A multi-mode optical imaging fusion defect-enhanced detection system and detection method

By using a multi-mode optical imaging fusion system, utilizing red and yellow-green light modes of optical imaging technology, combined with a telecentric optical path and a two-dimensional displacement platform, the problem of efficient identification of pinholes and scratches on semiconductor masks was solved, achieving high-precision and efficient defect detection.

CN121027145BActive Publication Date: 2026-06-12SUZHOU CHLOROMAN TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SUZHOU CHLOROMAN TECHNOLOGY CO LTD
Filing Date
2025-09-05
Publication Date
2026-06-12

AI Technical Summary

⚠Technical Problem

Existing technologies struggle to simultaneously and efficiently identify submicron-level pinholes and scratches on semiconductor masks, and the defect feature fusion algorithm lacks robustness, resulting in a high false positive rate and failing to meet the requirements for high-resolution and high-accuracy detection.

⚗Method used

A multi-mode optical imaging fusion system is adopted, including a high-angle red light mode and a low-angle yellow-green light mode. By switching the polarization state of the bandpass filter and the analyzer in a time-division manner, combined with the telecentric optical path and a two-dimensional displacement platform, the physical distinction and algorithmic recognition of pinholes and scratches can be achieved.

🎯Benefits of technology

It improves the detection resolution and accuracy of pinholes and scratches, meets the high-precision inspection requirements of semiconductor photomasks in the high-end intelligent field, and achieves high-contrast image output and efficient defect identification.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a kind of multi-mode optical imaging fusion's defect enhancement detection system and detection method, comprising: high-angle red light mode emission light path, low-angle yellow-green light mode emission light path, detection mask, two-dimensional displacement platform, coaxial receiving light path and control and processing module;Red light source is irradiated to collimating light uniform module, collimating light uniform module is collimated and uniform light after red light source is handled and irradiated to polarizer to generate linearly polarized light, collimated and uniform light after linearly polarized light is passed through annular diaphragm, and irradiated to the surface of detection mask;Coaxial receiving light path receives reflected light on detection mask, and the linear light spot of same polarization state is formed by switching band-pass filter and polarizer with control and processing module, linear light spot is imaged to the target surface of CCD camera by telecentric light path, forms high-contrast linear stripe, realizes dynamic adaptation by time-sharing switching the polarization state of polarizer, to distinguish pinhole and scratch.
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