Display panel and display device

Abstract

The invention provides a display panel and a display device, and relates to the technical field of display, the display panel comprises a display area and a photosensitive area, the display area at least partially surrounds the photosensitive area, the display panel comprises an array layer, a light-emitting functional layer, a first functional layer and a dimming part, and the light-emitting functional layer is located on one side of the array layer and electrically connected with the array layer; the first functional layer is located on the side, away from the array layer, of the light-emitting functional layer, the first functional layer comprises a light shielding layer and a light filtering part, the light shielding layer comprises a plurality of display openings and at least one light sensing opening, and the display openings and the light sensing openings penetrate through the light shielding layer in the thickness direction of the display panel; the display opening is located in the display area, the photosensitive opening is located in the photosensitive area, and the filter part is located in the display opening; the light adjusting part is located in the light sensing opening, and the thickness of the light adjusting part is smaller than or equal to the thickness of the light filtering part in the thickness direction of the display panel. Therefore, the reflectivity of the photosensitive area is reduced, the appearance of the product in a screen-off state is improved, and the use experience effect of a user is improved.

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and more particularly to a display panel and display device. Background Technology

[0002] With the continuous development of science and technology, more and more display products, such as mobile phones, tablets, laptops and smart wearable devices, are being widely used in people's daily lives and work, bringing great convenience to people's daily lives and work, and becoming an indispensable tool for people today.

[0003] To achieve a full-screen design, some current display panels, especially those used in smartphones and other devices, typically integrate the ambient light sensor (LS) outside the pixel light-emitting area, sensing light through a light-transmitting hole in the display (i.e., the LS photosensitive hole). While this design hides the sensor, it introduces new aesthetic and display uniformity issues. Summary of the Invention

[0004] To address the aforementioned technical issues, this disclosure provides a display panel and display device, which aim to reduce the reflectivity of the photosensitive area in the display product, improve the appearance of the product in the screen-off state, and enhance the user experience.

[0005] In a first aspect, this disclosure provides a display panel, including a display area and a photosensitive area, wherein the display area at least partially surrounds the photosensitive area; the display panel includes: Array layer; The light-emitting functional layer is located on one side of the array layer and is electrically connected to the array layer; The first functional layer is located on the side of the light-emitting functional layer opposite to the array layer. The first functional layer includes a light-shielding layer and a light-filtering part. The light-shielding layer includes multiple display openings and at least one photosensitive opening. The display openings and the photosensitive openings penetrate the light-shielding layer along the thickness direction of the display panel. The display openings are located in the display area, the photosensitive openings are located in the photosensitive area, and the light-filtering part is located in the display openings. The dimming section is located in the photosensitive opening and along the thickness direction of the display panel. The thickness of the dimming section is less than or equal to the thickness of the filter section.

[0006] Optionally, the area of ​​the dimming section in the photosensitive aperture is less than 100%.

[0007] Optionally, in the photosensitive opening, the dimming section includes at least two sub-dimming sections, with a first gap between adjacent sub-dimming sections, the width of the first gap being greater than 0.

[0008] Optionally, the edge of the first interval projected onto the light-emitting surface of the display panel includes at least one of a line segment and an arc.

[0009] Optionally, the width of the first interval is D0, 3μm≤D0≤8μm, and the width direction of the first interval is perpendicular to its extension direction and parallel to the light-emitting surface of the display panel.

[0010] Optionally, the area of ​​the dimming section in the photosensitive aperture is 100%.

[0011] Optionally, along the thickness direction of the display panel, the maximum thickness of the dimming section is less than the thickness of the light filter section.

[0012] Optionally, the dimming unit includes a main body and at least two protrusions disposed on the side of the main body away from the array layer. The main body covers the photosensitive opening, and there is a second gap between adjacent protrusions, the width of which is greater than 0.

[0013] Optionally, the main body and the protrusion are integrally formed.

[0014] Optionally, the dimming unit is disposed in the same layer as at least part of the filter unit.

[0015] Optionally, the filter section includes a red filter section, a green filter section, and a blue filter section, and the dimming section is disposed in the same layer as the green filter section.

[0016] Optionally, the filter section includes a red filter section, a green filter section, and a blue filter section, and the dimming section is disposed in the same layer as the red filter section or the blue filter section.

[0017] Optionally, the transmission spectrum peak position of the dimming section is different from that of the filter section. The transmission spectrum peak position of the dimming section is 550nm, and the extinction coefficient at the wavelength of 550nm is 0.005≤k≤0.04.

[0018] Optionally, the transmittance per unit thickness of the dimming section at the 550nm peak position is greater than or equal to 80%.

[0019] Optionally, the refractive index of the dimming part is n, where 1.53 ≤ n ≤ 1.65.

[0020] Optionally, along the thickness direction of the display panel, a first insulating layer is included between the first functional layer and the light-emitting functional layer, and the first insulating layer is disposed adjacent to the first functional layer; The surface of the first insulating layer facing the first functional layer is planar, or the first insulating layer includes a flat portion and a protruding portion. Along the thickness direction of the display panel, the flat portion is located in the display area, the protruding portion is located in the photosensitive opening, and the surface of the protruding portion away from the array layer is higher than the surface of the light-shielding layer away from the array layer.

[0021] Optionally, when the first insulating layer includes a flat portion and a protruding portion, the dimming portion is located on the side of the protruding portion away from the array layer, and the thickness of the dimming portion is S0, 0.5μm≤S0≤1.5μm.

[0022] Optionally, the area of ​​the dimming section in the photosensitive aperture is 100%.

[0023] Secondly, based on the same inventive concept, this disclosure also provides a display device, including a photosensitive element and a display panel provided in the first aspect, wherein the photosensitive element overlaps with the photosensitive opening along the thickness direction of the display device.

[0024] The technical solution provided in this disclosure has the following advantages compared with the prior art: Compared to related technologies where the photosensitive aperture is hollowed out, this disclosure introduces a dimming section within the photosensitive aperture, which is equivalent to introducing a thin-film structure within it. This thin-film structure adjusts the optical characteristics of the photosensitive aperture through optical interference principles (similar to anti-reflection films). The optical interference effect of multiple films counteracts some of the reflection of incident light, thereby significantly reducing the reflectivity of the photosensitive area to below 0.1%, solving the problem of the photosensitive aperture being clearly visible when the display panel is off. Furthermore, in this disclosure, the thickness of the dimming section within the photosensitive aperture is less than or equal to the thickness of the filter section within the display aperture. This minimizes the absorption of light by the dimming section, ensuring both anti-reflection and light attenuation. This ensures that the photosensitive device corresponding to the photosensitive area receives sufficient light signals, guaranteeing its normal function. The thickness settings of the dimming section and the filter section allow the display panel provided by this disclosure to achieve a balance between the conflicting technical requirements of high transmittance (ensuring photosensitive device function) and low reflectivity (aesthetic requirements), improving the product's appearance when the screen is off and effectively enhancing the user experience. Attached Figure Description

[0025] The accompanying drawings, which are incorporated in and form a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure.

[0026] To more clearly illustrate the technical solutions in the embodiments of this disclosure or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, those skilled in the art can obtain other drawings based on these drawings without creative effort.

[0027] Figure 1 The figure shown is a planar structural diagram of a display panel provided in an embodiment of this disclosure; Figure 2 The image shown is a schematic diagram of a film layer in a display panel with a photosensitive area in the related art; Figure 3 As shown Figure 1A schematic diagram of a film layer in the display area of ​​a central display panel; Figure 4 As shown Figure 1 A cross-sectional view of the display panel along the BB direction; Figure 5 The image shown is a planar schematic diagram of the display panel in the photosensitive area; Figure 6 The image shown is another planar schematic diagram of the display panel in the photosensitive area; Figure 7 The image shown is another planar schematic diagram of the display panel in the photosensitive area; Figure 8 The image shown is another planar schematic diagram of the display panel in the photosensitive area; Figure 9 As shown Figure 1 Another BB-direction cross-sectional view of the display panel; Figure 10 As shown Figure 1 Another BB-direction cross-sectional view of the display panel; Figure 11 As shown Figure 10 An enlarged schematic diagram of the central dimming section; Figure 12 The diagram shows the reflectance spectrum of the photosensitive area; Figure 13 As shown Figure 1 Another BB-direction cross-sectional view of the display panel; Figure 14 As shown Figure 1 Another BB-direction cross-sectional view of the display panel; Figure 15 As shown Figure 1 Another BB-direction cross-sectional view of the display panel; Figure 16 The figure shown is a plan view of a display device provided in an embodiment of this disclosure; Figure 17 As shown Figure 16 A cross-sectional view of a display device along the CC direction. Detailed Implementation

[0028] To better understand the above-mentioned objectives, features, and advantages of this disclosure, the solutions disclosed herein will be further described below. It should be noted that, unless otherwise specified, the embodiments and features described herein can be combined with each other.

[0029] Numerous specific details are set forth in the following description in order to provide a full understanding of this disclosure, but this disclosure may also be implemented in other ways different from those described herein; obviously, the embodiments in the specification are only some, and not all, of the embodiments of this disclosure.

[0030] Figure 1 The diagram shows a planar structure of a display panel according to an embodiment of this disclosure. The display panel 100 provided in this embodiment includes a display area AA and a photosensitive area GA, with the display area AA at least partially surrounding the photosensitive area GA. The photosensitive area GA is an important area where a photosensitive device (such as an ambient light sensor) is integrated below the screen to achieve a full-screen design. The main function of the photosensitive area GA is to act as a light channel, allowing external ambient light to penetrate the display panel and reach the ambient light sensor located below the screen. The ambient light sensor then receives and detects the intensity of the external ambient light, thus achieving ambient light detection. Based on the ambient light intensity, the system can automatically adjust the screen's display brightness to optimize user visual comfort and battery life. It should be noted that... Figure 1 The planar structure of the display panel shown is for illustrative purposes only and does not limit the actual shape of the display panel. The specific location and shape of the photosensitive area GA in the display panel are also for illustrative purposes only and are not intended to limit this disclosure.

[0031] Figure 2 The diagram shows a film layer of a display panel with a photosensitive area (GA) in related technologies. In order to allow light to pass through, it is necessary to hollow out part of the film layer in the photosensitive area (GA) of the display panel, such as hollowing out the light-shielding layer (BM). However, the hollowing out method causes the film stack structure in this area to be greatly different from the surrounding area, making the film stack structure in this area significantly different from the surrounding pixel light-emitting areas. This results in a sharp increase in the reflectivity of the photosensitive area (GA). When the screen is off, due to the increase in reflectivity, the hole in the photosensitive area (GA) will be very obvious, which seriously affects the product appearance and user experience.

[0032] To address the aforementioned technical problems, this disclosure provides a display panel, please refer to... Figure 1 , Figures 3 to 5 ,in, Figure 3 As shown Figure 1 A schematic diagram of a film layer in the display area AA of the central display panel. Figure 4 As shown Figure 1 A cross-sectional view of a display panel along the BB direction, corresponding to the film structure of the photosensitive area GA. Figure 5The diagram shows a planar schematic of a display panel in the photosensitive area GA. The display panel includes an array layer 40, a light-emitting functional layer 30, a first functional layer 90, and a dimming unit TG. The light-emitting functional layer 30 is located on one side of the array layer 40 and is electrically connected to the array layer 40. The first functional layer 90 is located on the side of the light-emitting functional layer 30 away from the array layer 40. The first functional layer 90 includes a light-shielding layer 91 and a light-filtering unit 92. The light-shielding layer 91 includes a plurality of display openings K1 and at least one photosensitive opening K2. Along the thickness direction of the display panel, the display openings K1 and the photosensitive openings K2 penetrate the light-shielding layer 91. The display openings K1 are located in the display area AA, the photosensitive openings K2 are located in the photosensitive area GA, and the light-filtering unit 92 is located in the display openings K1. The dimming unit TG is located in the photosensitive openings K2. Along the thickness direction of the display panel, the thickness of the dimming unit TG is less than or equal to the thickness of the light-filtering unit 92.

[0033] The following will first provide an exemplary description of the film layer structure of the display panel. Please refer to [link / reference]. Figure 3 This disclosure uses an OLED (Organic Light-Emitting Diode) display panel as an example for illustration, with the array layer 40 disposed on one side of the substrate 00. The light-emitting functional layer 30 includes multiple light-emitting elements D, and the basic structure of the light-emitting element D includes a first electrode 31, a light-emitting layer 32, and a second electrode 33. The first electrode 31 is the anode, and the second electrode 33 is the cathode. Optionally, the light-emitting functional layer 30 includes a pixel definition layer 34, which defines multiple pixel openings; the light-emitting layer 32 is located at least in the pixel openings. Along a direction perpendicular to the substrate 00, the first electrode 31 and the second electrode 33 are respectively located on opposite sides of the light-emitting layer 32, with the first electrode 31 located on the side of the second electrode 33 facing the substrate 00. The first electrode 31 is electrically connected to the array layer 40, and a pixel driving circuit is disposed in the array layer 40 for providing a driving voltage to the light-emitting elements D to drive the light-emitting elements to emit light. The pixel driving circuit includes multiple transistors T. When a suitable voltage is supplied, the holes generated by the first electrode 31 and the electrons generated by the second electrode 33 will combine in the light-emitting layer 32 to produce light.

[0034] Optionally, in the array layer 40, the gate of transistor T is disposed in the first metal layer m1, and the source and drain of transistor are disposed in the second metal layer m2. Optionally, the array layer 40 further includes an active layer 03 disposed on the side of the first metal layer m1 facing the substrate 00 and an auxiliary metal layer m0 disposed on the side of the active layer 01 facing the substrate 00. Along the direction perpendicular to the plane of the substrate 00, both the first metal layer m1 and the auxiliary metal layer m0 overlap with the active layer 03. The auxiliary metal layer m0 has a light-shielding function to prevent light from affecting the active layer 03. Optionally, a capacitor metal layer mc is further included between the first metal layer m1 and the second metal layer m2. The capacitor metal layer mc can form a capacitor structure with the second metal layer m2 or the first metal layer m1. Optionally, a third metal layer m3 is also included on the side of the second metal layer m2 away from the substrate 00. Another metal layer can be disposed on the side of the third metal layer m3 away from the substrate as needed. This disclosure does not specifically limit this, and signal lines can be laid in each metal layer. For example, power lines can be laid in the third metal layer m3. This embodiment will be described using the example of the anode 31 of the light-emitting element D being electrically connected to the transistor T in the array layer 40 through the third metal layer m3.

[0035] Optionally, an encapsulation layer 50 is further provided on the side of the second electrode 33 of the light-emitting element D away from the first electrode 31. Optionally, the encapsulation layer 50 includes an organic encapsulation layer 51 and two inorganic encapsulation layers 52 stacked together, with the organic encapsulation layer 51 located between the two inorganic encapsulation layers 52. Optionally, a touch layer 60 is provided on the side of the encapsulation layer 50 away from the substrate 00. The touch layer 60 includes at least one touch metal layer to realize the touch function of the display panel. The first functional layer 90 mentioned in the embodiments of this disclosure can be disposed on the side of the touch layer 60 away from the substrate 00. The first functional layer 90 includes a light-shielding layer 91 and a light-filtering portion 92. The light-shielding layer 91 includes a plurality of display openings K1 and at least one photosensitive opening K2. Along the thickness direction of the display panel, the display openings K1 and the photosensitive openings K2 penetrate the light-shielding layer 91. The display openings K1 are located in the display area AA, the photosensitive openings K2 are located in the photosensitive area GA, and the light-filtering portion 92 is located in the display openings K1. The filter section 92 may include, for example, a red filter section, a blue filter section, and a green filter section.

[0036] In this embodiment, the display opening K1 and the photosensitive opening K2 are multiple through holes located on the light-shielding layer 91. The display opening K1 is located in the display area AA, which defines the actual light-emitting area of ​​the sub-pixels in the display panel, allowing light emitted by the underlying light-emitting element D to pass through. The function of the light-shielding layer 91 is to separate different sub-pixels, prevent different colors of light from mixing, absorb stray light, and reduce the reflection and scattering of ambient light inside the display panel, thereby improving display contrast. The filter section 92 is located in the display opening K1. The purpose of introducing the filter section 92 is to filter out unwanted wavelengths of light emitted from the light-emitting functional layer, allowing only specific light to pass through, thereby giving each sub-pixel its desired color. The filter section 92 can make the wavelength range of the transmitted light narrower and more concentrated, thereby improving the color saturation and purity of the displayed image.

[0037] Please refer to Figure 4 and Figure 5 Compared to related technologies where the photosensitive aperture is hollowed out, this disclosure introduces a dimming unit TG into the photosensitive opening K2, which is equivalent to introducing a thin film structure into the photosensitive opening K2. This thin film structure adjusts the optical characteristics at the photosensitive opening K2 through the principle of optical interference (similar to an anti-reflection film). The optical interference effect of the thin film structure cancels out part of the reflection of incident light, thereby significantly reducing the reflectivity of the photosensitive area GA to below 0.1%, solving the problem that the photosensitive opening K2 is clearly visible when the display panel is off. Moreover, in the embodiments of this disclosure, the thickness of the dimming unit TG in the photosensitive opening K2 is less than or equal to the thickness of the filter unit 92 in the display opening K1. This minimizes the absorption of light by the dimming unit TG, so as to minimize the attenuation of light while ensuring the anti-reflection effect, thereby ensuring that the photosensitive device corresponding to the photosensitive area GA can receive sufficient light signal and ensure its normal function. The thickness setting method of the dimming part TG and the filter part 92 in this embodiment of the present disclosure enables the display panel provided by this embodiment to achieve a balance between the two contradictory technical requirements of high transmittance (ensuring the function of the photosensitive device) and low reflectance (appearance requirements), which is conducive to improving the appearance of the product in the screen-off state and effectively enhancing the user experience.

[0038] Please continue to refer to this. Figure 4 and Figure 5In one optional embodiment of this disclosure, the area of ​​the dimming portion TG in the photosensitive opening K2 is less than 100%. In this case, the photosensitive opening K2 is not completely covered by the dimming portion TG, and the dimming portion TG can be a patterned structure rather than a completely planar covering structure. Considering that if any film layer is introduced into the photosensitive opening K2, even a high-transmittance film layer, it will cause a certain absorption and reflection loss of visible light. When a part of the area of ​​the photosensitive opening K2 is left uncovered, it is equivalent to leaving a completely light-transmitting area. This can maximize the amount of light flux (total light intensity) entering the photosensitive device below, such as an ambient light sensor. Especially for sensors that need to receive incident light from multiple angles, the patterned, incompletely covered structure may have better light coupling efficiency than a uniform thin film, ensuring the reliability of the photosensitive function of the photosensitive device.

[0039] Furthermore, if the photosensitive opening K2 is not completely covered by the dimming section TG, and the dimming section TG exists in a patterned form within the photosensitive opening K2, the photosensitive opening K2 actually consists of two parts: one part is the area covered by the dimming section TG (with lower reflectivity), and the other part is the area not covered by the dimming section TG (completely hollowed out, with higher reflectivity). By precisely controlling the coverage area and aperture size of the dimming section TG, the optical effect generated by the patterned structure can be utilized to achieve more optimized reflectivity matching, thereby reducing the average reflectivity of the photosensitive area GA to a lower level, which is beneficial to improving the appearance of the product when the screen is off.

[0040] Please continue to refer to this. Figure 5 In one optional embodiment of this disclosure, the dimming section TG in the photosensitive aperture K2 includes at least two sub-dimming sections 01, with a first interval S1 between adjacent sub-dimming sections 01, the width of which is greater than 0. This is equivalent to introducing sub-dimming sections 01 to pattern the dimming section TG. In practical applications, by precisely designing the width and period of the sub-dimming sections 01 and the first interval S1 (i.e., the exposed area), the effective refractive index and effective film thickness of the photosensitive aperture region can be adjusted. This patterned structure can generate diffraction and scattering effects, and utilizes the principle of optical thin film interference to better match the surrounding normal display area AA film stack, thereby achieving optimal anti-reflection effect in the visible light band. Moreover, the presence of the first interval S1 ensures that a portion of the area is completely transparent, maximizing the light flux. At the same time, the patterned structure can scatter or guide ambient light incident into the photosensitive aperture, allowing it to enter the smaller photoelectric sensor device below more effectively, thereby enhancing the photosensitivity.

[0041] Furthermore, considering that continuous large-area films are prone to stress unevenness or morphological defects during processing, dividing the dimming section (TG) into independent substructures can effectively release film stress, improve the structural stability of the film layer in the photosensitive area, and reduce visual inhomogeneity caused by structural defects.

[0042] Figures 6 to 8 The following are alternative planar diagrams of the display panel in the photosensitive area GA. Please refer to them. Figures 5 to 8 In one optional embodiment of this disclosure, the edge of the orthographic projection of the first interval S1 onto the light-emitting surface of the display panel includes at least one of a line segment and an arc.

[0043] In the manufacturing process of display panels, the microstructure is formed through techniques such as photolithography and etching. When the edge of the orthographic projection of the first interval S1 includes a line segment structure, for example, please refer to... Figure 5 and Figure 6 Compared to other complex structures, the pattern design and transfer of its photomask are simpler and more precise. This helps ensure the dimensional accuracy and positional precision of the sub-tuning unit 01 and the first interval S1, reducing yield problems caused by pattern transfer errors. If the sub-tuning unit 01 is arranged in a periodic fine stripe (line segment structure), the entire photosensitive aperture area forms a periodic grating structure. The periodic line segment structure makes it easy to establish an optical model, allowing engineers to accurately predict and design its diffraction efficiency, transmittance, and reflectance. This regularity simplifies optical tuning, making the calibration of reflectance and transmittance and mass production easier to control. Moreover, specific line segment patterns (such as parallel fine stripes) can utilize the diffraction effect to scatter or diffract incident light in a specific direction. If the sensor requires light to enter at a specific angle or direction (e.g., perpendicular to the display panel), a carefully designed line segment structure can act as a miniature light guide grating, improving the efficiency of light coupling to the sensor.

[0044] Furthermore, if the orthographic projection of the first interval S1 includes an arc, for example, please refer to... Figure 7 and Figure 8Using curved edges (i.e., rounded corners or curved transitions) can smooth out the diffraction effect of light, reduce directional scattering of light, and make the light distribution in the photosensitive area more uniform. This helps to eliminate defects such as halos or rainbow patterns caused by diffraction, which is crucial for sensors that need to uniformly receive ambient light. In the micro-lithography and etching processes of semiconductors and display panels, sharp inner corners are often difficult to process precisely, easily leading to uneven etching, stress concentration, or residue accumulation. Using curved edges can avoid sharp corners, thereby improving the fidelity of the lithography pattern and the stability of the process. The shape of the edge of the first gap S1 determines how light interacts with the edge of the dimming unit film. By carefully designing the rounded edges, the effect of a microlens array can be simulated at the microscale, slightly refracting or converging the incident ambient light. This optimized design can help to more effectively couple and guide ambient light to the photosensitive area of ​​the photosensitive sensor below, further enhancing the sensor's sensitivity.

[0045] Of course, in some other embodiments of this disclosure, the edge of the first interval S1 can also be a combination of line segments and arcs. For example, line segments can be used in the periodic main part of the dimming pattern (such as the long side of a fine stripe) to ensure high precision and periodicity, thereby achieving a precise anti-reflection effect. Arcs are used at the corners or endpoints of the pattern to smooth the transition, eliminating photoelectric defects and process risks caused by sharp corners, thereby maximizing both the ultimate optimization of optical performance (smoothing diffraction through arcs) and the stability and controllability of mass production (ensuring precision through line segments).

[0046] It should be noted that the specific shape of the patterned dimming part is not limited in the embodiments disclosed herein, and it can be a strip, a grid, or any other feasible shape.

[0047] Please refer to Figure 5 In one optional embodiment of this disclosure, the width of the first interval S1 is D0, 3μm≤D0≤8μm, and the width direction of the first interval S1 is perpendicular to the extension direction of the first interval S1 and parallel to the light-emitting surface of the display panel.

[0048] Considering that if the width D0 of the first interval S1 is too large (e.g., exceeding 8μm), the exposed area of ​​the dimming part TG will increase significantly, leading to a sharp increase in the reflectivity of this area. This will make it difficult for the average reflectivity of the photosensitive aperture area to reach the target of less than 0.1%, affecting the appearance. On the other hand, if the interval width is too small (e.g., less than 3μm), the lithographic resolution and etching accuracy during manufacturing will face challenges, easily resulting in defects such as open circuits, short circuits, or dimensional inhomogeneities, affecting the yield. Therefore, in this embodiment, 3μm≤D0≤8μm is set to ensure that under existing process conditions, a certain amount of light transmission and patterning accuracy can be maintained, while the average reflectivity can be effectively controlled to avoid defects visible to the naked eye. Optionally, 4μm≤D0≤7μm, or 3.5μm≤D0≤6.5μm, are not specifically limited in this disclosure.

[0049] When the area of ​​the dimming section TG in the photosensitive aperture K2 is less than 100%, the thickness of the dimming section TG can optionally be the same as the thickness of the filter section 92. In this case, the dimming section TG and the filter section 92 can be fabricated in the same layer. When fabricating the first functional layer 90, it is not necessary to use a complex gray-tone mask or halftone mask to achieve the thickness difference. Only a conventional photolithography mask is needed to define the planar pattern of the dimming section TG (area ratio less than 100%), which greatly simplifies the process steps and control difficulty, and is beneficial for mass production and improved yield. At this time, the optical performance is entirely determined by the duty cycle and period of the planar pattern. By precisely controlling the pattern size, the balance between reflectivity and transmittance can be achieved more accurately. The first interval S1 (uncovered area) serves as a pure light transmission channel, ensuring the maximum light flux into the sensor, which is beneficial for improving the sensor's sensitivity.

[0050] When the area of ​​the dimming unit TG within the photosensitive aperture K2 is less than 100%, the thickness of the dimming unit can be flexibly set based on this area ratio. For example, if the area ratio of the dimming unit TG within the photosensitive aperture K2 is large, its thickness can be set smaller to improve light transmittance while reducing reflection. Conversely, if the area ratio of the dimming unit TG within the photosensitive aperture K2 is small, its thickness can be set larger to improve the anti-reflection effect while ensuring transmittance. In other words, the area ratio of the dimming unit TG within the photosensitive aperture K2 is inversely related to its thickness, ensuring both anti-reflection effect and sufficient light transmission to the photosensitive area.

[0051] The above embodiments describe a scheme where the area of ​​the dimming unit TG in the photosensitive aperture K2 is less than 100%. However, this disclosure does not limit this. In an optional embodiment of this disclosure, the area of ​​the dimming unit TG in the photosensitive aperture K2 can also be 100%. For example, please refer to... Figure 9 , Figure 9 As shown Figure 1 Another BB-direction cross-sectional view of the display panel. In this embodiment, the photosensitive aperture K2 is fully covered by the dimming unit TG, which can achieve a relatively comprehensive and uniform anti-reflection effect, making the optical properties of the photosensitive aperture K2 area more uniform. Moreover, the method of not requiring patterned design also helps to simplify the manufacturing process.

[0052] Alternatively, please refer to Figure 9 and Figure 3 When the dimming section TG occupies 100% of the area in the photosensitive opening K2, the maximum thickness S1 of the dimming section TG along the thickness direction of the display panel is less than the thickness S2 of the filter section 92. By reducing the thickness of the dimming section TG, it can cause destructive interference with the reflected light at the interface of the upper and lower film layers, thereby minimizing the reflection of ambient light and reducing the reflectivity of the photosensitive area GA to below 0.1%. Although the dimming section TG covers 100% of the area, the absorption loss of light passing through is controlled very low due to its reduced thickness. By optimizing the thinned thickness, an optimal balance between anti-reflection and high transmittance can also be found.

[0053] In this embodiment of the disclosure, when the light-adjusting part TG with a small thickness is used to cover the entire photosensitive opening K2, the thickness of the light-adjusting part TG can be uniform. This will not produce diffraction and scattering effects caused by the patterned periodicity, and completely avoid defects such as halos or rainbow patterns caused by the periodicity of the surrounding pattern.

[0054] Of course, in some other embodiments of this disclosure, when the dimming unit TG completely covers the photosensitive opening K2, the surface of the dimming unit TG may also have a non-flat structure. For example, please refer to... Figure 10 and Figure 11 , Figure 10 As shown Figure 1 Another BB-direction cross-sectional view of the display panel. Figure 11 As shown Figure 10 An enlarged schematic diagram of a dimming unit TG. In an optional embodiment of this disclosure, the dimming unit TG includes a main body G0 and at least two protrusions G1 disposed on the side of the main body G0 away from the array layer. The main body G0 covers the photosensitive opening K2, and there is a second interval S2 between adjacent protrusions G1. The width of the second interval S2 is greater than 0.

[0055] In this embodiment, the main body G0 in the dimming unit TG covers 100% of the area of ​​the photosensitive opening K2. At least two protrusions G1 exist on the side of the main body G0 facing away from the array layer, forming a non-flat surface on one side of the dimming unit TG, which can be used for scattering, diffraction, or focusing light. Furthermore, the gap width between adjacent protrusions G1 is greater than 0, ensuring that the spaces between the protrusions G1 are filled with air or low-refractive-index material, enabling a grating or lens effect. At the microscale, when light enters the array formed by the protrusions G1 from the air, it can be considered as passing through an interface with a gradually changing effective refractive index. This gradient refractive index structure can greatly eliminate Fresnel reflection, achieving ultra-low reflection over a wider wavelength and at a lower angle than traditional thin films. This is beneficial for further reducing the refractive index of the photosensitive area GA to below 0.1%, or even close to 0, significantly improving the product's appearance when the screen is off and enhancing the user experience. In practical applications, the curved surface morphology or periodic arrangement of the protrusions G1 can be designed as a microlens array or a grating. The raised curved surface refracts and converges ambient light incident at large angles, effectively guiding it to the photosensitive area of ​​the lower photosensitive element. This significantly improves the light coupling efficiency and sensitivity of the ambient light sensor, ensuring stable operation even in low-light or high-angle incident conditions. In this embodiment, the microstructure formed by the raised portion G1 effectively reduces reflection, greatly minimizing light loss in the reflective portion and consequently increasing transmittance. This solves the problem of surface reflection while ensuring sufficient light signal for the photosensitive device's sensing function.

[0056] Please continue to refer to this. Figure 10 and Figure 11 In one optional embodiment of this disclosure, the main body G0 and the protrusion G1 are integrally formed, meaning that the main body G0 and the protrusion G1 are formed from the same material in the same step. If the main body G0 and the protrusion G1 are manufactured separately, two independent steps are required: first, depositing and patterning the main body G0, and then depositing and patterning the protrusion G1. In this disclosure, the main body G0 and the protrusion G1 adopt an integrally formed structure, employing a single photolithography and single development / etching step. By precisely controlling the exposure amount of the photoresist (e.g., using a grayscale mask), thickness and morphology differences can be created in different areas of the material, thereby forming the main body G0 and the protrusion G1 in the same layer in one step. This significantly reduces the number of masks, equipment time, and process alignment errors, making it the most economical and efficient manufacturing method for achieving structural functionality.

[0057] Furthermore, if the main body G0 and the protrusion G1 are separate structures, an interface will be formed between them. This interface may suffer from problems such as stress mismatch, refractive index discontinuity, or chemical residue. In this disclosure, the main body G0 and the protrusion G1 are formed continuously from the same material, eliminating the interface and making them structurally and chemically completely continuous. This avoids interface reflection and scattering, improving light transmission and collection efficiency. It also enhances the mechanical strength and adhesion of the protrusion structure, reducing the risk of peeling or breakage during subsequent processing or use. Moreover, when the main body G0 and the protrusion G1 are integrally formed from the same material, it ensures that they are composed of materials with the exact same refractive index and extinction coefficient. This greatly simplifies optical design, makes the control of the microlens / grating effect more predictable, and ensures more consistent optical response of the photosensitive area at different wavelengths.

[0058] Please refer to Figure 3 , Figure 9 and Figure 10 In one optional embodiment of this disclosure, the dimming unit TG and at least a portion of the filter unit 92 are disposed on the same layer. If the dimming unit TG and the filter unit 92 are on different layers, multiple deposition, photolithography, and etching processes are required. The co-layering of the dimming unit TG and at least a portion of the filter unit 92 means that the dimming unit TG and the filter unit 92 (or at least a portion thereof) can be deposited and patterned in a single step. For example, if the dimming unit TG uses green color resist, and the filter unit 92 also contains green color resist, these two parts can be completed in the same process step of depositing the green color resist. This significantly reduces the overall process time and manufacturing cost, facilitating large-scale mass production.

[0059] Furthermore, in the multi-layer structure of a display panel, the alignment accuracy between layers is a key factor affecting yield. The dimming unit TG and the filter unit 92 are located on the same layer, and their alignment reference is the layer itself, eliminating the need to consider the complex alignment relationships between the upper and lower layers. This effectively eliminates alignment errors between the dimming unit TG and the filter unit 92, ensuring that the dimming unit TG can accurately cover or pattern in the photosensitive aperture K2, greatly improving manufacturing accuracy and yield. Since the dimming unit TG is designed as a derivative structure of the filter unit 92 (e.g., a thinned or patterned area of ​​the filter unit 92), they can use materials with similar or identical chemical properties (e.g., both using color resist materials). This avoids chemical compatibility issues (such as stress mismatch, poor adhesion, etc.) that may arise from introducing new materials, resulting in a more stable overall film stack structure.

[0060] In one optional embodiment of this disclosure, the filter section 92 includes a red filter section, a green filter section and a blue filter section, and the dimming section TG is disposed in the same layer as the green filter section.

[0061] The spectral peaks of sunlight and most artificial light sources tend to be concentrated in the mid-band of visible light (near yellow and green light, for example, around 550 nm). Furthermore, among the green, red, and blue filters, the green filter is the material with the highest transmittance for visible light. The spectral transmittance curve of the green filter best matches the wavelength range most sensitive to the human eye (approximately 555 nm) and the peak values ​​of the ambient light spectrum. Therefore, placing the dimming unit (TG) in the same layer as the green filter ensures that the photosensor can receive the strongest and most effective signal from the ambient light. This is crucial for ensuring the sensor's fast and accurate response in various environments, especially in low light conditions. This design makes the sensor's response to ambient light closer to human eye perception, contributing to more natural and comfortable automatic brightness adjustment.

[0062] The dimming unit TG and the green color resist in the filter unit 92 are set on the same layer, which can directly utilize the deposition, photolithography, and etching equipment and processes used to produce the green color resist. This avoids adding a separate film or using new materials for the dimming unit TG, reducing manufacturing complexity and cost. Whether achieving a thin layer (the thickness of the dimming unit TG is less than the thickness of the filter unit 92) or a patterned (the dimming unit TG covers less than 100% of the photosensitive aperture K2), the dimming unit TG can be completed by combining a grayscale mask or a conventional mask in a single photolithography step of the green color resist, maximizing the use of existing process resources.

[0063] Figure 12 The diagram shows the reflectance spectrum of the photosensitive area. Line L1 represents the reflectance spectrum when the light-adjusting element is not introduced into the photosensitive area, while line L2 represents the reflectance spectrum when the green color resist CFG in filter 92 is introduced as the light-adjusting element. The horizontal axis represents the spectrum, and the vertical axis represents the reflectance. It can be seen that the reflectance of the photosensitive area is high without the light-adjusting element. However, after introducing the light-adjusting element, the reflectance R% of the photosensitive area is effectively reduced, while the transmittance T at 550nm is still maintained.

[0064] In one optional embodiment of this disclosure, the filter section 92 includes a red filter section, a green filter section, and a blue filter section, and the dimming section TG is disposed in the same layer as the red filter section or the blue filter section.

[0065] If, for some reason, the manufacturing process of the red or blue color resist in the light filter section of the panel design is more convenient for integrating additional patterning (thinning or non-100% coverage), then choosing to place the dimming unit (TG) and the corresponding color resist of the red or blue light filter on the same layer can avoid adding additional photolithography steps. Maintaining a co-layer arrangement eliminates alignment errors between the dimming unit (TG) and the light filter (92), ensuring manufacturing accuracy and yield. When the red or blue light filter is placed on the same layer as the dimming unit (TG), the corresponding photosensitive device can be, for example, a device sensitive to red or blue light, thereby meeting the display product's requirement for sensing ambient light.

[0066] The above embodiments illustrate a scheme where the dimming unit TG and the filter unit 92 are disposed on the same layer. In some other embodiments of this disclosure, the dimming unit TG and the filter unit 92 may also be made of different materials. For example, please refer to the figure. Figure 13 , Figure 13 As shown Figure 1 Another BB-direction cross-sectional view of the display panel is shown in this embodiment. The dimming section TG and the filter section 92 are filled with different materials to represent that they are made of different materials. When the dimming section TG uses a different material than the filter section 92, the designer can customize the material entirely according to the requirements of anti-reflection and high transmittance. For example, in an optional embodiment of this disclosure, the transmission spectrum peak position of the dimming section TG is different from that of the filter section 92; the transmission spectrum peak position of the dimming section TG is 550 nm, and the extinction coefficient at a wavelength of 550 nm is 0.005 ≤ k ≤ 0.04.

[0067] The transmission peak of the color resist material used in conventional filters is around 530 nm, corresponding to the peak of the emission spectrum of the light-emitting element. In this embodiment, the dimming unit uses a different material than the filter, employing a material with a transmission peak of 550 nm. 550 nm is the wavelength most sensitive to the human eye and one of the wavelengths with concentrated energy in the ambient light spectrum. Setting the transmission peak of the dimming unit TG at 550 nm maximizes the efficient passage of ambient light signals, thus ensuring the sensitivity of the ambient light sensor. The extinction coefficient k is a physical parameter describing the degree of light absorption during propagation in a material. A larger k value indicates greater light absorption and lower transmittance. In this embodiment, the extinction coefficient k of the dimming unit TG is set to ≤0.04, resulting in extremely low light absorption and ensuring that light near 550 nm passes through the dimming unit TG with minimal loss, meeting the sensor's light throughput requirements. If the k value is too low (e.g., less than 0.005, close to 0), the material absorbs almost no light. Although the transmittance is extremely high, it may not be conducive to fine-tuning of reflectivity through interference effects using minute absorption. Therefore, the limitation of k ≥ 0.005 ensures that the material has a certain degree of optical activity (i.e., the refractive index n and extinction coefficient k work together), allowing it to participate in the optical interference antireflection process and achieve precise control of reflectivity. In this embodiment, 0.005 ≤ k ≤ 0.04 is set, limiting the k value to an extremely narrow and low range, ensuring that the dimming unit TG can provide optimal visible light transmittance while possessing optical control capabilities. This customized dimming unit TG design can achieve performance exceeding that of conventional color resist materials used in color filters, achieving an extreme balance between low reflectivity and high transmittance.

[0068] Please continue to refer to this. Figure 3 When the dimming section TG uses a different material than the filter section, in one optional embodiment of this disclosure, the transmittance per unit thickness of the dimming section TG at the 550nm peak position is greater than or equal to 80%. In this case, the dimming section TG absorbs very little light at the 550nm wavelength, ensuring that only a very small amount of energy is absorbed by the material and converted into heat or loss when light passes through the dimming section TG. This maximizes the amount of light flux (total light intensity) entering the underlying photosensitive device, such as an ambient light sensor, which is beneficial for improving the photosensitive reliability of the photosensitive device.

[0069] In one optional embodiment of this disclosure, the refractive index of the dimming unit TG is n, where 1.53 ≤ n ≤ 1.65. The dimming unit TG, acting as an antireflective coating, utilizes the destructive interference generated by reflected light at the upper and lower interfaces of the thin film layer to cancel out reflections. To achieve optimal antireflection, the refractive index of the thin film layer needs to meet specific conditions. In OLED panels, the dimming unit TG is typically located between the air interface (n_{air} ≈ 1.0) and the underlying organic or inorganic film layer (e.g., n_{lower layer} ≈ 1.7~1.9). Due to the complexity of actual OLED film stack structures, a refractive index between 1.5 and 1.7 is usually required for matching to minimize interface reflections.

[0070] In this embodiment, the refractive index of the dimming unit TG is set to 1.53≤n≤1.65. This range falls within the refractive index range of conventional organic materials and is an ideal range for anti-reflection after optical engineering optimization. This ensures an effective refractive index transition between the dimming unit TG and the upper and lower film stacks of the panel, thereby minimizing reflectivity and meeting the requirement of reducing reflectivity to less than 0.1%.

[0071] Furthermore, most organic materials used in display panels (such as photoresists, color resists, planarizing materials, etc.) have a refractive index around 1.5 to 1.7. When this disclosure uses a dimming section TG with a refractive index of 1.53 ≤ n ≤ 1.65, materials with this refractive index are easy to synthesize, relatively inexpensive, and possess good thermal stability and chemical compatibility. It can be fabricated using color resists or organic resin materials similar to those used in the filter section 92, ensuring good compatibility with existing OLED manufacturing processes.

[0072] Alternatively, 1.55 ≤ n ≤ 1.6, or 1.58 ≤ n ≤ 1.64, but this disclosure does not impose any specific limitations on this.

[0073] Figure 14 As shown Figure 1 Another BB-direction cross-sectional view of the display panel. In an optional embodiment of this disclosure, along the thickness direction of the display panel, a first insulating layer 61 is included between the first functional layer 90 and the light-emitting functional layer, and the first insulating layer 61 is disposed adjacent to the first functional layer 90. When a touch layer 60 is disposed between the first functional layer 90 and the encapsulation layer 50 in the display panel, the aforementioned first insulating layer 61 can be regarded as a touch insulating layer in the touch layer 60. It should be noted that when the touch layer 60 is not disposed in the display panel, the first functional layer 90 is in direct contact with the encapsulation layer 50, and the aforementioned first insulating layer 61 can then be represented as the inorganic encapsulation layer in the encapsulation layer 50 closest to the first functional layer 90. Please refer to... Figure 13 The surface of the first insulating layer 61 facing the first functional layer 90 is planar, or, please refer to... Figure 14The first insulating layer 61 includes a flat portion 611 and a protruding portion 612. Along the thickness direction of the display panel, the flat portion 611 is located in the display area AA, and the protruding portion 612 is located in the photosensitive opening K2. The surface of the protruding portion 612 facing away from the array layer 40 is higher than the surface of the light-shielding layer 91 facing away from the array layer 40.

[0074] Please refer to Figure 13 When the surface of the first insulating layer 61 is planar, the first insulating layer 61 is flat in both the display area AA and the photosensitive area GA. The dimming unit TG is directly located above the flat photosensitive opening K2, covered in a thinned or patterned form. This scheme requires the dimming unit TG to achieve anti-reflection through thickness control (thinning) or area patterning. Its anti-reflection effect depends entirely on the refractive index and film thickness of the dimming unit TG material and the interference matching between the upper and lower interfaces. The manufacturing process corresponding to this structure is relatively mature, simple, and has low production cost.

[0075] Please refer to Figure 14 When the first insulating layer 61 includes a flat portion 611 and a protruding portion 612, the flat portion 611 is located in the display area AA, and the protruding portion 612 is located in the photosensitive opening K2. In the photosensitive opening K2, the first insulating layer 61 forms a raised microstructure (protruding portion 62). The surface of the protruding portion 612 facing away from the array layer 40 is higher than the surface of the light-shielding layer 91 facing away from the array layer, and the dimming portion TG is located above the surface of the protruding portion 612. In this embodiment, the protruding structure of the protruding portion 612 can act as a microlens, which can refract and converge ambient light incident at a large angle, improving the efficiency of light entering the sensor (light-gathering effect). The protruding structure forms an effective gradient refractive index with the surrounding air or filling material, which can achieve ultra-low reflection over a wide angle and a wide spectrum, further improving the user experience.

[0076] Furthermore, when the first insulating layer 61 includes a flat portion 611 and a protrusion 612, when the upper dimming TG material (e.g., CFG color resist) is deposited on the lower TPOC protrusion 612, the thickness of the subsequently deposited dimming TG material at the top of the protrusion 612 will naturally decrease due to the curved morphology and high step of the protrusion 612. This naturally formed thickness difference (thin above the protrusion 612, thick at the flat area AA of the display region) itself meets the requirement for thinning of the dimming TG, eliminating the need for an additional graying process. Complex grayscale lithography is avoided, significantly reducing the chance of alignment and patterning errors. Using more reliable morphological rheology to achieve thickness control provides a wider process window and greater stability than relying on precise exposure dose and etching time control (graying), greatly simplifying the manufacturing process, reducing production costs, and facilitating large-scale mass production.

[0077] Please continue to refer to this. Figure 14In one optional embodiment of this disclosure, when the first insulating layer 61 includes a flat portion 611 and a protruding portion 612, the dimming portion TG is located on the side of the protruding portion 612 away from the array layer 40, and the thickness of the dimming portion TG is S0, 0.5μm≤S0≤1.5μm.

[0078] During the manufacturing process of display products, maintaining a stable film thickness below 0.5μm, especially when utilizing TPOC protrusions for natural thinning, presents significant challenges. This makes it highly susceptible to localized damage, voids, or uneven thickness. As an organic film, the dimming zone (TG) suffers from insufficient structural strength and toughness when too thin (e.g., less than 0.5μm), leading to structural defects such as cracking and peeling during subsequent deposition, heat treatment, or panel use, thus impacting product lifespan. Conversely, when the TG is too thick (e.g., greater than 1.5μm), the energy absorbed by light passing through increases significantly, severely attenuating the ambient light signal. This directly affects the response speed and accuracy of the ambient light sensor in low light conditions. Thicker films also tend to cause complex multi-order interference in reflected light. This can result in noticeable color changes or rainbow patterns (interference fringes) under different viewing angles or lighting conditions, severely affecting the uniformity of the screen's appearance when off. Furthermore, increased thickness requires more expensive organic materials (e.g., color resist), directly increasing material costs. Simultaneously, the patterning and curing time for thicker films also increases, reducing production efficiency.

[0079] Therefore, in this embodiment, the thickness is set to 0.5μm ≤ S0 ≤ 1.5μm. Within this thickness range, the dimming unit TG can simultaneously achieve efficient optical antireflection (meeting a reflectivity of less than 0.1%) and minimal light absorption (meeting the high sensitivity of the sensor), achieving a perfect balance between appearance and functionality. This avoids the structural defects and process uncontrollability caused by the thin-film layer, ensuring the mechanical reliability and high yield of the structure. This range matches the natural thinning effect introduced by the protrusion 612 in the first insulating layer 61, realizing the manufacturing simplification advantage of eliminating the need for an ashing process.

[0080] Optionally, 0.8μm≤S0≤1.4μm, or 1μm≤S0≤1.3μm, etc., are not specifically limited in this disclosure.

[0081] Please continue to refer to this. Figure 14 In one optional embodiment of this disclosure, when the first insulating layer 61 includes a flat portion 611 and a protruding portion 612, the area of ​​the dimming portion TG in the photosensitive opening K2 is 100%, thus forming a continuous, uninterrupted thin film. This completely eliminates diffraction, scattering, and resulting halos, rainbow patterns, and other defects caused by patterning periods and edge effects. This ensures extremely high visual uniformity in the photosensitive area when the screen is off.

[0082] In this embodiment, the dimming unit TG covers the protrusion 612 in the photosensitive opening K2, making the dimming unit TG also have a raised shape. This double-protruding structure (or continuation of the morphology) allows the photosensitive area to form a thicker and more efficient composite microlens structure. This further enhances the refraction and convergence of ambient light, enabling light to couple more accurately and efficiently into the underlying photosensitive sensor, maximizing the sensor's sensitivity. Raised organic structures generally have higher mechanical strength and scratch resistance than flat films. This improves the structural stability of the photosensitive area, which is beneficial for protecting the underlying functional layer.

[0083] Figure 15 As shown Figure 1 Please refer to another BB-direction cross-sectional view of the display panel. Figure 15 Optionally, the surface of the dimming unit TG facing away from the protrusion 612 includes multiple protruding microstructures W, such as conical or hemispherical structures. These protruding microstructures W can be arrayed on the surface of the dimming unit TG, thus forming a moth-eye-like structure on the surface of the dimming unit TG. This structure can achieve ultra-low reflection over a very wide range of angles and wavelengths, and its performance far exceeds that of traditional thin-film interference anti-reflection, further improving the user experience.

[0084] Based on the same inventive concept, this disclosure also provides a display device. Figure 16 The figure shown is a plan view of a display device provided in an embodiment of this disclosure. Figure 17 As shown Figure 16 A cross-sectional view along the C-axis of a display device, showing the film structure of the photosensitive area GA. Please refer to... Figure 16 and Figure 17 The display device 200 provided in this embodiment includes a photosensitive element 300 and any of the display panels 100 in the foregoing embodiments. Along the thickness direction of the display device 200, the photosensitive element 300 overlaps with the photosensitive opening K2. It should be noted that... Figure 17 The embodiments only illustrate one form of the dimming unit TG in the photosensitive area GA, but do not limit the specific form of the dimming unit TG. The dimming unit TG in the display device can adopt the structure of the dimming unit in any of the aforementioned embodiments.

[0085] The display device 200 provided in this embodiment can be any electronic device with display function, such as a touch screen, mobile phone, tablet computer, laptop computer, e-reader, or television. The display device 200 provided in this embodiment has the beneficial effects of the display panel provided in this embodiment; for details, please refer to the specific descriptions of the display panel in the above embodiments, which will not be repeated here.

[0086] Understandable, Figure 16The rectangular structure is used as an example to illustrate one shape of the display device 200. In some other embodiments of this disclosure, the display device 200 may also be circular, elliptical or any other feasible shape, and this disclosure does not specifically limit it.

[0087] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0088] The above description is merely a specific embodiment of this disclosure, enabling those skilled in the art to understand or implement it. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this disclosure. Therefore, this disclosure is not to be limited to the embodiments described herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A display panel, characterized in that, The display panel includes a display area and a photosensitive area, wherein the display area at least partially surrounds the photosensitive area; the display panel includes: Array layer; A light-emitting functional layer is located on one side of the array layer and is electrically connected to the array layer; A first functional layer is located on the side of the light-emitting functional layer opposite to the array layer. The first functional layer includes a light-shielding layer and a light-filtering part. The light-shielding layer includes a plurality of display openings and at least one photosensitive opening. Along the thickness direction of the display panel, the display openings and the photosensitive openings penetrate the light-shielding layer. The display openings are located in the display area, the photosensitive openings are located in the photosensitive area, and the light-filtering part is located in the display openings. A dimming section is located in the photosensitive opening along the thickness direction of the display panel, and the thickness of the dimming section is less than or equal to the thickness of the filter section.

2. The display panel according to claim 1, characterized in that, The area of ​​the dimming part in the photosensitive opening is less than 100%.

3. The display panel according to claim 2, characterized in that, In the photosensitive opening, the dimming section includes at least two sub-dimming sections, and there is a first interval between adjacent sub-dimming sections, the width of the first interval being greater than 0.

4. The display panel according to claim 3, characterized in that, The edge of the first interval projected onto the light-emitting surface of the display panel includes at least one of a line segment and an arc.

5. The display panel according to claim 3, characterized in that, The width of the first interval is D0, 3μm≤D0≤8μm, and the width direction of the first interval is perpendicular to its extension direction and parallel to the light-emitting surface of the display panel.

6. The display panel according to claim 1, characterized in that, The area of ​​the dimming unit in the photosensitive opening is 100%.

7. The display panel according to claim 6, characterized in that, Along the thickness direction of the display panel, the maximum thickness of the dimming section is less than the thickness of the filter section.

8. The display panel according to claim 6, characterized in that, The dimming unit includes a main body and at least two protrusions disposed on the side of the main body away from the array layer. The main body covers the photosensitive opening, and there is a second interval between adjacent protrusions, the width of which is greater than 0.

9. The display panel according to claim 8, characterized in that, The main body and the protrusion are integrally formed.

10. The display panel according to claim 1, characterized in that, The dimming unit is disposed in the same layer as at least a portion of the filter unit.

11. The display panel according to claim 10, characterized in that, The light filtering section includes a red light filtering section, a green light filtering section and a blue light filtering section, and the dimming section is disposed in the same layer as the green light filtering section.

12. The display panel according to claim 10, characterized in that, The light filtering section includes a red light filtering section, a green light filtering section, and a blue light filtering section, and the dimming section is disposed in the same layer as the red light filtering section or the blue light filtering section.

13. The display panel according to claim 1, characterized in that, The transmission spectrum peak position of the dimming unit is different from that of the filter unit. The transmission spectrum peak position of the dimming unit is 550nm, and the extinction coefficient at the wavelength of 550nm is 0.005≤k≤0.

04.

14. The display panel according to claim 13, characterized in that, The transmittance per unit thickness of the dimming unit at the 550nm peak position is greater than or equal to 80%.

15. The display panel according to claim 13, characterized in that, The refractive index of the dimming part is n, where 1.53 ≤ n ≤ 1.

65.

16. The display panel according to claim 1, characterized in that, Along the thickness direction of the display panel, a first insulating layer is included between the first functional layer and the light-emitting functional layer, and the first insulating layer is disposed adjacent to the first functional layer; The surface of the first insulating layer facing the first functional layer is planar, or the first insulating layer includes a flat portion and a protruding portion. Along the thickness direction of the display panel, the flat portion is located in the display area, the protruding portion is located in the photosensitive opening, and the surface of the protruding portion away from the array layer is higher than the surface of the light-shielding layer away from the array layer.

17. The display panel according to claim 16, characterized in that, When the first insulating layer includes a flat portion and a protruding portion, the dimming portion is located on the side of the protruding portion away from the array layer, and the thickness of the dimming portion is S0, 0.5μm≤S0≤1.5μm.

18. The display panel according to claim 17, characterized in that, The area of ​​the dimming unit in the photosensitive opening is 100%.

19. A display device, characterized in that, The display device includes a photosensitive device and a display panel as described in any one of claims 1 to 18, wherein the photosensitive device overlaps with the photosensitive opening along the thickness direction of the display device.

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