A surface cleaning machine spindle for a photomask, a cleaning machine and a cleaning method

Abstract

The application discloses a surface cleaning machine spindle of a photomask, which comprises a cleaning table, a photomask placing table and a first lifting module, the cleaning table is installed on the first lifting module and moves under the control of the first lifting module, and the photomask placing table is arranged on the cleaning table; the cleaning table is provided with a plurality of first spray heads which are uniformly distributed in the circumferential direction of the cleaning table to clean an external cavity. The application further discloses a surface cleaning machine of a photomask, which comprises a cleaning cavity, a first cleaning arm, a second cleaning arm and the above-mentioned surface cleaning machine spindle. The application further discloses a surface cleaning method of a photomask, which cleans the photomask through the above-mentioned surface cleaning machine. The application integrates the components of the cleaning cavity on the cleaning machine spindle, automatically cleans the cavity and guarantees a high-clean environment inside the cavity.

Description

Technical Field

[0001] This invention relates to the field of semiconductor device processing technology, specifically to a spindle and cleaning machine for surface cleaning of photomasks. Background Technology

[0002] In semiconductors, the photomask (also known as a mask) is a core precision optical template in the photolithography process, equivalent to a "nanoscale film" in chip manufacturing. It is responsible for accurately transferring the designed circuit pattern to the wafer surface and is a crucial carrier connecting IC design and manufacturing. During chip manufacturing, the photomask needs to be cleaned—an ultra-precise, non-destructive cleaning process—to remove particulate contaminants, organic residues, metal ions, photoresist components, and impurities generated during processing from the surface and edges of the photomask. Simultaneously, it ensures that the photomask substrate, light-shielding layer, phase-shifting layer, and protective film are not corroded, scratched, or have their morphology damaged. Photomask cleaning is typically performed in a high-level clean environment, using a combination of processes including high-purity chemical reagents, ultrapure water, low-power megasonic waves, and dry plasma cleaning. This ensures the photomask meets the requirements of advanced photolithography processes for surface defects, cleanliness, and dimensional stability, preventing defects such as chip pattern distortion, broken lines, and short circuits caused by contamination. It is a critical step in ensuring photolithography accuracy and yield.

[0003] In existing photomask surface cleaning machines, there is usually no automatic cleaning function for the chamber or cavity, or it is not possible to perform a comprehensive cleaning of the chamber or cavity. The chamber or cavity can only be cleaned manually once a period of time. Manual cleaning requires opening the chamber or cavity, which can easily cause contamination of the chamber or cavity, thereby destroying the high cleanliness environment in the chamber or cavity and affecting the subsequent cleaning of the photomask. Summary of the Invention

[0004] The purpose of this invention is to provide a main shaft and a cleaning machine for cleaning the surface of photomasks. By integrating a cleaning chamber assembly onto the main shaft, the chamber is automatically cleaned, ensuring a high-cleanliness environment inside. To achieve the above objective, this invention adopts the following technical solution:

[0005] The present invention discloses a main shaft for a surface cleaning machine for photomasks, comprising: a cleaning table, a photomask placement table, and a first lifting module. The cleaning table is mounted on the first lifting module and moves under the control of the first lifting module, and the photomask placement table is disposed on the cleaning table.

[0006] The cleaning platform is equipped with multiple first nozzles, which are evenly distributed around the circumference of the cleaning platform to clean the external cavity. The cleaning platform also has a first annular groove inside, which communicates with the first nozzles.

[0007] The bottom of the cleaning platform is also provided with multiple first connectors. Each first connector is connected to a liquid pump and communicates with the first annular groove, thereby simultaneously injecting cleaning fluid into multiple first nozzles through the first annular groove.

[0008] Preferably, the interior of the cleaning station is further provided with a second annular groove and a third annular groove. The second annular groove is located inside the first annular groove and a first sealing ring is installed in the second annular groove. The third annular groove is located outside the first annular groove and a second sealing ring is installed in the third annular groove.

[0009] Furthermore, the cleaning platform is also equipped with multiple second nozzles, which are located below the photomask placement platform. The bottom of the photomask placement platform is hollowed out, allowing the second nozzles to clean the back of the photomask. The bottom of the cleaning platform is equipped with multiple second connectors corresponding to the second nozzles. These second connectors are externally connected to a liquid injection pump and connected to the corresponding second nozzle to inject cleaning fluid into the second nozzle.

[0010] Furthermore, the main shaft of the surface cleaning machine for the photomask also includes: a first rotating module, the first rotating module including: a servo mechanism and a rotating shaft, the servo mechanism being installed below the cleaning table, one end of the rotating shaft being connected to the servo mechanism, and the other end passing through the center of the cleaning table and being connected to the photomask placement platform, the photomask placement platform rotating under the control of the servo mechanism.

[0011] Preferably, the second nozzles are evenly distributed around the circumference of the rotating shaft, and the nozzles on the second nozzles are obliquely upward and facing the center of the bottom of the photomask placement platform.

[0012] The present invention also discloses a surface cleaning machine for photomasks, comprising: a cleaning chamber, a first cleaning arm, a second cleaning arm, and the aforementioned surface cleaning machine spindle, wherein the first cleaning arm, the second cleaning arm, and the surface cleaning machine spindle are installed in the cleaning chamber, and the first cleaning arm and the second cleaning arm are respectively disposed on one side of the surface cleaning machine spindle.

[0013] The first cleaning arm is equipped with a third nozzle, which is externally connected to a liquid injection pump. The second cleaning arm is equipped with a fourth nozzle and an ultrasonic generator, which is externally connected to a liquid injection pump, and the ultrasonic generator is mounted on one side of the fourth nozzle.

[0014] Furthermore, the cleaning chamber includes an inner chamber and an outer chamber, with the inner chamber fitted inside the outer chamber. A second lifting module is disposed below the inner chamber, allowing the inner chamber to move under the control of the second lifting module. A retaining ring converging towards the center is disposed at the top of the inner chamber. The main shaft of the surface cleaning machine is mounted inside the inner chamber, and the first and second cleaning arms are mounted between the inner and outer chambers.

[0015] Preferably, the first cleaning arm is further provided with a second rotating module, and the third nozzle is rotated out or retracted in the space between the inner cavity and the outer cavity under the control of the second rotating module. The second cleaning arm is provided with a third rotating module, and the fourth nozzle and the ultrasonic generator are rotated out or retracted in the space between the inner cavity and the outer cavity under the control of the third rotating module.

[0016] Preferably, the cleaning chamber is further provided with a baffle assembly, which includes a baffle and a third lifting module installed below the baffle. At least two baffles are provided, which are joined together to form a circle and located between the outer cavity and the inner cavity. The two baffles correspond to the first cleaning arm and the second cleaning arm, respectively.

[0017] When the baffle moves downward under the control of the third lifting module, the first cleaning arm and the second cleaning arm rotate out in sequence; after the first cleaning arm and the second cleaning arm rotate in, the baffle moves upward under the control of the third lifting module.

[0018] Furthermore, the surface cleaning machine for the photomask also includes a flipping device, which is installed above the cleaning chamber.

[0019] The flipping device includes: a first clamping arm, a second clamping arm, a first axial moving module, a second axial moving module, a fourth rotating module, and a fifth rotating module. The first axial moving module and the second axial moving module are arranged facing each other. The first clamping arm is mounted on the fourth rotating module, and the fourth rotating module is mounted on the first axial moving module. The second clamping arm is mounted on the fifth rotating module, and the fifth rotating module is mounted on the second axial moving module.

[0020] The first clamping arm and the second clamping arm move toward each other under the control of the first axial moving module and the second axial moving module, respectively, clamping the photomask, and rotate under the control of the fourth rotating module and the fifth rotating module, respectively, flipping the photomask.

[0021] This invention also discloses a method for cleaning the surface of a photomask, which involves cleaning using the aforementioned surface cleaning machine without a flipping device. The specific steps include: S1. In standby mode, the first and second cleaning arms are in the starting position. After the machine starts running, the cleaning table of the surface cleaning machine spindle rises and places the photomask on the photomask placement table.

[0022] S2. After completing S1, the cleaning table descends, the first cleaning arm and the second cleaning arm rotate out in sequence to clean the upper surface of the photomask, and then the first cleaning arm and the second cleaning arm rotate inward.

[0023] S3. After completing S2, the second nozzle installed on the cleaning platform cleans the back of the photomask, and then the cleaning platform rises and removes the photomask.

[0024] S4. After completing S3, the cleaning platform descends, and the first nozzle in the circumferential direction of the cleaning platform cleans the inner wall of the cleaning chamber.

[0025] This invention also discloses another method for cleaning the surface of a photomask, which involves cleaning using a surface cleaning machine equipped with the aforementioned flipping device. The specific steps include: S1. In standby mode, the first clamping arm and the second clamping arm are respectively in the starting position on both sides, and the first cleaning arm and the second cleaning arm are also in the starting position. After the machine starts running, the cleaning table of the surface cleaning machine spindle rises and places the photomask on the photomask placement table.

[0026] S2. After completing S1, the cleaning table descends, the first cleaning arm and the second cleaning arm rotate out in sequence to clean the upper surface of the photomask, and then the first cleaning arm and the second cleaning arm rotate inward.

[0027] S3. After completing S2, the cleaning platform rises, and the first clamping arm and the second clamping arm move towards each other under the control of the first axial movement module and the second axial movement module, respectively, to clamp the photomask. Then the cleaning platform descends, causing the fourth rotation module and the fifth rotation module to control the first clamping arm and the second clamping arm to rotate, thus flipping the photomask over.

[0028] S4. After completing S3, the cleaning platform rises and the flipped photomask is placed on the photomask placement platform.

[0029] S5. Repeat process S2 for the flipped photomask.

[0030] S6. After completing S5, the cleaning platform rises and removes the photomask.

[0031] S7. After completing S6, the cleaning platform descends, and the first nozzle in the circumferential direction of the cleaning platform cleans the inner wall of the cleaning chamber.

[0032] After adopting the above technical solution, the present invention has the following effects: 1. In this invention, the main shaft of the photomask surface cleaning machine integrates a cleaning chamber component. After each cleaning of the photomask surface or when the chamber needs to be cleaned, the cleaning chamber component can automatically clean the chamber without opening it, thereby improving the cleanliness and stability of the photomask surface cleaning, and thus improving the wafer yield and the stability of mass production.

[0033] 2. The photomask surface cleaning machine in this invention adopts a double-layer cavity, dividing the traditional cavity into an inner layer and an outer layer. The liftable inner cavity can prevent liquid splashed out during cleaning from rebounding onto the photomask surface and contaminating it. At the same time, multiple sets of air extraction pipes are connected to the outside of the cavity, which can achieve stable flow in the cavity and improve the cleanliness of the photomask surface.

[0034] 3. The photomask surface cleaning machine of the present invention is equipped with a photomask flipping device, which can flip the photomask during the cleaning process, effectively controlling the cleanliness of the upper and lower surfaces of the photomask. Attached Figure Description

[0035] Figure 1 This is a three-dimensional structural diagram of the main shaft of the surface cleaning machine in this invention.

[0036] Figure 2 This is an exploded view of the main shaft of the surface cleaning machine in this invention.

[0037] Figure 3 This is a diagram showing the internal structure of the cleaning station in this invention.

[0038] Figure 4 This is a schematic diagram showing the nozzle orientation of the second nozzle of the cleaning station in this invention.

[0039] Figure 5 This is a top view of the main shaft of the surface cleaning machine in this invention.

[0040] Figure 6 for Figure 5 AA-direction cross-sectional view.

[0041] Figure 7 for Figure 5 BB-direction cross-sectional view.

[0042] Figure 8 This is a three-dimensional structural diagram of the surface cleaning machine in this invention.

[0043] Figure 9 This is an exploded view of the surface cleaning machine in this invention.

[0044] Figure 10 This is a first state diagram (cross-sectional view) of the surface cleaning machine in this invention.

[0045] Figure 11This is a second state diagram (cross-sectional view) of the surface cleaning machine in this invention.

[0046] Figure 12 This is a third state diagram (cross-sectional view) of the surface cleaning machine in this invention.

[0047] Figure 13 This is a fourth state diagram (cross-sectional view) of the surface cleaning machine in this invention.

[0048] Figure 14 This is a top view of the cleaning cavity in this invention.

[0049] Figure 15 for Figure 14 The CC-direction cross-sectional view.

[0050] Figure 16 This is a three-dimensional structural diagram of the inner cavity in this invention.

[0051] Figure 17 This is a three-dimensional structural diagram of the baffle in this invention.

[0052] Figure 18 This is a three-dimensional structural diagram of the first cleaning arm in this invention.

[0053] Figure 19 This is a three-dimensional structural diagram of the second cleaning arm in this invention.

[0054] Figure 20 This is a three-dimensional structural diagram of the flipping device in this invention.

[0055] Figure 21 This is a three-dimensional structural diagram of the flipping device in this invention (without the photomask clamped).

[0056] Figure 22 for Figure 21 Enlarged view of point D.

[0057] Main component symbols: 1: Main shaft of surface cleaning machine; 11: Cleaning table; 111: First nozzle; 112: First annular groove; 113: First connector; 114: Second annular groove; 115: First sealing ring; 116: Third annular groove; 117: Second sealing ring; 118: Second nozzle; 1181: Nozzle; 119: Second connector; 12: Photomask placement platform; 13: First lifting module; 14: First rotating module; 141: Rotating shaft; 142: Servo mechanism. 2: Cleaning chamber; 21: Outer chamber; 22: Inner chamber; 221: Retaining ring; 23: Baffle assembly; 231: Baffle; 231A: First baffle; 231B: Second baffle; 231C: Third baffle; 24: Air extraction port; 25: Air extraction pipeline; 3: First cleaning arm; 31: Third nozzle; 32: Second rotating module; 4: Second cleaning arm; 41: Fourth nozzle; 42: Ultrasonic generator; 43: Third rotating module; 5: Tilting device; 51: First clamping arm; 511: First slot; 52: Second clamping arm; 521: Second slot; 53: First axial movement module; 531: Pressure sensor; 54: Second axial movement module; 55: Fourth rotating module; 56: Fifth rotating module; 6: Photomask. Detailed Implementation

[0058] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments.

[0059] In the description of this invention, it should be noted that the terms "first," "second," "third," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0060] like Figures 1 to 3 As shown, the present invention discloses a main shaft for a surface cleaning machine for photomasks, including: a cleaning table 11, a photomask placement table 12 and a first lifting module 13. The cleaning table 11 is mounted on the first lifting module 13 and moves under the control of the first lifting module 13, and the photomask placement table 12 is disposed on the cleaning table 11.

[0061] Combination Figure 5 and Figure 6 As shown, the cleaning table 11 is provided with a plurality of first nozzles 111, which are evenly distributed around the circumference of the cleaning table 11 to clean the external cavity. The cleaning table 11 is provided with a first annular groove 112 inside, which communicates with the first nozzles 111.

[0062] The bottom of the cleaning platform 11 is also provided with multiple first connectors 113. The first connectors 113 are connected to external liquid pumps (not shown in the figure) and communicate with the first annular groove 112, thereby simultaneously injecting cleaning fluid into multiple first nozzles 111 through the first annular groove 112.

[0063] In this embodiment, in order to prevent the cleaning fluid in the first groove 112 from leaking out and affecting the normal operation of the surface cleaning machine spindle, the cleaning table 11 is also provided with a second annular groove 114 and a third annular groove 116. The second annular groove 114 is located inside the first annular groove 112, and a first sealing ring 115 is installed in the second annular groove 114. The third annular groove 116 is located outside the first annular groove 112, and a second sealing ring 117 is installed in the third annular groove 116.

[0064] Secondly, combining Figure 5 and Figure 7 As shown, in this embodiment, the cleaning table 11 is also provided with a plurality of second nozzles 118. The second nozzles 118 are located below the photomask placement table 12, and the bottom of the photomask placement table 12 is hollowed out, so that the second nozzles 118 clean the back of the photomask 6.

[0065] The bottom of the cleaning platform 11 is provided with multiple second connectors 119 corresponding to the second nozzles 118. The second connectors 119 are connected to external liquid pumps (not shown in the figure) and connected to the corresponding second nozzles 118 to inject cleaning fluid into the second nozzles 118.

[0066] And, as Figure 2 As shown, the main shaft of the surface cleaning machine also includes a first rotating module 14, which includes a servo mechanism 142 and a rotating shaft 141. The servo mechanism 142 is installed below the cleaning table 11. One end of the rotating shaft 141 is connected to the servo mechanism 142, and the other end passes through the center of the cleaning table 11 and is connected to the photomask placement stage 12. The photomask placement stage 12 rotates under the control of the servo mechanism 142.

[0067] The second nozzles 118 are evenly distributed around the circumference of the rotating shaft 141, and the nozzles 1181 on the second nozzles 118 are obliquely upward and facing the center of the bottom of the photomask placement platform 12, such as... Figure 4 As shown.

[0068] like Figure 8 and Figure 9 As shown, the present invention also discloses a surface cleaning machine for photomasks, including: a cleaning chamber 2, a first cleaning arm 3, a second cleaning arm 4, and the aforementioned surface cleaning machine spindle 1. The first cleaning arm 3, the second cleaning arm 4, and the surface cleaning machine spindle 1 are installed in the cleaning chamber 2, and the first cleaning arm 3 and the second cleaning arm 4 are respectively arranged on one side of the surface cleaning machine spindle 1.

[0069] The first cleaning arm 3 is equipped with a third nozzle 31, which is connected to an external liquid pump (not shown in the figure). The external liquid pump injects acidic cleaning solution to acid wash the photomask 6.

[0070] The second cleaning arm 4 is equipped with a fourth nozzle 41 and an ultrasonic generator 42. The fourth nozzle 41 is connected to an external liquid pump (not shown in the figure), which injects alkaline cleaning solution to perform alkaline cleaning on the photomask 6. The ultrasonic generator 42 is installed on one side of the fourth nozzle 41 to perform low-power megason cleaning on the photomask 6.

[0071] Again, such as Figure 16 As shown, in this embodiment, the cleaning chamber 2 includes an inner chamber 22 and an outer chamber 21. The inner chamber 22 is fitted inside the outer chamber 21, and a second lifting module (not shown in the figure) is provided below the inner chamber 22. The inner chamber 22 moves under the control of the second lifting module, and a retaining ring 221 that converges towards the center is provided on the top of the inner chamber 22.

[0072] When the first cleaning arm 3 or the second cleaning arm 4 cleans the photomask 6, the inner cavity 22 rises to the corresponding height under the control of the second lifting module to block the liquid thrown out by the cleaning photomask 6. At the same time, the baffle ring 221 at the top of the inner cavity 22 can reflect the thrown liquid at a downward angle, so that it will not splash back onto the surface of the photomask 6.

[0073] The main shaft 1 of the surface cleaning machine is installed inside the inner cavity 22, and the first cleaning arm 3 and the second cleaning arm 4 are installed between the inner cavity 22 and the outer cavity 21.

[0074] like Figure 18 and Figure 19 As shown, in this embodiment, the first cleaning arm 3 is further provided with a second rotating module 32. Under the control of the second rotating module 32, the third nozzle 31 rotates out to clean the photomask 6, and then rotates inward and is placed in the space between the inner cavity 22 and the outer cavity 21. The second cleaning arm 4 is provided with a third rotating module 43. Under the control of the third rotating module 43, the fourth nozzle 41 and the ultrasonic generator 42 rotate out to perform alkaline washing or ultrasonic washing on the photomask 6, and then rotate inward and are placed in the space between the inner cavity 22 and the outer cavity 21.

[0075] Among them, combined Figure 17 As shown, a baffle assembly 23 is also provided inside the cleaning chamber 2. The baffle assembly 23 includes a baffle 231 and a third lifting module (not shown in the figure) installed below the baffle 231. At least two baffles 231 are provided. The two baffles 231 are joined together to form a circle and are located between the outer chamber 21 and the inner chamber 22. The two baffles 231 correspond to the first cleaning arm 3 and the second cleaning arm 4, respectively.

[0076] In this embodiment, the baffle 231 is provided with three parts: a first baffle 231A, a second baffle 231B, and a third baffle 231C. The first baffle 231A corresponds to the first cleaning arm 3, the second baffle 231B corresponds to the second cleaning arm 4, and the first baffle 231A and the second baffle 231B are connected to the third lifting module. The third baffle 231C is fixed in the cleaning cavity 2.

[0077] When the first baffle 231A and the second baffle 231B move downward under the control of the third lifting module, the first cleaning arm 3 and the second cleaning arm 4 rotate out in sequence. After the first cleaning arm 3 and the second cleaning arm 4 rotate in, the first baffle 231A and the second baffle 231B move upward under the control of the third lifting module.

[0078] At the same time, combined Figure 14 and Figure 15 As shown, in this embodiment, the cleaning chamber 2 is provided with multiple air extraction ports 24, and the air extraction ports 24 are connected to an external air extraction device (not shown in the figure) through an air extraction pipe 25. In this embodiment, the air extraction ports 24 are located inside the outer chamber 21, and there are four sets of them. The air extraction pipe 25 connecting the air extraction ports 24 to the external air extraction device is also equipped with a pressure sensor and a regulating valve (neither shown in the figure) to regulate the negative pressure during air extraction and balance the internal and external pressures of the cleaning chamber 2.

[0079] In addition, such as Figures 20 to 22 As shown, in this embodiment, the surface cleaning machine for the photomask further includes a flipping device 5, which is installed above the cleaning chamber 2.

[0080] The flipping device 5 includes: a first clamping arm 51, a second clamping arm 52, a first axial moving module 53, a second axial moving module 54, a fourth rotating module 55, and a fifth rotating module 56. The first axial moving module 53 and the second axial moving module 54 are arranged facing each other. The first clamping arm 51 is mounted on the fourth rotating module 55, and the fourth rotating module 55 is mounted on the first axial moving module 53. The second clamping arm 52 is mounted on the fifth rotating module 56, and the fifth rotating module 56 is mounted on the second axial moving module 54.

[0081] The first clamping arm 51 and the second clamping arm 52 move toward each other under the control of the first axial moving module 53 and the second axial moving module 54, respectively, clamping the photomask 6, and rotate under the control of the fourth rotating module 55 and the fifth rotating module 56, respectively, flipping the photomask 6.

[0082] In this embodiment, the ends of the first clamping arm 51 and the second clamping arm 52 are respectively provided with a first slot 511 and a second slot 521. When the first clamping arm 51 and the second clamping arm 52 clamp the photomask 6, the first slot 511 and the second slot 521 respectively engage with the photomask 6 diagonally. At the same time, a pressure sensor 531 is also installed on the first axial movement module 53 to provide feedback on the pressure of clamping the photomask 6 and prevent the photomask 6 from being damaged.

[0083] Combination Figures 10 to 13 As shown, the working method for cleaning the photomask using the photomask surface cleaning machine of the present invention is as follows.

[0084] Cleaning is performed using a surface cleaning machine without the tilting device 5 installed: S1. In standby mode, the first cleaning arm 3 and the second cleaning arm 4 are in the starting position, i.e., retracted between the inner cavity 22 and the outer cavity 21. At this time, the first baffle 231A and the second baffle 231B are in the raised state. After starting operation, the cleaning table 11 of the surface cleaning machine spindle 1 rises and places the photomask 6 on the photomask placement table 12.

[0085] S2. After completing S1, the cleaning table 11 descends, the inner cavity 22 rises, the first baffle 231A and the second baffle 231B descend, the first cleaning arm 3 and the second cleaning arm 4 are rotated out in sequence to clean the upper surface of the photomask 6, and then the first cleaning arm 3 and the second cleaning arm 4 are rotated inward, the first baffle 231A and the second baffle 231B rise, so that the first cleaning arm 3 and the second cleaning arm 4 continue to be placed between the inner cavity 22 and the outer cavity 21.

[0086] S3. After completing S2, the second nozzle 118 installed on the cleaning table 11 cleans the back of the photomask 6. After cleaning, the inner cavity 22 descends to the initial position and the cleaning table 11 rises.

[0087] S4. After completing S3, the cleaning platform 11 descends, and the first nozzle 111 in the circumferential direction of the cleaning platform 11 cleans the inner wall of the cleaning chamber 2.

[0088] Cleaning is performed using a surface cleaning machine equipped with the tilting device 5: S1. In standby mode, the first clamping arm 51 and the second clamping arm 52 are respectively located in the starting positions on both sides, and the first cleaning arm 3 and the second cleaning arm 4 are also respectively in the starting position, that is, retracted between the inner cavity 22 and the outer cavity 21. At this time, the first baffle 231A and the second baffle 231B are in the raised state. After starting operation, the cleaning table 11 of the surface cleaning machine spindle 1 rises and places the photomask 6 on the photomask placement table 12.

[0089] S2. After completing S1, the cleaning table 11 descends, the inner cavity 22 rises, the first baffle 231A and the second baffle 231B descend, the first cleaning arm 3 and the second cleaning arm 4 are rotated out in sequence to clean the upper surface of the photomask 6, and then the first cleaning arm 3 and the second cleaning arm 4 are rotated inward, the first baffle 231A and the second baffle 231B rise, so that the first cleaning arm 3 and the second cleaning arm 4 continue to be placed between the inner cavity 22 and the outer cavity 21.

[0090] S3. After completing S2, the cleaning table 11 rises, and the first clamping arm 51 and the second clamping arm 52 move towards each other under the control of the first axial moving module 53 and the second axial moving module 54, respectively, to clamp the photomask 6. Then the cleaning table 11 descends, so that the fourth rotating module 55 and the fifth rotating module 56 control the first clamping arm 54 and the second clamping arm 52 to rotate, and flip the photomask 6 over.

[0091] S4. After completing S3, the cleaning table 11 rises and the flipped photomask 6 is placed on the photomask placement table 12.

[0092] S5. Repeat process S2 for the flipped photomask 6.

[0093] S6. After completing S5, the inner cavity 22 descends to the initial position, the cleaning table 11 rises, and the photomask 6 is removed.

[0094] S7. After completing S6, the cleaning platform 11 descends, and the first nozzle 111 in the circumferential direction of the cleaning platform 11 simultaneously cleans the inner wall of the cleaning chamber 2.

[0095] In both of the above methods, the inner wall of the cleaning chamber 2 will be cleaned after the photomask 6 is cleaned. This process can be performed after a period of time after multiple cleanings of the photomask 6, or it can be performed after each cleaning of the photomask 6, depending on the actual operation requirements.

[0096] The above description is merely a preferred embodiment of the present invention. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in the present invention should be included within the protection scope of the present invention.

Claims

1. A spindle for a surface cleaning machine for photomasks, characterized in that, include: The system includes a cleaning table, a photomask placement platform, and a first lifting module. The cleaning table is mounted on the first lifting module and moves under the control of the first lifting module. The photomask placement platform is placed on the cleaning table. The cleaning platform is equipped with a plurality of first nozzles, which are evenly distributed around the periphery of the cleaning platform to clean the external cavity. The cleaning platform is also equipped with a first annular groove, which communicates with the first nozzles. The bottom of the cleaning platform is also provided with multiple first connectors. Each first connector is connected to a liquid pump and communicates with the first annular groove, thereby simultaneously injecting cleaning fluid into multiple first nozzles through the first annular groove.

2. The spindle of a surface cleaning machine for photomasks as described in claim 1, characterized in that: The cleaning station is further provided with a second annular groove and a third annular groove. The second annular groove is located inside the first annular groove and a first sealing ring is installed in the second annular groove. The third annular groove is located outside the first annular groove and a second sealing ring is installed in the third annular groove.

3. The spindle of a surface cleaning machine for photomasks as described in claim 1, characterized in that: The cleaning table is also equipped with multiple second nozzles, which are located below the photomask placement table. The bottom of the photomask placement table is hollowed out, so that the second nozzles can clean the back of the photomask. The bottom of the cleaning platform is provided with multiple second connectors corresponding to the second nozzles. The second connectors are externally connected to a liquid pump and connected to the corresponding second nozzles to inject cleaning fluid into the second nozzles.

4. The spindle of a surface cleaning machine for photomasks as described in claim 3, characterized in that: Also includes: The first rotating module includes a servo mechanism and a rotating shaft. The servo mechanism is installed below the cleaning table. One end of the rotating shaft is connected to the servo mechanism, and the other end passes through the center of the cleaning table and is connected to the photomask placement platform. The photomask placement platform rotates under the control of the servo mechanism. The second nozzles are evenly distributed around the circumference of the rotating shaft, and the nozzles on the second nozzles are obliquely upward and facing the center of the bottom of the photomask placement platform.

5. A surface cleaning machine for photomasks, characterized in that, include: The cleaning chamber, the first cleaning arm, the second cleaning arm, and the surface cleaning machine spindle as described in any one of claims 1-4 are provided, wherein the first cleaning arm, the second cleaning arm, and the surface cleaning machine spindle are installed in the cleaning chamber, and the first cleaning arm and the second cleaning arm are respectively disposed on one side of the surface cleaning machine spindle. The first cleaning arm is equipped with a third nozzle, and the third nozzle is externally connected to a liquid injection pump; The second cleaning arm is equipped with a fourth nozzle and an ultrasonic generator. The fourth nozzle is connected to an external liquid pump, and the ultrasonic generator is installed on one side of the fourth nozzle.

6. The surface cleaning machine for photomasks as described in claim 5, characterized in that: The cleaning chamber includes an inner chamber and an outer chamber. The inner chamber is fitted inside the outer chamber, and a second lifting module is provided below the inner chamber. The inner chamber moves under the control of the second lifting module, and a retaining ring that converges towards the center is provided on the top of the inner chamber. The main shaft of the surface cleaning machine is installed in the inner cavity, and the first cleaning arm and the second cleaning arm are installed between the inner cavity and the outer cavity.

7. The surface cleaning machine for photomasks as described in claim 6, characterized in that: The first cleaning arm is also provided with a second rotating module, and the third nozzle is rotated out or retracted in the space between the inner cavity and the outer cavity under the control of the second rotating module; the second cleaning arm is provided with a third rotating module, and the fourth nozzle and the ultrasonic generator are rotated out or retracted in the space between the inner cavity and the outer cavity under the control of the third rotating module. The cleaning chamber is also provided with a baffle assembly, which includes a baffle and a third lifting module installed below the baffle. At least two baffles are provided, which are joined together to form a circle and located between the outer cavity and the inner cavity. The two baffles correspond to the first cleaning arm and the second cleaning arm, respectively. When the baffle moves downward under the control of the third lifting module, the first cleaning arm and the second cleaning arm rotate out in sequence; after the first cleaning arm and the second cleaning arm rotate in, the baffle moves upward under the control of the third lifting module.

8. A surface cleaning machine for photomasks as described in any one of claims 5-7, characterized in that: Also includes: A tilting device is installed above the cleaning chamber; The flipping device includes: a first clamping arm, a second clamping arm, a first axial moving module, a second axial moving module, a fourth rotating module, and a fifth rotating module. The first axial moving module and the second axial moving module are arranged facing each other. The first clamping arm is mounted on the fourth rotating module, and the fourth rotating module is mounted on the first axial moving module. The second clamping arm is mounted on the fifth rotating module, and the fifth rotating module is mounted on the second axial moving module. The first clamping arm and the second clamping arm move toward each other under the control of the first axial moving module and the second axial moving module, respectively, clamping the photomask, and rotate under the control of the fourth rotating module and the fifth rotating module, respectively, flipping the photomask.

9. A method for cleaning the surface of a photomask, characterized in that: The surface cleaning process, performed using the surface cleaning machine as described in any one of claims 5-7, includes the following specific steps: S1. In standby mode, the first cleaning arm and the second cleaning arm are in the starting position respectively. After the machine starts running, the cleaning table of the main shaft of the surface cleaning machine rises and places the photomask on the photomask placement table. S2. After completing S1, the cleaning table descends, the first cleaning arm and the second cleaning arm rotate out in sequence to clean the upper surface of the photomask, and then the first cleaning arm and the second cleaning arm rotate inward. S3. After S2 is completed, the second nozzle installed on the cleaning table cleans the back of the photomask, and then the cleaning table rises and removes the photomask. S4. After completing S3, the cleaning platform descends, and the first nozzle in the circumferential direction of the cleaning platform cleans the inner wall of the cleaning chamber.

10. A method for cleaning the surface of a photomask, characterized in that: The surface cleaning process, performed using the surface cleaning machine as described in claim 8, includes the following specific steps: S1. In standby mode, the first clamping arm and the second clamping arm are respectively in the starting position on both sides, and the first cleaning arm and the second cleaning arm are also in the starting position. After the machine starts running, the cleaning table of the main shaft of the surface cleaning machine rises and places the photomask on the photomask placement table. S2. After completing S1, the cleaning table descends, the first cleaning arm and the second cleaning arm rotate out in sequence to clean the upper surface of the photomask, and then the first cleaning arm and the second cleaning arm rotate inward. S3. After completing S2, the cleaning table rises, and the first clamping arm and the second clamping arm move towards each other under the control of the first axial movement module and the second axial movement module, respectively, to clamp the photomask. Then the cleaning table descends, so that the fourth rotation module and the fifth rotation module control the first clamping arm and the second clamping arm to rotate and flip the photomask. S4. After completing S3, the cleaning table rises and the flipped photomask is placed on the photomask placement table. S5. Repeat process S2 for the flipped photomask; S6. After completing S5, the cleaning platform rises and removes the photomask. S7. After completing S6, the cleaning platform descends, and the first nozzle in the circumferential direction of the cleaning platform cleans the inner wall of the cleaning chamber.

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