Manufacturing method of glass microcavity for quantum dot colorization display

Abstract

The invention provides a manufacturing method of a glass microcavity for quantum dot colorization display. The method comprises the following steps: preparing a glass substrate, forming a pre-transfer pattern on a chromium plate, plating a reflective layer on the glass substrate, cleaning the glass, coating the glass substrate with photoresist, baking the photoresist on the glass substrate, and exposing the glass coated with the photoresist by using the chromium plate with the pre-transfer pattern. And developing the exposed glass, etching the reflective layer on the glass by using an acidic etching solution, etching the glass by using a glass etching solution to form a micro-cavity, and slitting the glass. A glass material is adopted, the long-term environmental stability is excellent, the requirement can be well met, meanwhile, a reflective layer is arranged on the glass to block edge blue light from penetrating and improve the color purity, quantum display points are injected into a micro-cavity, the light color stability of the quantum dots can be kept for a long time, and the quantum dots are illuminated due to the fact that reflected light participates in illumination, so that the quantum dots are more stable. Therefore, the brightness is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass microcavity, in particular to a glass microcavity manufacturing method for quantum dot color display. BACKGROUND

[0002] Quantum dot colorization technology is a mature technology successfully tested on QD-OLED, and has reliability in process, material and equipment. This technical solution only needs to focus on mass transfer of a blue LED crystal to break through the difficulty of large-scale commercialization of MicroLED display, and can meet the application requirements of large size to IT class in pixel pitch. Quantum dots, as a light conversion material with great advantages in color purity, brightness, color gamut and quantum efficiency, have received extensive attention.

[0003] Researchers from the Semiconductor Institute of Guangdong Provincial Academy of Sciences have developed a simple and well-compatible patterning method to prepare quantum dot light conversion films with a thickness of more than 10 microns. The quantum dot polymer material used in this technology is simple to prepare, which well avoids the complex quantum dot surface modification and material composition problems necessary in other patterning methods. However, both large-size televisions and small-size mobile phones will generate heat when in use, and the polymer film is not suitable for long-term uninterrupted use. The polymer film will age and turn yellow, affecting the later use. SUMMARY

[0004] The problem to be solved by the present application is to provide a glass microcavity manufacturing method for quantum dot color display, which can maintain the light color stability of quantum dots for a long time by injecting quantum display dots on the microcavity.

[0005] To solve the above technical problems, the present application provides a glass microcavity manufacturing method for quantum dot color display, which comprises the following steps:

[0006] a. Prepare a glass substrate;

[0007] b. Form a pre-transfer pattern on a chromium plate;

[0008] c. Use a coating machine to vacuum plate a reflective layer on the glass substrate, and the thickness of the reflective layer is 50-500 nm;

[0009] d. Clean the glass;

[0010] e. Apply photoresist to the glass substrate;

[0011] f. Bake the photoresist on the glass substrate;

[0012] g. exposing the photoresist-coated glass to a chromium plate with a pre-transfer pattern using a parallel light exposure machine, and the exposure time is 5-50 seconds;

[0013] h. developing the exposed glass using a developing machine to make the pattern appear on the glass;

[0014] i. etching the reflective layer on the glass using an acidic etching solution until the reflective layer is completely removed;

[0015] j. etching the glass using a glass etching solution to etch a micro-cavity with an etching depth of 10-500 um on the glass;

[0016] k. cutting the glass.

[0017] Preferably, the thickness of the reflective layer in step c is 50-350 nm.

[0018] Preferably, the reflective layer in step c is metal or ceramic.

[0019] Preferably, the reflective layer in step c is aluminum.

[0020] Preferably, the coating thickness of the photoresist in step e is 3-30 um.

[0021] Preferably, the exposure time of the glass in step g is 10-30 seconds.

[0022] Preferably, the glass etching solution in step j contains 3-30% HF, 5-20% HCL, 1-10% HNO3, and 1-3% acetic acid, and the etching temperature is 60±10°C.

[0023] Preferably, the etching depth of the glass in step j is 200-300 um.

[0024] Preferably, step k uses femtosecond laser to cut the glass.

[0025] The beneficial effects of the present application are: the present application provides a glass microcavity manufacturing method for quantum dot color display, quantum dot colorization is excited by blue LED crystal, and the microcavity needs to have transparency, so that the blue light can pass through and excite the quantum dots. At the same time, the microcavity physical property is required to be stable, and does not change during long-term use, so as to ensure the color saturation and accuracy of quantum display. The present application adopts glass material, has excellent long-term environmental stability, can well meet the requirements, and at the same time, a reflective layer is made on the glass to block the edge blue light transmission, improve the color purity, and because the reflected light participates in illuminating the quantum dots, the brightness is improved. The transparent microcavity is made on the glass to add quantum display points, and the cavity is manufactured through key processes such as vacuum optical coating, yellow light process, etching, and laser cutting. The glass has stable performance, and after adding the quantum dots, the light color stability can be maintained for a long time, and the vacuum coating layer can isolate the influence of blue light on the quantum color. DETAILED DESCRIPTION

[0026] To make the purpose, technical scheme and advantages of the embodiments of the present disclosure clearer, the technical scheme of the embodiments of the present disclosure will be described clearly and completely below in combination with the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all the embodiments.

[0027] Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative labor belong to the scope of protection of the present disclosure.

[0028] Embodiment one:

[0029] The present application provides a glass microcavity manufacturing method for quantum dot color display, comprising the following steps:

[0030] a. preparing a glass substrate;

[0031] b. forming a pre-transfer pattern on a chromium plate;

[0032] c. using a coating machine to form a reflective layer on the glass substrate by vacuum plating, and the thickness of the reflective layer is 50 nm;

[0033] d. cleaning the glass;

[0034] e. coating photoresist on the glass substrate, and the coating thickness of the photoresist is 3 um;

[0035] f. baking the photoresist on the glass substrate;

[0036] g. using the chromium plate with the pre-transfer pattern to expose the glass coated with the photoresist on the parallel light exposure machine, and the exposure time is 5 s;

[0037] h. developing the exposed glass by a developing machine to make the pattern present on the glass;

[0038] i. etching the reflective layer on the glass by using an acidic etching solution until the reflective layer is completely removed;

[0039] j. etching the glass by using a glass etching solution to etch a micro-cavity with an etching depth of 10 um on the glass, the glass etching solution comprising 3-30% of HF, 5-20% of HCL, 1-10% of HNO3, and 1-3% of acetic acid, and the etching temperature being 60±10°C;

[0040] k. performing a dicing operation on the glass by using a femtosecond laser.

[0041] Example Two:

[0042] The present application provides a method for manufacturing a glass micro-cavity for quantum dot color display, comprising the following steps:

[0043] a. preparing a glass substrate;

[0044] b. forming a pre-transfer pattern on a chromium plate;

[0045] c. vacuum plating a reflective layer on the glass substrate by using a plating machine, and the thickness of the reflective layer being 275 nm;

[0046] d. cleaning the glass;

[0047] e. coating the glass substrate with photoresist, and the coating thickness of the photoresist being 16 um;

[0048] f. baking the photoresist on the glass substrate;

[0049] g. exposing the glass coated with the photoresist by using the chromium plate with the pre-transfer pattern on a parallel light exposure machine, and the exposure time being 27 s;

[0050] h. developing the exposed glass by a developing machine to make the pattern present on the glass;

[0051] i. etching the reflective layer on the glass by using an acidic etching solution until the reflective layer is completely removed;

[0052] j. etching the glass by using a glass etching solution to etch a micro-cavity with an etching depth of 250 um on the glass, the glass etching solution comprising 3-30% of HF, 5-20% of HCL, 1-10% of HNO3, and 1-3% of acetic acid, and the etching temperature being 60±10°C.

[0053] k. performing a dicing operation on the glass by using a femtosecond laser.

[0054] Example Three:

[0055] The application provides a glass microcavity manufacturing method for quantum dot color display.

[0056] a. preparing a glass substrate;

[0057] b. forming a pre-transfer pattern on a chromium plate;

[0058] c. vacuum plating a reflective layer on the glass substrate by using a coating machine, wherein the thickness of the reflective layer is 500 nm;

[0059] d. cleaning the glass;

[0060] e. coating photoresist on the glass substrate, wherein the coating thickness of the photoresist is 30 um;

[0061] f. baking the photoresist on the glass substrate;

[0062] g. exposing the photoresist-coated glass to light by using the chromium plate with the pre-transfer pattern on a parallel light exposure machine, wherein the exposure time is 50 s;

[0063] h. developing the exposed glass by using a developing machine, so that the pattern is presented on the glass;

[0064] i. etching the reflective layer on the glass by using an acidic etching solution until the reflective layer is completely removed;

[0065] j. etching the glass by using a glass etching solution to etch a microcavity with a depth of 500 um on the glass, wherein the glass etching solution comprises 3-30% HF, 5-20% HCL, 1-10% HNO3 and 1-3% acetic acid, and the etching temperature is 60±10°C;

[0066] k. cutting the glass by using a femtosecond laser.

[0067] Quantum dot colorization is excited by blue LED crystals, and the microcavity needs to be transparent, so that the blue light can pass through and excite the quantum dots. At the same time, the microcavity physical property is required to be stable, and does not change for a long time, so as to ensure the color saturation and accuracy of quantum display. The application adopts glass material, which has excellent long-term environmental stability and can well meet the requirements. Meanwhile, a reflective layer is made on the glass to block the edge blue light transmission and improve the color purity. In addition, the reflected light participates in illuminating the quantum dots, thereby improving the brightness. The transparent microcavity is made on the glass to add quantum display points, and the cavity is manufactured through key processes such as vacuum optical coating, yellow light process, etching and laser cutting. The glass has stable performance, and after adding quantum dots, the light color can be kept stable for a long time. The vacuum coating layer can isolate the influence of blue light on quantum color.

[0068] The above embodiments are only used to describe the preferred embodiments of the present application, and are not used to limit the scope of the present application. Without departing from the design spirit of the present application, various modifications and improvements made by those skilled in the art to the technical solutions of the present application shall fall within the protection scope of the claims of the present application.

Claims

1. A method for fabricating a glass microcavity for quantum dot color display, characterized in that, It includes the following steps: a. Prepare a glass substrate; b. Form a pre-transfer pattern on a chrome plate; c. Use a coating machine to vacuum deposit a reflective layer on a glass substrate, with a reflective layer thickness of 50-500nm; d. Clean the glass; e. Coating the glass substrate with photoresist; f. Bake the photoresist on the glass substrate; g. On a parallel light exposure machine, a chromium plate with a pre-transfer pattern is used to expose glass coated with photoresist for 5-50 seconds. h. Develop the exposed glass using a developing machine to reveal the pattern on the glass; i. Use an acidic etching solution to etch the reflective layer on the glass until the reflective layer is completely removed; j. Use glass etching solution to etch glass to create microcavities with an etching depth of 10-500 μm. k. Perform a glass cutting operation.

2. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, The thickness of the reflective layer in step c is 50-350nm.

3. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, The reflective layer in step c is made of metal or ceramic.

4. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, The reflective layer in step c is aluminum.

5. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, In step e, the coating thickness of the photoresist is 3-30 μm.

6. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, The exposure time for the glass in step g is 10-30 seconds.

7. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, In step j, the glass etching solution contains 3-30% HF, 5-20% HCl, 1-10% HNO3, and 1-3% acetic acid, and the etching temperature is 60±10°C.

8. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, Step j involves etching the glass to a depth of 200-300 μm.

9. The method for fabricating a glass microcavity for quantum dot color display according to claim 1, characterized in that, Step k uses a femtosecond laser to cut the glass.