A perovskite solar cell and a preparation method thereof

Abstract

The present invention relates to the technical field of photovoltaic cells, and in particular, to a perovskite cell and a preparation method thereof. A perovskite cell includes a base layer, a composite functional layer, an electrode layer, an interface protection layer, a groove protection layer, and a P3 groove; the interface protection layer includes an organic polymer; the groove protection layer includes a first protection layer located on a partial side wall of the P3 groove, and the first protection layer includes a reaction product of carbonyl sulfide and an organic polymer. By providing the interface protection layer and the groove protection layer, the perovskite cell of the present invention can reduce the influence of laser heat, and dust particles generated during the processing are not easily adhered to the surface of the device; it can effectively prevent moisture in the environment from invading the device structure, thereby improving the overall stability of the battery.

Description

Technical Field

[0001] The present invention relates to the technical field of photovoltaic cells, and in particular to a perovskite cell and a preparation method thereof. Background Art

[0002] Photovoltaic power generation has the advantages of being easy to use, environmentally friendly, and having a long lifespan. It is the most dynamic application mode of energy in the future. Perovskite solar cells are photovoltaic cells that use perovskite-type organic metal halide semiconductors as light-absorbing materials. Compared with crystalline silicon and other thin-film batteries, perovskite solar cells have higher efficiency. Perovskite is a synthetic material with high defect tolerance and less thermal recombination efficiency loss, so the carrier lifetime is high. The band gap can be adjusted according to different formulas, which can improve the spectrum utilization and achieve higher photoelectric conversion efficiency. Perovskite materials have good light absorption properties, and the film layer can be made very thin. Its material properties provide rich development space for the appearance of the battery, such as color adjustment, light transmission, flexibility, etc., while also ensuring a certain power generation efficiency. Therefore, it has broad development space in application scenarios such as photovoltaic vehicle integration, photovoltaic building integration, wearable devices, outdoor power stations, and indoor photovoltaics.

[0003] In terms of processing methods, lasers are indispensable in the preparation process of perovskite cells because of their advantages of non-contact processing, regional selectivity, high processing accuracy, strong adjustability, improved material utilization, and effective control of thermal effect zones. However, with the continuous optimization and superposition of the functional layers of perovskites and the introduction of various new material layers, lasers may produce adverse process effects such as obvious heat-affected zones, craters, bottom debris burrs, and film stratification when acting on the film layer, especially the P3 process, whose main function is to isolate the sub-cells separately. If there are many defects such as collapsed edges and stratification around the P3 wire slots, it is easy to cause overlap to form leakage risk points, reduce the parallel resistance of the battery, and film stratification is easy to cause ion migration, water and oxygen diffusion, and other problems, and also reduce the stability of the components.

[0004] The existing process optimization of P3 line grooves is to pre-score the edges of the P3 lines by setting different laser process parameters to form a protective line method, which improves the flatness of the line grooves and reduces the thermal impact on the edges on both sides. However, this involves multiple laser processing, which affects the process cycle. It is not suitable for large-area perovskite battery production processes. Some optimizations require combining the functional layer and the electrode layer under specific thickness and material conditions to optimize the laser process to achieve a line morphology without edge collapse, which makes the overall process less compatible and is not conducive to the development and introduction of new functional layer materials.

[0005] In view of this, the present invention is proposed. Summary of the invention

[0006] An object of the present invention is to provide a perovskite solar cell to solve the above technical problems. By providing an interface protection layer and a groove protection layer, the perovskite solar cell of the present invention can reduce the laser thermal effect, dust particles generated during the processing are not easily adhered to the device surface, and the edge collapse and lap morphology of the wire grooves can be effectively reduced, thereby effectively improving the overall stability of the battery.

[0007] Another object of the present invention is to provide a method for manufacturing the above perovskite solar cell. This method is applicable to the production process of large-area perovskite solar cells, does not affect the production rhythm, has strong compatibility with the development and introduction of new functional layer materials, and can obtain a battery with excellent stable performance.

[0008] In order to achieve the above objects of the present invention, the following technical solutions are specifically adopted:

[0009] A perovskite solar cell includes a base layer, a composite functional layer, an electrode layer, an interface protection layer, a groove protection layer, and a P3 groove; the composite functional layer and the electrode layer are arranged between the base layer and the interface protection layer, and the interface protection layer is located on the surface of the electrode layer, and the composite functional layer is located on the surface of the base layer; the P3 groove sequentially penetrates through the interface protection layer, the electrode layer, and the composite functional layer;

[0010] The interface protection layer includes an organic polymer;

[0011] The groove protection layer includes a first protection layer located on part of the side wall of the P3 groove, and the first protection layer includes a reaction product of carbonyl sulfide and the organic polymer.

[0012] In some embodiments, the organic polymer includes a cross-linked product of a polymer material, and the polymer material includes at least one of polyurethane acrylate, epoxy acrylate, acrylate, polyester acrylate, polyether acrylate, polyacrylic acid, and polyol compounds.

[0013] In some embodiments, the groove protection layer further includes a second protection layer, and the second protection layer is located on the surface of the first protection layer and the surface of the P3 groove; the second protection layer includes a fluorocarbon polymer.

[0014] In some embodiments, the composite functional layer includes a first charge transport layer, a perovskite layer, and a second charge transport layer that are sequentially stacked. The first charge transport layer is in contact with the base layer, and the second charge transport layer is in contact with the electrode layer; the perovskite solar cell further includes a P2 groove, and the P2 groove sequentially penetrates through the second charge transport layer, the perovskite layer, and the first charge transport layer; the electrode layer has an extension section that penetrates through the P2 groove and is in contact with the base layer; the base layer is provided with a P1 groove with an opening facing the first charge transport layer.

[0015] The preparation method of the perovskite battery as described above includes the following steps:

[0016] A composite functional layer and an electrode layer are sequentially prepared on the base layer.

[0017] A polymer material solution is coated on the surface of the electrode layer and cured to form an organic protective layer.

[0018] A P3 groove is made through the organic protective layer, the electrode layer, and the composite functional layer.

[0019] The organic protective layer near the P3 groove is etched by plasma to form an interface protective layer; carbonyl sulfide is introduced during the plasma etching process, and a first protective layer is formed on part of the side walls of the P3 groove to obtain a groove protective layer.

[0020] In some embodiments, the polymer material solution includes a polymer material and an organic solvent.

[0021] In some embodiments, the thickness of the organic protective layer is 50 - 150 nm. The thickness of the organic protective layer is preferably 50 - 120 nm.

[0022] In some embodiments, the plasma etching includes a dilution gas and an etching gas, and the flow rate ratio of the dilution gas to the etching gas is (1 - 2):(3 - 5).

[0023] In some embodiments, the flow rate ratio of the carbonyl sulfide to the dilution gas is 1:(3 - 5).

[0024] In some embodiments, the radio frequency power of the plasma etching is 500 - 700 W, and the radio frequency is 50 - 60 MHz.

[0025] In some embodiments, after the plasma etching for 60 - 150 s, the carbonyl sulfide is introduced, and the treatment time is 100 - 150 s.

[0026] In some embodiments, for the preparation of the groove protective layer, after obtaining the first protective layer, a fluorinated cycloalkane is further introduced to form a second protective layer on the surface of the first protective layer and the P3 groove.

[0027] In some embodiments, the fluorinated cycloalkane includes C4F8, and the flow rate ratio of the fluorinated cycloalkane to the dilution gas is 1:(3 - 5).

[0028] In some embodiments, after stopping the introduction of the etching gas and the carbonyl sulfide, the fluorinated cycloalkane is introduced under the condition that the radio frequency power is 150 - 250 W.

[0029] In some embodiments, the treatment time using the fluorinated cycloalkane is 100 to 150 s.

[0030] In some embodiments, the preparation of the composite functional layer specifically includes:

[0031] Fabricate a P1 groove on the surface of the base layer, and sequentially prepare a first charge transport layer, a perovskite layer, and a second charge transport layer on one side surface of the base layer having the P1 groove; fabricate a P2 groove that sequentially penetrates the second charge transport layer, the perovskite layer, and the first charge transport layer; and prepare an electrode layer on the surface of the second charge transport layer and within the P2 groove.

[0032] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0033] (1) In the perovskite battery of the present invention, the interface protection layer can reduce the influence of the thermal effect in P3 laser scribing, and the dust generated during processing is not easily accumulated on the surface of the device; the groove protection layer has a double-layer protection layer, with excellent chemical stability and hydrophobicity, which can effectively prevent water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery.

[0034] (2) In the preparation method of the perovskite battery of the present invention, an organic protection layer is prepared on the surface of the electrode layer, which can reduce the influence of the thermal effect in P3 laser scribing, and the dust generated during processing is not easily accumulated on the surface of the device, effectively reducing the edge collapse and lap morphology of the wire groove; after the P3 process, plasma etching is used to relatively flatten the protection layer at the edge of the wire groove, and carbonyl sulfide treatment is performed to form a first protection layer on a part of the side wall of the P3 groove; then a passivation process is carried out, and the fluorinated cycloalkane gas will generate a (CF2)n long-chain polymer. This fluorocarbon polymer has excellent chemical stability and hydrophobicity and can be deposited on the side wall and bottom of the groove, effectively preventing water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery. This method is applicable to the production process of large-area perovskite batteries, does not affect the production rhythm, and has strong compatibility with the development and introduction of new functional layer materials. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following will briefly introduce the drawings required for use in the description of the specific embodiments or the prior art. Obviously, the following drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0036] Figure 1 It is a schematic structural diagram of the perovskite battery of the present invention.

[0037] Reference numerals:

[0038] 1 - Base layer, 2 - Composite functional layer, 201 - First charge transport layer, 202 - Perovskite layer, 203 - Second charge transport layer, 3 - Electrode layer, 4 - Interface protection layer, 5 - Groove protection layer, 6 - P1 groove, 7 - P2 groove, 8 - P3 groove. Detailed implementation mode

[0039] The implementation scheme of the present invention will be described in detail below in conjunction with the embodiments. However, those skilled in the art will understand that the following embodiments are only used to illustrate the present invention and should not be regarded as limiting the scope of the present invention. For those not specified in the embodiments, they are carried out according to the conventional conditions or the conditions recommended by the manufacturer. For the reagents or instruments not specified by the manufacturer, they are all conventional products that can be obtained through commercial purchase.

[0040] According to one aspect of the present invention, the present invention relates to a perovskite solar cell, comprising a base layer, a composite functional layer, an electrode layer, an interface protection layer, a groove protection layer and a P3 groove; the composite functional layer and the electrode layer are between the base layer and the interface protection layer, and the interface protection layer is located on the surface of the electrode layer, and the composite functional layer is located on the surface of the base layer; the P3 groove sequentially penetrates through the interface protection layer, the electrode layer and the composite functional layer; the interface protection layer comprises an organic polymer, and the groove protection layer comprises a first protection layer located on a part of the side wall of the P3 groove, and the first protection layer comprises a reaction product of carbonyl sulfide (COS) and the organic polymer.

[0041] In the perovskite solar cell of the present invention, the interface protection layer can reduce the influence of the thermal effect in P3 laser scribing, and the dust generated during processing is not easily accumulated on the surface of the device, effectively reducing the edge collapse and lap morphology of the wire groove; the plasma etching area is relatively flat; the groove protection layer has excellent chemical stability and hydrophobicity, which can effectively prevent water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery.

[0042] In some embodiments, the organic polymer comprises a cross-linked product of a polymer material, and the polymer material comprises at least one of polyurethane acrylate, epoxy acrylate, acrylate, polyester acrylate, polyether acrylate, polyacrylic acid and polyol compound. For example, a combination of polyurethane acrylate and epoxy acrylate, a combination of polyester acrylate and polyether acrylate, a combination of polyester acrylate, polyether acrylate and polyol compound, etc.

[0043] In some embodiments, the groove protection layer further comprises a second protection layer, and the second protection layer is located on the surface of the first protection layer and the surface of the P3 groove; the second protection layer comprises a fluorocarbon polymer. The fluorocarbon polymer is a (CF2)n long-chain polymer. The fluorocarbon polymer has excellent chemical stability and hydrophobicity, which can effectively prevent water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery.

[0044] In some embodiments, the thickness of the interface protection layer is 20 - 100 nm, such as 20 nm, 30 nm, 40 nm, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm or 100 nm.

[0045] In some embodiments, the thickness of the groove protection layer is 1 - 10 nm, such as 1 nm, 2 nm, 3 nm, 4 nm, 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, etc.

[0046] In some embodiments, the composite functional layer includes a first charge transport layer, a perovskite layer, and a second charge transport layer that are sequentially stacked. The first charge transport layer is in contact with the base layer, and the second charge transport layer is in contact with the electrode layer. The perovskite cell further includes a P2 groove that sequentially penetrates the second charge transport layer, the perovskite layer, and the first charge transport layer. The electrode layer has an extension section that penetrates through the P2 groove and is in contact with the base layer; the base layer is provided with a P1 groove with an opening facing the first charge transport layer.

[0047] In some embodiments, the base layer includes conductive glass, which can be one of ITO or FTO. The thickness of the base layer is 100 - 400 nm.

[0048] In some embodiments, the first charge transport layer is a hole transport layer with a thickness of 15 - 25 nm, and the material includes polymer materials, inorganic oxide materials, and metal-organic framework materials; the inorganic oxides include at least one of nickel oxide, titanium oxide, zinc oxide, and scandium oxide. The second charge transport layer is an electron transport layer, including at least one of inorganic materials (such as titanium dioxide, zinc oxide, nitrides) and organic materials (such as fullerenes and their derivatives), and the thickness of the second charge transport layer is 40 - 80 nm.

[0049] In some embodiments, the thickness of the perovskite layer is 400 - 850 nm.

[0050] In some embodiments, the electrode layer includes one or a combination of Cu, Mo, Ni, and Ag. The thickness of the electrode layer is 50 - 100 nm.

[0051] According to another aspect of the present invention, the present invention also relates to a method for preparing the above perovskite cell, including the following steps:

[0052] The composite functional layer and the electrode layer are sequentially prepared on the base layer. A polymer material solution is coated on the surface of the electrode layer, and after curing, an organic protective layer is formed. A P3 groove is made to penetrate through the organic protective layer, the electrode layer, and the composite functional layer. The organic protective layer near the P3 groove is subjected to plasma etching, and a plasma etching region is formed on the organic protective layer near the P3 groove to form an interface protective layer; carbonyl sulfide is introduced during the plasma etching process, and a first protective layer is formed on a part of the side wall of the P3 groove to obtain a groove protective layer.

[0053] In the preparation method of the perovskite battery of the present invention, an organic protective layer is prepared on the surface of the electrode layer, which can reduce the influence of the thermal effect in P3 laser scribing, and the dust generated during processing is not easily accumulated on the surface of the device, effectively reducing the edge collapse and lap morphology of the wire groove. The reason is that the protective layer helps to cool during laser processing, the protective layer uniformly diffuses to the entire surface of the workpiece, and the surfactant components and organic solvents in the material can decompose the substances remaining on the surface of the device into fine particles or chemical reactions and dissolve them in the organic cleaning agent solution to achieve the effect of surface cleaning; after the P3 process, plasma etching is used to relatively flatten the protective layer at the edge of the wire groove, and carbonyl sulfide treatment is used to form a groove protective layer with a first protective layer on a part of the side wall of the P3 groove, which can prevent water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery. This method is applicable to the production process of large-area perovskite batteries, does not affect the production rhythm, and has strong compatibility with the development and introduction of new functional layer materials.

[0054] In some embodiments, the polymer material solution includes a polymer material and an organic solvent. The organic solvent includes ethers and esters, such as ethylene glycol ether and butyl acetate. In some embodiments, the coating can be performed by blade coating or spraying.

[0055] In some embodiments, the thickness of the organic protective layer is 50 - 150 nm, such as 50 nm, 80 nm, 100 nm, 129 nm, or 150 nm, etc. The thickness of the organic protective layer is preferably 50 - 120 nm.

[0056] In some embodiments, the curing temperature is 100 - 130 °C, such as 100 °C, 110 °C, 120 °C, 130 °C, etc. The curing time is 1 - 5 min, such as 1 min, 2 min, 3 min, 5 min, etc.

[0057] In some embodiments, plasma etching includes a dilution gas and an etching gas. The flow rate ratio of the dilution gas to the etching gas is (1 to 2):(3 to 5), such as 1:3, 1.5:4, 2:5, etc. The dilution gas includes a protective gas, such as Ar or N2. The etching gas includes CO2. Plasma etching includes that the dilution gas and the etching gas have an appropriate volume ratio to ensure the etching effect. The gases generated by the etching reaction of the organic protective layer mainly include H2, NO2, SO2, and CO2.

[0058] In some embodiments, the flow rate ratio of carbonyl sulfide to the dilution gas is 1:(3 to 5), such as 1:3, 1:4, or 1:5, etc. Carbonyl sulfide and the dilution gas have an appropriate flow rate ratio to ensure that carbonyl sulfide forms a stable chemical bond with the carbon atoms in the organic protective layer, and then a first protective layer is formed on the side walls of part of the P3 groove.

[0059] In some embodiments, the RF power of plasma etching is 500 to 700 W, such as 500 W, 550 W, 600 W, 650 W, 700 W, etc. The RF frequency is 50 to 60 MHz, such as 50 MHz, 55 MHz, 60 MHz, etc. Plasma etching uses an appropriate RF power and frequency to ensure the plasma etching effect.

[0060] In some embodiments, after plasma etching for 60 to 150 s (such as 60 s, 70 s, 80 s, 90 s, 100 s, 110 s, 120 s, 150 s, etc.), carbonyl sulfide is introduced, and the treatment time is 100 to 150 s (such as 100 s, 110 s, 120 s, 130 s, 140 s, 150 s, etc.).

[0061] In some embodiments, the preparation of the above-mentioned groove protective layer further includes: after obtaining the first protective layer, perfluorocycloalkane is introduced to form a second protective layer on the surface of the first protective layer and the P3 groove. Perfluorocycloalkane will generate a (CF2)n long-chain polymer, which has excellent chemical stability and hydrophobicity, can be deposited on the side walls and bottom of the groove, can effectively prevent water vapor in the environment from invading the inside of the device, and can improve the overall stability of the battery.

[0062] In some embodiments, the perfluorocycloalkane includes C4F8, and the flow rate ratio of the perfluorocycloalkane to the dilution gas is 1:(3 to 5), such as 1:3, 1:4, 1:5, etc. The perfluorocycloalkane and the dilution gas have an appropriate flow rate ratio to ensure the formation of a uniform and stable fluorocarbon polymer.

[0063] In some embodiments, after stopping the supply of the etching gas and carbonyl sulfide, perfluorocycloalkane is introduced under the condition that the RF power is 150 to 250 W (such as 150 W, 200 W, or 250 W).

[0064] In some embodiments, the treatment time using fluorocycloalkanes is 100 to 150 s, such as 100 s, 120 s, 130 s, 150 s, etc.

[0065] In some embodiments, the preparation of the composite functional layer specifically includes: making P1 grooves on the surface of the base layer, and then washing and drying; sequentially preparing a first charge transport layer, a perovskite layer, and a second charge transport layer on one surface of the base layer with P1 grooves. The first charge transport layer and the second charge transport layer respectively adopt a deposition method. The preparation of the perovskite layer: coating the precursor solution of the perovskite layer on the surface of the first charge transport layer, and then annealing at 100 to 140 °C for 5 to 30 min, and cooling to obtain the perovskite layer. Making P2 grooves sequentially penetrating through the second charge transport layer, the perovskite layer, and the first charge transport layer; preparing an electrode layer on the surface of the second charge transport layer and in the P2 grooves, and the electrode layer can adopt a sputtering method.

[0066] In some embodiments, it further includes: performing P4 scribing after the groove protection layer is prepared.

[0067] The following further explains with specific examples and comparative examples.

[0068] Example 1

[0069] A perovskite solar cell, as Figure 1 shown, includes a base layer 1, a composite functional layer 2, an electrode layer 3, an interface protection layer 4, a groove protection layer 5, P1 grooves 6, P2 grooves 7, and P3 grooves 8; a composite functional layer 2 and an electrode layer 3 are provided between the base layer 1 and the interface protection layer 4, and the interface protection layer 4 is located on the surface of the electrode layer 3, and the composite functional layer 2 is located on the surface of the base layer 1. The base layer 1 is provided with P1 grooves 6 with an opening facing the first charge transport layer 201. The composite functional layer 2 includes a first charge transport layer 201, a perovskite layer 202, and a second charge transport layer 203 which are sequentially stacked. The first charge transport layer 201 is in contact with the base layer 1, and the second charge transport layer 203 is in contact with the electrode layer 3. The P2 grooves 7 sequentially penetrate through the second charge transport layer 203, the perovskite layer 202, and the first charge transport layer 201. The electrode layer 3 has an extension section that penetrates through the P2 grooves 7 and is in contact with the base layer 1. The P3 grooves 8 sequentially penetrate through the interface protection layer 4, the electrode layer 3, and the composite functional layer 2; the interface protection layer 4 includes an organic polymer, and a plasma etching area is provided on the interface protection layer 4 close to the P3 grooves 8; the groove protection layer 5 includes a first protection layer located on part of the side walls of the P3 grooves 8, and a second protection layer located on the surface of the first protection layer and the surface of the P3 grooves 8. The first protection layer includes a reaction product of carbonyl sulfide and an organic polymer; the second protection layer includes a fluorocarbon polymer.

[0070] The preparation method of the perovskite solar cell in this example includes the following steps:

[0071] (1) Laser P1 lines were scribed on the surface of the base layer 1 (ITO) with a size of 1.2m*2m, and the surface was cleaned with pure water and dried. The thickness of the base layer 1 was 400nm.

[0072] (2) Preparing a composite functional layer 2 on the base layer 1 in sequence, including:

[0073] Nickel oxide is deposited on the surface of the base layer 1 by PVD to obtain a first charge transport layer 201 (hole transport layer) with a thickness of 20 nm.

[0074] Methylammonium chloride, formamidine iodide and lead iodide powders in a molar ratio of 1:10.5:16 are dissolved in a DMF (N,N-dimethylformamide) solvent, and the mixture is stirred and mixed to obtain a precursor solution. The precursor solution is spin-coated on the surface of the first charge transport layer 201, heated to 130°C, maintained for 10 minutes, and naturally cooled to room temperature to obtain a perovskite layer 202. The thickness of the perovskite layer 202 is 550 nm.

[0075] A second charge transport layer 203 is prepared on the surface of the perovskite layer 202 . The material of the second charge transport layer 203 is C60, and the thickness is 60 nm.

[0076] (3) A laser P2 scribing process is performed to produce a P2 groove 7 that sequentially penetrates the second charge transport layer 203, the perovskite layer 202, and the first charge transport layer 201, thereby forming a series of grooves.

[0077] (4) A metal electrode made of Cu is sputtered to form an electrode layer 3 on the surface of the second charge transport layer 203 and in the P2 groove 7. The thickness of the electrode layer 3 is 70 nm.

[0078] (5) Spraying a polymer material solution on the surface of the electrode layer 3, the polymer material solution including polyurethane acrylate and glycol ether, heating and curing at 120°C for 3 minutes to form an organic protective layer with a thickness of 50 nm.

[0079] (6) Performing a laser P3 line scribing process to produce a P3 groove 8 that penetrates the organic protective layer, the electrode layer 3 and the composite functional layer 2 to form a partition line groove.

[0080] (7) Place the sample after preparing the P3 groove 8 into a plasma device, introduce the dilution gas Ar, and introduce the etching gas CO2. The flow ratio of the dilution gas to the etching gas is 1:3, the radio frequency power is 600 W, the frequency is 55 MHz, and the processing time is 120 s, so that the organic protective layer undergoes a certain etching reaction to generate gas; at this time, introduce the COS gas, and the flow ratio of the COS gas to the dilution gas is 1:4, and the processing time is 120 s, so that it forms a stable chemical bond with the C atoms in the organic matter, thereby attaching to the side wall of the P3 groove 8 to form the first protective layer; then adjust the radio frequency power to 200 W, stop introducing the CO2 and COS gases, introduce the C4F8 gas, and the flow ratio of the C4F8 gas to the dilution gas is 1:4, and the processing time is 120 s, so that the C4F8 gas is ionized to generate an appropriate amount of (CF2)n long-chain polymer, which further attaches to the side wall and bottom of the wire groove to form the second protective layer, and obtain the groove protective layer 5.

[0081] (8) Then perform the P4 process to obtain the perovskite solar cell.

[0082] Example 2

[0083] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0084] The polymer material is polyester acrylate.

[0085] Example 3

[0086] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0087] The polymer material is epoxy acrylate and polyether acrylate.

[0088] Example 4

[0089] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0090] The flow ratio of the dilution gas to the etching gas is 2:5, and the processing time is 100 s; the flow ratio of the COS gas to the dilution gas is 1:3, and the processing time is 100 s.

[0091] Example 5

[0092] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0093] The flow ratio of the dilution gas to the etching gas is 2:5, and the processing time is 150 s; the flow ratio of the COS gas to the dilution gas is 1:5, and the processing time is 100 s.

[0094] Example 6

[0095] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0096] During the plasma etching process, the RF power is 700 W and the frequency is 60 MHz.

[0097] Example 7

[0098] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0099] The flow rate ratio of C4F8 gas to the dilution gas is 1:3.

[0100] Example 8

[0101] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0102] The flow rate ratio of C4F8 gas to the dilution gas is 1:5.

[0103] Comparative Example 1

[0104] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0105] The preparation of the groove protective layer 5 is not carried out.

[0106] Comparative Example 2

[0107] A method for preparing a perovskite solar cell, which is different from Example 1 in that:

[0108] The step of coating the polymer material solution on the surface of the electrode layer is not carried out, and the P3 scribing is directly completed.

[0109] Experimental Example

[0110] The perovskite solar cells of each example were subjected to performance tests, and the test results are shown in Table 1.

[0111] Table 1 Performance test results

[0112]

[0113] In the method for preparing a perovskite solar cell of the present invention, an organic protective layer is prepared on the surface of the electrode layer, which can reduce the influence of the thermal effect in P3 laser scribing, and the dust generated during processing is not easily accumulated on the surface of the device, effectively reducing the edge collapse and lap morphology of the wire groove; after the P3 process, plasma etching is used to relatively flatten the protective layer at the edge of the wire groove, and carbonyl sulfide treatment is carried out to form a first protective layer on a part of the side wall of the P3 groove; then a passivation process is carried out, and the C4F8 gas will generate fluorocarbon polymers, which have excellent chemical stability and hydrophobicity and can be deposited on the side wall and bottom of the P3 groove, effectively preventing water vapor in the environment from invading the device structure, thereby improving the overall stability of the battery.

[0114] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some or all of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the various embodiments of the present invention.

Claims

1. A perovskite solar cell, characterized in that, It includes a base layer, a composite functional layer, an electrode layer, an interface protection layer, a groove protection layer, and a P3 groove; the composite functional layer and the electrode layer are disposed between the base layer and the interface protection layer, and the interface protection layer is located on the surface of the electrode layer, and the composite functional layer is located on the surface of the base layer; the P3 groove sequentially penetrates through the interface protection layer, the electrode layer, and the composite functional layer; The interface protection layer includes an organic polymer; The groove protection layer includes a first protection layer located on a partial sidewall of the P3 groove, and the first protection layer includes a reaction product of carbonyl sulfide and the organic polymer; The organic polymer includes a cross-linked product of a polymer material.

2. The perovskite cell according to claim 1, wherein, The polymer material includes at least one of polyurethane acrylate, epoxy acrylate, acrylate, polyester acrylate, polyether acrylate, polyacrylic acid, and polyol compound.

3. The perovskite solar cell according to claim 1, characterized in that, The groove protection layer further includes a second protection layer, and the second protection layer is located on the surface of the first protection layer and the surface of the P3 groove; the second protection layer includes a fluorocarbon polymer.

4. The perovskite battery according to claim 1, wherein The composite functional layer includes a first charge transport layer, a perovskite layer, and a second charge transport layer which are sequentially stacked, the first charge transport layer is in contact with the base layer, and the second charge transport layer is in contact with the electrode layer; The perovskite cell further includes a P2 groove, and the P2 groove sequentially penetrates through the second charge transport layer, the perovskite layer, and the first charge transport layer; The electrode layer has an extension section, and the extension section penetrates through the P2 groove and is in contact with the base layer; The base layer is provided with a P1 groove with an opening facing the first charge transport layer.

5. A preparation method of a perovskite battery, characterized in that, The perovskite cell according to any one of claims 1 to 4 includes the following steps: Sequentially prepare a composite functional layer and an electrode layer on the base layer; Coat a polymer material solution on the surface of the electrode layer, and form an organic protection layer after curing; Fabricate a P3 groove that penetrates through the organic protection layer, the electrode layer, and the composite functional layer; Perform plasma etching on the organic protection layer near the P3 groove to form an interface protection layer; during the plasma etching process, introduce carbonyl sulfide, and form a first protection layer on a partial sidewall of the P3 groove to obtain a groove protection layer.

6. The preparation method of the perovskite battery according to claim 5, wherein, The polymer material solution includes a polymer material and an organic solvent.

7. The preparation method of the perovskite battery according to claim 5, wherein, It includes at least one of the following features (1) to (4): (1) The plasma etching includes a dilution gas and an etching gas, and the flow rate ratio of the dilution gas to the etching gas is (1 to 2):(3 to 5); (2) The flow rate ratio of the carbonyl sulfide to the dilution gas is 1:(3 to 5); (3) The radio frequency power of the plasma etching is 500 to 700 W, and the radio frequency frequency is 50 to 60 MHz; (4) After the plasma etching for 60 to 150 s, introduce the carbonyl sulfide, and the treatment time is 100 to 150 s.

8. The preparation method of the perovskite battery according to claim 5, characterized in that, For the preparation of the groove protection layer, it further includes: after obtaining the first protection layer, introduce fluorocycloalkane again to form a second protection layer on the surface of the first protection layer and the P3 groove.

9. The preparation method of the perovskite battery according to claim 8, wherein, It includes at least one of the following features (1) to (3): (1) The fluorinated cycloalkane includes C4F8, and the flow rate ratio of the fluorinated cycloalkane to the dilution gas is 1:(3 - 5); (2) After stopping the supply of the etching gas and the carbonyl sulfide, the fluorinated cycloalkane is introduced under the condition that the radio frequency power is 150 - 250 W; (3) The treatment time using the fluorinated cycloalkane is 100 - 150 s.

10. The preparation method of the perovskite battery according to claim 5, characterized in that, The preparation of the composite functional layer specifically includes: Making a P1 groove on the surface of the base layer, and sequentially preparing a first charge transport layer, a perovskite layer, and a second charge transport layer on one side surface of the base layer having the P1 groove; Making a P2 groove that sequentially penetrates through the second charge transport layer, the perovskite layer, and the first charge transport layer; Preparing an electrode layer on the surface of the second charge transport layer and in the P2 groove.

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