Ultrahigh-cleanliness mute intelligent storage library for semiconductor wafer Mask

Abstract

The embodiment of the invention provides a semiconductor wafer Mask ultra-high-cleanliness mute intelligent storage warehouse, and relates to the technical field of semiconductor manufacturing auxiliary equipment, the semiconductor wafer Mask ultra-high-cleanliness mute intelligent storage warehouse comprises a stacking station main body, a storage box body and a sliding guide mechanism, a storage cavity used for containing the storage box body is formed in the stacking station main body, and a high-efficiency air filter is arranged at the top of the storage cavity; the inner sides of the rims are in interference fit with flanges on the two sides of the I-shaped sliding rail, the magnitude of interference gradually changes in the length direction of the sliding rail, the storage box is of a double-layer hollow structure, a miniature constant-temperature and constant-humidity unit is installed on the inner wall of the box, and an intelligent monitoring module is further arranged on the stacking station body. And the intelligent monitoring module comprises a dust sensor arranged in the storage box body and a central controller arranged on the stacking station main body. The sliding mechanism has the effects of sliding stability, ultrahigh cleanliness and low noise.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing auxiliary equipment technology, and in particular to a semiconductor wafer mask ultra-high cleanliness silent intelligent storage library. Background Technology

[0002] In semiconductor manufacturing, the semiconductor wafer mask, as a core component of the photolithography process, directly affects the chip production quality due to its surface cleanliness and positional accuracy. Currently, semiconductor factories mostly use stacking stations to store masks. Existing stacking station storage devices typically include a stacking station body, horizontal slide rails installed within the stacking station body, and storage boxes that can slide along the slide rails. The storage boxes are used to hold the masks.

[0003] However, existing storage devices have the following drawbacks: the storage enclosure slides only by engaging a slide rail at its bottom, which easily causes wobbling along a direction perpendicular to the sliding direction. This wobbling can cause the mask inside the storage enclosure to shift, affecting the accuracy of subsequent loading and unloading. Furthermore, the wobbling generates additional friction between the enclosure and the slide rail, producing not only significant noise but also dust particles that contaminate the mask surface, leading to a decrease in chip production yield. In addition, long-term wobbling can reduce the structural stability and lifespan of the device.

[0004] To address the aforementioned issues, storage devices urgently need to resolve the problems of high dust generation and noise caused by unstable sliding. Summary of the Invention

[0005] To address the issue of unstable sliding in storage devices, this application provides a semiconductor wafer mask ultra-high cleanliness silent intelligent storage library.

[0006] This application provides a semiconductor wafer mask ultra-high cleanliness silent intelligent storage library using the following technical solution:

[0007] A high-cleanliness, silent intelligent storage warehouse for semiconductor wafer masks includes a stacking station body, a storage box, and a sliding guide mechanism. The stacking station body has an internal storage cavity for accommodating the storage box. A high-efficiency air filter is installed at the top of the storage cavity. The sliding guide mechanism includes a lower slide rail, an upper slide rail, and a composite roller assembly. Both the lower and upper slide rails are I-shaped structures and are horizontally and parallelly fixed to the bottom and top of the storage cavity, respectively. The composite roller assembly includes a lower roller group installed at the bottom of the storage box and an upper roller group installed at the top. All rollers in the roller assembly adopt a double-flange structure. The inner sides of the flanges of the rollers in the lower and upper roller assemblies are respectively interference-fitted with the two side flanges of the lower and upper slide rails. The interference amount is gradually set along the length direction of the lower and upper slide rails. The storage box is a double-layer hollow structure. A miniature constant temperature and humidity unit is installed on the inner wall of the storage box. The main body of the stacking station is also equipped with an intelligent monitoring module. The intelligent monitoring module includes a dust sensor installed in the storage box and a central controller installed on the main body of the stacking station. The dust sensor is electrically connected to the central controller.

[0008] Optionally, the outer layer of the storage box is an aluminum alloy frame, the inner layer is a polyetheretherketone dustproof board, and the space between the two layers is filled with sound-absorbing cotton.

[0009] Optionally, the interference gradient parameters of the composite roller assembly are: interference at the inlet end 0.02mm, interference in the middle section 0.03-0.04mm, and interference at the outlet end 0.02mm.

[0010] Optionally, the main body of the stacking station is equipped with an audible and visual alarm, and the central controller sets a warning threshold: when the dust concentration exceeds 0.05μm particles / minute, the audible and visual alarm is triggered and the storage box is controlled to stop moving.

[0011] In summary, this application includes at least one of the following beneficial technical effects:

[0012] The combination of the I-shaped slide rail and the double-flange rollers forms a three-dimensional constraint from both horizontal and vertical directions. Combined with the gradual interference fit design, it avoids rigid collisions and eliminates gap sway. The miniature constant temperature and humidity unit inside the storage box works in conjunction with the high-efficiency air filter of the stacking station to provide a constant storage environment, preventing mask deformation or surface condensation caused by temperature and humidity fluctuations. The monitoring of dust sensors enables real-time early warning and emergency shutdown of abnormal conditions, improving the safety of device operation and the reliability of mask storage. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0014] Figure 2 This is a schematic diagram of the storage box structure of the present invention;

[0015] Figure 3 This is a cross-sectional schematic diagram of the storage box of the present invention.

[0016] Explanation of reference numerals in the attached drawings: 1. Main body of the stacking station; 2. Storage box; 21. Miniature constant temperature and humidity unit; 211. Aluminum alloy frame; 212. Polyetheretherketone dustproof plate; 3. Sliding guide mechanism; 31. Lower slide rail; 32. Upper slide rail; 4. Composite roller assembly; 41. Lower roller group; 42. Upper roller group. Detailed Implementation

[0017] The terminology used in the following embodiments is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. As used in the specification and appended claims of this application, the singular expressions “a,” “an,” “the,” “the,” “the,” and “this” are intended to also include expressions such as “one or more,” unless the context clearly indicates otherwise. It should also be understood that in the following embodiments of this application, “at least one” and “one or more” refer to one, two, or more than two. The term “and / or” is used to describe the relationship between related objects, indicating that three relationships may exist; for example, A and / or B can indicate: A alone, A and B simultaneously, or B alone, where A and B can be singular or plural. The character “ / ” generally indicates that the preceding and following related objects are in an “or” relationship.

[0018] References to "one embodiment" or "some embodiments" as described in this specification mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.

[0019] The following is in conjunction with the appendix Figure 1-3 The present invention will be described in further detail below.

[0020] This application discloses an ultra-high cleanliness silent storage intelligent library for semiconductor wafer masks, referring to... Figure 1 , Figure 2 and Figure 3The system includes a stacking station main body 1, a storage box 2, and a sliding guide mechanism 3. The stacking station main body has an internal storage cavity to accommodate the storage box. A high-efficiency air filter is installed at the top of the storage cavity to circulate and purify the air, ensuring a clean storage environment. The storage box 2 has a double-layer hollow structure: an outer aluminum alloy frame 211 and an inner polyetheretherketone (PEEK) dustproof board 212. Sound-absorbing cotton is filled between the two layers to reduce overall operating noise and provide dust buffering, reducing the risk of airflow carrying dust into the storage box 2. A pneumatic sealing strip is installed at the opening of the storage box 2, forming a sealed structure with the side door. A miniature constant temperature and humidity unit 21 is installed inside the storage box 2 to maintain stable temperature and humidity. The sliding guide mechanism 3 includes a lower slide rail 31, an upper slide rail 32, and a composite roller assembly 4. Both the lower slide rail 31 and the upper slide rail 32 are I-beam shaped slide rails, horizontally and parallelly fixed to the bottom and top of the storage cavity of the stacking station main body 1. The composite roller assembly 4 includes rollers installed on the storage box... The lower roller assembly 41 at the bottom of the housing 2 and the upper roller assembly 42 at the top both employ a double-flange structure. The inner sides of the rims of the rollers in the lower roller assembly 41 and the upper roller assembly 42 are interference-fitted with the side flanges of the lower slide rail 31 and the upper slide rail 32, respectively. The interference amount gradually changes along the length of the lower slide rail 31 and the upper slide rail 32, with an interference of 0.02mm at the inlet end, a stable 0.03-0.04mm in the middle section, and a return to 0.02mm at the outlet end. (Stacking station) The main body 1 is also equipped with an intelligent monitoring module, which includes a dust sensor installed in the storage box 2 and a central controller installed on the main body 1 of the stacking station. The dust sensor is electrically connected to the central controller. The dust sensor detects the dust concentration in the storage box 2 and transmits the data to the central controller. The main body 1 of the stacking station is equipped with an audible and visual alarm. The central controller sets a warning threshold: when the dust concentration exceeds 0.05μm particles / minute, it triggers the audible and visual alarm and controls the storage box 2 to stop moving.

[0021] The above are merely preferred embodiments of the present invention. The scope of protection of the present invention is not limited to the above embodiments. Any equivalent modifications or variations made by those skilled in the art based on the content disclosed in the present invention should be included within the scope of protection set forth in the claims.

Claims

1. A semiconductor wafer mask ultra-high cleanliness silent intelligent storage library, comprising a stacking station body (1), a storage box (2), and a sliding guide mechanism (3), wherein the stacking station body (1) has a storage cavity inside for accommodating the storage box (2), characterized in that: A high-efficiency air filter is provided at the top of the storage cavity. The sliding guide mechanism (3) includes a lower slide rail (31), an upper slide rail (32), and a composite roller assembly (4). The lower slide rail (31) and the upper slide rail (32) are both I-shaped structures and are horizontally parallel and fixed at the bottom and top of the storage cavity. The composite roller assembly (4) includes a lower roller group (41) installed at the bottom of the storage box (2) and an upper roller group (42) installed at the top. The rollers in the lower roller group (41) and the upper roller group (42) both adopt a double-rim structure. The inner side of the rim of the roller in 2) is interference-fitted with the two side flanges of the lower slide rail (31) and the upper slide rail (32), respectively. The interference is gradually set along the length direction of the lower slide rail (31) and the upper slide rail (32). The storage box (2) is a double-layer hollow structure. The inner wall of the storage box (2) is equipped with a miniature constant temperature and humidity unit (21). The main body (1) of the stacking station is also equipped with an intelligent monitoring module. The intelligent monitoring module includes a dust sensor installed in the storage box (2) and a central controller installed on the main body (1) of the stacking station. The dust sensor is electrically connected to the central controller.

2. The semiconductor wafer mask ultra-high cleanliness silent storage intelligent library according to claim 1, characterized in that: The storage box (2) has an outer aluminum alloy frame (211) and an inner polyether ether ketone dustproof board (212), with sound-absorbing cotton filling the space between the two layers.

3. The semiconductor wafer mask ultra-high cleanliness silent storage intelligent library according to claim 1, characterized in that: The interference gradient parameters of the composite roller assembly (4) are: interference at the inlet end 0.02mm, interference at the middle section 0.03-0.04mm, and interference at the outlet end 0.02mm.

4. The semiconductor wafer mask ultra-high cleanliness silent storage intelligent library according to claim 1, characterized in that: The main body (1) of the stacking station is equipped with an audible and visual alarm. The central controller sets a warning threshold: when the dust concentration exceeds 0.05μm particles / minute, it triggers an audible and visual alarm and controls the storage box (2) to stop moving.

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