A remote plasma reaction chamber and a remote plasma source system

Abstract

The present invention discloses a remote plasma reaction chamber and a remote plasma source system. The remote plasma reaction chamber includes: a first flange, the first flange includes an air inlet; an insulating tube, located on one side of the first flange, the inner cavity of the insulating tube is connected to the air inlet; a ring-shaped electrode, fixed to the outer wall side of the insulating tube; a metal shield, located on the outer wall side of the ring electrode away from the insulating tube, wherein the metal shield and the ring electrode are spaced apart, the metal shield is reused as the first electrode, and the ring electrode is reused as the second electrode, the ring electrode is used to receive the radio frequency energy output by the radio frequency power module, and the metal shield and the ring electrode are used to ionize the process gas in the insulating tube to generate plasma; a second flange, located on the side of the insulating tube away from the first flange, wherein the second flange includes an air outlet. The present invention provides a remote plasma reaction chamber and a remote plasma source system with a simple structure, a small size, and high reliability.

Description

Technical Field

[0001] The present invention relates to the field of plasma technology, and in particular to a remote plasma reaction chamber and a remote plasma source system. Background Art

[0002] Remote Plasma Sources (RPS) offer several significant advantages that have led to their widespread use in high-end etching equipment. First, remote plasma sources can reduce physical damage to the material surface. Because high-energy ions are filtered out before reaching the process chamber, this effectively reduces the physical damage caused by the plasma to the processed surface, thereby protecting the integrity of the material surface. Second, remote plasma sources are highly selective and suitable for complex structures. This allows them to excel in processing materials with complex structures, enabling precise control of the processing process and reducing misoperation and damage. Furthermore, remote plasma sources improve process uniformity. By optimizing the transmission and distribution of the plasma, the uniformity of the processing process is ensured, improving the overall processing quality.

[0003] Remote plasma source systems are typically used to generate plasma outside a process chamber and remotely supply it to the process chamber. While remote plasma source systems are typically used in semiconductor manufacturing processes such as cleaning processes within process chambers, they are also used in other semiconductor manufacturing processes.

[0004] Currently, remote plasma source systems have problems such as poor reliability, complex structure and large size. Summary of the Invention

[0005] The present invention provides a remote plasma reaction chamber and a remote plasma source system with simple structure, small volume and high reliability.

[0006] According to one aspect of the present invention, a remote plasma reaction chamber is provided, comprising:

[0007] a first flange, the first flange comprising an air inlet;

[0008] an insulating cylinder, located on one side of the first flange, wherein an inner cavity of the insulating cylinder is in communication with the air inlet;

[0009] a ring-shaped electrode fixed to the outer wall of the insulating cylinder;

[0010] a metal shielding cover, located on the outer wall side of the annular electrode away from the insulating cylinder, wherein the metal shielding cover is spaced apart from the annular electrode, the metal shielding cover is reused as a first electrode, and the annular electrode is reused as a second electrode, the annular electrode is used to receive radio frequency energy output by the radio frequency power module, and the metal shielding cover and the annular electrode are used to ionize the process gas in the insulating cylinder to generate plasma;

[0011] The second flange is located on a side of the insulating cylinder away from the first flange, wherein the second flange includes an air outlet, and the air outlet is communicated with the inner cavity of the insulating cylinder.

[0012] Optionally, the metal shield includes a first through hole;

[0013] The first through hole is used to accommodate a conductive structure electrically connecting the radio frequency power module and the ring electrode.

[0014] Optionally, the remote plasma reaction chamber provided in this embodiment further includes a plurality of first connection structures and a plurality of second connection structures;

[0015] The first connecting structure is used to fix the metal shield on the first flange;

[0016] The second connection structure is used to fix the metal shielding cover on the second flange.

[0017] Optionally, the remote plasma reaction chamber provided in this embodiment further includes a fixed structure;

[0018] The ring-shaped electrode includes a metal open ring, a first metal sheet and a second metal sheet;

[0019] The first metal sheet is integrally connected to the metal open ring, and the second metal sheet is integrally connected to the metal open ring;

[0020] The first metal sheet and the second metal sheet are located on both sides of the opening of the metal open ring;

[0021] The first metal sheet includes a fourth through hole, and the second metal sheet includes a fifth through hole;

[0022] The fixing structure passes through the fourth through hole and the fifth through hole to fix the ring-shaped electrode to the outer wall side of the insulating cylinder.

[0023] Optionally, the material of the fixing structure includes metal;

[0024] The fixing structure is electrically connected to the conductive structure.

[0025] Optionally, the diameter of the insulating cylinder ranges from 4 cm to 30 cm;

[0026] The diameter of the metal shield ranges from 10 cm to 60 cm;

[0027] The diameter of the insulating cylinder is smaller than the diameter of the metal shielding cover.

[0028] Optionally, the material of the first flange and the material of the second flange are both metal materials;

[0029] The insulating cylinder comprises ceramic or quartz;

[0030] The material of the ring electrode includes at least one of aluminum, copper, stainless steel and nickel;

[0031] The material of the metal shielding cover includes at least one of aluminum, copper, stainless steel and nickel.

[0032] Optionally, the first flange includes a first groove, and the second flange includes a second groove;

[0033] The bottom of the first groove is connected to the air inlet, and the side wall of the first groove contacts the partial area of ​​the insulating cylinder close to the first flange; the bottom of the second groove is connected to the air outlet, and the side wall of the second groove contacts the partial area of ​​the insulating cylinder close to the second flange.

[0034] According to another aspect of the present invention, this embodiment provides a remote plasma source system, the remote plasma source system comprising a radio frequency power supply module, an impedance matching module, and a remote plasma reaction chamber provided by any embodiment of the present invention;

[0035] The impedance matching module is connected between the radio frequency power supply module and the annular electrode in the remote plasma reaction chamber;

[0036] The RF power supply module is used to adjust the output frequency of the RF power supply module so that the reverse power is less than the set threshold when the reverse power in the remote plasma source system exceeds the set threshold.

[0037] Optionally, the impedance matching module includes an impedance matching unit, a protective cover and at least one heat dissipation unit;

[0038] The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover;

[0039] The first end of the impedance matching unit is electrically connected to the RF power supply module, and the second end of the impedance matching unit is electrically connected to the ring electrode;

[0040] The protective cover is detachably connected to the remote plasma reaction chamber.

[0041] An embodiment of the present invention provides a remote plasma reaction chamber, in which the metal shield in the reaction chamber can be reused as a first electrode, and the ring electrode can be reused as a second electrode. The electric field generated between the metal shield and the ring electrode can ionize the process gas in the insulating tube into plasma. Therefore, there is no need to set up an additional capacitor structure for ionizing the process gas in the insulating tube, which can simplify the structure of the remote plasma reaction chamber, save the internal space of the insulating tube, and reduce the volume of the remote plasma reaction chamber. The embodiment of the present invention ionizes the process gas through the capacitor structure formed by the metal shield and the ring electrode, which can improve the uniformity of the plasma and improve the reliability of the ionized process gas. While the metal shield is reused as the first electrode, it also has the function of reducing the leakage of radio frequency energy. In summary, the remote plasma reaction chamber provided by the embodiment of the present invention has a simple structure, a small volume, and high reliability.

[0042] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present invention, nor is it intended to limit the scope of the present invention. Other features of the present invention will become readily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0044] Figure 1 2. This is a schematic structural diagram of a remote plasma reaction chamber without a metal shield provided in a first perspective according to an embodiment of the present invention;

[0045] Figure 2 2 is a schematic structural diagram of a remote plasma reaction chamber without a metal shield provided in a second perspective according to an embodiment of the present invention;

[0046] Figure 3 is a schematic diagram of the exploded structure of a remote plasma reaction chamber provided according to an embodiment of the present invention;

[0047] Figure 4 2 is a schematic structural diagram of a remote plasma reaction chamber system provided in an embodiment of the present invention;

[0048] Figure 5 2 is a schematic structural diagram of a remote plasma source system provided according to an embodiment of the present invention;

[0049] Figure 62 is a schematic structural diagram of another remote plasma source system provided according to an embodiment of the present invention;

[0050] Figure 7 yes Figure 6 Schematic diagram of the disassembled structure of the remote plasma source system shown. DETAILED DESCRIPTION

[0051] In order to enable those skilled in the art to better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0052] It should be noted that the terms "first", "second", etc. in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0053] Figure 1 1 is a schematic structural diagram of a remote plasma reaction chamber without a metal shield provided in a first perspective according to an embodiment of the present invention. Figure 2 1 is a schematic structural diagram of a remote plasma reaction chamber without a metal shield provided at a second viewing angle according to an embodiment of the present invention. The first viewing angle is different from the second viewing angle. Figure 3 is a schematic diagram of the decomposition structure of a remote plasma reaction chamber provided according to an embodiment of the present invention, with reference to Figure 1-Figure 3The remote plasma reaction chamber provided in this embodiment includes: a first flange 110, an insulating tube 120, an annular electrode 130, a metal shielding cover 140 and a second flange 150; the first flange 110 includes an air inlet 101; the insulating tube 120 is located on one side of the first flange 110, and the inner cavity of the insulating tube 120 is connected to the air inlet 101; the annular electrode 130 is fixed to the outer wall side of the insulating tube 120; the metal shielding cover 140 is located on the outer wall side of the annular electrode 130 away from the insulating tube 120, wherein the metal shielding cover 140 is disposed on the outer wall side of the annular electrode 130 away from the insulating tube 120. 40 is spaced apart from the annular electrode 130, the metal shielding cover 140 is reused as the first electrode, the annular electrode 130 is reused as the second electrode, the annular electrode 130 is used to receive the RF energy output by the RF power module, and the metal shielding cover 140 and the annular electrode 130 are used to ionize the process gas in the insulating tube 120 into plasma; the second flange 150 is located on the side of the insulating tube 120 away from the first flange 110, wherein the second flange 150 includes an air outlet 102, and the air outlet 102 is connected to the inner cavity of the insulating tube 120.

[0054] Specifically, the first flange 110 and the second flange 150 are used together to secure the insulating cylinder 120. The connection between the first flange 110 and the insulating cylinder 120 and the connection between the second flange 150 and the insulating cylinder 120 are both sealed. This arrangement prevents leakage of process gas and plasma within the insulating cylinder 120 from the connection. The material of the first flange 110 and the second flange 150 can both be metal. The material of the first flange 110 and the second flange 150 can be the same as the material of the metal shield 140.

[0055] The insulating cylinder 120, the ring electrode 130, and the metal shield 140 can all be hollow cylindrical. The ring electrode 130 can be secured to the outer wall of the insulating cylinder 120 by welding. The ring electrode 130 can also be a metal ring with an opening, secured to the outer wall of the insulating cylinder 120 by screws. The metal shield 140 can be fixedly connected to the first flange 110 and the second flange 150 by welding, or it can be removably connected to the first flange 110 and the second flange 150 by screws. The metal shield 140 can also include multiple heat dissipation holes.

[0056] In the height direction of the insulating tube 120 , the height of the metal shield 140 is greater than the height of the annular electrode 130 . The height of the annular electrode 130 may be half or one third of the height of the insulating tube 120 .

[0057] The remote plasma reaction chamber provided in this embodiment includes an air inlet 101 and an air outlet 102. The air inlet 101 is used to receive process gas, which may be argon or the like. The process gas enters the insulating tube 120. Since the metal shielding cover 140 is arranged around the annular electrode 130, when the annular electrode 130 receives the RF energy output by the RF power module, the annular electrode 130 and the metal shielding cover 140 can ionize the process gas into plasma. The plasma in the remote plasma reaction chamber can enter the pipeline through the air outlet 102 to clean the equipment to be cleaned, which may be a valve. For example, Figure 4 is a schematic structural diagram of a remote plasma reaction chamber system provided according to an embodiment of the present invention, with reference to Figure 4 The second flange of the remote plasma reaction chamber 100 can be connected to the CVD reaction chamber 200, the first flange of the remote plasma reaction chamber 100 can be connected to a pipeline, the other end of the pipeline is connected to the valve 300, the inner diameter of the insulating cylinder 120 can be consistent with the inner diameter of the gas path of the CVD reaction chamber 200, the CVD reaction chamber 200 inputs process gas into the insulating cylinder 120, and the insulating cylinder 120 serves as a plasma generation area. The generated plasma reacts with the deposits on the valve 300 to decompose the deposits, and the decomposed gaseous substances are extracted by the electronic pump 400 to achieve the purpose of cleaning.

[0058] The annular electrode 130 and metal shield 140 in this embodiment form a capacitor structure to ionize the process gas. This eliminates the need for a separate capacitor structure within the insulating tube 120, freeing up space within the insulating tube 120 and further miniaturizing the remote plasma reaction chamber. In this embodiment, the capacitor structure formed by the annular electrode 130 and metal shield 140 ionizes the process gas to generate plasma. This capacitor structure, under low-pressure conditions, produces relatively uniform plasma distribution, making it suitable for processes requiring uniform treatment over a large area.

[0059] The insulating tube 120 can be positioned adjacent to the outer wall of the annular electrode 130 without any gap. This maximizes the transmission of RF energy into the inner cavity of the insulating tube 120, generating a high-density plasma. The annular electrode 130 and the metal shield 140 are spaced apart and insulated from each other. The medium between the annular electrode 130 and the metal shield 140 can be air. In this embodiment, the metal shield 140 also serves to reduce RF energy leakage and lower spatial radiation.

[0060] The present embodiment provides a remote plasma reaction chamber, in which the metal shield in the reaction chamber can be reused as a first electrode, and the ring electrode can be reused as a second electrode. The electric field generated between the metal shield and the ring electrode can ionize the process gas in the insulating tube into plasma. Therefore, there is no need to set up an additional capacitor structure for ionizing the process gas in the insulating tube, which can simplify the structure of the remote plasma reaction chamber, save the internal space of the insulating tube, and reduce the volume of the remote plasma reaction chamber. The present embodiment ionizes the process gas through the capacitor structure formed by the metal shield and the ring electrode, which can improve the uniformity of the plasma and improve the reliability of the ionized process gas. While the metal shield is reused as the first electrode, it also has the function of reducing the leakage of radio frequency energy. In summary, the remote plasma reaction chamber provided by the present embodiment has a simple structure, a small volume, and high reliability.

[0061] Optional, continue to refer to Figure 3 The metal shielding cover 140 includes a first through hole 151 ; the first through hole 151 is used to accommodate a conductive structure electrically connecting the RF power module and the annular electrode 130 .

[0062] Specifically, since the annular electrode 130 is reused as the second electrode, it needs to be electrically connected to an RF power module, which can provide RF energy to the annular electrode 130. When the first electrode is grounded, the annular electrode 130 can transmit RF energy to the inner cavity of the insulating cylinder 120 to ionize the process gas and generate plasma.

[0063] A first through hole 151 is provided on the side wall of the metal shielding cover 140 , so that the conductive structure electrically connecting the RF power module and the annular electrode 130 can pass through the first through hole 103 and be electrically connected to the annular electrode 130 , thereby achieving electrical connection between the annular electrode 130 and the RF power module.

[0064] It should be noted that the conductive structure and the metal shielding cover 140 are insulated from each other, and the size of the first through hole 151 matches the size of the conductive structure.

[0065] Optional, continue to refer to Figure 3 The remote plasma reaction chamber provided in this embodiment also includes multiple first connection structures and multiple second connection structures (not shown in the figure); the first connection structure is used to fix the metal shielding cover 140 on the first flange 110, and the second connection structure is used to fix the metal shielding cover 140 on the second flange 150.

[0066] Specifically, the structure of the first connection structure and the structure of the second connection structure may be the same, and both the first connection structure and the second connection structure may be screws.

[0067] The sidewall of the first flange 110 includes a plurality of first screw holes 201, the sidewall of the second flange 150 includes a plurality of second screw holes 202, the area of ​​the metal shield 140 near the first flange 110 includes a plurality of second through holes 141, and the area of ​​the metal shield 140 near the second flange 150 includes a plurality of third through holes 142. The second through holes 141 may correspond one-to-one with the first screw holes 201, the third through holes 142 may correspond one-to-one with the second screw holes 202, the first connection structure may correspond one-to-one with the second through holes 141, and the second connection structure may correspond one-to-one with the third through holes 142.

[0068] A screw (first connecting structure) can pass through second through-hole 141 and be fixed in first screw hole 201, thereby fixing metal shield 140 to first flange 110. The head of the screw is located on the side of second through-hole 141 away from first screw hole 201. A screw (second connecting structure) can pass through third through-hole 142 and be fixed in second screw hole 202, thereby fixing metal shield 140 to second flange 150. The head of the screw is located on the side of third through-hole 142 away from second screw hole 202.

[0069] In this embodiment, the metal shield 140 is detachably connected to the first flange 110 and the second flange 150 via the first connection structure and the second connection structure, which facilitates the disassembly and replacement of the metal shield 140 and the fabrication of the remote plasma reaction chamber.

[0070] Optional, continue to refer to Figure 2 The remote plasma reaction chamber provided in this embodiment also includes a fixing structure (not shown in the figure); the annular electrode 130 includes a metal opening ring 131, a first metal sheet 132 and a second metal sheet 133; the first metal sheet 132 is integrally connected to the metal opening ring 131, and the second metal sheet 133 is integrally connected to the metal opening ring 131; the first metal sheet 132 and the second metal sheet 133 are located on both sides of the opening of the metal opening ring 131; the first metal sheet 132 includes a fourth through hole, and the second metal sheet 133 includes a fifth through hole; the fixing structure passes through the fourth through hole and the fifth through hole to fix the annular electrode 130 to the outer wall side of the insulating tube 120.

[0071] Specifically, the first metal sheet 132 and the second metal sheet 133 are disposed opposite each other, and are both located on the outer wall side of the metal open ring 131. The first metal sheet 132 and the second metal sheet 133 may be perpendicular to the outer wall side of the metal open ring 131. The distance between the openings of the metal open ring 131 may be much smaller than the circumference of the inner ring of the metal open ring 131. For example, the ratio of the distance between the openings of the metal open ring 131 to the circumference of the inner ring of the metal open ring 131 may be greater than 0 and less than or equal to 5%.

[0072] In this embodiment, the diameter of the metal open ring 131 can be adjusted by adjusting the distance between the first metal sheet 132 and the second metal sheet 133. Thus, by adjusting the distance between the first metal sheet 132 and the second metal sheet 133, the annular electrode 130 can be better aligned with the outer wall of the insulating tube 120, and the annular electrode 130 can be fixed to the outer wall of the insulating tube 120 via a fixing structure. As can be seen, in this embodiment, the annular electrode 130 does not need to be fixed to the outer wall of the insulating tube 120 by welding, thus avoiding the welding process of metal welding to the insulator, reducing the difficulty of connecting the annular electrode 130 to the insulating tube 120, and thus reducing the difficulty of manufacturing the remote plasma reaction chamber and improving manufacturing efficiency.

[0073] Optionally, the material of the fixed structure includes metal; and the fixed structure is electrically connected to the conductive structure.

[0074] Specifically, the fixing structure is conductive, and the radio frequency energy in the conductive structure is transmitted to the ring electrode through the fixing structure. The conductive structure can be located at the opening of the metal split ring. The fixing structure can include a screw and a nut, and the conductive structure can include a through-hole. When the conductive structure is located at the opening of the metal split ring, the screw in the fixing structure can sequentially pass through the fourth through-hole, the through-hole in the conductive structure, and the fifth through-hole, and the nut can be used to fix the relative position between the first metal sheet and the second metal sheet.

[0075] Optionally, the diameter of the insulating tube ranges from 4cm to 30cm; the diameter of the metal shielding cover ranges from 10cm to 60cm; the diameter of the insulating tube is smaller than the diameter of the metal shielding cover. It can be seen that the remote plasma reaction chamber provided in this embodiment is small in size and can meet the cleaning needs of devices to be cleaned at specific locations.

[0076] Specifically, the diameter of the insulating cylinder may be 4 cm, 5 cm, 6 cm, 10 cm, 15 cm, 18 cm, 20 cm, 25 cm, or 30 cm, etc. The diameter of the metal shield may be 10 cm, 12 cm, 30 cm, 40 cm, 50 cm, 55 cm, or 60 cm, etc.

[0077] Optionally, the material of the first flange and the material of the second flange are both metal materials; the insulating tube includes ceramic or quartz; the material of the ring electrode includes at least one of aluminum, copper, stainless steel and nickel; the material of the metal shielding cover includes at least one of aluminum, copper, stainless steel and nickel.

[0078] Specifically, ceramics and quartz have good insulation performance, are easy to obtain, and are cheap. Setting the insulation tube to be made of ceramics or quartz can reduce the cost of the insulation tube while ensuring the insulation performance of the insulation tube.

[0079] The material of the ring electrode can be the same as the material of the metal shielding cover. The material of the ring electrode includes at least one of aluminum, copper, stainless steel and nickel, and the material of the metal shielding cover includes at least one of aluminum, copper, stainless steel and nickel. This can not only improve the ionization effect of the remote plasma reaction chamber ionization process gas, but also reduce the cost of manufacturing the remote plasma reaction chamber.

[0080] Optional, continue to refer to Figure 2 The first flange 110 includes a first groove, and the second flange 150 includes a second groove; the bottom of the first groove is connected to the air inlet 101, and the side wall of the first groove contacts the partial area of ​​the insulating tube 120 close to the first flange 110; the bottom of the second groove is connected to the air outlet 102, and the side wall of the second groove contacts the partial area of ​​the insulating tube 120 close to the second flange 150.

[0081] Specifically, a first groove is provided in the first flange 110 and a second groove is provided in the second flange 150. The first groove and the second groove can better fix the insulating tube 120, thereby improving the airtightness of the connection between the first flange 110 and the insulating tube 120, and improving the airtightness of the connection between the second flange 150 and the insulating tube 120.

[0082] Figure 5 is a schematic structural diagram of a remote plasma source system provided according to an embodiment of the present invention, with reference to Figure 5 The remote plasma source system provided in this embodiment includes a radio frequency power supply module 500, an impedance matching module 600, and the remote plasma reaction chamber 100 provided in any embodiment of the present invention; the impedance matching module 600 is connected between the radio frequency power supply module 500 and the ring electrode in the remote plasma reaction chamber 100; the radio frequency power supply module 500 is used to adjust the output frequency of the radio frequency power supply module 500 so that the reverse power is less than the set threshold when the reverse power in the remote plasma source system exceeds a set threshold.

[0083] Specifically, the output frequency of the RF power module 500 can range from 400 kHz to 40 MHz, and the output frequency of the RF power module 500 is adjustable. The impedance matching module 600 is connected between the RF power module 500 and the remote plasma reaction chamber 100. The RF power module 500 is used to provide RF energy to the remote plasma reaction chamber 100 so that the remote plasma reaction chamber 100 ionizes the process gas to generate plasma. The impedance matching module 600 is used to achieve impedance matching between the RF power module 500 and the remote plasma reaction chamber 100. The impedance matching module 600 can include a fixed capacitor and a fixed inductor connected in series, or a fixed inductor and an adjustable capacitor connected in series.

[0084] The remote plasma source system provided in this embodiment can be used to clean equipment to be cleaned. For example, during cleaning, the pipeline is in a low-pressure state, with a pressure value within a range of 1 to 10 Torr or higher. Cleaning gas is introduced through the pipeline, and the RF power module 500 is turned on. The RF power module 500 can automatically detect impedance changes in the remote plasma reaction chamber 100. The RF power module 500 and the impedance matching module 600 can automatically match the impedance between the RF power module 500 and the remote plasma reaction chamber 100. The RF power module 500 can automatically adjust the frequency when the impedance of the remote plasma reaction chamber 100 changes significantly. RF energy is applied to the ring electrode via an RF cable. Due to the close distance between the ring electrode and the insulating cylinder, the RF excitation energy is high. Under the excitation of the RF energy, the process gas inside the insulating cylinder generates a high-density plasma. The plasma reacts with valve deposits, decomposing the deposits. The decomposed gaseous substances are then extracted by an electronic pump, achieving the cleaning purpose.

[0085] The remote plasma source system provided in this embodiment includes the remote plasma reaction chamber 100 provided in any embodiment of the present invention. Therefore, it has the beneficial effects of the remote plasma reaction chamber 100 provided in any embodiment of the present invention, which will not be described in detail here.

[0086] Optional, Figure 6 1 is a schematic structural diagram of another remote plasma source system provided according to an embodiment of the present invention. Figure 7 yes Figure 6 The disassembled structure diagram of the remote plasma source system is shown in FIG. Figure 6 and Figure 7 The impedance matching module includes an impedance matching unit, a protective cover 601 and at least one heat dissipation unit 602; the impedance matching unit is located inside the protective cover 601, and the heat dissipation unit 602 is located outside the protective cover 601; the first end of the impedance matching unit is electrically connected to the RF power supply module, and the second end of the impedance matching unit is electrically connected to the annular electrode 130; the protective cover 601 is detachably connected to the remote plasma reaction chamber.

[0087] Specifically, the impedance matching unit may include a fixed capacitor and a fixed inductor connected in series, or may include a fixed inductor and an adjustable capacitor connected in series. The impedance matching unit is located within the protective cover 601, which is used to protect the impedance matching unit from damage by foreign objects. The protective cover 601 may also include multiple heat dissipation holes.

[0088] The impedance matching module 600 may include two heat dissipation units 602 . The heat dissipation units 602 are used to reduce the temperature of the impedance matching units in the impedance matching module. The heat dissipation units 602 may be fans.

[0089] It should be understood that the various forms of the processes shown above can be used to reorder, add, or delete steps. For example, the steps described in the present invention can be performed in parallel, sequentially, or in a different order, as long as the desired results of the technical solution of the present invention can be achieved. This is not limited herein.

[0090] The above specific embodiments do not limit the scope of protection of the present invention. Those skilled in the art will appreciate that various modifications, combinations, sub-combinations, and substitutions may be made based on design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention are intended to be included within the scope of protection of the present invention.

Claims

1. A remote plasma reaction chamber, characterized in that: include: a first flange, the first flange comprising an air inlet; an insulating cylinder, located on one side of the first flange, wherein an inner cavity of the insulating cylinder is in communication with the air inlet; a ring-shaped electrode fixed to the outer wall of the insulating cylinder; a metal shielding cover, located on the outer wall side of the annular electrode away from the insulating cylinder, wherein the metal shielding cover is spaced apart from the annular electrode, the metal shielding cover is reused as a first electrode, and the annular electrode is reused as a second electrode, the annular electrode is used to receive radio frequency energy output by the radio frequency power module, and the metal shielding cover and the annular electrode are used to ionize the process gas in the insulating cylinder to generate plasma; The second flange is located on a side of the insulating cylinder away from the first flange, wherein the second flange includes an air outlet, and the air outlet is communicated with the inner cavity of the insulating cylinder.

2. The remote plasma reaction chamber according to claim 1, characterized in that: The metal shield includes a first through hole; The first through hole is used to accommodate a conductive structure electrically connecting the radio frequency power module and the ring electrode.

3. The remote plasma reaction chamber according to claim 1, wherein: Also included are a plurality of first connection structures and a plurality of second connection structures; The first connecting structure is used to fix the metal shield on the first flange; The second connection structure is used to fix the metal shielding cover on the second flange.

4. The remote plasma reaction chamber according to claim 2, wherein: It also includes fixed structures; The ring-shaped electrode includes a metal open ring, a first metal sheet and a second metal sheet; The first metal sheet is integrally connected to the metal open ring, and the second metal sheet is integrally connected to the metal open ring; The first metal sheet and the second metal sheet are located on both sides of the opening of the metal open ring; The first metal sheet includes a fourth through hole, and the second metal sheet includes a fifth through hole; The fixing structure passes through the fourth through hole and the fifth through hole to fix the ring-shaped electrode to the outer wall side of the insulating cylinder.

5. The remote plasma reaction chamber according to claim 4, characterized in that: The material of the fixing structure includes metal; The fixing structure is electrically connected to the conductive structure.

6. The remote plasma reaction chamber according to claim 1, wherein: The diameter of the insulating cylinder ranges from 4 cm to 30 cm; The diameter of the metal shield ranges from 10 cm to 60 cm; The diameter of the insulating cylinder is smaller than the diameter of the metal shielding cover.

7. The remote plasma reaction chamber according to claim 1, wherein: The material of the first flange and the material of the second flange are both metal materials; The insulating cylinder comprises ceramic or quartz; The material of the ring electrode includes at least one of aluminum, copper, stainless steel and nickel; The material of the metal shielding cover includes at least one of aluminum, copper, stainless steel and nickel.

8. The remote plasma reaction chamber according to any one of claims 1 to 7, characterized in that: The first flange includes a first groove, and the second flange includes a second groove; The bottom of the first groove is connected to the air inlet, and the side wall of the first groove contacts the partial area of ​​the insulating cylinder close to the first flange; the bottom of the second groove is connected to the air outlet, and the side wall of the second groove contacts the partial area of ​​the insulating cylinder close to the second flange.

9. A remote plasma source system, characterized in that: Comprising a radio frequency power supply module, an impedance matching module and the remote plasma reaction chamber according to any one of claims 1 to 8; The impedance matching module is connected between the radio frequency power supply module and the annular electrode in the remote plasma reaction chamber; The RF power supply module is used to adjust the output frequency of the RF power supply module so that the reverse power is less than the set threshold when the reverse power in the remote plasma source system exceeds the set threshold.

10. The remote plasma source system according to claim 9, wherein: The impedance matching module includes an impedance matching unit, a protective cover and at least one heat dissipation unit; The impedance matching unit is located inside the protective cover, and the heat dissipation unit is located outside the protective cover; The first end of the impedance matching unit is electrically connected to the RF power supply module, and the second end of the impedance matching unit is electrically connected to the ring electrode; The protective cover is detachably connected to the remote plasma reaction chamber.

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