Patterned solar cells, laminated solar cell assemblies, and photovoltaic systems

By employing a top electrode layer with a composite structure of a transparent conductive oxide layer and a metal layer in perovskite solar cells, the performance degradation problem caused by halide ion migration was solved, achieving long-term stability and cost reduction of the cells.

CN121968867BActive Publication Date: 2026-07-21KUNSHAN GCL OPTOELECTRONIC MATERIAL CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
KUNSHAN GCL OPTOELECTRONIC MATERIAL CO LTD
Filing Date
2026-03-27
Publication Date
2026-07-21

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Abstract

The application discloses a kind of patterned solar cell, laminated solar cell module and photovoltaic system.Patterned solar cell includes: photoelectric conversion structure layer, along first direction layer is arranged on the bottom electrode layer;Top electrode layer, along first direction layer is arranged on the photoelectric conversion structure layer, the top electrode layer includes transparent conductive oxide layer and multiple metal layers, multiple metal layers are spaced apart in the interior of the transparent conductive oxide layer along second direction, multiple metal layers have multiple sub-patterns, multiple sub-patterns jigsaw form at least one overall pattern, wherein, the first direction and the second direction are arranged crossly.The application is patterned in multiple metal layers in top electrode layer, so that multiple metal layers have multiple sub-patterns, multiple sub-patterns jigsaw form at least one overall pattern on the module, improve the appearance performance presented by perovskite solar cell, and can be customized to set appearance pattern.
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Description

Technical Field

[0001] This invention specifically relates to a patterned solar cell, a tandem solar cell module, and a photovoltaic system, belonging to the field of photovoltaic product technology. Background Technology

[0002] Over the past decade, with the deepening research on perovskite solar cells from all sectors of society, their efficiency has rapidly increased from 3.8% to 26.7%, surpassing other types of thin-film solar cells and injecting a strong boost into the industrialization process of this type of cell. Although the efficiency of perovskite cells has been greatly improved, the long-term stability of perovskite cells remains a major challenge for their industrialization.

[0003] In perovskite solar cells with metal electrode structures, halide ions migrate and react with the metal electrodes after prolonged operation, causing performance degradation. Although semi-transparent perovskite solar cells use transparent conductive oxide films instead of metal layers as electrodes to prevent halide ion reaction, these films have higher resistivity than metal layers. To achieve sheet resistance comparable to metal layers, these films need to be deposited thicker, significantly increasing the cost of this electrode layer and adding to the difficulty of pattern etching in large-area applications. Summary of the Invention

[0004] The main objective of this invention is to provide a patterned solar cell, a tandem solar cell module, and a photovoltaic system, thereby overcoming the shortcomings of the prior art.

[0005] To achieve the aforementioned objectives, the technical solution adopted by this invention includes: This invention provides a patterned solar cell, comprising: Bottom electrode layer; A photoelectric conversion structure layer is stacked on the bottom electrode layer along a first direction; A top electrode layer is stacked on the photoelectric conversion structure layer along a first direction, and the top electrode layer includes: Transparent conductive oxide layer; and Multiple metal layers are spaced apart within the transparent conductive oxide layer along a second direction. The multiple metal layers have multiple sub-patterns, and the multiple sub-patterns are pieced together to form at least one overall pattern, wherein the first direction and the second direction are intersected.

[0006] Furthermore, the transparent conductive oxide layer includes a first transparent conductive oxide layer and a second transparent conductive oxide layer stacked along the first direction, and a plurality of the metal layers are disposed between the first transparent conductive oxide layer and the second transparent conductive oxide layer.

[0007] In a more specific embodiment, the patterned solar cell further includes: a plurality of third grooves, each of the third grooves being located between two adjacent metal layers, the third grooves penetrating the top electrode layer, the bottom electrode layer, the photoelectric conversion structure layer, and the top electrode layer forming a plurality of sub-cells arranged along the second direction by means of the plurality of third grooves, each sub-cell including one or more metal layers.

[0008] In a more specific embodiment, the patterned solar cell further includes: Multiple first grooves are spaced apart along the second direction, and the first grooves penetrate the bottom electrode layer; and Multiple second grooves are spaced apart along the second direction, and the second grooves penetrate the photoelectric conversion structure layer; The first groove and the second groove are disposed in the region between two adjacent metal layers along the second direction. A first groove, a second groove, and a third groove distributed between two adjacent metal layers form a groove group. The bottom electrode layer, the photoelectric conversion structure layer, and the top electrode layer form a plurality of sub-cells arranged along the second direction by means of the plurality of groove groups.

[0009] Furthermore, the transparent conductive oxide layer included in the top electrode layer of each sub-cell has a first portion and a second portion, the first portion being distributed around the second portion, the metal layer being distributed inside the second portion, and the third groove being adjacent to the first portion.

[0010] Furthermore, the top electrode layer of each sub-cell contains a transparent conductive oxide layer with a width of Wy and a length of Ly, and the second portion has a width of Wx and a length of Lx, where Wx = (1 / 3~2 / 3) Wy and Lx = (1 / 3~2 / 3) Ly, and the width is the dimension along the second direction.

[0011] Furthermore, the sub-battery includes a battery functional segment and a non-battery functional segment arranged sequentially along the second direction, with the first groove, the second groove, and the third groove disposed in the non-battery functional segment.

[0012] Furthermore, the width of the battery functional segment is Wp, the width of the non-battery functional segment is Wd, the width of the sub-battery is Wp+Wd, and Wx < Wp < Wy < (Wp+Wd).

[0013] Furthermore, a first filling structure is provided in the first groove, and the first filling structure is electrically connected to the bottom electrode layer and the photoelectric conversion structure layer respectively. A second filling structure is provided in the second groove, and the second filling structure is electrically connected to the bottom electrode layer and the top electrode layer respectively. Two adjacent sub-cells are connected in series via the first filling structure and the second filling structure.

[0014] Furthermore, the thickness of the first transparent conductive oxide layer is 50nm~100nm, the thickness of the second transparent conductive oxide layer is 30nm~100nm, and the thickness of the metal layer is 10nm~100nm.

[0015] Furthermore, the materials of the first transparent conductive oxide layer and the second transparent conductive oxide layer include indium tin oxide, fluorine tin oxide, or tungsten indium oxide, and the materials of the metal layer include at least one of gold, silver, and copper, but are not limited thereto.

[0016] Furthermore, a portion of the puzzle pieces from multiple sub-patterns form a first pattern, and another portion forms a second pattern. The first pattern and the second pattern are each independent overall patterns, or the first pattern and the second pattern are combined to form the overall pattern.

[0017] Furthermore, the sub-pattern includes at least one of text, letters, numbers, geometric shapes, and real-world image graphics, but is not limited to these.

[0018] Furthermore, the physical image graphics include natural physical image graphics and man-made object image graphics, etc.

[0019] Furthermore, the patterned solar cell also includes an encapsulation structure disposed on the top electrode layer along the first direction.

[0020] Furthermore, the encapsulation structure includes a first encapsulation layer and a second encapsulation layer, wherein the first encapsulation layer is stacked on the top electrode layer along the first direction, and the second encapsulation layer is stacked on the first encapsulation layer along the first direction.

[0021] Furthermore, the material of the first encapsulation layer includes, but is not limited to, at least one of EVA (ethylene-vinyl acetate copolymer), POE (polyolefin elastomer), and PVB (polyvinyl butyral).

[0022] Furthermore, the thickness of the first encapsulation layer is 500μm~1000μm.

[0023] Furthermore, the material of the second encapsulation layer includes, but is not limited to, at least one of glass, PTFE (polytetrafluoroethylene), and ETFE (ethylene-tetrafluoroethylene copolymer).

[0024] A second aspect of the present invention provides a stacked solar cell module comprising at least two cells stacked sequentially, wherein at least one of the cells is a patterned solar cell.

[0025] A third aspect of the present invention provides a photovoltaic system comprising: the patterned solar cell, or the tandem solar cell module.

[0026] Compared with the prior art, the advantages of the present invention include: The present invention provides a patterned perovskite solar cell, which patterns multiple metal layers in the top electrode layer so that the multiple metal layers have multiple sub-patterns. The multiple sub-patterns are pieced together on the component to form at least one overall pattern, which improves the appearance performance of the perovskite solar cell and allows for customized appearance patterns.

[0027] The present invention provides a patterned perovskite solar cell, which uses a composite structure layer formed by wrapping a metal layer in a transparent conductive oxide layer as the top electrode layer. The transparent conductive oxide layer completely wraps the metal layer in the middle, eliminating the possibility of migrating halide ions reacting with the top electrode layer. At the same time, the metal layer being wrapped in the transparent conductive oxide layer also eliminates the possibility of the metal layer being oxidized by contact with the outside air.

[0028] The present invention provides a patterned perovskite solar cell, which uses a composite structure layer formed by wrapping a metal layer in a transparent conductive oxide layer as the top electrode layer. Under the same sheet resistance, its thickness is significantly lower than that of the top electrode layer formed by only transparent conductive oxide. This not only reduces the film thickness and manufacturing cost, but also reduces the difficulty of processing the internal series structure and realizing the patterning process. Attached Figure Description

[0029] Figure 1 This is a schematic diagram of a conventional perovskite solar cell. Figure 2 This is a schematic diagram of a conventional perovskite solar cell with multiple functional layers; Figure 3 This is a schematic diagram of the main structure of a large-area patterned perovskite solar cell at the component level, provided in a typical embodiment of the present invention. Figure 4 This is a schematic diagram of a patterned perovskite solar cell provided in a typical embodiment of the present invention; Figure 5 This is a schematic diagram of another patterned perovskite solar cell with multiple functional layers provided in a typical embodiment of the present invention; Figure 6 This is a schematic diagram of the longitudinal cross-sectional structure of the top electrode layer in a typical embodiment of the present invention; Figure 7 This is a top view of the stack of metal layer and transparent conductive oxide layer in the top electrode layer in a typical embodiment of the present invention; Figure 8 This is a partial structural diagram of a mask plate and a sub-battery used in a typical embodiment of the present invention. Figure 9 This is a schematic diagram of the longitudinal cross-sectional structure of the first type of large-area patterned perovskite solar cell at the component level provided in a typical embodiment of the present invention. Figure 10 This is a top view of the first type of large-area patterned perovskite solar cell at the component level after multiple metal layers are formed on the surface of the first transparent conductive oxide layer in a typical embodiment of the present invention. Figure 11 This is a top view of the mask used in a typical embodiment of the present invention for fabricating a large-area patterned perovskite solar cell at the component level. Figure 12 This is a schematic diagram of the longitudinal cross-sectional structure of the second type of large-area patterned perovskite solar cell at the component level provided in a typical embodiment of the present invention. Figure 13 This is a top view of a second type of large-area patterned perovskite solar cell at the component level after multiple metal layers are formed on the surface of the first transparent conductive oxide layer, in a typical embodiment of the present invention. Figure 14 This is a schematic diagram of the longitudinal cross-sectional structure of the third type of large-area patterned perovskite solar cell at the component level provided in a typical embodiment of the present invention. Figure 15 This is a top view of a third type of large-area patterned perovskite solar cell at the component level after multiple metal layers are formed on the surface of the first transparent conductive oxide layer, in a typical embodiment of the present invention. Figure 16 This is a schematic diagram of the longitudinal cross-sectional structure of the fourth type of large-area patterned perovskite solar cell at the component level provided in a typical embodiment of the present invention. Figure 17 This is a top view of a fourth type of large-area patterned perovskite solar cell at the component level after multiple metal layers are formed on the surface of the first transparent conductive oxide layer, in a typical embodiment of the present invention. Figure 18This is a schematic diagram of the overall appearance of a large-area patterned perovskite solar cell at the component level, provided in a typical embodiment of the present invention. Detailed Implementation

[0030] In view of the shortcomings of the prior art, the inventors of this invention, through long-term research and extensive practice, have proposed the technical solution of this invention. The following will further explain and illustrate the technical solution, its implementation process, and its principles in conjunction with the accompanying drawings and specific embodiments.

[0031] As a typical type of solar cell, perovskite solar cells are used as an example to illustrate their specific structure and effects.

[0032] Example 1 Please see Figure 3 , Figure 4 and Figure 5 , Figure 3 In the diagram, AA represents the width direction of the perovskite solar cell, and BB represents the length direction. This embodiment provides a module-level large-area patterned perovskite solar cell, comprising a bottom electrode layer (also referred to as the bottom electrode, hereinafter the same) 11, a photoelectric conversion structure layer 100, and a top electrode layer (also referred to as the top electrode, hereinafter the same) 50 stacked sequentially along a first direction. The top electrode 50 includes a transparent conductive oxide layer and multiple metal layers 52. The transparent conductive oxide layer is stacked on the photoelectric conversion structure layer 100 along the first direction, and the multiple metal layers 52 are spaced apart inside the transparent conductive oxide layer along a second direction. The multiple metal layers 52 have multiple sub-patterns, and the multiple sub-patterns are pieced together to form at least one overall pattern. Based on the following design, the multiple sub-patterns are pieced together on the module (i.e., the perovskite solar cell) to form at least one overall pattern, which improves the appearance performance of the solar cell. Furthermore, by adjusting the sub-pattern of each metal layer 52, the overall pattern can be changed, thereby achieving a customized overall pattern for the appearance.

[0033] Wherein, the first direction and the second direction are intersecting. For example, the first direction can be understood as the longitudinal direction, stacking direction or thickness direction of the perovskite solar cell, and the second direction can be the width direction of the perovskite solar cell. It can be understood that the first direction and the second direction can intersect perpendicularly.

[0034] Research has revealed that conventional perovskite solar cells typically use a metal layer or a transparent conductive oxide film as the top electrode layer. However, when only a metal layer is used as the top electrode layer, its thickness is generally 50 nm to 150 nm. Halogen ions from the perovskite active absorber layer migrate to the metal layer and react with it, causing performance degradation in the perovskite solar cell. When only a transparent conductive oxide film is used as the top electrode layer, its thickness is 300 nm to 2000 nm. In the long run, the transparent conductive oxide layer can avoid reaction with the migrating halide ions. However, due to the higher resistivity of the transparent conductive oxide film, a greater thickness is required compared to the metal layer to achieve a sheet resistance comparable to the metal layer. This significantly increases the cost of the top electrode layer and also increases the difficulty of pattern etching in large-area cell applications.

[0035] Unlike existing conventional structures, this invention uses a composite structure layer formed by a transparent conductive oxide layer and a metal layer as the top electrode layer. The metal layer is disposed inside the transparent conductive oxide layer. Based on this design, compared to using a transparent conductive oxide layer as the top electrode layer alone, the thickness of the transparent conductive oxide layer can be thinner with the presence of the metal layer. That is, the thickness of the top electrode layer in this invention is smaller. Furthermore, the resistivity of the top electrode layer formed by the composite structure layer of the transparent conductive oxide layer and the metal layer can also be reduced, resulting in better conductivity. This improves the long-term stability of the battery while reducing the manufacturing cost of the top electrode layer.

[0036] Specifically, the transparent conductive oxide layer includes a first transparent conductive oxide layer 51 and a second transparent conductive oxide layer 53 stacked along a first direction. One of the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 is stacked on the photoelectric conversion structure layer along the first direction, and a plurality of metal layers 52 are spaced apart between the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 along a second direction.

[0037] Specifically, the orthographic projections of the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 along the first direction have the same outline shape and area as the orthographic projection of the entire transparent conductive oxide layer along the first direction. The first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 are in direct contact and fixedly bonded to the outer periphery of the metal layer 52, thereby achieving complete encapsulation / encapsulation of the metal layer 52. More specifically, one or both of the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 may also be provided with multiple groove-shaped structures, and multiple metal layers 52 are respectively disposed within multiple groove-shaped structures. As a preferred embodiment, the shape and volume of the metal layer 52 are the same as the shape and volume of the groove-shaped structure, so that the metal layer 52 can be tightly attached to the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53.

[0038] Specifically, the second transparent conductive oxide layer 53 may be made of the same or different material as the first transparent conductive oxide layer 51. The second transparent conductive oxide layer 53 includes conventional indium tin oxide (FTO), fluorine tin oxide (ITO), or indium tungsten oxide (IWO) transparent oxide film layers, as well as other oxide film layers that may potentially serve as conductive electrode layers. The thickness of the second transparent conductive oxide layer 53 is 30nm to 100nm.

[0039] Specifically, the thickness of the top electrode layer 50 in this invention is 90nm~100nm, which is significantly lower than that of a pure transparent conductive oxide film. Tests show that the resistivity of a pure metal layer is 1.0E-6Ω·cm~6.0E-6Ω·cm, the resistivity of a pure transparent conductive oxide film is 2.0E-4Ω·cm~8.0E-4Ω·cm, while the resistivity of the top electrode layer 50 in this invention is 2.0E-5Ω·cm~7.0E-5Ω·cm. Compared to a pure transparent conductive oxide, the top electrode layer 50 with the same sheet resistance can significantly reduce the film thickness, thereby lowering the cost.

[0040] Please refer again to a more typical implementation plan. Figure 3 The large-area patterned perovskite solar cell at the component level also includes multiple third grooves P3, each of which is located between two adjacent metal layers 52. The third grooves P3 penetrate the top electrode layer 50 and cut off the top electrode layer 50 in the second direction. The bottom electrode layer 11, the photoelectric conversion structure layer and the top electrode layer 50 form multiple (segment) sub-cells arranged along the second direction by means of the multiple third grooves P3. Each sub-cell includes one or more metal layers 52.

[0041] Specifically, the third groove P3 is formed by etching the top electrode layer 50. By placing the third groove P3 between two adjacent metal layers 52, the problem of metal material from the metal layer 52 falling into the third groove P3 and causing a short circuit during the etching process is prevented. At the same time, the problem of metal diffusion and migration damaging the battery functional layer or being oxidized by contact with external moisture / air due to exposure of the metal layer 52 during the formation of the third groove P3 is avoided.

[0042] For a more typical implementation plan, please refer to the following: Figure 3 and Figure 9 The patterned perovskite solar cell further includes a plurality of first grooves P1 and a plurality of second grooves P2. The plurality of first grooves P1 are spaced apart along the second direction. The first grooves P1 penetrate the bottom electrode layer 11 and cut off the bottom electrode layer 11 in the second direction. The plurality of second grooves P2 are spaced apart along the second direction. The second grooves P2 penetrate the photoelectric conversion structure layer and cut off the photoelectric conversion structure layer in the second direction. The first groove P1 and the second groove P2 are disposed in the region between two adjacent metal layers 52 along the second direction. The first groove P1, the second groove P2 and the third groove P3 distributed between two adjacent metal layers 52 form a groove group. That is, the groove group is disposed in the region between two adjacent metal layers 52 along the second direction. The bottom electrode layer 11, the photoelectric conversion structure layer and the top electrode layer 50 form the multiple (segment) cells arranged along the second direction by the multiple groove groups.

[0043] Specifically, the first groove P1 can be formed by etching the bottom electrode layer 11, and the second groove P2 can be formed by etching the photoelectric conversion structure layer.

[0044] In a more typical embodiment, a conductive first filling structure is further provided in the first groove P1, which is electrically connected to the bottom electrode layer 11 and the photoelectric conversion structure layer 100. A conductive second filling structure is further provided in the second groove P2, which is electrically connected to the bottom electrode layer 11 and the top electrode layer 50. Two adjacent sub-cells are connected in series via the electrical connection structure formed by the first filling structure and the second filling structure. That is, the groove group located between two adjacent metal layers 52, the first filling structure in the first groove P1, and the second filling structure in the second groove P2 form an internal series structure. As a preferred embodiment, the second filling structure is integral with the transparent conductive oxide layer portion of the top electrode layer 50.

[0045] When only a metal layer is used as the top electrode layer, for the inner series structure of a large-area battery, the top electrode layer 50 is filled into the second groove P2 and connected to the bottom electrode layer 11. In the second groove P2, the metal of the top electrode layer will directly contact the perovskite active absorption layer in the photoelectric conversion structure layer. Halogen ions in the perovskite composition are more likely to migrate and diffuse into the top electrode layer 50 and react with it, causing the performance of the perovskite solar cell to degrade and seriously affecting the long-term stability. However, the design of this invention eliminates the problem of the migrating halogen ions reacting with the metal layer 52 in the top electrode layer 50.

[0046] In a typical implementation, taking a single (cell) battery as an example, the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 each have a first portion 501 and a second portion 502, with the second portion 502 surrounded by the first portion 501. A metal layer 52 is disposed between the second portions 502 of the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53. The first portions 501 of the first transparent conductive oxide layer 51 and the second transparent conductive oxide layer 53 are sealed together. It can be understood that the area of ​​the orthogonal projection of the metal layer 52 onto the first transparent conductive oxide layer 51 or the second transparent conductive oxide layer 53 does not exceed the area of ​​the orthogonal projection of the second portion 502 onto the first transparent conductive oxide layer 51 or the second transparent conductive oxide layer 53.

[0047] For details, please refer to Figure 6 and Figure 7 In each individual (cell) battery, the width of the first transparent conductive oxide layer 51 and the length of the second transparent conductive oxide layer 53 are Wy and Ly, respectively, and the width of the second portion 502 is Wx and the length is Lx, where Wx = (1 / 3 to 2 / 3) Wy and Lx = (1 / 3 to 2 / 3) Ly. As a preferred embodiment, in the width direction, the width of the first portion 501 located on both sides of the second portion 502 is equal, and in the length direction, the length of the first portion 501 located on both sides of the second portion is equal.

[0048] For details, please refer to Figure 3 , Figures 6-7 Each sub-battery includes a battery functional segment and a non-battery functional segment arranged sequentially along the second direction. A group of grooves, including a first groove P1, a second groove P2, and a third groove P3, is arranged in the non-battery functional segment. The width of the battery functional segment is Wp, the width of the non-battery functional segment is Wd, and the width of the sub-battery is Wp+Wd, where Wx < Wp < Wy < (Wp+Wd).

[0049] In a typical implementation, the large-area patterned perovskite solar cell at the component level may further include a substrate layer 10 and an encapsulation structure, with a bottom electrode layer 11 stacked on the substrate layer 10 along a first direction, and the encapsulation structure disposed on the top electrode layer 50 along the first direction.

[0050] Specifically, the substrate 10, also known as the base layer, serves as the main light-receiving surface of the perovskite solar cell, meaning that light enters from this structural layer. The substrate 10 can be made of transparent glass or flexible transparent material. For example, the transparent glass can be ultra-clear glass, soda-lime glass, sodium-free glass, borosilicate glass, quartz glass, etc., and the flexible transparent material can be PET (polyethylene terephthalate), PEN (polyethylene naphthalate), etc.

[0051] Specifically, the bottom electrode layer 11, also known as the bottom electrode or the front conductive layer, is stacked on the substrate layer 10. The bottom electrode layer 11 may include one or more conductive films composed of transparent conductive oxide (TCO) materials and nano-Ag wires, or multiple or multi-layered conductive films. Transparent conductive oxide (TCO) materials include, but are not limited to, FTO (fluorine-doped tin oxide), ITO (indium tin oxide), IWO (indium tungsten oxide), IWOH (hydrogen-doped indium tungsten oxide), IOH (hydrogen-doped indium oxide), IZO (indium zinc oxide), and IGZO (indium gallium zinc oxide).

[0052] Specifically, the bottom electrode layer 11 can be obtained by vacuum deposition processes such as PVD (physical vapor deposition), PECVD (plasma-enhanced chemical vapor deposition), LPCVD (low-pressure chemical vapor deposition), and ALD (atomic layer deposition), or by non-vacuum methods such as coating, blade coating, spraying, and scraping. The thickness of the bottom electrode layer 11 can be configured according to process requirements. For example, the thickness of the bottom electrode layer 11 is approximately 100 nm to 600 nm.

[0053] Specifically, the encapsulation structure includes a first encapsulation layer 60 and a second encapsulation layer 70. The first encapsulation layer 60 is stacked on the top electrode layer 50 along the first direction, and the second encapsulation layer 70 is stacked on the first encapsulation layer 60 along the first direction. During encapsulation, the first encapsulation layer 60 can also fill the third groove P3. The first encapsulation layer 60 is laminated to the substrate layer 10 through lamination or other processes to isolate and protect each sub-cell.

[0054] The first encapsulation layer is made of encapsulating film materials with equivalent functions, such as EVA (ethylene-vinyl acetate copolymer), POE (polyolefin elastomer), and PVB (polyvinyl butyral). The second encapsulation layer 70 is a battery structure encapsulation layer, serving functions such as load-bearing, fixation, pressure resistance, and aging resistance. The second encapsulation layer is made of various flexible backplane materials, such as glass, PTFE (polytetrafluoroethylene), and ETFE (ethylene-tetrafluoroethylene copolymer). More specifically, the thickness of the first encapsulation layer is 500μm to 1000μm.

[0055] In a typical embodiment, the photoelectric conversion structure layer 100 includes a first transport layer 20, a perovskite active absorber layer 30, and a second transport layer 40 sequentially stacked along a first direction. The first transport layer 20 is stacked on the bottom electrode layer 11, and the top electrode layer 50 is stacked on the second transport layer 40. One of the first transport layer 20 and the second transport layer 40 is a hole transport layer (HTL), and the other is an electron transport layer (ETL). In a preferred embodiment, the first transport layer 20 is integral with the first filling structure.

[0056] Specifically, in the inverted / reverse perovskite solar cell, the first transport layer 20 is a hole transport layer, and the material of the hole transport layer includes, but is not limited to, NiO. x Cu:NiO x CuSCN, Cu x The hole transport layer can be formed by any one of the following materials: O, PEDOT:PSS, P3HT, PTAA, PCDTBT, etc., as a single material layer or a composite layer formed by multiple materials. The thickness of the hole transport layer is approximately 10nm~50nm. Specifically, the hole transport layer can be obtained by vacuum deposition or by non-vacuum methods such as coating, blade coating, spraying, and scraping. Specifically, in a perovskite solar cell with a normal / normal structure, the first transport layer 20 is an electron transport layer, and the material of the electron transport layer includes, but is not limited to, C. 60 A composite layer formed by any one or more combinations of PCBM and SnO2, wherein the thickness of the electron transport layer is 10nm~80nm, and the electron transport layer is formed by methods including but not limited to vacuum deposition, spin coating, coating, spraying, etc.

[0057] Specifically, the materials of the perovskite active absorber layer 30 include, but are not limited to, MAPbI3, MA x Cs 1-x PbI3, MA x FA y Cs 1-x-y PbI3, MA x FA 1-x PbI 3-a Br a MAx FA 1-x PbI 3-b Cl b MA x FA 1-x PbBr 3-c Cl c x and y take values ​​from 0 to 1, and a, b, and c all take values ​​from 0 to 3 (the structural formula of MA is CH3NH3). + The structural formula of FA is CH(NH2)2 + The thickness of the perovskite active absorber layer 30 is 200 nm to 600 nm, and the film formation method of the perovskite active absorber layer 30 includes, but is not limited to, spin coating, coating, spraying, vacuum coating, etc.

[0058] Specifically, in inverted / inverted perovskite solar cells, the second transport layer 40 is an electron transport layer, and the material of the electron transport layer includes, but is not limited to, C. 60 The electron transport layer is a composite layer formed by any one or more combinations of PCBM and SnO2, with a thickness of 10nm to 80nm. The electron transport layer is formed by methods including, but not limited to, vacuum deposition, spin coating, coating, and spraying. Specifically, in a normal / normal perovskite solar cell, the second transport layer 40 is a hole transport layer, and the material of the hole transport layer includes, but is not limited to, NiO. x Cu:NiO x CuSCN, Cu x The hole transport layer can be formed into a single material layer or a composite layer of multiple materials, using any one of the following materials: O, PEDOT, PSS, P3HT, PTAA, PCDTBT, etc. The thickness of the hole transport layer is approximately 10nm to 50nm. Specifically, the hole transport layer can be obtained by vacuum deposition or by non-vacuum methods such as coating, blade coating, spraying, or blade coating.

[0059] Taking inverted / reverse / inverted perovskite solar cells as an example, the first groove P1 is formed by etching the bottom electrode layer 11, and the first filling structure is formed by filling the first groove P1 with HTL material. The second groove P2 is formed by etching the ETL layer, the perovskite active absorber layer 30, and the HTL layer. The second filling structure is formed by filling the second groove P2 with transparent conductive oxide material. The second filling structure in the second groove P2 makes the HTL layer and the top electrode layer 50 contact and connect, acting as the wire of the cell structure. The third groove P3 is formed by etching the top electrode layer 50, the ETL layer, the perovskite active absorber layer 30, and the HTL layer, thereby dividing the large-area perovskite solar cell into multiple sub-cells. Each sub-cell forms a large-area solar panel through this internal series structure.

[0060] It should be noted that the arrangement direction of the multiple sub-cells is consistent with the arrangement direction of the multiple internal series structures - scribe groups, and the three scribe lines in each scribe group, all of which are arranged along the second direction.

[0061] For other specific implementations, please refer to Figure 5 The photoelectric conversion structure layer 100 may also include at least one of the first functional layer 21, the second functional layer 31, and the third functional layer 41.

[0062] Specifically, a first functional layer 21 is stacked on the first transport layer 20, and a perovskite active absorber layer 30 is stacked on the first functional layer 21. The first functional layer 21 serves as a passivation layer, modification layer, blocking layer, or composite layer for the first transport layer 20 (currently illustrated as a hole transport layer - ETL in the inverse structure, and an electron transport layer - HTL in the formal structure). The first functional layer 21 includes, but is not limited to, layers that can cooperate with the first transport layer 20 (without affecting the carrier transport function and effectively limiting I). - or MA + FA + The first functional layer 21 is formed by any one of the following: two-dimensional materials (plasma migration diffusion), polymers, ionic liquids, self-assembled layers (SAMs), etc., forming a single material layer or a composite layer of multiple materials. The thickness of the first functional layer 21 is approximately 10 nm to 50 nm. It can be obtained by vacuum deposition or by non-vacuum methods such as spin coating, coating, blade coating, spraying, and scraping.

[0063] Specifically, a second functional layer 31 is stacked on the perovskite active absorber layer 30, and a second transport layer 40 is stacked on the second functional layer 31. The second functional layer 31 is a passivation layer, modification layer, barrier layer, or composite layer on the perovskite active absorber layer 30. The second functional layer 31 includes, but is not limited to, layers that can cooperate with the perovskite active absorber layer 30 (without affecting the carrier transport function and effectively limiting I- or MA). + FA + A single material layer or a composite layer of multiple materials can be formed from any of the following: two-dimensional materials (plasma migration and diffusion), polymers, ionic liquids, self-assembled layers (SAMs), etc. It can be obtained by vacuum coating or by non-vacuum methods such as spin coating, coating, blade coating, spraying, and scraping.

[0064] Specifically, a third functional layer 41 is stacked on the second transport layer 40, and a top electrode layer 50 is stacked on the third functional layer 41. The third functional layer 41 is a passivation layer, modification layer, blocking layer, or composite layer of the second transport layer 40 (currently illustrated as a hole transport layer-ETL in the inverse structure, and an electron transport layer-HTL in the formal structure). The third functional layer 41 includes, but is not limited to, layers that can cooperate with the perovskite active absorber layer 30 (without affecting the carrier transport function and effectively limiting I).- or MA + FA + A single material layer or a composite layer of multiple materials can be formed from any of the following: two-dimensional materials (plasma migration and diffusion), polymers, ionic liquids, self-assembled layers (SAMs), etc. It can be obtained by vacuum coating or by non-vacuum methods such as spin coating, coating, blade coating, spraying, and scraping.

[0065] In a more typical implementation scheme, please refer to Figure 3 , Figures 9-11 The method for fabricating this large-area patterned perovskite solar cell at the component level may include the following steps: A bottom electrode layer 11 is formed on the substrate layer 10 using conventional processes, and a plurality of first grooves P1 are formed on the bottom electrode layer 11 by means of laser processing or the like. The first grooves P1 penetrate the bottom electrode layer 11 along a first direction, and the plurality of first grooves P1 are spaced apart along a second direction.

[0066] A photoelectric conversion structure layer is formed on the bottom electrode layer 11 using conventional processes. A portion of the bottommost structure layer of the photoelectric conversion structure layer is extended and filled with multiple first grooves P1 to form multiple conductive first filling structures. Multiple second grooves P2 are formed on the photoelectric conversion structure layer by means of laser processing or the like. The second grooves P2 penetrate the photoelectric conversion structure layer along a first direction, and the multiple second grooves P2 are spaced apart along a second direction.

[0067] A top electrode layer 50 is formed on the photoelectric conversion structure layer by a composite of a transparent conductive oxide layer and multiple metal layers 52. A portion of the transparent conductive oxide layer of the top electrode layer 50 extends and fills multiple second grooves P2 to form multiple conductive second filling structures. First grooves P1 and second grooves P2 are respectively disposed between two adjacent metal layers 52. Multiple third grooves P3 are formed in the top electrode layer 50 by means of laser processing or the like. The third grooves P3 penetrate the bottom top electrode layer 50 along a first direction. The multiple third grooves P3 are spaced apart along a second direction. The third grooves P3, second grooves P2, and first grooves P1 are spaced apart along the second direction. The third grooves P3 are located between two adjacent metal layers 52.

[0068] A package structure is formed on the top electrode layer 50 using conventional processes.

[0069] Specifically, the fabrication process of the top electrode layer 50 may include the following steps: A first transparent conductive oxide layer 51 is formed on the upper surface of the photoelectric conversion structure layer using conventional vacuum coating processes or non-vacuum coating processes (such as screen printing). The first transparent conductive oxide layer 51 includes conventional indium tin oxide (FTO), fluorine tin oxide (ITO), or indium tungsten oxide (IWO) transparent oxide film layers, as well as other oxide film layers that can potentially serve as conductive electrode layers. The thickness of the first transparent conductive oxide layer 51 is 50nm~100nm. The first transparent conductive oxide layer 51 can effectively block the migration and diffusion of halide ions.

[0070] A metal layer 52 is fabricated in the second part / region of the first transparent conductive oxide layer 51 using conventional processes known in the art (e.g., vacuum deposition via magnetron sputtering). The first part of the first transparent conductive oxide layer 51 is not covered by the metal layer 52. Specifically, a mask 54 can be placed on the first transparent conductive oxide layer 51. The outline shape and size of the mask 54 are the same as those of the first transparent conductive oxide layer 51, and the shape and size of the cutouts on the mask 54 are consistent with the shape of the metal layer 52 to be formed. Then, the metal layer 52 is fabricated on the first transparent conductive oxide layer 51 that is not covered by the mask 54. Figure 5 , Figure 6 , Figure 7 As shown, the width of the second portion of the first transparent conductive oxide layer 51 is Wx, and the length is Lx, where Wx = (1 / 3~2 / 3)Wy and Lx = (1 / 3~2 / 3)Ly. In the width direction, the width of the first portion of the first transparent conductive oxide layer 51 not covered by the metal layer 52 on both sides is (Wy-Wx) / 2. In the length direction, the length of the first portion of the first transparent conductive oxide layer 51 not covered by the metal layer 52 on both sides is (Ly-Lx) / 2. Specifically, the metal layer 52 is made of a highly conductive metal, including but not limited to Cu, Ag, Au, etc., and its thickness is 10nm~100nm.

[0071] A second transparent conductive oxide layer 53 is formed on the first transparent conductive oxide layer 51 and the metal layer 52 using conventional vacuum coating processes or non-vacuum coating processes (such as screen printing). The second transparent conductive oxide layer 53 is connected to the portion of the first transparent conductive oxide layer 51 that is not covered by the metal layer 52 to form a transparent conductive oxide layer, thereby forming the top electrode layer 50. Specifically, the second transparent conductive oxide layer 53 and the first transparent conductive oxide layer 51 completely seal / encapsulate the metal layer 52, which not only prevents the metal layer 52 from reacting with halide ions, but also prevents the metal layer 52 from contacting and oxidizing with the outside air.

[0072] Specifically, the process of forming multiple metal layers 52 on the first transparent conductive oxide layer 51 may include: A large-area mask 54 of the same size and shape as the first transparent conductive oxide layer 51 is formed on its surface. In the area not covered by the mask 54, m metal layers 52 are fabricated, each corresponding to a sub-cell subsequently formed. Specifically, the width of the large-area mask is Ly, which can theoretically be infinitely long; for example, the length Ly = 1200nm~2400mm. The width W can theoretically be infinitely wide; for example, the width W = 600nm~1200mm. In the width direction, the mask 54 is divided into m segments, each with a width of Wp+Wd. The middle region of each segment has a hollow structure with a length of Lx and a width of Wx. The shape and size of the hollow structure are consistent with the metal layers 52. That is, m metal layers 52 are also formed on the first transparent conductive oxide layer 51, and the part of the mask 54 with a width of Wd exactly covers the position of the wire groove group.

[0073] A second transparent conductive oxide layer 53 is formed on the first transparent conductive oxide layer 51 and the metal layer 52 using conventional vacuum coating processes or non-vacuum coating processes (such as screen printing). The second transparent conductive oxide layer 53 is connected to the portion of the first transparent conductive oxide layer 51 not covered by the metal layer 52 to form a transparent conductive oxide layer, thereby forming the top electrode layer 50. Specifically, the second transparent conductive oxide layer 53 and the first transparent conductive oxide layer 51 completely enclose / enclose the metal layer 52.

[0074] It should be noted that the processes for forming the groove group and fabricating the first encapsulation layer 60 and the second encapsulation layer 70 are known in the art and will not be described in detail here. It should also be noted that, compared to using only a transparent conductive metal oxide layer as the top electrode layer 50, the top electrode layer 50 in this invention is thinner, reducing the difficulty of pattern etching, making it easier to etch cleanly, and avoiding short circuits between sub-cells and battery failure.

[0075] Specifically, such as Figure 3 and Figure 9As shown, the width of each sub-cell is Wp + Wd, where Wp = Wy is the effective width of a single sub-cell, and Wd is the ineffective width. For example, the effective width of a single sub-cell is Wp = Wy = 2.7mm~9.9mm, and the ineffective width is Wd = 0.1mm~0.3mm. The width of the metal layer 52 in a single sub-cell is Wx. The metal layer 52 is located in the middle of the effective width segment of the single sub-cell, while the inner series structure / groove group is located in the ineffective width segment of the single sub-cell. It can be understood that the inner series structure / groove group is arranged between the metal layers of two adjacent sub-cells along the second direction. This avoids damage to the metal layer 52 or exposure of the metal layer 52 during the processing of the inner series structure / groove group, which would cause metal diffusion and migration that could damage the battery functional layer or contact with external moisture. It also prevents the metal layer 52 from being extended or falling into the third groove P3 during the groove formation process, causing a short circuit.

[0076] Please refer to a more detailed implementation plan as well. Figures 9-18 Each sub-cell's metal layer 52 has a specified sub-pattern. The sub-pattern of any sub-cell can be combined with the sub-patterns of the remaining n sub-cells to form an overall pattern, thereby improving the appearance performance of the perovskite solar cell and allowing for customized appearance patterns. (m-1) ≥ n ≥ 1, where m and n are positive integers. For example, 'a' sub-patterns out of m sub-patterns can be pieced together to form a first pattern, and 'b' sub-patterns can be pieced together to form a second pattern. The first and second patterns can be independent overall patterns, or they can be pieced together to form an overall pattern, where m = a + b, and a, b ≥ 1.

[0077] Specifically, the metal layer 52 of each sub-cell may include one or more conductive metal structures, which combine to present a specified sub-pattern. Specifically, the sub-pattern includes at least one of text, letters, numbers, geometric shapes, and real-world image graphics. Real-world image graphics include natural real-world image graphics and man-made object image graphics. The sub-patterns contained in the top electrode layers of any two sub-cells may be the same or different.

[0078] In some typical implementations, such as Figure 9 and Figure 10 As shown, the metal layer 52 of each sub-cell includes a large-area conductive metal structure, and the metal layer 52 is a rectangular pattern structure. In other typical embodiments, such as Figure 12 and Figure 13 , Figure 14 and Figure 15 , Figure 16 and Figure 17 As shown, the metal layer 52 of each sub-cell includes multiple conductive metal structures, which are arranged in a selected manner. These conductive metal structures can be elongated rectangular structures (e.g.,...). Figure 12, Figure 13 As shown), it can be a square structure (such as...). Figure 14 , Figure 15 As shown), it can be a letter graphic (such as...). Figure 16 , Figure 17 Of course, the shape of the conductive metal structure and the metal layer can also be circular or other shapes.

[0079] Example 2 This embodiment of a tandem solar cell module mainly includes at least two cells stacked sequentially, wherein at least one of the cells is a patterned perovskite solar cell as described in Embodiment 1. The patterned perovskite solar cell is generally disposed on the top layer of the tandem solar cell module. Through this design, the tandem solar cell module can present a customized appearance pattern to the outside world.

[0080] Specifically, the voltage or current matching issues between at least two cells in a tandem solar cell module are generally not involved. The at least two cells can be stacked in a physically stacked manner, and the specific stacking, bonding structure, and method are not particularly limited. For example, adjacent cells can be bonded and fixed together using an adhesive film.

[0081] It should be noted that, in this embodiment, the cells other than the patterned perovskite solar cells in the tandem solar cell module can be crystalline silicon cells or other types of solar cells known in the art. Of course, all of them can also be patterned perovskite solar cells as in Embodiment 1. The band gap and other parameters of each solar cell are not the focus of this invention and are therefore not limited.

[0082] Typically, the stacked solar cell module in this embodiment can be a solar panel, etc. Depending on the number of stacked cells, the stacked solar cell module in this embodiment can be a two-layer solar cell module or a three-layer solar cell module, etc. It should be noted that the stacked solar cell module in this embodiment can of course also include other conventional accessories known in the art, such as solar panel frames, mounting frames, etc., which will not be described in detail here.

[0083] Example 3 A photovoltaic system in which the photovoltaic panels employ the tandem solar cell module of Example 2.

[0084] Specifically, the photovoltaic system can be a photovoltaic power generation system or a photovoltaic power station, etc., in which the photovoltaic panel is the core component that converts solar energy into electrical energy. The photovoltaic panels are generally arranged in an array. As those skilled in the art know, the photovoltaic power generation system also includes combiner boxes and inverters. The connection circuit structure and connection method between the combiner box, inverter and photovoltaic panel array are known in the art and are not the subject of the inventive improvement concept, so they will not be described in detail here.

[0085] It should be understood that the above embodiments are merely illustrative of the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the content of the present invention and implement it accordingly. They should not be construed as limiting the scope of protection of the present invention. All equivalent changes or modifications made in accordance with the spirit and essence of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A patterned solar cell, characterized in that, include: Bottom electrode layer; A photoelectric conversion structure layer is stacked on the bottom electrode layer along a first direction; A top electrode layer is stacked on the photoelectric conversion structure layer along a first direction, and the top electrode layer includes: Transparent conductive oxide layer; and Multiple metal layers are spaced apart within the transparent conductive oxide layer along a second direction. The multiple metal layers have multiple sub-patterns, and the multiple sub-patterns are pieced together to form at least one overall pattern, wherein the first direction and the second direction are intersected.

2. The patterned solar cell according to claim 1, characterized in that: The transparent conductive oxide layer includes a first transparent conductive oxide layer and a second transparent conductive oxide layer stacked along the first direction, and a plurality of metal layers are disposed between the first transparent conductive oxide layer and the second transparent conductive oxide layer.

3. The patterned solar cell according to claim 1 or 2, characterized in that, Also includes: Multiple third grooves are provided, each of which is located between two adjacent metal layers and penetrates the top electrode layer. The bottom electrode layer, the photoelectric conversion structure layer, and the top electrode layer form multiple sub-cells arranged along the second direction by means of the multiple third grooves. Each sub-cell includes one or more metal layers.

4. The patterned solar cell according to claim 3, characterized in that, Also includes: Multiple first grooves are spaced apart along the second direction, and the first grooves penetrate the bottom electrode layer; as well as Multiple second grooves are spaced apart along the second direction, and the second grooves penetrate the photoelectric conversion structure layer; The first groove and the second groove are disposed in the region between two adjacent metal layers along the second direction. A first groove, a second groove, and a third groove distributed between two adjacent metal layers form a groove group. The bottom electrode layer, the photoelectric conversion structure layer, and the top electrode layer form a plurality of sub-cells arranged along the second direction by means of the plurality of groove groups.

5. The patterned solar cell according to claim 4, characterized in that: Each of the sub-cells has a top electrode layer containing a transparent conductive oxide layer having a first portion and a second portion, the first portion being distributed around the second portion, the metal layer being distributed inside the second portion, and the third groove being adjacent to the first portion. And / or, the width of the transparent conductive oxide layer included in the top electrode layer of each of the sub-cells is Wy and the length is Ly, the width of the second portion is Wx and the length is Lx, and Wx = (1 / 3~2 / 3) Wy, Lx = (1 / 3~2 / 3) Ly, where the width is the dimension along the second direction.

6. The patterned solar cell according to claim 5, characterized in that: The sub-battery includes a battery functional segment and a non-battery functional segment arranged sequentially along the second direction, and the first groove, the second groove, and the third groove are arranged in the non-battery functional segment. And / or, the width of the battery functional segment is Wp, the width of the non-battery functional segment is Wd, the width of the sub-battery is Wp+Wd, and Wx < Wp < Wy < (Wp+Wd).

7. The patterned solar cell according to claim 4, characterized in that: The first groove is further provided with a first filling structure, which is electrically connected to the bottom electrode layer and the photoelectric conversion structure layer respectively. The second groove is further provided with a second filling structure, which is electrically connected to the bottom electrode layer and the top electrode layer respectively. Two adjacent sub-cells are connected in series via the first filling structure and the second filling structure.

8. The patterned solar cell according to claim 2, characterized in that: The thickness of the first transparent conductive oxide layer is 50nm~100nm, the thickness of the second transparent conductive oxide layer is 30nm~100nm, and the thickness of the metal layer is 10nm~100nm; And / or, the materials of the first transparent conductive oxide layer and the second transparent conductive oxide layer include indium tin oxide, fluorine tin oxide or tungsten indium oxide, and the materials of the metal layer include at least one of gold, silver and copper.

9. The patterned solar cell according to claim 1, characterized in that: A portion of the puzzle pieces from multiple sub-patterns forms a first pattern, and another portion forms a second pattern. The first pattern and the second pattern are each independent whole patterns, or the first pattern and the second pattern are combined to form the whole pattern. And / or, the sub-pattern includes at least one of text, letters, numbers, geometric shapes, and real-world image graphics.

10. The patterned solar cell according to claim 1, characterized in that, Also includes: A packaging structure is disposed on the top electrode layer along the first direction.

11. A tandem solar cell module, comprising at least two cells sequentially stacked, characterized in that: At least one of the batteries is a patterned solar cell according to any one of claims 1-10.

12. A photovoltaic system, characterized in that, include: The patterned solar cell according to any one of claims 1-10, or the tandem solar cell module according to claim 11.

Citation Information

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