Ion beam processing equipment
By moving the electrode head device along a first direction within the ion beam processing equipment, the problems of inconvenient cleaning and maintenance of the vacuum chamber and electrode head device are solved, achieving convenient operation and reducing the difficulty of equipment maintenance.
Patent Information
- Application Number
- CN202511454195.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-11
- Publication Date
- 2026-01-27
AI Technical Summary
In existing ion beam processing equipment, cleaning the vacuum chamber and maintaining the electrode device are inconvenient, especially since the vacuum chamber is not removable and has a small space, making it difficult to effectively clean and improve it.
An ion beam processing device is designed, wherein the electrode head can move along a first direction to change its relative position with the excitation components, allowing the electrode head to be pulled out from between the excitation components in the first state and enter a more open space for easy cleaning and improvement; in the second state, it is located between the excitation components to perform isotope separation or ion beam acceleration.
It improves the cleanliness of the electrode head device and enhances the ease of operation, reduces the difficulty of operation, avoids unnecessary impact on equipment performance, and simplifies the maintenance process.
Smart Images
Figure CN121419097A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of ion beam processing technology, and more particularly to an ion beam processing device. Background Technology
[0002] Generally, ion beams are accelerated using a cyclotron to increase their speed, or electromagnetically separated using an electromagnetic separator to increase their abundance. High-abundance stable isotopes have been widely used in various fields such as national defense, medicine, communications, and nuclear batteries. For example, Yb176 and Sr88, as precursor materials for the radioactive nuclides Lu177 and Sr89, are widely used in the treatment of cancers such as prostate cancer and breast cancer. Ni63 isotopes are used in the research and development of micro nuclear batteries, and rubidium atomic clocks with Rb87 as the core material have been applied to the BeiDou satellite navigation system.
[0003] In related technologies, the vacuum chambers of electromagnetic separators and cyclotrons need to be regularly maintained and serviced; however, this presents the problem of inconvenient operation. Summary of the Invention
[0004] In view of this, embodiments of this application provide an ion beam processing device, wherein the electrode head device can move along a first direction, thereby changing the relative position of the electrode head device and the excitation component, and improving the convenience of cleaning and / or improving the electrode head device.
[0005] This application provides an ion beam processing device, including: Two excitation components are arranged at intervals along the vertical direction; An electrode device, comprising a vacuum chamber and a magnetic field pad, wherein the magnetic field pad is disposed in the vacuum chamber, the electrode device is capable of moving along a first direction, and the electrode device has a first state and a second state, wherein the first direction is perpendicular to the up-down direction; When the pole head device is in the first state, at least two of the excitation components are extracted from the pole head device. The pole head device is in the second state, and the pole head device is located between the two excitation components.
[0006] In some embodiments, the pole head device is spaced apart from each of the excitation components.
[0007] In some embodiments, the ion beam processing apparatus includes a pad, which is disposed between the electrode head device and each of the excitation components when the electrode head device is in the second state.
[0008] In some embodiments, the ion beam processing apparatus includes a roller rotatably connected to the electrode head assembly, and the roller makes rolling contact with the excitation assembly below it.
[0009] In some embodiments, the ion beam processing apparatus includes a locking assembly disposed below the excitation assembly. The locking assembly is capable of locking the roller to hold the electrode head in the second state, and the locking assembly is capable of unlocking the roller to allow the roller to drive the electrode head to move along the first direction.
[0010] In some embodiments, the locking assembly includes a stop portion detachably connected to the excitation assembly below; the stop portion is located on one side of the roller along the first direction to lock the roller; removing the stop portion unlocks the roller.
[0011] In some embodiments, the excitation assembly includes a first magnetic conductor and a coil, the coil being wound around the first magnetic conductor, and the pole head device includes two magnetically conductive cover plates spaced apart along the vertical direction. The two magnetically conductive cover plates form part of the sidewall of the vacuum chamber, and each magnetically conductive cover plate corresponds to one excitation assembly. Two magnetic field pads are respectively disposed on the two magnetically conductive cover plates. When the pole head device is in the second state, with a plane perpendicular to the vertical direction as the projection plane, the projection of the first magnetic conductor is located within the projection range of the magnetically conductive cover plate.
[0012] In some embodiments, the excitation assembly includes a second magnetic conductor located between the first magnetic conductor and the magnetic cover plate. When the pole head device is in the second state, with a plane perpendicular to the vertical direction as the projection plane, the projection of the magnetic cover plate is located within the projection range of the second magnetic conductor. In some embodiments, the ion beam processing device includes a main body, the main body including a receiving space and an inlet / outlet communicating with the receiving space, two excitation components disposed within the receiving space, and the electrode head device moving along the first direction to enter or exit the receiving space through the inlet / outlet.
[0013] In some embodiments, the body includes: Two crossbeams are spaced apart along the vertical direction; Two columns are spaced apart along a second direction, and each column is connected to two crossbeams to jointly define the receiving space and the inlet / outlet. The first direction, the second direction, and the vertical direction are perpendicular to each other.
[0014] The ion beam processing equipment provided in this application embodiment integrates the vacuum chamber and the magnetic field pad. When cleaning or improvement of the electrode device is required, the electrode device can move to a first state, in which case it is pulled out from between the two excitation components and moved to a space outside the two excitation components. This facilitates convenient cleaning or improvement operations and reduces the difficulty of the operation. After cleaning or improvement is completed, the electrode device can move to a second state, in which case it is located between the two excitation components and can perform isotope separation or ion beam acceleration. The electrode device can move along a first direction to switch between the first and second states, thereby changing the relative position of the electrode device and the excitation components and improving the convenience of cleaning and / or improvement operations. Attached Figure Description
[0015] Figure 1 This is a cross-sectional schematic diagram of an ion beam processing device in some embodiments of this application; Figure 2 This is a cross-sectional schematic diagram of the electrode head device in some embodiments of this application; Figure 3 for Figure 1 Enlarged view of point A in the middle; Figure 4 This is a schematic diagram of a partial structure of an ion beam processing device in some embodiments of this application.
[0016] Explanation of reference numerals in the attached figures 1. Excitation assembly; 11. First magnetic conductor; 12. Coil; 13. Second magnetic conductor; 14. Support component; 101. First excitation assembly; 102. Second excitation assembly; 2. Pole head device; 2a. Vacuum chamber; 21. Magnetic field pad; 22. Magnetic conductor cover plate; 23. Side plate; 3. Pad block; 4. Roller; 5. Locking assembly; 51. Stop part; 6. Main body; 6a. Accommodation space; 61. Crossbeam; 62. Column. Detailed Implementation
[0017] The embodiments of this application will be described in further detail below with reference to the accompanying drawings and examples. The following examples are used to illustrate this application, but should not be used to limit the scope of this application.
[0018] The various specific technical features and embodiments described in the detailed embodiments can be combined in any suitable manner without contradiction. For example, different combinations of specific technical features / embodiments can form different implementation methods. To avoid unnecessary repetition, the various possible combinations of various specific technical features / embodiments in this application will not be described separately. In addition, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The application will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0019] It should be noted that in the embodiments of this application, the number of multiple representations is two or more.
[0020] In related technologies, the vacuum chamber needs to be cleaned regularly or the electrode head needs to be improved, such as by padding. However, the existing vacuum chamber is fixed in the main structure and the electrode head and the main structure are integrated. The space inside the main structure is relatively small, making it difficult to clean the vacuum chamber or to repair and improve the electrode head. In some cases, if the electrode head needs to be repaired or improved, large lifting tools are required to lift it and the main structure needs to be completely dismantled in order to remove the electrode head. Repeated disassembly and installation will have a significant impact on the performance of the equipment.
[0021] Please see Figures 1 to 4 This application provides an ion beam processing device, which includes two excitation components 1 and an electrode head device 2. The two excitation components 1 are spaced apart along the vertical direction; the electrode head device 2 includes a vacuum chamber 2a and a magnetic field pad 21, the magnetic field pad 21 being disposed within the vacuum chamber 2a. The electrode head device 2 is capable of moving along a first direction and has a first state and a second state, the first direction being perpendicular to the vertical direction; in the first state, at least a portion of the electrode head device 2 is withdrawn from the two excitation components 1; in the second state, the electrode head device 2 is located between the two excitation components 1.
[0022] The ion beam processing equipment in this application embodiment can be a cyclotron or an electromagnetic separator.
[0023] Vacuum chamber 2a is used to provide a vacuum environment, reduce the interference of air on the movement of the ion beam, and improve the stability of the ion beam deflection in the magnetic field.
[0024] It should be noted that the vacuum chamber 2a can be evacuated to the required vacuum level using a vacuum pumping device.
[0025] An electric field and / or magnetic field exist within vacuum chamber 2a. The electric field provides energy to the ion beam within vacuum chamber 2a for acceleration, while the magnetic field is used to regulate the direction of motion of the ion beam.
[0026] Taking a cyclotron as an example, there are electric and magnetic fields in the vacuum chamber 2a. The electric field is used to provide energy to increase the speed of the ion beam, and the magnetic field is used to deflect the direction of the ion beam so that the ion beam can pass through the electric field repeatedly.
[0027] Taking an electromagnetic separator as an example, a magnetic field exists within the vacuum chamber 2a. This magnetic field is used to deflect the direction of motion of the ion beam, achieving isotope separation through mass differences. Specifically, different isotopes of the same element have different masses, and ion beams with different mass-to-charge ratios (mass to charge ratio) will have different deflection radii under the same magnetic field. By utilizing the magnetic field, deflection, separation, and focusing are achieved, thereby realizing the separation of isotopes.
[0028] For example, the ion beam enters the vacuum chamber 2a, where isotope separation is achieved under the influence of a magnetic field and / or acceleration is achieved under the influence of an electric field.
[0029] Two excitation components 1 are used to generate a magnetic field within the vacuum chamber 2a.
[0030] The magnetic field pad 21 is used to adjust the field pattern of the magnetic field generated by the excitation assembly 1, thereby optimizing the magnetic field distribution.
[0031] The pole head device 2 can move in a first direction, so that the pole head device 2 can move approximately horizontally to switch between a first state and a second state, thereby changing the relative position of the pole head device 2 and the excitation assembly 1.
[0032] When the pole head device 2 is in the first state, at least a portion of the pole head device 2 has two excitation components 1 removed. This means that when the pole head device 2 is in the first state, a portion or all of the structure of the pole head device 2 has two excitation components 1 removed.
[0033] Understandably, compared to the second state, in the first state, more of the structure of the pole head device 2 is located outside the two excitation components 1.
[0034] The number of magnetic field pads 21 is not limited. For example, the number of magnetic field pads 21 can be one or more. For example, the number of magnetic field pads 21 can be two, three, or four, etc.
[0035] The ion beam processing equipment provided in this application embodiment integrates the vacuum chamber 2a and the magnetic field pad 21. When cleaning or improvement of the electrode head device 2 is required, the electrode head device 2 can be moved to a first state, in which case the electrode head device 2 is pulled out from between the two excitation components 1 and moved to a space outside the two excitation components 1, thereby facilitating convenient cleaning or improvement operations and reducing the difficulty of the operation. After cleaning or improvement is completed, the electrode head device 2 can be moved to a second state, in which case the electrode head device 2 is located between the two excitation components 1, and isotope separation or ion beam acceleration can be performed. The electrode head device 2 can move along a first direction to switch between the first and second states, thereby changing the relative position of the electrode head device 2 and the excitation components 1, improving the convenience of cleaning and / or improving the electrode head device 2.
[0036] In some embodiments, please refer to Figure 1 The ion beam processing equipment includes a main body 6, which includes a receiving space 6a and an inlet and outlet connected to the receiving space 6a. Two excitation components 1 are disposed in the receiving space 6a. The electrode head device 2 moves along a first direction to enter or exit the receiving space 6a through the inlet and outlet.
[0037] Specifically, the entrance and exit are located on one side of the accommodating space 6a along the first direction.
[0038] In this embodiment, when cleaning or modification of the electrode tip device 2 is required, the electrode tip device 2 moves along a first direction to be extracted from the receiving space 6a through the inlet and outlet. The electrode tip device 2 moves to a first state, where at least a portion of the electrode tip device 2 is located outside the receiving space 6a. The space outside the receiving space 6a is more open, thus preventing the main body 6 from obstructing the operator from cleaning or modifying the electrode tip device 2 to a certain extent. After cleaning or modification is completed, the electrode tip device 2 moves along the first direction to enter the receiving space 6a through the inlet and outlet. The electrode tip device 2 moves to a second state, where the entire structure of the electrode tip device 2 is located inside the receiving space 6a.
[0039] In some embodiments, please refer to Figure 1 The main body 6 includes two crossbeams 61 and two columns 62. The two crossbeams 61 are spaced apart along the vertical direction; the two columns 62 are spaced apart along the second direction. Each column 62 connects to the two crossbeams 61 to jointly define the accommodating space 6a and the entrance / exit. The first direction, the second direction and the vertical direction are perpendicular to each other.
[0040] In this embodiment, the two crossbeams 61 and the two columns 62 form a frame structure, which is lightweight and can well support the excitation assembly 1 and the pole head device 2.
[0041] The specific shape of the crossbeam 61 is not limited; the crossbeam 61 can be generally a column-shaped or plate-shaped structure extending in the horizontal direction. For example, the crossbeam 61 is generally a column-shaped or plate-shaped structure with a quadrilateral cross-section.
[0042] The specific shape of the column 62 is not limited; the column 62 can be generally a column-shaped or plate-shaped structure extending in the vertical direction. For example, the column 62 is generally a column-shaped or plate-shaped structure with a quadrilateral cross-section.
[0043] In some embodiments, please refer to Figure 1 , Figure 3 and Figure 4 The pole head device 2 is spaced apart from each excitation component 1.
[0044] For ease of description, in this application, the excitation component 1 located above is defined as the first excitation component 101, and the excitation component 1 located below is defined as the second excitation component 102.
[0045] The pole head device 2 is spaced apart from the first excitation component 101, that is, there is a gap greater than zero between the pole head device 2 and the first excitation component 101.
[0046] The pole head device 2 is spaced apart from the second excitation assembly 102, that is, there is a gap greater than zero between the pole head device 2 and the second excitation assembly 102.
[0047] The specific size of the gap can be determined based on various factors such as power consumption and the movement requirements of the electrode head device 2, and this application does not impose any restrictions.
[0048] In this embodiment, the pole head device 2 and the two excitation components 1 have a gap greater than zero. During the movement of the pole head device 2 along the first direction, the pole head device 2 and the excitation components 1 do not come into contact, thereby avoiding contact friction between the pole head device 2 and the excitation components 1 to a certain extent.
[0049] In some embodiments, please refer to Figure 3 The ion beam processing equipment includes a pad 3. When the electrode head device 2 is in the second state, the pad 3 is placed between the electrode head device 2 and each excitation component 1.
[0050] Specifically, when the pole head device 2 is in the second state, a pad 3 is provided between the upper surface of the pole head device 2 and the lower surface of the first excitation assembly 101, and a pad 3 is provided between the lower surface of the pole head device 2 and the upper surface of the second excitation assembly 102.
[0051] The number of pads 3 is not limited, and there can be multiple pads 3. For example, one or more pads 3 are provided between the upper surface of the pole head device 2 and the lower surface of the first excitation assembly 101, and one or more pads 3 are provided between the lower surface of the pole head device 2 and the upper surface of the second excitation assembly 102.
[0052] In some cases, when it is necessary to switch the electrode head device 2 from the second state to the first state, that is, when it is necessary to move the electrode head device 2, the pad block 3 can be removed first, and then the electrode head device 2 can be moved.
[0053] In some cases, when it is necessary to switch the electrode head device 2 from the second state to the first state, that is, when it is necessary to move the electrode head device 2, the pad block 3 may not be removed, and the electrode head device 2 may be moved directly.
[0054] For example, the pad 3 can abut against the pole head device 2 and the excitation assembly 1. Specifically, the pad 3 can abut against the opposing surfaces of the pole head device 2 and the excitation assembly 1.
[0055] In this embodiment, when the pole head device 2 is in the second state, the pad block 3 is supported between the pole head device 2 and each excitation component 1, which can maintain the gap between the pole head device 2 and each excitation component 1 well.
[0056] The pad 3 is a non-magnetic structure made of non-magnetic material. The non-magnetic material of the pad 3 includes, but is not limited to, 304 stainless steel or 316 stainless steel.
[0057] In some embodiments, please refer to Figure 1 , Figure 2 and Figure 4 The ion beam processing equipment includes a roller 4, which is rotatably connected to the electrode head device 2, and the roller 4 makes rolling contact with the excitation assembly 1 below.
[0058] In this embodiment, the roller 4 can rotate relative to the second excitation assembly 102 and also provides upward support for the pole head device 2, allowing the pole head device 2 to be spaced apart from each of the excitation assemblies 1. When it is necessary to move the pole head device 2, a force can be applied to the pole head device 2, causing the roller 4 to drive the pole head device 2 to move along the first direction. In this way, the excitation assembly 1 below the roller 4 makes rolling contact, resulting in low friction.
[0059] In some embodiments, please refer to Figure 4 The ion beam processing equipment includes a locking component 5, which is disposed below the excitation component 1. The locking component 5 can lock the roller 4, so that the electrode head device 2 is held in a second state. The locking component 5 can unlock the roller 4, so that the roller 4 can drive the electrode head device 2 to move in a first direction.
[0060] In this embodiment, the locking component 5 locks the roller 4, preventing the roller 4 from rotating freely, thereby keeping the electrode head device 2 in the second state. This prevents the roller 4 from moving the electrode head device 2 to a certain extent, thus improving reliability. When it is necessary to move the electrode head device 2, for example, when it is necessary to clean or improve the electrode head device 2, the locking component 5 can unlock the roller 4, allowing the roller 4 to rotate freely, so that the roller 4 can move the electrode head device 2 in the first direction to the first state.
[0061] In some embodiments, please refer to Figure 4 The locking assembly 5 includes a stop part 51, which is detachably connected to the excitation assembly 1 below. The stop part 51 is located on one side of the roller 4 along the first direction to lock the roller 4. The stop part 51 is removed to unlock the roller 4.
[0062] In this embodiment, the stop part 51 is detachably connected to the second excitation assembly 102. The stop part 51 is located on one side of the roller 4 along the first direction. In this way, the stop part 51 is located on the movement path of the roller 4. The stop part 51 stops the roller 4 and restricts the rotation of the roller 4, thereby achieving the purpose of locking the roller 4. After the stop part 51 is removed, the roller 4 is no longer stopped by the stop part 51, thereby achieving the purpose of unlocking the roller 4.
[0063] In some embodiments, stop portions 51 can be provided on both sides of any one of the rollers 4 along the first direction to lock the roller 4.
[0064] In some embodiments, stop portions 51 may be provided on both sides of the plurality of rollers 4 along the first direction to lock the rollers 4.
[0065] In some embodiments, please refer to Figure 1 , Figure 2 and Figure 4 At least one roller 4 is provided on both sides of the electrode head device 2 along the second direction.
[0066] In some embodiments, please refer to Figure 1 , Figure 2 and Figure 4 The pole head device 2 is provided with a set of rollers on both sides along the second direction. Each set of rollers includes multiple rollers 4. Two stop parts 51 are provided between any two rollers 4 in the set of rollers, and each stop part 51 corresponds to one roller 4.
[0067] A set of rollers includes two rollers 4, and two stop parts 51 are provided between the two rollers 4, with each stop part 51 corresponding to one roller 4.
[0068] For example, the first side and the second side of the first direction are opposite sides. The pole head device 2 moves toward the first side to be pulled out from between the two excitation components 1; the pole head device 2 moves toward the second side to be moved between the two excitation components 1; when it is necessary to pull out the pole head device 2, the stop part 51 away from the inlet and outlet can be removed, so that the pole head device 2 can move toward the first side until the roller 4 abuts against the stop part 51 near the inlet and outlet that has not been removed, and the operator can know that the pole head device 2 has been pulled out to the maximum position, so that the pole head device 2 can be cleaned or improved; after cleaning or improvement, the pole head device 2 can be moved toward the second side until the roller 4 abuts against the stop part 51 near the inlet and outlet that has not been removed, and the operator can know that the pole head device 2 is now located between the two excitation components 1.
[0069] Here, both stop parts 51 can be removed as needed, so that the pole head device 2 can have a larger stroke.
[0070] In this embodiment, the two stop portions 51 restrict the movement of the two rollers 4 at both ends in the first direction, thereby locking the roller assembly. When it is necessary to remove the electrode head device 2, only one stop portion 51 can be removed, and the other stop portion 51 can be used to stop the rollers 4 to limit the movement stroke of the electrode head device 2 in the first direction, which is simple and convenient; or both stop portions 51 can be removed to increase the movement stroke of the electrode head device 2.
[0071] The way the stop portion 51 is detachably connected to the excitation assembly 1 below is not limited. For example, it can be a screw connection, bolt connection, threaded connection and / or snap-fit connection, etc.
[0072] Taking the connection between the stop part 51 and the excitation assembly 1 below, i.e. the second excitation assembly 102, via screws as an example, the stop part 51 can be removed from the excitation assembly 1 below by removing the screws, thereby unlocking the roller 4.
[0073] In some embodiments, the stop portion 51 includes a stop surface, which may be a vertical surface facing the roller 4.
[0074] In some embodiments, please refer to Figures 1 to 3 The magnetic field pad 21 is connected to the upper or lower surface of the vacuum chamber 2a.
[0075] In some embodiments, please refer to Figures 1 to 4The excitation assembly 1 includes a first magnetic conductor 11 and a coil 12. The coil 12 is wound around the first magnetic conductor 11. The pole head device 2 includes two magnetic conductor covers 22 spaced apart along the vertical direction. The two magnetic conductor covers 22 form part of the sidewall of the vacuum chamber 2a. Each magnetic conductor cover 22 corresponds to one excitation assembly 1. Two magnetic field pads 21 are respectively disposed on the two magnetic conductor covers 22. When the pole head device 2 is in the second state, the projection of the first magnetic conductor 11 is located within the projection range of the magnetic conductor cover 22, with the plane perpendicular to the vertical direction as the projection plane.
[0076] Coil 12 is used to generate a magnetic field when energized.
[0077] The first magnetic conductive element 11 is used to conduct magnetic fields.
[0078] The magnetic cover plate 22 serves to conduct magnetic fields.
[0079] In this embodiment, the plane perpendicular to the vertical direction is used as the projection plane. The projection of the first magnetic conductive element 11 is located within the projection range of the magnetic conductive cover plate 22. The coil 12 is wound around the first magnetic conductive element 11. The area of the first magnetic conductive element 11 is smaller than the area of the magnetic conductive cover plate 22, which can reduce the inner diameter of the coil 12 and save the material of the coil 12.
[0080] The first magnetic conductive element 11 is made of a magnetically conductive material. For example, the material of the first magnetic conductive element 11 includes, but is not limited to, DT4 (steel with an iron content of more than 99.5%), No. 10 steel, etc., which have relatively high magnetic permeability.
[0081] The magnetic cover plate 22 is made of magnetically conductive material. For example, the material of the magnetic cover plate 22 includes, but is not limited to, DT4 (steel with an iron content of more than 99.5%), No. 10 steel, etc., which have relatively high magnetic permeability.
[0082] It is understandable that the materials of the first magnetic conductive element 11 and the magnetic conductive cover plate 22 may be the same or different.
[0083] The magnetic field pad 21 and the magnetic cover plate 22 can be detachably or non-detachably connected.
[0084] For example, the magnetic field pad patch 21 can be detachably connected to the magnetic cover plate 22, so that the magnetic field pad patch 21 can be replaced according to improvement or maintenance needs.
[0085] In some embodiments, please refer to Figures 1 to 4 The pole head device 2 includes a side plate 23, which is a hollow ring with openings at both the top and bottom. Two magnetic cover plates 22 respectively close the openings at the top and bottom of the side plate 23 to jointly define the vacuum chamber 2a.
[0086] Using a plane perpendicular to the vertical direction as the projection plane, the side plate 23 can be a circular ring, an elliptical ring, or a polygonal ring. Polygonal rings include, but are not limited to, quadrilateral rings or pentagonal rings, etc.
[0087] In this embodiment, the side plate 23 constitutes another part of the side wall of the vacuum chamber 2a, and the side plate 23 is a non-magnetic structure made of non-magnetic material.
[0088] The non-magnetic materials of the side plate 23 include, but are not limited to, 304 stainless steel or 316 stainless steel, etc.
[0089] In some embodiments, please refer to Figures 1 to 4 The excitation assembly 1 includes a second magnetic conductor 13, which is located between the first magnetic conductor 11 and the magnetic cover plate 22. When the pole head device 2 is in the second state, the projection of the magnetic cover plate 22 is located within the projection range of the second magnetic conductor 13, with the plane perpendicular to the up and down direction as the projection plane.
[0090] In this embodiment, the plane perpendicular to the vertical direction is used as the projection plane. The projection of the first magnetic conductive element 11 is located within the projection range of the magnetic conductive cover plate 22, and the projection of the magnetic conductive cover plate 22 is located within the projection range of the second magnetic conductive element 13. That is, the projected area of the first magnetic conductive element 11 is smaller than the projected area of the magnetic conductive cover plate 22, and the projected area of the magnetic conductive cover plate 22 is smaller than the projected area of the second magnetic conductive element 13. In this way, the magnetic field generated by the excitation assembly 1 can effectively cover the magnetic conductive cover plate 22.
[0091] In some embodiments, please refer to Figure 1 and Figure 4 Roller 4 is located outside vacuum chamber 2a and is rotatably connected to the peripheral wall of vacuum chamber 2a.
[0092] The circumferential sidewall of vacuum chamber 2a is the circumferential sidewall surrounding vacuum chamber 2a in the vertical direction.
[0093] For example, the roller 4 is rotatably connected to the side plate 23.
[0094] In some embodiments, please refer to Figures 1 to 4 The excitation assembly 1 located below includes a support member 14, which is connected to the second magnetic conductor 13. The roller 4 makes rolling contact with the support member 14, and the support member 14 is a non-magnetic structure.
[0095] For example, the two support members 14 are respectively connected to the two ends of the second magnetic conductor 13 of the second excitation assembly 102 along the second direction.
[0096] The excitation assembly 1 located at the top may be without the support member 14.
[0097] In this embodiment, the support member 14 is a non-magnetic structure used to support the roller 4 upward. The support member 14 does not affect the field shape of the magnetic field. The roller 4 rolls relative to the support member 14, thereby driving the pole head device 2 to move along the first direction.
[0098] The support member 14 is a non-magnetic structure made of non-magnetic material. The non-magnetic material of the support member 14 includes, but is not limited to, 304 stainless steel or 316 stainless steel.
[0099] In some embodiments, part of the sidewall of the vacuum chamber 2a can be disassembled. Thus, when at least part of the excitation assembly 1 and the receiving space 6a are extracted from the pole head device 2, part of the sidewall of the vacuum chamber 2a can be disassembled from outside the excitation assembly 1 and the receiving space 6a, so that the operator does not have to operate in a confined and dangerous space, reducing the difficulty of the operation.
[0100] In some embodiments, the two magnetic cover plates 22 are detachably connected to the side plate 23.
[0101] In this embodiment, the magnetic cover plate 22 can be removed from the side plate 23 when the pole head device 2 is in the first state. This allows the magnetic cover plate 22 and the magnetic field pad 21 to be quickly removed, and also allows the internal space of the vacuum chamber 2a to be easily opened, thereby facilitating the cleaning of the inside of the vacuum chamber 2a.
[0102] The magnetic cover 22 and the side plate 23 can be detachably connected in any way. For example, it can be a screw connection, bolt connection, threaded connection and / or snap-fit connection, etc.
[0103] In some embodiments, the magnetic cover plate 22 and the side plate 23 can be sealed with a sealant.
[0104] The seal can be a sealing ring that surrounds the edge of the magnetic cover plate 22.
[0105] The material of the seal is not limited, but includes, but is not limited to, rubber and / or silicone, etc.
[0106] In some embodiments, the ion beam processing device includes an ion source and a receiver, the ion source being detachably connected to the electrode head device 2, and the receiver being detachably connected to the electrode head device 2.
[0107] The ion source is used to provide an ion beam to the vacuum chamber 2a.
[0108] For example, the ion source can heat and vaporize the raw materials inside, and then ionize them by collision with electrons in the discharge chamber of the ion source to form plasma. After being extracted by the electrode system, it forms an ion beam.
[0109] Plasma can include free electrons, ions, and neutral particles, and is electrically neutral overall.
[0110] The receiver is used to receive isotopes separated by the magnetic field inside vacuum chamber 2a.
[0111] In some embodiments, both the ion source and the receiver can be existing ion sources and receivers.
[0112] In the description of this specification, the references to the terms "an embodiment," "some embodiments," and "exemplary" refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the embodiments of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.
[0113] The various embodiments / implementations provided in this application can be combined with each other without creating contradictions. The above descriptions are merely preferred embodiments of this application and are not intended to limit this application. For those skilled in the art, this application can have various modifications and variations. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. An ion beam processing device, characterized in that, include: Two excitation components are arranged at intervals along the vertical direction; An electrode device, comprising a vacuum chamber and a magnetic field pad, wherein the magnetic field pad is disposed in the vacuum chamber, the electrode device is capable of moving along a first direction, and the electrode device has a first state and a second state, wherein the first direction is perpendicular to the up-down direction; When the pole head device is in the first state, at least two of the excitation components are extracted from the pole head device. The pole head device is in the second state, and the pole head device is located between the two excitation components.
2. The ion beam processing equipment according to claim 1, characterized in that, The pole head device is spaced apart from each of the excitation components.
3. The ion beam processing equipment according to claim 2, characterized in that, The ion beam processing equipment includes a pad, which is disposed between the electrode head device and each of the excitation components when the electrode head device is in the second state.
4. The ion beam processing equipment according to claim 1, characterized in that, The ion beam processing equipment includes a roller, which is rotatably connected to the electrode head device, and the roller makes rolling contact with the excitation assembly below it.
5. The ion beam treatment apparatus according to claim 4, characterized in that, The ion beam processing device includes a locking assembly disposed below the excitation assembly. The locking assembly can lock the roller, keeping the electrode head device in the second state. The locking assembly can also unlock the roller, allowing the roller to drive the electrode head device to move along the first direction.
6. The ion beam treatment apparatus according to claim 5, characterized in that, The locking assembly includes a stop portion, which is detachably connected to the excitation assembly below it; the stop portion is located on one side of the roller along the first direction to lock the roller; removing the stop portion unlocks the roller.
7. The ion beam processing equipment according to claim 1, characterized in that, The excitation assembly includes a first magnetic conductor and a coil, the coil being wound around the first magnetic conductor. The pole head device includes two magnetically conductive cover plates spaced apart along the vertical direction, the two magnetically conductive cover plates forming part of the sidewall of the vacuum chamber, each magnetically conductive cover plate corresponding to one excitation assembly, and two magnetic field pads respectively disposed on the two magnetically conductive cover plates. When the pole head device is in the second state, with the plane perpendicular to the vertical direction as the projection plane, the projection of the first magnetic conductor is located within the projection range of the magnetically conductive cover plate.
8. The ion beam processing equipment according to claim 7, characterized in that, The excitation assembly includes a second magnetic conductor, which is located between the first magnetic conductor and the magnetic cover plate. When the pole head device is in the second state, with a plane perpendicular to the up and down direction as the projection plane, the projection of the magnetic cover plate is located within the projection range of the second magnetic conductor.
9. The ion beam processing equipment according to claim 1, characterized in that, The ion beam processing equipment includes a main body, which includes a receiving space and an inlet / outlet communicating with the receiving space. Two excitation components are disposed within the receiving space. The electrode head device moves along the first direction to enter or exit the receiving space through the inlet / outlet.
10. The ion beam processing equipment according to claim 9, characterized in that, The subject includes: Two crossbeams are spaced apart along the vertical direction; Two columns are spaced apart along a second direction, and each column is connected to two crossbeams to jointly define the receiving space and the inlet / outlet. The first direction, the second direction, and the vertical direction are perpendicular to each other.