Vacuum internal hall measurement system for vacuum internal undulators

Abstract

The application belongs to the technical field of magnetic variable measurement, and solves the technical problem of poor magnetic field measurement precision caused by single attitude adjustment of the existing Hall measurement system. The vacuum Hall measurement system for the in-vacuum undulator comprises a vacuum chamber, a Hall probe and a motion execution mechanism. The motion execution mechanism comprises a guide rail and a pose adjustment mechanism. The Hall probe is movable along the extension direction of the guide rail. The pose adjustment mechanism drives the Hall probe to move three-dimensionally to measure the magnetic field distribution through the guide rail. The pose adjustment mechanism comprises a Z-direction swing platform to adjust the pitch angle of the guide rail, a Y-direction swing platform to adjust the roll angle of the guide rail, a Y-direction moving platform, an X-direction moving platform and a Z-direction moving platform. The application can adjust the attitude in two directions and the position in three directions in space, reduce the parasitic displacement, make the Hall probe move three-dimensionally in the undulator and improve the magnetic field measurement precision.

Description

TECHNICAL FIELD

[0001] The present application generally relates to the technical field of magnetic variable measurement, and in particular to an in-vacuum Hall measurement system for an in-vacuum undulator. BACKGROUND

[0002] An in-vacuum undulator (IVU) is a core key component in modern advanced light sources. Compared with traditional external undulators, the biggest feature of the in-vacuum undulator is that the magnet array is directly installed in the vacuum cavity, which makes the magnetic pole gap very small, usually in the order of millimeters, or even smaller. Such a super-small magnetic gap can significantly enhance the magnetic field strength. According to the relationship between the undulator radiation wavelength and the magnetic field strength, higher energy and higher brightness hard X-rays can be generated, which greatly expands the application range of the light source, and plays an irreplaceable role in the fields of biological macromolecular crystallography, material science, nanotechnology, etc.

[0003] In the related art, the magnetic measurement system of the in-vacuum undulator controls the three-dimensional movement of the Hall probe through the motion platform, but the motion platform in the related art cannot realize attitude adjustment or only has a single attitude adjustment example, which makes it difficult to completely adjust the correct attitude of the Hall probe, thereby resulting in poor magnetic field measurement accuracy. SUMMARY

[0004] In view of the above-mentioned defects or shortcomings in the prior art, it is desirable to provide an in-vacuum Hall measurement system for an in-vacuum undulator, which can adjust the attitude of the guide rail pick rod in two directions in space and the position adjustment in three directions, while minimizing the parasitic displacement caused by attitude adjustment, thereby enabling the Hall probe to move three-dimensionally in the undulator, and further improving the magnetic field measurement accuracy.

[0005] In a first aspect, the present application provides an in-vacuum Hall measurement system for an in-vacuum undulator, characterized in that it comprises: a vacuum chamber, a Hall probe installed in the vacuum chamber, and a motion execution mechanism, the motion execution mechanism comprising a guide rail and a pose adjustment mechanism, the guide rail being installed in the vacuum chamber and the Hall probe being movable along the extension direction of the guide rail, the pose adjustment mechanism being connected with the guide rail for adjusting the position and attitude of the guide rail to drive the Hall probe to move three-dimensionally in the vacuum chamber, the Hall probe being used for collecting the three-dimensional magnetic field distribution of the undulator, and the pose adjustment mechanism comprising:

[0006] a guide rail pick rod, the guide rail pick rod extending into the vacuum chamber and being connected with the guide rail;

[0007] an attitude adjustment unit, the attitude adjustment unit comprising:

[0008] The around-Z swing platform is fixedly connected with the guide rail cantilever, and the guide rail cantilever can rotate around the first axis to adjust the pitch angle of the guide rail;

[0009] The around-Y swing platform is fixedly connected with the around-Z swing platform, and the guide rail cantilever can be driven to rotate around the second axis by driving the around-Z swing platform to rotate around the second axis to adjust the roll angle of the guide rail; the first axis and the second axis intersect with the axis of the guide rail cantilever;

[0010] The position adjusting unit comprises:

[0011] The Y-direction moving platform is connected with the around-Y swing platform, and drives the attitude adjusting unit to move horizontally along the Y direction to adjust the position of the guide rail in the Y direction;

[0012] The X-direction moving platform is connected with the Y-direction moving platform, and drives the Y-direction moving platform and the attitude adjusting unit to move along the X direction to adjust the position of the guide rail in the X direction;

[0013] The Z-direction moving platform is connected with the X-direction moving platform, and drives the X-direction moving platform, the Y-direction moving platform and the attitude adjusting unit to move along the Z direction to adjust the position of the guide rail in the Z direction.

[0014] As an optional solution, the around-Z swing platform comprises:

[0015] The first base has an arc-shaped first matching surface;

[0016] The first moving gland is installed on the first base, and the first moving gland has an arc-shaped groove formed thereon, and the arc-shaped groove has a second matching surface;

[0017] The first support frame is fixedly connected with the guide rail cantilever;

[0018] The second moving gland is installed on the first support frame, and an arc-shaped guide rail is formed in the region close to the first moving gland of the second moving gland, the arc-shaped guide rail has opposite third and fourth matching surfaces, the arc-shaped guide rail is located in the arc-shaped groove, the first matching surface and the third matching surface are slidingly matched in the arc surface extension direction thereof, and the second matching surface and the fourth matching surface are slidingly matched;

[0019] The first power mechanism comprises a first driving motor, an adjusting fork and an adjusting baffle, the adjusting fork is fixedly connected with the first support frame, and the adjusting fork has an adjusting cavity, the adjusting baffle is located in the adjusting cavity, the adjusting baffle is fixedly connected with the first base, the adjusting baffle is drivingly connected with the output end of the first driving motor, the first driving motor drives the adjusting baffle to move in the adjusting cavity, and drives the first support frame and the guide rail cantilever to rotate around the first axis to adjust the pitch angle of the guide rail.

[0020] The output end of the first driving motor is connected with a jacking rod, and the end face of the jacking rod is in point contact with the surface of the adjusting baffle.

[0021] As an optional solution, a plurality of locking bolts are further arranged between the adjusting fork and the adjusting baffle, the plurality of locking bolts are uniformly distributed on the opposite sides of the adjusting baffle, each locking bolt is in threaded connection with the adjusting fork, and the end of each locking bolt extends into the adjusting cavity through the adjusting fork, the end face of the locking bolt is in point contact with the surface of the adjusting baffle, so as to fix the moving position of the adjusting baffle.

[0022] As an optional solution, the Y-direction swing platform comprises:

[0023] An adjusting slide is fixedly connected with the Z-direction swing platform, the adjusting slide has opposite first and second arc surfaces, a part of the first arc surface is recessed towards the second arc surface, a matching groove and an adjusting platform are formed on the adjusting slide, and the adjacent surfaces of the matching groove and the adjusting platform are arc surfaces;

[0024] A second base is formed with an adjusting plate, the second base further has a fifth matching surface in sliding cooperation with the first arc surface, the adjusting plate comprises an adjacent matching platform and an adjusting groove, the profile of the matching platform is the same as that of the matching groove, the profile of the adjusting groove is the same as that of the adjusting platform, the adjusting slide cooperates with the adjusting plate, the matching platform and the matching groove are in sliding cooperation in the extension direction of the arc surface, the adjusting platform and the adjusting groove are in sliding cooperation in the extension direction of the arc surface, and the first arc surface of the adjusting slide is slidable along the fifth matching surface of the second base;

[0025] A second power mechanism comprises a second driving motor and a transmission member in driving connection with the second driving motor, the second driving motor is installed on the second base, the transmission member is connected with the adjusting slide, and the adjusting slide is driven to slide on the second base to adjust the overturning angle of the guide rail.

[0026] As an optional solution, the transmission member comprises a worm and a worm wheel in mutual engagement, one of the worm and the worm wheel is in driving connection with the second driving motor, and the other is connected with the adjusting slide;

[0027] The second base further comprises a hollow mounting table, the second driving motor is installed on one side of the mounting table, and the output shaft of the second driving motor is located inside the mounting table, the surface of the mounting table close to the first arc surface is configured as the fifth matching surface, and an arc-shaped hole is formed in the fifth matching surface, and the worm and the worm wheel are engaged at the arc-shaped hole.

[0028] As an optional solution, the Y-direction moving platform comprises:

[0029] A lifting table is fixedly connected with the Y-direction swing platform, and the lifting table has an inclined surface.

[0030] The fixed table is arranged opposite to the lifting table, a surface of the fixed table facing the lifting table is a mounting surface, and a lifting space is formed between the mounting surface and the inclined surface, and the inclined surface is inclined towards a direction away from the mounting surface;

[0031] The third power mechanism comprises a third driving motor, a first guide rail, a trapezoidal screw, a first sliding block, a second guide rail, a second sliding block and a wedge-shaped connecting block, the third driving motor is drivingly connected with the trapezoidal screw, the trapezoidal screw is connected with the first sliding block, the first sliding block is slidingly matched with the first guide rail, the first guide rail is mounted on the mounting surface, the second guide rail is mounted on the inclined surface, and the extending direction of the second guide rail is the same as the inclined direction of the inclined surface, the second sliding block is slidingly matched with the second guide rail, and the wedge-shaped connecting block is fixedly connected with the first sliding block and the second sliding block respectively.

[0032] As an optional solution, the Y-direction moving platform further comprises a limiting mechanism, the limiting mechanism comprises:

[0033] The third guide rail and a third sliding block slidingly connected with the third guide rail, the lifting table has a Y-direction side surface parallel to the Y direction, the third guide rail is fixedly mounted on the Y-direction side surface, and the third guide rail is arranged along the Y direction;

[0034] A fixed plate, the fixed plate is located on one side of the Y-direction side surface and is fixedly connected with the fixed table, and the fixed plate is fixedly connected with the third sliding block.

[0035] As an optional solution, the Y-direction moving platform further comprises a first grating ruler, the first grating ruler comprises a body, a reading head and a bracket, the body is fixed on the fixed plate, a long hole is formed on the fixed plate along the Y direction, one end of the bracket passes through the long hole and is connected with the lifting table, the other end of the bracket is provided with the reading head, the reading head is in contact with the body, and the lifting table can drive the reading head to move along the extending direction of the long hole.

[0036] As an optional solution, the X-direction moving platform comprises:

[0037] A first sliding plate, the first sliding plate is fixedly connected with the Y-direction moving platform;

[0038] A fourth base;

[0039] A fourth power mechanism, the fourth power mechanism is mounted on the fourth base, the fourth power mechanism comprises a fourth driving motor, a fourth guide rail, a fourth screw and a fourth sliding block, the fourth guide rail is arranged along the X direction, the fourth driving motor and the fourth screw are drivingly connected, the fourth screw is connected with the fourth sliding block, the fourth sliding block is slidingly matched with the fourth guide rail, and the fourth sliding block is fixedly connected with the first sliding plate;

[0040] A second grating ruler, the second grating ruler is mounted on the fourth base, and a reading head of the second grating ruler is connected with the first sliding plate;

[0041] The Z-direction moving platform comprises:

[0042] The second sliding plate is fixedly connected with the X-direction moving platform;

[0043] The fifth base;

[0044] The fifth power mechanism is installed on the fifth base, and the fifth power mechanism comprises a fifth driving motor, a fifth guide rail, a fifth screw rod and a fifth sliding block.

[0045] The third grating ruler is installed on the fifth base, and a reading head of the third grating ruler is connected with the second sliding plate.

[0046] The fourth base and the fifth base are respectively provided with locking mechanisms connected with the first sliding plate and the second sliding plate respectively, and the locking mechanisms are used for locking positions of the first sliding plate and the second sliding plate.

[0047] As an optional solution, the vacuum Hall measurement system further comprises an upper force sensing mounting seat, a lower force sensing mounting seat, an upper support rod, a lower support rod and a sealing pipe, the upper support rod and the lower support rod are fixedly connected with the guide rail cantilever rod respectively, the upper support rod is installed on the upper force sensing mounting seat, the lower support rod is installed on the lower force sensing mounting seat, the upper force sensing mounting seat and the lower force sensing mounting seat are fixedly installed on opposite sides of the first support frame respectively, the sealing pipe is sleeved outside the guide rail cantilever rod, one end of the guide rail cantilever rod extends into the vacuum chamber, and the guide rail cantilever rod is sealingly connected with the contact position in the vacuum chamber.

[0048] The vacuum Hall measurement system for the undulator in the vacuum chamber of the application, the guide rail cantilever rod is connected with the guide rail in the vacuum chamber, the Hall probe moves along the guide rail, the pitch angle of the guide rail can be reliably adjusted through the Z-direction swing platform, the roll angle of the guide rail can be reliably adjusted through the Y-direction swing platform, and the axis of the Z-direction swing and the axis of the Y-direction swing intersect with the axis of the guide rail cantilever rod, thereby reliably reducing the parasitic displacement generated by the attitude adjustment and improving the attitude adjustment accuracy. BRIEF DESCRIPTION OF DRAWINGS

[0049] Other features, objects, and advantages of the application will become more apparent from the following detailed description of non-limiting embodiments, when read in conjunction with the accompanying drawings:

[0050] Figure 1 Structure diagram of a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0051] Figure 2 Structure diagram of a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the vacuum chamber);

[0052] Figure 3 Cooperation structure diagram of a guide rail and a pose adjustment mechanism in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0053] Figure 4 Structure diagram of a guide rail and a Hall probe in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0054] Figure 5 Structure diagram of a pose adjustment mechanism in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0055] Figure 6 Cooperation structure diagram of a guide rail and a Hall probe in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0056] Figure 7 Structure diagram of a Z-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0057] Figure 8 Structure diagram of a first moving gland in a Z-direction swing platform of an embodiment of the present application;

[0058] Figure 9 Structure diagram of a Z-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the first moving gland);

[0059] Figure 10 Structure diagram of a Y-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application;

[0060] Figure 11 Structure diagram of a Y-direction swing platform in a vacuum Hall measurement system for an in-vacuum undulator of an embodiment of the present application (remove the adjusting slider);

[0061] Figure 12A structure diagram of a slider adjustment structure in a Y-direction swing platform for an embodiment of the present application;

[0062] Figure 13 A structure diagram of a first view of a Y-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application;

[0063] Figure 14 A structure diagram of a second view of a Y-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application;

[0064] Figure 15 A structure diagram of a third view of a Y-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application;

[0065] Figure 16 A structure diagram of a Y-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application (remove the fixed plate);

[0066] Figure 17 A structure diagram of an X-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application;

[0067] Figure 18 A structure diagram of a Z-direction moving platform in a vacuum Hall measurement system for an internal undulator for an embodiment of the present application.

[0068] In the figure,

[0069] 1, vacuum chamber, 2, guide rail, 3, Hall probe;

[0070] 1000, vacuum Hall measurement system;

[0071] 2000, pose adjustment mechanism; 2100, guide rail jib, 2200, base, 2300, support leg;

[0072] 100, Z-direction swing platform, 110, first base, 111, first side plate, 112, second side plate, A1, first matching surface, 113, first moving gland, 114, arc-shaped groove, A2, second matching surface; 120, first support frame, 121, second moving gland, 123, arc-shaped guide rail, A3, third matching surface, A4, fourth matching surface, 130, first driving motor, 131, adjustment yoke, 132, adjustment baffle, B1, adjustment cavity, 133, jacking rod, 134, locking bolt;

[0073] 200, swing around Y direction platform, 210, adjusting slider, C1, first camber surface, C2 second camber surface, 211, matching groove, 212, adjusting table, 220, second base, 221, adjusting plate, A5, fifth matching surface, 225, matching table, 222, adjusting groove, 223, mounting table, 224, arc hole, 230, second driving motor;

[0074] 300, Y direction moving platform, 310, lifting table, 311, Y direction side surface, D1, inclined surface, 320, fixed table, D2, mounting surface, 330, third driving motor, 331, first guide rail, 332, trapezoidal lead screw, 333, first slider, 334, second guide rail, 335, second slider, 336, wedge-shaped connecting block, 340, third guide rail, 341, third slider, 350, fixed plate, 360, first grating ruler, 361, body, 362, reading head, 363, support, 364, long hole;

[0075] 400, X direction moving platform, 410, first sliding plate, 420, fourth base, 430, fourth driving motor, 431, fourth guide rail, 432, fourth lead screw, 433, fourth slider, 440, second grating ruler;

[0076] 500, Z direction moving platform, 510, second sliding plate, 520, fifth base, 530, fifth driving motor, 531, fifth guide rail, 532, fifth lead screw, 533, fifth slider, 540, third grating ruler;

[0077] 600, locking clamp, 610, fixed seat, 620, support shaft, 630, handle;

[0078] 700, upper force sensing mounting seat, 710, lower force sensing mounting seat, 720, upper support rod, 730, lower support rod, 740, sealing tube. DETAILED DESCRIPTION

[0079] The application will be described in further detail below with reference to the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the related application, and are not a limitation on the application. In addition, it should be noted that only parts related to the application are shown in the drawings for ease of description.

[0080] It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other without conflict. The present application will be described in detail below with reference to the drawings and embodiments.

[0081] In the related art, after the installation of the guide rail support structure is completed, the geometric parameters of the guide rail in the vacuum chamber are detected, and if they are unqualified, the poses of the plurality of support structures need to be adjusted. Due to the unreasonable configuration of the adjustment mechanism in the related art, parasitic displacement will be generated during the attitude adjustment. For example, in actual operation, adjusting the roll angle will affect the Y-direction position that has been adjusted. This coupling effect will increase the difficulty of fine adjustment, and the operator needs to repeatedly adjust and iterate, and is highly dependent on the operator's experience, resulting in low work efficiency and poor magnetic field measurement accuracy.

[0082] Based on the above problems, as shown in Figures 1-18 The embodiment of the present application provides a vacuum internal Hall measurement system 1000 for an internal undulator, which comprises a vacuum chamber 1, a Hall probe 3 installed in the vacuum chamber 1, and a motion execution mechanism, wherein the motion execution mechanism comprises a guide rail 2 and a pose adjustment mechanism 2000, the guide rail 2 is installed in the vacuum chamber 1, the Hall probe 3 is movable along the extension direction of the guide rail 2, the pose adjustment mechanism 2000 is connected with the guide rail 2 and used for adjusting the position and attitude of the guide rail 2 to drive the Hall probe 3 to move three-dimensionally in the vacuum chamber 1, and the Hall probe 3 is used for collecting the three-dimensional magnetic field distribution of the undulator. The pose adjustment mechanism 2000 comprises:

[0083] A guide rail cantilever 2100 is located outside the vacuum chamber 1, and the guide rail cantilever 2100 extends into the vacuum chamber 1 and is connected with the guide rail 2;

[0084] An attitude adjustment unit, the attitude adjustment unit comprises:

[0085] A Z-direction swing platform 100, the Z-direction swing platform 100 is fixedly connected with the guide rail cantilever 2100, and the guide rail cantilever 2100 is driven to rotate around a first axis line, so as to adjust the pitch angle of the guide rail 2;

[0086] A Y-direction swing platform 200, the Z-direction swing platform 100 is fixedly connected with the Y-direction swing platform 200, and the Y-direction swing platform 200 is driven to rotate around a second axis line by driving the Z-direction swing platform 100 to rotate around the second axis line, so as to adjust the roll angle of the guide rail 2; the first axis line and the second axis line intersect with the axis line of the guide rail cantilever 2100;

[0087] A position adjustment unit, the position adjustment unit comprises:

[0088] A Y-direction moving platform 300, the Y-direction moving platform 300 is connected with the Y-direction swing platform 200, and drives the attitude adjustment unit to move horizontally along the Y direction, so as to adjust the position of the guide rail 2 in the Y direction;

[0089] An X-direction moving platform 400, the X-direction moving platform 400 is connected with the Y-direction moving platform 300, and drives the Y-direction moving platform 300 and the attitude adjustment unit to move along the X direction, so as to adjust the position of the guide rail 2 in the X direction.

[0090] The Z-direction moving platform 500 is connected with the X-direction moving platform 400, and drives the X-direction moving platform 400, the Y-direction moving platform 300 and the posture adjusting unit to move along the Z-direction, so as to adjust the position of the guide rail 2 in the Z-direction.

[0091] It can be understood that, as shown in Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 , the guide rail jib 2100 is connected with the vacuum chamber 1 in a sealed manner, as long as the movement of the guide rail jib 2100 can drive the guide rail 2 to move. As shown in Figure 4 , the Hall probe 3 is installed on the guide rail 2 in the vacuum chamber 1, and can freely move along the extension direction of the guide rail 2. The guide rail jib 2100 is driven by the posture adjusting mechanism 2000 to move the guide rail 2, so that the Hall probe 3 can rotate around the Z-direction, rotate around the Y-direction, translate along the Y-direction, translate along the Z-direction and translate along the X-direction in the vacuum chamber 1, thereby improving the movement adjustment degree of freedom of the Hall probe 3, collecting more Hall voltage data in more directions, and further improving the absolute accuracy of the magnetic field measurement and the reliability and repeatability of the measurement results.

[0092] As shown in Figure 6 , the in-vacuum Hall measurement system further comprises an upper force sensing mounting seat 700, a lower force sensing mounting seat 710, an upper support rod 720, a lower support rod 730 and a sealing pipe 740. The upper support rod 720 and the lower support rod 730 are fixedly connected with the guide rail jib 2100, and the upper support rod 720 is installed on the upper force sensing mounting seat 700, and the lower support rod 730 is installed on the lower force sensing mounting seat 710. The upper force sensing mounting seat 700 and the lower force sensing mounting seat 710 are fixedly installed on opposite sides of the Z-direction swing platform 100, respectively. The sealing pipe 740 is sleeved outside the guide rail jib 2100. One end of the guide rail jib 2100 extends into the vacuum chamber 1, and the guide rail jib 2100 is connected with the vacuum chamber 1 in a sealed manner.

[0093] The vacuum inner Hall measurement system for the vacuum inner undulator of the embodiment of the present application solves the problem of the existing Hall measurement system and the single attitude adjustment. The guide rail jib 2100 of the embodiment of the present application is connected with the guide rail 2 in the vacuum chamber 1, the Hall probe 3 moves along the guide rail 2, the pitch angle of the guide rail 2 can be reliably adjusted through the Z-direction swing platform 100, the roll angle of the guide rail 2 can be reliably adjusted through the Y-direction swing platform 200, and the axis of the Z-direction swing and the axis of the Y-direction swing intersect with the axis of the guide rail jib 2100 (that is, the first axis and the second axis intersect with the axis of the guide rail jib 2100 at a point on the guide rail jib 2100), thereby reliably reducing the parasitic displacement generated by the attitude adjustment and improving the attitude adjustment accuracy; and the Y-direction moving platform 300, the X-direction moving platform 400 and the Z-direction moving platform 500 can respectively adjust the position of the guide rail jib 2100 in the Y-direction, the position of the guide rail jib 2100 in the X-direction and the position of the guide rail jib 2100 in the Z-direction, thereby improving the position adjustment degree of freedom of the guide rail jib 2100 and improving the position and attitude adjustment degree of freedom of the guide rail 2 and the Hall probe 3, which is beneficial to timely compensate for the movement error of the Hall probe in the actual measurement of the magnetic field distribution and improve the magnetic field measurement accuracy.

[0094] In some embodiments, as shown in Figure 7 、 Figure 8 and Figure 9 , the Z-direction swing platform 100 comprises:

[0095] The first base 110 has an arc-shaped first matching surface A1;

[0096] The first moving gland 113 is installed on the first base 110, and the arc-shaped groove 114 is formed on the first moving gland 113, and the arc-shaped groove 114 has a second matching surface A2;

[0097] The first support frame 120 is fixedly connected with the guide rail jib 2100;

[0098] The second moving gland 121 is installed on the first support frame 120, and the arc-shaped guide rail 123 is formed in the area close to the first moving gland 113 of the second moving gland 121, the arc-shaped guide rail 123 has opposite third and fourth matching surfaces A3 and A4, the arc-shaped guide rail 123 is located in the arc-shaped groove 114, the first matching surface A1 and the third matching surface A3 are in sliding fit in the arc surface extension direction thereof, and the second matching surface A2 and the fourth matching surface A4 are in sliding fit;

[0099] The first power mechanism comprises a first driving motor 130, an adjusting fork 131 and an adjusting baffle 132. The adjusting fork 131 is fixedly connected with the first supporting frame 120 and has an adjusting cavity B1. The adjusting baffle 132 is located in the adjusting cavity B1 and is fixedly connected with the first base 110. The adjusting baffle 132 is drivingly connected with an output end of the first driving motor 130. The first driving motor 130 drives the adjusting baffle 132 to move in the adjusting cavity B1, drives the first supporting frame 120 and the guide rail cantilever 2100 to rotate around the first axis, and adjusts the pitch angle of the guide rail 2.

[0100] The output end of the first driving motor 130 is connected with a jacking rod 133. An end surface of the jacking rod 133 is in point contact with a surface of the adjusting baffle 132.

[0101] The first base 110 can comprise two opposite first side plates 111 and second side plates 112. An arc-shaped first matching surface A1 is formed on each of the first side plates 111 and the second side plates 112. First moving glands 113 are fixedly connected to the first side plates 111 and the second side plates 112, respectively. An arc-shaped groove 114 is formed on the first moving glands 113, so that the first moving glands 113 have the function of a sliding block. The arc-shaped groove 114 is recessed in a direction away from the first side plates 111 or the second side plates 112. A bottom of the arc-shaped groove 114 is a second matching surface A2. A side wall of the arc-shaped groove 114 is fixedly connected with the first side plates 111 or the second side plates 112. A wear-resistant sheet can be arranged on a surface of the arc-shaped groove 114 in contact with the arc-shaped guide rail 123.

[0102] The first supporting frame 120 is mainly used for supporting the guide rail cantilever 2100. An arc-shaped guide rail 123 is formed on a region of the first supporting frame 120 close to the first side plates 111 or the second side plates 112. A side of the arc-shaped guide rail 123 close to the first matching surface A1 is a third matching surface A3. A side opposite to the third matching surface A3 is a fourth matching surface A4. The arc-shaped guide rail 123 is located in the arc-shaped groove 114.

[0103] The first driving motor 130 can be a servo motor. The servo motor drives the jacking rod 133 to extend or retract, applies force to the adjusting baffle 132, drives the first moving glands 113 to slide along the arc-shaped guide rail 123 of the second moving glands 121, and drives the first supporting frame 120 to rotate around the first axis, so as to adjust the pitch angle of the guide rail 2 and the Hall probe 3.

[0104] In the preferred embodiment, a plurality of locking bolts 134 are further arranged between the adjusting fork 131 and the adjusting baffle 132, the plurality of locking bolts 134 are uniformly distributed on opposite sides of the adjusting baffle 132, each locking bolt 134 is in threaded connection with the adjusting fork 131, and the end of each locking bolt 134 extends into the adjusting cavity B1 through the adjusting fork 131, and the end surface of the locking bolt 134 is in point contact with the surface of the adjusting baffle 132 to fix the moving position of the adjusting baffle 132.

[0105] In the embodiment, the arrangement of the locking bolt 134 is conducive to fixing the moving position of the adjusting baffle 132 through the locking bolt 134 in addition to the locking movement of the servo electrically equipped brake shoe machine, so that the posture of the guide rail cantilever 2100 can be further stabilized and fixed.

[0106] As an implementable manner, as shown in Figure 10 、 Figure 11 and Figure 12 , the Y-direction swing platform 200 comprises:

[0107] The adjusting slider 210 is fixedly connected with the Z-direction swing platform 100, the adjusting slider 210 has opposite first and second arc surfaces C1 and C2, a part of the first arc surface C1 is recessed towards the second arc surface C2, a matching groove 211 and an adjusting table 212 are formed on the adjusting slider 210, and the abutting surfaces of the matching groove 211 and the adjusting table 212 are arc surfaces;

[0108] The second base 220 has a fifth matching surface A5 in sliding cooperation with the first arc surface C1, and the adjusting plate 221 comprises an abutting matching table 225 and an adjusting groove 222, the profile of the matching table 225 is the same as that of the matching groove 211, and the profile of the adjusting groove 222 is the same as that of the adjusting table 212, the adjusting slider 210 cooperates with the adjusting plate 221, the matching table 225 and the matching groove 211 are in sliding cooperation in the extension direction of the arc surface, the adjusting table 212 and the adjusting groove 222 are in sliding cooperation in the extension direction of the arc surface, and the first arc surface C1 of the adjusting slider 210 is slidable along the fifth matching surface A5 of the second base 220;

[0109] The second power mechanism comprises a second driving motor 230 and a transmission member in driving connection with the second driving motor 230, the second driving motor 230 is installed on the second base 220, the transmission member is connected with the adjusting slider 210 to drive the adjusting slider 210 to slide on the second base 220, so as to adjust the overturning angle of the guide rail 2.

[0110] In the preferred embodiment, the transmission member comprises a worm gear and a worm, one of which is drivingly connected with the second driving motor 230, and the other is connected with the adjusting slide 210;

[0111] The second base 220 further comprises a hollow mounting table 223, the second driving motor 230 is mounted on one side of the mounting table 223, and the output shaft of the second driving motor 230 is located inside the mounting table 223. The surface of the mounting table 223 close to the first arc surface C1 is configured as a fifth matching surface A5, and an arc-shaped hole 224 is formed on the fifth matching surface A5, and the worm gear and the worm are engaged at the arc-shaped hole 224.

[0112] It can be understood that the adjusting slide 210 is fixedly connected with the first base 110 described above, so that the adjusting slide 210 is fixedly connected with the Z-direction swing platform, and can drive the Z-direction swing platform to swing as a whole around the Y-direction. The adjusting slide 210 can be approximately quadrilateral, and the opposite two sides are respectively the first arc surface C1 and the second arc surface C2. In the thickness direction of the adjusting slide 210, part of the first arc surface C1 is recessed to form a matching groove 211 and an adjusting table 212. The adjusting plate 221 and the adjusting slide 210 are matched, that is, the matching groove 211 and the matching table 225 are matched, the adjusting table 212 and the adjusting groove 222 are matched, and a wear-reducing sheet can be further arranged on the surface where the matching groove 211 and the matching table 225 are in contact, so as to facilitate the mutual sliding of the adjusting plate 221 and the adjusting slide 210. Due to the existence of the arc surface, the adjusting slide 210 can drive the Y-direction swing platform 200 and the guide rail cantilever 2100 to rotate around the second axis.

[0113] The second driving motor 230 can be a servo motor, the output shaft of the servo motor extends into the mounting cavity, drives the worm gear and the worm to slide at the arc-shaped hole 224, and the arc-shaped hole 224 extends along the arc-shaped extension direction of the fifth matching surface A5.

[0114] Of course, in some embodiments, the transmission member can also be other gear mechanisms. In addition to the lock motion realized by the servo motor equipped with the brake, a mechanical locking structure can also be arranged between the adjusting slide 210 and the second base 220. For example, the locking structure can comprise a locking hole formed on the second base 220, a pin shaft inserted into the locking hole, and the pin shaft and the adjusting slide 210 are limited relative to each other, so as to fix the position of the adjusting slide.

[0115] In some embodiments, a high-precision arc-shaped grating ruler can also be arranged between the adjusting slide 210 and the second base 220. The high-precision arc-shaped grating ruler is matched with the high-precision encoder equipped on the servo motor to feedback the motion parameters, so as to improve the motion accuracy.

[0116] As an implementable way, as Figure 13 , Figure 14 ,Figure 15 and Figure 16 As shown in FIGS. 1 and 2, the Y-direction moving platform 300 comprises:

[0117] a lifting platform 310 fixedly connected with the Y-direction swinging platform 200, the lifting platform 310 having an inclined surface D1;

[0118] a fixed platform 320 oppositely arranged with the lifting platform 310, a surface of the fixed platform 320 facing the lifting platform 310 being a mounting surface D2, and a lifting space being formed between the mounting surface D2 and the inclined surface D1, the inclined surface D1 being inclined towards a direction away from the mounting surface D2;

[0119] a third power mechanism comprising a third driving motor 330, a first guide rail 331, a trapezoidal screw 332, a first sliding block 333, a second guide rail 334, a second sliding block 335 and a wedge-shaped connecting block 336, the third driving motor 330 being drivingly connected with the trapezoidal screw 332, the trapezoidal screw 332 being connected with the first sliding block 333, the first sliding block 333 being slidingly fitted with the first guide rail 331, the first guide rail 331 being mounted on the mounting surface D2, the second guide rail 334 being mounted on the inclined surface D1, and an extending direction of the second guide rail 334 being the same as an inclined direction of the inclined surface D1, the second sliding block 335 being slidingly fitted with the second guide rail 334, and the wedge-shaped connecting block 336 being fixedly connected with the first sliding block 333 and the second sliding block 335 respectively.

[0120] In a preferred embodiment, as shown in FIGS. 3 and 4, the Y-direction moving platform 300 further comprises a limiting mechanism comprising: Figure 15 and Figure 16 As shown in FIGS. 3 and 4, the Y-direction moving platform 300 further comprises a limiting mechanism comprising:

[0121] a third guide rail 340 and a third sliding block 341 slidingly connected on the third guide rail 340, the lifting platform 310 having a Y-direction side surface 311 parallel to the Y direction, the third guide rail 340 being fixedly mounted on the Y-direction side surface 311, and the third guide rail 340 being arranged along the Y direction;

[0122] a fixed plate 350 located on one side of the Y-direction side surface 311 and fixedly connected with the fixed platform 320, the fixed plate 350 being fixedly connected with the third sliding block 341.

[0123] It can be understood that the lifting platform 310 and the second base 220 are fixedly connected, the inclined surface of the wedge-shaped connecting block 336 is fixedly connected with the second sliding block 335 located on the second guide rail 334, the third driving motor 330 can be a servo motor, the servo motor drives the trapezoidal lead screw 332 to drive the first sliding block 333 to move along the first guide rail 331, thereby driving the second sliding block 335 to move along the second guide rail 334, due to the inclined arrangement of the inclined surface D1 of the lifting platform 310 and the second guide rail 334, the lifting platform 310 can move, and due to the fixed connection between the fixed plate 350 and the fixed platform 320, the third guide rail 340 fixed on the Y-direction side surface 311 of the lifting platform 310, and the third sliding block 341 slidingly fitted on the third guide rail 340 are fixedly connected with the fixed plate 350, so that the displacement of the lifting platform 310 in the Y-direction can be limited, on the one hand, to avoid movement in other directions, reduce parasitic displacement and improve adjustment accuracy, on the other hand, the arrangement of the trapezoidal lead screw 332 and the wedge-shaped connecting block 336 improves the adjustment accuracy while also being conducive to reducing costs.

[0124] In a preferred embodiment, as shown in Figure 16 the Y-direction moving platform 300 further comprises a first grating ruler 360, the first grating ruler 360 comprising a body 361, a reading head 362 and a bracket 363, the body 361 being fixed on the fixed plate 350, the fixed plate 350 being provided with a long hole 364 along the Y-direction, one end of the bracket 363 penetrating through the long hole 364 and being connected with the lifting platform 310, the other end of the bracket 363 being provided with the reading head 362, the reading head 362 being in contact with the body 361, the lifting platform 310 being capable of driving the reading head 362 to move along the extension direction of the long hole 364.

[0125] The arrangement of the first grating ruler 360 in the embodiment is conducive to feeding back the actual movement position of the lifting platform 310, thereby feeding back to the control system, which is conducive to improving the adjustment accuracy. Of course, a high-precision encoder can also be provided on the servo motor to jointly detect the movement position of the lifting platform 310 with the first grating ruler 360.

[0126] In some other embodiments, in addition to the brake holding mechanism provided on the servo motor to realize locking movement, a mechanical locking structure can be arranged between the lifting platform 310 and the first guide rail 331 to stabilize the position of the lifting platform 310.

[0127] In some embodiments, as shown in Figure 17 the X-direction moving platform 400 comprises:

[0128] a first sliding plate 410, the first sliding plate 410 being fixedly connected with the Y-direction moving platform 300;

[0129] a fourth base 420;

[0130] A fourth power mechanism is installed on the fourth base 420, and the fourth power mechanism comprises a fourth driving motor 430, a fourth guide rail 431, a fourth lead screw 432 and a fourth sliding block 433. The fourth guide rail 431 extends along the X direction. The fourth driving motor 430 is drivingly connected with the fourth lead screw 432. The fourth lead screw 432 is connected with the fourth sliding block 433. The fourth sliding block 433 is slidingly matched with the fourth guide rail 431. The fourth sliding block 433 is fixedly connected with the first sliding plate 410.

[0131] A second grating ruler 440 is installed on the fourth base 420, and a reading head of the second grating ruler 440 is connected with the first sliding plate 410.

[0132] As shown in Figure 18 The Z direction moving platform 500 comprises:

[0133] A second sliding plate 510 is fixedly connected with the X direction moving platform 400.

[0134] A fifth base 520 is provided.

[0135] A fifth power mechanism is installed on the fifth base 520, and the fifth power mechanism comprises a fifth driving motor 530, a fifth guide rail 531, a fifth lead screw 532 and a fifth sliding block 533. The fifth guide rail 531 extends along the Z direction. The fifth driving motor 530 is drivingly connected with the fifth lead screw 532. The fifth lead screw 532 is connected with the fifth sliding block 533. The fifth sliding block 533 is slidingly matched with the fifth guide rail 531. The fifth sliding block 533 is fixedly connected with the second sliding plate 510.

[0136] A third grating ruler 540 is installed on the fifth base 520, and a reading head of the third grating ruler 540 is connected with the second sliding plate 510.

[0137] Locking mechanisms are further provided on the fourth base 420 and the fifth base 520 respectively, and the locking mechanisms are connected with the first sliding plate 410 and the second sliding plate 510 respectively, so as to lock the positions of the first sliding plate 410 and the second sliding plate 510.

[0138] It can be understood that the second grating ruler 440 and the third grating ruler 540 can be used to feedback the movement displacement of the first sliding plate 410 and the second sliding plate 510 in the Z direction and the X direction respectively, so as to improve the adjustment accuracy.

[0139] As shown in Figure 18As shown, the locking mechanism can include a locking clamp 600, a fixing base 610, a support shaft 620 and a handle 630, the support shaft 620 is fixed on the fixing base 610, the fixing base 610 is respectively installed on the fourth base 420 and the fifth base 520, the support shaft 620 of the X-direction moving platform 400 is arranged along the X-direction, the support shaft 620 of the Y-direction moving platform 300 is arranged along the Y-direction, the locking clamp 600 is slidingly installed on the support shaft 620, the locking clamp 600 is fixedly connected with the first sliding plate 410 and the second sliding plate 510, when the first sliding plate 410 or the second sliding plate 510 moves to the target position, the handle 630 is operated to lock the locking clamp 600 on the support shaft 620, so as to fix the position of the first sliding plate 410 or the second sliding plate 510.

[0140] In some embodiments, the vacuum internal Hall measurement system further comprises a base 2200 and support legs 2300, the fifth base 520 is installed on the base 2200, the support legs 2300 are installed on the bottom surface of the base 2200, the support legs 2300 are at least three, which is conducive to integrating the pose adjustment mechanism 2000 on the base 2200, so that the overall structure is compact, convenient to install and use, and conducive to ensuring stable work of the pose adjustment mechanism 2000.

[0141] In actual application, a plurality of pose adjustment mechanisms 2000 can be arranged along the length direction of the vacuum chamber of the vacuum internal undulator, which can be appropriately increased or decreased according to the length of the vacuum chamber, for example, as shown in Figure 1 、 Figure 2 and Figure 3 , for a 4-meter long vacuum internal undulator, five pose adjustment mechanisms 2000 can be arranged.

[0142] The upper support rod 720 is installed on the upper force sensing mount 700, and the lower support rod 730 is installed on the lower force sensing mount 710. The upper force sensing mount 700 and the lower force sensing mount 710 are fixed on the first support frame 120 respectively. The guide rail cantilever rod 2100 extends into the vacuum chamber 1 and is connected with the guide rail 2. The connection between the guide rail cantilever rod 2100 and the vacuum chamber 1 is sealed by the sealing pipe 740 and other sealing components. The positions of the upper support rod 720 and the lower support rod 730 are adjusted to be close to the guide rail cantilever rod 2100. The guide rail cantilever rod 2100 is connected with the upper support rod 720 and the lower support rod 730 respectively. Since the upper support rod 720 is installed on the upper force sensing mount 700, and the lower support rod 730 is installed on the lower force sensing mount 710, the force generated by adjusting the upper support rod 720 and the lower support rod 730 can be sensed and combined to calculate the direction of the adjustment force (torque). By adjusting the appropriate motion parameters (based on the force-position hybrid control principle), the adjustment force applied to the upper support rod 720 and the lower support rod 730 can be converted into the motion of the pose adjustment mechanism 2000 in the desired direction and position. When the position is almost aligned, fasteners can be installed to fix the guide rail cantilever rod 2100. During the installation of the fasteners, since the guide rail cantilever rod 2100 is not completely and accurately connected with the upper support rod 720 and the lower support rod 730, additional assembly force will be generated. The force sensing structure will still sense it. The adaptive force-position hybrid control algorithm will enable the pose adjustment mechanism 2000 to intelligently and automatically adjust so that the force on each axis of the sensing structure is as small as possible. When this state is reached, it is considered that the connection is accurate. The pose adjustment mechanism 2000 is connected with the guide rail 2 in the vacuum chamber 1 one by one to achieve the preliminary support of the guide rail 2.

[0143] After assembly, the pose of the guide rail 2 is detected. If the pose of a certain segment does not meet the requirements, the position and attitude adjustment amount of the corresponding guide rail cantilever rod 2100 is calculated by computer precise operation. Then, the pose adjustment mechanism 2000 corresponding to the guide rail 2 is adjusted by rotating the Z-direction swing platform 100, the Y-direction swing platform 200, the Y-direction moving platform 300, the X-direction moving platform 400 and the Z-direction moving platform 500 according to the calculated adjustment amount. Since the remote center of motion formed by the Y-direction swing platform 200 and the Z-direction swing platform 100 is located at the end of the guide rail cantilever rod 2100 connected with the guide rail 2, no parasitic displacement will be generated during attitude adjustment, avoiding the simultaneous adjustment of position and attitude, which can greatly reduce the complexity of adjustment amount calculation and greatly improve the calculation and adjustment efficiency. After one adjustment is completed, the pose of the guide rail 2 is continuously detected. If the requirements are met, the adjustment stops. If not, the above process is repeated until the requirements are met.

[0144] The force sensing structure on the first support frame 120 not only functions during docking, but also functions during adjustment. When adjusting, if the force sensing signal abnormally increases, an error can be calculated, the adjustment action is timely stopped, an alarm is issued, and measurement and adjustment amount calculation are re-performed.

[0145] In summary, the vacuum inner Hall measurement system for the vacuum inner undulator of the embodiment of the present application has the following technical effects:

[0146] (1) Not only can the two-direction attitude of the guide rail cantilever 2100 be adjusted, but also the intersection of the two attitude rotation axes is located at the docking position of the guide rail cantilever 2100 and the guide rail 2, so that parasitic displacement caused by attitude adjustment is minimized, and a large amount of displacement adjustment operation in the process of attitude adjustment is avoided.

[0147] (2) During the assembly and fastening process, based on the force-position hybrid control principle, the device plays an intelligent sensing and cooperation role, reduces the installation difficulty, and improves the assembly efficiency;

[0148] (3) It has the ability of precise position adjustment in three directions in space and attitude adjustment in two directions. When the spatial pose of the guide rail 2 is not accurate or the overall structure of the guide rail 2 is deformed and needs to be adjusted, intelligent automatic adjustment and compensation can be performed according to the measurement results, and the process is monitored by the force sensor to avoid damage caused by excessive adjustment amplitude;

[0149] (4) The pose adjustment mechanism 2000 is compact and light, each pose adjustment mechanism 2000 is an independent stable platform, and constitutes a complete functional module, which changes the heavy form of the traditional large overall platform, effectively reduces the difficulty and cost of the device in the process of installation, disassembly and transportation. The number of pose adjustment mechanisms 2000 can be flexibly configured according to the length and type of the undulator. This "on-demand configuration" strategy enhances the universality and economy of the entire system, and can widely adapt to the measurement needs of various scientific devices.

[0150] It should be understood that the above-mentioned directional or positional relationships expressed by terms "center", "longitudinal", "transverse", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like are based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the indicated panel or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise stated, the meaning of "a plurality of" is two or more.

[0151] The above description is merely the preferred embodiments of the present application and the explanation of the technical principles applied. It should be understood by those skilled in the art that the scope of the present application is not limited to the technical solutions formed by the specific combinations of the above technical features, and should also cover other technical solutions formed by any combinations of the above technical features or their equivalent features without departing from the inventive concept. For example, the technical solutions formed by mutually replacing the above features with the technical features disclosed in the present application (but not limited to) having similar functions.

Claims

1. A vacuum internal Hall measurement system for an internal wave oscillator, characterized in that include: The system comprises a vacuum chamber, a Hall effect sensor mounted within the vacuum chamber, and a motion actuator. The motion actuator includes a guide rail and a position adjustment mechanism. The guide rail is mounted within the vacuum chamber, and the Hall effect sensor is movable along the extension direction of the guide rail. The position adjustment mechanism is connected to the guide rail and is used to adjust the position and orientation of the guide rail to drive the Hall effect sensor in three-dimensional motion within the vacuum chamber. The Hall effect sensor is used to acquire the three-dimensional magnetic field distribution of the undulator. The position adjustment mechanism includes: A guide rail lever extends into the vacuum chamber and connects to the guide rail; Attitude adjustment unit, the attitude adjustment unit includes: A Z-axis swing platform is fixedly connected to the guide rail lever, and the guide rail lever can rotate around a first axis to adjust the pitch angle of the guide rail. A swing platform is provided around the Y-axis, and a swing platform around the Z-axis is fixedly connected to the swing platform around the Z-axis. The swing platform around the Z-axis can be rotated around the second axis to drive the guide rail lever to rotate around the second axis, thereby adjusting the flip angle of the guide rail. The first axis and the second axis intersect with the axis of the guide rail lever. Position adjustment unit, the position adjustment unit comprising: The Y-axis moving platform is connected to the Y-axis swinging platform, which drives the attitude adjustment unit to translate along the Y-axis to adjust the position of the guide rail in the Y-axis. An X-axis moving platform is connected to a Y-axis moving platform, which drives the Y-axis moving platform and the attitude adjustment unit to move along the X-axis to adjust the position of the guide rail in the X-axis. The Z-axis moving platform is connected to the X-axis moving platform and drives the X-axis moving platform, the Y-axis moving platform and the attitude adjustment unit to move along the Z-axis to adjust the position of the guide rail in the Z-axis.

2. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Z-axis swing platform includes: A first base, the first base having an arc-shaped first mating surface; A first movable cover is mounted on the first base, and an arc-shaped groove is formed on the first movable cover, the arc-shaped groove having a second mating surface; A first support frame is fixedly connected to the guide rail cantilever. The second movable cover is mounted on the first support frame. An arc-shaped guide rail is formed in the area of ​​the second movable cover near the first movable cover. The arc-shaped guide rail has a third mating surface and a fourth mating surface. The arc-shaped guide rail is located in the arc-shaped groove. The first mating surface and the third mating surface slide in contact with each other in the arc-shaped extension direction. The second mating surface and the fourth mating surface slide in contact with each other. The first power mechanism includes a first drive motor, an adjusting fork, and an adjusting baffle. The adjusting fork is fixedly connected to the first support frame and has an adjusting cavity. The adjusting baffle is located in the adjusting cavity and is fixedly connected to the first base. The adjusting baffle is drivenly connected to the output end of the first drive motor. The first drive motor drives the adjusting baffle to move within the adjusting cavity, thereby causing the first support frame and the guide rail lever to rotate around a first axis to adjust the pitch angle of the guide rail. The output end of the first drive motor is connected to a lifting rod, and the end face of the lifting rod makes point contact with the surface of the adjusting baffle.

3. The vacuum Hall effect measurement system for a vacuum undulator according to claim 2, characterized in that, Multiple locking bolts are also provided between the adjusting fork and the adjusting baffle. The multiple locking bolts are evenly distributed on opposite sides of the adjusting baffle. Each locking bolt is threaded to the adjusting fork, and the end of each locking bolt passes through the adjusting fork and extends into the adjusting cavity. The end face of the locking bolt makes point contact with the surface of the adjusting baffle to fix the moving position of the adjusting baffle.

4. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Y-axis swing platform includes: An adjusting slider is fixedly connected to the Z-axis swing platform. The adjusting slider has a first arc surface and a second arc surface, and a portion of the first arc surface is recessed toward the second arc surface. A mating groove and an adjusting platform are formed on the adjusting slider. The surface of the mating groove adjacent to the adjusting platform is an arc surface. A second base has an adjustment plate formed on it. The second base also has a fifth mating surface that slides with a first arc surface. The adjustment plate includes an adjacent mating platform and an adjustment groove. The outline of the mating platform is the same as the outline of the mating groove, and the outline of the adjustment groove is the same as the outline of the adjustment platform. The adjustment slider mates with the adjustment plate. The mating platform and the mating groove slide in the extension direction of the arc surface. The first arc surface of the adjustment slider is slidable along the fifth mating surface of the second base. The second power mechanism includes a second drive motor and a transmission component that is driven and connected to the second drive motor. The second drive motor is mounted on the second base, and the transmission component is connected to the adjusting slider, which drives the adjusting slider to slide on the second base to adjust the flip angle of the guide rail.

5. The vacuum internal Hall effect measurement system for a vacuum internal undulator according to claim 4, characterized in that, The transmission component includes a worm gear and a worm that mesh with each other, one of which is connected to the second drive motor and the other is connected to the adjusting slider; The second base also includes a hollow mounting platform. The second drive motor is mounted on one side of the mounting platform, and the output shaft of the second drive motor is located inside the mounting platform. The surface of the mounting platform near the first arc surface is configured as the fifth mating surface, and an arc-shaped hole is provided on the fifth mating surface. The worm gear and the worm mesh at the arc-shaped hole.

6. The vacuum Hall effect measurement system for a vacuum undulator according to claim 1, characterized in that, The Y-axis mobile platform includes: A lifting platform, which is fixedly connected to the swing platform around the Y direction, has an inclined surface; A fixed platform is provided, which is arranged opposite to the lifting platform. The surface of the fixed platform facing the lifting platform is a mounting surface, and a lifting space is formed between the mounting surface and the inclined surface. The inclined surface is inclined in a direction away from the mounting surface. The third power mechanism includes a third drive motor, a first guide rail, a trapezoidal lead screw, a first slider, a second guide rail, a second slider, and a wedge-shaped connecting block. The third drive motor is driven by the trapezoidal lead screw, which is connected to the first slider. The first slider is slidably engaged with the first guide rail. The first guide rail is mounted on the mounting surface, and the second guide rail is mounted on the inclined surface, with the extension direction of the second guide rail being the same as the inclination direction of the inclined surface. The second slider is slidably engaged with the second guide rail, and the wedge-shaped connecting block is fixedly connected to both the first slider and the second slider.

7. The vacuum Hall effect measurement system for a vacuum undulator according to claim 6, characterized in that, The Y-axis moving platform further includes: a limiting mechanism, the limiting mechanism comprising: The third guide rail and the third slider are slidably connected on the third guide rail. The lifting platform has a Y-direction side parallel to the Y direction. The third guide rail is fixedly installed on the Y-direction side and extends along the Y direction. A fixing plate is located on one side of the Y-direction side and is fixedly connected to the fixing platform. The fixing plate is also fixedly connected to the third slider.

8. The vacuum Hall effect measurement system for a vacuum undulator according to claim 7, characterized in that, The Y-axis moving platform further includes: a first grating ruler, which includes a body, a reading head, and a bracket. The body is fixed on the fixed plate, and an elongated hole is provided on the fixed plate along the Y direction. One end of the bracket passes through the elongated hole and is connected to the lifting platform. The other end of the bracket is equipped with the reading head, which is in contact with the body. The lifting platform can drive the reading head to move along the extension direction of the elongated hole.

9. The vacuum internal Hall effect measurement system for a vacuum internal undulator according to any one of claims 1-8, characterized in that, The X-axis mobile platform includes: A first sliding plate is fixedly connected to the Y-axis moving platform; Fourth base; A fourth power mechanism is installed on the fourth base. The fourth power mechanism includes a fourth drive motor, a fourth guide rail, a fourth lead screw, and a fourth slider. The fourth guide rail extends along the X direction. The fourth drive motor and the fourth lead screw are driven and connected. The fourth lead screw is connected to the fourth slider. The fourth slider is slidably engaged with the fourth guide rail. The fourth slider is fixedly connected to the first sliding plate. The second grating ruler is mounted on the fourth base, and the reading head of the second grating ruler is connected to the first sliding plate; The Z-axis mobile platform includes: The second sliding plate is fixedly connected to the X-axis moving platform; The fifth base; The fifth power mechanism is installed on the fifth base. The fifth power mechanism includes a fifth drive motor, a fifth guide rail, a fifth lead screw, and a fifth slider. The fifth guide rail extends along the Z direction. The fifth drive motor and the fifth lead screw are driven and connected. The fifth lead screw is connected to the fifth slider. The fifth slider is slidably engaged with the fifth guide rail. The fifth slider is fixedly connected to the second sliding plate. The third grating ruler is mounted on the fifth base, and the reading head of the third grating ruler is connected to the second sliding plate; The fourth base and the fifth base are each provided with a locking mechanism, which is connected to the first sliding plate and the second sliding plate respectively, and is used to lock the position of the first sliding plate and the second sliding plate.

10. The vacuum Hall effect measurement system for a vacuum undulator according to claim 2, characterized in that, The vacuum Hall effect measurement system further includes: an upper force sensing mounting base, a lower force sensing mounting base, an upper support rod, a lower support rod, and a sealing tube. The upper support rod and the lower support rod are respectively fixedly connected to the guide rail bracket. The upper support rod is mounted on the upper force sensing mounting base, and the lower support rod is mounted on the lower force sensing mounting base. The upper force sensing mounting base and the lower force sensing mounting base are respectively fixedly mounted on opposite sides of the first support frame. The sealing tube is sleeved on the outside of the guide rail bracket. One end of the guide rail bracket extends into the vacuum chamber, and the contact point between the guide rail bracket and the vacuum chamber is sealed.

Images