Shutter device, shutter control system and photoetching equipment

Abstract

The invention discloses a shutter device, a shutter control system and photoetching equipment, and belongs to the field of semiconductor equipment. The shutter device comprises a driving unit, the driving unit comprises a stator assembly and a rotor assembly, the stator assembly comprises a stator yoke and a magnet array, a plurality of magnets in the magnet array are distributed on the stator yoke in the circumferential direction, the magnets adjacent in the circumferential direction are tightly attached to each other, and the rotor assembly comprises a coil fixing frame of a symmetrical structure and a coil assembly supported by the coil fixing frame; an included angle between a first cross beam and a second cross beam in the coil fixing frame is an obtuse angle; the shading unit comprises blades; the connecting unit is connected with the driving unit and the shading unit; the driving unit drives the shading unit to reciprocate so as to connect and disconnect a light path. According to the invention, the stator assembly improves the output torque of the driving unit, so that rapid opening and closing of the blades are realized; the rotor assembly provides a larger mechanical avoiding space for rotation of the blade, large-angle opening and closing of the blade are achieved, the clear aperture of the shutter device is increased, time consumed by single exposure is shortened, and the photoetching yield is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor equipment, in particular to a shutter device, a shutter control system and a photolithography equipment. BACKGROUND

[0002] The photolithography machine is a key equipment in semiconductor manufacturing, which is used to accurately transfer the pattern on the mask to the substrate such as silicon wafer through the exposure process. In the photolithography system, the mercury lamp light source is usually used, and the mechanical shutter is used to control the opening and closing of the exposure process to realize the accurate control of the exposure dose. The control accuracy of the exposure dose directly determines the etching quality of the photolithography pattern.

[0003] Among them, the double-blade shutter scheme has certain limitations in application due to the light leakage at the joint, the complex structure and the high cost of the double driving module. Under this background, the single-blade shutter is adopted due to its simple structure and direct control. However, this scheme still faces problems such as long opening and closing time of the shutter, insufficient time control accuracy and limited light aperture, which directly affect the stability of the exposure dose and restrict the further improvement of the photolithography pattern precision. SUMMARY

[0004] The shutter device, the shutter control system and the photolithography equipment provided by the embodiments of the present application can shorten the opening and closing time of the exposure shutter, improve the control accuracy of the exposure dose, and also can increase the light aperture, reduce the time consumption of single exposure and improve the photolithography yield.

[0005] In order to achieve the above-mentioned purpose, according to the first aspect of the present application, a shutter device is provided, comprising: A driving unit comprising a stator assembly and a rotor assembly, the stator assembly comprising a stator yoke and a magnet array, a plurality of magnets in the magnet array being distributed circumferentially on the stator yoke and circumferentially adjacent magnets being in close contact with each other, the rotor assembly comprising a coil fixing frame with a symmetrical structure and a coil set supported thereby, and the included angle between the first cross beam and the second cross beam in the coil fixing frame being an obtuse angle; A light shielding unit comprising a blade; A connecting unit connecting the driving unit and the light shielding unit; The driving unit is used to drive the light shielding unit to reciprocate to open and close the light path.

[0006] According to the second aspect of the present application, a shutter control system is also provided, comprising: A host computer for sending instructions; A control board card for outputting shutter control instructions based on the instructions; A driver for outputting driving instructions based on the shutter control instructions; As described in the above technical solution, the shutter device controls the blades in the shutter device to reciprocate according to the drive command, so as to open and close the light path.

[0007] According to a third aspect of this application, a photolithography apparatus is also provided, the photolithography apparatus comprising: The shutter device as described in the above technical solution, or the shutter control system as described in the above technical solution.

[0008] In the shutter device of this application embodiment, the above technical solution has at least the following beneficial effects: the multiple magnets constituting the magnet array are arranged close to each other, which can increase the overall magnetic flux within a limited space; the magnetic flux generated by the magnet array is concentrated and constrained to the working air gap where the mover assembly is located by the stator yoke, so as to enhance the air gap magnetic density and increase the output torque of the drive unit, thereby realizing the rapid opening and closing of the blade. The included angle between the first crossbeam and the second crossbeam of the coil fixing frame in the mover assembly is an obtuse angle. This structure provides a larger mechanical clearance space for the rotational movement of the blade (i.e., increases the physical space between the blade and the stator assembly), so that the blade can achieve a larger maximum opening. The increase in opening directly leads to an increase in the maximum light-transmitting aperture of the shutter device, which means that under the condition of constant light source intensity, the light power (energy) reaching the silicon wafer through the shutter device per unit time is increased, shortening the time required for the photoresist to undergo chemical reaction (reaching the exposure dose), reducing the single exposure time, and improving the photolithography yield.

[0009] Other features and advantages of this application will be described in detail in the following detailed description section. Attached Figure Description

[0010] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0011] To gain a more complete understanding of this application and its beneficial effects, the following description will be provided in conjunction with the accompanying drawings, wherein the same reference numerals in the following description denote the same parts.

[0012] Figure 1 This is a schematic diagram of the overall structure of the shutter device provided in the embodiments of this disclosure; Figure 2 This is one of the schematic diagrams of the internal structure of the shutter device provided in the embodiments of this disclosure; Figure 3 This is the second schematic diagram of the internal structure of the shutter device provided in the embodiments of this disclosure; Figure 4is a distribution diagram of a stator assembly of a shutter device provided in embodiments of the present disclosure; Figure 5 is Figure 1 is a sectional view of the shutter device provided in embodiments of the present disclosure, after being cut along a direction perpendicular to the first direction; Figure 6 is Figure 3 is an enlarged diagram of a D portion of the shutter device provided in embodiments of the present disclosure; Figure 7 is a third internal structure diagram of a shutter device provided in embodiments of the present disclosure; Figure 8 is Figure 3 is an enlarged diagram of an E portion of the shutter device provided in embodiments of the present disclosure; Figure 9 is a structure block diagram of a shutter control system provided in embodiments of the present disclosure; Figure 10 is a control time and exposure light intensity corresponding relationship curve diagram of a shutter control system provided in embodiments of the present disclosure.

[0013] Legend of reference signs: 1 - shutter device; 2 - driving unit; 21 - stator assembly; 211 - stator yoke; 2111 - first stator yoke; 2112 - second stator yoke; 212 - magnet array; 2121 - first magnet array; 2122 - second magnet array; 213 - magnet; 22 - mover assembly; 221 - coil fixing frame; 2211 - first cross beam; 2212 - second cross beam; 2213 - third cross beam; 2214 - fourth cross beam; 2215 - first through hole; 2216 - second through hole; 222 - coil group; 2221 - first coil; 2222 - second coil; 3 - light shielding unit; 31 - blade; 4 - connecting unit; 41 - rotating shaft; 42 - first connecting piece; 421 - third through hole; 422 - fourth through hole; 43 - bearing support seat; 5 - angle measurement unit; 51 - angle encoder; 6 - support unit; 61 - first support frame; 62 - second support frame; 63 - cover; 7 - light passing hole; 8 - air blowing unit; 81 - first air blowing assembly; 811 - first air inlet; 812 - first air outlet; 813 - first flow channel; 82 - second air blowing assembly; 821 - second air inlet; 91 - upper computer; 92 - control board card; 93 - driver; X - first direction; Y - second direction; Z - third direction. DETAILED DESCRIPTION

[0014] With reference to the drawings, the technical solutions in the embodiments of the present application will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative work fall within the scope of the present application.

[0015] In the description of the present application, it should be understood that the terms "center", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation to the present application.

[0016] The terms "first", "second" are only for descriptive purpose, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0017] In the description of the present application, it should be noted that unless otherwise specified and limited, the terms "mounting", "connecting", "connection" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integral connection; it can be mechanical connection, it can be direct connection, or indirect connection through intermediate medium, it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0018] The present application provides a shutter device, a shutter control system and a lithographic apparatus, which will be described in detail respectively below. It should be noted that the description order of the following embodiments is not limited as the preferred order of the embodiments of the present application. In the following embodiments, the description of each embodiment has its own emphasis, and the parts not described in detail in a certain embodiment can be referred to the related description of other embodiments.

[0019] Please refer to Figure 1 and Figure 2The shutter device 1 of the present application comprises a driving unit 2, a light shielding unit 3 and a connecting unit 4. The driving unit 2 comprises a stator assembly 21 and a rotor assembly 22. The stator assembly 21 comprises a stator yoke 211 and a magnet array 212, a plurality of magnets 213 in the magnet array 212 are distributed along the circumference of the stator yoke 211 and circumferentially adjacent magnets 213 are in close contact with each other. The rotor assembly 22 comprises a coil fixing frame 221 and a coil set 222, the coil fixing frame 221 has a symmetrical structure and can support the coil set 222. The included angle between the first cross beam 2211 and the second cross beam 2212 in the coil fixing frame 221 is an obtuse angle. The light shielding unit 3 comprises a blade 31. The connecting unit 4 connects the driving unit 2 and the light shielding unit 3. The driving unit 2 is used to drive the light shielding unit 3 to reciprocate, so as to turn on and off the light path.

[0020] In the technical scheme, the driving unit 2 serves as the core power source, and the stator assembly 21 and the rotor assembly 22 in the driving unit 2 jointly drive the light shielding unit 3 to reciprocate. Specifically, in the stator assembly 21, a plurality of magnets 213 are arranged along the circumference to form an arc-shaped magnet array 212. The polarities of two adjacent magnets 213 in the arc-shaped magnet array 212 are opposite. The two adjacent magnets 213 are arranged in close contact with each other, so as to reduce magnetic leakage and improve the overall magnetic flux in a limited space. The magnet array 212 is fixed on the stator yoke 211 in a manner such as gluing, and the stator yoke 211 has an arc-shaped structure corresponding to the magnet array 212. The stator yoke 211 passes through a path with low magnetic resistance, so as to concentrate and constrain the magnetic flux generated by the magnet array 212 to the working air gap where the rotor assembly 22 is located as much as possible, so as to enhance the air gap magnetic density and directly improve the output torque of the driving unit 2, thereby realizing the rapid opening and closing (reaching the “open state” or the “closed state”) of the blade 31. The “open state” refers to that the blade 31 is in an effective working position allowing the exposure light beam to pass through the light passing hole 7; the “closed state” refers to that the blade 31 is in a light shielding position effectively preventing the exposure light beam from passing through the light passing hole 7. The above-mentioned “rapid opening and closing” refers to that the movement time of the blade 31 for completing one complete opening or closing action is significantly shortened.

[0021] In the mover assembly 22, the coil holder 221 is used to support the coil set 222. The coil set 222, when current is passed through, is subjected to Lorentz force in the magnetic field of the stator assembly 21, which forms a driving torque relative to the rotation axis, thereby driving the overall rotation of the mover assembly 22. The coil holder 221 itself is of a symmetrical structure, and it supports the coil set 222 in a symmetrical manner, which ensures that the line of action of the resultant Lorentz force on the coil set passes through the rotation center of the mover assembly, and the center of mass of the entire mover assembly 22 also lies on the rotation axis. These two conditions work together to effectively suppress the vibration and bending moment of the mover assembly 22 due to imbalance in high-frequency reciprocating rotation, ensuring smooth operation. The coil holder 221 has multiple beams for supporting the coil set 222, and the beams are fixed with the coil set by means of adhesion or the like. The coil holder 221 includes a first beam 2211 and a second beam 2212, and the included angle between the first beam 2211 and the second beam 2212 is obtuse. This structure provides more mechanical avoidance space for the rotational movement of the blade 31 (i.e., increases the physical space between the blade 31 and the stator assembly 21), enabling the blade 31 to achieve a larger maximum opening. The increase in the opening directly leads to an increase in the maximum light aperture of the shutter device 1. The increase in the light aperture means that, under the condition that the intensity of the light source remains unchanged, the light power (energy) reaching the silicon wafer through the shutter device 1 per unit time is improved, the time required for the photoresist to undergo chemical reaction (reach the exposure dose) is shortened, the time consumption of single exposure is reduced, and the photolithography yield is improved. Preferably, the included angle between the first beam 2211 and the second beam 2212 is between 156° and 165°, for example: 157°, 158°, 159°, 160°, 161°, 162°, 163°, and 164°, but not limited thereto.

[0022] Thus, by adopting the above design, the multiple magnets 213 in the magnet array 212 are arranged in close contact with each other to improve the overall magnetic flux, and the magnetic flux generated by the magnet array 212 is as much as possible to be converged and constrained to the working air gap where the mover assembly 22 is located, so as to enhance the air gap magnetic density and directly improve the output torque of the driving unit 2, thereby realizing the rapid opening and closing of the blade 31. The included angle between the first beam 2211 and the second beam 2212 of the coil holder 221 in the mover assembly 22 is obtuse, which provides more mechanical avoidance space for the rotational movement of the blade 31, enabling the blade 31 to achieve a larger maximum opening, thereby increasing the maximum light aperture of the shutter device 1, reducing the time consumption of single exposure, and improving the photolithography yield.

[0023] In some embodiments, the orthogonal projection of the magnet array 212 in the first direction (in this application, the X direction is defined as the first direction) is located within the orthogonal projection of the stator yoke 211 in the first direction. The arc-shaped profile of the magnet array 212 is concentric with the arc-shaped profile of the stator yoke 211.

[0024] In this scheme, in the first direction, the magnet array 212 is fully contained within the profile of the stator yoke 211 to ensure that the stator yoke 211 can form a low-reluctance closed magnetic circuit for the magnet array 212, thereby greatly reducing the leakage of magnetic flux in the air, concentrating the magnetic energy on the working air gap where the coil set 222 is located, and ultimately achieving greater output force under the same input current. The arc-shaped profile of the magnet array 212 is concentric with the arc-shaped profile of the stator yoke 211, ensuring that a magnetic field with uniform amplitude and periodic distribution of magnetic flux density is formed within the movement stroke of the mover assembly 22. This magnetic field characteristic enables the energized coil set 222 to receive uniform and consistent Lorentz force throughout the entire effective stroke, thereby providing smooth driving force for the driving unit 2.

[0025] In some embodiments, referring to Figures 2 to 4 , the stator yoke 211 includes a first stator yoke 2111 and a second stator yoke 2112. The magnet array 212 includes a first magnet array 2121 and a second magnet array 2122 arranged parallel and opposite to each other. The first magnet array 2121 is fixed to the first stator yoke 2111, and the second magnet array 2122 is fixed to the second stator yoke 2112. The first magnet array 2121 in the first direction is fully overlapped with the second magnet array 2122 in the first direction. The mover assembly 22 is located between the first magnet array 2121 and the second magnet array 2122.

[0026] In this technical solution, the number of magnets in the first magnet array 2121 and the second magnet array 2122 is the same. Within each array, the polarity of adjacent magnets 213 is opposite; between the two arrays, the polarity of the X-directionally opposite magnets 213 is also opposite. This polarity arrangement enables the magnetic lines to be emitted from, for example, the N-pole of one side magnet 213, pass through the working air gap and the mover assembly 22, be received by the S-pole of the opposite magnet 213 on the other side, and form a complete closed loop through the first stator yoke 2111 and the second stator yoke 2112, thereby constituting an efficient axial magnetic circuit that creates and strengthens the working magnetic field for the mover assembly 22. This axial magnetic circuit rotary motor, compared to the traditional Halbach array motor which requires an additional middle yoke, is beneficial for reducing the axial size. At the same time, since the magnetic circuit closure only relies on the two stator yokes, the external mechanical support structure can be made of light non-magnetic materials such as aluminum alloy, thereby significantly reducing the weight of the device. As an example, to further enhance the air gap flux density, the first stator yoke 2111 and the second stator yoke 2112 can be made of high-saturation-magnetization materials such as electrical pure iron, martensitic stainless steel, etc.

[0027] As an example, in this application, the first magnet array 2121 and the second magnet array 2122 each include 4 magnets 213, which can be understood as 4 groups of magnet pairs arranged in parallel, but not limited to this. If the coil group 222 in the mover assembly 22 is taken as a whole, the conductor wound will pass through the magnetic field formed by the 4 groups of magnet pairs in turn. If the length of the coil conductor distributed in the air gap of a single group of magnet pairs is taken as the benchmark, this structure makes the total effective conductor length in the strong working magnetic field increase to about 4 times. The increase of the total effective conductor length directly improves the torque coefficient of the driving unit 2. When the input current remains unchanged, the output torque of the driving unit 2 will be significantly improved. This ultimately translates into greater driving torque acting on the blade 31, thereby providing core power support for achieving its rapid opening and closing motion.

[0028] The direction of the magnetic field formed by the stator assembly 21 in this application is described below. The first stator yoke 2111 is fixed with the first magnet array 2121, and the polarity of the magnets 213 in the array is distributed in the circumferential direction as NSNS in turn. The second stator yoke 2112 is fixed with the second magnet array 2122, and the polarity of the magnets 213 in the array is distributed in the circumferential direction as SNSN in turn. At the same time, the polarity of the two magnets 213 oppositely relative to the first direction is also opposite. This polarity correspondence of the inner and outer arrays jointly establishes an axial magnetic field with high magnetic flux density and periodically alternating direction in the air gap between the first magnet array 2121 and the second magnet array 2122.

[0029] In some embodiments, referring to Figure 3 and Figure 5 , the angle between the central axis A of the blade 31 extending in the third direction (defined as the third direction in this application) and the extension line B of the first cross beam 2211 is smaller than the angle between the central axis A and the extension line C of the second cross beam 2212.

[0030] In this technical solution, the blade 31 is located between the first cross beam 2211 and the second cross beam 2212. Among them, the central axis A of the blade 31 and the extension line B of the first cross beam 2211 form an angle α, and the central axis A and the extension line of the second cross beam 2212 form an angle β, and β>α is satisfied. This asymmetric angle design makes the second cross beam 2212 supporting the coil group 222 and its associated mover assembly part more outwardly offset in space, thereby giving the blade 31 more swing space for rotation. This layout is especially suitable for the opening and closing motion working condition of a single blade, which can ensure that the blade 31 always maintains sufficient safety clearance with key static components such as the stator assembly 21 in the entire motion trajectory, fundamentally eliminating motion interference and ensuring long-term reliability of operation.

[0031] In some embodiments, the coil holder 221 further comprises a third crossbeam 2213 and a fourth crossbeam 2214, and an included angle θ between the third crossbeam 2213 and the fourth crossbeam 2214 is an acute angle. The coil set 222 comprises a first coil 2221 and a second coil 2222, and the first crossbeam 2211 and the fourth crossbeam 2214 support the first coil 2221, and the second crossbeam 2212 and the third crossbeam 2213 support the second coil 2222.

[0032] In the technical solution, the included angle θ between the third crossbeam 2213 and the fourth crossbeam 2214 is an acute angle, which meets the geometric constraint of the coil holder 221 and ensures the overall stability of the coil holder 221. Preferably, the acute angle θ ranges from 60° to 65°, for example: 61°, 62°, 63°, and 64°, but is not limited thereto.

[0033] In some embodiments, referring to Figure 5 , the coil holder 221 further comprises a first through hole 2215 and a second through hole 2216. The first through hole 2215 is located at the center of the coil holder 221, and the second through hole 2216 is closer to the second crossbeam 2212 than the first through hole 2215.

[0034] In the technical solution, the shape, size, and position of the first through hole 2215 and the second through hole 2216 can be specifically designed according to actual needs. As an example, the first through hole 2215 can be designed as a circular shape, and the second through hole 2216 can be designed as a long slot shape, and the extension direction thereof is adapted to the rotation direction of the coil holder 221.

[0035] In some embodiments, referring to Figure 6 , the connecting unit 4 comprises a rotating shaft 41 and a first connecting piece 42. The first connecting piece 42 is fixed to the coil holder 221, and the first connecting piece 42 is provided with a third through hole 421 and a fourth through hole 422, the third through hole 421 is correspondingly arranged with the first through hole 2215, and the fourth through hole 422 is correspondingly arranged with the second through hole 2216. The blade 31 is installed at the free end of the first connecting piece 42. The rotating center of the rotating shaft 41 is concentric with the center of the arc-shaped contour of the magnet array 212, and the rotating shaft 41 is arranged through the third through hole 421 and the first through hole 2215 and synchronously moves with the mover assembly 22 to drive the blade 31 to move.

[0036] In the technical solution, the connecting unit 4 is used for connecting the moving assembly 22 in the driving unit 2 and the vane 31. Specifically, the first connecting piece 42 is installed on the coil fixing frame 221 near one side of the second magnet array 2122, the third through hole 421 of the first connecting piece 42 corresponds to the position and size of the first through hole 2215 of the coil fixing frame 221 in terms of position and size, so that the rotating shaft 41 passes through the first through hole 2215 and the third through hole 421 in sequence and is fixed by the bearing (not shown in the figure) and the bearing support 43. The free end of the first connecting piece 42 is in the shape of a long strip and is fixedly connected with the vane 31. Meanwhile, the rotating center of the rotating shaft 41 is concentric with the center of the arc-shaped magnet array 212, so that the distribution of the air gap magnetic field is axisymmetric and uniform within the working stroke of the moving assembly 22. Therefore, the driving torque generated by the Lorentz force acting on the coil set 222 has a stable linear relationship with the input current, so as to ensure the smoothness of the output torque and reduce the control difficulty. As an optional solution, the first connecting piece 42 can also be installed on the coil fixing frame 221 near one side of the first magnet array 2121, and the shape of the free end of the first connecting piece 42 can be designed based on the connection stiffness, space avoidance and other factors.

[0037] In some embodiments, referring to Figure 6 , the connecting unit 4 further comprises a limiting column (not shown in the figure) which is arranged to pass through the fourth through hole 422 and the second through hole 2216 and is used for limiting the rotating angle of the moving assembly 22. The limiting column is installed on the bearing support.

[0038] In the technical solution, the limiting column (not shown in the figure) and the limiting hole (i.e. the fourth through hole 422 and the second through hole 2216) matched with the limiting column are arranged. The limiting column passes through the limiting hole, and when the moving assembly 22 rotates, the left and right two slot walls of the limiting hole will alternately contact the fixed limiting column, so as to form mechanical limiting and accurately restrict the rotating angle range of the moving assembly 22. The limiting design can effectively prevent the moving assembly 22 from rotating overshoot and avoid the collision between the vane 31 and the surrounding components, so as to ensure the accuracy of the motion trajectory and the functional reliability of the device.

[0039] In some embodiments, referring to Figure 6 , the shutter device 1 further comprises an angle measuring unit 5. The angle encoder 51 constituting the angle measuring unit 5 is installed on the output end of the rotating shaft 41 and is used for directly measuring the real-time rotating angle of the rotating shaft 41, which is equivalent to the actual angular position of the moving assembly 22 and the vane 31. Based on the real-time angle signal fed back by the angle encoder 51, the control system can construct a closed-loop servo control: comparing the detected actual angle with the preset target angle, and dynamically adjusting the input current of the driving unit 2 according to the generated position deviation signal. The closed-loop mechanism not only ensures the fast response of the vane 31, but also enables the vane 31 to accurately and stably reach the instruction position, so as to realize the high-precision control of the exposure dose.

[0040] In some embodiments, referring toFigure 1 and Figure 2 The shutter device 1 further comprises a support unit 6, which comprises a first support frame 61, a second support frame 62, and a cover 63. The first support frame 61 and the second support frame 62 are both provided with a light passage hole 7. The first support frame 61 is fixed to the side of the first stator yoke 2111 away from the first magnet array 2121, and the second support frame 62 is fixed to the side of the second stator yoke 2112 away from the second magnet array 2122. The cover 63 covers the area between the first support frame 61 and the second support frame 62.

[0041] In this technical solution, the first support frame 61 and the first stator yoke 2111 are fixedly connected, and the second support frame 62 and the second stator yoke 2112 are fixedly connected. The fixed connection mode includes screw fixing, rivet fixing, and welding fixing, but is not limited thereto. Thus, the weight and working load of the drive unit 2, the light shielding unit 3, and the connecting unit 4 are jointly borne by the first support frame 61 and the second support frame 62. The first support frame 61 and the second support frame 62 are arranged in parallel to each other, and the shapes and sizes of the two correspond to each other. The cover 63 is installed between the first support frame 61 and the second support frame 62. Firstly, it connects and reinforces this parallel support frame, improving the rigidity of the overall structure; secondly, it covers the area between the first support frame 61 and the second support frame 62, forming a protective shell. This shell not only provides physical protection against dust and impact for the internal moving parts, but more importantly, it serves as an effective light seal, eliminating any unintended light leakage due to structural gaps in the shutter closed state.

[0042] In some embodiments, referring to Figure 1 and Figure 7 The shutter device 1 further comprises a gas blowing unit 8, which comprises a first gas blowing assembly 81 and a second gas blowing assembly 82. The first gas blowing assembly 81 and the second gas blowing assembly 82 are arranged in the cover 63. The first gas blowing assembly 81 comprises a first air inlet 811 and a first air outlet 812, which are used for heat dissipation of the coil group 222. The second gas blowing assembly 82 comprises a second air inlet 821 and a second air outlet, which are used for heat dissipation of the blade 31.

[0043] In the technical solution, the clean and dry compressed air or other plant air is blown to the coil set 222 through the first air inlet 811 and the first air outlet 812 to dissipate heat while the current is applied to the coil set 222. The heat dissipation mechanism can maintain the working temperature of the coil set 222 within the thermal limit of the insulating material, thereby allowing the system to apply a larger driving current under the premise of safety, which directly improves the output torque of the driving unit 2 and provides a guarantee for the rapid opening and closing of the blade 31. At the same time, to cope with the heat generated by the high-speed operation of the blade 31, the same clean air is supplied to the second air inlet 821, and the air flow is blown to the blade 31 from the second air outlet. This can effectively inhibit the thermal deformation and thermal stress of the blade 31 due to temperature rise, thereby ensuring the movement accuracy (operation stability) of the blade 31 and prolonging the mechanical service life of the blade 31.

[0044] In some embodiments, referring to Figure 1 , Figure 7 and Figure 8 , the number of the first air blowing assemblies 81 is multiple. The first air blowing assembly 81 further comprises a first flow channel 813, and the cross section of the first flow channel 813 is isosceles trapezoidal. The first air outlet 812 is arranged as a point array air outlet.

[0045] In the technical solution, as an example, two first air blowing assemblies 81 with the same internal structure are arranged to independently dissipate heat for the first coil 2221 and the second coil 2222. The first flow channel 813 adopts an isosceles trapezoidal cross section with a narrow inlet and a wide outlet. This gradually expanding flow channel cooperates with a gentle inner wall transition to effectively guide the smooth diffusion of the air flow, thereby providing a stable and uniform flow field for the first air outlet 812 while maximizing the inhibition of the generation of eddy currents in the flow channel. In addition, the first air outlet 812 is arranged as two rows of completely symmetrical discrete small holes, so that the air flow range can effectively cover the thickness of the coil set 222, ensuring the heat dissipation efficiency. At the same time, the point array distribution mode can make the air flow uniformly blow out from multiple points, and the air outlet wind speed of each small air outlet is more moderate, which can not only carry away heat but also reduce the physical impact of the air flow on the coil set 222, thereby balancing heat dissipation and protection.

[0046] Referring to Figure 9 and Figure 10 , in the embodiments of the present application, the present application further provides a shutter control system, comprising: a host computer 91 configured to send an instruction; a control board card 92 configured to output a shutter control instruction based on the instruction; a driver 93 configured to output a driving instruction based on the shutter control instruction; and the shutter device 1 as described in any of the technical solutions, wherein the shutter device 1 is controlled to move the blade 31 according to the driving instruction to open and close the light path.

[0047] In the technical solution, T0-T1 represents the time when the control board card 92 issues an opening instruction of the blade 31 to the driver 93, T1-T2 represents the time when the driver 93 receives the instruction to control the blade 31 from the closed state to the open state, T2-T3 represents the steady state time when the blade 31 remains in the fully open state, T3-T4 represents the time when the control board card 92 issues a closing instruction of the blade 31 to the driver 93, and T4-T5 represents the time when the driver 93 receives the instruction to control the blade 31 from the open state to the closed state.

[0048] In some embodiments, I / O communication is used between the control board card 92 and the driver 93 in the shutter control system, and the sampling frequency of the position loop of the driver 93 is greater than or equal to 10 kHz.

[0049] In the technical solution, the time required for the opening and closing of the blade 31 and the repetition accuracy (stability) thereof are two core indicators for measuring the performance of the shutter device. Specifically, it is required that T0-T2 (total opening time) and T3-T5 (total closing time) are as short as possible, and the periodic jitter is small. The control board card 92 issues an instruction to the control driver 93 by using I / O communication, and the communication process has very low delay, and the time consumption (T0-T1) is only about 0.5 ms. At the same time, the driver 93 with a servo update frequency greater than 10 kHz (period <0.1 ms) is used to improve the response speed and stability of the control loop. The core movement time (T1-T2) of the blade 31 is determined by the output performance of the driving unit 2 and the clear aperture. In an embodiment of the present application, the time is optimized to about 9.5 ms. Therefore, the total time of a single opening (or closing) of the blade 31 is about 10 ms, that is, the total time of a complete opening and closing cycle is strictly controlled within 20 ms, so as to realize accurate regulation of the exposure dose. At the same time, a large clear aperture of 55 mm can be realized.

[0050] In some embodiments of the present application, the present application also provides a lithographic apparatus comprising the shutter device as claimed in any one of the technical solutions above, or the shutter control system as claimed in any one of the technical solutions above. Since the shutter device or the shutter control system in the lithographic apparatus has the same technical features as the shutter device or the shutter control system described above, they can solve the same technical problems and achieve the same technical effects.

[0051] In the description of the present application, specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0052] The above merely describes specific embodiments of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can easily think of changes or replacements within the technical scope disclosed by the present application, which should be covered within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims. In addition, the principles and embodiments of the present application are described by applying specific examples in the specification, and the above description of the embodiments is only used to help understand the method and core idea of the present application, and the content of the specification should not be understood as limiting the present application.

Claims

1. A shutter device, characterized in that, include: A drive unit includes a stator assembly and a mover assembly. The stator assembly includes a stator yoke and a magnet array. A plurality of magnets in the magnet array are circumferentially distributed on the stator yoke and circumferentially adjacent magnets are in close contact with each other. The mover assembly includes a coil holder with a symmetrical structure and a coil group supported thereon. The included angle between a first crossbeam and a second crossbeam in the coil holder is an obtuse angle. The shading unit includes blades; A connection unit connects the driving unit and the light-shielding unit; The driving unit is used to drive the light-shielding unit to reciprocate in order to switch the light path on and off.

2. The shutter device according to claim 1, characterized in that, The orthographic projection of the magnet array in the first direction lies within the orthographic projection of the stator yoke in the first direction; The arc-shaped profile of the magnet array is concentric with the arc-shaped profile of the stator yoke.

3. The shutter device according to claim 2, characterized in that, The stator yoke includes a first stator yoke and a second stator yoke; The magnet array includes a first magnet array and a second magnet array arranged parallel to each other and facing each other. The first magnet array is fixed to the first stator yoke, and the second magnet array is fixed to the second stator yoke. The orthographic projection of the first magnet array in the first direction completely coincides with the orthographic projection of the second magnet array in the first direction; The moving part is located between the first magnet array and the second magnet array.

4. The shutter device according to claim 1, characterized in that, The angle between the central axis of the blade extending in a third direction and the first crossbeam is smaller than the angle between the central axis and the second crossbeam.

5. The shutter device according to claim 1, characterized in that, The coil fixing frame also includes a third crossbeam and a fourth crossbeam, and the included angle between the third crossbeam and the fourth crossbeam is an acute angle; The coil group includes a first coil and a second coil; The first crossbeam and the fourth crossbeam support the first coil, and the second crossbeam and the third crossbeam support the second coil.

6. The shutter device according to claim 1, characterized in that, The coil fixing bracket is also provided with a first through hole and a second through hole; The first through hole is located at the center of the coil holder; The second through hole is closer to the second crossbeam than the first through hole.

7. The shutter device according to claim 6, characterized in that, The connecting unit includes a rotating shaft and a first connecting member; The first connector is fixed to the coil fixing frame. The first connector is provided with a third through hole and a fourth through hole. The third through hole is provided in correspondence with the first through hole, and the fourth through hole is provided in correspondence with the second through hole. The blade is mounted on the free end of the first connector; The rotation center of the rotating shaft is concentric with the center of the arc-shaped contour of the magnet array; The rotating shaft passes through the third through hole and the first through hole, and moves synchronously with the moving part assembly to drive the blade.

8. The shutter device according to claim 7, characterized in that, The connecting unit further includes a limiting post, which passes through the fourth through hole and the second through hole to limit the rotation angle of the moving part assembly.

9. The shutter device according to claim 1, characterized in that, The shutter device also includes an angle measuring unit, which includes an angle encoder; The angle encoder is installed at the output end of the rotating shaft and is used to detect the rotation angle of the moving part assembly.

10. The shutter device according to claim 3, characterized in that, The shutter device also includes a support unit, which includes a first support frame, a second support frame, and a cover. Both the first support frame and the second support frame are provided with light-transmitting holes; The first support frame is fixed on the side of the first stator yoke away from the first magnet array, and the second support frame is fixed on the side of the second stator yoke away from the second magnet array; The cover encloses the area between the first support frame and the second support frame.

11. The shutter device according to claim 10, characterized in that, The shutter device further includes an air blowing unit, which includes a first air blowing component and a second air blowing component; The first air blowing assembly and the second air blowing assembly are disposed on the housing; The first air blowing assembly includes a first air inlet and a first air outlet, used to dissipate heat from the coil assembly; The second air blowing assembly includes a second air inlet and a second air outlet for dissipating heat from the blades.

12. The shutter device according to claim 11, characterized in that, The number of the first air blowing components is multiple; The first air blowing assembly further includes a first flow channel, the cross-section of which is an isosceles trapezoid. The first air outlet is configured as a point array air outlet.

13. A shutter control system, characterized in that, include: The host computer is used to send commands; A control board, used to output shutter control commands based on the aforementioned instructions; A driver, used to output a drive command based on the shutter control command; The shutter device according to any one of claims 1 to 12 controls the blades in the shutter device to reciprocate according to the drive command, so as to open and close the light path.

14. The shutter control system according to claim 13, characterized in that, The control board and the driver communicate via I / O. The position loop sampling frequency of the driver is ≥10KHz.

15. A photolithography apparatus, characterized in that, include: The shutter device as described in any one of claims 1 to 12, or the shutter control system as described in any one of claims 13 to 14.

Images