A slurry diaphragm valve for a semiconductor CMP apparatus and an assembly method thereof

Abstract

The present application relates to the technical field of diaphragm valve, and proposes a grinding fluid diaphragm valve for semiconductor CMP equipment and an assembling method thereof.The diaphragm valve comprises a valve seat with a 3-10° inclined annular step inside, a wear-resistant diaphragm and an adjusting assembly.The wear-resistant diaphragm has a rubber main body, a PTFE wear-resistant layer and a pre-embedded threaded part with a limiting part.The adjusting assembly comprises an adjusting rod, a diaphragm connecting shaft pressing block, a hand wheel and a movable limiting adjusting nut.The present application realizes non-limiting pre-pressing static sealing by means of inclined surface contact, eliminates flow channel dead zones and prevents grinding fluid crystallization.The PTFE wear-resistant layer improves wear resistance.The unique limiting adjusting nut design allows setting of the closing stroke or reservation of the closed gap, realizing flexible switching between full closing and anti-crystallization dripping modes.The present application has the characteristics of high cleanliness, long service life and strong process adaptability, and is suitable for precise fluid control of semiconductor.

Description

Technical Field

[0001] This invention relates to the field of diaphragm valve technology, and in particular to a slurry diaphragm valve for semiconductor chemical mechanical polishing (CMP) equipment and its assembly method. Background Technology

[0002] In the chemical mechanical polishing (CMP) process for semiconductor manufacturing, the delivery and control of the polishing slurry is crucial. Polishing slurries typically contain hard abrasive particles such as silicon dioxide, alumina, or cerium oxide, and are prone to precipitation, crystallization, or gelation in stagnant or dead zones. Therefore, diaphragm valves used in CMP equipment not only need to have conventional on / off functions, but also need to meet the special process requirements of no dead zones, resistance to particle abrasion, and prevention of crystallization.

[0003] Existing general-purpose industrial diaphragm valves have significant limitations when applied to CMP equipment. Firstly, traditional diaphragm valves often employ a plane-to-plane compression seal, requiring substantial pre-tightening force to ensure a tight seal. This leads to excessive compression of the diaphragm rubber, easily creating a stress concentration zone at the valve seat center, accelerating diaphragm aging and rupture. Simultaneously, the planar sealing structure easily creates dead zones within the valve cavity, resulting in residual crystallization of grinding fluid, which can contaminate subsequent wafers or jam the valve. Secondly, the limiting mechanisms of existing valves are typically fixed, unable to flexibly address the "bypass / trickle flow" requirements common in CMP processes (i.e., maintaining a small flow rate to prevent pipeline crystallization when the valve is "closed"). This necessitates the addition of bypass lines, increasing system complexity and leakage risk.

[0004] Chinese patent application CN113646562A discloses a diaphragm and a diaphragm valve. The diaphragm has a through hole with a diameter larger than just large enough to allow a bolt to pass through. A metal bolt insert is embedded in the through hole. The height of the bolt insert is less than or equal to the height of the through hole. While this diaphragm valve enhances connection strength, it does not address optimization for the inclined sealing structure of fluids containing particles, fails to solve the dead zone problem, and lacks a fine-tuning mechanism for valve stroke.

[0005] Chinese patent application CN106415099A discloses a diaphragm valve and its assembly method. The diaphragm valve comprises: a main body with a fluid passage; a valve stem movable vertically relative to the main body; a diaphragm that opens and closes the fluid passage of the main body as the valve stem moves vertically; a valve cover disposed on the upper side of the main body and guiding the valve stem's vertical movement; a diaphragm pressing member installed at the lower end of the valve stem and pushing the diaphragm downwards; and a handle that rotates to move the valve stem vertically to the open and closed positions. An internally threaded component is screwed onto the upper end of the externally threaded portion of the valve stem. When the valve stem reaches the appropriate closed position, the internally threaded component abuts against the upper end of the valve cover to prevent the valve stem from moving further downwards. Although this diaphragm valve has a limiting function, its limiting structure is mainly used to prevent over-closing. It cannot flexibly set between fully closed and slightly leaking states without disassembling the valve, and its sealing interface is still of a traditional type, making it susceptible to damage from CMP polishing fluid.

[0006] Chinese patent application CN108757989A discloses a pre-tightening adjustable diaphragm valve, comprising a valve body, valve core, valve stem, valve cover, and diaphragm. The valve cover has an extension platform and a limiting boss at its edge, and the valve body has a mounting platform that matches the limiting boss. The limiting boss and the mounting platform form a rigid sealing connection via fastening screws. The extension platform, limiting boss, and mounting platform form an internal cavity, within which the diaphragm is placed, with its edge abutting against the limiting boss. The extension platform, diaphragm, and mounting platform are sealed together via pre-tightening studs and pre-tightening nuts. This diaphragm valve focuses on the rigid sealing connection and pre-tightening during valve body assembly, but fails to address the issue of axial positioning consistency of the diaphragm during repeated opening and closing, and does not mention flow channel optimization for the characteristics of grinding fluids. Summary of the Invention

[0007] The main objective of this invention is to provide a diaphragm valve for polishing slurry in semiconductor CMP equipment. The main advancement lies in the fact that, through a special inclined sealing structure and composite diaphragm design, the wear leakage and dead zone accumulation problems in the transportation of polishing slurry containing particles are solved. Furthermore, the adjustable limit mechanism enables dual control of flow cutoff and micro-bypass, significantly improving the valve's adaptability and lifespan in semiconductor processes.

[0008] The second main objective of this invention is to provide an assembly method for a polishing slurry diaphragm valve for semiconductor CMP equipment. The main improvement is that the assembled polishing slurry diaphragm valve is applicable to semiconductor CMP equipment.

[0009] The main objective of this invention is achieved through the following technical solution: a diaphragm valve for polishing slurry in semiconductor CMP equipment, comprising:

[0010] The diaphragm valve seat has a valve port and a first flow channel and a second flow channel communicating with the valve port. The diaphragm valve seat is provided with an annular stepped surface surrounding the valve port. The annular stepped surface has an inclined surface at 3° to 10° relative to the horizontal plane.

[0011] A wear-resistant diaphragm sheet, installed on the valve port, has a rubber body, a PTFE wear-resistant layer covering the surface of the rubber body, and a threaded connector embedded in the rubber body; a limiting step is formed on the rubber body, and an embedded groove communicating with the limiting step is formed inside; the threaded connector has an embedded end, a limiting part, and a threaded part connected in sequence, the embedded end is embedded in the embedded groove, and the limiting part is installed at the limiting step; the surface of the PTFE wear-resistant layer contacts the inclined surface to form a static seal without ultimate pre-pressure;

[0012] An adjusting assembly includes an adjusting rod, a diaphragm coupling pressure block, a handwheel, and a limiting adjusting nut. The diaphragm coupling pressure block is connected to the adjusting rod and the threaded connector. The limiting portion of the threaded connector contacts the surface of the diaphragm coupling pressure block to limit the axial installation position of the adjusting assembly. The limiting adjusting nut is mounted on the handwheel, and the handwheel and the limiting adjusting nut are mounted on the adjusting rod. The handwheel drives the adjusting rod to move the diaphragm coupling pressure block and the wear-resistant diaphragm up and down to adjust the opening of the valve port. The limiting adjusting nut can move up and down along the adjusting rod to set the closing stroke or closing gap of the wear-resistant diaphragm.

[0013] The implementation principle of this basic structural example is that the wear-resistant diaphragm moves relative to the valve port of the diaphragm valve seat by adjusting the component. A static seal is formed by the contact between the PTFE wear-resistant layer and the inclined surface of the annular stepped surface surrounding the valve port. The downward stroke is precisely controlled by the limit adjusting nut. Specific effects include:

[0014] 1) The annular stepped surface of the diaphragm valve seat adopts a 3° to 10° inclined surface design, achieving "non-limit pre-compression". In traditional planar sealing structures, the rubber body of the diaphragm is compressed to the end of its elastic deformation range (compression ratio often >40%), causing the rubber molecular chains to be in a high stress state for a long time, accelerating aging and fatigue fracture. The inclined surface design of this invention only requires compressing the rubber body by 15%-25% to achieve the same or even better sealing effect (helium leakage rate <1x10). -6 This low-stress working state greatly delays the fatigue of rubber materials. Combined with the resistance of the PTFE wear-resistant layer to abrasive particles, the wear-resistant diaphragm of this invention can stably achieve a fault-free cycle life of more than 3 million cycles under the flushing of typical CMP abrasive fluid (such as containing 8% SiO2 particles, pH=10.5), which is 3-5 times that of the traditional design.

[0015] 2) This inclined surface design does not affect the tight fit between the wear-resistant diaphragm and the diaphragm valve seat, effectively eliminating dead zones in the valve cavity that are easily generated in the sealing structure. This avoids the accumulation and residue of abrasive particles in the grinding fluid, prevents dirt and grime buildup, significantly improves the valve's internal cavity displacement rate, and meets the stringent requirements for high cleanliness in semiconductor CMP processes.

[0016] 3) The limit adjusting nut can be moved up and down along the adjusting rod to set the closing stroke. For grinding fluids that are prone to crystallization, the position of the limit adjusting nut can be adjusted (e.g., moved down) so that the valve retains a small closing gap in the "closed" state, forming a dripping or micro-flow state (non-dead valve). This design can satisfy both on / off control and prevent crystallization blockage caused by fluid stasis, greatly improving the valve's process adaptability.

[0017] 4) The threaded connectors embedded inside the wear-resistant diaphragm have a limiting part, which, together with the limiting step on the rubber body, provides a precise axial positioning reference when assembled with the regulating components. This eliminates the initial shape difference of the diaphragm caused by different screw-in depths in traditional diaphragm valves, ensuring the consistency of CV values ​​for batch products. This effectively prevents the problem of the diaphragm becoming concave in the middle due to excessive screw-in (affecting the seal) or bulging in the middle of the diaphragm due to insufficient screw-in (aggravating wear), ensuring the consistency and stability of the sealing performance of each valve after assembly.

[0018] 5) The wear-resistant diaphragm adopts a structure in which a rubber body and a PTFE layer are hot-pressed together. The excellent chemical inertness and low coefficient of friction of PTFE are used to resist the scouring and chemical corrosion of CMP abrasive fluid. At the same time, the rubber body provides good resilience and sealing pressure, which solves the defect that a single rubber material is easily worn by abrasives.

[0019] In a preferred embodiment, the present invention may further include: a valve cover mounted on the diaphragm valve seat, the valve cover and the diaphragm valve seat being locked together by a valve seat locking nut; a sealing ring externally mounted on the valve cover for sealing the gap between the valve cover and the diaphragm valve seat; a valve cover threaded hole and a pressure block limiting groove formed inside the valve cover; an adjusting rod and the diaphragm connecting shaft pressure block assembled inside the valve cover; wherein the adjusting rod extends out of the valve cover from the valve cover threaded hole; and the shape of the pressure block limiting groove matches the shape of the diaphragm connecting shaft pressure block to restrict the circumferential rotation of the diaphragm connecting shaft pressure block and allow the diaphragm connecting shaft pressure block to slide up and down axially.

[0020] By employing the optimized technical features of the above structure, the stability of the adjustment movement can be ensured. The shape matching between the pressure block limiting groove inside the valve cover and the diaphragm coupling pressure block forms an anti-rotation guide mechanism, forcing the diaphragm coupling pressure block to slide up and down axially and not rotate circumferentially. This avoids the rotational torque being directly transmitted to the wear-resistant diaphragm when adjusting by rotating the handwheel, preventing the diaphragm from being damaged by torsional shear forces. At the same time, the sealing ring effectively blocks the external environment and fluid passage, preventing leakage and the entry of external impurities.

[0021] In a preferred embodiment, the present invention may be further configured such that the adjusting rod has an adjusting rod body with threads on its surface and a snap-fit ​​end disposed at the end of the adjusting rod body; the diaphragm coupling pressure block has a gear pressure block body, a pressure block slot with a side opening disposed on the gear pressure block body, and a pressure block threaded hole disposed in the gear pressure block body, the pressure block slot being used for interlocking with the snap-fit ​​end, and the pressure block threaded hole being used for screwing with a threaded connector; wherein, the tooth-shaped profile of the gear pressure block body cooperates with the pressure block limiting groove to restrict the circumferential rotation of the diaphragm coupling pressure block.

[0022] By adopting the preferred technical features of the above structure, a convenient and robust modular connection is achieved. The snap-fit ​​end of the adjusting rod and the side opening groove of the diaphragm coupling block are interlocked, which not only simplifies the assembly process and facilitates maintenance and replacement, but also ensures high reliability in axial force transmission. At the same time, the toothed shape of the diaphragm coupling block further enhances the anti-rotation effect, ensuring that the tightness of the threaded connection between the threaded connector and the threaded hole of the block will not loosen due to prolonged operation.

[0023] In a preferred embodiment, the present invention may be further configured such that the adjusting assembly further includes an opening indicator ring and a handwheel locking block. The opening indicator ring is sleeved on the valve cover and is used to indicate the opening degree of the valve port. The handwheel locking block is installed on the handwheel and is used to lock the handwheel to the adjusting rod.

[0024] By adopting the optimized technical features of the above structure, the operational safety and visibility of the valve are improved. The opening indicator ring provides operators with intuitive feedback on the valve status (open / closed and the degree of opening), facilitating on-site inspection and process monitoring. The handwheel locking block securely locks the handwheel to the adjusting rod, preventing the handwheel from falling off or shifting its adjustment position due to equipment vibration or misoperation, thus ensuring the stability of process parameters.

[0025] In a preferred embodiment, the present invention may be further configured such that the limiting adjusting nut has a central threaded hole and ratchet teeth on its outer end face, the central threaded hole being used to assemble the limiting adjusting nut onto the adjusting rod; and the handwheel has ratchet teeth inside, the handwheel ratchet teeth being used to engage with the ratchet teeth of the nut to circumferentially lock the handwheel and the limiting adjusting nut.

[0026] By employing the optimized technical features of the above-described structure, reliable circumferential locking of the adjusting mechanism is achieved. The meshing design of the handwheel ratchet teeth and the nut ratchet teeth makes the handwheel and the limit adjusting nut integral in the direction of rotation. When adjusting the valve opening, this locking structure ensures effective torque transmission; after the limit stroke is set, the ratchet engagement effectively prevents the limit adjusting nut from rotating or shifting relative to vibration, thus ensuring that the set closing stroke or closing gap remains unchanged over a long period without the need for frequent calibration.

[0027] In a preferred embodiment, the present invention may be further configured such that the flow outlets of both the first flow channel and the second flow channel are equipped with connecting pipe nuts.

[0028] By adopting the optimized technical features of the above structure, the installation and removal of valves in the piping system of semiconductor CMP equipment are greatly facilitated. The connecting nut provides a standard connection interface, supports quick access to the flow channel, and facilitates subsequent maintenance and replacement, reducing equipment downtime.

[0029] In a preferred embodiment, the present invention may be further configured such that the material of the threaded connector is selected from the group consisting of: polyvinylidene fluoride, polyether ether ketone, or stainless steel with a perfluoroalkoxy coating; and the PTFE wear-resistant layer is uniformly doped with nanodiamond or nano boron nitride.

[0030] By adopting the preferred technical features of the above structure, the threaded connector uses materials with no risk of metal precipitation, such as PVDF, PEEK, or PFA coatings. Simultaneously, the PTFE wear-resistant layer is composite-doped with ultra-hard particles such as nanodiamond or boron nitride, achieving a dual innovation of macroscopic structural optimization and microscopic material strengthening. On the one hand, the possibility of metal ion contamination is completely eliminated from the material source, ensuring the absolute purity of the polishing slurry even in extreme failure modes such as accidental diaphragm damage, providing ultimate safety assurance for semiconductor processes. On the other hand, by constructing micro-armor at the atomic scale, the wear resistance of the diaphragm is improved by an order of magnitude, thereby pushing the mechanical cycle life of the valve to a new theoretical limit. The second main objective of this invention is achieved through the following technical solution: proposing an assembly method for a polishing slurry diaphragm valve for semiconductor CMP equipment, including the following steps:

[0031] S1. Assemble the adjusting rod on the diaphragm coupling pressure block;

[0032] S2. Install the adjusting rod and the diaphragm connecting block into the valve cover;

[0033] S3. Assemble the sealing ring and opening indicator ring on the valve cover;

[0034] S4. Install a wear-resistant diaphragm sheet at the lower part of the diaphragm coupling block; the wear-resistant diaphragm sheet has a rubber body, a PTFE wear-resistant layer covering the surface of the rubber body, and a threaded connector embedded in the rubber body; a limiting step is formed on the rubber body, and a pre-embedded groove communicating with the limiting step is formed inside; the threaded connector has a pre-embedded end, a limiting part, and a threaded part connected in sequence, the pre-embedded end is embedded in the pre-embedded groove, the limiting part is installed at the limiting step, and the limiting part contacts the surface of the diaphragm coupling block to limit the axial installation position of the adjustment component;

[0035] S5. Install the valve cover onto the diaphragm valve seat; the diaphragm valve seat has a valve port and a first flow channel and a second flow channel communicating with the valve port, and the diaphragm valve seat has an annular stepped surface surrounding the valve port, the annular stepped surface has an inclined surface at 3° to 10° relative to the horizontal plane, and the surface of the PTFE wear-resistant layer contacts the inclined surface to form a static seal without ultimate pre-pressure.

[0036] S6. Assemble the limit adjusting nut onto the handwheel, and install the limit adjusting nut and the handwheel onto the adjusting rod; wherein, the handwheel is used to drive the adjusting rod to move the diaphragm connecting shaft pressure block and the wear-resistant diaphragm up and down to adjust the opening of the valve port; the limit adjusting nut can move up and down along the adjusting rod to set the closing stroke or closing gap of the wear-resistant diaphragm.

[0037] S7. Assemble the handwheel locking block on the handwheel, and install the connecting pipe nut on the first flow channel and the second flow channel.

[0038] This basic method example demonstrates the efficient assembly of a grinding slurry diaphragm valve, ensuring that all components work together to achieve the high cleanliness and high control precision required by semiconductor CMP equipment. Specific results are as follows:

[0039] 1) It is clear that the axial installation position is limited by the contact between the limiting part of the threaded connector and the diaphragm coupling pressure block. This method eliminates the error of manual assembly from the process point of view, and ensures that the initial position height of the diaphragm of all valves leaving the factory is consistent, thereby ensuring that the sealing pressure when it is subsequently matched with the inclined surface of the valve seat meets the design standard.

[0040] 2) By adopting a reasonable assembly sequence (inner components first, then outer components; functional components first, then control components), especially the valve cover locking in step S5 and the setting of the limit adjusting nut in step S6, the valve is ensured to have a "non-limit pre-pressure" sealing state and adjustable stroke control function after assembly, without the need for complicated post-assembly debugging.

[0041] 3) This method has a clear process, strong logic, and facilitates standardized operations. There is minimal interference between each step. For example, the adjusting rod and the pressure block are interlocked before the valve cover is installed, avoiding complex operations in confined spaces and effectively improving assembly efficiency and product yield.

[0042] In a preferred embodiment, the present invention can be further configured such that, in step S2, a valve cover threaded hole and a pressure block limiting groove are formed in the valve cover, the adjusting rod extends out of the valve cover threaded hole, and the shape of the pressure block limiting groove matches the shape of the diaphragm connecting shaft pressure block to restrict the circumferential rotation of the diaphragm connecting shaft pressure block and allow the diaphragm connecting shaft pressure block to slide up and down in the axial direction; in step S5, the valve cover and the diaphragm valve seat are locked together by a valve seat lock nut.

[0043] By employing the optimized technical features of the above method, a comprehensive anti-rotation protection system is constructed during the assembly process. In the valve cover installation step, the pressure block limiting groove is used for positioning, preventing relative rotation of the core components during subsequent diaphragm installation or valve operation, thus protecting the structural integrity of the diaphragm assembly. Simultaneously, the locking mechanism of the valve seat lock nut ensures the rigidity and sealing of the overall valve body structure, enabling it to withstand the impact of high-pressure fluids.

[0044] In a preferred embodiment, the present invention can be further configured such that, in step S1, the adjusting rod has an adjusting rod body with threads on its surface and a snap-fit ​​end disposed at the end of the adjusting rod body; the diaphragm coupling block has a gear block body, a block slot with a side opening disposed on the gear block body, and a block threaded hole disposed in the gear block body, wherein the block slot is used for interlocking with the snap-fit ​​end.

[0045] By employing the preferred technical features of the above method, and utilizing the interlocking assembly and gear-shaped pressure block, the assembly process becomes smoother. This connection method eliminates the need for special tools to connect the adjusting rod and the pressure block, and the resulting structure is compact, effectively utilizing the internal space of the valve cover and helping to reduce the overall size of the valve.

[0046] In a preferred embodiment, the present invention can be further configured such that, in step S6, the limiting adjusting nut has a central threaded hole and ratchet teeth on its outer end face, the central threaded hole being used to assemble the limiting adjusting nut onto the adjusting rod; the handwheel has ratchet teeth inside, the handwheel ratchet teeth being used to engage with the ratchet teeth of the nut to circumferentially lock the handwheel and the limiting adjusting nut.

[0047] By employing the preferred technical features of the above method, the anti-loosening function is simultaneously implemented during the assembly of the control mechanism. The ratchet tooth engagement assembly process is simple and efficient, completing both drive connection and anti-loosening locking functions in a single operation, greatly simplifying the assembly process and reducing assembly costs.

[0048] In summary, the technical solutions of the apparatus or method in this invention include at least one of the following technical effects that contribute to the prior art:

[0049] 1. Solves the cleanliness and dead zone problems in semiconductor CMP process: The unique 3-10° inclined valve seat and PTFE composite diaphragm achieve static sealing without dead zone and without extreme pre-pressure, effectively preventing the accumulation and crystallization of polishing fluid and improving process yield.

[0050] 2. Significantly improves valve durability and reliability: The double-layer screw pre-embedded structure ensures the consistency of connection strength and installation position. Combined with the wear-resistant properties of the PTFE layer and the low-stress characteristics of the bevel seal, it greatly extends the service life of the valve.

[0051] 3. Offers flexible process adaptability: The adjustable limit mechanism not only achieves precise flow cutoff, but also innovatively solves the "dripping" requirement of easily crystallizing fluids, enabling the same valve to adapt to a wider variety of semiconductor fluid control scenarios. Attached Figure Description

[0052] Figure 1 A perspective view of a polishing slurry diaphragm valve for a semiconductor CMP equipment is shown in an embodiment of the present invention;

[0053] Figure 2 An exploded view of the components of the grinding fluid diaphragm valve in an embodiment of the present invention is shown;

[0054] Figure 3 A cross-sectional schematic diagram of the grinding fluid diaphragm valve in an embodiment of the present invention is shown;

[0055] Figure 4 A schematic diagram illustrating the features of the valve cover of the grinding fluid diaphragm valve in an embodiment of the present invention is shown. Figure 4 Parts (A) and (B) show the features of the valve cover from different angles;

[0056] Figure 5 A schematic diagram illustrating the features of the diaphragm valve seat of the grinding fluid diaphragm valve in an embodiment of the present invention;

[0057] Figure 6 A schematic diagram illustrating the features of the wear-resistant diaphragm of the grinding fluid diaphragm valve in an embodiment of the present invention;

[0058] Figure 7 A cross-sectional schematic diagram of the wear-resistant diaphragm of the grinding fluid diaphragm valve in an embodiment of the present invention is shown;

[0059] Figure 8 Draw Figure 3 Enlarged view of region A in the middle;

[0060] Figure 9 A schematic diagram illustrating the features of the adjustment component in an embodiment of the present invention;

[0061] Figure 10 Draw Figure 3 Enlarged view of region B in the middle;

[0062] Figure 11 A cross-sectional schematic diagram of the regulating assembly of the grinding fluid diaphragm valve in an embodiment of the present invention is shown;

[0063] Figure 12 A flow block diagram illustrating an assembly method for a polishing slurry diaphragm valve for a semiconductor CMP device is shown in an embodiment of the present invention.

[0064] Figure 13 Draw corresponding Figure 12 Assembly diagram for step S1;

[0065] Figure 14 Draw corresponding Figure 12 Assembly diagram for step S2;

[0066] Figure 15 Draw corresponding Figure 12 Assembly diagram for step S3;

[0067] Figure 16 Draw corresponding Figure 12 Assembly diagram for step S4;

[0068] Figure 17 Draw corresponding Figure 12 Assembly diagram for step S5;

[0069] Figure 18 Draw corresponding Figure 12 Assembly diagram for step S6;

[0070] Figure 19 Draw corresponding Figure 12 Assembly diagram for step S7.

[0071] Figure label:

[0072] 10. Valve cover; 11. Sealing ring; 12. Sealing groove; 13. Indicator ring retaining groove; 14. Valve cover threaded hole; 15. Pressure block limiting slide groove; 16. Air hole;

[0073] 20. Diaphragm valve seat; 21. Valve seat lock nut; 22. Connector nut; 23. Valve port; 24. First flow channel; 25. Second flow channel; 26. Annular stepped surface;

[0074] 30. Wear-resistant diaphragm; 31. Rubber body; 31A. Limiting step; 31B. Embedded groove; 32. PTFE wear-resistant layer; 33. Threaded connector; 33A. Embedded end; 33B. Limiting part; 33C. Threaded part;

[0075] 40. Adjustment component; 41. Adjustment rod; 41A. Adjustment rod body; 41B. Snap-fit ​​end; 42. Diaphragm coupling pressure block; 42A. Gear pressure block body; 42B. Pressure block slot; 43. Opening indicator ring; 44. Handwheel; 44A. Handwheel center hole; 44B. Handwheel ratchet tooth; 45. Handwheel locking block; 46. Limit adjustment nut; 46A. Nut center threaded hole; 46B. Nut ratchet tooth. Detailed Implementation

[0076] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments for understanding the inventive concept of the present invention, and cannot represent all embodiments, nor are they interpreted as the only embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art under the premise of understanding the inventive concept of the present invention are within the scope of protection of the present invention.

[0077] In the embodiments and variations of this invention, "pre-embedding" refers to a process in which, during the manufacturing of the wear-resistant diaphragm, a metal threaded connector is positioned using a mold and placed as an insert into the rubber substrate. This is followed by high-temperature vulcanization molding, where the rubber and metal are integrated, rather than physical adhesion or interference fit after molding. "Non-limit pre-compression" refers to the sealing achieved when the wear-resistant diaphragm contacts the valve seat, relying on the combined radial force and axial pressure generated by the inclined surface fit. In this case, the compression of the rubber body is controlled within the linear range of elastic deformation (typically 15%-25%), rather than compressing the rubber to near its physical limits, thus preserving the diaphragm's resilience. "Static sealing" refers to a microscopic contact state where, after the PTFE layer of the wear-resistant diaphragm contacts the annular stepped surface of the valve seat and reaches a stable closed state, there is no relative sliding friction between the sealing surfaces, and fluid cannot penetrate. "Closed stroke" refers to the axial displacement distance required for the adjusting component to drive the wear-resistant diaphragm to move downwards from the fully open position until the PTFE wear-resistant layer and the annular stepped surface of the valve seat form an effective seal. "Closed gap" refers to the micron- or millimeter-level channel height maintained between the sealing surface of the wear-resistant diaphragm and the valve seat when the diaphragm reaches the mechanical bottom stop, artificially set by the limit adjusting nut under specific process modes (such as anti-crystallization mode), allowing fluid to pass through at extremely low flow rates. It should be noted that if directional indicators (such as up, down, left, right, front, back, etc.) are involved in the embodiments of this invention, these directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly. To better understand the technical solution of this invention, the grinding fluid diaphragm valve of this invention will be described and explained in further detail below, but this is not intended to limit the scope of protection of this invention.

[0078] Figure 1 A perspective view of a polishing slurry diaphragm valve for a semiconductor CMP equipment is shown in an embodiment of the present invention; Figure 2 An exploded view of the components of the grinding fluid diaphragm valve in an embodiment of the present invention is shown; Figure 3 A cross-sectional schematic diagram of the grinding fluid diaphragm valve in an embodiment of the present invention is shown; Figure 4 A schematic diagram illustrating the features of the valve cover of the grinding fluid diaphragm valve in an embodiment of the present invention is shown. Figure 4 Parts (A) and (B) show the features of the valve cover from different angles; Figure 5 A schematic diagram illustrating the features of the diaphragm valve seat of the grinding fluid diaphragm valve in an embodiment of the present invention; Figure 6 A schematic diagram illustrating the features of the wear-resistant diaphragm of the grinding fluid diaphragm valve in an embodiment of the present invention; Figure 7 A cross-sectional schematic diagram of the wear-resistant diaphragm of the grinding fluid diaphragm valve in an embodiment of the present invention is shown; Figure 8 Draw Figure 3Enlarged view of region A in the middle; Figure 9 A schematic diagram illustrating the features of the adjustment component in an embodiment of the present invention; Figure 10 Draw Figure 3 Enlarged view of region B in the middle; Figure 11 A cross-sectional schematic diagram of the regulating component of the grinding fluid diaphragm valve in an embodiment of the present invention is shown.

[0079] A diaphragm valve for polishing slurries in semiconductor CMP equipment is used in the semiconductor manufacturing industry's equipment supply chain. Specifically, it can be applied to the precise flow control of polishing slurries in semiconductor CMP equipment. The product application requirements for the diaphragm valve include: high wear resistance, long lifespan, and a clean valve cavity without dead zones. Specifically, in semiconductor CMP processes, cleanliness is a core indicator. The process requires that after multiple valve opening and closing cycles, the concentration of newly added particles larger than 20nm in the ultrapure water flowing through the valve must be less than 10 particles / mL. Traditional diaphragm valves, due to wear of the planar seal and material shedding in the dead zone, often have particle concentrations exceeding 100 particles / mL, severely exceeding the standard. This invention, through a 3°-10° slope design without dead zones and a PTFE wear-resistant layer, suppresses particle generation to an extreme level, with a measured concentration of less than 5 particles / mL, far exceeding industry requirements. Dead volume ratio and fluid displacement: To prevent crystallization and contamination, the process requires the valve cavity dead volume ratio to be less than 1%. Traditional products typically have a dead zone ratio between 5% and 10%, and this significant annular dead zone often becomes a source of chemical crystallization. This invention introduces an innovative annular stepped surface design, fundamentally eliminating the sealing dead zone and reducing the dead zone ratio to below 0.5%, achieving near-ideal piston flow displacement. Furthermore, under real grinding fluid conditions containing 8% SiO2 particles, a pH of 10.5, and a pressure of 0.2 MPa, the process requires a leak-free cycle life exceeding 3 million cycles. Traditional diaphragm valves often fail prematurely in less than 1 million cycles due to diaphragm wear and high-stress fatigue. This invention, through the synergistic effect of non-limiting pre-compression combined with a PTFE wear-resistant layer, ensures a cycle life consistently exceeding 3 million cycles, with some optimized designs even reaching 5 million cycles. Modern CMP processes require equipment capable of flexibly switching between "zero leakage" and "micron-level controllable dripping" modes. Traditional diaphragm valves have limited functionality, and achieving mode switching requires an additional, expensive, and complex bypass system. This invention achieves dual-mode switching for a single valve, allowing for precise setting of the closing gap from 0-200μm using a limit adjusting nut, meeting diverse process requirements without any external modifications. For large-scale applications, the flow coefficient (Cv) deviation of batch products at the same opening degree needs to be controlled within ±5%. Traditional diaphragm valves suffer from inconsistent initial diaphragm heights due to manual assembly errors, often with deviations exceeding ±15%. This invention provides a rigid assembly datum at the limiting part, ensuring batch consistency in height and strictly controlling deviations within ±3%. In summary, this invention, through structural innovation (sloping surface design, annular stepped surface, limiting part datum) and material optimization (PTFE wear-resistant layer), comprehensively solves the pain points of traditional diaphragm valves in CMP processes, such as high particulate matter content, large dead zones, short lifespan, limited functionality, and poor consistency. All indicators meet or exceed the stringent requirements of semiconductor mass production.

[0080] Reference Figure 1 , Figure 2 and Figure 3 This invention discloses a diaphragm valve for a semiconductor CMP equipment, comprising: a valve cover 10 mounted on a diaphragm valve seat 20 for providing containment and isolation effects; a diaphragm valve seat 20 for providing a valve port 23 and a flow channel connecting the valve port 23; a wear-resistant diaphragm 30 cooperating with the diaphragm valve seat 20 for adjusting the opening of the valve port 23; and an adjustment assembly 40 pre-assembled for driving the wear-resistant diaphragm 30 to move.

[0081] Reference Figure 2 , Figure 3 and Figure 4 The valve cover 10 is mounted on the diaphragm valve seat 20. The valve cover 10 has an external sealing groove 12 for mounting a sealing ring 11 and an indicator ring slot 13 for mounting an opening indicator ring 43. The sealing ring 11 and the opening indicator ring 43 are pre-fitted into the sealing groove 12 and the indicator ring slot 13, respectively. The sealing ring 11 seals the gap between the valve cover 10 and the diaphragm valve seat 20, and the opening indicator ring 43 indicates the opening degree of the grinding fluid diaphragm valve. The valve cover 10 has a threaded hole 14 for mounting an adjusting rod 41 and a pressure block limiting groove 15 that cooperates with the diaphragm coupling pressure block 42. The diaphragm coupling pressure block 42 can slide up and down along the pressure block limiting groove 15 but cannot rotate. The valve cover 10 is also provided with an air hole 16 communicating with its interior. The air hole 16 is used to balance the internal pressure of the valve cover 10 during the opening and closing of the grinding fluid diaphragm valve, so that the internal pressure of the valve cover 10 is consistent with the external air pressure. This means that the adjustment mechanism does not need to fight the resistance caused by the change in air pressure, thus ensuring smooth, stable and labor-saving operation.

[0082] Reference Figure 2 , Figure 3 and Figure 5 The diaphragm valve seat 20 has a valve port 23 and a first flow channel 24 and a second flow channel 25 communicating with the valve port 23. The valve cover 10 is installed on the diaphragm valve seat 20 and locked in place by a valve seat lock nut 21. Connecting nuts 22 are installed at the flow openings of both the first flow channel 24 and the second flow channel 25 to connect the polishing slurry diaphragm valve to the piping system of a semiconductor CMP device. In a preferred embodiment, the first flow channel 24 and the second flow channel 25 are symmetrically arranged, allowing the polishing slurry to flow in from the first flow channel 24 and out from the second flow channel 25, or vice versa. The valve cover 10 and the wear-resistant diaphragm 30 are installed at the valve port 23, and a sealing ring 11 pre-fitted into the sealing groove 12 of the valve cover 10 seals the gap between the valve cover 10 and the diaphragm valve seat 20. The valve port 23 has an annular stepped surface 26 on its periphery, which is used to support the outer edge portion of the wear-resistant diaphragm 30. (See reference) Figure 8 The surface of the wear-resistant diaphragm 30 and the annular stepped surface 26 form the static sealing interface of the grinding fluid diaphragm valve. The annular stepped surface 26 has an inclination of 3°-10° relative to the horizontal plane. This inclination design avoids the wear-resistant diaphragm 30 from being subjected to extreme pre-compression, effectively ensuring the flexural service life of the wear-resistant diaphragm 30. At the same time, there is no installation gap between the wear-resistant diaphragm 30 and the diaphragm valve seat 20, which keeps the valve cavity clean and free of dead zones, prevents dirt accumulation, ensures the internal cavity replacement rate, and thus effectively meets the relevant requirements for semiconductor cleanliness.

[0083] One of the core features of this invention is that the annular stepped surface 26 on the diaphragm valve seat 20 adopts a specific tilt angle range of 3° to 10°. This range is not arbitrarily chosen, but rather discovered by the inventors after extensive experiments and simulations, as the only effective interval for synergistically resolving the three contradictory points of "sealing reliability," "long lifespan," and "no dead zone." To demonstrate the criticality and non-obviousness of this range, the inventors conducted comparative experiments. The experimental subjects were three groups of valves of this invention that were identical in all aspects except for the angle of the annular stepped surface. Comparative group A: Angle of 0° (i.e., conventional planar seal). Invention group B: Angle of 7° (falling within the 3°-10° range). Comparative group C: Angle of 15° (greater than 10°). The experimental conditions were: the fluid medium was an 8% concentration SiO2 polishing slurry with an average particle size of 100nm and pH=10.5; the working pressure was 0.2 MPa; and the cycle frequency was 1 Hz (on / off). The test items included lifespan and cleanliness, including recording valve leakage (leakage rate >1x10). -6 The number of cycles (Pa·m³ / s) was determined, and after 1 million valve cycles, a downstream ultrapure water sample was taken, and the concentration of newly added >50nm particles was detected using a particle counter. The experimental results are shown in Table 1.

[0084] Table 1

[0085]

[0086] As shown in Table 1, 3° to 10° is a "golden window" for achieving synergistic optimization of "long lifespan" and "high cleanliness". When the tilt angle is less than 3°, the diaphragm is under high stress for a long time during the closing process, accelerating aging and fatigue fracture; when the tilt angle is greater than 10°, the angle between the diaphragm and the valve seat step is too large, making it difficult to guarantee sealing reliability and dead zone elimination effect. Therefore, the selection of this angle range is the key to solving the core technical problem of CMP valves in this invention, and has outstanding substantive features and significant progress.

[0087] Reference Figure 2 and Figure 3The wear-resistant diaphragm 30 is mounted on the valve port 23 and connected to the adjusting assembly 40, and is controlled by the adjusting assembly 40 to adjust the opening degree of the valve port 23. (See reference) Figure 6 and Figure 7 The wear-resistant diaphragm 30 includes a rubber body 31, a polytetrafluoroethylene (PTFE) wear-resistant layer 32 coated on the lower surface of the rubber body 31, and a threaded connector 33 embedded in the upper part of the rubber body 31 for connecting the adjustment assembly 40. This threaded connector 33 is typically made of a high-strength metal (such as stainless steel) to ensure sufficient rigidity and durability. In a preferred embodiment, although the threaded connector 33 is embedded within the rubber body, to prevent metal ion contamination of the polishing fluid in extreme cases (such as diaphragm rupture), the threaded connector 33 is made of high-strength engineering plastics such as PVDF (polyvinylidene fluoride) or PEEK (polyether ether ketone), or a PFA coating is applied to the stainless steel surface. The PTFE wear-resistant layer 32 is bonded to the rubber body 31, for example, through a hot-pressing process. As the surface in contact with the polishing fluid during the use of the polishing fluid diaphragm valve, it effectively ensures the high cleanliness required for semiconductor processes while also providing wear resistance. In a preferred embodiment, the PTFE wear-resistant layer 32 may be uniformly doped with nanodiamond or boron nitride particles to form a composite reinforcing material, further improving its wear resistance while maintaining good chemical inertness. (Refer to...) Figure 8The surface of the PTFE wear-resistant layer 32 and the annular stepped surface 26 of the diaphragm valve seat 20 form a static sealing interface for the grinding fluid diaphragm valve. The annular stepped surface 26 is constructed with an inclination angle of 3°-10° relative to the horizontal plane. This inclination structure design can prevent the wear-resistant diaphragm 30 from being subjected to extreme pre-compression, and can effectively ensure the flexural service life of the wear-resistant diaphragm 30. A limiting step 31A and a pre-embedded groove 31B communicating with the limiting step 31A are provided on the rubber body 31. The threaded connector 33 has a pre-embedded end 33A that matches the shape of the pre-embedded groove 31B, a limiting part 33B that matches the shape of the limiting step 31A, and a threaded part 33C for screwing into the diaphragm coupling pressure block 42. In this design, the pre-embedded end 33A of the threaded connector 33 is embedded in the pre-embedded groove 31B, so that the pre-embedded end 33A is completely covered and pre-embedded in the rubber elastomer substrate, thereby ensuring the connection strength between the threaded connector 33 and the rubber body 31. The limiting part 33B is installed at the limiting step 31A. The surface of the limiting part 33B can provide a precise mechanical positioning reference surface. When the wear-resistant diaphragm 30 is installed on the diaphragm coupling block 42 of the adjusting assembly 40, the surface of the limiting part 33B will contact the corresponding surface of the diaphragm coupling block 42, thereby strictly limiting the axial position of the installation. Without the limiting part 33B, the flexible rubber body 31 of the wear-resistant diaphragm 30 will directly contact the rigid end face of the diaphragm coupling block 42. During the screw-on operation, if the screw-on is too deep, the middle sealing portion of the wear-resistant diaphragm 30 will become concave, adversely affecting the sealing performance. If the screw-on is too shallow, the middle position of the wear-resistant diaphragm 30 will bulge, which will negatively impact the diaphragm's service life. By limiting the axial position of the installation with the limiting part 33B, the installation height of the wear-resistant diaphragm 30 can be kept consistent, thereby ensuring the stable sealing performance and precise flow control characteristics of the grinding fluid diaphragm valve and eliminating performance fluctuations caused by installation errors.

[0088] Reference Figure 2 , Figure 3 and Figure 9The adjusting assembly 40 includes an adjusting rod 41, a diaphragm coupling pressure block 42 fitted to the adjusting rod 41 with a slot, an opening indicator ring 43 fitted onto the valve cover 10 to indicate the opening degree of the grinding fluid diaphragm valve, a handwheel 44 connected to the adjusting rod 41 via a handwheel locking block 45, and a limiting adjusting nut 46 fitted onto the handwheel 44 for limiting the position. The adjusting rod 41 includes an adjusting rod body 41A with threads on its surface and a snap-fit ​​end 41B located at the first end of the adjusting rod body 41A. The diaphragm coupling pressure block 42 has a gear pressure block body 42A, a pressure block slot 42B with a side opening located above the gear pressure block body 42A, and a pressure block threaded hole located within the gear pressure block body. The pressure block slot 42B is used for interlocking with the snap-fit ​​end 41B of the adjusting rod 41, and the pressure block threaded hole is used for screwing into the threaded connector 33 of the wear-resistant diaphragm sheet 30. The adjusting rod 41 and the diaphragm coupling pressure block 42 are interlocked and then installed inside the valve cover 10. The adjusting rod body 41A is screwed into the valve cover threaded hole 14 of the valve cover 10 and extends out. The toothed shape of the gear pressure block body 42A of the diaphragm coupling pressure block 42 engages with the pressure block limiting groove 15 on the inner wall of the valve cover 10. This engagement restricts the rotation of the diaphragm coupling pressure block 42, ensuring that it can only move linearly up and down along the axial direction inside the valve cover 10. The opening indicator ring 43 is sleeved on the indicator ring groove 13 of the valve cover 10 and is used to indicate the opening degree of the grinding fluid diaphragm valve.

[0089] Reference Figure 10 and Figure 11The limiting adjusting nut 46 is assembled on the handwheel 44, and the handwheel 44 and the limiting adjusting nut 46 are mounted on the second end of the adjusting rod 41. The limiting adjusting nut 46 has a central threaded hole 46A and a ratchet tooth 46B on the outer end face of the limiting adjusting nut 46. The internal thread of the central threaded hole 46A can precisely engage with the external thread on the adjusting rod 41, and the ratchet tooth 46B is used for linkage and locking with the handwheel 44. The handwheel 44 has a smooth, threadless central hole 44A at its center, and the handwheel locking block 45 is installed at the central hole 44A to lock the handwheel 44 to the second end of the adjusting rod 41. The ratchet tooth 44B is provided on the inner surface of the handwheel 44. When the limiting adjusting nut 46 is assembled on the handwheel 44, the ratchet tooth 44B engages with the ratchet tooth 46B. Under normal operation, due to the tight engagement between the ratchet teeth 44B of the handwheel and the ratchet teeth 46B of the nut, the handwheel 44 and the limit adjusting nut 46 are locked in the rotational direction to form an integrated driving component. During rotation, this integrated driving component drives the adjusting rod 41 to move the diaphragm coupling pressure block 42 and the wear-resistant diaphragm 30 in a linear up-and-down motion, thereby realizing the opening and closing of the grinding fluid diaphragm valve. In addition, the limit adjusting nut 46 can move up and down along the adjusting rod 41 to set the closing stroke or closing gap of the wear-resistant diaphragm 30. Specifically, by individually adjusting the initial position of the limit adjusting nut 46 in the axial direction of the adjusting rod 41, the functional mode of the grinding fluid diaphragm valve can be set. Specifically, when the limit adjusting nut 46 is set so that its bottom surface abuts against the top of the valve cover 10, the wear-resistant diaphragm 30 reaches a sealed state. This serves as the limit for the closing stroke of the grinding fluid diaphragm valve, ensuring that the wear-resistant diaphragm 30 will not be subjected to excessive ultimate compression when the handwheel 44 is continuously rotated. This prevents the wear-resistant diaphragm 30 from losing its resilience or from undergoing excessive deformation due to ultimate compression, which could damage its molecular structure, shorten its service life, and cause cracking. When the wear-resistant diaphragm 30 is used as a bypass valve, given the presence of crystallization in some fluids, the grinding fluid diaphragm valve needs to have a dripping effect when closed to ensure a small flow rate. In this case, the limit adjusting nut 46 can be moved in the initial state so that the grinding fluid diaphragm valve cannot be fully closed when the bottom surface of the limit adjusting nut 46 abuts against the top of the valve cover 10.

[0090] Figure 12 A flow block diagram illustrating an assembly method for a polishing slurry diaphragm valve in a semiconductor CMP apparatus according to an embodiment of the present invention is shown. (Refer to...) Figure 12This invention also discloses an assembly method for a polishing slurry diaphragm valve for semiconductor CMP equipment, comprising steps S1 to S7. Steps S4 to S6 are key steps. Specifically, step S1 involves assembling an adjusting rod 41 onto the diaphragm coupling block 42. Step S2 involves installing the adjusting rod 41 and the diaphragm coupling block 42 into the valve cover 10. Step S3 involves assembling a sealing ring 11 and an opening indicator ring 43 onto the valve cover 10. Step S4: Install the wear-resistant diaphragm 30 at the lower part of the diaphragm coupling block 42; wherein, the wear-resistant diaphragm 30 has a rubber body 31, a PTFE wear-resistant layer 32 covering the surface of the rubber body 31, and a threaded connector 33 embedded in the rubber body 31; a limiting step 31A is formed on the rubber body 31, and a pre-embedded groove 31B communicating with the limiting step 31A is formed inside; the threaded connector 33 has a pre-embedded end 33A, a limiting part 33B, and a threaded part 33C connected in sequence, the pre-embedded end 33A is embedded in the pre-embedded groove 31B, the limiting part 33B is installed at the limiting step 31A, and the limiting part 33B contacts the surface of the diaphragm coupling block 42 to limit the axial installation position of the adjusting assembly 40. Step S5: Install the valve cover 10 onto the diaphragm valve seat 20. The diaphragm valve seat 20 has an internal valve port 23 and a first flow channel 24 and a second flow channel 25 communicating with the valve port 23. The diaphragm valve seat 20 also has an annular stepped surface 26 surrounding the valve port 23. The annular stepped surface 26 has an inclined surface at a relative angle of 3° to 10° to the horizontal plane. The surface of the PTFE wear-resistant layer 32 contacts the inclined surface to form a static seal without ultimate pre-pressure. Step S6: Assemble the limiting adjusting nut 46 onto the handwheel 44 and install the handwheel 44 onto the adjusting rod 41. The handwheel 44 drives the adjusting rod 41 to move the diaphragm connecting block 42 and the wear-resistant diaphragm 30 up and down to adjust the opening degree of the valve port 23. The limiting adjusting nut 46 can move up and down along the adjusting rod 41 to set the closing stroke or closing gap of the wear-resistant diaphragm 30. Step S7: Assemble the handwheel locking block 45 onto the handwheel 44, and install the connecting pipe nut 22 on the first flow channel 24 and the second flow channel 25.

[0091] Figure 13 Draw corresponding Figure 12 Assembly diagram for step S1. The operation of step S1 can be found in [reference needed]. Figure 13 (Refer to) Figure 2 , Figure 3 and Figure 9An adjusting rod 41 is mounted on a diaphragm coupling block 42. The adjusting rod 41 includes an adjusting rod body 41A with threads on its surface and a snap-fit ​​end 41B located at the first end of the adjusting rod body 41A. The diaphragm coupling block 42 has a gear-type pressing block body 42A, a pressing block groove 42B with a side opening located above the gear-type pressing block body 42A, and a pressing block threaded hole located within the gear-type pressing block body. The pressing block groove 42B is used for interlocking with the snap-fit ​​end 41B of the adjusting rod 41, and the pressing block threaded hole is used for subsequent screw-in connection with the threaded connector 33 of the wear-resistant diaphragm sheet 30.

[0092] Figure 14 Draw corresponding Figure 12 Assembly diagram for step S2. The operation of step S2 can be found by referring to... Figure 14 (Refer to) Figure 2 , Figure 3 and Figure 4 The adjusting rod 41 and the diaphragm coupling pressure block 42 are then installed into the valve cover 10. The adjusting rod 41 and the diaphragm coupling pressure block 42 are interlocked and then installed into the valve cover 10. The adjusting rod body 41A is screwed into the valve cover threaded hole 14 of the valve cover 10 and extends outwards. The toothed shape of the gear-shaped pressure block body 42A of the diaphragm coupling pressure block 42 engages with the pressure block limiting groove 15 on the inner wall of the valve cover 10. This engagement restricts the rotation of the diaphragm coupling pressure block 42, ensuring that it can only move linearly up and down along the axial direction inside the valve cover 10.

[0093] Figure 15 Draw corresponding Figure 12 Assembly diagram for step S3. The operation of step S3 can be found in [reference needed]. Figure 15 (Refer to) Figure 2 , Figure 3 and Figure 4 A sealing ring 11 and an opening indicator ring 43 are assembled on the valve cover 10. The valve cover 10 has a sealing groove 12 for mounting the sealing ring 11 and an indicator ring slot 13 for mounting the opening indicator ring 43 on its exterior. The sealing ring 11 and the opening indicator ring 43 are respectively fitted into the sealing groove 12 and the indicator ring slot 13. The sealing ring 11 seals the gap between the valve cover 10 and the diaphragm valve seat 20, and the opening indicator ring 43 indicates the opening degree of the grinding fluid diaphragm valve.

[0094] Figure 16 Draw corresponding Figure 12 Assembly diagram for step S4. The operation of step S4 can be found in [reference needed]. Figure 15 (Refer to) Figure 2 , Figure 3 , Figure 6 , Figure 7 and Figure 8A wear-resistant diaphragm 30 is installed at the lower part of the diaphragm coupling block 42. The wear-resistant diaphragm 30 includes a rubber body 31, a PTFE wear-resistant layer 32 covering the lower surface of the rubber body 31, and a threaded connector 33 embedded in the upper part of the rubber body 31 for connecting the adjustment assembly 40. This threaded connector 33 is typically made of a high-strength metal (such as stainless steel) to ensure sufficient rigidity and durability. The PTFE wear-resistant layer 32 is bonded to the rubber body 31, for example, through a hot-pressing process. During the use of the polishing slurry diaphragm valve, it serves as the surface in contact with the polishing slurry, effectively ensuring the high cleanliness required for semiconductor processes while also providing wear resistance. The surface of the PTFE wear-resistant layer 32 is used to subsequently form a static sealing interface between itself and the annular stepped surface 26 of the diaphragm valve seat 20. The annular stepped surface 26 is constructed with an inclination angle of 3°-10° relative to the horizontal plane. This inclination design avoids the wear-resistant diaphragm 30 from being subjected to extreme pre-compression, effectively ensuring the flexural service life of the wear-resistant diaphragm 30. A limiting step 31A and a pre-embedded groove 31B communicating with the limiting step 31A are provided on the rubber body 31. The threaded connector 33 has a pre-embedded end 33A matching the shape of the pre-embedded groove 31B, a limiting part 33B matching the shape of the limiting step 31A, and a threaded part 33C for screwing into the diaphragm connecting block 42. The pre-embedded end 33A of the threaded connector 33 is embedded in the pre-embedded groove 31B, so that the pre-embedded end 33A is completely covered and pre-embedded in the rubber elastomer substrate, thereby ensuring the connection strength between the threaded connector 33 and the rubber body 31. The limiting part 33B is installed at the limiting step 31A. The surface of the limiting part 33B can provide a precise mechanical positioning reference surface. When the wear-resistant diaphragm 30 is installed on the diaphragm coupling block 42 of the adjusting assembly 40, the surface of the limiting part 33B will contact the corresponding surface of the diaphragm coupling block 42, thereby strictly limiting the axial position of the installation. Without the limiting part 33B, the flexible rubber body 31 of the wear-resistant diaphragm 30 will directly contact the rigid end face of the diaphragm coupling block 42. When performing the screwing operation, if the screwing degree is too deep, the middle sealing part of the wear-resistant diaphragm 30 will be concave, which will adversely affect the sealing performance; if the screwing degree is too shallow, the middle position of the wear-resistant diaphragm 30 will be convex, which will adversely affect the service life of the diaphragm. By limiting the axial position of the installation by the limiting part 33B, the installation height of the wear-resistant diaphragm 30 can be kept consistent, thereby ensuring the stable sealing performance and precise flow control characteristics of the grinding fluid diaphragm valve and eliminating performance fluctuations caused by installation errors.

[0095] Figure 17 Draw corresponding Figure 13Assembly diagram for step S5. The operation of step S5 can be found in [reference needed]. Figure 15 (Refer to) Figure 2 , Figure 3 and Figure 5 The valve cover 10 is installed on the diaphragm valve seat 20. Specifically, the valve cover 10, which includes the adjusting rod 41, the diaphragm coupling block 42, and the wear-resistant diaphragm sheet 30, is assembled to the bottom of the diaphragm valve seat 20 through a slot, and is locked to the diaphragm valve seat 20 by a valve seat lock nut 21 using threads. The bottom surface of the valve seat lock nut 21 is required to be flush with the limiting teeth of the diaphragm valve seat 20. The diaphragm valve seat 20 has a valve port 23 and a first flow channel 24 and a second flow channel 25 communicating with the valve port 23. The valve cover 10 is installed on the diaphragm valve seat 20 and locked and fixed to the diaphragm valve seat 20 by the valve seat lock nut 21. In a preferred embodiment, the first flow channel 24 and the second flow channel 25 are symmetrically arranged, allowing the grinding fluid to flow in from the first flow channel 24 and out from the second flow channel 25, or vice versa. The valve cover 10 and the wear-resistant diaphragm 30 are installed at the valve port 23. A sealing ring 11, pre-fitted into the sealing groove 12 of the valve cover 10, seals the gap between the valve cover 10 and the diaphragm valve seat 20. The outer periphery of the valve port 23 has an annular stepped surface 26, which supports the outer edge of the wear-resistant diaphragm 30. (See reference for mating.) Figure 8 The surface of the wear-resistant diaphragm 30 and the annular stepped surface 26 form the static sealing interface of the grinding fluid diaphragm valve. The annular stepped surface 26 has an inclination of 3°-10° relative to the horizontal plane. This inclination design avoids the wear-resistant diaphragm 30 from being subjected to extreme pre-compression, effectively ensuring the flexural service life of the wear-resistant diaphragm 30. At the same time, there is no installation gap between the wear-resistant diaphragm 30 and the diaphragm valve seat 20, which keeps the valve cavity clean and free of dead zones, prevents dirt accumulation, ensures the internal cavity replacement rate, and thus effectively meets the relevant requirements for semiconductor cleanliness.

[0096] Figure 18 Draw corresponding Figure 13 Assembly diagram for step S6. The operation of step S6 can be found in [reference needed]. Figure 18 (Refer to) Figure 9 , Figure 10 and Figure 11A limit adjusting nut 46 is assembled onto the handwheel 44, and the handwheel 44 is mounted on the adjusting rod 41. The limit adjusting nut 46 and the handwheel 44 are screwed into the adjusting rod 41 through a threaded connection. The lowest position of the handwheel 44 overlaps with the highest position of the opening indicator ring 43; this state represents the maximum opening position of the grinding fluid diaphragm valve. The limit adjusting nut 46 has a central threaded hole 46A and a ratchet tooth 46B located on the outer end face of the limit adjusting nut 46. The internal thread of the central threaded hole 46A can precisely engage with the external thread on the adjusting rod 41. The ratchet tooth 46B is used for linkage and locking with the handwheel 44. The handwheel 44 has a smooth, threadless central hole 44A at its center. A handwheel locking block 45 is installed at the central hole 44A to lock the handwheel 44 to the second end of the adjusting rod 41. A ratchet tooth 44B is provided on the inner surface of the handwheel 44. When the limiting adjusting nut 46 is assembled on the handwheel 44, the ratchet tooth 44B of the handwheel engages with the ratchet tooth 46B of the nut. Under normal operation, due to the tight engagement of the ratchet tooth 44B of the handwheel and the ratchet tooth 46B of the nut, the handwheel 44 and the limiting adjusting nut 46 are locked in the rotational direction to form an integral driving component. During rotation, this integral driving component drives the adjusting rod 41 to drive the diaphragm connecting shaft pressure block 42 and the wear-resistant diaphragm 30 to move up and down linearly, thereby realizing the opening and closing of the grinding fluid diaphragm valve. In addition, the limiting adjusting nut 46 can move up and down along the adjusting rod 41 to set the closing stroke or closing gap of the wear-resistant diaphragm 30. Specifically, by individually adjusting the initial position of the limiting adjusting nut 46 in the axial direction of the adjusting rod 41, the functional mode of the grinding fluid diaphragm valve can be set. Specifically, when the limit adjusting nut 46 is set so that its bottom surface abuts against the top of the valve cover 10, the wear-resistant diaphragm 30 reaches a sealed state. This serves as the limit for the closing stroke of the grinding fluid diaphragm valve, ensuring that the wear-resistant diaphragm 30 will not be subjected to excessive ultimate compression when the handwheel 44 is continuously rotated. This prevents the wear-resistant diaphragm 30 from losing its resilience or from undergoing excessive deformation due to ultimate compression, which could damage its molecular structure, shorten its service life, and cause cracking. When the wear-resistant diaphragm 30 is used as a non-dead valve, given the presence of crystallization in some fluids, the grinding fluid diaphragm valve needs to have a dripping effect when closed to ensure a small flow rate. In this case, the limit adjusting nut 46 can be moved in the initial state so that the grinding fluid diaphragm valve cannot be fully closed when the bottom surface of the limit adjusting nut 46 abuts against the top of the valve cover 10.

[0097] Figure 19 Draw corresponding Figure 13 Assembly diagram for step S7. The operation of step S7 can be found in [reference needed]. Figure 19 (Refer to) Figure 2 A handwheel locking block 45 is mounted on the handwheel 44, and a connecting nut 22 is installed on the first flow channel 24 and the second flow channel 25. The handwheel locking block 45 is used to lock the handwheel 44 to the adjusting rod 41, and the connecting nut is used to connect the polishing slurry diaphragm valve to the piping system of the semiconductor CMP equipment.

[0098] The high back pressure pneumatic valve provided in the embodiments and variations of this invention has the following working principle: When the handwheel 44 is rotated clockwise, the handwheel drives the limit adjusting nut 46 and the adjusting rod 41 to rotate synchronously through the ratchet teeth. Under the action of the valve cover threaded hole 14, the adjusting rod 41 converts the rotational motion into axial downward linear motion, pushing the diaphragm connecting block 42 and the wear-resistant diaphragm 30 to move downward. When the PTFE wear-resistant layer 32 contacts the annular stepped surface 26 of the diaphragm valve seat 20, the 3°-10° tilt angle causes the diaphragm to generate a self-centering effect at the moment of contact, and forms an annular sealing band as the pressure increases, cutting off the connection between the first flow channel 24 and the second flow channel 25. When it is necessary to set the "anti-crystallization dripping mode", the operator needs to loosen the handwheel lock block in advance and rotate the limit adjusting nut 46 to move it downward along the adjusting rod a specific distance. At this time, during the valve closing process, the bottom surface of the limit adjusting nut 46 will abut against the top of the valve cover 10 before the diaphragm sealing contact point, forcing the adjusting rod to stop descending, thereby maintaining a preset closing gap between the diaphragm and the valve seat.

[0099] The specific embodiments and variations provided by the present invention have the following corresponding technical effects to achieve a significant improvement over the prior art:

[0100] 1. Overcame the challenges of wear and crystallization in polishing slurries: Utilizing the low coefficient of friction and chemical inertness of the PTFE layer to resist slurry erosion, combined with a 3°-10° inclined valve seat design, the traditional "flat-surface crushing" seal is transformed into an "inclined wedge-tight" seal. This design not only optimizes the flow velocity gradient in the sealing area, reducing particle impact kinetic energy, but also eliminates dead zones in the valve cavity, preventing polishing slurry precipitation and crystallization, significantly improving the valve's cleanliness level.

[0101] 2. Achieves flexible switching and precise reset of process modes: The innovative limit adjustment nut, combined with the ratchet locking mechanism, enables the valve to have both full shut-off and micro-drip modes. For example, when the CMP machine is in standby mode, it can be quickly adjusted to drip mode to keep the pipeline moist; during maintenance, it can be adjusted to full shut-off mode. Furthermore, the ratchet structure provides mechanical position memory and anti-loosening functions, ensuring that the set value does not drift under vibration conditions.

[0102] 3. Improved assembly accuracy and structural reliability: The design of the limiting part and limiting step of the pre-embedded part inside the wear-resistant diaphragm establishes an axial dimension benchmark at the assembly source. This eliminates the initial installation height error of the diaphragm caused by inconsistent thread engagement depth, ensuring the consistency of the opening degree of all valves at the same handwheel rotation angle (repeatability), and greatly reducing the debugging cost of semiconductor equipment.

[0103] The above are all preferred embodiments of the present invention and are not intended to limit the scope of protection of the present invention. Therefore, all equivalent changes made in accordance with the structure, shape and principle of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A slurry diaphragm valve for a semiconductor CMP apparatus, characterized by, include: The diaphragm valve seat (20) has a valve port (23) and a first flow channel (24) and a second flow channel (25) communicating with the valve port (23). The diaphragm valve seat (20) is provided with an annular stepped surface (26) surrounding the valve port (23). The annular stepped surface (26) has an inclined surface that is inclined downward from the center relative to the horizontal plane at a rate of 7° to 10°, so that when the wear-resistant diaphragm sheet (30) is pressed down, it is attached to the inclined surface and there is no installation gap between the wear-resistant diaphragm sheet (30) and the diaphragm valve seat (20). A wear-resistant diaphragm (30) is installed on the valve port (23) and has a rubber body (31), a PTFE wear-resistant layer (32) covering the surface of the rubber body (31), and a threaded connector (33) embedded in the rubber body (31). A limiting step (31A) is provided on the rubber body (31), and a pre-embedded groove (31B) communicating with the limiting step (31A) is provided inside. The threaded connector (33) has a pre-embedded end (33A), a limiting part (33B), and a threaded part (33C) connected in sequence. The pre-embedded end (33A) is embedded in the pre-embedded groove (31B), and the limiting part (33B) is installed at the limiting step (31A). The surface of the PTFE wear-resistant layer (32) contacts the inclined surface of the annular step (26) to form a static sealing interface for the non-limit pre-pressure of the grinding fluid diaphragm valve. The compression rate of the rubber body (31) is 15%-25%. A valve cover (10) is installed on the diaphragm valve seat (20), and the valve cover (10) and the diaphragm valve seat (20) are locked together by a valve seat lock nut (21); An adjusting assembly (40) is installed on the valve cover (10). The adjusting assembly (40) is used to drive the wear-resistant diaphragm (30) to move downward from the fully open position until the PTFE wear-resistant layer (32) and the annular stepped surface (26) form an effective seal. The adjusting assembly (40) includes an adjusting rod (41), a diaphragm coupling block (42), a handwheel (44), and a limiting adjusting nut (46). The diaphragm coupling block (42) is connected to the adjusting rod (41) and the threaded connector (33). The limiting part (33B) of the threaded connector (33) contacts the surface of the diaphragm coupling block (42) to limit the axial installation position of the adjusting assembly (40), thereby limiting the screw-in depth of the threaded connector (33) and keeping the axial installation height of the wear-resistant diaphragm (30) consistent. The limiting adjusting nut (46) is assembled on the handwheel (44), and the handwheel... The handwheel (44) and the limiting adjustment nut (46) are mounted on the adjusting rod (41); wherein, the handwheel (44) is used to drive the adjusting rod (41) to move the diaphragm connecting block (42) and the wear-resistant diaphragm (30) up and down to adjust the opening of the valve port (23); the limiting adjustment nut (46) moves down along the adjusting rod (41) to set the closing stroke of the wear-resistant diaphragm (30); the limiting adjustment nut (46) is mounted on the adjusting rod (41) to adjust the opening of the valve port (23); the limiting adjustment nut (46) is mounted on the adjusting rod (41) to adjust the closing stroke of the wear-resistant diaphragm (30); the limiting adjustment nut (44) is mounted on the adjusting rod (41) to adjust the opening of the valve port (23 ...4) to adjust the opening of the valve port (23) to adjust the opening of the valve port (24) to adjust the opening of the valve port (23) to adjust the opening of the valve The nut (46) has a central threaded hole (46A) and a ratchet tooth (46B) with an outer end face. The central threaded hole (46A) is used to assemble the limiting adjustment nut (46) onto the adjusting rod (41). The handwheel (44) has a handwheel ratchet tooth (44B) inside. The handwheel ratchet tooth (44B) meshes with the nut ratchet tooth (46B) to circumferentially lock the handwheel (44) and the limiting adjustment nut (46).

2. The slurry diaphragm valve for a semiconductor CMP apparatus according to claim 1, characterized by, The valve cover (10) is fitted with a sealing ring (11), which is used to seal the gap between the valve cover (10) and the diaphragm valve seat (20). The valve cover (10) has a valve cover threaded hole (14) and a pressure block limiting slide groove (15). The adjusting rod (41) and the diaphragm connecting shaft pressure block (42) are assembled in the valve cover (10). The adjusting rod (41) extends out of the valve cover (10) from the valve cover threaded hole (14). The shape of the pressure block limiting slide groove (15) matches the shape of the diaphragm connecting shaft pressure block (42) to restrict the circumferential rotation of the diaphragm connecting shaft pressure block (42) and make the diaphragm connecting shaft pressure block (42) slide up and down in the axial direction.

3. The grinding fluid diaphragm valve according to claim 2, characterized in that, The adjusting rod (41) has an adjusting rod body (41A) with threads on its surface and a snap-fit ​​end (41B) at the end of the adjusting rod body (41A); the diaphragm connecting block (42) has a gear block body (42A), a block slot (42B) with a side opening on the gear block body (42A) and a block threaded hole in the gear block body (42A). The block slot (42B) is used to interlock with the snap-fit ​​end (41B), and the block threaded hole is used to screw into the threaded connector (33); wherein, the tooth-shaped shape of the gear block body (42A) cooperates with the block limiting groove (15) to restrict the circumferential rotation of the diaphragm connecting block (42).

4. The grinding fluid diaphragm valve according to claim 1, characterized in that, The adjustment assembly (40) further includes an opening indicator ring (43) and a handwheel locking block (45). The opening indicator ring (43) is sleeved on the valve cover (10) and is used to indicate the opening degree of the valve port (23). The handwheel locking block (45) is installed on the handwheel (44) and is used to lock the handwheel (44) to the adjustment rod (41).

5. The grinding fluid diaphragm valve according to claim 1, characterized in that, Both the first flow channel (24) and the second flow channel (25) are equipped with connecting pipe nuts (22).

6. The grinding fluid diaphragm valve according to claim 1, characterized in that, The material of the threaded connector (33) is selected from a combination of the following: polyvinylidene fluoride, polyether ether ketone, or stainless steel with a perfluoroalkoxy coating; the PTFE wear-resistant layer (32) is doped with nanodiamond or nano boron nitride.

7. A method for assembling a slurry diaphragm valve for a semiconductor CMP equipment as described in claim 1, characterized in that, Includes the following steps: S1. Assemble the adjusting rod (41) on the diaphragm coupling pressure block (42); S2. Install the adjusting rod (41) and the diaphragm connecting block (42) into the valve cover (10). S4. Install the wear-resistant diaphragm (30) at the lower part of the diaphragm coupling block (42); the wear-resistant diaphragm (30) has a rubber body (31), a PTFE wear-resistant layer (32) covering the surface of the rubber body (31), and a threaded connector (33) embedded in the rubber body (31); a limiting step (31A) is opened on the rubber body (31), and a pre-embedded groove (31B) communicating with the limiting step (31A) is opened inside; the threaded connector (33) has a pre-embedded end (33A), a limiting part (33B) and a threaded part (33C) connected in sequence, the pre-embedded end (33A) is embedded in the pre-embedded groove (31B), the limiting part (33B) is installed at the limiting step (31A), and the limiting part (33B) contacts the surface of the diaphragm coupling block (42) to limit the axial installation position of the adjustment component (40); S5. Install the valve cover (10) onto the diaphragm valve seat (20); the diaphragm valve seat (20) has a valve port (23) and a first flow channel (24) and a second flow channel (25) communicating with the valve port (23), and the diaphragm valve seat (20) has an annular stepped surface (26) surrounding the valve port (23), the annular stepped surface (26) has an inclined surface at a relative angle of 7° to 10° to the horizontal plane, and the surface of the PTFE wear-resistant layer (32) contacts the inclined surface to form a static seal without ultimate pre-pressure; in step S5, the valve cover (10) and the diaphragm valve seat (20) are locked together by the valve seat lock nut (21); S6. Assemble the limit adjusting nut (46) onto the handwheel (44), and install the limit adjusting nut (46) and the handwheel (44) onto the adjusting rod (41); wherein, the handwheel (44) is used to drive the adjusting rod (41) to move the diaphragm connecting block (42) and the wear-resistant diaphragm (30) up and down to adjust the opening of the valve port (23); the limit adjusting nut (46) moves down along the adjusting rod (41) to set the wear-resistant diaphragm (30) to close. In step S6, the limiting adjusting nut (46) has a nut center threaded hole (46A) and a nut ratchet tooth (46B) with an outer end face. The nut center threaded hole (46A) is used to assemble the limiting adjusting nut (46) onto the adjusting rod (41). The handwheel (44) has a handwheel ratchet tooth (44B) inside. The handwheel ratchet tooth (44B) is used to mesh with the nut ratchet tooth (46B) to circumferentially lock the handwheel (44) and the limiting adjusting nut (46).

8. The assembly method according to claim 7, characterized in that, The valve cover (10) is fitted with a sealing ring (11) to seal the gap between the valve cover (10) and the diaphragm valve seat (20). The valve cover (10) has a valve cover threaded hole (14) and a pressure block limiting groove (15). The adjusting rod (41) and the diaphragm connecting rod pressure block (42) are assembled inside the valve cover (10). The adjusting rod (41) extends out of the valve cover (10) from the valve cover threaded hole (14). The shape of the pressure block limiting groove (15) matches the shape of the diaphragm connecting rod pressure block (42) to limit the circumferential rotation of the diaphragm connecting rod pressure block (42) and allow the diaphragm connecting rod pressure block (42) to slide up and down along the axial direction. The adjusting assembly (40) also includes an opening indicator ring (43), which is sleeved on the valve cover (10) to indicate the opening degree of the valve port (23). Between step S2 and step S4, step S3 is performed: assembling the sealing ring (11) and the opening indicator ring (43) on the valve cover (10); In step S2, a valve cover threaded hole (14) and a pressure block limiting groove (15) are opened in the valve cover (10). The adjusting rod (41) extends out of the valve cover (10) from the valve cover threaded hole (14). The shape of the pressure block limiting groove (15) matches the shape of the diaphragm connecting pressure block (42) to restrict the circumferential rotation of the diaphragm connecting pressure block (42) and make the diaphragm connecting pressure block (42) slide up and down in the axial direction.

9. The assembly method according to claim 7, characterized in that, The adjusting assembly (40) further includes a handwheel locking block (45), which is mounted on the handwheel (44) and used to lock the handwheel (44) to the adjusting rod (41); in step S1, the adjusting rod (41) has an adjusting rod body (41A) with threads on its surface and a snap-fit ​​end (41B) provided at the end of the adjusting rod body (41A); the diaphragm coupling pressure block (42) has a gear pressure block body (42A) and is provided with... The gear pressing block body (42A) has a pressing block slot (42B) with a side opening and a pressing block threaded hole provided in the gear pressing block body (42A). The pressing block slot (42B) is used to interlock with the snap-fit ​​end (41B). The assembly method further includes the following steps after step S6: S7, assembling the handwheel locking block (45) on the handwheel (44) and installing the connecting pipe nut (22) on the first flow channel (24) and the second flow channel (25).

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