Compositions and optoelectronic devices
CN122103829APending Publication Date: 2026-05-29SHENZHEN TCL HIGH TECH DEVELOPMENT CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHENZHEN TCL HIGH TECH DEVELOPMENT CO LTD
- Filing Date
- 2024-11-27
- Publication Date
- 2026-05-29
AI Technical Summary
Technical Problem
The number of defect states in metal oxides varies with environmental conditions, resulting in poor performance stability and affecting the performance of optoelectronic devices.
Method used
A composition comprising metal oxides and polymer materials is used, wherein the polymer materials can passivate the defect states of the metal oxides, and a functional layer is prepared by a film-forming process to reduce the number of defect states.
Benefits of technology
It improves the performance stability of metal oxides and the optoelectronic performance of optoelectronic devices, and enhances the surface flatness and optimizes interface defects of the devices.
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Smart Images
Figure CN122103829A_ABST
Abstract
The application discloses a composition and a photoelectric device, the composition comprises a metal oxide and at least one polymer, the polymer can passivate defect states of the metal oxide, effectively reduce the number of defect states of the metal oxide, and improve the performance stability of the metal oxide, and the composition can be used for preparing the photoelectric device, and is beneficial to improving photoelectric performance and performance stability of the photoelectric device.
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