A non-destructive measurement method of response time of MEMS infrared detector
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHONGBEI UNIV
- Filing Date
- 2025-09-09
- Publication Date
- 2026-07-21
AI Technical Summary
Existing MEMS infrared detector response time testing requires opening the cap to measure the absorption area, resulting in large testing errors, long testing time, and non-reusability. Furthermore, national standards require destructive operations.
By testing the output voltage of a MEMS infrared detector in its packaged state, the response time can be obtained using the frequency response. A test system can be built and the amplitude-frequency curve can be fitted to calculate the cutoff frequency without opening the cap.
It enables non-destructive testing of MEMS infrared detectors, accurately obtains response time, simplifies operation procedures, reduces errors, ensures the structural integrity and reusability of detectors, and meets national standards.
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