Beam energy degrading device for ion implantation and method of use thereof

Abstract

The application discloses a beam energy reduction device for ion implantation and relates to the field of beam energy reduction. The beam energy reduction device for ion implantation comprises a transition frame, a wedge-shaped energy reducer, a beam measurement transmission line, a beam detection system, a connecting frame, an adjusting part, a monitoring device and a control part. The beam energy reduction device for ion implantation is designed with a wedge-shaped energy reducer with a right-angled triangle cross section, which is installed at the bottom of the output end of an analyzing magnet. The energy reducer realizes passive correction of the energy dispersive beam through the thickness gradient of the energy reducer. The ions with higher energy are weakly deflected due to the dispersion effect of the magnet, can pass through the thicker area of the energy reducer, and have more energy loss. The ions with lower energy have a larger deflection amplitude and only pass through the thinner area, so that the energy loss is less. The process can effectively compress the original energy distribution range of the beam, and significantly improve the energy uniformity and monodispersity of the extracted beam.

Description

Technical Field

[0001] This invention relates to the field of beam de-energization, and particularly to a beam de-energization device for ion implantation and its method of use. Background Technology

[0002] The beam is composed of particles such as electrons and protons and can be focused to the micro-nano scale. It is generated through steps such as initial particle supply, electric field acceleration, and magnetic field focusing. Its applications cover fields such as high-energy particle collision research of basic particles and ion beam injection to control semiconductors.

[0003] Ion implantation, a crucial core process in semiconductor manufacturing, places stringent requirements on beam quality. From an energy perspective, energy uniformity must be ensured. Uniformly energized ions can precisely control the implantation depth when implanting into silicon wafers, which is essential for constructing the intricate microstructures within the chip. The uniformity of the beam directly determines the ion distribution density on the silicon wafer surface. However, in reality, when the beam passes through an analytical magnet, dispersion occurs due to the magnetic field, disrupting the energy uniformity of the ion beam. Ions with varying energies implanted into the silicon wafer lead to inconsistent junction depths, severely impacting the chip's electrical performance. Furthermore, substandard beam uniformity can cause imbalances in doping concentration in localized areas of the chip, resulting in abnormal circuit functions or even complete chip failure, posing a significant threat to the quality and reliability of semiconductor products. Summary of the Invention

[0004] The purpose of this invention is to provide a beam de-energizing device for ion implantation to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a beam de-energizing device for ion implantation comprising: A transition frame, in which wedge-shaped energy degraders are installed; A beam measurement transmission line, one end of which is inserted into the right end of a wedge-shaped energy degrader, and the other end of which is equipped with a beam current detection system; A connecting frame is fixedly connected to a transition frame. An adjusting component is provided on the connecting frame, and the adjusting component is used to adjust the angle of the output end of the analytical magnet. A monitoring device is respectively installed above the end of the wedge-shaped energy depletor. The monitoring device is used to detect and analyze the positional relationship between the magnet output end and the wedge-shaped energy depletor. The control component is communicatively connected to the monitoring device. When the difference in the monitoring device value is greater than the threshold H1, the control component issues an alarm and drives the regulating component to move.

[0006] The transition frame includes a first transition frame and a second transition frame. A first mounting frame is fixedly connected to the upper end of the first transition frame, and a second mounting frame is fixedly connected to the bottom of the second transition frame. The first mounting frame and the second mounting frame abut against each other. A first sealing ring and a second sealing ring are fixedly connected to the inner walls of the first mounting frame and the second mounting frame, respectively. The wedge-shaped energy reducer is snapped between the first mounting frame, the second mounting frame, the first sealing ring, and the second sealing ring.

[0007] A second mounting plate is provided on the outer wall of the first transition frame, a sealing element is provided on the first mounting frame, the beam measurement transmission line abuts against the sealing element, an interlocking block is fixedly connected to the inner wall of the second mounting frame, a first mounting plate is fixedly connected to the outer wall of the second transition frame, a first fixing ear is fixedly connected to the inner wall of the second transition frame, and a fixing bolt is threadedly connected between the connecting frame and the first fixing ear.

[0008] The adjusting element includes; A fixed frame, which is fixedly connected to the connecting frame; A flexible adjustment component, which is fixedly connected to the fixed frame; An adjustment frame is fixedly connected to a flexible adjustment component. A second fixing ear and a third mounting plate are fixedly connected to the inner wall of the adjustment frame. The second fixing ear is used to connect the output end of the analytical magnet. The first electric actuator is mounted on the first mounting plate; The adjusting claw has its bottom fixedly connected to the output end of the first electric push rod, and its upper end is fixedly connected to the bottom of the adjusting frame.

[0009] The right end of the wedge-shaped energy degrader is provided with an interlock slot and a wiring socket. The interlock block is engaged in the interlock slot, and one end of the beam measurement transmission line is inserted into the wiring socket.

[0010] Both the first transition frame and the second transition frame are equipped with a vacuum detection device. The vacuum detection device is used to detect the airtightness of the device. The vacuum detection device includes a first vacuum pump, a second vacuum pump, a first pressure gauge, and a second pressure gauge. The first vacuum pump and the first pressure gauge are installed on the front of the first transition frame, and the second vacuum pump and the second pressure gauge are installed on the front of the second transition frame.

[0011] The monitoring device includes a first displacement sensor and a second displacement sensor, which are respectively installed on the bottom of the third mounting plate, with the detection ends of the first displacement sensor and the second displacement sensor facing the upper surface of the wedge-shaped energy reducer.

[0012] A protective box is provided at the right end of the transition frame, and the beam detection system is installed inside the protective box. The beam detection system performs real-time online monitoring of the beam correction. The beam detection system includes: The signal amplifier and converter performs current-to-voltage conversion and primary amplification, and one end of the beam-sensing transmission line is connected to the signal amplifier and converter. The main amplifier is mounted on the signal amplification and conversion device, and a data transmission line is connected between the main amplifier and the signal amplification and conversion device. The main amplifier optimizes the amplified signal. A data acquisition card is installed on the main amplifier, and the main amplifier is electrically connected to the data acquisition card. The data acquisition card is used to digitize the analog voltage signal and transmit it to the computer.

[0013] A quick-release component is provided between the first transition frame and the second transition frame. The quick-release component is used to quickly replace the wedge-shaped energy reducer. The quick-release component includes: The second electric actuator is mounted on the second mounting plate; The connector is fixedly connected between the output end of the second electric push rod and the second mounting frame.

[0014] A method of using a beam de-energizing device for ion implantation includes the following steps: Step 1: When using this device, first install the analytical magnet at the top and the collecting device at the bottom. Then, separate the first mounting frame and the second mounting frame using the quick-release mechanism. Place the wedge-shaped energy degrader in the first mounting frame and connect the wedge-shaped energy degrader to the beam detection system through the beam measurement transmission line. Finally, restore the first mounting frame and the second mounting frame using the quick-release mechanism. At this time, the first mounting frame, the second mounting frame, the first sealing ring, and the second sealing ring seal the wedge-shaped energy degrader. Step 2: After the wedge-shaped energy degrader is installed, the vacuum detection device tests the sealing performance of the beam energy degrader. The first and second vacuum pumps operate simultaneously, and there is a certain difference in the vacuum volume drawn by the first and second vacuum pumps. After standing for a period of time, the staff checks the pressure gauges. If the readings of the two pressure gauges are similar and the total pressure remains unchanged, it indicates that the sealing performance of the wedge-shaped energy degrader is not up to standard. If the readings of the two pressure gauges are significantly different and the total pressure decreases, it indicates that the sealing performance of the transition frame is not up to standard, and the component with substandard sealing performance needs to be replaced. If the readings of the two pressure gauges are significantly different and the total pressure remains unchanged, it indicates that the sealing performance of the device meets the standard. Then, the monitoring device monitors the positional relationship between the output end of the analytical magnet and the upper surface of the wedge-shaped energy degrader. If the difference between the first displacement sensor and the second displacement sensor is greater than the threshold H1, it indicates that the output end of the analytical magnet and the upper surface of the wedge-shaped energy degrader are not parallel. The control component sends a command to the adjustment component for adjustment. If the difference between the first displacement sensor and the second displacement sensor is less than the threshold H1, it indicates that the adjustment is in place. Step 3: After completing the above checks, the dispersive beam can be corrected using a beam de-energizing device for ion implantation. During the correction process, the beam detection system monitors the beam in real time.

[0015] The technical effects and advantages of this invention are as follows: 1. This beam de-energizing device for ion implantation features a wedge-shaped de-energizer with a right-angled triangular cross-section, which is installed at the bottom of the output end of an analytical magnet. The de-energizer passively corrects the energy-dispersive beam through its own thickness gradient. Higher-energy ions, due to the magnetic dispersion, are weakly deflected and pass through the thicker region of the de-energizer, resulting in greater energy loss. Lower-energy ions, on the other hand, are deflected more significantly and pass through the thinner region with less energy loss. This process effectively compresses the original energy distribution range of the beam, significantly improving the energy uniformity and monoenergeticity of the extracted beam. The device requires no additional high-frequency or magnetic field adjustment components, has a compact structure, and can be widely adapted to scenarios with high energy consistency requirements, such as ion implantation, microbeam fabrication, and accelerator experimental terminals.

[0016] 2. This beam reduction device for ion implantation uses a transition frame that is easy to open and close to fix the wedge-shaped energy reducer. It can replace the wedge-shaped energy reducer with different thicknesses as required. The angle of the output end of the analytical magnet is adjusted by the monitoring device and the adjustment component to ensure that the output end of the analytical magnet is strictly parallel to the upper surface of the wedge-shaped energy reducer, thereby ensuring the beam correction effect. At the same time, the beam detection system monitors the beam in real time during the beam correction process. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram of the second electric push rod structure of the present invention; Figure 3 This is a schematic diagram of the flexible adjustment component structure of the present invention; Figure 4 This is a schematic diagram of the displacement sensor structure of the present invention; Figure 5 This is a schematic diagram of the first transition frame structure of the present invention; Figure 6 This is a schematic diagram of the second transition frame structure of the present invention; Figure 7 This is a schematic diagram of the wedge-shaped energy reducer structure of the present invention; Figure 8 This is a schematic diagram of the beam-measuring transmission line structure of the present invention; Figure 9 This is a tree flowchart of the method of using the present invention; Figure 10 This is a tree-like flowchart of the correction and detection process of this invention.

[0018] In the diagram: 1. First transition frame; 11. First mounting frame; 12. First sealing ring; 13. Sealing element; 14. Second mounting plate; 2. Second transition frame; 21. First fixing ear; 22. Second mounting frame; 23. Interlocking block; 24. Second sealing ring; 25. First mounting plate; 3. Protective box; 4. Beam measurement transmission line; 41. Signal amplification and converter; 42. Main amplifier; 43. Data transmission line; 44. Data acquisition card; 5. Wedge-shaped energy reduction. 51. Interlocking slot; 52. Wiring socket; 6. Connecting frame; 61. Fixing frame; 62. Flexible adjusting component; 63. Adjusting frame; 64. Second fixing ear; 65. Third mounting plate; 7. First electric push rod; 71. Adjusting claw; 8. First displacement sensor; 81. Second displacement sensor; 9. First vacuum pump; 91. Second vacuum pump; 92. First pressure gauge; 93. Second pressure gauge; 10. Second electric push rod; 101. Connecting component. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0020] This invention provides, for example Figure 1 - Figure 8 The beam de-energizing device for ion implantation shown includes a transition frame, a wedge de-energizer 5, a beam measurement transmission line 4, a beam detection system, a connecting frame 6, an adjustment component, a monitoring device, and a control component. The transition frame provides a mounting base for the wedge de-energizer 5 and works with other components to achieve functions such as sealing and installing the monitoring device. It consists of a first transition frame 1 and a second transition frame 2, which can be quickly opened and closed through quick-release parts to facilitate the replacement of the wedge de-energizer 5.

[0021] A wedge-shaped deflector 5, made of graphite and designed with a right-angled triangular cross-section, is installed at the bottom of the analysis magnet output end. Through its own thickness gradient, it passively corrects the energy-dispersive beam. Higher-energy ions, due to the magnetic dispersion, are weakly deflected and pass through the thicker region of the deflector, resulting in greater energy loss. Lower-energy ions are deflected more significantly, passing through only the thinner region with less energy loss. This effectively compresses the original energy distribution range of the beam, improving the energy uniformity and monoenergeticity of the extracted beam.

[0022] One end of the beam measurement transmission line 4 is plugged into the right end of the wedge de-energizer 5, and the other end of the beam measurement transmission line 4 is equipped with a beam detection system. The beam measurement transmission line 4 is responsible for transmitting the beam signal processed by the wedge de-energizer 5 to the beam detection system for detection. The beam detection system performs real-time online monitoring of the beam correction and includes a signal amplifier and converter 41, a main amplifier 42, and a data acquisition card 44.

[0023] The connecting frame 6 is fixedly connected to the transition frame. The connecting frame 6 is equipped with an adjusting component, which is used to adjust the angle of the output end of the analytical magnet to ensure that the output end of the analytical magnet is strictly parallel to the upper surface of the wedge-shaped energy degrader 5, thereby ensuring the beam correction effect. The connecting frame 6 is used to install the adjusting component, and the angle of the output end of the analytical magnet is adjusted by the adjusting component.

[0024] The monitoring devices are respectively set above the end of the wedge-shaped energy depletor 5. The monitoring devices are used to detect and analyze the positional relationship between the magnet output end and the wedge-shaped energy depletor 5. When the difference of the monitoring device is greater than the threshold H1, the control component issues an alarm and drives the adjustment component to move.

[0025] The control unit is connected to the monitoring device. When the difference in the monitoring device is greater than the threshold H1, the control unit issues an alarm and drives the adjusting component to move. The control unit receives the signal from the monitoring device. When the difference in the monitoring device is greater than the threshold H1, it issues an alarm and drives the adjusting component to move, thereby realizing the automatic adjustment of the angle of the output end of the analytical magnet.

[0026] The transition frame includes a first transition frame 1 and a second transition frame 2. A first mounting frame 11 is fixedly connected to the upper end of the first transition frame 1, and a second mounting frame 22 is fixedly connected to the bottom of the second transition frame 2. The first mounting frame 11 and the second mounting frame 22 abut against each other. A first sealing ring 12 and a second sealing ring 24 are fixedly connected to the inner walls of the first mounting frame 11 and the second mounting frame 22, respectively. A wedge-shaped energy reducer 5 is snapped between the first mounting frame 11, the second mounting frame 22, the first sealing ring 12, and the second sealing ring 24.

[0027] A second mounting plate 14 is provided on the outer wall of the first transition frame 1, a sealing element 13 is provided on the first mounting frame 11, the beam measurement transmission line 4 abuts against the sealing element 13, an interlocking block 23 is fixedly connected to the inner wall of the second mounting frame 22, a first mounting plate 25 is fixedly connected to the outer wall of the second transition frame 2, a first fixing ear 21 is fixedly connected to the inner wall of the second transition frame 2, and a fixing bolt is threadedly connected between the connecting frame 6 and the first fixing ear 21.

[0028] The adjusting components include; Fixed frame 61 is fixedly connected to connecting frame 6; The flexible adjustment component 62 is fixedly connected to the fixed frame 61; An adjustment frame 63 is fixedly connected to a flexible adjustment member 62. A second fixing ear 64 and a third mounting plate 65 are fixedly connected to the inner wall of the adjustment frame 63. The second fixing ear 64 is used to connect the output end of the analysis magnet. The first electric push rod 7 is mounted on the first mounting plate 25, and the accuracy of the first electric push rod 7 is 0.02mm. The adjusting claw 71 is fixedly connected at its bottom to the output end of the first electric push rod 7, and its upper end is fixedly connected to the bottom of the adjusting frame 63.

[0029] The right end of the wedge-shaped energy reducer 5 is provided with an interlock slot 51 and a wiring socket 52. The interlock block 23 is engaged in the interlock slot 51, and one end of the beam measurement transmission line 4 is inserted into the wiring socket 52.

[0030] Both the first transition frame 1 and the second transition frame 2 are equipped with vacuum detection devices. The vacuum detection devices are used to detect the airtightness of the devices. The vacuum detection devices include a first vacuum pump 9, a second vacuum pump 91, a first pressure gauge 92, and a second pressure gauge 93. The first vacuum pump 9 and the first pressure gauge 92 are installed on the front of the first transition frame 1, and the second vacuum pump 91 and the second pressure gauge 93 are installed on the front of the second transition frame 2. The first vacuum pump 9 and the second vacuum pump 91 operate simultaneously, and there is a certain difference in the vacuum volume drawn. After standing for a period of time, the pressure gauge readings are checked, and the airtightness is judged according to different situations.

[0031] The monitoring device includes a first displacement sensor 8 and a second displacement sensor 81, which are respectively installed on the bottom of the third mounting plate 65. The detection ends of the first displacement sensor 8 and the second displacement sensor 81 are directly opposite the upper surface of the wedge-shaped energy reducer 5.

[0032] A protective box 3 is provided at the right end of the transition frame. The beam detection system is installed inside the protective box 3. The beam detection system performs real-time online monitoring of the beam correction. The beam detection system includes: The signal amplifier and converter 41 performs the conversion from current to voltage and primary amplification. One end of the beam measurement transmission line 4 is connected to the signal amplifier and converter 41. The main amplifier 42 is mounted on the signal amplification and converter 41. A data transmission line 43 is connected between the main amplifier 42 and the signal amplification and converter 41. The main amplifier 42 optimizes the amplified signal. The data acquisition card 44 is mounted on the main amplifier 42. The main amplifier 42 and the data acquisition card 44 are electrically connected. The data acquisition card 44 is used to digitize the analog voltage signal and transmit it to the computer.

[0033] A quick-release component is provided between the first transition frame 1 and the second transition frame 2 for quick replacement of the wedge-shaped energy degrader 5. It consists of a second electric push rod 10 and a connector 101. The quick-release component includes: The second electric push rod 10 is mounted on the second mounting plate 14; The connector 101 is fixedly connected between the output end of the second electric push rod 10 and the second mounting frame 22.

[0034] Figure 9 and Figure 10 The diagram illustrates the installation and monitoring steps of a beam de-energizing device for ion implantation: Step 1: When using this device, first install the analytical magnet at the top and the collecting device at the bottom. Then, separate the first mounting frame 11 and the second mounting frame 22 using the quick-release mechanism. Place the wedge-shaped energy degrader 5 inside the first mounting frame 11. At the same time, connect the wedge-shaped energy degrader 5 to the beam detection system through the beam measurement transmission line 4. Finally, restore the first mounting frame 11 and the second mounting frame 22 using the quick-release mechanism. At this time, the first mounting frame 11, the second mounting frame 22, the first sealing ring 12, and the second sealing ring 24 seal the wedge-shaped energy degrader 5. Step 2: After the wedge-shaped energy reducer 5 is installed, the vacuum testing device checks the sealing performance of the beam energy reducer. The first vacuum pump 9 and the second vacuum pump 91 operate simultaneously. There is a certain difference in the vacuum volume drawn by the first vacuum pump 9 and the second vacuum pump 91. After a period of time, the operator checks the pressure gauges. If the readings of the two pressure gauges are similar and the total pressure remains unchanged, it indicates that the sealing performance of the wedge-shaped energy reducer 5 is substandard. If the readings of the two pressure gauges differ significantly and the total pressure decreases, it indicates that the sealing performance of the transition frame is substandard, and the substandard components need to be replaced. If the difference between the two pressure gauge readings is large and the total pressure remains unchanged, it indicates that the sealing performance of the device meets the standard. The monitoring device then monitors the positional relationship between the output end of the analytical magnet and the upper surface of the wedge-shaped energy depletor 5. If the difference between the first displacement sensor 8 and the second displacement sensor 81 is greater than the threshold H1 (H1=0.02mm), it indicates that the output end of the analytical magnet and the upper surface of the wedge-shaped energy depletor 5 are not parallel. The control unit sends a command to the adjustment unit for adjustment. If the difference between the first displacement sensor 8 and the second displacement sensor 81 is less than the threshold H1, it indicates that the adjustment is in place. Step 3: After completing the above checks, the dispersive beam can be corrected using a beam de-energizing device for ion implantation. During the correction process, the beam detection system monitors the beam in real time.

[0035] Example 1: This invention provides a beam de-energizing device for ion implantation. The installation, sealing, and positional monitoring process is as follows: First, the device is initially installed. After installing the analytical magnet at the top and the collecting device at the bottom, the transition frame of the beam de-energizing device consists of a first transition frame 1 and a second transition frame 2. A quick-release mechanism is provided between them, consisting of a second electric push rod 10 and a connector 101. The second electric push rod 10 is mounted on a second mounting plate 14, and the connector 101 is fixedly connected between the output end of the second electric push rod 10 and the second mounting frame 22. The first mounting frame 11 and the second mounting frame 22 are separated using the quick-release mechanism. A wedge-shaped de-energizer 5, made of graphite and with a right-angled triangular cross-section, is placed inside the first mounting frame 11. The right end of the wedge-shaped de-energizer 5 has an interlocking slot 51. The wiring socket 52 and the interlocking block 23 fixedly connected to the inner wall of the second transition frame 2 are engaged in the interlocking slot 51 to achieve the initial fixation of the wedge-shaped energy degrader 5. At the same time, one end of the beam measurement transmission line 4 is inserted into the wiring socket 52 and the other end is connected to the beam detection system to complete the connection between the wedge-shaped energy degrader 5 and the beam detection system. Then, the first mounting frame 11 and the second mounting frame 22 are restored by quick-release parts. At this time, the first mounting frame 11 and the second mounting frame 22 abut against each other, and the first sealing ring 12 and the second sealing ring 24 fixedly connected to their inner walls respectively, together with the first mounting frame 11 and the second mounting frame 22, seal the wedge-shaped energy degrader 5. The outer wall of the first transition frame 1 is provided with a second mounting plate 14, and the first mounting frame 11 is provided with a sealing element 13. The beam measurement transmission line 4 abuts against the sealing element 13 to ensure the sealing effect.

[0036] After the wedge-shaped energy reducer 5 is installed, the sealing performance of the beam energy reduction device needs to be tested. The device is equipped with a vacuum detection device, including a first vacuum pump 9, a second vacuum pump 91, a first pressure gauge 92, and a second pressure gauge 93. The first vacuum pump 9 and the first pressure gauge 92 are installed on the front of the first transition frame 1, and the second vacuum pump 91 and the second pressure gauge 93 are installed on the front of the second transition frame 2. During the test, the first vacuum pump 9 and the second vacuum pump 91 operate simultaneously. Since there is a certain difference in the amount of vacuum drawn by the two pumps, after standing for a period of time, the staff checks the pressure gauge readings. If the two pressure gauge readings are similar and the total pressure remains unchanged, it indicates that the sealing performance of the wedge-shaped energy reducer 5 is substandard. If the two pressure gauge readings differ greatly and the total pressure decreases, it indicates that the sealing performance of the transition frame is substandard, and the substandard component needs to be replaced. If the two pressure gauge readings differ greatly and the total pressure remains unchanged, it indicates that the sealing performance of the device is up to standard.

[0037] After confirming that the device's sealing meets the standards, the monitoring device begins to monitor the positional relationship between the output end of the analytical magnet and the upper surface of the wedge-shaped energy depressor 5. The monitoring device includes a first displacement sensor 8 and a second displacement sensor 81, which are respectively installed on the bottom of the third mounting plate 65 on the inner wall of the adjusting frame 63, with the detection end facing the upper surface of the wedge-shaped energy depressor 5. The connecting frame 6 is fixedly connected to the transition frame. The connecting frame 6 is provided with an adjusting component, which includes a fixed frame 61, a flexible adjusting component 62, an adjusting frame 63, a first electric push rod 7, and an adjusting claw 71. The fixed frame 61 is fixedly connected to the connecting frame 6, the flexible adjusting component 62 is fixedly connected to the fixed frame 61, and the adjusting frame 63 is fixedly connected to the flexible adjusting component 62. A second fixing ear 64 and a third mounting plate 65 are fixedly connected to the inner wall of the adjusting frame 63. The second fixing ear 64 is used to connect the output end of the analytical magnet. The first electric push rod 7 is installed on the first mounting plate 25 on the outer wall of the second transition frame 2 with an accuracy of 0.02mm. The bottom of the adjusting claw 71 is fixedly connected to the first... The upper end of the output of an electric push rod 7 is fixedly connected to the bottom of the adjustment frame 63. If the difference between the first displacement sensor 8 and the second displacement sensor 81 is greater than the threshold H1 (H1=0.02mm), it indicates that the output end of the analytical magnet is not parallel to the upper surface of the wedge-shaped energy reducer 5. The control unit sends a command to the adjustment unit, and the first electric push rod 7 pushes the adjustment claw 71, thereby driving the adjustment frame 63 to move and realize the adjustment of the angle of the output end of the analytical magnet. If the difference between the first displacement sensor 8 and the second displacement sensor 81 is less than the threshold H1, it indicates that the adjustment is in place. Through the above steps, the installation of the beam energy reduction device and the monitoring and adjustment of its sealing and positional relationship are completed.

[0038] Example 2: After completing the installation and monitoring of the sealing and position of the beam de-energizer for ion implantation, the device can be used to correct the dispersive beam. During the correction process, the beam is monitored in real time by the beam detection system. In this device, the wedge-shaped de-energizer 5 is installed at the bottom of the output end of the analytical magnet. Its design utilizes its own thickness gradient to achieve passive correction of the energy dispersive beam. Ions with higher energy are deflected less by the dispersive effect of the magnet and will pass through the thicker area of ​​the de-energizer, resulting in greater energy loss. Ions with lower energy are deflected more and only pass through the thinner area, resulting in less energy loss. This effectively compresses the original energy distribution range of the beam and improves the energy uniformity and monoenergeticity of the extracted beam.

[0039] One end of the beam measurement transmission line 4 is plugged into the right end of the wedge de-energizer 5, and the other end is connected to the beam detection system. It is responsible for transmitting the beam signal processed by the wedge de-energizer 5 to the beam detection system for detection. A protective box 3 is set at the right end of the transition frame. The beam detection system is installed in the protective box 3 and includes a signal amplifier and converter 41, a main amplifier 42, and a data acquisition card 44. The signal amplifier and converter 41 completes the current-to-voltage conversion and primary amplification. One end of the beam measurement transmission line 4 is connected to the signal amplifier and converter 41. The main amplifier 42 is installed on the signal amplifier and converter 41. A data transmission line 43 connects the two. The main amplifier 42 optimizes the amplified signal. The data acquisition card 44 is installed on the main amplifier 42. The main amplifier 42 and the data acquisition card 44 are electrically connected. The data acquisition card 44 is used to digitize the analog voltage signal and transmit it to the computer.

[0040] During the dispersive beam correction process, the beam signal is processed by the wedge de-energizer 5 and then transmitted to the beam detection system via the beam measurement transmission line 4. The signal first enters the signal amplification and converter 41 for current-to-voltage conversion and primary amplification, and then is transmitted to the main amplifier 42 for signal optimization. Finally, the data acquisition card 44 digitizes the analog voltage signal and transmits it to the computer so that the staff can monitor the beam status information in real time. Through this real-time online monitoring method, problems that occur during the beam correction process can be detected in a timely manner, and the device can be adjusted accordingly based on the monitoring data to ensure that the beam correction effect meets the expected requirements and satisfies the beam quality requirements of processes such as ion implantation. The entire beam correction and real-time monitoring process works together to ensure the stable and efficient operation of the beam de-energizer used for ion implantation.

[0041] Finally, it should be noted that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A beam de-energizing device for ion implantation, characterized in that, include: A transition frame, in which a wedge-shaped energy degrader (5) is provided; A beam measurement transmission line (4) is inserted at one end into the right end of a wedge-shaped energy depletor (5), and a beam detection system is provided at the other end of the beam measurement transmission line (4). A connecting frame (6) is fixedly connected to a transition frame. An adjusting component is provided on the connecting frame (6), which is used to adjust the angle of the output end of the analytical magnet. A monitoring device is respectively set above the end of the wedge-shaped energy depletor (5). The monitoring device is used to detect and analyze the positional relationship between the magnet output end and the wedge-shaped energy depletor (5). The control component is communicatively connected to the monitoring device. When the difference in the monitoring device value is greater than the threshold H1, the control component issues an alarm and drives the regulating component to move.

2. The beam de-energizing device for ion implantation according to claim 1, characterized in that, The transition frame includes a first transition frame (1) and a second transition frame (2). The first transition frame (1) is fixedly connected to a first mounting frame (11) at its upper end, and the second transition frame (2) is fixedly connected to a second mounting frame (22) at its bottom. The first mounting frame (11) and the second mounting frame (22) abut against each other. The first mounting frame (11) and the second mounting frame (22) are respectively fixedly connected to the inner walls of the first mounting frame (11) and the second mounting frame (22). The wedge-shaped energy reducer (5) is snapped between the first mounting frame (11), the second mounting frame (22), the first sealing ring (12), and the second sealing ring (24).

3. The beam de-energizing device for ion implantation according to claim 2, characterized in that, A second mounting plate (14) is provided on the outer wall of the first transition frame (1), a sealing element (13) is provided on the first mounting frame (11), the beam measurement transmission line (4) abuts against the sealing element (13), an interlocking block (23) is fixedly connected to the inner wall of the second mounting frame (22), a first mounting plate (25) is fixedly connected to the outer wall of the second transition frame (2), a first fixing ear (21) is fixedly connected to the inner wall of the second transition frame (2), and a fixing bolt is threaded between the connecting frame (6) and the first fixing ear (21).

4. A beam de-energizing device for ion implantation according to claim 3, characterized in that, The adjusting element includes; The fixed frame (61) is fixedly connected to the connecting frame (6); A flexible adjustment element (62) is fixedly connected to a fixed frame (61); An adjustment frame (63) is fixedly connected to a flexible adjustment member (62). A second fixing ear (64) and a third mounting plate (65) are fixedly connected to the inner wall of the adjustment frame (63). The second fixing ear (64) is used to connect the output end of the analysis magnet. The first electric push rod (7) is mounted on the first mounting plate (25); The adjusting claw (71) is fixedly connected at its bottom to the output end of the first electric push rod (7), and the upper end of the adjusting claw (71) is fixedly connected to the bottom of the adjusting frame (63).

5. A beam de-energizing device for ion implantation according to claim 4, characterized in that, The right end of the wedge-shaped energy degrader (5) is provided with an interlock slot (51) and a wiring socket (52). The interlock block (23) is engaged in the interlock slot (51), and one end of the beam measurement transmission line (4) is inserted into the wiring socket (52).

6. A beam de-energizing device for ion implantation according to claim 2, characterized in that, Vacuum detection devices are provided on both the first transition frame (1) and the second transition frame (2). The vacuum detection devices are used to detect the airtightness of the devices. The vacuum detection devices include a first vacuum pump (9), a second vacuum pump (91), a first pressure gauge (92), and a second pressure gauge (93). The first vacuum pump (9) and the first pressure gauge (92) are installed on the front of the first transition frame (1), and the second vacuum pump (91) and the second pressure gauge (93) are installed on the front of the second transition frame (2).

7. A beam de-energizing device for ion implantation according to claim 4, characterized in that, The monitoring device includes a first displacement sensor (8) and a second displacement sensor (81). The first displacement sensor (8) and the second displacement sensor (81) are respectively installed on the bottom of the third mounting plate (65). The detection ends of the first displacement sensor (8) and the second displacement sensor (81) are facing the upper surface of the wedge-shaped energy reducer (5).

8. A beam de-energizing device for ion implantation according to claim 1, characterized in that, A protective box (3) is provided at the right end of the transition frame. The beam detection system is installed inside the protective box (3). The beam detection system performs real-time online monitoring of the beam correction. The beam detection system includes: The signal amplifier and converter (41) performs the conversion from current to voltage and primary amplification, and one end of the beam measurement transmission line (4) is connected to the signal amplifier and converter (41); A main amplifier (42) is mounted on a signal amplifier and converter (41). A data transmission line (43) is connected between the main amplifier (42) and the signal amplifier and converter (41). The main amplifier (42) optimizes the amplified signal. A data acquisition card (44) is installed on the main amplifier (42). The main amplifier (42) is electrically connected to the data acquisition card (44). The data acquisition card (44) is used to digitize the analog voltage signal and transmit it to the computer.

9. A beam de-energizing device for ion implantation according to claim 3, characterized in that, A quick-release component is provided between the first transition frame (1) and the second transition frame (2). The quick-release component is used to quickly replace the wedge-shaped energy reducer (5). The quick-release component includes: The second electric push rod (10) is mounted on the second mounting plate (14); The connector (101) is fixedly connected between the output end of the second electric push rod (10) and the second mounting frame (22).

10. A method of using a beam de-energizing device for ion implantation according to any one of claims 1-9, characterized in that, Includes the following steps; Step 1: When using this device, first install the analytical magnet at the top and the collecting device at the bottom. Then, separate the first mounting frame (11) and the second mounting frame (22) using quick-release parts. Place the wedge-shaped de-energizer (5) inside the first mounting frame (11). At the same time, connect the wedge-shaped de-energizer (5) to the beam detection system through the beam measurement transmission line (4). Finally, restore the first mounting frame (11) and the second mounting frame (22) using quick-release parts. At this time, the first mounting frame (11), the second mounting frame (22), the first sealing ring (12), and the second sealing ring (24) seal the wedge-shaped de-energizer (5). Step 2: After the wedge-shaped energy reducer (5) is installed, the vacuum testing device tests the sealing performance of the beam energy reducer. The first vacuum pump (9) and the second vacuum pump (91) operate simultaneously. There is a certain difference in the vacuum volume drawn by the first vacuum pump (9) and the second vacuum pump (91). After standing for a period of time, the staff checks the pressure gauges. If the readings of the two pressure gauges are similar and the total pressure remains unchanged, it indicates that the sealing performance of the wedge-shaped energy reducer (5) is substandard. If the readings of the two pressure gauges are significantly different and the total pressure decreases, it indicates that the sealing performance of the transition frame is substandard. The substandard sealing performance needs to be addressed. If the two pressure gauges show a large difference in readings and the total pressure remains unchanged, it indicates that the device is in good condition. The monitoring device then monitors the positional relationship between the output end of the analytical magnet and the upper surface of the wedge-shaped energy dropper (5). If the difference between the first displacement sensor (8) and the second displacement sensor (81) is greater than the threshold H1, it indicates that the output end of the analytical magnet and the upper surface of the wedge-shaped energy dropper (5) are not parallel. The control unit sends a command to the adjustment unit to adjust. If the difference between the first displacement sensor (8) and the second displacement sensor (81) is less than the threshold H1, it indicates that the adjustment is in place. Step 3: After completing the above checks, the dispersive beam can be corrected using a beam de-energizing device for ion implantation. During the correction process, the beam detection system monitors the beam in real time.

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