Display panel, preparation method thereof and display device

Abstract

Embodiments of the present application provide a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, an isolation structure, the isolation structure surrounds a plurality of isolation openings, the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is located on a side of the second isolation part away from the substrate, the second isolation part comprises a first surface, a second surface and a side wall, the first surface is located on a side of the second surface away from the substrate, and the first surface and the second surface are connected by the side wall; a projection of the first surface on the substrate is located within a projection range of the first isolation part on the substrate; a projection of the first surface on the substrate is located within a projection range of the second surface on the substrate; an included angle between the side wall and the second surface in the isolation structure surrounding the first isolation opening is a first included angle; an included angle between the side wall and the second surface in the isolation structure surrounding the second isolation opening is a second included angle; and the first included angle is greater than the second included angle.

Description

Technical Field

[0001] This application relates to the field of display technology, and more specifically, to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0002] Organic light-emitting diode (OLED) display technology is considered the most promising next-generation display technology. Compared with liquid crystal display technology, OLED display technology has advantages such as low energy consumption, low cost, self-emissiveness, wide viewing angle, and fast response speed.

[0003] In the traditional OLED display panel manufacturing process, a fine metal mask (FMM) is typically used to pattern the light-emitting pixels. FMM technology is mature and has extensive mass production experience. However, FMM technology also suffers from limitations in precision and high cost. Fine metal mask-less technology eliminates the limitations of traditional OLED processes on display size, resolution, and other screen performance characteristics, offering advantages such as high performance, full-size display, and agile delivery. Patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A describe relevant content regarding fine metal mask-less technology and are provided for reference.

[0004] However, due to limitations in related technologies, current display panels suffer from low yield rates and still cannot adequately meet the demand. Summary of the Invention

[0005] In order to overcome the technical problems mentioned in the above technical background, this application provides a display panel, a method for manufacturing the same, and a display device.

[0006] The first aspect of this application provides a display panel, including:

[0007] substrate;

[0008] An isolation structure is located on one side of a substrate. The isolation structure encloses multiple isolation openings, including a first isolation opening and a second isolation opening. The isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located on the side of the second isolation portion facing away from the substrate. The second isolation portion includes a first surface, a second surface, and a sidewall. The first surface is located on the side of the second surface facing away from the substrate, and the first and second surfaces are connected by the sidewall. The orthographic projection of the first surface onto the substrate is within the orthographic projection range of the first isolation portion onto the substrate. The orthographic projection of the first surface onto the substrate is within the orthographic projection range of the second surface onto the substrate. In the isolation structure enclosing the first isolation opening, the included angle between the sidewall and the second surface is a first included angle. In the isolation structure enclosing the second isolation opening, the included angle between the sidewall and the second surface is a second included angle. The first included angle is greater than the second included angle.

[0009] Multiple light-emitting devices, including a first light-emitting device and a second light-emitting device, wherein at least a portion of the first light-emitting device is located in a first isolation opening and at least a portion of the second light-emitting device is located in a second isolation opening.

[0010] In one embodiment, in the isolation structure that encloses the first isolation opening, the distance by which the first isolation portion extends beyond the first surface is a first distance; in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the first surface is a second distance, and the first distance is less than or equal to the second distance.

[0011] Preferably, in the isolation structure that encloses the first isolation opening, the distance by which the first isolation portion extends beyond the second surface is a third distance; in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the second surface is a fourth distance, and the third distance is greater than or equal to the fourth distance.

[0012] Preferably, in the isolation structure that encloses the first isolation opening, the first isolation portion extends beyond the second surface; in the isolation structure that encloses the second isolation opening, the second surface extends beyond the first isolation portion.

[0013] In one embodiment, the first light-emitting device includes a first light-emitting functional layer and a first electrode layer located in a first isolation opening, wherein the first electrode layer is located on the side of the first light-emitting functional layer away from the substrate.

[0014] The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on the side of the second light-emitting functional layer away from the substrate.

[0015] The thickness of the first light-emitting functional layer is less than the thickness of the second light-emitting functional layer;

[0016] Preferably, the first light-emitting device includes a blue light-emitting device, and the second light-emitting device includes a green light-emitting device.

[0017] In one embodiment, the display panel further includes a first encapsulation layer, the first encapsulation layer including a plurality of encapsulation portions, the plurality of encapsulation portions including a first encapsulation portion and a second encapsulation portion;

[0018] The first package portion is located on the side of the first light-emitting device away from the substrate, and the orthographic projection of the first isolation opening on the substrate is within the orthographic projection range of the first package portion on the substrate; a portion of the first package portion is located on the side of the first isolation portion away from the substrate, and the distance between the first package portion and the first isolation portion is the fifth distance.

[0019] The second encapsulation portion is located on the side of the second light-emitting device away from the substrate, and the orthographic projection of the second isolation opening on the substrate is within the orthographic projection range of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on the side of the isolation structure away from the substrate, and the distance between the second encapsulation portion and the first isolation portion is the sixth distance.

[0020] The fifth distance is less than the sixth distance.

[0021] In one embodiment, the area of ​​the first isolation opening projected onto the substrate is greater than the area of ​​the second isolation opening projected onto the substrate.

[0022] In one embodiment, the plurality of isolation openings further includes a third isolation opening, and in the isolation structure surrounding the third isolation opening, the included angle between the sidewall and the second surface is the third included angle;

[0023] The second included angle is greater than the third included angle.

[0024] In one embodiment, in the isolation structure that encloses the third isolation opening, the distance by which the first isolation portion extends beyond the first surface is a seventh distance; in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the first surface is a second distance, and the second distance is less than or equal to the seventh distance.

[0025] Preferably, in the isolation structure that encloses the second isolation opening, the distance by which the first isolation part extends beyond the second surface is the fourth distance; in the isolation structure that encloses the third isolation opening, the distance by which the first isolation part extends beyond the second surface is the eighth distance, and the fourth distance is greater than or equal to the eighth distance.

[0026] Preferably, in the isolation structure that encloses the second isolation opening, the first isolation portion extends out of the second surface; in the isolation structure that encloses the third isolation opening, the second surface extends out of the first isolation portion.

[0027] Preferably, in the isolation structure that encloses the second isolation opening, the distance by which the second surface extends beyond the first isolation portion is the ninth distance; in the isolation structure that encloses the third isolation opening, the distance by which the second surface extends beyond the first isolation portion is the tenth distance; the tenth distance is greater than or equal to the ninth distance.

[0028] In one embodiment, the plurality of light-emitting devices include a third light-emitting device, the third light-emitting device including a third light-emitting functional layer and a third electrode layer located in a third isolation opening, the third electrode layer being located on the side of the third light-emitting functional layer away from the substrate.

[0029] The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on the side of the second light-emitting functional layer away from the substrate.

[0030] The thickness of the second light-emitting functional layer is less than the thickness of the third light-emitting functional layer;

[0031] Preferably, the second light-emitting device includes a green light-emitting device, and the third light-emitting device includes a red light-emitting device.

[0032] In one embodiment, the display panel further includes a first encapsulation layer, the first encapsulation layer including a plurality of encapsulation portions, the plurality of encapsulation portions including a second encapsulation portion and a third encapsulation portion;

[0033] The second encapsulation portion is located on the side of the second light-emitting device away from the substrate, and the orthographic projection of the second isolation opening on the substrate is within the orthographic projection range of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on the side of the isolation structure away from the substrate, and the distance between the second encapsulation portion and the first isolation portion is the sixth distance.

[0034] The third encapsulation part is located on the side of the third light-emitting device away from the substrate, and the orthographic projection of the third isolation opening on the substrate is within the orthographic projection range of the third encapsulation part on the substrate; a portion of the third encapsulation part is located on the side of the first isolation part away from the substrate, and the distance between the third encapsulation part and the first isolation part is the eleventh distance.

[0035] The sixth distance is less than the eleventh distance.

[0036] In one embodiment, the area of ​​the first isolation opening projected onto the substrate is greater than the area of ​​the second isolation opening projected onto the substrate, and the area of ​​the first isolation opening projected onto the substrate is greater than the area of ​​the third isolation opening projected onto the substrate.

[0037] In one embodiment, the isolation structure further includes a third isolation portion located on the side of the second isolation portion closer to the substrate, wherein the orthographic projection of the second isolation portion on the substrate is within the orthographic projection range of the third isolation portion on the substrate.

[0038] Preferably, in the isolation structure that encloses the first isolation opening, the distance by which the third isolation part extends beyond the second surface is the twelfth distance; in the isolation structure that encloses the second isolation opening, the distance by which the third isolation part extends beyond the second surface is the thirteenth distance; the twelfth distance is less than the thirteenth distance.

[0039] A second aspect of this application provides a method for manufacturing a display panel, comprising:

[0040] A fourth electrode layer is fabricated on one side of the substrate;

[0041] A second isolation material layer and a first isolation material layer are sequentially prepared on the side of the fourth electrode layer away from the substrate;

[0042] The first and second isolation material layers are patterned to obtain a first isolation opening and a first intermediate isolation opening; the fourth electrode layer is at least partially exposed to the first isolation opening and the first intermediate isolation opening.

[0043] A first light-emitting functional material layer and a first electrode material layer are sequentially prepared in the first isolation opening, with a portion of the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening;

[0044] A first etching process is performed on the first light-emitting functional material layer and the first electrode material layer to remove the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening, while retaining the first light-emitting functional material layer and the first electrode material layer located in the first isolation opening, resulting in a first light-emitting device, a second isolation portion, a first isolation portion, and a second isolation opening. The first isolation portion and the second isolation portion constitute an isolation structure. The second isolation portion includes a first surface, a second surface, and a sidewall. The first surface is located on the side of the second surface facing away from the substrate, and the first surface and the second surface are connected by the sidewall. The orthographic projection of the first surface on the substrate is within the orthographic projection range of the first isolation portion on the substrate. The orthographic projection of the first surface on the substrate is within the orthographic projection range of the second surface on the substrate. In the isolation structure surrounding the first isolation opening, the included angle between the sidewall and the second surface is a first included angle. In the isolation structure surrounding the second isolation opening, the included angle between the sidewall and the second surface is a second included angle. The first included angle is greater than the second included angle.

[0045] A second light-emitting functional layer and a second electrode layer are sequentially fabricated in the second isolation opening to obtain a second light-emitting device.

[0046] In one embodiment, the first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening, a first intermediate isolation opening, and a second intermediate isolation opening;

[0047] Preferably, in the step of sequentially preparing the first light-emitting functional material layer and the first electrode material layer in the first isolation opening, a portion of the first light-emitting functional material layer and the first electrode material layer are located in the first intermediate isolation opening and the second intermediate isolation opening;

[0048] Preferably, the step of performing the first etching process on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain the third intermediate isolation opening;

[0049] Preferably, the second light-emitting functional layer and the second electrode layer are sequentially fabricated in the second isolation opening, comprising:

[0050] A second light-emitting functional material layer and a second electrode material layer are sequentially prepared in the second isolation opening, with a portion of the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening;

[0051] A second etching process is performed on the second light-emitting functional material layer and the second electrode material layer to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening, while retaining the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, thereby obtaining the second light-emitting device and the third isolation opening. In the isolation structure surrounding the third isolation opening, the included angle between the sidewall and the second surface is the third included angle; the second included angle is greater than the third included angle.

[0052] In one embodiment, the step of sequentially fabricating a first light-emitting functional material layer and a first electrode material layer in a first isolation opening includes:

[0053] A first light-emitting functional material layer, a first electrode material layer, and a first encapsulation material layer are sequentially prepared in the first isolation opening;

[0054] Preferably, the first etching process for the first light-emitting functional material layer and the first electrode material layer includes: performing a first etching process on the first light-emitting functional material layer, the first electrode material layer and the first encapsulation material layer to obtain a first light-emitting device and a first encapsulation portion, wherein a portion of the first encapsulation portion is located on the side of the first isolation portion away from the substrate, and the distance between the first encapsulation portion and the first isolation portion is a fifth distance.

[0055] Preferably, the second light-emitting functional layer and the second electrode layer are sequentially fabricated in the second isolation opening, comprising:

[0056] A second light-emitting functional material layer and a second electrode material layer are sequentially prepared in the second isolation opening. The thickness of the second light-emitting functional material layer is greater than the fifth distance. At the edge of the first encapsulation part, the second electrode material layer extends continuously from the side of the first encapsulation part away from the substrate to the side of the first isolation part away from the substrate.

[0057] A second etching process is performed on the second light-emitting functional material layer and the second electrode material layer, retaining the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, to obtain the second light-emitting device.

[0058] A third aspect of this application provides a display device, including the aforementioned display panel, or including a display panel prepared by the aforementioned preparation method.

[0059] In the display panel provided in this application embodiment, in the isolation structure surrounding the first isolation opening, the included angle between the sidewall and the second surface is the first included angle; in the isolation structure surrounding the second isolation opening, the included angle between the sidewall and the second surface is the second included angle; when the first included angle is greater than the second included angle, the film layer of the second light-emitting device, such as the cathode film layer of the second light-emitting device, is more likely to overlap with the sidewall of the isolation structure and is conducive to obtaining a relatively large overlap area, and the cathode ramp angle of the second light-emitting device is smaller, which is conducive to improving the continuity of the cathode film layer, improving the overlap effect, improving the yield of the display panel, and reducing the power consumption of the display panel. Attached Figure Description

[0060] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0061] Figure 1 This is one of the schematic diagrams of the cross-sectional structure of a display panel in related technologies.

[0062] Figure 2 This is the second schematic diagram of the cross-sectional structure of a display panel in related technologies.

[0063] Figure 3 This is a schematic cross-sectional view of the display panel in one embodiment of this application.

[0064] Figure 4 This is a top view of the display panel in one embodiment of this application.

[0065] Figure 5 This is one of the cross-sectional structural schematic diagrams of the display panel in another embodiment of this application.

[0066] Figure 6 This is a second schematic diagram of the cross-sectional structure of the display panel in another embodiment of this application.

[0067] Figure 7 This is the third schematic diagram of the cross-sectional structure of the display panel in another embodiment of this application.

[0068] Figure 8 This is the fourth schematic diagram of the cross-sectional structure of the display panel in another embodiment of this application.

[0069] Figure 9 This is the fifth schematic diagram of the cross-sectional structure of the display panel in another embodiment of this application.

[0070] Figure 10This is a schematic diagram of the manufacturing process of a display panel in one embodiment of this application.

[0071] Figure 11 This is a schematic diagram of the structure in which a first light-emitting functional material layer and a first electrode material layer are sequentially prepared in a first isolation opening according to one embodiment of this application.

[0072] Figure 12 This is a schematic cross-sectional view of the display panel in another embodiment of this application.

[0073] Figure 13 This is a schematic diagram of the structure in one embodiment of the present application, in which a second light-emitting functional layer, a second electrode layer, and a second encapsulation material layer are sequentially prepared in a second isolation opening.

[0074] Figure 14 This is a schematic cross-sectional view of the display panel in another embodiment of this application. Detailed Implementation

[0075] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0076] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0077] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. It should be noted that, unless otherwise specified, different features in the embodiments of this application can be combined with each other.

[0078] For ease of understanding, the accompanying diagram shows the mutually orthogonal X-axis, Y-axis, and Z-axis. The direction along the X-axis is called the X-direction, the direction along the Y-axis is called the Y-direction, and the direction along the Z-axis is called the Z-direction. The Z-direction is the normal direction relative to the plane containing the X and Y directions. Furthermore, a view where various elements are observed parallel to the plane containing the X and Y directions is called a top view. Alternatively, the planes in the X and Y directions can be planes parallel to the display surface of the display panel, and the Z-direction can be a direction parallel to the thickness direction of the display panel.

[0079] For certain elements, terms like "above" or "overhead" are sometimes used when describing the position of an element in the Z direction, and "below" or "under" are used when describing the position of an element in the opposite direction. Furthermore, when using terms like "above," "overhead," "below," "under," or "relative" to define the positional relationship between two elements, this includes not only the state where the two elements are directly adjacent, but also the state where the two elements are separated by gaps or other elements. Additionally, terms like "first," "second," and "third" are used only for distinguishing descriptions and should not be interpreted as indicating or implying relative importance.

[0080] The inventors of this application discovered through research that when fabricating a display panel using a fine metal mask-free technique, referring to... Figure 1 The diagram shows a cross-sectional structure of the display panel. Figure 1(This is a schematic diagram of the structure before the light-emitting device 300 is fabricated). The display panel includes an isolation structure 200, which is used to isolate the light-emitting functional layer of the light-emitting device 300, and the cathode layer of the light-emitting device 300 is also isolated. The isolation structure 200 encloses a first isolation opening 211, a second isolation opening 212, and a third isolation opening 213. The isolation structure 200 includes a first isolation portion 201 and a second isolation portion 202. The first isolation portion 201 is located on the side of the second isolation portion 202 away from the substrate 100. The second isolation portion 202 includes a first surface 2021, a second surface 2022, and a sidewall 2023. The first surface 2021 is located on the side of the second surface 2022 away from the substrate 100, and the sidewall 2023 is used to connect the first surface 2021 and the second surface 2022. The first isolation portion enclosing the first isolation opening 211 is formed before the light-emitting functional layer and the cathode layer of the light-emitting device 300 are fabricated. The distance L1 from which the first isolation portion 201 extends beyond the first surface 201, the distance L2 from which the first isolation portion 201 surrounding the second isolation opening 212 extends beyond the first surface 201, and the distance L3 from which the first isolation portion 201 surrounding the third isolation opening 203 extends beyond the first surface 201 are equal. Furthermore, the angles α1 between the sidewall 203 surrounding the first isolation opening 211 and the second surface 2022, α2 between the sidewall 203 surrounding the second isolation opening 212 and the second surface 2022, and α3 between the sidewall 203 surrounding the third isolation opening 203 and the second surface 2022 are equal. The light-emitting device 300 includes a first light-emitting device 310, a second light-emitting device 320, and a third light-emitting device 330, which are fabricated sequentially in the order of the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330. During the fabrication of the first light-emitting device 310 in the first isolation opening 211, a wet etching process is used for patterning. Simultaneously, the second isolation opening 212 is etched, resulting in the distance L2' of the first isolation portion 201 surrounding the second isolation opening 212 extending beyond the first surface 201 being greater than the distance L1. Similarly, after the second light-emitting device 320 is fabricated, the distance L3' of the first isolation portion 201 surrounding the third isolation opening 213 extending beyond the first surface 2021 is greater than the distance L2'. For details, please refer to [reference needed]. Figure 2 The diagram shows a cross-sectional structure of the display panel. Because L3' is greater than L2' and L2' is greater than L1, the cathode layers of the subsequently manufactured second and third light-emitting devices 320 and 330 are difficult to overlap with the isolation structure 200. Furthermore, the relationship between the included angles α1, α2, and α3 remains α1=α2=α3, resulting in a larger ramp angle for the cathode layers of the subsequently manufactured second and third light-emitting devices 320 and 330. This leads to discontinuity in the cathode layers of the subsequently manufactured second and third light-emitting devices 320 and 330, consequently reducing the yield of the display panel.

[0081] In view of this, the first aspect of this application provides a display panel, referring to Figure 3 The diagram shows a cross-sectional structure of the display panel, which includes a substrate 100, an isolation structure 200, and multiple light-emitting devices 300.

[0082] Optionally, the isolation structure 200 is located on one side of the substrate 100; the isolation structure 200 surrounds a plurality of isolation openings 210, including a first isolation opening 211 and a second isolation opening 212; the isolation structure 200 includes a first isolation portion 201 and a second isolation portion 202, the first isolation portion 201 is located on the side of the second isolation portion 202 away from the substrate 100, the second isolation portion 202 includes a first surface 2021, a second surface 2022 and a sidewall 2023, the first surface 2021 is located on the side of the second surface 2022 away from the substrate 100, and the first surface 2021 and the second surface 2022 are connected. The first surface 2021 is connected via the sidewall 2023; the orthographic projection of the first surface 2021 on the substrate 100 is within the orthographic projection range of the first isolation portion 201 on the substrate 100; the orthographic projection of the first surface 2021 on the substrate 100 is within the orthographic projection range of the second surface 2022 on the substrate 100; in the isolation structure 200 surrounding the first isolation opening 211, the included angle between the sidewall 2023 and the second surface 2022 is the first included angle β1; in the isolation structure 200 surrounding the second isolation opening 212, the included angle between the sidewall 2023 and the second surface 2022 is the second included angle β2; the first included angle β1 is greater than the second included angle β2.

[0083] Optionally, the plurality of light-emitting devices 300 include a first light-emitting device 310 and a second light-emitting device 320, with at least a portion of the first light-emitting device 310 located in the first isolation opening 211 and at least a portion of the second light-emitting device 320 located in the second isolation opening 212.

[0084] In one embodiment, the first light-emitting device 310 includes a first light-emitting functional layer 311 and a first electrode layer 312 located in the first isolation opening 211, with the first electrode layer 312 located on the side of the first light-emitting functional layer 311 facing away from the substrate 100; the second light-emitting device 320 includes a second light-emitting functional layer 321 and a second electrode layer 322 located in the second isolation opening 212, with the second electrode layer 322 located on the side of the second light-emitting functional layer 321 facing away from the substrate 100.

[0085] For example, the first electrode layer 312 and the second electrode layer 322 are each independently a cathode.

[0086] It is understandable that the first included angle β1 is greater than the second included angle β2, that is, the slope of the side wall 2023 of the second isolation part 202 surrounding the second isolation opening 212 is less than the slope of the side wall 2023 of the second isolation part 202 surrounding the first isolation opening 211. This makes the climbing angle of the second electrode layer 322 of the second light-emitting device 320 relatively small, which is beneficial to improve the film continuity of the second electrode layer 322 and make the overlap effect between the second electrode layer 322 and the isolation structure 200 better.

[0087] In one embodiment, refer to Figure 4 The schematic diagram of the top view of the display panel shows that the area of ​​the first isolation opening 211 projected onto the substrate 100 is larger than the area of ​​the second isolation opening 212 projected onto the substrate 100. If the first included angle β1 is equal to the second included angle β2, the overlap area between the second electrode layer 322 and the isolation structure 200 is smaller than the overlap area between the first electrode layer 312 and the isolation structure 200, resulting in a larger overlap resistance between the second electrode layer 322 and the isolation structure 200. Furthermore, the ramp angle of the second electrode layer 322 is relatively large, resulting in lower continuity of the second electrode layer 322, further increasing the overlap resistance between the second electrode layer 322 and the isolation structure 200. In the display panel of this application embodiment, the first included angle β1 is greater than the second included angle β2, and the ramp angle of the second electrode layer 322 of the second light-emitting device 320 is relatively small, which is beneficial to improving the film continuity of the second electrode layer 322 and may increase the overlap area between the second electrode layer 322 and the isolation structure 200, which is beneficial to reducing the overlap resistance between the second electrode layer 322 and the isolation structure 200, which is beneficial to reducing the power consumption of the display panel, and almost no problems such as dark spots or dark patches will occur.

[0088] In the display panel provided in this application embodiment, in the isolation structure 200 surrounding the first isolation opening 211, the included angle between the side wall 2023 and the second surface 2022 is a first included angle β1; in the isolation structure 200 surrounding the second isolation opening 212, the included angle between the side wall 2023 and the second surface 2022 is a second included angle β2; when the first included angle β1 is greater than the second included angle β2, the film layer of the second light-emitting device 320, such as the cathode film layer of the second light-emitting device 320, is more likely to overlap with the side wall 2023 of the isolation structure 200 and is conducive to obtaining a relatively large overlap area, and the cathode ramp angle of the second light-emitting device 320 is smaller, which is conducive to improving the continuity of the cathode film layer and improving the overlap effect.

[0089] In one embodiment, in the isolation structure 200 surrounding the first isolation opening 211, the distance by which the first isolation portion 201 extends beyond the first surface 2021 is a first distance D1; in the isolation structure 200 surrounding the second isolation opening 212, the distance by which the first isolation portion 201 extends beyond the first surface 2021 is a second distance D2, and the first distance D1 is less than the second distance D2 (refer to...). Figure 3 Alternatively, the first distance D1 is equal to the second distance D2.

[0090] It should be noted that the distance by which the first isolation portion 201 extends beyond the first surface 2021 refers to the distance within which the orthographic projection of the first surface 2021 on the substrate 100 is located. The distance between the edge of the orthographic projection of the first surface 2021 on the substrate 100 and the edge of the orthographic projection of the first isolation portion 201 on the substrate 100 is the distance by which the first isolation portion 201 extends beyond the first surface 2021.

[0091] It is understandable that when the first included angle β1 is greater than the second included angle β2, the overlap effect between the first electrode layer 312 of the first light-emitting device 310 and the sidewall 2023 is not as good as the overlap effect between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023. Therefore, when the first distance D1 is less than the second distance D2, it is beneficial to increase the overlap area between the first electrode layer 312 and the sidewall 2023 and improve the overlap effect between the first electrode layer 312 and the sidewall 2023.

[0092] For example, if the first distance D1 is greater than the second distance D2, the overlap effect between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023 can be further improved, but it may lead to poor overlap effect between the first electrode layer 312 of the first light-emitting device 310 and the sidewall 2023.

[0093] Optionally, in the isolation structure 200 that encloses the first isolation opening 211, the distance by which the first isolation portion 201 extends beyond the second surface 2022 is a third distance D3; in the isolation structure 200 that encloses the second isolation opening 212, the distance by which the first isolation portion 201 extends beyond the second surface 2022 is a fourth distance D4, and the third distance D3 is greater than the fourth distance D4 (refer to...). Figure 5 Alternatively, the third distance D3 is equal to the fourth distance D4.

[0094] It should be noted that the distance by which the first isolation portion 201 extends beyond the second surface 2022 refers to the distance within which the orthographic projection of the second surface 2022 onto the substrate 100 falls within the orthographic projection range of the first isolation portion 201 onto the substrate 100. The distance between the edge of the orthographic projection of the second surface 2022 onto the substrate 100 and the edge of the orthographic projection of the first isolation portion 201 onto the substrate 100 is the distance by which the first isolation portion 201 extends beyond the second surface 2022. It can be understood that the smaller the distance by which the first isolation portion 201 extends beyond the second surface 2022, the better the connection between the cathode and the isolation structure 200. For example, a third distance D3 greater than a fourth distance D4 is beneficial for improving the connection effect between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023.

[0095] Optionally, refer to Figure 6 The schematic diagram of the cross-sectional structure of the display panel shown illustrates that in the isolation structure 200 surrounding the first isolation opening 211, the first isolation portion 201 extends out of the second surface 2022; in the isolation structure 200 surrounding the second isolation opening 212, the second surface 2022 extends out of the first isolation portion 201. This facilitates further increasing the overlap area between the second electrode layer 322 and the sidewall 2023 of the second light-emitting device 320, improving the continuity of the second electrode layer 322, and enhancing the overlap effect between the second electrode layer 322 and the sidewall 2023. It should be noted that... Figure 6 The document only shows the main structures such as the isolation structure and the substrate, and should not be construed as a limitation of this application.

[0096] It is understandable that in the isolation structure 200 that surrounds the second isolation opening 212, when the second surface 2022 extends out of the first isolation part 201, the evaporation angle of the second light-emitting functional layer 321 of the second light-emitting device 320 can be adjusted so that the second light-emitting functional layer 321 does not overlap with the isolation structure 200.

[0097] It is understandable that in the isolation structure 200 that surrounds the second isolation opening 212, the second surface 2022 extending out of the first isolation part 201 is more conducive to the second electrode layer 322 overlapping with the side wall 2023.

[0098] It should be noted that when the first isolation portion 201 extends out of the second surface 2022, the orthographic projection of the second surface 2022 on the substrate 100 is within the orthographic projection range of the first isolation portion 201 on the substrate 100; when the second surface 2022 extends out of the first isolation portion 201, the orthographic projection of the first isolation portion 201 on the substrate 100 is within the orthographic projection range of the second surface 2022 on the substrate 100.

[0099] Optionally, the first light-emitting device 310 includes a blue light-emitting device, and the second light-emitting device 320 includes a green light-emitting device. The thickness of the first light-emitting functional layer 311 is less than the thickness of the second light-emitting functional layer 321.

[0100] For example, the first light-emitting device 310 and the second light-emitting device 320 can be organic light-emitting diode (OLED) devices or quantum dot light-emitting diodes (QLED) devices.

[0101] It is understandable that the light emitted by the luminescent functional layer needs to be reflected and transmitted through the electrodes to form interference. The interference enhancement effect is controlled by adjusting the thickness of the luminescent functional layer film to maximize the intensity of the target wavelength light. The wavelength of blue light (approximately 430 nm-480 nm) is shorter than that of green light (approximately 500 nm-560 nm). According to the microcavity resonance condition (the optical path difference is an integer multiple of half the wavelength), the total thickness of the luminescent functional layer (including the luminescent layer, charge transport layer, etc.) matching the blue light resonance is less than the total thickness of the luminescent functional layer (including the luminescent layer, charge transport layer, etc.) matching the green light resonance, so as to achieve interference enhancement of blue light and improve luminous efficiency and color purity. In addition, the exciton diffusion length of materials emitting blue light (such as fluorescent or phosphorescent dyes) is shorter. A thinner luminescent functional layer can reduce non-radiative recombination, which also indirectly leads to thinner film layers in blue light-emitting devices.

[0102] In one embodiment, refer to Figure 7 The schematic diagram of the cross-sectional structure of the display panel shown shows that the display panel also includes a first encapsulation layer 400, the first encapsulation layer 400 includes a plurality of encapsulation parts 410, and the plurality of encapsulation parts 410 include a first encapsulation part 411 and a second encapsulation part 412.

[0103] The first encapsulation portion 411 is located on the side of the first light-emitting device 310 away from the substrate 100, and the orthographic projection of the first isolation opening 211 on the substrate 100 is within the orthographic projection range of the first encapsulation portion 411 on the substrate 100; a portion of the first encapsulation portion 411 is located on the side of the first isolation portion 201 away from the substrate 100, and the distance between the first encapsulation portion 411 and the first isolation portion 201 is the fifth distance D5. For example, when fabricating the first light-emitting device 310, it is necessary to fabricate a whole layer of light-emitting functional material layer, a first electrode material layer, and a first encapsulation material layer. Part of the light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer are located on the side of the isolation structure 200 surrounding the first isolation opening 211 that is away from the substrate 100. Then, the light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer are wet-etched to achieve patterning. During the wet etching process, the light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer located on the side of the isolation structure 200 away from the substrate 100 are also etched. Part of the etching solution enters the side of the first encapsulation material layer near the substrate 100 from the sidewall of the first encapsulation material layer, thereby etching the light-emitting functional material layer and the first electrode material layer, so that there is a gap between the obtained first encapsulation part 411 and the isolation structure 200 (or the first isolation part 201).

[0104] The second encapsulation portion 412 is located on the side of the second light-emitting device 320 facing away from the substrate 100. The orthographic projection of the second isolation opening 212 on the substrate 100 is within the orthographic projection range of the second encapsulation portion 412 on the substrate 100. A portion of the second encapsulation portion 412 is located on the side of the isolation structure 200 facing away from the substrate 100, and the distance between the second encapsulation portion 412 and the first isolation portion 201 is a sixth distance D6. The reason for the distance between the second encapsulation portion 412 and the first isolation portion 201 can be referred to the reason for the distance between the first encapsulation portion 411 and the first isolation portion 201 as described above, and will not be elaborated further here.

[0105] For example, the thickness of the second light-emitting functional layer 321 of the second light-emitting device 320 is greater than the thickness of the first light-emitting functional layer 311 of the first light-emitting device 310. After wet etching, the distance between the first encapsulation portion 411 and the first isolation portion 201 corresponding to the first light-emitting device 310 is less than the distance between the second encapsulation portion 412 and the first isolation portion 201 corresponding to the second light-emitting device 320. For example, the fifth distance D5 is less than the sixth distance D6. For example, when fabricating the light-emitting device 300, the first light-emitting device 310 can be fabricated first, and then the second light-emitting device 320 can be fabricated. When fabricating the second light-emitting device 320, a complete layer of the second light-emitting functional material layer, the second electrode material layer, and the second encapsulation material layer can be fabricated sequentially. The thickness of the second light-emitting functional material layer is greater than the thickness of the first light-emitting functional layer 311. The second light-emitting functional material layer can effectively cover the gap between the first encapsulation part 411 and the first isolation part 201 corresponding to the first light-emitting device 310, thereby making the second electrode material layer a continuous film layer. This can effectively protect the first light-emitting device 310 from the damage of the etching solution during the wet etching process of the second light-emitting functional material layer, the second electrode material layer, and the second encapsulation material layer, reducing the probability of display failure of the first light-emitting device 310 and improving the reliability of the display panel.

[0106] In one embodiment, the plurality of isolation openings 210 further includes a third isolation opening 213. In the isolation structure 200 surrounding the third isolation opening 213, the included angle between the sidewall 2023 and the second surface 2022 is a third included angle β3; the second included angle β2 is greater than the third included angle β3. Optionally, the plurality of light-emitting devices 300 further includes a third light-emitting device 330. The third light-emitting device 330 includes a third light-emitting functional layer 331 and a third electrode layer 332 located in the third isolation opening 213. The third electrode layer 332 is located on the side of the third light-emitting functional layer 331 facing away from the substrate 100. The ramp angle of the third electrode layer 332 of the third light-emitting device 330 is relatively small, which is beneficial to improving the film continuity of the third electrode layer 332 and may increase the overlap area between the third electrode layer 332 and the isolation structure 200, which is beneficial to reducing the overlap resistance between the third electrode layer 332 and the isolation structure 200, which is beneficial to reducing the power consumption of the display panel and almost eliminating problems such as dark spots or dark patches.

[0107] For example, the third electrode layer 332 is a cathode.

[0108] It is understandable that the second included angle β2 is greater than the third included angle β3, that is, the slope of the side wall 2023 of the second isolation part 202 surrounding the third isolation opening 213 is less than the slope of the side wall 2023 of the second isolation part 202 surrounding the second isolation opening 212. This makes the climbing angle of the third electrode layer 332 of the third light-emitting device 330 relatively small, which is conducive to improving the film continuity of the third electrode layer 332 and making the overlap effect between the third electrode layer 332 and the isolation structure 200 better.

[0109] It is understandable that when fabricating the light-emitting device 300, it can be fabricated sequentially in the order of the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 300. When the first light-emitting device 300 is fabricated using wet etching patterning, it will etch the corresponding isolation opening 210 of the light-emitting device 300 fabricated later in the sequence. The etching effect on the isolation opening 210 of the light-emitting device 300 fabricated later in the sequence is more severe. In this embodiment, the first included angle β1 is greater than the second included angle β2, and the second included angle β2 is greater than the third included angle β3. This effectively ensures a better overlap between the second electrode layer 322 of the second light-emitting device 320 and the isolation structure 200, and also a better overlap between the third electrode layer 332 of the third light-emitting device 330 and the isolation structure 200, thereby improving the manufacturing yield of the display panel.

[0110] In one embodiment, the area of ​​the first isolation opening 211 projected onto the substrate 100 is larger than the area of ​​the third isolation opening 213 projected onto the substrate 100. If the first included angle β1 is equal to the third included angle β3, the overlap area between the third electrode layer 332 and the isolation structure 200 is smaller than the overlap area between the first electrode layer 312 and the isolation structure 200, resulting in a larger overlap resistance between the third electrode layer 332 and the isolation structure 200. Furthermore, the ramp angle of the third electrode layer 332 is relatively large, resulting in lower continuity of the third electrode layer 332, further increasing the overlap resistance between the third electrode layer 332 and the isolation structure 200. In the display panel of this application embodiment, the first included angle β1 is greater than the second included angle β2, the second included angle β2 is greater than the third included angle β3, and thus the first included angle β1 is greater than the third included angle β3. The ramp angle of the third electrode layer 332 is relatively small, which is beneficial to improving the film continuity of the third electrode layer 332 and may increase the overlap area between the third electrode layer 332 and the isolation structure 200. This is beneficial to reducing the overlap resistance between the third electrode layer 332 and the isolation structure 200, which is beneficial to reducing the power consumption of the display panel and almost eliminating problems such as dark spots or dark patches.

[0111] In one embodiment, in the isolation structure 200 that encloses the third isolation opening 213, the distance by which the first isolation portion 201 extends beyond the first surface 2021 is the seventh distance D7; the second distance D2 is less than the seventh distance D7 (refer to...). Figure 3 Alternatively, the second distance D2 is equal to the seventh distance D7. It is understandable that since the second included angle β2 is greater than the third included angle β3, the overlap effect between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023 is not as good as the overlap effect between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023. Therefore, when the second distance D2 is less than or equal to the seventh distance D7, it is beneficial to increase the overlap area between the second electrode layer 322 and the sidewall 2023, thereby improving the overlap effect between the second electrode layer 322 and the sidewall 2023.

[0112] For example, if the second distance D2 is greater than the seventh distance D7, the overlap effect between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023 can be further improved, but it may lead to poor overlap effect between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023.

[0113] Optionally, in the isolation structure 200 that encloses the second isolation opening 212, the distance by which the first isolation portion 201 extends beyond the second surface 2022 is a fourth distance D4; in the isolation structure 200 that encloses the third isolation opening 213, the distance by which the first isolation portion 201 extends beyond the second surface 2022 is an eighth distance D8, and the fourth distance D4 is greater than the eighth distance D8 (refer to...). Figure 5 Alternatively, the fourth distance D4 is equal to the eighth distance D8. For example, a fourth distance D4 being greater than the eighth distance D8 is beneficial to improving the overlap effect between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023.

[0114] Optionally, refer to Figure 6 In the isolation structure 200 that surrounds the second isolation opening 212, the first isolation portion 201 extends out of the second surface 2022; in the isolation structure 200 that surrounds the third isolation opening 213, the second surface 2022 extends out of the first isolation portion 201. This is beneficial for further increasing the overlap area between the third electrode layer 332 and the sidewall 2023 of the third light-emitting device 330, improving the continuity of the third electrode layer 332, and enhancing the overlap effect between the third electrode layer 332 and the sidewall 2023.

[0115] It is understandable that when the second surface 2022 extends out of the first isolation part 201 in the isolation structure 200 surrounding the third isolation opening 213, the evaporation angle of the third light-emitting functional layer 331 of the third light-emitting device 330 can be adjusted so that the third light-emitting functional layer 331 does not overlap with the isolation structure 200.

[0116] It is understandable that in the isolation structure 200 that surrounds the third isolation opening 213, the second surface 2022 extending out of the first isolation part 201 is more conducive to the third electrode layer 332 overlapping with the side wall 2023.

[0117] Optionally, refer to Figure 6 In the isolation structure 200 that surrounds the second isolation opening 212, the distance by which the second surface 2022 extends beyond the first isolation portion 201 is the ninth distance D9; in the isolation structure 200 that surrounds the third isolation opening 213, the distance by which the second surface 2022 extends beyond the first isolation portion 201 is the tenth distance D10; the tenth distance D10 is greater than or equal to the ninth distance D9. This further improves the overlap effect between the third electrode layer 332 and the sidewall 2023.

[0118] For example, the first light-emitting device 310 includes a blue light-emitting device, the second light-emitting device 320 includes a green light-emitting device, and the third light-emitting device 330 includes a red light-emitting device. The thickness of the first light-emitting functional layer 311 is less than the thickness of the second light-emitting functional layer 321, and the thickness of the second light-emitting functional layer 321 is less than the thickness of the third light-emitting functional layer 331. For example, the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330 can be organic light-emitting diodes (OLEDs) or quantum dot light-emitting diodes (QLEDs). Therefore, the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330 can all have a strong microcavity effect, resulting in excellent display performance of the display panel.

[0119] In one embodiment, refer to Figure 7 The display panel also includes a first encapsulation layer 400, which includes a plurality of encapsulation portions 410, including a second encapsulation portion 412 and a third encapsulation portion 413. The second encapsulation portion 412 is located on the side of the second light-emitting device 320 away from the substrate 100, and the orthographic projection of the second isolation opening 212 on the substrate 100 is within the orthographic projection range of the second encapsulation portion 412 on the substrate 100. A portion of the second encapsulation portion 412 is located on the side of the isolation structure 200 away from the substrate 100, and the distance between the second encapsulation portion 412 and the first isolation portion 201 is a sixth distance D6. The third encapsulation portion 413 is located on the side of the third light-emitting device 330 away from the substrate 100, and the orthographic projection of the third isolation opening 213 on the substrate 100 is within the orthographic projection range of the third encapsulation portion 413 on the substrate 100. A portion of the third encapsulation portion 413 is located on the side of the first isolation portion 201 away from the substrate 100, and the distance between the third encapsulation portion 413 and the first isolation portion 201 is an eleventh distance D11.

[0120] It should be noted that the reason for the gap between the third encapsulation part 413 and the first isolation part 201 can be referred to the reason for the gap between the first encapsulation part 411 and the first isolation part 201 as described above, and will not be elaborated further here.

[0121] For example, the thickness of the third light-emitting functional layer 331 of the third light-emitting device 330 is greater than the thickness of the second light-emitting functional layer 321 of the second light-emitting device 320. After wet etching, the distance between the second encapsulation portion 412 corresponding to the second light-emitting device 320 and the first isolation portion 201 is less than the distance between the third encapsulation portion 413 corresponding to the third light-emitting device 330 and the first isolation portion 201. Exemplarily, the sixth distance D6 is less than the eleventh distance D11. For example, when fabricating the light-emitting device 300, the second light-emitting device 320 can be fabricated first, followed by the third light-emitting device 330. When fabricating the third light-emitting device 330, a complete layer of the third light-emitting functional material, the third electrode material, and the third encapsulation material are fabricated sequentially. The thickness of the third light-emitting functional material layer is greater than the thickness of the first light-emitting functional layer 311 and the second light-emitting functional layer 321. The third light-emitting functional material layer can effectively cover the gap between the first encapsulation part 411 and the first isolation part 201 corresponding to the first light-emitting device 310 and the gap between the second encapsulation part 412 and the first isolation part 201 corresponding to the second light-emitting device 320. This makes the third electrode material layer a continuous film layer, which can effectively protect the first light-emitting device 310 and the second light-emitting device from the damage of the etching solution during the wet etching process of the third light-emitting functional material layer, the third electrode material layer, and the third encapsulation material layer, thereby reducing the probability of display failure of the first light-emitting device 310 and the second light-emitting device 320 and improving the reliability of the display panel.

[0122] In one embodiment, refer to Figure 8 The isolation structure 200 also includes a third isolation portion 203, located on the side of the second isolation portion 202 near the substrate 100. The orthographic projection of the second isolation portion 202 on the substrate 100 is within the orthographic projection range of the third isolation portion 203 on the substrate 100. This further improves the bonding effect between the cathode of the light-emitting device 300 and the isolation structure.

[0123] Optionally, in the isolation structure 200 surrounding the first isolation opening 211, the distance by which the third isolation portion 203 extends beyond the second surface 2022 is the twelfth distance D12; in the isolation structure 200 surrounding the second isolation opening 212, the distance by which the third isolation portion 203 extends beyond the second surface 2022 is the thirteenth distance D13; and in the isolation structure 200 surrounding the third isolation opening 213, the distance by which the third isolation portion 203 extends beyond the second surface 2022 is the fourteenth distance D14. The twelfth distance D12 is less than the thirteenth distance D13, and the thirteenth distance D13 is less than the fourteenth distance D14. This is beneficial for improving the bonding effect between the cathode of the subsequently fabricated light-emitting device and the isolation structure 200, further avoiding the occurrence of undesirable phenomena such as dark spots.

[0124] For example, the light-emitting device 300 further includes a fourth electrode layer 301 located between the isolation structure 200 and the substrate 100, with at least a portion of the fourth electrode layer 301 exposed in the isolation opening 210, and the fourth electrode layer 301 being an anode.

[0125] For example, the first isolation portion 201 and the second isolation portion 202 are made of different materials, and the etching rate of the first isolation portion 201 is lower than that of the second isolation portion 202. The material of the second isolation portion 202 includes a conductive material, specifically including at least one of aluminum (Al) and aluminum alloys, and the aluminum alloys may include at least one of aluminum-neodymium alloy (AlNd), aluminum-yttrium alloy (AlY), or aluminum-silicon alloy (AlSi). The first isolation portion 201 can be a single-layer structure or a multi-layer structure. When the first isolation portion 201 is a single-layer structure, the material of the first isolation portion 201 may include at least one of titanium, titanium nitride, molybdenum, tungsten, molybdenum-tungsten alloy, or molybdenum-niobium alloy. When the first isolation portion 201 is a multi-layer structure, one layer of the first isolation portion 201 is made of at least one of titanium, titanium nitride, molybdenum, tungsten, molybdenum-tungsten alloy, or molybdenum-niobium alloy, and the other layer of the first isolation portion 201 may be made of a conductive oxide or an inorganic insulating material, such as indium tin oxide (ITO) or indium zinc oxide (IZO).

[0126] For example, the material of the third isolation part 203 may include at least one of molybdenum (Mo), titanium (Ti), titanium nitride (TiN), molybdenum-tungsten alloy (MoW), or molybdenum-niobium alloy (MoNb).

[0127] For example, refer to Figure 9The display panel further includes a second encapsulation layer 500 and a third encapsulation layer 600. The second encapsulation layer 500 covers the isolation structure 200 and the encapsulation portion 410, and the third encapsulation layer 600 covers the second encapsulation layer 500. Both the first encapsulation layer 400 and the third encapsulation layer 600 are inorganic materials, and the materials of the first encapsulation layer 400 and the third encapsulation layer 600 include at least one of silicon nitride (SiN), silicon oxide (SiO), and silicon oxynitride (SiON). The second encapsulation layer 500 is an organic insulating material, such as epoxy resin, acrylic resin, or other resin materials. The second encapsulation layer 500 and the third encapsulation layer 600 are continuously disposed at least over the entire display area of ​​the display panel, with a portion also disposed in the bezel area of ​​the display panel.

[0128] In one embodiment, the display panel may further include a pixel defining layer 700, and an isolation structure 200 is disposed on the pixel defining layer 700. The pixel defining layer 700 has pixel openings communicating with the isolation openings 210. Specifically, the pixel defining layer 700 has a first pixel opening communicating with a first isolation opening 211, a second pixel opening communicating with a second isolation opening 212, and a third pixel opening communicating with a third isolation opening 213. The areas of the orthographic projections of the first pixel opening, the second pixel opening, and the third pixel opening on the substrate 100 may be the same or different. The shapes of the orthographic projections of the pixel openings and the corresponding isolation openings 210 on the substrate 100 may be the same or different. Generally, the area of ​​the orthographic projection of the isolation opening 210 on the substrate 100 is larger than the area of ​​the orthographic projection of the pixel opening communicating with the isolation opening 210 on the substrate 100. The orthographic projections of the pixel openings on the substrate 100 overlap with the orthographic projections of the isolation openings 210 on the substrate 100. The pixel defining layer 700 is made of an inorganic material, such as an inorganic insulating material formed by using at least one of silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiON).

[0129] In another embodiment, the isolation structure 200 is disposed within a groove in the pixel limiting layer 700. Alternatively, the pixel limiting layer 700 may not be provided in the display panel, and the isolation structure 200 may be disposed on one side of the substrate 100, with the isolation structure 200 in contact with one side of the substrate 100.

[0130] For example, the display panel may also include at least one film layer such as a touch layer, a polarizer, a color filter substrate, and a protective cover. The film layer may also be bonded to the display panel via an adhesive layer such as OCA (Optical Clear Adhesive).

[0131] For example, the substrate 100 includes a pixel driving circuit, which is electrically connected to the fourth electrode layer 301.

[0132] It should be noted that the cross-sectional diagrams mentioned in this article can be... Figure 4 A schematic diagram of the cross-sectional structure of the display panel along the AA' direction.

[0133] The second aspect of this application provides a method for manufacturing a display panel, referring to... Figure 10 The diagram shows a process flow chart for manufacturing a display panel, which includes the following steps.

[0134] S100: A fourth electrode layer is prepared on one side of the substrate.

[0135] It should be noted that the substrate and the fourth electrode layer are the same as described above, and will not be repeated here.

[0136] S200: A second isolation material layer and a first isolation material layer are sequentially prepared on the side of the fourth electrode layer away from the substrate.

[0137] For example, the second isolation material layer and the first isolation material layer can be prepared by vapor deposition.

[0138] S300: The first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening and a first intermediate isolation opening; the fourth electrode layer is at least partially exposed to the first isolation opening and the first intermediate isolation opening.

[0139] In one embodiment, the first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening, a first intermediate isolation opening, and a second intermediate isolation opening.

[0140] S400: A first light-emitting functional material layer and a first electrode material layer are sequentially prepared in the first isolation opening, with a portion of the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening.

[0141] For example, in the step of sequentially preparing the first light-emitting functional material layer and the first electrode material layer in the first isolation opening, a portion of the first light-emitting functional material layer and the first electrode material layer are located in the first intermediate isolation opening and the second intermediate isolation opening.

[0142] In one embodiment, the step of sequentially fabricating a first light-emitting functional material layer and a first electrode material layer in the first isolation opening includes: sequentially fabricating a first light-emitting functional material layer 31, a first electrode material layer 32, and a first encapsulation material layer 41 in the first isolation opening 211. The first light-emitting functional material layer 31, the first electrode material layer 32, and the first encapsulation material layer 41 are respectively located in the first isolation opening 211, the first intermediate isolation opening 212a, and the second intermediate isolation opening 213a, as detailed below. Figure 11The first light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer located in the first intermediate isolation opening 212a and the second intermediate isolation opening 213a need to be etched away to obtain the first light-emitting device 310, as shown in the figure. Figure 12 .

[0143] S500: Perform a first etching process on the first light-emitting functional material layer and the first electrode material layer to remove the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening, and retain the first light-emitting functional material layer and the first electrode material layer located in the first isolation opening to obtain a first light-emitting device, a second isolation part, a first isolation part and a second isolation opening, wherein the first isolation part and the second isolation part constitute an isolation structure.

[0144] It should be noted that the isolation structure is consistent with the previous description, and will not be elaborated further here.

[0145] The second isolation portion includes a first surface, a second surface, and a sidewall. The first surface is located on the side of the second surface that is away from the substrate, and the first surface and the second surface are connected by the sidewall. The orthographic projection of the first surface on the substrate is within the orthographic projection range of the first isolation portion on the substrate. The orthographic projection of the first surface on the substrate is within the orthographic projection range of the second surface on the substrate. In the isolation structure surrounding the first isolation opening, the included angle between the sidewall and the second surface is a first included angle. In the isolation structure surrounding the second isolation opening, the included angle between the sidewall and the second surface is a second included angle. The first included angle is greater than the second included angle.

[0146] For example, a wet etching method is used to remove the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening. After etching, the first intermediate isolation opening is inevitably etched by the etching solution, resulting in a second isolation opening with a larger size than the first intermediate isolation opening. Specifically, the sidewall of the second isolation portion of the second isolation opening is recessed from the first isolation portion by a greater distance than the sidewall of the second isolation portion of the first intermediate isolation opening is recessed from the first isolation portion. For instance, if the etching rate of the first isolation material layer is less than the etching rate of the second isolation material layer, the length of the first isolation material portion extending beyond the first surface of the second isolation portion in the isolation structure surrounding the second isolation opening is longer.

[0147] Optionally, the step of performing the first etching process on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain a third intermediate isolation opening. For example, when a wet etching method is used to remove the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening, after etching, the second intermediate isolation opening is inevitably etched by the etching solution. The size of the third intermediate isolation opening is larger than the size of the second intermediate isolation opening. Specifically, the distance by which the sidewall of the second isolation portion of the third intermediate isolation opening is recessed from the first isolation portion is greater than the distance by which the sidewall of the second isolation portion of the second intermediate isolation opening is recessed from the first isolation portion. For example, if the etching rate of the first isolation material layer is less than the etching rate of the second isolation material layer, the length of the first isolation portion extending beyond the first surface of the second isolation portion in the isolation structure surrounding the third intermediate isolation opening is longer.

[0148] Optionally, the first etching process on the first light-emitting functional material layer and the first electrode material layer includes: performing a first etching process on the first light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer to obtain a first light-emitting device and a first encapsulation portion, wherein a portion of the first encapsulation portion is located on the side of the first isolation portion away from the substrate, and the distance between the first encapsulation portion and the first isolation portion is a fifth distance. Thus, the first encapsulation material layer can avoid damage to its underlying film layer by the etching solution. Furthermore, during the etching process, a portion of the etching solution enters the side of the first encapsulation portion near the substrate, causing a portion of the first light-emitting functional material layer and the first electrode material layer on the side of the first encapsulation portion near the substrate to be etched away.

[0149] S600: The second light-emitting functional layer and the second electrode layer are sequentially fabricated in the second isolation opening to obtain the second light-emitting device.

[0150] Optionally, the sequential fabrication of a second light-emitting functional layer and a second electrode layer in the second isolation opening includes: sequentially fabricating a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, with a portion of the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening; performing a second etching process on the second light-emitting functional material layer and the second electrode material layer to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening, while retaining the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, thereby obtaining a second light-emitting device and a third isolation opening. For example, a wet etching method is used to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening. After etching, the third intermediate isolation opening is inevitably etched by the etching solution, and the size of the third isolation opening is larger than the size of the third intermediate isolation opening. Specifically, the distance by which the sidewall of the second isolation portion of the third isolation opening is recessed from the first isolation portion is greater than the distance by which the sidewall of the second isolation portion of the third intermediate isolation opening is recessed from the first isolation portion. For example, the etching rate of the first isolation material layer is less than the etching rate of the second isolation material layer, resulting in a longer length of the first isolation portion extending beyond the first surface of the second isolation portion in the isolation structure surrounding the third isolation opening.

[0151] In the isolation structure surrounding the third isolation opening, the included angle between the sidewall and the second surface is the third included angle; the second included angle is greater than the third included angle. Therefore, when fabricating the third light-emitting device, the ramp angle of the third electrode layer is smaller, the continuity is higher, and it is more conducive to increasing the overlap area between the third electrode layer and the isolation structure, thus improving the overlap yield.

[0152] Optionally, the sequential fabrication of the second light-emitting functional layer and the second electrode layer in the second isolation opening includes: sequentially fabricating a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, wherein the thickness of the second light-emitting functional material layer is greater than the fifth distance; at the edge of the first package portion, the second electrode material layer extends continuously from the side of the first package portion away from the substrate to the side of the first isolation portion away from the substrate; a second etching process is performed on the second light-emitting functional material layer and the second electrode material layer to retain the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, thereby obtaining the second light-emitting device. It is understood that because the thickness of the second light-emitting functional material layer is greater than the fifth distance, the second light-emitting functional material layer is almost unbroken at the edge of the first package portion, exhibiting strong continuity. This ensures that the second electrode material layer remains continuous at the edge of the first package portion. During subsequent wet etching processes, the second electrode material layer and the second light-emitting functional material layer can effectively protect the first package portion of the first light-emitting device from etching damage, thus effectively protecting the first light-emitting device.

[0153] Exemplarily, the sequential fabrication of the second light-emitting functional layer and the second electrode layer in the second isolation opening includes: sequentially fabricating a second light-emitting functional material layer 33, a second electrode material layer 34, and a second encapsulation material layer 35 in the second isolation opening 212; at the edge of the first encapsulation portion 411, the second electrode material layer 33 extends continuously from the side of the first encapsulation portion 411 away from the substrate 100 to the side of the first isolation portion 411 away from the substrate 100, and the second encapsulation material layer 35 is a continuous film layer, as shown in the figure. Figure 13 A second etching process is performed on the second light-emitting functional material layer 33, the second electrode material layer 34, and the second encapsulation material layer 35, retaining the second light-emitting functional material layer 33, the second electrode material layer 34, and the second encapsulation material layer 35 located in the second isolation opening 212, to obtain the second light-emitting device 320 and the second encapsulation part 412, as shown in the reference. Figure 14 .

[0154] Similarly, the fabrication steps of the third light-emitting device include: sequentially fabricating a third light-emitting functional material layer and a third electrode material layer in the third isolation opening. The third light-emitting functional material layer and the third electrode material layer cover the first encapsulation portion and the second encapsulation portion. At the edge of the first encapsulation portion, the third light-emitting functional material layer and the third electrode material layer are continuous film layers. At the edge of the second encapsulation portion, the third light-emitting functional material layer and the third electrode material layer are continuous film layers. During the subsequent wet etching process, the third light-emitting functional material layer and the third electrode material layer can effectively protect the first encapsulation portion of the first light-emitting device and the second encapsulation portion of the second light-emitting device from etching damage, thus effectively protecting the first light-emitting device and the second light-emitting device.

[0155] For example, the sequential fabrication of a third light-emitting functional layer and a third electrode layer in the third isolation opening includes: sequentially fabricating a third light-emitting functional material layer, a third electrode material layer, and a third encapsulation material layer in the third isolation opening; at the edge of the first encapsulation portion, the third electrode material layer extends continuously from the side of the first encapsulation portion away from the substrate to the side of the first isolation portion away from the substrate, and the third encapsulation material layer is a continuous film layer; at the edge of the second encapsulation portion, the third electrode material layer extends continuously from the side of the second encapsulation portion away from the substrate to the side of the first isolation portion away from the substrate, and the third encapsulation material layer is a continuous film layer; a second etching process is performed on the third light-emitting functional material layer, the third electrode material layer, and the third encapsulation material layer to retain the third light-emitting functional material layer, the third electrode material layer, and the third encapsulation material layer located in the third isolation opening, thereby obtaining a third light-emitting device and a third encapsulation portion.

[0156] It should be noted that the display panel prepared by the method of this embodiment can be combined with the display panel described above in whole or in part, which will not be elaborated further here.

[0157] A third aspect of this application provides a display device, including the aforementioned display panel, or including a display panel prepared by the aforementioned preparation method.

[0158] It should be noted that, in addition to the aforementioned display panel, the display device may also include the structures that conventional display devices should have, such as chips, batteries, and casings, which will not be elaborated on further here.

[0159] For example, the display device may include a device with image processing capabilities, such as a mobile phone, desktop computer, laptop computer, tablet computer, in-vehicle display, wearable device, etc. Because the display device includes the display panel described in this application, the electronic device has higher reliability.

[0160] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0161] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A display panel, characterized in that, include: substrate; An isolation structure is located on one side of the substrate; The isolation structure encloses a plurality of isolation openings, including a first isolation opening and a second isolation opening; the isolation structure includes a first isolation portion and a second isolation portion, the first isolation portion being located on the side of the second isolation portion away from the substrate, the second isolation portion including a first surface, a second surface and a sidewall, the first surface being located on the side of the second surface away from the substrate, and the first surface and the second surface being connected through the sidewall; The orthographic projection of the first surface onto the substrate is located within the orthographic projection range of the first isolation portion onto the substrate; The orthographic projection of the first surface onto the substrate is located within the orthographic projection range of the second surface onto the substrate; In the isolation structure that encloses the first isolation opening, the angle between the sidewall and the second surface is a first included angle; in the isolation structure that encloses the second isolation opening, the angle between the sidewall and the second surface is a second included angle. The first included angle is greater than the second included angle; Multiple light-emitting devices, including a first light-emitting device and a second light-emitting device, wherein at least a portion of the first light-emitting device is located in the first isolation opening, and at least a portion of the second light-emitting device is located in the second isolation opening; A first encapsulation layer, comprising a plurality of encapsulation portions, the plurality of encapsulation portions including a first encapsulation portion and a second encapsulation portion; the first encapsulation portion is located on the side of the first light-emitting device away from the substrate, and the orthographic projection of the first isolation opening on the substrate is within the orthographic projection range of the first encapsulation portion on the substrate; a portion of the first encapsulation portion is located on the side of the first isolation portion away from the substrate, and the distance between the first encapsulation portion and the first isolation portion is a fifth distance. The second encapsulation portion is located on the side of the second light-emitting device away from the substrate, and the orthographic projection of the second isolation opening on the substrate is within the orthographic projection range of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on the side of the isolation structure away from the substrate, and the distance between the second encapsulation portion and the first isolation portion is a sixth distance; the fifth distance is less than the sixth distance.

2. The display panel according to claim 1, characterized in that, In the isolation structure that encloses the first isolation opening, the distance by which the first isolation portion extends beyond the first surface is a first distance; in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the first surface is a second distance, and the first distance is less than or equal to the second distance. And / or, in the isolation structure surrounding the first isolation opening, the distance by which the first isolation portion extends beyond the second surface is a third distance; in the isolation structure surrounding the second isolation opening, the distance by which the first isolation portion extends beyond the second surface is a fourth distance, and the third distance is greater than or equal to the fourth distance; And / or, in the isolation structure that encloses the first isolation opening, the first isolation portion extends out of the second surface; In the isolation structure that encloses the second isolation opening, the second surface extends out of the first isolation portion.

3. The display panel according to claim 1, characterized in that, The first light-emitting device includes a first light-emitting functional layer and a first electrode layer located in the first isolation opening, wherein the first electrode layer is located on the side of the first light-emitting functional layer opposite to the substrate; The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on the side of the second light-emitting functional layer opposite to the substrate; The thickness of the first light-emitting functional layer is smaller than the thickness of the second light-emitting functional layer; And / or, the first light-emitting device includes a blue light-emitting device, and the second light-emitting device includes a green light-emitting device.

4. The display panel according to claim 1, characterized in that, The area of ​​the first isolation opening projected onto the substrate is larger than the area of ​​the second isolation opening projected onto the substrate.

5. The display panel according to any one of claims 1 to 4, characterized in that, The plurality of isolation openings also include a third isolation opening, and in the isolation structure surrounding the third isolation opening, the included angle between the sidewall and the second surface is the third included angle; The second included angle is greater than the third included angle.

6. The display panel according to claim 5, characterized in that, In the isolation structure that encloses the third isolation opening, the distance by which the first isolation portion extends beyond the first surface is a seventh distance; in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the first surface is a second distance, and the second distance is less than or equal to the seventh distance. And / or, in the isolation structure that encloses the second isolation opening, the distance by which the first isolation portion extends beyond the second surface is a fourth distance; in the isolation structure that encloses the third isolation opening, the distance by which the first isolation portion extends beyond the second surface is an eighth distance, and the fourth distance is greater than or equal to the eighth distance; And / or, in the isolation structure that encloses the second isolation opening, the first isolation portion extends out of the second surface; In the isolation structure that encloses the third isolation opening, the second surface extends out of the first isolation portion; And / or, in the isolation structure that encloses the second isolation opening, the distance by which the second surface extends beyond the first isolation portion is a ninth distance; in the isolation structure that encloses the third isolation opening, the distance by which the second surface extends beyond the first isolation portion is a tenth distance; The tenth distance is greater than or equal to the ninth distance.

7. The display panel according to claim 5, characterized in that, The plurality of light-emitting devices include a third light-emitting device, the third light-emitting device including a third light-emitting functional layer and a third electrode layer located in the third isolation opening, the third electrode layer being located on the side of the third light-emitting functional layer opposite to the substrate; The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on the side of the second light-emitting functional layer opposite to the substrate; The thickness of the second light-emitting functional layer is less than the thickness of the third light-emitting functional layer; And / or, the second light-emitting device includes a green light-emitting device, and the third light-emitting device includes a red light-emitting device.

8. The display panel according to claim 7, characterized in that, The display panel further includes a first encapsulation layer, which includes a plurality of encapsulation portions, including a second encapsulation portion and a third encapsulation portion; The second encapsulation portion is located on the side of the second light-emitting device away from the substrate, and the orthographic projection of the second isolation opening on the substrate is within the orthographic projection range of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on the side of the isolation structure away from the substrate, and the distance between the second encapsulation portion and the first isolation portion is a sixth distance; The third encapsulation portion is located on the side of the third light-emitting device away from the substrate, and the orthographic projection of the third isolation opening on the substrate is within the orthographic projection range of the third encapsulation portion on the substrate; a portion of the third encapsulation portion is located on the side of the first isolation portion away from the substrate, and the distance between the third encapsulation portion and the first isolation portion is the eleventh distance. The sixth distance is less than the eleventh distance.

9. The display panel according to claim 5, characterized in that, The area of ​​the first isolation opening projected onto the substrate is larger than the area of ​​the second isolation opening projected onto the substrate, and the area of ​​the first isolation opening projected onto the substrate is larger than the area of ​​the third isolation opening projected onto the substrate.

10. The display panel according to claim 1, characterized in that, The isolation structure further includes a third isolation portion located on the side of the second isolation portion near the substrate, wherein the orthographic projection of the second isolation portion on the substrate is within the orthographic projection range of the third isolation portion on the substrate.

11. The display panel according to claim 10, characterized in that, In the isolation structure surrounding the first isolation opening, the distance by which the third isolation portion extends beyond the second surface is the twelfth distance; in the isolation structure surrounding the second isolation opening, the distance by which the third isolation portion extends beyond the second surface is the thirteenth distance; the twelfth distance is less than the thirteenth distance.

12. A method for manufacturing a display panel, characterized in that, include: A fourth electrode layer is fabricated on one side of the substrate; A second insulating material layer and a first insulating material layer are sequentially prepared on the side of the fourth electrode layer opposite to the substrate; The first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening and a first intermediate isolation opening; The fourth electrode layer is at least partially exposed to the first isolation opening and the first intermediate isolation opening; A first light-emitting functional material layer, a first electrode material layer, and a first encapsulation material layer are sequentially prepared in the first isolation opening, with a portion of the first light-emitting functional material layer and the first electrode material layer located in the first intermediate isolation opening; The first light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer are subjected to a first etching process to remove the first light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer located in the first intermediate isolation opening, while retaining the first light-emitting functional material layer, the first electrode material layer, and the first encapsulation material layer located in the first isolation opening, thereby obtaining a first light-emitting device, a first encapsulation portion, a second isolation portion, a first isolation portion, and a second isolation opening. The first isolation portion and the second isolation portion constitute an isolation structure. The second isolation portion includes a first surface, a second surface, and a sidewall. The first surface is located on the side of the second surface that is away from the substrate, and the first surface and the second surface are connected through the sidewall. The orthographic projection of the first surface onto the substrate is located within the orthographic projection range of the first isolation portion onto the substrate; The orthographic projection of the first surface onto the substrate is located within the orthographic projection range of the second surface onto the substrate; In the isolation structure that encloses the first isolation opening, the angle between the sidewall and the second surface is a first included angle; in the isolation structure that encloses the second isolation opening, the angle between the sidewall and the second surface is a second included angle. The first included angle is greater than the second included angle; a portion of the first package portion is located on the side of the first isolation portion away from the substrate, and the distance between the first package portion and the first isolation portion is a fifth distance; A second light-emitting functional layer, a second electrode layer, and a second encapsulation material layer are sequentially prepared in the second isolation opening, wherein the thickness of the second light-emitting functional material layer is greater than the fifth distance; At the edge of the first package portion, the second electrode material layer extends continuously from the side of the first package portion away from the substrate to the side of the first isolation portion away from the substrate. The second encapsulation material layer is a continuous film layer; A second etching process is performed on the second light-emitting functional material layer, the second electrode material layer, and the second encapsulation material layer, retaining the second light-emitting functional material layer, the second electrode material layer, and the second encapsulation material layer located in the second isolation opening, to obtain a second light-emitting device and a second encapsulation part; the distance between the second encapsulation part and the first isolation part is a sixth distance. The fifth distance is less than the sixth distance.

13. The preparation method according to claim 12, characterized in that, The first isolation material layer and the second isolation material layer are graphically processed to obtain a first isolation opening, a first intermediate isolation opening, and a second intermediate isolation opening.

14. The preparation method according to claim 13, characterized in that, In the step of sequentially preparing the first light-emitting functional material layer and the first electrode material layer in the first isolation opening, a portion of the first light-emitting functional material layer and the first electrode material layer are located in the first intermediate isolation opening and the second intermediate isolation opening; And / or, the step of performing a first etching process on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain a third intermediate isolation opening.

15. The preparation method according to claim 14, characterized in that, The second light-emitting functional layer and the second electrode layer are sequentially fabricated in the second isolation opening, including: A second light-emitting functional material layer and a second electrode material layer are sequentially prepared in the second isolation opening, with a portion of the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening; The second light-emitting functional material layer and the second electrode material layer are subjected to a second etching process to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening, while retaining the second light-emitting functional material layer and the second electrode layer located in the second isolation opening, thereby obtaining a second light-emitting device and a third isolation opening. In the isolation structure surrounding the third isolation opening, the included angle between the sidewall and the second surface is a third included angle; the second included angle is greater than the third included angle.

16. A display device, characterized in that, It includes the display panel according to any one of claims 1 to 11, or the display panel prepared by the preparation method according to any one of claims 12 to 15.

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