Particle beam gate structure and beam gate control device

Abstract

The invention relates to the technical field of beam gates, and discloses a particle beam gate structure and a beam gate control device.The particle beam gate structure comprises a first polar plate group, a second polar plate group, a third polar plate group and a Faraday cage which are sequentially arranged; the first polar plate group is provided with a first electric field operation area for deflecting the electron beam; the second polar plate group is provided with a second electric field operation area and is used for reversely deflecting the electron beams passing through the first electric field operation area; the third polar plate group is provided with a first space and a third electric field operation area, the first space and the third electric field operation area are oppositely arranged, no electric field is arranged in the first space, and the third electric field operation area is used for deflecting a high-energy electron beam. The first polar plate group and the second polar plate group enable the low-energy electron beam to be incident to the Faraday cage after being subjected to two times of inclined deflection; the high-energy electron beam is incident to the Faraday cage after being deflected for three times, so that the problem that electron beams with different energies cannot be deflected by the beam brake under the same voltage in the existing design is effectively solved.

Description

Technical Field

[0001] This invention relates to the field of beam control technology, specifically to a particle beam beam control structure and beam control device. Background Technology

[0002] In precision instruments such as particle beam lithography and scanning electron microscopes, the beam gate is a core component for rapidly controlling the on / off state of incident ions or electron beams. Its main function is to deflect the electron beam from the main optical path to a specific area when needed by applying a controllable voltage, so as to avoid irradiating the sample surface; while maintaining a neutral state when there is no need to block the movement of particles, allowing charged particles to pass smoothly along their original trajectory.

[0003] In existing designs, to ensure sufficient electrostatic field strength for a large deflection angle under the same voltage, a high potential difference between the gate electrodes is required. When the electron energy is low and the same deflection target needs to be met, if a high-voltage gate potential is continued to be used, the electrostatic field may excessively affect the weak current, causing low-energy particles to directly collide with the plates due to excessive lateral displacement. The Faraday cylinder cannot effectively collect the electron flow signal, resulting in distorted measurement data, increased errors, and in extreme cases, damage to the device.

[0004] While high voltage can enhance the electrostatic field strength to achieve particle deflection at a greater angle, it may lead to excessive lateral displacement or direct collision with the electrode for low-energy electrons. Conversely, if the operating potential is reduced, the strong current under high voltage acceleration may not be effectively collected due to insufficient deflection. Summary of the Invention

[0005] This invention provides a particle beam gantler structure and gantler control device to solve the problem that existing gantler designs cannot deflect high-energy and low-energy particle beams under the same voltage.

[0006] In a first aspect, the present invention provides a particle beam gating structure, comprising:

[0007] The first electrode group, the second electrode group, the third electrode group, and the Faraday cage are arranged sequentially. The first electrode assembly has a first electric field operating region for deflecting the electron beam; The second electrode assembly has a second electric field operating region for reversing the electron beam passing through the first electric field operating region; The third electrode assembly has a first space and a third electric field operating area. The first space and the third electric field operating area are arranged opposite to each other. No electric field is set in the first space. The first space is used for low-energy electron beams to pass through directly. The third electric field operating area is used to deflect high-energy electron beams. When the first electrode group, the second electrode group, and the third electrode group are all set to the same voltage, the low-energy electron beam is tilted and deflected in the first electric field operating region, enters the second electric field operating region, tilts and deflects in the opposite direction, passes through the first space, and enters the Faraday cage. After being deflected in the first electric field operating region, the high-energy electron beam is deflected in the opposite direction in the second electric field operating region, and then deflected again in the third electric field operating region before entering the Faraday cage.

[0008] Beneficial effects: Under the same voltage, the particle beam gating structure of the present invention allows the low-energy electron beam to pass through the first space and enter the Faraday cage after being tilted and deflected twice by the first and second electrode groups; the third electrode group allows the low-energy electron beam to pass through without interference while applying deflection to the high-energy electron beam, ensuring that the high-energy electron beam is accurately incident on the Faraday cage.

[0009] In one alternative embodiment, the first electrode group includes a pair of first deflection electrodes disposed opposite to each other, with a first electric field operating area between the two first deflection electrodes.

[0010] Beneficial effects: The first electric field operating area formed by the first deflection electrodes arranged at relatively intervals can precisely control the initial deflection angle of the electron beam, thereby improving the accuracy and stability of the entire particle beam gate structure in controlling the electron beam.

[0011] In one alternative embodiment, the second electrode assembly includes a pair of second deflection electrodes disposed opposite to each other, with a second electric field operating region between the two second deflection electrodes, and a reverse potential applied to the second electric field operating region.

[0012] Beneficial effects: The second deflecting electrodes arranged at relative intervals in the second electrode group form a second electric field operating region with a reverse potential, which forms a reverse electric field with the first electric field operating region of the first electrode group. This allows the low-energy electron beam to pass through the first space after two tilting deflections, avoiding direct impact on the electrode plates, thereby protecting the particle beam gating structure and ensuring the stable transmission of the electron beam.

[0013] In one alternative implementation, the width of the second electric field operating area is greater than the width of the first electric field operating area.

[0014] Beneficial effects: By setting the width of the second electric field operating area to be greater than that of the first electric field operating area, the low-energy electron beam can be deflected at a larger angle after passing through the first electric field operating area. The wider second electric field operating area can provide sufficient reverse deflection space for the deflected low-energy electron beam, ensuring that the low-energy electron beam can smoothly reverse tilt and deflect through the first space into the Faraday cage, avoiding electron beam collision with the electrode plate due to insufficient space.

[0015] In one optional embodiment, the third electrode assembly includes: two first separators and two separation electrodes, with the two separation electrodes spaced apart to form the third electric field operating area; the two first separators spaced apart to form the first space.

[0016] Beneficial effects: The third electrode assembly uses two first separators and two separate electrode components. The third electric field operating area deflects the high-energy electron beam, while the low-energy electron beam passes directly through the first space.

[0017] In one alternative embodiment, the length of the third electrode group along the electron beam extension direction is greater than the lengths of the first electrode group and the second electrode group.

[0018] Beneficial effect: The third electrode assembly is set to a longer length along the extension direction of the electron beam, which can provide a more sufficient deflection path for the high-energy electron beam, ensuring that it is accurately incident into the Faraday cage after three deflections.

[0019] In one optional embodiment, the first electrode group and the second electrode group are fixedly connected by a first insulating member; the second electrode group and the third electrode group are fixedly connected by a second insulating member; and the third electrode group and the Faraday cage are connected by a third insulating member.

[0020] Beneficial effects: The first, second, and third electrode groups are fixed together as a whole by the first, second, and third insulating components, respectively. At the same time, the first, second, and third insulating components effectively prevent potential interference between different electrode groups.

[0021] In one optional embodiment, the third insulating member is provided with a clearance through hole, one end of which is connected to the first space and the third electric field operating area, and the other end is connected to the Faraday cage.

[0022] Beneficial effect: The clearance through hole provided on the third insulating component provides a path for the transmission of the electron beam from the third electrode group to the Faraday cage, ensuring that the electron beam can enter the Faraday cage for collection.

[0023] In one alternative implementation, the diameter of the clearance through-hole gradually increases as it extends from the third electric field operating region toward the Faraday cage.

[0024] Beneficial effects: The design of gradually increasing diameter of the avoidance through-hole reduces the collision of the electron beam within the avoidance through-hole during the transmission of the electron beam from the third electric field operating region to the Faraday cage, thereby reducing the energy loss of the electron beam.

[0025] In a second aspect, the present invention also provides a beam gate control device, comprising: a controller, wherein the controller is electrically connected to the particle beam beam gate structure described in any one of the above-mentioned embodiments; The controller is connected to the positive and negative poles of the two first deflection plates of the first electrode group, respectively. The second electrode group is located below the first electrode group. The controller is connected to the positive and negative terminals of the two second deflection plates of the second electrode group, respectively. The potential of the two second deflection plates is opposite to the potential of the two first deflection plates. The third electrode group is located below the second electrode group, and the controller is connected to the positive and negative terminals respectively with the two separate electrode components of the third electrode group; The first electrode group, the second electrode group, and the third electrode group use the same voltage; The controller is disconnected when deflection is not required; When deflection is required, the controller path, the low-energy electron beam is tilted and deflected in the first electric field operating area, enters the second electric field operating area, tilts and deflects in the opposite direction, passes through the first space, and enters the Faraday cage; After being deflected in the first electric field operating region, the high-energy electron beam is deflected in the opposite direction in the second electric field operating region, and then deflected again in the third electric field operating region before entering the Faraday cage.

[0026] Beneficial effects: By precisely controlling the voltage of each electrode group through the controller, different deflection processes are applied to high-energy and low-energy electron beams under the same voltage. When deflection is not required, the controller is open, and there is no electric field acting on each electrode group, allowing the electron beam to propagate along its original path. When deflection is required, the controller is closed, and each electrode group generates a corresponding electric field. The low-energy electron beam enters the Faraday cage after two tilting deflections, while the high-energy electron beam is precisely incident on the Faraday cage after three deflections. This effectively solves the problem in existing designs where the beam gate cannot deflect electron beams of different energies under the same voltage. Attached Figure Description

[0027] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0028] Figure 1 The working principle of electron beam deflection in existing designs; Figure 2 A perspective view of a particle beam girder structure provided for this embodiment; Figure 3for Figure 2 Exploded view of the particle beam gate structure in the image; Figure 4 for Figure 3 A top view of the particle beam gate structure in the image; Figure 5 for Figure 4 AA section view in the middle; Figure 6 for Figure 2 A top view of the particle beam gate structure in the image; Figure 7 for Figure 6 BB section view in the middle; Figure 8 for Figure 7 A schematic diagram of the path of the high-energy electron beam in the image; Figure 9 for Figure 7 A schematic diagram of the path of the low-energy electron beam in the image; Figure 10 for Figure 6 CC section view in the middle; Figure 11 for Figure 10 A schematic diagram of the path of the high-energy electron beam in the image; Figure 12 for Figure 10 A schematic diagram of the path of the low-energy electron beam in the image; Figure 13 for Figure 1 A schematic diagram of the distribution of the 1-30KV electron beam within the Faraday cage.

[0029] Explanation of reference numerals in the attached figures: 1. First electrode plate group; 2. Second electrode plate group; 3. Third electrode plate group; 4. Faraday cage; 5. Perforation; 6. First space; 7. First deflecting electrode; 8. Second deflecting electrode; 9. First separator; E1. First electric field operating area; E2. Second electric field operating area; E3. Third electric field operating area; 10. Separating electrode; 11. First insulating component; 12. Second insulating component; 13. Third insulating component; 14. Boss; 15. First plug-in plate; 16. Second plug-in plate; 17. Third plug-in plate; 18. Fourth plug-in plate; 19. Clearance through hole. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0031] like Figure 1 The diagram shown illustrates the working principle of the beam gate in this embodiment. The deflection angle θ of the electron beam after entering the beam gate electrode can be calculated using the following formula:

[0032] Where: L - length of the gate electrode plate; D - Spacing between gate plates; V D - Voltage between plates; V ACC - Electron beam acceleration at extremely high pressure.

[0033] The above formulas represent the basic principle of beam shutter operation. Therefore, beam shutter design involves striking a balance between electro-optical requirements, mechanical space constraints, and high-voltage electrical engineering. Generally, due to the overall design of the lens barrel, the electrode length L cannot be too long or D too large. A smaller electrode spacing D helps reduce the maximum electrode voltage but can easily cause problems such as breakdown and electron beam obstruction.

[0034] Electron beam accelerating extremely high voltage V ACC The range is typically quite large. To ensure the deflection of high-energy electron beams, a high beam gate voltage D is required. However, at this voltage, low-energy electron beams will be directly deflected to the beam gate and cannot enter the Faraday cage. Similarly, if the plate voltage is low, it ensures that low-energy electron beams are deflected to the Faraday cage, but high-energy electron beams cannot reach the Faraday cage due to the small deflection angle.

[0035] Therefore, if the beam gate needs to deflect both high-energy and low-energy electron beams, then the electron beam acceleration extremely high voltage V... ACC The voltage V between the plates needs to be changed at any time. D This requires changing the voltage of the electrical supply, but frequent voltage changes increase the complexity of the power supply system and may cause voltage fluctuations, leading to the malfunction of the beam deflector. Therefore, a beam deflector needs to be designed that can deflect both low-energy and high-energy electron beams at the same voltage.

[0036] The following is combined Figures 2 to 12 The following describes embodiments of the present invention.

[0037] like Figure 2 , Figure 3As shown, according to an embodiment of the present invention, in one aspect, a particle beam gating structure is provided, comprising a first electrode group 1, a second electrode group 2, a third electrode group 3, and a Faraday cage 4 arranged sequentially. The Faraday cage 4 has a perforation 5. When deflection is not required, the electron beam passes sequentially through the first electrode group 1, the second electrode group 2, and the third electrode group 3, and exits from the perforation 5 of the Faraday cage 4. Specifically, the first electrode group 1 has a first electric field operating region E1 for deflecting the electron beam; the second electrode group 2 has a second electric field operating region E2 for reversing the deflection of the electron beam passing through the first electric field operating region E1; the third electrode group 3 has a first space 6 and a third electric field operating region E3, which are arranged opposite to each other. No electric field is set in the first space 6, which is used for low-energy electron beams to pass through directly, and the third electric field operating region E3 is used for deflecting high-energy electron beams.

[0038] When deflection is required, the first electrode group 1, the second electrode group 2, and the third electrode group 3 are all set to the same voltage.

[0039] When the low-energy electron beam passes sequentially through the first electrode group 1, the second electrode group 2, and the third electrode group 3 from one end of the particle beam gate structure, it is tilted and deflected in the first electric field operating region E1. Since the deflection angle of the low-energy electron beam in the first electric field operating region E1 is large, in order to ensure that the low-energy electron beam enters the Faraday cage 4 smoothly, it needs to enter the second electric field operating region E2, tilt and deflect in the opposite direction, pass through the first space 6 of the third electrode group 3, and enter the Faraday cage 4. At this time, the low-energy electron beam cannot be emitted from the perforation 5 of the Faraday cage 4.

[0040] When the high-energy electron beam passes sequentially through the first electrode group 1, the second electrode group 2, and the third electrode group 3 from one end of the particle beam gating structure, it is deflected in the first electric field operating region E1 and then deflected in the opposite direction in the second electric field operating region E2. Since the deflection angle of the high-energy electron beam is small after passing through the first electric field operating region E1 and the second electric field operating region E2, it is necessary to make the high-energy electron beam deflected again when entering the third electric field operating region E3 to ensure that it can enter the Faraday cage 4.

[0041] Specifically, the deflection direction of the first electric field operating region E1 is the same as that of the third electric field operating region E3, both of which cause the electron beam to deflect outward along the radial direction of the particle beam gating structure. The second electric field operating region E2 causes the electron beam to deflect inward along the radial direction of the particle beam gating structure.

[0042] In the particle beam gating structure of the present invention, under the same voltage, the first electrode group 1 and the second electrode group 2 allow the low-energy electron beam to pass through the first space 6 and enter the Faraday cage 4 after being tilted and deflected twice. The third electrode group 3 allows the low-energy electron beam to pass through without interference while applying deflection to the high-energy electron beam, ensuring that the high-energy electron beam is accurately incident on the Faraday cage 4.

[0043] like Figure 4 , Figure 5 As shown, in this embodiment, the first electrode group 1 includes a pair of relatively spaced first deflection electrodes 7, with a first electric field operating region E1 between the two first deflection electrodes 7. The two first deflection electrodes 7 are respectively connected to the positive and negative electrodes, and their connection method is a conventional design, which will not be described in detail in this embodiment. The first electric field operating region E1 formed by the relatively spaced first deflection electrodes 7 can precisely control the initial deflection angle of the electron beam, deflecting low-energy electron beams significantly and high-energy electron beams slightly. It should be noted that, as an alternative implementation, the shape of the first deflection electrodes 7 can be designed according to actual needs, such as being rectangular or circular, as long as a stable and uniform first electric field operating region E1 is formed between the two first deflection electrodes 7. Furthermore, the spacing between the two first deflection electrodes 7 also needs to be adjusted according to the characteristics of the electron beam and the required deflection angle.

[0044] Specifically, the two first deflection plates 7 have vertical planes facing each other, and a threaded hole for connecting voltage is provided at the end of the first deflection plate 7 away from the vertical plane.

[0045] like Figure 4 , Figure 5 , Figure 6 , Figure 7 As shown, in this embodiment, the second electrode group 2 includes a pair of second deflecting electrodes 8 arranged at intervals. A second electric field operating region E2 is located between the two second deflecting electrodes 8, and a reverse potential is applied to the second electric field operating region E2. The structure of the second deflecting electrodes 8 is the same as that of the first deflecting electrodes 7. The two second deflecting electrodes 8 are positioned directly below the two first deflecting electrodes 7, and are spaced apart from each other. The positive and negative connections of the two second deflecting electrodes 8 are opposite to those of the first deflecting electrodes 7; that is, one first deflecting electrode 7 is connected to the positive electrode, and the second deflecting electrode 8 below it is the negative electrode; the other first deflecting electrode 7 is connected to the negative electrode, and the second deflecting electrode 8 below it is the positive electrode. The second electric field operating region E2 and the first electric field operating region E1 form a reverse electric field, thereby achieving two-stage tilt deflection control of the electron beam. After two tilting deflections, the low-energy electron beam passes through the first space 6, avoiding direct impact with the electrode plates, thus protecting the particle beam gate structure and ensuring stable electron beam transmission. Simultaneously, the reverse potential has a smaller deflection amount for the high-energy electron beam, allowing it to enter the third electric field operating region E3 of the third electrode group 3. It should be noted that, as an alternative implementation, the second deflecting electrode 8 can also be designed in different shapes, such as rectangular or circular, to meet the requirements of the second electric field operating region E2 in different application scenarios.

[0046] like Figure 7 As shown, in this embodiment, the width of the second electric field operating area E2 is greater than the width of the first electric field operating area E1. Width refers to the distance between the opposing surfaces of the two second deflecting electrodes 8 or the opposing surfaces of the first deflecting electrodes 7. Specifically, the vertical plane of the second deflecting electrode 8 connected to the positive electrode is aligned vertically with the vertical plane of the first deflecting electrode 7 directly above it; the end face of the second deflecting electrode 8 connected to the negative electrode is a certain distance smaller than the vertical plane of the first deflecting electrode 7 directly above it, thus ensuring that the width of the second electric field operating area E2 is greater than the width of the first electric field operating area E1. A low-energy or high-energy electron beam enters the particle beam gate structure and is deflected towards the first deflection electrode 7 at the positive electrode. Due to the larger width of the second electric field operating region E2, the low-energy electron beam undergoes a larger deflection angle after passing through the first electric field operating region E1. The wider second electric field operating region E2 provides sufficient reverse deflection space for the deflected low-energy electron beam, ensuring it can smoothly reverse-angle and deflect through the first space 6 into the Faraday cage 4, avoiding electron beam collisions with the electrode plates due to insufficient space. It should be noted that, as an alternative implementation, the width ratio of the first electric field operating region E1 and the second electric field operating region E2 can be adjusted according to actual needs to meet the deflection requirements of electron beams of different energies. For example, when processing higher-energy electron beams, the width of the second electric field operating region E2 can be appropriately increased to ensure the electron beam receives sufficient reverse deflection space.

[0047] like Figure 3 As shown, in this embodiment, the third electrode assembly 3 includes two first separators 9 and two separation electrodes 10. A third electric field operating region E3 is formed between the two separation electrodes 10 at intervals; the two first separators 9 are also arranged at intervals to form a first space 6, which refers to the gap between the two first separators 9. Specifically, the first separators 9 and the separation electrodes 10 have the same shape, and the two first separators 9 and the two separation electrodes 10 are arranged in a circumferential array. The two separation electrodes 10 are positioned directly below the second deflector plate of the positive electrode. After being deflected by the second deflector plate, the high-energy electron beam enters the third electric field operating region E3 between the two separation electrodes 10. The third electrode assembly 3 uses two first separators 9 and two separation electrodes 10. The third electric field operating region E3 deflects the high-energy electron beam, while the low-energy electron beam passes directly through the first space 6. It should be noted that, as an alternative implementation, the first separator 9 may be omitted, and only two separating electrode components 10 may be provided. After the low-energy electron beam is deflected by the first electrode group 1 and the second electrode group 2, it can directly enter the Faraday cage 4. In this case, the first space 6 is the space in which the third electrode group 3 avoids the passage of the low-energy electron beam.

[0048] like Figure 5As shown, in this embodiment, the length of the third electrode group 3 along the electron beam extension direction is greater than the length of the first electrode group 1 and the second electrode group 2. For high-energy electron beams, the first electrode group 1 and the second electrode group 2 deflect the high-energy electron beam at a relatively small angle, which may prevent the high-energy electron beam from entering the Faraday cage 4. By setting a longer third electrode group 3, a more sufficient deflection path can be provided for the high-energy electron beam, ensuring that it accurately enters the Faraday cage 4 after three deflections. Specifically, the extension direction of the electron beam refers to the direction in which the electron beam extends from the first electrode group 1 toward the perforation 5 of the Faraday cage 4 without deflection. It should be noted that, as an alternative implementation, the length of the third electrode group 3 can also be set to be equal to the length of the first electrode group 1 and the second electrode group 2. In this case, multiple sets of third electrode groups 3 need to be set so that the high-energy electron beam can still accurately enter the Faraday cage 4 after multiple deflections.

[0049] like Figure 2 , Figure 5 , Figure 7 As shown, in this embodiment, the first electrode group 1 and the second electrode group 2 are fixedly connected by a first insulating member 11. The second electrode group 2 and the third electrode group 3 are fixedly connected by a second insulating member 12. The third electrode group 3 and the Faraday cage 4 are connected by a third insulating member 13. Specifically, the first electrode group 1, the second electrode group 2, and the third electrode group 3 are made of titanium, and the first insulating member 11, the second insulating member 12, and the third insulating member 13 are made of ceramic. Each insulating member and each electrode group are bonded and fixed together by vacuum adhesive. Specifically, the Faraday cage 4 has a radially outwardly extending boss 14 at one end near the third insulating member 13. The boss 14 abuts against the end face of the third insulating member 13, and an insulating fastener passes through the boss 14 and is threadedly connected to the third insulating member 13. The fastener can be a nylon screw, and three fasteners are provided. After installation, the particle beam gate structure is cylindrical. The first electrode group 1, the second electrode group 2, and the third electrode group 3 are fixed together as a whole by the first insulating component 11, the second insulating component 12, and the third insulating component 13, respectively. Simultaneously, the first insulating component 11, the second insulating component 12, and the third insulating component 13 effectively prevent potential interference between different electrode groups. It should be noted that, as an alternative implementation, the first insulating component 11, the second insulating component 12, and the third insulating component 13 can also be made of other materials with good insulation properties, as long as the requirements for preventing potential interference are met. Furthermore, the materials for each electrode group can also be metal materials with good conductivity and a certain mechanical strength, such as copper and aluminum. In addition to nylon screws, plastic bolts can also be used as fasteners.

[0050] Specifically, the first insulating element 11 is a circular ring. Two sets of first insertion plates 15 are respectively provided on the upper and lower end faces along the axial direction of the first insulating element 11. Each set of first insertion plates 15 has two symmetrically arranged at both ends of the first insulating element 11. The first insertion plates 15 are arc-shaped, with an outer diameter smaller than the outer diameter of the first insulating element 11, and an inner diameter equal to the inner diameter of the first insulating element 11. A first insertion groove is provided on the first deflection plate, which can be inserted between the two first insertion plates 15. After insertion, vacuum adhesive is used to fix them.

[0051] The second insulating element 12 is also an annular ring. A second insertion plate 16 is symmetrically arranged on the side of the second insulating element 12 facing the first insulating element 11. The outer diameter of the second insertion plate 16 is equal to the outer diameter of the second insulating element 12, and the inner diameter of the second insertion plate 16 is equal to the outer diameter of the first insertion plate 15. During installation, the second deflector plate is inserted between the two second insertion plates 16. Then, the first insertion plate 15 at the lower end of the first insulating element 11 is aligned with the second insertion plate 16, and after insertion, vacuum adhesive is used to fix it, ensuring a stable connection between the first electrode group 1 and the second electrode group 2.

[0052] The third insulating element 13 is a ring. The axes of the first insulating element 11, the second insulating element 12, and the third insulating element 13 are collinear, and the outer diameters of the first insulating element 11, the second insulating element 12, and the third insulating element 13 are equal. A third plug-in plate 17 and a fourth plug-in plate 18 are provided on the end face of the third insulating element 13 facing the second insulating element 12. The two third plug-in plates 17 are symmetrically arranged with respect to the center of the third insulating element 13, and the two fourth plug-in plates 18 are symmetrically arranged with respect to the center of the third insulating element 13, and the third plug-in plates 17 and the fourth plug-in plates 18 are staggered. The width of the fourth plug-in plate 18 is greater than the width of the third plug-in plate 17. Specifically, two separating electrode elements 10 are symmetrically arranged on both sides of one of the fourth plug-in plates 18. Two separators are symmetrically arranged on both sides of the other fourth plug-in plate 18. Because the fourth plug-in plate 18 is wider, the width of the first space 6 and the third electric field operating area E3 is also wider, which can better accommodate the transmission requirements of the electron beam. Meanwhile, the third plug-in plate 17 and the fourth plug-in plate 18 on the third insulating member 13 provide mounting positions for the separating electrode member 10 and the separator, thereby achieving the fixation of the separating electrode member 10 and the separator.

[0053] like Figure 7As shown, in this embodiment, the third insulating member 13 is provided with a clearance through hole 19. One end of the clearance through hole 19 communicates with the first space 6 and the third electric field operating area E3, and the other end communicates with the Faraday cage 4. The clearance through hole 19 is a circular hole, and its diameter gradually increases as it extends from the third electric field operating area E3 toward the Faraday cage 4. The clearance through hole 19 provided on the third insulating member 13 provides a path for the transmission of the electron beam from the third electrode group 3 to the Faraday cage 4, ensuring that the electron beam can enter the Faraday cage 4 for collection. It should be noted that, as an alternative implementation, the clearance through hole 19 can also be set as a circular hole with a diameter equal to the inner diameter of the Faraday cage 4.

[0054] Secondly, the present invention also provides a beam gate control device, comprising: a controller electrically connected to the aforementioned particle beam gate structure. The controller is connected to the positive and negative terminals of two first deflection electrodes 7 of the first electrode group 1, respectively. The second electrode group 2 is located below the first electrode group 1, and the controller is connected to the positive and negative terminals of two second deflection electrodes 8 of the second electrode group 2, respectively, with the potential of the two second deflection electrodes 8 being opposite to the potential of the two first deflection electrodes 7; the third electrode group 3 is located below the second electrode group 2, and the controller is connected to the positive and negative terminals of two separate electrode components 10 of the third electrode group 3, respectively; the first electrode group 1, the second electrode group 2, and the third electrode group 3 use the same voltage; When deflection is not required, the controller is disconnected. At this time, there is no potential difference between the plate groups in the particle beam gate structure. The electron beam passes directly through the area between the plate groups in a straight line, unaffected by the electric field, and is emitted from the perforation 5 of the Faraday cage 4.

[0055] When deflection is required, such as Figure 8 , Figure 9 , Figure 10 , Figure 11 , Figure 12 As shown, in the controller circuit, the low-energy electron beam is tilted and deflected in the first electric field operating region E1, then enters the second electric field operating region E2, and after being tilted and deflected in the opposite direction, passes through the first space 6 and enters the Faraday cage 4. The high-energy electron beam is deflected in the first electric field operating region E1, then deflected in the opposite direction in the second electric field operating region E2, and after being deflected again in the third electric field operating region E3, it enters the Faraday cage 4. The controller precisely controls the voltage of each electrode group, achieving different deflection treatments for high-energy and low-energy electron beams under the same voltage. When deflection is not needed, the controller is open, and there is no electric field effect on the electrode groups; the electron beam propagates along its original path. When deflection is needed, the controller is open, and each electrode group generates a corresponding electric field. The low-energy electron beam enters the Faraday cage 4 after two tilting deflections, and the high-energy electron beam is incident on the Faraday cage 4 after three deflections. This effectively solves the problem in existing designs where the beam gate cannot deflect electron beams of different energies under the same voltage.

[0056] Specifically, the particle beam gating structure of this application is used in particle beam lithography or scanning electron microscope systems to rapidly control the on / off state of electron beams with a wide range of energies (1-30KV). Typically, the particle beam gating structure of this application contains only one type of electron beam, which, after deflection, appears as a single point within the Faraday cage 4. The distribution of electron beams of different energies within the Faraday cage 4 is as follows: Figure 13 As shown, specifically, due to the large deflection angle, the low-energy electron beam forms a point relatively close to the edge within the Faraday cage 4; while the high-energy electron beam has a small deflection angle, forming a point relatively close to the center within the Faraday cage 4. This means that when needed, the particle beam can be quickly and precisely cut off, preventing it from reaching the sample; and when needed, the particle beam can be quickly and precisely restored to irradiate the sample.

[0057] Although embodiments of the invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the invention, and all such modifications and variations fall within the scope defined by the appended claims.

Claims

1. A particle beam gating structure, characterized in that, include: The first electrode group (1), the second electrode group (2), the third electrode group (3) and the Faraday cage (4) are arranged in sequence. The first electrode assembly (1) has a first electric field operating region (E1) for deflecting the electron beam; The second electrode assembly (2) has a second electric field operating region (E2) for reversing the electron beam that has passed through the first electric field operating region (E1); The third electrode assembly (3) has a first space (6) and a third electric field operating area (E3). The first space (6) and the third electric field operating area (E3) are arranged opposite to each other. No electric field is set in the first space (6). The first space (6) is used for low-energy electron beams to pass through directly. The third electric field operating area (E3) is used to deflect high-energy electron beams. When the first electrode group (1), the second electrode group (2), and the third electrode group (3) are all set to the same voltage, the low-energy electron beam is tilted and deflected in the first electric field operating region (E1), then enters the second electric field operating region (E2), and after being tilted and deflected in the opposite direction through the first space (6), it enters the Faraday cage (4). After the high-energy electron beam is deflected in the first electric field operating region (E1), it is deflected in the opposite direction in the second electric field operating region (E2), and after being deflected again in the third electric field operating region (E3), it enters the Faraday cage (4).

2. The particle beam gating structure according to claim 1, characterized in that, The first electrode assembly (1) includes a pair of first deflection electrodes (7) arranged at a relative interval, with a first electric field operating area (E1) between the two first deflection electrodes (7).

3. The particle beam gating structure according to claim 2, characterized in that, The second electrode assembly (2) includes a pair of second deflection plates (8) arranged at an angle to each other, with a second electric field operating region (E2) between the two second deflection plates (8), and a reverse potential applied to the second electric field operating region (E2).

4. The particle beam gating structure according to claim 3, characterized in that, The width of the second electric field working area (E2) is greater than the width of the first electric field working area (E1).

5. The particle beam gating structure according to any one of claims 1-4, characterized in that, The third electrode assembly (3) includes: two first separators (9) and two separation electrodes (10), with the two separation electrodes (10) spaced apart to form the third electric field operating area (E3); the two first separators (9) spaced apart to form the first space (6).

6. The particle beam gating structure according to any one of claims 1-4, characterized in that, The length of the third electrode group (3) along the electron beam extension direction is greater than the lengths of the first electrode group (1) and the second electrode group (2).

7. The particle beam gating structure according to any one of claims 1 to 4, characterized in that, The first electrode group (1) and the second electrode group (2) are fixedly connected by a first insulating member (11); the second electrode group (2) and the third electrode group (3) are fixedly connected by a second insulating member (12); the third electrode group (3) and the Faraday cage (4) are connected by a third insulating member (13).

8. The particle beam gating structure according to claim 7, characterized in that, The third insulating component (13) is provided with a clearance through hole (19), one end of which is connected to the first space (6) and the third electric field operating area (E3), and the other end is connected to the Faraday cage (4).

9. The particle beam gating structure according to claim 8, characterized in that, As the clearance through-hole (19) extends from the third electric field operating area (E3) toward the Faraday cage (4), its diameter gradually increases.

10. A brake control device, characterized in that, The controller is electrically connected to the particle beam girder structure described in any one of claims 1-9; The controller is connected to the positive and negative poles of the two first deflection plates (7) of the first pole plate group (1), respectively; The second electrode group (2) is located below the first electrode group (1). The controller is connected to the positive and negative terminals of the two second deflection plates (8) of the second electrode group (2) respectively. The potential of the two second deflection plates (8) is opposite to the potential of the two first deflection plates (7). The third electrode group (3) is located below the second electrode group (2), and the controller is connected to the positive and negative electrodes of the two separate electrode components (10) of the third electrode group (3) respectively. The first electrode group (1), the second electrode group (2), and the third electrode group (3) use the same voltage; The controller is disconnected when deflection is not required; When deflection is required, the controller path, the low-energy electron beam is tilted and deflected in the first electric field operating region (E1), enters the second electric field operating region (E2), and after being tilted and deflected in the opposite direction through the first space (6), enters the Faraday cage (4). After the high-energy electron beam is deflected in the first electric field operating region (E1), it is deflected in the opposite direction in the second electric field operating region (E2), and after being deflected again in the third electric field operating region (E3), it enters the Faraday cage (4).

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