Radio frequency power supply control method for limiting reflection power and related equipment

Abstract

The invention belongs to the technical field of radio frequency power supply control, and discloses a radio frequency power supply control method for limiting reflection power and related equipment, and the method comprises the steps: introducing a dynamically set reflection power threshold value and a reflection adjustment characteristic value, and combining a real-time voltage standing wave ratio and a power control mode, carrying out the active and fine adjustment of the forward power of a radio frequency power supply, therefore, when the reflection power is increased, the radio frequency output is prevented from being directly cut off, the continuous protection of the radio frequency power supply is realized, and the continuity of the production process is ensured.

Description

Technical Field

[0001] This application relates to the field of radio frequency power control technology, and more specifically, to a radio frequency power control method and related equipment for limiting reflected power. Background Technology

[0002] Radio frequency (RF) power supply technology, as the core driving force of plasma processes, has been widely applied in high-precision industrial scenarios such as semiconductor manufacturing, thin film deposition, and reactive ion etching. A typical RF power supply system consists of an RF power supply and a plasma chamber, which excites and maintains the plasma state within the chamber by outputting RF energy. However, in actual operation, the dynamic impedance characteristics of the plasma chamber and the output impedance of the RF power supply are often mismatched. This impedance mismatch not only reduces energy transmission efficiency but also causes significant reflected power. Excessive reflected power can act in reverse on the power amplifier module of the RF power supply, potentially causing amplifier overheating, performance degradation, or even direct damage to core RF components, resulting in equipment downtime and high maintenance costs.

[0003] The current mainstream protection method is to directly cut off the radio frequency output, i.e., shut down the power, when the reflected power is detected to exceed a preset threshold. Although this can protect the hardware to some extent, it forces the process to be interrupted. In continuous production processes such as semiconductor coating and etching, such interruptions can lead to a series of problems such as wafer scrapping, chamber process state reset, and production line shutdown, which seriously restricts production efficiency and product consistency.

[0004] Furthermore, the tolerance threshold of the RF power supply to reflected power is not a fixed value, but is dynamically affected by chamber process parameters (such as gas type, pressure, and temperature) and operating stages (such as ignition, deposition, and cleaning). Existing technologies use fixed threshold cutoff mechanisms, which cannot adjust the protection strategy according to real-time operating conditions. This may lead to over-protection (resulting in unnecessary frequent shutdowns) or under-protection (resulting in equipment damage), both of which are detrimental to the stable operation of the equipment and the continuity of production.

[0005] To address the aforementioned issues, existing technologies urgently need improvement. Summary of the Invention

[0006] The purpose of this application is to provide a radio frequency power supply control method and related equipment for limiting reflected power. By dynamically adjusting the forward power of the radio frequency power supply, the reflected power is limited, thereby protecting the radio frequency power supply and avoiding process interruptions caused by excessive reflected power, thus improving the continuity and efficiency of production.

[0007] In a first aspect, this application provides a method for controlling radio frequency power supply to limit reflected power, used for controlling radio frequency power supply; the method includes the following steps: A1. Obtain the real-time reflected power, real-time forward power, and current power control mode of the RF power supply; A2. Based on the reflected power limit that the radio frequency power supply can withstand, set a reflected power threshold and a reflected adjustment characteristic value; the reflected adjustment characteristic value is less than the reflected power threshold; A3. Compare the real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process, and after initiating the suppression process, execute steps A4-A6; A4. Calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power; A5. Calculate the target forward power based on the voltage standing wave ratio, the reflection regulation characteristic value, and the power control mode; A6. Adjust the forward power of the radio frequency power supply to the target forward power.

[0008] Preferably, step A2 includes: A201. Obtain the process parameters related to the current load; A202. Based on the process parameters and the real-time forward power, determine the maximum reflected power that the RF power supply can withstand; A203. Determine the reflection power threshold based on the reflection power limit value and a safety factor; A204. Determine the reflection adjustment characteristic value based on the reflection power threshold and the preset proportional coefficient.

[0009] Preferably, before step A203, the method further includes the following step: A205. Obtain the current load's process stage and system operation priority objectives; the system operation priority objectives include prioritizing stable operation of RF power supply, prioritizing product manufacturing efficiency, or prioritizing product quality; A206. Determine the safety factor based on the process stage and the system operation priority objectives.

[0010] Preferably, step A3 includes: Compare the real-time reflection power with the reflection power threshold; If the duration for which the real-time reflected power exceeds the reflected power threshold reaches a preset time threshold, then the suppression process is initiated, and steps A4-A6 are executed.

[0011] Preferably, step A4 includes: The voltage standing wave ratio is calculated using the following formula: ; in, The voltage standing wave ratio (VSWR) is... The real-time forward power is [the power]. The real-time reflection power is denoted as .

[0012] Preferably, step A5 includes: If the power control mode is forward power control mode, the target forward power is calculated according to the following formula: ; If the power control mode is the load power control mode, the target forward power is calculated according to the following formula: ; in, The target forward power, The voltage standing wave ratio (VSWR) is... This refers to the reflection adjustment characteristic value.

[0013] Preferably, step A6 includes: A601. Obtain the real-time impedance of the current load; A602. Calculate the real-time impedance change rate based on the current load's real-time impedance; A603. Adjust the response speed or adjustment step size of the forward power regulation according to the real-time impedance change rate; A604. Adjust the forward power of the RF power supply to the target forward power according to the response speed or adjustment step size.

[0014] Secondly, this application provides a radio frequency power supply control device for limiting reflected power, used to control the radio frequency power supply; the device includes: The information acquisition module is used to acquire the real-time reflected power, real-time forward power, and current power control mode of the RF power supply. The threshold setting module is used to set a reflection power threshold and a reflection adjustment characteristic value according to the reflection power limit that the radio frequency power supply can withstand; the reflection adjustment characteristic value is less than the reflection power threshold. The suppression process initiation module is used to compare the real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process. The first calculation module is used to calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power after the suppression process is started. The second calculation module is used to calculate the target forward power based on the voltage standing wave ratio, the reflection regulation characteristic value, and the power control mode after the suppression process is initiated. An adjustment module is used to adjust the forward power of the radio frequency power supply to the target forward power after the suppression process is initiated.

[0015] Thirdly, this application provides an electronic device including a processor and a memory, the memory storing a computer program executable by the processor, wherein when the processor executes the computer program, it performs the steps of the radio frequency power control method for limiting reflected power as described above.

[0016] Fourthly, this application provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, performs the steps of the radio frequency power supply control method for limiting reflected power as described above.

[0017] Beneficial effects: The radio frequency power supply control method and related equipment for limiting reflected power provided in this application introduce dynamically set reflected power threshold and reflected regulation characteristic value, and combine real-time voltage standing wave ratio and power control mode to actively and finely regulate the forward power of radio frequency power supply. This avoids directly cutting off radio frequency output when reflected power increases, thereby achieving continuous protection of radio frequency power supply and ensuring the continuity of production process. Attached Figure Description

[0018] Figure 1 A flowchart of a radio frequency power supply control method for limiting reflected power provided in an embodiment of this application.

[0019] Figure 2 This is a schematic diagram of the structure of the radio frequency power supply control device for limiting reflected power provided in an embodiment of this application.

[0020] Figure 3 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application.

[0021] Labeling Explanation: 1. Information Acquisition Module; 2. Threshold Setting Module; 3. Suppression Process Start-up Module; 4. First Calculation Module; 5. Second Calculation Module; 6. Adjustment Module; 301. Processor; 302. Memory; 303. Communication Bus. Detailed Implementation

[0022] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0023] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. Furthermore, in the description of this application, terms such as "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0024] Please refer to Figure 1 This application discloses a radio frequency power supply control method for limiting reflected power in some embodiments, used to control the radio frequency power supply; the method includes the following steps: A1. Obtain the real-time reflected power, real-time forward power, and current power control mode of the RF power supply; A2. Based on the maximum reflected power that the RF power supply can withstand, set the reflected power threshold and the reflected adjustment characteristic value; the reflected adjustment characteristic value should be less than the reflected power threshold. A3. Compare the real-time reflected power with the reflected power threshold to determine whether to initiate the suppression process, and after initiating the suppression process, execute steps A4-A6; A4. Calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power; A5. Calculate the target's forward power based on the voltage standing wave ratio, reflection regulation characteristic value, and power control mode; A6. Adjust the forward power of the RF power supply to the target forward power.

[0025] The reflected power limit refers to the maximum reflected power value that an RF power supply can continuously withstand without damage or significant performance degradation. It can be determined based on the hardware design parameters, component tolerance, or manufacturer specifications of the RF power supply, such as by consulting the equipment specification sheet or conducting reliability tests. It is mainly used to define the safe operating boundary of the RF power supply.

[0026] Among them, the reflected power threshold refers to the preset reflected power value used to trigger the reflected power suppression process. It can be set according to the product or proportional relationship between the reflected power limit value and the safety factor. For example, it can be set through the system configuration interface or dynamically calculated by the algorithm. The main purpose is to activate the protection mechanism in time when the reflected power reaches a level that may affect the safety of the equipment.

[0027] Among them, the reflection regulation characteristic value refers to a reference value used to guide the degree of forward power regulation during the reflection power suppression process. It can be determined based on the product of the reflection power threshold and the preset proportional coefficient or a fixed difference, such as through system parameter configuration or algorithm dynamic adjustment. The main purpose is to ensure that the regulated reflection power is within a safe range and to maintain the continuity of the process.

[0028] Among them, the power control mode refers to the output power control strategy currently adopted by the RF power supply. It can include forward power control mode or load power control mode, etc., which can be switched by the user or automatically by the system. The main purpose is to keep the calculation of the target forward power consistent with the control logic of the current process.

[0029] Voltage standing wave ratio (VSWR) is the ratio of the maximum voltage to the minimum voltage in an RF transmission line. It is used to measure the impedance matching between the RF power supply and the load. It can be calculated based on real-time forward power and real-time forward power using a specific formula, such as by acquiring data and calculating it through an RF power meter or vector network analyzer. Its main purpose is to quantify the current impedance mismatch and provide a basis for power regulation.

[0030] The core innovation of this application lies in the active and precise adjustment of the forward power of the RF power supply by introducing dynamically set reflection power threshold and reflection regulation characteristic value, combined with real-time voltage standing wave ratio and power control mode. This avoids directly cutting off the RF output when the reflection power increases, thus achieving continuous protection of the RF power supply and ensuring the continuity of the production process.

[0031] Specifically, this solution first acquires the real-time reflected power, real-time forward power, and current power control mode of the RF power supply. This data forms the basis for the system's judgment and adjustment. Simultaneously, the system dynamically sets a reflected power threshold and a reflection regulation characteristic value based on the reflected power limit that the RF power supply can withstand. The reflection regulation characteristic value is set to be less than the reflected power threshold, thus establishing a tiered protection strategy. Subsequently, the system continuously compares the real-time reflected power with the reflected power threshold. Once the real-time reflected power reaches or exceeds the threshold and meets the activation conditions, a suppression process is initiated. After the suppression process is initiated, the system calculates the voltage standing wave ratio (VSWR) based on the current real-time reflected power and real-time forward power. This ratio accurately reflects the impedance mismatch between the RF power supply and the load. Then, the system comprehensively considers the calculated VSWR, the preset reflection regulation characteristic value, and the current power control mode to accurately calculate the target forward power of the RF power supply. Ultimately, the system adjusts the forward power of the RF power supply to the target forward power. Through this active and precise power adjustment, the reflected power is effectively reduced, thereby protecting the RF power supply while maintaining the continuity of RF output and avoiding the process interruption caused by directly cutting off the power supply in traditional solutions.

[0032] Through the above solution, this application effectively solves the problem of potential damage to the RF power supply in high-reflection power environments, avoiding process interruptions caused by directly cutting off the power supply in traditional protection mechanisms. This solution achieves continuous protection of the RF power supply through dynamic settings and active adjustments, while ensuring the continuity of the production process, thus achieving a balance between equipment safety and production efficiency.

[0033] In some implementations, step A2 includes: A201. Obtain the process parameters related to the current load; A202. Determine the maximum reflected power that the RF power supply can withstand based on process parameters and real-time forward power; A203. Determine the reflection power threshold based on the reflection power limit and a safety factor; A204. Determine the reflection adjustment characteristic value based on the reflection power threshold and the preset proportional coefficient.

[0034] Among them, process parameters refer to various physical quantities that affect the load characteristics of the RF power supply and the plasma state, such as the type of gas, pressure, temperature, chamber volume, electrode spacing or plasma density in the plasma chamber, which can be collected in real time by sensors, read from the equipment controller or obtained through preset configuration.

[0035] The safety factor refers to a multiplier or subtractor used to provide additional protection margin based on the reflected power limit. It can be a preset fixed value or dynamically adjusted according to the process stage, system operation target or equipment health status.

[0036] The proportional coefficient is a factor used to convert the reflection power threshold into a reflection regulation characteristic value. It can be a preset fixed value or it can be configured according to process requirements, regulation response speed requirements or system stability objectives.

[0037] This solution addresses the problems associated with fixed threshold settings by introducing a dynamic parameter acquisition and calculation mechanism to adaptively set the reflected power threshold and reflection regulation characteristic value of the RF power supply. First, the system acquires process parameters related to the current load, reflecting the real-time operating conditions of the plasma chamber and providing fundamental information for subsequent dynamic evaluation. Then, combining these real-time process parameters with the real-time forward power acquired from the power supply, the system can accurately determine the maximum reflected power limit that the RF power supply can safely withstand under the current complex operating conditions. This limit is no longer static but dynamically changes according to actual operating conditions, thus more accurately reflecting the power supply's true tolerance capability. Based on this dynamic limit, a safety factor is introduced to calculate the reflected power threshold. This threshold serves as the basis for initiating the suppression process, ensuring that protection measures are activated before the reflected power reaches the power supply's absolute limit, providing a necessary safety buffer for the power supply. Furthermore, based on this dynamically determined reflected power threshold and a preset proportional coefficient, the reflection regulation characteristic value is calculated. This regulation characteristic value directly affects the adjustment range of the forward power during subsequent suppression, and its dynamic nature ensures that the power adjustment response matches the current protection requirements and process status.

[0038] Through the above steps, this scheme transforms the setting of the reflection power threshold and reflection adjustment characteristic value from static fixed to dynamic adaptive. This, combined with the steps in the basic scheme of obtaining real-time forward power and calculating the target forward power based on the adjustment characteristic value, enables the entire reflection power limiting control method to intelligently adjust according to real-time operating conditions. When the real-time reflection power approaches or exceeds the dynamic threshold, the system can adjust the forward power in a more reasonable and smoother manner based on the dynamically calculated adjustment characteristic value, avoiding excessive suppression or insufficient protection caused by a fixed strategy. This effectively protects the RF power supply while maximizing the continuity and stability of the plasma process.

[0039] In one specific embodiment, the RF power supply control method for limiting reflected power can be implemented as follows: In the step of acquiring process parameters related to the current load, the system can obtain real-time readings from a gas flow meter via a sensor array connected to the plasma chamber to determine the gas type, acquire chamber pressure via a pressure sensor, and acquire chamber temperature via a thermocouple. In the step of determining the reflected power limit that the RF power supply can withstand based on process parameters and real-time forward power, a multi-dimensional lookup table can be pre-stored. This lookup table maps the corresponding reflected power limit that the RF power supply can withstand based on different gas types, pressures, temperatures, and real-time forward power. For example, when a specific gas, high pressure, and high forward power are detected, the lookup table can return a relatively low reflected power limit to reflect the power supply's tolerance under heavy load. In the step of determining the reflected power threshold based on the reflected power limit and a safety factor, the controller multiplies the reflected power limit obtained from the lookup table by a preset safety factor, such as 0.8 or 0.9, to obtain the current reflected power threshold. This safety factor can be configured according to the needs of the actual application scenario to provide different protection margins. In the step of determining the reflection regulation characteristic value based on the reflected power threshold and a preset proportionality coefficient, the calculated reflected power threshold is multiplied by a preset proportionality coefficient, such as 0.5 or 0.6, to determine the reflection regulation characteristic value. This proportionality coefficient can be adjusted according to the desired power regulation response speed and stability requirements. In this way, the protection parameters of the RF power supply can be dynamically adjusted according to real-time process conditions and power load, ensuring the adaptability and effectiveness of the protection strategy.

[0040] This solution dynamically acquires load-related process parameters and real-time forward power, and based on this, determines the maximum reflected power limit that the RF power supply can withstand. It then dynamically sets the reflected power threshold and reflection regulation characteristic values. This allows the RF power supply's protection strategy to adapt to constantly changing process conditions and power loads in real time, avoiding overly conservative protection strategies that might result from fixed thresholds. This reduces unnecessary suppression process triggering, ensuring production continuity. Simultaneously, it avoids insufficient protection, effectively protecting the RF power supply from damage caused by excessive reflected power, extending equipment lifespan, and improving process stability.

[0041] In some preferred embodiments, before step A203, the following step is also included: A205. Obtain the current process stage and system operation priority objectives for the current load; system operation priority objectives include prioritizing stable operation of RF power supply, prioritizing product manufacturing efficiency, or prioritizing product quality; A206. Determine the safety factor based on the process stage and system operation priority objectives.

[0042] "Process stage" refers to the specific operating state of the RF power supply during a particular production process, such as plasma ignition, stabilization deposition, etching, or cleaning. The impedance characteristics of the load, its sensitivity to reflected power, and its tolerance to process interruptions all differ at different process stages. Obtaining process stage information provides crucial contextual information for subsequent dynamic adjustments.

[0043] Among these, the system operation priority objectives refer to the core objectives emphasized in the current production task within the RF power supply control strategy. These can include "RF power supply stable operation priority," prioritizing the maximum protection of the RF power supply hardware; "product preparation efficiency priority," aiming to minimize process interruptions and increase production speed; or "product quality priority," focusing on ensuring the final product meets quality standards. These priority objectives reflect the immediate needs of the production line and are key factors guiding the dynamic adjustment of the safety factor.

[0044] The determination of the safety factor refers to calculating or selecting a suitable value based on the acquired process stage and system operation priorities to adjust the reflected power limit value, thereby obtaining the final reflected power threshold. This safety factor is no longer fixed but can be intelligently adjusted according to actual operating conditions and production needs, making the setting of the reflected power threshold more flexible and intelligent.

[0045] This application introduces a dynamic sensing and intelligent adjustment mechanism for RF power supply control strategies, effectively addressing the problem in existing technologies where fixed safety factors cannot optimally balance equipment protection and process continuity requirements. Specifically, before determining the reflected power threshold, the system first acquires the current process stage of the load and the current system operation priorities. The process stage provides real-time contextual information about load impedance characteristics and process sensitivity; for example, impedance changes drastically during plasma ignition, while it remains relatively stable during stable deposition. Simultaneously, the system operation priorities clarify whether current production focuses on equipment protection, production efficiency, or product quality. It is precisely because of this multi-dimensional real-time information that the subsequent safety factor determination process possesses a dynamic and intelligent foundation. Based on this, the system dynamically determines an appropriate safety factor according to the acquired process stage and system operation priorities. For example, when in the plasma ignition stage and the system operation priority is stable RF power supply operation, a relatively high safety factor can be determined to ensure adequate protection of the equipment under drastic impedance changes. Conversely, if the system is in a stable deposition phase and the primary objective is product fabrication efficiency, a relatively low safety factor can be determined, allowing for higher reflected power and avoiding unnecessary power adjustments or process interruptions to improve production efficiency. Therefore, combining this dynamically determined safety factor with the reflected power limit that the RF power supply can withstand allows for a more precise and adaptive reflected power threshold. This threshold better balances equipment protection with process continuity, efficiency, and quality. This dynamic adjustment mechanism enables the RF power supply's protection strategy to be deeply integrated into specific processes and production goals, thus avoiding the risks of efficiency reduction due to over-protection or equipment damage due to insufficient protection, achieving a balance between equipment safety and process optimization.

[0046] As a preferred implementation, the limitation of reflected power can be achieved in practical applications as follows: Before determining the reflected power threshold, the system can first obtain the current process stage and system operation priority targets through various methods. For example, the process stage can be obtained by communicating with the control system of the plasma chamber, which can output the identifier of the currently executed process step, such as "ignition," "etching," "deposition," and "cleaning." The system operation priority targets can be selected and input by the operator on the human-machine interface, or automatically loaded according to preset production plans and batch information. For example, when producing high-value products, the system can automatically set the priority target to "product quality priority," while in batch production, it can be set to "product preparation efficiency priority." Furthermore, after obtaining the process stage and system operation priority targets, a preset lookup table or rule-based logic can be used to determine the safety factor. For example, a two-dimensional lookup table can be constructed, where rows represent different process stages (such as ignition, deposition, etching, and cleaning), and columns represent different system operation priority targets (such as RF power supply stable operation priority, product preparation efficiency priority, and product quality priority). Each cell in the table stores a corresponding safety factor value. When the system obtains the current process stage and system operation priority, it can query the table to obtain the corresponding safety factor. For example, if the current stage is "ignition" and the system operation priority is "RF power supply stable operation priority," a higher safety factor, such as 1.5, can be found. If the current stage is "stable deposition" and the system operation priority is "product preparation efficiency priority," a lower safety factor, such as 1.1, can be found. This dynamically determined safety factor is then applied to the reflected power limit value determined based on process parameters and real-time forward power to calculate the final reflected power threshold. For example, if the reflected power limit is 100W, in the "ignition" stage with "RF power supply stable operation priority," the safety factor is 1.5, and the reflected power threshold can be set to 100W divided by 1.5, approximately equal to 66.7W. In the "stable deposition" stage with "product preparation efficiency priority," the safety factor is 1.1, and the reflected power threshold can be set to 100W divided by 1.1, approximately equal to 90.9W. In this way, the reflection power threshold can be intelligently adjusted according to actual operating conditions and production needs, thereby achieving refined protection of the RF power supply and optimized control of the process.

[0047] By acquiring the current load's process stage and system operation priorities, and dynamically determining the safety factor accordingly, this application enables more flexible and intelligent setting of the reflection power threshold. This overcomes the shortcomings of traditional fixed safety factors that cannot adapt to complex and changing operating conditions. Therefore, while ensuring the safety of RF power supply equipment, it can more accurately balance the relationship between equipment protection and process continuity, product manufacturing efficiency, or product quality. This effectively avoids process interruptions and efficiency reductions due to over-protection, or equipment damage risks caused by insufficient protection, thereby improving the adaptability and reliability of RF power supply control.

[0048] In some implementations, step A3 includes: Compare real-time reflected power with the reflected power threshold; If the duration for which the real-time reflected power exceeds the reflected power threshold reaches a preset time threshold, the suppression process is initiated, and steps A4-A6 are executed.

[0049] The preset time threshold refers to the shortest time required for the real-time reflected power to continuously exceed the reflected power threshold before the reflected power suppression process is started. It can be implemented by using a fixed value determined during system design based on power supply characteristics, process stability requirements, and historical data analysis, or by using a variable that is dynamically adjusted based on the current process stage, load type, or system operating status.

[0050] This application addresses the oversensitivity and frequent adjustments inherent in traditional methods by introducing a time dimension to optimize the initiation conditions of the suppression process, thereby improving the stability of RF power supply control and the continuity of the process. Specifically, in the RF power supply control method, the real-time reflected power and the reflected power threshold are continuously compared. This initial identification of potential risks ensures the system continuously monitors whether the reflected power exceeds the safe range. Crucially, this application no longer relies solely on whether the reflected power instantaneously exceeds the threshold; instead, it requires that the reflected power exceeding the threshold persist for a preset time. Only when the duration of the real-time reflected power exceeding the reflected power threshold reaches the preset time threshold is a genuine risk considered to exist, requiring suppression through forward power adjustment. This duration-based judgment mechanism allows the system to effectively distinguish between transient, harmless reflected power fluctuations and continuous, intervention-required impedance mismatches. Only when this condition is met will the system initiate the subsequent suppression process, namely, calculating the voltage standing wave ratio (VSWR), calculating the target forward power, and adjusting the RF power supply forward power to the target forward power. This delayed-start strategy avoids frequent power regulation triggers due to short-term fluctuations, thus significantly improving the stability of the RF power supply output, reducing unnecessary system disturbances, ensuring process continuity and product quality stability, while still effectively protecting the RF power supply from continuous high reflected power. In this way, this solution is closely integrated with subsequent power regulation steps, forming a more intelligent and robust reflected power suppression mechanism, ensuring intervention only when necessary, thereby optimizing the overall control effect.

[0051] In some implementations, step A4 includes: Calculate the voltage standing wave ratio using the following formula: ; in, Voltage standing wave ratio (VSWR) For real-time forward power, This represents the real-time reflected power.

[0052] In some implementations, step A5 includes: If the power control mode is forward power control mode, the target forward power is calculated according to the following formula: ; If the power control mode is load power control mode, the target forward power is calculated according to the following formula: ; in, For the target forward power, Voltage standing wave ratio (VSWR) This is the characteristic value for reflection regulation.

[0053] Among them, forward power control mode refers to the operating state of the RF power supply with its output forward power as the primary control target. Load power control mode refers to the operating state of the RF power supply with the actual power coupled to the load as the primary control target.

[0054] This solution addresses the challenge of accurately and effectively suppressing reflected power under different control objectives by providing calculation formulas for target forward power under various power control modes. This ensures equipment safety while maintaining process continuity and stability. Specifically, after initiating the suppression process, the system first acquires the current power control mode. When the forward power control mode is identified, the system uses the first calculation formula to determine the target forward power. This formula incorporates the voltage standing wave ratio (VSWR), allowing the calculation of the target forward power to directly respond to the degree of impedance mismatch. This enables direct and rapid suppression of reflected power when controlling forward power is the primary objective, preventing damage to the power supply due to excessive reflection. When the power control mode is identified as load power control mode, the system uses the second calculation formula to determine the target forward power. This formula also considers the VSWR, but its mathematical relationship aims to ensure that even with reflection, the desired load power can be maintained or adjusted as much as possible. In load power control mode, simply reducing the forward power may result in insufficient load power, affecting process performance. Therefore, through this specific formula, the system can calculate a target forward power that can effectively suppress reflections while also taking into account the load power requirements, thereby protecting the equipment while maximizing the stable operation of the process and product quality.

[0055] This ability to dynamically adjust based on actual control objectives makes the RF power supply's reflection power suppression strategy more adaptable and precise, effectively solving the problem that a single calculation method cannot simultaneously address the suppression effect and process requirements under different power control modes. In this way, this solution, along with steps such as acquiring real-time reflection power, real-time forward power, and power control mode; setting reflection power thresholds and reflection adjustment characteristic values; comparing real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process; and calculating the voltage standing wave ratio, collectively constitutes a complete and optimized reflection power limiting method. This ensures the reliable operation of the RF power supply and the continuity of the process in complex and ever-changing industrial applications.

[0056] In some preferred embodiments, step A6 includes: A601. Obtain the real-time impedance of the current load; A602. Calculate the real-time impedance change rate based on the current load's real-time impedance; A603. Adjust the response speed or adjustment step size of the forward power regulation according to the real-time impedance change rate; A604. Adjust the forward power of the RF power supply to the target forward power according to the response speed or adjustment step size.

[0057] Real-time impedance refers to the complex impedance value presented by the load connected to the RF power supply at the current moment. It can be obtained in real time by setting voltage and current sensors at the output of the RF power supply or at the matching network, combined with impedance calculation circuits or algorithms.

[0058] The real-time impedance change rate refers to how fast the real-time impedance changes over time. It can be calculated by performing differential operations, moving averages, or curve fitting on continuously acquired real-time impedance data.

[0059] Among them, response speed refers to how quickly the forward power of the RF power supply reaches the target value after receiving the adjustment command, while the adjustment step size refers to the magnitude of the forward power change in each power adjustment operation. They can be achieved by adjusting the gain parameters, integral time, derivative time or preset power increment / decrement values ​​of the control algorithm.

[0060] The adaptive forward power regulation strategy proposed in this application operates on the principle of real-time sensing and intelligent response to the dynamic characteristics of load impedance. This strategy first acquires the real-time impedance of the current load, providing fundamental data for subsequent dynamic regulation. Real-time impedance is a key parameter reflecting the state of the plasma chamber, and its changes directly affect the coupling efficiency of RF energy and the level of reflected power. Based on the real-time impedance data, the system further calculates the real-time impedance change rate, which quantifies the severity and trend of load impedance changes. For example, a rapid impedance change rate may indicate a drastic transition in plasma ignition, extinction, or process stages, while a slow impedance change rate may indicate a relatively stable process state. Based on this deep understanding of the dynamic characteristics of load impedance, the system can intelligently adjust the response speed or adjustment step size of forward power regulation according to the real-time impedance change rate. When the impedance change rate is fast, the system can appropriately increase the response speed or increase the adjustment step size to ensure that the forward power can keep up with the load changes in a timely manner, quickly reaching the target forward power, thereby effectively suppressing reflected power and avoiding risks caused by regulation lag. Conversely, when the impedance change rate is slow, the system can appropriately reduce the response speed or decrease the adjustment step size to achieve smoother and finer power regulation, avoiding power overshoot or oscillation, thereby improving the stability and accuracy of regulation and better maintaining the plasma state. Finally, after determining the optimized response speed or adjustment step size, the system adjusts the forward power of the RF power supply to the pre-calculated target forward power according to these dynamically adjusted parameters. This adaptive regulation strategy allows the power regulation process to better match actual operating conditions, avoiding the limitations of fixed adjustment parameters.

[0061] In this way, the RF power supply can operate more intelligently and robustly, effectively reducing equipment risks and process interruptions caused by impedance mismatch. This solution is closely integrated with other steps in the RF power supply control method for limiting reflected power. After determining that the suppression process needs to be initiated and calculating the target forward power, this solution no longer simply adjusts the forward power in a fixed manner, but introduces a sensing and response mechanism for dynamic changes in load impedance. By acquiring the load impedance in real time and calculating its rate of change, the system can dynamically optimize the execution parameters of power adjustment, making the forward power adjustment process smoother, more efficient, and more accurate. This not only ensures that the RF power supply can continuously and effectively adjust the forward power to the target value to suppress reflected power when facing complex and variable plasma loads, but more importantly, it significantly improves the robustness and adaptability of the entire control method, avoiding process interruptions or equipment damage caused by improper adjustment, thereby protecting the RF power supply while maintaining process continuity and production efficiency.

[0062] In one specific embodiment, the RF power supply control system may include an impedance measurement module, a data processing unit, and a power regulation actuator. The impedance measurement module can be integrated into the output of the RF power supply or in the matching network, for example, by using a directional coupler and an RF voltage / current probe to acquire the voltage and current waveforms of the RF signal in real time and convert these analog signals into digital signals. The data processing unit can be a high-performance digital signal processor or microcontroller that receives the digital signals from the impedance measurement module. The data processing unit can periodically calculate the real-time impedance of the current load, which can be achieved by performing a Fourier transform on the acquired voltage and current data or by directly calculating the complex impedance. Subsequently, the data processing unit can calculate the real-time impedance change rate based on the continuous real-time impedance values. For example, the first-order difference method or the moving average method can be used to estimate the instantaneous rate of change of impedance. Based on the calculated real-time impedance change rate, the data processing unit can dynamically adjust the response speed or adjustment step size of the forward power regulation. This can be achieved by pre-setting a lookup table or using a fuzzy logic controller. For example, when the impedance change rate exceeds a certain preset threshold, the system can select a larger adjustment step size and a faster response speed parameter from a lookup table; conversely, when the impedance change rate is below another threshold, a smaller adjustment step size and a slower response speed parameter are selected. These parameters can be mapped to control commands on the power regulation actuator. The power regulation actuator can be a digitally controlled attenuator or a programmable power amplifier gain controller. The data processing unit sends the adjusted response speed or adjustment step size parameters to the power regulation actuator, which then precisely adjusts the forward power of the RF power supply to the target forward power based on these parameters. For instance, if the adjustment step size is set to a larger value, the power regulation actuator can change the forward power output by a larger margin in each adjustment cycle; if the response speed is set to a faster value, the gain of the control loop can be increased to converge to the target power more quickly. In this way, the entire system can flexibly adjust the power output according to the dynamic characteristics of the load impedance, ensuring stable and efficient power transmission under different operating conditions.

[0063] This solution effectively addresses the problem of suboptimal regulation caused by fixed power regulation parameters in existing technologies by introducing a sensing and adaptive adjustment mechanism for dynamic changes in load impedance. By acquiring the load impedance in real time and calculating its rate of change, the system can dynamically adjust the response speed or adjustment step size of the forward power regulation according to actual operating conditions. When the load impedance changes drastically, the response speed can be increased or the adjustment step size can be enlarged to ensure that the power can keep up with the load change in a timely manner, quickly suppress reflected power, and avoid risks caused by regulation lag. When the load impedance changes gradually, the response speed can be reduced or the adjustment step size can be decreased, thereby achieving smoother and more precise power regulation, avoiding power overshoot or system oscillation, and improving the stability and accuracy of regulation. Therefore, this solution can achieve a smoother, more efficient, and robust power regulation process, better protect the RF power supply, and maintain the continuity and production efficiency of the plasma process.

[0064] refer to Figure 2 This application provides a radio frequency power supply control device for limiting reflected power, used to control the radio frequency power supply; the device includes: Information acquisition module 1 is used to acquire the real-time reflected power, real-time forward power and current power control mode of the RF power supply (for details, please refer to step A1 above). Threshold setting module 2 is used to set the reflection power threshold and reflection adjustment characteristic value according to the reflection power limit that the RF power supply can withstand; the reflection adjustment characteristic value is less than the reflection power threshold (for details, please refer to step A2 above). The suppression process initiation module 3 is used to compare the real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process (for details, please refer to step A3 above). The first calculation module 4 is used to calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power after the suppression process is started (for details, please refer to step A4 above). The second calculation module 5 is used to calculate the target forward power based on the voltage standing wave ratio, reflection regulation characteristic value and power control mode after the suppression process is started (the specific process can be referred to step A5 above). The adjustment module 6 is used to adjust the forward power of the RF power supply to the target forward power after the suppression process is started (the specific process can be referred to step A6 above).

[0065] Please refer to Figure 3This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application. The electronic device includes a processor 301 and a memory 302. The processor 301 and the memory 302 are interconnected and communicate with each other via a communication bus 303 and / or other forms of connection mechanisms (not shown). The memory 302 stores a computer program executable by the processor 301. When the electronic device is running, the processor 301 executes the computer program to perform the radio frequency power supply control method for limiting reflected power in any optional implementation of the above embodiments, to achieve the following function: A1. Obtaining the real-time reflected power of the radio frequency power supply. A1. Real-time forward power and current power control mode; A2. Set the reflection power threshold and reflection adjustment characteristic value according to the reflection power limit that the RF power supply can withstand; the reflection adjustment characteristic value is less than the reflection power threshold; A3. Compare the real-time reflection power and the reflection power threshold to determine whether to start the suppression process, and after starting the suppression process, execute steps A4-A6; A4. Calculate the voltage standing wave ratio (VSWR) based on the real-time reflection power and real-time forward power; A5. Calculate the target forward power based on the voltage standing wave ratio, reflection adjustment characteristic value, and power control mode; A6. Adjust the forward power of the RF power supply to the target forward power.

[0066] This application provides a computer-readable storage medium storing a computer program. When the computer program is executed by a processor, it performs the radio frequency power supply control method for limiting reflected power in any optional implementation of the above embodiments to achieve the following functions: A1. Obtain the real-time reflected power, real-time forward power, and current power control mode of the radio frequency power supply; A2. Set a reflected power threshold and a reflection adjustment characteristic value according to the reflected power limit that the radio frequency power supply can withstand; the reflection adjustment characteristic value is less than the reflected power threshold; A3. Compare the real-time reflected power and the reflected power threshold to determine whether to start the suppression process, and after starting the suppression process, execute steps A4-A6; A4. Calculate the voltage standing wave ratio (VSWR) based on the real-time reflected power and real-time forward power; A5. Calculate the target forward power based on the VSWR, the reflection adjustment characteristic value, and the power control mode; A6. Adjust the forward power of the radio frequency power supply to the target forward power. The computer-readable storage medium can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as Static Random Access Memory (SRAM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Erasable Programmable Read Only Memory (EPROM), Programmable Red-Only Memory (PROM), Read-Only Memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk.

[0067] In the embodiments provided in this application, it should be understood that the disclosed apparatus and methods can be implemented in other ways. The apparatus embodiments described above are merely illustrative. For example, the division of units is only a logical functional division, and in actual implementation, there may be other division methods. Furthermore, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Additionally, the displayed or discussed mutual couplings, direct couplings, or communication connections may be through some communication interfaces; indirect couplings or communication connections between devices or units may be electrical, mechanical, or other forms.

[0068] Furthermore, the units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment, depending on actual needs.

[0069] Furthermore, the functional modules in the various embodiments of this application can be integrated together to form an independent part, or each module can exist independently, or two or more modules can be integrated to form an independent part.

[0070] In this document, relational terms such as first and second are used only to distinguish one entity or operation from another entity or operation, without necessarily requiring or implying any such actual relationship or order between these entities or operations.

[0071] The above description is merely an embodiment of this application and is not intended to limit the scope of protection of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of protection of this application.

Claims

1. A method for controlling radio frequency power supply to limit reflected power, used to control radio frequency power supply; characterized in that, The method includes the following steps: A1. Obtain the real-time reflected power, real-time forward power, and current power control mode of the RF power supply; A2. Based on the reflected power limit that the radio frequency power supply can withstand, set the reflected power threshold and the reflected adjustment characteristic value; The reflection modulation characteristic value is less than the reflection power threshold; A3. Compare the real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process, and after initiating the suppression process, execute steps A4-A6; A4. Calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power; A5. Calculate the target forward power based on the voltage standing wave ratio, the reflection regulation characteristic value, and the power control mode; A6. Adjust the forward power of the radio frequency power supply to the target forward power.

2. The radio frequency power supply control method for limiting reflected power according to claim 1, characterized in that, Step A2 includes: A201. Obtain the process parameters related to the current load; A202. Based on the process parameters and the real-time forward power, determine the maximum reflected power that the RF power supply can withstand; A203. Determine the reflection power threshold based on the reflection power limit value and a safety factor; A204. Determine the reflection adjustment characteristic value based on the reflection power threshold and the preset proportional coefficient.

3. The radio frequency power supply control method for limiting reflected power according to claim 2, characterized in that, Before step A203, the following steps are also included: A205. Obtain the current load's process stage and system operation priority objectives; the system operation priority objectives include prioritizing stable operation of RF power supply, prioritizing product manufacturing efficiency, or prioritizing product quality; A206. Determine the safety factor based on the process stage and the system operation priority objectives.

4. The radio frequency power supply control method for limiting reflected power according to claim 1, characterized in that, Step A3 includes: Compare the real-time reflection power with the reflection power threshold; If the duration for which the real-time reflected power exceeds the reflected power threshold reaches a preset time threshold, then the suppression process is initiated, and steps A4-A6 are executed.

5. The radio frequency power supply control method for limiting reflected power according to claim 1, characterized in that, Step A4 includes: The voltage standing wave ratio is calculated using the following formula: ； in, The voltage standing wave ratio (VSWR) is... The real-time forward power is [the power]. The real-time reflection power is denoted as .

6. The radio frequency power supply control method for limiting reflected power according to claim 1, characterized in that, Step A5 includes: If the power control mode is forward power control mode, the target forward power is calculated according to the following formula: ； If the power control mode is the load power control mode, the target forward power is calculated according to the following formula: ； in, The target forward power, The voltage standing wave ratio (VSWR) is... This refers to the reflection adjustment characteristic value.

7. The radio frequency power supply control method for limiting reflected power according to claim 1, characterized in that, Step A6 includes: A601. Obtain the real-time impedance of the current load; A602. Calculate the real-time impedance change rate based on the current load's real-time impedance; A603. Adjust the response speed or adjustment step size of the forward power regulation according to the real-time impedance change rate; A604. Adjust the forward power of the RF power supply to the target forward power according to the response speed or adjustment step size.

8. A radio frequency power supply control device for limiting reflected power, used to control the radio frequency power supply; characterized in that, The device includes: The information acquisition module is used to acquire the real-time reflected power, real-time forward power, and current power control mode of the RF power supply. The threshold setting module is used to set a reflection power threshold and a reflection adjustment characteristic value according to the reflection power limit that the radio frequency power supply can withstand; the reflection adjustment characteristic value is less than the reflection power threshold. The suppression process initiation module is used to compare the real-time reflection power with the reflection power threshold to determine whether to initiate the suppression process. The first calculation module is used to calculate the voltage standing wave ratio based on the real-time reflected power and the real-time forward power after the suppression process is started. The second calculation module is used to calculate the target forward power based on the voltage standing wave ratio, the reflection regulation characteristic value, and the power control mode after the suppression process is initiated. An adjustment module is used to adjust the forward power of the radio frequency power supply to the target forward power after the suppression process is initiated.

9. An electronic device, characterized in that, It includes a processor and a memory, the memory storing a computer program executable by the processor, wherein when the processor executes the computer program, it performs the steps of the radio frequency power supply control method for limiting reflected power as described in any one of claims 1-7.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it performs the steps of the radio frequency power supply control method for limiting reflected power as described in any one of claims 1-7.

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