An ultraviolet cut-off adhesive film layer, a preparation method thereof, a perovskite solar cell module, a photovoltaic module and a photovoltaic system

Abstract

The application belongs to the technical field of solar cells, and relates to an ultraviolet cutting adhesive film layer and a preparation method thereof, a perovskite solar cell module, a photovoltaic module and a photovoltaic system. The preparation method comprises the following steps: diluting ultraviolet curing adhesive by using an organic solvent to obtain an ultraviolet protection liquid; coating the ultraviolet protection liquid on one side surface of a light-entering surface of the perovskite solar cell module; and performing ultraviolet curing on the obtained ultraviolet protection wet film to obtain the ultraviolet cutting adhesive film layer. In the application, the diluted ultraviolet curing adhesive is used as a coating liquid and is coated on the light-entering surface of the perovskite solar cell module. The subsequent ultraviolet curing process can be performed at low temperature and low power, potential damage to a functional layer of the perovskite solar cell caused by preparation of the film layer under long-time high-temperature conditions is avoided, and thus the influence of the ultraviolet curing conditions on the module in the preparation process is effectively improved and the stability of the module under ultraviolet light in the operation process is enhanced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of perovskite solar cell modules, and in particular to an ultraviolet cut-off adhesive film layer and a preparation method thereof, a perovskite solar cell module, a photovoltaic module and a photovoltaic system. BACKGROUND

[0002] Perovskite solar cells (PSCs) are considered as a strong contender for future solar technology due to their high photoelectric conversion efficiency and low-cost manufacturing process. The crystalline silicon module reliability test is generally based on a 15KWh benchmark, but with the continuous development of the solar cell industry, enterprises and manufacturers are increasingly demanding on the ultraviolet reliability test of modules, and the test benchmark is gradually increasing from 15KWh to 60KWh and above. Therefore, as a new type of solar cell, the problem of weak stability of perovskite solar cells under ultraviolet irradiation will also become an obstacle to its commercial application.

[0003] Ultraviolet light is an important factor affecting the long-term operation stability of perovskite solar cells, and long-term or excessive ultraviolet light irradiation can reduce the stability and service life of perovskite solar cells, and also reduce the performance of perovskite solar cells. At present, the existing methods for improving the ultraviolet stability of perovskite modules under ultraviolet light irradiation during operation mainly include doping ultraviolet light absorbers or other ultraviolet light converters in the perovskite layer, adding ultraviolet absorbing layers or isolation layers in the perovskite layer or other internal structure layers of the perovskite module, or introducing rare earth down-conversion materials for ultraviolet light conversion.

[0004] For example, by adding an ultraviolet light absorber 2-(2-hydroxy-5-methylphenyl) benzotriazole (UVP) in the perovskite light-absorbing layer, the ultraviolet light can be directly absorbed by the opening and closing of the chelating ring, thereby reducing the direct damage of ultraviolet light to the perovskite layer; for example, by adding (trifluoroacetyl) benzotriazole (TFABI) as an ultraviolet light absorbing passivation agent in the perovskite light-absorbing layer, the ultraviolet stability and performance of the p-i-n wide-bandgap solar cell can be enhanced, and the degradation of the perovskite absorbing layer under ultraviolet light can be inhibited; for example, by introducing an anti-ultraviolet molecule octanoic acid (OCT), the adverse effects of ultraviolet light irradiation can be reduced, the crystallization process can be adjusted, and a perovskite thin film with larger crystal grains and enhanced crystallinity can be produced, thereby improving the efficiency and stability of the cell; for example, by adding a down-conversion material to convert high-energy ultraviolet light into more visible light, the damage to the perovskite layer can be reduced; for example, by using a biopolymer heparin sodium (HS), graphene nanosheets (GnPs), an amino acid or inserting PEROVI3 (HOCO-R-NH3 +I) single-layer thin film passivation of TiO2 surface defects with stable chemical properties to achieve UV stabilization of the TiO2 / perovskite interface; for example, using PCBM instead of TiO2 as a more stable electron transport layer material as an electron transport layer, which can maintain high-efficiency carrier injection and reduce degradation caused by UV light, etc.

[0005] However, the above-mentioned addition of UV absorption or isolation layer inside the battery structure can easily cause problems such as battery defects, energy level mismatch, and additional transmission resistance, and the cost of rare earth down-conversion fluorescent material is relatively high; and the method of placing the UV additive in the UV protection layer by evaporation, magnetron sputtering or solution drying method has high requirements for equipment in the process, and the process is usually realized at a high temperature of 100°C, which can cause potential damage to the perovskite light-absorbing layer. Based on the above-mentioned defects, setting an ultraviolet cutoff layer on the light-incident side of the perovskite solar cell is undoubtedly a relatively small impact on the perovskite solar cell itself.

[0006] And for the scheme of setting an ultraviolet cutoff layer on the light-incident side of the perovskite solar cell, the different ultraviolet curing process conditions have a great influence on the performance of the functional layer of the perovskite solar cell on the production line in the actual production process, which is specifically manifested in: after the existing ultraviolet curing glue is coated on the light-incident side of the perovskite solar cell, it usually needs to be irradiated by high-power and long-time ultraviolet light to realize the complete curing of the ultraviolet curing glue, and the above-mentioned ultraviolet curing conditions can damage the chemical bonds in the perovskite crystal structure and cause material decomposition, or generate high-activity free radicals (such as superoxide free radicals O2 - ·) in the perovskite or at the interface, which can accelerate the aging of the perovskite material and the transport layer material, and the problem of heat effect accompanying ultraviolet light can exacerbate ion migration in the perovskite, destroy the lattice integrity, cause phase separation or generate defect states, greatly reduce the performance and stability of the component, therefore, it is difficult to balance the high-quality curing of the ultraviolet cutoff layer and the stability of the performance of the functional layer of the perovskite solar cell. SUMMARY

[0007] To solve the above technical problems, the present application provides an ultraviolet cut-off adhesive film layer and a preparation method thereof, a perovskite solar cell module, a photovoltaic module and a photovoltaic system. The present application uses diluted ultraviolet curing adhesive as a coating liquid, which is coated on the light-incident surface of the perovskite solar cell module. The subsequent ultraviolet curing process can be carried out at low temperature and low power. Low-temperature and low-power ultraviolet curing can avoid the preparation of the film layer under high-temperature and high-ultraviolet energy conditions, and at the same time, the ultraviolet curing can be completed in a relatively short time, avoiding potential damage to the functional layer of the perovskite solar cell caused by long-time ultraviolet irradiation and accompanying thermal effects during the preparation process, thereby further improving the preparation efficiency. By setting it at the light-incident end and preparing it at the late stage of the preparation of the perovskite solar cell module, on the one hand, most or all of the ultraviolet light can be cut off from the source, and the internal structure of the perovskite solar cell module will not be affected, thereby effectively improving the stability of the perovskite solar cell module under ultraviolet light. On the other hand, the cut-off adhesive film layer is prepared on the light-incident surface of the perovskite solar cell module after the preparation is completed, and the thickness is relatively thin, which improves the production efficiency and reduces the manufacturing cost.

[0008] To achieve this purpose, the present application adopts the following technical solutions:

[0009] In a first aspect, the present application provides a preparation method of an ultraviolet cut-off adhesive film layer for a perovskite solar cell module, comprising the following steps:

[0010] S1, providing ultraviolet curing adhesive;

[0011] S2, providing an organic solvent;

[0012] S3, diluting the ultraviolet curing adhesive with the organic solvent to obtain an ultraviolet protection liquid;

[0013] S4, coating the ultraviolet protection liquid on the light-incident surface of the perovskite solar cell module to obtain an ultraviolet protection wet film;

[0014] S5, ultraviolet curing the ultraviolet protection wet film to obtain an ultraviolet cut-off adhesive film layer.

[0015] The present application uses diluted ultraviolet curing adhesive as a coating liquid, which is coated on the light-incident surface of the perovskite solar cell module. The subsequent ultraviolet curing process can be carried out at low temperature and low power. Low-temperature and low-power ultraviolet curing can avoid the preparation of the film layer under high-temperature and high-ultraviolet energy conditions, and at the same time, the ultraviolet curing can be completed in a relatively short time, avoiding potential damage to the functional layer of the perovskite solar cell caused by long-time ultraviolet irradiation and accompanying thermal effects during the preparation process, thereby further improving the preparation efficiency. By setting it at the light-incident end and preparing it at the late stage of the preparation of the perovskite solar cell module, on the one hand, most or all of the ultraviolet light can be cut off from the source, and the internal structure of the perovskite solar cell module will not be affected, thereby effectively improving the stability of the perovskite solar cell module under ultraviolet light. On the other hand, the cut-off adhesive film layer is prepared on the light-incident surface of the perovskite solar cell module after the preparation is completed, and the thickness is relatively thin, which improves the production efficiency and reduces the manufacturing cost.

[0016] In addition, the preparation of the ultraviolet cut-off adhesive film layer in the present application is carried out after the preparation of the perovskite solar cell module, which does not affect the preparation of the functional layers in the perovskite solar cell module in the previous process, and can be prepared on the preferred perovskite solar cell module, thereby improving the production efficiency and reducing the manufacturing cost; and does not induce the problems of energy level mismatch and additional transmission resistance in the module; and the preparation of the functional layers does not affect the performance of the ultraviolet cut-off adhesive film layer.

[0017] It should be noted that the "light-incident surface of the perovskite solar cell module" in the present application, wherein the position of the ultraviolet protection liquid coating is different according to the structure of the perovskite solar cell module, but only the incident light is first incident on the obtained ultraviolet cut-off adhesive film to cut off most or all of the ultraviolet light, and then enter the perovskite functional layer.

[0018] As a preferred technical solution of the present application, the curing temperature of the ultraviolet curing in step S5 is 25℃~30℃, such as 25℃, 26℃, 27℃, 28℃, 29℃ or 30℃, etc.

[0019] As a preferred technical solution of the present application, the curing power of the ultraviolet curing is 200mW / cm 2 ~600mW / cm 2 , such as 200mW / cm 2 , 230mW / cm 2 , 250mW / cm 2 , 280mW / cm 2 , 300mW / cm 2 , 320mW / cm 2 , 350W / cm 2 , 380mW / cm 2 , 400mW / cm 2 , 420mW / cm 2 , 450mW / cm 2 , 480mW / cm 2 , 500W / cm 2 , 520mW / cm 2 , 550mW / cm 2 , 580mW / cm 2 or 600mW / cm 2 , etc.

[0020] As a preferred technical solution of the present application, the curing time of the ultraviolet curing in step S5 is 10s~60s, such as 10s, 20s, 30s, 40s, 50s or 60s, etc.

[0021] In the present application, ultraviolet curing can be carried out at low ultraviolet energy and room temperature, avoiding the influence of high temperature and high ultraviolet energy curing on the stability of the perovskite light-absorbing layer. Compared with other preparation processes, the curing time is extremely short, and the preparation efficiency is greatly improved. If the ultraviolet curing time is too long, the ultraviolet cutoff film layer will be crosslinked too much, become hard and brittle, and the light uniformity inside the film layer will be poor, thereby affecting the light transmittance. If the ultraviolet curing time is too short, the ultraviolet cutoff film layer formed cannot be completely cured, the degree of ultraviolet light cutoff is limited, the stability of the obtained perovskite solar cell module under ultraviolet light is limited, and the performance and service life of the ultraviolet cutoff film layer are also affected.

[0022] As a preferred technical solution of the present application, before the ultraviolet curing in step S5, the wet ultraviolet protection film is further subjected to the steps of drying and leveling in sequence.

[0023] As a preferred technical solution of the present application, the drying temperature is 40℃-70℃, such as 40℃, 45℃, 50℃, 55℃, 60℃, 65℃ or 70℃, etc.

[0024] And / or, the drying time is 10min-25min, such as 10min, 12min, 15min, 18min, 20min, 22min or 25min, etc.

[0025] In the present application, the solvent in most of the wet film is dried before ultraviolet curing, which facilitates shortening the time for curing the ultraviolet curing adhesive by using ultraviolet curing in the later stage and achieving better curing and crosslinking effect, thereby improving the film forming efficiency.

[0026] And / or, the leveling method includes any one of standing leveling, blade coating leveling or roller coating leveling.

[0027] As a preferred technical solution of the present application, the standing leveling time is 5min-15min, such as 5min, 8min, 10min, 12min or 15min, etc.

[0028] In the present application, in order to further improve the quality of film forming, after the coating is completed, standing leveling in a natural state can be further included to automatically fill small recesses and pores and other defects on the surface of the wet film, so that the surface of the wet film is more smooth and flat; the components in the wet film can also be made uniform, and the thickness is consistent, thereby ensuring the uniformity of the components inside the ultraviolet cutoff film and the uniform light transmittance of each part; in addition, the combination with the light entrance surface can also be enhanced, and the film adhesion can be improved.

[0029] As a preferred technical solution of the present application, the organic solvent in step S2 includes any two of ketone solvents, ether solvents, aliphatic hydrocarbon solvents or aromatic hydrocarbon solvents.

[0030] And / or, the viscosity of the ultraviolet protection liquid in step S3 is 500 mPa·s~800 mPa·s, for example, 500 mPa·s, 550 mPa·s, 600 mPa·s, 650 mPa·s, 700 mPa·s, 750 mPa·s or 800 mPa·s, etc.

[0031] And / or, the solid content of the ultraviolet protection liquid in step S3 is 25%~65%, for example, 25%, 35%, 45%, 55% or 65%, etc.

[0032] As a preferred technical solution of the present application, the volume ratio of the ultraviolet curing adhesive in step S1 to the organic solvent in step S2 is (0.5~3):1, for example, 0.5:1, 1:1, 1.5:1, 2:1, 2.5:1 or 3:1, etc.

[0033] In the present application, by adjusting the volume ratio of the ultraviolet curing adhesive and the organic solvent, the ultraviolet curing adhesive can be better dispersed in the organic solvent to form a uniform ultraviolet protection liquid. If the amount of ultraviolet curing adhesive added is too much, the ultraviolet curing adhesive cannot be uniformly dispersed in the organic solvent, and the viscosity of the ultraviolet protection liquid is too large, which is not conducive to the coating of the ultraviolet protection liquid and the film formation of the liquid film in the later stage, and will affect the light transmittance of the obtained ultraviolet cutoff adhesive film layer. If the amount of ultraviolet curing adhesive added is too small, although the ultraviolet curing adhesive can be uniformly dispersed and the coating of the ultraviolet protection liquid and the film formation of the liquid film in the later stage can be better achieved, the obtained ultraviolet cutoff adhesive film layer has limited effect on cutting off ultraviolet light, and cannot cut off most of the ultraviolet light, which still affects the stability of the device under ultraviolet light, and the improvement effect is not obvious.

[0034] And / or, the organic solvent in step S2 includes solvent A and solvent B, the solvent A includes aromatic hydrocarbon solvents, and the solvent B includes any one of ketone solvents, ether solvents or aliphatic hydrocarbon solvents.

[0035] In the present application, the two solvents synergistically act to accelerate the film forming rate, thereby improving the film forming quality. Solvent A mainly plays a dispersing role. Due to the high viscosity of the ultraviolet curing adhesive itself, film breaking often occurs during coating, and the film forming process is long, which cannot achieve the effect of uniform coating and rapid film forming. In addition, the air involved in the coating process is also difficult to discharge, which will form bubbles and reduce the environmental tolerance of the adhesive film. In addition, if the curing power is too low or the curing time is too short under high viscosity, there will be incomplete curing problems in the adhesive film, which will affect the performance and service life of the ultraviolet cut-off adhesive film layer. The addition of solvent A can effectively disperse the ultraviolet curing adhesive without affecting the performance, forming a mixed solution with uniform composition and low viscosity (compared with pure ultraviolet curing adhesive), greatly reducing the amount of adhesive used. Solvent B has a low boiling point and mainly plays a dilution and rapid evaporation role. During the subsequent liquid film forming process, part of solvent A is rapidly evaporated, greatly reducing the film forming time. Solvent A and solvent B synergistically disperse the ultraviolet curing adhesive and rapidly evaporate, greatly improving the film forming uniformity and substrate adhesion, thereby realizing rapid high-quality film forming and enhancing the environmental tolerance of the adhesive film.

[0036] And / or, the ultraviolet curing adhesive in step S1 has a cut-off ultraviolet waveband range of 200nm-400nm.

[0037] The ultraviolet curing adhesive used in the present application has a cut-off ultraviolet waveband range of 200nm-400nm, which can maximize the cut-off of different waveband ultraviolet light, thereby ensuring the cut-off of most or all ultraviolet light, so that the device is still long-term stable under ultraviolet light.

[0038] And / or, the viscosity of the ultraviolet curing adhesive in step S1 is 3000mPa·s-6000mPa·s, for example, 3000mPa·s, 3500mPa·s, 4000mPa·s, 4500mPa·s, 5000mPa·s, 5500mPa·s or 6000mPa·s, etc.

[0039] And / or, the solid content of the ultraviolet curing adhesive in step S1 is 80%-95%, for example, 80%, 82%, 85%, 88%, 90%, 92% or 95%, etc.

[0040] As a preferred technical solution of the present application, the volume ratio of the solvent A to the solvent B is x:y, x+y=1, 0

[0041] In the present application, the volume ratio of solvent A and solvent B can make the ultraviolet curing adhesive fully and uniformly dispersed in the solvent, ensuring that the obtained ultraviolet cutoff adhesive film is transparent and uniformly continuous. If the amount of solvent A added is too small and the amount of solvent B added is too much, the obtained ultraviolet cutoff adhesive film will be turbid, the light transmittance will be poor, and the continuity will be poor.

[0042] And / or, the aromatic hydrocarbon solvent includes toluene and / or xylene.

[0043] And / or, the ketone solvent includes acetone and / or butanone.

[0044] And / or, the ether solvent includes diethyl ether and / or propylene glycol ether.

[0045] And / or, the aliphatic hydrocarbon solvent includes any one or a combination of at least two of n-hexane, cyclohexane or n-pentane.

[0046] It should be noted that the ultraviolet curing adhesive used in the present application can be prepared according to known formula, or can be purchased on the market. Those skilled in the art can make adaptive selection according to the actual situation, for example, commercially available Han Gao 3494, Zhuoli De D5602 or Guangzhou Xinyi New Material H55H352 can be used.

[0047] As a preferred technical solution of the present application, the preparation method comprises the following steps:

[0048] S1, providing an ultraviolet curing adhesive; the viscosity of the ultraviolet curing adhesive is 3000 mPa·s~6000 mPa·s; the ultraviolet waveband range cut off by the ultraviolet curing adhesive is 200nm~400nm, and the solid content of the ultraviolet curing adhesive is 80%~95%;

[0049] S2, providing an organic solvent;

[0050] S3, diluting the ultraviolet curing adhesive with the organic solvent to obtain an ultraviolet protection liquid; the volume ratio of the ultraviolet curing adhesive to the organic solvent is (0.5~3):1; the viscosity of the ultraviolet protection liquid is 500 mPa·s~800 mPa·s, and the solid content of the ultraviolet protection liquid is 25%~65%;

[0051] S4, coating the ultraviolet protection liquid on the light entering surface of the perovskite solar cell module to obtain an ultraviolet protection wet film;

[0052] S5, after the ultraviolet protection wet film is placed and leveled for 5min~15min, drying at 40℃~70℃ for 10min~25min, and then testing the Jsc, Voc and FF of the perovskite solar cell module at 25℃~30℃, 200mW / cm 2 ~600mW / cm 2The UV-curing is performed for 10s-60s under the condition to obtain the UV-cutting adhesive film layer.

[0053] The organic solvent comprises solvent A and solvent B, the solvent A comprises aromatic hydrocarbon solvent, the solvent B comprises any one of ketone solvent, ether solvent or aliphatic hydrocarbon solvent; the volume ratio of the solvent A and the solvent B is x:y, x+y=1, 0

[0054] In the second aspect, the application further provides a UV-cutting adhesive film layer, which is prepared by the preparation method of the first aspect, and has a thickness of 50-300 μm, for example, 50 μm, 80 μm, 100 μm, 120 μm, 150 μm, 180 μm, 200 μm, 220 μm, 250 μm, 280 μm or 300 μm, etc.

[0055] In the application, the thickness of the UV-cutting adhesive film layer has a great influence on the UV light stability, and within the thickness range of 50-300 μm, the battery stability under UV light has a more optimal stabilizing effect, and the thickness range uses less adhesive amount, greatly reducing the production cost. If the thickness of the UV-cutting adhesive film layer is too thick, the light transmittance will be reduced before UV light aging (irradiation), thereby affecting the visible light utilization rate and the photoelectric performance of the battery; if the thickness of the UV-cutting adhesive film layer is too thin, the degree of UV light cutting is limited, and most or all of the UV light cannot be cut off, and the stability of the battery under UV light is still irreversibly affected.

[0056] In the third aspect, the application further provides a perovskite solar cell module, which comprises a perovskite solar cell module and a UV-cutting adhesive film layer located on the light-incident surface of the perovskite solar cell module, wherein the UV-cutting adhesive film layer is prepared by the preparation method of the first aspect or the UV-cutting adhesive film layer of the second aspect.

[0057] As a preferred technical solution of the application, the perovskite solar cell module comprises:

[0058] a substrate;

[0059] a transparent conductive layer laminated on one side of the substrate;

[0060] a first carrier transport layer laminated on the side of the transparent conductive layer away from the substrate;

[0061] a perovskite light-absorbing layer laminated on the side of the first carrier transport layer away from the transparent conductive layer;

[0062] a second carrier transport layer, which is arranged in a stack on a side of the perovskite light-absorbing layer away from the first carrier transport layer;

[0063] a top electrode layer, which is arranged in a stack on a side of the second carrier transport layer away from the perovskite light-absorbing layer; and

[0064] an encapsulation layer, which is arranged in a stack on a side of the top electrode layer away from the second carrier transport layer.

[0065] Preferably, the first carrier transport layer comprises a hole transport layer, and the second carrier transport layer comprises an electron transport layer, or the first carrier transport layer comprises an electron transport layer, and the second carrier transport layer comprises a hole transport layer.

[0066] It should be noted that the perovskite solar cell module in the present application is prepared by a conventional preparation method, and the materials of the functional layers in the module are also selected from conventional materials, which can be selected and adjusted according to actual conditions by those skilled in the art, and are applicable to the present application.

[0067] Exemplarily, the present application provides a preparation method of a perovskite solar cell module, which comprises the following steps.

[0068] Step 1: a substrate (glass substrate) and a transparent conductive layer are arranged in a stack, the transparent conductive layer is etched by laser to form a P1 line groove, and then the transparent conductive layer is ultrasonically cleaned with a glass cleaning solution, water and ethanol for 15-20 min, and dried with nitrogen to obtain a composite substrate, and the material of the transparent conductive layer comprises FTO or ITO.

[0069] Step 2: using a magnetron sputtering method, NiO x is sputtered on a surface of the transparent conductive layer away from the glass substrate, and then annealed at 200-300℃ for 30-60 min to obtain a 10-30 nm hole transport layer.

[0070] Step 3: a perovskite solution is scraped on the NiO x hole transport layer, the scraping speed is 10-20 mm / s, the coating head height is 100-250 μm, and the perovskite solution is annealed at 100-150℃ for 10-20 min to obtain a perovskite light-absorbing layer; in the perovskite solution, the molar ratio of lead iodide: formamidinium hydroiodide: methylammonium iodide: cesium iodide is 1:x:(0.95-x):0.05, wherein 0.8

[0071] Step 4: scraping the electron transport layer solution on the perovskite light-absorbing layer, scraping speed 10mm / s~20mm / s, coating head height 50μm~150μm, annealing temperature 70℃~100℃, annealing time 5min~15min, to obtain the electron transport layer; the electron transport layer solution contains PCBM as the component, chlorobenzene as the solvent, and the concentration is 15mg / mL~20mg / mL.

[0072] Step 5: after laser etching P2 line groove on the overall structure of the hole transport layer, the perovskite light-absorbing layer and the electron transport layer, using evaporation or magnetron sputtering method to prepare the top electrode layer, evaporation rate 0.1Å / s~8Å / s, electrode thickness 80nm~150nm, to obtain the top electrode layer, and the material of the top electrode layer includes any one or a combination of at least two of Ag, Cu, Au or non-metallic conductive oxide.

[0073] Step 6: laser etching P3 line groove on the overall structure of the hole transport layer, the perovskite light-absorbing layer, the electron transport layer and the top electrode layer, and edge cleaning around the structure, wherein the edge cleaning width is 1.5cm~2cm, using cover glass and encapsulating adhesive film to encapsulate the structure at 100℃~140℃, encapsulation pressure 50Mpa~70Mpa, laminated encapsulation 15~30min, to obtain the encapsulation layer, and the encapsulating adhesive film includes any one or a combination of at least two of butyl adhesive, POE adhesive film or PVB adhesive film.

[0074] In a fourth aspect, the present application further provides a photovoltaic module, which comprises the perovskite solar cell module according to the third aspect.

[0075] And / or, the photovoltaic module comprises a perovskite-crystalline silicon tandem solar cell module.

[0076] In a fifth aspect, the present application further provides a photovoltaic system, which comprises the photovoltaic module according to the fourth aspect.

[0077] And / or, the photovoltaic system comprises a combination structure of a photovoltaic power station or a photovoltaic support containing the photovoltaic module and the photovoltaic module.

[0078] Compared with the prior art, the present application has at least the following beneficial effects:

[0079] The application adopts diluted ultraviolet curing glue as a coating liquid, which is coated on the light inlet surface of the perovskite solar cell module, and the subsequent ultraviolet curing process can be carried out at low temperature and low power, thereby avoiding potential damage to the functional layer of the perovskite solar cell caused by the preparation of the film layer under long-time high-temperature and high-power ultraviolet conditions and the accompanying thermal effect, and effectively improving the influence of the ultraviolet curing conditions on the module during the preparation process and the stability under ultraviolet light during the operation process. Specifically, after the obtained module is subjected to ultraviolet aging test (total irradiation amount is 120 KWh / m 2 ), the short-circuit current density, open-circuit voltage, fill factor and photoelectric conversion efficiency of the battery are not greatly reduced. BRIEF DESCRIPTION OF DRAWINGS

[0080] Figure 1 is a preparation method flow chart of the ultraviolet cut-off glue film layer provided by the application.

[0081] Figure 2 is a structural schematic diagram of the perovskite solar cell module provided by example 1 of the application.

[0082] Among them, 1-ultraviolet cut-off glue film layer; 2-composite substrate; 201-first surface of the composite substrate; 21-glass substrate; 22-FTO transparent conductive layer; 3-NiO x hole transport layer; 4-perovskite light absorption layer; 5-electron transport layer; 6-top electrode layer; 7-encapsulation layer.

[0083] Figure 3 is a light transmittance comparison diagram of the perovskite solar cell module provided by example 1 of the application and the perovskite solar cell module provided by comparative example 3. DETAILED DESCRIPTION

[0084] The technical solutions of the application will be further described below by means of specific embodiments and in conjunction with the drawings. However, the following examples are only simple examples of the application, and do not represent or limit the protection scope of the application, and the protection scope of the application is subject to the claims.

[0085] Unless otherwise specified, the raw materials and reagents used in the following examples are commercially available or can be prepared by known methods.

[0086] The structure of the perovskite solar cell module in the specific embodiment part of the application includes a glass substrate, an FTO transparent conductive layer, a hole transport layer, a perovskite light absorption layer, an electron transport layer, a top electrode layer and an encapsulation layer which are sequentially stacked.

[0087] Figure 1 shows a preparation method flow chart of the ultraviolet cut-off glue film layer provided by the application, and the preparation method includes the following steps:

[0088] S1, providing ultraviolet curing glue;

[0089] S2, providing organic solvent;

[0090] S3, diluting the ultraviolet curing glue with the organic solvent to obtain ultraviolet protection liquid;

[0091] S4, coating the ultraviolet protection liquid on the light-entering surface of the perovskite solar cell module to obtain ultraviolet protection wet film;

[0092] S5, ultraviolet curing the ultraviolet protection wet film to obtain ultraviolet cut-off glue film layer.

[0093] After obtaining the ultraviolet cut-off glue film layer, a perovskite solar cell assembly can be prepared, which is used in a photovoltaic assembly, and the photovoltaic assembly is used in a photovoltaic system.

[0094] The ultraviolet curing glue provided in step S1 can be commercially available Han Gao 3494, Zhuoli De D5602 or Guangzhou Xinyi New Material H55H352, etc.

[0095] The application uses diluted ultraviolet curing glue as coating liquid, which is coated on the light-entering surface of the perovskite solar cell module, and then the ultraviolet protection wet film is ultraviolet cured, so that the ultraviolet cut-off glue film layer can be prepared, which takes into account the high-quality curing of the ultraviolet cut-off glue film layer and the stability of the performance of the functional layer of the perovskite solar cell.

[0096] Example 1

[0097] The embodiment provides a preparation method of ultraviolet cut-off glue film layer and a perovskite solar cell assembly, and the preparation method of ultraviolet cut-off glue film layer comprises the following steps.

[0098] S1, providing ultraviolet curing glue, Han Gao 3494, viscosity 6000 mPa·s, solid content 90%.

[0099] S2, providing toluene and n-hexane.

[0100] S3, stirring and mixing the ultraviolet curing glue, toluene and n-hexane according to the volume ratio of 1:0.75:0.25 to obtain uniform ultraviolet protection liquid, the viscosity of the ultraviolet protection liquid is 650 mPa·s, and the solid content is 45%.

[0101] S4, using the scraping method to coat it on the first surface of the composite substrate of the perovskite solar cell module (the surface of the glass substrate away from the FTO transparent conductive layer), the speed of the scraper is 5 mm / s, to obtain the ultraviolet protection wet film.

[0102] S5, placing the obtained ultraviolet protection wet film to level for 10 min, drying at 60℃ for 8 min, and then curing at 300 mW / cm2 , 25℃, UV curing for 20s, to obtain a UV cut-off adhesive film layer with a thickness of 50μm, and then to obtain the perovskite solar cell module.

[0103] The perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0104] Figure 2 A structural schematic diagram of the perovskite solar cell module provided by Embodiment 1 of the present application is shown, which comprises a UV cut-off adhesive film layer 1, a glass substrate 21, an FTO transparent conductive layer 22, a composite substrate first surface 201, a NiO x , a perovskite light-absorbing layer 4, an electron transport layer 5, a top electrode layer 6, and an encapsulation layer 7, which are sequentially stacked.

[0105] The preparation method of the perovskite solar cell module comprises the following steps.

[0106] Step 1: Stack the glass substrate and the FTO transparent conductive layer, and then perform ultrasonic cleaning with glass cleaning solution, water, and ethanol for 20min, respectively, and dry with nitrogen, to obtain a composite substrate.

[0107] Step 2: Use a magnetron sputtering method to sputter NiO x on the side surface of the FTO transparent conductive layer away from the glass substrate, and then perform annealing at 300℃ for 30min, to obtain a 20nm hole transport layer.

[0108] Step 3: Scratch coat a perovskite solution on the hole transport layer, with a scratching speed of 15mm / s and a coating head height of 200μm, and then perform annealing at 150℃ for 10min, to obtain a perovskite light-absorbing layer; in the perovskite solution, the molar ratio of lead iodide: formamidinium hydroiodide: methylammonium iodide: cesium iodide is 1:0.9:0.05:0.05, the mixed solvent DMF:DMSO is 4:1, and the concentration is 1.5mol / L.

[0109] Step 4: Scratch coat an electron transport layer solution on the perovskite light-absorbing layer, with a scratching speed of 15mm / s and a coating head height of 100μm, and then perform annealing at 70℃ for 10min, to obtain an electron transport layer; in the electron transport layer solution, the component is PCBM, the solvent is chlorobenzene, and the concentration is 20mg / mL.

[0110] Step 5: Perform laser etching P2 slot on the overall structure of the hole transport layer, the perovskite light-absorbing layer, and the electron transport layer, and then evaporate a top (Ag) electrode layer, with an evaporation rate of 5Å / s and an electrode thickness of 150nm, to obtain a top electrode.

[0111] Step 6: Laser etching P3 groove to the whole structure of the hole transport layer, perovskite light absorption layer, electron transport layer and top electrode layer, and trimming the structure around, wherein the trimming width is 2 cm, laminating and packaging the structure at 140 DEG C for 100 s with cover glass, butyl glue and POE film to form a packaging layer, and a perovskite solar cell module is obtained.

[0112] Example 2

[0113] The embodiment provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, and the preparation method comprises the following steps.

[0114] S1, providing ultraviolet curing adhesive, Han Gao 3494, viscosity 6000 mPa·s, solid content 90%.

[0115] S2, providing toluene and n-hexane.

[0116] S3, stirring and mixing the ultraviolet curing adhesive, toluene and n-hexane according to a volume ratio of 0.5:0.75:0.25 to obtain a uniform ultraviolet protection liquid, wherein the ultraviolet protection liquid has a viscosity of 500 mPa·s and a solid content of 30%.

[0117] S4, coating the ultraviolet protection liquid on a first surface of a composite substrate of the perovskite solar cell module (a surface of a glass substrate away from an FTO transparent conductive layer) in a manner of doctor blading, wherein the speed of a doctor blade is 5 mm / s, and an ultraviolet protection wet film is obtained.

[0118] S5, after drying at 60 DEG C for 15 min, ultraviolet curing at 360 mW / cm 2 , 25 DEG C for 30 s, an ultraviolet cutoff adhesive film layer with a thickness of 100 mu m is obtained, and a perovskite solar cell module is further obtained.

[0119] The preparation method and parameters of the perovskite solar cell module are consistent with those of example 1.

[0120] The perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0121] Example 3

[0122] The embodiment provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, and the preparation method comprises the following steps.

[0123] S1, providing ultraviolet curing adhesive, Han Gao 3494, viscosity 6000 mPa·s, solid content 90%.

[0124] S2, providing toluene and n-hexane.

[0125] S3, the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed according to the volume ratio of 0.8:0.75:0.25 to obtain a uniform ultraviolet protection liquid, the viscosity of the ultraviolet protection liquid is 620 mPa·s, and the solid content is 40%.

[0126] S4, the ultraviolet protection liquid is coated on the first surface of the composite substrate of the perovskite solar cell module (the side surface of the glass substrate away from the FTO transparent conductive layer) by using a scraping method, the speed of the scraper is 5 mm / s, and the ultraviolet protection wet film is obtained.

[0127] S5, the obtained ultraviolet protection wet film is placed and leveled for 5 min, dried at 60 DEG C for 10 min, and then ultraviolet cured for 25 s under the condition of 320 mW / cm 2 , 25 DEG C, to obtain an ultraviolet cutoff adhesive film layer with a thickness of 80 mu m, and further obtain a perovskite solar cell module.

[0128] The preparation method and parameters of the perovskite solar cell module are consistent with those of example 1.

[0129] The perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0130] Example 4

[0131] The embodiment provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, and the preparation method comprises the following steps.

[0132] S1, providing an ultraviolet curing adhesive, Han Gao 3494, viscosity 6000 mPa·s, solid content 90%.

[0133] S2, providing toluene and acetone.

[0134] S3, the ultraviolet curing adhesive, toluene and n-hexane are stirred and mixed according to the volume ratio of 0.8:0.75:0.25 to obtain a uniform ultraviolet protection liquid, the viscosity of the ultraviolet protection liquid is 620 mPa·s, and the solid content is 40%.

[0135] S4, the ultraviolet protection liquid is coated on the first surface of the composite substrate of the perovskite solar cell module (the side surface of the glass substrate away from the FTO transparent conductive layer) by using a scraping method, the speed of the scraper is 5 mm / s, and the ultraviolet protection wet film is obtained.

[0136] S5, the obtained ultraviolet protection wet film is placed and leveled for 5 min, dried at 40 DEG C for 25 min, and then ultraviolet cured for 60 s under the condition of 200 mW / cm 2 , 30 DEG C, to obtain an ultraviolet cutoff adhesive film layer with a thickness of 200 mu m, and further obtain a perovskite solar cell module.

[0137] The preparation method and parameters of the perovskite solar cell module are consistent with those of Example 1.

[0138] The perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0139] Example 5

[0140] The embodiment provides a preparation method of an ultraviolet cut-off adhesive film layer and a perovskite solar cell module, and the preparation method comprises the following steps.

[0141] S1, providing ultraviolet curing adhesive, Han Gao 3494, viscosity 6000 mPa·s, solid content 90%.

[0142] S2, providing dimethylbenzene and diethyl ether.

[0143] S3, the ultraviolet curing adhesive, dimethylbenzene and diethyl ether are stirred and mixed in a volume ratio of 3:0.75:0.25 to obtain a uniform ultraviolet protection liquid, the ultraviolet protection liquid has a viscosity of 800 mPa·s and a solid content of 65%.

[0144] S4, the ultraviolet protection liquid is coated on the first surface of the composite substrate of the perovskite solar cell module (the surface of the glass substrate away from the FTO transparent conductive layer) in a scraping manner, the speed of the scraper is 5 mm / s, and an ultraviolet protection wet film is obtained.

[0145] S5, after the obtained ultraviolet protection wet film is dried at 70 DEG C for 10 min, the ultraviolet curing is performed at 400 mW / cm 2 , 25 DEG C for 10 s, an ultraviolet cut-off adhesive film layer with a thickness of 280 mu m is obtained, and then a perovskite solar cell module is obtained.

[0146] The preparation method and parameters of the perovskite solar cell module are consistent with those of Example 1.

[0147] The perovskite solar cell module is used in a photovoltaic module, and the photovoltaic module is used in a photovoltaic power station.

[0148] Example 6

[0149] The embodiment provides a preparation method of an ultraviolet cut-off adhesive film layer and a perovskite solar cell module, and the preparation method is different from that of Example 1 in that the curing time is 80 s, and the rest of the preparation method and parameters are consistent with those of Example 1.

[0150] Example 7

[0151] The embodiment provides a preparation method of an ultraviolet cut-off adhesive film layer and a perovskite solar cell module, and the preparation method is different from that of Example 1 in that the ultraviolet curing power is 1000 mW / cm 2The rest of the preparation method and parameters remain the same as in Example 1.

[0152] Example 8

[0153] The present example provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, wherein the difference between the preparation method and Example 1 is that the curing temperature is 50℃, and the rest of the preparation method and parameters remain the same as in Example 1.

[0154] Example 9

[0155] The present example provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, wherein the difference between the preparation method and Example 1 is that the ultraviolet protection liquid has a viscosity of 850 mPa·s and a solid content of 70%, and the volume ratio of the ultraviolet curing adhesive, toluene and n-hexane is 3.5:0.75:0.25 for stirring and mixing, and the rest of the preparation method and parameters remain the same as in Example 1.

[0156] Comparative Example 1

[0157] The present comparative example provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, wherein the preparation method comprises the following steps: 30 mg of UVP additive phenyl benzimidazole sulfonic acid is dissolved in 1 mL of ethanol, the transparent glass substrate is placed with the back side facing up, the phenyl benzimidazole sulfonic acid solution is coated on the side surface of the glass substrate of the perovskite solar cell module away from the FTO transparent conductive layer by the doctor blade method, and the glass substrate is annealed at 180℃ for 10 min to form an ultraviolet cutoff adhesive film layer containing UVP additive, thereby obtaining a perovskite solar cell.

[0158] The preparation method and parameters of the perovskite solar cell module remain the same as in Example 1.

[0159] Comparative Example 2

[0160] The present comparative example provides a preparation method of an ultraviolet cutoff adhesive film layer and a perovskite solar cell module, wherein the difference between the preparation method and Example 1 is that the preparation of the ultraviolet cutoff adhesive film layer is carried out during the preparation of the perovskite solar cell module, and the preparation method comprises the following steps.

[0161] Step 1: The glass substrate and FTO transparent conductive layer are stacked and arranged, the FTO transparent conductive layer is laser etched P1 slot, and then the glass substrate is ultrasonically cleaned with glass cleaning solution, water and ethanol for 20 min, and dried with nitrogen to obtain a composite substrate.

[0162] Step 2: The ultraviolet cutoff adhesive film layer is prepared on the side surface of the glass substrate away from the FTO transparent conductive layer by the preparation method provided in Example 1.

[0163] Step 3: Sputtering NiO on the side surface of the FTO transparent conductive layer away from the glass substrate using the method of magnetron sputtering x and annealing at 300℃ for 30min to obtain a 20nm hole transport layer.

[0164] Step 4: Scraping the perovskite solution on the hole transport layer, the scraping speed is 15mm / s, the coating head height is 200μm, annealing at 150℃ for 10min to obtain the perovskite light absorbing layer; in the perovskite solution, the molar ratio of lead iodide: formamidinium hydroiodide: methylammonium iodide: iodine is 1:0.9:0.05:0.05, the mixed solvent DMF:DMSO is 4:1, and the concentration is 1.5mol / L.

[0165] Step 5: Scraping the electron transport layer solution on the perovskite light absorbing layer, the scraping speed is 15mm / s, the coating head height is 100μm, annealing at 70℃ for 10min to obtain the electron transport layer; in the electron transport layer solution, the component is PCBM, the solvent is chlorobenzene, and the concentration is 20mg / mL.

[0166] Step 6: After laser etching P2 line groove on the overall structure of the hole transport layer, the perovskite light absorbing layer and the electron transport layer, evaporating the top (Ag) electrode, the evaporation rate is 5Å / s, and the electrode thickness is 150nm to obtain the top electrode.

[0167] Step 7: Laser etching P3 line groove on the overall structure of the hole transport layer, the perovskite light absorbing layer, the electron transport layer and the top electrode layer, and clearing the edges around the structure, wherein the edge clearing width is 2cm, laminating and packaging the structure at 140℃ for 100s using the cover glass, butyl glue and POE glue film to obtain the packaging layer, and further obtaining the perovskite solar cell module.

[0168] Comparative Example 3

[0169] This comparative example provides a perovskite solar cell module, which is different from Example 1 in that the preparation of the ultraviolet cutoff glue film layer is not performed, and the preparation method and parameters of the perovskite solar cell module remain consistent with Example 1.

[0170] Comparative Example 4

[0171] This example provides a preparation method of an ultraviolet cutoff glue film layer and a perovskite solar cell module, which is different from Example 1 in that the organic solvent is omitted, and the ultraviolet curing glue is directly coated on the first surface of the composite substrate of the perovskite solar cell module by scraping, and then the perovskite solar cell module is obtained, and the rest of the preparation method and parameters remain consistent with Example 1.

[0172] Figure 3The light transmittance contrast chart of the perovskite solar cell module provided by the embodiment 1 and the perovskite solar cell module provided by the comparative example 3 is shown, and it can be seen from the chart that, in the embodiment 1, when the ultraviolet cut-off adhesive film layer exists, the ultraviolet transmittance is basically zero in the ultraviolet wave band of 300nm~390nm, the ultraviolet cut-off can be effectively realized, the transmittance is higher in the visible wave band of 500nm~800nm, and reaches more than 90%, and the visible light utilization rate can be extremely high. In the comparative example 3, when the ultraviolet cut-off adhesive film layer is not arranged, the ultraviolet can be completely transmitted in the ultraviolet wave band of 300nm~390nm, the transmittance in the visible wave band of 500nm~800nm also has a significant decrease, and the visible light utilization rate is obviously reduced.

[0173] The perovskite solar cell modules prepared in the above embodiment 1~9 and comparative examples 1~2 and 4 and the perovskite solar cell module prepared in the comparative example 3 are tested for Jsc1, Voc1, FF1 and Eta1 without ultraviolet light irradiation, then ultraviolet aging test (total irradiation amount is 120KWh / m 2 ), and then Jsc2, Voc2, FF2 and Eta2 are measured, and △Jsc, △Voc, △FF and △Eta are calculated, and the calculation formula is as follows: △Jsc=(Jsc2-Jsc1) / Jsc1×100%; △Voc=(Voc2-Voc1) / Voc1×100%; △FF=(FF2-FF1) / FF1×100%; △Eta=(Eta2-Eta1) / Eta1×100%, and the specific data is shown in Table 1.

[0174] The test method of Jsc, Voc, FF and Eta is as follows: the module is placed on a constant temperature platform (25±1℃), a AAA level solar simulator (spectrum response meets AM1.5G requirements, spectrum matching degree is ±25%, irradiation non-uniformity is ≤2%, time instability is ≤0.5%) is used to irradiate the module, an IV tester is used to scan the I-V curve (test standard refers to IEC 60904-1: photovoltaic device I-V characteristic measurement) synchronously, the starting voltage is set to 25V, the cut-off voltage is set to 0V, the range is set to 1A, the short circuit current Jsc, the open circuit voltage Voc, the fill factor FF and the efficiency Eta are recorded, and the average value is taken by repeating 3 times.

[0175] Table 1

[0176]

[0177] It can be seen from the test results that:

[0178] (1) As can be seen from Examples 1 to 5, the present invention uses diluted UV-curable adhesive as a coating liquid to coat the light-incident surface of the perovskite solar cell module. The subsequent UV curing process can be carried out at low temperature and low power. Low temperature and low power UV curing can avoid the preparation of the film layer under high temperature and high UV energy conditions. At the same time, UV curing can be completed in a relatively short time, avoiding potential damage to the perovskite solar cell module by temperature, time and UV light during the preparation process, and thus improving the preparation efficiency. Setting it at the light-incident end and preparing it in the later stage of the perovskite solar cell module preparation can, on the one hand, block most or all of the UV light from the source, and will not affect the internal structure of the perovskite solar cell module, thus effectively improving the stability of the perovskite solar cell module under UV light.

[0179] Specifically, the ultraviolet aging test (total irradiation of 120 kWh / m²) 2 After that, △Jsc (%) ranged from -0.33% to -0.22%, △Voc (%) ranged from -2.35% to 0.68%, △FF (%) ranged from -3.78% to 0.14%, and △Eta (%) ranged from -4.89% to -3.27%. Among these, △FF in Examples 1 and 4, and △Voc in Examples 2 and 3, will increase further.

[0180] (2) As can be seen from Examples 6-8, the UV curing time of the present invention is controlled to be 10s-60s, the curing temperature is 25℃-30℃, and the curing power is 200mW / cm. 2 ~600mW / cm 2 The process is carried out at low UV energy and room temperature, which avoids the impact of high temperature and high UV energy curing on the stability of the perovskite light-absorbing layer, and can also effectively improve the stability of the resulting perovskite solar cell module under UV irradiation.

[0181] (3) As can be seen from Example 9, the viscosity of the UV protection liquid of the present invention is controlled to be 500 mPa·s~800 mPa·s, which can make the UV curing adhesive better dispersed in the organic solvent and the composition of the protection liquid is uniform. If the viscosity of the UV protection liquid is too high, it indicates that the amount of UV curing adhesive added is too much, which will cause the UV curing adhesive to be unable to be uniformly dispersed in the organic solvent, which will affect the light transmittance and visible light utilization of the obtained UV cutoff adhesive film layer, and is also not conducive to the subsequent coating and curing process.

[0182] (4) As can be seen from Example 1 and Comparative Example 1, compared with the method of using ordinary UVP additives in the prior art, it is necessary to anneal at a certain temperature. The higher the temperature and the longer the time, the more likely it will have an unavoidable impact on the perovskite light-absorbing layer and also affect the preparation efficiency. The overall photoelectric performance of the perovskite solar cell module will be reduced. Even if there is an ultraviolet cutoff film layer, the overall photoelectric performance of the perovskite solar cell module will be greatly reduced after ultraviolet aging.

[0183] (5) As can be seen from Example 1 and Comparative Example 2, when the UV cutoff film layer is prepared first, the preparation of other functional layers in the later stage will affect the UV cutoff film layer. For example, the annealing temperature during the preparation of each functional layer in the later stage will affect the cutoff performance of the UV cutoff film and reduce the effect of the UV cutoff film layer.

[0184] (6) As can be seen from Example 1 and Comparative Example 3, when the preparation of the UV cutoff film layer is omitted, the overall photoelectric performance of the perovskite solar cell module is significantly reduced after UV aging, and ΔFF and ΔEta are nearly 3 times or even more than those in Example 1.

[0185] (7) As can be seen from Example 1 and Comparative Example 4, when the addition of organic solvent is omitted and only UV-curable adhesive is used for coating, the Jsc, Voc, FF and Eta of the obtained perovskite solar cell module are significantly reduced after UV aging test. The reason is that, due to the omission of the addition of organic solvent, the UV curing rate is greatly reduced. Under the same curing time, temperature and power as in Example 1, only the surface of the UV cutoff adhesive film layer can be cured, while the inner layer is not completely cured. Therefore, it cannot effectively cut off UV light, and the overall photoelectric performance of the perovskite solar cell module is greatly reduced. If complete curing is to be achieved, the curing time and power must be increased. At the same time, the thermal effect is aggravated, which inevitably causes potential damage to the functional layer of the perovskite solar cell, and the preparation efficiency is also greatly reduced.

[0186] In summary, the application uses diluted ultraviolet curing adhesive as coating liquid, which is coated on the light-incident surface of the perovskite solar cell module, and the subsequent ultraviolet curing process can be carried out at low temperature and low power. Low-temperature and low-power ultraviolet curing can avoid the preparation of the film layer under high-temperature and high-ultraviolet energy conditions, and can complete the ultraviolet curing in a relatively short time, avoid the potential damage to the functional layer of the perovskite solar cell caused by long-time ultraviolet irradiation and the accompanying thermal effect problem in the preparation process, and further improve the preparation efficiency. By setting it at the light-incident end and preparing it in the late stage of the preparation of the perovskite solar cell module, on the one hand, most or all of the ultraviolet light can be cut off from the source, and the internal structure of the perovskite solar cell module will not be affected, thereby effectively improving the stability of the perovskite solar cell module under ultraviolet light, on the other hand, the preparation of the cut-off adhesive film layer on the light-incident surface of the perovskite solar cell module after the preparation of the perovskite solar cell module and the thin thickness improve the production efficiency and reduce the manufacturing cost.

[0187] The above merely describes the specific embodiments of the present application, but the protection scope of the present application is not limited thereto. It should be understood by those skilled in the art that any changes or replacements within the technical scope disclosed by the present application can be easily thought of, and all such changes or replacements fall within the protection scope and disclosure scope of the present application.

Claims

1. A method for preparing an ultraviolet cut adhesive film layer for a perovskite solar cell module, characterized by, The preparation method comprises the following steps: S1, providing an ultraviolet curing adhesive, wherein a cut-off ultraviolet wave range of the ultraviolet curing adhesive is 200nm-400nm; S2, providing an organic solvent, wherein the organic solvent comprises a solvent A and a solvent B, the solvent A comprises toluene and / or dimethylbenzene, the solvent B comprises any one of acetone, butanone, diethyl ether, propylene glycol ether, n-hexane, cyclohexane or n-pentane, a volume ratio of the solvent A and the solvent B is x:y, x+y=1, 0 S3, diluting the ultraviolet curing adhesive by using the organic solvent to obtain an ultraviolet protection liquid, wherein a viscosity of the ultraviolet protection liquid is 500mPa·s-800mPa·s; S4, coating the ultraviolet protection liquid on a light-incident surface of a perovskite solar cell module to obtain an ultraviolet protection wet film; S5, performing ultraviolet curing on the ultraviolet protection wet film to obtain an ultraviolet cut-off adhesive film layer.

2. The production method according to claim 1, characterized by, The curing temperature of the ultraviolet curing in step S5 is 25℃-30℃.

3. The preparation method according to claim 1, characterized in that, The curing power for the UV curing in step S5 is 200 mW / cm 2 ~600 mW / cm 2 .

4. The production method according to claim 1, characterized by, The curing time of the ultraviolet curing in step S5 is 10s-60s.

5. The preparation method according to claim 1, characterized in that, Before the ultraviolet curing in step S5, the ultraviolet protection wet film is further subjected to the steps of drying and leveling in sequence.

6. The production method according to claim 5, wherein The temperature of the drying is 40℃-70℃; And / or, the time of the drying is 10min-25min; And / or, the leveling mode comprises any one of standing leveling, blade coating leveling or roller coating leveling.

7. The preparation method according to claim 1, characterized in that, The solid content of the ultraviolet protection liquid in step S3 is 25%-65%.

8. The method of claim 1, wherein, The volume ratio of the ultraviolet curing adhesive in step S1 and the organic solvent in step S2 is (0.5-3):

1.

9. An ultraviolet cut-off adhesive film layer, characterized by, The ultraviolet cut-off adhesive film layer is prepared according to the preparation method in any one of claims 1-8, and a thickness of the ultraviolet cut-off adhesive film layer is 50μm-300μm.

10. A perovskite solar cell module, characterized by, The perovskite solar cell module comprises a perovskite solar cell module and an ultraviolet cut-off adhesive film layer located on a light-incident surface of the perovskite solar cell module, the ultraviolet cut-off adhesive film layer is prepared by using the preparation method in any one of claims 1-8, or the ultraviolet cut-off adhesive film layer is the one in claim 9.

11. The perovskite solar cell module according to claim 10, characterized in that, The perovskite solar cell module comprises: a substrate; a transparent conductive layer, which is laminated on one side of the substrate; a first carrier transport layer, which is laminated on a side of the transparent conductive layer away from the substrate; a perovskite light-absorbing layer, which is laminated on a side of the first carrier transport layer away from the transparent conductive layer; a second carrier transport layer, which is laminated on a side of the perovskite light-absorbing layer away from the first carrier transport layer; a top electrode layer, which is laminated on a side of the second carrier transport layer away from the perovskite light-absorbing layer; and an encapsulation layer, which is laminated on a side of the top electrode layer away from the second carrier transport layer.

12. The perovskite solar cell module according to claim 11, characterized in that, The first carrier transport layer comprises a hole transport layer, and the second carrier transport layer comprises an electron transport layer, or the first carrier transport layer comprises an electron transport layer, and the second carrier transport layer comprises a hole transport layer.

13. A photovoltaic module, characterized by, The photovoltaic module comprises the perovskite solar cell module in any one of claims 10-12.

14. A photovoltaic system characterized by, The photovoltaic system comprises the photovoltaic module according to claim 13.

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