Photoelectric detection device and electronic equipment
By optimizing the layout design of the photoelectric conversion region and the isolation region in the photoelectric detection device, an effective transmission path between the transmission transistor and the charge holding section is ensured, thus solving the problem of image quality degradation caused by pixel miniaturization and improving signal charge transmission characteristics.
Patent Information
- Application Number
- CN202480058878.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-10-17
- Filing Date
- 2024-10-17
- Publication Date
- 2026-04-10
AI Technical Summary
As pixels become smaller, the distance between the transmission transistor and the charge holding part becomes too close, which affects the signal charge transfer characteristics and degrades image quality performance.
In the photoelectric detection device, the layout of the photoelectric conversion area and the isolation area is designed to be square. The transmission transistor is located in the photoelectric conversion area, and the charge holding part is located in the isolation area across the center line to ensure the effectiveness of the transmission path.
It improves image quality performance, enhances signal charge transmission characteristics, and solves the problem of image quality degradation caused by close proximity.