Processing liquid supply apparatus, processing liquid supply method, and storage medium

Abstract

The invention provides a processing liquid supply apparatus, a processing liquid supply method, and a storage medium. A processing liquid supply apparatus that supplies a processing liquid to a discharge unit that discharges the processing liquid to a substrate includes: a supply line that is connected to the discharge unit; a diaphragm pump which is provided in the supply line and which pressurizes and conveys the processing liquid to the discharge unit; and a control unit that performs control so as to execute: a normal operation including a discharge operation in which the processing liquid is discharged from the discharge unit by pressurized conveyance of the processing liquid in the pump chamber of the diaphragm pump, and a replenishment operation in which the processing liquid is replenished to the pump chamber before and after the discharge operation; and a cleaning operation for cleaning the inside of the pump chamber, the cleaning operation including: a cleaning supplement operation for supplying the processing liquid to the pump chamber such that the amount of the processing liquid in the pump chamber is greater than the maximum amount in the pump chamber during the normal operation; and a cleaning discharge operation of discharging the processing liquid from the pump chamber so that the amount of the processing liquid in the pump chamber is less than the minimum amount in the pump chamber during the normal operation.

Description

Technical Field

[0001] The present disclosure relates to a treatment liquid supply device, a treatment liquid supply method, and a storage medium. Background Art

[0002] Patent Document 1 discloses a liquid processing apparatus that supplies a processing liquid from a processing liquid supply source to a substrate using a diaphragm pump from a supply portion at a downstream end of a supply path included in a flow path system.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 2021-163952 Summary of the Invention

[0006] Problems to be solved by the invention

[0007] The technology according to the present disclosure improves the ability to clean a diaphragm pump for pressurizing and feeding the treatment liquid to a discharge portion in a treatment liquid supply device that supplies the treatment liquid to the discharge portion.

[0008] Solutions for solving problems

[0009] One embodiment of the present disclosure is a processing liquid supply device that supplies the processing liquid to a spraying part for spraying the processing liquid onto a substrate, the processing liquid supply device comprising: a supply pipeline connected to the spraying part; a diaphragm pump, which is arranged in the supply pipeline and pressurizes and delivers the processing liquid to the spraying part; and a control part, wherein the control part controls to perform the following actions: a normal action, including a spraying action and a replenishing action, in which the processing liquid is sprayed from the spraying part by pressurizing the processing liquid in the pump chamber of the diaphragm pump, and in which the processing liquid is replenished to the pump chamber before and after the spraying action; and a cleaning action, which cleans the pump chamber, the cleaning action including the following actions: a cleaning replenishing action, which supplies the processing liquid to the pump chamber so that the amount of the processing liquid in the pump chamber is more than the maximum amount in the pump chamber during the normal action; and a cleaning discharge action, which discharges the processing liquid from the pump chamber so that the amount of the processing liquid in the pump chamber is less than the minimum amount in the pump chamber during the normal action.

[0010] Effects of the Invention

[0011] According to the present disclosure, in a treatment liquid supply device that supplies treatment liquid to a treatment liquid discharge portion, it is possible to improve the ability to clean a diaphragm pump for pressurizing and feeding the treatment liquid to the discharge portion. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is an explanatory diagram schematically showing the structure of the processing liquid supply device according to this embodiment.

[0013] Figure 2 This is a diagram showing the state of the processing liquid supply device during the discharge operation in normal operation.

[0014] Figure 3 It is a diagram showing the state of the processing liquid supply device during the replenishment operation of the normal operation.

[0015] Figure 4 It is a diagram showing the state of the processing liquid supply device during the replenishment operation for cleaning.

[0016] Figure 5 It is a diagram showing the state of the processing liquid supply device during the cleaning discharge operation.

[0017] Figure 6 It is a diagram showing another example of the position of the foreign object detection unit.

[0018] Figure 7 It is a diagram for explaining another example of the cleaning operation. DETAILED DESCRIPTION

[0019] In the photolithography process of manufacturing semiconductor devices, a coating liquid such as a resist solution is used to form coating films such as an anti-reflective film and a resist film on a semiconductor wafer (hereinafter referred to as a "wafer") serving as a substrate. Furthermore, in the photolithography process, not only the coating liquid used to form the coating film but also a developer, rinse solution, and the like are used as processing liquids for the wafer.

[0020] In a process using a treatment liquid, for example, the treatment liquid is ejected from a nozzle onto a wafer held on a rotating holding plate. The treatment liquid ejected from the nozzle is supplied to the nozzle from a treatment liquid supply source via a pump. Specifically, the treatment liquid in the supply source is temporarily stored in the pump and then supplied to the nozzle through pressurized delivery by the pump. Diaphragm pumps are widely used as pumps for pressurized delivery of treatment liquid.

[0021] Furthermore, the cleanliness of the treatment liquid within the diaphragm pump may sometimes decrease. Specifically, the cleanliness of the treatment liquid within the pump chamber of the diaphragm pump, which stores the treatment liquid, may sometimes decrease. When this cleanliness decreases, the treatment liquid is passed through the diaphragm pump. However, conventional methods of passing the treatment liquid through the diaphragm pump require a large amount of treatment liquid to achieve the desired cleanliness level.

[0022] Therefore, the technology disclosed herein improves the ability to clean a diaphragm pump.

[0023] Hereinafter, the structure of the processing liquid supply device according to the present embodiment will be described with reference to the accompanying drawings. In addition, in this specification, the same reference numerals are given to elements having substantially the same functional structure, and redundant descriptions are omitted.

[0024] <Coating and developing device>

[0025] Figure 1 It is an explanatory diagram schematically showing the structure of the processing liquid supply device according to this embodiment.

[0026] Figure 1 The processing liquid supply device 100 supplies the processing liquid to the discharge nozzle 1 as the discharge portion. The number of the discharge nozzles to which the processing liquid supply device 100 supplies the processing liquid may be plural.

[0027] The discharge nozzle 1 discharges a processing liquid onto a wafer W serving as a substrate. Specifically, the discharge nozzle 1 discharges the processing liquid onto the wafer W held by a rotating holding disk 2 serving as a holding portion. In this embodiment, the processing liquid supplied by the processing liquid supply device 100 and discharged from the discharge nozzle 1 is a developer, but may also be another type of processing liquid such as a snow solvent.

[0028] The processing liquid supply device 100 includes a supply line 150 connected to the discharge nozzle 1. The supply line 150 is connected to the discharge nozzle 1 at its downstream end and to the developer source 101 at its upstream end, for example.

[0029] The developer source 101 is a liquid supply source storing developer. On the downstream side of the developer source in the supply line 150, an electropneumatic regulator 111 for pressure adjustment and an on-off valve V1 are provided in this order from the upstream side.

[0030] Diaphragm pumps 102a and 102b are also installed in parallel in the supply line 150. Specifically, the downstream side of the on-off valve V1 in the supply line 150 branches into branch lines 151a and 151b. Diaphragm pump 102a is installed in branch line 151a, and diaphragm pump 102b is installed in branch line 151b. More specifically, the pump chamber 13 of diaphragm pump 102b, described below, is installed in each of branch lines 151a and 151b.

[0031] Furthermore, the downstream ends of the branch lines 151a and 151b merge with each other.

[0032] Diaphragm pumps 102a and 102b each include a housing 11 having a cavity therein and a flexible diaphragm 12 that partitions the cavity of housing 11. Housing 11 and diaphragm 12 define a pump chamber 13 and a working chamber 14, which are separated by diaphragm 12.

[0033] The pump chamber 13 temporarily stores the developer. In addition to being connected to branch pipes 151a and 151b, the pump chamber 13 is also connected to drain pipes 155a and 155b. These drain pipes 155a and 155b are used to discharge the developer in the pump chamber 13 without passing through the ejection nozzle 1. The drain pipes 155a and 155b are provided with on-off valves V11a and V11b, respectively.

[0034] The working chamber 14 operates to deliver the developer from the pump chamber 13 and to suck the developer into the pump chamber 13. The working chamber 14 is connected to the supply and exhaust mechanism 120, which is capable of supplying and sucking a working fluid such as nitrogen, via supply and exhaust pipes 161a and 161b. Opening and closing valves V21a and V21b are provided in the supply and exhaust pipes 161a and 161b, respectively.

[0035] In addition, an on-off valve V2a is provided on the upstream side of the diaphragm pump 102a in the branch line 151a, and an on-off valve V3a is provided on the downstream side.

[0036] Similarly, an on-off valve V2b is provided on the upstream side of the diaphragm pump 102b in the branch line 151b, and an on-off valve V3b is provided on the downstream side.

[0037] Furthermore, the branch lines 151 a and 151 b in the supply line 150 are provided with a filter 103 and a constant pressure valve 104 . Specifically, the filter 103 and the constant pressure valve 104 are provided in this order from the upstream side.

[0038] The filter 103 filters the developer to remove particles, that is, foreign matter. Specifically, the filter 103 filters the developer delivered from the pumps 102a and 102b to remove foreign matter in the developer.

[0039] The opening degree of the constant pressure valve 104 is adjusted so that the pressure on the secondary side of the constant pressure valve 104 becomes a predetermined pressure.

[0040] In addition, an on-off valve V4 is provided on the downstream side of the filter 103 and the constant pressure valve 104 in the supply line 150 .

[0041] Furthermore, a foreign matter detector 105 is provided in the supply line 150 for detecting foreign matter in the developer flowing through the supply line 150. The foreign matter detector 105 is provided, for example, downstream of the filter 103. In the example shown in the figure, the foreign matter detector 105 is provided in the supply line 150 between the constant pressure valve 104 and the on-off valve V4.

[0042] like Figure 1As shown, at least one control unit M is provided in the above-mentioned treatment liquid supply device 100. The control unit M processes computer-executable commands that enable the treatment liquid supply device 100 to perform the various processes described in the present disclosure. The control unit M can be configured to control the various elements of the treatment liquid supply device 100 to perform the various processes described herein. In one embodiment, part or all of the control unit M may also be included in the treatment liquid supply device 100. The control unit M may include a processing unit, a storage unit, and a communication interface. The control unit M is implemented, for example, by a computer. The processing unit can be configured to perform various control actions by reading a program from the storage unit and executing the read program, and the program provides logic or routines that can perform various control actions. The program can be stored in the storage unit in advance, or it can be obtained via a medium when necessary. The obtained program is stored in the storage unit, and is read out from the storage unit and executed by the processing unit. The medium can be various storage media that can be read by a computer, or it can be a communication line connected to a communication interface. The storage medium can be a transient storage medium or a non-transient storage medium. The processing unit may be a CPU (Central Processing Unit) or one or more circuits. The storage unit may include RAM (Random Access Memory), ROM (Read Only Memory), HDD (Hard Disk Drive), SSD (Solid State Drive), or a combination thereof. The communication interface may communicate with the treatment liquid supply device 100 via a communication line such as a LAN (Local Area Network).

[0043] Each valve provided in the processing liquid supply device 100 uses a solenoid valve or a pneumatic valve that can be controlled by the control unit M, and each valve is electrically connected to the control unit M. In addition, the control unit M is electrically connected to the pumps 102a and 102b. With this structure, a series of processes in the processing liquid supply device 100 can be automatically performed under the control of the control unit M.

[0044] The control unit 24 is also connected to the foreign object detection unit 105. Therefore, the control unit 24 can perform control based on the detection result of the foreign object detection unit.

[0045] <Normal Operation of Processing Liquid Supply Device 100>

[0046] Then, based on Figure 2 and Figure 3 Next, a normal operation of the processing liquid supply device 100 will be described.

[0047] Normal operations of the processing liquid supply device 100 include a discharge operation and a replenishment operation. Figure 2and Figure 3 The figures show the states of the processing liquid supply device 100 during the ejection operation and the replenishment operation respectively. Figure 2 and Figure 3 and the following Figure 4 and Figure 5 In the figure, valves in the open state are indicated by white, valves in the closed state are indicated by black, and pipes through which the developer or working fluid flows are indicated by thick lines, and the opening and closing states of other valves are omitted as appropriate. In addition, it is assumed that the supply pipe 150 is pre-filled with the developer before the discharge operation.

[0048] Furthermore, the normal operation of the processing liquid supply device 100 may include detection of foreign matter in the developer by the foreign matter detector 105 .

[0049] <Spraying action>

[0050] The discharge operation is an operation of discharging the processing liquid from the discharge nozzle 1 by pressurizing and feeding the developing liquid in the pump chamber 13 of the diaphragm pump 102 a or the diaphragm pump 102 b .

[0051] In the treatment liquid supply device 100 during the discharge operation by the diaphragm pump 102a, as shown in FIG. Figure 2 As shown, for example, while on-off valves V2a and V11a are closed, on-off valves V3a and V4 are opened. Furthermore, on-off valves V2b, V3b, V11b, and V21b associated with diaphragm pump 102b are all closed. In this state, working fluid is supplied from supply and exhaust mechanism 120 at a predetermined pressure P1 to working chamber 14 of diaphragm pump 102a, pressurizing pump chamber 13 of pump 102a.

[0052] As a result, the developer in the diaphragm pump 102 a is delivered, and as a result, the developer on the downstream side of the diaphragm pump 102 a that is filled in the supply line 150 is squeezed out and supplied to the discharge nozzle 1 , and is discharged from the discharge nozzle 1 .

[0053] The discharge operation performed by the diaphragm pump 102b is the same as the discharge operation performed by the diaphragm pump 102a.

[0054] <Supplement>

[0055] The replenishment operation is an operation of replenishing the developer into the pump chamber 13 of the diaphragm pump 102 a or the diaphragm pump 102 b before or after the discharge operation.

[0056] The diaphragm pump 102a is refilled when the amount of developer in the pump chamber 13 of the diaphragm pump 102a falls below a predetermined minimum amount Vmin after normal discharge. Specifically, the diaphragm pump 102a is refilled when, for example, a sensor (not shown) detects proximity between the surface of the diaphragm 12 of the diaphragm pump 102a on the pump chamber 13 side and the housing 11 after normal discharge. The sensor is, for example, an optical sensor, and is controlled by the control unit M, which also outputs the sensor's detection results.

[0057] In the treatment liquid supply device 100 during the replenishment operation of the diaphragm pump 102a, as shown in FIG. Figure 3 As shown, for example, while on-off valves V3a and V11a are closed, on-off valves V1 and V2a are opened. Furthermore, on-off valves V2b, V3b, V11b, and V21b associated with diaphragm pump 102b are all closed. In this state, the working chamber 14 of diaphragm pump 102a is exhausted at a predetermined exhaust pressure P2 by the air supply and exhaust mechanism 120, while developer is supplied from developer source 101 at a predetermined pressure P3 via electropneumatic regulator 111.

[0058] Thus, the developer is replenished into the pump chamber 13 of the diaphragm pump 102 a at a pressure of P2 + P3 .

[0059] The exhaust mechanism 120 exhausts the pump chamber 13 and supplies developer from the developer source 101 until the developer volume in the pump chamber 13 reaches a predetermined maximum volume Vmax. Specifically, the exhaust and supply are continued until a sensor (not shown) detects the proximity of the surface of the diaphragm 12 of the diaphragm pump 102a on the working chamber 14 side to the housing 11. The sensor is, for example, an optical sensor, and is controlled by the control unit M, which also outputs the sensor's detection results.

[0060] The replenishment operation for the diaphragm pump 102b is the same as the replenishment operation for the diaphragm pump 102a.

[0061] Furthermore, the diaphragm pump 102b performs a discharge operation during a replenishment operation for the diaphragm pump 102a, and the diaphragm pump 102a performs a discharge operation during a replenishment operation for the diaphragm pump 102b. In this manner, the diaphragm pumps 102a and 102b are switched and used during the discharge operation.

[0062] <Cleaning Operation of Processing Liquid Supply Device 100>

[0063] Next, based on Figure 4 and Figure 5 The cleaning operation of the processing liquid supply device 100 will be described.

[0064] The cleaning operation of the processing liquid supply device 100 includes a cleaning replenishment operation and a cleaning discharge operation. Figure 4 and Figure 5 These are views showing the states of the processing liquid supply device 100 during a replenishing operation for cleaning and a discharging operation for cleaning, respectively.

[0065] The cleaning operation of the processing liquid supply device 100 is initiated based on the detection results of the foreign matter detection unit 105. Specifically, the cleaning operation of the processing liquid supply device 100 is initiated when the number of foreign matter in the developer calculated based on the detection results of the foreign matter detection unit 105 exceeds a predetermined value. More specifically, the cleaning operation of the processing liquid supply device 100 is initiated when the number of foreign matter in the developer calculated based on the detection results of the foreign matter detection unit 105, which is set to detect foreign matter with a predetermined particle size or larger, exceeds a predetermined value.

[0066] The cleaning replenishment operation and the cleaning discharge operation are performed alternately multiple times during the cleaning operation of the processing liquid supply device 100. However, the cleaning replenishment operation and the cleaning discharge operation may be performed only once each during the cleaning operation of the processing liquid supply device 100.

[0067] <Replenishing action for cleaning>

[0068] The replenishment operation for cleaning is an operation to supply developer to the pump chamber 13 so that the amount of developer in the pump chamber 13 of the diaphragm pump 102 a or 102 b becomes larger than the maximum amount Vmax in the pump chamber 13 during normal operation.

[0069] The replenishment operation for cleaning the diaphragm pump 102a is similar to the replenishment operation for the diaphragm pump 102a in the normal operation, for example. Figure 4 As shown, with on-off valves V3a and V11a closed, on-off valves V1 and V2a are opened. Furthermore, on-off valves V2b, V3b, V11b, and V21b associated with diaphragm pump 102b are all closed. In this state, the working chamber 14 of diaphragm pump 102a is exhausted at a predetermined exhaust pressure P2 by the air supply and exhaust mechanism 120, while developer is supplied from the developer source 101 at a predetermined pressure P3 via the electropneumatic regulator 111.

[0070] Thus, the developer is replenished into the pump chamber 13 of the diaphragm pump 102 a at a pressure of P2 + P3 .

[0071] However, during the cleaning and replenishing operation for diaphragm pump 102a, unlike the replenishing operation for diaphragm pump 102a during normal operation, exhaust from the pump chamber 13 by the supply and exhaust mechanism 120 and supply of developer from the developer source 101 are continued until the developer volume in the pump chamber 13 exceeds the maximum volume Vmax during normal operation. Specifically, for example, exhaust and supply are continued until the developer volume in the pump chamber 13 reaches the maximum volume VLmax, which is the structural limit of diaphragm pump 102a. More specifically, exhaust and supply are continued until a supply time corresponding to the maximum volume VLmax, which is the structural limit of diaphragm pump 102a, has elapsed. Furthermore, the structural limit of diaphragm pump 102a in this case refers to, for example, the substantially entire surface of diaphragm 12 on the working chamber 14 side being in close contact with housing 11.

[0072] The replenishment operation for cleaning of the diaphragm pump 102b is the same as the replenishment operation for cleaning of the diaphragm pump 102a.

[0073] <Cleaning Discharge Action>

[0074] The cleaning discharge operation is an operation of discharging the developer from the pump chamber 13 so that the amount of developer in the pump chamber 13 of the diaphragm pump 102 a or 102 b becomes smaller than the minimum amount Vmin in the pump chamber 13 during normal operation.

[0075] In the treatment liquid supply device 100 during the cleaning discharge operation of the diaphragm pump 102a, as shown in FIG. Figure 5 As shown, for example, while on-off valves V2a and V3a are closed, on-off valve V11a is opened. Furthermore, on-off valves V2b, V3b, V11b, and V21b associated with diaphragm pump 102b are all closed. In this state, working fluid is supplied from supply and exhaust mechanism 120 at a predetermined pressure P1 to working chamber 14 of diaphragm pump 102a, pressurizing pump chamber 13 of pump 102a.

[0076] Thus, the developer in the pump chamber 13 of the diaphragm pump 102a is discharged through the discharge pipe 155a. This discharge is continued until the amount of developer in the pump chamber 13 becomes less than the minimum amount Vmin during normal operation. Specifically, for example, the discharge is continued until the amount of developer in the pump chamber 13 reaches the minimum amount VLmin, which is the structural limit of the diaphragm pump 102a. More specifically, for example, the discharge is continued until the supply time corresponding to the minimum amount VLmin, which is the structural limit of the diaphragm pump 102a, has elapsed. In this case, the structural limit of the diaphragm pump 102a refers to, for example, the fact that substantially the entire surface of the diaphragm 12 on the pump chamber 13 side is in close contact with the housing 11.

[0077] The cleaning discharge operation for the diaphragm pump 102b is the same as the cleaning discharge operation for the diaphragm pump 102a.

[0078] <Main effects>

[0079] As a cleaning operation for cleaning the pump chamber of a diaphragm pump (hereinafter referred to as a "comparative cleaning operation"), which differs from the cleaning operation of the present embodiment, the following cleaning operation is available. Specifically, the comparative cleaning operation includes a replenishing operation to replenish the pump chamber to a maximum developer volume Vmax during normal operation, and a discharging operation to reduce the developer volume Vmin during normal operation by pressurizing the process liquid within the pump chamber. In contrast, the cleaning operation for cleaning the pump chamber 13 of the diaphragm pump 102a, etc., of the present embodiment includes a replenishing operation for cleaning to increase the developer volume within the pump chamber 13 to a maximum of Vmax during normal operation, and a discharging operation for cleaning to reduce the developer volume Vmin during normal operation. During the replenishing operation for cleaning, a larger amount of developer is filled into the pump chamber 13 upon completion than during the replenishing operation in the comparative cleaning operation, causing the diaphragm 12 that partitions the pump chamber 13 to expand. Therefore, foreign matter remaining near the end of the diaphragm 12 connected to the housing 11 can be washed out. Furthermore, during the cleaning discharge operation, compared to the discharge operation in the comparative cleaning operation, it is possible to suppress the developer solution that may contain foreign matter from remaining in the pump chamber 13 upon completion of the operation. Therefore, according to this embodiment, the ability to clean the diaphragm pump (specifically, the pump chamber of the diaphragm pump) can be improved.

[0080] (Other Examples of Positions of Foreign Object Detection Unit 105)

[0081] Figure 6 1 is a diagram showing another example of the position of the foreign object detection unit 105 .

[0082] In the above example, the foreign matter detector 105 is provided on the downstream side of the filter 103 in the supply line 150. Alternatively, the foreign matter detector 105 may be provided on the downstream side of the filter 103 in the supply line 150. Figure 6 As shown, the foreign matter detector 105 is provided on the upstream side of the filter 103 in the supply line 150. In this case, the foreign matter detector 105 is provided between the branch lines 151a, 151b and the filter 103 in the supply line 150, for example.

[0083] In this case, the following may also be adopted.

[0084] That is, the cleaning operation may include detection of foreign matter in the developer by the foreign matter detector 105 , and during the cleaning operation, the particle size of the foreign matter to be detected by the foreign matter detector 105 may be set larger than that during the normal operation.

[0085] Furthermore, the cleaning operation may be repeated until the number of foreign objects detected by the foreign object detector 105 falls below a predetermined value. Specifically, for example, each time a combination of a cleaning replenishment operation and a cleaning discharge operation is performed one or more times, an operation similar to the normal ejection operation is performed, during which foreign object detection by the foreign object detector 105 is performed. Furthermore, if the number of foreign objects detected at this time falls below a predetermined value, the cleaning operation may be terminated. If the number of foreign objects detected at this time does not fall below the predetermined value, the combination of a cleaning replenishment operation and a cleaning discharge operation may be performed again one or more times.

[0086] This can prevent the cleaning degree in the pump chamber 13 from falling below the target due to insufficient cleaning when the cleaning operation is completed, or prevent the developer and time from being wasted by continuing the cleaning operation even after the cleaning degree in the pump chamber 13 has reached the target.

[0087] In addition, through Figure 1 By providing the foreign matter detector 105 on the downstream side of the filter 103 as in the examples above, it is possible to use the foreign matter detector 105 to more accurately determine whether or not foreign matter is included in the developer discharged from the discharge nozzle 1 .

[0088] In addition, through Figure 6 By disposing the foreign matter detector 105 on the upstream side of the filter 103 as in the example of FIG. 1 , the foreign matter detector 105 can be used to more accurately determine whether the developer in the pump chamber 13 of the diaphragm pumps 102 a and 102 b contains foreign matter.

[0089] <Other Examples of Exhaust Pressure in Cleaning Supplement Operation>

[0090] In the above example, the exhaust pressure in the working chamber 14 generated by the supply and exhaust mechanism 120 during the replenishing cleaning operation is the same as the exhaust pressure during the replenishing normal operation, namely, P2. However, the exhaust pressure in the working chamber 14 generated by the supply and exhaust mechanism 120 during the replenishing cleaning operation can also be increased compared to the exhaust pressure during the replenishing normal operation. This increases the momentum of the developer flowing into the pump chamber 13 during the replenishing cleaning operation, thereby more reliably flushing out foreign matter trapped near the end of the diaphragm 12. Even if the exhaust pressure is increased only during the initial period of the replenishing cleaning operation, the same effect can be achieved as during the entire period.

[0091] Alternatively, the exhaust pressure of the working chamber 14 generated by the supply and exhaust mechanism 120 may be lowered during the final stage of the cleaning replenishment operation (for example, from the time the developer volume in the pump chamber 13 exceeds the maximum volume Vmax during normal operation). During the final stage of the cleaning replenishment operation, the diaphragm 12 contacts the shell 11. If the exhaust pressure of the working chamber 14 is high, the developer flowing into the pump chamber 13 has a strong momentum, causing the diaphragm 12 to move rapidly. Therefore, the impact caused by the contact is large, and there is a possibility that foreign matter will be generated and mixed into the developer due to the impact. Therefore, by lowering the exhaust pressure as described above, the movement of the diaphragm 12 is slowed, and the impact caused by the contact is reduced. Therefore, it is possible to suppress the generation and mixing of foreign matter into the developer due to the impact.

[0092] <Other Examples of Cleaning Operations>

[0093] Figure 7 It is a diagram for explaining another example of the cleaning operation.

[0094] As in this embodiment, multiple diaphragm pumps are provided. When these diaphragm pumps are used alternately during the normal discharge operation, the number of cleaning operations performed is, for example, equal among the diaphragm pumps. However, the number of cleaning operations performed may differ among the diaphragm pumps. In other words, a particular diaphragm pump may be prioritized for cleaning. In this case, the diaphragm pump to be cleaned is determined by the control unit 24, for example, as follows.

[0095] The control unit M determines whether a cleaning operation is necessary based on the detection results of the foreign matter detection unit 105. If it is determined to be necessary, the control unit M identifies the diaphragm pump 102a or 102b that is currently being supplied with the developer solution being detected as a foreign matter. To this end, the control unit M obtains the amount of developer solution discharged by the diaphragm pump used in the normal discharge operation after it was last switched, as well as identification information indicating the diaphragm pump 102a or 102b that was last switched. The developer solution amount and identification information can be obtained from the log information of the processing liquid supply device 100 stored in the storage unit (not shown). Then, based on the developer solution amount and identification information, the control unit M identifies the diaphragm pump that is being supplied with the developer solution being detected as a foreign matter.

[0096] For example, here, Figure 7As shown, assume that the piping volume L1 from the downstream end of branch lines 151a and 151b to foreign matter detector 105 is 400 ml, and the effective volume of diaphragm pumps 102a and 102b (the amount replenished during normal replenishment) is 200 ml. In this case, if the developer volume and the identification information are "50 ml" and "diaphragm pump 102a," the result is 400 (piping volume L1) - 50 (discharge volume after switching to diaphragm pump 102a) - 200 (effective volume of diaphragm pump 102b) = 150. Therefore, the developer for foreign matter detection is the remaining 150 ml of developer in diaphragm pump 102a.

[0097] Utilizing this, as described above, the control unit M identifies the diaphragm pump supplied with the developer, which is the target of foreign matter detection, based on the developer volume and the identification information. The control unit M then prioritizes the diaphragm pump for cleaning by selecting the identified diaphragm pump. Specifically, the control unit M prioritizes the diaphragm pump for cleaning based on the developer volume and the identification information.

[0098] By determining the diaphragm pump to be cleaned first and performing the cleaning operation first for this diaphragm pump as in this example, it is possible to efficiently use the developer and time for cleaning.

[0099] In the above example, the cleaning operation in the pump chamber 13 of the diaphragm pump 102a etc. includes both the cleaning replenishment operation and the cleaning discharge operation, but may also include only one of them. In this case, the ability to clean the diaphragm pump (specifically, the pump chamber of the diaphragm pump) can be improved.

[0100] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive. The embodiments described above may be omitted, replaced, or modified in various ways without departing from the scope of the appended claims and their intended meaning. For example, the constituent elements of the embodiments described above may be combined arbitrarily. Such arbitrary combinations can naturally achieve the effects and benefits of the various constituent elements involved in the combination, as well as other effects and benefits that would be apparent to those skilled in the art based on the description of this specification.

[0101] In addition, the effects described in this specification are merely illustrative or exemplary, and not restrictive. In other words, the technology involved in this disclosure can play other effects that those skilled in the art can clearly understand based on the description of this specification, as a supplement or replacement for the above-mentioned effects.

[0102] In addition, the following structural examples also belong to the technical scope of the present disclosure.

[0103] (1) A processing liquid supply device for supplying a processing liquid to a discharge portion for discharging the processing liquid onto a substrate, the processing liquid supply device comprising:

[0104] a supply pipeline connected to the ejection portion;

[0105] a diaphragm pump, disposed in the supply line, for pressurizing and delivering the treatment liquid to the ejection portion; and

[0106] Control Department,

[0107] The control unit controls to perform the following actions:

[0108] Normal operation includes a discharge operation and a replenishment operation, wherein the discharge operation discharges the treatment liquid from the discharge portion by pressurizing the treatment liquid in the pump chamber of the diaphragm pump, and the replenishment operation replenishes the treatment liquid to the pump chamber before and after the discharge operation; and

[0109] Cleaning action, cleaning the pump chamber,

[0110] The cleaning action includes at least one of the following actions:

[0111] a replenishing operation for cleaning, supplying the processing liquid to the pump chamber so that the amount of the processing liquid in the pump chamber is greater than the maximum amount in the pump chamber during the normal operation; and

[0112] The cleaning discharge operation discharges the processing liquid from the pump chamber so that the amount of the processing liquid in the pump chamber becomes smaller than the minimum amount in the pump chamber during the normal operation.

[0113] (2) The treatment liquid supply device described in (1), wherein:

[0114] The device further comprises a foreign matter detector, which is provided on the downstream side of the diaphragm pump in the supply line and is used to detect foreign matter contained in the treatment liquid in the supply line.

[0115] The control unit performs control based on a detection result of the foreign matter detection unit to execute the cleaning operation.

[0116] (3) The treatment liquid supply device described in (2), wherein:

[0117] A filter is further provided, the filter being arranged on the downstream side of the diaphragm pump in the supply line and configured to filter the treatment liquid.

[0118] The foreign matter detector is provided on the downstream side of the filter in the supply line.

[0119] (4) The treatment liquid supply device described in (2), wherein:

[0120] A filter is further provided, the filter being arranged on the downstream side of the diaphragm pump in the supply line and configured to filter the treatment liquid.

[0121] The foreign matter detector is provided on the upstream side of the filter in the supply line.

[0122] In the cleaning operation, the particle size of the foreign matter to be detected by the foreign matter detection unit is set to be larger than that in the normal operation.

[0123] The control unit controls to repeatedly execute the cleaning operation until the number of foreign objects detected by the foreign object detector becomes smaller than a predetermined value.

[0124] (5) The processing liquid supply device according to any one of (2) to (4), wherein:

[0125] A plurality of the diaphragm pumps are provided,

[0126] A plurality of the diaphragm pumps are connected in parallel and are switched for use during the ejection operation.

[0127] When the control unit determines that the cleaning action is necessary based on the detection result of the foreign matter detection unit, the control unit determines the diaphragm pump to be cleaned first by the cleaning action based on the amount of the treatment liquid ejected after the diaphragm pump used in the ejection action was last switched and information indicating the diaphragm pump after the last switching among the multiple diaphragm pumps.

[0128] (6) The processing liquid supply device according to any one of (1) to (5), wherein:

[0129] The pressure at which the working chamber of the diaphragm pump is exhausted during the cleaning replenishment operation is higher than the pressure at which the working chamber is exhausted during the replenishment operation.

[0130] (7) A processing liquid supply method, comprising: using a processing liquid supply device to supply the processing liquid to a discharge portion for discharging the processing liquid onto a substrate;

[0131] The treatment liquid supply device comprises:

[0132] a supply pipe connected to the ejection portion; and

[0133] a diaphragm pump, which is provided in the supply pipeline and pressurizes and delivers the treatment liquid to the ejection portion;

[0134] The treatment liquid supply method includes the following steps:

[0135] Step (A) comprises steps (a) and (b), wherein in step (a), the treatment liquid is ejected from the ejection portion by pressurizing the treatment liquid in the pump chamber of the diaphragm pump, and in step (b), the treatment liquid is replenished to the pump chamber before and after step (a); and

[0136] Step (B), cleaning the pump chamber,

[0137] The step (B) includes at least one of the following steps:

[0138] Step (m), supplying the treatment liquid to the pump chamber so that the amount of the treatment liquid in the pump chamber is greater than the maximum amount in the pump chamber in the step (A); and

[0139] Step (n) of discharging the treatment liquid from the pump chamber so that the amount of the treatment liquid in the pump chamber becomes smaller than the minimum amount in the pump chamber in step (A).

[0140] (8) The treatment liquid supply method described in (7), wherein:

[0141] The treatment liquid supply device further includes a foreign matter detector, which is provided on the downstream side of the diaphragm pump in the supply line and is used to detect foreign matter contained in the treatment liquid in the supply line.

[0142] In the processing liquid supply method, the step (B) is performed based on the detection result of the foreign matter detection unit.

[0143] (9) The treatment liquid supply method described in (8), wherein:

[0144] The treatment liquid supply device further includes a filter, which is provided on the downstream side of the diaphragm pump in the supply pipeline and is used to filter the treatment liquid.

[0145] The foreign matter detector is provided on the downstream side of the filter in the supply line.

[0146] (10) The treatment liquid supply method described in (8), wherein:

[0147] The treatment liquid supply device further includes a filter, which is provided on the downstream side of the diaphragm pump in the supply pipeline and is used to filter the treatment liquid.

[0148] The foreign matter detector is provided on the upstream side of the filter in the supply line.

[0149] In the step (B), the particle size of the foreign matter to be detected by the foreign matter detection unit is set to be larger than that in the step (A).

[0150] The step (B) is repeated until the number of foreign objects detected by the foreign object detection unit becomes smaller than a predetermined value.

[0151] (11) The treatment liquid supply method according to any one of (8) to (10), wherein:

[0152] The processing liquid supply device includes a plurality of the diaphragm pumps.

[0153] A plurality of the diaphragm pumps are arranged in parallel and are used in a switchable manner in the step (a).

[0154] When it is determined that the process (B) is necessary based on the detection result of the foreign matter detection unit, the diaphragm pump to be cleaned preferentially through the process (B) is determined based on the amount of the treatment liquid ejected after the diaphragm pump used in the process (a) was last switched and the information indicating the diaphragm pump after the last switching among the multiple diaphragm pumps.

[0155] (12) The treatment liquid supply method according to any one of (7) to (11), wherein:

[0156] The pressure at which the working chamber of the diaphragm pump is exhausted in the step (n) is higher than the pressure at which the working chamber is exhausted in the step (b).

[0157] (13) A computer-readable storage medium storing a program that operates on a computer of a control unit that controls the processing liquid supply device to execute the processing liquid supply method described in any one of (7) to (12) through the processing liquid supply device.

[0158] Description of Reference Numerals

[0159] 1: ejection nozzle; 13: pump chamber; 100: processing liquid supply device; 102a: diaphragm pump; 102b: diaphragm pump; 150: supply pipeline; M: control unit; W: wafer.

Claims

1. A processing liquid supply device for supplying a processing liquid to a discharge portion for discharging the processing liquid onto a substrate, the processing liquid supply device comprising: a supply pipeline connected to the ejection portion; a diaphragm pump, disposed in the supply line, for pressurizing and delivering the treatment liquid to the ejection portion; and Control Department, in, The control unit performs control to execute the following actions: Normal operation includes a discharge operation and a replenishment operation, wherein the discharge operation discharges the treatment liquid from the discharge portion by pressurizing the treatment liquid in the pump chamber of the diaphragm pump, and the replenishment operation replenishes the treatment liquid to the pump chamber before and after the discharge operation; and Cleaning action, cleaning the pump chamber, The cleaning action includes at least one of the following actions: a replenishing operation for cleaning, supplying the processing liquid to the pump chamber so that the amount of the processing liquid in the pump chamber is greater than the maximum amount in the pump chamber during the normal operation; as well as The cleaning discharge operation discharges the processing liquid from the pump chamber so that the amount of the processing liquid in the pump chamber becomes smaller than the minimum amount in the pump chamber during the normal operation.

2. The processing liquid supply device according to claim 1, wherein The device further comprises a foreign matter detector, which is provided on the downstream side of the diaphragm pump in the supply line and is used to detect foreign matter contained in the treatment liquid in the supply line. The control unit performs control based on a detection result of the foreign matter detection unit to execute the cleaning operation.

3. The processing liquid supply device according to claim 2, wherein: A filter is further provided, the filter being arranged on the downstream side of the diaphragm pump in the supply line and configured to filter the treatment liquid. The foreign matter detector is provided on the downstream side of the filter in the supply line.

4. The processing liquid supply device according to claim 2, wherein: A filter is further provided, the filter being arranged on the downstream side of the diaphragm pump in the supply line and configured to filter the treatment liquid. The foreign matter detector is provided on the upstream side of the filter in the supply line. In the cleaning operation, the particle size of the foreign matter to be detected by the foreign matter detection unit is set to be larger than that in the normal operation. The control unit controls to repeatedly execute the cleaning operation until the number of foreign objects detected by the foreign object detector becomes smaller than a predetermined value.

5. The processing liquid supply device according to any one of claims 2 to 4, wherein: A plurality of the diaphragm pumps are provided, A plurality of the diaphragm pumps are connected in parallel and are switched for use during the ejection operation. When the control unit determines that the cleaning action is necessary based on the detection result of the foreign matter detection unit, the control unit determines the diaphragm pump to be cleaned first by the cleaning action based on the amount of the treatment liquid ejected after the diaphragm pump used in the ejection action was last switched and information indicating the diaphragm pump after the last switching among the multiple diaphragm pumps.

6. The processing liquid supply device according to any one of claims 1 to 4, wherein: The pressure at which the working chamber of the diaphragm pump is exhausted during the cleaning replenishment operation is higher than the pressure at which the working chamber is exhausted during the replenishment operation.

7. A method for supplying a processing liquid, comprising: using a processing liquid supply device to supply the processing liquid to a discharge portion for discharging the processing liquid onto a substrate; The treatment liquid supply device comprises: a supply pipe connected to the ejection portion; and a diaphragm pump, which is provided in the supply pipeline and pressurizes and delivers the treatment liquid to the ejection portion; The treatment liquid supply method includes the following steps: Step (A) comprises steps (a) and (b), wherein in step (a), the treatment liquid is ejected from the ejection portion by pressurizing the treatment liquid in the pump chamber of the diaphragm pump, and in step (b), the treatment liquid is replenished to the pump chamber before and after step (a); and Step (B), cleaning the pump chamber, The step (B) includes at least one of the following steps: Step (m), supplying the treatment liquid to the pump chamber so that the amount of the treatment liquid in the pump chamber is greater than the maximum amount in the pump chamber in step (A); and Step (n) of discharging the treatment liquid from the pump chamber so that the amount of the treatment liquid in the pump chamber becomes smaller than the minimum amount in the pump chamber in step (A).

8. The processing liquid supply method according to claim 7, wherein: The treatment liquid supply device further includes a foreign matter detector, which is provided on the downstream side of the diaphragm pump in the supply line and is used to detect foreign matter contained in the treatment liquid in the supply line. In the processing liquid supply method, the step (B) is performed based on the detection result of the foreign matter detection unit.

9. The processing liquid supply method according to claim 8, wherein: The treatment liquid supply device further includes a filter, which is provided on the downstream side of the diaphragm pump in the supply pipeline and is used to filter the treatment liquid. The foreign matter detector is provided on the downstream side of the filter in the supply line.

10. The processing liquid supply method according to claim 8, wherein: The treatment liquid supply device further includes a filter, which is provided on the downstream side of the diaphragm pump in the supply pipeline and is used to filter the treatment liquid. The foreign matter detector is provided on the upstream side of the filter in the supply line. In the step (B), the particle size of the foreign matter to be detected by the foreign matter detection unit is set to be larger than that in the step (A). The step (B) is repeated until the number of foreign objects detected by the foreign object detection unit becomes smaller than a predetermined value.

11. The processing liquid supply method according to any one of claims 8 to 10, wherein: The processing liquid supply device includes a plurality of the diaphragm pumps. A plurality of the diaphragm pumps are arranged in parallel and are used in a switchable manner in the step (a). When it is determined that the process (B) is necessary based on the detection result of the foreign matter detection unit, the diaphragm pump to be cleaned preferentially through the process (B) is determined based on the amount of the treatment liquid ejected after the diaphragm pump used in the process (a) was last switched and the information indicating the diaphragm pump after the last switching among the multiple diaphragm pumps.

12. The processing liquid supply method according to any one of claims 7 to 10, wherein: The pressure at which the working chamber of the diaphragm pump is exhausted in the step (n) is higher than the pressure at which the working chamber is exhausted in the step (b).

13. A computer-readable storage medium storing a program, wherein the program is executed on a computer of a control unit that controls the processing liquid supply device so as to execute the processing liquid supply method according to any one of claims 7 to 10 through the processing liquid supply device.

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