Cover plate glass and manufacturing method thereof with low frosting risk

Abstract

The invention discloses cover plate glass and a low-frosting-risk manufacturing method thereof, and the method comprises the following steps: designing glass components SiO, AlO, NaO, KO, MgO, ZrO and BO, melting the glass to optimize the acid resistance index (R) of the glass, and selecting the type and pH range of polishing powder according to the acid resistance index (R) for polishing to obtain the low-frosting-risk cover plate glass. According to the electronic cover plate glass with the low frosting risk, the preparation method and the polishing method of the electronic cover plate glass, the frosting risk of the glass is greatly reduced, the processing yield is improved, on the other hand, the glass obtained through processing is good in frosting resistance and stable in performance, the service life of a product can be greatly prolonged, and the electronic cover plate glass with the low frosting risk and the preparation method and the polishing method thereof are achieved. The glass substrate is suitable for mobile phone cover plates, protection pastes, chip packaging and 5G communication equipment glass substrates.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass production, in particular to a cover plate glass and a preparation method of a low-fogging-risk cover plate glass. BACKGROUND

[0002] In the fields of mobile phone cover plate, protective stickers, chip packaging and 5G communication device glass substrates, the polishing of glass needs to consider both optical performance and cost. The polishing process is the core link to determine the optical performance, but there have been two technical bottlenecks of chemical fogging and physical fogging for a long time.

[0003] Chemical fogging: using low-cerium fluorine-containing polishing powder (fluorine content ≥ 1%) in an acidic environment with pH ≤ 7, fluorine ions erode the glass surface to form fogging (fogging rate > 12%), which is chemical fogging. Although the use of traditional high-cerium powder has no fogging problem, it is difficult to be applied on a large scale due to high cost (cerium oxide content ≥ 82%), and there is no auxiliary effect of fluorine, the polishing time is relatively long, the efficiency is relatively low, and the production capacity is limited.

[0004] Physical fogging: using high-hardness polishing powder (such as alumina, hardness 9 Mohs) to cause particle-shaped indentation, which is physical fogging. Fogging can significantly reduce the optical performance of glass, which is an unacceptable defect in some applications, and limits the application scenarios of glass.

[0005] Although the use of traditional high-cerium powder has no fogging problem, it is difficult to be applied on a large scale due to high cost (cerium oxide content ≥ 82%), and there is no auxiliary effect of fluorine, the polishing time is relatively long, the efficiency is relatively low, and the production capacity is limited.

[0006] A glass component with low fogging rate and an adaptive polishing process are needed to realize a low-fogging-risk electronic glass cover plate and a preparation method of a low-fogging-risk cover plate glass. SUMMARY

[0007] In order to achieve the above-mentioned purpose, the technical scheme adopted by the present application is as follows:

[0008] A cover plate glass, characterized in that it comprises the following: the main components of the glass include, by mass percentage: 60-65% of SiO2, 12-20% of Al2O3, 12-16% of Na2O, 2-5% of K2O, 1-4% of MgO, 0-3% of ZrO2, 0.5-3.5% of B2O3, and the total mass is 100%.

[0009] The above is the main component of the glass, and the sum is limited to 100%. In addition, the glass may also contain impurities such as Fe2O3 introduced by raw materials, which are not included in the overall composition.

[0010] The preparation method of the low-fogging risk cover plate glass as described above, characterized in that, specifically comprises the following:

[0011] The main body component comprises glass, and the glass is melted by designing the glass components SiO2, Al2O3, Na2O, K2O, MgO, ZrO2, and B2O3 to optimize the acid resistance index (R), and the polishing powder type, pH range are selected according to the acid resistance index (R) value for polishing, so as to obtain a low-fogging cover plate glass.

[0012] Specifically comprises the following:

[0013] 1) Raw material ratio: the raw materials are weighed according to the composition of the glass described above, and mixed uniformly;

[0014] 2) Melting: after the above mixture is ground and mixed uniformly, it is placed in a platinum crucible, the platinum crucible is placed in a lifting furnace, heated to 1645℃, kept for 6.5h, then lowered to 1590℃, kept for 1.5h, then poured into a rectangular graphite mold heated to 480℃, after hardening, transferred to an annealing furnace raised to 610℃, kept for 5h, then cooled to room temperature with the furnace;

[0015] 3) Cut into a thin sheet, polish both sides, the size of the polished glass is 150mm×70mm×0.6mm, and CNC processing is performed;

[0016] The polishing is performed according to the calculated acid resistance index (R), the polishing powder is selected, and the polishing powder and water ratio is 1:1.15, the pH range is 5.0~7.0, and the polishing is performed.

[0017] The acid resistance index R is used to represent the anti-fogging effect, the larger the R is, the stronger the anti-fogging ability is, and it is suitable for polishing process with acidic (pH≤7) and long polishing time; while the R is small, the anti-fogging ability is lacking, and the polishing process with neutral pH and short polishing time is required.

[0018] The acid resistance index (R) is calculated by the following formula:

[0019]

[0020] In the above formula, A~G represent the mass percentage of each component (not counting the percentage sign, ranging from 0 to 100), the mass percentage of glass, A is SiO2, B is Al2O3, C is Na2O, D is K2O, E is MgO, F is ZrO2, and G is B2O3.

[0021] MgO and ZrO2 have no effect on the acid resistance index of the glass.

[0022] In the step 3), the polishing powder is selected according to the acid resistance index (R) as follows:

[0023] Polishing powder type / ingredient 1# 2# 3# 4# 5# 6# cerium oxide 62 60 58 57 65 82 lanthanum oxide 26 29 30 32 28 0.5 fluorine content 5 4 3 2 1 0 impurities 7 7 9 9 6 17.5 acid resistance index R 67.5~65.5 67.5~61.5 67.5~60 67.5~59 67.5~53.5 67.5~44.3

[0024] R is preferably 53.5-67.5, if R is less than 53.5, the glass has insufficient anti-fogging ability, and only the polishing powder without fluorine and with high cerium can be used for polishing, which is high in cost and low in efficiency; if the polishing powder containing fluorine is used, the fogging phenomenon is prone to occur; and if R is greater than 67.5, the anti-fogging ability is too strong, and the surface is not polished locally under the same process, so that the processing time needs to be prolonged, and the processing efficiency is low.

[0025] The corrosion of the polishing powder is mainly determined by the fluorine content. The glass with high acid resistance index has strong anti-fogging ability, and the polishing powder with high fluorine content can be selected for polishing, so that the glass can be polished bright in a short time, or the polishing powder with low fluorine content (downward compatible) can be selected and the time is appropriately prolonged to achieve the polishing effect.

[0026] In the step 3),

[0027] The glass sheet after CNC processing is placed in a polishing mold, and the polishing process parameters are set, the pressure is 60 kgf, and the polishing time is 6-10 min.

[0028] After polishing, the glass sheet is cleaned with water, and then ultrasonic cleaning is performed in pure water for 15 min, and then the glass sheet is naturally dried.

[0029] The above preparation method is also a polishing method of the cover plate glass.

[0030] Compared with the prior art, the present application has the following beneficial effects:

[0031] The present application designs and limits the components of the glass, and performs polishing process according to the acid resistance index (R) and the different polishing powders, which greatly reduces the risk of glass fogging, improves the processing yield, and on the other hand, the processed glass has good anti-fogging effect, while the performance is stable, which can greatly increase the service life of the product, realizes a low-fogging risk electronic cover plate glass and its preparation method and polishing method, and is suitable for mobile phone cover plate, protective paste, chip packaging and 5G communication equipment glass substrate. DETAILED DESCRIPTION

[0032] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor belong to the scope of protection of the present application.

[0033] Cover plate glass, characterized in that it comprises the following: the main components of the glass comprise, by mass percentage: 60-65% of SiO2, 12-20% of Al2O3, 12-16% of Na2O, 2-5% of K2O, 1-4% of MgO, 0-3% of ZrO2, 0.5-3.5% of B2O3, and the total mass is 100%.

[0034] The above are the main components of the glass, and the sum is limited to 100%. In addition, the glass can also contain impurities such as Fe2O3 introduced by raw materials, which are not included in the overall composition.

[0035] Silicon dioxide (SiO2) is the main component of the glass skeleton and is essential. It also has the effect of improving the strength of the glass, but it increases the viscosity of the glass and reduces the corrosion resistance of the glass to polishing liquid. The mass percentage of SiO2 is preferably 60-65%. If the mass percentage of SiO2 is less than 60%, the glass forming performance is poor, and the strength and weather resistance are not enough. If it exceeds 65%, the glass becomes difficult to melt, and the tendency to crystallize increases, and it is easy to become cloudy when polished with fluorine-containing polishing powder.

[0036] Aluminum oxide (Al2O3) can improve the strength of the glass and the corrosion resistance to polishing liquid, and can greatly increase the strength of the glass, but it increases the viscosity of the glass and makes it difficult to clarify. It is an essential component. The mass percentage is preferably 12-20%. If the content is less than 12%, the corrosion resistance and strength of the glass are insufficient. If it is higher than 20%, the viscosity of the glass is too high, and it is difficult to clarify, the melting quality is reduced, and it will significantly affect the performance of the glass.

[0037] Sodium oxide (Na2O) is an essential component that significantly improves the melting of the glass. The mass percentage is preferably 12-16%. If the mass percentage is less than 12%, the melting of the glass is poor; if it is higher than 16%, the weather resistance of the glass becomes poor and it is easy to become cloudy.

[0038] Potassium oxide (K2O) can improve the melting of the glass and is an essential component. The mass percentage is preferably 2-5%, and it can produce a "mixed alkali effect" with sodium oxide to improve the performance of the glass. If the mass percentage is less than 2%, the melting of the glass is poor; if it is higher than 5%, the weather resistance of the glass becomes poor.

[0039] Magnesium oxide (MgO) can reduce the viscosity of the glass at high temperature, promote the melting and clarification of the glass, and is an essential component. If the mass fraction of MgO is less than 1%, the melting of the glass becomes poor and it is easy to become cloudy when polished; if the mass fraction of MgO is higher than 4%, the glass is easy to crystallize, and the material of the glass is too short to be shaped.

[0040] Zirconium oxide (ZrO2) can improve the weather resistance of the glass, but can increase the viscosity of the glass, and is not a necessary component; if the mass percentage is higher than 3%, the melting property of the glass deteriorates.

[0041] Boron oxide (B2O3) can reduce the high-temperature viscosity of the glass, and can reduce the thermal expansion coefficient of the glass, and plays a certain role in the chemical stability of the glass, and is a necessary component. If the mass percentage is less than 0.5%, the melting property of the glass is insufficient, and the chemical stability is poor; if the mass percentage is higher than 3.5%, the form of the glass in the glass changes, which makes the glass structure relaxed, resulting in poor chemical stability.

[0042] A method for preparing a low-fogging cover glass as described above, characterized in that it specifically comprises the following:

[0043] The main components of the glass are included, and the glass is melted by designing the glass components SiO2, Al2O3, Na2O, K2O, MgO, ZrO2, B2O3 to optimize the acid resistance index (R), and the polishing powder type, pH range are selected according to the acid resistance index (R) value for polishing, to obtain a low-fogging cover glass.

[0044] Specifically, it comprises the following:

[0045] 1) Raw material ratio: the raw materials are weighed according to the composition of the glass described above and mixed uniformly;

[0046] 2) Melting: after the above mixture is ground and mixed uniformly, it is placed in a platinum crucible, the platinum crucible is placed in a lifting furnace, heated to 1645℃, kept for 6.5h, then lowered to 1590℃, kept for another 1.5h, then poured into a rectangular graphite mold heated to 480℃, after hardening, transferred to an annealing furnace raised to 610℃, kept for 5h, then cooled to room temperature with the furnace;

[0047] 3) Cut into a thin sheet, polish both sides, the size of the polished glass is 150mm×70mm×0.6mm, and CNC processing is performed;

[0048] and according to the calculated acid resistance index (R), the appropriate polishing powder is selected, and the polishing powder and water are mixed at a ratio of 1:1.15, and the pH range is 5.0~7.0, and then polished.

[0049] The acid resistance index R is used to represent the anti-fogging effect, the larger the R is, the stronger the anti-fogging ability is, and it is suitable for polishing processes with acidic pH (pH≤7) and long polishing time; while the R is small, the anti-fogging ability is lacking, and a polishing process with neutral pH and short polishing time is needed.

[0050] The acid resistance index (R) is calculated by the following formula:

[0051]

[0052] In the above formula, A~G represent the mass percentage of each component (not counting the percentage sign, ranging from 0~100), the mass percentage of the glass, A is SiO2, B is Al2O3, C is Na2O, D is K2O, E is MgO, F is ZrO2, and G is B2O3.

[0053] MgO and ZrO2 have no effect on the acid resistance index of the glass.

[0054] R is preferably 53.5~67.5, if R is less than 53.5, the anti-fogging ability of the glass is insufficient, and only fluorine-free high cerium polishing powder can be used for polishing, which is high in cost and low in efficiency; if fluorine-containing polishing powder is used, fogging phenomenon is prone to occur; and if R is greater than 67.5, the anti-fogging ability is too strong, and under the same process, the surface is not polished locally, and the processing time needs to be extended, which is low in processing efficiency.

[0055] According to the different values of R, six kinds of polishing powders suitable therefor are selected for polishing treatment in the embodiments of the present application to form a polishing process for cover plate glass, as follows:

[0056] Polishing powder type / ingredient 1# 2# 3# 4# 5# 6# cerium oxide 62 60 58 57 65 82 lanthanum oxide 26 29 30 32 28 0.5 fluorine content 5 4 3 2 1 0 impurities 7 7 9 9 6 17.5 acid resistance index R 67.5~65.5 67.5~61.5 67.5~60 67.5~59 67.5~53.5 67.5~44.3

[0057] The corrosion of the polishing powder is mainly determined by the fluorine content. The glass with a higher acid resistance index has stronger anti-fogging ability, and high-fluorine polishing powder can be selected for polishing, which can polish bright in a short time, or polishing powder with low fluorine content (downward compatible) can be selected and the time is appropriately extended to achieve the polishing effect.

[0058] According to the compositions of the examples and comparative examples in Table 1, the corresponding batch materials are calculated and weighed based on 1500g of glass liquid.

[0059] After the above batch materials are ground and uniformly mixed, they are placed in a platinum crucible, the platinum crucible is placed in an elevator furnace, heated to 1645℃, kept for 6.5h, then lowered to 1590℃, kept for another 1.5h, then poured into a rectangular graphite mold heated to 480℃, and after hardening, transferred into an annealing furnace raised to 610℃, kept for 5h, and then cooled to room temperature with the furnace.

[0060] It is cut into a thin sheet, polished on both sides, and after polishing, the size of the glass is 150mm×70mm×0.6mm, and CNC processing is performed.

[0061] According to the R value of each embodiment, the polishing powder is selected, the polishing powder and water ratio is 1:1.15, the pH range is 5.0-7.0, and polishing is performed. The glass sample after CNC treatment is placed in a polishing mold, and the polishing process parameters are set, the pressure is 60 kgf, and the polishing time is 6-10 min.

[0062] After polishing is completed, the glass sample is washed with clean water, and then ultrasonic cleaning is performed in pure water for 15 min, and the glass sample is naturally dried.

[0063] Haze testing is performed by using a haze meter, and the glass surface is observed under strong light.

[0064] Table 1

[0065] Properties Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 SiO2 65 64 63.5 63 63 62.6 62.5 Al2O3 12 15.5 12 14 15 15.5 14 Na2O 16 13 14 14 13.5 13.5 14 K2O 3 2 3 5 3.2 3.2 3 MgO 2 1 2 2 2.3 2.2 2 ZrO2 1 1 2 1 1.3 1.2 1 B2O3 1 3.5 3.5 1 1.7 1.8 3.5 Σ 100 100 100 100 100 100 100 acid resistance index R 57.1 63.3 67.5 56.4 58.9 59.5 67.4 Polishing powder type 5# 2# 1# 5# 5# 4# 1# polishing powder F content 1 4 5 1 1 2 5 polishing liquid pH 5.0 7.0 7.0 6.0 6.5 7.0 6.0 polishing time (min) 10 8 6 10 10 8 6 haze 0.03% 0.04% 0.04% 0.03% 0.02% 0.03% 0.04% fogging 0.0% 0.0% 0.0% 0.0% 0.0% 0.0% 0.0% Properties Example 8 Example 9 Example 10 Example 11 Example 12 Example 13 Example 14 SiO2 62.5 62.5 62.5 62.3 62 61.7 61.4 Al2O3 15 18 16 14.2 15.5 16.8 15.5 Na2O 13 12 13 13.6 13.4 13.2 13.5 K2O 3 2 3.5 3.6 3.4 3.2 3.8 MgO 2 1.5 2.5 2.6 2.4 2.2 2.8 ZrO2 1 1 1 1.6 1.4 1.2 1.2 B2O3 3.5 3 1.5 2.1 1.9 1.7 1.8 Σ 100 100 100 100 100 100 100 acid resistance index R 65.5 60.4 57.2 61.9 60.2 58.5 60.4 Polishing powder type 1# 3# 5# 2# 4# 5# 3# polishing powder F content 5 3 1 4 2 1 3 polishing liquid pH 6.5 6.0 5.5 6.0 6.5 7.0 7.0 polishing time (min) 6 8 10 6 8 10 8 haze 0.04% 0.04% 0.02% 0.04% 0.03% 0.02% 0.04% fogging 0.0% 0.0% 0.0% 0.0% 0.0% 0.0% 0.0% Properties Example 15 Example 16 Example 17 Example 18 Example 19 Comparative Example 0 Comparative Example 1-1 SiO2 61.3 61 60.2 60 60 60 64.5 Al2O3 15.2 18 19.2 12 18.5 18.5 20 Na2O 14 12.5 12.8 15 13.5 13.5 12 K2O 3.5 3.5 3.8 4.8 4 4 2 MgO 2.5 2 2.2 4 2 2 1 ZrO2 1.5 1 0.8 3 0.5 0.5 0 B2O3 2 2 1 1.2 1.5 1.5 0.5 Σ 100 100 100 100 100 100 100 acid resistance index R 62.0 59.2 53.5 60.2 58.6 58.6 44.3 Polishing powder type 2# 4# 5# 3# 5# / 6# polishing powder F content 4 2 1 3 1 / 0 polishing liquid pH 6.5 7.0 5.0 5.0 5.5 / 7.0 polishing time (min) 6 8 10 8 10 / 10 haze 0.04% 0.03% 0.02% 0.04% 0.03% 0.01% 0.06% fogging 0.0% 0.0% 0.0% 0.0% 0.0% 0.0% 0.5% Properties Comparative Example 1-2 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 SiO2 64.5 60 59 60.5 64 63.5 64 Al2O3 20 14 19.5 11.5 15.5 12 15.5 Na2O 12 16 13.5 15 13 14 13 K2O 2 4.5 4 4.8 2 3 2 MgO 1 1 2 4 1 2 1 ZrO2 0 1 0.5 3 1 2 1 B2O3 0.5 3.5 1.5 1.2 3.5 3.5 3.5 Σ 100 100 100 100 100 100 100 acid resistance index R 44.3 72.8 58.6 60.2 63.9 67.5 63.9 Polishing powder type 5# 1# 5# 3# 2# alumina 2# polishing powder F content 1 5 1 3 4 0 4 polishing liquid pH 6.0 6.0 5.0 6.0 2.0 5.0 7.0 polishing time (min) 6 6 10 8 6 6 20 haze 0.27% 0.25% 0.18% 0.14% 0.22% 0.31% 0.10% fogging 31.2% 16.2% 18.6% 20.5% 48.3% 52.8% 12.5%

[0066] In Table 1, Examples 1-19 all meet the requirements of the present application, and according to the test results, the optical performance of the glass after polishing treatment with the adapted polishing powder is still at an ideal level, and the glass does not become hazy.

[0067] For the glass of the present application, R is preferably 53.5-67.5.

[0068] Comparative Example 0 is a production line glass that has not been polished with polishing powder, and the optical performance of the glass after polishing treatment according to the present application is still close to that of Comparative Example 0, indicating that the polishing treatment has little effect.

[0069] Comparative Example 1-1 has a composition that meets the requirements of the present application, but the acid resistance index R is low, and the acid resistance index R is only 44.3, which is lower than the preferred range of 53.5 of the present application. When 5# (fluorine-containing) polishing powder is used for polishing, the haze is high, and when observed under strong light, the glass has a high haze rate. If 6# (fluorine-free high cerium) polishing powder (Comparative Example 1-2) is used, the haze is significantly reduced (0.06%), which is at an acceptable level, but is still higher than that of the examples of the present application; the haze rate is significantly reduced (0.5%), but is not 0. This indicates that it can be applicable to fluorine-free high cerium polishing powder, but the performance is poorer than that of the examples of the present application.

[0070] Comparative Example 2 has a composition that meets the requirements of the present application, but the acid resistance index is too high, and the acid resistance index R is 72.8, which is higher than the preferred range of 67.5 of the present application, and 1# polishing powder is selected, and it still cannot be polished bright after 10 min, and the polishing time needs to be extended to 15 min, which reduces the polishing efficiency.

[0071] Comparative Example 3 is almost identical to Example 19, and the main difference is that the mass percentage of SiO2 in Comparative Example 3 is less than 60%, at which time the glass-forming performance of SiO2 is poor, and the strength and weather resistance are not enough, and the corrosion resistance of the glass to the polishing liquid is reduced, and the polishing effect is not ideal.

[0072] Comparative Example 4 is almost identical to Example 18, the main difference is that the mass percentage of Al2O3 in Comparative Example 4 is less than 12%, and the corrosion resistance and strength of the glass are insufficient, resulting in an increase in haze and poor polishing effect.

[0073] Comparative Example 5 is almost identical to Example 2, the main difference is that the pH of the polishing liquid in Comparative Example 5 is 2.0, which is not within the pH (5.0-7.0) range of the polishing process of the present application, and the corrosion is greater under strong acid, resulting in an increase in haze and haze.

[0074] Comparative Example 6 is almost identical to Example 3, the main difference is that the polishing in Comparative Example 6 is polished with alumina powder, which has a hardness of 9 and is too hard, forming a large number of regular particle-shaped indentations on the glass surface, resulting in an increase in haze and poor polishing effect.

[0075] Comparative Example 7 is almost identical to Example 2, the main difference is that the polishing process time in Comparative Example 6 is 20 min, which is not within the polishing time range of 6-10 min in the polishing process of the present application, and the prolonged polishing time also results in a poor polishing effect.

[0076] The above uses the composition of the glass to be designed and limited to be made, and different polishing powders are adapted according to the acid resistance index (R) to perform the polishing process, which greatly reduces the risk of glass haze, improves the processing yield, on the other hand, the processed glass has good anti-haze effect, while the performance is stable, which can greatly increase the service life of the product, realizes a low haze risk electronic cover plate glass and its preparation method and polishing method, and is suitable for mobile phone cover plate, protection, chip packaging and 5G communication equipment glass substrate.

[0077] It is obvious to those skilled in the art that the present application is not limited to the details of the above exemplary embodiments, and can be implemented in other specific forms without departing from the spirit or essential characteristics of the present application. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting, and the scope of the present application is defined by the appended claims rather than the above description, and all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the present application.

[0078] In addition, it should be understood that although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be properly combined to form other embodiments that those skilled in the art can understand.

Claims

1. A cover glass, characterized in that, The glass comprises the following components by mass percentage: 60%~65% SiO2, 12%~20% Al2O3, 12%~16% Na2O, 2%~5% K2O, 1%~4% MgO, 0%~3% ZrO2, and 0.5%~3.5% B2O3, for a total mass of 100%.

2. A method for preparing a low-obscuration-risk cover glass as described in claim 1, characterized in that, Specifically, it includes the following: Glass with low turbidity was obtained by designing glass components SiO2, Al2O3, Na2O, K2O, MgO, ZrO2, and B2O3 to melt glass and optimize its acid resistance index (R). Polishing powder type and pH range were selected according to the acid resistance index (R) value for polishing.

3. The method for preparing low-blurring-risk cover glass according to claim 2, characterized in that, Specifically, it includes the following: 1) Raw material ratio: Weigh the raw materials according to the glass composition described above and mix them evenly; 2) Melting: After grinding and mixing the above-mentioned materials evenly, place them in a platinum crucible, place the platinum crucible in a lifting furnace, heat to 1645℃, hold for 6.5h, then reduce to 1590℃, hold for another 1.5h, and then pour it into a rectangular graphite mold that has been heated to 480℃. After it hardens, transfer it to an annealing furnace that has been raised to 610℃, hold for 5h, and then cool to room temperature with the furnace. 3) Cut it into thin slices, grind and polish on both sides. The size of the polished glass is 150mm×70mm×0.6mm, and then CNC process it. Based on the calculated acid resistance index (R), a suitable polishing powder is selected, with the polishing powder to water ratio being 1:1.15 and the pH range being 5.0~7.0, and then polished.

4. The method for preparing low-blurring-risk cover glass according to claim 3, characterized in that, The acid resistance index (R) is calculated using the following formula: In the above formula, A~G represent the mass percentage of each component (excluding the percentage sign, ranging from 0 to 100), the mass percentage of glass, where A is SiO2, B is Al2O3, C is Na2O, D is K2O, E is MgO, F is ZrO2, and G is B2O3.

5. The method for preparing low-blurring-risk cover glass according to claim 4, characterized in that, In step 3), a suitable polishing powder is selected according to the following acid resistance index (R):

6. The method for preparing low-obscuration-risk cover glass according to claim 4, characterized in that, In step 3), Place the CNC-processed glass sheet into the polishing mold, set the polishing process parameters, select a pressure of 60 kgf, and a polishing time of 6 to 10 minutes; After polishing, rinse with clean water, then use an ultrasonic cleaner to ultrasonically clean in pure water for 15 minutes, and then remove and air dry.

7. A method for polishing cover glass, characterized in that, The polishing method formed by the method described in any one of claims 2 to 6.

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