Miniature wearable blood glucose monitoring device
Through the integrated Raman probe and micro-spectrometer, the problem of large size, complex structure and invasive calibration in the prior art is solved, and non-invasive and convenient blood sugar detection is achieved, which is suitable for home use.
Patent Information
- Application Number
- CN202510980039.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-16
- Publication Date
- 2025-08-12
- Estimated Expiration
- 2045-07-16
AI Technical Summary
The existing blood sugar monitoring devices have problems such as large size, complex structure, high cost and needing invasive calibration, making it difficult to achieve non-invasive and convenient home blood sugar monitoring.
A miniature wearable blood sugar monitoring device is designed, using an integrated Raman probe and a micro spectrometer, including a light source, slit and information processing unit, which is connected by a watch strap to achieve non-invasive blood sugar detection.
It realizes non-invasive blood sugar detection with simple structure, small size and low cost, which is suitable for long-term monitoring at home and avoids the risks of wounds and allergies.
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Figure CN120458569A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to a blood glucose monitoring device, in particular to a miniature wearable blood glucose monitoring device. Background Art
[0002] Diabetes is a chronic disease characterized by hyperglycemia caused by absolute or relative insulin deficiency and impaired utilization. The primary means of managing diabetes and its complications is self-monitoring of blood glucose by diabetic patients. Currently, the predominantly invasive method on the market is fingerstick blood testing, which is not only time-consuming and laborious, but also painful and prone to wound infection. CGM (Consumer General Mobility Glucose Monitor) significantly reduces pain, but its lifespan is relatively short (typically 7-14 days), and prolonged use can cause skin allergies and erosions. New non-invasive Raman spectroscopy technology eliminates the need for blood draws and poses no risk of allergic reactions. However, traditional Raman spectroscopy-based detection systems suffer from large experimental setups, complex structures, and high costs. Some equipment also requires invasive calibration, making them unsuitable for continuous home monitoring. Summary of the Invention
[0003] To address the deficiencies of the prior art, the present invention provides a miniature wearable blood glucose monitoring device with a simple structure, small size, low cost, no need for calibration, and non-invasive blood glucose testing.
[0004] The present invention provides the following technical solution: a micro wearable blood glucose monitoring device, comprising a first part and a second part formed into a ring by two straps connected in series; The first part includes an integrated Raman probe, which includes two light sources and a slit for generating a line spot. The two light sources are respectively arranged on either side of the slit, and emit excitation light to the skin tissue through the slit to generate a Raman signal. The slit has a long-pass filter for filtering out Rayleigh scattering and other stray light and autofluorescence. The probe also has a micro-spectrometer for performing spectroscopic analysis and detection of the Raman signal. The second part includes an information processing unit for driving and controlling the light source and the micro-spectrometer and for online analysis of micro-glucose, a touch screen display for reading and displaying blood glucose values, and a battery module for supplying power to the integrated Raman probe, the information processing unit, and the touch screen display; The watch strap has a data line for transmitting data and a power line for supplying power.
[0005] Furthermore, the light source is a horizontal cavity surface emitting laser (HCSEL) or a vertical cavity surface emitting laser array.
[0006] Furthermore, the central wavelength of the light source is 808-976 nm, and the line width is ≥0.1 nm.
[0007] Furthermore, the width direction of the slit is the direction from one light source to another light source, and the width is 25~200um; the thickness direction of the slit is the direction perpendicular to the skin tissue, and the thickness is 0.1~2mm; the height direction of the slit is perpendicular to both the width and height, and the height is 0.6~2mm; the back of the slit is coated with a long-pass filter for filtering out Rayleigh scattering and other scattered light and fluorescent background. The side of the slit close to the skin tissue is the front side, and the other side is the back side.
[0008] Furthermore, the distance between the center of the light source and the center of the slit is 0.5 mm to 2 mm.
[0009] Furthermore, the slit is an air slit or a solid slit.
[0010] Furthermore, the air slit is manufactured by the following steps: First, the glass substrate or quartz substrate is cleaned, and then a vacuum deposition or magnetron sputtering process is used to deposit a light-shielding film, which is a matte nanofilm or AR black film; after the light-shielding film is deposited, a photoresist is spin-coated on the light-shielding film, which is a positive or negative photoresist, and a pre-baking process is performed after the coating process is completed; then the photolithography process is entered, and ultraviolet light is irradiated on the mask to complete the pattern transfer; after the photolithography process is completed, development and hardening processes are performed, and then wet etching or dry etching is performed to transfer the size of the slit from the mask to the light-shielding film. After the de-gumming process, the slit is cleaned. After cleaning, an ion beam process is used to deposit a long-pass filter film layer on the back of the glass substrate or quartz substrate to complete the entire slit processing process.
[0011] Furthermore, the solid slit is manufactured by the following steps: First, the glass substrate or quartz substrate is cleaned, and then the light-shielding film is deposited by vacuum deposition or magnetron sputtering process. The light-shielding film is a matte nano film or AR black film. After the light-shielding film is deposited, the photoresist is spin-coated on the light-shielding film. The photoresist is a positive or negative photoresist. After the coating process is completed, the pre-baking process is performed. Then the photolithography process is entered, and ultraviolet light is irradiated on the mask to complete the pattern transfer. After the photolithography process is completed, the development and hardening process are carried out, and then wet etching or dry etching is performed to transfer the size of the slit from the mask to the On the light-shielding film, the photoresist on the surface of the slit is removed, and an electron beam or magnetron sputtering process is used to deposit a high-refractive-index film layer. The material is SiO2, SiN, SiON and a mixture thereof. The thickness of the high-refractive-index film layer is the thickness of the slit, or greater than the thickness of the slit. After the coating is completed, the CMP process is used for grinding to remove the excess film layer on the surface. After grinding, the grinding liquid and impurities are removed by cleaning. After cleaning, the long-pass filter film layer is deposited on the back of the glass substrate or quartz substrate using an ion beam process to complete the entire slit processing process.
[0012] Furthermore, the micro-spectrometer includes a collimating lens, a transmission grating, a converging lens group and a detector which are sequentially arranged along the propagation direction of the Raman signal.
[0013] Furthermore, the micro-spectrometer includes a lens and a chip-type micro-spectrometer arranged in sequence along the propagation direction of the Raman signal. The chip-type micro-spectrometer includes a wide-bandwidth grating coupler, a tapered waveguide, a first flat waveguide, an arrayed waveguide, a second flat waveguide, an output waveguide array and an array detector arranged in sequence along the propagation direction of the Raman signal.
[0014] Furthermore, the coupling structure between the output waveguide array and the array detector includes a direct coupling type in parallel arrangement, a reflection coupling type in parallel arrangement, and a reflection coupling type in stepped arrangement.
[0015] The beneficial effects of the present invention are as follows: (1) By designing the slit structure and integrating it with the light source, an integrated Raman probe is formed, and then a device is formed, which has a simple structure, small size, low cost, no need for calibration, and non-invasive blood glucose detection.
[0016] (2) It will not cause any wounds to the patient, and can achieve non-invasive real-time monitoring. It is small in size and low in cost. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 This is a schematic diagram of the overall structure of Example 1 of the present invention; Figure 2 This is a schematic structural diagram of the first part of Example 1 of the present invention; Figure 3 Schematic diagram of the structure of the light source and the slit according to Example 1 of the present invention; Figure 4 This is a flow chart of manufacturing the slit according to Example 1 of the present invention; Figure 5 This is a schematic diagram of the overall structure of Example 1 of the present invention; Figure 6 This is a flow chart of manufacturing a slit according to Example 2 of the present invention; Figure 7 This is a schematic structural diagram of the first part of Example 3 of the present invention; Figure 8 Schematic diagram of the structure of a chip-type micro-spectrometer according to Example 3 of the present invention; Figure 9 Schematic diagrams of the installation of the output waveguide and array detector of Example 3 of the present invention, wherein (a) is a direct coupling type with parallel arrangement, (b) is a reflection coupling type with parallel arrangement, and (c) is a reflection coupling type with stepped arrangement; Figure 10A flowchart of establishing a regression model for a method of using a micro wearable blood glucose monitoring device according to Example 4 of the present invention; Figure 11 A flowchart of the spectrum and processing of a method for using a micro wearable blood glucose monitoring device according to Example 4 of the present invention; Figure 12 This is a test flow chart of a method for using a micro wearable blood glucose monitoring device according to Example 4 of the present invention. DETAILED DESCRIPTION
[0018] In order to further illustrate the technical means and effects adopted by the present invention to achieve the predetermined purpose of the invention, the specific implementation methods, structures, features and effects of the present invention are described in detail below in conjunction with the accompanying drawings and preferred embodiments.
[0019] By designing the slit structure and integrating it with the light source, an integrated Raman probe is formed, and then a device is formed, which has a simple structure, small size, low cost, no need for calibration, and can perform non-invasive blood glucose testing.
[0020] The embodiments of the present invention are further described below with reference to a number of embodiments.
[0021] Example 1
[0022] like Figure 1-Figure 2 , a miniature wearable blood glucose monitoring device, comprising a first portion and a second portion connected in series to form a ring by two straps 104; The first part includes an integrated Raman probe, which includes two light sources 101 and a slit 102 for generating linear light spots. The two light sources 101 are respectively arranged on either side of the slit 102, and emit excitation light through the slit 102 to the skin tissue 105 to generate Raman signals. The slit 102 has a long-pass filter 305 for filtering out Rayleigh scattering and other stray light and autofluorescence. The probe also includes a micro-spectrometer 103 for splitting and detecting Raman signals. The second part includes an information processing unit 106 for driving and controlling the light source 101 and the micro-spectrometer 103 and for online micro-glucose analysis, a touch screen display 107 for reading and displaying blood glucose values, and a battery module 108 for powering the integrated Raman probe, the information processing unit 106, and the touch screen display 107. The strap 104 has a data line for transmitting data and a power line for supplying power.
[0023] The light source 101 is a horizontal cavity surface emitting laser, and in some embodiments, a vertical cavity surface emitting laser array may also be used.
[0024] The central wavelength of the light source 101 is 830 nm, and in some embodiments, any value between 808 and 976 nm may be used, such as 808 nm, 850 nm, 905 nm, 940 nm, 976 nm, etc. The line width of this embodiment is 0.1 nm, and may also be any value greater than 0.1 nm.
[0025] The width direction of the slit 102 is the direction from one light source 101 to the other light source 101, and the width is 100 μm. In some embodiments, any value between 25 and 200 μm, such as 200 μm, 150 μm, 50 μm, 25 μm, etc., can also be used. The thickness direction of the slit 102 is perpendicular to the skin tissue 105, and the thickness is 0.5 mm. In some embodiments, any value between 0.1 mm and 2 mm, such as 2 mm, 1.5 mm, 1.2 mm, 0.3 mm, 0.2 mm, and 0.1 mm, can also be used. The height direction of the slit 102 is perpendicular to both the width and height directions, and the height is 1.5 mm. In some embodiments, any value between 0.6 mm and 2 mm, such as 2 mm, 1.2 mm, 1 mm, 0.896 mm, and 0.6 mm, can also be used. The back of the slit 102 is coated with a long-pass filter 305 for filtering out Rayleigh scattering and other scattered light and fluorescent background. The side of the slit 102 close to the skin tissue is the front side, and the other side is the back side.
[0026] like Figure 3 The distance between the center of the light source and the center of the slit is 0.5 mm. In some embodiments, any value between 0.5 mm and 2 mm may be used, such as 1 mm, 1.5 mm, 2 mm, etc.
[0027] like Figure 4 The slit 102 in this embodiment is a solid slit, which is manufactured by the following steps: First, the quartz substrate 301 is cleaned, and then the light shielding film 302 is deposited by a vacuum deposition process. In some embodiments, magnetron sputtering can also be used. The light shielding film 302 is a matte nanofilm. In some embodiments, an opaque material such as AR black film can also be used. The coating material is SiO2 + MgF2, and the co-evaporation ratio is 70%:30%. At 100°C, the evaporation rates are 1.5nm / s and 1nm / s respectively. At a vacuum degree of 10⁻ 3 Pa deposition 200nm, in some embodiments, the vacuum degree can also be 10⁻ 5~10⁻³ Pa, the deposition thickness can also be 150nm~300nm; after the light shielding film 302 is deposited, a photoresist 303 is spin-coated on the light shielding film 302. The photoresist 303 is a positive photoresist with a thickness of 2um. In some embodiments, it can also be 1~5um. The spinning speed is 2000rpm. In some embodiments, it can also be 1500-3000rpm. In some embodiments, a negative photoresist can also be used. After the coating process is completed, a pre-baking process is performed. Then, the photolithography process is entered, and ultraviolet light is irradiated on the mask 304 to complete the pattern transfer. The mask 304 is The process parameters of the slit on 4 are 100×1500um, and other values can also be used as needed; after the photolithography process is completed, development and hardening processes are performed; then dry etching is performed to create a 100um light-transmitting groove (i.e., the width of the slit) on the light-shielding film 302. In some embodiments, it can also be 25~200um. The dry etching adopts reactive ion etching (IRE) and the etching time is about 1.5 minutes to complete the etching of the 200nm matte nanofilm. The etching time is optimized as appropriate according to the characteristics of different matte nanofilms and other AR black film opaque materials. In some embodiments, the etching time is about 1.5 minutes. In some embodiments, wet etching may be used; the size of the slit 301 is transferred from the mask 304 to the light shielding film 302, and the photoresist 303 on the surface of the slit 102 is removed; an electron beam process is used to deposit a high refractive index film 306 on the light-transmitting groove and the light shielding film 302. In some embodiments, magnetron sputtering may be used. The material is SiO2. In some embodiments, SiO2, SIN, SION, and mixtures thereof may also be used. The refractive index is preferably n=1.547. The thickness of the high refractive index film 306 is the same as the thickness of the slit 102, and in some embodiments, it may be greater than the thickness of the slit 102. 2; after the coating is completed, the CMP process is used for grinding to remove the high refractive index film layer 306 on the light-shielding film 302, and retain the high refractive index film layer 306 in the light-transmitting groove, but it should be noted that the grinding should not damage the nano-matt film. After grinding, it is cleaned to remove the grinding liquid and impurities. After cleaning, the long-pass filter film layer 305 is deposited on the back of the quartz substrate using an ion beam process. This process uses a commercial coating process and an 830nm long-pass filter process. In some embodiments, a 785nm~1064nm long-pass filter process can also be used to complete the entire slit 102 processing process.
[0028] The above preparation methods are common technical means in this field.
[0029] Example 2
[0030] like Figure 5 In a micro wearable blood glucose monitoring device of this embodiment, the micro spectrometer 103 includes a collimating lens 404, a transmission grating 405, a converging lens group 406, and a detector 407, which are sequentially arranged along the propagation direction of the Raman signal.
[0031] Two light sources 101 simultaneously emit linear excitation light, which passes through the epidermal tissue and excites glucose molecules in the interstitial fluid of the dermal tissue, generating a Raman signal. The Raman signal is received by slit 102, where unwanted stray light such as Rayleigh scattering is filtered out. After being collimated by collimating lens 404, the signal is diffracted by transmission grating 405, which is a volume holographic grating or, in some embodiments, a quartz transmission grating. The dispersed Raman signal is focused by converging lens assembly 406 onto detector 407, which is a near-infrared-enhanced CCD or, in some embodiments, a near-infrared-enhanced CMOS sensor.
[0032] like Figure 6 The slit 102 in this embodiment is an air slit, which is manufactured by the following steps: First, the glass substrate 301 is cleaned, and then the light shielding film 302 is deposited by magnetron sputtering process. The light shielding film 302 is a matte nano film, and the coating material is SiO2 + MgF2, with a co-evaporation ratio of 70%:30%. At 100°C, the evaporation rates are 1.5nm / s and 1nm / s respectively, and the vacuum degree is 10⁻ 5 Pa deposition 200nm, in some embodiments, the vacuum degree can also be 10⁻ 5~10⁻³ Pa, the deposition thickness can also be 150nm~300nm; after the light shielding film 302 is deposited, a photoresist 303 is spin-coated on the light shielding film 302, the thickness of the photoresist is 2um, and in some embodiments it can also be 1~5um, the spinning speed is 2000rpm, and in some embodiments it can also be 1500-3000rpm, the photoresist 303 is a positive photoresist, and in some embodiments a negative photoresist can also be used. After the coating process is completed, a pre-baking process is performed; then the photolithography process is entered, and ultraviolet light is irradiated on the mask 304 to complete the pattern transfer. The slit process parameters on the mask 304 are 100×1500um, and other values can also be used as needed; after the photolithography process is completed, development and hardening processes are performed, and then dry etching is performed, and then dry etching is performed to create a 100um light-transmitting groove ( The slit 102 is etched from the mask 304 to the light-shielding film 302. After the degumming process, the slit 102 is cleaned. After cleaning, the long-pass filter film 305 is deposited on the back of the glass substrate using an ion beam process. The process uses a commercial coating process, preferably an 830nm long-pass filter process. In some embodiments, a 785nm~1064nm long-pass filter process can also be used to complete the entire slit processing process.
[0033] The above preparation methods are common technical means in this field.
[0034] Example 3
[0035] like Figure 7-Figure 8 A miniature wearable blood glucose monitoring device uses two light sources 101 to simultaneously emit linear excitation light, which penetrates the epidermis and excites glucose molecules in the interstitial fluid of the dermis to generate Raman signals. The Raman signals are received by slit 102, where they are filtered out of other unwanted stray light, such as Rayleigh scattering. After convergence through lens 110, the Raman signals are coupled into the waveguide chip via a wide-bandwidth grating coupler 501. They then pass through a tapered waveguide 502 and enter the first slab waveguide 503-1. After being split by an array waveguide 504, light of the same wavelength interferes and enters the output waveguide array 505. After passing through a second slab waveguide 503-2, they are received by an array detector 506. The array detector 506 is a photodiode array. In some embodiments, a linear array CCD detector or a CMOS image sensor can also be used.
[0036] like Figure 9 In (a), in this embodiment, the output waveguide 505 and the array detector 506 are installed in a parallel arrangement and directly coupled, and are installed by dispensing optical glue; in some embodiments, they can also be Figure 9 In the reflection coupling type (b) or (c), the reflection efficiency is improved by etching the reflector 510 on the chip surface and evaporating a metal film such as gold or silver on the reflector 510. The arrangement of the reflection coupling type can be Figure 9 The parallel arrangement of (b) can also be Figure 9 (c) is arranged in a stepped manner.
[0037] This application uses an integrated Raman probe and semiconductor processing technology, which greatly reduces the complexity and volume of the monitoring device, making it easier for patients to wear.
[0038] Example 4
[0039] The present application discloses a micro wearable blood glucose monitoring device, and its use method is as follows: like Figure 10-12 When the information processing unit 106 performs blood glucose prediction, it must first establish a blood glucose regression model 604, that is, it is necessary to collect the blood glucose label value at the corresponding moment while acquiring the spectrum through this device. The blood glucose label value selected in this solution is the venous blood glucose value, or it can be the fingertip blood glucose value. The number of spectra N collected to establish the regression model and the number of blood glucose label values N need to correspond one to one. The number N can be 1000, 2000, 5000, 8000, etc., and this embodiment uses 5000. After the regression model 604 is established, it is stored in the information processing unit 106. During user testing, spectral data 601 is collected, and after spectral preprocessing 602 and feature selection 603, it is input into the regression model 604 to predict the blood glucose value 607. It should be noted that if the regression model 604 establishment process has not been performed on the current device, the regression model 604 establishment process needs to be executed before predicting blood glucose.
[0040] Establishing the regression model 604 primarily involves three steps: spectral data acquisition 601, spectral preprocessing 602, and feature selection 603. The establishment of the blood glucose regression model 604 requires the simultaneous input of the corresponding blood glucose label value at the time the spectrum was acquired. Spectral preprocessing 602 includes spectral intensity normalization 701, spectral baseline removal 702, and spectral quality assessment 703.
[0041] The spectral intensity normalization 701 is for any spectral signal ,in Represents the spectral intensity corresponding to the mth wave number, and is obtained by mean normalization ; The spectral baseline removal 702 is calculated using the Neighbor adjusted mean filtering method. The low-frequency component , is the optimal mean filter radius centered on the mth wave number obtained by collecting spectral data 601, and As the characteristic spectrum after removing the baseline, in order to avoid The minimum value in is used as the denominator in the subsequent ratio calculation, and all eigenvalues can be added with 1; Spectral quality evaluation 703 for the characteristic spectrum after baseline removal The M peak response values in the spectrum 601 can be combined into M·(M-1) / 2 pairs of combinations. For each pair of combinations, the peak response ratio of the combination in the spectral data obtained by collecting spectral data 601 is calculated. The 95% interval with the densest distribution (the smallest interval span) is used as the valid ratio interval. It is recorded whether the peak response ratio of the combination in the current spectrum falls within the valid ratio interval. If more than 95% of the peak response ratios of the M·(M-1) / 2 combinations of the current spectrum fall within the corresponding valid ratio interval, the spectrum is considered to be of qualified quality.
[0042] The process of feature selection 603 and regression model establishment 604 in this embodiment is as follows: Feature selection 603 is based on the spectral data obtained from the collected spectral data 601 and the corresponding blood glucose label value. That is, each spectrum and each corresponding blood glucose calibration label constitute a calibration sample pair, and the total number of pairs is N: a. For any pair of M·(M-1) / 2 peak combinations, calculate the peak response ratio of each historical spectrum after preprocessing according to steps 701, 702, and 703 to obtain a characteristic sequence of length N. ; b. Calculate the current feature sequence A sequence of blood glucose label values of the same length N Spearman correlation coefficient of ; Repeat steps a and b for all calibration sample pairs to obtain a feature correlation sequence of length M·(M-1) / 2 ; Each component C of C j (j=1,2,...,M·(M-1) / 2) Definition: The jth pair in the M·(M-1) / 2 peak response combinations is selected from the N-row and M-column matrix consisting of the N spectra {X^1,...,X^N} preprocessed in steps 701, 702, and 703. j-1 ,m j-2} columns, forming a peak response ratio sequence F (length N), Cj That is, the correlation coefficient between F and the blood glucose label value G (length is also N), so we can select the K components with the highest absolute values from C and record their serial numbers in the sequence 1, 2, ..., M·(M-1) / 2; Peak response combination: M peak response values, two-by-two combinations can produce M·(M-1) / 2 pairs of combinations, each pair can be represented by the serial numbers of the two peaks {m j-1 ,m j-2}, where j=1,2,...,M·(M-1) / 2, m j-1 = 1,2,...,M,m j-2 = 1,2,...,M,m j-1 ≠m j-2 Obviously, each peak response combination corresponds to two components of X^ in the output X^ of the spectral baseline removal 702, and the ratio of these two components is the peak response ratio corresponding to the peak response combination; d. Select K peak pairs with the highest absolute value of correlation coefficient from correlation sequence C. ; e. For any pair of K peak combinations, collect the corresponding characteristic sequence in the spectrum is the independent variable, a sequence of blood glucose label values To regress the target quantity, the least squares method is used to calculate the Sigmoid regression parameters : ; f. and Write to the local file and build the regression model 604.
[0043] The blood sugar prediction process is as follows: The user touches the display screen 107 to trigger the detection, and the information processing unit 106 starts the information processing process, collecting spectral data 802 from the user's wrist. Spectral preprocessing 803 and feature selection 804 are performed. The method for collecting spectral data 802 is the same as the method for collecting spectral data 601. The method for spectral preprocessing 803 is the same as the method for spectral preprocessing 602. The method for feature selection 804 is the same as the method for feature selection 603. The regression model 805 is the regression model 604. Then, for the current spectrum to be predicted, , read the local file output from steps d to f in the previous section, and calculate the peak response ratio of each pair of combinations based on the K pairs of peak combinations recorded in the file , call the corresponding regression parameters , and obtain the single-feature blood glucose prediction value: ; Predict values for K single features , take the average as the final blood glucose prediction value, and finally display the blood glucose value on the touch screen 107.
[0044] The above method is only an example of the use of the device of the present application. Those skilled in the art may also use other different processing methods and processes to obtain blood glucose values. The hardware of the device of the present application has the ability to execute different processing methods and processes to obtain blood glucose values.
[0045] The above description is merely a preferred embodiment of the present invention and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as above in terms of a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can, without departing from the scope of the technical solution of the present invention, make some changes or modifications to equivalent embodiments using the technical contents disclosed above. However, any brief modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.
Claims
1. A micro wearable blood glucose monitoring device, characterized in that: It includes a first part and a second part connected in series by two straps to form a ring; The first part includes an integrated Raman probe, which includes two light sources and a slit for generating a line spot. The two light sources are respectively arranged on either side of the slit, and emit excitation light to the skin tissue through the slit to generate a Raman signal. The slit has a long-pass filter for filtering out Rayleigh scattering and other stray light and autofluorescence. The probe also has a micro-spectrometer for performing spectroscopic analysis and detection of the Raman signal. The second part includes an information processing unit for driving and controlling the light source and the micro-spectrometer and for online analysis of micro-glucose, a touch screen display for reading and displaying blood glucose values, and a battery module for supplying power to the integrated Raman probe, the information processing unit, and the touch screen display; The watch strap has a data line for transmitting data and a power line for supplying power.
2. The device according to claim 1, characterized in that The light source is a horizontal cavity surface emitting laser or a vertical cavity surface emitting laser array.
3. The device according to claim 1, characterized in that The central wavelength of the light source is 808-976 nm, and the line width is ≥0.1 nm.
4. The device according to claim 1, characterized in that The width direction of the slit is the direction from one light source to another, and the width is 25~200um; the thickness direction of the slit is the direction perpendicular to the skin tissue, and the thickness is 0.1~2mm; the height direction of the slit is perpendicular to both the width and height, and the height is 0.6~2mm; the back of the slit is coated with a long-pass filter for filtering out Rayleigh scattering and other scattered light and fluorescent background. The side of the slit close to the skin tissue is the front side, and the other side is the back side.
5. The device according to claim 1, characterized in that The distance between the center of the light source and the center of the slit is 0.5 mm to 2 mm.
6. The device according to claim 1, characterized in that The slit is an air slit or a solid slit.
7. The device according to claim 6, characterized in that The air slit is manufactured by the following steps: First, the glass substrate or quartz substrate is cleaned, and then the light-shielding film is deposited. After the light-shielding film is deposited, the photoresist is spin-coated on the light-shielding film. After the coating process is completed, the pre-baking process is performed. Then, the photolithography process begins, and ultraviolet light is irradiated on the mask to complete the pattern transfer. After the photolithography process is completed, the development and hardening processes are carried out, and then the size of the slit is transferred from the mask to the light-shielding film. After the degumming process, the slit is cleaned. After cleaning, the long-pass filter film layer is deposited on the back of the glass substrate or quartz substrate to complete the entire slit processing process.
8. The device according to claim 6, characterized in that The solid slit is manufactured by the following steps: First, the glass substrate or quartz substrate is cleaned, and then the light-shielding film is deposited. After the light-shielding film is deposited, the photoresist is spin-coated on the light-shielding film. After the coating process is completed, the pre-baking process is performed. Then, the photolithography process begins, and ultraviolet light is irradiated on the mask to complete the pattern transfer. After the photolithography process is completed, the development and hardening processes are carried out, and then the size of the slit is transferred from the mask to the light-shielding film, the photoresist on the slit surface is removed, and a high refractive index film layer is deposited; After coating, the CMP process is used for grinding to remove excess film layers on the surface. After grinding, it is cleaned to remove grinding fluid and impurities. After cleaning, the long-pass filter film layer is deposited on the back of the glass substrate or quartz substrate to complete the entire slit processing process.
9. The device according to claim 1, characterized in that The micro-spectrometer comprises a collimating lens, a transmission grating, a converging lens group and a detector which are sequentially arranged along the propagation direction of the Raman signal.
10. The device according to claim 9, characterized in that The detector is a near-infrared enhanced CCD or a near-infrared enhanced CMOS sensor.
11. The device according to claim 9, characterized in that The transmission grating is a volume holographic grating or a quartz transmission grating.
12. The device according to claim 1, characterized in that The micro-spectrometer includes a lens and a chip-type micro-spectrometer arranged in sequence along the propagation direction of the Raman signal. The chip-type micro-spectrometer includes a wide-bandwidth grating coupler, a tapered waveguide, a first slab waveguide, an arrayed waveguide, a second slab waveguide, an output waveguide array, and an array detector arranged in sequence along the propagation direction of the Raman signal.
13. The device according to claim 12, characterized in that The coupling structure of the output waveguide array and the array detector includes a direct coupling type in parallel arrangement, a reflection coupling type in parallel arrangement and a reflection coupling type in stepped arrangement.
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