Display panel and display device

Abstract

The invention provides a display panel and a display device. The display panel comprises a display area and a non-display area, in the non-display area, the display panel comprises a substrate, an insulating layer and an isolation function layer, the substrate is provided with a first wire, the insulating layer is arranged on the substrate and covers at least part of the first wire, an opening is formed in the insulating layer in the non-display area, and the isolation function layer is arranged on the opening. The orthographic projection of the opening on the substrate is at least partially overlapped with the orthographic projection of the first wire on the substrate, the orthographic projection of the side, away from the substrate, of the insulating layer on the substrate is located in the orthographic projection of the side, close to the substrate, of the insulating layer on the substrate, and the insulating layer is covered with the isolation function layer, filled in the opening and electrically connected with the first wire. Therefore, the included angle between the side wall of the opening and the plane where the substrate is located is an acute angle, the subsequent isolation function layer is prevented from being broken at the side wall of the opening, the continuity of covering the opening by the isolation function layer is ensured, and the display effect of the display panel is improved.

Description

Technical Field

[0001] This application relates to the field of display technology, and more particularly to a display panel and display device. Background Technology

[0002] The development of semiconductor technology plays a crucial role in the advancement of the electronics industry. Organic light-emitting diodes (OLEDs) have attracted great attention and are widely used in electronic display products due to their advantages such as simple manufacturing process, low cost, low power consumption, high brightness, wide viewing angle, high contrast, and the ability to achieve flexible displays.

[0003] However, the current manufacturing process of OLED display products needs improvement. Summary of the Invention

[0004] In view of this, the purpose of this application is to provide a display panel and display device that aims to improve the process performance of the display panel.

[0005] To achieve the above objectives, this application adopts the following technical solution.

[0006] A display panel includes a display area and a non-display area, wherein in the non-display area:

[0007] The display panel includes:

[0008] A substrate having a first trace.

[0009] An insulating layer is disposed on the substrate and covers a portion of the first trace. An opening is provided on the insulating layer in the non-display area. The orthographic projection of the opening on the substrate at least partially overlaps with the orthographic projection of the first trace on the substrate. The orthographic projection of the side of the insulating layer away from the substrate on the substrate is located within the orthographic projection of the side of the insulating layer closer to the substrate on the substrate.

[0010] An isolation functional layer is disposed on the side of the insulating layer away from the substrate and fills the opening.

[0011] In one embodiment, a planarization layer is further included, the planarization layer being disposed between the substrate and the insulating layer, the planarization layer covering a portion of the first trace.

[0012] The planarization layer has at least one via, at least one of the vias communicating with the opening, the orthographic projection of the via on the substrate at least partially overlapping the orthographic projection of the first trace on the substrate, and the insulating layer is disposed on the side of the planarization layer away from the substrate and extends into the via.

[0013] Preferably, the via extends in a direction perpendicular to the substrate, and the orthographic projection of the via on the substrate is located within the orthographic projection of the first trace on the substrate;

[0014] Preferably, the orthographic projection of the opening on the substrate lies within the orthographic projection of the via on the substrate.

[0015] In one embodiment, the sidewall of the opening is a straight line or an arc in a cross-section perpendicular to the substrate.

[0016] In one embodiment, the angle between the sidewall of the opening and the plane containing the substrate is less than or equal to 70°.

[0017] Preferably, the angle between the sidewall of the opening and the plane of the substrate is less than or equal to 60°.

[0018] Preferably, the angle between the sidewall of the opening and the plane of the substrate is between 30° and 60°.

[0019] In one embodiment, the isolation layer fills the opening and is electrically connected to the first trace.

[0020] In one embodiment, the isolation functional layer includes a first isolation functional layer and a second isolation functional layer, wherein the first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and the second isolation functional layer is disposed on the side of the first isolation functional layer away from the substrate.

[0021] Preferably, the thickness of the second isolation functional layer is less than the thickness of the first isolation functional layer;

[0022] Preferably, the first insulating functional layer is made of aluminum, and the second insulating functional layer is made of titanium.

[0023] In one embodiment, the isolation functional layer includes a third isolation functional layer, which is disposed between the insulating layer and the first isolation functional layer, and the third isolation functional layer fills the opening and is electrically connected to the first trace.

[0024] Preferably, the third isolation functional layer comprises molybdenum material.

[0025] Preferably, the thickness of the third isolation functional layer is less than or equal to the thickness of the second isolation functional layer.

[0026] In one embodiment, both the first isolation functional layer and the second isolation functional layer disposed in the non-display area are continuous film layers;

[0027] The first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening;

[0028] The second isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening.

[0029] In one embodiment, the ratio of the thickness of the second isolation layer to the thickness of the first isolation layer is between 0.05 and 0.5.

[0030] Preferably, the ratio of the thickness of the second isolation functional layer to the thickness of the first isolation functional layer is between 0.1 and 0.3.

[0031] In one embodiment, the isolation functional layer is disposed in the display area and the non-display area. The isolation functional layer disposed in the display area includes an isolation structure, which encloses and forms a plurality of isolation openings.

[0032] In one embodiment, a display functional layer is further included, which comprises a plurality of light-emitting devices, each light-emitting device including a first electrode, a light-emitting functional layer, and a second electrode.

[0033] At least a portion of the light-emitting device is disposed within the isolation opening, and the second electrode is disposed on the side of the light-emitting functional layer away from the substrate and overlaps with the isolation structure.

[0034] In one embodiment, the first trace is electrically connected to the isolation functional layer disposed in the non-display area, and is electrically connected to the isolation structure disposed in the display area through the isolation functional layer disposed in the non-display area.

[0035] In one embodiment, a second trace is provided on the non-display area side of the substrate, and the second trace is electrically connected to the first electrode.

[0036] In one embodiment, a third trace is provided on the non-display area side of the substrate, the third trace is disposed on the same layer as the first trace, and a dam is provided on the side of the third trace away from the substrate.

[0037] Based on the same inventive concept, this application proposes a display device that includes the aforementioned display panel.

[0038] Compared with the prior art, this application optimizes the structure of the opening of the insulating layer in the non-display area. The side of the insulating layer corresponding to the sidewall of the opening that is away from the substrate is orthographically projected onto the substrate, while the side of the insulating layer corresponding to the sidewall of the opening that is close to the substrate is orthographically projected onto the substrate. This makes the angle between the sidewall of the opening and the plane where the substrate is located an acute angle, thus preventing the subsequent isolation functional layer from breaking at the sidewall of the opening, ensuring the continuity of the isolation functional layer covering the opening, and improving the display effect of the display panel. Attached Figure Description

[0039] To more clearly illustrate the technical solutions in this application or related technologies, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0040] Figure 1 This is a schematic diagram of the structure of a display panel according to an embodiment of this application;

[0041] Figure 2 for Figure 1 Schematic diagram of the cross-section at point a;

[0042] Figure 3 and Figure 4 This is a schematic diagram of an embodiment of the present application showing the isolation functional layer covering the sidewall of a via in the insulating layer of a non-display area;

[0043] Figure 5 This is a schematic diagram illustrating the discontinuous appearance of vias in the insulating layer covering the isolation functional layer according to an embodiment of this application. Detailed Implementation

[0044] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with specific embodiments and the accompanying drawings.

[0045] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this application should have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms "first," "second," and similar terms used in the embodiments of this application do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0046] The manufacturing process of OLED (Organic Light-Emitting Diode) display panels generally involves three stages: array substrate fabrication, light-emitting device fabrication, and module fabrication. Further research by the applicant on the light-emitting device fabrication stage revealed that this stage requires multiple wet etching processes (such as etching the cathode of the light-emitting device). During etching, the substrate is immersed in a specific solution (such as a solution containing phosphoric acid, nitric acid, acetic acid, or a combination thereof) to etch the substrate. This causes a series of chemical reactions between the film material on the substrate surface and the solution, thereby achieving the etching effect. The isolation functional film layer 470 located in the non-display area does not completely cover the sidewall of the via 461 of the underlying insulating layer (such as the pixel limiting layer) 460. Figure 5 At point b, during subsequent wet etching, the wet etching solution penetrates through the discontinuity of the isolation functional film 472, etching the underlying aluminum / Al film 471. As the wet process progresses, the aluminum / Al film is hollowed out, leading to increased resistance in the isolation functional film and its inability to effectively transmit signals, resulting in display abnormalities. Furthermore, at the vias / steps where the isolation functional film does not completely cover the underlying insulating layer, moisture can penetrate to these discontinuities under high temperature and humidity, continuously corroding the aluminum / Al film and causing display abnormalities.

[0047] Therefore, this application provides a display panel and a display device to solve the above problems. See the following embodiments for details.

[0048] The display panel includes a display area and a non-display area. In the non-display area, the display panel includes a substrate, an insulating layer, and an isolation functional layer.

[0049] The substrate has a first trace. An insulating layer is disposed on the substrate and covers at least a portion of the first trace. An opening is provided on the insulating layer in the non-display area. The orthographic projection of the opening onto the substrate at least partially overlaps with the orthographic projection of the first trace onto the substrate. The orthographic projection of the side of the insulating layer away from the substrate is located within the orthographic projection of the side of the insulating layer closer to the substrate. An isolation functional layer is disposed on the side of the insulating layer away from the substrate and fills the opening. In this way, the first isolation functional layer can continuously and smoothly cover the sidewalls of the opening of the insulating layer and extend to cover the first trace without any steep sections. When the second isolation functional layer, which also serves as a protective film, is deposited on top, there will be no discontinuity. This prevents the wet etching solution from seeping through the discontinuity of the second isolation functional layer in the subsequent wet process, causing over-etching of the aluminum material in the first isolation functional layer below, which would lead to display abnormalities.

[0050] like Figure 1 The diagram shown is a schematic representation of the structure of a display panel according to an embodiment of this application.

[0051] The display panel 100 includes a display area 110 (also called the AA area) and a non-display area 120 (also called the bezel area / NA area) located outside the display area 110. The non-display area 120 is provided with a bonding area (not shown), which is used to mount bonding components in subsequent processes.

[0052] The display area 110 includes a plurality of light-emitting devices 111 arranged in a preset pattern. The plurality of light-emitting devices 111 include a first light-emitting device, a second light-emitting device, and a third light-emitting device for emitting different colors. For example, the first light-emitting device is used to emit blue light, the second light-emitting device is used to emit green light, and the third light-emitting device is used to emit red light. In this embodiment, the arrangement of the first light-emitting device, the second light-emitting device, and the third light-emitting device is not limited.

[0053] like Figure 2 As shown Figure 1 A schematic diagram of the cross-section at point a.

[0054] The display panel includes a substrate 130, a planarization layer 140, an insulating layer 160, and an isolation functional layer 170.

[0055] The substrate 130 is disposed in the display area 110 and the non-display area 120. It is a flexible substrate, and its material can be selected from polyimide (PI), polyethylene naphthalate (PEN) or polyethylene terephthalate (PET), etc., or it can be a mixture of the above materials. Alternatively, the substrate 130 can be a rigid substrate, which can be selected from glass.

[0056] The substrate 130 has a first trace 141. Preferably, the substrate 130 has a second trace (not shown) that is electrically connected to a pixel driving circuit located in the display area.

[0057] The planarization layer 140 is disposed on one side of the substrate 130, covering the substrate 130 and a portion of the first trace 141. A first electrode 150 is disposed on the side of the planarization layer 140 away from the substrate 130, and the planarization layer 140 is disposed in the display area 110 and the non-display area 120. The planarization layer 140 located in the non-display area 120 has at least one via 142, which communicates with a corresponding opening 161 to expose at least a portion of the first trace 141, that is, the orthographic projection of the via 142 on the substrate 130 at least partially overlaps with the orthographic projection of the first trace 141 on the substrate 130.

[0058] The insulating layer 160 (also called the pixel defining layer) is disposed on the planarization layer 140 (e.g., the insulating layer is located on the side of the planarization layer away from the substrate). The insulating layer is disposed in the display area 110 and the non-display area 120. The insulating layer 160 disposed in the display area 110 defines a plurality of pixel openings, and at least a portion of the light-emitting device 111 is located in the corresponding pixel opening. An insulating layer 160 disposed in the non-display area 120 has an opening 161 (preferably, the opening extends in a direction perpendicular to the substrate 10). The insulating layer 160 of the non-display area 120 is disposed on the side of the planarization layer 140 away from the substrate 130 and extends into the via 142. The orthographic projection of the opening 161 on the substrate 130 lies within the orthographic projection of the via 142 on the substrate 130, and the angle α (also called the Taper angle or slope angle of the sidewall 162) between the sidewall 162 of the opening and the plane of the substrate 130 is less than or equal to 70° (e.g., 70°, 60°, 55°, 50°, 45°, 40°, 35°, 30°). Preferably, the angle α (also called the Taper angle or slope angle of the sidewall 162) between the sidewall 162 of the opening 161 and the plane of the substrate 130 is less than or equal to 60°. In a preferred embodiment, the angle α (also called the Taper angle or slope angle of the sidewall 162 of the opening 161 and the plane of the substrate 130) is between 30° and 60°.

[0059] An isolation functional layer 170 is disposed in the display area 110 and the non-display area 120. The isolation functional layer disposed in the display area 110 includes an isolation structure (not shown in the figure). The isolation structure encloses and forms a plurality of isolation openings. That is, the isolation functional layer disposed in the display area 110 is a discontinuous film layer, while the isolation functional layer disposed in the non-display area 120 is a continuous film layer. Since the display area of ​​the display panel is provided with a plurality of light-emitting devices 111, the isolation structure can avoid signal crosstalk between adjacent light-emitting devices. The isolation functional layer 170 disposed in the non-display area 120 is disposed on the side of the insulating layer 160 away from the substrate and fills the opening 161 and is electrically connected to the first trace 141.

[0060] The isolation functional layer 170 includes a first isolation functional layer 171 and a second isolation functional layer 172, wherein the first isolation functional layer 171 is disposed on the side of the insulating layer 160 facing away from the substrate 130, and the second isolation functional layer 172 is disposed on the side of the first isolation functional layer 171 facing away from the substrate 10. The thickness h2 of the second isolation functional layer 172 is less than the thickness h1 of the first isolation functional layer 171. The thickness here specifically refers to the dimension of the isolation functional layer in the direction perpendicular to the substrate (Z direction). For example, the thickness h1 of the first isolation functional layer 171 specifically refers to the dimension of the first isolation functional layer 271 in the direction perpendicular to the substrate (Z direction), and the thickness h2 of the second isolation functional layer 172 specifically refers to the dimension of the second isolation functional layer 272 in the direction perpendicular to the substrate (Z direction). If the angle α between the sidewall 162 of the opening 161 and the plane of the substrate 130 is too large, the first isolation functional layer covers the sidewall 162 of the opening and part of the first trace 141, and the second isolation functional layer 172 is located on the side of the first isolation functional layer away from the substrate, then the corresponding sidewall 162 of the first isolation functional layer 171 is prone to steepness at the point where it meets the substrate 130. The second isolation functional layer 172 is prone to breakage at the steep point, and during wet etching, the etching solution will penetrate from there to the first isolation functional layer 171 below, causing over-etching of the aluminum material. Preferably, the first isolation functional layer 171 is made of aluminum, and the second isolation functional layer 172 is made of titanium. By optimizing the structure of the opening in the insulating layer and the slope angle of the sidewall 162 of the opening 161, the first isolation functional layer located in the non-display area 120 is continuously disposed on the side of the insulating layer 160 away from the substrate, and extends continuously from the sidewall 162 of the opening 161 to the side of the first trace 141 away from the substrate 130. The second isolation functional layer continuously covers the side of the first isolation functional layer 171 below it away from the substrate 160. That is, the isolation functional layer in the non-display area is a continuous film layer, and both the first isolation functional layer 171 and the second isolation functional layer 172 in the non-display area 120 are continuous film layers. A first isolation functional layer 171 is disposed on the side of the insulating layer 160 away from the substrate 130, and extends continuously from the sidewall 162 of the opening 161 into the opening 161. A second isolation functional layer 172 is disposed on the side of the insulating layer 160 away from the substrate 130, and extends continuously from the sidewall 162 of the opening 161 into the opening 161. During the subsequent fabrication of the light-emitting device, the second isolation functional layer 172 acts as a protective film to prevent the wet etching solution from penetrating from the second isolation functional layer 172 into the first isolation functional layer 171 below it, thus preventing over-etching of the aluminum material and causing display abnormalities. It also prevents continuous corrosion of Al by moisture during reliable high-temperature and high-humidity processes, thus avoiding display abnormalities.

[0061] It should be noted that in this embodiment, the angle α (also called the Taper angle or slope angle of the sidewall 162 of the opening) between the plane of the substrate 130 and the opening sidewall of the first isolation functional layer 171 is less than or equal to 70°. This ensures that the first isolation functional layer 171 continuously and smoothly covers the opening sidewall of the insulating layer and extends to cover the first trace 141 without any steep sections. The second isolation functional layer 172, which also serves as a protective film, will not be discontinuous. This prevents the wet etching solution from penetrating through the discontinuities of the second isolation functional layer 172 during subsequent wet processing, thus avoiding over-etching of the aluminum material in the first isolation functional layer 171 below and causing display abnormalities.

[0062] In one embodiment, the isolation functional layer includes a third isolation functional layer disposed between the insulating layer 160 and the first isolation functional layer, and filling the opening. The third isolation functional layer is electrically connected to the first trace 141. The first isolation functional layer is disposed on the side of the third isolation functional layer facing away from the substrate. The second isolation functional layer 172 continuously covers the first isolation functional layer 171 below it. The second isolation functional layer also serves as a protective film to prevent the wet etching solution from penetrating from the second isolation functional layer to the first isolation functional layer below it during the subsequent wet etching process, thus preventing over-etching of the aluminum material and causing display abnormalities.

[0063] An isolation functional layer 170 is disposed in the display area 110 and the non-display area 120. The isolation functional layer in the display area 110 includes an isolation structure. The isolation structure encloses and forms a plurality of isolation openings. That is, the isolation functional layer in the display area is a discontinuous film layer. The isolation structure is disposed on the side of the insulating layer (pixel defining layer) away from the substrate. The pixel defining layer defines a pixel opening, and the isolation structure defines an isolation opening. The isolation opening corresponds to the pixel opening and is connected to each other.

[0064] The isolation structure includes a first portion formed by a first isolation functional layer, a second portion formed by a second isolation functional layer, and a third portion formed by the first isolation functional layer. Specifically, the third portion is disposed on the side of the insulating layer (pixel defining layer) away from the substrate, the first portion is disposed on the side of the third portion facing away from the substrate, and the second portion is disposed on the side of the first portion facing away from the substrate. The orthographic projection of the first portion on the substrate lies within the orthographic projection of the second portion on the substrate, the orthographic projection of the third portion on the substrate lies within the orthographic projection of the second portion on the substrate, and the orthographic projection of the first portion on the substrate lies within the orthographic projection of the third portion on the substrate. Thus, the isolation structure located in the display area 110 forms a roof-like structure with a vapor-deposited shadow area. This creates a gap between the light-emitting functional layer and the isolation structure during the formation of the light-emitting device, preventing signal crosstalk between adjacent light-emitting devices. For example, the material of the first portion includes aluminum, the material of the second portion includes titanium, and the material of the third portion includes molybdenum. Regarding the structure of the isolation structure (also known as the partition structure, etc.), see patents (applications) CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, PCT / CN2024 / 099072, and CN1179. The relevant technical solutions are described in CN117998900A, CN117062489A, CN117580403A, CN116583155A, CN116669477A, ​​CN117396039A, CN116669480A, CN116600606A, and CN117500332A, the contents of which are incorporated herein by reference.

[0065] The display functional layer includes multiple light-emitting devices, each of which includes a first electrode, a light-emitting functional layer (not shown in the figures), and a second electrode (not shown in the figures). At least a portion of the light-emitting functional layer is located within an isolation opening, and the second electrode is located on the side of the light-emitting functional layer away from the substrate and overlaps with the isolation structure (the second electrode is electrically connected to a first portion of the isolation structure). The first electrode may be an anode, and the second electrode may be a cathode. In some embodiments of this disclosure, some film layers in the light-emitting functional layer, such as the light-emitting layer, can be prepared using a non-evaporation method, such as inkjet printing. The specific method can be selected based on the material of these film layers. For example, if these film layers are made of polymer materials and evaporation is not applicable, inkjet printing can be used to prepare them.

[0066] refer to Figure 2The first trace 141, located in the non-display area, is electrically connected to the isolation functional layer 170. Specifically, the first trace 141 is electrically connected to the isolation functional layer 170 in the non-display area, and then electrically connected to the isolation structure in the display area via the isolation functional layer in the non-display area (and further electrically connected to the second electrode / cathode). The second trace (not shown in the figures) located in the non-display area is electrically connected to the first electrode. Specifically, the second trace in the non-display area is electrically connected to the pixel driving circuit in the display area, and then electrically connected to the first electrode via the pixel driving circuit. Regarding the circuit connection structure of the driving layer, relevant technical solutions are described in patents (applications) CN118251982A, CN116685174A, CN116669477A, ​​CN117580403A, CN116669477A, ​​and CN116936581A, the contents of which are incorporated herein by reference. This design reduces the risk of signal inefficiency in the display area (AA area) caused by the etching of Al in the first isolation functional layer of the non-display area. It also prevents display abnormalities due to electrochemical corrosion caused by moisture intrusion during high-temperature and high-humidity operation.

[0067] Please continue to refer to this. Figure 2 In one embodiment, a third trace 143 is provided on the substrate 130. The third trace is disposed on the same layer as the first trace, and a dam 180 is provided on the side of the third trace away from the substrate.

[0068] refer to Figure 3The isolation layer 170 includes a first isolation layer 171 and a second isolation layer 172. The first isolation layer 171 covers the insulating layer 160 and extends continuously to cover the first trace 141, while the second isolation layer 172 covers the first isolation layer 171. The thickness of the second isolation layer is less than the thickness of the first isolation layer. Preferably, the ratio of the thickness of the second isolation layer to the thickness of the first isolation layer is between 0.05 and 0.5 (e.g., 0.05, 0.1, 0.15, 0.2, 0.25, 0.3, 0.35, 0.4, 0.45, 0.5). More preferably, the ratio of the thickness of the second isolation layer to the thickness of the first isolation layer is between 0.1 and 0.3. The thickness of the second insulating functional layer is thinner than that of the first insulating functional layer. If the first insulating functional layer has a steep slope, the deposited second insulating functional layer is prone to discontinuity. This is caused by the large slope angle of the opening sidewall 162 of the insulating layer 160. Therefore, this application adjusts the slope angle (the angle α between the sidewall 162 and the surface of the substrate 130) of the opening sidewall 162 of the insulating layer 160 to be less than or equal to 70° (e.g., 70°, 60°, 55°, 50°, 45°, 40°, 35°, 30°). In this embodiment, along the cross-section perpendicular to the substrate, the opening sidewall 162 is a straight line, and the angle α between this straight line and the surface of the substrate is less than or equal to 70°. Preferably, the angle α (also called the Taper angle or slope angle of the sidewall 162) is less than or equal to 60°. In this way, the first isolation functional layer continuously and smoothly covers the opening sidewall 162 of the insulating layer 160 and extends to cover the first trace 141 without any steep sections, and the deposition of the second isolation functional layer on it will not be discontinuous.

[0069] Figure 4 In the illustrated embodiment, the sidewall 162 of the opening, in a cross-section perpendicular to the substrate, is arc-shaped. The angle α between the tangent of this arc and the surface of the substrate is less than or equal to 70°, preferably less than or equal to 60° (also called the Taper angle or slope angle of the sidewall 162). This second isolation functional layer 172 also functions as a protective film, preventing the wet etching solution from penetrating from the second isolation functional layer 172 to the underlying first isolation functional layer 171 during subsequent wet processing, thus avoiding over-etching of the aluminum material and resulting in display abnormalities. It also prevents continuous corrosion of Al by moisture during reliable high-temperature and high-humidity processes, thus avoiding display abnormalities.

[0070] It should be noted that the display panel can also include other functional structures. For example, the display panel can also include a touch structure to provide touch functionality. For example, the touch structure can be a touch panel or a touch layer. The touch panel can be bonded into the display panel, or the touch layer can be directly fabricated on the encapsulation layer of the display panel, which is beneficial for the thinner and lighter design of the display panel.

[0071] This application provides a display device including the display panel described in the above embodiments. The pixel density of this display device ranges from 400 PPI to 7000 PPI, making it suitable for applications such as televisions and laptops, and also suitable for micro-display products (such as AR and VR). Furthermore, this display device can be any product or component with display functionality, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, navigator, or console.

[0072] Although this application has been described in conjunction with specific embodiments thereof, many substitutions, modifications and variations of these embodiments will be apparent to those skilled in the art from the foregoing description.

[0073] It should be noted that the above description describes some embodiments of this application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in a different order than that shown in the above embodiments and still achieve the desired result. Furthermore, the processes depicted in the drawings do not necessarily require a specific or sequential order to achieve the desired result. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0074] The embodiments of this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the embodiments of this application should be included within the protection scope of this application.

Claims

1. A display panel, characterized in that, The display panel includes a display area and a non-display area. In the non-display area, the display panel includes: A substrate, wherein a first trace is provided on the substrate; An insulating layer is disposed on the substrate and covers a portion of the first trace. An opening is provided on the insulating layer in the non-display area. The orthographic projection of the opening on the substrate at least partially overlaps with the orthographic projection of the first trace on the substrate. The orthographic projection of the side of the insulating layer away from the substrate on the substrate is located within the orthographic projection of the side of the insulating layer closer to the substrate on the substrate. An isolation functional layer is disposed on the side of the insulating layer away from the substrate and fills the opening.

2. The display panel as described in claim 1, characterized in that, It also includes a planarization layer disposed between the substrate and the insulating layer, the planarization layer covering a portion of the first trace. The planarization layer has at least one via, at least one of the vias communicating with the opening, the orthographic projection of the via on the substrate at least partially overlapping the orthographic projection of the first trace on the substrate, and the insulating layer is disposed on the side of the planarization layer away from the substrate and extends into the via. Preferably, the via extends in a direction perpendicular to the substrate, and the orthographic projection of the via on the substrate is located within the orthographic projection of the first trace on the substrate; Preferably, the orthographic projection of the opening on the substrate lies within the orthographic projection of the via on the substrate.

3. The display panel as described in claim 1, characterized in that, In a cross-section perpendicular to the substrate, the sidewall of the opening is either a straight line or an arc.

4. The display panel as described in claim 3, characterized in that, The angle between the sidewall of the opening and the plane of the substrate is less than or equal to 70°. Preferably, the angle between the sidewall of the opening and the plane of the substrate is less than or equal to 60°. Preferably, the angle between the sidewall of the opening and the plane of the substrate is between 30° and 60°.

5. The display panel as described in claim 1, characterized in that, The isolation layer fills the opening and is electrically connected to the first trace.

6. The display panel as described in claim 1, characterized in that, The isolation functional layer includes a first isolation functional layer and a second isolation functional layer. The first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and the second isolation functional layer is disposed on the side of the first isolation functional layer away from the substrate. Preferably, the thickness of the second isolation functional layer is less than the thickness of the first isolation functional layer; Preferably, the first insulating functional layer is made of aluminum, and the second insulating functional layer is made of titanium.

7. The display panel as described in claim 6, characterized in that, The isolation functional layer includes a third isolation functional layer, which is disposed between the insulating layer and the first isolation functional layer, and fills the opening and is electrically connected to the first trace. Preferably, the third isolation functional layer comprises molybdenum material. Preferably, the thickness of the third isolation functional layer is less than or equal to the thickness of the second isolation functional layer.

8. The display panel as described in claim 6, characterized in that, Both the first isolation functional layer and the second isolation functional layer disposed in the non-display area are continuous film layers; The first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening; The second isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening.

9. The display panel as described in any one of claims 6-8, characterized in that, The ratio of the thickness of the second isolation layer to the thickness of the first isolation layer is between 0.05 and 0.

5. Preferably, the ratio of the thickness of the second isolation functional layer to the thickness of the first isolation functional layer is between 0.1 and 0.

3.

10. The display panel as claimed in claim 1, characterized in that... The isolation functional layer is disposed in the display area and the non-display area. The isolation functional layer disposed in the display area includes an isolation structure, which encloses and forms a plurality of isolation openings.

11. The display panel as claimed in claim 10, characterized in that, It also includes a display functional layer, which comprises multiple light-emitting devices, each including a first electrode, a light-emitting functional layer, and a second electrode. At least a portion of the light-emitting device is disposed within the isolation opening, and the second electrode is disposed on the side of the light-emitting functional layer away from the substrate and overlaps with the isolation structure.

12. The display panel as claimed in claim 10, characterized in that, The first trace is electrically connected to the isolation functional layer disposed in the non-display area, and is electrically connected to the isolation structure disposed in the display area through the isolation functional layer disposed in the non-display area.

13. The display panel as claimed in claim 11, characterized in that, A second trace is provided on the non-display area side of the substrate, and the second trace is electrically connected to the first electrode.

14. The display panel as claimed in claim 10, characterized in that, A third trace is provided on the non-display area side of the substrate. The third trace is disposed on the same layer as the first trace. A dam is provided on the side of the third trace away from the substrate.

15. A display panel, characterized in that, The display panel includes a display area and a non-display area. In the non-display area, the display panel includes: A substrate, wherein a first trace is provided on the substrate; An insulating layer is disposed on the substrate and covers at least a portion of the first trace. An opening is provided on the insulating layer in the non-display area. The orthographic projection of the opening on the substrate at least partially overlaps with the orthographic projection of the first trace on the substrate. The angle between the sidewall of the opening and the plane of the substrate is less than or equal to 70°.

16. The display panel as claimed in claim 15, characterized in that, In a cross-section perpendicular to the substrate, the sidewall of the opening is either a straight line or an arc.

17. The display panel as described in claim 15, characterized in that, The angle between the sidewall of the opening and the plane of the substrate is less than or equal to 60°; Preferably, the angle between the sidewall of the opening and the plane of the substrate is between 30° and 60°.

18. The display panel as described in claim 15, characterized in that, The display panel further includes an isolation functional layer, which is disposed on the side of the insulating layer away from the substrate and fills the opening; Preferably, the isolation functional layer includes a first isolation functional layer and a second isolation functional layer, wherein the first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and the second isolation functional layer is disposed on the side of the first isolation functional layer away from the substrate.

19. The display panel as claimed in claim 18, characterized in that, Both the first isolation functional layer and the second isolation functional layer are continuous film layers; The first isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening; The second isolation functional layer is disposed on the side of the insulating layer away from the substrate, and extends continuously from the sidewall of the opening into the opening.

20. A display device, characterized in that, Includes the display panel as described in any one of claims 1-19.

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