Electron beam sewage treatment device based on optimized runner design

By optimizing the inclined runner and rectifier design, the new electron beam irradiation device is solved, and the problems of low energy utilization and uneven flow state in sewage treatment are improved and uniform in sewage treatment efficiency is enhanced, and the degradation effect of difficult-to-degrade organic matter is enhanced.

CN120383364APending Publication Date: 2025-07-29NINGBO HANSU TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510221739.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-02-27
Publication Date
2025-07-29

AI Technical Summary

Technical Problem

The energy utilization rate of sewage in the existing electron beam irradiation device is low, resulting in uneven treatment effect and turbulent flow state, which affects the sewage absorption efficiency.

Method used

A new type of electron beam irradiation device including an inclined runner and a rectifier device is designed. By reasonably configuring the inclination angle and tapering angle of the runner, and optimizing the sewage flow path in combination with the rectifier device to ensure that all parts of the sewage receive uniform electron beam irradiation.

Benefits of technology

It significantly improves the energy utilization rate and treatment efficiency of sewage treatment, can effectively degrade high concentrations of difficult-to-degrade organic matter, enhance the treatment effect, and is effective when combined with other sewage treatment methods.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to an under-beam device for treating sewage through electron beam irradiation. The device comprises a water storage tank, an inclined flow channel, a rectifying device, a sewage outlet and an irradiation area. The sewage storage tank is arranged at the topmost end and used for collecting sewage; the inclined flow channel is positioned below a beam outlet of the electron accelerator and is used for guiding sewage to flow along a preset path and receiving electron beam irradiation; the rectifying device is arranged at the upper part of the runner and is used for adjusting and optimizing the flowing state of sewage; an electron accelerator is arranged above the irradiation area and is used for carrying out irradiation treatment on the sewage; the sewage outlet is used for discharging the treated sewage. The speed distribution of the sewage flowing layer is regulated and controlled by adjusting the inclination angle and the gradual shrinkage angle of the inclined flow channel and the structure of the vertical baffle, and the uniformity of the sewage absorbing dose is improved. The device can improve the utilization rate of electron beam energy and enhance the sewage treatment effect, and has remarkable economic value.
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Description

Technical Field

[0001] The present invention relates to the field of sewage treatment, and in particular to a device under the beam for irradiating sewage with an electron beam and a sewage treatment process. Background Art

[0002] With the continuous advancement of the industrialization process, sewage treatment technology is facing increasingly severe challenges. Traditional sewage treatment methods, such as physical separation, chemical precipitation, and biodegradation, although can effectively treat conventional pollutants to a certain extent, have limited treatment effects on some refractory organic compounds and toxic substances, and often accompanied by the problem of secondary pollution. To address these challenges, electron beam irradiation technology, as a new sewage treatment technology, has emerged.

[0003] The technology of treating sewage by electron beam irradiation realizes the degradation and transformation of pollutants by directly irradiating the pollutants in the sewage with high-energy electron beams, inducing a series of complex physical and chemical reactions. Compared with traditional technologies, the electron beam irradiation technology has the advantages of small floor area, flexible operation, no secondary pollution, etc. At the same time, the high-energy electron beam generated by the electron accelerator has a service life of up to 20 years, greatly improving the economy and sustainability of the device. In addition, due to its "synergistic effect", the electron beam irradiation technology can be used in combination with other physical and chemical treatment methods to enhance the comprehensive effect of sewage treatment.

[0004] To meet the treatment requirements of different types of sewage, researchers have designed a variety of devices under the beam, including waterfall-type, spray-type, jet-type, upflow-type, and baffle-type reactors. These devices have their own characteristics, but there are also some limitations. For example, the waterfall-type reactor reduces resistance by the vertical fall of sewage, but it is prone to splashing when the water flow velocity is high, affecting the treatment effect. The spray-type reactor treats sewage by atomizing the water flow in combination with electron beams and ozone, but the degree of atomization is difficult to control, limiting its treatment capacity. The jet-type reactor (CN115947407A, CN201810758081.X) is designed by considering the advantages and disadvantages of the previous two reactors, and can eject sewage at high speed through a water pump to form a relatively thin water film, but the uniformity of the water flow still needs to be optimized. The upflow-type reactor increases the residence time of the water flow by flowing from the bottom to the top, but there are differences in the uniformity of the water flow absorbing irradiation energy. The baffle-type reactor changes the flow path of the fluid through baffle plates, increasing the absorption of irradiation energy, but due to the velocity difference, the treatment effects are still inconsistent.

[0005] Although the electron beam irradiation technology has significant advantages in processing efficiency, due to the non-linear distribution of electron beam energy with water depth, the energy absorbed by different parts of the sewage is uneven, resulting in differences in treatment effects. In addition, the flow state of the sewage in the flow channel is turbulent, and the non-uniform distribution of the flow velocity further affects the absorption efficiency of the sewage for the electron beam energy. Summary of the Invention

[0006] Aiming at the deficiencies of the existing electron beam irradiation devices in terms of energy utilization efficiency and processing efficiency, the present invention proposes a new type of under-beam device for electron beam irradiation by optimizing the design of the inclined flow channel and the rectifying device. This device significantly improves the energy utilization efficiency while ensuring the treatment effect, and has broad application prospects.

[0007] An under-beam device for treating sewage by electron beam irradiation includes a sewage storage water tank, an inclined flow channel, a rectifying device, a sewage outlet, and an irradiation area. The inclined flow channel is located below the irradiation area and has a certain inclination angle to ensure that the sewage can flow smoothly in the channel and receive electron beam irradiation. When the fluid flows along the inclined flow channel, the gravitational potential energy is converted into kinetic energy, and the fluid velocity gradually increases. When the mass flow rate is constant, the increase in velocity leads to a reduction in the cross-sectional area of the downstream fluid, resulting in inconsistent liquid level heights at each cross-section of the fluid, and it is difficult for the energy absorbed by the sewage from ionization irradiation to reach a uniform distribution. The design of the present invention enables the sewage to uniformly receive electron beam irradiation during the flow process by reasonably configuring the channel inclination angle and the taper angle.

[0008] Since the electron irradiation absorption curve varies non-linearly with water depth, the energy absorbed by different parts of the sewage is uneven, and the treatment effects vary greatly. The flow state of the sewage in the flow channel is turbulent, and due to the existence of wall friction, the velocity distributions near the wall and inside are also inconsistent. The rectifying device is arranged at the starting section of the inclined flow channel. Through the design of the height, length, and interval of the rectifying device, it is used to optimize the flow path of the sewage and adjust the velocity distribution to ensure that the upper and lower parts of the sewage absorb the electron beam energy more uniformly. This setting helps to improve the treatment effect, ensure uniform irradiation of each part of the sewage, maximize the utilization efficiency of the electron beam energy, thereby avoiding energy waste and improving the overall efficiency of sewage treatment.

[0009] In addition, the position of the electron beam irradiation device should be selected at a position where the thickness of the flow layer is flush with the side wall surface of the flow channel and the velocity distribution is uniform across the cross-section to ensure the best irradiation effect.

[0010] Through the above technical solutions, the present invention has at least the following advantages compared with the prior art:

[0011] 1. The ionization radiation sewage treatment device and method of the present invention can significantly change the absorption dose distribution in the sewage, thereby making full use of almost all the electron beam energy.

[0012] 2. The device and method can effectively degrade high-concentration, refractory, long-chain polymer organic compounds in sewage, significantly improving the sewage treatment efficiency.

[0013] 3. The device and method of the present invention can be combined with various sewage treatment operations, such as Fenton method, ozone catalytic oxidation, membrane filtration, flocculation, and reverse osmosis, etc. However, in fact, satisfactory water treatment effects can be achieved only by combining the ionization catalytic unit with a conventional biochemical unit.

[0014] In the ranges disclosed herein, the endpoints and any values are not limited to the exact ranges or values. These ranges or values should be understood to include values close to these ranges or values. For numerical ranges, the endpoint values of each range, between the endpoint values of each range and individual point values, and between individual point values can be combined with each other to obtain one or more new numerical ranges, and these numerical ranges should be regarded as specifically disclosed herein. Description of the Drawings

[0015] Figure 1 Schematic structural diagram of a sub-beam irradiation device according to an embodiment of the present application;

[0016] Figure 2 Relationship diagram of the absorbed dose of electron irradiation of water at 5 MeV with water depth;

[0017] Figure 3 Irradiation absorption energy ratio of the upper and lower interfaces of a 3 cm water film thickness flow channel.

[0018] Description of the Reference Numerals

[0019] 1 - Sewage storage water tank, 2 - Inclined flow channel, 3 - Rectifying device, 4 - Sewage outlet, 5 - Irradiation area; Detailed Description of the Embodiment

[0020] In order to make the objectives, technical solutions, and advantages of the present invention clearer and more understandable, the present invention will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the scope of the present invention.

[0021] Please refer to Figure 1, which is a structural block diagram of an embodiment of the sewage treatment device by electron beam irradiation of the present invention. As shown in the figure, the device of the present invention mainly includes the following components: a sewage storage tank for collecting and temporarily storing sewage; an inclined flow channel located in the central part of the device, designed to gradually narrow from the starting point to the ending point; a rectifying device arranged at the front section of the inclined flow channel, the rectifying device being a vertical strip-shaped structure baffle plate arranged at intervals along the cross-section of the flow channel; a sewage outlet arranged at the bottom of the sewage storage tank; an irradiation area with an electron accelerator above for irradiating the sewage.

[0022] In one example, the rectifying device is arranged in the first 1 / 2 section from the starting position of the inclined flow channel.

[0023] In one example, the rectifying device is a vertical strip-shaped structure baffle plate arranged at intervals along the cross-section of the inclined flow channel. The length of the baffle plate is 0.5 - 10 cm, and the interval of the rectifying device is 2 - 20 cm.

[0024] In one example, the ratio of the height of the baffle plate to the height of the sewage liquid level in the flow channel is 1 / 5 - 1.

[0025] In one example, the baffle plate is fixed to the bottom of the flow channel, and the angle with the flow channel direction is 0 - 80°.

[0026] In one example, an inclination angle adjusting device such as a hinge adjustment, a rotating screw, a bolt, etc. is arranged between the water tank and the inclined flow channel. The inclination angle range of the inclined flow channel is 15 - 30°, so as to optimize the flow velocity of the sewage and make it match the irradiation absorption dose of the electron beam, thereby improving the treatment effect.

[0027] In one example, the tapering angle range of the inclined flow channel is 0 - 5°, so as to maintain a uniform thickness of the sewage flow layer and ensure a uniform velocity distribution of the sewage across the cross-section of the flow channel.

[0028] In one example, the sewage storage tank is chamfered to make the flow of the fluid more stable by reducing the height difference.

[0029] In one example, the thickness range of the sewage water film in the inclined flow channel should be 0.5 - 6 cm to obtain the best irradiation effect. Preferably, the water film thickness range is 3 - 5 cm.

[0030] In one example, the irradiation area is arranged in the flow channel area where the water flow velocity is 0.5 - 5 m / s. Preferably, it is in the flow channel area with a flow velocity of 1 - 3 m / s.

[0031] In one example, a catalyst carrier component is arranged in the irradiation flow channel area for carrying the catalyst.

[0032] In one example, the electron beam accelerator is characterized in that its irradiation energy is 1 - 10 MeV (preferably 3 - 10 MeV), and the beam current intensity is 1 - 60 mA (preferably 5 - 60 mA).

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0034] Preparation Example

[0035] Preparation of the catalyst

[0036] (1) Disperse 1.0 g of TiO2 in 190 mL of water and ultrasonicate for 10 min, then quickly add 16 mL of aqueous ammonia solution (25.0 - 28.0%) to the suspension;

[0037] (2) Dissolve 0.5 g of ferric chloride hexahydrate and 0.2 g of ferrous chloride tetrahydrate in 20 mL and 5 mL of water respectively to prepare Solution A and Solution B. Add 0.8 mL of 2M hydrochloric acid solution to Solution B;

[0038] (3) Add Solution A and Solution B to the TiO2 suspension simultaneously, and carry out continuous mechanical stirring and nitrogen bubbling. Then, reflux the suspension for 60 min to generate the final black photocatalyst;

[0039] (4) Further separate with an external magnet, wash 3 times with a water - ethanol (v / v 1:1) solution, and dry at 60 °C for 12 h to obtain the TiO2 / Fe3O4 composite catalyst.

[0040] Example 1

[0041] Treat the chemical industrial park sewage to be treated through an electron beam sewage treatment device. The length of the sewage storage tank is set to 3 m, the width is 2 m, and the height is 1.5 m, and chamfering treatment is carried out on it. The length of the inclined flow channel is set to 5 m, the width is 2 m, and the height is 5 cm. The inclination angle of the flow channel is 20°, and the taper angle is 2°. A rectifying device is set at 15 cm from the starting point of the flow channel. The height of each baffle is 2.2 cm, the length is 2.5 cm, the thickness is 0.5 cm, the interval is 5 cm, and the angle between the baffle and the inclined flow channel is 30°. The irradiation area is set 2 m above the starting point of the flow channel. The flow channel catalyst carrier component is loaded with the catalyst of the preparation example. The sewage flows out from the storage tank, passes through the inclined flow channel, and passes through the electron beam irradiation area. The water film thickness is about 3 cm. The electron beam irradiation energy is 5 MeV, and the beam current intensity is 5 mA; the sewage after irradiation treatment is discharged through the sewage outlet.

[0042] Example 2

[0043] It is basically the same as Example 1, except that baffles are not provided in the flow channel.

[0044] Example 3

[0045] It is basically the same as Example 1, except that the length of the baffle is 15 cm.

[0046] Example 4

[0047] It is basically the same as Example 1, except that the interval between the baffles is 25 cm.

[0048] Example 5

[0049] It is basically the same as Example 1, except that the height of the baffle is 0.5 cm.

[0050] Example 6

[0051] It is basically the same as Example 1, except that the height of the baffle is 6 cm.

[0052] Example 7

[0053] It is basically the same as Example 1, except that the inclination angle of the flow channel is 45°.

[0054] Example 8

[0055] It is basically the same as Example 1, except that the inclination angle of the flow channel is 8°.

[0056] Example 9

[0057] It is basically the same as Example 1, except that the taper angle of the flow channel is 10°.

[0058] Example 10

[0059] It is basically the same as Example 1, except that the irradiation area is set 0.5 m above the end of the flow channel.

[0060] Comparative Example 1

[0061] It is consistent with Example 1 in terms of irradiation energy, beam current intensity, irradiation time, and the catalyst used. The chemical industrial park sewage to be treated is treated by a jet-type electron beam sewage treatment device. The sewage enters the flow channel through a nozzle and is irradiated by an electron beam above the flow channel. The length of the nozzle is 1 m, the width is 3 cm, the water flow velocity is 0.3 m / s, and the water film thickness is about 8.5 cm.

[0062] The treated water obtained from the above examples was subjected to water quality testing, and the results are summarized in Table 1.

[0063] Table 1

[0064]

[0065] From the comparison of the COD removal rates and treated water volumes of each example in Table 1, it can be seen that Example 1 exhibits a relatively high COD removal efficiency and treated water volume, with a COD removal rate of 68% and a treated water volume of 5250 m 3 / day. This is attributed to the effective setting of the baffle and the design of the taper angle, which makes the sewage flow more smoothly and improves the irradiation effect of the electron beam. Generally speaking, the flow channel design (including the setting of the baffle, inclination angle, and taper angle) and the position of the irradiation area have a significant impact on the effect of electron beam sewage treatment. Compared with the jet-type electron beam sewage treatment device, the device of this patent can treat about one and a half times more sewage while maintaining a better degradation effect.

Claims

1. An under-beam device for treating sewage by electron beam irradiation, characterized in that: It includes a water storage tank, an inclined flow channel, a rectifying device, a sewage outlet and an irradiation area. The inclined flow channel is located below the beam outlet of the electron accelerator, guiding sewage to flow along a predetermined path and receive electron beam irradiation. The rectifying device is arranged in the inclined flow channel to optimize the flow path of the sewage. An electron accelerator is provided above the irradiation area for irradiating the sewage, and the sewage outlet is used to discharge the treated sewage.

2. The under-beam device for treating sewage by electron beam irradiation according to claim 1, wherein The rectifying device is arranged in the first 1 / 2 section from the starting position of the inclined flow channel.

3. The sewage treatment device by electron beam irradiation according to claim 1, characterized in that, The rectifying device is a baffle with a vertical strip structure, which is arranged at intervals along the cross-section of the inclined flow channel. The length of the baffle is 0.5 - 10 cm, and the interval is 2 - 20 cm.

4. The rectifying device according to claim 3, characterized in that, The ratio of the height of the baffle to the height of the sewage liquid level in the flow channel is 1 / 5 - 1.

5. The rectifying device according to claim 3, characterized in that, The baffle is fixed to the bottom of the flow channel, and the included angle with the flow channel direction is 0 - 80°.

6. The sewage treatment device by electron beam irradiation according to claim 1, characterized in that, The inclination angle range of the flow channel is 10 - 40°.

7. The sewage treatment device by electron beam irradiation according to claim 1, characterized in that, The width of the inclined flow channel gradually decreases from the top to the bottom, and the taper angle is 0 - 5°.

8. The sewage treatment device by electron beam irradiation according to claim 1, characterized in that, The thickness range of the sewage water film in the inclined flow channel should be 0.5 - 6 cm to obtain the best irradiation effect. Preferably, the water film thickness range is 1 - 4 cm.

9. The sewage treatment device by electron beam irradiation according to claim 1, characterized in that, The irradiation area is set in the flow channel area where the water flow velocity is 0.5 - 5 m / s. Preferably, it is set in the flow channel area with a flow velocity of 1 - 3 m / s.

10. The electron beam accelerator according to claim 3, characterized in that, Its irradiation energy is 1 - 10 MeV (preferably 3 - 10 MeV), and the beam current intensity is 1 - 60 mA (preferably 5 - 60 mA).

Citation Information

Patent Citations

  • Liquid irradiation device

    CN108622976A

  • Fluid sterilizing device

    CN111320229A

  • Under-beam device for electron beam irradiation of wastewater and sewage treatment process

    CN115947407A

  • Preparation method of magnetically recoverable Fe3O4 / TiO2 compound photocatalyst

    CN118663262A

  • Sewage electron beam irradiation degradation device

    CN220078858U