example, an operator can perform customization regarding the processing to be performed on the substrate for each processing tank.

[0031] According to the substrate processing apparatus of the seventh aspect, for example, when there is no difference in the processing results of each processing tank with respect to the substrate, by setting the second liquid supply mode, it is possible to omit the setting of the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate. Thus, for example, the workload of the operator who sets the processing conditions can be reduced.

[0032] According to the substrate processing apparatus of the eighth aspect, for example, an operator can arbitrarily switch between a plurality of setting items for setting conditions that do not depend on the passage of time and a plurality of setting items for setting conditions that depend on the passage of time. Thus, for example, an operator can create a process that specifies desired conditions. As a result, for example, an operator can perform processing on a substrate under desired conditions. Therefore, for example, in the substrate processing apparatus, customization of processing to be performed on a substrate can be easily performed.

[0033] According to the substrate processing apparatus of the ninth aspect, for example, it is possible to prohibit a specific setting item that cannot set a condition dependent on the passage of time from being changed to a setting item related to a condition dependent on the passage of time. This can prevent an operator from creating a recipe that specifies a process that cannot be executed.

[0034] According to the substrate processing apparatus of the tenth aspect, for example, an operator can efficiently switch setting items between a plurality of setting items for setting conditions not depending on the passage of time and a plurality of setting items for setting conditions depending on the passage of time.

[0035] According to the substrate processing apparatus of the eleventh aspect, for example, the operator can switch between an expanded state in which the two or more first setting items are displayed and a collapsed state in which the two or more second setting items are not displayed for each group including two or more first setting items. Thus, for example, even if the number of the plurality of first setting items in the first area increases, the operator can easily perform the operation of creating and editing a process while confirming both the first area and the second area on the process input screen. Therefore, for example, customization of the process to be performed on the substrate can be easily performed in the substrate processing apparatus. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 It is a plan view showing a schematic structure of a substrate processing apparatus according to the first embodiment.

[0037] Figure 2 This is a block diagram showing the functional structure of the substrate processing apparatus according to the first embodiment.

[0038] Figure 3 It is a diagram showing a schematic structure of a chemical liquid processing unit.

[0039] Figure 4 It is a block diagram showing the functional configuration of the liquid supply process implemented by the control unit.

[0040] Figure 5 It is a figure which shows the 1st example of a part of a recipe input screen.

[0041] Figure 6It is a figure which shows the 2nd example of a part of a recipe input screen.

[0042] Figure 7 This is a diagram showing an example of the relationship between the number of substrates and the amount of processing liquid supplied to the processing tank.

[0043] Figure 8 This is a flowchart showing an example of the operation flow of supplying the processing liquid to the processing tank.

[0044] Fig. 9 This is a diagram showing a schematic structure of a recipe input screen.

[0045] Fig.10 It is a diagram showing a reference example of a part of the recipe input section in the recipe input screen.

[0046] Fig.11 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0047] Fig.12 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0048] Fig.13 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0049] Fig.14 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0050] Fig.15 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0051] Fig.16 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0052] Fig.17 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0053] Fig.18 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0054] Fig.19 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0055] Fig. 20 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0056] Fig.21 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0057] Fig. 22 It is a diagram showing an example of a part of the recipe input section in the recipe input screen.

[0058] The reference numerals are described as follows:

[0059] 51st liquid processing unit

[0060] 6 Second liquid processing unit

[0061] 8 Input section

[0062] 9 Output section

[0063] 10. Control Unit

[0064] 10a Screen creation section

[0065] 10b Display control unit

[0066] 10c Process Creation Department

[0067] 10d Schedule Creation Department

[0068] 10e Acquisition Department

[0069] 10f Identification Department

[0070] 10g Calculation Department

[0071] 10h Supply control unit

[0072] 10I Mode switch unit

[0073] 11m Sensor unit

[0074] 20 Storage

[0075] 52 Chemical liquid treatment department

[0076] 100 Substrate processing device

[0077] Ar0 process display area

[0078] Ar1 Region 1

[0079] Ar2 Area 2

[0080] CB2 treatment tank

[0081] Dc1 to Dc3 1st display element

[0082] Mp1 Mouse Pointer

[0083] SL1 Liquid supply unit

[0084] SL1a 1st liquid supply unit

[0085] SL1b 2nd liquid supply unit

[0086] Sc0 process input screen

[0087] V1a, V1b values

[0088] Va1 adjustment value

[0089] Va11 First adjustment value

[0090] Va12 Second adjustment value

[0091] Vs1 Base Value

[0092] W substrate. DETAILED DESCRIPTION

[0093] There is known a substrate processing device that immerses a substrate in a stored processing liquid in a processing tank to perform a process such as etching on the substrate. In this substrate processing device, for example, an etching process is sometimes performed to melt out a nitride film formed on the surface of the substrate using a processing liquid such as an aqueous phosphoric acid solution. In the processing tank where such an etching process is performed, whenever the concentration of a component melted out from the substrate in the processing liquid increases, it is necessary to replace the stored processing liquid in the processing tank to a certain extent. In particular, in recent years, in the case of a process in which the amount of etching objects dissolved in one batch of processing such as forming a three-dimensional NAND is greater than before, the amount and frequency of replacing the stored processing liquid in the processing liquid have increased.

[0094] In addition, most substrate processing apparatuses have a plurality of processing tanks capable of performing the same processing using a processing liquid on a substrate in parallel. When such a substrate processing apparatus is used to process a substrate in a plurality of processing tanks in parallel, for example, if the substrate is processed according to the same process prescribed for processing the substrate, the increase in the number of processes can be suppressed and the amount of work required to create a process can be reduced.

[0095] However, for example, when a plurality of processing tanks have the same configuration, if there are some differences in conditions between the plurality of processing tanks, even if the same processing is performed on the substrate in the plurality of processing tanks, the processing results between the plurality of processing tanks may differ. Here, as differences in conditions that may occur between the plurality of processing tanks, for example, the age of use, the condition of the piping, external factors such as vibration or temperature, the number of times used, and the configuration may be considered. In particular, when a larger amount of etching objects are dissolved for one batch of processing such as the above-mentioned formation of three-dimensional NAND than in the past, the processing results between the plurality of processing tanks are likely to differ greatly.

[0096] Such a problem is generally common in a so-called batch-type substrate processing apparatus that processes a substrate by immersing the substrate in a stored processing liquid in a processing tank.

[0097] Therefore, the inventors of the present application have created a technology that can easily perform customization of the processing to be performed on a substrate for each processing tank in a substrate processing apparatus.

[0098] Hereinafter, various embodiments of the present invention will be described with reference to the accompanying drawings. In the accompanying drawings, parts having the same structure and function are marked with the same reference numerals, and repeated descriptions are omitted in the following description. The accompanying drawings are schematically shown and do not accurately show the dimensions and positional relationships of the various structures in each figure.

[0099] <1. First embodiment>

[0100] <1-1. Configuration of substrate processing apparatus>

[0101] Figure 1 It is a plan view showing an example of a schematic configuration of the substrate processing apparatus 100 according to the first embodiment. Figure 2 1 is a block diagram showing an example of the functional configuration of the substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 can perform chemical liquid processing, cleaning processing, and drying processing on a substrate W, for example.

[0102] like Figure 1 As shown, the substrate processing apparatus 100 includes, for example, an input unit 1, a first transport unit 2, a second transport unit 3, a drying unit 4, a first liquid processing unit 5, a second liquid processing unit 6, a discharge unit 7, an input unit 8, an output unit 9, a control unit 10, and a storage unit 20.

[0103] The loading section 1 is, for example, a portion for loading a plurality of pre-processed substrates W from outside the substrate processing apparatus 100 into the substrate processing apparatus 100. The loading section 1 has, for example, two loading tables 11 that can respectively load a box C1 containing a plurality of (for example, less than 25) pre-processed substrates W. The loading table 11 is provided with, for example, a sensor section 11m. The sensor section 11m can, for example, measure the number of substrates W placed in the box C1. In addition, the sensor section 11m can, for example, detect the arrangement of the substrates W in the box C1. Here, the sensor section 11m can, for example, detect the arrangement of the substrates W in the box C1 by scanning downward a pair of light-projecting sections and a light-receiving section that constitute a transmission-type infrared sensor with the inside of the box C1 as the object, and can measure the number of substrates placed in the box C1 according to the number and position of blocking the infrared rays. The information on the number of substrates W measured by the sensor unit 11m and the information on the arrangement of the substrates W in the cassette C1 detected by the sensor unit 11m are stored in the storage unit 20, for example, together with the identification information of the cassette C1. The information on the number of substrates W measured by the sensor unit 11m is used in the control unit 10, for example, to obtain information on the processing amount of the substrates W that are processed in the drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6 (also referred to as processing amount information). That is, the sensor unit 11m functions as a portion for measuring the processing amount of the substrates W, for example.

[0104] The unloading section 7 is, for example, a portion for unloading a plurality of processed substrates W from the substrate processing apparatus 100 to the outside of the substrate processing apparatus 100. The unloading section 7 is, for example, located adjacent to the input section 1. The unloading section 7 has, for example, two loading tables 71 capable of loading cassettes C1, respectively. In the unloading section 7, in a state where a plurality of (for example, less than 25) processed substrates W are accommodated in the cassettes C1, the plurality of processed substrates W can be unloaded to the outside of the substrate processing apparatus 100 for each cassette C1.

[0105] The first transport unit 2 is, for example, located along the input unit 1 and the unloading unit 7. The first transport unit 2 can, for example, take out all the substrates W contained in the box C1 placed in the input unit 1 and transport them relative to the second transport unit 3. At this time, for example, by transporting all the substrates W contained in the two boxes C1 relative to the second transport unit 3, a batch of substrate groups including a plurality of substrates W is formed. The plurality of substrates W forming a batch of substrate groups serve as units for processing in the drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6. In addition, the first transport unit 2 can, for example, receive the processed substrates W from the second transport unit 3, transport the processed substrates W relative to the box C1 placed on the mounting table 71 of the unloading unit 7, and store them in the box C1.

[0106] The second transport unit 3 can be moved, for example, along the longitudinal direction of the substrate processing apparatus 100. Along the moving direction of the second transport unit 3, a drying processing unit 4, a first liquid processing unit 5, and a second liquid processing unit 6 are provided in order from the side close to the first transport unit 2. In other words, for example, the first liquid processing unit 5 is located adjacent to the drying processing unit 4, and the second liquid processing unit 6 is located adjacent to the first liquid processing unit 5.

[0107] The drying processing unit 4 can accommodate a plurality of substrates W in a low-pressure chamber and dry the substrates W, for example.

[0108] The first liquid processing unit 5 includes, for example, a cleaning processing unit 51, a chemical liquid processing unit 52, and an auxiliary transport unit 53. The cleaning processing unit 51 can, for example, perform a cleaning process on a plurality of substrates W using pure water (also referred to as pure water cleaning process). The chemical liquid processing unit 52 can, for example, process a plurality of substrates W using a processing liquid including a chemical liquid (also referred to as chemical liquid process). The auxiliary transport unit 53 can, for example, transfer the substrates W to and from the second transport unit 3, and can be raised and lowered in the cleaning processing unit 51 and the chemical liquid processing unit 52, respectively.

[0109] The second liquid processing section 6 includes, for example, a cleaning processing section 51 , a chemical liquid processing section 52 , and a secondary transport section 53 , similarly to the first liquid processing section 5 .

[0110] The input unit 8 is, for example, located near the mounting table 11. The input unit 8 can, for example, input signals in response to actions of an operator as a user. Thus, the operator can select or input various information. The input unit 8 is, for example, composed of a touch panel or the like. In addition, the input unit 8 can, for example, have an operation unit including buttons that can perform various operations such as pressing, and can also have a microphone that can perform sound-based input. For example, the operator can create and edit a process that specifies the order for processing substrates W via the input unit 8 and store it in the storage unit 20, or specify a process from a process group including multiple processes stored in the storage unit 20 for multiple substrates W that are processing objects.

[0111] The output unit 9 is, for example, located near the mounting table 11. The output unit 9 is, for example, a portion that can output various information according to the control of the control unit 10. The output unit 9 includes, for example, a display unit that can visually output various information. The display unit can, for example, respond to the operator's actions and display a screen (also referred to as a process input screen) for the operator to create and edit a process according to a signal input by the input unit 8. In addition, the output unit 9 can also include, for example, a speaker that can output various information audibly. The various information visually or audibly output by the output unit 9 can, for example, include information showing various states of the substrate processing device 100 and information showing various alarm sounds (alarms. Here, for example, the display units of the input unit 8 and the output unit 9 can also be implemented by the same display unit having a touch panel.

[0112] The storage unit 20 has, for example, a non-volatile storage medium for storing various information such as a hard disk or a flash memory. In the storage unit 20, for example, folders storing various programs including schedule creation programs and processing programs, a process group including a plurality of processes, and various data are implemented. The various data include, for example, data for constituting a process input screen (also referred to as screen constituting data. The screen constituting data includes, for example, information required for inputting setting conditions such as displaying a plurality of setting items constituting a process and numerical values. In the screen constituting data, a plurality of setting items are appropriately classified, for example, by category. In addition, the screen constituting data includes, for example, data for allowing or prohibiting classification changes of categories for setting items.

[0113] The operation of the substrate processing apparatus 100 having the above-mentioned structure is as follows, for example. Figure 2 As shown, the control unit 10 performs unified control.

[0114] The control unit 10 includes, for example, a computing unit and a memory. For example, the computing unit includes an electrical circuit such as a central computing unit (CPU) that functions as at least one processor. For example, the memory includes an electrical circuit such as a random access memory (RAM) that temporarily stores information. Various information temporarily obtained by various operations in the computing unit is appropriately stored in the memory. The computing unit implements various functional components for performing unified control of the actions of the substrate processing device 100 based on the control unit 10 by, for example, reading and executing a program stored in the storage unit 20. The various functional components include, for example, a part that creates a schedule for processing a plurality of substrates W in the substrate processing device 100 (also referred to as a schedule creation part) and a part that executes processing for a plurality of substrates W according to the schedule (also referred to as a processing execution part). In addition, the control unit 10 may also control the actions of various parts in the first liquid processing unit 5 and the second liquid processing unit 6 according to the measurement results of various sensors from the liquid processing unit 52. The various sensors include, for example, a flow meter.

[0115] <1-2. Chemical liquid processing unit>

[0116] Figure 3 1 is a diagram schematically showing the structure of the chemical liquid processing unit 52. The chemical liquid processing unit 52 performs a process (also referred to as an etching process) of selectively dissolving the silicon nitride film by, for example, immersing the substrate W having the silicon oxide film and the silicon nitride film formed thereon in a phosphoric acid aqueous solution as a processing liquid that functions as an etching liquid.

[0117] like Figure 3 As shown, the chemical liquid processing unit 52 includes a liquid supply unit SL1, a processing tank CB2, a liquid circulation unit CL2, and a liquid discharge unit EL1. Therefore, in the first embodiment, the substrate processing apparatus 100 includes two chemical liquid processing units 52 each including a liquid processing unit SL1 and a processing tank CB2.

[0118] The liquid supply part SL1 is a part for supplying the processing liquid to the processing tank CB2. The liquid supply part SL1 includes, for example, a regulating tank CB1, a first liquid supply part SL1a, a liquid circulation part CL1, and a second liquid supply part SL1b.

[0119] The regulating box CB1 temporarily stores the phosphoric acid solution for adjusting the temperature of the phosphoric acid solution supplied to the treatment tank CB2. The regulating box CB1 may be a box-shaped member made of quartz or fluororesin material having excellent corrosion resistance to the phosphoric acid solution.

[0120] The first liquid supply section SL1a is capable of, for example, performing a process of supplying a new processing liquid sent from the processing liquid supply source En0 to the adjustment box CB1 via the first piping section Tb1 (also referred to as a first liquid supply process). Here, for example, as the processing liquid, a new liquid of a phosphoric acid aqueous solution of a specified concentration, which is a chemical liquid that functions as an etching liquid, is supplied (also referred to as a phosphoric acid aqueous solution before use). The processing liquid supply source En0 is connected to the first end of the first piping section Tb1 in a manner of being connected. The processing liquid supply source En0, for example, sends the phosphoric acid aqueous solution from a tank that stores the phosphoric acid aqueous solution at a normal temperature (for example, 25° C.) provided inside or outside the substrate processing apparatus 100 toward the first piping section Tb1 by means of a pump or gas or the like. A phosphoric acid aqueous solution is provided in the first piping section Tb1. A first flow control unit Cf1 is provided. The first flow control unit Cf1 has, for example, a first valve V1 for opening and closing the flow path of the first piping unit Tb1, and a first flow meter M1 for measuring the flow rate of the phosphoric acid aqueous solution. The second end of the first piping unit Tb1 is connected, for example, in a manner communicating with a regulating box CB1. Here, the first flow control unit Cf1 is connected to the control unit 10. The control unit 10 controls the first valve V1 based on a signal indicating the flow rate sent from the first flow meter M1. Thus, in the first liquid supply unit SL1a, for example, the phosphoric acid aqueous solution supplied from the treatment liquid supply source En0 passes through the first piping unit Tb1 and is supplied to the regulating box CB1 at a flow rate set by the first flow control unit Cf1.

[0121] The liquid circulation section CL1 is capable of, for example, performing a process of heating the phosphoric acid aqueous solution discharged from the regulating tank CB1 and pressurizing and circulating it to the regulating tank CB1 (also referred to as a first liquid circulation process). The liquid circulation section CL1 has, for example, a second piping section Tb2. The second piping section Tb2 has, for example, a first end connected in a manner communicating with the regulating tank CB1 and a second end connected in a manner communicating with the regulating tank CB1. In the second piping section Tb2, for example, a second valve V2, a first pump Pm1, and a first heater Ht1 are provided in order from the upstream side. The second valve V2 opens and closes the flow path of the second piping section Tb2. The first pump Pm1 pressurizes the phosphoric acid aqueous solution drawn from the regulating tank CB1 toward the regulating tank CB1 via the second piping section Tb2. The first heater Ht1 heats the phosphoric acid aqueous solution flowing through the second piping section Tb2 to a predetermined temperature (for example, approximately 160°C).

[0122] The second liquid supply section SL1b, for example, can perform a process (also referred to as a second liquid supply process) of supplying a phosphoric acid aqueous solution before use as a processing liquid that functions as an etching liquid to the processing tank CB2. The second liquid supply section SL1b, for example, has a third piping section Tb3 as a liquid supply pipe section, and can supply the phosphoric acid aqueous solution sent from the regulating box CB1 to the processing tank CB2 via the third piping section Tb3. The third piping section Tb3, for example, has a first end connected in a manner connected to a portion between the first heater Ht1 in the second piping section Tb2 and the regulating box CB1, and a second end connected in a manner connected to the outer tank B2b of the processing tank CB2. In other words, the third piping section Tb3 is a piping section branched from the second piping section Tb2. In the third piping section Tb3, the phosphoric acid aqueous solution is pressure-fed from the first end toward the second end by, for example, the first pump Pm1. A second flow control section Cf2 is provided in the third piping section Tb3. The second flow control section Cf2, for example, has the following structure The structure is as follows: With respect to the third piping section Tb3, a second flow meter M2, a third valve V3, and a fourth valve V4 are provided in order from the upstream side (regulating box CB1 side). For example, a flow detector capable of detecting the flow rate of the phosphoric acid aqueous solution flowing in the third piping section Tb3 is applied to the second flow meter M2. For example, a flow control valve for regulating the flow rate of the phosphoric acid aqueous solution flowing in the third piping section Tb3 is applied to the third valve V3. For example, an on-off valve for controlling the opening and closing of the flow path of the phosphoric acid aqueous solution in the third piping section Tb3 is applied to the fourth valve V4. Here, the second flow control section Cf2 is connected to the control section 10. The control section 10 controls the third valve V3 and the fourth valve V4, for example, based on a signal indicating the flow rate sent from the second flow meter M2. Thus, the second liquid supply section SL1b can supply the phosphoric acid aqueous solution supplied from the regulating box CB1 to the outer tank B2b of the processing tank CB2 via the third piping section Tb3 at a flow rate controlled by the second flow control section Cf2.

[0123] In addition, the liquid supply section SL1 may have the same structure as the second liquid supply section SL1b directly connected to the processing liquid supply source En, instead of the first liquid supply section SL1a, the adjustment box CB1, and the liquid circulation section CL1. In this case, for example, the first end portion on the upstream side of the third piping section Tb3 is directly connected to the processing liquid supply source En.

[0124] The processing tank CB2 is, for example, a portion for applying a treatment to the substrate W using a stored treatment liquid. In the first embodiment, the processing tank CB2 is, for example, a portion (also referred to as a processing portion) for performing an etching treatment on the substrate W using a phosphoric acid aqueous solution as a treatment liquid that functions as an etching liquid. The processing tank CB2 stores, for example, a phosphoric acid aqueous solution as an etching liquid, and has a double structure consisting of an inner tank B2a for immersing the substrate W in the phosphoric acid aqueous solution and an outer tank B2b for recovering the phosphoric acid aqueous solution overflowing from the upper part of the inner tank B2a. The inner tank B2a is, for example, a portion of a rectangular box shape in a plan view formed of a quartz or fluororesin material having excellent corrosion resistance to the phosphoric acid aqueous solution. The total amount of liquid that can be stored in the processing tank CB2 (capacity) is, for example, set to about 60 liters. The outer tank B2b is, for example, also formed of the same material as the inner tank B2a, and is located at a position surrounding the outer circumferential upper end of the inner tank B2a.

[0125] In addition, a lift LF2 for immersing the substrate W in the phosphoric acid aqueous solution stored in the processing tank CB2 is provided in the processing tank CB2. The lift LF2, for example, uses three holding rods to hold a plurality of (for example, 50 or less) substrates W arranged parallel to each other in an upright position (a position in which the normals of the main surfaces of the substrates are in the horizontal direction). The lift LF2 is configured to be able to be lifted and lowered in the vertical direction by a lifting mechanism (not shown). The lift LF2, for example, moves the plurality of substrates W being held at a processing position ( Figure 3 The processing tank CB2 is raised and lowered between the position of the inner tank B2a and the handover position lifted from the phosphoric acid aqueous solution. In the processing tank CB2, for example, by positioning a plurality of substrates W at the processing position in the inner tank B2a and immersing them in the phosphoric acid aqueous solution, an etching process can be performed to dissolve the silicon nitride film of the substrate W using the phosphoric acid aqueous solution. At this time, the phosphoric acid aqueous solution stored in the inner tank B2a melts the substrate W into silicon which is a component constituting the substrate W (also referred to as a substrate component).

[0126] The liquid circulation section CL2 is capable of, for example, performing a process of heating the phosphoric acid aqueous solution discharged from the treatment tank CB2 and then pressurizing and circulating it to the treatment tank CB2 (also referred to as a second liquid circulation process). The liquid circulation section CL2 has, for example, a fourth piping section Tb4 connected in a manner that connects the outer tank B2b and the inner tank B2a. For example, the fourth piping section Tb4 has a first end connected in a manner that communicates with the bottom of the outer tank B2b, and a second end connected in a manner that communicates with the bottom of the inner tank B2a. In the fourth piping section Tb4, a fifth valve V5, a second pump Pm2, a sixth valve V6, a second heater Ht2, and a filter Fl1 are provided in order from the upstream side. The fifth valve V5 opens and closes the flow path of the fourth piping section Tb4. The second pump Pm2 pressurizes the phosphoric acid aqueous solution extracted from the outer tank B2b toward the inner tank B2a via the fourth piping section Tb4. The sixth valve V6 The flow path of the fourth piping section Tb4 is opened and closed. The second heater Ht2 heats the phosphoric acid aqueous solution flowing through the fourth piping section Tb4 to a predetermined temperature (for example, about 160° C.). The filter Fl1 is a filtrate filter for removing foreign matter in the phosphoric acid aqueous solution flowing through the fourth piping section Tb4. In addition, the liquid circulation section CL2 may also include, for example, a fifth piping section Tb5 for heating the phosphoric acid aqueous solution discharged from the inner tank B2a and circulating it in the inner tank B2a. In this case, for example, the fifth piping section Tb5 has a first end connected in communication with the inner tank B2a and a second end connected in communication with a portion between the fifth valve V5 and the second pump Pm2 in the fourth piping section Tb4. The fifth piping section Tb5 is provided with a seventh valve V7, which opens and closes the flow path of the fifth piping section Tb5.

[0127] The drain section EL1 is, for example, a section that performs a process (also referred to as a drain process) for discharging a phosphoric acid aqueous solution (also referred to as a used phosphoric acid aqueous solution or a first phosphoric acid aqueous solution) as a processing liquid (also referred to as a first processing liquid) after an etching process for a substrate W in a processing tank CB2 as a processing section to the outside of the substrate processing apparatus 100. The used phosphoric acid aqueous solution becomes a state in which the concentration (also referred to as a dissolved concentration) of substrate components (for example, silicon) is dissolved by the etching process of the substrate W in the processing tank CB2 is very high compared to the phosphoric acid aqueous solution before use. The drain section EL1 includes, for example, a sixth piping section Tb6, a seventh piping section Tb7, a cooling box Ct1, and an eighth piping section Tb8. Here, the sixth piping section Tb6, the seventh piping section Tb7, and the eighth piping section Tb8 constitute a section (also referred to as a drain pipe section Tg1) for discharging the used phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100.

[0128] The sixth piping section Tb6, for example, has a first end connected in a manner connected to the portion between the second pump Pm2 and the sixth valve V6 in the fourth piping section Tb4, and a second end connected in a manner connected to the cooling box Ct1. In other words, the sixth piping section Tb6 and the fourth piping section Tb4 together constitute a portion connecting the processing tank CB2 and the cooling box Ct1 (also referred to as the first portion). The sixth piping section Tb6 is provided with an eighth valve V8. The eighth valve V8 opens and closes the flow path of the sixth piping section Tb6. Therefore, by appropriately controlling the opening and closing of the sixth valve V6 and the eighth valve V8, it is possible to selectively perform a process of heating the phosphoric acid aqueous solution discharged from the processing tank CB2 and then pressurizing and circulating it to the processing tank CB2 (second liquid circulation process), and a process of discharging the used phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100 via the cooling box Ct1 (liquid discharge process).

[0129] The seventh piping portion Tb7 has, for example, a first end portion connected to communicate with the upper portion of the outer tank B2b of the treatment tank CB2 and a second end portion connected to communicate with the cooling tank Ct1. Here, for example, when the storage amount of the phosphoric acid aqueous solution stored in the outer tank B2b of the treatment tank CB2 increases excessively, the seventh piping portion Tb7 can flow the phosphoric acid aqueous solution from the outer tank B2b to the cooling tank Ct1 so that the phosphoric acid aqueous solution does not overflow from the outer tank B2b.

[0130] The cooling box Ct1 can store and cool the used phosphoric acid aqueous solution.

[0131] The 8th piping section Tb8 is connected to, for example, the cooling box Ct1, and constitutes a portion for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100. The 8th piping section Tb8 has, for example, a first end connected to the cooling box Ct1, and a second end connected to a portion for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100 (also referred to as a processing liquid discharge section Ex0). The processing liquid discharge section Ex0 is, for example, a box for recovering the phosphoric acid aqueous solution (also referred to as a recovery box) that can be installed and removed relative to the substrate processing apparatus 100, or a box for discarding the phosphoric acid aqueous solution (also referred to as a discard box), or a drainage pipe for connecting to a factory wastewater treatment facility, etc. The 8th piping section Tb8 is provided with, for example, a 9th valve V9. The 9th valve V9 can open and close the flow path of the 8th piping section Tb8. Here, the phosphoric acid aqueous solution discharged from the cooling box Ct1 to the processing liquid discharge section Ex0 can be adjusted by the 9th valve V9.

[0132] The operation of each part of the above-mentioned chemical liquid processing unit 52 can be controlled by the control unit 10 . For example, the control unit 10 can control the treatment of supplying the phosphoric acid aqueous solution before use as the second processing liquid from the first liquid supply unit SL1a to the regulating box CB1 (first liquid supply treatment), the treatment of circulating the phosphoric acid aqueous solution through the liquid circulation unit CL1 (first liquid circulation treatment), the treatment of supplying the phosphoric acid aqueous solution before use to the processing tank CB2 from the second liquid supply unit SL1b (second liquid supply treatment), the treatment of circulating the phosphoric acid aqueous solution through the liquid circulation unit CL2 (second liquid circulation treatment), and the treatment of discharging the used phosphoric acid aqueous solution as the first processing liquid from the processing tank CB2 through the drain unit EL1 (liquid discharge treatment. In addition, for example, a concentration meter arranged along the inner wall of the inner tank B2a detects the dissolved concentration of a specific substance of the substrate W precipitated in the phosphoric acid aqueous solution stored in the inner tank B2a, and the control unit 10 can open and close the eighth valve V8 and the ninth valve V9 according to the dissolved concentration as the detection result, and appropriately send the used phosphoric acid aqueous solution to the processing liquid drain unit Ex0.

[0133] <1-3. Control of supply of treatment liquid>

[0134] In the chemical liquid processing unit 52 , for example, in the processing tank CB2 , at least one timing of pre-processing, main processing, and post-processing for a plurality of substrates W in one batch, an unused phosphoric acid aqueous solution is supplied as a processing liquid into the processing tank CB2 .

[0135] Here, the pre-processing is, for example, a process in which, before immersing the plurality of substrates W in the phosphoric acid aqueous solution stored in the processing tank CB2, the phosphoric acid aqueous solution stored in the processing tank CB2 is prepared in a manner such that the phosphoric acid aqueous solution stored in the processing tank CB2 is in an active state suitable for etching processing by supplying the phosphoric acid aqueous solution before use to the processing tank CB2 and introducing bubbles for bubbling processing. This process is, for example, a process in which etching is performed on the plurality of substrates W while the plurality of substrates W are immersed in the phosphoric acid aqueous solution stored in the processing tank CB2. The post-processing is, for example, a process in which, after the completion of this process, preparations are made for processing of a batch of the plurality of substrates W to be the next processing target by supplying the phosphoric acid aqueous solution before use to the processing tank CB2.

[0136] At this time, the control unit 10 controls, for example, the second liquid supply process of supplying the pre-used phosphoric acid aqueous solution as the processing liquid to the processing tank CB2 by using the second liquid supply unit SL1b, thereby controlling the process of supplying the pre-used phosphoric acid aqueous solution as the processing liquid relative to the processing tank CB2 through the liquid supply unit SL1 (also referred to as liquid supply process). For example, the above-mentioned liquid supply process can be controlled by the control unit 10 with respect to a batch of multiple substrates W as processing objects according to a specified process.

[0137] Figure 4 1 is a block diagram showing an example of the functional configuration of the liquid supply process implemented by the control unit 10. In the control unit 10, the memory is used as a workspace in the calculation unit, and various functional configurations are implemented. Figure 4 As shown, the control unit 10 includes, as the functional configuration implemented, for example, a screen creation unit 10a, a display control unit 10b, a recipe creation unit 10c, a schedule creation unit 10d, an acquisition unit 10e, a recognition unit 10f, a calculation unit 10g, a supply control unit 10h, and a mode switching unit 10i. Here, for example, at least a part of the functions implemented by the control unit 10 may be implemented by a dedicated electronic circuit.

[0138] The screen creation unit 10a can, for example, create a screen (information of a process input screen) for creating or editing a process that specifies the order in which an operator processes the substrate W. For example, the screen creation unit 10a creates the information of the process input screen based on the screen configuration data stored in the storage unit 20.

[0139] For example, the display control unit 10b can cause the display unit included in the output unit 9 to display the recipe input screen based on the information of the recipe input screen created by the screen creation unit 10a.

[0140] The recipe creation unit 10c can create or edit a recipe, for example, based on a signal inputted by the input unit 8 in response to an operator's action. Here, for example, the recipe creation unit 10c can create and edit a recipe by the operator inputting various information on a recipe input screen displayed on the display unit.

[0141] Figure 5 (a and Figure 5 FIG. 1( b ) is a diagram showing a first example of a portion R1a or R1b of a recipe input screen that specifies the processing in the chemical liquid processing unit 52 . Figure 6 1 is a diagram showing a second example of a portion R2 of the recipe input screen that defines the processing in the chemical liquid processing unit 52 .

[0142] For example, Figure 5 As shown in (a), for the liquid processing unit 52 of the first liquid processing unit 5, the numerical value V1a of the supply amount of the processing liquid per unit processing amount of the substrate W can be recorded on the process input screen, and the storage unit 20 can store the process. In addition, for example, Figure 5 As shown in (b), for the liquid processing unit 52 of the second liquid processing unit 6, the numerical value V1b of the supply amount of the processing liquid per unit processing amount of the substrate W can be recorded on the process input screen, and the storage unit 20 can store the process. Here, the numerical values ​​V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W are, for example, the volumes of the processing liquid.

[0143] In this way, the process creation unit 10c records the numerical values ​​V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W for the two liquid processing units 52, respectively, into the process according to the signal input by the input unit 8 in response to the operator's action, thereby enabling the process to be created or edited. Thus, for example, the operator can perform customization regarding the processing to be performed on the substrate W for each processing tank CB2 in the two liquid processing units 52. Here, the unit processing amount of the substrate W includes, for example, a unit processing number of sheets consisting of a specified number of sheets. The specified number of sheets can be, for example, 1 sheet, or any number of more than two sheets. The numerical values ​​V1a and V1b should be, for example, values ​​representing the volume of the processing liquid. In Figure 5 In the example of (a), the supply amount of the processing liquid is recorded as 600 ml for one substrate W. Figure 5 In the example of (b), the supply amount of 800 ml of the processing liquid is recorded relative to one substrate W. Here, the numerical values ​​V1a and V1b are appropriately input by the operator, for example, according to the results of the processing relative to the substrate W in the processing tank CB2 of each liquid processing unit 52. Thus, for example, the operator can record the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W in the process for each liquid processing unit 52. Then, for each of the two liquid processing units 52, the numerical information including the numerical values ​​V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W is stored in the storage unit 20.

[0144] exist Figure 5 (a and Figure 5 In the example of (b), the numerical values ​​V1a and V1b for the two processing tanks CB2 are recorded for each process, but it is not limited to this. For example, numerical information including the numerical values ​​V1a and V1b for each liquid processing unit 52 can also be recorded for one process. In this case, for example, in one process, an amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each liquid processing unit 52. Thereby, for example, according to one process, the substrate W can be processed in parallel using the two processing tanks CB2.

[0145] In addition, if Figure 6 As shown, the numerical information recorded in one process may include the supply amount of the processing liquid per unit processing amount of the substrate W, the reference value Vs1 relative to the two liquid processing units 52, and the adjustment value Va1 relative to at least one of the two liquid processing units 52. Figure 6In an example of a process shown in , the liquid processing unit 52 of the first liquid processing unit 5 is represented by symbol T2, and the liquid processing unit 52 of the second liquid processing unit 6 is represented by symbol T4. Here, as the reference value Vs1, for example, a standard value that specifies the supply amount of the processing liquid per unit processing amount of the substrate W relative to one liquid processing unit 52 is applied. As the adjustment value Va1, for example, a value that specifies the amount by which the supply amount of the processing liquid per unit processing amount of the substrate W should be increased for each liquid processing unit 52 based on the reference value Vs1 is applied. As the reference value Vs1 and the adjustment value Va1, for example, the volume of the processing liquid is applied. In Figure 6 In the example of , 600 ml as the reference value Vs1, 0 ml as the first adjustment value Va11, and 200 ml as the second adjustment value Va12 are recorded in one process. Here, the first adjustment value Va11 is an adjustment value relative to the liquid treatment unit 52 of the first liquid treatment unit 5, and the second adjustment value Va12 is an adjustment value relative to the liquid treatment unit 52 of the second liquid treatment unit 6.

[0146] The schedule creation unit 10d can, for example, create a schedule according to a process specified for a plurality of substrates W to be processed. The schedule specifies, for example, the timing of the transport of a plurality of substrates W by the first transport unit 2, the transport of a plurality of substrates W in a batch by the second transport unit 3, and the processing of the plurality of substrates W by the drying unit 4, the first liquid processing unit 5, and the second liquid processing unit 6. The schedule created by the schedule creation unit 10d is stored, for example, in a memory or a storage unit 20. Then, the substrate processing apparatus 100 can perform various operations, for example, according to the schedule created by the schedule creation unit 10d.

[0147] The acquisition unit 10e can acquire, for example, the processing volume information of a batch of substrates W to be processed based on the measurement result based on the sensor unit 11m. Here, for example, it is assumed that a batch of substrate groups including a plurality of substrates W are formed by conveying all the substrates W contained in the two boxes C1 relative to the second conveying unit 3. In this case, for example, the number of all the substrates W contained in each of the two boxes C1 is acquired as the processing volume information of a batch of substrates W based on the result measured by the sensor unit 11m. Thus, for example, based on the processing volume of the substrates W measured by the substrate processing apparatus 100, the processing liquid of an amount corresponding to the processing volume of the substrates W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52. As a result, for example, in the substrate processing apparatus 100, customization of the processing applied to the substrates W can be performed for each processing tank CB2.

[0148] The identification unit 10f can identify, for example, one of the two liquid processing units 52 used to process the substrate W. For example, the liquid processing unit 52 to which a plurality of substrates W of one batch are transferred can be determined based on the time schedule.

[0149] The calculation unit 10g can calculate the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of a liquid processing unit 52, based on the numerical information of the process specified for a batch of multiple substrates W as processing objects, the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W corresponding to a liquid processing unit 52 identified by the identification unit 10f, and the processing amount information acquired by the acquisition unit 10e.

[0150] Here, if Figure 5 (a and Figure 5 As shown in (b), it is assumed that the numerical values ​​V1a and V1b for two processing tanks CB2 are recorded for each process. In this case, for example, when the identification unit 10f identifies the chemical liquid processing unit 52 of the first liquid processing unit 5, the value obtained by multiplying 600 ml of the supply amount of the processing liquid for one substrate W as the unit processing amount of the substrate W by the number of substrates W (less than 50) obtained as the processing amount information by the acquisition unit 10e is calculated as the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52. Figure 5 In the example of (a), a state is shown in which a numerical value of 30000 ml of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52 is calculated by multiplying 600 ml by 50, which is the number of substrates W. In addition, for example, when the recognition unit 10f recognizes the liquid processing unit 52 of the second liquid processing unit 6, a value obtained by multiplying 800 ml of the supply amount of the processing liquid for one substrate W as the unit processing amount of the substrate W by the number of substrates W (less than 50) obtained by the acquisition unit 10e as the processing amount information is calculated as the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52. Figure 5 In the example of (b), a state is shown in which the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52 is calculated by multiplying 800 ml by the number of substrates W, that is, 50, that is, 40000 ml.

[0151] The supply control unit 10h can, for example, supply the processing liquid to the processing tank CB2 from the liquid supply unit SL1 in one of the liquid processing units 52 identified by the identification unit 10f based on the numerical value calculated by the calculation unit 10g. Therefore, for example, the processing liquid of an amount corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each liquid processing unit 52. As a result, for example, waste of the processing liquid and defects such as over-processing due to over-supply of the processing liquid are less likely to occur. As a result, for example, it is possible to easily perform processing customization for the substrate W for each processing tank CB2 in the substrate processing apparatus 100. Therefore, for example, it is possible to easily perform processing customization for the substrate W in the substrate processing apparatus 100.

[0152] In addition, the calculation unit 10g may be configured to calculate the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52, based on the reference value Vs1, the adjustment value Va1 corresponding to one chemical liquid processing unit 52 identified by the identification unit 10f, and the processing amount information acquired by the acquisition unit 10e, among the numerical information recorded in one recipe. In this case, for example, by changing the adjustment value in one recipe, the processing liquid of the amount corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52. Thus, for example, a recipe can be easily created.

[0153] Here, if Figure 6 As shown, it is assumed that a reference value Vs1 and an adjustment value Va1 are recorded for a process. In this case, for example, when the identification unit 10f identifies the liquid processing unit 52 of the first liquid processing unit 5, a reference value Vs1 of the supply amount of the processing liquid for one substrate W as a unit processing amount of the substrate W is calculated, i.e., a value obtained by multiplying 600 ml by the number of substrates W (less than 50) as processing amount information obtained by the acquisition unit 10e, and a first adjustment value Va11 of the supply amount of the processing liquid for one substrate W as a unit processing amount of the substrate W is calculated, i.e., a value obtained by multiplying 0 ml by the number of substrates W (less than 50) as processing amount information obtained by the acquisition unit 10e, as the sum of the values, as the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52. In Figure 6In the example of , a state is shown in which the sum of the reference value Vs1, which is 600 ml and the number of substrates W, which is 50, and the first adjustment value Va11, which is 0 ml and the number of substrates W, which is 50, is 30000 ml. In addition, for example, when the recognition unit 10f recognizes the liquid processing unit 52 of the second liquid processing unit 6, the reference value Vs1, which is 600 ml and the number of substrates W (less than 50) as the processing volume information obtained by the acquisition unit 10e, and the second adjustment value Va12, which is 200 ml and the number of substrates W (less than 50) as the processing volume information obtained by the acquisition unit 10e, for the supply amount of the processing liquid for one substrate W as the unit processing amount of the substrate W are calculated as the value of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52.

[0154] Figure 7 1 is a diagram showing an example of the relationship between the number of substrates W and the amount of processing liquid supplied to the processing tank CB2 . Figure 7 Shows that according to Figure 6 The relationship between the number of substrates W and the amount of processing liquid supplied to the processing tank CB2 is shown in FIG. Figure 7 In FIG. 1 , the solid line L1 indicates the relationship between the number of substrates W and the amount of processing liquid supplied to the processing tank CB2 in the chemical processing section 52 of the first liquid processing section 5, and the dashed line L2 indicates the relationship between the number of substrates W and the amount of processing liquid supplied to the processing tank CB2 in the chemical processing section 52 of the second liquid processing section 6. Here, for example, in the chemical processing section 52 of the first liquid processing section 5, the first adjustment value Va11 is 0 ml, and thus the amount of processing liquid supplied is not adjusted. Thus, the amount of processing liquid supplied to the processing tank CB2 in the chemical processing section 52 of the first liquid processing section 5 is obtained by multiplying the reference value Vs1, i.e., 600 ml, by the number of substrates W as the processing amount information, as indicated by the solid line L1. For example, in the case of the chemical liquid processing section 52 of the second liquid processing section 6, the second adjustment value Va12 is 200 ml, and therefore, the supply amount of the processing liquid is adjusted so as to increase the processing liquid by 200 ml for one substrate W as the unit processing amount. Thus, the supply amount of the processing liquid supplied to the processing tank CB2 of the chemical liquid processing section 52 of the second liquid processing section 6 is adjusted as shown by the dashed line L2 by adding the value obtained by multiplying the second adjustment value Va12, i.e., 200 ml, by the number of substrates W as the processing amount information to the supply amount of the processing liquid shown by the solid line L1 along the reference value Vs1.

[0155] The mode switching unit 10i can switch the mode between the first liquid supply mode and the second liquid supply mode according to a signal input by the input unit 8 in response to the action of the operator. Here, the first liquid supply mode is a mode in which a processing liquid corresponding to the processing volume is supplied to the processing tank CB2 for each liquid processing unit 52 as described above. Specifically, the following mode is applied to the first liquid supply mode, for example: the calculation unit 10g calculates the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one liquid processing unit 52 identified by the identification unit 10f based on the numerical value of the supply amount of the processing liquid per unit processing volume of the substrate W corresponding to one liquid processing unit 52 identified by the identification unit 10f in the numerical information recorded in the process and the processing volume information acquired by the acquisition unit 10e, and the supply control unit 10h supplies the processing liquid function to the processing tank CB2 in one liquid processing unit 52 identified by the identification unit 10f according to the numerical value calculated by the calculation unit 10g. The second liquid supply mode is a mode for supplying a predetermined amount of treatment liquid to the treatment tank CB2 regardless of the two liquid treatment units 52. Specifically, the second liquid supply mode is applied, for example, in the following mode: the control unit 10 supplies a predetermined amount of treatment liquid set in advance by the liquid supply unit SL1 to the treatment tank CB2 of one liquid treatment unit 52 identified by the identification unit 10f.

[0156] As long as such a mode switching can be performed, for example, when there is no difference in the processing results of the substrates W between the processing tanks CB2, by setting the second liquid supply mode, it is possible to omit the setting of the numerical value of the supply amount of the processing liquid per unit processing amount of the substrates W for each chemical liquid processing section 52. Thus, for example, the workload of the operator who sets the processing conditions by creating and editing a recipe can be reduced.

[0157] <1-4. Operation of supplying treatment liquid to treatment tank>

[0158] Figure 8 1 is a flowchart showing an example of an operation flow of supplying the processing liquid to the processing tank CB2. The operation of supplying the processing liquid to the processing tank CB2 also includes, for example, the operation of creating and editing a process. This operation flow is realized, for example, by the control unit 10 controlling the operation of each part of the substrate processing apparatus 100. Here, for example, by performing Figure 8 The processing of steps S1 to S10 executes the action of supplying the processing liquid to the processing tank CB2.

[0159] In step S1, the control unit 10 determines whether to start creating and editing a recipe. Here, for example, if a signal for displaying a recipe input screen is inputted from the input unit 8 without responding to the operator's action, the process proceeds to step S5, and if a signal for displaying a recipe input screen is inputted from the input unit 8 in response to the operator's action, the process proceeds to step S2.

[0160] In step S2 , the display control unit 10 b displays the recipe input screen on the display unit included in the output unit 9 based on the information of the recipe input screen created by the screen creation unit 10 a .

[0161] In step S3, the recipe creation unit 10c receives input of information such as information to be recorded on the recipe input screen in response to a signal inputted from the input unit 8 in response to an action of the operator. At this time, for example, numerical information of the amount of processing liquid supplied per unit processing amount of the substrate W may be inputted for each of the two liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6.

[0162] In step S4, the control unit 10 determines whether to end the creation and editing of the recipe. Here, for example, if a signal for ending the creation and editing of the recipe is not inputted from the input unit 8 in response to the operator's action, the process proceeds to step S3, and if a signal for ending the creation and editing of the recipe is inputted from the input unit 8 in response to the operator's action, the process proceeds to step S5.

[0163] In step S5, the control unit 10 stores the recipe created and edited on the recipe input screen in the storage unit 20. Thus, for example, the numerical information of the supply amount of the processing liquid per unit processing amount of the substrate W is stored in the storage unit 20 for each of the two liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6.

[0164] In step S6, the control unit 10 determines whether it is the timing to start the liquid treatment in the liquid treatment unit 52. Here, the control unit 10 determines whether it is the timing to start the liquid treatment based on the time schedule created by the schedule creation unit 10d according to the process specified for the plurality of substrates W as the processing target and stored in the storage unit 20 or the like. Here, if it is not the timing to start the liquid treatment in the liquid treatment unit 52, the process proceeds to step S1. On the other hand, if it is the timing to start the liquid treatment in the liquid treatment unit 52, the process proceeds to step S7. At this time, the process specified for the plurality of substrates W in one batch as the processing target can be identified.

[0165] In step S7 , the acquisition unit 10 e acquires the number of substrates W per batch as the processing amount of substrates W to be processed in the chemical liquid processing unit 52 .

[0166] In step S8, the recognition unit 10f recognizes one of the two liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6 used to process the substrate W. Here, the recognition unit 10f can recognize one processing bath CB2 used based on a time schedule, for example.

[0167] In step S9, the calculation unit 10g calculates the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of a liquid processing unit 52 based on the numerical information recorded in the process specified for a batch of multiple substrates W as processing objects, the numerical value of the supply amount of the processing liquid per unit processing amount corresponding to a liquid processing unit 52 identified in step S8, and the number of substrates W as a batch of processing amounts obtained in step S7.

[0168] In step S10 , the supply control unit 10 h supplies the processing liquid to the processing tank CB2 through the liquid supply unit SL1 in one of the chemical liquid processing units 52 identified in step S8 , based on the numerical value calculated in step S9 .

[0169] By such an operation, for example, the amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52CB2. As a result, for example, waste of processing liquid and defects such as excessive processing due to excessive supply of processing liquid are not easily generated. As a result, for example, in the substrate processing apparatus 100, it is possible to easily perform processing customization for the substrate W for each processing tank CB2. Therefore, for example, in the substrate processing apparatus 100, it is possible to easily perform processing customization for the substrate W.

[0170] <1-5. Display of process input screen>

[0171] Fig. 9 Sc0 is a diagram showing a schematic structure of the recipe input screen Sc0. Fig.10 1 is a diagram showing a reference example of a part of the recipe input portion Pr1 in the recipe input screen Sc0. Figure 11 to Figure 22 Each of them is a diagram showing an example of a part of the recipe input part Pr1 in the recipe input screen Sc0.

[0172] like Fig. 9 As shown, the process input screen Sc0 includes, for example, an area for displaying information on the process (also referred to as a process display area Ar0, and an area for arranging buttons for inputting various commands (also referred to as a button area Ab0. The process display area Ar0 includes, for example, a portion for displaying various identification information on the process (also referred to as an identification information portion Pr0, and a portion for displaying and inputting setting items for the process and setting conditions (numerical values, etc.) for each setting item (also referred to as a process input portion Pr1).

[0173] Here, if Fig.10As shown, the process input part Pr1 includes, for example, a first area Ar1 located at the top and a second area Ar2 located at the bottom. The first area Ar1 is, for example, an area (also referred to as a head area) for recording conditions for a plurality of setting items (also referred to as first setting items or head items) regarding conditions that do not depend on the passage of time in the processing performed according to the process. The second area Ar2 is, for example, an area (also referred to as a step area) for recording conditions for a plurality of setting items (also referred to as second setting items or step items) regarding conditions that depend on the passage of time in the processing performed according to the process. The plurality of first setting items may, for example, include items such as the lifting speed of the elevator LF2, the etching amount of the substrate W, the conditions for the processing based on the processing liquid in the processing tank CB2, and the presence or absence of bubbles. The plurality of second setting items may, for example, include items such as the supply amount of the chemical solution supplied to the processing tank CB2 that changes with the passage of time.

[0174] Then, for example, the operator can perform the operation of creating and editing the recipe while confirming both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0. Then, the recipe creation unit 10c can create or edit the recipe by, for example, recording the conditions for each first setting item on the recipe input screen Sc0 and recording the conditions for each second setting item on the recipe input screen Sc0 based on a signal inputted from the input unit 8 in response to the operator's action.

[0175] <1-5-1. Expanding and shrinking items on the process input screen>

[0176] However, in recent years, for example, there is a tendency to pursue more detailed requirements with respect to the processing performed on the substrate W. Therefore, there is a tendency to increase the number of first setting items in the first area Ar1. For example, in the case where bubbling of the stored processing liquid using nitrogen is performed in the processing tank CB2, the number of gas tubes used for bubbling is sometimes increased and individual settings such as whether or not gas is ejected from each gas tube are performed. In this case, the number of first setting items related to bubbling in the first area Ar1 increases. In particular, in recent years, for example, the number of items for which processing conditions should be set in detail in a process for forming a three-dimensional NAND has increased, and there is also a tendency that the number of first setting items in the first area Ar1 has increased significantly.

[0177] However, for example, as the number of first setting items in the first area Ar1 increases, the proportion of the first area Ar1 in the recipe input screen Sc0 increases. In this case, in order to display the first area Ar1 and the second area Ar2 simultaneously on the recipe input screen Sc0, for example, a method of reducing the text on the recipe input screen Sc0 may be considered, but the visual confirmation of the recipe input screen Sc0 deteriorates. As a result, for example, it becomes increasingly difficult to create and change a recipe.

[0178] Therefore, in the first embodiment, for example, Figure 11 to Figure 13 As shown, in the first area Ar1, the plurality of first setting items are divided into a plurality of groups, and the plurality of first setting items can be switched between display and non-display for each group. The display in the first area Ar1 can be realized by, for example, screen configuration data stored in the storage unit 20.

[0179] Here, for example, Fig.11 As shown, in the first area Ar1, display elements (also referred to as first display elements Dc1 to Dc3) each including a plurality of item groups (also referred to as group names of the first setting item groups) of two or more first setting items among the plurality of first setting items are set. Such first display elements Dc1 to Dc3 are defined by the screen configuration data stored in the storage unit 20. Fig.11 In the example, in the first area Ar1, a plurality of first setting items are classified into a group of first setting items for a lifting speed of the lift LF2 (also referred to as the first group), a group of first setting items regarding conditions for treatment by a treatment liquid in a treatment tank CB2 (also referred to as the second group), and a group regarding other first setting items (also referred to as the third group. In the first area Ar1, for example, a first display element Dc1 of the group name of the first group, a first display element Dc2 of the group name of the second group, and a first display element Dc3 of the group name of the third group are displayed.

[0180] Then, for example, it is configured as follows: by the screen creation unit 10a, according to a signal input by the input unit 8 in response to the operator's action, the display state of two or more first setting items included in one first setting item group among the plurality of first setting item groups is switched between a displayed state (also referred to as an expanded state) and a non-displayed state (a contracted state) in the process input screen Sc0 displayed by the display unit included in the output unit 9. If such a configuration is adopted, for example, the operator can switch between an expanded state in which the two or more first setting items are displayed and a contracted state in which the two or more first setting items are not displayed for each group including the two or more first setting items. Thus, for example, even if the number of the plurality of first setting items in the first area Ar1 increases, the operator can easily perform the operation of creating and editing the process while confirming both the first area Ar1 and the second area Ar2 on the process input screen Sc0. Therefore, for example, in the substrate processing apparatus 100, it is possible to easily perform the processing customization to be performed on the substrate W.

[0181] Here, for example, the following configuration is adopted: by performing various operations on each of the first display elements Dc1 to Dc3 according to a signal inputted by the input unit 8 in response to an action of the operator, the display state of two or more first setting items of each of the first to third groups is switched between an expanded state and a collapsed state. Specifically, for example, the following configuration can be considered: Fig.11 When the display state of the two or more first setting items of the first group is in the contracted state, if the first display element Dc1 is clicked with the mouse pointer Mp1, Fig.12 As shown in FIG. 1 , the display state of the two or more first setting items of the first group changes from the contracted state to the expanded state. On the other hand, for example, the following form can be considered: Fig.12 When the display state of the two or more first setting items of the first group is in the expanded state, if the first display element Dc1 is clicked with the mouse pointer Mp1, Fig.11 The display state of the two or more first setting items of the first group shown is changed from the expanded state to the contracted state. In addition, the following forms can be considered: Fig.11 When the display state of the two or more first setting items of the second group is in the contracted state, if the first display element Dc2 is clicked with the mouse pointer Mp1, Fig.13 The display state of the two or more first setting items of the second group shown in the figure changes from the contracted state to the expanded state. Fig.13 When the display state of the two or more first setting items of the second group is in the expanded state, if the first display element Dc2 is clicked with the mouse pointer Mp1, Fig.11 The display state of the two or more first setting items of the second group shown in the figure changes from the expanded state to the contracted state. Fig.11 When the display state of the two or more first setting items of the third group is in the contracted state, if the first display element Dc3 is clicked with the mouse pointer Mp1, the display state of the two or more first setting items of the third group is changed from the contracted state to the expanded state, although not shown in the figure. On the other hand, the following form can be considered: when the display state of the two or more first setting items of the third group is in the expanded state, if the first display element Dc3 is clicked with the mouse pointer Mp1, Fig.11 The display state of the two or more first setting items of the third group is changed from the expanded state to the contracted state.

[0182] Here, for example Figure 11 to Figure 13As shown in FIG. 1 , if the plurality of first display elements Dc1 to Dc3 are displayed in a manner that can be visually distinguished from the plurality of first setting items, the operator's workability can be improved. Specifically, it is conceivable that the plurality of first display elements Dc1 to Dc3 are displayed using a color different from that of the display elements of the plurality of first setting items. In addition, for example, Figure 11 to Figure 13 As shown in FIG. 1 , the plurality of first display elements Dc1 to Dc3 may be respectively labeled with a first mark Mk1 indicating a contracted state or a second mark Mk2 indicating an expanded state. Fig.13 As shown, the plurality of first setting items for which 0 is recorded as the setting condition are not used in the chemical liquid treatment. Therefore, for example, the first setting items for which 0 is recorded as the setting condition and the first setting items for which other than 0 is recorded as the setting condition can be displayed in a manner that allows visual distinction such as by color separation.

[0183] Here, for example, a configuration may be adopted in which the screen creation unit 10a adds certain information to each of the first display elements Dc1 to Dc3 based on a signal inputted by the input unit 8 in response to an action of the operator. Fig.14 As shown, the number of first setting items included in the group may be added to each of the first display elements Dc1 to Dc3, and the reason for grouping may be added.

[0184] In addition, in the process input screen Sc0, for example, by pressing a button for saving the process included in the button area Ab0 with the mouse pointer Mp1, the folder of the process recorded in the process display area Ar0 by the process creation unit 10c is stored in the storage unit 20. Here, for example, when saving the folder of the process in the storage unit 20, the process creation unit 10c checks whether a setting item of an erroneous setting condition (also referred to as an error item) is recorded. The screen creation unit 10a may also display an element for notifying that an error in the setting has occurred on the process input screen (also referred to as a first error notification element). Here, as a record of an erroneous setting condition, for example, a setting item record with respect to the speed of the elevator LF2 that exceeds an upper limit value corresponding to the type of the processing liquid, and the simultaneous addition of acid and alkali can be considered. As the display of the first error notification element, for example, Fig.15 as well as Fig.16 As shown, there are display of a pop-up Em0 notifying an error, display in a visually identifiable manner such as color separation of the error item, and display in a visually identifiable manner such as color separation of the first display element Dc1 of the group to which the error item belongs.

[0185] <1-5-2. Moving items in the process input screen>

[0186] Furthermore, for example, the requirements for high precision of the processing performed on the substrate W are different for each user. For example, at the stage of developing a product using the substrate W, the demand for finely varying and testing the processing performed on the substrate W becomes high. In this case, for example, there is a desire to change the first setting item (head item) regarding a condition that does not depend on the passage of time in the processing performed according to the process to a second setting item (step item) regarding a condition that depends on the passage of time in the processing performed according to the process. On the other hand, for example, at the stage of developing a product using the substrate W, there is a desire to change the second setting item (step item) to the first setting item (head item). In addition, for example, at the stage of mass production of a product that wants to use the substrate W, the number of setting items that become the same setting conditions every day increases, and there is a desire to change the second item (step item) to the first item (head item).

[0187] However, in order to fully satisfy such contradictory expectations, the process input screen Sc0 of the substrate processing apparatus 100 is customized for each user and shipped, which significantly complicates the manufacturing and shipping process of the substrate processing apparatus 100. In addition, even if the process input screen Sc0 of the substrate processing apparatus 100 is customized for each user and shipped, it is impossible to fully cope with changes in expectations corresponding to the usage conditions of the substrate processing apparatus 100.

[0188] Therefore, in the first embodiment, for example, Figure 17 to Figure 22 As shown, in the recipe input screen Sc0, the setting items can be moved between the first area (header area Ar1) and the second area (step area Ar2).

[0189] Here, for example, the screen creation unit 10a can change one or more of the first setting items in the plurality of first setting items in the first area Ar1 to one or more of the second setting items in the second area Ar2 in the recipe input screen Sc0 according to a signal input by the input unit 8 in response to the operator's action. In addition, for example, the screen creation unit 10a can change one or more of the second setting items in the plurality of second setting items in the second area Ar2 to one or more of the first setting items in the recipe input screen Sc0 in the manner of the plurality of first setting items included in the first area Ar1 according to a signal input by the input unit 8 in response to the operator's action. If such a configuration is adopted, for example, the operator can arbitrarily change the setting items between the plurality of first setting items and the plurality of second setting items. Thus, for example, the operator can create a recipe that specifies desired conditions. As a result, for example, the operator can perform processing on the substrate W under desired conditions in the substrate processing apparatus 100. Therefore, for example, the processing customization to be performed on the substrate W can be easily performed in the substrate processing apparatus 100.

[0190] For example Fig.17 As shown, the following method can be considered: in the process input screen Sc0, by pressing the left button of the mouse corresponding to the mouse pointer Mp1 and then dragging it, and releasing the left button of the mouse, as shown in FIG. Fig.18 As shown, it moves to the second area Ar2 and is set as the second setting item. On the other hand, for example, it can be considered that: Fig.19 As shown, in the process input screen Sc0, by pressing the left button of the mouse corresponding to the mouse pointer Mp1 and then dragging it, and releasing the left button of the mouse, one of the second setting items displayed in the second area Ar2 is entered, as shown in FIG. Fig. 20 As shown, the first area Ar1 is moved to the first setting item.

[0191] In addition, for example, the following method can be adopted: Fig.17 As shown in FIG. 1 , in the recipe input screen Sc0, by causing the mouse pointer Mp1 to correspond to one of the plurality of first setting items displayed in the first area Ar1 and left-clicking, the recipe input screen Sc0 is displayed. Fig.18 As shown in FIG. 1 , this first setting item is moved to the second area Ar2 and is set as the second setting item. In addition, for example, the following method can also be adopted: Fig.19 As shown in FIG. 1 , in the recipe input screen Sc0, by left-clicking the mouse pointer Mp1 corresponding to one of the plurality of second setting items displayed in the second area Ar2, the recipe input screen Sc0 is displayed. Fig. 20 As shown in FIG. 1 , this second setting item is moved to the first area Ar1 and is set as the first setting item.

[0192] Here, for example, the screen creation unit 10a may also prohibit the change of one or more specific first setting items pre-set among the plurality of first setting items in the first area Ar1 to one or more second setting items in the form of a plurality of second setting items included in the second area Ar2. The rule for prohibiting the change from the first setting item to the second setting item may be specified by, for example, the screen configuration data stored in the storage unit 20. Here, for example, in the case where the conditions for bubbling of the treatment liquid stored in the treatment tank CB2 using nitrogen gas cannot be changed over time or in the case where individual settings cannot be made for each of the plurality of gas pipes, the first setting item for bubbling may be set to one or more specific first setting items. If such a configuration is adopted, for example, it is possible to prohibit the change of a specific first setting item for which a condition dependent on the passage of time cannot be set to a second setting item for a condition dependent on the passage of time. Thus, for example, it is possible to avoid the undesirable situation that the operator creates a process that cannot be executed.

[0193] Here, for example, the screen creation unit 10a may, based on a signal inputted from the input unit 8 in response to an action of the operator, change one or more specific first setting items to second setting items in the recipe input screen Sc0. Fig.21 As shown in FIG. 1 , an element for notifying the movement of an item in which an error is designated (also referred to as a second error notification element Em1) is displayed on the recipe input screen.

[0194] In addition, here, for example, Fig. 22 As shown, two or more first setting items in the first area Ar1 can be changed to two or more second setting items in the second area Ar2 in units of groups.

[0195] Here, for example, in the process input screen Sc0, it is assumed that there are first display elements Dc1 to Dc3 in the first area Ar1, each of which includes the group name of a plurality of first setting item groups of two or more first setting items among the plurality of first setting items. In this case, for example, the screen creation unit 10a may change the two or more first setting items in the first area Ar1 to two or more second setting items in a manner that is included in the plurality of second setting items in the second area Ar2 for each group of the first setting item groups among the plurality of first setting item groups, based on a signal input by the input unit 8 in response to an action of the operator. For example, the following method may be considered: Fig. 22As shown, in the recipe input screen Sc0, one of the first display elements Dc2 among the plurality of first display elements Dc1 to Dc3 displayed in the first area Ar1 is moved to the second area Ar2 by a drag operation of pressing the left button of the mouse in correspondence with the mouse pointer Mp1 and then moving it, and a release operation of releasing the left button of the mouse, so that two or more first setting items belonging to the second group are set to two or more second setting items. If such a configuration is adopted, for example, the operator can efficiently switch the setting items between a plurality of first setting items for setting conditions that do not depend on the passage of time and a plurality of second setting items for setting conditions that depend on the passage of time.

[0196] <2. Modifications>

[0197] The present invention is not limited to the above-described embodiments, and various changes, improvements, and the like can be made without departing from the gist of the present invention.

[0198] In the first embodiment described above, the unit processing volume of the substrate W is not limited to a specified number of sheets, and may be, for example, a value corresponding to other indicators such as a specified weight. For example, if the unit processing volume of the substrate W is a specified weight, the weight of a plurality of substrates W constituting one batch may be measured by the sensor unit 11m, and the supply volume of the processing liquid may be calculated by the calculation unit 10g based on the weight measured by the sensor unit 11m and the numerical value of the supply volume of the processing liquid per specified weight. In addition, for example, the unit time (also referred to as the unit processing time) of the time for the chemical liquid treatment applied to the substrate W may be applied to the value corresponding to other indicators. In this case, for example, the supply volume of the processing liquid may be calculated based on the numerical value of the supply volume of the processing liquid per unit processing time as the unit processing volume of the substrate W and the total time of the chemical liquid treatment applied to the substrate W.

[0199] In the first embodiment, for example, the process may also specify the timing of supplying the processing liquid by the liquid supply unit SL1 to each processing tank CB2. If such a configuration is adopted, for example, at appropriate timings of pre-processing, main processing, and post-processing of the liquid treatment, the processing liquid in an amount corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each liquid treatment unit 52.

[0200] In the above-mentioned first embodiment, for example, when the supply amount of the processing liquid per unit time from the liquid supply part SL1 to the processing tank CB2 is constant, the supply time of the processing liquid can be applied to the numerical values ​​V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W recorded in the process and the reference value Vs1 and the adjustment value Va1 of the supply amount of the processing liquid per unit processing amount of the substrate W included in the numerical information recorded in a process.

[0201] In the first embodiment described above, the substrate processing apparatus 100 may include two chemical liquid processing units 52 having the same configuration, but may include, for example, three or more chemical liquid processing units 52 having the same configuration.

[0202] In the first embodiment described above, the recipe is created in the substrate processing apparatus 100 , but a configuration may be adopted in which the recipe is transmitted to the substrate processing apparatus 100 from an external device connected in a communicable manner, for example.

[0203] In the above-mentioned first embodiment, for example, with respect to the various configurations of switching between the contracted state and the expanded state of two or more setting items in each group in the process input screen Sc0, and the change of items between the first setting item and the second setting item in the process input screen Sc0, it is not limited to a batch-type substrate processing apparatus 100, but can also be applied to a single-type substrate processing apparatus.

[0204] Of course, all or part of the above-mentioned one embodiment and various modifications can be appropriately combined within the scope of no contradiction.

Claims

1. A substrate processing device, characterized in that: have: A liquid treatment unit having a treatment tank and a liquid supply unit for supplying a treatment liquid to the treatment tank, wherein the treatment tank uses the stored treatment liquid to treat the substrate and stores the treatment liquid suitable for treating the substrate before the substrate is treated; a storage unit storing a recipe for the chemical liquid processing unit, the recipe recording numerical information of the supply amount of the processing liquid per unit processing amount of the substrate and defining processing conditions; and the control department, The control unit has: an acquisition unit that acquires processing volume information related to the processing volume of substrates to be processed, wherein the processing volume information is the number of substrates; a calculation unit that calculates a numerical value of a supply amount of the processing liquid supplied to the processing tank of the chemical liquid processing unit based on the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate in the numerical information recorded in the process stored in the storage unit and the processing amount information acquired by the acquisition unit; A supply control unit supplies the processing liquid in an amount corresponding to the numerical value calculated by the calculation unit to the processing tank through the liquid supply unit.

2. The substrate processing device according to claim 1, characterized in that: The numerical value of the supply amount of the processing liquid is calculated by multiplying the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate by the processing amount information acquired by the acquisition unit.

3. The substrate processing device according to claim 1 or 2, characterized in that: The unit processing amount of the substrate is one substrate.

4. The substrate processing device according to claim 1 or 2, characterized in that: A sensor unit for measuring the processing amount of the substrate is also provided. The acquisition unit acquires the processing amount information based on the measurement result of the sensor unit.

5. A substrate processing method, which is a substrate processing method in a substrate processing device, wherein the substrate processing device is provided with a liquid processing unit, the liquid processing unit having a processing tank for processing a substrate using a stored processing liquid, and a liquid supply unit for supplying the processing liquid to the processing tank, wherein the substrate processing method is characterized in that: The processing tank stores a processing liquid suitable for processing the substrate before processing the substrate. The substrate processing method comprises: (a) a step of causing a storage unit to store a recipe for the chemical liquid processing unit, wherein the recipe records numerical information on the amount of processing liquid supplied per unit processing amount of the substrate and specifies processing conditions; (b) step, obtaining a processing amount of the substrate to be processed, wherein the processing amount is the number of substrates; (c) step of calculating the numerical value of the supply amount of the treatment liquid supplied to the treatment tank based on the numerical value of the supply amount of the treatment liquid per unit treatment amount stored in step (a) and the treatment amount acquired in step (b); and (d) step of supplying the treatment liquid in an amount corresponding to the numerical value calculated in the step (c) to the treatment tank through the liquid supply unit.

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