Frame deposition processing method, frame preparation method and terminal equipment
By forming a deposition layer on the outer surface of the frame through the friction stir additive manufacturing process, the problem of surface defects after anodizing of the terminal device frame is solved, and the high-gloss metallic texture and structural strength are improved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-14
- Publication Date
- 2026-04-17
AI Technical Summary
Surface defects such as pores, segregation, and pitting exist on the bezels of terminal devices (such as mobile phone bezels) during the anodizing process, resulting in poor appearance and difficulty in achieving a high-gloss metallic texture.
The friction stir additive manufacturing process is adopted to form a deposition layer on the outer surface of the frame through a stirring head. Combined with positioning block clamping and lubricant isolation, the deposition path is planned and the processing parameters are adjusted to achieve the uniformity and continuity of the deposition layer.
It effectively masks minor defects on the surface after anodizing, improves the load-bearing capacity, surface hardness, and structural strength of the frame, ensures the density and uniformity of the deposited layer, and enhances the appearance quality of the terminal equipment.
Smart Images
Figure CN121870245A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of deposition processing, specifically to a border deposition processing method, a border preparation method, and a terminal device. Background Technology
[0002] Driven by the trend towards high strength and lightweight design, die casting is often used for the bezels of terminal devices (such as mobile phone bezels) to achieve complex internal structures. However, this process suffers from drawbacks such as low load-bearing capacity and weak strength. Alternatively, composite materials are used to improve rigidity. However, these processes or materials exhibit significant defects during anodizing: die-cast parts, due to limitations in the molding process, generally have porosity and segregation on the surface, easily leading to acid leaching and color differences; composite materials, due to the difference in electrochemical properties between the internal reinforcing phase and the matrix, result in discontinuous oxide film growth, and the interface is susceptible to electrolyte erosion, causing pitting. These substrate defects not only damage the integrity of the film layer but also make it difficult to achieve the high-gloss metallic texture required for consumer electronics products. Therefore, how to shield the material defects of the substrate to improve the surface quality of the terminal device bezel has become a key technological challenge that urgently needs to be solved in the manufacturing of terminal device bezels. Summary of the Invention
[0003] To avoid and overcome the technical problems existing in the prior art, the present invention provides a frame deposition processing method. This invention provides a frame deposition processing method that solves the problem of poor anodizing appearance of terminal device frames (such as mobile phone frames) due to uneven substrate microstructure caused by die-cast aluminum alloys and composite materials.
[0004] To achieve the above objectives, the present invention provides the following technical solution: A border deposition process includes the following steps: The frame substrate to be processed is clamped, and the frame substrate includes one or more sets of frames. Determine the deposition path on the outer surface of the border; The stirring head passes through the deposition path of the frame continuously or in segments, and forms a deposition layer on the deposition path of the frame through the friction stir additive manufacturing process.
[0005] As a further aspect of the present invention: the frame substrate can be rotated while being clamped to switch processing positions, and the frame substrate is simultaneously subjected to stirring friction additive manufacturing on the outer surface of the frame by a stirring head to achieve deposition when it is fixed and rotating.
[0006] As a further embodiment of the present invention: when the frame base includes a single set of frame edges, the single set of frame edges is held by two sets of positioning blocks; When the frame base includes multiple sets of frames, the multiple sets of frames are arranged in a linear array. While the multiple sets of frames are clamped by two sets of positioning blocks, adjacent sets of frames are isolated, fixed and supported by contouring punches.
[0007] As a further embodiment of the present invention: the frame substrate is located within the outline of the positioning block, so that a height difference is formed between the frame and the positioning block; when the frame is deposited, the deposited raw material discharged through the outlet of the stirring head is stirred and rubbed against the surface of the positioning block.
[0008] As a further embodiment of the present invention: the starting point and / or the ending point of the stirring head for stirring friction is located on the surface of the positioning block or on the extended surface of the positioning block.
[0009] As a further aspect of the present invention, the width of the discharge port of the stirring head is set to be greater than the distance between the two sets of positioning blocks.
[0010] As a further embodiment of the present invention: when the frame substrate includes a single set of frames, the introduction area of the stirring head is set on the surface of one set of positioning blocks or the extension surface of the surface, the frame deposition starting point is set on the frame surface, the stirring head moves from the introduction area of the positioning block to the frame deposition starting point of the frame, and after completing the deposition operation through the deposition path of the frame, the stirring head moves to the surface of one set of positioning blocks or the extension surface of the surface to be led out.
[0011] As a further embodiment of the present invention: when the frame substrate includes multiple sets of frames, the introduction area of the stirring head is set on the surface of one set of positioning blocks or the extension surface of the surface, and the frame deposition starting point is set on the surface of multiple sets of frames, so that the frame deposition starting points of each frame are arranged in a straight line along the spacing direction between the two sets of positioning blocks; the stirring head moves from the introduction area of the positioning block to the frame deposition starting point of the frame substrate, and after the stirring head completes the deposition operation through the deposition path of multiple sets of frames, the stirring head moves to the surface of one set of positioning blocks or the extension surface of the surface and is then led out.
[0012] As a further embodiment of the present invention: when the frame substrate includes multiple sets of frames, the stirring friction starting point of the stirring head is set on the surface of one set of positioning blocks or the extended surface of the surface, and the frame deposition starting point is set on the surface of multiple sets of frames. The stirring head moves through the introduction area of the positioning block to the frame deposition starting point of the frame substrate, and after completing the deposition operation through the deposition path of each frame in sequence, the stirring head moves to the surface of another set of positioning blocks or the extended surface of the surface and is then led out. During the deposition process on the frame, the deposition material discharged from the outlet of the stirring head is stirred and rubbed against the frame. Alternatively, it can be subjected to stirring friction with the frame and the contouring punch; Alternatively, it can be subjected to stirring friction with the positioning block and the contouring punch; Alternatively, it can be stirred and rubbed with the frame, positioning block, and contouring punch.
[0013] As a further embodiment of the present invention: the frame base is located within the outline of the positioning block, so that a height difference is formed between the frame and the positioning block; the width of the discharge port of the stirring head is set to be less than or equal to the distance between the two sets of positioning blocks; the deposited raw material discharged through the discharge port of the stirring head is stirred and rubbed with the frame or the surface of the frame and positioning block.
[0014] As a further embodiment of the present invention: the outline dimensions of the frame substrate and the positioning block correspond to each other so that the frame and the positioning block are flush; the deposited raw material discharged through the discharge port of the stirring head is stirred and rubbed against the surface of the positioning block and / or the frame.
[0015] As a further embodiment of the present invention: the positioning block is located within the contour range of the frame substrate, so that a height difference is formed between the frame and the positioning block; the deposited raw material discharged through the discharge port of the stirring head is stirred and rubbed against the surface of the frame.
[0016] As a further aspect of the present invention: before the positioning block clamps the frame substrate, a lubricant is applied to the clamping surface of the positioning block to form an isolation film.
[0017] As a further aspect of the present invention: the deposition path of the frame is divided into straight line segments and rounded corner segments based on the outer contour of the frame. When depositing on the straight segments of the frame, the stirring head moves in a straight line along the straight segments of the frame, while the frame remains stationary. During the deposition process on the rounded corners of the frame, the frame rotates, and the stirring head floats and rises and falls along the direction perpendicular to the frame while moving in a straight line along the direction parallel to the frame, maintaining a constant vertical distance between the stirring head and the frame.
[0018] As a further embodiment of the present invention: the straight line segment of the border is further divided into a straight line travel segment and a curve preparation segment; The rounded corners of the border are further divided into inward curve sections and outward curve sections. The straight section, the preparation section for entering the curve, the entry section, and the exit section are connected in sequence. During deposition, specific processing parameters are determined based on the deposition thickness; The processing parameters include the rotational speed of the stirring head, the travel speed of the stirring head along the straight travel section, the feeding rate of the straight travel section, the travel speed of the stirring head along the entry-bend preparation section, the feeding rate of the entry-bend preparation section, the rotational speed of the frame in the entry-bend section, the rotational speed of the frame in the exit-bend section, the feeding rate of the entry-bend section, and the feeding rate of the exit-bend section.
[0019] As a further embodiment of the present invention: when the deposition thickness is 2.5 mm, the rotation speed of the stirring head is 100-350 rpm, the travel speed of the stirring head along the straight travel section is 100-400 mm / min, the feeding speed of the straight travel section is 1.3-2.0 mm / s, the travel speed of the stirring head along the bend preparation section is 100-200 mm / min, the feeding speed of the bend preparation section is 1.3-2.0 mm / s, the rotation speed of the frame in the bend entry section is 200-300° / min, the rotation speed of the frame in the bend exit section is 300-500° / min, the feeding speed of the bend entry section is 0.8-1.2 mm / s, and the feeding speed of the bend exit section is 0.5-1.0 mm / s.
[0020] As a further embodiment of the present invention: when the deposition thickness is 3 mm, the rotation speed of the stirring head is 100-350 rpm, the travel speed of the stirring head along the straight travel section is 150-300 mm / min, the feeding speed of the straight travel section is 1.5-3.0 mm / s, the travel speed of the stirring head along the bend preparation section is 100-200 mm / min, the feeding speed of the bend preparation section is 1.3-2.0 mm / s, the rotation speed of the frame in the bend entry section is 200-400° / min, the rotation speed of the frame in the bend exit section is 300-600° / min, the feeding speed of the bend entry section is 1.2-1.8 mm / s, and the feeding speed of the bend exit section is 0.8-1.0 mm / s.
[0021] As a further aspect of the present invention: the entry section and the exit section are divided by an angle ratio, with the angle ratio of the entry section and the exit section being 1:2; the length range of the entry preparation section is 15-25mm.
[0022] As a further aspect of the present invention, it also includes deposition processing tooling used in conjunction with the deposition processing process; The deposition processing fixture includes two sets of positioning blocks that clamp and position the frame at both ends along the direction of the inner liner plate perpendicular to the frame, and a rotating shaft that drives the two sets of positioning blocks to rotate synchronously at the same speed. It also includes a stirring head that travels along the outer surface of the frame to perform the deposition action. The rotation axis of the rotating shaft is perpendicular to the inner liner plate of the frame, and the rotating shaft is configured to drive the frame to rotate when the frame is deposited with rounded corner sections. The stirring head includes at least two directions of travel. The first direction of travel of the stirring head is to travel in a straight line along the straight segments of the frame and perform a deposition action on each straight segment of the frame. The second direction of travel of the stirring head is to travel in a combined manner along the rounded corner segments of the frame. The combined manner involves floating and rising in the direction perpendicular to the frame while traveling in a straight line in the direction parallel to the frame and performing a deposition action on each rounded corner segment of the frame. The spacing between the stirring head and the frame remains constant in both directions of travel.
[0023] The present invention also proposes a frame preparation method, including the above-mentioned frame deposition processing method, and further including: heat treatment of the deposited sample; machining of the heat-treated sample; and appearance treatment of the machined sample.
[0024] The present invention also proposes a terminal device, the terminal device including a housing, the frame of which is prepared according to the above-described frame preparation method.
[0025] Compared with the prior art, the beneficial effects of the present invention are: 1. This invention plans a deposition path after clamping the frame and combines it with friction stir additive manufacturing to form a deposition layer on the outer surface of the frame, effectively masking the minor defects on the surface of traditional terminal devices (such as mobile phones) after anodizing. The frame is clamped and fixed by two sets of positioning blocks, and an introduction area and an exit area are set on the surface of the positioning blocks, so that the stirring head can smoothly enter and exit the deposition path. The deposition material is evenly distributed, avoiding anodizing defects at the beginning and end of the deposition layer, and improving the continuity and integrity of the deposition process.
[0026] 2. When there is a height difference between the positioning block and the frame, the deposition material directly stirs and rubs against the positioning block during the deposition process. This causes the deposition material to soften and flow downwards to deposit on the frame. This avoids the deposition material directly applying pressure to the frame, improving the stability of the deposition process and the deposition quality of the frame. It can also improve the load-bearing capacity, surface hardness, and structural strength of the frame.
[0027] 3. During the processing of this invention, lubricating oil, molybdenum disulfide and other lubricants are applied to the clamping surface of the positioning block to form an isolation film, which prevents the positioning block from sticking to the frame after the deposition process and facilitates separation after processing. The deposition path is divided into straight segments and rounded segments, and different processing methods are used for different segments, so that the stirring head can always maintain a constant distance from the frame surface, effectively avoiding the problems of unstable material flow and uneven deposition layer thickness caused by contour changes.
[0028] 4. By further subdividing the straight segments and rounded segments and setting the processing parameters of each subdivided segment according to the deposition thickness, the present invention achieves refined control of the deposition process, improves the stability of the material flow in the deposition layer and the surface deposition quality; by adjusting the rate of each segment and the feeding rate, the density and uniformity of the deposition layer are further improved.
[0029] 5. The angle ratio between the entry and exit bends of the rounded corner section in this invention enables the stirring head to transition smoothly during the turning process, reducing deposition defects caused by sudden changes in direction and improving the deposition quality in the rounded corner area; the length control of the entry bend preparation section provides sufficient buffer distance for the stirring head to enter the rounded corner section, ensuring that the deposition parameters can be smoothly transitioned and avoiding uneven deposition caused by sudden speed changes or changes in direction. Attached Figure Description
[0030] Figure 1 This is a schematic diagram of the deposition processing fixture in this invention.
[0031] Figure 2 This is a schematic diagram of the positioning block in this invention.
[0032] Figure 3 This is a schematic diagram of the processing trajectory of the stirring head along the edge of the frame in this invention.
[0033] In the picture: 1. Base; 11. Positioning seat; 12. Slide rail; 2. Rotating shaft; 21. Driving gear; 22. Driven gear; 3. Transmission shaft; 31. Transmission gear; 4. Support base; 41. Support roller; 5. Positioning block; 51. Fixing shaft hole; 52. Pin hole; 6. Frame; 7. Stirring head; 8. Chassis; 81. Brake; A. Inlet and outlet areas. Detailed Implementation
[0034] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0035] Please see Figures 1-3 In this embodiment of the invention, a border deposition processing method includes the following steps: The frame substrate to be processed is clamped and fixed, and the frame substrate includes one or more sets of frame 6; Determine the deposition path on the outer surface of border 6; The stirring head 7 passes through the deposition path of the frame 6 continuously or in segments, and forms a deposition layer on the deposition path of the frame 6 through a stirring friction additive manufacturing process.
[0036] The specific cooperation relationship between the frame 6 and the positioning block 5 includes the following embodiments: Example 1: This embodiment is a preferred embodiment. The frame substrate is clamped and fixed by two sets of positioning blocks 5. The frame substrate is located within the outline of the positioning blocks 5. The distance between the edge of the frame 6 and the edge of the positioning block 5 in the frame substrate is a constant value. A height difference is formed between the frame 6 and the positioning blocks 5. The deposition material discharged from the outlet of the stirring head 7 directly stirs and rubs against the surface of the positioning blocks 5 to reduce the pressure on the frame 6 during deposition. The stirring and friction between the deposition material and the positioning blocks 5 causes the deposition material to soften plastically and flow downwards to be deposited on the frame 6.
[0037] During processing, as the stirring head 7 moves to deposit material, the deposited material directly interacts with the surface of the positioning block 5 through stirring friction. The positioning block 5 serves as an auxiliary support surface, and the stirring head 7 is introduced and withdrawn from its top surface or an extension thereof to guide its smooth entry and exit from the processing area. The introduction position of the stirring head 7 marks the starting point of its stirring friction, and the withdrawal position marks the end point of its stirring friction.
[0038] In this embodiment, the width of the discharge port of the stirring head 7 is greater than the distance between the two sets of positioning blocks 5.
[0039] In this embodiment, when the frame substrate consists of a single set of frame 6, the stirring head 7 can complete the deposition of the single set of frame 6 after circling the frame substrate once; when the frame substrate includes multiple sets of frame 6, the stirring head 7 can complete the deposition of multiple sets of frame 6 after circling the frame substrate once. Of course, when there are multiple sets of frame 6, the width of the discharge port of the stirring head 7 can also be less than or equal to the width between two sets of positioning blocks 5. In this case, the stirring head 7 can circle the frame substrate multiple times to deposit multiple sets of frame 6.
[0040] In this embodiment, taking the processing of a single set of frame 6 as an example, an introduction area is set on the surface of one set of positioning blocks 5. The stirring head 7 moves from its initial position to the introduction area and stirs and rubs against the positioning blocks 5, then moves along the surface of the positioning blocks 5 towards the frame substrate. At the same time, a deposition starting point is set on the surface of the frame 6. The location of the deposition starting point is not limited and can be on a straight segment or a rounded segment of the frame 6, preferably on a straight segment. The stirring head 7 moves from the introduction area to the deposition starting point and moves along the deposition path set on the outer surface of the frame to complete the deposition operation. After the deposition is completed, the stirring head 7 returns to the deposition starting point and then moves to the surface of one set of positioning blocks 5, ending the processing at the exit area on the surface of the positioning blocks 5 and lifting it away. Usually, the exit area position coincides with the introduction area position.
[0041] In this embodiment, taking the processing of multiple sets of frame 6 as an example, the multiple sets of frame 6 are arranged in a linear array and are clamped and fixed by two sets of positioning blocks 5.
[0042] The surface of the positioning block 5 is provided with an inlet area. A deposition starting point is set on the surface of each set of frame edges 6, and these starting points are arranged in a straight line along the spacing between the two sets of positioning blocks 5. The stirring head 7 moves from the inlet area until its outlet can simultaneously cover the deposition starting points of all frame edges 6. Then, the stirring head 7 simultaneously passes through the deposition path of all frame edges 6, completing the deposition process for all frame edges 6 in one go. After deposition is completed, the stirring head 7 ends its processing at the exit area on the surface of the positioning block 5 and is lifted away; typically, the exit area coincides with the inlet area.
[0043] Example 2: The outline dimensions of the frame base and the positioning block 5 are precisely matched, so that the surface of the frame 6 is flush with the surface of the positioning block 5.
[0044] During the processing, the deposited material discharged from the stirring head 7 can be directly stirred and rubbed against the surface of the positioning block 5 or the surface of the frame 6, or simultaneously with both. In this processing, the width of the discharge port of the stirring head 7 and the distance between the two sets of positioning blocks 5 are not limited. It can be deposited on each frame 6 simultaneously after circling the frame base, or it can be deposited on each frame 6 in segments after circling the frame base multiple times.
[0045] Example 3: The frame substrate is clamped and fixed by two sets of positioning blocks 5, which are located within the contour range of the frame substrate to create a height difference between the frame 6 and the positioning blocks 5. The deposited material discharged from the stirring head 7 directly stirs and rubs against the surface of the frame 6. During this process, the width of the discharge port of the stirring head 7 and the distance between the two sets of positioning blocks 5 are not limited. Deposition on each frame 6 can be completed simultaneously after one revolution around the frame substrate, or it can be completed segmentally after multiple revolutions around the frame substrate. During the process, the positioning blocks 5 mainly serve a clamping and positioning function; their surfaces do not directly participate in the main deposition and friction process.
[0046] In the above embodiments, when multiple sets of frame 6 are provided, in a more preferred fixing method, adjacent frame 6 are isolated, fixed and supported by a contouring punch. The addition of the contouring punch can enhance the support and positioning effect of multiple sets of frame 6, and avoid some frame 6 from slipping out due to only two sets of positioning blocks 5 clamping the frame 6, thereby improving the stability of the deposition process.
[0047] Specifically, the contouring punch has a multi-segment structure, including support segments and isolation segments. These support segments and isolation segments are arranged alternately. The segments of the contouring punch, as well as the punch itself, can be fixed using hole-shaft connections or bolt positioning, as long as they facilitate easy assembly and disassembly. Taking two sets of frame 6 as an example, the contouring punch includes two sets of support segments and one set of isolation segments. The outer contours of the two sets of support segments correspond to the contours of the inner wall of the frame 6, thus forming internal support for the inner wall of the frame 6. The isolation segment of the contouring punch connects the two sets of support segments and separates adjacent sets of frame 6. The outer contour dimensions of the isolation segment are not limited; it can be higher than the height of the frame 6, flush with the surface of the frame 6, or lower than the height of the frame 6. After fixing, from the machining perspective, the frame 6, the isolation segment of the contouring punch, and the frame 6 are arranged alternately.
[0048] After adding the contouring punch, its effect, except for separating the two sets of frame 6, is equivalent to the effect of the positioning block 5. The cooperation relationship between the contouring punch, the frame 6, and the stirring head 7 can be understood in the same way as the cooperation relationship between the positioning block 5, the frame 6, and the stirring head 7 in the above embodiments, and will not be repeated.
[0049] In one embodiment, when the frame substrate includes multiple sets of frames 6, the stirring friction starting point of the stirring head 7 is set on the surface of one set of positioning blocks 5 or the extended surface of the surface. The frame deposition starting point is set on the surface of multiple sets of frames 6. The stirring head 7 moves to the frame deposition starting point of the frame substrate through the introduction area of the positioning block 5. After completing the deposition operation by passing through the deposition path of each frame 6 in sequence, the stirring head 7 moves to the surface of another set of positioning blocks 5 or the extended surface of the surface and is then led out. When depositing on the frame 6, the deposition material discharged through the outlet of the stirring head 7 is stirred and rubbed with the frame 6, or with the frame 6 and the contouring punch, or with the positioning block 5 and the contouring punch, or with the frame 6, the positioning block 5 and the contouring punch.
[0050] Specifically, based on the above embodiments, taking the case where the height of the isolation section of the contouring punch is higher than the height of the frame 6 as an example, the isolation section of the contouring punch can be regarded as the positioning block 5. When the deposited material discharged from the outlet of the stirring head 7, it can directly act on the surface of the positioning block 5, and also directly act on the surface of the isolation section of the contouring punch for stirring and friction. Taking the case where the height of the isolation section of the contouring punch is flush with the height of the frame 6 as another example, in this flush state, when the deposited material discharged from the outlet of the stirring head 7, it can directly act on the surface of the frame 6, and also directly act on the surface of the isolation section of the contouring punch for stirring and friction. Finally, taking the case where the height of the isolation section of the contouring punch is lower than the height of the frame 6 as an example, in this case, the contouring punch only serves as a support, fixation, and separation function, and does not directly participate in the stirring and friction with the deposited material.
[0051] In the above embodiments, before clamping and fixing, a lubricant, such as lubricating oil or molybdenum disulfide, can be applied to the clamping surface of the positioning block 5 to form an isolation film. This helps to separate the frame substrate from the positioning block 5 after the deposition process, preventing disassembly difficulties due to adhesion.
[0052] Of course, before installing the contour punch, a lubricant, such as lubricating oil or molybdenum disulfide, can be applied to its support surface to form a protective film.
[0053] In the above embodiments, different motion control strategies are adopted for the rounded corner segments and straight line segments of the border 6 to ensure the uniformity of deposition, and the deposition path of the border 6 is divided into straight line segments and rounded corner segments. The straight section can be further divided into a straight travel section and a curve preparation section. The straight travel section is the main straight part in the middle of the straight section, and the curve preparation section is the transition section connecting the straight line and the rounded corner. The length of the curve preparation section ranges from 15 to 25 mm. The rounded corner section can be further divided into a curve entry section and a curve exit section. The curve entry section corresponds to the beginning part of the rounded corner, and the curve exit section corresponds to the end part of the rounded corner. The straight travel section, curve preparation section, curve entry section, and curve exit section are connected sequentially. The angle ratio between the curve entry section and the curve exit section can be set to 1:2. In this embodiment, the rounded corner of the curve entry section is 30°, and the rounded corner of the curve exit section is 60°.
[0054] When depositing on the straight segment of frame 6, the stirring head 7 is activated. The stirring head 7 moves in a straight line along the straight segment of frame 6, and this direction of movement is the first direction of movement of the stirring head 7, corresponding to the straight segment of frame 6.
[0055] During deposition on the rounded corner section of frame 6, when the stirring head 7 reaches the rounded corner section of frame 6, frame 6 rotates, and simultaneously the stirring head 7 floats and rises in a direction perpendicular or approximately perpendicular to the surface of frame 6. While floating and rising, it also travels in a straight line parallel to frame 6 (here, the direction parallel to frame 6 can be understood as the tangent direction of the current rounded corner section's processing surface) to track the contour changes of the rounded corner section. This direction of travel serves as the second direction of travel for the stirring head 7, corresponding to the rounded corner section of frame 6. Through the coordinated action of frame 6 rotation and the floating and rising movement of the stirring head 7 combined with its straight-line travel, continuous deposition of the rounded corner section is achieved.
[0056] By switching the first and second travel directions of the stirring head 7, combined with the rotation of the frame 6, the deposition processing of the straight and rounded segments of the frame 6 is carried out alternately, thereby completing the continuous processing of the frame 6. Throughout the processing, by controlling the rotation speed of the frame 6, the travel speed of the stirring head 7 along the two travel directions, and the floating and lifting speed of the stirring head 7, it is ensured that the distance between the discharge port of the stirring head 7 and the frame 6 remains constant throughout the deposition process, so that the thickness of the deposition layer on the surface of the frame 6 remains consistent and the deposition effect is guaranteed.
[0057] Processing parameters are adjusted according to the target deposition thickness: ① When the deposition thickness is 2.5 mm, the rotation speed of the stirring head 7 is 100-350 rpm, the travel speed of the stirring head 7 along the straight travel section is 100-400 mm / min, the feeding speed of the straight travel section is 1.3-2.0 mm / s, the travel speed of the stirring head 7 along the bend preparation section is 100-200 mm / min, the feeding speed of the bend preparation section is 1.3-2.0 mm / s, the rotation speed of the frame 6 in the bend entry section is 200-300° / min, the rotation speed of the frame 6 in the bend exit section is 300-500° / min, the feeding speed of the bend entry section is 0.8-1.2 mm / s, and the feeding speed of the bend exit section is 0.5-1.0 mm / s.
[0058] ② When the deposition thickness is 3mm, the rotation speed of the stirring head 7 is 100-350rpm, the travel speed of the stirring head 7 along the straight travel section is 150-300mm / min, the feeding speed of the straight travel section is 1.5-3.0mm / s, the travel speed of the stirring head 7 along the bend preparation section is 100-200mm / min, the feeding speed of the bend preparation section is 1.3-2.0mm / s, the rotation speed of the frame 6 in the bend entry section is 200-400° / min, the rotation speed of the frame 6 in the bend exit section is 300-600° / min, the feeding speed of the bend entry section is 1.2-1.8mm / s, and the feeding speed of the bend exit section is 0.8-1.0mm / s.
[0059] The present invention also proposes a deposition processing tooling for use in conjunction with the deposition processing process.
[0060] The system includes a base 1 for fixing the components, and two sets of positioning blocks 5 mounted on a rotating shaft 2 on the base 1, clamping the frame 6 from both sides. The positioning blocks 5 can be configured as a contoured structure, clamping the inner lining plate of the frame 6 while providing internal support for the frame 6. The two sets of positioning blocks 5 achieve positioning of the double end faces of the frame 6. The rotation axis of the rotating shaft 2 is perpendicular to the inner lining plate of the frame 6, driving the two sets of positioning blocks 5 to rotate synchronously at the same speed. The deposition process is performed by a stirring head 7, which is an existing structure, so its structure will not be described in detail.
[0061] This fixture is equipped with two sets of rotating shafts 2, which are used to drive two sets of positioning blocks 5 respectively. To ensure that the positioning blocks 5 and the frame 6 do not twist during rotation, the two sets of rotating shafts 2 rotate synchronously, and the synchronization method is as follows: One set of rotating shafts 2 serves as the driving shaft, directly driven by a motor inside the housing 8. The other set of rotating shafts 2 serves as the driven shaft. The driving and driven shafts are connected by a transmission mechanism.
[0062] In this embodiment, a drive gear 21 and a driven gear 22 are coaxially mounted on the drive shaft and the driven shaft, respectively. A transmission shaft 3 parallel to the rotating shaft 2 is added to the base 1. Two sets of transmission gears 31 are coaxially mounted on the transmission shaft 3, which mesh with the drive gear 21 and the driven gear 22, respectively, thereby synchronously transmitting the power and speed of the drive shaft to the driven shaft.
[0063] In addition to the transmission method mentioned above, the two sets of rotating shafts 2 can be driven by independent servo motors. The two motors can be controlled by a CNC system to maintain the same speed and phase, so as to achieve synchronous rotation.
[0064] During the deposition process, the frame 6 to be processed is placed between two sets of positioning blocks 5, and its position is adjusted so that the inner lining plate of the frame 6 is clamped and positioned by the two sets of positioning blocks 5. In this application, the deposition process is preferably a friction stir additive manufacturing process.
[0065] When depositing on the straight segment of the frame 6, the stirring head 7 travels in a straight line along the direction of the straight segment of the frame 6. This direction of travel is the first direction of travel for the stirring head 7, corresponding to the straight segment of the frame 6. During this process, to maintain a constant processing position, the brake 81 is activated, applying resistance to the rotating shaft 2 to prevent accidental rotation and locking the position of the frame 6. The stirring head 7 deposits on the outer surface of the frame 6 during its linear movement. In this embodiment, the brake 81 can be an electromagnetic brake or a friction brake, applying braking to the motor that drives the rotating shaft 2.
[0066] When depositing on the rounded corner section of frame 6, when the stirring head 7 reaches the rounded corner section of frame 6, the brake 81 releases the brake on the rotating shaft 2. The motor drives the rotating shaft 2 to rotate at a preset speed, causing the two sets of positioning blocks 5 and the clamped frame 6 to rotate synchronously. At the same time, the stirring head 7 floats and rises in a direction perpendicular or approximately perpendicular to the surface of the frame 6, while simultaneously moving in a straight line parallel to the frame 6 (here, the direction parallel to the frame 6 can be understood as the tangent direction of the current rounded corner section processing surface) to track the contour changes of the rounded corner section of the frame. This direction of movement serves as the second direction of movement for the stirring head 7, corresponding to the rounded corner section of the frame 6. Through the coordinated action of the rotating shaft 2 driving the frame 6 to rotate and the floating and rising + straight-line movement of the stirring head 7, continuous deposition of the rounded corner section is completed.
[0067] By switching the first and second travel directions of the stirring head 7, combined with the rotation of the frame 6, the deposition processing of the straight and rounded segments of the frame 6 is carried out alternately, thereby completing the continuous processing of the frame 6. Throughout the processing, by controlling the rotation speed of the frame 6, the travel speed of the stirring head 7 along the two travel directions, and the floating and lifting speed of the stirring head 7, it is ensured that the distance between the discharge port of the stirring head 7 and the frame 6 remains constant throughout the deposition process, so that the thickness of the deposition layer on the surface of the frame 6 remains consistent and the deposition effect is guaranteed.
[0068] To resist the downward pressure exerted by the stirring head 7 on the frame 6 and the rotating shaft system during the deposition process and to prevent the rotating shaft 2 from undergoing excessive deflection deformation, a support seat 4 is provided on the base 1. The support seat 4 is located below the rotating shaft 2, so that the direction of the supporting force exerted by the support seat 4 on the rotating shaft 2 is opposite to the direction of the pressure exerted by the stirring head 7, forming a balanced torque to improve the rigidity of the rotating shaft 2 and improve the processing accuracy.
[0069] Support rollers 41, which can rotate along the axis parallel to the rotating shaft 2, are mounted on the support base 4. The wheel surface of the support rollers 41 is in direct contact with the shaft body of the rotating shaft 2, forming rolling friction. This provides effective support while reducing the frictional resistance when the rotating shaft 2 rotates. Multiple sets of support bases 4 can be provided and symmetrically arranged on both sides of the rotating shaft 2.
[0070] In this application, the positioning block 5, the frame 6, and the stirring head 7 have various mating relationships. Among them, the frame base in each embodiment can be a single set of frames or multiple sets of frames. A single set of frames is directly clamped by two sets of positioning blocks 5. When the frame is set to multiple sets, the multiple sets of frames are arranged in a linear array to form a frame group (i.e., the frame base), and then clamped by two sets of positioning blocks 5.
[0071] In a preferred embodiment, the outer dimensions of both sets of positioning blocks 5 are larger than the outer dimensions of the frame 6. After clamping, the frame 6 is located within the edge contour range of the two positioning blocks 5. The width of the discharge port of the stirring head 7 is designed to be greater than the width of the frame 6. When the stirring head 7 is pressed down for deposition, the deposition material discharged through the discharge port directly stirs and rubs against the upper surface of the two positioning blocks 5. At this time, the area between the bottom of the deposition material and the upper surface of the frame 6 that is not in contact forms a gap space, which serves as the flow space after the deposition material has been plastically softened. In this embodiment, the height difference between the frame 6 and the positioning blocks 5 is 0.1 to 2.5 mm, preferably 2 mm. The height difference between the frame 6 and the discharge port of the stirring head 7 is 0.5 mm to 4 mm, preferably 2.5 mm to 3 mm, and this height difference serves as the deposition layer height. The height difference between the positioning blocks 5 and the stirring head 7 is maintained at 0.4 mm to 1.5 mm, preferably 1 mm. During the deposition process in this embodiment, the introduction and exit areas A of the stirring head 7 are both set on the positioning blocks 5, and the stirring head 7 is introduced and exited on the surface of the positioning blocks 5.
[0072] The following is a suboptimal embodiment: The size of the positioning block 5 is larger than that of the frame 6, and the width of the discharge port of the stirring head 7 is less than or equal to the width of the frame 6. ① When the width of the discharge port of the stirring head 7 is less than the width of the frame 6, the stirring head 7 circles the frame 6 multiple times to process the frame 6 in segments, or travels along the S-shaped direction of the surface of the frame 6 and circles the frame 6 once to complete the deposition; during the deposition process, the deposition material discharged through the discharge port directly acts on the surface of the frame 6, or acts on the upper surface of the frame 6 and one set of positioning blocks 5 to generate stirring friction. ② When the width of the discharge port of the stirring head 7 is equal to the width of a single set of frame 6, the deposition material discharged through the discharge port directly acts on the surface of the frame 6 to generate stirring friction, and completes the deposition process after traveling around the frame 6 once; or the deposition material discharged through the discharge port acts on the upper surface of one set of positioning blocks 5 to generate stirring friction, and completes part of the deposition of the frame 6 after traveling around the frame 6 once, and then the deposition material acts on the upper surface of another set of positioning blocks 5 to generate stirring friction, and completes the deposition of the remaining part of the frame 6 after traveling around the frame 6 once.
[0073] The dimensions of the positioning block 5 are basically the same as those of the frame 6. After clamping, the edge of the positioning block 5 is flush with the edge of the frame 6. ① When the width of the discharge port of the stirring head 7 is greater than the width of the frame 6, during deposition, the deposited material discharged from the discharge port of the stirring head 7 directly acts on the upper surface of the positioning block 5 and the upper surface of the frame 6 to generate stirring friction, and completes the deposition process after traveling around the frame 6 once; ② When the width of the discharge port of the stirring head 7 is equal to the width of the frame 6, the deposited material directly acts on the upper surface of the frame 6 to generate stirring friction, and completes the deposition process after traveling around the frame 6 once; ③ When the width of the stirring head 7 is less than the width of the frame 6, during deposition, the stirring head 7 travels around the frame 6 multiple times and then processes the frame 6 in segments, or travels along the S-shaped direction on the surface of the frame 6 while traveling around the frame 6 once to complete the deposition process. Deposition; during the deposition process, the deposition material directly acts on the surface of the frame 6 or on the upper surface of the frame 6 and one of the positioning blocks 5 to generate stirring friction; taking the discharge port width of the stirring head 7 as being greater than half the width of the frame 6 as an example, the deposition material discharged through the discharge port acts on the upper surface of one of the positioning blocks 5 and part of the upper surface of the frame 6 (greater than or equal to half the width) to generate stirring friction, and after moving around the frame 6 once, part of the deposition of the frame 6 is completed. Then the deposition material is acted on the upper surface of another set of positioning blocks 5 and the remaining upper surface of the frame 6 to generate stirring friction, and after moving around the frame 6 once, the deposition of the remaining part of the frame 6 is completed.
[0074] The size of frame 6 is larger than the size of positioning block 5. During clamping, the two sets of positioning blocks 5 are located within the boundary range of frame 6 to clamp and fix the inner lining plate. ① When the width of the discharge port of stirring head 7 is greater than the width of frame 6, the deposited material discharged through the discharge port directly acts on the upper surface of frame 6 to generate stirring friction, and completes the deposition process after traveling around frame 6 once; ② When the width of the discharge port of stirring head 7 is equal to the width of frame 6, the deposited material directly acts on the upper surface of frame 6 to generate stirring friction, and completes the deposition process after traveling around frame 6 once; ③ When the width of stirring head 7 is less than the width of frame 6, during deposition, stirring head 7 circles frame 6 multiple times and then processes frame 6 in segments, or along the surface of frame 6. While moving in the direction of the shape, it circles the frame 6 to complete the deposition; during the deposition process, the deposition material directly acts on the surface of the frame 6 to cause stirring and friction; taking the width of the discharge port of the stirring head 7 as being greater than half the width of the frame 6 as an example, the deposition material acts on part of the upper surface of the frame 6 (greater than or equal to half the width) to cause stirring and friction, and after moving around the frame 6 once, part of the deposition of the frame 6 is completed. Then, the deposition material acts on the remaining upper surface of the frame 6 to cause stirring and friction, and after moving around the frame 6 once, the deposition of the remaining part of the frame 6 is completed.
[0075] To accommodate frame widths 6 of varying sizes, both the drive shaft and driven shaft are cantilevered. The drive shaft is directly mounted on the chassis 8 of the base 1 and rotated by a drive motor within the chassis 8. The driven shaft is mounted on an independent positioning seat 11. A slide rail 12 is provided on the platform of the base 1 along a direction parallel to the axis of the rotating shaft 2. Depending on the width of the frame 6 to be processed, the positioning seat 11 slides along the slide rail 12, and its position is adjusted and fixed with bolts. This adjusts the distance between the driven shaft and the drive shaft to match different frame sizes. To facilitate the movement of the positioning seat 11, a push seat is provided on the base 1, arranged parallel to the positioning seat 11. Multiple sets of bolts are provided on the push seat along the sliding direction of the positioning seat 11. The ends of each bolt engage with the positioning seat 11 in a free-spinning manner, while the bolts are threaded into the push seat. Tightening the bolts engages the threads of the bolts with the push seat, causing the positioning seat 11 to move linearly, thus adjusting its position.
[0076] In one embodiment, each positioning block 5 has a fixed shaft hole 51 at its center, which is used to fix and connect to the end of the rotating shaft 2 by means of a key, pin or flange, so as to transmit torque.
[0077] To prevent relative misalignment between the two positioning blocks 5 when the stirring head 7 applies excessive pressure or torque, in one embodiment, multiple sets of pin holes 52 are provided on the positioning blocks 5. The positions of the pin holes 52 correspond to the positions of the original functional area holes on the inner lining plate of the frame 6. During clamping, after placing the frame 6 between the two positioning blocks 5, positioning pins are sequentially passed through the pin holes 52 of one positioning block 5, the functional area holes on the inner lining plate of the frame 6, and the corresponding pin holes 52 of the other positioning block 5. Through the pin connection, the two positioning blocks 5 are further locked, thereby suppressing deformation.
[0078] During processing, lubricant needs to be pre-applied to the clamping surface of the positioning block 5 to form an isolation film, preventing the positioning block 5 from sticking to the frame 6 after processing. The lubricant is preferably lubricating oil or molybdenum disulfide.
[0079] The present invention also proposes a border fabrication method, including the border deposition processing method of the above embodiments, and further comprising: The heat treatment of the deposited frame sample includes stress relief, solution treatment, and aging treatment; then, the heat-treated frame sample is machined according to the product structure, including CNC roughing and CNC finishing; finally, the machined frame sample is subjected to surface treatment, including grinding, polishing, and anodizing.
[0080] The present invention also proposes a terminal device, the terminal device including a housing, the frame of which is prepared according to the above-described frame preparation method.
[0081] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.
[0082] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.
Claims
1. A method for edge deposition processing, characterized in that, Includes the following steps: The frame substrate to be processed is clamped, and the frame substrate includes one or more sets of frames (6). Determine the deposition path on the outer surface of the border (6); The stirring head (7) passes through the deposition path of the frame (6) continuously or in segments, and forms a deposition layer on the deposition path of the frame (6) through the friction stir additive manufacturing process.
2. The method of claim 1, wherein, The frame substrate can be rotated while being clamped to switch processing positions. When the frame substrate is fixed and rotated, it is simultaneously stirred and frictionally additively processed on the outer surface of the frame (6) by the stirring head (7) to achieve deposition.
3. The method of claim 2, wherein, When the frame base includes a single frame (6), the single frame (6) is held by two sets of positioning blocks (5); When the frame base includes multiple sets of frame (6), the multiple sets of frame (6) are arranged in a linear array. While the multiple sets of frame (6) are clamped by two sets of positioning blocks (5), the adjacent two sets of frame (6) are isolated, fixed and supported by the contouring punch.
4. The method of claim 3, wherein, The frame substrate is located within the outline of the positioning block (5) so that a height difference is formed between the frame (6) and the positioning block (5); when the frame (6) is deposited, the deposited raw material discharged through the outlet of the stirring head (7) is stirred and rubbed against the surface of the positioning block (5).
5. The method of claim 4, wherein the frame deposition process is a sputter deposition process. The starting point and / or ending point of the stirring head (7) for stirring friction is located on the surface of the positioning block (5) or on the extended surface of the positioning block (5).
6. The method of claim 5, wherein, The width of the discharge port of the stirring head (7) is set to be greater than the distance between the two sets of positioning blocks (5).
7. The method of claim 6, wherein the frame deposition process is a sputter deposition process. When the frame substrate includes a single frame (6), the introduction area of the stirring head (7) is set on the surface of one of the positioning blocks (5) or the extension surface of the surface. The frame deposition start point is set on the surface of the frame (6). The stirring head (7) moves from the introduction area of the positioning block (5) to the frame deposition start point of the frame (6). After completing the deposition operation through the deposition path of the frame (6), the stirring head (7) moves to the surface of one of the positioning blocks (5) or the extension surface of the surface and is led out.
8. The method of claim 6, wherein the frame deposition process is a sputter deposition process. When the frame substrate includes multiple sets of frames (6), the introduction area of the stirring head (7) is set on the surface of one set of positioning blocks (5) or the extension surface of the surface. The frame deposition starting point is set on the surface of multiple sets of frames (6), so that the frame deposition starting point of each frame (6) is arranged in a straight line along the spacing direction between the two sets of positioning blocks (5). The stirring head (7) moves to the frame deposition starting point of the frame substrate through the introduction area of the positioning block (5). After the stirring head (7) completes the deposition operation through the deposition path of multiple sets of frames (6), the stirring head (7) moves to the surface of one set of positioning blocks (5) or the extension surface of the surface and is then led out.
9. The method of claim 3, wherein the frame deposition process is a sputter deposition process. When the frame substrate includes multiple sets of frames (6), the stirring friction starting point of the stirring head (7) is set on the surface of one set of positioning blocks (5) or the extended surface of the surface. The frame deposition starting point is set on the surface of multiple sets of frames (6). The stirring head (7) moves to the frame deposition starting point of the frame substrate through the introduction area of the positioning block (5). After completing the deposition operation through the deposition path of each frame (6), the stirring head (7) moves to the surface of another set of positioning blocks (5) or the extended surface of the surface and is then led out. When depositing on the frame (6), the deposit material discharged from the outlet of the stirring head (7) is stirred and rubbed against the frame (6); Alternatively, it can be stirred and rubbed with the frame (6) and the contouring punch; Alternatively, it can be stirred and rubbed with the positioning block (5) and the contouring punch; Alternatively, it can be stirred and rubbed with the frame (6), the positioning block (5) and the contouring punch.
10. The method of claim 3, wherein the method further comprises: The frame base is located within the outline of the positioning block (5) so that a height difference is formed between the frame (6) and the positioning block (5); the width of the discharge port of the stirring head (7) is set to be less than or equal to the distance between the two sets of positioning blocks (5); the deposited raw material discharged through the discharge port of the stirring head (7) is stirred and rubbed against the surface of the frame (6) or the frame (6) and the positioning block (5).
11. The method of claim 3, wherein the method is a bezel deposition process. The outline dimensions of the frame base correspond to those of the positioning block (5) so that the frame (6) and the positioning block (5) are flush; the deposited raw material discharged through the outlet of the stirring head (7) is stirred and rubbed against the surface of the positioning block (5) and / or the frame (6).
12. The method of claim 3, wherein the method is a bezel deposition process. The positioning block (5) is located within the outline of the frame substrate so that a height difference is formed between the frame (6) and the positioning block (5); the deposited raw material discharged through the outlet of the stirring head (7) is stirred and rubbed against the surface of the frame (6).
13. A method according to any one of claims 3 to 12, wherein, Before the positioning block (5) clamps the frame substrate, a lubricant is applied to the clamping surface of the positioning block (5) to form an isolation film.
14. The method of claim 2-12, wherein, Using the outer contour of the border (6), the deposition path of the border (6) is divided into straight line segments and rounded corner segments; When depositing the straight section of the frame (6), the stirring head (7) moves in a straight line along the straight section of the frame (6), while the frame (6) remains stationary. When depositing the rounded corner section of the frame (6), the frame (6) rotates, and the stirring head (7) floats and rises and falls along the direction perpendicular to the frame (6) while moving in a straight line along the direction parallel to the frame (6), keeping the vertical distance between the stirring head (7) and the frame (6) constant.
15. The method of claim 14, wherein, The straight line segment of the border (6) is further divided into a straight travel segment and a curve preparation segment; The rounded corner segment of the border (6) is further divided into the entry curve segment and the exit curve segment; The straight section, the preparation section for entering the curve, the entry section, and the exit section are connected in sequence. During deposition, specific processing parameters are determined based on the deposition thickness; The processing parameters include the rotational speed of the stirring head (7), the travel speed of the stirring head (7) along the straight travel section, the feeding rate of the straight travel section, the travel speed of the stirring head (7) along the entry-bend preparation section, the feeding rate of the entry-bend preparation section, the rotational speed of the frame (6) in the entry-bend section, the rotational speed of the frame (6) in the exit-bend section, the feeding rate of the entry-bend section, and the feeding rate of the exit-bend section.
16. The method of claim 15, wherein, When the deposition thickness is 2.5 mm, the rotation speed of the stirring head (7) is 100-350 rpm, the travel speed of the stirring head (7) along the straight travel section is 100-400 mm / min, the feeding speed of the straight travel section is 1.3-2.0 mm / s, the travel speed of the stirring head (7) along the bend preparation section is 100-200 mm / min, the feeding speed of the bend preparation section is 1.3-2.0 mm / s, the rotation speed of the frame (6) in the bend section is 200-300° / min, the rotation speed of the frame (6) in the bend exit section is 300-500° / min, the feeding speed of the bend entry section is 0.8-1.2 mm / s, and the feeding speed of the bend exit section is 0.5-1.0 mm / s.
17. A border deposition processing method according to claim 15, characterized in that, When the deposition thickness is 3 mm, the rotation speed of the stirring head (7) is 100-350 rpm, the travel speed of the stirring head (7) along the straight travel section is 150-300 mm / min, the feeding speed of the straight travel section is 1.5-3.0 mm / s, the travel speed of the stirring head (7) along the bend preparation section is 100-200 mm / min, the feeding speed of the bend preparation section is 1.3-2.0 mm / s, the rotation speed of the frame (6) in the bend entry section is 200-400° / min, the rotation speed of the frame (6) in the bend exit section is 300-600° / min, the feeding speed of the bend entry section is 1.2-1.8 mm / s, and the feeding speed of the bend exit section is 0.8-1.0 mm / s.
18. A border deposition processing method according to claim 15, characterized in that, The entry and exit sections are divided by an angle ratio of 1:2; the length of the entry preparation section is 15-25mm.
19. A border deposition processing method according to any one of claims 1 to 12, characterized in that, It also includes deposition processing tooling used in conjunction with the deposition processing process; The deposition processing fixture includes two sets of positioning blocks (5) that form a double-end face clamping and positioning of the frame (6) along the direction of the inner liner plate of the vertical frame (6), and a rotating shaft (2) that drives the two sets of positioning blocks (5) to rotate synchronously at the same speed. It also includes a stirring head (7) that travels along the outer surface of the frame (6) to perform the deposition action. The rotation axis of the rotating shaft (2) is perpendicular to the inner liner plate of the frame (6), and the rotating shaft (2) is configured to drive the frame (6) to rotate when the frame (6) deposits the rounded corner section. The stirring head (7) includes at least two directions of travel. The first direction of travel of the stirring head (7) is to travel in a straight line along the straight line segment of the frame (6) and perform a deposition action on each straight line segment of the frame (6). The second direction of travel of the stirring head (7) is to travel in a combined manner along the rounded corner segment of the frame (6). The combined manner is to float and rise in the direction perpendicular to the frame (6) while traveling in a straight line in the direction parallel to the frame (6) and perform a deposition action on each rounded corner segment of the frame (6). The spacing between the stirring head (7) and the frame (6) is constant in both directions of travel.
20. A method for preparing a border, characterized in that, The border deposition process method according to any one of claims 1 to 19 further includes: The deposited sample is then subjected to heat treatment. The heat-treated sample is then machined. The machined sample is then subjected to surface finishing.
21. A terminal device, characterized in that, The terminal device includes a housing, and the frame of the housing is prepared according to the frame preparation method of claim 20.