Shelf motion distribution curve system and method
By dividing each segment of the standard 7-segment motion control method into two sub-segments and introducing a higher-order acceleration distribution curve, the vibration problem during acceleration and deceleration is solved, resulting in a smoother motion trajectory and higher position accuracy, thereby improving the production efficiency of semiconductor manufacturing equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- KLA CORP
- Filing Date
- 2024-10-28
- Publication Date
- 2026-04-21
AI Technical Summary
The standard 7-segment motion control method in the prior art causes vibrations during acceleration and deceleration, which leads to a decrease in the performance of the wafer processing stage and a reduction in production efficiency. Furthermore, the sharp changes in the acceleration distribution curve cause mechanical vibrations that affect the wafer processing process.
By dividing each segment into two sub-segments and introducing higher-order acceleration distribution curves, using function types such as polynomial functions, the transition of the acceleration distribution curve between each segment is made smoother, reducing mechanical vibration.
It achieves a smoother motion trajectory, reduces mechanical vibration, improves the final position accuracy and production efficiency of the wafer processing stage, and enhances motion control performance.
Smart Images

Figure CN121909774A_ABST
Abstract
Description
Technical Field
[0001] This disclosure generally relates to motion control systems for semiconductor manufacturing equipment, and more specifically, to a system and method for implementing a polygonal 7-segment motion distribution curve for a wafer handling stage. Background Technology
[0002] Precise and efficient handling of semiconductor wafers during the manufacturing process is essential for ensuring high-quality electronic devices. A key challenge for wafer handling stages and other motion control systems is reducing vibrations caused by acceleration and deceleration. These vibrations not only affect the performance of the wafer handling stage but also the overall productivity of the tooling or machine.
[0003] Conventional motion control methods rely on a standard 7-segment design, which divides the motion trajectory into up to seven segments, each constrained by maximum jerk, acceleration, and velocity. While the 7-segment approach provides a direct method for motion control, it has inherent drawbacks. A major drawback is the abrupt change in acceleration distribution curves between segments. This abrupt change introduces shocks and high-frequency components to the stage, leading to mechanical vibrations that negatively impact wafer processing. Therefore, there is a need to develop systems and methods to address these shortcomings. Summary of the Invention
[0004] According to one or more illustrative embodiments of this disclosure, a system is disclosed. In one illustrative embodiment, the system includes a controller configured to modify a motion distribution curve of a stage for a semiconductor tool. In another illustrative embodiment, the controller includes one or more processors configured to execute program instructions stored in a memory. In another illustrative embodiment, the one or more processors are configured to receive at least one target position of the stage. In another illustrative embodiment, the one or more processors are configured to generate a motion distribution curve for transitioning the stage to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary over time. In another illustrative embodiment, the one or more processors are configured to modify the one or more segments of the acceleration distribution curve by: determining the midpoint of each of the one or more segments; determining a reference line for each of the one or more segments, the reference line being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; dividing each of the one or more segments into at least a first sub-segment and a second sub-segment; defining the first sub-segment as a function such that its starting point is tangent to a first axis and its ending point is tangent to the reference line; defining the second sub-segment by rotating the first sub-segment about the midpoint by a selected rotation angle; and actuating the stage to the target position based on the generated motion distribution curve.
[0005] According to one or more illustrative embodiments of this disclosure, a semiconductor characterization system is disclosed. In one illustrative embodiment, the system includes a stage for a semiconductor tool. In another illustrative embodiment, the system includes a controller configured to modify a motion distribution curve for the stage of the semiconductor tool. In another illustrative embodiment, the controller includes one or more processors configured to execute program instructions stored in a memory. In another illustrative embodiment, the one or more processors are configured to receive at least one target position of the stage. In another illustrative embodiment, the one or more processors are configured to generate a motion distribution curve for transitioning the stage to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary over time. In another illustrative embodiment, the one or more processors are configured to modify the one or more segments of the acceleration distribution curve by: determining the midpoint of each of the one or more segments; determining a reference line for each of the one or more segments, the reference line being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; dividing each of the one or more segments into at least a first sub-segment and a second sub-segment; defining the first sub-segment as a function such that its starting point is tangent to a first axis and its ending point is tangent to the reference line; defining the second sub-segment by rotating the first sub-segment about the midpoint by a selected rotation angle; and actuating the stage to the target position based on the generated motion distribution curve.
[0006] According to one or more embodiments of this disclosure, a method for generating a motion distribution curve is disclosed. In one illustrative embodiment, the method may include (but is not limited to) at least one target position of a stage for receiving a semiconductor tool. In another illustrative embodiment, the method may include (but is not limited to) generating a motion distribution curve for transitioning the stage to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary over time. In another illustrative embodiment, the method may include (but is not limited to) modifying the one or more segments of the acceleration distribution curve via one or more processors by: determining the midpoint of each of the one or more segments; determining a reference line for each of the one or more segments, the reference line being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; dividing each of the one or more segments into at least a first sub-segment and a second sub-segment; defining the first sub-segment as a function such that its starting point is tangent to a first axis and its ending point is tangent to the reference line; defining the second sub-segment by rotating the first sub-segment about the midpoint by a selected rotation angle; and actuating the stage to at least the target position in response to the modified acceleration distribution curve.
[0007] It should be understood that the above general description and the following detailed description are for illustrative purposes only and do not necessarily limit the invention. The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and, together with the general description, serve to explain the principles of the invention. Attached Figure Description
[0008] Those skilled in the art can better understand the many advantages of this disclosure by referring to the accompanying drawings.
[0009] Figure 1A This is a conceptual diagram of a motion distribution curve system used according to one or more embodiments of the present disclosure.
[0010] Figure 1B This is a conceptual diagram of a semiconductor characterization tool 116 utilizing a motion distribution curve system according to one or more embodiments of the present disclosure.
[0011] Figure 1C This is a top view illustrating a dual overhead shelf configured for bidirectional motion control according to one or more embodiments of the present disclosure.
[0012] Figure 2 It is a comparison between an acceleration distribution curve generated by a motion distribution curve system according to one or more embodiments of the present disclosure and a standard 7-segment motion distribution curve.
[0013] Figure 3It is a comparison of a segment of an acceleration distribution curve generated by a motion distribution curve system according to one or more embodiments of the present disclosure with a segment of a standard 7-segment motion distribution curve.
[0014] Figure 4 This is a flowchart depicting a method for generating an acceleration distribution curve for a wafer handling stage according to one or more embodiments of the present disclosure.
[0015] Figure 5 This is a flowchart depicting a method for modifying one or more segments of an acceleration distribution curve generated by a semiconductor stage according to one or more embodiments of the present disclosure.
[0016] Figures 6A to 6B This describes a scan band performance metric for a motion distribution curve system that compares a standard 7-segment motion distribution curve with one or more embodiments of the present disclosure.
[0017] Figures 7A to 7B This describes the final position error measure of a motion distribution curve system that is compared with a standard 7-segment motion distribution curve according to one or more embodiments of this disclosure. Detailed Implementation
[0018] Reference will now be made in detail to the disclosed subject matter, which is illustrated in the accompanying drawings. This disclosure has been specifically shown and described with respect to certain embodiments and their specific features. The embodiments set forth herein are to be considered illustrative rather than restrictive. It will be readily apparent to those skilled in the art that various changes and modifications in form and detail may be made without departing from the spirit and scope of this disclosure.
[0019] Embodiments of this disclosure relate to systems and methods for generating smooth, multi-segment motion distribution curves for stages of semiconductor tools. The smooth, multi-segment motion distribution curve comprises one or more segments, each segment having a timing and position similar to or analogous to a standard 7-segment motion distribution curve. Compared to a standard 7-segment motion distribution curve, the motion distribution curve can be modified such that each segment is divided into two sub-segments defined by a function that helps smooth the motion distribution curve.
[0020] Referring now to Figures 1 to 7B, a system and method for generating motion distribution curves will be described in more detail according to one or more embodiments of the present disclosure.
[0021] Figure 1A This is a conceptual diagram of a motion distribution curve system 100 capable of generating motion distribution curves for a shelf 114, according to one or more embodiments of the present disclosure.
[0022] In one embodiment, the motion distribution curve system 100 includes a controller 102. For example, the controller 102 may include one or more processors 104, memory media 106 (e.g., a medium), an interface device 108, and a distribution curve generator 110. By another example, the distribution curve generator 110 may be configured to generate one or more of position distribution curves, velocity distribution curves, and / or acceleration distribution curves. In another embodiment, one or more of the processors 104, memory media 106, interface device 108, and / or distribution curve generator 110 may be electrically and / or communicatively coupled to each other to perform one or more of the functions of the motion distribution curve system 100.
[0023] In an embodiment, interface device 108 may be configured to receive user input and present output to the user in any suitable format (e.g., visual, audio, haptic, etc.). User input may include, for example, constraints (e.g., maximum acceleration, maximum speed, etc.) entered by the user and used by distribution curve generator 110 to calculate motion distribution curves.
[0024] In one embodiment, the distribution curve generator 110 may be configured to receive an indication of the desired target position of the platform 114 and calculate a motion distribution curve for transitioning the platform 114 to the target position within parameters of user-defined constraints.
[0025] In embodiments, the distribution curve generator 110 may be integrated with the controller 102. For example, the distribution curve generator 110 may be configured as a functional component of the operating system of the controller 102 and / or control software executed by one or more processors 104. By another example, the distribution curve generator 110 may be implemented as a hardware component within the controller 102, such as a circuit board or integrated circuit, that exchanges data with other functional elements of the controller 102. It should be understood that other embodiments of the distribution curve generator 110 are also covered within the scope of this disclosure. For example, the distribution curve generator 110 may be configured as a separate element from the controller 102, having the ability to exchange data with the controller 102 or other elements of the motion distribution curve system 100 via various communication methods, including but not limited to wired or wireless networking, hardwired data links, or other suitable communication methods known in the art.
[0026] One or more processors 104 of controller 102 may comprise any processor or processing element known in the art. For the purposes of this disclosure, the terms “processor” or “processing element” may be broadly defined to cover any device having one or more processing or logic elements (e.g., one or more microprocessor devices, one or more application-specific integrated circuit (ASIC) devices, one or more field-programmable gate arrays (FPGAs), or one or more digital signal processors 104 (DSPs)). In this sense, one or more processors 104 may comprise any device configured to execute algorithms and / or instructions (e.g., program instructions stored in memory 106). In embodiments, one or more processors 104 may embody a desktop computer, a mainframe computer system, a workstation, a graphics computer, a parallel processor, a networked computer, or any other computer system configured to execute a program configured to operate or in conjunction with the operation of the motion distribution curve system 100, as described throughout this disclosure. It should be noted that one or more processors 104 of controller 102 may perform any of the various process steps described throughout this disclosure.
[0027] Furthermore, different subsystems of the motion distribution curve system 100 may include processors or logic elements suitable for performing at least a portion of the steps described in this disclosure. Therefore, the above description should not be construed as limiting the embodiments of this disclosure but is merely illustrative. Additionally, the steps described throughout this disclosure may be performed by a single controller 102 or alternatively by multiple controllers 102. Furthermore, a controller 102 may comprise one or more controllers housed within a common housing or multiple housings. In this manner, any controller 102 or combination of controllers can be individually packaged as a module suitable for integration into the motion distribution curve system 100.
[0028] Memory media 106 may comprise any storage medium known in the art suitable for storing program instructions executable by one or more associated processors 104. For example, memory media 106 may comprise non-transitory memory media 106. By another example, memory media 106 may comprise (but is not limited to) read-only memory (ROM), random access memory (RAM), magnetic or optical storage devices (e.g., magnetic disks), magnetic tape, solid-state drives, and the like. It should be further noted that memory media 106 may be housed in a common controller housing with one or more processors 104. In embodiments, memory media 106 may be remotely located relative to the physical location of one or more processors 104 and controller 102. For example, one or more processors 104 of controller 102 may access remote memory 106 (e.g., a server) accessible via a network (e.g., the Internet, an intranet, and the like).
[0029] Figure 1BThis illustration shows a conceptual diagram of a semiconductor characterization tool 116 utilizing a motion distribution curve system 100 according to one or more embodiments of the present disclosure. The characterization tool 116 can be configured as any optical characterization tool known in the art, including (but not limited to) inspection tools or metrology tools.
[0030] In an embodiment, the controller 102 may be communicatively coupled to the stage 114 to adjust the position and / or orientation of the stage 114 in response to a generated motion distribution profile. For example, the stage 114 may include any number of linear and / or rotary actuators for actuating the sample 112. Examples of wafer characterization tools are described in detail in U.S. Patent Nos. 7,092,082, 6,702,302, 6,621,570, and 5,805,278, the entire contents of each of which are incorporated herein by reference.
[0031] In an embodiment, the characterization tool 116 may include an illumination source 118 configured to generate an illumination beam 119. For example, the illumination source 118 may guide the illumination beam 119 to a sample 112 placed on a stage 114 via an illumination path. The illumination path may include one or more illumination path focusing elements 122 or additional illumination path optics 120 adapted to modify and / or adjust the illumination beam 119. Furthermore, the characterization tool 116 may include an objective lens 126 for focusing or otherwise guiding the illumination beam 119 onto the sample 112.
[0032] In an embodiment, the characterization tool 116 may include a detector 128 configured to capture radiation emitted from the sample 112 through a light-collecting path. For example, the detector 128 may receive an image of the sample 112 provided by elements in the light-collecting path (e.g., objective lens 126, one or more light-collecting path focusing elements 132, or the like). The light-collecting path 130 may further include any number of light-collecting path optics 134 for guiding and / or modifying the illumination collected by the objective lens 126, including (but not limited to) one or more filters, one or more polarizers, or one or more beam stops. The detector 128 may include any type of optical detector known in the art suitable for measuring the illumination received from the sample 112.
[0033] In an embodiment, such as Figure 1CAs shown, the stage 114 may include a double overhead stage 114. For example, the double overhead stage 114 may be configured to provide bidirectional motion control for the sample 112. The double overhead stage 114 may include an X-axis overhead stage perpendicular to the Y-axis overhead positioning. It should be noted here that the motion distribution curve system 100 is not limited to a particular stage type and may include one or more adjustable stages 114, such as (but not limited to) double overhead stages, linear translation stages, rotating stages, tip / tilt stages, or the like.
[0034] In an embodiment, the double-height shelf 114 may include one or more features related to the positioning and alignment of the shelf 114. For example, X yaw This can refer to yaw or angular deviation in the X-axis (horizontal) direction. By another example, Y... yaw This can represent yaw or angular deviation in the Y-axis (vertical) direction. These measurements indicate how well the stage 114 maintains its orientation in both the X and Y directions while moving or positioning in response to a motion distribution curve received from the motion distribution curve system 100. Yaw error can cause misalignment or offset positioning of the stage 114, and it is a critical parameter to maintain in applications requiring high precision, such as the motion distribution curve system 100. As another example, X... AVG This can refer to the average positional error along the X-axis. It indicates how far the stage 114 deviates on average from its desired X-axis position. By another example, Y... AVG Similarly, the average position error in the Y-axis direction is represented. These measurements provide information about the overall accuracy of the stage 114 in achieving the target position determined by the motion distribution curves generated by the system 100 along the X and Y axes.
[0035] Figure 2 This section describes a comparison 200 between an acceleration distribution curve 202 generated by a motion distribution curve system 100 according to one or more embodiments of the present disclosure and a standard 7-segment motion distribution curve 204.
[0036] In an embodiment, the motion distribution curve system 100 may include an acceleration distribution curve 202. The acceleration distribution curve 202 may represent the acceleration domain of the motion distribution curve generated by the system 100. For example, the acceleration domain may refer to a specific stage or segment of the motion distribution curve in which acceleration is the dominant parameter. By another example, the acceleration distribution curve 202 may be defined by at least one of maximum jerk, maximum acceleration, maximum velocity, and distance traveled.
[0037] In an embodiment, the acceleration versus time graph illustrated in Figure 6 plots the acceleration of a given motion distribution curve between the starting position and the target position, as defined by system 100. As generally understood, the plotted values can be mathematically derived from at least one of the position or velocity graphs, and can also be used to derive at least one of higher-order motion trajectory graphs (e.g., sudden change, burst, or bounce).
[0038] In this embodiment, the acceleration distribution curve 202 may employ three of the seven distribution curve stages, including: constant acceleration (stage 2), constant velocity (stage 4), and constant deceleration (stage 6). This is obtained from... Figure 2 The solid line in the figure depicts the shape of the trapezoidal distribution curve. The abrupt transition between the constant acceleration / deceleration phase and the constant velocity phase results in sharp angles between one or more segments of the trapezoidal acceleration curve. Because the acceleration and deceleration phases of the trapezoidal distribution curve of the standard 7-segment motion distribution curve 204 are always constant, the acceleration curve of this distribution curve steps sharply between constant values, as illustrated by the solid line on the motion distribution curve 204. Furthermore, the abrupt change curve (representing the rate of change of acceleration / deceleration) briefly pulsates at the transition moment (not plotted) and remains zero when acceleration or deceleration remains constant.
[0039] In this embodiment, because the trapezoidal distribution curve of the standard 7-segment motion distribution curve 204 accelerates and decelerates at a constant rate without gradually transitioning to and from a constant speed phase, the trapezoidal curve distribution curve can traverse the distance between the current position and the target position relatively quickly. For example, a sudden transition between acceleration / deceleration and constant (or zero) speed can introduce undesirable mechanical turbulence into system 100. Furthermore, because deceleration does not gradually decrease as the motion system approaches the target position, but rather maintains a constant deceleration until reaching the target position before suddenly becoming zero, the trapezoidal motion distribution curve has a high probability of exceeding the target position at the end of the initial traversal, requiring the controller 102 to apply a compensating control signal to bring the load back to the target position. Therefore, in some embodiments, higher-order curve segments can be introduced into the acceleration distribution curve 202 to smooth the transition between one or more segments, which will help reduce the mechanical turbulence exhibited in system 100.
[0040] Figure 3 The following describes a comparison 300 between a segment of an acceleration distribution curve 202 generated by a motion distribution curve system 100 according to one or more embodiments of the present disclosure and a segment of a standard 7-segment motion distribution curve 204.
[0041] In an embodiment, the motion distribution curve system 100 can be configured to generate motion distribution curves to achieve a smoother acceleration distribution curve 202 by introducing higher-order segments (e.g., sudden changes, bursts, and bounces), while retaining the standard 7-segment timing and position. For example, one or more processors 104 of the controller 102 can be configured to divide each segment of the acceleration distribution curve 202 into at least two sub-segments, such as... Figure 3 As shown in the diagram, the division into one or more segments and the introduction of higher-order segments ensure a slower change at the end of each segment, resulting in a smoother overall trajectory.
[0042] In an embodiment, such as Figure 3 As shown, the segment "OC" can represent one or more segments of the acceleration distribution curve 202. For example, segment OC can include a midpoint "M" equidistant from the two endpoints of segment OC. By another example, one or more sub-segments can be divided from one or more segments OC into at least a first sub-segment "OM" and a second sub-segment "MC", where each sub-segment is a smooth transition curve. Furthermore, the reference line "AB" can be configured to bisect OC at point M and have a slope greater than that of segment OC of the standard 7-segment motion distribution curve.
[0043] In an embodiment, the first sub-segment of curve OM can be defined by a function such that the starting point of the sub-segment is tangent to the X-axis and the ending point of the first sub-segment is tangent to the reference line AB. Furthermore, the second sub-segment can be defined by rotating the first sub-segment about point M (e.g., by 180 degrees).
[0044] It should be noted in this paper that the smooth transition curve OM can be mathematically described by one or more functions of various types. For example, Figures 2 to 3 Describe the curve OM using the following polynomial function:
[0045]
[0046] It satisfies the following boundary conditions:
[0047]
[0048] Where λ is the slope ratio between the reference line AB and the segment OC.
[0049] It should be noted that the selected polynomial function is not restrictive and multiple function types can be used to achieve the desired smoothness, such as (but not limited to) sigmoid functions, tangent bibliometric functions, or sine functions.
[0050] In this embodiment, the acceleration distribution curve 202 of system 100 may share one or more parameters with a standard 7-segment motion distribution curve. For example, the acceleration distribution curve 202 may share the same start and end points for each segment of the acceleration distribution curve 202. By another example, both the motion distribution curve system 100 and the standard 7-segment motion distribution curve can maintain the same constant velocity at the same displacement, which is critical for wafer scanning processes. By yet another example, the compatibility of the motion distribution curve system 100 allows it to be immediately adopted in existing products without requiring any software upgrades.
[0051] Figure 4 This is a flowchart illustrating the steps performed in a method 400 for generating a motion distribution curve for a semiconductor stage 114 according to one or more embodiments of the present disclosure. The applicant emphasizes that the embodiments and implementation techniques previously described herein in the context of the motion distribution curve system 100 should be interpreted as extending to method 400. However, it should be further noted that method 400 is not limited to the architecture of the motion distribution curve system 100.
[0052] In one embodiment, method 400 includes step 402 of receiving at least one target position of the stage 114 of the semiconductor tool 116. For example, the target position may represent the final position that the stage 114 is expected to reach after completing its motion. As another example, a set of motion constraints may be defined, including (but not limited to) limitations on speed, acceleration, deceleration, and abrupt changes. The constraints may also include a definition of sample time for the controller 102 of the control system 100. As another example, user interface device 108 may be configured to receive input specifying a target position or at least one of at least one of the defined constraints.
[0053] In an embodiment, the motion trajectory of the motion distribution curve system 100 can be divided into multiple segments. For example, at least one of the position, velocity, and / or acceleration of the motion distribution curve generated by the system 100 can vary during each segment.
[0054] In one embodiment, method 400 includes a step 404 of generating a motion distribution curve for transitioning the platform 114 to at least a target position, the motion distribution curve including an acceleration distribution curve 202 that varies over time. For example, the distribution curve generator 110 may calculate this acceleration distribution curve that varies over time for one or more segments of the motion distribution curve.
[0055] In one embodiment, method 400 includes step 406 instructing the stage 114 to transition from its current position to a new position in response to a generated motion distribution curve. For example, the motion distribution curve system 100 may be designed to control the movement of the stage 114 to follow a defined trajectory while adhering to constraints imposed by at least one of abrupt changes, acceleration, and speed limits. By another example, the controller 102 may transmit one or more control signals to the motor driver of the stage 114. In this regard, the motor driver may actuate the stage 114 based on the motion distribution curve generated by the controller 102.
[0056] Figure 5 This is a flowchart illustrating the steps performed in a method for modifying one or more segments of an acceleration distribution curve 202 generated by a semiconductor stage 114 according to one or more embodiments of the present disclosure. The applicant emphasizes that the embodiments and implementation techniques previously described herein in the context of the motion distribution curve system 100 should be interpreted as extending to method 500. However, it should be further noted that method 500 is not limited to the architecture of the motion distribution curve system 100.
[0057] In an embodiment, method 500 includes step 502 of determining the midpoint of one or more segments of the acceleration distribution curve 202. For example, one or more processors 104 may be configured to calculate the midpoint of a segment by dividing the duration of the corresponding segment in half.
[0058] In an embodiment, method 500 includes step 504 of determining a reference line for each of one or more segments, the reference line having a slope greater than that of the corresponding segment. For example, one or more processors 104 may be configured to determine the reference line by calculating the acceleration change at the midpoint of the corresponding segment of the acceleration distribution curve 202.
[0059] In an embodiment, method 500 includes step 506 of dividing each of one or more segments into at least a first sub-segment and a second sub-segment. For example, one or more processors 104 may be configured to define the start and end points of the first sub-segment and the second sub-segment within corresponding segments of the acceleration distribution curve 202.
[0060] In an embodiment, method 500 includes step 508 of defining a first sub-segment as a function such that the starting point of the first sub-segment is tangent to a first axis and the ending point is tangent to a reference line. For example, multiple function types can be used to achieve the desired smoothness, such as (but not limited to) polynomial functions, sigmoid functions, tangent bibliometric functions, or sine functions.
[0061] In one embodiment, method 500 includes step 510 of defining a second sub-segment by rotating a first sub-segment about a selected rotation angle around the midpoint of the segment. For example, one or more processors 104 may be configured to rotate the first sub-segment of the acceleration distribution curve 202 about 180 degrees around the midpoint.
[0062] In one embodiment, method 500 includes step 512 of actuating the stage 114 to at least a target position. For example, controller 102 may enable the generated motion distribution curve to communicate with a motor driver (which controls the motor driving the stage 114).
[0063] Figures 6A to 6B This describes a performance metric of a motion distribution curve system 100, which is compared to a standard 7-segment motion distribution curve according to one or more embodiments of the present disclosure.
[0064] It should be noted in this document that the motion distribution curve system 100 of this disclosure exhibits significant advantages over the conventional standard 7-segment motion distribution curve, particularly in achieving smoother transitions between each segment. This smooth transition not only enhances motion control performance but also has a positive impact on the final positional accuracy of the stage 114 of the semiconductor tool 116.
[0065] To illustrate the benefits of the motion distribution curve system 100, Figures 6A to 6B The figure shows a comparison of the scan band performance between a standard 7-segment motion distribution curve and a motion distribution curve system 100 measured at different scan band speeds. The figure depicts two sets of error bars: brown bars represent the average error, while blue bars represent the inter-peak error. The results clearly demonstrate the motion distribution curve system 100's performance during the scan band at X and X... yaw and Y yaw It shows an improvement over the standard 7-segment method in terms of positional error.
[0066] Specifically, the motion distribution curve system 100 is displayed on X yaw Significant enhancement on the axis, and X yaw The error is reduced by approximately 50% compared to the standard 7-segment method. This reduction in error demonstrates the ability of the motion distribution curve system 100 to minimize the impact of motion-induced coupling on other motion axes, thereby improving accuracy and stability during motion.
[0067] Figures 7A to 7BThis section describes a comparison of the final position error between a motion distribution curve system 100 according to one or more embodiments of the present disclosure and a standard 7-segment motion distribution curve. In the embodiments, the standard 7-segment motion distribution curve exhibits a wide distribution of final position errors ranging from 0 nm to 0.8 nm. In contrast, the motion distribution curve system 100 achieves a significantly lower final position error, with most errors confined to the range of 0 nm to 0.4 nm and most data points below 0.1 nm.
[0068] These results indicate that the smoother motion trajectory and reduced vibration of the motion distribution curve system 100 result in a more precise and accurate final position of the moving object. The narrower distribution of the final position error further demonstrates the reliability and consistency of the motion distribution curve system 100, making it ideal for high-precision applications where position accuracy is critical.
[0069] Overall, compared to the standard 7-segment method, the motion distribution curve system 100 exhibits superior performance, with smoother transitions between segments, reduced motion-induced coupling effects, and improved final position accuracy. These advantages make the motion distribution curve system 100 a valuable and innovative motion control technology with the potential to revolutionize semiconductor manufacturing processes and other precision motion applications.
[0070] The objects described herein sometimes refer to different components contained within or connected to other components. It should be understood that such depicted architectures are merely illustrative, and in fact, many other architectures can be implemented to achieve the same functionality. Conceptually, any arrangement of components used to achieve the same functionality is effectively “associated” to achieve the desired functionality. Therefore, any two components combined herein to achieve a particular functionality can be considered “associated” with each other to achieve the desired functionality, regardless of the architecture or intermediate components. Similarly, any two such associated components can be considered “connected” or “coupled” with each other to achieve the desired functionality, and any two components that can be suchly associated can also be considered “coupleable” to each other to achieve the desired functionality. Specific examples of coupleability include (but are not limited to) physically interactive and / or physically interactive components and / or wirelessly interactive and / or logically interactive components.
[0071] As used throughout this disclosure, the term "sample" generally refers to a substrate (e.g., a wafer or the like) formed of a semiconductor or non-semiconductor material. For example, semiconductor or non-semiconductor materials may include (but are not limited to): single-crystal silicon, gallium arsenide, and indium phosphide.
[0072] It is believed that this disclosure and its many accompanying advantages will be understood from the foregoing description, and it will be appreciated that various changes can be made in the form, construction, and arrangement of the components without departing from the subject matter of the disclosure or sacrificing all its material advantages. The forms described are for illustrative purposes only, and the appended claims are intended to cover and encompass such changes. Furthermore, it should be understood that the invention is defined by the appended claims.
Claims
1. A system comprising: A controller configured to modify the motion distribution curve of a stage for a semiconductor tool, the controller including one or more processors configured to execute program instructions stored in a memory, wherein the program instructions are configured to cause the one or more processors to: Receive at least one target position of the shelf; Generate a motion distribution curve for transitioning the platform to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary with time. The one or more processors are further configured to modify the one or more segments of the acceleration distribution curve by: Determine the midpoint of each of the one or more segments of the acceleration distribution curve; Determine a reference line for each of the one or more segments, the reference lines being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; Each of the one or more segments is divided into at least one first sub-segment and one second sub-segment; Define the first sub-segment as a function such that the starting point is tangent to the first axis and the ending point is tangent to the reference line; The second sub-segment is defined by rotating the first sub-segment around the midpoint by a selected rotation angle; and The platform is actuated to at least the target position in response to the generated motion distribution curve.
2. The system of claim 1, wherein the one or more processors are further configured to generate the motion distribution curves that vary according to at least one defined constraint, wherein the at least one defined constraint includes at least one of sample time, velocity limit, acceleration limit, abrupt change limit, or deceleration limit.
3. The system of claim 2, wherein the controller includes an interface means configured to receive an input specifying the at least one defined constraint.
4. The system of claim 1, wherein each sub-segment of the acceleration distribution curve comprises a smooth acceleration curve.
5. The system according to claim 1, wherein the first sub-segment and the second sub-segment use half of the abrupt change time and half of the maximum acceleration value as corresponding one or more segments.
6. The system of claim 1, wherein the second sub-segment is defined by rotating the first sub-segment 180 degrees around the midpoint.
7. The system of claim 1, wherein one or more higher-order segments are introduced into the acceleration distribution curve, the one or more higher-order segments comprising at least one of abrupt change, burst, or bounce.
8. A semiconductor characterization system, comprising: A shelf for semiconductor tools; A controller configured to modify the motion distribution curve of the stage of the semiconductor tool, the controller including one or more processors configured to execute program instructions stored in a memory, wherein the program instructions are configured to cause the one or more processors to: Receive at least one target position of the shelf; Generate a motion distribution curve for transitioning the platform to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary with time. The one or more processors are further configured to modify the one or more segments of the acceleration distribution curve by: Determine the midpoint of each of the one or more segments of the acceleration distribution curve; Determine a reference line for each of the one or more segments, the reference lines being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; Each of the one or more segments is divided into at least one first sub-segment and one second sub-segment; Define the first sub-segment as a function such that the starting point is tangent to the first axis and the ending point is tangent to the reference line; The second sub-segment is defined by rotating the first sub-segment around the midpoint by a selected rotation angle; and The platform is actuated to at least the target position in response to the generated motion distribution curve.
9. The system of claim 8, wherein the one or more processors are further configured to generate the motion distribution curves that vary according to at least one defined constraint, wherein the at least one defined constraint includes at least one of sample time, velocity limit, acceleration limit, abrupt change limit, or deceleration limit.
10. The system of claim 9, wherein the controller includes an interface means configured to receive an input specifying the at least one defined constraint.
11. The system of claim 8, wherein each sub-segment of the acceleration distribution curve comprises a smooth acceleration curve.
12. The system of claim 8, wherein the first sub-segment and the second sub-segment use half of the abrupt change time and half of the maximum acceleration value as corresponding one or more segments.
13. The system of claim 8, wherein the second sub-segment is defined by rotating the first sub-segment 180 degrees around the midpoint.
14. The system of claim 8, wherein one or more higher-order segments are introduced into the acceleration distribution curve, the one or more higher-order segments comprising at least one of abrupt change, burst, or bounce.
15. A method for generating a motion distribution curve, comprising: At least one target location of the stage for receiving semiconductor tools; A motion distribution curve is generated to transition the platform to the target position, wherein the motion distribution curve includes an acceleration distribution curve having one or more segments that vary with time. The acceleration distribution curve is modified via one or more processors in the following ways: Determine the midpoint of each of the one or more segments of the acceleration distribution curve; Determine a reference line for each of the one or more segments, the reference lines being configured to bisect the corresponding segment and having a slope greater than that of the corresponding segment; Each of the one or more segments is divided into at least one first sub-segment and one second sub-segment; Define the first sub-segment as a function such that the starting point is tangent to the first axis and the ending point is tangent to the reference line; The second sub-segment is defined by rotating the first sub-segment around the midpoint by a selected rotation angle; and The platform is actuated to at least the target position in response to the generated motion distribution curve.
16. The method of claim 15, wherein generating the motion distribution curve comprises generating the motion distribution curve that varies according to at least one defined constraint, wherein the at least one defined constraint comprises at least one of sample time, velocity limit, acceleration limit, abrupt change limit, or deceleration limit.
17. The method of claim 16, wherein generating the motion distribution curve that varies according to at least one defined constraint comprises receiving input specifying the at least one defined constraint via an interface device.
18. The method of claim 15, wherein the one or more segments of modifying the acceleration distribution curve include defining a smooth acceleration curve for at least one of the first sub-segment and the second sub-segment.
19. The method of claim 15, wherein defining the second sub-segment comprises rotating the first sub-segment about the midpoint by 180 degrees.
20. The method of claim 15, further comprising introducing one or more higher-order segments into the acceleration distribution curve, said one or more higher-order segments comprising at least one of abrupt change, burst, or bounce.
Citation Information
Patent Citations
Particle detection method and apparatus
US5805278A
Method and apparatus for inspecting a patterned semiconductor wafer
US6621570B1
Edge handling wafer chuck
US6702302B2
Method and apparatus for inspecting a semiconductor wafer
US7092082B1