A TGDDM epoxy resin and its synthesis method
CN121895542BActive Publication Date: 2026-07-03HAIKE GRP RES INST OF INNOVATION & TECH
Patent Information
- Application Number
- CN202610371087.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-03-25
- Publication Date
- 2026-07-03
- Estimated Expiration
- 2046-03-25
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Figure CN121895542B_ABST
Abstract
This invention discloses a TGDDM epoxy resin and its synthesis method, belonging to the field of resin synthesis technology. The technical solution includes: mixing epichlorohydrin and ethylene glycol, then adding 4,4'-diaminodiphenylmethane to conduct a ring-opening reaction to prepare an intermediate; removing unreacted epichlorohydrin from the intermediate, then adding acetone and pure water to obtain a mixed solution; adding NaOH aqueous solution dropwise to the mixed solution to conduct a ring-closure reaction; after the ring-closure reaction, removing residual epichlorohydrin and solvent to obtain a crude epoxy resin product; desalting the crude epoxy resin product, after which the hydrolyzable chlorine content of the epoxy resin is 8000-20000 ppm, and then purifying it to obtain TGDDM epoxy resin. This invention is applied to the synthesis of TGDDM epoxy resin, solving the problems of numerous by-products and low purity in TGDDM epoxy resin prepared by existing processes, and can greatly reduce the formation of by-products and improve the purity of TGDDM epoxy resin.
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Citation Information
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