Optical system optimization design method for differentially controlling pose sensitivity
By constructing the analytical relationship between position deviation and structural parameters, and optimizing the optical system using vector aberration theory, the problem of low position sensitivity control efficiency in optical system design in the prior art is solved, and efficient and accurate optical system design is achieved.
Patent Information
- Application Number
- CN202510851764.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-24
- Publication Date
- 2025-08-01
- Estimated Expiration
- 2045-06-24
AI Technical Summary
Existing optical system design methods are difficult to efficiently differentiate the control of position sensitivity, resulting in low optimization efficiency, long time-consuming, and easy to fall into local extreme values, which cannot meet the performance requirements of specific optical system.
Based on vector aberration theory, the analytical relationship between the position distortion amount and structural parameters of the optical system is constructed, and the position sensitivity evaluation function is constructed through weighting to directly optimize the position sensitivity of the optical system to avoid repeated iterations and sensitivity analysis.
It improves the optimization efficiency of optical system, simplifies the design process, avoids local extreme values, achieves more accurate posture sensitivity control, and improves system performance and stability.
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Figure CN120405944A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the field of optical design technology, and in particular relates to an optical system optimization design method for differentially controlling posture sensitivity. Background Art
[0002] With the development of space astronomical observations, high-resolution Earth remote sensing, and space laser communications, reflective space optical systems have gained widespread application, and optical designers are striving to improve optical system performance in multiple dimensions. However, one of the main trade-offs for improved optical system performance is increased system complexity (such as the use of more reflective surfaces and free-form surfaces), which presents challenges in system alignment and image quality maintenance. To reduce this difficulty and the cost of maintaining image quality, optical designers aim to reduce the sensitivity of each degree of freedom in the system while maintaining system performance. A series of low-sensitivity optical system design schemes have been proposed. Typical desensitization methods currently include direct optimization and multiple structure methods.
[0003] Desensitization methods such as direct optimization and multiple structural methods have reduced the sensitivity of optical systems to a certain extent. However, existing methods have the following problems in practical applications: First, existing methods evaluate or constrain component pose sensitivity based on ray tracing results, but have not yet directly established an analytical relationship between optical component structural parameters and their pose sensitivity. Consequently, it is impossible to directly control the optimization of optical system structural parameters by constraining component pose sensitivity, resulting in low optimization efficiency and long optimization time. Second, existing low-sensitivity optical system design methods consider component-level tolerance desensitization, that is, reducing the sensitivity of each degree of freedom of a component while simultaneously constraining the system aberrations to be in a good state at different pose states. This can easily lead the optimization process to local extremes, making it difficult to obtain the optimal design solution. In addition, the pose sensitivity requirements of the same optical component in actual optical systems are related to the structural design level, and low sensitivity in all dimensions is not required. Therefore, rationally controlling and designing different pose sensitivities can effectively improve system development efficiency and ensure system performance. Third, the optical design software has highly versatile operands, but when meeting specific needs, multiple operands need to be applied in combination. Not only is the evaluation function difficult to construct, but the running process is also time-consuming, which increases the optimization time of the optical system.
[0004] Therefore, there is an urgent need for an optimized design scheme for reflective space optical systems that can achieve differentiated control of the sensitivity of each posture. Summary of the Invention
[0005] In view of this, the present invention aims to provide an optimized design method for an optical system that differentially controls the pose sensitivity. For different poses, the relationship between the misalignment amount and the structural parameters of the optical system is directly constructed, without the need for multiple optimizations and adjustments of the optical system or repeated calls to sensitivity analysis, thus solving the problem of difficultly and efficiently differentially controlling the sensitivity of each pose during the design and optimization process of the optical system.
[0006] To achieve the above object, the technical solution of the present invention is realized as follows: The present invention provides an optimized design method for an optical system that differentially controls the pose sensitivity, including: Based on the vector aberration theory, obtain the aberration of the optical system under the condition of pose misalignment. According to the aberration of the optical system under the condition of pose misalignment, obtain the sensitivity of the aberration coefficient of a specific type at any field point to different pose misalignment amounts. Construct an evaluation function for the pose sensitivity of any single field of view according to the sensitivity of the aberration coefficient of a specific type at any field point to different pose misalignment amounts. By weighting, construct an evaluation function for the pose sensitivity of the entire field of view of the optical system, and use the evaluation function for the pose sensitivity of the entire field of view to differentially optimize the pose sensitivity of the optical system.
[0007] Preferably, the optical system is a reflective optical system.
[0008] Preferably, before obtaining the aberration of the optical system under the condition of pose misalignment, it further includes: obtaining the aberration of the optical system under the condition of no pose misalignment.
[0009] Preferably, the aberration of the optical system under the condition of no pose misalignment is: ; wherein, represents the normalized field vector, represents the normalized pupil vector, represents the normalized pupil off-axis vector, represents the number of optical surfaces in the optical system, , , , and are constants, , , represents the aberration coefficient of the aberration of a specific type of the th optical surface, represents the aberration field center offset vector of the th optical surface.
[0010] Aberration of the optical system under the condition of pose misalignment is: ; wherein, represents the relationship function between the astigmatism coefficient of the th optical surface and the pose misalignment, represents the relationship function between the spherical aberration coefficient of the th optical surface and the pose misalignment, represents the relationship function between the coma coefficient of the th optical surface and the pose misalignment, represents the normalized field-of-view vector, represents the normalized pupil vector, srepresents the normalized pupil off-axis vector, represents the aberration field center offset vector of the th optical surface, represents the astigmatism of the optical system, represents the coma of the optical system, represents other types of aberration coefficients.
[0011] Preferably, solve , and through the Seidel aberration theory.
[0012] Preferably, the sensitivity of the aberration coefficient of a specific type at any field point to different pose misalignments is calculated as: ; [[ID=�4]]wherein, represents an arbitrary field point within the normalized field of view, represents the aberration coefficient of any type, represents the pose misalignment.
[0013] Preferably, the aberration coefficient of any type takes values of astigmatism or coma, and the pose misalignment includes the eccentricity along the x-axis, the eccentricity along the y-axis, the tilt around the x-axis, the tilt around the y-axis, and the translation along the z-axis of the optical surface.
[0014] Preferably, the single-field pose sensitivity evaluation function [[ID=7ģ]] is: ; wherein, represents the weight factor of the rd degree of freedom of the pose misalignment, represents the field point any target value of the pose sensitivity, indicating the pose misalignment the th degree-of-freedom vector, indicating the astigmatism component, , indicating the coma component, .
[0015] Preferably, the full-field pose sensitivity evaluation function is: ; where m and n respectively represent the number of single-field points sampled in the x and y directions of the full field of view, indicating the field point weight factor for the constraint intensity of the pose sensitivity of each position in the full field of view.
[0016] Compared with the prior art, the present invention can achieve the following beneficial effects: Compared with the traditional method that requires tolerance (pose misalignment) analysis of the optical system and repeated iterative optimization processes, the present invention does not require multiple optimization adjustments or repeated calls to sensitivity analysis. Instead, it directly constructs the relationship between the pose misalignment and the structural parameters of the optical system, greatly improving the system optimization efficiency, reducing the system design and optimization time, and enabling a quick realization of an optical design solution that meets the requirements. Moreover, based on the vector aberration theory, the present invention establishes an analytical relationship and performs differential control for different poses, enabling a more comprehensive consideration of the performance of the optical system in various poses, effectively avoiding local extreme value problems, improving the accuracy and reliability of optimization, and making it easier to find the global optimal solution.
[0017] The present invention constructs a pose sensitivity evaluation function, which can more precisely control the pose sensitivity of optical elements, reduce the problem of image quality degradation caused by element pose errors, and improve the overall performance and stability of the optical system. In addition, compared with the traditional method that requires repeated calls to the sensitivity analysis of software, the present invention can convert the pose sensitivity evaluation function into a macro language and load it into the optical system optimization evaluation function, eliminating the cumbersome process of direct software calls, simplifying the program writing, reducing the maintenance cost, and improving the stability and maintainability of the system. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The accompanying drawings that form a part of the present invention are used to provide a further understanding of the present invention. The schematic embodiments and descriptions thereof of the present invention are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings: Figure 1It is a flowchart of an optimized design method for an optical system that differentiates and controls pose sensitivity according to an embodiment of the present invention; Figure 2 It is a schematic diagram of the initial structure of an optical system according to an embodiment of the present invention; Figure 3 It is a schematic diagram of the selection of field point sampling according to an embodiment of the present invention. Detailed implementation manners
[0019] In order to make the purpose, technical solutions and advantages of the present invention clearer, the following further details the present invention in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not constitute a limitation to the present invention. Similar elements in different embodiments are labeled with related similar element numbers. In the following embodiments, many details are described to enable a better understanding of the present invention. However, those skilled in the art can easily recognize that some of the features can be omitted in different situations, or can be replaced by other elements, materials, and methods. In some cases, some operations related to the present invention are not shown or described in the specification, which is to avoid the core part of the present invention being overwhelmed by excessive description. For those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations according to the description in the specification and general technical knowledge in the art.
[0020] It should be noted that, without conflict, the embodiments and features in the embodiments of the present invention can be combined with each other to form various implementation manners. At the same time, the steps or actions in the method description can also be reordered or adjusted in a manner obvious to those skilled in the art. Therefore, the various sequences in the specification and drawings are only for clearly describing a certain embodiment and do not mean that they are the necessary sequences, unless it is stated that a certain sequence must be followed.
[0021] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. These are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", etc. may explicitly or implicitly include one or more of such features. In the description of the present invention, unless otherwise specified, the meaning of "a plurality" is two or more.
[0022] In the description of the present invention, it should be noted that unless otherwise clearly specified and limited, the terms "mounted", "connected", "coupled" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood through specific circumstances.
[0023] The present invention will be described in detail below with reference to the drawings and in conjunction with embodiments.
[0024] Please refer to Figure 1 , in an embodiment of the present invention, in view of the problem that it is difficult to efficiently and differentially control the pose sensitivity during the design optimization process of an optical system, an optical system optimization design method for differentially controlling the pose sensitivity is proposed. An analytical relationship between the structural parameters of an optical element and the pose sensitivity of the element is directly constructed. By directly invoking the analytical relationship, the process of multiple optimization iterations and repeated calls to sensitivity analysis is omitted. The above optical system optimization design method specifically includes the following steps: Step 1: First, according to the design index requirements, determine the initial structure of the optical system. Usually, the input indexes include: the requirements for the first-order parameters of the optical system, the structural size requirements, the image quality requirements, and the pose sensitivity requirements, etc. Among them, the requirements for the first-order parameters include the requirements for basic optical parameters such as the optical power and focal length, and the image quality requirements include the requirements for the resolution, contrast, aberration magnitude, etc. Based on the above requirements, establish the initial structure of the optical system to be designed. The determination of the initial structure specifically includes determining the number, type (such as lens or mirror, etc.), basic parameters, and position of the optical elements.
[0025] The establishment process of the initial structure can directly adopt existing methods. For example, a coaxial system can be designed and determined based on the third-order aberration theory, or a system with an off-axis aperture and an off-axis field of view, etc. The parameters such as the position of the aperture and the field focal length are determined, and further, according to theoretical calculations and preliminary designs, the initial structure is modified and adjusted to meet the design requirements.
[0026] Specifically, in the embodiments of the present invention, taking the design and optimization of Figure 2 the coaxial two-mirror optical system shown as an example, the determination process of the initial structure of the optical system is described as follows: According to the optical design requirements, the type of the optical system is determined, such as the Cassegrain structure, that is, the coaxial two-mirror optical system includes Figure 2 the primary mirror represented by M and the secondary mirror represented by S. Then, the radius of curvature of the primary mirror M and the secondary mirror S are determined, which are respectively expressed as and , and the occlusion ratio of the primary and secondary mirrors is represented by . The occlusion ratio refers to the ratio of the aperture of the secondary mirror to the aperture of the primary mirror. And is used to represent the semi-aperture of the primary mirror M, is used to represent the semi-aperture of the secondary mirror S, is used to represent the object distance of the secondary mirror S, is used to represent the image distance of the secondary mirror S, m represents the distance between the primary mirror M and the secondary mirror S, is used to represent the focal length of the primary mirror M.
[0027] After the above parameters are defined, the parameter relationship formula of the primary mirror M and the secondary mirror S is established. Specifically, assuming that the object is located at infinity and the aperture is located on the primary mirror N, where the conic coefficients of the primary mirror M and the secondary mirror S are respectively and , the magnification of the secondary mirror S is β, then the occlusion ratio and the magnification need to satisfy: ; where, represents the incident angle of the second mirror surface, represents the exit angle of the second mirror surface.
[0028] From the Gaussian formula , it can also be deduced that: .
[0029] According to the aberration theory, the expressions of the spherical aberration , coma , astigmatism and field curvature of the system are: 。
[0030] According to the selection of the optical system, such as the Cassegrain structure form, the parameters 、 、 and can be determined.
[0031] For an off-axis system, the off-axis amount of the secondary mirror S also needs to be determined relation: ; wherein, represents the margin left to avoid mechanical structure interfering with the optical path.
[0032] Set the distance between the primary and secondary mirrors as m, and set the deflection angle of the primary mirror as , then the deflection angle of the chief ray is . Therefore, the deflection amount of the secondary mirror S can be expressed as: .
[0033] So far, the relationship between the primary and secondary mirrors has been constructed according to the traditional method, and the initial of the optical system has been determined.
[0034] Step 2: Conduct a preliminary optimization of the system image quality.
[0035] First of all, in combination with the actual situation, set some structural parameters of the optical system as variables. For example, in the above coaxial two-mirror optical system, set the curvature radius, thickness, conic coefficient, aspheric coefficient, distance between the primary and secondary mirrors, etc. of the primary and secondary mirrors as variables. These parameters can vary within a certain range to optimize the image quality of the system. And adjust the surface shape of the element, such as adjusting from a spherical surface to an aspherical surface or a free-form surface.
[0036] According to the image quality requirements, preliminarily construct an image quality evaluation function. The image quality evaluation function usually includes indicators such as aberration magnitude, image plane flatness, energy concentration, etc. Use the traditional method to construct the evaluation function, and adjust the variable parameters through the design software to make the evaluation function reach the minimum value, and complete the preliminary optimization of the system image quality.
[0037] Step 3: Based on the vector aberration theory, establish a wave aberration model according to the principle of pupil coordinate transformation. Under the condition of no pose misalignment, the wave aberration of the optical system is expressed as: ; wherein, represents the normalized field vector, represents the normalized pupil vector, represents the normalized pupil off-axis vector, represents the number of optical surfaces in an optical system, 、 、 、 and is a constant, , , Indicates the The aberration coefficients of specific types of aberrations on each optical surface are related to the structural parameters of the optical system. Indicates the The aberration field center offset vector of each optical surface, is a function of eccentricity and tilt along the x and y axes, is the spherical aberration field eccentricity vector, is the eccentricity vector of the aspherical aberration field, both of which are related to the structural parameters of the optical system.
[0038] Furthermore, based on the aberration expression of the optical system without posture misalignment, considering the low-order aberrations, the aberration of the optical system with posture misalignment can be obtained: for: ; in, Indicates the The relationship function between the astigmatism coefficient of an optical surface and the amount of posture misalignment is: Indicates the The relationship function between the spherical aberration coefficient of an optical surface and the posture misalignment is: Indicates the The relationship function between the coma coefficient of an optical surface and the posture misalignment is: represents the normalized field of view vector, represents the normalized pupil vector, represents the normalized pupil off-axis vector, Indicates the The aberration field center offset vector of each optical surface, represents the astigmatism of the optical system, represents the coma of the optical system, Indicates other types of aberration coefficients. 、 and Specifically, the solution can be obtained through traditional Seidel aberration theory. The specific solution process is a prior art and is beyond the research and protection scope of the present invention, so it will not be described in detail here.
[0039] Obtaining the aberration of the optical system under the condition of posture misalignment After the expression, it is further possible to obtain the sensitivities of the wave aberration coefficients of a specific type at any field point to each misalignment amount of the pose, and it is obtained that the sensitivities are directly related to the structural parameters of the optical system, directly constructing the relationship between the pose sensitivity and the structural parameters of the optical system. Specifically, the sensitivities of the aberration coefficients of a specific type at any field point to different misalignment amounts of the pose are obtained The calculation formula is: ; Among them, represents any field point within the normalized field of view , that is, a single field of view, represents the aberration coefficient of any type, specifically astigmatism ( ) and coma ( ), represents the misalignment amount of the pose, and the misalignment amount of the pose includes the eccentricity along the x-axis, the eccentricity along the y-axis, the tilt amount around the x-axis, the tilt amount around the y-axis, and the translation amount along the z-axis of the optical surface, that is, the misalignment amounts in a total of five degrees of freedom.
[0040] Sensitivity The calculation formula expresses the analytical relationship between the system pose sensitivity and the system structural parameters. Through this calculation formula, a specific field of view sensitivity evaluation function can be further constructed to achieve differential control of the pose sensitivities in each dimension. For a single field point, a single field of view pose sensitivity evaluation function is: ; Among them, represents the weight factor of the th degree of freedom of the misalignment amount of the pose, represents the target value of any th pose sensitivity of the field point , represents the th degree of freedom vector of the misalignment amount of the pose , represents the astigmatism component, , represents the coma component, .
[0041] Based on the single field of view pose sensitivity evaluation function, multiple field points are selected at equal intervals within the effective field of view. As shown in Figure 3 , m points can be selected in the x direction and n points can be selected in the y direction. For each field point, a single field of view evaluation function is constructed, and then the evaluation function values of all field points are weighted and added. By controlling the constraint strength of each field point on each pose sensitivity through the weight factor, the full field of view pose sensitivity evaluation function is: ; Wherein, m and n respectively represent the number of single-field points sampled in the x and y directions of the full field of view, represents the field point The weight factor for the sensitivity constraint intensity of each pose in the full field of view.
[0042] For the convenience of calling during optical design, the above full-field pose sensitivity evaluation function and single-field pose sensitivity evaluation function are converted into macro language and loaded into the optical system optimization evaluation function. For example, in Zemax software, use its macro language to write the code of the pose sensitivity evaluation function and use it as one of the optimization objectives to participate in the optimization process of the optical system together with the traditional image quality evaluation function.
[0043] S4: Use the pose sensitivity evaluation function to perform differential pose sensitivity optimization control on the optical system. The specific process includes: First, according to the requirements of each pose sensitivity in engineering applications, reasonably set the target value of the pose sensitivity, that is, the sensitivity threshold, and load the macro language evaluation item into the system optimization evaluation function. Use the pose sensitivity evaluation function and the traditional image quality evaluation function to perform preliminary optimization on the optical system.
[0044] After preliminary optimization, judge whether the pose sensitivity and image quality meet the set indicators. If the pose sensitivity meets the indicators, output the design result; if the pose sensitivity does not meet the indicators, return to step 3, analyze the reasons, which may be insufficient field of view sampling or unreasonable weight setting, adjust the field of view sampling and weight size, and re-optimize until the indicators are met.
[0045] Through the above implementation steps, differential control of the pose sensitivity of the optical system can be achieved, improving the performance and stability of the optical system and meeting different application requirements.
[0046] In short, the above description is only a preferred embodiment of this specification and is not used to limit the protection scope of this specification. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of this specification shall be included in the protection scope of this specification.
[0047] The system, device, module or unit described in the above one or more embodiments can be specifically implemented by a computer chip or entity, or by a product with a certain function. A typical implementation device is a computer. Specifically, the computer can be, for example, a personal computer, a laptop computer, a cellular phone, a camera phone, a smart phone, a personal digital assistant, a media player, a navigation device, an email device, a game console, a tablet computer, a wearable device, or any combination of these devices.
[0048] It should also be noted that the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, commodity or device comprising a series of elements not only includes those elements but also other elements not expressly listed, or elements inherent to such process, method, commodity or device. Without further limitation, an element defined by the statement "comprising an..." does not exclude the presence of additional identical elements in the process, method, commodity or device comprising said element.
[0049] Each embodiment in this specification is described in a progressive manner. For the same or similar parts among the embodiments, reference can be made to each other, and the differences between each embodiment and other embodiments are emphasized. In particular, for system embodiments, since they are basically similar to method embodiments, they are described relatively simply, and reference can be made to the corresponding parts of the method embodiments for relevant content.
[0050] The specific embodiments of this specification are described above. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recited in the claims may be performed in a different order than in the embodiments and still achieve the desired result. Additionally, the processes depicted in the figures do not necessarily require the particular order or sequential order shown to achieve the desired result. In certain embodiments, multitasking and parallel processing are also possible or may be advantageous.
Claims
1. An optimized design method for an optical system with differential control of pose sensitivity, characterized in that Including: Based on the vector aberration theory, obtain the aberration of the optical system under the condition of pose misalignment; According to the aberration of the optical system under the condition of pose misalignment, obtain the sensitivity of the aberration coefficients of a specific type at any field point to different pose misalignments; According to the sensitivity of the aberration coefficients of a specific type at any field point to different pose misalignments, construct an evaluation function for the pose sensitivity of any single field of view, and construct an evaluation function for the pose sensitivity of the entire field of view of the optical system by weighting. Use the evaluation function for the pose sensitivity of the entire field of view to differentially optimize the pose sensitivity of the optical system.
2. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 1, characterized in that The optical system is a reflective optical system.
3. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 1, characterized in that, Before obtaining the aberration of the optical system under the condition of pose misalignment, it further includes: obtaining the aberration of the optical system under the condition of no pose misalignment.
4. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 3, characterized in that, The aberration of the optical system under the condition of no attitude misalignment is as follows: ; Among them, represents the normalized field vector, represents the normalized pupil vector, represents the normalized pupil decentration vector, represents the number of optical surfaces in the optical system, 、 、 、 and are constants, , , represents the aberration coefficient of the aberration of a specific type of the -th optical surface, represents the aberration field center offset vector of the -th optical surface.
5. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 1, characterized in that The aberration of the optical system under the condition of the existing pose misalignment amount is as follows: ; Among them, represents the relationship function between the astigmatism coefficient and the misalignment amount of the th optical surface, represents the relationship function between the spherical aberration coefficient and the misalignment amount of the th optical surface, represents the relationship function between the coma coefficient and the misalignment amount of the th optical surface, represents the normalized field vector, represents the normalized pupil vector, represents the normalized pupil off-axis vector, represents the aberration field center offset vector of the th optical surface, represents the astigmatism of the optical system, represents the coma of the optical system, represents other types of aberration coefficients.
6. The optimized design method of an optical system for differentiating and controlling pose sensitivity according to claim 5, characterized in that, Solve by Seidel aberration theory , and .
7. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 5, characterized in that Sensitivity of aberration coefficients of a specific type at any field point to misalignment amounts in different poses The calculation formula is as follows: ; Among them, represents any field point within the normalized field of view , represents the aberration coefficient of any type, represents the misalignment amount of the pose.
8. The optimized design method of an optical system for differentiating and controlling pose sensitivity according to claim 7, characterized in that Aberration coefficients of any type The value is astigmatism or coma, and the misalignment amount It includes the eccentricity along the x-axis, the eccentricity along the y-axis, the tilt around the x-axis, the tilt around the y-axis, and the translation along the z-axis of the optical surface.
9. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 5, characterized in that The single-field pose sensitivity evaluation function is as follows: ; Among them, represents the weight factor of the th degree of freedom of the pose misalignment amount, represents the target value of the arbitrary th pose sensitivity of the field point, represents the th degree of freedom vector of the pose misalignment amount, represents the astigmatism component, , represents the coma component, .
10. The optimized design method of the optical system for differentiating and controlling pose sensitivity according to claim 6, characterized in that, The full-field pose sensitivity evaluation function is as follows: ; where m and n respectively represent the number of single - field - of - view points sampled in the x and y directions of the full field of view. represents the field - of - view point is the weight factor for the sensitivity constraint intensity of each pose in the full field of view.
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