Display panel, preparation method thereof and display device

Abstract

The invention provides a display panel, a preparation method thereof and a display device. The preparation method of the display panel comprises the following steps: providing a substrate; arranging a pixel definition layer on one side of the substrate, and performing graphical processing on the pixel definition layer to form a plurality of pixel openings; cleaning the residual pixel definition material in the pixel opening for the first time; and after the first cleaning operation, carrying out curing processing on the pixel definition layer. According to the preparation method of the display panel provided by the invention, the luminous efficiency of the display panel can be improved by utilizing the characteristic that the uncured pixel definition material is easy to remove, and the display quality is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a method for preparing the same, and a display device. Background Art

[0002] OLED (Organic Light Emitting Diode) display panel is one of the hot spots in the current display panel research field. OLED display panel has the advantages of low energy consumption, low cost, self-luminescence, wide viewing angle and fast response speed. In order to improve light transmittance and reduce the thickness of the display panel, the current OLED display panel usually adopts COE (Color Filter on Encapsulation) technology, combining color filter (Color Filter, CF) and black matrix (Black Matrix, BM) to replace polarizer. However, the display quality of display panels using COE technology needs to be improved. Summary of the invention

[0003] In view of this, the purpose of the present application is to provide a display panel and a manufacturing method thereof, and a display device, which can improve the display quality.

[0004] Based on the above objectives, the present application provides a method for preparing a display panel, which includes:

[0005] providing a substrate;

[0006] A pixel definition layer is disposed on one side of the substrate, and the pixel definition layer is patterned to form a plurality of pixel openings;

[0007] performing a first cleaning operation on the pixel definition material remaining in the pixel opening;

[0008] After the first cleaning operation, the pixel definition layer is cured.

[0009] In one embodiment, the first cleaning operation of the residual pixel definition material in the pixel opening includes:

[0010] The pixel definition material remaining in the pixel opening is first cleaned using deionized water.

[0011] In one embodiment, after curing the pixel definition layer, the preparation method includes:

[0012] performing a second cleaning operation on the pixel definition material remaining in the pixel opening;

[0013] Preferably, a second cleaning operation is performed on the pixel definition material remaining in the pixel opening using a stripping liquid;

[0014] Preferably, after the second cleaning operation, the roughness of the slope surface of the pixel definition layer located at the pixel opening is within a range of 3-10 nm.

[0015] In one embodiment, the pixel definition material includes photoresist;

[0016] Preferably, the step of providing a pixel definition layer on one side of the substrate and performing a patterning process on the pixel definition layer comprises:

[0017] The photoresist is coated, exposed and developed.

[0018] In one embodiment, after curing the pixel definition layer, the preparation method includes:

[0019] forming a plurality of light-emitting units, wherein at least a portion of the light-emitting units are located at the corresponding pixel openings;

[0020] forming an encapsulation layer on a side of the light-emitting unit away from the substrate;

[0021] A color filter layer is formed on a side of the encapsulation layer away from the substrate, wherein the color filter layer includes a black matrix and a color resistance unit, the black matrix includes a plurality of light-transmitting openings, and the color resistance unit is at least partially located in the light-transmitting openings;

[0022] Preferably, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the corresponding light-transmitting opening on the substrate;

[0023] Preferably, the pixel definition material comprises black photoresist.

[0024] In one embodiment, forming a color filter layer on a side of the encapsulation layer away from the substrate includes:

[0025] forming a touch function layer on a side of the encapsulation layer away from the substrate;

[0026] forming the color filter layer on a side of the touch function layer away from the substrate;

[0027] Preferably, the orthographic projection of the touch function layer on the substrate is located within the orthographic projection of the black matrix on the substrate.

[0028] Based on the same inventive concept, the present application also provides a display panel, including:

[0029] substrate;

[0030] The pixel definition layer is arranged on one side of the substrate, and the pixel definition layer includes a plurality of pixel openings; the surface of the pixel definition layer away from the substrate includes a slope surface located at the pixel openings, and the slope surface is a smooth surface.

[0031] In one embodiment, the display panel further includes:

[0032] A plurality of light-emitting units are disposed on one side of the substrate, wherein at least a portion of the light-emitting units are located in the corresponding pixel openings;

[0033] An encapsulation layer, disposed on a side of the light-emitting unit away from the substrate;

[0034] A color filter layer is disposed on a side of the encapsulation layer away from the substrate, the color filter layer comprises a black matrix and a color resistance unit, the black matrix comprises a plurality of light-transmitting openings, and the color resistance unit is at least partially located in the light-transmitting openings;

[0035] Preferably, the surface of the pixel definition layer away from the substrate is a smooth surface;

[0036] Preferably, the roughness of the surface of the pixel definition layer away from the substrate is 3-10 nm;

[0037] Preferably, the pixel definition material comprises black photoresist;

[0038] Preferably, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the corresponding light-transmitting opening on the substrate;

[0039] Preferably, the light-emitting unit comprises a first electrode, a light-emitting layer, and a second electrode which are sequentially stacked in a direction away from the substrate, the first electrode is located between the substrate and the pixel definition layer, and the first electrode is at least partially exposed to the corresponding pixel opening;

[0040] Preferably, the encapsulation layer comprises a first inorganic encapsulation layer, an organic encapsulation layer and a second inorganic encapsulation layer which are sequentially stacked in a direction away from the substrate.

[0041] In one embodiment, the display panel further includes:

[0042] A touch function layer, disposed between the encapsulation layer and the color filter layer;

[0043] Preferably, the orthographic projection of the touch function layer on the substrate is located within the orthographic projection of the black matrix on the substrate;

[0044] Preferably, the touch function layer includes a first metal layer and a second metal layer which are sequentially stacked in a direction away from the substrate.

[0045] Based on the same inventive concept, the present application also provides a display device, which includes a display panel prepared by the display panel preparation method as described above, or a display panel as described above.

[0046] Compared with the prior art, the method for preparing a display panel provided in the present application cleans and removes the material of the pixel definition layer remaining in the pixel opening before curing the pixel definition layer, and utilizes the easy-to-remove property of the uncured pixel definition material to enhance the luminous efficiency of the display panel and improve the display quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] In order to more clearly illustrate the technical solutions in the present application or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0048] Figure 1 It is a structural schematic diagram of a display panel in the related art;

[0049] Figure 2 A flow chart of a method for preparing a display panel provided in one embodiment of the present application;

[0050] Figure 3 A schematic diagram of the structure of a display panel during the preparation process provided by an embodiment of the present application;

[0051] Figure 4 A schematic diagram of the structure of a display panel provided in one embodiment of the present application;

[0052] Figure 5 A schematic diagram of the structure of a display panel provided in another embodiment of the present application;

[0053] Figure 6 A schematic diagram of the structure of a display panel provided in another embodiment of the present application;

[0054] Figure 7 CV curves of R / G / B pixels of the present application and the comparative example.

[0055] Marking Description:

[0056] 100. Display panel; 1. Substrate; 2. Pixel definition layer; 20. Pixel opening; 21. Slope surface; 3. Light-emitting unit; 31. First electrode; 32. Light-emitting layer; 33. Second electrode; 4. Encapsulation layer; 41. First inorganic encapsulation layer; 42. Organic encapsulation layer; 43. Second inorganic encapsulation layer; 5. Color film layer; 51. Black matrix; 510. Light-transmitting opening; 52. Color resistance unit; 6. Touch function layer; 61. First metal layer; 62. Second metal layer. DETAILED DESCRIPTION

[0057] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0058] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should be the usual meanings understood by people with ordinary skills in the field to which the present application belongs. The "first", "second" and similar words used in the embodiments of the present application do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0059] In the OLED display industry, COE technology can reduce power consumption (about 30%) and reflectivity (about 6.5%). In order to reduce the reflectivity of the display, black photoresist is generally used as the pixel definition material. During the preparation process, O2plasma (oxygen plasma treatment) process is usually used to remove the photoresist residue in the pixel opening.

[0060] refer to Figure 1 As shown, in the related art, the display panel 100 includes a substrate 1 and a pixel definition layer 2, the pixel definition layer 2 includes a plurality of pixel openings 20, and the sidewalls of the pixel openings 20 are climbing surfaces 21. Usually, after the pixel definition layer 2 is cured, a plasma treatment is used to remove the residual material in the pixel openings 20. However, this process will damage the climbing surface 21, causing the roughness of the pixel definition layer 2 to increase, and the morphology to become porous and rough. Because the rough surface is more likely to absorb charges, the pixel definition layer is more likely to absorb parasitic capacitance in the subsequent process. During display, due to the influence of the parasitic capacitance, the afterimage level of the display panel decreases.

[0061] Based on this, the present application provides a method for preparing a display panel to solve the above problems, with specific reference to the following embodiments.

[0062] Reference Figure 2 , Figure 3 , Figure 4 As shown, an embodiment of the present application provides a method for manufacturing a display panel. The method for manufacturing a display panel 100 includes the following steps:

[0063] Step S10, providing a substrate 1;

[0064] Step S20, disposing a pixel definition layer 2 on one side of the substrate 1, and patterning the pixel definition layer 2 to form a plurality of pixel openings 20;

[0065] Step S30, performing a first cleaning operation on the pixel definition material remaining in the pixel opening 20;

[0066] Step S40 , after the first cleaning operation, the pixel definition layer 2 is cured.

[0067] In the method for preparing a display panel provided in an embodiment of the present application, before the pixel definition layer 2 is cured, the material of the pixel definition layer (hereinafter referred to as pixel definition material) remaining in the pixel opening 20 is cleaned and removed. Before the curing process, the pixel definition material in the pixel opening 20 is easily removed, and other impurities remaining in the pixel opening 20 can also be cleaned together to ensure the smooth progress of subsequent processes and reduce the influence of the residual substances in the pixel opening 20 on the luminous efficiency of the display panel. Therefore, the present application utilizes the characteristic of easy removal of uncured pixel definition material to improve the luminous efficiency of the display panel and the display quality.

[0068] Specifically, the pixel definition material can be photoresist, and the patterning process can be photolithography (PHO), and a pattern with a pixel opening 20 can be formed on the substrate 1. The pixel opening 20 has a bottom wall and a side wall, and the side wall is inclined relative to the bottom wall to form a climbing surface 21. The curing process can be baked (OVEN), and heat treatment can be performed to promote the curing of the photoresist, so that the chemical structure of the photoresist is more stable, improve its tolerance in subsequent processes, and prevent the photoresist from being deformed or damaged in other process steps, thereby ensuring the accuracy of the photolithographic pattern. In addition, during the photoresist coating process, a solvent is used to adjust the viscosity of the photoresist so as to facilitate uniform coating. The solvent can be volatilized by baking, and the adhesion between the photoresist and the substrate 1 is enhanced.

[0069] It should be noted that the cleaning operation of the pixel definition material remaining in the pixel opening 20 refers to cleaning the pixel opening 20 with a cleaning liquid or other cleaning medium to remove the pixel definition material remaining in the pixel opening 20. Of course, removal refers to the desired effect to be achieved, and the pixel definition material remaining in the pixel opening 20 may not be completely removed by the cleaning operation.

[0070] Furthermore, in one embodiment, in step S30 , a first cleaning operation is performed on the pixel definition material remaining in the pixel opening 20 , including: using deionized water to clean the pixel definition material remaining in the pixel opening 20 for the first cleaning operation.

[0071] Deionized water (DI water), also often referred to as pure water, has a high purity and contains almost no ionic impurities, which can effectively avoid the introduction of new contaminants during the cleaning process and ensure the cleanliness of the process. Before curing, deionized water can be used to remove at least part of the pixel definition material, such as photoresist, remaining in the pixel opening 20.

[0072] In one embodiment, in step S40, the pixel definition layer 2 is cured, and then the method for preparing the display panel further includes:

[0073] Step S50 , performing a second cleaning operation on the pixel definition material remaining in the pixel opening 20 .

[0074] Preferably, step S50 includes performing a second cleaning operation on the pixel definition material remaining in the pixel opening 20 using a stripping solution (STR solution).

[0075] Preferably, after the second cleaning operation, the roughness of the slope surface 21 located in the pixel opening 20 on the surface of the pixel definition layer 2 away from the substrate 1 is within a range of 3-10 nm.

[0076] Among them, after the pixel definition layer 2 is solidified, a secondary cleaning is performed, which can replace the original plasma treatment process to ensure the cleanliness of the pixel opening 20 and avoid the adverse effects of particle impurities on subsequent processes and product performance. Specifically, the use of stripping liquid for cleaning, on the one hand, can effectively clean the residual particles in the pixel opening 20, and has little effect on the solidified pixel definition layer 2 located outside the pixel opening 20. On the other hand, the STR solution can significantly reduce the surface roughness of the pixel definition layer, making the surface of the pixel definition layer smoother and flatter, reducing the risk of parasitic charge introduction due to increased roughness, improving the progress bar afterimage of the display panel, and thus improving the electrical performance of the display panel.

[0077] Among them, progress bar afterimage refers to the phenomenon that when the progress bar image changes on the display device, the pixel electrode is affected by factors such as parasitic capacitance and fails to quickly reach a stable state, resulting in the previous frame image remaining in the original position or other positions, affecting the user's accurate judgment of the progress and visual experience.

[0078] In one embodiment, the pixel definition material includes photoresist.

[0079] Preferably, in step S20, a pixel definition layer 2 is provided on one side of the substrate 1, and the pixel definition layer 2 is patterned, including: coating, exposing and developing the pixel definition material.

[0080] Among them, photoresist is a light-sensitive material whose properties can undergo chemical changes during light exposure, thereby achieving pattern transfer. The graphic processing in this embodiment is photolithography, and the photolithography process includes:

[0081] Coating: evenly coat the photoresist on the surface of substrate 1.

[0082] Exposure: Use light of a specific wavelength (such as ultraviolet light) to illuminate the photoresist through a mask. The mask has a pre-designed circuit pattern on it. The light shines through the transparent areas of the mask onto the photoresist, causing the photoresist to undergo a photochemical reaction in these areas.

[0083] Development: After exposure, the exposed area and the unexposed area of ​​the photoresist have different chemical properties. The unnecessary parts of the photoresist are removed by the developer, leaving a photoresist pattern that is the same as the mask pattern, for example, forming multiple pixel openings 20 in the pixel definition layer 2.

[0084] refer to Figure 5 As shown, in one embodiment, in step S40, the pixel definition layer 2 is cured, and then the method for preparing the display panel further includes:

[0085] Step S60, forming a plurality of light-emitting units 3, wherein at least a portion of the light-emitting units 3 are located in corresponding pixel openings 20;

[0086] Step S70, forming an encapsulation layer 4 on a side of the light-emitting unit 3 away from the substrate 1;

[0087] Step S80 , forming a color filter layer 5 on a side of the encapsulation layer 4 away from the substrate 1 , the color filter layer 5 comprising a black matrix 51 and a color resist unit 52 , the black matrix 51 comprising a plurality of light-transmitting openings 510 , and the color resist unit 52 being at least partially located in the light-transmitting openings 510 .

[0088] Preferably, the orthographic projection of the pixel opening 20 on the substrate 1 is located within the orthographic projection of the corresponding light-transmitting opening 510 on the substrate 1 .

[0089] Specifically, a black matrix 51 can be formed on the side of the encapsulation layer 4 away from the substrate 1, and then a color resist unit 52 is formed in the light-transmitting opening 510 of the black matrix 51. The color resist unit 52 acts as a color filter, which can filter the light emitted by the corresponding light-emitting unit 3, and then different color resist units 52 can be set as needed, so that the light emitted from the corresponding area of ​​each color resist unit 52 is a certain type of light. For example, a color resist unit 52 is set for only red light to pass, and the light emitted from the corresponding area of ​​the color resist unit 52 is red light. The black matrix 51 uses a light-absorbing material. When ambient light is incident on the display panel 100, the black matrix 51 can absorb external incident light to reduce the reflection intensity of the display panel to ambient light and improve the display performance.

[0090] Specifically, each pixel opening 20 on the pixel definition layer 2 defines a sub-pixel area, and a light-emitting unit 3 corresponding to a pixel opening 20 corresponds to a sub-pixel, and three types of sub-pixels, R, G, and B, are generally used to emit red light, green light, and blue light, respectively. In the thickness direction of the display panel 100, the light-transmitting opening 510 is arranged opposite to the pixel opening 20, so that the light emitted by the light-emitting unit 3 can be emitted through the corresponding light-transmitting opening 510.

[0091] Optionally, the light emitting units 3 correspond to the color resist units 52 one by one. Alternatively, adjacent light emitting units 3 emitting the same color share the same color resist unit 52 .

[0092] Preferably, the pixel definition material includes black photoresist, which is a light-absorbing material. When the light from the external environment passes through the color resist unit 52, the pixel definition layer 2 can be used to absorb the light that is not reflected or absorbed by the light-emitting unit 3, thereby reducing the reflected light and improving the contrast of the display screen of the display panel 100. In addition, the pixel definition layer 2, as a light blocking layer, can prevent light leakage between sub-pixels, ensure that each pixel emits light independently and accurately, and improve the sharpness of the image edge and the clarity of the text.

[0093] Specifically, the encapsulation layer 4 covers a plurality of light-emitting units 3, and the color filter layer 5 is located on the side of the encapsulation layer 4 away from the substrate 1. The light-emitting units 3 are sensitive to environments such as water vapor and oxygen, and the encapsulation layer 4 can block water vapor and air, thereby ensuring the performance reliability of the display panel 100. In addition, the color filter layer 5 does not have the requirement of isolating water vapor and oxygen, so it can be located on the side of the encapsulation layer 4 away from the substrate 1.

[0094] Specifically, the encapsulation layer 4 includes a stacked first inorganic encapsulation layer 41, an organic encapsulation layer 42, and a second inorganic encapsulation layer 43. The organic encapsulation layer 42 has a relatively large thickness and has a planarization function, and the first inorganic encapsulation layer 41 and the second inorganic encapsulation layer 43 have high compactness and can isolate water and oxygen.

[0095] refer to Figure 6 As shown, in one embodiment, step S80, forming a color filter layer 5 on a side of the encapsulation layer 4 away from the substrate 1, includes:

[0096] A touch function layer 6 is formed on a side of the encapsulation layer 4 away from the substrate 1;

[0097] A color filter layer 5 is formed on a side of the touch function layer 6 away from the substrate 1 .

[0098] Preferably, the orthographic projection of the touch function layer 6 on the substrate 1 is located within the orthographic projection of the black matrix 51 on the substrate 1 .

[0099] Specifically, the display panel 100 is integrated with a touch function, and can sense a user's touch operation through the touch function layer 6 , and convert the sensed touch operation into an electrical signal to be transmitted to the driving circuit on the substrate 1 .

[0100] Optionally, the touch function layer 6 includes a first metal layer 61 and a second metal layer 62 which are sequentially stacked in a direction away from the substrate 1 , and the touch function layer 6 may be a multi-layer structure.

[0101] In other embodiments, the touch function layer 6 may also be a single-layer structure.

[0102] The touch function layer 6 can be directly prepared on the encapsulation layer 4 to reduce the design thickness of the entire display panel. A protective layer, specifically an OC protective layer, can be provided on the side of the color filter layer 5 away from the substrate 1. The protective layer covers and protects the color filter layer 5.

[0103] In other embodiments, a buffer layer may also be disposed between the touch function layer 6 and the encapsulation layer 4 .

[0104] Reference Figure 4 As shown, another embodiment of the present application provides a display panel, the display panel 100 includes a substrate 1 and a pixel definition layer 2, the pixel definition layer 2 is arranged on one side of the substrate 1, and the pixel definition layer 2 includes a plurality of pixel openings 20. Among them, the surface of the pixel definition layer 2 away from the substrate 1 includes a climbing surface 21 located in the pixel opening 20, and the climbing surface 21 is a smooth surface. Among them, the smooth surface means that the surface roughness is less than a preset threshold.

[0105] The display panel 100 provided in this embodiment processes the slope surface 21 of the pixel definition layer 2 to form a smooth surface. By reducing the roughness, the parasitic capacitance can be reduced, the afterimage condition of the display panel can be improved, and the competitiveness of the product can be improved.

[0106] Reference Figure 5As shown, in one embodiment, the display panel 100 further includes a plurality of light-emitting units 3, an encapsulation layer 4 and a color filter layer 5. The plurality of light-emitting units 3 are disposed on one side of the substrate 1, and the light-emitting units 3 are at least partially located in the corresponding pixel openings 20. The encapsulation layer 4 is disposed on a side of the light-emitting unit 3 away from the substrate 1. The color filter layer 5 is disposed on a side of the encapsulation layer 4 away from the substrate 1, and the color filter layer 5 includes a black matrix 51 and a color resist unit 52. The black matrix 51 includes a plurality of light-transmitting openings 510, and the color resist unit 52 is at least partially located in the light-transmitting openings 510.

[0107] Specifically, the encapsulation layer 4 covers a plurality of light-emitting units 3, and the color filter layer 5 is located on the side of the encapsulation layer 4 away from the substrate 1. The light-emitting unit 3 is very sensitive to environments such as water vapor and oxygen, and the encapsulation layer 4 can block water vapor and air, thereby ensuring the performance reliability of the display panel 100. In addition, the color filter layer 5 does not have the requirement of isolating water vapor and oxygen, so it can be located on the side of the encapsulation layer 4 away from the substrate 1.

[0108] Preferably, the surface of the pixel definition layer 2 away from the substrate 1 is a smooth surface.

[0109] Preferably, the roughness of the surface of the pixel definition layer 2 away from the substrate 1 is within a range of 3-10 nm. For example, the roughness may be 3 nm, 4 nm, 5 nm, 6 nm, 7 nm, 8 nm, 9 nm or 10 nm.

[0110] Preferably, the pixel definition material includes black photoresist, which is a light-absorbing material. When the light from the external environment passes through the color resist unit 52, the pixel definition layer 2 can be used to absorb the light that is not reflected or absorbed by the light-emitting unit 3, thereby reducing the reflected light and improving the contrast of the display screen of the display panel 100. In addition, the pixel definition layer 2, as a light blocking layer, can prevent light leakage between sub-pixels, ensure that each pixel emits light independently and accurately, and improve the sharpness of the image edge and the clarity of the text.

[0111] Preferably, the orthographic projection of the pixel opening 20 on the substrate 1 is located within the orthographic projection of the corresponding light-transmitting opening 510 on the substrate 1 .

[0112] Preferably, the light-emitting unit 3 includes a first electrode 31 , a light-emitting layer 32 and a second electrode 33 stacked in sequence in a direction away from the substrate 1 . The first electrode 31 is located between the substrate 1 and the pixel definition layer 2 . The first electrode 31 is at least partially exposed to the corresponding pixel opening 20 .

[0113] Preferably, the encapsulation layer 4 includes a first inorganic encapsulation layer 41 , an organic encapsulation layer 42 , and a second inorganic encapsulation layer 43 which are sequentially stacked in a direction away from the substrate 1 .

[0114] Further, refer to Figure 6As shown, in one embodiment, the display panel 100 further includes a touch function layer 6 , and the touch function layer 6 is disposed between the encapsulation layer 4 and the color filter layer 5 .

[0115] Preferably, the orthographic projection of the touch function layer 6 on the substrate 1 is located within the orthographic projection of the black matrix 51 on the substrate 1 .

[0116] Preferably, the touch function layer 6 includes a first metal layer 61 and a second metal layer 62 which are sequentially stacked in a direction away from the substrate 1 .

[0117] Another embodiment of the present application provides a display device, which may include the display panel 100 in any of the above embodiments. For example, the display device may be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, etc.

[0118] The display device provided in this embodiment has a display panel 100 in which the slope surface 21 of the pixel definition layer 2 is processed to form a smooth surface. By reducing the roughness, the parasitic capacitance can be reduced, the afterimage condition of the display panel can be improved, and the competitiveness of the product can be improved.

[0119] The following experiments verify the differences in various indicators between the present application scheme and the original scheme of the comparative example. For details, please refer to Table 1 and Figure 7 . The process flow of the comparative example is: patterning → curing → ashing. The process flow of the present application is: patterning → cleaning → curing → wet stripping. In Table 1, JND is just noticeable difference, which is a unit used to measure the degree of afterimage of the progress bar. RMS is root mean square, which is a parameter to describe surface roughness. Figure 7 The CV curve in is a capacitance-voltage curve, where the vertical axis is the capacitance value and the horizontal axis is the voltage value, which is used to characterize the relationship between the capacitance characteristics and voltage of a material or device; Figure 7 The three groups of curves in are capacitance-voltage contrast curves of R pixel, G pixel and B pixel respectively. R pixel, G pixel and B pixel correspond to light emitting unit 3 whose light emitting colors are red, green and blue respectively.

[0120] Table 1

[0121]

[0122] Specifically, the roughness change of the comparative example is that after the pixel definition layer is ashed, a nanoporous structure appears, and the roughness is significantly increased, from 6.26 to 13.5, and the RMS value is 11.2; the roughness of the present application is that after the pixel definition layer is wet-stripped, the roughness remains basically unchanged, and the RMS value is 5.23. Therefore, compared with the comparative example, the present application can reduce the roughness of the pixel definition layer.

[0123] In addition, the progress bar afterimage of the comparative example is 13.4 JND at T0 seconds and 5.6 JND at T10 seconds; the progress bar afterimage of the present application is 1.54 JND at T0 seconds and 1.05 JND at T10 seconds, which significantly improves the afterimage situation and enhances the product competitiveness. Therefore, compared with the comparative example, the present application can improve the low grayscale afterimage situation.

[0124] Finally, from Figure 7 From the CV curve of the R / G / B pixels in FIG, the capacitance value of the comparative example is relatively large, while the capacitance value of the solution of the present application is significantly reduced, which can reduce the parasitic capacitance.

[0125] Although the present application has been described in conjunction with specific embodiments thereof, many alternatives, modifications and variations of these embodiments will be apparent to those skilled in the art in light of the foregoing description.

[0126] It should be noted that the above describes some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0127] The embodiments of the present application are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the scope of protection of the present application.

Claims

1. A method for preparing a display panel, characterized in that: include: providing a substrate; A pixel definition layer is disposed on one side of the substrate, and the pixel definition layer is patterned to form a plurality of pixel openings; performing a first cleaning operation on the pixel definition material remaining in the pixel opening; After the first cleaning operation, the pixel definition layer is cured.

2. The method for preparing a display panel according to claim 1, wherein: The first cleaning operation of the pixel definition material remaining in the pixel opening includes: The pixel definition material remaining in the pixel opening is first cleaned using deionized water.

3. The method for preparing a display panel according to claim 1, wherein: After the pixel definition layer is cured, the preparation method includes: performing a second cleaning operation on the pixel definition material remaining in the pixel opening; Preferably, a second cleaning operation is performed on the pixel definition material remaining in the pixel opening using a stripping liquid; Preferably, after the second cleaning operation, the roughness of the slope surface of the pixel definition layer located at the pixel opening is within a range of 3-10 nm.

4. The method for preparing a display panel according to claim 1, wherein: The pixel definition material includes photoresist; Preferably, the step of providing a pixel definition layer on one side of the substrate and performing a patterning process on the pixel definition layer comprises: The photoresist is coated, exposed and developed.

5. The method for preparing a display panel according to claim 1, wherein: After the pixel definition layer is cured, the preparation method includes: forming a plurality of light-emitting units, wherein at least a portion of the light-emitting units are located at the corresponding pixel openings; forming an encapsulation layer on a side of the light-emitting unit away from the substrate; A color filter layer is formed on a side of the encapsulation layer away from the substrate, wherein the color filter layer includes a black matrix and a color resistance unit, the black matrix includes a plurality of light-transmitting openings, and the color resistance unit is at least partially located in the light-transmitting openings; Preferably, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the corresponding light-transmitting opening on the substrate; Preferably, the pixel definition material comprises black photoresist.

6. The method for preparing a display panel according to claim 5, wherein: The step of forming a color film layer on a side of the encapsulation layer away from the substrate comprises: forming a touch function layer on a side of the encapsulation layer away from the substrate; forming the color filter layer on a side of the touch function layer away from the substrate; Preferably, the orthographic projection of the touch function layer on the substrate is located within the orthographic projection of the black matrix on the substrate.

7. A display panel, characterized in that: include: substrate; A pixel definition layer is disposed on one side of the substrate, and the pixel definition layer includes a plurality of pixel openings; The surface of the pixel definition layer away from the substrate includes a slope surface located at the pixel opening, and the slope surface is a smooth surface.

8. The display panel according to claim 7, wherein: The display panel further includes: A plurality of light-emitting units are disposed on one side of the substrate, wherein at least a portion of the light-emitting units are located in the corresponding pixel openings; An encapsulation layer, disposed on a side of the light-emitting unit away from the substrate; A color filter layer is disposed on a side of the encapsulation layer away from the substrate, the color filter layer comprises a black matrix and a color resistance unit, the black matrix comprises a plurality of light-transmitting openings, and the color resistance unit is at least partially located in the light-transmitting openings; Preferably, the surface of the pixel definition layer away from the substrate is a smooth surface; Preferably, the roughness of the surface of the pixel definition layer away from the substrate is 3-10 nm; Preferably, the pixel definition material comprises black photoresist; Preferably, the orthographic projection of the pixel opening on the substrate is located within the orthographic projection of the corresponding light-transmitting opening on the substrate; Preferably, the light-emitting unit comprises a first electrode, a light-emitting layer, and a second electrode which are sequentially stacked in a direction away from the substrate, the first electrode is located between the substrate and the pixel definition layer, and the first electrode is at least partially exposed to the corresponding pixel opening; Preferably, the encapsulation layer comprises a first inorganic encapsulation layer, an organic encapsulation layer and a second inorganic encapsulation layer which are sequentially stacked in a direction away from the substrate.

9. The display panel according to claim 8, wherein: The display panel further includes: A touch function layer, disposed between the encapsulation layer and the color filter layer; Preferably, the orthographic projection of the touch function layer on the substrate is located within the orthographic projection of the black matrix on the substrate; Preferably, the touch function layer includes a first metal layer and a second metal layer which are sequentially stacked in a direction away from the substrate.

10. A display device, characterized in that: It comprises a display panel prepared by the display panel preparation method according to any one of claims 1 to 6, or a display panel according to any one of claims 7 to 9.

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