Display device

Abstract

A display device is provided. A display device according to one embodiment of the present invention comprises: a fingerprint sensor layer that receives light reflected from an external object; a substrate disposed on the fingerprint sensor layer; the optical pattern layer is arranged on the substrate and comprises a light blocking part and a light transmitting part penetrating through the light blocking part in one direction; the light emitting device includes a substrate, an optical pattern layer disposed on the substrate, a light emitting element layer disposed on the optical pattern layer, a first lens layer disposed at one of between the optical pattern layer and the light emitting element layer and between the optical pattern layer and the substrate, and having a first refractive index; and a planarization layer disposed on the first lens layer and having a second refractive index smaller than the first refractive index, in which the first lens layer includes a first inclined surface.

Description

[0001] This application is a divisional application of the patent application with application number 202011527797.2, titled "Display device", filed on December 22, 2020. TECHNICAL FIELD

[0002] The present application relates to a display device and a manufacturing method thereof, and more particularly, to a display device including a fingerprint recognition sensor and a manufacturing method thereof. BACKGROUND

[0003] With the development of information society, the requirements for a display device for displaying an image are increasing in various forms. For example, the display device is applied to various electronic devices such as a smart phone, a digital camera, a notebook computer, a navigator, and a smart TV. The display device can be a flat panel display device such as a liquid crystal display device (LCD), a field emission display device, an organic light emitting display device, etc.

[0004] An organic light emitting display device displays an image using an organic light emitting element (OLED) that generates light by recombination of an electron and a hole. The organic light emitting display device has an advantage of having a faster response speed, and has a larger brightness and a larger viewing angle, while being driven with a lower power consumption.

[0005] Recently, research and development related to a technology of integrating a sensor for fingerprint recognition in a display panel occupying the largest area in a display device to achieve integration are being conducted. SUMMARY

[0006] The present application relates to a display device and a manufacturing method thereof, and more particularly, to a display device including a fingerprint recognition sensor and a manufacturing method thereof.

[0007] The technical problems to be solved by the present application are not limited to the above-mentioned technical problems, and other technical problems not mentioned can be clearly understood by those skilled in the art through the following description.

[0008] A display device according to an embodiment of the present application for solving the above technical problems includes a fingerprint sensor layer receiving light reflected from an external object; a substrate disposed on the fingerprint sensor layer; an optical pattern layer disposed on the substrate and including a light blocking portion and a light transmitting portion penetrating the light blocking portion in a direction; a first light transmitting layer disposed on the light blocking portion and having a first refractive index; a second light transmitting layer disposed on the first light transmitting layer and having a second refractive index different from the first refractive index; and a light emitting element layer disposed on the second light transmitting layer.

[0009] The first light transmitting layer can include an opening overlapping the light transmitting portion, and the second light transmitting layer can fill the opening of the first light transmitting layer and the light transmitting portion.

[0010] The first refractive index can be greater than the second refractive index.

[0011] The first light transmitting layer can include at least one of an inorganic substance layer including at least one inorganic material of silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), and aluminum oxide (AlO x ), and an organic substance layer including inorganic particles formed of the inorganic material.

[0012] The second light transmitting layer can include a transparent organic substance.

[0013] A ratio of the refractive indices of the first light transmitting layer and the second light transmitting layer is 0.9775 or less.

[0014] The light blocking portion can include at least one of an organic light blocking material and a metallic light blocking material.

[0015] The display device can further include a lens layer disposed between the second light transmitting layer and the light emitting element layer and having an inclined surface, wherein the inclined surface of the lens layer can overlap the light blocking portion in the direction, and light incident to the inclined surface from the external object can be refracted toward the light transmitting portion.

[0016] The display device can further include a first lens layer disposed between the substrate and the optical pattern layer and having a first inclined surface, wherein the fingerprint sensor layer can include a plurality of light receiving elements including a light receiving layer, the first inclined surface can overlap with a region between the light receiving layer included in the plurality of light receiving elements in the one direction, and light incident on the first inclined surface among light passing through the light transmitting portion can be refracted toward the light receiving layer included in at least one of the plurality of light receiving elements.

[0017] The display device can further include a second lens layer disposed between the second light transmitting layer and the light emitting element layer and having a second inclined surface, wherein the second inclined surface of the second lens layer can overlap with the light blocking portion in the one direction, and light incident on the second inclined surface among light reflected from the external object can be refracted toward the light transmitting portion.

[0018] A display device according to another embodiment for solving the above technical problems includes a fingerprint sensor layer receiving light reflected from an external object, a substrate disposed on the fingerprint sensor layer, an optical pattern layer disposed on the substrate and including a light blocking portion and a light transmitting portion passing through the light blocking portion in one direction, a light emitting element layer disposed on the optical pattern layer, a first lens layer disposed at one of between the optical pattern layer and the light emitting element layer and between the optical pattern layer and the substrate and having a first refractive index, and a planarization layer disposed on the first lens layer and having a second refractive index smaller than the first refractive index, wherein the first lens layer includes a first inclined surface.

[0019] The first lens layer can include an upper surface and a lower surface parallel to the upper surface, the first inclined surface can be located between the upper surface and the lower surface, and an angle formed by the first inclined surface and the lower surface can be an acute angle.

[0020] The first lens layer can be disposed at an upper portion of the optical pattern layer, the first inclined surface of the first lens layer can overlap with the light blocking portion in the one direction, and light incident on the first inclined surface of the first lens layer among light reflected from the external object can be refracted toward the light transmitting portion.

[0021] The first lens layer can be disposed at a lower portion of the optical pattern layer, the fingerprint sensor layer can include a plurality of light receiving elements including a light receiving layer, the first inclined surface of the first lens layer can overlap with a region between the light receiving layer included in the plurality of light receiving elements in the one direction, and light incident on the first inclined surface among light passing through the light transmitting portion can be refracted toward the light receiving layer included in at least one of the plurality of light receiving elements.

[0022] The first inclined surface of the first lens layer can overlap with a region between the plurality of light receiving elements in the one direction, and light incident to the first inclined surface among light passing through the light-transmissive portion can be refracted toward at least one of the plurality of light receiving elements.

[0023] The display device can further include a second lens layer disposed between the optical pattern layer and the light emitting element layer and including a second inclined surface, wherein the second inclined surface of the second lens layer can overlap with the light-blocking portion in the one direction, and light incident to the second inclined surface among light reflected from the external object can be refracted toward the light-transmissive portion.

[0024] A manufacturing method of a display device according to an embodiment for solving the above technical problem includes the steps of: disposing an optical pattern layer, a first light-transmissive layer, and a second light-transmissive layer on a substrate; disposing a display panel on the second light-transmissive layer; and disposing a fingerprint sensor layer at a lower portion of the substrate, wherein the step of disposing the optical pattern layer, the first light-transmissive layer, and the second light-transmissive layer includes the steps of: forming a light-blocking substance layer on the substrate; forming the first light-transmissive layer on the light-blocking substance layer; etching the light-blocking substance layer using the first light-transmissive layer as a mask to form a light-blocking portion and a light-transmissive portion; and forming the second light-transmissive layer on the substrate in a manner of filling the light-transmissive portion and covering the first light-transmissive layer.

[0025] The first light-transmissive layer can have a refractive index greater than a refractive index of the second light-transmissive layer.

[0026] The first light-transmissive layer can include at least one of an inorganic substance layer and an organic substance layer, wherein the inorganic substance layer can include at least one inorganic material of silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), and aluminum oxide (AlO x ), and the organic substance layer can include inorganic particles formed of the inorganic material.

[0027] The second light-transmissive layer can include a transparent organic substance.

[0028] The light-blocking portion can include at least one of an organic light-blocking material and a metallic light-blocking material.

[0029] Details of other embodiments are included in the detailed description and the accompanying drawings.

[0030] Based on the display device according to the embodiment of the present application and the manufacturing method of the display device, a refractive pattern layer is formed on the upper portion of the optical pattern layer, so that the same brightness cutoff angle can be maintained, while the light transmittance toward the light receiving element can be improved. Accordingly, the fingerprint recognition performance of the display device including the fingerprint recognition sensor can be improved.

[0031] Also, based on the display device according to the embodiment of the present application and the manufacturing method of the display device, a refractive pattern layer having a lens layer is formed on the upper portion or the lower portion of the optical pattern layer, so that the light receiving efficiency of the light receiving element can be improved. Accordingly, the fingerprint recognition performance of the display device including the fingerprint recognition sensor can be further improved.

[0032] The effects according to the embodiments are not limited to what has been described above, and various effects contained in the present specification and / or the drawings are included. BRIEF DESCRIPTION OF DRAWINGS

[0033] Figure 1 is a plan view of a display device according to an embodiment.

[0034] Figure 2 is a cross-sectional view of a display device according to an embodiment.

[0035] Figure 3 is a perspective view showing a path of reflected light in a display device according to an embodiment.

[0036] Figure 4 is a diagram illustrating a fingerprint pixel and a sensor pixel of a display device according to an embodiment.

[0037] Figure 5 is a plan view showing an example of an optical pattern layer of a display device according to an embodiment.

[0038] Figure 6 is a plan view showing another example of an optical pattern layer of a display device according to an embodiment.

[0039] Figure 7 is a diagram showing a connection relationship of a sub-pixel and a line of a display device according to an embodiment.

[0040] Figure 8 is a diagram showing a connection relationship of a fingerprint sensor and a line of a display device according to an embodiment.

[0041] Figure 9 is a diagram showing a connection relationship of a switching transistor and a line of a display device according to an embodiment.

[0042] Figure 10 is a block diagram schematically showing a display device according to an embodiment.

[0043] Figure 11 FIG. 4 is a cross-sectional view illustrating a fingerprint sensor layer of a display device according to an embodiment.

[0044] Figure 12 is a cross-sectional view showing in detail a display device according to an embodiment.

[0045] Figure 13 is a cross-sectional view of a display device according to an embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to an embodiment.

[0046] Figure 14 is Figure 13 A modification of the structure shown.

[0047] Figure 15 is a cross-sectional view of a display device according to another embodiment, and is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to another embodiment.

[0048] Figure 16 is Figure 15 A modification of the structure shown.

[0049] Figure 17 is a cross-sectional view of a display device according to yet another embodiment, and in particular, is a cross-sectional view showing in detail an optical pattern layer and a refractive pattern layer of the display device according to yet another embodiment.

[0050] Figure 18 to Figure 21 is a cross-sectional view of a display device according to various embodiments.

[0051] Figure 22 to Figure 25 4 are cross-sectional views illustrating process steps of a method for manufacturing a display device according to an embodiment. DETAILED DESCRIPTION

[0052] If you refer to the attached Figure 1 The advantages, features, and methods for achieving the same will become apparent from the embodiments described in detail below. However, the present invention is not limited to the embodiments disclosed below and can be implemented in various different forms. The embodiments of the present invention are provided to complete the disclosure of the present invention and to fully inform those with ordinary knowledge in the technical field to which the present invention belongs. The present invention is limited only by the scope of the claims.

[0053] When it is described that an element or a layer is "on" another element or layer, it does not only mean the case where the element or the layer is positioned on the immediate upper portion of the other element or layer, but also the case where the element or the layer is positioned on another element or layer with another element or layer interposed therebetween. Throughout the specification, like reference numerals refer to like elements. The shapes, sizes, ratios, angles, numbers, and the like disclosed in the drawings for describing embodiments are exemplary and do not limit the present application to the illustrated matters.

[0054] Although the terms first, second, etc. are used to describe various elements, the elements are clearly not limited by these terms. The terms are used only to distinguish one element from another. It is obvious that the first element mentioned below can be a second element within the scope of the technical idea of the present application. The singular expression includes the plural expression unless it is clearly specified in context. The same or similar reference numerals are used for the same or similar elements throughout the drawings.

[0055] Each feature of the various embodiments of the present application can be partially or wholly combined or combined with each other, and various linkages and drives in the technical field can be achieved, and each embodiment can be independently implemented or implemented in a related relationship.

[0056] Hereinafter, embodiments of the present application will be described in detail with reference to the accompanying drawings.

[0057] Figure 1 is a plan view of a display device according to an embodiment.

[0058] In the present specification, "upper", "top", "upper surface" mean an upper direction (i.e., a Z-axis direction) with the display device 10 as a reference, and "lower", "bottom", "lower surface" mean a lower direction (i.e., a reverse direction of the Z-axis direction) with the display device 10 as a reference. Also, "left", "right", "up", "down" mean directions when the display device 10 is viewed from a plan. For example, "left" means a reverse direction of the X-axis direction, "right" means the X-axis direction, "up" means the Y-axis direction, and "down" means a reverse direction of the Y-axis direction.

[0059] Referring to Figure 1The display device 10 can be applied not only as a display screen of a portable electronic device such as a mobile phone, a smart phone, a tablet PC, a smart watch, a watch phone, a mobile communication terminal, an electronic organizer, an electronic book, a PMP (Portable Multimedia Player), a navigator, or a UMPC (Ultra Mobile PC), but also as a display screen of various products such as a television, a notebook computer, a monitor, an advertisement board, or an IOT (Internet of Things).

[0060] The display device 10 can include a first area DR1 and a second area DR2. The first area DR1 can be flatly formed, and the second area DR2 can extend from left and right sides of the first area DR1. For example, the second area DR2 can be flatly formed or formed as a curved surface. In a case where the second area DR is flatly formed, an angle formed by the first area DR1 and the second area DR2 can be an obtuse angle. In a case where the second area DR is formed as a curved surface, the second area DR2 can have a constant curvature or a varying curvature.

[0061] The second area DR2 can extend from left and right sides of the first area DR1, respectively, but is not limited thereto. For example, the second area DR2 can extend from only one of the left and right sides of the first area DR1. As another example, the second area DR2 can extend not only from the left and right sides of the first area DR1 but also from at least one of the upper and lower sides.

[0062] The display device 10 includes a display panel 100 that displays an image. The display panel 100 can include a display area DA and a non-display area NDA.

[0063] The display area DA, as an area that displays an image, can include a plurality of sub-pixels SP. Also, the display area DA can be applied as a detection member for detecting an external environment. For example, the display area DA can correspond to a fingerprint recognition area for recognizing a user's fingerprint. Accordingly, the display area DA can include a plurality of sub-pixels SP and a plurality of fingerprint sensors FPS. The display area DA, while displaying an image, can be applied as an area that recognizes a user's fingerprint. For example, the display panel 100 in which a plurality of sub-pixels SP are arranged and a fingerprint sensor layer in which a plurality of fingerprint sensors FPS are arranged can overlap in a third direction (Z-axis direction).

[0064] The non-display area NDA can be defined as a remaining area in the display panel 100 except for the display area DA. For example, the non-display area NDA can include a scan driving part for applying a scan signal to a scan line, a fan-out line connecting a data line with a display driving part, and a pad connected with a circuit board.

[0065] For example, the non-display area NDA can be formed in an opaque form. The non-display area NDA can be formed as a decorative layer in which a pattern capable of being seen by a user is formed.

[0066] Figure 2 is a cross-sectional view of a display device according to an embodiment.

[0067] Referring to Figure 2 The display device 10 can include a first substrate SUB1, an optical pattern layer CML, a refractive pattern layer PTL, a display panel 100, a cover window CW, and a fingerprint sensor layer FPSL.

[0068] The first substrate SUB1 can be a base substrate, and can be configured of an insulating material such as a polymer resin. For example, the first substrate SUB1 can be configured of polyether sulfone (PES), polyacrylate (PAC), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyimide (PI), polycarbonate (PC), cellulose triacetate (CTA), cellulose acetate propionate (CAP), or a combination of these.

[0069] For example, the first substrate SUB1 can be a flexible substrate capable of implementing bending, folding, rolling, or the like. In the case where the first substrate SUB1 is a flexible substrate, it can be formed of polyimide (PI), but is not limited thereto.

[0070] The optical pattern layer CML can be disposed on the first substrate SUB1. The optical pattern layer CML can function to distinguish the light reflected from the ridge line FR of the fingerprint of the user's finger F and the light reflected from the ridge valley FV and provide the distinguished light to the separate light receiving elements. To this end, the optical pattern layer CML can include a light blocking part BA and a plurality of light transmitting parts TA through the light blocking part BA in one direction.

[0071] The light blocking part BA can include at least one of an organic light blocking material and a metallic light blocking material. For example, the organic light blocking material can include at least one of carbon black (CB) and titanium black (TiBK), but is not limited thereto. Also, the metallic light blocking material can include at least one of chromium, chromium oxide, and chromium nitride, but is not limited thereto.

[0072] The plurality of light transmitting parts TA can be an optical path of the second light L2, which is the first light L1 emitted from the light emitting element layer EML reflected from the user's body and travels toward the fingerprint sensor layer FPSL.

[0073] The plurality of light transmitting parts TA can not overlap the plurality of thin film transistors of the first thin film transistor layer TFTL1, and the light blocking part BA can overlap the plurality of thin film transistors of the first thin film transistor layer TFTL1. For example, the plurality of light transmitting parts TA can be arranged in the first direction (X-axis direction) and the second direction (Y-axis direction). The size of each of the plurality of light transmitting parts TA can be determined according to the path of the second light L2.

[0074] Detailed descriptions of the light blocking part BA and the light transmitting part TA will be described with reference to Figure 3 to Figure 6 later.

[0075] The refraction pattern layer PTL can be disposed on the optical pattern layer CML.

[0076] The refraction pattern layer PTL can be a layer that refracts at least a part of the second light L2 traveling toward the fingerprint sensor layer FPSL and adjusts the path of the second light L2. The refraction pattern layer PTL can include a first light transmitting layer including a high refractive index substance and a second light transmitting layer including a low refractive index substance.

[0077] The refraction pattern layer PTL can refract the second light L2 incident at an angle equal to or greater than a predetermined angle and make it travel toward the light blocking part BA. That is, the refraction pattern layer PTL can block the second light L2 incident at an angle equal to or greater than a predetermined angle from traveling toward the light transmitting part TA. The predetermined angle at which the travel toward the light transmitting part TA is blocked can vary according to the height and the refractive index ratio of the light transmitting layer included in the refraction pattern layer PTL. Detailed descriptions of the refraction pattern layer PTL will be described with reference to Figure 13 later.

[0078] The display panel 100 can be disposed on the refractive pattern layer PTL.

[0079] The display panel 100 can include a back plate BP, a first thin film transistor layer TFTL1, an emission element layer EML, a first thin film encapsulation layer TFEL1, and a touch sensor layer TSL.

[0080] The back plate BP can be disposed on an upper portion of the refractive pattern layer PTL (or the optical pattern layer CML) to support the first thin film transistor layer TFTL1. For example, the back plate BP can be configured with an insulating material such as a polymer resin.

[0081] For example, the back plate BP can be a flexible substrate capable of implementing bending, folding, rolling, or the like. In the case where the back plate BP is a flexible substrate, it can be formed using polyimide (PI), but is not limited thereto.

[0082] The first thin film transistor layer TFTL1 can be disposed on the back plate BP. The first thin film transistor layer TFTL1 can include at least one thin film transistor to drive a plurality of sub-pixels SP, respectively.

[0083] The at least one thin film transistor of the sub-pixel SP can include a semiconductor layer, a gate electrode, a drain electrode, and a source electrode. For example, the first thin film transistor layer TFTL1 can further include a scan line, a data line, a power line, a scan control line, and a routing line connecting a pad and the data line, connected to the at least one thin film transistor of the sub-pixel SP.

[0084] The emission element layer EML can be disposed on the first thin film transistor layer TFTL1. The emission element layer EML can include an emission element connected to the at least one thin film transistor of the first thin film transistor layer TFTL1.

[0085] The emission element can include a first electrode, an emission layer, and a second electrode. For example, the emission layer can be an organic emission layer configured with an organic material, but is not limited thereto. In the case where the emission layer corresponds to the organic emission layer, if the thin film transistor of the first thin film transistor layer TFTL1 applies a predetermined voltage to the first electrode of the emission element, and the second electrode of the emission element receives a common voltage or a cathode voltage, holes and electrons can move to the organic emission layer through a hole transport layer and an electron transport layer, respectively, and the holes and the electrons can combine with each other in the organic emission layer to emit light.

[0086] The light emitting element layer EML can include a pixel definition film defining a plurality of sub-pixels SP. The light emitting layers 162 adjacent to each other can be spaced apart from each other by the pixel definition film 170, and can be insulated.

[0087] The first thin film encapsulation layer TFEL1 can be disposed on the light emitting element layer EML to cover the first thin film transistor layer TFTL1 and the light emitting element layer EML.

[0088] The first thin film encapsulation layer TFEL1 can prevent oxygen or moisture from penetrating into the light emitting element layer EML. To this end, the first thin film encapsulation layer TFEL1 can include at least one inorganic film. For example, the first thin film encapsulation layer TFEL1 can include an inorganic film including an inorganic material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), or aluminum oxide (AlO x ), but is not limited thereto.

[0089] The first thin film encapsulation layer TFEL1 can protect the light emitting element layer EML from foreign substances such as dust. To this end, the first thin film encapsulation layer TFEL1 can include at least one organic film. The first thin film encapsulation layer TFEL1 can include an organic film such as an Acryl Resin, an Epoxy Resin, a Phenolic Resin, a Polyamide Resin, or a Polyimide Resin, but is not limited thereto.

[0090] The touch sensor layer TSL can be disposed on an upper portion of the first thin film encapsulation layer TFEL1. The touch sensor layer TSL is directly disposed on the upper portion of the first thin film encapsulation layer TFEL1, and thus the thickness of the display device 10 can be reduced compared to a case in which a separate touch panel including the touch sensor layer TSL is attached to the first thin film encapsulation layer TFEL1.

[0091] The touch sensor layer TSL can include a touch electrode for sensing a touch of a user and a touch electrode line connecting a pad and the touch electrode. The touch electrode of the touch sensor layer TSL can be disposed in a touch sensing area overlapping the display area DA of the display panel 100.

[0092] A cover window CW can be disposed on the display panel 100.

[0093] A cover window CW can be disposed on the touch sensor layer TSL of the display panel 100. For example, the cover window CW can be attached to the touch sensor layer TSL by a transparent adhesive member. The cover window CW can be in direct contact with the user's finger F.

[0094] The fingerprint sensor layer FPSL can be disposed on a lower portion of the first substrate SUB1. An upper face (or one face) of the first substrate SUB1 can face the optical pattern layer CML. A lower face (or the other face) of the first substrate SUB1 can face the fingerprint sensor layer FPSL.

[0095] The upper face (or one face) of the fingerprint sensor layer FPSL can be attached to the lower face (or the other face) of the first substrate SUB1 by an adhesive member OCA. The adhesive member OCA can be an Optical Clear Adhesive, but is not limited thereto.

[0096] The fingerprint sensor layer FPSL can include a plurality of fingerprint sensors FPS as shown in FIG. 2. Figure 1

[0097] The plurality of fingerprint sensors FPS can be optical fingerprint sensors. For example, the plurality of fingerprint sensors FPS can be configured with a Photo Diode, a CMOS image sensor, a CCD camera, a Photo Transistor, etc., but are not limited thereto.

[0098] The plurality of fingerprint sensors FPS can sense light reflected by the ridges FR and the valleys FV between the ridges FR of the fingerprint of the finger F to recognize the fingerprint.

[0099] For example, if the user's finger F contacts the cover window CW, the first light L1 output by the light emitting element layer EML can be reflected by the ridges FR and the valleys FV of the fingerprint of the finger F, and the reflected second light L2 can pass through the light transmissive portions TA of the refractive pattern layer PTL and the optical pattern layer CML to reach the fingerprint sensor layer FPSL disposed on the lower portion of the first substrate SUB1. The fingerprint sensor FPS of the fingerprint sensor layer FPSL can distinguish the second light L2 reflected from the ridges FR of the fingerprint of the finger F from the second light L2 reflected from the valleys FV of the fingerprint of the finger F, thereby recognizing the pattern of the user's fingerprint. Accordingly, the light transmissive portions TA of the optical pattern layer CML can become a passage of the second light L2 reflected by the user's finger F.

[0100] ​In the display device 10, the fingerprint sensor layer FPSL can be disposed at a lower portion of the display panel 100, so that a process can be simplified, and since the fingerprint sensor FPS is not disposed in a path of the first light L1 (e.g., an upper portion of the light emitting element layer EML), a resolution can be prevented from being reduced.

[0101] The fingerprint sensor layer FPSL can include a second substrate SUB2, a buffer layer 410, a second thin film transistor layer TFTL2, a light receiving element layer PDL, and a second thin film encapsulation layer TFEL2.

[0102] The second substrate SUB2 can be a base substrate, and can be configured with an insulating material such as a polymer resin. For example, the second substrate SUB2 can be a flexible substrate capable of bending, folding, rolling, or the like. In the case where the second substrate SUB2 is a flexible substrate, it can be formed of polyimide (PI), but is not limited thereto.

[0103] The buffer layer 410 can be disposed on the second substrate SUB2. The buffer layer 410 can be configured with an inorganic film capable of preventing air or moisture from penetrating. For example, the buffer layer 410 can be configured as a multi-layered film in which inorganic films including inorganic materials such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), or aluminum oxide (AlO x ) are alternately stacked, but is not limited thereto. According to an embodiment, the buffer layer 410 can be omitted.

[0104] The second thin film transistor layer TFTL2 can be disposed on the second substrate SUB2 or the buffer layer 410. A lower surface of the second thin film transistor layer TFTL2 can face an upper surface of the buffer layer 410.

[0105] The second thin film transistor layer TFTL2 can include at least one thin film transistor that drives each of a plurality of fingerprint sensors FPS. The at least one thin film transistor of the fingerprint sensor FPS can include a semiconductor layer, a gate electrode, a drain electrode, and a source electrode. For example, the second thin film transistor layer TFTL2 can further include a scan line, a pull-out line, and a common voltage line connected to the at least one thin film transistor of the fingerprint sensor FPS.

[0106] The light receiving element layer PDL can be disposed on the second thin film transistor layer TFTL2. A lower surface of the light receiving element layer PDL can face an upper surface of the second thin film transistor layer TFTL2.

[0107] The light-receiving element layer PDL may include a light-receiving element connected to at least one thin-film transistor of the second thin-film transistor layer TFTL2. The light-receiving element may include a first electrode, a light-receiving layer, and a second electrode. For example, the light-receiving layer may be an organic light-receiving layer formed using an organic material, but is not limited thereto. When the light-receiving layer corresponds to an organic light-receiving layer, the organic light-receiving layer may receive the second light L2 and combine holes and electrons, and may convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first electrode and the second electrode.

[0108] The light receiving element layer PDL may include a sensor definition film defining a plurality of fingerprint sensors FPS. The first electrode of the light receiving element and the light receiving layer may be separated and insulated from each other by the sensor definition film.

[0109] The second thin film encapsulation layer TFEL2 may be disposed on the light receiving element layer PDL, and a lower surface of the second thin film encapsulation layer TFEL2 may face an upper surface of the light receiving element layer PDL.

[0110] The second thin film encapsulation layer TFEL2 may cover the upper surface of the light receiving element layer PDL and may prevent oxygen or moisture from penetrating into the light receiving element layer PDL. For example, the second thin film encapsulation layer TFEL2 may include at least one inorganic film. The second thin film encapsulation layer TFEL2 may include a layer containing a silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlO x ) and other inorganic materials, but is not limited thereto.

[0111] The second thin film encapsulation layer TFEL2 can protect the light receiving element layer PDL from foreign matter such as dust. To this end, the second thin film encapsulation layer TFEL2 may include at least one organic film. The second thin film encapsulation layer TFEL2 may include an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, or polyimide resin, but is not limited thereto.

[0112] In addition, Figure 2 The second thin film encapsulation layer TFEL2 of the fingerprint sensor layer FPSL is arranged to face the third direction (Z-axis direction) as an example, but the present invention is not limited thereto. For example, the fingerprint sensor layer FPSL may be arranged so that the second substrate SUB2 faces the third direction (Z-axis direction).

[0113] Figure 3 is a perspective view showing a path of reflected light in a display device according to an embodiment.

[0114] Figure 4 is a diagram illustrating a fingerprint pixel and a sensor pixel of a display device according to an embodiment.

[0115] Referring to Figure 3 and Figure 4 , the cover window CW can include a plurality of fingerprint pixels FPP and a sampling region SPR surrounding each of the plurality of fingerprint pixels FPP. The fingerprint sensor layer FPSL can include a plurality of fingerprint sensors FPS and a sensing region SSR surrounding each of the plurality of fingerprint sensors FPS.

[0116] One fingerprint pixel FPP on the cover window CW can correspond to at least one fingerprint sensor FPS of the fingerprint sensor layer FPSL. For example, one fingerprint pixel FPP can correspond to 20 to 30 fingerprint sensors FPS, but is not limited thereto. Each of the sampling regions SRR on the cover window CW can correspond to the sensing region SSR of the fingerprint sensor layer FPSL.

[0117] Each of the plurality of fingerprint pixels FPP can correspond to one light-transmissive area TA of the optical pattern layer CML. For example, if a user's finger F contacts the cover window CW, each of the plurality of sampling regions SPR can reflect the first light L1 output by the display panel 100, and the second light L2 reflected from each of the plurality of sampling regions SPR can pass through the light-transmissive area TA of the optical pattern layer CML to reach the sensing region SSR of the fingerprint sensor layer FPSL.

[0118] The plurality of light-transmissive areas TA of the optical pattern layer CML can become a passage for the second light L2 reflected by the user's finger F. Accordingly, the plurality of fingerprint sensors FPS can sense the second light L2 reflected by the ridges FR and the valleys FV between the ridges FR of the fingerprint of the finger F contacting the sampling regions SPR on the cover window CW.

[0119] The display device 10 can adjust the ratio of the fingerprint distance OD and the sensor distance ID so that light reflected by the user's finger F can be sensed by the fingerprint sensor FPS. Here, the fingerprint distance OD can be equivalent to the distance between the surface of the cover window CW, where the user's finger F directly contacts, and the center point of the light-transmitting portion TA of the optical pattern layer CML. The sensor distance ID can be equivalent to the distance between the center point of the light-transmitting portion TA of the optical pattern layer CML and the fingerprint sensor FPS of the fingerprint sensor layer FPSL. For example, light reflected from one end of a fingerprint pixel FPP on the cover window CW can pass through the center point of the light-transmitting portion TA to reach the other end of the fingerprint sensor FPS. Furthermore, light reflected from the other end of a fingerprint pixel FPP on the cover window CW can pass through the center point of the light-transmitting portion TA to reach one end of the fingerprint sensor FPS. Therefore, the shape of a fingerprint directly contacting the fingerprint pixel FPP and the image formed on the fingerprint sensor FPS can differ by 180 degrees.

[0120] In order to distinguish between light reflected from the ridges FR and light reflected from the valleys FV of the fingerprint of the user's finger F and provide them to the separate fingerprint sensors FPS, the light-transmitting portion TA can be formed to have a predetermined aspect ratio. In this case, the aspect ratio of the light-transmitting portion TA can be a value obtained by dividing the height Wb of the light-transmitting portion TA by the line width Wa of the light-transmitting portion TA. The line width Wa of the light-transmitting portion TA can represent the length of the light-transmitting portion TA in the first direction (X-axis direction) or the length in the second direction (Y-axis direction).

[0121] Figure 5 FIG. 1 is a plan view showing an example of an optical pattern layer of a display device according to an embodiment.

[0122] Reference Figure 5 The optical pattern layer CML may include a plurality of light-transmitting portions TA. For example, the planar shape of the plurality of light-transmitting portions TA may be equivalent to a circle. The line width (or diameter) Wa of each of the plurality of light-transmitting portions TA may be 1 μm to 10 μm, but is not limited thereto.

[0123] The plurality of light-transmitting portions TA may be arranged with a first pitch P1 along the first direction (X-axis direction). For example, the first pitch P1 may be greater than or equal to 1.3 times the sensor distance ID, but is not limited thereto.

[0124] The plurality of light-transmitting portions TA may be arranged with a second pitch P2 along the second direction (Y-axis direction). For example, the second pitch P2 may be substantially the same as the first pitch P1. As another example, the second pitch P2 may be different from the first pitch P1.

[0125] For example, the plurality of light-transmitting portions TA can be arranged side by side in the first direction (X-axis direction) and the second direction (Y-axis direction). As another example, the plurality of light-transmitting portions TA can be arranged in the first pitch P1 and the second pitch P2, and can also be arranged in alignment in a direction other than the first direction (X-axis direction) and the second direction (Y-axis direction).

[0126] For example, the first pitch P1 or the second pitch P2 can be proportional to the thickness of the first thin film encapsulation layer TFEL1. If the thickness of the first thin film encapsulation layer TFEL1 increases, the fingerprint distance OD can increase, and the area of the fingerprint pixel FPP and the sampling region SPR can also increase. Therefore, in order to adjust the ratio of the fingerprint distance OD and the sensor distance ID, the first pitch P1 or the second pitch P2 of the plurality of light-transmitting portions TA can be proportional to the thickness of the first thin film encapsulation layer TFEL1.

[0127] For example, the first pitch P1 or the second pitch P2 can be proportional to the distance between the light emitting elements of the light emitting element layer EML or the distance between the sub-pixels SP. If the distance between the light emitting elements increases, the distance between the second light L2 reflected by the finger F can also increase. Therefore, in order to cause the plurality of light-transmitting portions TA to perform the channeling of the second light L2, the first pitch P1 or the second pitch P2 can be proportional to the distance between the light emitting elements or the distance between the sub-pixels SP.

[0128] Figure 6 FIG. 7 is a plan view illustrating another example of an optical pattern layer of a display device according to an embodiment. Figure 6 The shape of the light-transmitting portion TA of FIG. 7 is different from that of Figure 5 the light-transmitting portion TA of FIG. 6, and thus the same configuration as the above-described configuration will be briefly described or omitted.

[0129] Referring to FIG. 7, Figure 6 the planar shape of the plurality of light-transmitting portions TA can correspond to a quadrangle. Each of the plurality of light-transmitting portions TA can have a first length Wa1 in the first direction (X-axis direction), and can have a second length Wa2 in the second direction (Y-axis direction). For example, the first length Wa1 of each of the plurality of light-transmitting portions TA can be 1 µm to 10 µm, but is not limited thereto. For example, the second length Wa2 of each of the plurality of light-transmitting portions TA can be the same as the first length Wa1. As another example, the second length Wa2 of each of the plurality of light-transmitting portions TA can be different from the first length Wa1.

[0130] In addition, the shape of the plurality of light-transmitting portions TA is not limited to Figure 5 and Figure 6The circular shape and the quadrangular shape are shown. For example, the plurality of light-transmissive portions TA can be formed in various shapes such as an elliptical shape, a polygonal shape, and the like. Also, the plurality of light-transmissive portions TA can have different shapes from each other within the optical pattern layer CML.

[0131] According to the above-described embodiment, the display device 10 can adjust the ratio of the fingerprint distance OD and the sensor distance ID, and adjust the arrangement and the shape of the light-transmissive portion TA of the optical pattern layer CML, and thus the sensitivity of the fingerprint sensor FPS can be improved.

[0132] Figure 7 FIG. 1 is a diagram illustrating a connection relationship of subpixels and lines according to an embodiment.

[0133] Referring to Figure 7 , the display panel 100 can include a display area DA and a non-display area NDA.

[0134] The display area DA can include a plurality of subpixels SP, a voltage supply line VL connected to the subpixels SP, a scan line SL, an emission control line EL, and a data line DL.

[0135] Each subpixel SP can be connected to at least one scan line SL, at least one data line DL, at least one emission control line EL, and at least one voltage supply line VL. In Figure 7 , each subpixel SP is connected to 2 scan lines SL, 1 data line DL, 1 emission control line EL, and 1 voltage supply line VL, but is not limited thereto. For example, each subpixel SP can be connected to 3 or more scan lines SL.

[0136] Each subpixel SP can include a driving transistor, at least one switching transistor, an emission element, and a capacitor.

[0137] The driving transistor can emit light by supplying a driving current to the emission element according to a data voltage applied to a gate electrode. For example, the driving transistor and the at least one switching transistor can be a thin film transistor (TFT).

[0138] The emission element can emit light having a predetermined brightness according to the magnitude of the driving current of the driving transistor. For example, the emission element can be an organic light emitting diode (OLED) including a first electrode, an organic emission layer, and a second electrode. The capacitor can maintain the data voltage applied to the gate electrode of the driving transistor constant.

[0139] The sub-pixel SP can receive a driving voltage VDD through a voltage supply line VL. Here, the driving voltage VDD can be a high potential voltage for driving the light emitting element of the sub-pixel SP.

[0140] The plurality of voltage supply lines VL can be spaced apart from each other in the first direction (X-axis direction) and can extend in the second direction (Y-axis direction). For example, each of the plurality of voltage supply lines VL can be arranged along a column of the sub-pixels SP arranged in the display area DA. Each of the plurality of voltage supply lines VL can be connected with the sub-pixels SP arranged in the same column and can supply the driving voltage VDD to the sub-pixels SP.

[0141] The scan lines SL and the emission control lines EL can extend in the first direction (X-axis direction) and can be spaced apart from each other in the second direction (Y-axis direction) crossing the first direction (X-axis direction). The scan lines SL and the emission control lines EL can be formed side by side with each other.

[0142] The data lines DL can be spaced apart from each other in the first direction (X-axis direction) and can extend in the second direction (Y-axis direction). The data lines DL can be formed side by side with the voltage supply lines VL.

[0143] The non-display area NDA can include a scan driving part 300 for applying a scan signal to the scan lines SL, a fan-out line FL connecting the data lines DL and a display driving part 200, and a pad DP connected with a circuit board. The pad DP can be arranged closer to a side edge of the display panel 100 than the display driving part 200.

[0144] The display driving part 200 can be connected to the pad DP to receive digital video data and a timing signal. The display driving part 200 can convert the digital video data into an analog positive / negative polarity data voltage and supply to the data lines DL through the fan-out line FL.

[0145] The display driving part 200 can generate a scan control signal and supply to the scan driving part 300 through a scan control line SCL.

[0146] The scan driving part 300 can be arranged at one side of the non-display area NDA. The scan driving part 300 can include a plurality of thin film transistors for generating a scan signal according to a scan control signal. The scan driving part 300 can supply the scan signal to the sub-pixels SP based on the scan control signal, so that the sub-pixels SP to which the data voltage is to be supplied can be selected.

[0147] Figure 8 FIG. 1 is a diagram illustrating a connection relationship of a fingerprint sensor and lines of a display apparatus according to an embodiment. Figure 9 FIG. 2 is a diagram illustrating a connection relationship of a switching transistor and lines of a display apparatus according to an embodiment.

[0148] Referring to Figure 8 and Figure 9 The fingerprint sensor layer FPSL can include a fingerprint recognition area FPA and a non-fingerprint recognition area NFPA.

[0149] The fingerprint recognition area FPA can include a plurality of fingerprint sensors FPS, a plurality of scan lines SL connected to the fingerprint sensors FPS, a plurality of lead-out lines ROL, and a plurality of common voltage lines VCL. For example, a distance between each of the plurality of fingerprint sensors FPS can be 5 μm to 50 μm, and one fingerprint pixel on the cover window CW can correspond to 20 to 30 fingerprint sensors FPS of the fingerprint sensor layer FPSL, but is not limited thereto.

[0150] Each of the plurality of fingerprint sensors FPS can be connected to the scan driving part SCU through the scan line SL and receive a scan signal from the scan driving part SCU. The scan line SL can extend in a first direction (X-axis direction) and can be spaced apart from each other in a second direction (Y-axis direction). The scan driving part SCU can supply the scan signal to each of the plurality of fingerprint sensors FPS, thereby selecting the fingerprint sensor FPS which is to sense a change in the lead-out signal.

[0151] Each of the plurality of fingerprint sensors FPS can be connected to the sensor driving part 500 through the lead-out line ROL and can supply a lead-out signal to the sensor driving part 500. The lead-out line ROL can be spaced apart from each other in the first direction (X-axis direction) and can extend in the second direction (Y-axis direction).

[0152] The non-fingerprint recognition area NFPA can be disposed outside the fingerprint recognition area FPA. The non-fingerprint recognition area NFPA can be defined as a remaining area other than the fingerprint recognition area FPA. For example, the scan driving part SCU can be disposed at one side of the non-fingerprint recognition area NFPA to be connected to the scan line SL extending to the fingerprint recognition area FPA.

[0153] The sensor driving part 500 can be disposed at the other side perpendicular to one side of the non-fingerprint recognition area NFPA and be connected to the lead-out line ROL extending to the non-fingerprint recognition area NFPA. The sensor driving part 500 can supply a sensing driving voltage to the plurality of fingerprint sensors FPS and receive a lead-out signal based on a user's finger F touch to recognize a pattern of the user's fingerprint.

[0154] For example, in a case where the finger F of the user is in contact with the cover window CW, the output signal of the fingerprint sensor FPS that receives the scan signal can change. The output signal of the fingerprint sensor FPS that receives light reflected by the ridge FR of the fingerprint of the finger F can be different from the output signal of the fingerprint sensor FPS that receives light reflected by the valley FV of the fingerprint of the finger F. The sensor driving part 500 can distinguish the difference of the output signal to determine whether the fingerprint pixel of the cover window CW corresponding to the fingerprint sensor FPS is the ridge FR or the valley FV of the fingerprint of the finger F. Accordingly, the sensor driving part 500 can recognize the pattern of the user's fingerprint based on the output signal.

[0155] The non-fingerprint recognition area NFPA can further include a fingerprint recognition pad FP disposed at one side edge of the fingerprint sensor layer FPSL. The fingerprint recognition pad FP can be connected with the sensor driving part 500 to supply a signal applied from an external integrated circuit to the sensor driving part 500.

[0156] In Figure 9 The fingerprint sensor FPS can include a switching transistor ST and a light-receiving element PD.

[0157] The switching transistor ST can supply a sensing driving voltage to the light-receiving element PD based on a scan signal applied to a gate electrode. For example, the gate electrode of the switching transistor ST can be connected to the scan line SL, the first electrode can be connected to the output line ROL, and the second electrode can be connected to the first electrode of the light-receiving element PD. The first electrode of the switching transistor ST can be a source electrode, and the second electrode can be a drain electrode. If the source-gate voltage of the switching transistor ST exceeds the threshold voltage of the switching transistor ST, a driving current can flow through the channel of the switching transistor ST.

[0158] The light-receiving element PD can recognize the pattern of the user's fingerprint based on the second light L2 reflected by the finger F of the user. The first electrode of the light-receiving element PD can be connected with the second electrode of the switching transistor ST, and the second electrode can be connected with the common voltage line VCL. For example, the second electrodes of a plurality of light-receiving elements PD can be formed as a common electrode to be connected with the common voltage line VCL. The common voltage line VCL can supply a low potential voltage to the second electrodes of the light-receiving elements PD.

[0159] For example, in a case where there is no contact of the user's body on the cover window CW, the light-receiving element PD can not receive light. If the light-receiving element PD does not receive light, the driving current input to the first electrode can be output to the second electrode.

[0160] If the user's finger F contacts the cover window CW, the light-receiving element PD can receive the second light L2 reflected by the ridge line FR or the valley line FV of the fingerprint of the finger F. The first light L1 output from the light-emitting element layer EML can be reflected by the ridge line FR or the valley line FV of the fingerprint of the finger F, and the reflected second light L2 can reach the light-receiving element PD of the fingerprint sensor layer FPSL. The light-receiving element PD can convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first electrode and the second electrode, and the converted electrical signal can be supplied to the sensor driving part 500 as an extraction signal. For example, in a case where a reverse bias is formed between the first electrode and the second electrode of the light-receiving element PD, a driving current and a reverse current can flow in proportion to the amount of light of the second light L2. Accordingly, if the light-receiving element PD receives the second light L2, the reverse current output from the light-receiving element PD can flow to the switching transistor ST, and can be applied to the sensor driving part 500 as an extraction signal.

[0161] The sensor driving part 500 distinguishes whether the extraction signal received from the fingerprint sensor FPS corresponds to the ridge line FR of the fingerprint of the finger F or whether it corresponds to the valley line FV of the fingerprint of the finger F, and thus can recognize the pattern of the user's fingerprint.

[0162] For example, the light-receiving element PD can be implemented as a photo transistor or a photo diode, but is not limited thereto. The light-receiving element PD can correspond to a light sensor that converts light energy into electrical energy, and can utilize a photovoltaic power generation effect in which a current flowing in a radial direction changes according to light intensity.

[0163] Figure 10 A block diagram of a display apparatus according to an embodiment is schematically illustrated.

[0164] Referring to Figure 10 The display apparatus 10 can include a display panel 100, a display driving part 200, a fingerprint sensor layer FPSL, and a sensor driving part 500.

[0165] The display driving part 200 can supply an image driving signal to the display panel 100, and thus can control an image display operation of the display panel 100. The display driving part 200 can generate the image driving signal based on digital video data and timing signals supplied from the outside. For example, the display driving part 200 can receive the digital video data and the timing signals from a host (not shown), and the timing signals can include a vertical synchronization signal, a horizontal synchronization signal, a clock signal, etc. Also, the image driving signal can include a scan signal, a light emission control signal, a data signal, etc.

[0166] The sensor driving part 500 can control an operation of the plurality of fingerprint sensors FPS of the fingerprint sensor layer FPSL to recognize a fingerprint of a user. For example, the sensor driving part 500 can supply a sensing driving voltage to the plurality of fingerprint sensors FPS, and can receive an output signal by a touch of the finger F. The fingerprint sensor FPS can supply output signals different from each other to the sensor driving part 500 based on light energy reflected from the ridge FR and the valley FV of the fingerprint of the finger F, respectively. The sensor driving part 500 can recognize the fingerprint of the user based on the output signal corresponding to each of the plurality of fingerprint pixels of the cover window CW.

[0167] Figure 11 FIG. 1 is a cross-sectional view illustrating a fingerprint sensor layer of a display apparatus according to an embodiment.

[0168] Referring to Figure 11 The fingerprint sensor layer FPSL can include a second substrate SUB2, a buffer layer 410, a second thin film transistor layer TFTL2, a light receiving element layer, and a second thin film encapsulation layer TFEL2.

[0169] The second substrate SUB2 can be a base substrate, and can be configured with an insulating material such as a polymer resin. For example, the second substrate SUB2 can be a flexible substrate capable of bending, folding, rolling, etc. In the case where the second substrate SUB2 is a flexible substrate, it can be formed of polyimide (PI), but is not limited thereto.

[0170] The buffer layer 410 can include a first buffer layer 411 and a second buffer layer 412. The first buffer layer 411 can be provided on the second substrate SUB2. The first buffer layer 411 can be configured with an inorganic film capable of preventing air or moisture from penetrating. The first buffer layer 411 can be configured with a material containing silicon nitride (SiN x), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), aluminum oxide (AlO x ), and the like.

[0171] The second buffer layer 412 can be disposed on the first buffer layer 411 and can cover the light-blocking pattern 420 patterned on the first buffer layer 411. The second buffer layer 412 can be constituted of an inorganic film capable of preventing air or moisture from penetrating.

[0172] The light-blocking pattern 420 can be disposed between the first buffer layer 411 and the second buffer layer 412 in a manner of overlapping the switching transistor ST. For example, the light-blocking pattern 420 can be formed by performing exposure patterning after depositing a light-absorbing substance or a light-blocking substance on the first buffer layer 411. The light-blocking pattern 420 can be constituted of a metal such as molybdenum (Mo), aluminum (Al), chromium (Cr), and silver (Ag), or an alloy of these, but is not limited thereto.

[0173] The second thin film transistor layer TFTL2 can be provided on the buffer layer 410. The second thin film transistor layer TFTL2 can include the switching transistor ST that drives each of the plurality of fingerprint sensors FPS. The second thin film transistor layer TFTL2 can further include a gate insulating film 440, an interlayer insulating film 450, a protective layer 460, and a planarization layer 470. The switching transistor ST of the fingerprint sensor FPS can include a semiconductor layer 431, a gate electrode 432, a source electrode 433, and a drain electrode 434.

[0174] The semiconductor layer 431 can be provided on the buffer layer 410. The semiconductor layer 431 can be disposed to overlap the gate electrode 432, the source electrode 433, and the drain electrode 434. The semiconductor layer 431 can be in direct contact with the source electrode 433 and the drain electrode 434, and can face the gate electrode 432 with the gate insulating film 440 interposed therebetween.

[0175] The gate electrode 432 can be disposed on the gate insulating film 440. The gate electrode 432 can overlap the semiconductor layer 431 with the gate insulating film 440 interposed therebetween.

[0176] The source electrode 433 and the drain electrode 434 can be arranged spaced apart from each other on the interlayer insulating film 450. The source electrode 433 can contact one surface of the semiconductor layer 431 through a first contact hole provided in the gate insulating film 440 and the interlayer insulating film 450. The drain electrode 434 can contact the other surface of the semiconductor layer 431 through a second contact hole provided in the gate insulating film 440 and the interlayer insulating film 450. The drain electrode 434 can directly contact the first electrode 481 of the light receiving element PD through a third contact hole in the protective layer 460.

[0177] The gate insulating film 440 may be provided on the semiconductor layer 431. For example, the gate insulating film 440 may be disposed on the semiconductor layer 431 and the buffer layer 410, and may insulate the semiconductor layer 431 from the gate electrode 432. The gate insulating film 440 may include a first contact hole through which the source electrode 433 passes, and a second contact hole through which the drain electrode 434 passes.

[0178] The interlayer insulating film 450 may be disposed on the gate electrode 432. For example, the interlayer insulating film 450 may include a first contact hole through which the source electrode 433 passes, and a second contact hole through which the drain electrode 434 passes. Here, the first contact hole and the second contact hole of the interlayer insulating film 450 may be connected to the first contact hole or the second contact hole of the gate insulating film 440, respectively.

[0179] The protection layer 460 may be provided on the switching transistor ST to protect the switching transistor ST. For example, the protection layer 460 may include a third contact hole through which the first electrode 481 of the light receiving element PD passes.

[0180] A planarization layer 470 may be provided on the protective layer 460 to planarize the top surface of the switching transistor ST. The planarization layer 470 may include a third contact hole through which the first electrode 481 of the light-receiving element PD passes. The third contact hole of the protective layer 460 and the third contact hole of the planarization layer 470 may be connected to each other so that the first electrode 481 of the light-receiving element PD passes therethrough.

[0181] Light receiving element layer ( Figure 2 The light receiving element layer PDL may include: a light receiving element PD connected to the switch transistor ST of the second thin film transistor layer TFTL2; and a sensor definition film 490 surrounding the light receiving element PD.

[0182] The light receiving element PD may include a first electrode 481 , a light receiving layer 482 , and a second electrode 483 .

[0183] The first electrode 481 can be provided on the planarization layer 470. For example, the first electrode 481 can be arranged to overlap with the opening area of ​​the light-receiving element layer PDL defined by the sensor definition film 490. Furthermore, the first electrode 481 can be connected to the drain electrode 434 of the switching transistor ST through a third contact hole provided in the planarization layer 470 and the protective layer 460. For example, the first electrode 481 can be formed of a transparent conductive material so that it can transmit the second light L2 reflected by the finger F and can function as the anode of the light-receiving element PD.

[0184] The light-receiving layer 482 may be provided on the first electrode 481. The light-receiving layer 482 may include a hole injection layer, a hole transport layer, a light-receiving layer, an electron blocking layer, an electron transport layer, an electron injection layer, and the like. For example, the light-receiving layer 482 may be an organic light-receiving layer formed of an organic substance, but is not limited thereto. When the light-receiving layer 482 corresponds to an organic light-receiving layer, the organic light-receiving layer may receive the second light L2 and combine holes and electrons, and may convert the energy of the second light L2 into an electrical signal (current or voltage) formed between the first electrode 481 and the second electrode 483.

[0185] The second electrode 483 can be provided on the light-receiving layer 482. For example, the second electrode 483 can be implemented as follows: it is not differentiated for each fingerprint sensor FPS, but is a common electrode for all fingerprint sensors FPS. If a driving voltage is applied to the first electrode 481 and a common voltage is applied to the second electrode 483, holes and electrons can move to the light-receiving layer 482 and combine with each other. The second electrode 483 can function as the cathode of the light-receiving element PD.

[0186] A sensor definition film 490 of the light-receiving element layer (PDL) may be provided on the planarization layer 470. The sensor definition film 490 may be provided between adjacent first electrodes 481 to divide the plurality of first electrodes 481. The sensor definition film 490 may electrically insulate the adjacent first electrodes 481 from the light-receiving layer 482, thereby defining an opening region of the light-receiving element layer (PDL).

[0187] The second thin film encapsulation layer TFEL2 may be provided on the light receiving element layer PDL. The second thin film encapsulation layer TFEL2 may cover the light receiving element layer PDL and may prevent oxygen or moisture from penetrating into the light receiving element layer PDL. For example, the second thin film encapsulation layer TFEL2 may include at least one inorganic film. The second thin film encapsulation layer TFEL2 may include a film containing a silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ) or aluminum oxide (AlOx ) etc., but is not limited thereto.

[0188] The second thin film encapsulation layer TFEL2 can protect the light receiving element layer PDL from foreign matter such as dust. For example, the second thin film encapsulation layer TFEL2 may include at least one organic film. The second thin film encapsulation layer TFEL2 may include an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, or polyimide resin, but is not limited thereto.

[0189] Figure 12 is a cross-sectional view showing in detail a display device according to an embodiment. Figure 12 As shown in detail Figure 2 , and thus the same structure as the above-mentioned structure will be briefly described or omitted.

[0190] Reference Figure 2 as well as Figure 12 The display device 10 may include a first substrate SUB1, an optical pattern layer CML, a refractive pattern layer PTL, a display panel, a cover window CW, and a fingerprint sensor layer FPSL. Display panel ( Figure 2 The fingerprint sensor layer FPSL may include a second substrate SUB2, a buffer layer 410, a second thin film transistor layer TFTL2, a light receiving element layer ( Figure 2 PDL) and a second thin film encapsulation layer TFEL2.

[0191] The optical pattern layer CML may include a plurality of light-transmitting portions TA, which may be optical passages for second light L2 emitted from the light-emitting element layer EML and reflected from the user's body to travel toward the fingerprint sensor layer FPSL.

[0192] The refraction pattern layer PTL may be a layer that refracts at least a portion of the second light L2 traveling toward the fingerprint sensor layer FPSL to adjust the path of the second light L2. The refraction pattern layer PTL may include a first light-transmitting layer including a high-refractive-index material and a second light-transmitting layer including a low-refractive-index material.

[0193] For detailed description of the optical pattern layer CML and the refractive pattern layer PTL, please refer to Figure 13 as well as Figure 22 to Figure 25 To be described later.

[0194] The first thin film transistor layer TFTL1 can be disposed on the back panel BP. The first thin film transistor layer TFTL1 can include at least one thin film transistor 110 that respectively drives a plurality of sub-pixels SP.

[0195] The first thin film transistor layer TFTL1 can further include a gate insulating film 120, an interlayer insulating film 130, a protective layer 140, and a planarization layer 150. The at least one thin film transistor 110 can include a semiconductor layer 111, a gate electrode 112, a source electrode 113, and a drain electrode 114.

[0196] The semiconductor layer 111 can be disposed on the back panel BP. The semiconductor layer 111 can be disposed to overlap the gate electrode 112, the source electrode 113, and the drain electrode 114. The semiconductor layer 111 can be in direct contact with the source electrode 113 and the drain electrode 114, and can face the gate electrode 112 with the gate insulating film 120 interposed therebetween.

[0197] The gate electrode 112 can be disposed on an upper portion of the gate insulating film 120. The gate electrode 112 can overlap the semiconductor layer 111 with the gate insulating film 120 interposed therebetween.

[0198] The source electrode 113 and the drain electrode 114 can be disposed apart from each other on the interlayer insulating film 130. The source electrode 113 can be in contact with one face of the semiconductor layer 111 through a contact hole provided in the gate insulating film 120 and the interlayer insulating film 130. The drain electrode 114 can be in contact with the other face of the semiconductor layer 111 through a contact hole provided in the gate insulating film 120 and the interlayer insulating film 130. The drain electrode 114 can be in direct contact with the first electrode 161 of the light emitting element 160 through a contact hole of the protective layer 140.

[0199] The gate insulating film 120 can be disposed on the semiconductor layer 111. For example, the gate insulating film 120 can be disposed on upper portions of the semiconductor layer 111 and the back panel BP, and can insulate the semiconductor layer 111 and the gate electrode 112. The gate insulating film 120 can include a contact hole through which the source electrode 113 passes and a contact hole through which the drain electrode 114 passes.

[0200] The interlayer insulating film 130 can be disposed on the gate electrode 112. For example, the interlayer insulating film 130 can include a contact hole through which the source electrode 113 passes and a contact hole through which the drain electrode 114 passes. Here, the contact hole of the interlayer insulating film 130 can be connected to the contact hole of the gate insulating film 120.

[0201] A protective layer 140 can be provided on the thin film transistor 110 to protect the thin film transistor 110. For example, the protective layer 140 can include a contact hole through which the first electrode 161 of the light emitting element 160 penetrates.

[0202] A planarization layer 150 can be provided on the protective layer 140 to planarize the upper surface of the thin film transistor 110. For example, the planarization layer 150 can include a contact hole through which the first electrode 161 of the light emitting element 160 penetrates. Here, the contact hole of the protective layer 140 and the contact hole of the planarization layer 150 can be connected to each other in order for the first electrode 161 of the light emitting element 160 to penetrate.

[0203] A light emitting element layer EML can be provided on the first thin film transistor layer TFTL1. The light emitting element layer EML can include the light emitting element 160 connected to the thin film transistor 110 of the first thin film transistor layer TFTL1.

[0204] The light emitting element 160 can include the first electrode 161, a light emitting layer 162, and a second electrode 163.

[0205] The first electrode 161 can be provided on the planarization layer 150. For example, the first electrode 161 can be disposed to overlap with an open region of the light emitting element layer EML defined by the pixel definition film 170. The first electrode 161 can be in contact with the drain electrode 114 of the thin film transistor 110 through the contact hole provided in the planarization layer 150 and the protective layer 140. For example, the first electrode 161 can function as an anode of the light emitting element 160.

[0206] The light emitting layer 162 can be provided on the first electrode 161. The light emitting layer 162 can include a hole injection layer, a hole transport layer, a light emitting layer, an electron blocking layer, an electron transport layer, an electron injection layer, etc. For example, the light emitting layer 162 can be an organic light emitting layer configured with an organic substance, but is not limited thereto. When the light emitting layer 162 corresponds to the organic light emitting layer, if the thin film transistor 110 of the first thin film transistor layer TFTL1 applies a predetermined voltage to the first electrode 161 of the light emitting element 160, and the second electrode 163 of the light emitting element 160 receives a common voltage or a cathode voltage, holes and electrons can move to the light emitting layer 162 through the hole transport layer and the electron transport layer, respectively, and the holes and the electrons can combine with each other in the light emitting layer 162 to emit light.

[0207] The second electrode 163 can be provided on the light emitting layer 162. For example, the second electrode 163 can be implemented in an electrode form that is not distinguished by each sub-pixel SP, but is a common electrode for the entire sub-pixels SP.

[0208] The light emitting element layer EML can include a pixel definition film 170 defining a plurality of sub-pixels SP. The first electrode 161 and the light emitting layer 162 of the light emitting element 160 can be separated from and insulated from each other by the pixel definition film 170.

[0209] Furthermore, the first thin film encapsulation layer TFEL1, the touch sensor layer TSL, the cover window CW, and the fingerprint sensor layer FPSL have been described with reference to Figure 2 and Figure 11 The first thin film encapsulation layer TFEL1, the touch sensor layer TSL, the cover window CW, and the fingerprint sensor layer FPSL have been described, and thus the repeated content is omitted.

[0210] Figure 13 is a cross-sectional view of a display device according to an embodiment, and illustrates a cross-sectional view of an optical pattern layer and a refractive pattern layer of the display device according to an embodiment in detail. Figure 14 is Figure 13 is a modification of the structure shown in FIG. 7. Hereinafter, for convenience of explanation, only the second substrate SUB2 and a plurality of light receiving elements PD and a sensor definition film 490 disposed on the second substrate SUB2 among the components of the fingerprint sensor layer FPSL are schematically illustrated, but it is obvious that other components for constituting the fingerprint sensor layer FPSL can also be included.

[0211] Referring to Figure 13 , the optical pattern layer CML and the refractive pattern layer PTL can be disposed on the first substrate SUB1.

[0212] As described above, the optical pattern layer CML can include the light blocking part BA and the plurality of light transmitting parts TA through the light blocking part BA in one direction (for example, a thickness direction). A part of the light incident to the optical pattern layer CML can travel toward the light receiving element PD through the light transmitting part TA, but another part of the light can be blocked by the light blocking part BA.

[0213] Specifically, the optical pattern layer CML includes the light blocking part BA and the light transmitting part TA, so that only light incident at an angle within a predetermined angle can be transmitted, and light other than this can be blocked. Here, the predetermined angle determined by the optical pattern layer CML can be defined as a cut off angle θc or a blocking angle. The light receiving element PD can distinguish and receive the light reflected from the ridge line of the fingerprint of the user's finger and the light reflected from the valley by the optical pattern layer CML.

[0214] The cut off angle θc of the optical pattern layer CML can be determined by the ratio of the line width Wa and the height Wb of the light transmitting part TA (that is, the aspect ratio of the light transmitting part TA). In addition, the sum of the line width Wa of the light transmitting part TA and the width Wc of the light blocking part BA can be constant. That is, the distance between the light transmitting parts TA can be constant, but is not limited thereto.

[0215] The refractive pattern layer PTL can be disposed on the optical pattern layer CML. The refractive pattern layer PTL can include a first light-transmissive layer HRL and a second light-transmissive layer LRL having different refractive indexes from each other.

[0216] Specifically, the refractive index of the first light-transmissive layer HRL can be greater than the refractive index of the second light-transmissive layer LRL. As an embodiment, the refractive index ratio of the first light-transmissive layer HRL and the second light-transmissive layer LRL can be 0.9775 or less. Here, the refractive index ratio can be a value obtained by dividing the refractive index of the second light-transmissive layer LRL by the refractive index of the first light-transmissive layer HRL.

[0217] The first light-transmissive layer HRL can be disposed to overlap the light-blocking portion BA of the optical pattern layer CML. According to an embodiment, the first light-transmissive layer HRL can completely overlap the light-blocking portion BA, in which case the shape on the plane of the first light-transmissive layer HRL can be substantially the same as the shape on the plane of the light-blocking portion BA.

[0218] The first light-transmissive layer HRL can include a plurality of openings OP. The openings OP included in the first light-transmissive layer HRL can be formed at positions corresponding to the light-transmissive portions TA of the optical pattern layer CML.

[0219] The first light-transmissive layer HRL can be a high-refractive layer including a high-refractive substance. For example, the first light-transmissive layer HRL can be formed to include an inorganic film including an inorganic material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), or aluminum oxide (AlO x ), but is not limited thereto and can be formed to include an organic film including inorganic particles formed of the above-described inorganic material.

[0220] The second light-transmissive layer LRL can be formed on the first light-transmissive layer HRL and can be formed in a manner to fill the light-transmissive portions TA of the optical pattern layer CML. That is, the space between the light-blocking portions BA of the optical pattern layer CML can be filled with the second light-transmissive layer LRL. Also, the second light-transmissive layer LRL can entirely cover the first light-transmissive layer HRL. The second light-transmissive layer LRL can be formed in a manner to fill the openings OP of the first light-transmissive layer HRL.

[0221] The upper surface of the second light-transmissive layer LRL can be substantially flat. That is, the second light-transmissive layer LRL can perform the role of a planarization layer that compensates for the step difference of the configuration disposed below. By this, the light incident onto the upper surface of the second light-transmissive layer LRL can uniformly travel toward the optical pattern layer CML.

[0222] The second light-transmitting layer LRL may be a low-refractive-index layer containing a low-refractive-index material. As described above, the refractive index of the second light-transmitting layer LRL may be lower than that of the first light-transmitting layer HRL. For example, the second light-transmitting layer LRL may be formed using an organic film including a transparent organic material such as polyacrylate resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenyleneether resin, polyphenylenesulfide resin, or benzocyclobutene (BCB).

[0223] The arrangement and shape of the second light-transmitting layer LRL are not limited to the above. For example, Figure 14 As shown, the second light-transmitting layer LRL_1 may not be filled with the light-transmitting portion TA. In this case, the material filling the light-transmitting portion TA can be different from the material constituting the second light-transmitting layer LRL_1. As one example, the light-transmitting portion TA can be filled with a transparent organic material having a different refractive index than that of the second light-transmitting layer LRL_1. As another example, an air layer can be formed in at least a portion of the light-transmitting portion TA.

[0224] In the above-described embodiment, the cutoff angle θc of the optical pattern layer CML can be determined by the aspect ratio of the light-transmitting portion TA. As the line width Wa of the light-transmitting portion TA decreases and the height Wb of the light-transmitting portion TA increases, the aspect ratio of the light-transmitting portion TA can be increased, and the cutoff angle θc of the optical pattern layer CML can be reduced. Consequently, the optical pattern layer CML can more accurately distinguish between light reflected from the ridges and valleys of a fingerprint and supply the light to the light-receiving element PD. This improves the fingerprint detection capability of the display device 10.

[0225] However, as the aspect ratio of the light-transmitting portion TA increases, the amount of light blocked by the light-blocking portion BA of the optical pattern layer CML may increase, and the light transmittance of the optical pattern layer CML may decrease. When the light transmittance of the optical pattern layer CML decreases, the amount of light supplied to the light-receiving element PD may be insufficient, and the signal-to-noise ratio (SNR) of the optical pattern layer CML may deteriorate.

[0226] Accordingly, the display device 10 according to an embodiment of the present invention may include a refraction pattern layer PTL disposed on the optical pattern layer CML.

[0227] For example, the refractive pattern layer PTL can be incident with the first reflected light L2a and the second reflected light L2b.

[0228] The first reflected light L2a can be light incident at a first angle θa with respect to one side surface BAS of the light blocking portion BA. Here, the first reflected light L2a can be light incident at an angle within the cut-off angle θc. The first reflected light L2a can not be refracted by the refractive pattern layer PRL (or the first transparent layer HRL). The first reflected light L2a can be transmitted through the refractive pattern layer PTL and the optical pattern layer CML to be incident toward the light receiving element PD arranged in the lower portion.

[0229] On the contrary, the second reflected light L2b can be light incident at a second angle θb with respect to one side surface BAS of the light blocking portion BA. Here, the second reflected light L2b can be light incident at an angle greater than the cut-off angle θc. As described above, the refractive index of the first transparent layer HRL can be greater than the refractive index of the second transparent layer LRL. Accordingly, the second reflected light L2b traveling toward the first transparent layer HRL from the second transparent layer LRL can be refracted. Thus, the second reflected light L2b can be refracted as refracted light L2b' toward the light blocking portion BA side, and the refracted light L2b' can be blocked or absorbed by the light blocking portion BA, so that it can not be provided toward the light receiving element PD side.

[0230] That is, the refractive pattern layer PTL can refract the incident light by the difference in refractive index of the first transparent layer HRL and the second transparent layer LRL, and accordingly, the cut-off angle θc of the optical pattern layer CML can be adjusted.

[0231] As in the present embodiment, in the case where the refractive pattern layer PTL is arranged in the upper portion of the optical pattern layer CML, even if the line width Wa of the light transmitting portion TA is increased in order to improve the light transmittance of the optical pattern layer CML, the cut-off angle θc of the optical pattern layer CML can be maintained at a predetermined level. For example, as the line width Wa of the light transmitting portion TA increases, the height Wh of the first transparent layer HRL can also increase. That is, while the light transmittance of the optical pattern layer CML is improved by increasing the line width Wa of the light transmitting portion TA, the height Wh of the first transparent layer HRL can be adjusted, so that the cut-off angle θc of the optical pattern layer CML can be adjusted to a desired level.

[0232] In the case where the line width Wa of the light transmitting portion TA is increased to improve the transmittance of the optical pattern layer CML, the signal-to-noise ratio (SNR) of the fingerprint sensor including the light receiving element PD can be improved, and the fingerprint detection capability of the display device 10 can be improved.

[0233] Further, since the bright-dark cutoff angle θc of the optical pattern layer CML can be adjusted by adjusting the height Wh of the first light-transmissive layer HRL, the optical pattern layer CML can more accurately distinguish the light reflected from the ridge lines of the fingerprint of the finger and the light reflected from the valleys and provide to the light-receiving element PD. That is, the fingerprint detection capability of the display device 10 can be improved.

[0234] Hereinafter, other embodiments will be described. In the following embodiments, the same reference signs are used for the same configurations as those already described, and repeated descriptions will be omitted or simplified.

[0235] Figure 15 is a cross-sectional view of a display device according to another embodiment, and is a cross-sectional view that shows the optical pattern layer and the refractive pattern layer of the display device according to another embodiment in detail. Figure 16 is a cross-sectional view of a display device according to another embodiment, and is a cross-sectional view that shows the optical pattern layer and the refractive pattern layer of the display device according to another embodiment in detail. Figure 15 is a modification example of the structure shown in

[0236] Referring to Figure 15 and Figure 16 , the display device 10_2 can include a refractive pattern layer PTL_2 disposed at the upper portion of the optical pattern layer CML. The refractive pattern layer PTL_2 can be a lens pattern layer that controls the path of light reflected from an external object.

[0237] The refractive pattern layer PTL_2 can include a first light-transmissive layer HRL_2 (or a lens layer) and a second light-transmissive layer LRL (or a protective layer).

[0238] The first light-transmissive layer HRL_2 can include an upper surface HRLa, a lower surface HRLb facing the upper surface HRLa, and an inclined surface HRLc_2 between the upper surface HRLa and the lower surface HRLb. The upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_2 can be substantially parallel, and the lower surface HRLb of the first light-transmissive layer HRL_2 can be in contact with the optical pattern layer CML. However, it is not limited thereto, and a separate support member for supporting the refractive pattern layer PTL_2 can be disposed between the first light-transmissive layer HRL_2 and the optical pattern layer CML.

[0239] The area (or width) of the upper surface HRLa of the first light-transmissive layer HRL_2 can be smaller than the area (or width) of the lower surface HRLb. The inclined surface HRLc_2 can be provided between the upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_2. The inclined surface HRLc_2 of the first light-transmissive layer HRL_2 can form an inclined angle θc' with the lower surface HRLb, and the inclined angle θc' can be an acute angle. At least a portion of the inclined surface HRLc_2 of the first light-transmissive layer HRL_2 can overlap the light-blocking portion BA in one direction (for example, the thickness direction).

[0240] The second light-transmitting layer LRL may be arranged to cover the first light-transmitting layer HRL_2. The upper surface of the second light-transmitting layer LRL may be substantially flat. That is, the second light-transmitting layer LRL may function as a planarization layer.

[0241] The refractive indexes of the first light-transmitting layer HRL_2 and the second light-transmitting layer LRL may be different from each other. Specifically, the refractive index of the first light-transmitting layer HRL_2 may be greater than the refractive index of the second light-transmitting layer LRL. Accordingly, light traveling from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_2 may be refracted.

[0242] The refractive pattern layer PTL_2 may improve the light transmittance of the optical pattern layer CML.

[0243] For example, the first reflected light L2c and the second reflected light L2d may be incident on the refraction pattern layer PTL_2. The first reflected light L2c may pass through the upper surface HRLa and the lower surface HRLb of the first light-transmitting layer HRL_2 and be incident on the light-receiving element PD through the light-transmitting portion TA.

[0244] Conversely, the second reflected light L2d may be incident on the inclined surface HRLc_2 of the first light-transmitting layer HRL_2. Here, the second reflected light L2d may be light traveling toward the light-blocking portion BA. As the second reflected light L2d travels from the second light-transmitting layer LRL toward the first light-transmitting layer HRL_2, it may be refracted by the inclined surface HRLc_2 and travel toward the light-transmitting portion TA.

[0245] Specifically, the refractive pattern layer PTL_2 according to this embodiment can adjust the path of light reflected from external objects traveling toward the light-blocking portion BA and refract light traveling toward the light-blocking portion BA, directing it toward the light-transmitting portion TA. This improves the light transmittance of the optical pattern layer CML, increases the amount of light incident on the light-receiving element PD, and enhances the fingerprint recognition performance of the display device 10_2.

[0246] In addition, the shape of the first light-transmitting layer HRL_2 is not limited to the above, but may be various.

[0247] For example, Figure 16 As shown, the display device 10_3 may include a refraction pattern layer PTL_3 disposed on the optical pattern layer CML. The refraction pattern layer PTL_3 may include a plurality of first light-transmitting layers HRL_3 disposed spaced apart from each other.

[0248] The first light-transmissive layer HRL_3 can include an inclined surface HRLc_3. The inclined surface HRLc_3 of the first light-transmissive layer HRL_3 can form an inclined angle θd with the lower surface HRLb, and the inclined angle θd can be an acute angle. At least a portion of the inclined surface HRLc_3 of the first light-transmissive layer HRL_3 can overlap the light-blocking portion BA in a direction (e.g., a thickness direction).

[0249] A second light-transmissive layer LRL can be disposed on the first light-transmissive layer HRL_3. The second light-transmissive layer LRL can be disposed to cover the first light-transmissive layer HRL_3, and according to an embodiment, the second light-transmissive layer LRL can fill at least a portion of the light-transmissive portion TA.

[0250] The first reflected light L2e and the second reflected light L2f can be incident to the refractive pattern layer PTL_3. The first reflected light L2e can be transmitted through the upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_3 and be incident toward the light-receiving element PD side through the light-transmissive portion TA. In contrast, the second reflected light L2f can be incident to the inclined surface HRLc_3 of the first light-transmissive layer HRL_3. Here, the second reflected light L2f can be light traveling toward the light-blocking portion BA. The second reflected light L2f can be refracted by the inclined surface HRLc_3 in a process of traveling toward the first light-transmissive layer HRL_3 from the second light-transmissive layer LRL and can travel toward the light-transmissive portion TA.

[0251] As explained through Figure 15 , by the refractive pattern layer PTL_3, the light transmittance of the optical pattern layer CML can be improved, and the amount of light incident to the light-receiving element PD can be increased, and the fingerprint recognition performance of the display device 10_3 can be improved.

[0252] Figure 17 is a cross-sectional view of a display device according to still another embodiment, and particularly, a cross-sectional view of an optical pattern layer and a refractive pattern layer of the display device according to still another embodiment is shown in detail.

[0253] Referring to Figure 17 , the display device 10_4 can include a refractive pattern layer PTL_4 disposed at a lower portion of the optical pattern layer CML. The refractive pattern layer PTL_4 can be a lens pattern layer that controls a path of light transmitted through the optical pattern layer CML.

[0254] The refractive pattern layer PTL_4 can include a first light-transmissive layer HRL_4 (or a lens layer) and a second light-transmissive layer LRL (or a protective layer).

[0255] The first light-transmissive layer HRL_4 can include an upper surface HRLa, a lower surface HRLb facing the upper surface HRLa, and an inclined surface HRLc_4 between the upper surface HRLa and the lower surface HRLb. The upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_4 can be substantially parallel, and the lower surface HRLb of the first light-transmissive layer HRL_4 can be in contact with the first substrate SUB1. However, the present embodiment is not limited thereto, and a separate support member for supporting the refractive pattern layer PTL_4 can be disposed between the first light-transmissive layer HRL_4 and the first substrate SUB1.

[0256] The inclined surface HRLc_4 can be disposed between the upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_4. The inclined surface HRLc_4 of the refractive pattern layer PTL_4 can form an inclined angle θe with the lower surface HRLb, and the inclined angle θe can be an acute angle.

[0257] A plurality of light-receiving elements PD can be disposed at a lower portion of the first light-transmissive layer HRL_4. At least a portion of the inclined surface HRLc_4 of the first light-transmissive layer HRL_4 can overlap with a region between the light-receiving layers 482 included in the plurality of light-receiving elements PD in a direction (e.g., a thickness direction).

[0258] In addition, as the distance Wd between the light-receiving layers 482 of the light-receiving elements PD increases, the distance Wt between the refractive pattern layer PTL_4 and the light-receiving elements PD can also increase.

[0259] The second light-transmissive layer LRL can be disposed to cover the first light-transmissive layer HRL_4. An upper surface of the second light-transmissive layer LRL can be substantially flat. That is, the second light-transmissive layer LRL can perform the role of a planarization layer, and can be equipped with a space in which the optical pattern layer CML is to be disposed.

[0260] The refractive indices of the first light-transmissive layer HRL_4 and the second light-transmissive layer LRL can be different from each other. Specifically, the refractive index of the first light-transmissive layer HRL_4 can be greater than the refractive index of the second light-transmissive layer LRL. Accordingly, light traveling toward the first light-transmissive layer HRL_4 from the second light-transmissive layer LRL can be refracted.

[0261] The refractive pattern layer PTL_4 can improve the light-receiving efficiency of the light-receiving elements PD.

[0262] For example, the first reflected light L2g and the second reflected light L2h that have passed through the optical pattern layer CML can be incident on the refractive pattern layer PTL_4. The first reflected light L2g can pass through the upper surface HRLa and the lower surface HRLb of the first light-transmissive layer HRL_4 and be incident toward the light-receiving element PD side.

[0263] On the other hand, the second reflected light L2h can be incident toward the inclined surface HRLc_4 of the first light-transmissive layer HRL_4. Here, the second reflected light L2h can be light that travels toward the region between the light-receiving elements PD. The second reflected light L2h can be refracted by the inclined surface HRLc_4 in traveling from the second light-transmissive layer LRL toward the first light-transmissive layer HRL_4, and can travel toward the light-receiving elements PD.

[0264] That is, the refractive pattern layer PTL_4 according to the present embodiment can adjust the path of light that travels toward the region between the light-receiving elements PD among the light that has transmitted the optical pattern layer CML, and can cause it to be refracted in a manner that travels toward the light-receiving elements PD. Thereby, the light-receiving efficiency of the light-receiving elements PD can be improved, and the amount of light incident to the light-receiving elements PD can be increased, and the fingerprint recognition performance of the display device 10_4 can be improved.

[0265] Figure 18 to Figure 21 is a cross-sectional view of a display device according to various embodiments. The refractive pattern layer according to the above-described Figure 13 , Figure 15 and Figure 17 embodiments can be composed of each other. Hereinafter, such a composite structure will be described in Figure 18 to Figure 21 , however, the repeated description will be omitted.

[0266] As an example, as shown in Figure 18 , the display device 10_5 can include a refractive pattern layer PTL_5 disposed on the optical pattern layer CML. The refractive pattern layer PTL_5 can include a first refractive pattern layer PTL1_5 and a second refractive pattern layer PTL2_5 disposed on the first refractive pattern layer PTL1_5.

[0267] The first refractive pattern layer PTL1_5 can be substantially the same as the refractive pattern layer PTL described in Figure 13 , and the second refractive pattern layer PTL2_5 can be substantially the same as the refractive pattern layer PTL_2 described in Figure 15 , and thus the repeated description thereof will be omitted.

[0268] For the display device 10_5 according to the embodiment of Figure 18 , the second refractive pattern layer PTL2_5 can adjust the path of light that travels toward the light-blocking portion BA among the light reflected from the external object, and can cause the light that travels toward the light-blocking portion BA to be refracted to travel toward the light-transmissive portion TA. Thereby, the light transmittance of the optical pattern layer CML can be improved, and the fingerprint recognition performance of the display device 10_5 can be improved. Also, since the bright-dark cutoff angle of the optical pattern layer CML can be adjusted by the first refractive pattern layer PTL1_5, the fingerprint detection capability of the display device 10_5 can be improved.

[0269] As another example, Figure 19 As shown, the display device 10_6 may include refraction pattern layers PTL_6 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_6 may include a first refraction pattern layer PTL1_6 disposed above the optical pattern layer CML and a second refraction pattern layer PTL2_6 disposed below the optical pattern layer CML.

[0270] The first refraction pattern layer PTL1_6 may be Figure 13 The refraction pattern layer PTL described in the embodiment is substantially the same, and the second refraction pattern layer PTL2_6 may be the same as Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0271] For according to Figure 19 For the display device 10_6 of the embodiment, the second refractive pattern layer PTL2_6 refracts light in the following manner: it adjusts the path of light traveling toward the area between the light-receiving elements PD, thereby directing the light toward the light-receiving elements PD. This improves the light-receiving efficiency of the light-receiving elements PD and enhances the fingerprint recognition performance of the display device 10_6. Furthermore, because the first refractive pattern layer PTL1_6 can adjust the cutoff angle of the optical pattern layer CML, the fingerprint detection capability of the display device 10_6 can be enhanced.

[0272] As another example, Figure 20 As shown, the display device 10_7 may include a refraction pattern layer PTL_7 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_7 may include a first refraction pattern layer PTL1_7 and a second refraction pattern layer PTL2_7 disposed above the optical pattern layer CML, and a third refraction pattern layer PTL3_7 disposed below the optical pattern layer CML.

[0273] Since the first refraction pattern layer PTL1_7 is Figure 13 The refraction pattern layer PTL described in the above is substantially the same as the second refraction pattern layer PTL2_7. Figure 15 The refraction pattern layer PTL_2 described in the above is substantially the same as the third refraction pattern layer PTL3_7. Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0274] according to Figure 20In the embodiment, the second refraction pattern layer (PTL2_7) can adjust the path of light reflected from external objects traveling toward the light-blocking portion BA, refracting the light traveling toward the light-blocking portion BA and directing it toward the light-transmitting portion TA. This improves the light transmittance of the optical pattern layer CML and the fingerprint recognition performance of the display device 10_7. Furthermore, the third refraction pattern layer (PTL3_7) can adjust the path of light traveling toward the area between the light-receiving elements PD, thereby refracting the light toward the light-receiving elements PD. This improves the light-receiving efficiency of the light-receiving elements PD and further enhances the fingerprint recognition performance of the display device 10_7. Furthermore, because the first refraction pattern layer (PTL1_7) can adjust the light cutoff angle of the optical pattern layer CML, the fingerprint detection capability of the display device 10_7 can be enhanced.

[0275] As another example, Figure 21 As shown, the display device 10_8 may include a refraction pattern layer PTL_8 disposed above and below the optical pattern layer CML. The refraction pattern layer PTL_8 may include a second refraction pattern layer PTL2_8 disposed above the optical pattern layer CML and a third refraction pattern layer PTL3_8 disposed below the optical pattern layer CML.

[0276] Since the second refraction pattern layer PTL2_8 is Figure 15 The refraction pattern layer PTL_2 described in the embodiment is substantially the same, and the third refraction pattern layer PTL3_8 is substantially the same as Figure 17 The refraction pattern layer PTL_4 described in FIG. 1 is substantially the same as that in FIG. 2 , and thus repeated description thereof will be omitted.

[0277] The display device 10_8 according to this embodiment is different from the aforementioned Figure 20 Compared with the embodiment of FIG. 1 , the difference is that the display device 10_8 according to this embodiment does not include the first refraction pattern layer ( Figure 20 's PTL1_7), and the rest of the configuration is substantially the same, so the specific description will be omitted.

[0278] Figure 22 to Figure 25 1 is a cross-sectional view illustrating various steps of a method for manufacturing a display device according to an embodiment. Figure 22 to Figure 25 As a description of the manufacturing Figure 1 to Figure 13 A cross-sectional view of a method for displaying a device with Figure 1 to Figure 13 Substantially the same components are denoted by the same reference numerals, and detailed reference numerals are omitted.

[0279] First, refer to Figure 22 , a light-blocking material layer BML is formed on the first substrate SUB1.

[0280] The light-blocking material layer BML can be formed using an organic light-blocking material and a metallic light-blocking material. For example, the organic light-blocking material can include at least one of carbon black (CB) and titanium black (TiBK), but is not limited thereto. Also, the metallic light-blocking material can include at least one of chromium, chromium oxide, and chromium nitride, but is not limited thereto.

[0281] For example, the step of forming the light-blocking material layer BML can be performed by inkjet printing or spin coating using a polyacrylates resin, an epoxy resin, a phenolic resin, a polyamides resin, a polyimides resin, an unsaturated polyesters resin, a poly phenylenethers resin, a polyphenylenesulfides resin, or benzocyclobutene (BCB) including the above-described light-blocking material, but is not limited thereto.

[0282] Subsequently, referring to FIG. 2B, a first light-transmitting layer HRL is formed on the light-blocking material layer BML, and the light-blocking material layer BML is etched to form a light-blocking portion BA and a light-transmitting portion TA. At this time, the first light-transmitting layer HRL can be used as a hard mask HM for etching the light-blocking material layer BML. That is, the first light-transmitting layer HRL can be formed at a position where the light-transmitting portion TA is defined. Figure 23 Figure 24 Subsequently, referring to FIG. 2B, a first light-transmitting layer HRL is formed on the light-blocking material layer BML, and the light-blocking material layer BML is etched to form a light-blocking portion BA and a light-transmitting portion TA. At this time, the first light-transmitting layer HRL can be used as a hard mask HM for etching the light-blocking material layer BML. That is, the first light-transmitting layer HRL can be formed at a position where the light-transmitting portion TA is defined.

[0283] For example, the step of forming the first light-transmitting layer HRL can be performed by plasma chemical vapor deposition (PECVD). The first light-transmitting layer HRL can be formed as an inorganic film including an inorganic material such as silicon nitride (SiN x ), silicon oxynitride (SiON), silicon oxide (SiO x ), titanium oxide (TiO x ), or aluminum oxide (AlO x ), but is not limited thereto, or as an organic film including inorganic particles.

[0284] Subsequently, referring to FIG. 2B, a first light-transmitting layer HRL is formed on the light-blocking material layer BML, and the light-blocking material layer BML is etched to form a light-blocking portion BA and a light-transmitting portion TA. At this time, the first light-transmitting layer HRL can be used as a hard mask HM for etching the light-blocking material layer BML. That is, the first light-transmitting layer HRL can be formed at a position where the light-transmitting portion TA is defined. Figure 25 ​A second light-transmissive layer LRL is formed on the first light-transmissive layer HRL. The second light-transmissive layer LRL can be formed so as to fill the light-transmissive portions TA of the optical pattern layer CML and cover the first light-transmissive layer HRL. The second light-transmissive layer LRL can completely fill the light-transmissive portions TA and contact the first substrate SUB1, but is not limited thereto. For example, an air layer can also be formed at least in part between the second light-transmissive layer LRL and the first substrate SUB1.

[0285] The upper surface of the second light-transmissive layer LRL can be substantially flat. That is, the second light-transmissive layer LRL can function as a planarization layer that compensates for the step difference of the constituent disposed in the lower portion. By this, light incident on the upper surface of the second light-transmissive layer LRL can uniformly travel toward the optical pattern layer CML.

[0286] For example, the step of forming the second light-transmissive layer LRL can be performed by inkjet printing or spin coating using a transparent organic material such as polyacrylates resin, epoxy resin, phenolic resin, polyamides resin, polyimides resin, unsaturated polyesters resin, poly phenylenethers resin, polyphenylenesulfides resin, or benzocyclobutene (BCB), but is not limited thereto.

[0287] Subsequently, a fingerprint sensor layer FPSL is formed in the lower portion of the first substrate SUB1 as shown in FIG. 1C, and a display panel is formed on the optical pattern layer CML, thereby completing the display device. At this time, as described above, the fingerprint sensor layer FPSL can be attached through a separate process after the optical pattern layer CML and the refractive pattern layer PTL are formed, but is not limited thereto. For example, the optical pattern layer CML and the refractive pattern layer PTL can also be formed directly on the fingerprint sensor layer FPSL. Figure 2

[0288] According to the manufacturing method of the display device of the present embodiment, since the first light-transmissive layer HRL including the high refractive index substance can be applied as a hard mask HM to etch the light-blocking substance layer BML, and a separate process of removing the hard mask HM is not required, the manufacturing process of the display device can be simplified. Accordingly, the manufacturing time and manufacturing cost of the display device including the refractive pattern layer PTL can be reduced.

[0289] ​Although the embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art with ordinary knowledge in the art will understand that the present invention can be implemented in other specific forms without changing the technical concept or essential features. Therefore, the embodiments described above should be understood in all aspects as illustrative rather than restrictive.

Claims

1. A display device comprising: a fingerprint sensor layer that receives light reflected from external objects; a substrate, arranged on the fingerprint sensor layer; an optical pattern layer, arranged on the substrate, and comprising a light-blocking portion and a light-transmitting portion penetrating the light-blocking portion in one direction; a light-emitting element layer, arranged on the optical pattern layer; a first lens layer disposed at one of between the optical pattern layer and the light emitting element layer and between the optical pattern layer and the substrate, and having a first refractive index; and a planarization layer, disposed on the first lens layer and having a second refractive index smaller than the first refractive index, Wherein, the first lens layer includes a first inclined surface.

2. The display device according to claim 1, wherein The first lens layer includes an upper surface and a lower surface parallel to the upper surface, The first inclined surface is located between the upper surface and the lower surface, and the angle formed by the first inclined surface and the lower surface is an acute angle.

3. The display device according to claim 2, wherein: The first lens layer is arranged on the upper portion of the optical pattern layer. The first inclined surface of the first lens layer overlaps with the light blocking portion along the one direction, Of the light reflected from the external object, the light incident on the first inclined surface of the first lens layer is refracted toward the light-transmitting portion.

4. The display device according to claim 2, wherein: The first lens layer is arranged below the optical pattern layer. The fingerprint sensor layer includes a plurality of light receiving elements. The first inclined surface of the first lens layer overlaps with the area between the plurality of light receiving elements along the one direction, Of the light that has passed through the light-transmitting portion, the light that has entered the first inclined surface is refracted toward at least one of the plurality of light-receiving elements.

5. The display device according to claim 4, further comprising: The second lens layer is arranged between the optical pattern layer and the light emitting element layer and includes a second inclined surface. The second inclined surface of the second lens layer overlaps with the light-blocking portion along the one direction. Of the light reflected from the external object, the light incident on the second inclined surface is refracted toward the light transmitting portion.

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