Light-emitting device, preparation method thereof and display device

Abstract

The invention relates to the technical field of display, in particular to a light-emitting device, a preparation method thereof and a display device. Wherein the light-emitting device comprises a first light-emitting unit and a second light-emitting unit which are arranged in parallel; wherein the first light-emitting unit is correspondingly provided with a first surface treatment layer, and the second light-emitting unit is correspondingly provided with a second surface treatment layer; a plurality of first pores are formed in the first surface treatment layer, a plurality of second pores are formed in the second surface treatment layer, and the average pore size of the first pores is different from the average pore size of the second pores. The surface treatment layers with different average pore sizes are arranged on the different light-emitting units, so that the different light-emitting units can be subjected to surface treatment at the same time, the surface treatment effect of the light-emitting device can be improved, the performance of the light-emitting device is improved, and the service life of the light-emitting device is prolonged.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a light-emitting device, its preparation method, and a display device. Background Technology

[0002] Organic light-emitting diodes (OLEDs) and quantum dot light-emitting diodes (QLEDs) both have advantages such as self-illumination, low power consumption, fast response speed, wide viewing angle, high brightness, and ultra-thinness, making them the mainstream light-emitting devices for manufacturing display devices. They are highly distinctive and competitive in fields such as flexible displays and lighting.

[0003] OLED and QLED devices are currently mostly fabricated using solution processing. However, during the fabrication process, the surface treatment of the functional layers of different light-emitting units often results in poor surface treatment effects. Therefore, improving the surface treatment process of the functional layers to obtain devices with better performance is an urgent problem to be solved. Summary of the Invention

[0004] Based on this, embodiments of this application provide a light-emitting device, a method for preparing the same, and a display device.

[0005] To address the aforementioned technical problems, this application provides a light-emitting device, employing the following technical solution:

[0006] A light-emitting device includes a first light-emitting unit and a second light-emitting unit arranged in parallel.

[0007] The first light-emitting unit is provided with a first surface treatment layer, and the second light-emitting unit is provided with a second surface treatment layer; the first surface treatment layer has a plurality of first pores, and the second surface treatment layer has a plurality of second pores, wherein the average pore size of the first pores and the average pore size of the second pores are different.

[0008] To address the aforementioned technical problems, this application provides a method for fabricating a light-emitting device, employing the following technical solution:

[0009] A method for fabricating a light-emitting device, comprising:

[0010] A prefabricated light-emitting device is provided, the prefabricated light-emitting device comprising a first light-emitting unit and a second light-emitting unit arranged in parallel;

[0011] A first surface treatment layer is prepared on the first light-emitting unit, and a second surface treatment layer is prepared on the second light-emitting unit to obtain a light-emitting device; wherein, the first surface treatment layer has a plurality of first pores, the second surface treatment layer has a plurality of second pores, and the average pore size of the first pores and the average pore size of the second pores are different.

[0012] To address the aforementioned technical problems, this application provides a display device that employs the following technical solution:

[0013] A display device comprising the above-described light-emitting device or a light-emitting device prepared by the above-described light-emitting device preparation method.

[0014] Compared with the prior art, the embodiments of this application have the following main advantages:

[0015] This application provides surface treatment layers with different average pore sizes on different light-emitting units, which can simultaneously perform surface treatment on different light-emitting units, thereby improving the surface treatment effect of the light-emitting device and thus improving the performance and service life of the light-emitting device. Attached Figure Description

[0016] To more clearly illustrate the solutions in this application, the accompanying drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of a light-emitting device provided in an embodiment of this application;

[0018] Figure 2 This is a schematic diagram of another light-emitting device provided in an embodiment of this application;

[0019] Figure 3 This is a schematic diagram of ink droplets from different light-emitting units provided in the embodiments of this application;

[0020] Figure 4 This is a schematic diagram of a surface treatment layer provided in an embodiment of this application;

[0021] Figure 5 This is a schematic diagram of another light-emitting device provided in the embodiments of this application;

[0022] Figure 6 This is a flowchart of a method for fabricating a light-emitting device provided in an embodiment of this application;

[0023] Figure 7 Another flowchart of a method for fabricating a light-emitting device provided in this application embodiment;

[0024] Figure 8 This is a schematic diagram illustrating the working principle of a surface treatment layer provided in an embodiment of this application.

[0025] Figure label:

[0026] 100, Substrate; 110, First light-emitting unit; 111, First anode; 112, First hole injection layer; 113, First hole transport layer; 114, First light-emitting layer; 115, First electron transport layer; 116, First cathode; 120, Second light-emitting unit; 121, Second anode; 122, Second hole injection layer; 123, Second hole transport layer; 124, Second light-emitting layer; 125, Second electron transport layer; 126, Second cathode; 30. Third light-emitting unit; 131. Third anode; 132. Third hole injection layer; 133. Third hole transport layer; 134. Third light-emitting layer; 135. Third electron transport layer; 136. Third cathode; 140. Light extraction layer; 151. First surface treatment layer; 152. Second surface treatment layer; 153. Third surface treatment layer; 160. First inorganic layer; 170. Organic layer; 180. Second inorganic layer; 200. Gas supply device. Detailed Implementation

[0027] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains; the terminology used herein in the specification of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application; the terms "comprising" and "having," and any variations thereof, in the specification, claims, and foregoing drawings of this application, are intended to cover non-exclusive inclusion. The terms "first," "second," etc., in the specification, claims, or foregoing drawings of this application are used to distinguish different objects, not to describe a particular order.

[0028] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0029] This application provides a light-emitting device, such as... Figure 1 As shown, it includes a first light-emitting unit 110 and a second light-emitting unit 120 arranged side by side; wherein, the first light-emitting unit 110 is provided with a first surface treatment layer 151, and the second light-emitting unit 120 is provided with a second surface treatment layer 152; the first surface treatment layer 151 has a plurality of first pores, and the second surface treatment layer 152 has a plurality of second pores, the average pore size of the first pores and the average pore size of the second pores are different, which makes the gas flux of the first surface treatment layer 151 and the second surface treatment layer 152 different under the same gas exposure conditions.

[0030] In this embodiment, the same gas exposure condition means that the first surface treatment layer 151 and the second surface treatment layer 152 have the same exposure area and are exposed to the same gas atmosphere for the same duration. Under this condition, the gas passes through the first surface treatment layer 151 and the second surface treatment layer 152 at different rates, that is, the gas flux of the first surface treatment layer 151 and the second surface treatment layer 152 is different.

[0031] In one embodiment, such as Figure 2 As shown, the light-emitting device further includes a third light-emitting unit 130 arranged in parallel with the first light-emitting unit 110 and the second light-emitting unit 120. The surface of the third light-emitting unit 130 is provided with a third surface treatment layer 153. The third surface treatment layer 153 has a plurality of third pores. The average pore size of the third pores is different from the average pore size of the first pores and the second pores. This makes the gas flux of the third surface treatment layer 153, the first surface treatment layer 151, and the second surface treatment layer 152 different under the same gas exposure conditions.

[0032] In this embodiment, at least two of the first light-emitting unit 110, the second light-emitting unit 120, and the third light-emitting unit 130 have different emission peak wavelengths.

[0033] In a specific embodiment, the peak wavelength of the first light-emitting unit 110 is 650-670nm, that is, the first light-emitting unit 110 is a red light-emitting unit.

[0034] In a specific embodiment, the peak wavelength of the second light-emitting unit 120 is 530-550nm, that is, the second light-emitting unit 120 is a green light-emitting unit.

[0035] In a specific embodiment, the peak wavelength of the third light-emitting unit 130 is 430-450nm, that is, the third light-emitting unit 130 is a blue light-emitting unit.

[0036] It is understood that light-emitting units with different emission peak wavelengths have different characteristics. In this embodiment, the surface treatment of each light-emitting unit of a three-color (e.g., red, green, blue) light-emitting device can be performed simultaneously, which can improve the surface treatment effect of the three-color light-emitting device, thereby improving the performance and service life of the three-color light-emitting device.

[0037] In some embodiments, at least two of the surface treatment layers 151, 152 and 153 have different thicknesses, for example, one of them has a different thickness than the other two, or all three have different thicknesses.

[0038] In one embodiment, the film thickness of the first surface treatment layer is 1 to 2 times the film thickness of the second surface treatment layer; and / or, the film thickness of the first surface treatment layer is 3 to 4 times the film thickness of the third surface treatment layer.

[0039] In a further embodiment, the thicknesses of the first surface treatment layer 151, the second surface treatment layer 152, and the third surface treatment layer 153 decrease sequentially.

[0040] In a specific embodiment, the thickness of the first surface treatment layer 151 is 8 to 10 μm.

[0041] Optionally, the film thickness of the first surface treatment layer 151 is selected from any one or a combination of 8 μm, 9 μm, and 10 μm.

[0042] In a specific embodiment, the thickness of the second surface treatment layer 152 is 6 to 8 μm.

[0043] Optionally, the film thickness of the second surface treatment layer 152 is selected from any one or a combination of 6 μm, 7 μm, 8 μm, or both.

[0044] In a specific embodiment, the thickness of the third surface treatment layer 153 is 4 to 6 μm.

[0045] Optionally, the thickness of the third surface treatment layer 153 is selected from any one or a combination of 4μm, 5μm, and 6μm.

[0046] In this embodiment, because the first surface treatment layer 151 is relatively thick, gas has difficulty passing through. The second surface treatment layer 152 is thinner than the first surface treatment layer 151, so gas passes through more easily. The third surface treatment layer 153 is thinner than the light-emitting surface treatment layer, so gas passes through even more easily. When each surface treatment layer is exposed to a gas atmosphere, the thickness range of the first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 in this embodiment is beneficial for gas penetration when each light-emitting unit is exposed to a gas atmosphere (such as a mixed gas containing oxygen and water vapor). Different treatment layers have different penetration rates, which can process light-emitting units of different colors simultaneously and improve the processing efficiency of the surface treatment layers.

[0047] In some embodiments, at least two of the first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 are made of different materials, for example, one of them is made of a different material than the other two, or all three are made of different materials.

[0048] In one embodiment, the first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 are made of resin materials. The resin materials are selected from acrylate resins, epoxy resins, polyethylene resins, polystyrene resins, polysiloxane resins, and polysilazane resins. The first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 may each be composed of a single different resin material, or they may be composed of a mixture of two or more resin materials.

[0049] In a specific embodiment, the acrylate resin is selected from at least one of polypropylene, polyacrylate, and polyurethane acrylate; the epoxy resin is selected from at least one of bisphenol A type epoxy resin, bisphenol F type epoxy resin, polyphenol type glycidyl ether epoxy resin, aliphatic glycidyl ether epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, epoxidized olefin compound, heterocyclic type and mixed type epoxy resin.

[0050] In this embodiment, the first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 are formed by depositing ink droplets. The first pore, the second pore, and the third pore represent the average distance between adjacent ink droplets after the ink droplets form a film. This reflects the ink droplet distribution density per unit area in each surface treatment layer. For example, when the ink droplets can be distributed in an array, the first pore, the second pore, and the third pore represent the average row spacing and column spacing. Or, when they can be randomly distributed in a star-shaped pattern, the first pore, the second pore, and the third pore represent the average distance between each ink droplet and its surrounding adjacent ink droplets.

[0051] In this embodiment, the ink droplet spacing is controlled by the spacing between the nozzles of the print head. Generally speaking, the volume of a single ink droplet can be understood as the same (in reality, after observing and screening the ink droplets, the volume difference is very small, generally controlled within 3% to 5%). This can be understood as the ink droplets having the same spreading area. Therefore, the ink droplet distribution density can be controlled by adjusting the nozzle spacing of the printing device.

[0052] This embodiment deposits resin-containing ink with different droplet spacings into different light-emitting units, forming surface treatment layers with different properties. The larger the droplet spacing, the easier it is for gas to pass through when exposed to a gas atmosphere. This allows for simultaneous exposure treatment of different color light-emitting units of the same light-emitting device without relying on external devices, simply through surface treatment layers of different properties. This satisfies the surface treatment requirements of different light-emitting units, improves the surface treatment effect, and thus improves the efficiency and lifespan of the device.

[0053] In one embodiment, the average pore size of the second pore is 1 to 2 times the average pore size of the first pore; and / or the average pore size of the third pore is 3 to 4 times the average pore size of the first pore.

[0054] In a further embodiment, the average pore size of the first pore, the second pore, and the third pore increases sequentially.

[0055] In a specific embodiment, the average pore size of the first pore can be 21.17–63.5 μm; the average pore size of the second pore can be 21.17–127 μm; and the average pore size of the third pore can be 63.51–254 μm. (See also...) Figure 3 and Figure 4 , Figure 3 This is a schematic diagram of a surface treatment layer provided in an embodiment of this application. In the figure, a first surface treatment layer 152 is formed on the first light-emitting unit 110; a second surface treatment layer 152 is formed on the second light-emitting unit 120; and a third surface treatment layer 153 is formed on the third light-emitting unit 130. Figure 4 The diagram illustrates different droplet spacings on different light-emitting units. The first light-emitting unit 110 has a smaller droplet spacing, resulting in a denser droplet distribution and a correspondingly smaller first pore. The second light-emitting unit 120 has a larger droplet spacing than the first light-emitting unit 110, resulting in a sparser droplet distribution and a correspondingly larger second pore than the first pore. The third light-emitting unit 130 has a larger droplet spacing than the second light-emitting unit 120, resulting in even sparser droplets and a correspondingly larger third pore than the second pore. The sparser the droplets, the easier it is for gas to permeate through the surface treatment layer and perform surface treatment on the corresponding light-emitting unit.

[0056] Optionally, the average pore size of the first pore is selected from any one or a range formed by two of 21.17 μm, 25.4 μm, 31.75 μm, 42.33 μm, and 63.5 μm.

[0057] Optionally, the average pore size of the second pore is selected from any one or a range formed by two of the following: 21.17 μm, 25.4 μm, 31.75 μm, 42.33 μm, 50.8 μm, 62.5 μm, 82.66 μm, and 127 μm.

[0058] Optionally, the average pore size of the third pore is selected from any one or a range formed by two of the following: 63.51 μm, 76.2 μm, 95.25 μm, 101.6 μm, 127 μm, 169.32 μm, 190.5 μm, and 254 μm.

[0059] In this embodiment, since the spacing between ink droplets deposited on different light-emitting units is different, the average pore size of the prepared surface treatment layer is also different. When the gas atmosphere is exposed through the surface treatment layer with different average pore sizes, the gas concentration is also different, which can meet the requirement of simultaneous atmosphere exposure for different light-emitting units, improve the processing efficiency of the surface treatment layer of the light-emitting device, and thus improve the service life of the light-emitting device.

[0060] It is understandable that for surface treatment layers that use an ink droplet array, the spacing between ink droplets can be either consistent across all rows of ink or inconsistent across all rows of ink.

[0061] Specifically, for cases where the spacing between each line of ink is consistent, such as when there are 3 lines of ink droplets per unit area, each line contains 12 ink droplets, and the spacing between each pair of adjacent ink droplets is 21.17 μm.

[0062] For cases where the spacing between ink droplets in each row is inconsistent, for example, the number of rows of ink droplets per unit area can be 3, the number of ink droplets in the first row is 12, and the spacing between each adjacent ink droplet can be 21.17μm, the number of ink droplets in the second row is 10, and the spacing between each adjacent ink droplet can be 25.4μm, and the number of ink droplets in the third row is 8, and the spacing between each adjacent ink droplet can be 31.75μm.

[0063] In this embodiment, the number of ink droplets in the surface treatment layer area corresponding to different color light-emitting units is inconsistent (i.e., the ink droplet spacing is different). By controlling the ink droplet distribution density, the ink droplet distribution is made moderate, which is conducive to the effective surface treatment of different light-emitting units at the same time, improving the uniformity of local brightness of the device, improving the uniformity of surface light intensity of the device, improving the mixing effect of different color light and the accuracy of color of the device, and realizing the rich color performance of the device.

[0064] In some embodiments, at least two of the surface treatment layers, the second surface treatment layer 152, and the third surface treatment layer 153 have different surface uniformities, for example, one of them has a different surface uniformity than the other two, or all three have different surface uniformities.

[0065] In some embodiments, the surface uniformity of the first surface treatment layer 152, the second surface treatment layer 152, and the third surface treatment layer 153 decreases sequentially. Surface uniformity refers to the uniformity of the film thickness. The smaller the surface uniformity, the more conducive it is to gas permeation. Different surface uniformities can achieve control over the amount of surface treatment gas passing through different light-emitting units.

[0066] In a specific embodiment, the surface uniformity of the first surface treatment layer 152 is 95% to 100%; and / or, the surface uniformity of the second surface treatment layer 152 is 95% to 100%; and / or, the surface uniformity of the third surface treatment layer 153 is 95% to 100%.

[0067] In this embodiment, the surface uniformity is determined based on the error value of the surface uniformity of the film layer. Specifically, the maximum and minimum values ​​of the surface uniformity of the same film layer can be selected. The error value of the surface uniformity can be obtained by dividing the difference between the maximum and minimum values ​​by the sum of the maximum and minimum values. The smaller the error value, the more uniform the surface of the surface treatment layer.

[0068] In this embodiment, since the surface uniformity error of the surface treatment layer for different colors of light is less than 5%, on the one hand, the permeation control of exposed gas is achieved by different surface uniformities, and on the other hand, it can effectively prevent problems such as uneven brightness and color deviation in the device, thus ensuring the light-emitting effect of the device.

[0069] In some embodiments, see Figure 5 The first light-emitting unit 110 includes a first anode 111, a first light-emitting layer 114 and a first cathode 116 stacked together; the second light-emitting unit 120 includes a second anode 121, a second light-emitting layer 124 and a second cathode 126 stacked together; and the third light-emitting unit 130 includes a third anode 131, a third light-emitting layer 134 and a third cathode 136 stacked together.

[0070] The first surface treatment layer 152 is disposed above the first cathode 116, the second surface treatment layer 152 is disposed above the second cathode 126, and the third surface treatment layer 153 is disposed above the third cathode 136.

[0071] In some embodiments, the light-emitting device further includes a light extraction layer 140, which covers the first cathode 116, the second cathode 126 and the third cathode 136, and the first surface treatment layer 152, the second surface treatment layer 152 and the third surface treatment layer 153 are disposed on the light extraction layer 140.

[0072] In some embodiments, a first hole-functional layer is further provided between the first anode 111 and the first light-emitting layer 114, a second hole-functional layer is further provided between the second anode 121 and the second light-emitting layer 124, and a third hole-functional layer is further provided between the third anode 131 and the third light-emitting layer 134; the first hole-functional layer, the second hole-functional layer, and the third hole-functional layer each include at least one hole injection layer and a hole transport layer, for example... Figure 5The first hole functional layer includes a first hole injection layer 112 and a first hole transport layer 113, the second hole functional layer includes a second hole injection layer 122 and a second hole transport layer 123, and the third hole functional layer includes a third hole injection layer 132 and a third hole transport layer 133.

[0073] In some embodiments, a first electronic functional layer is further provided between the first cathode 116 and the first light-emitting layer 114, a second electronic functional layer is further provided between the second cathode 126 and the second light-emitting layer 124, and a third electronic functional layer is further provided between the third cathode 136 and the third light-emitting layer 134; the first electronic functional layer, the second electronic functional layer, and the third electronic functional layer each include at least one electron injection layer and an electron transport layer, for example... Figure 5 The first electronic functional layer includes a first electronic transport layer 115, the second electronic functional layer includes a second electronic transport layer 125, and the third electronic functional layer includes a third electronic transport layer 135.

[0074] In some embodiments, the first surface treatment layer 152, the second surface treatment layer 152 and the third surface treatment layer 153 are further provided with an encapsulation layer, the encapsulation layer comprising a first inorganic layer 160, an organic layer 170 and a second inorganic layer 180 stacked sequentially.

[0075] In some embodiments, the materials of the first anode 111, the second anode 121, the third anode 131, the first cathode 116, the second cathode 126, or the third cathode 136 are each independently selected from at least one of metallic materials, carbon materials, and metal oxides. The metallic materials include one or more of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb, and Mg; the carbon materials include one or more of graphite, carbon nanotubes, graphene, and carbon fibers; and the metal oxides include doped or undoped metal oxides. The compounds include one or more of ITO, FTO, ATO, AZO, GZO, IZO, MZO, and AMO, or include composite electrodes in which a metal is sandwiched between doped or undoped transparent metal oxides, wherein the composite electrode includes at least one of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2, and TiO2 / Al / TiO2.

[0076] In some embodiments, the materials of the hole injection layer and the hole transport layer are selected from at least one of TFB, CuPc, PVK, Poly-TPD, PFB, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT:PSS, T·APC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfides, transition metal tin compounds, doped graphene, undoped graphene, and C60.

[0077] In some embodiments, the materials of the first light-emitting layer 114, the second light-emitting layer 124, and the third light-emitting layer 134 are each selected from at least one of single-structure quantum dots and core-shell structure quantum dots, wherein the shell of the core-shell structure quantum dot comprises one or more layers; the materials of the single-structure quantum dots, the core material of the core-shell structure quantum dots, and the shell material of the core-shell structure quantum dots are each selected from at least one of group II-VI compounds, group IV-VI compounds, group III-V compounds, and group I-III-VI compounds, wherein group II-VI compounds include, but are not limited to, CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, and Zn One or more of O, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe, group IV-VI compounds include However, it is not limited to one or more of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, and SnPbSTe; III-V group compounds include, but are not limited to, GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, and AlN. One or more of P, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb, and group I-III-VI compounds including but not limited to at least one of CuInS2, CuInSe2, and AgInS2.

[0078] In some embodiments, the material of the electron transport layer is selected from inorganic or organic materials; the inorganic material is selected from one or more of the following: doped or undoped zinc oxide, barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin sulfide, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate; the doped elements include one or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium; the organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds.

[0079] In some embodiments, the material of the electron injection layer includes at least one of LiF, NaF, KF, CsF, RbF, LiF / Yb, CsN3, NaF / Yb, CsF / Yb, MgP, MgF2, Al2O3, Ga2O3, Cs2CO3, Rb2CO3, RbBr, and lithium tetrakis(8-hydroxyquinoline)boron (LiBq4).

[0080] In some embodiments, the materials of the first inorganic layer 160 and the second inorganic layer 180 are selected from at least one of silicon nitride, silicon oxynitride, silane, ammonia, and nitrous oxide.

[0081] In some embodiments, the material of the organic layer 170 is selected from at least one of polypropylene, polyacrylate, polyurethane acrylate, polyethylene, polystyrene, polysiloxane, polysilazane, and epoxy resin.

[0082] In the above embodiments, the light-emitting device can be a positive light-emitting device or an inverted light-emitting device, and the hole injection layer, hole transport layer, electron transport layer, light extraction layer, etc. are optional functional layers.

[0083] When the light-emitting device of this application embodiment is exposed to a gas atmosphere through a first surface treatment layer 152, a second surface treatment layer 152, and a third surface treatment layer 153 with different thicknesses, materials, pore sizes, and / or surface uniformities, it can meet the requirement of simultaneously processing three different color sub-pixels for gas atmosphere exposure, thereby enabling the light-emitting device to have higher performance.

[0084] This application provides a method for fabricating a light-emitting device, such as... Figure 6 As shown, the method includes the following steps S1 to S2:

[0085] S1. Provide a pre-fabricated light-emitting device, wherein the pre-fabricated light-emitting device includes a first light-emitting unit and a second light-emitting unit arranged in parallel;

[0086] S2. A first surface treatment layer is prepared on the first light-emitting unit, and a second surface treatment layer is prepared on the second light-emitting unit to obtain a light-emitting device; wherein, the first surface treatment layer has a plurality of first pores, the second surface treatment layer has a plurality of second pores, the average pore size of the first pores and the average pore size of the second pores are different, and this causes the gas flux of the first surface treatment layer and the second surface treatment layer to be different under the same gas exposure conditions.

[0087] In a further embodiment, see [reference] Figure 7 The method further includes:

[0088] S3. Expose the light-emitting device to a gaseous atmosphere.

[0089] In some embodiments, the pre-fabricated light-emitting device further includes a third light-emitting unit arranged in parallel with the first light-emitting unit and the second light-emitting unit; before obtaining the light-emitting device, the method further includes: preparing a third surface treatment layer on the third light-emitting unit; wherein the third surface treatment layer has a plurality of third pores, and the average pore size of the third pores is different from the average pore size of the first pores and the second pores, which makes the gas flux of the third surface treatment layer and the first surface treatment layer and the second surface treatment layer different under the same gas exposure conditions.

[0090] This embodiment obtains a light-emitting device by preparing surface treatment layers with different average pore sizes on different light-emitting units of the provided prefabricated light-emitting device. Since the gas flux of each surface treatment layer is different, the light-emitting device is exposed to a gas atmosphere for treatment. This allows for simultaneous surface treatment of different light-emitting units, which can improve the surface treatment effect of the light-emitting device, thereby improving the performance and service life of the light-emitting device.

[0091] In one embodiment, the peak emission wavelengths of the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit in step S1 are different, as can be found in the above-mentioned embodiments of the light-emitting device.

[0092] In one embodiment, preparing a first surface treatment layer on the first light-emitting unit includes: providing a first ink comprising a first resin material, depositing the first ink onto the first light-emitting unit at a first droplet spacing to obtain a first liquid film, and subjecting the first liquid film to light treatment to obtain the first surface treatment layer.

[0093] In one embodiment, preparing a second surface treatment layer on the second light-emitting unit includes: providing a second ink containing a second resin material, depositing the second ink onto the second light-emitting unit at a second droplet spacing to obtain a second liquid film, and subjecting the second liquid film to light treatment to obtain the second surface treatment layer.

[0094] In one embodiment, preparing a third surface treatment layer on the third light-emitting unit includes: providing a third ink containing a third resin material, depositing the third ink onto the third light-emitting unit at a set third droplet spacing to obtain a third liquid film, and subjecting the third liquid film to light treatment to obtain the third surface treatment layer.

[0095] The preset droplet spacing during the deposition of the first ink, the second ink, and the third ink is different, resulting in a different number of ink droplets per unit area in each surface treatment layer. After the ink droplets dry, they form pores with each other. Specifically, the first surface treatment layer has multiple first pores, the second surface treatment layer has multiple second pores, and the third surface treatment layer has multiple third pores. The average pore size of the first pores, the second pores, and the third pores is different. For details of each pore, please refer to the relevant embodiments of the above-mentioned light-emitting device.

[0096] In some embodiments, the resin materials in the first ink, the second ink, and the third ink are of different types; the resin materials are selected from acrylate resins, epoxy resins, polyethylene resins, polystyrene resins, polysiloxane resins, and polysilazane resins, and specific examples can be found in the relevant embodiments of the light-emitting devices described above.

[0097] In this embodiment, the surface treatment layer formed by the resin material can meet the requirements of atmospheric gas permeation during the subsequent exposure treatment in step S3.

[0098] In some embodiments, the above steps involve using an inkjet printing device to perform an inkjet printing process on organic ink according to a set procedure. After the organic ink droplets of the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit are completed, they are left to stand for a certain period of time, such as 180 seconds, to obtain the first liquid film corresponding to the first light-emitting unit, the second liquid film corresponding to the second light-emitting unit, and the third liquid film corresponding to the third light-emitting unit.

[0099] In one embodiment, the second droplet distribution density in the above steps is 1 to 2 times the first droplet distribution density; the third droplet distribution density is 3 to 4 times the first droplet distribution density. For details, please refer to the relevant embodiments of the above-mentioned light-emitting device.

[0100] In some embodiments, the phototreatment includes irradiating the first liquid film, the second liquid film, and the third liquid film with ultraviolet light to solidify the first liquid film, the second liquid film, and the third liquid film.

[0101] In a specific embodiment, the wavelength of the ultraviolet light irradiation is 285–395 nm.

[0102] Optionally, the wavelength of the ultraviolet light irradiation is selected from any one or a range formed by two of the following: 285nm, 295nm, 305nm, 315nm, 325nm, 335nm, 345nm, 355nm, 365nm, 375nm, 385nm, and 395nm.

[0103] In a specific embodiment, the ultraviolet light irradiation time is 20 to 120 seconds.

[0104] Optionally, the duration of the illumination is selected from any one or a range formed by two of the following: 20s, 30s, 40s, 50s, 60s, 70s, 80s, 90s, 100s, 110s, and 120s.

[0105] Under the aforementioned ultraviolet light irradiation conditions, the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer with high surface uniformity can be formed.

[0106] In this embodiment, ultraviolet light with a wavelength of 395nm can be preferably used to irradiate the first liquid film, the second liquid film and the third liquid film for 30s, so as to form a first surface treatment layer, a second surface treatment layer and a third surface treatment layer with high surface uniformity.

[0107] In one embodiment, in step S2, the thicknesses of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer are different. Optionally, the thicknesses of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer decrease sequentially. For details, please refer to the relevant embodiments of the light-emitting device described above.

[0108] In one embodiment, the gaseous atmosphere of the exposure treatment in step S3 contains at least one of oxygen and water vapor.

[0109] In a specific embodiment, the exposure humidity of the exposure treatment is 55%-95%.

[0110] Optionally, the exposure humidity is selected from any or a range formed by two of 55%, 60%, 65%, 70%, 75%, 80%, 85%, 90%, and 95%.

[0111] In a specific embodiment, the exposure temperature of the exposure treatment is 23–25°C.

[0112] Optionally, the temperature is selected from any one or a range formed by two of 23°C, 24°C, and 25°C.

[0113] In a specific embodiment, the exposure pressure of the exposure treatment is 0.02 to 0.05 MPa.

[0114] Optionally, the exposure pressure is selected from any one or a range formed by two of 0.02 MPa, 0.03 MPa, 0.04 MPa, and 0.05 MPa.

[0115] In a specific embodiment, the exposure time for the exposure treatment is 5 to 90 minutes.

[0116] Optionally, the exposure time is selected from 5 min, 10 min, 15 min, 20 min, 25 min, ...

[0117] 30min, 35min, 40min, 45min, 50min, 55min, 60min, 65min, 70min,

[0118] The range formed by any one or two of 75min, 80min, 85min, and 90min.

[0119] In this embodiment, because the first surface treatment layer is thicker, gas has more difficulty passing through. The second surface treatment layer is thinner than the first surface treatment layer, so gas passes through more easily. The third surface treatment layer is thinner than the light-emitting surface treatment layer, so gas passes through even more easily. This allows the surface treatment layer to be exposed to a gas atmosphere in the subsequent process, enabling the processing of three different colored pixels simultaneously based on the surface treatment layer with different colored light, thereby improving the processing efficiency of the surface treatment layer.

[0120] In some embodiments, at least two of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer have different surface uniformities. Specifically, the surface uniformity of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer obtained in the above embodiments is 95%-100%, as detailed in the relevant embodiments of the light-emitting device described above.

[0121] like Figure 8As shown, it illustrates the atmospheric gas permeation of different surface treatment layers during the exposure treatment via the gas supply device 200 in step S3. Specifically, the first surface treatment layer 151, the second surface treatment layer 152, and the third surface treatment layer 153 correspond to the first light-emitting unit 110, the second light-emitting unit 120, and the third light-emitting unit 130 on the substrate 100, respectively. The dashed arrows in the first surface treatment layer 151, the second surface treatment layer 152, and the third surface treatment layer 153 represent the paths through which the gas atmosphere provided by the gas supply device 200 acts on the first light-emitting unit 110, the second light-emitting unit 120, and the third light-emitting unit 130, respectively. The number of dashed arrows represents the gas concentration through which the gas permeates. For example, at the microscopic level, because the ink droplet distribution density deposited on the first light-emitting unit 110 is relatively large, the corresponding first surface treatment layer 151 has a thicker film and smaller pores, resulting in fewer gas permeation paths. The ink droplet distribution density deposited on the second light-emitting unit 120 is smaller than that of the first light-emitting unit 110, resulting in a thinner film of the corresponding second surface treatment layer 152 with slightly increased pores, resulting in more gas permeation paths compared to the first surface treatment layer 151. The ink droplet distribution density deposited on the third light-emitting unit 130 is smaller than that of the second light-emitting unit 120, resulting in a thinner film of the corresponding third surface treatment layer 153 with larger pores, resulting in more gas permeation paths compared to the second surface treatment layer 152.

[0122] In this embodiment, the first surface treatment layer 151, the second surface treatment layer 152, and the third surface treatment layer 153, which correspond to different regions of the first light-emitting unit 110, the second light-emitting unit 120, and the third light-emitting unit 130, can simultaneously perform atmospheric exposure process treatment on the surface treatment layer of the light-emitting device for the three-color light-emitting device, thereby improving the processing efficiency of the light-emitting device and ensuring the normal service life of the light-emitting device.

[0123] In some embodiments, the first light-emitting unit includes a first anode, a first light-emitting layer, and a first cathode stacked together; the second light-emitting unit includes a second anode, a second light-emitting layer, and a second cathode stacked together; and the third light-emitting unit includes a third anode, a third light-emitting layer, and a third cathode stacked together. The first surface treatment layer is disposed above the first cathode, the second surface treatment layer is disposed above the second cathode, and the third surface treatment layer is disposed above the third cathode. For details, please refer to the relevant embodiments of the light-emitting device described above.

[0124] In a specific embodiment, the first light-emitting layer, the second light-emitting layer, and the third light-emitting layer are quantum dot light-emitting layers of different colors, such as a quantum dot red light-emitting layer, a quantum dot green light-emitting layer, and a quantum dot blue light-emitting layer, respectively.

[0125] In some embodiments, after the step of exposing the light-emitting device to a gas atmosphere, the method further includes: forming an encapsulation layer on the stacked structure of the light-emitting device. Optionally, forming the encapsulation layer includes: sequentially preparing a first inorganic layer, an organic layer, and a second inorganic layer on the stacked structure of the light-emitting device.

[0126] In this embodiment, by forming an encapsulation layer, the resulting light-emitting device further includes an encapsulation layer disposed on the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer. The encapsulation layer comprises a first inorganic layer, an organic layer, and a second inorganic layer stacked sequentially. In this embodiment, by preparing the encapsulation layer, the integrity of the surface treatment layer can be better guaranteed, further ensuring the service life of the light-emitting device.

[0127] In some embodiments, the pre-fabricated light-emitting device further includes a light extraction layer disposed on the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit; the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer are prepared on the light extraction layer; the method further includes, before preparing the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer, the method further includes preparing the light extraction layer on the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit.

[0128] Accordingly, the step of preparing a first surface treatment layer, a second surface treatment layer, and a third surface treatment layer on the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit respectively includes: preparing a first surface treatment layer, a second surface treatment layer, and a third surface treatment layer on the light extraction layer corresponding to the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit respectively.

[0129] In a specific embodiment, the light extraction layer is an IZO film layer deposited by organic vapor deposition or by vacuum sputtering.

[0130] In this embodiment, by preparing a light extraction layer encapsulation layer, the resulting light-emitting device includes a light extraction layer, which is disposed on the light-emitting side of the light-emitting device. The first surface treatment layer, the second surface treatment layer, and the third surface treatment layer are disposed on the light extraction layer.

[0131] In this specific embodiment, the film thickness of the first inorganic layer and the second inorganic layer is between 700 and 1000 nm.

[0132] Optionally, the film thickness of the first inorganic layer and the second inorganic layer can be selected from any one or a range of 700, 750, 800, 850, 900, 950, 1000 nm.

[0133] In some embodiments, the materials of the first inorganic layer and the second inorganic layer are selected from at least one of silicon nitride, silicon oxynitride, silane, ammonia, and nitrous oxide.

[0134] In this specific embodiment, the thickness of the organic layer is between 4 and 16 μm.

[0135] Optionally, the thickness of the organic layer can be selected from any one or a combination of 4, 6, 8, 10, 12, 14, and 16 μm.

[0136] The materials of the film layers in the various embodiments of the above-described light-emitting device fabrication method can be referred to the relevant embodiments of the above-described light-emitting device.

[0137] In this embodiment, when exposing the light-emitting device to a gas atmosphere, the gas concentrations are different when exposing the device to a gas atmosphere through the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer. This satisfies the requirement of exposing the device to a gas atmosphere for processing three different color sub-pixels simultaneously. It also avoids using external devices for surface treatment of the light-emitting device, improving the surface treatment efficiency of the device. Furthermore, the first inorganic layer, the organic layer, and the second inorganic layer enable complete encapsulation of the light-emitting device, thereby ensuring that the lifespan of the device is not affected.

[0138] The above scheme will be further explained below with reference to specific embodiments. Taking the fabrication of an upright quantum dot light-emitting device as an example, the fabricated light-emitting device, from bottom to top, consists of a substrate, an anode, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, a cathode, a light extraction layer, a surface treatment layer (including a red light surface treatment layer, a green light surface treatment layer, and a blue light surface treatment layer), a first inorganic layer, an organic layer, and a second inorganic layer. Specifically, the preferred embodiments of the present invention are detailed below:

[0139] Example 1

[0140] Step 1: Fabricate printed QLED devices on a glass substrate or flexible substrate. The hole injection layer, hole transport layer, light-emitting layer and electron transport layer can be fabricated using inkjet printing technology. The light-emitting layer includes a quantum dot red light-emitting layer, a quantum dot green light-emitting layer and a quantum dot blue light-emitting layer, forming a first light-emitting unit, a second light-emitting unit and a third light-emitting unit.

[0141] Step 2: Fabricate a cathode metal layer on the electron transport layer using a vapor deposition process, and fabricate a light extraction layer on the cathode metal layer using a vapor deposition process or a sputtering process.

[0142] Step 3: Surface treatment layers are fabricated for the quantum dot red light-emitting layer, quantum dot green light-emitting layer, and quantum dot blue light-emitting layer, respectively. Specifically, inkjet printing technology is used to fabricate a red light surface treatment layer with a thickness of 10nm and a surface uniformity of 97%, a green light surface treatment layer with a thickness of 8nm and a surface uniformity of 96%, and a blue light surface treatment layer with a thickness of 6nm and a surface uniformity of 95% on the light extraction layer.

[0143] Step 4: Perform a gas atmosphere exposure process, for example, expose the light-emitting device for 30 minutes in a water vapor environment with an exposure humidity of 55%, an exposure temperature of 25°C, and an exposure pressure of 0.05 MPa.

[0144] Step 5: Using chemical vapor deposition, a first inorganic layer with a thickness of 800 nm is formed on the surface treatment layer.

[0145] Step 6: Prepare an organic layer on the first inorganic layer using inkjet printing technology, with the organic layer having a thickness of 8 μm;

[0146] Step 7: Using chemical vapor deposition, a second inorganic film layer is fabricated on the organic layer. The inorganic film layer can be silicon nitride, and the film layer thickness is 800 nm.

[0147] Example 2

[0148] The difference from Example 1 is as follows:

[0149] Step 4: Expose the light-emitting device for 60 minutes under the conditions of exposure humidity of 75%, exposure temperature of 23℃, and exposure pressure of 0.02Mpa.

[0150] Comparative Example 1

[0151] The difference from Example 1 is that no surface treatment layer was made in this comparative example.

[0152] Experimental testing and analysis: The red efficiency (Cd / A), green efficiency (Cd / A), and blue efficiency (Cd / A) of the light-emitting devices prepared in Example 1 and Comparative Example 1 were tested using IVL testing equipment, and the LT95 lifetime of the light-emitting devices at 1000 nits was tested using lifetime aging equipment. The test results are shown in Table 1.

[0153] Comparative Example 2

[0154] The difference from Example 1 is that the thickness of the surface treatment layer corresponding to the first light-emitting unit, the second light-emitting unit and the third light-emitting unit in this comparative example is 6nm.

[0155] Comparative Example 3

[0156] The difference from Example 1 is that the surface uniformity of the red light surface treatment layer in this comparative example is 92%, the surface uniformity of the green light surface treatment layer is 91%, and the uniformity of the blue light surface treatment layer is 90%.

[0157] Table 1

[0158]

[0159] Referring to Table 1, compared to Comparative Example 1, Embodiments 1 and 2 of this application add a surface treatment layer. Furthermore, when exposing the light-emitting device to a gas atmosphere, the gas atmosphere varies depending on the thickness of the surface treatment layer. This satisfies the requirement for simultaneous processing of red, green, and blue sub-pixels during gas atmosphere exposure, improving the surface treatment efficiency of the light-emitting device. Even after adjusting the exposure conditions during exposure, the device's performance remains superior to the device without a surface treatment layer. Comparative Example 1 and Embodiments 1 and 2 show that, under otherwise unchanged conditions, the device with the added surface treatment layer is more efficient than the device without it. Further, comparing the red lifetime (H), green lifetime (H), and blue lifetime (H) LT95 lifetime @ 1000 nits of Comparative Example 1 and Embodiment 1 shows that, under otherwise unchanged conditions, the device with the added surface treatment layer has a longer lifetime than the device without it. Finally, the light-emitting device is fully encapsulated, ensuring that its lifespan remains unaffected.

[0160] Referring to Table 1, compared to Comparative Example 2, the efficiency of each light-emitting unit in Embodiment 1 of this application is higher. However, the efficiency of the first light-emitting unit (corresponding to the red light-emitting layer) and the third light-emitting unit (corresponding to the blue light-emitting layer) in Comparative Example 2 is significantly lower than that in Embodiment 1. It can be seen that by using surface treatment layers of different thicknesses for different light-emitting units, the efficiency of the light-emitting device can be improved.

[0161] Referring to Table 1, compared to Comparative Example 3, the surface uniformity error of Embodiment 1 of this application is controlled within 5%, which can effectively prevent problems such as uneven brightness and color deviation in the device, and ensure the light emission effect of the device. Through the red efficiency (Cd / A), green efficiency (Cd / A) and blue efficiency (Cd / A) of Comparative Example 3 and Embodiment 1, it can be seen that, under the condition that other conditions remain unchanged, the device with a surface uniformity error of less than 5% has better efficiency than the device with a surface uniformity error of greater than 5%. Furthermore, through the red lifetime (H), green lifetime (H) and blue lifetime (H) LT95 lifetime@1000nit of Comparative Example 3 and Embodiment 1, it can be seen that, under the condition that other conditions remain unchanged, the lifetime of the device with a surface uniformity error of less than 5% is better than the lifetime of the device with a surface uniformity error of greater than 5%.

[0162] This application also provides a display device, which includes the light-emitting device described in the above embodiments or the light-emitting device prepared by the light-emitting device preparation method described in the above embodiments, and has the corresponding technical effects.

[0163] Obviously, the embodiments described above are only some embodiments of this application, not all embodiments. The accompanying drawings show preferred embodiments of this application, but do not limit the patent scope of this application. This application can be implemented in many different forms; rather, the purpose of providing these embodiments is to provide a more thorough and comprehensive understanding of the disclosure of this application. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing specific embodiments, or make equivalent substitutions for some of the technical features. Any equivalent structures made using the content of this application's specification and drawings, directly or indirectly applied to other related technical fields, are similarly within the scope of patent protection of this application.

Claims

1. A light-emitting device, characterized in that, Includes a first light-emitting unit and a second light-emitting unit arranged side by side; The first light-emitting unit is provided with a first surface treatment layer, and the second light-emitting unit is provided with a second surface treatment layer; the first surface treatment layer has a plurality of first pores, and the second surface treatment layer has a plurality of second pores, wherein the average pore size of the first pores and the average pore size of the second pores are different.

2. The light-emitting device as described in claim 1, characterized in that, The first surface treatment layer and the second surface treatment layer have different thicknesses; and / or, The material of the first surface treatment layer includes a first resin material, and the material of the second surface treatment layer includes a second resin material; and / or, The light-emitting device further includes a third light-emitting unit arranged in parallel with the first light-emitting unit and the second light-emitting unit. The surface of the third light-emitting unit is provided with a third surface treatment layer. The third surface treatment layer has a plurality of third pores. The average pore size of the third pores is different from the average pore size of the first pores and the second pores.

3. The light-emitting device as described in claim 2, characterized in that, The average pore size of the second pore is 1 to 2 times the average pore size of the first pore; and / or, The average pore size of the third pore is 3 to 4 times the average pore size of the first pore; and / or, The thickness of the first surface treatment layer is 1 to 2 times the thickness of the second surface treatment layer; and / or, The thickness of the first surface treatment layer is 3 to 4 times the thickness of the third surface treatment layer; and / or, At least two of the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit have different emission peak wavelengths.

4. The light-emitting device as described in claim 3, characterized in that, The thicknesses of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer decrease sequentially; and / or, The third surface treatment layer has multiple third pores, with the size of the first pore, the second pore, and the third pore increasing sequentially.

5. The light-emitting device as described in claim 3 or 4, characterized in that, The thickness of the first surface treatment layer is 8–10 μm; and / or, The thickness of the second surface treatment layer is 6–8 μm, and / or, The thickness of the third surface treatment layer is 4–6 μm; and / or, The average pore size of the first pore is 21.17–63.5 μm; and / or, The average pore size of the second pore is 21.17–127 μm; and / or, The average pore size of the third pore is 63.51–254 μm; and / or, The peak emission wavelength of the first light-emitting unit is 650–670 nm; and / or, The peak emission wavelength of the second light-emitting unit is 530–550 nm; and / or, The peak wavelength of the third light-emitting unit is 430–450 nm.

6. The light-emitting device as described in claim 5, characterized in that, The material of the third surface treatment layer includes a third resin material; The first resin material, the second resin material, and the third resin material are each independently selected from at least one of acrylate resins, epoxy resins, polyethylene resins, polystyrene resins, polysiloxane resins, and polysilazane resins; wherein the acrylate resin is selected from at least one of polypropylene, polyacrylate, and polyurethane acrylate; and the epoxy resin is selected from at least one of bisphenol A type epoxy resin, bisphenol F type epoxy resin, polyphenol type glycidyl ether epoxy resin, aliphatic glycidyl ether epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, epoxidized olefin compounds, heterocyclic type, and mixed type epoxy resins.

7. The light-emitting device as described in claim 2, characterized in that, The first light-emitting unit includes a first anode, a first light-emitting layer, and a first cathode stacked together; the second light-emitting unit includes a second anode, a second light-emitting layer, and a second cathode stacked together; and the third light-emitting unit includes a third anode, a third light-emitting layer, and a third cathode stacked together. The first surface treatment layer is disposed above the first cathode, the second surface treatment layer is disposed above the second cathode, and the third surface treatment layer is disposed above the third cathode.

8. The light-emitting device as described in claim 7, characterized in that, The light-emitting device further includes a light extraction layer, which covers the first cathode, the second cathode, and the third cathode, and the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer are disposed on the light extraction layer; and / or A first hole-functional layer is further provided between the first anode and the first light-emitting layer; a second hole-functional layer is further provided between the second anode and the second light-emitting layer; and a third hole-functional layer is further provided between the third anode and the third light-emitting layer; each of the first, second, and third hole-functional layers includes at least one hole injection layer and a hole transport layer; and / or, A first electronic functional layer is further provided between the first cathode and the first light-emitting layer; a second electronic functional layer is further provided between the second cathode and the second light-emitting layer; and a third electronic functional layer is further provided between the third cathode and the third light-emitting layer; each of the first, second, and third electronic functional layers includes at least one electron injection layer and an electron transport layer; and / or, An encapsulation layer is further provided on the first surface treatment layer, the second surface treatment layer and the third surface treatment layer, the encapsulation layer comprising a first inorganic layer, an organic layer and a second inorganic layer stacked in sequence.

9. The light-emitting device according to claim 8, characterized in that, The materials of the first anode, the second anode, the third anode, the first cathode, the second cathode, or the third cathode are each independently selected from at least one of metallic materials, carbon materials, and metal oxides. The metallic materials include one or more of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb, and Mg. The carbon materials include one or more of graphite, carbon nanotubes, graphene, and carbon fibers. The metal oxides include doped or undoped metal oxides, and the doped metal oxides include ITO, FTO, and ATO. One or more of AZO, GZO, IZO, MZO, and AMO, or a composite electrode comprising a metal sandwiched between doped or undoped transparent metal oxides, wherein the composite electrode comprises at least one of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2, and TiO2 / Al / TiO2; and / or, The materials of the hole injection layer and the hole transport layer are respectively selected from at least one of TFB, CuPc, PVK, Poly-TPD, PFB, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT:PSS, T·APC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfides, transition metal tin compounds, doped graphene, undoped graphene, and C60; and / or, The materials of the first, second, and third light-emitting layers are each selected from at least one of single-structure quantum dots and core-shell quantum dots. The shell of the core-shell quantum dot includes one or more layers. The materials of the single-structure quantum dots, the core material of the core-shell quantum dots, and the shell material of the core-shell quantum dots are each selected from at least one of group II-VI compounds, group IV-VI compounds, group III-V compounds, and group I-III-VI compounds. Among them, group II-VI compounds include, but are not limited to, CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, and HgT. One or more of the following: e, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe; and group IV-VI compounds, including but not limited to SnS, S... One or more of the following: nSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, and SnPbSTe; III-V compounds including, but not limited to, GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, and AlNAs. One or more of the following compounds: AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb; and group I-III-VI compounds, including but not limited to at least one of CuInS2, CuInSe2, and AgInS2; and / or, The material of the electron transport layer is selected from inorganic or organic materials; the inorganic material is selected from one or more of the following: doped or undoped zinc oxide, barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin sulfide, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate; the doped elements include one or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium; the organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds; and / or, The electron injection layer is made of at least one of LiF, NaF, KF, CsF, RbF, LiF / Yb, CsN3, NaF / Yb, CsF / Yb, MgP, MgF2, Al2O3, Ga2O3, Cs2CO3, Rb2CO3, RbBr, and lithium tetrakis(8-hydroxyquinoline)boron (LiBq4); and / or, The materials of the first inorganic layer and the second inorganic layer are selected from at least one of silicon nitride, silicon oxynitride, silane, ammonia, and nitrous oxide; and / or, The material of the organic layer is selected from at least one of polypropylene, polyacrylate, polyurethane acrylate, polyethylene, polystyrene, polysiloxane, polysilazane, and epoxy resin.

10. A method for fabricating a light-emitting device, characterized in that, The method includes: A prefabricated light-emitting device is provided, the prefabricated light-emitting device comprising a first light-emitting unit and a second light-emitting unit arranged in parallel; A first surface treatment layer is prepared on the first light-emitting unit, and a second surface treatment layer is prepared on the second light-emitting unit to obtain a light-emitting device; wherein the first surface treatment layer has a plurality of first pores, the second surface treatment layer has a plurality of second pores, and the average pore size of the first pores and the average pore size of the second pores are different.

11. The method for fabricating a light-emitting device as described in claim 10, characterized in that, The first surface treatment layer and the second surface treatment layer have different thicknesses; and / or, The surface uniformity of the first surface treatment layer and the second surface treatment layer is different; and / or, The pre-fabricated light-emitting device further includes a third light-emitting unit arranged parallel to the first light-emitting unit and the second light-emitting unit; before obtaining the light-emitting device, the method further includes: preparing a third surface treatment layer on the third light-emitting unit; wherein the third surface treatment layer has a plurality of third pores, and the average pore size of the third pores is different from the average pore size of the first pores and the second pores; and / or, The method further includes: providing the light-emitting device and exposing the light-emitting device to a gaseous atmosphere.

12. The method for fabricating a light-emitting device as described in claim 11, characterized in that, The average pore size of the second pore is 1 to 2 times the average pore size of the first pore; and / or, The average pore size of the third pore is 3 to 4 times the average pore size of the first pore; and / or, The thickness of the first surface treatment layer is 1 to 2 times the thickness of the second surface treatment layer; and / or, The thickness of the first surface treatment layer is 3 to 4 times the thickness of the third surface treatment layer; and / or; At least two of the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit have different emission peak wavelengths.

13. The method for fabricating a light-emitting device as described in claim 12, characterized in that, in, The thicknesses of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer decrease sequentially; and / or, The third surface treatment layer has a plurality of third pores, wherein the average pore size of the first pore, the second pore, and the third pore increases sequentially; and / or, The surface uniformity of the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer decreases sequentially.

14. The method for fabricating a light-emitting device as described in claim 12 or 13, characterized in that, Includes at least one of the following features: (1) The thickness of the first surface treatment layer is 8 to 10 μm; (2) The thickness of the second surface treatment layer is 6-8 μm; (3) The thickness of the third surface treatment layer is 4 to 6 μm; (4) The average pore size of the first pore is 21.17–63.5 μm; (5) The average pore size of the second pore is 21.17–127 μm; (6) The average pore size of the third pore is 63.51–254 μm; (7) The peak wavelength of the first light-emitting unit is 650-670nm, and / or the peak wavelength of the second light-emitting unit is 530-550nm, and / or the peak wavelength of the third light-emitting unit is 430-450nm.

15. The method for fabricating a light-emitting device according to any one of claims 11 to 13, characterized in that, Preparing a first surface treatment layer on the first light-emitting unit includes: providing a first ink comprising a first resin material; depositing the first ink onto the first light-emitting unit at a first droplet spacing to obtain a first liquid film; and subjecting the first liquid film to light irradiation treatment to obtain the first surface treatment layer; and / or, Preparing a second surface treatment layer on the second light-emitting unit includes: providing a second ink comprising a second resin material; depositing the second ink onto the second light-emitting unit at a second droplet spacing to obtain a second liquid film; and subjecting the second liquid film to light irradiation to obtain the second surface treatment layer; and / or, The preparation of the third surface treatment layer on the third light-emitting unit includes: providing a third ink containing a third resin material, depositing the third ink onto the third light-emitting unit at a set third droplet spacing to obtain a third liquid film, and subjecting the third liquid film to light treatment to obtain the third surface treatment layer.

16. The method for fabricating a light-emitting device as described in claim 15, characterized in that, Includes at least one of the following features: (1) The first resin material, the second resin material, and the third resin material are each independently selected from at least two of acrylate resins, epoxy resins, polyethylene resins, polystyrene resins, polysiloxane resins, and polysilazane resins; wherein the acrylate resin is selected from at least one of polypropylene, polyacrylate, and polyurethane acrylate; and the epoxy resin is selected from at least one of bisphenol A type epoxy resin, bisphenol F type epoxy resin, polyphenol type glycidyl ether epoxy resin, aliphatic glycidyl ether epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, epoxidized olefin compounds, heterocyclic type, and mixed type epoxy resins. (2) The light treatment uses ultraviolet light irradiation, the wavelength of the ultraviolet light irradiation is 285-395nm, and / or the time of the ultraviolet light irradiation is 20-120s; The gaseous atmosphere contains at least one of oxygen and water vapor; (3) The humidity in the gas atmosphere is 55% to 95%; (4) The temperature of the exposure treatment is 23-25℃; (5) The pressure of the exposure treatment is 0.02 to 0.05 MPa; (6) The exposure treatment time is 5 to 90 minutes.

17. The method for fabricating a light-emitting device according to claim 11, characterized in that, After the step of exposing the light-emitting device to a gas atmosphere, the method further includes: forming an encapsulation layer on the stacked structure of the light-emitting device; optionally, forming the encapsulation layer includes: sequentially preparing a first inorganic layer, an organic layer, and a second inorganic layer on the stacked structure of the light-emitting device; and / or, The pre-fabricated light-emitting device further includes a light extraction layer, which is disposed on the first light-emitting unit, the second light-emitting unit, and the third light-emitting unit; the first surface treatment layer, the second surface treatment layer, and the third surface treatment layer are prepared on the light extraction layer.

18. A display device, characterized in that, The display device includes the light-emitting device according to any one of claims 1 to 9 or the light-emitting device prepared by the light-emitting device preparation method according to any one of claims 10 to 17.

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